JP5580805B2 - Peeling apparatus, peeling system, peeling method, program, and computer storage medium - Google Patents

Description

  The present invention relates to a peeling device that peels a superposed substrate from a substrate to be processed and a support substrate, a peeling system including the peeling device, a peeling method using the peeling device, a program, and a computer storage medium.

  In recent years, for example, in semiconductor device manufacturing processes, semiconductor wafers (hereinafter referred to as “wafers”) have become larger in diameter. Further, in a specific process such as mounting, it is required to make the wafer thinner. For example, if a thin wafer with a large diameter is transported or polished as it is, the wafer may be warped or cracked. For this reason, for example, in order to reinforce the wafer, the wafer is attached to, for example, a wafer that is a support substrate or a glass substrate. Then, after a predetermined process such as a wafer polishing process is performed in a state where the wafer and the support substrate are bonded in this way, the wafer and the support substrate are peeled off.

  The wafer and the support substrate are peeled off using, for example, a peeling device. The peeling apparatus includes, for example, a first holder that holds a wafer, a second holder that holds a support substrate, and a nozzle that ejects liquid between the wafer and the support substrate. In this peeling apparatus, the liquid is applied between the wafer bonded from the nozzle and the support substrate with an injection pressure larger than the bonding strength between the wafer and the support substrate, preferably at least twice as large as the bonding strength. The wafer and the support substrate are peeled off by spraying (Patent Document 1).

JP-A-9-167724

  However, when the peeling apparatus described in Patent Document 1 is used, since the liquid is ejected with a large ejection pressure, the wafer or the support substrate may be damaged. In particular, since the wafer is thin, it is easily damaged.

  In addition, for example, when the wafer and the support substrate are bonded via an adhesive, the bonding strength between the wafer and the support substrate is high, so a liquid with a very large spray pressure is required, and the wafer and the support substrate are peeled off. It takes a lot of time.

  This invention is made | formed in view of this point, and it aims at performing the peeling process of a to-be-processed substrate and a support substrate appropriately and efficiently.

In order to achieve the above object, the present invention provides a peeling apparatus for peeling a polymerized substrate in which a substrate to be processed and a support substrate are bonded with an adhesive to the substrate to be processed and the support substrate. A first holding unit that holds the substrate in a state; a second holding unit that holds the support substrate at a normal temperature; and a normal temperature support substrate that is held in the second holding unit from the entire periphery of the outer periphery. A moving mechanism for holding the outer peripheral portion of the second holding portion and moving it in the vertical direction so as to continuously peel from the substrate to be processed held at the first holding portion toward the central portion. It is characterized by having. Note that the normal temperature is a temperature of a processing atmosphere for performing a separation process between the substrate to be processed and the support substrate, and is 23 ° C., for example.

  According to the peeling apparatus of the present invention, the outer peripheral portion of the second holding portion is moved in the vertical direction, and the room temperature support substrate held by the second holding portion is moved from the outer peripheral portion toward the central portion. It can peel continuously from the to-be-processed substrate of the normal temperature hold | maintained at the holding | maintenance part. As described above, since the support substrate is continuously peeled from the substrate to be processed from the outer peripheral portion toward the center portion, the substrate to be processed and the support substrate can be easily peeled off. For this reason, a to-be-processed substrate and a support substrate can be peeled appropriately and uniformly, without being damaged to a to-be-processed substrate. Furthermore, the time required for the peeling treatment can be shortened as compared with the conventional case. Therefore, according to the present invention, it is possible to appropriately and efficiently perform the separation process between the substrate to be processed and the support substrate.

  The first holding unit may be disposed above the second holding unit, and the moving mechanism may move the second holding unit vertically downward.

  The peeling apparatus may include a rotation mechanism that rotates at least the first holding unit or the second holding unit.

  The moving mechanism holds the first holding unit, holds the second holding unit and moves only the outer peripheral part of the second holding unit in the vertical direction, and holds the first moving unit, and You may have the 2nd moving part which moves the 1st moving part and the 2nd holding part in the perpendicular direction.

  The first moving unit includes a plurality of cylinders that move the outer peripheral part of the second holding unit in the vertical direction, and the outer peripheral part of the second holding unit moves in the vertical direction by the plurality of cylinders. And a support column that supports the central portion of the second holding portion so that the vertical position of the central portion of the second holding portion does not change.

  The first moving unit holds the second holding unit, and is provided in a bellows that is extendable in the vertical direction and inside the bellows, and the bellows contracts and an outer peripheral portion of the second holding unit And a support column that supports the central portion of the second holding portion so that the vertical position of the central portion of the second holding portion does not change when moving in the vertical direction. Good.

  The peeling apparatus includes a solvent supply unit that supplies a solvent for the adhesive to the adhesive on the outer periphery of the polymerization substrate held by the first holding unit and the second holding unit. Also good.

  The present invention according to another aspect is a peeling system including the peeling device, wherein the peeling device, a first cleaning device for cleaning a substrate to be processed peeled by the peeling device, and peeling by the peeling device. A second cleaning apparatus for cleaning the supported substrate, a loading / unloading station for loading / unloading a substrate to be processed, a supporting substrate or a superposed substrate with respect to the peeling processing station, and the peeling And a transfer device for transferring a substrate to be processed, a support substrate, or a superposed substrate between the processing station and the carry-in / out station.

  The peeling system includes an interface station that transports a substrate to be processed between the peeling processing station and a post-processing station that performs predetermined post-processing on the substrate to be processed that has been peeled off at the peeling processing station. Also good.

Another aspect of the present invention is a peeling method for peeling a polymerized substrate in which a substrate to be processed and a support substrate are bonded with an adhesive using a peeling device to the substrate to be processed and the support substrate. The first holding unit that holds the substrate to be processed at a normal temperature, the second holding unit that holds the support substrate at a normal temperature, and the support substrate held by the second holding unit include: A moving mechanism for moving the outer peripheral portion of the second holding portion in the vertical direction so as to continuously peel from the substrate to be processed held by the first holding portion from the entire circumference of the outer peripheral portion toward the central portion. In the peeling method, the outer peripheral portion of the second holding portion is moved in the vertical direction, and the room temperature support substrate held by the second holding portion is moved from the entire circumference of the outer peripheral portion. Peel continuously from the substrate to be processed held at the first holding part toward the center part A first step, then move the entire second holding portion in the vertical direction, it is characterized by having a second step of peeling the substrate to be processed supported substrate. Note that the normal temperature is a temperature of a processing atmosphere for performing a separation process between the substrate to be processed and the support substrate, and is 23 ° C., for example.

  The first holding unit may be disposed above the second holding unit, and the second holding unit may be moved vertically downward in the first step and the second step.

  The peeling apparatus includes a rotation mechanism that rotates at least the first holding unit or the second holding unit, and in the first step, at least the first holding unit or the second holding unit. After starting the rotation, the outer peripheral portion of the second holding portion may be moved in the vertical direction, and the support substrate may be continuously peeled from the substrate to be processed from the outer peripheral portion toward the central portion.

  In the first step, a solvent of the adhesive may be supplied to the adhesive on the outer peripheral portion of the polymerization substrate held by the first holding part and the second holding part.

  According to another aspect of the present invention, there is provided a program that operates on a computer of a control unit that controls the peeling device in order to cause the peeling device to execute the peeling method.

  According to another aspect of the present invention, a readable computer storage medium storing the program is provided.

  ADVANTAGE OF THE INVENTION According to this invention, the peeling process of a to-be-processed substrate and a support substrate can be performed appropriately and efficiently.

It is a top view which shows the outline of a structure of the peeling system concerning this Embodiment. It is a side view of a to-be-processed wafer and a support wafer. It is a longitudinal cross-sectional view which shows the outline of a structure of a peeling apparatus. It is a top view of the 1st vertical movement part. It is a longitudinal cross-sectional view which shows the outline of a structure of a 1st washing | cleaning apparatus. It is a cross-sectional view which shows the outline of a structure of a 1st washing | cleaning apparatus. It is a longitudinal cross-sectional view which shows the outline of a structure of a 2nd washing | cleaning apparatus. It is a side view which shows the outline of a structure of a 2nd conveying apparatus. It is a flowchart which shows the main processes of peeling processing. It is explanatory drawing which shows a mode that the superposition | polymerization wafer was hold | maintained with the 1st holding | maintenance part and the 2nd holding | maintenance part. It is explanatory drawing which shows a mode that a 2nd holding | maintenance part outer peripheral part is moved vertically downward by a 1st vertical movement part. It is explanatory drawing which shows a mode that a 2nd holding | maintenance part is moved vertically downward by a 2nd vertical movement part. It is explanatory drawing which shows a mode that the to-be-processed wafer and the support wafer were peeled. It is explanatory drawing which shows a mode that a to-be-processed wafer is delivered from a 1st holding | maintenance part to Bernoulli chuck. It is explanatory drawing which shows a mode that a to-be-processed wafer is delivered from a Bernoulli chuck to a porous chuck | zipper. It is a longitudinal cross-sectional view which shows the outline of a structure of the peeling apparatus concerning other embodiment. It is explanatory drawing which shows a mode that the 2nd holding | maintenance part outer peripheral part is moved to the perpendicular downward direction by the 1st vertical movement part concerning other embodiment. It is a longitudinal cross-sectional view which shows the outline of a structure of the peeling apparatus concerning other embodiment. It is a longitudinal cross-sectional view which shows the outline of a structure of the peeling apparatus concerning other embodiment.

  Embodiments of the present invention will be described below. FIG. 1 is a plan view showing an outline of a configuration of a peeling system 1 according to the present embodiment.

In the peeling system 1, as shown in FIG. 2, a superposed wafer T as a superposed substrate in which a target wafer W as a target substrate and a support wafer S as a support substrate are bonded with an adhesive G is used as a target wafer W. And the support wafer S is peeled off. Hereinafter, in the processing target wafer W, a surface bonded to the support wafer S via the adhesive G is referred to as “bonding surface W _J ”, and a surface opposite to the bonding surface W _J is referred to as “non-bonding surface W _N ”. That's it. Similarly, in the support wafer S, a surface bonded to the processing target wafer W via the adhesive G is referred to as “bonding surface S _J ”, and a surface opposite to the bonding surface S _J is referred to as “non-bonding surface S _N”. " Note that wafer W is a wafer as a product, a plurality of electronic circuits are formed, for example, joint surface W _J. The wafer W is, for example, non-bonding surface W _N is polished, thin (e.g., thickness of 50 [mu] m) it is. The support wafer S is a wafer having the same diameter as the wafer W to be processed and supporting the wafer W to be processed. In this embodiment, the case where a wafer is used as the support substrate will be described, but another substrate such as a glass substrate may be used.

As shown in FIG. 1, the peeling system 1 includes cassettes C _W , C _S , and C _T that can accommodate, for example, a plurality of wafers W to be processed, a plurality of support wafers S, and a plurality of superposed wafers T, respectively. A loading / unloading station 2 for loading / unloading, a peeling processing station 3 including various processing apparatuses for performing predetermined processing on the wafer W to be processed, the support wafer S, and the overlapped wafer T, and a post-processing adjacent to the peeling processing station 3 The interface station 5 that transfers the wafer W to be processed to and from the station 4 is integrally connected.

  The carry-in / out station 2 and the peeling processing station 3 are arranged side by side in the X direction (vertical direction in FIG. 1). A wafer transfer region 6 is formed between the carry-in / out station 2 and the peeling processing station 3. Further, the interface station 5 is arranged on the Y direction negative direction side (left direction side in FIG. 1) of the carry-in / out station 2, the peeling processing station 3, and the wafer transfer region 6.

The loading / unloading station 2 is provided with a cassette mounting table 10. A plurality of, for example, three cassette mounting plates 11 are provided on the cassette mounting table 10. The cassette mounting plates 11 are arranged in a line in the Y direction (left and right direction in FIG. 1). These cassette mounting plates 11, cassettes _C W to the outside of the peeling system _1, C S, when loading and unloading the _{C T,} a cassette _{C W,} C S, can be placed on _{C T} . Thus, the carry-in / out station 2 is configured to be capable of holding a plurality of wafers W to be processed, a plurality of support wafers S, and a plurality of superposed wafers T. The number of cassette mounting plates 11 is not limited to the present embodiment, and can be arbitrarily determined. Further, the plurality of superposed wafers T carried into the carry-in / out station 2 are inspected in advance, and the superposed wafer T including the normal target wafer W and the superposed wafer T including the defective target wafer W; Has been determined.

  A first transfer device 20 is disposed in the wafer transfer region 6. The first transfer device 20 includes a transfer arm that can move around, for example, a vertical direction, a horizontal direction (Y direction, X direction), and a vertical axis. The first transfer device 20 moves in the wafer transfer region 6 and can transfer the wafer W to be processed, the support wafer S, and the overlapped wafer T between the carry-in / out station 2 and the separation processing station 3.

  The peeling processing station 3 includes a peeling device 30 that peels the superposed wafer T into the processing target wafer W and the supporting wafer S. A first cleaning device 31 that cleans the wafer to be processed W that has been peeled off is disposed on the negative side in the Y direction of the peeling device 30 (left side in FIG. 1). A second transfer device 32 is provided between the peeling device 30 and the first cleaning device 31. Further, a second cleaning device 33 for cleaning the peeled support wafer S is arranged on the positive side in the Y direction of the peeling device 30 (right side in FIG. 1). As described above, the first cleaning device 31, the second transport device 32, the peeling device 30, and the second cleaning device 33 are arranged in this order from the interface station 5 side in the peeling processing station 3.

  The interface station 5 is provided with a third transport device 41 that is movable on a transport path 40 extending in the X direction. The third transfer device 41 is also movable in the vertical direction and the vertical axis (θ direction), and can transfer the wafer W to be processed between the separation processing station 3 and the post-processing station 4.

  In the post-processing station 4, predetermined post-processing is performed on the processing target wafer W peeled off at the peeling processing station 3. As predetermined post-processing, for example, processing for mounting the processing target wafer W, processing for inspecting electrical characteristics of electronic circuits on the processing target wafer W, processing for dicing the processing target wafer W for each chip, and the like are performed. .

  Next, the structure of the peeling apparatus 30 mentioned above is demonstrated. As shown in FIG. 3, the peeling apparatus 30 includes a processing container 100 that can seal the inside. A loading / unloading port (not shown) for the processing target wafer W, the support wafer S, and the overlapped wafer T is formed on the side surface of the processing container 100, and an opening / closing shutter (not shown) is provided at the loading / unloading port.

  An intake port 101 that sucks the atmosphere inside the processing container 100 is formed on the bottom surface of the processing container 100. An intake pipe 103 communicating with a negative pressure generator 102 such as a vacuum pump is connected to the intake port 101.

  Inside the processing container 100, a first holding unit 110 that sucks and holds a wafer W to be processed at a normal temperature, for example, 23 ° C. on the lower surface, and a support wafer S at a normal temperature, for example, 23 ° C., are placed and held on the upper surface. A second holding unit 111 is provided. The first holding unit 110 is provided above the second holding unit 111 and is disposed so as to face the second holding unit 111. That is, in the inside of the processing container 100, the peeling process is performed on the superposed wafer T in a state where the processing target wafer W is arranged on the upper side and the supporting wafer S is arranged on the lower side.

For example, a porous chuck is used for the first holding unit 110. The first holding part 110 has a plate-like main body part 120. A porous body 121 is provided on the lower surface side of the main body 120. The porous body 121 has, for example, substantially the same diameter as the wafer to be processed W, and is in contact with the non-joint surface W _{N of the} wafer to be processed W. For example, silicon carbide is used as the porous body 121.

A suction space 122 is formed inside the main body 120 and above the porous body 121. The suction space 122 is formed so as to cover the porous body 121, for example. A suction tube 123 is connected to the suction space 122. The suction pipe 123 is connected to a negative pressure generator (not shown) such as a vacuum pump. Then, the non-joint surface W _N of the processing target wafer is sucked from the suction pipe 123 through the suction space 122 and the porous body 121, and the processing target wafer W is sucked and held by the first holding unit 110.

  A support plate 130 that supports the first holding unit 110 is provided on the upper surface of the first holding unit 110. The support plate 130 is supported on the ceiling surface of the processing container 100. Note that the support plate 130 of the present embodiment may be omitted, and the first holding unit 110 may be supported in contact with the ceiling surface of the processing container 100.

  A suction tube 140 for sucking and holding the support wafer S is provided inside the second holding unit 111. The suction tube 140 is connected to a negative pressure generator (not shown) such as a vacuum pump. The second holding unit 111 is made of an elastic material such as aluminum.

  Below the second holding unit 111, a moving mechanism 150 that moves the second holding unit 111 and the supporting wafer S in the vertical direction and the horizontal direction is provided. The moving mechanism 150 includes a first vertical moving unit 151 as a first moving unit that holds the second holding unit 111 and moves only the outer peripheral portion of the second holding unit 111 in the vertical direction. A second vertical moving unit 152 as a second moving unit that holds the vertical moving unit 151 and moves the first vertical moving unit 151 and the second holding unit 111 in the vertical direction; A moving unit 151, a second vertical moving unit 152, and a horizontal moving unit 153 that moves the second holding unit 111 in the horizontal direction are provided. The first vertical movement unit 151, the second vertical movement unit 152, and the horizontal movement unit 153 are arranged in this order from the top in the vertical direction.

  The first vertical moving portion 151 is a support column that supports a plurality of, for example, six cylinders 160 that move the outer peripheral portion of the second holding portion 111 in an annular shape in the vertical direction and the central portion of the second holding portion 111. 161, and a support plate 162 that supports the cylinder 160 and the support column 161. As shown in FIG. 4, the six cylinders 160 are arranged at equal intervals on the same circumference as the support plate 162. The cylinders 160 are arranged at positions corresponding to the outer peripheral portion of the second holding part 111. The support column 161 is disposed at a position corresponding to the center portion of the second holding portion 111 in the center portion of the support plate 162. That is, when the outer peripheral portion of the second holding portion 111 is moved vertically downward by the cylinder 160, the support column 161 is arranged so that the vertical position of the central portion of the second holding portion 111 does not change. Yes.

  As shown in FIG. 3, the second vertical moving unit 152 includes a drive unit 170 that moves the support plate 162 up and down, and a support member 171 that supports the support plate 162. The drive unit 170 includes, for example, a ball screw (not shown) and a motor (not shown) that rotates the ball screw. Further, the support member 171 is configured to be extendable in the vertical direction, and is provided at, for example, three locations between the support plate 162 and the horizontal movement unit 153.

  The horizontal moving unit 153 includes, for example, a ball screw (not shown) and a motor (not shown) that rotates the ball screw, and includes a first vertical moving unit 151, a second vertical moving unit 152, and a second vertical moving unit 153. The holding part 111 can be moved in the horizontal direction.

  In addition, below the 2nd holding | maintenance part 111, the raising / lowering pin (not shown) for supporting and raising / lowering the superposition | polymerization wafer T or the support wafer S from the downward direction is provided. The elevating pin is inserted through a through hole (not shown) formed in the second holding part 111 and can protrude from the upper surface of the second holding part 111.

  Next, the configuration of the first cleaning device 31 described above will be described. As shown in FIG. 5, the first cleaning device 31 has a processing container 180 that can be sealed inside. A loading / unloading port (not shown) for the processing target wafer W is formed on the side surface of the processing container 180, and an opening / closing shutter (not shown) is provided at the loading / unloading port.

A porous chuck 190 that holds and rotates the wafer W to be processed is provided at the center of the processing container 180. The porous chuck 190 has a flat plate-shaped main body 191 and a porous body 192 provided on the upper surface side of the main body 191. The porous body 192 has, for example, substantially the same diameter as the wafer W to be processed, and is in contact with the non-joint surface W _{N of the} wafer W to be processed. For example, silicon carbide is used as the porous body 192. A suction tube (not shown) is connected to the porous body 192, and the non-bonded surface W _N of the wafer to be processed W is sucked from the suction tube through the porous body 192, thereby It can be sucked and held on the porous chuck 190.

  Below the porous chuck 190, for example, a chuck driving unit 193 provided with a motor or the like is provided. The porous chuck 190 can be rotated at a predetermined speed by the chuck driving unit 193. Further, the chuck driving unit 193 is provided with an elevating drive source such as a cylinder, for example, and the porous chuck 190 is movable up and down.

  Around the porous chuck 190, there is provided a cup 194 that receives and collects the liquid scattered or dropped from the wafer W to be processed. Connected to the lower surface of the cup 194 are a discharge pipe 195 for discharging the collected liquid and an exhaust pipe 196 for evacuating and exhausting the atmosphere in the cup 194.

  As shown in FIG. 6, a rail 200 extending along the Y direction (left and right direction in FIG. 6) is formed on the side of the cup 194 in the negative X direction (downward direction in FIG. 6). The rail 200 is formed, for example, from the outside of the cup 194 on the Y direction negative direction (left direction in FIG. 6) side to the outside of the Y direction positive direction (right direction in FIG. 6) side. An arm 201 is attached to the rail 200.

  As shown in FIGS. 5 and 6, the arm 201 supports a cleaning liquid nozzle 202 that supplies a cleaning liquid, for example, an organic solvent that is a solvent for the adhesive G, to the wafer W to be processed. The arm 201 is movable on the rail 200 by a nozzle driving unit 203 shown in FIG. As a result, the cleaning liquid nozzle 202 can move from the standby unit 204 installed on the outer side of the cup 194 on the positive side in the Y direction to above the center of the wafer W to be processed in the cup 194, and further on the wafer W to be processed. Can be moved in the radial direction of the wafer W to be processed. The arm 201 can be moved up and down by a nozzle driving unit 203 and the height of the cleaning liquid nozzle 202 can be adjusted.

  For example, a two-fluid nozzle is used as the cleaning liquid nozzle 202. As shown in FIG. 5, a supply pipe 210 that supplies the cleaning liquid to the cleaning liquid nozzle 202 is connected to the cleaning liquid nozzle 202. The supply pipe 210 communicates with a cleaning liquid supply source 211 that stores the cleaning liquid therein. The supply pipe 210 is provided with a supply device group 212 including a valve for controlling the flow of the cleaning liquid, a flow rate adjusting unit, and the like. The cleaning liquid nozzle 202 is connected to a supply pipe 213 that supplies an inert gas such as nitrogen gas to the cleaning liquid nozzle 202. The supply pipe 213 communicates with a gas supply source 214 that stores an inert gas therein. The supply pipe 213 is provided with a supply device group 215 including a valve for controlling the flow of the inert gas, a flow rate adjusting unit, and the like. Then, the cleaning liquid and the inert gas are mixed in the cleaning liquid nozzle 202 and supplied from the cleaning liquid nozzle 202 to the wafer W to be processed. In the following, a mixture of a cleaning liquid and an inert gas may be simply referred to as “cleaning liquid”.

  In addition, below the porous chuck 190, lifting pins (not shown) for supporting and lifting the wafer to be processed W from below may be provided. In such a case, the elevating pins can pass through a through hole (not shown) formed in the porous chuck 190 and protrude from the upper surface of the porous chuck 190. Then, instead of raising and lowering the porous chuck 190, the raising and lowering pins are raised and lowered, and the wafer W to be processed is transferred to and from the porous chuck 190.

  The configuration of the second cleaning device 33 is substantially the same as the configuration of the first cleaning device 31 described above. As shown in FIG. 7, the second cleaning device 33 is provided with a spin chuck 220 instead of the porous chuck 190 of the first cleaning device 31. The spin chuck 220 has a horizontal upper surface, and a suction port (not shown) for sucking, for example, the support wafer S is provided on the upper surface. The support wafer S can be sucked and held on the spin chuck 220 by suction from the suction port. Since the other structure of the 2nd washing | cleaning apparatus 33 is the same as that of the structure of the 1st washing | cleaning apparatus 31 mentioned above, description is abbreviate | omitted.

In the second cleaning device 33, a back rinse nozzle (not shown) for injecting the cleaning liquid toward the back surface of the support wafer S, that is, the non-bonding surface _SN is provided below the spin chuck 220. Also good. The non-bonding surface _SN of the support wafer S and the outer peripheral portion of the support wafer S are cleaned by the cleaning liquid sprayed from the back rinse nozzle.

  Next, the configuration of the second transport device 32 described above will be described. The second transfer device 32 has a Bernoulli chuck 230 that holds the wafer W to be processed as shown in FIG. The Bernoulli chuck 230 can suspend and hold the wafer W to be processed in a non-contact state by suspending the wafer W to be processed by ejecting air. Bernoulli chuck 230 is supported by support arm 231. The support arm 231 is supported by the first drive unit 232. The first drive unit 232 allows the support arm 231 to rotate around the horizontal axis and extend and contract in the horizontal direction. A second driving unit 233 is provided below the first driving unit 232. By the second drive unit 233, the first drive unit 232 can rotate around the vertical axis and can move up and down in the vertical direction.

  In addition, since the 3rd conveying apparatus 41 has the structure similar to the 2nd conveying apparatus 32 mentioned above, description is abbreviate | omitted. However, the second drive unit 233 of the third transport device 41 is attached to the transport path 40 shown in FIG. 1, and the third transport device 41 is movable on the transport path 40.

  The peeling system 1 is provided with a controller 300 as shown in FIG. The control unit 300 is a computer, for example, and has a program storage unit (not shown). The program storage unit stores a program for controlling processing of the processing target wafer W, the supporting wafer S, and the overlapped wafer T in the peeling system 1. The program storage unit also stores a program for controlling the operation of drive systems such as the above-described various processing apparatuses and transport apparatuses to realize a peeling process described later in the peeling system 1. The program is recorded on a computer-readable storage medium H such as a computer-readable hard disk (HD), a flexible disk (FD), a compact disk (CD), a magnetic optical desk (MO), or a memory card. May have been installed in the control unit 300 from the storage medium H.

  Next, the peeling process method of the to-be-processed wafer W and the support wafer S performed using the peeling system 1 comprised as mentioned above is demonstrated. FIG. 9 is a flowchart showing an example of main steps of the peeling process.

First, placing a plurality of normal temperature, the cassette C _T accommodating the bonded wafer T of example 23 ° _C., the empty cassette C _W, and an empty cassette C _S is a predetermined cassette mounting plate 11 of the carry-out station 2 Is done. The superposed wafer _T in the cassette CT is taken out by the first transfer device 20 and transferred to the peeling device 30 of the peeling processing station 3. At this time, the superposed wafer T is transported in a state where the processing target wafer W is disposed on the upper side and the support wafer S is disposed on the lower side.

The overlapped wafer T carried into the peeling apparatus 30 is sucked and held by the second holding unit 111. After that, as shown in FIG. 10, the second holding unit 111 is raised by the second vertical moving unit 152 of the moving mechanism 150, and the overlapped wafer T is sandwiched between the first holding unit 110 and the second holding unit 111. Hold on. At this time, the non-bonding surface W _N of the wafer W is held by suction on the first holding portion 110, the non-bonding surface S _N of the support wafer S is held by suction to the second holding portion 111. At this time, the temperature of the processing target wafer W held in the first holding unit 110 is normal temperature, for example, 23 ° C., and the temperature of the support wafer S held in the second holding unit 111 is also normal temperature, for example, 23 ° C. is there. Thereafter, while the wafer to be processed W and the support wafer S are peeled by the peeling apparatus 30, the temperatures of the wafer to be processed W and the support wafer S are maintained at room temperature.

  After that, as shown in FIG. 11, only the outer peripheral portion of the second holding unit 111 is moved vertically downward in an annular shape by the first vertical moving unit 151 of the moving mechanism 150. That is, when the outer peripheral part of the second holding part 111 moves vertically downward by the cylinder 160, the central part of the second holding part 111 is supported by the support pillar 161, and the central part of the second holding part 111 is The vertical position does not change.

In such a case, the support wafer S held by the second holding unit 111 is continuously peeled from the wafer W to be processed held by the first holding unit 110 from the outer periphery toward the center. Since the electronic circuit is formed on the bonding surface W _J of wafer W as described above, an attempt to peel the support wafer S and wafer W at a time, joint surface W _J, S _J it takes a great load, the electronic circuitry on the bonding surface W _J is likely to suffer damage. In this respect, in this embodiment, since the support wafer S is continuously peeled from the processing target wafer W from the outer peripheral portion toward the central portion, a large load is not applied to the bonding surfaces W _J and S _J. Therefore, damage to the electronic circuit can be suppressed.

  Thereafter, in a state where only the center portion of the wafer W to be processed and the center portion of the support wafer S are bonded, the second holding portion 111 is moved vertically downward by the second vertical moving portion 152 as shown in FIG. . Then, the support wafer S is peeled from the wafer W to be processed in a state where the outer peripheral portion of the support wafer S is bent vertically downward. Thereafter, as shown in FIG. 13, the outer periphery of the second holding unit 111 and the support wafer S is moved vertically upward by the first vertical moving unit 151, and the second holding unit 111 and the support wafer S are flattened. Is done. In this way, the wafer W to be processed held by the first holding unit 110 and the support wafer S held by the second holding unit 111 are separated (step A1 in FIG. 9).

  Thereafter, the wafer W to be processed peeled off by the peeling device 30 is transferred to the first cleaning device 31 by the second transfer device 32. Here, a transfer method of the wafer W to be processed by the second transfer device 32 will be described.

As shown in FIG. 14, the support arm 231 is extended, and the Bernoulli chuck 230 is disposed below the processing target wafer W held by the first holding unit 110. Thereafter, the Bernoulli chuck 230 is raised, and the suction of the wafer W to be processed from the suction tube 123 in the first holding unit 110 is stopped. Then, the processing target wafer W is delivered from the first holding unit 110 to the Bernoulli chuck 230. At this time, the bonding surface W _J of wafer W is held by the Bernoulli chuck 230, since the Bernoulli chuck 230 of the wafer W is held in a non-contact state, the bonding surface W _J of wafer W The upper electronic circuit is not damaged.

  Next, as shown in FIG. 15, the support arm 231 is rotated to move the Bernoulli chuck 230 above the porous chuck 190 of the first cleaning device 31, and the Bernoulli chuck 230 is inverted to move the wafer W to be processed. Turn downward. At this time, the porous chuck 190 is raised above the cup 194 and kept waiting. Thereafter, the wafer W to be processed is delivered from the Bernoulli chuck 230 to the porous chuck 190 and held by suction.

When the wafer to be processed W is sucked and held on the porous chuck 190 in this way, the porous chuck 190 is lowered to a predetermined position. Subsequently, the arm 201 moves the cleaning liquid nozzle 202 of the standby unit 204 to above the center of the wafer W to be processed. Thereafter, while rotating the wafer W by the porous chuck 190, and supplies the cleaning liquid from the cleaning liquid nozzle 202 to the bonding surface W _J of wafer W. Supplied cleaning liquid is diffused over the entire surface of the bonding surface W _J of wafer W by the centrifugal force, the bonding surface W _J of the wafer W is cleaned (step A2 in FIG. 9).

  Here, as described above, the plurality of superposed wafers T carried into the carry-in / out station 2 have been inspected in advance, and the superposed wafer T including the normal target wafer W and the defective target wafer W are arranged. The superposed wafer T is discriminated.

Normal wafer W which has been peeled from the normal bonded wafer T, after bonding surface W _J in step A2 is cleaned, it is conveyed by the third conveying device 41 to the post-processing station 4. Note that the transfer of the wafer W to be processed by the third transfer device 41 is substantially the same as the transfer of the wafer W to be processed by the second transfer device 32 described above, and thus the description thereof is omitted. Thereafter, predetermined post-processing is performed on the wafer W to be processed in the post-processing station 4 (step A3 in FIG. 9). Thus, the processing target wafer W is commercialized.

On the other hand, wafer W with a peel defects from bonded wafer T including a defect, after bonding surface W _J is washed in step A2, is conveyed to the station 2 loading and unloading by the first transfer device 20. Thereafter, the processing target wafer W having a defect is unloaded from the loading / unloading station 2 and collected (step A4 in FIG. 9).

While the above-described steps A <b> 2 to A <b> 4 are performed on the wafer W to be processed, the support wafer S peeled by the peeling device 30 is transferred to the second cleaning device 33 by the first transfer device 20. Then, in the second cleaning device 33, bonding surface _{S J} of the support wafer S is cleaned (step A5 in FIG. 9). Note that the cleaning of the support wafer S in the second cleaning device 33 is the same as the cleaning of the wafer W to be processed in the first cleaning device 31 described above, and thus the description thereof is omitted.

Thereafter, the support wafer S which joint surface S _J is cleaned is conveyed to station 2 loading and unloading by the first transfer device 20. Thereafter, the support wafer S is unloaded from the loading / unloading station 2 and collected (step A6 in FIG. 9). In this way, a series of separation processing of the processing target wafer W and the supporting wafer S is completed.

  According to the peeling apparatus 30 of the above embodiment, the outer peripheral portion of the second holding unit 111 is moved vertically downward, and the room temperature support wafer S held by the second holding unit 111 is moved from the outer peripheral portion. The wafer can be continuously peeled from the wafer W to be processed held at the first holding unit 110 toward the center. Thus, since the support wafer S is continuously peeled from the wafer W to be processed from the outer periphery toward the center, the wafer W to be processed and the support wafer S can be easily peeled with a small load. For this reason, the to-be-processed wafer W and the support wafer S can be peeled appropriately, without the electronic circuit on the to-be-processed wafer W being damaged. Furthermore, the time required for the peeling treatment can be shortened as compared with the conventional case. Therefore, according to the present embodiment, it is possible to appropriately and efficiently perform the separation process between the processing target wafer W and the supporting wafer S.

  In addition, since the moving mechanism 150 includes the first vertical moving unit 151 and the second vertical moving unit 152, the separation process of the processing target wafer W and the supporting wafer S can be performed in stages. That is, after the support wafer S is continuously peeled from the wafer W to be processed from the outer periphery toward the center by the first vertical movement unit 151, the wafer W and the support wafer S are processed by the second vertical movement unit 152. Can be completely peeled off. By performing the peeling process stepwise in this way, the wafer W to be processed and the support wafer S can be uniformly peeled. In addition, since the first vertical movement unit 151 moves the outer peripheral portion of the second holding unit 111 in a ring shape vertically downward, the wafer to be processed W and the support wafer S can be more evenly separated.

  According to the peeling system 1 of the above embodiment, after the superposed wafer T is peeled off from the processing target wafer W and the support wafer S in the peeling device 30, the peeled processing target wafer W is peeled off in the first cleaning device 31. In addition to cleaning, the second cleaning device 33 can clean the peeled support wafer S. As described above, according to the present embodiment, a series of stripping processes from the stripping of the processing target wafer W and the supporting wafer S to the cleaning of the processing target wafer W and the cleaning of the supporting wafer S can be efficiently performed in one stripping system 1. Can be done well. Further, in the first cleaning device 31 and the second cleaning device 33, the cleaning of the processing target wafer W and the cleaning of the support wafer S can be performed in parallel. Furthermore, while the wafer to be processed W and the support wafer S are peeled by the peeling apparatus 30, the other wafer to be processed W and the support wafer S can be processed by the first cleaning device 31 and the second cleaning device 33. . Therefore, the wafer W to be processed and the support wafer S can be efficiently peeled, and the throughput of the peeling process can be improved.

  Further, in this series of processes, the process from the separation of the wafer to be processed W and the support wafer S to the post-processing of the wafer to be processed W can be performed, so that the throughput of the wafer processing can be further improved.

  In the peeling apparatus 30 of the above embodiment, the first vertical drive unit 151 may be configured to hold the second holding unit 111 and move only the outer peripheral portion of the second holding unit 111 in the vertical direction. What is necessary is just to take various structures. For example, instead of the cylinder 160 and the support column 161 of the first vertical drive unit 151, the first vertical drive unit 310 may have a bellows 311 and a support column 312 as shown in FIG.

  The bellows 311 is made of, for example, a stainless steel bellows that can expand and contract in the vertical direction. The bellows 311 holds the second holding portion 111 on its upper surface, and its lower surface is supported by the support plate 162. A fluid supply pipe 313 for supplying a fluid, for example, compressed air, is connected to the bellows 311. The fluid supply pipe 313 is connected to a fluid supply source (not shown). The bellows 311 is extended by supplying fluid from the fluid supply pipe 313 to the bellows 311.

  The support column 312 is provided inside the bellows 311. The support pillar 312 supports the central portion of the second holding part 111.

  In addition, since the other structure of the peeling apparatus 30 is the same as that of the structure of the peeling apparatus 30 of the said embodiment, description is abbreviate | omitted.

  In such a case, as shown in FIG. 17, the first vertically moving unit 310 moves only the outer periphery of the second holding unit 111 in an annular shape in the vertically downward direction. That is, when the outer peripheral part of the second holding part 111 moves vertically downward by the bellows 311, the central part of the second holding part 111 is supported by the support pillar 312, and the central part of the second holding part 111 is The vertical position does not change. Then, the support wafer S held by the second holding unit 111 is continuously peeled from the processing target wafer W held by the first holding unit 110 from the outer peripheral part toward the center part. Therefore, also in the present embodiment, the processing target wafer W and the supporting wafer S can be appropriately and uniformly separated.

  The peeling apparatus 30 of the above embodiment may have a rotating mechanism 320 that rotates the first holding unit 110 as shown in FIG. The rotation mechanism 320 is provided between the first holding unit 110 and the support plate 130. Further, the rotation mechanism 320 has a motor (not shown) for rotating the first holding unit 110. In addition, since the other structure of the peeling apparatus 30 is the same as that of the structure of the peeling apparatus 30 of the said embodiment, description is abbreviate | omitted.

  In such a case, after the superposed wafer T is held by the first holding unit 110 and the second holding unit 111 in the above-described step A1, the first holding unit 110 is rotated by the rotation mechanism 320. The rotation speed of the first holding unit 110 at this time is, for example, 1 mm / second to 10 mm / second. Thereafter, the outer peripheral portion of the second holding unit 111 is moved vertically downward to continuously peel the support wafer S from the processing target wafer W from the outer peripheral portion toward the central portion, and then the second holding unit 111 as a whole. Is moved vertically downward to separate the wafer W to be processed and the support wafer S from each other. In addition, since the peeling method of this to-be-processed wafer W and the support wafer S is the same as the method demonstrated in the said embodiment, description is abbreviate | omitted.

  According to the present embodiment, since the first holding unit 110 is rotated, the equilibrium state between the wafer W to be processed and the support wafer S by the adhesive G can be broken. If it does so, the outer peripheral part of the 2nd holding | maintenance part 111 can be moved smoothly after that, and the outer peripheral part of the support wafer S can be peeled from the to-be-processed wafer W smoothly. Therefore, the separation process between the wafer W to be processed and the support wafer S can be performed more efficiently.

  In the above embodiment, the rotation mechanism 320 rotates the first holding unit 110. However, instead of the rotation mechanism 320, a rotation mechanism (not shown) that rotates the second holding unit 111 is provided. May be. Moreover, you may provide both the rotation mechanism which rotates the rotation mechanism 320 and the 2nd holding | maintenance part.

  As shown in FIG. 19, the peeling device 30 of the above embodiment is bonded to the adhesive G on the outer peripheral portion of the overlapped wafer T held by the first holding part 110 and the second holding part 111. You may have the solvent supply part 330 which supplies the organic solvent which is a solvent of the agent G. The solvent supply unit 330 is provided in an annular shape so as to surround the outer periphery of the superposed wafer T. The solvent supply unit 330 is formed with a plurality of supply ports 331 for supplying an organic solvent. In addition, the solvent supply part 330 is not limited to the shape of this Embodiment, It can take the various shape which supplies an organic solvent. For example, a cup-shaped member surrounding the outer peripheral portion of the superposed wafer T may be used for the solvent supply unit 330. Moreover, since the other structure of the peeling apparatus 30 is the same as that of the peeling apparatus 30 of the said embodiment, description is abbreviate | omitted.

  In such a case, after the overlapped wafer T is held by the first holding unit 110 and the second holding unit 111 in the above-described step A1, the adhesive G exposed from the solvent supply unit 330 to the outer peripheral portion of the overlapped wafer T is applied. Supply organic solvent. If it does so, the adhesive agent G of the outer peripheral part of the superposition | polymerization wafer T will melt | dissolve in this organic solvent. For this reason, the load at the time of moving the 2nd holding | maintenance part 111 below vertically can be made small after that. Then, the outer peripheral portion of the second holding unit 111 is moved vertically downward to continuously peel the support wafer S from the wafer W to be processed from the outer peripheral portion toward the central portion, and then the entire second holding unit 111. Is moved vertically downward to separate the wafer W to be processed and the support wafer S from each other.

  According to the present embodiment, since the load when moving the second holding unit 111 vertically downward in the step A1 can be further reduced, the processing target wafer W and the support wafer S can be easily loaded with a smaller load. Can be peeled off. Therefore, the processing target wafer W and the supporting wafer S can be appropriately separated without damaging the electronic circuit on the processing target wafer W. Further, the wafer to be processed W and the support wafer S can be peeled off more quickly.

  In the above embodiment, the first vertical moving portion 151 of the moving mechanism 150 has moved the outer peripheral portion of the second holding portion 111 in an annular shape in the vertical direction, but the outer periphery of the second holding portion 111 is The one end side of the part may be moved in the vertical direction. And you may peel the support wafer S from the to-be-processed wafer W toward the other end part from the one end part of an outer peripheral part. Even in such a case, the wafer to be processed W and the support wafer S are continuously peeled off, so that the wafer to be processed W and the support wafer S can be peeled appropriately and uniformly.

  In the above embodiment, the wafer to be processed W and the support wafer S are separated in a state where the wafer to be processed W is arranged on the upper side and the support wafer S is arranged on the lower side. The vertical arrangement of the wafer W and the support wafer S may be reversed. In such a case, the moving mechanism 150 may move the second holding unit 111 vertically upward.

In the second transport device 32 of the above embodiment, a plurality of supply ports (not shown) for supplying the cleaning liquid may be formed on the surface of the Bernoulli chuck 230. In such a case, when passing wafer W to porous chuck 190 of the first cleaning device 31 from the Bernoulli chuck 230, the bonding surface W by supplying a cleaning liquid to the bonding surface W _J of wafer W from the Bernoulli chuck 230 _{In addition} to cleaning _J , the Bernoulli chuck 230 itself can also be cleaned. If it does so, the cleaning time of the to-be-processed wafer W in the 1st cleaning apparatus 31 after that can be shortened, and the throughput of peeling processing can further be improved. Moreover, since the Bernoulli chuck 230 can also be cleaned, the next wafer to be processed W can be appropriately transferred.

  In the above embodiment, the third transport device 41 includes the Bernoulli chuck 230. However, instead of the Bernoulli chuck 230, the third transport device 41 may include a porous chuck (not shown). Even in such a case, the wafer W to be processed thinned by the porous chuck can be appropriately sucked and held.

  In the above embodiment, the two-fluid nozzle is used as the cleaning liquid nozzle 202 of the first cleaning apparatus 31 and the second cleaning apparatus 33. However, the form of the cleaning liquid nozzle 202 is not limited to this embodiment. Various nozzles can be used. For example, as the cleaning liquid nozzle 202, a nozzle body in which a nozzle for supplying a cleaning liquid and a nozzle for supplying an inert gas are integrated, a spray nozzle, a jet nozzle, a megasonic nozzle, or the like may be used. In order to improve the throughput of the cleaning process, for example, a cleaning liquid heated to 80 ° C. may be supplied.

Further, in the first cleaning device 31 and the second cleaning device 33, in addition to the cleaning liquid nozzle 202, a nozzle for supplying IPA (isopropyl alcohol) may be provided. In this case, after cleaning the wafer W or the support wafer S with the cleaning liquid from the cleaning liquid nozzle 202, the cleaning liquid on the wafer W or the support wafer S is replaced with IPA. Then, the bonding surfaces W _J and S _{J of the} processing target wafer W or the support wafer S are more reliably cleaned.

  The peeling method of the to-be-processed wafer W and the support wafer S of the above embodiment is, for example, for processing the superposed wafer T in which the outer peripheral portions of the to-be-processed wafer W and the support wafer S are strongly bonded by the adhesive G This is particularly useful when separating the wafer W and the support wafer S.

  The superposed wafer T may be one obtained by bonding and bonding only the outer peripheral portions of the processing target wafer W and the supporting wafer S. In this case, for example, the outer peripheral portion of the surface of the support wafer S is formed to be bonded and bonded to the adhesive G on the processing target wafer W, and the center portion of the surface of the support wafer S is bonded to the adhesive G. It is formed not to be. Alternatively, the overlapped wafer T may be bonded and bonded so that the adhesive force between the outer peripheral portions of the processing target wafer W and the support wafer S is larger than the adhesive force at the central portion. In this case, for example, an adhesive having a strong adhesive force is used for the outer peripheral portions of the processing target wafer W and the support wafer S, and an adhesive having a weak adhesive force is used for the central portion.

  In this case, the load when moving the second holding part 111 vertically downward in the above-described step A1 can be further reduced. Therefore, the processing target wafer W and the supporting wafer S can be easily separated with a smaller load. Further, the wafer to be processed W and the support wafer S can be peeled off more quickly.

  In the above-described embodiment, the case where the post-processing station 4 performs post-processing on the wafer to be processed W to produce a product has been described. It can also be applied to the case where it is peeled off. The three-dimensional integration technology is a technology that meets the recent demand for higher integration of semiconductor devices. Instead of arranging a plurality of highly integrated semiconductor devices in a horizontal plane, This is a technique of three-dimensional lamination. Also in this three-dimensional integration technique, it is required to reduce the thickness of wafers to be processed, and the wafers to be processed are bonded to a support wafer to perform a predetermined process.

The preferred embodiments of the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to such examples. It is obvious for those skilled in the art that various modifications or modifications can be conceived within the scope of the idea described in the claims, and these naturally belong to the technical scope of the present invention. It is understood.
The present invention is not limited to this example and can take various forms. The present invention can also be applied to a case where the substrate is another substrate such as an FPD (flat panel display) other than a wafer or a mask reticle for a photomask.

DESCRIPTION OF SYMBOLS 1 Peeling system 2 Carry-in / out station 3 Peeling processing station 4 Post-processing station 5 Interface station 6 Wafer conveyance area | region 20 1st conveyance apparatus 30 Peeling apparatus 31 1st washing | cleaning apparatus 32 2nd conveyance apparatus 33 2nd washing | cleaning apparatus 41 Third transport device 110 First holding unit 111 Second holding unit 150 Moving mechanism 151 First vertical moving unit 152 Second vertical moving unit 153 Horizontal moving unit 160 Cylinder 161 Support pillar 162 Support plate 170 Drive unit 171 Support member 300 Control unit 310 First vertical movement unit 311 Bellows 312 Support column 313 Fluid supply pipe 320 Rotating mechanism 330 Solvent supply unit G Adhesive S Support wafer T Superposition wafer W Processed wafer

Claims (15)

A peeling apparatus for peeling a polymerization substrate in which a substrate to be processed and a support substrate are bonded with an adhesive, to the substrate to be processed and the support substrate,
A first holding unit for holding the substrate to be processed at room temperature;
A second holding unit for holding the support substrate at room temperature;
The normal temperature supporting substrate held by the second holding part is continuously peeled from the normal temperature processing substrate held by the first holding part from the entire circumference of the outer peripheral part toward the central part. And a moving mechanism for holding the outer peripheral portion of the second holding portion and moving the second holding portion in the vertical direction. The first holding part is disposed above the second holding part,
The peeling apparatus according to claim 1 , wherein the moving mechanism moves the second holding portion vertically downward. The peeling apparatus according to claim 2 , further comprising a rotation mechanism that rotates at least the first holding unit or the second holding unit. The moving mechanism is
A first moving unit that holds the second holding unit and moves only an outer peripheral portion of the second holding unit in a vertical direction;
Holding the first moving unit, and characterized by having a, a second moving unit for moving the second holding portion and the first moving portion in the vertical direction, according to claim 1 to 3 The peeling apparatus in any one of. The first moving unit includes:
A plurality of cylinders for moving the outer peripheral portion of the second holding portion in the vertical direction;
When the outer peripheral part of the second holding part moves in the vertical direction by the plurality of cylinders, the center of the second holding part is not changed so that the vertical position of the central part of the second holding part does not change. The peeling apparatus according to claim 4 , further comprising a support column that supports the portion. The first moving unit includes:
A bellows that holds the second holding portion and is vertically extendable;
Provided inside the bellows, when the bellows contracts and the outer peripheral portion of the second holding portion moves in the vertical direction, the vertical position of the central portion of the second holding portion does not change. The peeling apparatus according to claim 4 , further comprising a support column that supports a central portion of the second holding portion. A solvent supply unit that supplies a solvent of the adhesive to an adhesive on an outer peripheral portion of the polymerization substrate held by the first holding unit and the second holding unit. The peeling apparatus in any one of 1-6 . A peeling system comprising a peeling device according to any one of claims 1 to 7
A peeling processing station comprising: the peeling device; a first cleaning device that cleans the substrate to be processed peeled by the peeling device; and a second cleaning device that cleans the support substrate peeled by the peeling device. When,
A loading / unloading station for loading / unloading a substrate to be processed, a support substrate or a superposed substrate with respect to the peeling processing station,
A peeling system comprising: a transfer device that transfers a substrate to be processed, a support substrate, or a superposed substrate between the peeling processing station and the carry-in / out station. An interface station that transports a substrate to be processed is provided between the peeling processing station and a post-processing station that performs predetermined post-processing on the substrate to be processed that has been peeled off at the peeling processing station. The peeling system according to claim 8 . Using a peeling apparatus, a peeling method for peeling a polymerization substrate in which a substrate to be processed and a support substrate are bonded with an adhesive, to the substrate to be processed and the support substrate,
The peeling device is
A first holding unit for holding the substrate to be processed at room temperature;
A second holding unit for holding the support substrate at room temperature;
The support substrate held by the second holding unit is continuously peeled from the substrate to be processed held by the first holding unit from the entire circumference of the outer peripheral part toward the central part. A moving mechanism for moving the outer peripheral part of the holding part in the vertical direction,
The peeling method includes:
The first holding portion moves the outer peripheral portion of the second holding portion in the vertical direction, and moves the room temperature support substrate held by the second holding portion from the entire circumference of the outer peripheral portion toward the center portion. A first step of continuously peeling from the substrate to be processed at room temperature held in
Then, the second holding part is moved in the vertical direction to have a second step of peeling the substrate to be processed and the support substrate. The first holding part is disposed above the second holding part,
The peeling method according to claim 10 , wherein in the first step and the second step, the second holding portion is moved vertically downward. The peeling apparatus has a rotation mechanism that rotates at least the first holding unit or the second holding unit,
In the first step, at least after the rotation of the first holding part or the second holding part is started, the outer peripheral part of the second holding part is moved in the vertical direction so that the outer peripheral part moves to the center part. The peeling method according to claim 11 , wherein the supporting substrate is continuously peeled from the substrate to be processed. In the first step, the adhesive solvent is supplied to the adhesive on the outer periphery of the superposed substrate held by the first holding part and the second holding part, The peeling method according to any one of claims 10 to 12 . A program that operates on a computer of a control unit that controls the peeling device in order to cause the peeling device to execute the peeling method according to any one of claims 10 to 13 . A readable computer storage medium storing the program according to claim 14 .

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