JP6013212B2 - Pattern forming device - Google Patents

Description

  The present invention relates to a pattern forming apparatus that forms a pattern by patterning a pattern forming material carried on a blanket with a plate or transferring the formed pattern onto a substrate.

  As a technique for forming a pattern on a substrate such as a glass substrate or a semiconductor substrate, there is a technique in which a pattern is transferred to a substrate by bringing a blanket carrying the pattern into contact with the substrate. Further, as a technique for supporting a pattern on the blanket, a plate (negative plate) is pressed against a uniform film formed on the blanket surface by a pattern forming material, and unnecessary portions of the film are adhered to the plate and removed. Thus, there is a pattern forming (patterning) by leaving only a portion to be a pattern on the blanket.

  As one of such techniques, for example, there is one applying a printing technique as described in Patent Document 1. For example, in the technique described in Patent Document 2, a plate that is tensioned in one direction and stretched on a frame is disposed above the substrate in a state of being inclined with respect to the substrate, and the press roller is used to fix the plate to one end thereof. The pattern on the plate is transferred to the substrate by sequentially pressing the substrate on the substrate and then peeling the plate.

JP 07-125179 A JP 2002-036499 A

  In the configuration in which the pattern carrier disposed on the upper part of the substrate is pressed from above as in the above prior art, since the upper surface of the pattern carrier must be held open, the bending is inevitable. In order to avoid unintentional contact with the substrate due to bending, it is conceivable to arrange the pattern carrier away from the substrate, or to hold the plate tilted as in the prior art described above. In this case, the pattern carrier and the substrate cannot be brought close to each other, and the position accuracy of the pattern formed on the substrate is not sufficient.

  For this reason, it is desired to press the roller from below, but the technology for that purpose has not been sufficiently established. In particular, when the pressing position is moved while performing local pressing by the roller, it is expected that an offset load is applied to the member that receives the pressing force from the roller. When the pressing force becomes non-uniform due to such an uneven load, it becomes difficult to form a good pattern. However, there has been no proposal for such a problem and a specific apparatus configuration for solving the problem. .

  The present invention has been made in view of the above problems, and in a pattern forming apparatus for forming a pattern by bringing a plate or a substrate into contact with a blanket, a constant space between the plate or the substrate and the blanket is avoided while avoiding unintended contact. An object of the present invention is to provide a technique capable of forming a favorable pattern by pressing with a pressing force.

  According to one aspect of the present invention, a plate for patterning a pattern forming material or a substrate onto which a pattern is transferred is used as a processing target, and the processing target and a blanket that supports the pattern forming material on one surface are provided. A pattern forming apparatus that forms a pattern by abutting, in order to achieve the above object, a first holding means for holding the blanket in a horizontal posture with the one surface facing upward, and a planar size of the processing object A holding plane having the above-mentioned plane size, a second holding means for holding the one surface of the processing object in contact with the holding plane, and a horizontal extension extending across the second holding means A beam member that supports the second holding means with the holding plane opposed to the one surface of the blanket held by the first holding means, and the second of the beam members A pair of support members that respectively support the beam member so as to be movable up and down at both side positions sandwiching the holding means, and a direction orthogonal to the extending direction of the beam member from the other surface side opposite to the one surface of the blanket The blanket is partially pressed to the second holding means side with a uniform pressing force to contact the processing object held by the first holding means, and the pressing position of the blanket is Pressing means for moving the beam member in parallel with the extending direction of the beam member.

  In the invention configured as described above, the second holding means is arranged to face the blanket held in the horizontal posture. Then, the blanket is partially pressed against the plate or the substrate as the processing object held by the second holding means. In such partial pressing, an offset load is applied to the second holding means that receives the pressing force. As a result, when the posture of the second holding means changes, the pressing force acting between the processing object and the blanket changes. In addition, the gap between the processing object and the blanket that are arranged opposite to each other fluctuates, and in severe cases, these may cause unintended contact.

  In the configuration in which the second holding means is attached to the beam member supported at both ends, when an unbalanced load that causes rotation about the extending direction of the beam member is applied, the member is twisted and second There is a possibility that the holding means is displaced. In particular, in the configuration in which the beam member is movable, the second holding means is easily displaced by having the movable portion.

  Therefore, in the present invention, the pressing position is moved along the extending direction of the beam while pressing the blanket with a uniform pressing force in a direction orthogonal to the extending direction of the beam member. By doing so, the torsion due to the uneven load is limited around the axis orthogonal to the extending direction of the beam member, and the displacement of the second holding member is minimized. Then, by supporting both sides of the beam member, it is possible to provide a function of raising and lowering the beam member while increasing the proof strength against the uneven load. Therefore, in the present invention, it is possible to form a good pattern by pressing these with a constant pressing force while avoiding unintended contact between the plate or the substrate and the blanket.

  Here, as the pressing means, for example, a uniform pressing force is applied to a region of the blanket in which the length in the direction orthogonal to the extending direction of the beam member is longer than the length of the object to be processed in the direction. It may be configured. In this way, unevenness of the pressing force on the processing object in the direction orthogonal to the extending direction does not occur, and the pressing force is applied to the entire processing object only by moving the pressing means once along the extending direction. Can be given.

  Further, for example, the pressing means includes a pressing member that contacts the blanket and presses the blanket in a pressing region having a direction perpendicular to the extending direction of the other surface of the blanket as a longitudinal direction; The structure which has a moving part which moves to an extending direction, making it contact may be sufficient. In this case, the pressing member may be, for example, a roller that is rotatably supported by the moving unit and has a rotation axis in a direction orthogonal to the extending direction. In such a configuration, only the operation of moving the pressing member in the extending direction can uniformly press between the processing object and the blanket over the entire surface.

  Further, for example, the beam member may be configured to move in the vertical direction while keeping the extending direction horizontal. By doing so, the movement of the beam member in the vertical direction causes the holding plane of the second holding member to move while keeping parallel to the blanket, so that a minute gap adjustment between the two is performed without bringing them into contact with each other. be able to.

  Further, for example, the pair of support members may be fixed to the common base portion, and the pressing means may be supported so as to be movable in the extending direction with respect to the base portion. In such a configuration, the relative position between the support member and the pressing means, and hence the second holding means and the pressing means, is defined via the base portion, and the pressing means presses the blanket toward the second holding means. The pressing force can be easily controlled.

  According to the present invention, the torsion caused by the unbalanced load due to the pressing of the pressing means is limited around the axis orthogonal to the extending direction of the beam member, and the displacement of the second holding member can be suppressed to the minimum. Alternatively, a good pattern can be formed by pressing them with a constant pressing force while avoiding unintended contact between the substrate and the blanket.

It is a perspective view showing one embodiment of a pattern formation device concerning this invention. It is a block diagram which shows the control system of this pattern formation apparatus. It is a perspective view which shows the structure of a lower stage block. It is a figure which shows the structure of a raising / lowering hand unit. It is a figure which shows the structure of a transfer roller unit. It is a figure which shows the structure of an upper stage assembly. It is a flowchart which shows a pattern formation process. It is a 1st figure which shows typically the positional relationship of each part of an apparatus in each step of a process. It is a 2nd figure which shows typically the positional relationship of each part of an apparatus in each step of a process. It is a 3rd figure which shows typically the positional relationship of each part of an apparatus in each step of a process. It is a 4th figure which shows typically the positional relationship of each part of an apparatus in each step of a process. It is a 5th figure which shows typically the positional relationship of each part of an apparatus in each step of a process. It is a 6th figure which shows typically the positional relationship of each part of an apparatus in each step of processing. It is a figure which shows the positional relationship of a plate | board or a board | substrate, and a blanket. It is a 7th figure which shows typically the positional relationship of each part of an apparatus in each step of a process. It is a figure which shows typically the relationship between the extending direction of a beam member, and a roller moving direction.

  FIG. 1 is a perspective view showing an embodiment of a pattern forming apparatus according to the present invention. FIG. 2 is a block diagram showing a control system of the pattern forming apparatus. FIG. 1 shows a state in which the external cover is removed to show the internal configuration of the apparatus. In order to uniformly indicate the direction in each figure, XYZ orthogonal coordinate axes are set as shown in the lower right of FIG. Here, the XY plane represents a horizontal plane and the Z axis represents a vertical axis. More specifically, the (+ Z) direction represents a vertically upward direction. The front direction when viewed from the apparatus is the (−Y) direction, and access to the apparatus from the outside, including loading and unloading of articles, is made along the Y-axis direction.

  The pattern forming apparatus 1 has a structure in which an upper stage block 4 and a lower stage block 6 are attached to a main frame 2. In FIG. 1, in order to clearly show the distinction between the blocks, the upper stage block 4 is provided with dots having a coarse pitch, and the lower stage block 6 is provided with dots having a finer pitch. In addition to the above, the pattern forming apparatus 1 has a control unit 8 (FIG. 2) that controls each part of the apparatus according to a processing program stored in advance and executes a predetermined operation. Detailed configurations of the upper stage block 4 and the lower stage block 6 will be described later. First, the overall configuration of the apparatus 1 will be described.

  The pattern forming apparatus 1 is an apparatus that forms a pattern by bringing the blanket BL held by the lower stage block 6 and the plate PP or the substrate SB held by the upper stage block 4 into contact with each other. More specifically, the pattern forming process by the apparatus 1 is as follows. First, the coated layer carried on the blanket BL is patterned by bringing a plate PP created corresponding to the pattern to be formed into contact with the blanket BL on which the pattern forming material is uniformly applied (see FIG. Patterning process). Then, by bringing the blanket BL thus patterned and the substrate SB into contact, the pattern carried on the blanket BL is transferred to the substrate SB (transfer process). As a result, a desired pattern is formed on the substrate SB.

  As described above, the pattern forming apparatus 1 can be used for both the patterning process and the transfer process in the pattern forming process for forming a predetermined pattern on the substrate SB. However, the pattern forming apparatus 1 is responsible for only one of these processes. May be used.

  The lower stage block 6 of the pattern forming apparatus 1 is supported by the base frame 21 of the main frame 2. On the other hand, the upper stage block 4 is attached to a pair of upper stage support frames 22 and 23 that are erected from the base frame 21 and extend in the Y direction so as to sandwich the lower stage block 6 from the X direction.

  Further, a pre-alignment camera for detecting the positions of the substrate SB and the blanket BL carried into the apparatus is attached to the main frame 2. More specifically, three substrate pre-alignment cameras 241, 242, and 243 for detecting the edge of the substrate SB carried into the apparatus along the Y-axis direction at three different positions are provided on the upper stage support frame 22. , 23 are respectively attached to booms erected. Similarly, three blanket pre-alignment cameras 244, 245 and 246 for detecting the edge of the blanket BL carried into the apparatus along the Y-axis direction at three different positions are provided from the upper stage support frames 22 and 23. Each is attached to a standing boom. In FIG. 1, one blanket pre-alignment camera 246 located behind the upper stage block 4 does not appear. In FIG. 2, the substrate pre-alignment camera is abbreviated as “substrate PA camera”, and the blanket pre-alignment camera is abbreviated as “blanket PA camera”.

  FIG. 3 is a perspective view showing the structure of the lower stage block. In the lower stage block 6, pillars 602 are erected in the vertical direction (Z direction) at the four corners of a plate-shaped alignment stage 601 with an opening at the center, and the stage support plate 603 is supported by these pillars 602. ing. Although not shown, at the lower part of the alignment stage 601, there are three degrees of freedom in the rotational direction (hereinafter referred to as “θ direction”), the X direction and the Y direction with the rotational axis extending in the vertical direction Z as the rotational center. An alignment stage support mechanism 605 (FIG. 2) such as a cross roller bearing is provided, and the alignment stage 601 is attached to the base frame 21 via the alignment stage support mechanism 605. Therefore, the alignment stage 601 can move in a predetermined range in the X direction, the Y direction, and the θ direction with respect to the base frame 21 by the operation of the alignment stage support mechanism 605.

  An annular rectangular lower stage 61 having an upper surface substantially coincident with a horizontal plane and having an opening window 611 formed at the center is disposed above the stage support plate 603. A blanket BL is placed on the upper surface of the lower stage 61, and the lower stage 61 holds it.

  The opening size of the opening window 611 needs to be larger than the planar size of the effective area (not shown) in the central portion that effectively functions as the pattern formation area in the surface area of the blanket BL. That is, when the blanket BL is placed on the lower stage 61, the entire area corresponding to the effective area on the lower surface of the blanket BL faces the opening window 611, and the lower part of the effective area needs to be completely open. is there. The coating layer made of the pattern forming material is formed so as to cover at least the entire effective area.

  On the upper surface 61a of the lower stage 61, a plurality of grooves 612 are provided along the peripheral edges of the opening window 611. Each groove 612 is connected to a negative pressure supply section of the control unit 8 via a control valve (not shown). 804 is connected. Each groove 612 is disposed in a region having a planar size smaller than the planar size of the blanket BL. Then, as indicated by the alternate long and short dash line in the figure, the blanket BL is placed on the lower stage 61 so as to cover all the grooves 612. In order to enable this, a stopper member 613 for restricting the position of the blanket BL is appropriately disposed on the lower stage upper surface 61a.

  By supplying negative pressure to each groove 612, each groove 612 functions as a vacuum suction groove, and thus the four sides of the peripheral portion of the blanket BL are sucked and held on the upper surface 61a of the lower stage 61. By configuring the vacuum suction groove with a plurality of independent grooves 612, even if a vacuum break occurs in some of the grooves for some reason, the suction of the blanket BL by other grooves is maintained, so that the blanket BL can be securely attached. Can be held. Further, the blanket BL can be adsorbed with a stronger adsorbing force than when a single groove is provided.

  Below the opening window 611 of the lower stage 61, there are provided lifting hand units 62 and 63 for moving the blanket BL up and down in the Z-axis direction, and a transfer roller unit 64 that abuts and pushes up the blanket BL from below. Yes.

  FIG. 4 is a diagram showing the structure of the lifting hand unit. Since the structures of the two lifting hand units 62 and 63 are the same, the structure of one lifting hand unit 62 will be described here. The elevating hand unit 62 has two support columns 621 and 622 erected in the Z direction from the base frame 21, and a plate-like slide base 623 can move up and down with respect to these support columns 621 and 622. It is attached. More specifically, guide rails 6211 and 6221 extending in the vertical direction (Z direction) are attached to the two support columns 621 and 622, respectively, and attached to the rear surface of the slide base 623, that is, the (+ Y) side main surface. The slider (not shown) is slidably attached to the guide rails 6211 and 6221. Then, for example, an elevating mechanism 624 including an appropriate drive mechanism such as a motor and a ball screw mechanism moves the slide base 623 up and down in accordance with a control command from the control unit 8.

  A plurality (four in this example) of hands 625 are attached to the slide base 623 so as to be movable up and down. The structure of each hand 625 is basically the same except that the shape of the base portion differs depending on the arrangement position. Each hand 625 is fixed to a slider 627 that is slidably engaged with a guide rail 626 that is attached to the front surface of the slide base 623, that is, the (−Y) side main surface along the vertical direction (Z direction). Has been. The slider 627 is connected to an elevating mechanism 628 having an appropriate drive mechanism such as a rodless cylinder attached to the back surface of the slide base 623, and moves up and down with respect to the slide base 623 by the operation of the elevating mechanism 628. To do. Each hand 625 is provided with an independent lifting mechanism 628, and each hand 625 can be moved up and down individually.

  That is, in the elevating hand unit 62, the elevating mechanism 624 moves the slide base 623 up and down to integrally move the hands 625 up and down, and the elevating mechanisms 628 operate independently to allow the hands 625 to move up and down. Can be raised and lowered individually.

  The upper surface 625a of the hand 625 is finished in an elongated flat surface with the Y direction as the longitudinal direction, and the upper surface 625a can be brought into contact with the lower surface of the blanket BL to support the blanket BL. The upper surface 625a is provided with an adsorption hole 625b that communicates with a negative pressure supply unit 804 provided in the control unit 8 via a pipe and a control valve (not shown). Thereby, negative pressure from the negative pressure supply unit 804 is supplied to the suction hole 625b as necessary, and the blanket BL can be sucked and held on the upper surface 625a of the hand 625. Therefore, it is possible to prevent slipping when the hand 625 supports the blanket BL.

  In addition, an appropriate gas, for example, dry air or inert gas, is supplied to the adsorption hole 625b from a gas supply unit 806 of the control unit 8 through a pipe and a control valve (not shown) as necessary. That is, the negative pressure from the negative pressure supply unit 804 and the gas from the gas supply unit 806 are selectively supplied to the suction hole 625 b by opening and closing each control valve controlled by the control unit 8.

  When the gas from the gas supply unit 806 is supplied to the adsorption hole 625b, a small amount of gas is discharged from the adsorption hole 625b. Thereby, a minute gap is formed between the lower surface of the blanket BL and the upper surface 625a of the hand, and the hand 625 is in a state of being separated from the lower surface of the blanket BL while supporting the blanket BL from below. Therefore, the blanket BL can be moved in the horizontal direction without being rubbed against each hand 625 while the blanket BL is supported by each hand 625. In addition, you may provide a gas discharge hole in the hand upper surface 625a separately from the adsorption hole 625b.

  Returning to FIG. 3, in the lower stage block 6, the lifting hand units 62, 63 having the above-described configuration are disposed facing each other so as to face the Y direction with the hand 625 facing inward. In the state where each hand 625 is lowered most, the upper surface 625a of the hand is located below the lower stage upper surface 61a, that is, a position that is largely retracted in the (−Z) direction. On the other hand, in the state where each hand 625 is raised most, the tip of each hand 625 protrudes upward from the opening window 611 of the lower stage 61, and the hand upper surface 625a is above the lower stage upper surface 61a, that is, in the (+ Z) direction. To the position protruding.

  Further, when viewed from above, a certain distance is provided between the tips of the hands 625 facing each other of the elevating hand units 62 and 63 so that they do not come into contact with each other. Further, as will be described next, the transfer roller unit 64 moves in the X direction using this gap.

  FIG. 5 shows the structure of the transfer roller unit. The transfer roller unit 64 includes a transfer roller 641 that is a cylindrical roller member extending in the Y direction, and a support frame that extends in the Y direction along the lower side of the transfer roller 641 and rotatably supports the transfer roller 641 at both ends thereof. 642 and an elevating mechanism 644 that has an appropriate drive mechanism and moves the support frame 642 up and down in the Z direction. The transfer roller 641 is not connected to a rotation drive mechanism and rotates freely. Further, the support frame 642 is provided with a backup roller 643 that comes into contact with the surface of the transfer roller 641 from below to prevent the transfer roller 641 from bending.

  The length of the transfer roller 641 in the Y direction is shorter than the length of the four sides of the opening window 611 of the lower stage 61 along the Y direction, that is, the opening dimension of the opening window 611 in the Y direction, and will be described later. It is longer than the length along the Y direction of the plate PP or the substrate SB when held on the upper stage. Since the effective area effective as a pattern formation area in the blanket BL is naturally equal to or shorter than the length of the plate PP or the substrate SB, the transfer roller 641 is longer than the effective area in the Y direction.

  The elevating mechanism 644 includes a base portion 644a and support legs 644b extending upward from the base portion 644a and connected to the vicinity of the center of the support frame 642 in the Y direction. The support leg 644b can move up and down with respect to the base portion 644a by an appropriate drive mechanism such as a motor or a cylinder. The base portion 644a is slidably attached to a guide rail 646 extending in the X direction, and is further coupled to a moving mechanism 647 having an appropriate driving mechanism such as a motor and a ball screw mechanism. . The guide rail 646 is attached to the upper surface of the lower frame 645 that extends in the X direction and is fixed to the base frame 21. By operating the moving mechanism 647, the transfer roller 641, the support frame 642, and the lifting mechanism 644 integrally travel in the X direction.

  As will be described in detail later, in this pattern forming apparatus 1, the blanket BL held on the lower stage 61 is brought into contact with the transfer roller 641 to partially lift the blanket BL, whereby the blanket BL is held on the upper stage. The blanket BL is brought into contact with the plate PP or the substrate SB arranged in close proximity to each other.

  The elevating mechanism 644 travels through a gap formed by the hands 625 facing each other of the elevating hand units 62 and 63. Each hand 625 has an upper surface 625 a that can be retracted in the (−Z) direction from the lower surface of the support frame 642 of the transfer roller unit 64 to the lower side. Therefore, when the elevating mechanism 644 runs in this state, the support frame 642 of the transfer roller unit 64 passes over the upper surface 625a of each hand 625, and the transfer roller unit 64 and the hand 625 are prevented from colliding. .

  Next, the structure of the upper stage block 4 will be described. As shown in FIG. 1, the upper stage block 4 is erected from an upper stage assembly 40 that is a structure extending in the X direction and upper stage support frames 22 and 23. A pair of support columns 45 and 46 for supporting each of them, and an elevating mechanism 47 that includes an appropriate drive mechanism such as a motor and a ball screw mechanism and moves the entire upper stage assembly 40 up and down in the Z direction.

  FIG. 6 shows the structure of the upper stage assembly. The upper stage assembly 40 is coupled to the upper stage 41 holding the plate PP or the substrate SB on the lower surface, a reinforcing frame 42 provided on the upper stage 41, and extends horizontally along the X direction. A beam-like structure 43 and an upper suction unit 44 mounted on the upper stage 41 are provided. As shown in FIG. 6, the upper stage assembly 40 has substantially symmetric shapes with respect to the XZ plane and the YZ plane including the center on the outer shape.

  The upper stage 41 is a flat member slightly smaller than the plane size of the plate PP or the substrate SB to be held, and a lower surface 41a held in a horizontal posture holds the plate PP or the substrate SB in contact with the holding plane. It has become. Since the holding plane is required to have a high degree of flatness, quartz glass or a stainless steel plate is suitable as the material. The holding plane is provided with a through hole for mounting a suction pad of the upper suction unit 44 described later.

  The reinforcing frame 42 is composed of a combination of reinforcing ribs extending in the Z direction on the upper surface of the upper stage 41. As shown in the drawing, the upper stage 41 is prevented from being bent and its lower surface (holding plane) 41a In order to maintain the flatness, a plurality of reinforcing ribs 421 parallel to the YZ plane and reinforcing ribs 422 parallel to the XZ plane are appropriately combined. The reinforcing ribs 421 and 422 can be made of, for example, a metal plate.

  Further, the beam-like structure 43 is a structure formed by combining a plurality of metal plates and having a longitudinal direction in the X direction, and both ends thereof are supported by the support columns 45 and 46 so as to be vertically movable. Yes. Specifically, guide rails 451 and 461 extending in the Z direction are provided on the support columns 45 and 46, respectively, and a slider (not shown) is attached to the (+ Y) side main surface of the beam-like structure 43 facing the support pillars 45 and 46, respectively. These are slidably engaged. As shown in FIG. 1, the beam-like structure 43 and the support column 46 are connected by an elevating mechanism 47, and the elevating mechanism 47 operates to keep the beam-like structure 43 in a horizontal posture. Move in the vertical direction (Z direction). Since the upper stage 41 is integrally coupled to the beam-like structure 43 via the reinforcing frame 42, the upper stage 41 moves up and down with the holding plane 41 a kept horizontal by the operation of the elevating mechanism 47.

  The structures of the reinforcing frame 42 and the beam-like structure 43 are not limited to those illustrated. Here, a necessary strength is obtained by combining a plate-like member parallel to the YZ plane and a plate-like member parallel to the XZ plane, but a sheet metal, an angle member, or the like may be appropriately combined with other shapes. The reason for this structure is to make the upper stage assembly 40 lightweight. In order to reduce the deflection of each part, it is conceivable to increase the thickness of the upper stage 41 or to use the beam-like structure 43 as a solid body, but if so, the mass of the entire upper stage assembly 40 will increase.

  The increase in the weight of the structure disposed on the upper part of the apparatus requires additional strength and durability for a mechanism for supporting and moving the structure, and the entire apparatus becomes very large and heavy. It is more realistic to reduce the weight of the entire structure while obtaining the required strength by combining plate materials and the like.

  A pair of upper suction units 44 are mounted on the upper stage 41 surrounded by the reinforcing frame 42. A state where one upper suction unit 44 is taken out upward is shown in the upper part of FIG. In the upper suction unit 44, for example, rubber suction pads 443 are attached to lower ends of a plurality of pipes 442 extending downward from the support frame 441, respectively. The upper end side of each pipe 442 is connected to a negative pressure supply unit 804 of the control unit 8 via a pipe and a control valve (not shown). The support frame 441 has a shape that does not interfere with the ribs 421 and 422 constituting the reinforcing frame 42.

  The support frame 441 is supported movably in the vertical direction with respect to the base plate 446 through a pair of sliders 444 and a pair of guide rails 445 engaged therewith. Further, the base plate 446 and the support frame 441 are coupled by an elevating mechanism 447 having an appropriate driving mechanism such as a motor and a ball screw mechanism. By the operation of the lifting mechanism 447, the support frame 441 moves up and down with respect to the base plate 446, and the pipe 442 and the suction pad 443 move up and down integrally therewith.

  The upper suction unit 44 is attached to the upper stage 41 by fixing the base plate 446 to the upper stage 41. In this state, the lower end of each pipe 442 and the suction pad 443 are inserted through through holes (not shown) provided in the upper stage 41. Then, by the operation of the elevating mechanism 447, the suction pad 443 has the lower surface discharged to the lower side of the lower surface (holding plane) 41a of the upper stage 41 and the lower surface inside the through hole of the upper stage 41 (upper). It moves up and down with the retracted position. When the lower surface of the suction pad 443 is positioned at substantially the same height as the holding plane 41a of the upper stage 41, the upper stage 41 and the suction pad 443 cooperate to hold the plate PP or the substrate SB on the holding plane 41a. can do.

  Returning to FIG. 1, the upper stage assembly 40 configured as described above is provided on a base plate 481. More specifically, the support columns 45 and 46 are respectively erected on the base plate 481, and the upper stage assembly 40 is attached to the support columns 45 and 46 so as to be movable up and down. The base plate 481 is attached to the upper stage support frames 22 and 23, and is supported by an upper stage block support mechanism 482 including an appropriate movable mechanism such as a cross roller bearing.

  Therefore, the entire upper stage assembly 40 can be moved horizontally with respect to the main frame 2. Specifically, the base plate 481 moves horizontally in the horizontal plane, that is, the XY plane by the operation of the upper stage block support mechanism 482. A pair of base plates 481 provided corresponding to the support pillars 45 and 46 can move independently of each other, and the upper stage assembly 40 moves with respect to the main frame 2 in accordance with these movements. It is possible to move in a predetermined range in the direction, the Y direction and the θ direction.

  Each part of the pattern forming apparatus 1 configured as described above is controlled by the control unit 8. As shown in FIG. 2, the control unit 8 includes a CPU 801 that controls the operation of the entire apparatus, a motor control unit 802 that controls a motor provided in each unit, and a valve control unit that controls control valves provided in each unit. 803 and a negative pressure supply unit 804 that generates a negative pressure to be supplied to each unit. In addition, when the negative pressure supplied from the outside can be utilized, the control unit 8 does not need to be provided with the negative pressure supply part.

  The motor control unit 802 controls positioning and movement of each part of the apparatus by controlling a motor group provided in each functional block. Further, the valve control unit 803 controls a valve group provided on a negative pressure piping path connected from the negative pressure supply unit 804 to each functional block and on a piping path connected from the gas supply unit 806 to the hand 625. Thus, the vacuum suction by the negative pressure supply is executed and released, and the gas is discharged from the hand upper surface 625a.

  The control unit 8 includes an image processing unit 805 that performs image processing on an image captured by the camera. The image processing unit 805 performs predetermined image processing on images captured by the substrate pre-alignment cameras 241 to 243 and the blanket pre-alignment cameras 244 to 246 attached to the main frame 2, so that the substrate SB and The approximate position of the blanket BL is detected. Further, the positional relationship between the substrate SB and the blanket BL is detected more precisely by performing predetermined image processing on an image picked up by an alignment camera CM for precision alignment described later. The CPU 801 controls the upper stage block support mechanism 482 and the alignment support mechanism 605 based on these position detection results, and the plate PP or substrate SB held on the upper stage 41 and the blanket BL held on the lower stage 61. Alignment (pre-alignment processing and precision alignment processing) is performed.

  Next, a pattern forming process in the pattern forming apparatus 1 configured as described above will be described. In this pattern forming process, the plate PP or the substrate SB held on the upper stage 41 and the blanket BL held on the lower stage 61 are arranged close to each other with a minute gap therebetween. Then, the transfer roller 641 contacts the lower surface of the blanket BL and moves along the lower surface of the blanket BL while locally pushing up the blanket BL. The pushed blanket BL first locally contacts the plate PP or the substrate SB, and the contact portion gradually expands as the roller moves, and finally contacts the entire plate PP or the substrate SB. Thus, patterning from the plate PP to the blanket BL or pattern transfer from the blanket BL to the substrate SB is performed.

  FIG. 7 is a flowchart showing the pattern forming process. FIGS. 8 to 15 are diagrams schematically showing the positional relationship of each part of the apparatus at each stage of processing. The operation of each part in the pattern forming process will be described below with reference to FIGS. In addition, in order to show the relationship between the respective units at each stage of the process in an easy-to-understand manner, a configuration that is not directly related to the process at the stage or a reference numeral to be attached thereto may be omitted. In addition, since the operation is the same except when a processing object held on the upper stage 41 is a plate PP and a substrate SB, the plate PP and the substrate SB are shown in common in the figure. Will be read as appropriate.

  In this pattern forming process, the plate PP corresponding to the pattern to be formed is first loaded into the initialized pattern forming apparatus 1 and set on the upper stage 41 (step S101). A blanket BL on which such a coating layer is formed is carried and set on the lower stage 61 (step S102). The plate PP is loaded with the effective surface corresponding to the pattern facing downward, and the blanket BL is loaded with the coating layer facing upward.

  FIG. 8 shows a process until the plate PP or the substrate SB is carried into the apparatus and set on the upper stage 41. As shown in FIG. 8A, in the initial state, the upper stage 41 is retracted upward and the distance from the lower stage 61 is increased, and a wide processing space SP is formed between both stages. Each hand 625 is retracted below the upper surface of the lower stage 61. The transfer roller 641 is the position closest to the (−X) direction among the positions facing the opening window 611 of the lower stage 61, and the position retracted below the upper surface of the lower stage 61 in the vertical direction (Z direction). is there. Each control valve connected to the negative pressure supply unit 804 is closed.

  In this state, from the front side of the apparatus, that is, from the (−Y) direction to the (+ Y) direction, the plate PP placed on the external plate hand HP is processed after its thickness is measured in advance. It is carried into the space SP. The plate hand HP may be an operation jig manually operated by an operator, or may be a hand of an external transfer robot. At this time, since the hand 625 and the transfer roller 641 are retracted downward, the carrying-in operation can be facilitated. When the plate PP is positioned at a predetermined position, the upper stage 41 is lowered as indicated by an arrow.

  When the upper stage 41 is lowered to a predetermined position close to the plate PP, the suction pad 443 provided on the upper stage 41 is below the lower surface of the upper stage 41, that is, the holding plane 41a, as shown in FIG. Until it touches the upper surface of the plate PP. When the control valve connected to the suction pad 443 is opened, the upper surface of the plate PP is sucked by the suction pad 443 and the plate PP is held. Then, the plate PP is lifted from the plate hand HP by raising the suction pad 443 while continuing the suction. At this point, the plate hand HP moves out of the apparatus.

  Finally, as shown in FIG. 8C, the lower surface of the suction pad 443 rises to a position that is the same height as or slightly higher than the holding plane 41a, so that the upper surface of the plate PP becomes higher than that of the upper stage 41. It is held in close contact with the holding plane 41a. A configuration may be adopted in which suction grooves or suction holes are provided on the lower surface of the upper stage 41 so as to suck the plate PP. In this way, the holding of the plate PP is completed. By the same procedure, the substrate SB can be loaded by the substrate hand HS.

  9 and 10 show a process from the loading of the plate PP until the blanket BL is loaded and held on the lower stage 61. FIG. When the holding of the plate PP by the upper stage 41 is completed, as shown in FIG. 9A, the upper stage 41 is raised to form a wide processing space SP again, and each hand 625 is moved from the upper surface 61 a of the lower stage 61. Also raise to the top. At this time, the upper surfaces 625a of the hands 625 are all set to the same height.

  In this state, as shown in FIG. 9B, the blanket BL having the coating layer PT made of the patterning material formed on the upper surface is placed on the external blanket hand HB and carried into the processing space SP. Accept. The thickness of the blanket BL is measured prior to loading. The blanket hand HB is preferably of the fork type having fingers extending in the Y direction so that the blanket hand HB can enter through the gap without interfering with the hand 625.

  When the blanket hand HB descends after entering or the hand 625 rises, the upper surface 625a of the hand 625 comes into contact with the lower surface of the blanket BL. Thereafter, as shown in FIG. Is supported by By supplying a negative pressure to the suction hole 625b (FIG. 4) provided in the hand 625, the support can be made more reliable. Thus, the blanket BL is transferred from the blanket hand HB to the hand 625, and the blanket hand HB can be discharged out of the apparatus.

  Thereafter, as shown in FIG. 10A, the hand 625 is lowered with the height of the upper surface 625 a of each hand 625 aligned, and finally the hand upper surface 625 a is made to be the same height as the upper surface 61 a of the lower stage 61. . As a result, the peripheral portions of the four sides of the blanket BL abut against the upper surface 61 a of the lower stage 61.

  At this time, as shown in FIG. 10B, a negative pressure is supplied to the vacuum suction groove 612 provided on the lower stage upper surface 61a to suck and hold the blanket BL. Accordingly, the suction with the hand 625 is released. As a result, the blanket BL is in a state in which the peripheral portions of the four sides are sucked and held by the lower stage 61. In FIG. 10B, the blanket BL and the hand 625 are separated to clearly indicate that the suction holding by the hand 625 has been released, but in actuality, the lower surface of the blanket BL is in contact with the upper surface 625a of the hand. Is maintained.

  If the hand 625 is separated in this state, it is considered that the blanket BL is bent downward at its center by its own weight, and has a convex shape as a whole. By maintaining the hand 625 at the same height as the lower stage upper surface 61a, it is possible to suppress the bending and maintain the blanket BL in a planar state. In this way, the blanket BL is held by the lower stage 61 by suction and the central portion is supplementarily supported by the hand 625, and the holding of the blanket BL is completed.

  The order of loading the plate PP and the blanket BL may be reversed. However, when the plate PP is loaded after the blanket BL is loaded, there is a risk that foreign matter may fall on the blanket BL when the plate PP is loaded, thereby contaminating the coating layer PT with the pattern forming material or causing defects. By setting the blanket BL on the lower stage 61 after setting the plate PP on the upper stage 41 as described above, such a problem can be avoided in advance.

  Returning to FIG. 7, when the plate PP and the blanket BL are set on the upper and lower stages in this way, the plate PP and the blanket BL are pre-aligned (step S103). Furthermore, gap adjustment is performed so that both face each other across a preset gap (step S104).

  FIG. 11 is a diagram illustrating a process of gap adjustment processing and alignment processing. Among them, the precision alignment process shown in FIG. 11C is a process necessary only for the transfer process described later, and will be described in the later description of the transfer process. As described above, the plate PP, the substrate SB, or the blanket BL is carried in from the outside, but a positional shift may occur during the delivery. The pre-alignment process is a process for roughly positioning the plate PP or substrate SB held on the upper stage 41 and the blanket BL held on the lower stage 61 at positions suitable for the subsequent processes.

  FIG. 11A is a side view schematically showing the arrangement of a configuration for executing pre-alignment. As described above, in this embodiment, a total of six pre-alignment cameras 241 to 246 are provided in the upper part of the apparatus. Among these, the three cameras 241 to 243 are substrate pre-alignment cameras for detecting the outer edge of the plate PP (or the substrate SB) held on the upper stage 41. The other three cameras 244 to 246 are blanket pre-alignment cameras for detecting the outer edge of the blanket BL. Here, the pre-alignment cameras 241 to 243 are referred to as “substrate pre-alignment cameras” for the sake of convenience, but these can be used for both the alignment of the plate PP and the alignment of the substrate SB. The processing contents are also the same.

  As shown in FIGS. 1 and 11 (a), the substrate pre-alignment cameras 241 and 242 are installed at substantially the same position in the X direction and different positions in the Y direction. The (-X) side outer edge is imaged from above. Since the upper stage 41 is formed in a plane size slightly smaller than the substrate SB, the (-X) side outer edge portion of the plate PP (or the substrate SB) extending outward from the end portion of the upper stage 41 is imaged from above. be able to. Further, although not shown in the figure, another substrate pre-alignment camera 243 is provided on the front side of the paper surface of FIG. 11A, and the camera 243 is (−) of the plate PP (or the substrate SB). Y) Take an image of the side outer edge from above.

  On the other hand, the blanket pre-alignment cameras 244 and 246 are installed in substantially the same position in the X direction and different positions in the Y direction, and the (+ X) side outer edge portion of the blanket BL placed on the lower stage 61. Are imaged from above. Further, another blanket pre-alignment camera 245 is provided on the front side of FIG. 11A, and the camera 245 images the outer edge of the blanket BL on the (−Y) side from above.

  The positions of the plate PP (or the substrate SB) and the blanket BL are grasped from the imaging results of these pre-alignment cameras 241 to 246, respectively. Then, when the upper stage block support mechanism 482 and the alignment stage support mechanism 605 operate as necessary, the plate PP (or the substrate SB) and the blanket BL are respectively positioned at preset target positions.

  When the blanket BL is moved horizontally together with the lower stage 61, it is preferable that the upper surface 625a of each hand 625 and the lower surface of the blanket BL are slightly separated from each other as shown in FIG. For this purpose, the gas supplied from the gas supply unit 806 can be discharged from the suction hole 625 b of the hand 625. The same applies to the precision alignment process described later.

  In addition, for a thin or large substrate SB that is likely to be bent, the substrate SB may be subjected to processing with a plate-like support member in contact with the back surface, for example, in order to facilitate handling. In such a case, even if the support member is larger than the substrate SB, for example, the support member is made of a transparent material, or a partially transparent window or through hole is provided in the support member. If the position of the outer edge portion is set to be easy to detect, pre-alignment processing similar to the above can be performed.

  Next, as shown in FIG. 11B, the upper stage 41 holding the plate PP is lowered with respect to the lower stage 61 holding the blanket BL, and a gap G between the plate PP and the blanket BL is determined in advance. To the set value. At this time, the thicknesses of the plate PP and the blanket BL measured in advance are taken into consideration. That is, the distance between the upper stage 41 and the lower stage 61 is adjusted so that the gap between the plates PP and the blanket BL takes a predetermined value in consideration of the thickness. The gap value G here can be set to about 300 μm, for example.

  Regarding the thicknesses of the plate PP and the blanket BL, there are individual differences due to dimensional variations in manufacturing, and even for the same part, for example, a change in thickness due to swelling is conceivable. Further, the gap G may be defined between the lower surface of the plate PP and the upper surface of the blanket BL, and between the lower surface of the plate PP and the upper surface of the coating layer PT of the pattern forming material carried on the blanket BL. May be defined between. As long as the thickness of the coating layer PT is strictly controlled in the coating stage, it is technically equivalent.

  Returning to FIG. 7, when the plate PP and the blanket BL are arranged to face each other with a gap G therebetween, the plate PP is moved by moving the transfer roller 641 in the X direction while contacting the lower surface of the blanket BL. And the blanket BL are brought into contact with each other. Thereby, the coating layer PT of the pattern forming material on the blanket BL is patterned by the plate PP (patterning process; step S105).

  FIG. 12 shows the patterning process. Specifically, as shown in FIG. 12A, the transfer roller 641 is raised to a position immediately below the blanket BL, and the center line of the transfer roller 641 is substantially the same as the end of the plate PP in the X direction. Alternatively, the transfer roller 641 is disposed at a position slightly deviated in the (−X) direction. In this state, as shown in FIG. 12B, the transfer roller 641 is further raised and brought into contact with the lower surface of the blanket BL, and the blanket BL at the contacted position is locally pushed upward. As a result, the blanket BL (more precisely, the coating layer PT of the pattern forming material carried on the blanket BL) is pressed against the lower surface of the plate PP with a predetermined pressing force. Since the transfer roller 641 is longer than the plate PP (and the effective region) in the Y direction, an elongated region along the Y direction from one end to the other end in the Y direction on the lower surface of the plate PP contacts the blanket BL.

  Thus, the lifting mechanism 644 travels in the (+ X) direction while the transfer roller 641 presses the blanket BL, thereby moving the push-up position of the blanket BL in the (+ X) direction. At this time, in order to prevent the hand 625 from coming into contact with the transfer roller 641, as shown in FIG. 12C, at least the hand 625 with respect to the hand 625 whose X-direction distance to the transfer roller 641 is equal to or smaller than a predetermined value. The upper surface 625a is retracted downward until it is positioned lower than the lower surface of the support frame 642.

  Since the suction by the hand 625 has already been released, the blanket BL is not lowered downward as the hand 625 is lowered. Further, by appropriately managing the timing of starting the descent in synchronization with the travel of the transfer roller 641, it is possible to prevent the blanket BL that has lost support by the hand 625 from drooping downward due to its own weight.

  FIG. 13 shows the running process of the transfer roller 641. Since the plate PP and the blanket BL that have been in contact with each other are maintained in close contact with each other through the coating layer PT of the pattern forming material, the plate PP is moved along with the travel of the transfer roller 641 as shown in FIG. And the area where the blanket BL is in close contact gradually expands in the (+ X) direction. At this time, as shown in the figure, the hand 625 is sequentially lowered as the transfer roller 641 approaches.

  Finally, as shown in FIG. 13B, all the hands 625 are lowered, and the transfer roller 641 reaches the (+ X) side end portion below the lower stage 61. At this time, the transfer roller 641 has reached a position substantially directly below or slightly to the (+ X) side of the end of the (+ X) side of the plate PP, and the entire lower surface of the plate PP is applied to the coating layer PT on the blanket BL. Abutted.

  While the transfer roller 641 travels while maintaining a constant height, the area of the area pressed by the transfer roller 641 on the lower surface of the blanket BL is constant. Therefore, when the lifting mechanism 644 applies a constant load and presses the transfer roller 641 against the blanket BL, the plate PP and the blanket BL are pressed against each other with a constant pressing force with the coating layer PT of the pattern forming material interposed therebetween. Will be. Thereby, patterning from the plate PP to the blanket BL can be performed satisfactorily.

  In patterning, it is ideal that the entire surface area of the plate PP can be used effectively. However, an area that cannot be effectively used due to scratches, contact with the hand during transportation, or the like is unavoidable at the periphery of the plate PP. To occur. As shown in FIG. 13B, when the central area excluding the end area of the plate PP is an effective area AR that functions effectively as a plate, at least the effective area AR has a pressing force and a traveling speed of the transfer roller 641. It is desirable that is constant. For this purpose, the length of the transfer roller 641 in the Y direction needs to be longer than the length of the effective area AR in the same direction. In the X direction, the transfer roller 641 starts traveling from a position on the (−X) side of the end of the effective area AR in the (−X) direction, and reaches at least the end of the effective area AR in the (+ X) direction. Until then, it is desirable to maintain a constant speed. The surface area of the blanket BL facing the effective area AR of the plate PP is the effective area on the blanket BL side.

  FIG. 14 shows the positional relationship between the plate or substrate and the blanket. More specifically, this figure is a plan view of the positional relationship when the plate PP or the substrate SB contacts the blanket BL as viewed from above. As shown in the figure, the blanket BL has a larger planar size than the plate PP or the substrate SB. The region R1 near the peripheral edge with dots in the drawing in the blanket BL is a region that abuts the lower stage upper surface 61a when held by the lower stage 61. The blanket BL is held by the lower stage 61 in a state where the lower surface of the inner region is open.

  The plate PP and the substrate SB are substantially the same size, and these are smaller than the opening window size of the lower stage 61. The effective area AR that is effectively used for actual pattern formation is smaller than the size of the plate PP or the substrate SB. Therefore, the area corresponding to the effective area AR in the blanket BL is in a state where the lower surface is opened and faces the opening window 611 of the lower stage 61.

  A hatched region R2 indicates a region (pressing region) that is simultaneously pressed by the transfer roller 641 on the lower surface of the blanket BL. The pressing region R2 is an elongated region extending in the roller extending direction, that is, the Y direction, and both end portions in the Y direction extend to the outside from the end portions of the plate PP or the substrate SB, respectively. Therefore, when the transfer roller 641 presses the blanket BL in a state parallel to the lower surface of the blanket BL, the pressing force is uniform in the Y direction from one end to the other end of the effective area AR in the Y direction. is there.

  Thus, the transfer roller 641 moves in the X direction while applying a uniform pressing force in the Y direction to the effective area AR, so that the plate PP or the substrate SB and the blanket BL are uniformly pressed in the entire effective area AR. They are pressed against each other by pressure. Thereby, it is possible to prevent pattern damage due to non-uniform pressing and to form a high quality pattern.

  When the transfer roller 641 reaches the end on the (+ X) side in this way, the transfer roller 641 stops running, and the transfer roller 641 is retracted downward as shown in FIG. Thereby, the transfer roller 641 is separated from the lower surface of the blanket BL, and the patterning process is completed.

  Returning to FIG. 7, when the patterning process is completed in this way, the plate PP and the blanket BL are carried out (step S106). FIG. 15 shows the process of carrying out the plate and blanket. First, as shown in FIG. 15A, each hand 625 that has been lowered during the patterning process is raised again to position the upper surface 625 a at the same height as the upper surface 61 a of the lower stage 61. In this state, the adsorption of the plate PP by the adsorption pad 443 of the upper stage 41 is released. As a result, the holding of the plate PP by the upper stage 41 is released, and a laminated body in which the plate PP and the blanket BL are integrated via the coating layer PT of the pattern forming material is left on the lower stage 61. The center of the laminate is supported by the hand 625.

  Subsequently, as shown in FIG. 15B, the upper stage 41 is lifted to form a wide processing space SP, the suction by the groove 612 of the lower stage 61 is released, and the hand 625 is further lifted to lower the lower stage. Move upward from 61. At this time, it is preferable that the laminate is sucked and held by the hand 625.

  This makes it possible to access from the outside. Therefore, as shown in FIG. 15C, the blanket BL with the plate PP in close contact is carried out by accepting the blanket hand HB from the outside and performing the reverse operation to that during loading. . If the plate PP thus adhered is peeled from the blanket BL by an appropriate peeling means, a predetermined pattern is formed on the blanket BL.

  Next, a case where the pattern formed on the blanket BL is transferred to the substrate SB that is the final object will be described. The process is basically the same as in the patterning process. That is, as shown in FIG. 7, first, the substrate SB is set on the upper stage 41 (step S107), and then the blanket BL after pattern formation is set on the lower stage 61 (step S108). Then, after pre-alignment processing and gap adjustment between the substrate SB and the blanket BL (steps S109 and S110), the pattern on the blanket BL is transferred to the substrate SB by running the transfer roller 641 below the blanket BL. (Transfer process; Step S112). After the transfer is completed, the integrated blanket BL and the substrate SB are carried out, and the process ends (step S113). These series of operations are also the same as those shown in FIGS. In these drawings, when the plate PP is read as the substrate SB, the symbol PT means a pattern after the patterning process.

  However, in the transfer process, in order to properly transfer the pattern to a predetermined position on the substrate SB, before the substrate SB and the blanket BL are brought into contact with each other, a more precise alignment (precise alignment process) between the two is performed ( Step S111). FIG. 11C shows the process.

  Although not shown in FIG. 1, the pattern forming apparatus 1 is provided with a precision alignment camera CM supported by a support column erected in the (+ Z) direction from the base frame 21. A total of four precision alignment cameras CM are provided with their optical axes oriented vertically upward so as to respectively image the four corners of the substrate SB through the opening window 611 of the lower stage 61.

  On the four corners of the substrate SB, alignment marks (substrate-side alignment marks) serving as position references are formed in advance. On the corresponding positions of the blanket BL, blanket-side alignment is performed as a part of the pattern patterned by the plate PP. A mark is formed. These are imaged with the same field of view of the precision alignment camera CM, and the positional relationship between them is obtained by obtaining the positional relationship between them, and the amount of movement of the blanket BL that corrects this is obtained. By moving the alignment stage 601 by the obtained movement amount by the alignment stage support mechanism 605, the lower stage 61 moves in the horizontal plane, and the positional deviation between the substrate SB and the blanket BL is corrected.

  The substrate SB and the blanket BL are opposed to each other with a small gap G, and the alignment marks formed on the substrates SB and the blanket BL are imaged with the same camera, so that the substrate SB and the blanket BL can be aligned with high accuracy. It can be carried out. In this sense, the alignment process can be said to be a highly accurate precision alignment process compared to the case where the substrate SB and the blanket BL are individually imaged and the position is adjusted. By bringing them into contact with each other from this state, in this embodiment, it is possible to form a pattern that is accurately aligned with a predetermined position of the substrate SB. Then, by performing pre-alignment processing of the substrate SB and the blanket BL in advance, alignment marks respectively formed on the substrate SB and the blanket BL can be positioned within the field of view of the precision alignment camera CM.

  It should be noted that such a precise alignment process is not necessarily required when forming a pattern on the blanket BL using the plate PP. This is because the blanket side alignment mark is preliminarily formed on the plate PP together with the pattern, so that there is no positional deviation between the pattern formed on the blanket BL and the blanket side alignment mark. This is because a slight misalignment between the plate PP and the blanket BL does not affect pattern formation as long as precise alignment is performed between the side alignment mark and the substrate side alignment mark. From this point, only the pre-alignment process is executed in the patterning process.

  In the pattern forming apparatus 1 of the present embodiment configured as described above, the blanket BL held on the lower stage 61 is pushed up from below by the transfer roller 641, so that the plate PP or the substrate SB held on the upper stage 41 is applied. On the other hand, it is possible to press the blanket BL with a constant pressing force. One of the reasons is the configuration of the beam-like structure 43 and the transfer roller unit 64. This point will be described with reference to FIG.

  FIG. 16 is a diagram schematically showing the relationship between the extending direction of the beam member and the roller moving direction. FIG. 16A shows a comparative example in which a beam member BM supporting the upper stage ST is extended in a direction Db orthogonal to the moving direction Dr of the transfer roller R, unlike the present embodiment. In such a configuration, as shown in FIG. 16B, when the transfer roller R presses the blanket BL against the upper stage ST, a pressing force Fr locally applied from the transfer roller R to the upper stage ST is applied to the upper stage ST. If the position is deviated from the center of gravity position, this force becomes an unbalanced load on the upper stage ST. Due to this uneven load, one end of the upper stage ST is pushed up around an axis parallel to the direction Db, and thereby the gap between the plate PP or the substrate SB and the blanket BL varies. Further, as in the case of the point P shown in the figure, the plate PP or the substrate SB and the blanket BL may come into contact with each other in a severe case.

  Such displacement of the upper stage ST is caused by elastic bending of each member constituting the apparatus, and in the case where the upper stage ST is integrally lifted and lowered with the beam member BM, in the movable part thereof. Some are caused by play and play, which remain even if the rigidity of the member is increased.

  On the other hand, as shown in FIG. 16C, in this embodiment, the longitudinal direction of the transfer roller 641 is orthogonal to the extending direction Db of the beam-like structure 43, and the moving direction Dr of the transfer roller 641 is parallel. It is a relationship. Therefore, the offset load caused by the roller pressing force Fr acts in the direction in which the beam-like structure 43 is rotated around the axis orthogonal to the longitudinal direction, and therefore the displacement of the upper stage 41 caused by this offset load is extremely small. Become. Further, by making the cross-sectional shape of the beam-like structure 43 vertically long or by appropriately providing a reinforcing member, it is possible to increase the yield strength relatively easily against bending of the beam-like structure 43 due to an offset load.

  In addition, while supporting the beam-like structure 43 by providing a pair of support columns 45 and 46 on both sides of the beam-like structure 43 with the upper stage 41 interposed therebetween, the beam-like structure is supported so as to be movable up and down. It is possible to suppress torsion due to the uneven load.

  As described above, in this embodiment, the lower stage 61 functions as the “first holding means” of the present invention, and the upper stage 41 functions as the “second holding means” of the present invention. . Further, the support columns 45 and 46 function as “a pair of support members” of the present invention, and the main frame 2 functions as a “base portion” of the present invention. The beam-like structure 43 functions as the “beam member” of the present invention. The transfer roller 641 functions as the “pressing member” of the present invention, while the lifting mechanism 644 functions as the “moving part” of the present invention, and these function integrally as the “pressing means” of the present invention. ing. Further, in this embodiment, the plate PP and the substrate SB correspond to the “processing object” of the present invention.

  The present invention is not limited to the above-described embodiment, and various modifications other than those described above can be made without departing from the spirit of the present invention. For example, in the above embodiment, the plate PP or the substrate SB and the blanket BL are all held by vacuum suction, but the holding mode is not limited to this and is arbitrary.

  Further, for example, in the above embodiment, the upper stage 41 is lifted and lowered integrally with the beam-like structure 43. However, the above-described problem of uneven load occurs regardless of whether or not the beam member is lifted or lowered. The invention is also effective in such an apparatus that does not have a function of raising and lowering the beam member.

  The beam-like structure 43 in the above embodiment is configured by combining metal flat plates. However, the beam member is not limited to the one disclosed here, and for example, a cross-sectional shape such as H-type, I-type, or C-type. Various members that can obtain the required strength even with a light weight, such as extruded members having a thickness and members having a honeycomb structure, can be applied in combination as necessary.

  Further, for example, in the above-described embodiment, the four side peripheral portions of the rectangular blanket BL are held by the annular lower stage 61. However, as long as the posture of the blanket is maintained, a part of the peripheral portion may be opened. . However, it is preferable to hold at least both end portions in the roller running direction (X direction) in order to prevent a positional shift associated with the roller running.

  This invention is one of a pattern forming process for forming a pattern on various substrates such as a glass substrate and a semiconductor substrate, a process for patterning a pattern forming material on a blanket with a plate, and a process for transferring the pattern on the blanket to the substrate. Or it is applicable suitably with respect to both.

2 Main frame (base part)
41 Upper stage (second holding means)
43 Beam-like structure (beam member)
45,46 Support pillar (a pair of support members)
61 Lower stage (first holding means)
641 Transfer roller (pressing member, pressing means)
644 Lifting mechanism (moving part, pressing means)
PP version (object to be processed)
SB substrate (object to be processed)

Claims (6)

Using a plate for patterning a pattern forming material or a substrate onto which a pattern is transferred as a processing target, the processing target is brought into contact with a blanket carrying the pattern forming material on one surface to form a pattern. A pattern forming device,
First holding means for holding the blanket in a horizontal posture with the one surface facing upward;
A second holding means having a holding plane having a plane size equal to or larger than the plane size of the processing object, and holding the one surface of the processing object in contact with the holding plane;
A beam member that extends in a horizontal direction so as to straddle the second holding means, and that supports the second holding means with the holding plane facing the one surface of the blanket held by the first holding means; ,
A pair of support members that support the beam members so as to be movable up and down at both side positions sandwiching the second holding means among the beam members;
From the other surface side opposite to the one surface of the blanket, the blanket is partially pressed toward the second holding means side with a uniform pressing force in a direction orthogonal to the extending direction of the beam member. A pattern forming apparatus comprising: a pressing unit that is brought into contact with the object to be processed held by a second holding unit and that moves the pressing position of the blanket in parallel with the extending direction of the beam member.   The said pressing means gives uniform pressing force with respect to the area | region where the length in the direction orthogonal to the extending direction of the said beam member is longer than the length of the said process target object in this direction among the said blankets. 2. The pattern forming apparatus according to 1.   The pressing means supports a pressing member that presses the blanket in contact with the blanket in a pressing region whose longitudinal direction is a direction orthogonal to the extending direction of the other surface of the blanket, and the pressing member. The pattern forming apparatus according to claim 1, further comprising: a moving unit that moves in the extending direction while contacting the blanket.   The pattern forming apparatus according to claim 3, wherein the pressing member is a roller that is rotatably supported by the moving unit and has a rotation axis in a direction orthogonal to the extending direction.   The pattern forming apparatus according to claim 1, wherein the beam member moves in a vertical direction while keeping the extending direction horizontal.   The pair of support members are respectively fixed to a common base portion, and the pressing means is supported to be movable in the extending direction with respect to the base portion. Pattern forming device.

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