JP5620553B2 - Processing information supply device - Google Patents

Description

  The present invention relates to a machining information supply apparatus for supplying machining information applied to a laser machining apparatus for cutting a workpiece along a planned cutting line, and a machining information supply system using the machining information supply apparatus. .

  Conventionally, as a method of cutting a workpiece such as a semiconductor wafer, the laser beam is irradiated with a focusing point inside the workpiece to be a starting point for cutting along the planned cutting line. A method for forming a modified region inside a workpiece is known (see, for example, Patent Documents 1 to 4). In this processing method, a cutting start region is formed by the modified region along the planned cutting line by irradiating the processing target with laser light while scanning the condensing point. Then, the workpiece is cut using the cutting start region as a starting point.

Japanese Patent No. 3408805 Japanese Patent No. 3708102 JP 2007-75886 A JP 2006-43713 A

  As an example of a laser processing apparatus using the above processing method, there is a processing apparatus that uses a laser beam having a wavelength that is transmissive to a wafer-shaped processing target to form a modified region inside the processing target. . In such a configuration, the laser beam applied to the workpiece is transmitted without damaging the workpiece, but the laser beam is focused at the internal condensing point and locally very high laser beam power. Density is obtained. At this time, a modified region is formed inside the processing object by the absorption phenomenon due to the high power density at the condensing point inside the processing object.

  In such a processing method, depending on the type and shape of the workpiece, the conditions for forming the modified region necessary for cutting the workpiece and the processing conditions for forming such a modified region are large. Come different. In addition, in order to set processing conditions according to such a processing target, it is necessary to accumulate processing knowledge and processing data regarding laser processing. For this reason, in the laser processing apparatus described above, the processing conditions such as the irradiation conditions of the laser beam are appropriately set on the side of the person who actually performs the cutting process (the user of the laser processing apparatus) so as to suit each processing object. There is a problem that it is difficult to do.

  The present invention has been made to solve the above-described problems, and a machining information supply apparatus and machining information supply capable of suitably obtaining machining information applied to a laser machining apparatus on the side of the machine. The purpose is to provide a system.

In order to achieve such an object, the processing information supply apparatus according to the present invention irradiates a laser beam with a converging point inside the processing object, along the planned cutting line of the processing object, A processing information supply device that supplies processing information applied to a laser processing device that forms a modified region that is a starting point of cutting inside a processing target, and (1) inputs processing target information about the processing target. Target information input means for processing, and (2) processing in which data on processing conditions for forming a modified region in the processing target object by irradiation with laser light according to processing target information in the laser processing apparatus is accumulated A processing database for the processing object based on the processing object information input from the target information input means with reference to the condition database and (3) the processing condition data included in the processing condition database. A processing condition setting means for setting a, (4) and an condition information output means for outputting processing condition information about the set machining conditions in the machining condition setting means, object information input means, as processing object information, the processing The thickness of the object and the incident condition of the laser beam on the object to be processed are input as essential information, and as the incident condition of the laser beam, either the front surface incident or the back surface incident of the laser beam on the object to be processed is specified. Detailed information about the processing object is inputted as arbitrary information, and the processing condition setting means refers to the thickness of the processing object and the incident condition of the laser beam in the setting of the processing condition. Determine whether it is incident or back-illuminated, and if surface incidence is specified, refer to the thickness of the workpiece under the conditions of laser light surface incidence. If machining conditions are extracted from the machining condition database, basic machining conditions are set, and back-side incidence is specified, the machining conditions are referenced from the machining condition database by referring to the thickness of the workpiece under the back-side incidence conditions of the laser beam. The basic machining conditions are extracted, and when detailed information is input, the machining conditions are optimized by referring to the detailed information, and the detailed machining conditions are set. For the thickness of the workpiece, prepare multiple thickness ranges as a reference, and set the basic machining conditions with reference to the thickness of the workpiece. As a processing condition of the thickness range corresponding to the thickness, a thickness range in which the thickness of the input processing target object is within the range among the plurality of thickness ranges is determined, and the processing target object within the thickness range is determined. Machining conditions for typical values of thickness Extracted from the machining condition database, set basic machining conditions for the workpiece based on the extracted machining conditions, and set the basic machining conditions based on the extracted machining conditions. If the values match, the extracted machining conditions are set as basic machining conditions as they are, and if they do not match, the input is made for the extracted machining conditions with optimization according to the difference between the thickness and the representative value of the workpiece, characterized in that you set the basic processing conditions.

  In the processing information supply device described above, the processing conditions for cutting a processing target such as a semiconductor wafer using a laser processing device are stored by associating the specific processing conditions with the processing target information and accumulating data. The processing condition setting means sets a processing condition to be applied to the processing object with reference to data in the processing condition database. Thereby, the processing conditions in the laser processing apparatus according to the processing target information about the type and shape of the processing target can be suitably set.

  Furthermore, for such machining condition setting means and machining condition database, target information input means for inputting machining target information used for setting machining conditions, and condition information for outputting the set machining condition information Output means. According to such a configuration, the processing information to be applied to the laser processing apparatus can be suitably acquired on the processing side by the processing person accessing the processing information supply device.

  Here, in the processing information supply apparatus described above, the target information input means and the condition information output means can be connected to a processing information acquisition apparatus for acquiring processing information applied to the laser processing apparatus via a network. It is preferable to be configured.

Further, machining information supply system includes a processing information supply device configured as described above, are connected via a network to the processing information supply apparatus, and a processing information acquisition device that acquires processing information applied to the laser processing device The processing information acquisition device may be configured to instruct the processing information supply device through the target information input unit and to acquire the processing condition information through the condition information output unit. .

  As described above, according to the configuration in which the machining information acquisition device is connected to the machining information supply device via a network such as the Internet, a processor who is a user of the laser processing device can connect the machining information acquisition device via the network. Then, a processing information supply apparatus installed in a manufacturer or the like that manufactures the laser processing apparatus is accessed. Then, by inputting necessary processing target information to the processing information supply device, it is possible to easily acquire information on processing conditions to be applied in laser processing.

  Further, the machining information supply device preferably includes a setting history storage unit that stores a setting history including at least one of the machining target information and the machining condition information with respect to the machining condition setting performed by the machining condition setting unit. Thereby, on the processing information supply apparatus side, it is possible to appropriately grasp the usage status of the information supply apparatus by the user of the laser processing apparatus or the content of the processing information required on the user side.

  For specific processing target information input to the supply device, the target information input means inputs the processing target thickness and the incident condition of the laser beam on the processing target as essential information as processing target information. In addition, it is preferable to input detailed information about the object to be processed as arbitrary information as necessary.

  Thereby, in a processing information supply apparatus, the information required for the setting of the processing conditions with respect to a laser processing apparatus can be acquired reliably. In this case, the processing condition setting means sets the basic processing condition by extracting the processing condition from the processing condition database with reference to the thickness of the processing object and the incident condition of the laser beam in setting the processing condition. If necessary, it is preferable to set the detailed machining conditions by referring to the detailed information and optimizing the machining conditions.

  Further, the object information input means inputs the thickness of the processing object as the processing object information, and the processing condition setting means prepares a plurality of thickness ranges serving as a reference for the thickness of the processing object. In the setting of conditions, the machining conditions in the thickness range corresponding to the thickness of the workpiece to be input among a plurality of thickness ranges are extracted from the machining condition database, and the workpiece is processed based on the extracted machining conditions It is preferable to set processing conditions for.

  Thereby, the processing conditions which should be applied in a laser processing apparatus can be set suitably. Further, in this case, the processing condition setting means cannot set the processing conditions for the input processing target information when the thickness of the input processing target is not within the range of the plurality of prepared thickness ranges. If there is, a setting error may be output.

  In addition, as for the processing conditions of laser processing set in the supply device, the processing condition setting means scans the condensing point along the planned cutting line with respect to the processing object as the processing conditions, and the modified region is It is preferable to set the number of scans indicating the number of times of forming the cutting start region formed continuously or intermittently, and the laser light irradiation conditions in each scan. Thereby, the processing conditions which should be applied in a laser processing apparatus can be set suitably.

  In addition, regarding the irradiation condition of the laser beam in each scan in this case, the processing condition setting means further includes the position in the thickness direction of the condensing point on the processing target as the irradiation condition of the laser beam, and the processing target. It is preferable to set the intensity condition of the laser beam irradiated to the object and the setting condition of the optical system for irradiating the workpiece with the laser beam.

  According to the processing information supply device and the supply system of the present invention, the processing conditions in the laser processing device are associated with the processing target information and data is accumulated to form a processing condition database. The processing conditions to be applied to the processing object are set with reference to the data, and target information input means for inputting the processing target information used for setting the processing conditions, and the set processing condition information is output. By providing the condition information output means, it becomes possible for the processing side to suitably acquire processing information applied to the laser processing apparatus.

It is a block diagram which shows roughly the structure of one Embodiment of the processing information supply system containing a processing information supply apparatus. It is a figure which shows typically about the laser processing method with respect to a process target object. It is a figure which shows typically about the laser processing method with respect to a process target object. It is a figure which shows typically about the laser processing method with respect to a process target object. It is a block diagram which shows an example of a laser processing apparatus roughly. It is a block diagram which shows the modification of a laser processing apparatus. It is a flowchart which shows an example of the setting method of a process condition. It is a flowchart which shows an example of the setting method of basic processing conditions. It is a flowchart which shows an example of the setting method of detailed process conditions. It is a figure which shows an example of a data structure of a process condition database typically. It is a figure which shows an example of the input screen used for the input of process target information. It is a figure which shows an example of the output screen used for the output of process condition information. It is a figure which shows an example of the operation screen used for setting operation of a process condition. It is a figure which shows an example of the operation screen used for setting operation of a process condition.

  Hereinafter, preferred embodiments of a machining information supply device and a machining information supply system according to the present invention will be described in detail with reference to the drawings. In the description of the drawings, the same elements are denoted by the same reference numerals, and redundant description is omitted. Further, the dimensional ratios in the drawings do not necessarily match those described.

  FIG. 1 is a block diagram schematically showing a configuration of an embodiment of a processing information supply system including a processing information supply apparatus according to the present invention. The processing information supply apparatus 10 shown in FIG. 1 is a modified region that becomes a starting point of cutting along a cutting target line of a processing target by irradiating a laser beam with a condensing point inside the processing target. An information supply device that supplies processing information applied to a laser processing apparatus to a processing person or the like who is a user of the laser processing apparatus. is there.

  The machining information supply apparatus 10 according to the present embodiment includes an information input / output unit 11, a machining information processing unit 15, and a machining condition database 19. The input / output unit 11 includes a target information input unit 12 and a condition information output unit 13. The target information input unit 12 is an input unit that inputs processing target information about a processing target regarding cutting processing on the processing target such as a semiconductor wafer by a laser processing apparatus. The condition information output unit 13 is an output unit that outputs processing condition information regarding the processing conditions set by the processing information processing unit 15.

  The processing information processing unit 15 includes a processing condition setting unit 16, an access management unit 17, and a setting history storage unit 18. In the supply apparatus 10, a machining condition database 19 is prepared for the machining information processing unit 15. The processing condition database 19 is a database in which data on processing conditions corresponding to processing target information in the laser processing apparatus is accumulated.

  Specifically, in the processing condition database 19, the processing conditions for forming a modified region necessary for the cutting process inside the processing object by irradiating the laser beam with respect to the laser processing apparatus to be supplied with information. Data is stored in a state associated with processing target information such as the type and shape of the processing target. Such processing condition data is based on, for example, processing knowledge, experience, processing data, etc. accumulated by performing laser processing on various processing objects on the manufacturer side that manufactures and provides the laser processing apparatus. Created. Alternatively, it is possible to create processing condition data by collecting processing data and the like acquired on the user side of the laser processing apparatus. Specific processing condition data will be described later.

  In the machining information processing unit 15, the machining condition setting unit 16 refers to the machining condition data stored in the machining condition database 19 described above, and is based on the machining target information input from the target information input unit 12. This is setting means for setting processing conditions for an object. The machining conditions set by the machining condition setting unit 16 are output to the outside as machining condition information via the condition information output unit 13 and supplied to the user of the laser machining apparatus.

  In addition, the setting history storage unit 18 is a storage unit that stores setting information as a setting history regarding the setting of the processing conditions performed based on the processing target information in the processing condition setting unit 16. Specifically, the setting history storage unit 18 stores, as necessary, information including at least one of processing target information and processing condition information as a setting history. Such setting history is stored and managed for each setting process or in the form of totalizing the setting process repeatedly executed by the processing condition setting unit 16 in response to a request for information supply from the processor. .

  The processing information supply device 10 described above includes a CPU that executes various processes necessary for information supply such as setting processing in the processing condition setting unit 16, and an input / output that functions as a target information input unit 12 and a condition information output unit 13. By an I / F, a ROM in which software programs necessary for processing operations are stored, and one or a plurality of storage devices such as an internal memory or an external storage device used for the setting history storage unit 18 and the processing condition database 19 The processing information supply server can be configured.

  Such a processing information supply apparatus 10 is prepared, for example, by a manufacturer that manufactures a laser processing apparatus and accumulates the processing information. Further, the processing information supply device (supply server) 10 shown in FIG. 1 can be connected to an external device via a network 30 such as the Internet.

  Specifically, in the machining information supply apparatus 10, the input / output unit 11 including the target information input unit 12 and the condition information output unit 13 is a machining information acquisition apparatus 31 for acquiring machining information applied to the laser machining apparatus. On the other hand, it is configured to be connectable via the network 30. Thus, a machining information supply system including the machining information supply apparatus 10 and the machining information acquisition apparatus 31 connected to each other via the network 30 is configured.

  The processing information acquisition device 31 can be configured by an information acquisition terminal such as a personal computer connected to the Internet, which is the network 30, for example. A user of the laser processing apparatus operates the information acquisition apparatus 31 to operate the information supply apparatus 10 via the target information input unit 12 to perform a cutting process using the laser processing apparatus. Is instructed to set processing conditions based on the processing target information.

  In addition, the user acquires processing condition information indicating the processing conditions set by the processing condition setting unit 16 based on the processing target information previously instructed to the information supply apparatus 10 via the condition information output unit 13. To do. At this time, the laser processing apparatus 32 that actually performs the cutting process on the processing object is automatically or manually operated by the operator based on the processing condition information acquired by the processing information acquisition apparatus 31. 32 is operated, and the workpiece is cut by it.

  The laser processing device 32 may be configured to include the function of the processing information acquisition device 31, and the laser processing device 32 may be directly connected to the processing information supply device 10 via the network 30. In this case, for example, the processing information supply device 10 may be configured to directly and remotely control the processing condition setting in the laser processing device 32. In the configuration shown in FIG. 1, an operation unit 20 including an input device 21 and a display device 22 is connected to the input / output unit 11. If necessary, the processing information can also be acquired by the operation unit 20 provided for the processing information supply apparatus 10.

  In the processing information supply device 10, in response to the fact that the processing information acquisition device 31, which is an external device, can be connected via the network 30 as described above, in the processing information processing unit 15, the access management unit 17 Is provided. The access management unit 17 is a management unit that controls access from the external processing information acquisition device 31 to the processing information supply device 10 and manages the access information.

  The effects of the machining information supply device according to the embodiment and the machining information supply system using the same will be described.

  In the processing information supply apparatus 10 and the processing information supply system shown in FIG. 1, the specific processing conditions are associated with the processing target information for cutting processing of a processing target such as a semiconductor wafer using the laser processing apparatus 32. The processing condition database 19 is prepared by accumulating data, and the processing condition setting unit 16 sets processing conditions to be applied to the processing target with reference to the data of the processing condition database 19. Thereby, the processing conditions in the laser processing apparatus 32 according to the processing target information about the type and shape of the processing target can be suitably set.

  Furthermore, for such a machining condition setting unit 16 and machining condition database 19, a target information input unit 12 for inputting machining target information used for setting machining conditions, and for outputting the set machining condition information. The input / output unit 11 including the condition information output unit 13 is provided. According to such a configuration, the processing information to be applied to the laser processing device 32 can be suitably acquired on the processing device side when the processing device accesses the information supply device 10.

  In the configuration shown in FIG. 1, in the processing information supply device 10, the target information input unit 12 and the condition information output unit 13 are connected to the processing information acquisition device 31 via a network 30 such as the Internet. Thus, a processing information supply system is configured. According to such a configuration, a processor who is a user of the laser processing apparatus 32 passes from the processing information acquisition apparatus 31 to the processing information supply apparatus 10 installed in the manufacturer of the laser processing apparatus via the network 30. to access. Then, by inputting necessary processing target information to the information supply apparatus 10, it is possible to easily acquire information on processing conditions to be applied in laser processing.

  In the present embodiment, in the machining information supply apparatus 10, the setting history storage unit 18 that stores a setting history including at least one of the machining target information and the machining condition information with respect to the machining condition setting performed by the machining condition setting unit 16. Is provided. As a result, on the processing information supply apparatus 10 side, it is possible to easily grasp the usage status of the information supply apparatus 10 by the user of the laser processing apparatus. Further, for example, by storing the processing target information input by the user as a setting history, it is possible to grasp the content of the processing information required by the user or the tendency thereof.

  The processing information supply device 10 and the supply system having such a configuration use a laser beam having a wavelength that is transmissive to a wafer-like processing target, and form a modified region inside the processing target. It can apply suitably for supply of the processing information about. That is, in such a laser processing apparatus, a modified region serving as a starting point for cutting is formed inside the object to be processed by using a laser beam having a wavelength that is transmissive. In such a processing apparatus, in order to accurately cut the workpiece, for example, the size of the modified region, the formation position of the modified region in the thickness direction of the workpiece, the number of modified regions in the thickness direction The processing conditions in the cutting process on the processing object including the forming conditions of the modified region such as the forming pitch of the modified region along the planned cutting line vary greatly depending on the type and shape of the processing object. On the other hand, by using the processing information supply apparatus 10 having the above-described configuration, it is possible to reliably supply information about the optimal processing conditions corresponding to each processing object to the processing person.

  Further, in the machining information supply apparatus 10 having the above-described configuration, for the machining condition setting unit 16 and the machining condition database 19, a machining condition setting program and a database are prepared separately, and the program reads the necessary data from the database while machining conditions are read. It can be set as the structure which performs this setting. Alternatively, a configuration in which the contents of the database are included in the machining condition setting program itself may be used.

  The processing information supply device and the supply system according to the present invention will be further described together with specific configuration examples and the like.

  First, a specific example of a laser processing apparatus that is a target of information supply by the above-described processing information supply apparatus 10 will be described. In the laser processing apparatus described below, a modified region serving as a starting point for cutting is formed inside a workpiece (see Patent Documents 1 to 4). In such a processing method, as described above, laser light having a wavelength that is transmissive to the object to be processed is used as laser light for cutting. Such a laser processing method will be briefly described with reference to FIGS.

  FIG. 2 is a diagram schematically showing a laser processing method of a processing object using laser light having a wavelength that becomes transparent. FIG. 2A is a top view of the processing object, and FIG. Shows a cross-sectional view of the workpiece on a plane orthogonal to the planned cutting line. As shown in FIG. 2A, a scheduled cutting line 42 for cutting the workpiece 40 is set on the surface 41 of the workpiece 40 such as a wafer (flat plate). . The planned cutting line 42 is an imaginary line extending linearly.

  In this laser processing method, as shown in FIG. 2B, the laser beam L is irradiated with the focused point P inside the object to be processed 40, so that the cutting point becomes the starting point of cutting at the focused point P. A quality region 43 is formed. In addition, the condensing point P is a location where the laser light L is condensed. Further, the planned cutting line 42 is not limited to a straight line, but may be a curved line, or may be a line actually drawn on the workpiece 40 without being limited to a virtual line.

  Then, the laser beam L is relatively moved along the planned cutting line 42 in the direction of arrow A in FIG. 2A, and the condensing point P by the laser beam L is scanned along the planned cutting line 42. Thereby, as shown in the cross-sectional view along the planned cutting line 42 in FIG. 3A, a plurality of modified regions 43 are formed inside the workpiece 40 along the planned cutting line 42. The region 43 becomes the cutting start region 46.

  As the laser beam L for forming the modified region 43, it is preferable to use a pulsed laser beam. Alternatively, continuous laser light may be used. Further, the cutting start region 46 means a region that becomes a starting point of cutting (cracking) when the workpiece 40 is cut. The cutting starting region 46 may be formed by continuously forming the modified region 43, or may be formed as a modified region row in which the modified region 43 is formed intermittently. There is also.

  In such a laser processing method, the laser beam L is absorbed in the processing object 40 so that the processing object 40 generates heat and the modified region 43 is not formed. Thus, the laser beam L is transmitted through the workpiece 40, and the modified region 43 is formed inside the workpiece 40. Therefore, since the laser beam L is hardly absorbed by the surface 41 of the workpiece 40, the surface 41 of the workpiece 40 is not melted (stealth dicing).

  When the cutting start region 46 composed of the modified region 43 is formed inside the workpiece 40, cracks are likely to occur from the region 46 as a starting point. For this reason, as shown in FIG. 4, the workpiece 40 can be cut along the planned cutting line 42 with a relatively small force. Thereby, it becomes possible to cut | disconnect the processing target object 40 with high precision, without generating an unnecessary crack in the surface 41 of the processing target object 40. FIG.

  As a cutting method of the processing target object 40 in this case, for example, after the cutting start point region 46 is formed, the processing target object 40 is started from the cutting start point region 46 by applying an artificial force to the processing target object 40. There is a method of cracking and cutting the workpiece 40. Alternatively, by forming the cutting start region 46, a method in which the cutting target region 46 is naturally cracked in the cross-sectional direction (thickness direction) of the processing target 40 and the processing target 40 is cut as a result. There is.

  In addition, as a specific example of the modified region 43 formed inside the workpiece 40 by the laser processing method, (1) the modified region is a crack region including one or more cracks. (2) The modified region is a melting treatment region, and (3) The modified region is a refractive index change region.

  As for the cutting starting point region 46 by the modified region 43, if the workpiece 40 is relatively thin, one cutting starting point region 46 may be formed as shown in FIG. On the other hand, if the workpiece 40 is thick, the number of scans for scanning the condensing point P along the planned cutting line 42 with respect to the workpiece 40 may be two or more. In this case, as shown in an example in which, for example, three cutting start regions 46, 47, and 48 are formed in FIG. A region is formed. The number of scans is preferably set according to the material of the workpiece 40, its thickness, and the like.

  In addition, for example, when a semiconductor wafer in which a plurality of functional elements are formed in a matrix is used as a processing object, and a semiconductor wafer is cut into a lattice shape for each functional element to form a plurality of semiconductor elements, The planned cutting lines are set for both the X-axis direction and the Y-axis direction that intersect each other. In this case, it is preferable that the formation of the cutting starting point region in each of the X-axis direction and the Y-axis direction is performed in an appropriate order by dividing into processing phases as necessary (Patent Document 4). reference).

  FIG. 5 is a configuration diagram schematically showing an example of a laser processing apparatus used for cutting a workpiece (see Patent Document 2). The laser processing apparatus 101 according to the present configuration example irradiates the laser beam L with the condensing point P inside the flat plate-shaped processing object S placed on the stage 102 and modifies the processing object S. This is a processing apparatus for forming the quality region R. The stage 102 is configured to be able to move in the vertical direction (Z-axis direction) and the horizontal direction (X-axis direction, Y-axis direction) and to rotate. A laser output device 106 mainly including a laser head unit 103, an optical system main body 104, and an objective lens unit 105 is disposed above the stage 102.

  The laser head unit 103 is detachably attached to the upper end portion of the optical system main body 104. The laser head unit 103 has an L-shaped cooling jacket 111, and a cooling pipe 112 through which cooling water flows is embedded in a vertical wall 111a of the cooling jacket 111 in a meandering state. A laser head 113 that emits laser light L downward and a shutter unit 114 that selectively opens and closes the optical path of the laser light L are attached to the front surface of the vertical wall 111a. The laser head 113 uses, for example, an Nd: YAG laser as a laser light source, and preferably emits a pulsed laser beam having a pulse width of 1 μs or less as the laser beam L.

  Further, in the laser head unit 103, an adjustment unit 115 for adjusting the position and inclination of the cooling jacket 111 is attached to the lower surface of the bottom wall 111 b of the cooling jacket 111. The adjusting unit 115 is for aligning the optical axis α of the laser light L emitted from the laser head 113 with the optical axis β of the optical system main body 104 and the objective lens unit 105. A through hole through which the laser beam L passes is formed in the bottom wall 111 b of the cooling jacket 111, the adjustment unit 115, and the housing 121 of the optical system main body 104.

  Further, on the optical axis β in the housing 121 of the optical system main body 104, a beam expander 122 that is a laser shaping optical system that expands the beam size of the laser light L emitted from the laser head 113, and the laser light An optical attenuator 123 that adjusts the output of L, an output observation optical system 124 that observes the output of the laser light L adjusted by the optical attenuator 123, and a polarization adjustment optical system 125 that adjusts the polarization of the laser light L from above. They are arranged in this order below. In addition, a beam damper 126 that absorbs the removed laser light is attached to the optical attenuator 123, and this beam damper 126 is connected to the cooling jacket 111 via a heat pipe 127. With the above configuration, the laser light L emitted from the laser head 113 is adjusted to predetermined characteristics in the optical system main body 104.

  Further, in order to observe the processing object S placed on the stage 102, a light guide 128 that guides visible light for observation is attached to the housing 121 of the optical system main body 104. A CCD camera 129 is disposed in the center. Visible light for observation is guided into the housing 121 by the light guide 128, and sequentially passes through the field stop 131, the reticle 132, the dichroic mirror 133, and the like, and then is reflected by the dichroic mirror 134 disposed on the optical axis β. The reflected visible light for observation travels downward on the optical axis β and is irradiated onto the workpiece S. The laser beam L passes through the dichroic mirror 134.

  Then, the reflected light of the visible light for observation reflected on the surface of the workpiece S travels upward along the optical axis β and is reflected by the dichroic mirror 134. The reflected light reflected by the dichroic mirror 134 is further reflected by the dichroic mirror 133, passes through the imaging lens 135 and the like, and enters the CCD camera 129. An image of the processing object S picked up by the CCD camera 129 is displayed on a monitor. Thus, the processing object observation optical system is configured by the light guide 128, the CCD camera 129, the field stop 131, the reticle 132, the dichroic mirrors 133 and 134, and the imaging lens 135.

The objective lens unit 105 is detachably positioned and attached to the lower end of the optical system main body 104. A processing objective lens 142 is attached to the lower end of the housing 141 of the objective lens unit 105 with an actuator 143 using a piezoelectric element interposed therebetween so that the optical axis coincides with the optical axis β. A through hole through which the laser beam L passes is formed in the casing 121 of the optical system main body 104 and the casing 141 of the objective lens unit 105. Further, the peak power density at the condensing point P of the laser light L condensed by the objective lens 142 is, for example, 1 × 10 ⁸ (W / cm ² ) or more.

  Furthermore, a laser diode 144 that emits measurement laser light and a light receiving unit 145 are arranged in the housing 141 of the objective lens unit 105 in order to set the condensing point P with respect to the workpiece S to a predetermined position. Yes. The measurement laser light is emitted from the laser diode 144, sequentially reflected by the mirror 146 and the half mirror 147, and then reflected by the dichroic mirror 148 disposed on the optical axis β. The reflected measurement laser light travels downward on the optical axis β, passes through the objective lens 142, and is irradiated onto the workpiece S. The laser beam L passes through the dichroic mirror 148.

  Then, the reflected light of the measurement laser light reflected by the surface of the workpiece S reenters the objective lens 142, travels upward on the optical axis β, and is reflected by the dichroic mirror 148. Reflected light of the measurement laser beam reflected by the dichroic mirror 148 passes through the half mirror 147 and enters the light receiving unit 145, and is condensed on a quadrant position detection element obtained by dividing the photodiode into four equal parts. The Then, based on the condensing image pattern of the reflected light of the measuring laser beam condensed on the four-divided position detecting element, the focusing point of the measuring laser beam by the objective lens 142 is determined with respect to the workpiece S. Whether it is in a position can be detected.

  Note that FIG. 5 shows an example of the configuration of a laser processing apparatus to which processing information is supplied by the processing information supply apparatus 10 shown in FIG. 1, and specifically, laser processing apparatuses having various configurations. Can be targeted. For example, FIG. 6 is a block diagram showing a modification of the laser processing apparatus shown in FIG.

  In the configuration example shown in FIG. 6, in the optical system 204 provided between the laser head 213 and the processing objective lens 242, in addition to the laser shaping optical system 222 that expands the beam diameter of the laser light L, a pair of knives An edge 224 is installed. The knife edge 224 is located on the optical axis of the laser beam L expanded by the laser shaping optical system 222, and extends in a direction parallel to the cutting line (see FIG. 2) on the workpiece S. Is forming. By using such a knife edge 224 and changing the width of the slit 223, the beam width of the laser light irradiated onto the workpiece S can be adjusted (see Patent Document 3).

  Next, a specific information supply method executed in the processing information supply apparatus 10 shown in FIG. 1 will be described. 7 to 9 are flowcharts showing an example of a processing condition setting method executed in the processing information supply apparatus 10. In the following, an example in which a processing object to be cut by a laser processing apparatus is a semiconductor wafer will be mainly described.

  In the example of the processing condition setting shown in FIG. 7, first, the user of the laser processing device 32 (see FIG. 1) first processes the semiconductor to be processed via the information acquisition device 31 and the target information input unit 12 of the information supply device 10. Processing object information about the wafer is input (step S101). Specifically, for a semiconductor wafer, as essential processing target information, a wafer thickness (t0 μm) that is a thickness of the processing target and a laser beam incident condition on the semiconductor wafer are input. Further, detailed information about the semiconductor wafer is input as arbitrary processing target information as necessary. In addition, as the laser beam incident condition, for example, either laser beam front surface incidence or back surface incidence on the semiconductor wafer to be processed is specified.

  For these pieces of processing target information, the processing condition setting unit 16 refers to processing condition data included in the processing condition database 19 and sets processing conditions for the semiconductor wafer based on the input processing target information. First, the processing condition setting unit 16 refers to the wafer thickness t0, which is essential information, and the laser light incident condition in setting processing conditions, extracts processing information from the processing condition database 19, and sets basic processing conditions. (S102 to S104). In addition, if detailed information that is optional information is entered in addition to essential information, refer to the detailed information as necessary, optimize the basic machining conditions, set the detailed machining conditions, Final processing conditions are set (S105 to S107).

  As described above, as processing target information about a processing target such as a semiconductor wafer, the thickness of the processing target and the incident condition of the laser beam on the processing target are input as essential information, and the processing target is set as necessary. Detailed information about the object is input as arbitrary information, and the processing condition setting unit 16 performs processing condition setting processing according to the procedure according to the input processing information information. Acquisition of information necessary for setting and setting of machining conditions based on the acquired information can be reliably executed.

  Specifically, in the example shown in FIG. 7, first, it is determined whether the incident condition of the laser beam on the semiconductor wafer is front surface incidence or back surface incidence (S102). If surface incidence is designated as the laser light incidence condition, basic processing conditions are set with reference to the wafer thickness t0 under the laser light surface incidence condition (S103). If back side incidence is specified as the laser light incident condition, basic processing conditions are set with reference to the wafer thickness t0 under the laser light back side incident condition (S104).

  If the basic machining conditions are set by the essential machining target information, it is next checked whether or not detailed information that is arbitrary machining target information is specified (S105). If the detailed information is designated, the machining conditions are reset based on the detailed information, and the detailed machining conditions as the final machining conditions are set (S106). If detailed information is not specified, the basic machining conditions are used as final machining conditions as they are. The final machining conditions set by the machining condition setting unit 16 through the above procedure are output from the condition information output unit 13 to the machining information acquisition device 31 as machining condition information (S107).

  Here, as the processing conditions of laser processing set by the processing condition setting unit 16, specifically, for example, the condensing point is scanned along the planned cutting line on the semiconductor wafer to be processed, and the processing conditions are changed. The number of scans indicating the number of times that the quality starting region is formed continuously or intermittently (see FIG. 3, number of scans = 1 in FIG. 3A, number of scans = 3 in FIG. 3B) It is preferable to set the irradiation conditions of the laser beam on the semiconductor wafer in each scan. Thereby, the processing conditions which should be applied in a laser processing apparatus can be set suitably.

  Further, in the example shown in FIG. 7, as the laser light irradiation conditions in each scan, specifically, the position in the thickness direction (Z position) of the focal point of the semiconductor wafer to be processed on the semiconductor wafer, and the semiconductor wafer The intensity condition of the laser beam for irradiating the semiconductor wafer and the optical system setting condition (optical system setting) for irradiating the semiconductor wafer with the laser beam are set. In addition, as for the intensity condition of the laser beam, more specifically, an outlet output and a power condition are set.

  Among these processing conditions, “exit output” is a condition regarding the output of laser light emitted from the processing objective lens 142 (see FIG. 5) to the processing target S. Such an output of the laser beam is set by adjusting the optical attenuator 123 in the configuration of FIG. 5, for example. In other words, this “exit output” can be said to be a kind of optical system setting.

  The “power condition” is a condition for a laser light source or the like that supplies a processing laser beam. Specifically, as power conditions, the laser output emitted from the laser oscillator, the repetition frequency when using pulsed laser light, the moving speed of the stage 102 when irradiating the laser light (relative of the laser light to the workpiece S) Machining speed), a pulse width of the laser beam, a beam profile, and the like are set. Of these power conditions, the laser output and the repetition frequency are essential setting items.

  “Optical system setting” is a condition for setting various optical systems in the optical system main body 104 or the like. Specifically, the beam diameter, beam divergence angle, beam shape, and the like of the laser light incident on the objective lens 142 are set as the optical system settings. Here, the beam diameter and the divergence angle of the laser light are indispensable setting items, and are set by adjusting a laser shaping optical system such as the beam expander 122 in the configuration of FIG. Further, the beam shape of the laser beam corresponds to the beam shape of the laser beam irradiated onto the workpiece S, and is set by adjusting the slit 223 formed by the pair of knife edges 224 in the configuration of FIG. Is done.

  In addition, when performing a cutting process to cut a semiconductor wafer into a lattice shape to form a plurality of semiconductor elements, as described above, in addition to the above-described processing conditions, each of the X-axis direction and the Y-axis direction It is preferable to set a processing step (phase) for forming the cutting start region in the processing steps for each scan as a processing condition.

  FIG. 8 is a flowchart showing an example of a basic processing condition setting method in the case of surface incidence performed in step S103 of FIG. In the example of the setting method shown below, the target information input unit 12 inputs the thickness of the processing target object as processing target information, and the processing condition setting unit 16 has a plurality of references for the thickness of the processing target object. A thickness range is prepared, and in the setting of the processing conditions, the processing conditions in the thickness range corresponding to the thickness of the workpiece to be input among the plurality of thickness ranges are extracted from the processing condition database 19 and extracted. In other words, a method for setting machining conditions for a workpiece based on the machining conditions. In such a method, the processing conditions to be applied in the laser processing apparatus can be suitably set.

  Specifically, in the setting method shown in FIG. 8, a plurality of thickness ranges are prepared by preparing reference values T1 to T4 (however, T1 <T2 <T3 <T4) for the wafer thickness. A method for setting processing conditions according to the value of the wafer thickness t0 of the target semiconductor wafer is used.

  In the example shown in FIG. 8, first, it is determined whether or not the wafer thickness t0 is within the range of T1 ≦ t0 <T2 (step S201). If the designated wafer thickness t0 μm is within this range, the representative value of the wafer thickness in the above range is set to T1 μm, and the processing conditions for the wafer thickness T1 μm are extracted from the processing condition database 19 (S202).

  If the wafer thickness t0 is not within the range of T1 ≦ t0 <T2, then it is determined whether the wafer thickness t0 is within the range of T2 ≦ t0 <T3 (S203). If the specified wafer thickness t0 μm is within this range, the processing conditions for the wafer thickness T2 μm are extracted from the processing condition database 19 (S204).

  Further, when the wafer thickness t0 is not within the range of T2 ≦ t0 <T3, it is subsequently determined whether the wafer thickness t0 is within the range of T3 ≦ t0 <T4 (S205). If the designated wafer thickness t0 μm is within this range, the processing conditions for the wafer thickness T3 μm are extracted from the processing condition database 19 (S206). Further, when the wafer thickness t0 is not within the range of T3 ≦ t0 <T4, that is, when the wafer thickness t0 is not within the range of T1 ≦ t0 <T4 (a plurality of input workpiece thicknesses prepared). If it is not within the range of the thickness range, a setting error is output assuming that the processing condition cannot be set for the specified processing target information (S210).

  When the processing conditions for the wafer thickness T1, T2, or T3 are extracted from the processing condition database 19 (S202, S204, S206), the designated wafer thickness t0 is a thickness Tn that is a representative value in each range. It is determined whether or not (n = 1, 2, 3) matches (Tn = t0) (S207). If Tn matches t0, the setting of the basic machining conditions is completed using the extracted machining conditions as the basic machining conditions as they are (S209). If Tn does not match t0, the extracted machining conditions are optimized according to the difference between Tn and t0 (S208), and basic machining conditions are set (S209).

  For the setting of the basic processing conditions in the case of backside incidence performed in step S104 of FIG. 7, basically the same setting method as in the case of front side incidence shown in FIG. 8 is used. However, specific processing conditions such as the wafer thickness values T1 to T4 for setting the processing method according to the wafer thickness t0 in the setting of the processing conditions are different depending on the case of front side incidence and the case of rear side incidence. Also good.

  FIG. 9 is a flowchart showing an example of a detailed machining condition setting method performed in step S106 of FIG. In this setting method, it is assumed that a plurality of information items of detailed information 1, 2,... Are prepared as detailed information about the workpiece. However, for such detailed information, a single information item may be prepared.

  In the example shown in FIG. 9, first, it is determined whether or not the detailed information 1 is designated (step S301). If the detailed information 1 is designated, an optimization process is performed on the machining conditions set based on the essential information (S302). Subsequently, it is determined whether or not the next detailed information 2 is designated (S303). If the detailed information 2 is designated, optimization processing is performed with respect to the machining conditions (S304). The detailed processing conditions, which are final processing conditions, are set by performing confirmation of detailed information specification and optimization processing in the case of specification for all the detailed information items (S305).

  FIG. 10 is a diagram illustrating an example of a data configuration in the machining condition database 19. FIG. 10 schematically shows an example of machining condition data prepared in the machining condition database 19 when the machining condition setting method shown in FIGS. 7 to 9 is used. In this configuration example, in the processing condition database 19, processing condition data 191 in the case of surface incidence including processing condition data for each of the wafer thicknesses T1, T2, and T3, which are reference values of the wafer thickness, and the wafer thickness T1. Processing condition data 192 in the case of backside incidence including processing condition data for each of ', T2', and T3 'is prepared.

  In this configuration example, machining condition optimization data 193 is prepared in addition to the machining condition data 191 and 192. The optimization data 193 is used when optimization data (see FIG. 8) used when Tn = t0 is not set in the basic machining condition setting and when detailed information is specified in the detailed machining condition setting. Optimization data (see FIG. 9). As shown in this example, regarding the configuration of the machining condition database 19, the content of the machining target information input from the target information input unit 12, the specific setting method of the machining conditions executed in the machining condition setting unit 16, etc. It is preferable to adopt a configuration according to.

  The information supply method in the processing information supply apparatus 10 shown in FIG. 1 will be further described. FIG. 11 is a diagram illustrating an example of an input screen used for inputting processing target information to the processing information supply apparatus 10. This input screen 50 is displayed, for example, on the display unit of the machining information acquisition device 31 operated by the user in the configuration shown in FIG.

  In the input screen 50 shown in FIG. 11, a workpiece name input unit 51 for inputting a workpiece name, a wafer thickness input unit 52 for inputting a wafer thickness, which is essential information, and a laser beam incident condition from back side incidence or front side incidence. An incident condition input unit 53 to be selected and a detailed information input unit 54 to input detailed information are provided. Further, in this configuration example, an expanding method input unit 55 for inputting information on a cutting method of the workpiece after forming the modified region is provided. Further, below these input units 51 to 55, a processing condition setting button 56 for instructing execution of setting of processing conditions based on the input processing target information, and for clearing the input processing target information. A clear button 57 is provided.

  Specifically, the detailed information input unit 54 specifies detailed information for each item of the wafer type, wafer size, chip size, street width, crystal orientation / processing angle, dope type / rate, street state, and back surface state. It is possible to do.

  Specific examples of the detailed information include MPU, DSP, DRAM, SRAM, flash memory, optical device, MEMS, bare wafer, and the like as wafer types. Further, the crystal orientation includes <100>, <111>, <110>, and the like. Further, as the kind of doping, there are Sb (n-type), As (n-type), P (n-type), B (p-type), and the like.

As for the street state, the street state 1 includes SiO ₂ , SiO ₂ + SiN, Poly-Si, Bear-Si, and the like. Further, the street state 2 includes an AlN film, a low-k film, an SOI, a through electrode, and contamination due to etching. Regarding the back surface state, the back surface state 1 includes Bear-Si, SiO ₂ , SiO ₂ + SiN, Poly-Si, a back electrode (Au), a back electrode (AuSn), and the like. Further, as the back surface state 2, there are a polyimide / resin film, a metal film, a through electrode, a bump, a DAF attached after processing, a DAF attached before processing, dirt due to etching, etc. .

  In FIG. 11, as an example of processing object information input, assuming that the workpiece thickness = 0 μm, the incident condition = surface incidence, and the detailed information = designation for the processed workpiece name = work 1, the dope type = Sb (n Type) and dope rate = 0.5 Ω · cm, respectively.

  FIG. 12 is a diagram illustrating an example of an output screen used for outputting processing condition information from the processing information supply apparatus 10. The output screen 60 is displayed on the display unit of the processing information acquisition device 31 operated by the user in the configuration shown in FIG.

  In the output screen 60 shown in FIG. 12, a processing target information display unit 61 that displays the processing target information input on the input screen 50, and a processing condition information display unit 62 that indicates processing conditions set based on the processing target information. Is provided. Also, below these display sections 61 and 62, a return button 63 for returning to the input screen 50 and an end button 64 for ending the processing condition setting process are provided.

  In FIG. 12, as an output example of the processing condition information set in accordance with the processing target information described above with reference to FIG. 11, the number of scans is 4, and laser processing is performed for each of the four scans SD1, SD2, SD3, and SD4. An example is shown in which specific processing conditions to be applied to the apparatus are displayed.

  Specifically, for the first scan SD1, Z position = 30 μm, exit output = 2.00 W, and machining stage = 1 are output. In addition, for the second scan SD2, Z position = 84 μm, exit output = 2.00 W, and machining stage = 1 are output. In addition, for the third scan SD3, Z position = 139 μm, outlet output = 2.00 W, and machining stage = 2 are output. In addition, for the fourth scan SD4, Z position = 196 μm, exit output = 2.50 W, and machining stage = 2 are output. As for the power condition and the optical system setting, the condition 5 and the setting 1 are output in all the scans SD1 to SD4, respectively.

  Further, in the above example in which the processing stage = 1 is set in the scans SD1 and SD2 and the processing stage = 2 is set in the scans SD3 and SD4, the cutting step is performed in a grid pattern in the X axis direction and the Y axis direction. Laser processing of a semiconductor wafer is performed in the following procedure. First, in the processing stage 1, scans SD1 and SD2 are sequentially performed in the X-axis direction to form two modified region rows, and subsequently, scans SD1 and SD2 are sequentially performed in the Y-axis direction to perform two rows of modification. A quality region row is formed. Further, in processing stage 2, scans SD3 and SD4 are sequentially performed in the Y-axis direction (or X-axis direction) to form two modified region rows, and then scanned in the X-axis direction (or Y-axis direction). SD3 and SD4 are sequentially performed to form two modified region rows. Such setting of the processing stage is effective for suitably forming the modified region row in each scan.

  The processing conditions in the laser processing device 32 set in the processing condition setting unit 16 of the processing information supply device 10 and output from the condition information output unit 13 can be operated and set in the target laser processing device 32. It is preferable that the machining conditions are set and output so as to correspond to the set items and the parameters that can be set and selected in each setting item.

  Further, the laser processing device 32 is preferably provided with a setting operation unit capable of setting processing conditions based on information supplied from the processing information supply device 10. About such a setting operation part, the structure which displays a setting operation screen on the display part provided in the laser processing apparatus 32 can be used, for example. Alternatively, a configuration in which a setting operation panel including a condition setting button and a setting knob is provided in the laser processing apparatus 32 may be used.

  FIG. 13 and FIG. 14 are diagrams illustrating an example of an operation screen used for a processing condition setting operation in the laser processing apparatus. On the operation screen 70, the first setting item tag 71 and the second setting item tag 72 can switch the setting item display section displayed on the operation screen 70. Further, below these item tags 71 and 72 and the setting item display section, a setting button 75 for completing the processing condition setting operation and a cancel button 76 for canceling the setting contents are provided.

  In FIG. 13, the first setting item tag 71 is selected, and the corresponding first setting item display unit 73 is displayed on the operation screen 70. Here, for each of the four scans SD1, SD2, SD3, and SD4 shown in FIG. 12, the Z position, the exit output, and the processing stage are set, and their contents are displayed. In FIG. 14, the second setting item tag 72 is selected, and the corresponding second setting item display unit 74 is displayed on the operation screen 70. Here, for each of the optical system settings and power conditions, selectable contents and selected processing conditions (shown with hatching) are displayed.

  The processing information supply device and the processing information supply system according to the present invention are not limited to the above-described embodiments and configuration examples, and various modifications are possible. For example, contents of processing target information input to the processing information supply apparatus 10, contents of processing condition information set and output in the processing information supply apparatus 10, setting method of processing conditions, data configuration in the processing condition database, and the like FIG. 7 to FIG. 14 show an example, and specifically, various configurations may be used.

  INDUSTRIAL APPLICABILITY The present invention can be used as a machining information supply apparatus and a machining information supply system that can suitably obtain machining information applied to a laser machining apparatus on the machining side.

DESCRIPTION OF SYMBOLS 10 ... Processing information supply apparatus, 11 ... Information input / output part, 12 ... Object information input part, 13 ... Condition information output part, 15 ... Processing information processing part, 16 ... Processing condition setting part, 17 ... Access management part, 18 ... Setting history storage unit, 19 ... processing condition database, 20 ... operation unit, 21 ... input device, 22 ... display device, 30 ... network, 31 ... processing information acquisition device, 32 ... laser processing device,
DESCRIPTION OF SYMBOLS 40 ... Processing object, 41 ... Surface, 42 ... Planned cutting line, 43 ... Modified area | region, 46-48 ... Cutting origin area | region (modified area | region row | line | column), L ... Laser beam, P ... Condensing point.

Claims (6)

By irradiating a laser beam with a focusing point inside the object to be processed, a modified region serving as a starting point of cutting is formed inside the object to be processed along a planned cutting line of the object to be processed. A processing information supply device for supplying processing information applied to a laser processing device,
Target information input means for inputting processing target information about the processing target;
In accordance with the processing object information in the laser processing apparatus, a processing condition database in which data on processing conditions for forming the modified region in the processing object by irradiation of the laser light is accumulated,
Processing condition setting means for referring to the processing condition data included in the processing condition database and setting processing conditions for the processing object based on the processing target information input from the target information input means;
Condition information output means for outputting machining condition information about the machining conditions set by the machining condition setting means ,
The target information input means inputs, as the processing target information, the thickness of the processing target and a laser beam incident condition on the processing target as essential information, and the laser beam incident condition as the processing target information. While specifying either the front surface incidence or the rear surface incidence of the laser beam on the object, the detailed information about the object to be processed is input as arbitrary information,
The processing condition setting means refers to the thickness of the object to be processed and the incident condition of the laser beam in the setting of the processing condition. If the surface incidence is specified, the machining conditions are extracted from the machining condition database with reference to the thickness of the workpiece under the condition of laser beam surface incidence, and the basic machining conditions are determined. If the back-side incidence is specified, the processing conditions are extracted from the processing-condition database with reference to the thickness of the object to be processed under the conditions of laser light back-side incidence, and the basic processing conditions are set. , When the detailed information is input, the processing conditions are optimized with reference to the detailed information to set the detailed processing conditions,
The processing condition setting means prepares a plurality of reference thickness ranges for the thickness of the workpiece, and sets the plurality of thicknesses in the setting of the basic processing conditions with reference to the thickness of the workpiece. As the processing condition of the thickness range corresponding to the thickness of the processing object input within the thickness range, the thickness of the processing target input within the plurality of thickness ranges is within the range. A thickness range is determined, a processing condition in the case of a representative value of the thickness of the processing object in the thickness range is extracted from the processing condition database, and the processing object is extracted based on the extracted processing condition. Set the basic processing conditions,
In the setting of the basic processing conditions based on the extracted processing conditions, it is determined whether or not the input thickness of the processing object matches the representative value. The machining conditions are set as the basic machining conditions as they are, and if they do not match, optimization is performed according to the difference between the thickness of the workpiece and the representative value input with respect to the extracted machining conditions. performed by processing information supply apparatus characterized that you set the basic processing conditions.   The target information input unit and the condition information output unit are configured to be connectable via a network to a processing information acquisition device for acquiring the processing information applied to the laser processing device. The processing information supply device according to claim 1.   3. A setting history storage unit for storing a setting history including at least one of the processing target information and the processing condition information for setting the processing conditions performed by the processing condition setting unit. The processing information supply apparatus described. The processing condition setting means is unable to set the processing condition for the input processing target information when the thickness of the input processing target is not within the range of the plurality of thickness ranges prepared. as there, processing information supply apparatus according to any one of claims 1 to 3, and outputs a setting error. The processing condition setting means scans the condensing point along the planned cutting line with respect to the processing object as the processing condition, and a cutting start point where the modified region is formed continuously or intermittently. a scan number which indicates the number of times to form the region, setting the irradiation conditions of the laser beam machining information supply device according to any one of claims 1-4, characterized in at each scan. The processing condition setting means includes, as the laser light irradiation conditions, the position in the thickness direction of the condensing point on the processing target, the intensity condition of the laser light irradiated to the processing target, 6. The processing information supply apparatus according to claim 5, wherein a setting condition of an optical system for irradiating the processing target with laser light is set.

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