JP6016108B2 - Substrate peeling apparatus and peeling method, and electronic device manufacturing method - Google Patents

Substrate peeling apparatus and peeling method, and electronic device manufacturing method Download PDF

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JP6016108B2
JP6016108B2 JP2012275538A JP2012275538A JP6016108B2 JP 6016108 B2 JP6016108 B2 JP 6016108B2 JP 2012275538 A JP2012275538 A JP 2012275538A JP 2012275538 A JP2012275538 A JP 2012275538A JP 6016108 B2 JP6016108 B2 JP 6016108B2
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peeling
substrate
plate
main surface
flexible plate
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JP2014118276A (en
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泰則 伊藤
泰則 伊藤
洋 宇津木
洋 宇津木
圭 滝内
圭 滝内
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AGC Inc
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Asahi Glass Co Ltd
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Priority to CN201310698272.9A priority patent/CN103871945B/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C63/00Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
    • B29C63/0004Component parts, details or accessories; Auxiliary operations
    • B29C63/0013Removing old coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00Handling processes for sheets or webs
    • B65H2301/50Auxiliary process performed during handling process
    • B65H2301/51Modifying a characteristic of handled material
    • B65H2301/511Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
    • B65H2301/5112Processing surface of handled material upon transport or guiding thereof, e.g. cleaning removing material from outer surface
    • B65H2301/51122Processing surface of handled material upon transport or guiding thereof, e.g. cleaning removing material from outer surface peeling layer of material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H29/00Delivering or advancing articles from machines; Advancing articles to or into piles
    • B65H29/54Article strippers, e.g. for stripping from advancing elements
    • B65H29/56Article strippers, e.g. for stripping from advancing elements for stripping from elements or machines
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386Separation by peeling

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Folding Of Thin Sheet-Like Materials, Special Discharging Devices, And Others (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

本発明は、基板と補強板との界面を剥離する基板の剥離装置及び剥離方法並びに電子デバイスの製造方法に関する。   The present invention relates to a substrate peeling apparatus and peeling method for peeling an interface between a substrate and a reinforcing plate, and an electronic device manufacturing method.

近年、表示パネル、太陽電池、及び薄膜二次電池等の電子デバイスの薄型化、軽量化に伴い、電子デバイスに用いられる基板の薄板化が要望されている。しかしながら、薄板化によって基板の強度が低下すると、基板のハンドリング性が悪化するため、薄膜トランジスタ(TFT:Thin Film Transistor)、カラーフィルタ(CF:color filter)等の電子デバイス用の機能層を基板の表面に形成するのが困難になる。   In recent years, with the reduction in thickness and weight of electronic devices such as display panels, solar cells, and thin film secondary batteries, there has been a demand for thinner substrates used in electronic devices. However, if the strength of the substrate is reduced due to the thin plate, the handling property of the substrate is deteriorated. Therefore, a functional layer for an electronic device such as a thin film transistor (TFT), a color filter (CF) is provided on the surface of the substrate. It becomes difficult to form.

そこで、基板の裏面に補強板を剥離可能に貼り付けた積層板(広義では積層体)を構成し、その積層板の基板の表面に機能層を形成した後、基板と補強板とを剥離する方法が提案されている(例えば、特許文献1参照)。以下、機能層が形成される面を基板の「表面」と言い、補強板が貼り付けられる面を基板の「裏面」と言う。   Therefore, a laminated board (laminated body in a broad sense) in which the reinforcing plate is detachably attached to the back surface of the substrate is formed, a functional layer is formed on the surface of the laminated board, and then the substrate and the reinforcing plate are peeled off. A method has been proposed (see, for example, Patent Document 1). Hereinafter, the surface on which the functional layer is formed is referred to as the “front surface” of the substrate, and the surface on which the reinforcing plate is attached is referred to as the “back surface” of the substrate.

特許文献1の剥離方法は、基板の裏面と補強板との界面が一端側から他端側に向けて順次剥離するように、基板及び補強板のうち少なくとも一方の板材を撓み変形させて、界面を全面剥離する方法である。前記撓み変形は、基板及び補強板のうち少なくとも一方を可撓性板で吸着保持し、可撓性板に固定された複数の可動体を独立して移動させることにより行われる。   The peeling method of Patent Document 1 is such that at least one of the substrate and the reinforcing plate is flexibly deformed so that the interface between the back surface of the substrate and the reinforcing plate is sequentially peeled from one end side to the other end side. Is a method of peeling the entire surface. The bending deformation is performed by attracting and holding at least one of the substrate and the reinforcing plate with a flexible plate and independently moving a plurality of movable bodies fixed to the flexible plate.

図19(a)は、特許文献1における基板の剥離形態を模式的に示した積層板100の平面図である。図19(b)は、基板の剥離形態の側面図である。   FIG. 19A is a plan view of the laminated plate 100 schematically showing the substrate peeling pattern in Patent Document 1. FIG. FIG.19 (b) is a side view of the peeling form of a board | substrate.

図19(b)の如く積層板100は基板102と、基板102の裏面に貼り付けられた補強板104とからなる。図19(a)の破線A及び図19(b)の符号Aは、基板102と補強板104との界面が剥離した剥離領域106と界面が剥離していない未剥離領域108との境界線(以下、「剥離前線」ともいう。以下、符号Aで示す。)である。この剥離前線Aが、図19(a)の矢印Bの如く、積層板100の隅部110側から隅部112側に向けて略平行に進行するように、図19(b)の複数の可動体114、114…が矢印Cの如く順次下降移動させられる。   As shown in FIG. 19B, the laminated plate 100 includes a substrate 102 and a reinforcing plate 104 attached to the back surface of the substrate 102. A broken line A in FIG. 19A and a symbol A in FIG. 19B indicate a boundary line between the peeling region 106 where the interface between the substrate 102 and the reinforcing plate 104 is peeled and the non-peeling region 108 where the interface is not peeled ( Hereinafter, it is also referred to as a “peeling front. A plurality of movable members shown in FIG. 19B are arranged so that the peeling front A advances substantially in parallel from the corner 110 side to the corner 112 side of the laminated plate 100 as indicated by an arrow B in FIG. The bodies 114, 114... Are sequentially moved downward as indicated by an arrow C.

基板102の表面は、支持手段としての平板状のステージ116に変形不能に支持され、補強板104は、弾性変形可能な可撓性板118に吸着保持されている。この可撓性板118に可動体114、114…が碁盤目状に固定されている。すなわち、剥離前線Aの剥離進行方向である矢印Bに対して略直交する方向に配列された複数の可動体114、114…を、同時に下降移動させて可撓性板118を撓み変形させていくことで、剥離前線Aが矢印B方向に進行する。   The surface of the substrate 102 is supported in a non-deformable manner by a flat plate stage 116 as a support means, and the reinforcing plate 104 is adsorbed and held by a flexible plate 118 that can be elastically deformed. The movable bodies 114, 114... Are fixed to the flexible plate 118 in a grid pattern. That is, the plurality of movable bodies 114, 114... Arranged in a direction substantially orthogonal to the arrow B which is the peeling advance direction of the peeling front A are simultaneously moved downward to bend and deform the flexible plate 118. Thus, the peeling front A proceeds in the direction of arrow B.

なお、特許文献1では、剥離領域106の曲率半径aが250mm〜2500mmとなるように、可動体114、114…によって可撓性板118を撓み変形させている。   In Patent Document 1, the flexible plate 118 is bent and deformed by the movable bodies 114, 114... So that the radius of curvature a of the peeling region 106 is 250 mm to 2500 mm.

国際公開第2011/024689号パンフレットInternational Publication No. 2011/024689 Pamphlet

しかしながら、特許文献1の基板の剥離形態では、図19(a)に示すように基板102の端部に微細クラック(以下、クラックという。)120が発生している場合には、剥離時にクラック120が伸展して基板102が割れる(破れる)という問題があった。   However, in the peeling form of the substrate of Patent Document 1, when a fine crack (hereinafter referred to as a crack) 120 is generated at the end of the substrate 102 as shown in FIG. Has a problem that the substrate 102 breaks (breaks).

図19(c)には、クラック120に起因する基板102の割れのメカニズムが示されている。   FIG. 19C shows a mechanism of cracking of the substrate 102 caused by the crack 120.

界面を矢印B方向に進行する剥離前線Aは、クラック120を通過する際、クラック120を伸展させる方向に通過する。つまり、剥離前線Aの矢印Bで示す剥離進行方向は、基板102の縁部102Aから基板102の内側に向いた方向となる。これにより、界面を剥離させる力がクラック120を伸展させる方向に作用するため、クラック120が符号122の如く剥離前線Aとともに伸展していく。このメカニズムによって、基板102が割れることを実験にてつきとめた。   The peeling front A that travels in the direction of arrow B through the interface passes in the direction in which the crack 120 extends when passing through the crack 120. That is, the peeling progress direction indicated by the arrow B of the peeling front A is the direction from the edge 102 </ b> A of the substrate 102 to the inside of the substrate 102. As a result, the force that peels the interface acts in the direction in which the crack 120 extends, so that the crack 120 extends along with the peeling front A as indicated by reference numeral 122. It has been experimentally found that the substrate 102 is broken by this mechanism.

本発明は、このような事情に鑑みてなされたものであって、基板にクラックが発生していた場合であっても基板を良好に剥離できる基板の剥離装置及び剥離方法並びに電子デバイスの製造方法を提供することを目的とする。   The present invention has been made in view of such circumstances, and is a substrate peeling apparatus and peeling method that can satisfactorily peel off a substrate even when a crack has occurred in the substrate, and a method for manufacturing an electronic device The purpose is to provide.

本発明の一態様の基板の剥離装置は、前記目的を達成するために、基板と、前記基板を補強する補強板との界面を一端側から他端側に向けた剥離進行方向に沿って順次剥離する基板の剥離装置において、前記界面を剥離した剥離領域と未剥離領域との境界線と前記基板の外周との2つの交点を結んだ直線と、前記剥離領域の前記基板の外周の接線と、のなす角度が少なくとも90度以下の剥離範囲において、前記境界線の端部の接線と、前記剥離領域の前記基板の外周の接線と、のなす角度が90度よりも大きくなるように前記界面を剥離させる剥離手段を備えたことを特徴とする。   In order to achieve the above-described object, the substrate peeling apparatus of one embodiment of the present invention sequentially has an interface between the substrate and the reinforcing plate that reinforces the substrate along the peeling progress direction from one end side to the other end side. In the peeling apparatus for the substrate to be peeled, a straight line connecting two intersections of the boundary line between the peeling area and the non-peeling area where the interface is peeled off and the outer periphery of the substrate, and the tangent line of the outer circumference of the substrate in the peeling area In the peeling range of at least 90 degrees or less, the interface is formed such that the angle formed by the tangent of the end of the boundary line and the tangent of the outer periphery of the substrate in the peeling area is greater than 90 degrees. It is characterized by having a peeling means for peeling off.

本発明の一態様の基板の剥離方法は、前記目的を達成するために、基板と、前記基板を補強する補強板との界面を一端側から他端側に向けた剥離進行方向に沿って順次剥離する基板の剥離方法において、前記界面を剥離した剥離領域と未剥離領域との境界線と前記基板の外周との2つの交点を結んだ直線と、前記剥離領域の前記基板の外周の接線と、のなす角度が少なくとも90度以下の剥離範囲において、前記境界線の端部の接線と、前記剥離領域の前記基板の外周の接線と、のなす角度が90度よりも大きくなるように前記界面を剥離手段によって剥離させることを特徴とする。   In order to achieve the above object, the substrate peeling method according to one aspect of the present invention sequentially performs the interface between the substrate and the reinforcing plate that reinforces the substrate from one end side to the other end side along the peeling progress direction. In the peeling method of the substrate to be peeled, a straight line connecting two intersections of the boundary line between the peeling region and the non-peeling region where the interface is peeled off and the outer periphery of the substrate, and the tangent line of the outer periphery of the substrate in the peeling region In the peeling range of at least 90 degrees or less, the interface is formed such that the angle formed by the tangent of the end of the boundary line and the tangent of the outer periphery of the substrate in the peeling area is greater than 90 degrees. Is peeled off by a peeling means.

本発明の一態様の電子デバイスの製造方法は、前記目的を達成するために、補強板で補強した基板の表面に機能層を形成する機能層成形工程と、前記機能層が形成された前記基板と前記補強板とを剥離する剥離工程とを有する電子デバイスの製造方法において、前記剥離工程は、前記基板と前記補強板との界面を一端側から他端側に向けた剥離進行方向に沿って順次剥離する工程であって、前記界面を剥離した剥離領域と未剥離領域との境界線と前記基板の外周との2つの交点を結んだ直線と、前記剥離領域の前記基板の外周の接線と、のなす角度が少なくとも90度以下の剥離範囲において、前記境界線の端部の接線と、前記剥離領域の前記基板の外周の接線と、のなす角度が90度よりも大きくなるように前記界面を剥離する工程であることを特徴とする。   In order to achieve the above object, an electronic device manufacturing method according to an aspect of the present invention includes a functional layer forming step of forming a functional layer on a surface of a substrate reinforced with a reinforcing plate, and the substrate on which the functional layer is formed. And a peeling step of peeling the reinforcing plate, the peeling step is performed along a peeling progress direction in which an interface between the substrate and the reinforcing plate is directed from one end side to the other end side. A step of sequentially peeling, and a straight line connecting two intersections of a boundary line between the peeling region and the non-peeling region where the interface is peeled off and an outer periphery of the substrate, and a tangent line of the outer periphery of the substrate in the peeling region In the peeling range of at least 90 degrees or less, the interface is formed such that the angle formed by the tangent of the end of the boundary line and the tangent of the outer periphery of the substrate in the peeling area is greater than 90 degrees. Is the process of peeling And wherein the door.

本発明の剥離形態の一態様によれば、前記剥離範囲において進行する境界線(剥離前線)は、基板の端部に発生しているクラックを通過する際、クラックを伸展させる方向に通過せず、基板の内側から基板の縁部に向いた方向に通過する。これにより、界面を剥離させる力がクラックを伸展させる方向に作用しないため、クラックは境界線の進行とともに伸展しない。よって、本発明の剥離形態の一態様によれば、基板にクラックが発生していた場合であっても基板を良好に剥離できる。   According to one aspect of the peeling mode of the present invention, the boundary line (peeling front) that progresses in the peeling range does not pass in the direction of extending the crack when passing through the crack generated at the end of the substrate. , Passing in the direction from the inside of the substrate toward the edge of the substrate. Thereby, since the force which peels an interface does not act in the direction which extends a crack, a crack does not extend with progress of a boundary line. Therefore, according to one aspect of the peeling mode of the present invention, the substrate can be peeled satisfactorily even when cracks are generated in the substrate.

本発明の一態様は、前記基板は、厚さが0.2mm以下のガラス基板であることが好ましい。   In one embodiment of the present invention, the substrate is preferably a glass substrate having a thickness of 0.2 mm or less.

本発明の一態様によれば、電子デバイスの薄型化に対応したガラス基板の剥離装置、剥離方法に好適となる。   According to one embodiment of the present invention, it is suitable for a glass substrate peeling apparatus and a peeling method corresponding to a reduction in thickness of an electronic device.

本発明の基板の剥離装置の一態様は、前記剥離手段は、前記基板及び前記補強板を含む積層体の第1の主面を支持する支持手段と、前記積層体の第2の主面の外縁を吸着保持する第1の吸着面、及び前記外縁を除く第2の主面を吸着保持する第2の吸着面を有する可撓性板であって、前記第2の吸着面は前記第2の主面に対して平行な面であり、前記第1の吸着面は、前記第2の吸着面に対して所定量突出した突出面である可撓性板と、前記可撓性板に間隔をおいて固定され、前記支持手段に対して独立に移動可能な複数の可動体と、前記剥離進行方向の前記一端側に位置する前記可動体から前記剥離進行方向の他端側に位置する前記可動体を、前記支持手段に対して離間させる方向に順次移動させる制御手段と、を備えることが好ましい。   In one aspect of the substrate peeling apparatus of the present invention, the peeling means includes: a supporting means for supporting the first main surface of the laminate including the substrate and the reinforcing plate; and a second main surface of the laminate. A flexible plate having a first suction surface for sucking and holding an outer edge and a second suction surface for sucking and holding a second main surface excluding the outer edge, wherein the second suction surface is the second suction surface. The first suction surface is a projecting surface projecting a predetermined amount with respect to the second suction surface, and is spaced from the flexible plate. A plurality of movable bodies that are fixed and movable independently of the support means, and the movable body that is located on the other end side in the peeling progress direction from the movable body that is located on the one end side in the peeling progress direction. It is preferable to include a control unit that sequentially moves the movable body in a direction away from the support unit.

本発明の基板の剥離方法の一態様は、前記剥離手段による剥離方法は、前記基板及び前記補強板を含む積層体の第1の主面を支持する支持手段と、前記積層体の第2の主面の外縁を吸着保持する第1の吸着面、及び前記外縁を除く第2の主面を吸着保持する第2の吸着面を有する可撓性板であって、前記第2の吸着面は前記第2の主面に対して平行な面であり、前記第1の吸着面は、前記第2の吸着面に対して所定量突出した突出面である可撓性板と、前記可撓性板に間隔をおいて固定され、前記支持手段に対して独立に移動可能な複数の可動体と、を備え、前記剥離進行方向の前記一端側に位置する前記可動体から前記剥離進行方向の他端側に位置する前記可動体を、前記支持手段に対して離間させる方向に制御手段によって順次移動させることが好ましい。   In one aspect of the substrate peeling method of the present invention, the peeling method by the peeling means includes a supporting means for supporting the first main surface of the laminate including the substrate and the reinforcing plate, and a second of the laminate. A flexible plate having a first suction surface for sucking and holding the outer edge of the main surface and a second suction surface for sucking and holding the second main surface excluding the outer edge, wherein the second suction surface is A flexible plate which is a plane parallel to the second main surface, and the first suction surface is a projecting surface projecting a predetermined amount with respect to the second suction surface; and the flexibility A plurality of movable bodies fixed to the plate at an interval and movable independently with respect to the support means, from the movable body located on the one end side of the peeling progress direction to the other of the peeling progress direction. The movable body located on the end side is sequentially moved by the control means in a direction away from the support means. It is preferable.

本発明の電子デバイスの製造方法の一態様は、前記剥離工程は、前記基板及び前記補強板を含む積層体の第1の主面を支持手段で支持するとともに、前記積層体の第2の主面を吸着保持する可撓性板に間隔をおいて固定された複数の可動体の前記支持手段に対する移動を制御することで、前記界面を一端側から他端側に向けた剥離進行方向に沿って順次剥離する工程であって、前記可撓性板は、前記積層体の第2の主面の外縁を吸着保持する第1の吸着面、及び前記外縁を除く第2の主面を吸着保持する第2の吸着面を有する可撓性板であって、前記第2の吸着面は前記第2の主面に対して平行な面であり、前記第1の吸着面は、前記第2の吸着面に対して所定量突出した突出面を備えていることが好ましい。   In one aspect of the method for producing an electronic device of the present invention, in the peeling step, the first main surface of the multilayer body including the substrate and the reinforcing plate is supported by a support means, and the second main surface of the multilayer body is supported. By controlling the movement of the plurality of movable bodies fixed to the flexible plate that holds and holds the surface at intervals with respect to the support means, the interface extends along the peeling progress direction from one end side to the other end side. The flexible plate is held by suction and holds the first suction surface that sucks and holds the outer edge of the second main surface of the laminate, and the second main surface excluding the outer edge. A flexible plate having a second suction surface, wherein the second suction surface is parallel to the second main surface, and the first suction surface is the second suction surface. It is preferable to provide a protruding surface protruding a predetermined amount with respect to the adsorption surface.

本発明の剥離形態の一態様によれば、剥離進行方向の一端側に位置する可動体から剥離進行方向の他端側に位置する可動体を、支持手段に対して離間させる方向に制御手段によって順次移動させると、積層体の外縁が外縁を除く面よりも遅れて剥離する。これにより、本発明の剥離形態の一態様によれば、境界線の端部の接線と、剥離領域の基板の外周の接線とのなす角度が90度よりも大きくなるので、基板にクラックが発生していた場合であっても基板を良好に剥離できる。   According to one aspect of the peeling mode of the present invention, the control means moves the movable body positioned on the other end side in the peeling progress direction from the movable body positioned on the one end side in the peeling progress direction in the direction separating the support body from the movable means. When sequentially moved, the outer edge of the laminate is peeled off later than the surface excluding the outer edge. As a result, according to one aspect of the peeling mode of the present invention, the angle formed between the tangent line at the end of the boundary line and the tangent line at the outer periphery of the substrate in the peeling region is larger than 90 degrees, so that a crack is generated in the substrate. Even if it is a case, the board | substrate can be peeled favorable.

本発明の基板の剥離装置の一態様は、前記剥離手段は、前記基板及び前記補強板を含む積層体の第1の主面を支持する支持手段と、前記積層体の第2の主面を吸着保持する可撓性板と、前記可撓性板に間隔をおいて固定され、前記支持手段に対して独立に移動可能な複数の可動体と、前記剥離進行方向の前記一端側に位置する前記可動体から前記剥離進行方向の他端側に位置する前記可動体を、前記支持手段に対して離間させる方向に順次移動させるとともに、前記第2の主面の外縁に位置する前記可動体の離間移動開始時間を、前記外縁を除く前記第2の主面に位置する前記可動体の離間移動開始時間よりも所定時間遅らせる制御手段と、を備えることが好ましい。   In one aspect of the substrate peeling apparatus of the present invention, the peeling means includes a supporting means for supporting a first main surface of a laminate including the substrate and the reinforcing plate, and a second main surface of the laminate. A flexible plate to be sucked and held, a plurality of movable bodies fixed to the flexible plate at an interval and movable independently with respect to the support means, and positioned on the one end side in the peeling progress direction The movable body positioned on the other end side in the peeling progress direction from the movable body is sequentially moved in a direction away from the support means, and the movable body positioned on the outer edge of the second main surface It is preferable to include a control unit that delays the separation movement start time by a predetermined time from the separation movement start time of the movable body located on the second main surface excluding the outer edge.

本発明の基板の剥離方法の一態様は、前記剥離手段による剥離方法は、前記基板及び前記補強板を含む積層体の第1の主面を支持する支持手段と、前記積層体の第2の主面を吸着保持する可撓性板と、前記可撓性板に間隔をおいて固定され、前記支持手段に対して独立に移動可能な複数の可動体と、を備え、前記剥離進行方向の前記一端側に位置する前記可動体から前記剥離進行方向の他端側に位置する前記可動体を、前記支持手段に対して離間させる方向に制御手段によって順次移動させるとともに、前記第2の主面の外縁に位置する前記可動体の離間移動開始時間を、前記外縁を除く前記第2の主面に位置する前記可動体の離間移動開始時間よりも前記制御手段によって所定時間遅らせることが好ましい。   In one aspect of the substrate peeling method of the present invention, the peeling method by the peeling means includes a supporting means for supporting the first main surface of the laminate including the substrate and the reinforcing plate, and a second of the laminate. A flexible plate that adsorbs and holds a main surface; and a plurality of movable bodies that are fixed to the flexible plate at an interval and are movable independently of the support means. The movable body located on the other end side in the peeling progress direction from the movable body located on the one end side is sequentially moved by the control means in a direction away from the support means, and the second main surface It is preferable that the control means delays the separation movement start time of the movable body located on the outer edge of the movable body by a predetermined time from the separation movement start time of the movable body located on the second main surface excluding the outer edge.

本発明の電子デバイスの製造方法の一態様は、前記剥離工程は、前記基板及び前記補強板を含む積層体の第1の主面を支持手段で支持するとともに、前記積層体の第2の主面を吸着保持する可撓性板に間隔をおいて固定された複数の可動体の前記支持手段に対する移動を制御することで、前記界面を一端側から他端側に向けた剥離進行方向に沿って順次剥離する工程であって、前記剥離進行方向の前記一端側に位置する前記可動体から前記剥離進行方向の他端側に位置する前記可動体を、前記支持手段に対して離間させる方向に順次移動させるとともに、前記第2の主面の外縁に位置する前記可動体の離間移動開始時間を、前記外縁を除く前記第2の主面に位置する前記可動体の離間移動開始時間よりも所定時間遅らせることが好ましい。   In one aspect of the method for producing an electronic device of the present invention, in the peeling step, the first main surface of the multilayer body including the substrate and the reinforcing plate is supported by a support means, and the second main surface of the multilayer body is supported. By controlling the movement of the plurality of movable bodies fixed to the flexible plate that holds and holds the surface at intervals with respect to the support means, the interface extends along the peeling progress direction from one end side to the other end side. In the direction in which the movable body positioned on the other end side in the peeling progress direction is separated from the support means from the movable body positioned on the one end side in the peeling progress direction. The movement start time of the movable body located on the outer edge of the second main surface is set to be predetermined more than the start time of the separation movement of the movable body located on the second main surface excluding the outer edge. It is preferable to delay the time.

本発明の剥離形態の一態様によれば、第2の主面の外縁に位置する可動体の離間移動開始時間を、外縁を除く第2の主面に位置する可動体の離間移動開始時間よりも制御手段によって所定時間遅らせると、積層体の外縁が外縁を除く面よりも遅れて剥離する。これにより、本発明の剥離形態の一態様によれば、境界線の端部の接線と、剥離領域の基板の外周の接線とのなす角度が90度よりも大きくなるので、基板にクラックが発生していた場合であっても基板を良好に剥離できる。   According to one aspect of the peeling mode of the present invention, the separation movement start time of the movable body located on the outer edge of the second main surface is set to be greater than the separation movement start time of the movable body located on the second principal surface excluding the outer edge. Also, if the control means delays for a predetermined time, the outer edge of the laminate is peeled off later than the surface excluding the outer edge. As a result, according to one aspect of the peeling mode of the present invention, the angle formed between the tangent line at the end of the boundary line and the tangent line at the outer periphery of the substrate in the peeling region is larger than 90 degrees, so that a crack is generated in the substrate. Even if it is a case, the board | substrate can be peeled favorable.

本発明の基板の剥離装置及び基板の剥離方法並びに電子デバイスの製造方法によれば、基板にクラックが発生していた場合であっても基板を良好に剥離できる。   According to the substrate peeling apparatus, the substrate peeling method, and the electronic device manufacturing method of the present invention, the substrate can be satisfactorily peeled even when cracks are generated in the substrate.

電子デバイスの製造工程に供される積層板の要部拡大側面図Enlarged side view of the main part of the laminate used in the manufacturing process of electronic devices 電子デバイスの製造工程の途中で作製される積層体の要部拡大側面図Enlarged side view of the main part of a laminate produced during the manufacturing process of an electronic device (a)は矩形状の積層板の平面図、(b)は本発明の基板の剥離方法による剥離前線の剥離進行方向を示した要部説明図(A) is a plan view of a rectangular laminated board, (b) is an explanatory diagram showing the main part of the peeling direction of the peeling front by the board peeling method of the present invention. 基板の短辺から対向する短辺に向けた剥離進行方向に沿って界面を順次剥離する剥離方法を示した説明図Explanatory drawing which showed the peeling method which peels an interface sequentially along the peeling advancing direction toward the short side which opposes from the short side of a substrate 円形の基板の場合における剥離方法を示した説明図Explanatory drawing showing the peeling method in the case of a circular substrate 本発明の剥離装置の基本構成を示した要部縦断面図The principal part longitudinal cross-sectional view which showed the basic composition of the peeling apparatus of this invention 可撓性板に対する複数の可動体の配置位置を示した可撓性板の平面図The top view of the flexible board which showed the arrangement position of a plurality of movable bodies to a flexible board (a)は可撓性板の平面図、(b)は(a)のS−S線に沿う縦断面図(A) is a top view of a flexible board, (b) is a longitudinal cross-sectional view which follows the SS line | wire of (a). 界面が順次剥離していく状態を示した剥離装置の要部縦断面図Principal section of the main part of the peeling device showing the state where the interface is peeled off sequentially (a)は剥離手段によって積層板を保持する前状態を示した要部縦断面図、(b)は剥離手段によって積層板を保持した状態を示した要部縦断面図、(c)は剥離手段によって界面が完全に剥離された状態を示した要部縦断面図(A) is a main part longitudinal sectional view showing a state before the laminated plate is held by the peeling means, (b) is a main part vertical sectional view showing a state where the laminated board is held by the peeling means, and (c) is peeled off. Longitudinal longitudinal sectional view showing a state where the interface is completely peeled off by means (a)は進行中の剥離前線を示した積層板の平面図、(b)は(a)のT−T線に沿う縦断面図(A) is a plan view of a laminate showing an ongoing peeling front, (b) is a longitudinal sectional view taken along line TT in (a). (a)は第1の吸着面の肉厚を代えて2段階構成とした剥離装置の要部縦断面図、(b)は第1の吸着面の背面側に二層の中間膜を配置して2段階構成とした剥離装置の要部縦断面図(A) is a vertical cross-sectional view of the main part of a peeling device having a two-stage configuration in which the thickness of the first suction surface is changed, and (b) is a two-layer intermediate film disposed on the back side of the first suction surface. A longitudinal section of the main part of a peeling device with a two-stage configuration (a)は剥離前線が進行している可撓性板の平面図、(b)は(a)のU−U線に沿う縦断面図(A) is a top view of the flexible board which the peeling front has advanced, (b) is a longitudinal cross-sectional view which follows the U-U line of (a). (a)は搬送装置によって積層板が可撓性板に載置された剥離装置の側面図、(b)は積層板の第1の主面がステージによって真空吸着保持された剥離装置の側面図、(c)は剥離装置によって本発明の剥離方法が実施されている剥離装置の側面図(A) is a side view of a peeling device in which a laminated plate is placed on a flexible plate by a transport device, and (b) is a side view of the peeling device in which a first main surface of the laminated plate is held by vacuum suction by a stage. (C) is a side view of a peeling apparatus in which the peeling method of the present invention is carried out by the peeling apparatus. (a)は、界面を完全に剥離させた剥離装置の側面図、(b)はステージから可撓性板に基板を受け渡した剥離装置の側面図、(c)は基板を搬出する直前状態の剥離装置の側面図(A) is a side view of the peeling device with the interface completely peeled off, (b) is a side view of the peeling device that delivers the substrate from the stage to the flexible plate, and (c) is a state immediately before carrying out the substrate. Side view of peeling device (a)は搬送装置によって積層体が可撓性板に載置された剥離装置の側面図、(b)は積層体の第1の主面を可撓性板によって真空吸着保持した剥離装置の側面図、(c)は剥離装置によって本発明の剥離方法が実施されている剥離装置の側面図(A) is a side view of the peeling device in which the laminate is placed on the flexible plate by the transport device, and (b) is a drawing of the peeling device in which the first main surface of the laminate is held by vacuum suction using the flexible plate. Side view, (c) is a side view of a peeling apparatus in which the peeling method of the present invention is carried out by the peeling apparatus. (a)は界面を完全に剥離させた剥離装置の側面図、(b)は積層体を上下の可撓性板によって真空吸着保持した剥離装置の側面図、(c)は、剥離装置によって本発明の剥離方法が実施されている剥離装置の側面図(A) is a side view of a peeling apparatus in which the interface is completely peeled, (b) is a side view of the peeling apparatus in which the laminated body is vacuum-adsorbed and held by upper and lower flexible plates, and (c) is a main view of the peeling apparatus. Side view of a peeling apparatus in which the peeling method of the invention is implemented (a)は界面を完全に剥離させた剥離装置の側面図、(b)は上側の可撓性板から下側の可撓性板に補強板を受け渡した剥離装置の側面図、(c)は補強板を搬出する直前状態の剥離装置の側面図(A) is a side view of the peeling device with the interface completely peeled off, (b) is a side view of the peeling device in which the reinforcing plate is transferred from the upper flexible plate to the lower flexible plate, (c). Is a side view of the peeling device just before unloading the reinforcing plate (a)は、特許文献1における基板の剥離形態を模式的に示した積層板の平面図、(b)は基板の剥離形態を示した剥離装置の側面図、(c)はクラックに起因する基板の割れのメカニズムを示した説明図(A) is the top view of the laminated board which showed typically the peeling form of the board | substrate in patent document 1, (b) is the side view of the peeling apparatus which showed the peeling form of the board | substrate, (c) originates in a crack. Explanatory drawing showing the mechanism of substrate cracking

以下、添付図面に従って、本発明の基板の剥離装置及び剥離方法並びに電子デバイスの製造方法の実施の形態について説明する。   Embodiments of a substrate peeling apparatus, a peeling method, and an electronic device manufacturing method according to the present invention will be described below with reference to the accompanying drawings.

図1は、電子デバイスの製造工程に供される積層板1の要部拡大側面図である。   FIG. 1 is an enlarged side view of a main part of a laminated plate 1 used in a manufacturing process of an electronic device.

〔電子デバイスの製造方法〕
実施の形態の電子デバイスの製造方法は、電子デバイスに用いられる基板2の薄板化に対応するため、基板2の裏面に補強板3を貼り付けた積層板1を構成し、積層板1の基板2の表面に機能層を形成する機能層形成工程と、機能層が形成された基板2と補強板3とを剥離する剥離工程とを有する。前記剥離工程において、実施の形態の基板の剥離装置が使用される。剥離装置については後述する。なお、補強板3は、電子デバイスの一部とはならならず、基板2から剥離された後、基板2の補強用として再利用される。
[Method of manufacturing electronic device]
The method for manufacturing an electronic device according to the embodiment includes a laminated plate 1 in which a reinforcing plate 3 is attached to the back surface of the substrate 2 in order to cope with the thinning of the substrate 2 used in the electronic device. 2 has a functional layer forming step for forming a functional layer on the surface, and a peeling step for peeling the substrate 2 and the reinforcing plate 3 on which the functional layer is formed. In the peeling step, the substrate peeling apparatus of the embodiment is used. The peeling apparatus will be described later. The reinforcing plate 3 does not become a part of the electronic device and is reused for reinforcing the substrate 2 after being peeled from the substrate 2.

前記電子デバイスとは表示パネル、太陽電池、薄膜二次電池等の電子部品をいう。また、前記表示パネルは液晶パネル(LCD)、プラズマパネル(PDP)、及び有機ELパネル(OLED)を含む。   The said electronic device means electronic components, such as a display panel, a solar cell, and a thin film secondary battery. The display panel includes a liquid crystal panel (LCD), a plasma panel (PDP), and an organic EL panel (OLED).

〔積層板1〕
図1の如く積層板1は、基板2と基板2を補強する補強板3とからなり、基板2の裏面に補強板3を貼り付けることによって構成される。
[Laminate 1]
As shown in FIG. 1, the laminated plate 1 includes a substrate 2 and a reinforcing plate 3 that reinforces the substrate 2, and is configured by attaching the reinforcing plate 3 to the back surface of the substrate 2.

〔基板2〕
基板2の表面には、電子デバイスの製造工程の途中で、所定の機能層(例えば、TFT、CF)が形成される。
[Substrate 2]
A predetermined functional layer (for example, TFT, CF) is formed on the surface of the substrate 2 during the manufacturing process of the electronic device.

基板2は、例えばガラス基板、セラミックス基板、樹脂基板、金属基板、又は半導体基板等であるが、ガラス基板は、耐薬品性、耐透湿性に優れ、且つ、線膨張係数が小さいので好ましい。線膨張係数が小さくなるほど、高温下で形成される機能層のパターンが冷却時にずれ難くなるからである。   The substrate 2 is, for example, a glass substrate, a ceramic substrate, a resin substrate, a metal substrate, or a semiconductor substrate, and the glass substrate is preferable because it has excellent chemical resistance and moisture permeability resistance and a small linear expansion coefficient. This is because as the linear expansion coefficient decreases, the pattern of the functional layer formed at a high temperature becomes difficult to shift during cooling.

ガラス基板のガラスとしては、特に限定されないが、例えば、無アルカリガラス、ホウケイ酸ガラス、ソーダライムガラス、高シリカガラス、その他の酸化ケイ素を主な成分とする酸化物系ガラス等を例示できる。酸化物系ガラスとしては、酸化物換算による酸化ケイ素の含有量が40〜90質量%のガラスが好ましい。   The glass of the glass substrate is not particularly limited, and examples thereof include non-alkali glass, borosilicate glass, soda lime glass, high silica glass, and other oxide-based glasses mainly composed of silicon oxide. As the oxide glass, a glass having a silicon oxide content of 40 to 90% by mass in terms of oxide is preferable.

また、ガラス基板のガラスとしては、電子デバイスの種類やその製造工程に適したガラスが採用されることが好ましい。例えば、液晶パネル用のガラス基板は、アルカリ金属成分を実質的に含まないガラス(無アルカリガラス)からなることが好ましい。このように、ガラス基板のガラスは、適用される電子デバイスの種類及びその製造工程に基づいて適宜選択される。   Moreover, as glass of a glass substrate, it is preferable that the glass suitable for the kind of electronic device and its manufacturing process is employ | adopted. For example, it is preferable that the glass substrate for liquid crystal panels consists of glass (an alkali free glass) which does not contain an alkali metal component substantially. As described above, the glass of the glass substrate is appropriately selected based on the type of electronic device to be applied and the manufacturing process thereof.

前記樹脂基板の樹脂は、結晶性樹脂であっても、非結晶性樹脂であってもよく、特に限定されない。   The resin of the resin substrate may be a crystalline resin or an amorphous resin, and is not particularly limited.

基板2の厚さは、基板2の種類に応じて設定される。例えば、ガラス基板の場合、電子デバイスの軽量化、薄板化のため、好ましくは0.7mm以下であり、より好ましくは0.2mm以下であり、さらに好ましくは0.1mm以下である。0.2mm以下の場合、ガラス基板に良好なフレキシブル性を与えることが可能であり、電子デバイスの薄型化に対応した好適な基板となる。0.1mm以下の場合、ガラス基板をロール状に巻き取ることが可能である。また、ガラス基板の厚さは、ガラス基板の製造が容易であること、ガラス基板の取り扱いが容易であること等の理由から、0.03mm以上であることが好ましい。   The thickness of the substrate 2 is set according to the type of the substrate 2. For example, in the case of a glass substrate, it is preferably 0.7 mm or less, more preferably 0.2 mm or less, and still more preferably 0.1 mm or less for reducing the weight and thickness of the electronic device. In the case of 0.2 mm or less, it is possible to give good flexibility to the glass substrate, and it becomes a suitable substrate corresponding to thinning of the electronic device. In the case of 0.1 mm or less, the glass substrate can be wound into a roll. Further, the thickness of the glass substrate is preferably 0.03 mm or more for reasons such as easy manufacture of the glass substrate and easy handling of the glass substrate.

〔補強板3〕
補強板3は、基板2に貼り付けられると、剥離操作が行われるまで、基板2を補強する機能を備える。補強板3は、機能層の形成後、電子デバイスの製造工程の途中で、実施の形態の基板の剥離装置によって基板2から剥離される。
[Reinforcement plate 3]
When the reinforcing plate 3 is attached to the substrate 2, the reinforcing plate 3 has a function of reinforcing the substrate 2 until a peeling operation is performed. After the functional layer is formed, the reinforcing plate 3 is peeled from the substrate 2 by the substrate peeling apparatus of the embodiment in the course of the manufacturing process of the electronic device.

補強板3は、温度変化による反りや剥離を抑制するため、基板2の線膨張係数に対してその差が小さいものが好ましい。基板2がガラス基板の場合、補強板3はガラス板を含むものが好ましい。このガラス板のガラスは、ガラス基板のガラスと同じ種類であることが好ましい。   The reinforcing plate 3 preferably has a small difference with respect to the linear expansion coefficient of the substrate 2 in order to suppress warping and peeling due to temperature changes. When the substrate 2 is a glass substrate, the reinforcing plate 3 preferably includes a glass plate. The glass of this glass plate is preferably the same type as the glass of the glass substrate.

補強板3は、ベースとなる支持板4と、支持板4の面に形成される樹脂層5とを備える。樹脂層5と基板2との間に作用するファンデルワールス力、又は樹脂層5の粘着力等によって、基板2が樹脂層5を介して支持板4に剥離可能に貼り付けられる。   The reinforcing plate 3 includes a support plate 4 serving as a base and a resin layer 5 formed on the surface of the support plate 4. The substrate 2 is detachably attached to the support plate 4 via the resin layer 5 by van der Waals force acting between the resin layer 5 and the substrate 2 or the adhesive force of the resin layer 5.

なお、図1の補強板3は、支持板4と樹脂層5とによって構成されているが、支持板4のみで構成されていてもよい。この場合には、支持板4と基板2との間に作用するファンデルワールス力等によって支持板4と基板2とが剥離可能に貼り付けられる。また、この場合には、ガラス板である支持板4と、ガラス基板である基板2とが高温で接着しないように、支持板4の貼り付け側面に無機薄膜を形成することが好ましい。   In addition, although the reinforcement board 3 of FIG. 1 is comprised by the support plate 4 and the resin layer 5, you may be comprised only by the support plate 4. FIG. In this case, the support plate 4 and the substrate 2 are detachably attached by van der Waals force or the like acting between the support plate 4 and the substrate 2. Moreover, in this case, it is preferable to form an inorganic thin film on the side surface to which the support plate 4 is attached so that the support plate 4 that is a glass plate and the substrate 2 that is a glass substrate are not bonded at high temperatures.

また、図1の支持板4は1枚であり、樹脂層5は1層であるが、支持板4を複数枚の支持板4で構成するとともに樹脂層5を複数の層で構成してもよい。   In addition, although the support plate 4 in FIG. 1 is one and the resin layer 5 is one layer, the support plate 4 may be composed of a plurality of support plates 4 and the resin layer 5 may be composed of a plurality of layers. Good.

〔支持板4〕
支持板4は、樹脂層5を介して基板2を支持することによって、基板2が補強板3によって補強される。この支持板4は、電子デバイスの製造工程における基板2の変形、傷付き、破損等を防止する機能も備える。
[Support plate 4]
The support plate 4 supports the substrate 2 via the resin layer 5, whereby the substrate 2 is reinforced by the reinforcing plate 3. The support plate 4 also has a function of preventing deformation, scratching, breakage, and the like of the substrate 2 in the electronic device manufacturing process.

支持板4として、例えば、ガラス板、セラミックス板、樹脂板、半導体板、又は金属板等を例示できる。支持板4の種類は、電子デバイスの種類、及び基板2の種類等に応じて適宜選定される。支持板4と基板2とが同種であると、温度変化による反り、剥離が低減されるので好ましい。   Examples of the support plate 4 include a glass plate, a ceramic plate, a resin plate, a semiconductor plate, and a metal plate. The type of the support plate 4 is appropriately selected according to the type of the electronic device, the type of the substrate 2, and the like. It is preferable that the support plate 4 and the substrate 2 are of the same type because warpage due to a temperature change and peeling are reduced.

支持板4と基板2の平均線膨張係数の差(絶対値)は、基板2の寸法形状等に応じて適宜設定されるが、例えば35×10−7/℃以下であることが好ましい。ここで、「平均線膨張係数」とは、50〜300℃の温度範囲における平均線膨張係数(JIS R 3102)をいう。 The difference (absolute value) in the average linear expansion coefficient between the support plate 4 and the substrate 2 is appropriately set according to the dimension shape and the like of the substrate 2, but is preferably 35 × 10 −7 / ° C. or less, for example. Here, the “average linear expansion coefficient” refers to an average linear expansion coefficient (JIS R 3102) in a temperature range of 50 to 300 ° C.

支持板4の厚さは、例えば0.7mm以下であることが好ましい。また、支持板4の厚さは、基板2を補強するため、0.4mm以上であることが好ましい。支持板4の厚さは、基板2よりも厚くてもよいし薄くてもよい。   The thickness of the support plate 4 is preferably 0.7 mm or less, for example. Further, the thickness of the support plate 4 is preferably 0.4 mm or more in order to reinforce the substrate 2. The support plate 4 may be thicker or thinner than the substrate 2.

支持板4の外形は、支持板4が樹脂層5の全体を支持できるように、図1に示すように樹脂層5の外形と同一であるか、樹脂層5の外形よりも大きいことが好ましい。   The outer shape of the support plate 4 is preferably the same as or larger than the outer shape of the resin layer 5 as shown in FIG. 1 so that the support plate 4 can support the entire resin layer 5. .

〔樹脂層5〕
樹脂層5は、基板2が密着された後、剥離操作が行われるまで、支持板4に対する基板2の位置ずれを防止する機能を備える。また、樹脂層5は、剥離操作によって基板2から容易に剥離する機能も備える。基板2が容易に剥離されることによって、剥離時における基板2の破損を防止できる。更に、樹脂層5は、支持板4との間の結合力が、基板2との結合力よりも相対的に高くなるように形成される。
[Resin layer 5]
The resin layer 5 has a function of preventing displacement of the substrate 2 with respect to the support plate 4 until a peeling operation is performed after the substrate 2 is brought into close contact. The resin layer 5 also has a function of easily peeling from the substrate 2 by a peeling operation. Since the substrate 2 is easily peeled off, the substrate 2 can be prevented from being damaged at the time of peeling. Further, the resin layer 5 is formed such that the bonding force with the support plate 4 is relatively higher than the bonding force with the substrate 2.

樹脂層5の樹脂は、特に限定されないが、アクリル樹脂、ポリオレフィン樹脂、ポリウレタン樹脂、ポリイミド樹脂、シリコーン樹脂、ポリイミドシリコーン樹脂等を例示できる。また、複数種類の樹脂を混合して用いることもできるが、耐熱性や剥離性の観点から、シリコーン樹脂、ポリイミドシリコーン樹脂が好ましい。   Although resin of the resin layer 5 is not specifically limited, Acrylic resin, polyolefin resin, polyurethane resin, polyimide resin, silicone resin, polyimide silicone resin, etc. can be illustrated. In addition, a plurality of types of resins can be mixed and used, but silicone resins and polyimide silicone resins are preferable from the viewpoints of heat resistance and releasability.

樹脂層5の厚さは、特に限定されないが、好ましくは1〜50μm、より好ましくは4〜20μmである。樹脂層5の厚さを1μm以上とすることで、樹脂層5と基板2との間に気泡や異物が混入した場合に、気泡や異物の厚さを吸収するように樹脂層5が変形するからである。一方、樹脂層5の厚さが50μm以下であると、樹脂層5の形成時間を短縮でき、さらに樹脂層5の樹脂を必要以上に使用しないため経済的であるからである。   Although the thickness of the resin layer 5 is not specifically limited, Preferably it is 1-50 micrometers, More preferably, it is 4-20 micrometers. By setting the thickness of the resin layer 5 to 1 μm or more, when bubbles or foreign matter are mixed between the resin layer 5 and the substrate 2, the resin layer 5 is deformed so as to absorb the thickness of the bubbles or foreign matter. Because. On the other hand, when the thickness of the resin layer 5 is 50 μm or less, the formation time of the resin layer 5 can be shortened, and the resin of the resin layer 5 is not used more than necessary, which is economical.

樹脂層5の外形は、樹脂層5が基板2の全体を密着できるように、図1に示すように基板2の外形と同一か、基板2の外形よりも大きいことが好ましい。   The outer shape of the resin layer 5 is preferably the same as or larger than the outer shape of the substrate 2 as shown in FIG. 1 so that the resin layer 5 can adhere the entire substrate 2.

なお、樹脂層5は2層以上からなっていてもよい。この場合「樹脂層の厚さ」は全ての樹脂層の合計の厚さを意味するものとする。また、樹脂層5が2層以上からなる場合は、各々の層を形成する樹脂の種類が異なってもよい。更に、積層板1の構成は、図1に示されるものに限られない。例えば、樹脂層5の替わりに、メタルシリサイド、窒化物および炭化物からなる群(WSi、AlN、TiN、SiおよびSiC等)から選択される少なくとも1種を含有する無機層を用いてもよい。また、樹脂層5を用いず、基板2と補強板3のそれぞれの接合面を鏡面研磨することで、これらの接合面の表面粗さを小さくし、基板2と補強板3とを接合してもよい。 In addition, the resin layer 5 may consist of two or more layers. In this case, “the thickness of the resin layer” means the total thickness of all the resin layers. Moreover, when the resin layer 5 consists of two or more layers, the kind of resin which forms each layer may differ. Furthermore, the structure of the laminated board 1 is not restricted to what is shown by FIG. For example, instead of the resin layer 5, an inorganic layer containing at least one selected from the group consisting of metal silicide, nitride and carbide (WSi 2 , AlN, TiN, Si 3 N 4 and SiC, etc.) is used. Also good. Further, the surface roughness of these joint surfaces is reduced by polishing the respective joint surfaces of the substrate 2 and the reinforcing plate 3 without using the resin layer 5, and the substrate 2 and the reinforcing plate 3 are joined. Also good.

図2は、電子デバイスの製造工程の途中で作製される積層体6の要部拡大側面図である。   FIG. 2 is an enlarged side view of a main part of the laminate 6 produced in the course of the electronic device manufacturing process.

〔積層体6〕
積層体6は、図1の積層板1の基板2の表面に機能層を形成した2枚の積層板1、1を、各々の機能層を対向させて結合させることによって構成される。機能層の種類は、電子デバイスの種類に応じて選択される。複数の機能層が基板2の表面に順次積層されてもよい。機能層の形成方法としては、一般的な方法が用いられ、例えばCVD法、PVD法等の蒸着法、及びスパッタ法等が用いられる。機能層は、フォトリソグラフィ法、及びエッチング法で所定のパターンに形成される。
[Laminate 6]
The laminated body 6 is configured by joining two laminated plates 1 and 1 in which functional layers are formed on the surface of the substrate 2 of the laminated plate 1 in FIG. 1 so that the respective functional layers are opposed to each other. The type of functional layer is selected according to the type of electronic device. A plurality of functional layers may be sequentially stacked on the surface of the substrate 2. As a method for forming the functional layer, a general method is used. For example, a vapor deposition method such as a CVD method or a PVD method, a sputtering method, or the like is used. The functional layer is formed in a predetermined pattern by a photolithography method and an etching method.

図2の積層体6は、上層から下層にかけて、補強板3A、基板2A、液晶層(機能層)7、基板2B、及び補強板3Bを備える。すなわち、中央の液晶層7を挟んで上層側に基板2Aと補強板3Aとからなる積層板1Aが備えられ、下層側に基板2Bと補強板3Bとからなる積層板1Aが備えられる。   2 includes a reinforcing plate 3A, a substrate 2A, a liquid crystal layer (functional layer) 7, a substrate 2B, and a reinforcing plate 3B from the upper layer to the lower layer. That is, a laminated plate 1A composed of the substrate 2A and the reinforcing plate 3A is provided on the upper layer side with the central liquid crystal layer 7 interposed therebetween, and a laminated plate 1A composed of the substrate 2B and the reinforcing plate 3B is provided on the lower layer side.

図2の積層体6は、LCDの製造工程の途中で作製されるものである。基板2Aの液晶層7側の面、すなわち基板2Aの表面には薄膜トランジスタ(TFT)が形成され、基板2Bの液晶層7側の面、すなわち基板2Bの表面にはカラーフィルタ(CF)が形成され、薄膜トランジスタとカラーフィルタとによって機能層である液晶層7が形成されている。   The laminated body 6 of FIG. 2 is produced in the middle of the LCD manufacturing process. A thin film transistor (TFT) is formed on the surface of the substrate 2A on the liquid crystal layer 7 side, that is, the surface of the substrate 2A, and a color filter (CF) is formed on the surface of the substrate 2B on the liquid crystal layer 7 side, that is, the surface of the substrate 2B. A liquid crystal layer 7 as a functional layer is formed by the thin film transistor and the color filter.

なお、図2の積層体6は、両側に補強板3A、3Bが配置された構成であるが、積層体としては、片側にのみ補強板が配置された構成でもよい。   In addition, although the laminated body 6 of FIG. 2 is the structure by which reinforcement board 3A, 3B is arrange | positioned at both sides, as a laminated body, the structure by which the reinforcement board was arrange | positioned only at one side may be sufficient.

積層体6は、剥離工程において補強板3A、3Bが剥離される。補強板3A、3Bが剥離された基板2A、2Bの裏面には、バックライト等の電子部品が取り付けられ、これによって、製品であるLCDが製造される。補強板3A、3Bの剥離には、後述の剥離装置が用いられる。   In the laminate 6, the reinforcing plates 3A and 3B are peeled off in the peeling step. Electronic components such as a backlight are attached to the back surfaces of the substrates 2A and 2B from which the reinforcing plates 3A and 3B have been peeled off, whereby an LCD as a product is manufactured. A peeling device described later is used for peeling the reinforcing plates 3A and 3B.

〔本発明の基板の剥離方法〕
まず、実施の形態の基板の剥離装置を説明する前に、本発明の基板の剥離方法について説明する。
[Substrate peeling method of the present invention]
First, before explaining the substrate peeling apparatus of the embodiment, the substrate peeling method of the present invention will be explained.

本発明の基板の剥離方法は、例えば図1に示した積層板1においては、基板2と補強板3との界面を、図3(a)に示された矩形状の積層板1の平面図で示すように、隅部(一端)8側から隅部(他端)9側に向けた矢印Dで示す剥離進行方向に沿って順次剥離する剥離方法を基本とする。   For example, in the laminate 1 shown in FIG. 1, the substrate peeling method of the present invention shows the interface between the substrate 2 and the reinforcing plate 3 in the plan view of the rectangular laminate 1 shown in FIG. As shown in FIG. 4, the peeling method is basically based on a peeling method in which peeling is performed sequentially along the peeling progress direction indicated by the arrow D from the corner (one end) 8 side to the corner (other end) 9 side.

次に、図3(a)で示した符号E、F、G、H、J、K、L、M、N、12について説明する。   Next, reference numerals E, F, G, H, J, K, L, M, N, and 12 shown in FIG.

符号Eは、界面を剥離した剥離領域10と未剥離領域11との剥離前線(境界線)である。   Reference symbol E denotes a peeling front (boundary line) between the peeling region 10 where the interface is peeled off and the non-peeling region 11.

符号F、Gは、剥離前線Eと基板2の外周との2つの交点である。   Reference numerals F and G are two intersections of the peeling front E and the outer periphery of the substrate 2.

符号Hは、交点F、Gを結んだ直線である。   A symbol H is a straight line connecting the intersections F and G.

符号J、Kは、剥離領域10の基板2の外周の接線である。   Reference numerals J and K are tangents on the outer periphery of the substrate 2 in the peeling region 10.

符号M、Nは、剥離前線Eの端部の接線である。   Reference numerals M and N are tangents at the end of the peeling front E.

符号12は、直線Hと接線J、Kとのなす角度が少なくとも90度以下の剥離範囲である。この剥離範囲は、二点鎖線Lと接線J、Kとで囲まれる平面視三角形の範囲である。   Reference numeral 12 denotes a peeling range in which an angle formed by the straight line H and the tangent lines J and K is at least 90 degrees or less. This peeling range is a range of a triangle in plan view surrounded by a two-dot chain line L and tangent lines J and K.

そして、本発明の基板の剥離方法は、剥離範囲12において、接線M、Nと接線J、Kとのなす角度θが90度よりも大きくなるように界面を剥離させることを特徴としている。   The substrate peeling method of the present invention is characterized in that, in the peeling range 12, the interface is peeled so that the angle θ formed between the tangent lines M and N and the tangent lines J and K is larger than 90 degrees.

図3(b)は、本発明の基板の剥離方法による剥離前線Eの剥離進行方向を示した要部説明図である。   FIG. 3B is an explanatory view of a main part showing the peeling progress direction of the peeling front E by the substrate peeling method of the present invention.

剥離範囲12において進行する剥離前線Eは、基板2の端部に発生しているクラック13を通過する際、クラック13を伸展させる方向に通過せず、矢印Pの如く基板2の内側から基板2の縁部に向いた方向に通過する。これにより、界面を剥離させる力がクラック13を伸展させる方向に作用しないため、クラック13は剥離前線Eの進行とともに伸展しない。よって、本発明の基板の剥離方法によれば、基板2にクラック13が発生していた場合であっても基板2を良好に剥離できる。   The peeling front E that progresses in the peeling range 12 does not pass in the direction in which the crack 13 extends when passing through the crack 13 generated at the end of the substrate 2, and from the inside of the substrate 2 as indicated by the arrow P, from the substrate 2. Pass in the direction facing the edge of the. Thereby, since the force which peels an interface does not act in the direction which extends the crack 13, the crack 13 does not extend with progress of the peeling front E. Therefore, according to the substrate peeling method of the present invention, it is possible to peel the substrate 2 satisfactorily even when the crack 13 is generated on the substrate 2.

なお、剥離範囲12を規定した理由は、剥離範囲12を超えた範囲において、図19(a)に示した従来の剥離方法であっても、角度θが90度よりも大きくなる場合があるからである。この場合には、従来の剥離方法であってもクラックは伸展しない。つまり、本発明の基板の剥離方法は、剥離範囲12に存在するクラック13による基板2の割れを防止するものである。   The reason for defining the peeling range 12 is that the angle θ may be larger than 90 degrees in the range exceeding the peeling range 12 even in the conventional peeling method shown in FIG. It is. In this case, cracks do not extend even with the conventional peeling method. That is, the substrate peeling method of the present invention prevents the substrate 2 from cracking due to the cracks 13 existing in the peeling range 12.

また、図3(a)の剥離方法は、隅部8側から隅部9側に向けた矢印Dで示す剥離進行方向に沿って界面を順次剥離する剥離方法である。これに対して、図4の他の剥離方法は、基板2の短辺2Cから短辺2Dに向けた矢印Qで示す剥離進行方向に沿って剥離前線Eを進行させて界面を順次剥離する剥離方法である。図4の剥離方法の場合は、基板2の全面が剥離範囲12となる。   Moreover, the peeling method of Fig.3 (a) is a peeling method which peels an interface sequentially along the peeling advancing direction shown by the arrow D toward the corner part 9 side from the corner part 8 side. On the other hand, another peeling method in FIG. 4 is a peeling in which the interface is sequentially peeled by advancing the peeling front E along the peeling progress direction indicated by the arrow Q from the short side 2C to the short side 2D of the substrate 2. Is the method. In the case of the peeling method of FIG. 4, the entire surface of the substrate 2 is the peeling range 12.

更に、図5に示す円形の基板1Cの場合も同様の剥離方法によって界面を剥離する。すなわち、界面を剥離した剥離領域10と未剥離領域11との境界線である剥離前線Eと基板2の外周との2つの交点F、Gを結んだ直線Hと、剥離領域10の基板2の外周の接線J、Kと、のなす角度が少なくとも90度以下の剥離範囲(二点鎖線Lと接線J、Kとで囲まれる、平面視半円形の範囲)12において、剥離前線Eの端部の接線M、Nと接線J、Kとのなす角度θが90度よりも大きくなるように界面を剥離させる。この場合も、同様の効果が得られる。以上が、本発明の基板の剥離方法であり、従来の問題を解決できる。   Further, in the case of the circular substrate 1C shown in FIG. 5, the interface is peeled by the same peeling method. That is, a straight line H connecting two intersections F and G between the peeling front E which is a boundary line between the peeling area 10 where the interface is peeled and the non-peeling area 11 and the outer periphery of the substrate 2, and the substrate 2 in the peeling area 10 In the peeling range (a semi-circular range in plan view surrounded by the two-dot chain line L and the tangents J and K) 12 where the angle formed by the outer tangents J and K is at least 90 degrees or less, the end of the peeling front E The interface is peeled off so that the angle θ between the tangent lines M and N and the tangent lines J and K is greater than 90 degrees. In this case, the same effect can be obtained. The above is the substrate peeling method of the present invention, which can solve the conventional problems.

次に、本発明の基板の剥離装置を説明する。   Next, the substrate peeling apparatus of the present invention will be described.

〔本発明の基板の剥離装置〕
図6は、剥離装置20の基本構成を示した要部縦断面図である。図7は、後述する可撓性板22に対する複数の可動体24、24…の配置位置を模式的に示した可撓性板22の平面図である。また、図6は、図7のR−R線に沿う断面図に相当する。
[Substrate peeling apparatus of the present invention]
FIG. 6 is a longitudinal sectional view of a main part showing the basic configuration of the peeling apparatus 20. FIG. 7 is a plan view of the flexible plate 22 schematically showing the arrangement positions of the plurality of movable bodies 24, 24... Relative to the flexible plate 22 described later. 6 corresponds to a cross-sectional view taken along line RR in FIG.

図6の如く剥離装置20は、基板2と補強板3との界面を隅部8側から隅部9側に向けて順次剥離する。剥離時には、図7の如く前記界面を剥離した剥離領域10と未剥離領域11との境界線である剥離前線Eが矢印D方向に進行する。   As shown in FIG. 6, the peeling device 20 peels the interface between the substrate 2 and the reinforcing plate 3 sequentially from the corner 8 side toward the corner 9 side. At the time of peeling, a peeling front E that is a boundary line between the peeling area 10 and the non-peeling area 11 where the interface is peeled as shown in FIG.

また、剥離装置20は、基板2を変形不能に支持して補強板3を撓み変形させることにより、前記界面を剥離する装置であるが、補強板3を変形不能に支持して基板2を撓み変形させて前記界面を剥離する装置であってもよい。   The peeling device 20 is a device that peels the interface by supporting the substrate 2 so that it cannot be deformed and flexing and deforming the reinforcing plate 3. However, the peeling device 20 flexes the substrate 2 while supporting the reinforcing plate 3 so that it cannot be deformed. It may be an apparatus that deforms and peels off the interface.

剥離装置20は、支持手段である平板状のステージ26、可撓性板22、複数の可動体24、24…、可動体24毎に可動体24を昇降移動させる複数の駆動装置28、及び駆動装置28毎に駆動装置28を制御する制御装置(制御手段)30等によって構成される。   The peeling apparatus 20 includes a flat plate stage 26 as a support means, a flexible plate 22, a plurality of movable bodies 24, 24..., A plurality of drive devices 28 that move the movable body 24 up and down for each movable body 24, and a drive. Each device 28 includes a control device (control means) 30 that controls the drive device 28.

ステージ26は、基板2を支持するため、積層板1の第1の主面(基板2の表面)1aを真空吸着保持する。なお、真空吸着に代えて、静電吸着又は磁気吸着してもよい。また、ステージ26は、剥離時に基板2を変形不能に支持するため、剛性の高い金属製である。   The stage 26 holds the first main surface (surface of the substrate 2) 1a of the laminated plate 1 by vacuum suction in order to support the substrate 2. Instead of vacuum suction, electrostatic suction or magnetic suction may be used. The stage 26 is made of a highly rigid metal in order to support the substrate 2 so as not to be deformed at the time of peeling.

可撓性板22は、補強板3を撓み変形させるため、積層板1の第2の主面1bを真空吸着保持する。なお、真空吸着に代えて、静電吸着又は磁気吸着してもよい。   The flexible plate 22 holds the second main surface 1b of the laminated plate 1 by vacuum suction so as to bend and deform the reinforcing plate 3. Instead of vacuum suction, electrostatic suction or magnetic suction may be used.

図8(a)は、可撓性板22の平面図であり、図8(b)は、図8(a)のS−S線に沿う可撓性板22の縦断面図である。   FIG. 8A is a plan view of the flexible plate 22, and FIG. 8B is a longitudinal sectional view of the flexible plate 22 taken along the line S-S in FIG. 8A.

可撓性板22は、積層板1の第2の主面1bを吸着保持する布状の吸着シート32、吸着シート32が被覆される弾性シート34、及び弾性シート34を支持する本体板36から構成される。弾性シート34の表面には貫通した枠状の溝38が備えられ、この溝38よりも内側に吸着シート32が被覆されている。また、本体板36には、複数の貫通孔40、40…が開口されており、これらの貫通孔40、40…の一端は溝38に連通され、他端は、不図示の吸引管路を介して吸気源(例えば真空ポンプ)に接続されている。   The flexible plate 22 includes a cloth-like suction sheet 32 that sucks and holds the second main surface 1b of the laminated plate 1, an elastic sheet 34 that is covered with the suction sheet 32, and a main body plate 36 that supports the elastic sheet 34. Composed. A frame-like groove 38 is provided on the surface of the elastic sheet 34, and the suction sheet 32 is covered inside the groove 38. Further, a plurality of through holes 40, 40... Are opened in the main body plate 36. One end of these through holes 40, 40... Is communicated with the groove 38, and the other end is connected to a suction pipe (not shown). To an intake source (for example, a vacuum pump).

したがって、前記吸気源が駆動されると、前記吸引管路、貫通孔40、及び溝38の空気が吸引されることにより、積層板1の第2の主面1bが吸着シート32に真空吸着保持される。この場合、吸着シート32が積層板1の第2の主面1bを全体的に支持できるように、吸着シート32の外形は積層板1の第2の主面1bの外形よりも大きく設定されている。また、弾性シート34の材料としては、特に限定されないがゴムが好ましい。ゴムとしては、シリコーンゴムが好ましい。   Accordingly, when the intake source is driven, the air in the suction pipe, the through hole 40, and the groove 38 is sucked, whereby the second main surface 1b of the laminated plate 1 is vacuum-sucked and held on the suction sheet 32. Is done. In this case, the outer shape of the suction sheet 32 is set larger than the outer shape of the second main surface 1b of the laminated plate 1 so that the adsorption sheet 32 can support the second main surface 1b of the laminated plate 1 as a whole. Yes. The material of the elastic sheet 34 is not particularly limited, but rubber is preferable. As the rubber, silicone rubber is preferable.

本体板36は弾性シート34と同じ大きさである。また、本体板36は、弾性シート34よりも曲げ剛性が高く、本体板36の曲げ剛性が可撓性板22の曲げ剛性を支配する。可撓性板22の単位幅(1mm)あたりの曲げ剛性は、1000〜40000N・mm/mmであることが好ましい。例えば、可撓性板22の幅が100mmの部分では、曲げ剛性は、100000〜4000000N・mmとなる。可撓性板22の曲げ剛性を1000N・mm以上とすることで、可撓性板22が吸着保持する板(本実施形態では補強板3)の折れ曲がりを防止することができる。また、可撓性板22の曲げ剛性を4000N・mm以下とすることで、可撓性板22が吸着保持する板を適度に撓み変形させることができる。 The main body plate 36 is the same size as the elastic sheet 34. The main body plate 36 has higher bending rigidity than the elastic sheet 34, and the bending rigidity of the main body plate 36 dominates the bending rigidity of the flexible plate 22. The flexural rigidity per unit width (1 mm) of the flexible plate 22 is preferably 1000 to 40000 N · mm 2 / mm. For example, in a portion where the width of the flexible plate 22 is 100 mm, the bending rigidity is 100000 to 4000000 N · mm 2 . By setting the bending rigidity of the flexible plate 22 to 1000 N · mm 2 or more, it is possible to prevent the plate (the reinforcing plate 3 in this embodiment) that the flexible plate 22 absorbs and holds. In addition, by setting the bending rigidity of the flexible plate 22 to 4000 N · mm 2 or less, the plate that the flexible plate 22 holds by suction can be appropriately bent and deformed.

本体板36としては、例えばポリ塩化ビニル(PVC)樹脂、ポリカーボネート樹脂、アクリル樹脂、ポリアセタール(POM)樹脂等の樹脂板の他、金属板が用いられる。   As the main body plate 36, for example, a resin plate such as polyvinyl chloride (PVC) resin, polycarbonate resin, acrylic resin, polyacetal (POM) resin, or a metal plate is used.

なお、ステージ26による積層板1の第1の主面1aの支持方法及び構造も、可撓性板22による真空吸着保持方法及びその構造と略同一である。   The method and structure for supporting the first main surface 1a of the laminated plate 1 by the stage 26 are also substantially the same as the vacuum suction holding method and the structure by the flexible plate 22.

図6に示すように本体板36の下面には、図7に示した円盤状の可動体24、24…が碁盤目状に固定される。これらの可動体24、24…は、本体板36にボルト等の締結部材によって固定されるが、ボルトに代えて接着固定されてもよい。これらの可動体24、24…は、制御装置30によって駆動制御された駆動装置28、28…によって、ステージ26に対し、独立して昇降移動される。   As shown in FIG. 6, the disk-like movable bodies 24, 24... Shown in FIG. These movable bodies 24, 24... Are fixed to the main body plate 36 by fastening members such as bolts, but may be bonded and fixed instead of the bolts. These movable bodies 24, 24... Are moved up and down independently with respect to the stage 26 by drive devices 28, 28.

すなわち、制御装置30は、図7において隅部8側に位置する可動体24、24…から矢印Dで示す剥離進行方向の隅部9側に位置する可動体24、24…を、ステージ26に対して離間させる方向に順次下降移動させる。この動作によって、図9の縦断面図の如く基板2と補強板3との界面が隅部8側から隅部9側に向けて順次剥離していく。   That is, the control device 30 moves the movable bodies 24, 24... Located on the corner 9 side in the peeling progress direction indicated by the arrow D from the movable bodies 24, 24. On the other hand, it is sequentially moved downward in the direction of separation. With this operation, the interface between the substrate 2 and the reinforcing plate 3 is sequentially peeled from the corner 8 side toward the corner 9 as shown in the longitudinal sectional view of FIG.

駆動装置28は、例えば回転式のサーボモータ及びボールねじ機構等で構成される。サーボモータの回転運動は、ボールねじ機構において直線運動に変換され、ボールねじ機構のロッド42に伝達される。ロッド42の先端部には、ボールジョイント44を介して可動体24が設けられている。これにより、ステージ26から離間した可動体24を、図9の如く可撓性板22の撓み変形に追従して傾動させることができる。よって、可撓性板22に無理な力を加えることなく、可撓性板22を撓み変形させることができる。なお、駆動装置28としては、回転式のサーボモータ及びボールねじ機構に限定されず、リニア式のサーボモータ、又は流体圧シリンダ(例えば空気圧シリンダ)であってもよい。   The drive device 28 is composed of, for example, a rotary servo motor and a ball screw mechanism. The rotational motion of the servo motor is converted into linear motion in the ball screw mechanism and transmitted to the rod 42 of the ball screw mechanism. A movable body 24 is provided at the tip of the rod 42 via a ball joint 44. Thereby, the movable body 24 separated from the stage 26 can be tilted following the bending deformation of the flexible plate 22 as shown in FIG. Therefore, the flexible plate 22 can be bent and deformed without applying an excessive force to the flexible plate 22. The drive device 28 is not limited to a rotary servo motor and a ball screw mechanism, and may be a linear servo motor or a fluid pressure cylinder (for example, a pneumatic cylinder).

複数の駆動装置28、28…は、ステージ26に対して昇降可能なフレーム46にクッション部材48を介して取り付けられることが好ましい。クッション部材48は、可撓性板22の撓み変形に追従するように弾性変形する。これによって、ロッド42がステージ26に対して傾動する。   The plurality of driving devices 28 are preferably attached to a frame 46 that can be moved up and down with respect to the stage 26 via a cushion member 48. The cushion member 48 is elastically deformed so as to follow the bending deformation of the flexible plate 22. As a result, the rod 42 tilts with respect to the stage 26.

フレーム46は、剥離した補強板3を可撓性板22から取り外す際に、不図示の駆動部によって下降移動される。これにより、ステージ26と可撓性板22との間に、補強板3を取り出すための十分な作業空間が得られる。また、ステージ26も同様に駆動部50、50…によって昇降移動され、可撓性板22に対して進退移動する。   The frame 46 is moved downward by a drive unit (not shown) when the peeled reinforcing plate 3 is removed from the flexible plate 22. Thereby, a sufficient working space for taking out the reinforcing plate 3 is obtained between the stage 26 and the flexible plate 22. Similarly, the stage 26 is also moved up and down by the drive units 50, 50... And moved forward and backward with respect to the flexible plate 22.

制御装置30は、CPU、ROMやRAM等の記録媒体等を含むコンピュータとして構成される。制御装置30は、記録媒体に記録されたプログラムをCPUに実行させることにより、複数の駆動装置28を駆動装置28毎に制御して、複数の可動体24、24…の昇降移動を制御する。   The control device 30 is configured as a computer including a CPU, a recording medium such as a ROM and a RAM, and the like. The control device 30 controls the plurality of drive devices 28 for each drive device 28 by causing the CPU to execute the program recorded on the recording medium, thereby controlling the vertical movement of the plurality of movable bodies 24, 24.

次に、図3(a)で示した剥離前線Eを得るための第1の剥離装置の構成について説明する。   Next, the structure of the 1st peeling apparatus for obtaining the peeling front E shown in Fig.3 (a) is demonstrated.

〔第1の剥離装置の構成〕
図10(a)は、ステージ26と可撓性板22とからなる剥離手段によって積層板1を保持する前の状態を示した要部縦断面図、図10(b)は、前記剥離手段によって積層板1を保持した状態の要部縦断面図、図10(c)は、前記剥離手段によって界面が完全に剥離された基板2と補強板3とを示した要部縦断面図である。
[Configuration of first peeling apparatus]
FIG. 10A is a longitudinal sectional view of the main part showing a state before the laminated plate 1 is held by the peeling means composed of the stage 26 and the flexible plate 22, and FIG. FIG. 10C is a main part longitudinal sectional view showing the substrate 2 and the reinforcing plate 3 whose interface is completely peeled off by the peeling means.

また、図11(a)は、進行中の剥離前線Eが示された積層板1の平面図であり、図11(b)は、図11(a)のT−T線に沿う縦断面図である。   Moreover, Fig.11 (a) is a top view of the laminated board 1 in which the peeling front E in progress was shown, FIG.11 (b) is a longitudinal cross-sectional view which follows the TT line | wire of Fig.11 (a). It is.

図10(a)〜(c)に示すように、可撓性板22の弾性シート34には、積層板1の第2の主面1bの枠状の外縁1cを吸着保持する第1の吸着面22A、及び外縁1cを除く矩形状の第2の主面1bを吸着保持する第2の吸着面22Bが備えられている。第2の吸着面22Bは、第2の主面1bに対して平行な面であり、第1の吸着面22Aは、第2の吸着面22Bに対して所定量突出した突出面である。   As shown in FIGS. 10A to 10C, the elastic sheet 34 of the flexible plate 22 has a first suction that holds the frame-shaped outer edge 1c of the second main surface 1b of the laminated plate 1 by suction. A second suction surface 22B that sucks and holds the second main surface 1b having a rectangular shape excluding the surface 22A and the outer edge 1c is provided. The second suction surface 22B is a surface parallel to the second main surface 1b, and the first suction surface 22A is a protruding surface that protrudes a predetermined amount from the second suction surface 22B.

また、ステージ26を構成する弾性シート52にも同様の第1の吸着面52A、及び第2の吸着面52Bが備えられている。すなわち、弾性シート34には、積層板1の第1の主面1aの枠状の外縁1dを吸着保持する第1の吸着面52A、及び外縁1dを除く矩形状の第1の主面1aを吸着保持する第2の吸着面52Bが備えられている。第2の吸着面52Bは、第1の主面1aに対して平行な面であり、第1の吸着面52Aは、第2の吸着面52Bに対して所定量突出した突出面である。   The elastic sheet 52 constituting the stage 26 is also provided with the same first suction surface 52A and second suction surface 52B. That is, the elastic sheet 34 includes a first suction surface 52A that sucks and holds the frame-shaped outer edge 1d of the first main surface 1a of the laminated plate 1, and a rectangular first main surface 1a excluding the outer edge 1d. A second suction surface 52B is provided for sucking and holding. The second suction surface 52B is a surface parallel to the first main surface 1a, and the first suction surface 52A is a protruding surface that protrudes from the second suction surface 52B by a predetermined amount.

一例として、第1の吸着面22A、52Aの突出量tは約0.5mmであり、第1の吸着面22A、52Aの幅wは2〜10mmである。なお、第1の吸着面22A、52Aは、ステージ26及び可撓性板22のうち少なくとも一方に備えられていればよい。この場合、前記突出量tは約1.0mmとなる。   As an example, the protrusion amount t of the first suction surfaces 22A and 52A is about 0.5 mm, and the width w of the first suction surfaces 22A and 52A is 2 to 10 mm. The first suction surfaces 22 </ b> A and 52 </ b> A may be provided on at least one of the stage 26 and the flexible plate 22. In this case, the protrusion amount t is about 1.0 mm.

上記の如く構成された第1の剥離装置によれば、図7の如く、矢印Dで示した剥離進行方向の隅部8側に位置する可動体24から剥離進行方向の隅部9側に位置する可動体24を、図9の如く、ステージ26に対して離間させる方向に制御装置30によって順次下降移動させると、図11(b)の如く、積層板1の外縁1c、1dが外縁1c、1dを除く面よりも遅れて剥離する。   According to the first peeling apparatus configured as described above, as shown in FIG. 7, the movable body 24 positioned on the corner 8 side in the peeling progress direction indicated by the arrow D is positioned on the corner 9 side in the peeling progress direction. When the movable body 24 to be moved is sequentially moved downward by the control device 30 in a direction away from the stage 26 as shown in FIG. 9, the outer edges 1c and 1d of the laminated plate 1 become the outer edge 1c, as shown in FIG. It peels later than the surface except 1d.

これにより、第1の剥離装置によれば、図3(a)の如く、剥離前線Eの端部の接線M、Nと、剥離領域10の外周の接線J、Kとのなす角度θが90度よりも大きくなるので、図3(b)に示したクラック13が基板2に発生していた場合であっても基板2を良好に剥離できる。   Thus, according to the first peeling apparatus, as shown in FIG. 3A, the angle θ formed by the tangent lines M and N at the end of the peeling front E and the tangent lines J and K at the outer periphery of the peeling region 10 is 90. Therefore, even when the crack 13 shown in FIG. 3B has occurred in the substrate 2, the substrate 2 can be peeled off satisfactorily.

図12(a)は、第1の吸着面22A、52Aの肉厚を代えて2段階構成とした別形態の剥離装置が示されている。図12(b)は、第1の吸着面22A、52Aの背面側に長さの異なる二層の中間膜54、56を重ねて配置して、第1の吸着面22A、52Aを2段階構成とした別形態の剥離装置が示されている。これらの別形態の剥離装置であっても同様の効果を得ることができる。また、第1の吸着面22A、52Aを傾斜面としても同様である。   FIG. 12A shows another type of peeling apparatus in which the thickness of the first suction surfaces 22A and 52A is changed to have a two-stage configuration. FIG. 12B shows a two-stage configuration of the first suction surfaces 22A and 52A, in which two layers of intermediate films 54 and 56 having different lengths are stacked on the back side of the first suction surfaces 22A and 52A. Another type of peeling apparatus is shown. Similar effects can be obtained even with these different types of peeling devices. The same applies when the first suction surfaces 22A and 52A are inclined surfaces.

以上述べた第1の剥離装置は、弾性シート34、52に第1の吸着面22A、52Aを備えたことを特徴としたものである。   The first peeling apparatus described above is characterized in that the elastic sheets 34 and 52 are provided with the first suction surfaces 22A and 52A.

次に、第2の剥離装置について説明する。   Next, the second peeling apparatus will be described.

〔第2の剥離装置の構成〕
前記第1の剥離装置の構成に対する、第2の剥離装置の構成の相違点は、可撓性板22の弾性シート34の吸着面、ステージ26の弾性シート52の吸着面が段差無くフラットである点、及び第2の主面1bの外縁1cに位置する可動体24の離間移動開始時間を、外縁1cを除く第2の主面1bに位置する可動体24の離間移動開始時間よりも所定時間遅らせる点である。
[Configuration of second peeling apparatus]
The difference between the configuration of the second peeling device and the configuration of the first peeling device is that the suction surface of the elastic sheet 34 of the flexible plate 22 and the suction surface of the elastic sheet 52 of the stage 26 are flat without a step. The separation movement start time of the movable body 24 located on the point and the outer edge 1c of the second main surface 1b is set to a predetermined time than the separation movement start time of the movable body 24 located on the second main surface 1b excluding the outer edge 1c. It is a point to delay.

図13(a)、(b)は、第2の剥離装置による剥離形態が模式的に示されている。   FIGS. 13A and 13B schematically show the form of peeling by the second peeling apparatus.

図13(a)は、剥離前線Eが隅部8側から隅部9側に向けて進行している可撓性板22の平面図、図13(b)は、図13(a)のU−U線に沿う縦断面図である。   FIG. 13A is a plan view of the flexible plate 22 in which the peeling front E advances from the corner 8 side toward the corner 9 side, and FIG. 13B shows the U of FIG. 13A. It is a longitudinal cross-sectional view which follows the -U line.

次に、第2の剥離装置による基板の剥離方法について、図10(a)と図13(a)、(b)とを参照して説明する。   Next, a substrate peeling method using the second peeling apparatus will be described with reference to FIGS. 10 (a), 13 (a), and 13 (b).

第2の剥離装置による基板の剥離方法は、第2の主面1bの外縁1cに位置する可動体24の離間移動開始時間を、外縁1cを除く第2の主面1bに位置する可動体24の離間移動開始時間よりも制御装置30によって所定時間遅らせる。これにより、図13(b)の如く、補強板3の外縁が外縁を除く面よりも遅れて剥離する。このような制御装置30による制御を、剥離前線E(図3(a)参照)の剥離進行方向である矢印Dに対して略直交する方向に配列された複数の可動体24、24…について実施する。   The substrate peeling method by the second peeling apparatus is such that the movable body 24 located on the second main surface 1b excluding the outer edge 1c is set to the separation start time of the movable body 24 located on the outer edge 1c of the second main surface 1b. The controller 30 delays the separated movement start time by a predetermined time. Thereby, as shown in FIG. 13B, the outer edge of the reinforcing plate 3 is peeled off later than the surface excluding the outer edge. Such control by the control device 30 is performed for a plurality of movable bodies 24, 24,... Arranged in a direction substantially perpendicular to the arrow D that is the peeling progress direction of the peeling front E (see FIG. 3A). To do.

これにより、第2の剥離装置による基板の剥離方法によれば、図3(a)の如く、剥離前線Eの端部の接線M、Nと、剥離領域10の基板2の外周の接線J、Kとのなす角度θが90度よりも大きくなるので、基板2にクラック13(図3(b)参照)が発生していた場合であっても基板2を良好に剥離できる。   Thereby, according to the substrate peeling method by the second peeling apparatus, as shown in FIG. 3A, the tangent lines M and N at the end of the peeling front E and the tangent line J at the outer periphery of the substrate 2 in the peeling region 10 Since the angle θ formed with K is greater than 90 degrees, the substrate 2 can be satisfactorily peeled even when the crack 13 (see FIG. 3B) has occurred in the substrate 2.

〔剥離装置に対する積層板の搬入工程、剥離工程、搬出工程〕
図14(a)〜(c)〜図15(a)〜(c)は、積層板1を剥離装置20に搬入する搬入工程、積層板1の剥離工程、及び剥離した基板2と補強板3を剥離装置20から搬出する搬出工程を時系列的に示した説明図である。また、剥離装置20への積層板1の搬入作業、及び剥離した補強板3及び基板2の搬出作業は、図14(a)に示す複数の吸着パッド58、58…を備えた搬送装置60によって行われる。
[Lamination board loading process, peeling process, unloading process]
14 (a) to 14 (c) to 15 (a) to 15 (c) show a carrying-in process for carrying the laminated board 1 into the peeling device 20, a peeling process for the laminated board 1, and the peeled board 2 and the reinforcing board 3; It is explanatory drawing which showed the carrying-out process which carries out from the peeling apparatus 20 in time series. Moreover, the carrying-in operation | work of carrying in the laminated board 1 to the peeling apparatus 20 and carrying out the peeled reinforcement board 3 and the board | substrate 2 are carried out by the conveying apparatus 60 provided with several suction pad 58, 58 ... shown to Fig.14 (a). Done.

図14(a)は、搬送装置60によって積層板1が可撓性板22に載置された剥離装置20の側面図である。この場合、可撓性板22とステージ26との間に搬送装置60が挿入されるように、可撓性板22とステージ26とが相対的に十分に退避した位置に予め移動されている。そして、積層板1が可撓性板22に載置されると、可撓性板22によって積層板1の補強板3が真空吸着保持される。つまり、積層板1の第2の主面1bが可撓性板22に真空吸着保持される。   FIG. 14A is a side view of the peeling device 20 in which the laminated plate 1 is placed on the flexible plate 22 by the transport device 60. In this case, the flexible plate 22 and the stage 26 are moved in advance to a relatively sufficiently retracted position so that the transport device 60 is inserted between the flexible plate 22 and the stage 26. When the laminated plate 1 is placed on the flexible plate 22, the reinforcing plate 3 of the laminated plate 1 is held by vacuum suction by the flexible plate 22. That is, the second main surface 1 b of the laminated plate 1 is vacuum-sucked and held on the flexible plate 22.

図14(b)は、可撓性板22とステージ26とが相対的に近づく方向に移動されて、積層板1の第1の主面1aがステージ26によって真空吸着保持された状態の剥離装置20の側面図である。   FIG. 14B shows a peeling device in a state where the flexible plate 22 and the stage 26 are moved in a direction in which the flexible plate 22 and the stage 26 are relatively approached and the first main surface 1a of the laminated plate 1 is vacuum-sucked and held by the stage 26. FIG.

図14(c)は、剥離装置20によって、本発明の剥離方法が実施されている状態の剥離装置20の側面図である。同図によれば、可撓性板22が撓み変形されながら、積層板1の界面が剥離前線Eに沿って剥離されている。   FIG. 14C is a side view of the peeling device 20 in a state where the peeling method of the present invention is being carried out by the peeling device 20. According to the figure, the interface of the laminated plate 1 is peeled along the peeling front E while the flexible plate 22 is bent and deformed.

図15(a)は、界面が完全に剥離された状態の剥離装置20の側面図である。同図によれば、剥離した基板2がステージ26に真空吸着保持され、剥離した補強板3が可撓性板22に真空吸着保持されている。また、可撓性板22とステージ26との間に、図14(a)で示した搬送装置60が挿入されるように、可撓性板22とステージ26とが相対的に十分に退避した位置に予め移動されている。   FIG. 15A is a side view of the peeling apparatus 20 with the interface completely peeled off. According to the figure, the peeled substrate 2 is held by vacuum suction on the stage 26, and the peeled reinforcing plate 3 is held by vacuum suction on the flexible plate 22. Further, the flexible plate 22 and the stage 26 are relatively sufficiently retracted so that the transfer device 60 shown in FIG. 14A is inserted between the flexible plate 22 and the stage 26. It has been moved to the position in advance.

この後、まず、可撓性板22の真空吸着が解除される。次に、搬送装置60の吸着パッド58、58…によって補強板3が吸着保持される。次いで、搬送装置60によって、補強板3が剥離装置20から搬出される。   Thereafter, the vacuum suction of the flexible plate 22 is first released. Next, the reinforcing plate 3 is sucked and held by the suction pads 58 of the transfer device 60. Next, the reinforcing plate 3 is unloaded from the peeling device 20 by the transport device 60.

図15(b)は、ステージ26から可撓性板22に基板2が受け渡された状態の剥離装置20の側面図である。すなわち、ステージ26が可撓性板22に向けて下降移動され、基板2が可撓性板22に載置されたタイミンングでステージ26の吸着保持が解除され、その後、ステージ26が可撓性板22から十分に離間した位置に退避移動される。   FIG. 15B is a side view of the peeling apparatus 20 in a state where the substrate 2 is transferred from the stage 26 to the flexible plate 22. That is, the stage 26 is moved downward toward the flexible plate 22, and the suction holding of the stage 26 is released by the timing when the substrate 2 is placed on the flexible plate 22, and then the stage 26 is moved to the flexible plate 22. It is retracted to a position sufficiently separated from 22.

図15(c)は、基板2が搬出される直前状態の剥離装置20の側面図である。この後、図14(a)で示した搬送装置60によって基板2が吸着保持されて、剥離装置20から基板2が搬出される。   FIG. 15C is a side view of the peeling apparatus 20 in a state immediately before the substrate 2 is unloaded. Thereafter, the substrate 2 is sucked and held by the transfer device 60 shown in FIG. 14A, and the substrate 2 is unloaded from the peeling device 20.

以上が、剥離装置20に対する積層板1の搬入工程、剥離工程、搬出工程である。   The above are the carrying-in process of the laminated board 1 with respect to the peeling apparatus 20, a peeling process, and a carrying-out process.

〔剥離装置に対する積層体の搬入工程、剥離工程、搬出工程〕
図16(a)〜(c)〜図17(a)〜(c)〜図18(a)〜(c)は、図2に示した積層体6を剥離装置20に搬入する搬入工程、積層体6の剥離工程、剥離した補強板3A、3Bを剥離装置20から搬出する搬出工程、及び補強板3A、3Bが剥離した基板2A、2Bと液晶層7とからなる電子デバイス用のパネル62を剥離装置20から搬出する搬出工程を時系列的に示した説明図である。また、剥離装置20への積層体6の搬入作業、及び剥離した補強板3A、3B及びパネル62の搬出作業は、図14(a)に示した搬送装置60によって行われる。
[Loading process, peeling process, and unloading process of the laminate with respect to the peeling device]
16 (a) to (c) to FIG. 17 (a) to (c) to FIG. 18 (a) to (c) are a carrying-in process for carrying the laminated body 6 shown in FIG. A panel 62 for an electronic device composed of the liquid crystal layer 7 and the substrate 2A, 2B from which the reinforcing plates 3A, 3B are peeled off, and the unloading step for carrying out the peeling process of the body 6, the peeled reinforcing plates 3A, 3B from the peeling device 20. It is explanatory drawing which showed the carrying-out process carried out from the peeling apparatus 20 in time series. Moreover, the carrying-in operation | work of the laminated body 6 to the peeling apparatus 20 and the carrying-out operation | work of the peeled reinforcement plates 3A and 3B and the panel 62 are performed by the conveying apparatus 60 shown to Fig.14 (a).

また、図16〜図18に示した剥離装置20は、ステージ26の代わりに可撓性板64を配置し、上下に位置する一対の可撓性板22、64によって補強板3A、3Bを剥離させる機能を備えている。すなわち、可撓性板64は、可撓性板22と同一の機能を備えている。つまり、可撓性板64には、可撓性板22を撓み変形させる可動体24と同一の可動体(不図示)、駆動装置28と同一の駆動装置(不図示)、及び制御装置30と同一の制御装置(不図示)を備えている。   Also, the peeling device 20 shown in FIGS. 16 to 18 has a flexible plate 64 disposed in place of the stage 26, and peels the reinforcing plates 3A and 3B by a pair of flexible plates 22 and 64 positioned above and below. It has a function to let you. That is, the flexible plate 64 has the same function as the flexible plate 22. That is, the flexible plate 64 includes a movable body (not shown) that is the same as the movable body 24 that bends and deforms the flexible plate 22, a drive device (not shown) that is the same as the drive device 28, and the control device 30. The same control device (not shown) is provided.

図16(a)は、搬送装置60によって積層体6が可撓性板22に載置された剥離装置20の側面図である。この場合、可撓性板22と可撓性板64との間に搬送装置60が挿入されるように、可撓性板22と可撓性板64とが相対的に十分に退避した位置に予め移動されている。そして、積層体6が可撓性板22に載置されると、可撓性板22によって積層体6の補強板3Bが真空吸着保持される。つまり、積層体6の第2の主面6bが可撓性板22に真空吸着保持される。   FIG. 16A is a side view of the peeling device 20 in which the laminate 6 is placed on the flexible plate 22 by the transport device 60. In this case, the flexible plate 22 and the flexible plate 64 are relatively retracted so that the transport device 60 is inserted between the flexible plate 22 and the flexible plate 64. It has been moved in advance. When the laminated body 6 is placed on the flexible plate 22, the reinforcing plate 3 </ b> B of the laminated body 6 is held by vacuum suction by the flexible plate 22. That is, the second main surface 6 b of the stacked body 6 is held by vacuum suction on the flexible plate 22.

図16(b)は、可撓性板22と可撓性板64とが相対的に近づく方向に移動されて、積層体6の第1の主面6aが可撓性板64によって真空吸着保持された状態の剥離装置20の側面図である。   In FIG. 16B, the flexible plate 22 and the flexible plate 64 are moved in a relatively approaching direction, and the first main surface 6 a of the laminate 6 is vacuum-sucked and held by the flexible plate 64. It is a side view of the peeling apparatus 20 of the state made.

図16(c)は、剥離装置20によって、本発明の剥離方法が実施されている状態の剥離装置20の側面図である。同図によれば、可撓性板22が撓み変形されながら、積層体6の基板2Bと補強板3Bとの界面が剥離前線Eに沿って剥離されている。   FIG. 16C is a side view of the peeling device 20 in a state where the peeling method of the present invention is being carried out by the peeling device 20. According to the figure, the interface between the substrate 2B and the reinforcing plate 3B of the laminate 6 is peeled along the peeling front E while the flexible plate 22 is bent and deformed.

図17(a)は、基板2Bと補強板3Bとの界面が完全に剥離された状態の剥離装置20の側面図である。同図によれば、剥離した補強板3Bが可撓性板22に真空吸着保持され、補強板3Bを除く積層体66(補強板3A、基板2A、液晶層7、及び基板2Bからなる積層体)が可撓性板64に真空吸着保持されている。また、可撓性板22と可撓性板64との間に、図14(a)で示した搬送装置60が挿入されるように、可撓性板22と可撓性板64とが相対的に十分に退避した位置に予め移動されている。   FIG. 17A is a side view of the peeling apparatus 20 in a state where the interface between the substrate 2B and the reinforcing plate 3B is completely peeled. According to the figure, the peeled reinforcing plate 3B is vacuum-sucked and held on the flexible plate 22, and a laminated body 66 (a laminated body comprising the reinforcing plate 3A, the substrate 2A, the liquid crystal layer 7, and the substrate 2B) excluding the reinforcing plate 3B. ) Is held by vacuum suction on the flexible plate 64. In addition, the flexible plate 22 and the flexible plate 64 are relative to each other so that the conveyance device 60 shown in FIG. 14A is inserted between the flexible plate 22 and the flexible plate 64. Therefore, it has been moved in advance to a fully retracted position.

この後、まず、可撓性板22の真空吸着が解除される。次に、搬送装置60の吸着パッド58、58…によって補強板3Bが吸着保持される。次いで、搬送装置60によって、補強板3Bが剥離装置20から搬出される。   Thereafter, the vacuum suction of the flexible plate 22 is first released. Next, the reinforcing plate 3B is sucked and held by the suction pads 58, 58. Next, the reinforcing plate 3 </ b> B is unloaded from the peeling device 20 by the transport device 60.

図17(b)は、可撓性板22と可撓性板64とによって積層体66が真空吸着保持された剥離装置20の側面図である。すなわち、可撓性板22と可撓性板64とが相対的に近づく方向に移動されて、積層体66が可撓性板22と可撓性板64とによって真空吸着保持される。   FIG. 17B is a side view of the peeling device 20 in which the laminate 66 is held by vacuum suction by the flexible plate 22 and the flexible plate 64. That is, the flexible plate 22 and the flexible plate 64 are moved in a direction in which the flexible plate 22 and the flexible plate 64 are relatively approached, and the laminate 66 is held by vacuum suction between the flexible plate 22 and the flexible plate 64.

図17(c)は、剥離装置20によって、本発明の剥離方法が実施されている状態の剥離装置20の側面図である。同図によれば、可撓性板64が撓み変形されながら、積層体66の基板2Aと補強板3Aとの界面が剥離前線Eに沿って剥離されている。   FIG. 17C is a side view of the peeling device 20 in a state where the peeling method of the present invention is being carried out by the peeling device 20. According to the figure, while the flexible plate 64 is bent and deformed, the interface between the substrate 2A and the reinforcing plate 3A of the laminate 66 is peeled along the peeling front E.

図18(a)は、基板2Aと補強板3Aとの界面が完全に剥離された状態の剥離装置20の側面図である。同図によれば、剥離した補強板3Aが可撓性板64に真空吸着保持され、パネル62が可撓性板22に真空吸着保持されている。また、可撓性板22と可撓性板64との間に、図14(a)で示した搬送装置60が挿入されるように、可撓性板22と可撓性板64とが相対的に十分に退避した位置に予め移動されている。   FIG. 18A is a side view of the peeling device 20 in a state where the interface between the substrate 2A and the reinforcing plate 3A is completely peeled. According to the figure, the peeled reinforcing plate 3A is held by vacuum suction on the flexible plate 64, and the panel 62 is held by vacuum suction on the flexible plate 22. In addition, the flexible plate 22 and the flexible plate 64 are relative to each other so that the conveyance device 60 shown in FIG. 14A is inserted between the flexible plate 22 and the flexible plate 64. Therefore, it has been moved in advance to a fully retracted position.

この後、まず、可撓性板22の真空吸着が解除される。次に、搬送装置60の吸着パッド58、58…によってパネル62が吸着保持される。次いで、搬送装置60によって、パネル62が剥離装置20から搬出される。   Thereafter, the vacuum suction of the flexible plate 22 is first released. Next, the panel 62 is sucked and held by the suction pads 58 of the transfer device 60. Next, the panel 62 is carried out of the peeling device 20 by the transport device 60.

図18(b)は、可撓性板64から可撓性板22に補強板3Aが受け渡された状態の剥離装置20の側面図である。すなわち、可撓性板64が可撓性板22に向けて下降移動され、補強板3Aが可撓性板22に載置されたタイミンングで可撓性板64の吸着保持が解除され、その後、可撓性板64が可撓性板22から十分に離間した位置に退避移動される。   FIG. 18B is a side view of the peeling device 20 in a state where the reinforcing plate 3 </ b> A is transferred from the flexible plate 64 to the flexible plate 22. That is, the flexible plate 64 is moved downward toward the flexible plate 22, and the adsorption and holding of the flexible plate 64 is released by the timing when the reinforcing plate 3 </ b> A is placed on the flexible plate 22. The flexible plate 64 is retracted to a position sufficiently separated from the flexible plate 22.

図18(c)は、補強板3Aが搬出される直前状態の剥離装置20の側面図である。この後、図14(a)で示した搬送装置60によって補強板3Aが吸着保持されて、剥離装置20から補強板3Aが搬出される。   FIG. 18C is a side view of the peeling device 20 in a state immediately before the reinforcing plate 3A is carried out. Thereafter, the reinforcing plate 3 </ b> A is sucked and held by the transport device 60 shown in FIG. 14A, and the reinforcing plate 3 </ b> A is carried out from the peeling device 20.

以上が、剥離装置20に対する積層体6の搬入工程、剥離工程、搬出工程である。   The above are the carrying-in process of the laminated body 6 with respect to the peeling apparatus 20, a peeling process, and a carrying-out process.

以上、本発明の好ましい形態について説明したが、本発明は上記形態に制限されない。本発明の範囲を逸脱することなく、上記形態に種々の変形及び置換を加えることができる。   As mentioned above, although the preferable form of this invention was demonstrated, this invention is not restrict | limited to the said form. Various modifications and substitutions can be made to the above forms without departing from the scope of the present invention.

1…積層板、1a…第2の主面、1b…第1の主面、2…基板、3、3A、3B…補強板、4…支持板、5…樹脂層、6…積層体、7…液晶層、8、9…隅部、10…剥離領域、11…未剥離領域、12…剥離範囲、13…クラック、20…剥離装置、22…可撓性板、22A…第1の吸着面、22B…第2の吸着面、24…可動体、26…ステージ、28…駆動装置、30…制御装置、32…吸着シート、34…弾性シート、36…本体板、38…溝、40…貫通孔、42…ロッド、44…ボールジョイント、46…フレーム、48…クッション部材、50…駆動部、52…弾性シート、52A…第1の吸着面、52B…第2の吸着面、54、56…中間膜、58…吸着パッド、60…搬送装置、62…パネル、64…可撓性板、66…積層体   DESCRIPTION OF SYMBOLS 1 ... Laminated board, 1a ... 2nd main surface, 1b ... 1st main surface, 2 ... Board | substrate, 3, 3A, 3B ... Reinforcement plate, 4 ... Support plate, 5 ... Resin layer, 6 ... Laminated body, 7 ... Liquid crystal layer, 8, 9 ... Corner, 10 ... Peeling area, 11 ... Unpeeling area, 12 ... Peeling area, 13 ... Crack, 20 ... Peeling device, 22 ... Flexible plate, 22A ... First adsorption surface 22B ... second suction surface, 24 ... movable body, 26 ... stage, 28 ... drive device, 30 ... control device, 32 ... adsorption sheet, 34 ... elastic sheet, 36 ... main plate, 38 ... groove, 40 ... penetration Hole, 42 ... Rod, 44 ... Ball joint, 46 ... Frame, 48 ... Cushion member, 50 ... Drive part, 52 ... Elastic sheet, 52A ... First suction surface, 52B ... Second suction surface, 54, 56 ... Intermediate film 58 ... Adsorption pad 60 ... Conveying device 62 ... Panel 64 ... Flexible plate 66 ... Product Body

Claims (6)

基板と、前記基板を補強する補強板との界面を一端側から他端側に向けた剥離進行方向に沿って順次剥離する基板の剥離装置において、
前記界面を剥離した剥離領域と未剥離領域との境界線と前記基板の外周との2つの交点を結んだ直線と、前記剥離領域の前記基板の外周の接線と、のなす角度が少なくとも90度以下の剥離範囲において、
前記境界線の端部の接線と、前記剥離領域の前記基板の外周の接線と、のなす角度が90度よりも大きくなるように前記界面を剥離させる剥離手段を備え
前記剥離手段は、
前記基板及び前記補強板を含む積層体の第1の主面を支持する支持手段と、
前記積層体の第2の主面の外縁を吸着保持する第1の吸着面、及び前記外縁を除く第2の主面を吸着保持する第2の吸着面を有する可撓性板であって、前記第2の吸着面は前記第2の主面に対して平行な面であり、前記第1の吸着面は、前記第2の吸着面に対して所定量突出した突出面である可撓性板と、
前記可撓性板に間隔をおいて固定され、前記支持手段に対して独立に移動可能な複数の可動体と、
前記剥離進行方向の前記一端側に位置する前記可動体から前記剥離進行方向の他端側に位置する前記可動体を、前記支持手段に対して離間させる方向に順次移動させる制御手段と、を備えることを特徴とする基板の剥離装置。
In the substrate peeling apparatus that sequentially peels the interface between the substrate and the reinforcing plate that reinforces the substrate from the one end side toward the other end side along the peeling progress direction,
An angle formed by a straight line connecting two intersections between the boundary line between the peeling area and the non-peeling area where the interface is peeled off and the outer periphery of the substrate, and the tangent line of the outer periphery of the substrate in the peeling area is at least 90 degrees In the following peeling range:
A peeling means for peeling the interface so that an angle formed between a tangent at an end of the boundary line and a tangent to the outer periphery of the substrate in the peeling region is larger than 90 degrees ;
The peeling means includes
Support means for supporting the first main surface of the laminate including the substrate and the reinforcing plate;
A flexible plate having a first suction surface for sucking and holding the outer edge of the second main surface of the laminate, and a second suction surface for sucking and holding the second main surface excluding the outer edge; The second suction surface is a surface parallel to the second main surface, and the first suction surface is a projecting surface projecting a predetermined amount with respect to the second suction surface. The board,
A plurality of movable bodies fixed to the flexible plate at intervals and movable independently of the support means;
Control means for sequentially moving the movable body located on the other end side in the peeling progress direction from the movable body located on the one end side in the peeling progress direction in a direction away from the support means. A substrate peeling apparatus.
前記基板は、厚さが0.2mm以下のガラス基板である請求項1に記載の基板の剥離装置。   The substrate peeling apparatus according to claim 1, wherein the substrate is a glass substrate having a thickness of 0.2 mm or less. 基板と、前記基板を補強する補強板との界面を一端側から他端側に向けた剥離進行方向に沿って順次剥離する基板の剥離方法において、
前記界面を剥離した剥離領域と未剥離領域との境界線と前記基板の外周との2つの交点を結んだ直線と、前記剥離領域の前記基板の外周の接線と、のなす角度が少なくとも90度以下の剥離範囲において、
前記境界線の端部の接線と、前記剥離領域の前記基板の外周の接線と、のなす角度が90度よりも大きくなるように前記界面を剥離手段によって剥離させ
前記剥離手段による剥離方法は、
前記基板及び前記補強板を含む積層体の第1の主面を支持する支持手段と、
前記積層体の第2の主面の外縁を吸着保持する第1の吸着面、及び前記外縁を除く第2の主面を吸着保持する第2の吸着面を有する可撓性板であって、前記第2の吸着面は前記第2の主面に対して平行な面であり、前記第1の吸着面は、前記第2の吸着面に対して所定量突出した突出面である可撓性板と、
前記可撓性板に間隔をおいて固定され、前記支持手段に対して独立に移動可能な複数の可動体と、を備え、
前記剥離進行方向の前記一端側に位置する前記可動体から前記剥離進行方向の他端側に位置する前記可動体を、前記支持手段に対して離間させる方向に制御手段によって順次移動させることを特徴とする基板の剥離方法。
In the peeling method of the substrate, the interface between the substrate and the reinforcing plate that reinforces the substrate is sequentially peeled along the peeling progress direction from one end side to the other end side.
An angle formed by a straight line connecting two intersections between the boundary line between the peeling area and the non-peeling area where the interface is peeled off and the outer periphery of the substrate, and the tangent line of the outer periphery of the substrate in the peeling area is at least 90 degrees In the following peeling range:
The interface is peeled off by a peeling means so that an angle formed between a tangent line at an end of the boundary line and a tangent line of the outer periphery of the substrate in the peeling region is larger than 90 degrees ,
The peeling method by the peeling means is:
Support means for supporting the first main surface of the laminate including the substrate and the reinforcing plate;
A flexible plate having a first suction surface for sucking and holding the outer edge of the second main surface of the laminate, and a second suction surface for sucking and holding the second main surface excluding the outer edge; The second suction surface is a surface parallel to the second main surface, and the first suction surface is a projecting surface projecting a predetermined amount with respect to the second suction surface. The board,
A plurality of movable bodies fixed to the flexible plate at intervals and movable independently with respect to the support means,
The movable body positioned on the other end side in the peeling progress direction is sequentially moved by the control means in a direction to be separated from the support means from the movable body positioned on the one end side in the peeling progress direction. A method for peeling the substrate.
前記基板は、厚さが0.2mm以下のガラス基板である請求項に記載の基板の剥離方法。 The substrate peeling method according to claim 3 , wherein the substrate is a glass substrate having a thickness of 0.2 mm or less. 補強板で補強した基板の表面に機能層を形成する機能層成形工程と、前記機能層が形成された前記基板と前記補強板とを剥離する剥離工程とを有する電子デバイスの製造方法において、
前記剥離工程は、
前記基板及び前記補強板を含む積層体の第1の主面を支持手段で支持するとともに、前記積層体の第2の主面を吸着保持する可撓性板に間隔をおいて固定された複数の可動体の前記支持手段に対する移動を制御することで、前記基板と前記補強板との界面を一端側から他端側に向けた剥離進行方向に沿って順次剥離する工程であって、
前記可撓性板は、前記積層体の第2の主面の外縁を吸着保持する第1の吸着面、及び前記外縁を除く第2の主面を吸着保持する第2の吸着面を有する可撓性板であって、前記第2の吸着面は前記第2の主面に対して平行な面であり、前記第1の吸着面は、前記第2の吸着面に対して所定量突出した突出面を備え、
前記界面を剥離した剥離領域と未剥離領域との境界線と前記基板の外周との2つの交点を結んだ直線と、前記剥離領域の前記基板の外周の接線と、のなす角度が少なくとも90度以下の剥離範囲において、
前記境界線の端部の接線と、前記剥離領域の前記基板の外周の接線と、のなす角度が90度よりも大きくなるように前記界面を剥離する工程であることを特徴とする電子デバイスの製造方法。
In a method for manufacturing an electronic device, comprising: a functional layer forming step of forming a functional layer on a surface of a substrate reinforced with a reinforcing plate; and a peeling step of peeling the substrate on which the functional layer is formed and the reinforcing plate.
The peeling step includes
A plurality of substrates fixed at intervals to a flexible plate that supports the first main surface of the laminate including the substrate and the reinforcing plate by a supporting means and sucks and holds the second main surface of the laminate. Controlling the movement of the movable body with respect to the support means to sequentially peel the interface between the substrate and the reinforcing plate along the peeling progress direction from one end side to the other end side,
The flexible plate may have a first suction surface for sucking and holding the outer edge of the second main surface of the laminate, and a second suction surface for sucking and holding the second main surface excluding the outer edge. A flexible plate, wherein the second suction surface is parallel to the second main surface, and the first suction surface protrudes a predetermined amount with respect to the second suction surface. With a protruding surface,
An angle formed by a straight line connecting two intersections between the boundary line between the peeling area and the non-peeling area where the interface is peeled off and the outer periphery of the substrate, and the tangent line of the outer periphery of the substrate in the peeling area is at least 90 degrees In the following peeling range:
The step of peeling the interface so that the angle formed by the tangent at the end of the boundary line and the tangent to the outer periphery of the substrate in the peeling region is larger than 90 degrees. Production method.
前記基板は、厚さが0.2mm以下のガラス基板である請求項5に記載の電子デバイスの製造方法。
The method of manufacturing an electronic device according to claim 5, wherein the substrate is a glass substrate having a thickness of 0.2 mm or less.
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