JP5218489B2 - Display element and manufacturing method thereof, display device and manufacturing method thereof - Google Patents

Description

The present invention is self-luminous display device and manufacturing method thereof, such as organic light-emitting device, and relates to a method of manufacturing a display device, particularly a display device and a manufacturing method thereof having a resonator structure, and to a method of manufacturing a display device .

  In recent years, organic EL displays using organic light-emitting elements have been put into practical use as display devices that replace liquid crystal displays. Since the organic EL display is a self-luminous type, the viewing angle is wider than that of liquid crystal or the like, and it is considered that the organic EL display has sufficient response to a high-definition high-speed video signal.

  So far, organic light-emitting devices have been tried to control the light generated in the light-emitting layer by introducing a resonator structure to improve the color purity of the light emission color or increase the light emission efficiency ( For example, see Patent Document 1).

WO 01/39554 pamphlet JP-A-9-190883 JP 2006-32327 A

  However, when the organic light emitting device is thus provided with a resonator structure, the spectrum of the resonated light has a high peak and a narrow width, so that the light extraction efficiency in the front direction with respect to the display screen is improved, while the screen is inclined. When viewed from above, there is a problem that the emission wavelength is greatly shifted or the emission intensity is lowered. That is, conventionally, there has been a problem that luminance differences and color shifts occur depending on the viewing angle of the screen, resulting in deterioration of viewing angle characteristics and deterioration of image quality.

  By the way, in the past, in order to improve the viewing angle characteristics of organic light emitting devices, by forming a concave structure, light diffusing layer, and photorefractive layer on the transparent substrate, the light emission direction is diffused, and the light directivity is averaged. There has been an attempt to expand the viewing angle by making it (see, for example, Patent Document 2). However, this conventional method has a problem that external light is scattered by the concave structure, the light diffusing layer, and the photorefractive layer formed on the transparent substrate, and the external light contrast is remarkably deteriorated.

  In Patent Document 3, it is proposed to use a laminated electrode of a metal reflective film and a transparent conductive film and to provide a plurality of resonator structures having different optical distances in one element by changing the thickness of the transparent conductive film. Has been. However, in the structure of Patent Document 3, it is necessary to change the thickness of the transparent conductive film in one element in addition to the necessity of the transparent conductive film, which increases the film formation and patterning steps for the manufacturing cost. There was a problem that would rise. In addition, the stepped portion where the thickness of the transparent conductive film changes tends to cause non-light emitting defects. As a countermeasure, the stepped portion may be covered with an insulating film, but the aperture ratio has been lowered.

The present invention has been made in view of the above problems, an object of a display element and a method of manufacturing the same capable of improving the viewing angle characteristics without deteriorating external light contrast, and provides a method of manufacturing a display device There is to do.

The display device according to the present invention includes a first electrode, an organic layer including a light emitting layer, and a second electrode on a substrate in order, and light generated in the light emitting layer is transmitted between the first end and the second end. The substrate has a resonator structure that resonates, and a concavo-convex structure having a concavo-convex shape is provided on the surface of the first electrode on the substrate, the first electrode is provided on the concavo-convex structure, and the first electrode The end surface on the light emitting layer side is a first end portion having a concavo-convex shape in which the height continuously changes corresponding to the concavo-convex structure and the surface is a curved surface, and is between the first electrode and the second electrode. In addition, by providing a distance adjustment layer having a concavo-convex shape and a flat surface on the second electrode side, the second end becomes flat and the first end and the second end according to the concavo-convex shape optical distance is continuously changed between the average inclination angle of the uneven shape of the first end portion is 2 ° or more Those are.
The method for manufacturing a display element according to the present invention includes a first electrode, an organic layer including a light emitting layer, and a second electrode on a substrate in order, and light generated in the light emitting layer is transmitted between the first end and the second end. And manufacturing a display element having a resonator structure that resonates between a step of forming a single-layer concavo-convex structure having a concavo-convex shape on the surface of the first electrode on a substrate, A first electrode is provided on the light emitting layer side of the first electrode, and the end surface of the first electrode is a first end portion having a concavo-convex shape having a curved surface and a continuously changing height corresponding to the concavo-convex structure; By embedding a concavo-convex shape between the first electrode and the second electrode and providing a distance adjusting layer having a flat surface on the second electrode side, the second end portion is flattened and the concavo-convex shape is adapted. Continuously changing the optical distance between the first end and the second end; In the process of forming the concavo-convex structure, the photosensitive resin film is exposed and developed by a photolithography method using a halftone reticle or two reticles, and the reticle pattern used for exposure is finer than the resolution of the exposure machine. By using a simple pattern, the average inclination angle of the irregular shape at the first end is set to 2 ° or less .

A display device according to the present invention includes the display element of the present invention.
A method for manufacturing a display device according to the present invention is a method for manufacturing a display device including the display element according to the present invention, and the display element is manufactured by the method for manufacturing a display element according to the present invention.

In the display element according to the present invention or the display device according to the present invention, the first end of the resonator structure has a concavo-convex shape in which the height continuously changes and the surface is a curved surface. Since the optical distance between the first end and the second end is continuously changed by being embedded and flattened by the distance adjustment layer, the peak wavelength of the spectrum of the extracted light is optical. It changes continuously according to the distance, the full width at half maximum of the synthesized spectrum is widened, and the viewing angle characteristics are improved.
Moreover, since the average inclination angle of the uneven shape at the first end is 2 ° or less, a decrease in external light contrast can be suppressed.

According to the display element and the manufacturing method of the present invention, or the display device and the manufacturing method of the present invention, the first end portion of the resonator structure has a concavo-convex shape whose height changes continuously and whose surface is a curved surface. The optical distance between the first end portion and the second end portion is continuously changed by embedding and flattening the uneven shape with the distance adjusting layer. The peak wavelength of the spectrum can be continuously changed according to the optical distance, the half width of the spectrum obtained by synthesizing them can be widened, and the viewing angle characteristics can be improved.
In addition, since the average inclination angle of the irregular shape of the first end portion is set to 2 ° or less, the viewing angle characteristics can be improved without deteriorating the external light contrast.

Further, according to Table示素Ko or display device of the present invention, the concave structure and the light diffusing layer in the conventional transparent substrate as, the need to form a structure that may that scatters external light such as light refraction layer is eliminated, The external light contrast is not deteriorated, and the manufacturing cost is also advantageous.

It is a figure showing the structure of the display apparatus which concerns on the 1st Embodiment of this invention. It is a figure showing an example of the pixel drive circuit shown in FIG. It is a top view showing the structure of the display area shown in FIG. It is a top view showing the structure of the organic light emitting element shown in FIG. It is sectional drawing showing the structure of the organic light emitting element shown in FIG. It is a figure showing the spectrum of the resonator filter at the time of changing (DELTA) L. It is a figure showing the change of the brightness | luminance by viewing angle at the time of changing (DELTA) L. It is a figure showing color difference (DELTA) u'v 'by a viewing angle at the time of changing (DELTA) L. FIG. 6 is a cross-sectional view illustrating another configuration example of the organic light emitting element illustrated in FIG. 5. FIG. 3 is a cross-sectional view illustrating a method of manufacturing the display device illustrated in FIG. 1 in order of steps. FIG. 11 is a cross-sectional diagram illustrating a process following the process in FIG. 10. FIG. 12 is a cross-sectional diagram illustrating a process following the process in FIG. 11. It is sectional drawing showing the structure of the organic light emitting element used for the display apparatus which concerns on the 2nd Embodiment of this invention. It is sectional drawing showing the structure of the organic light emitting element used for the display apparatus which concerns on the 3rd Embodiment of this invention. It is sectional drawing showing the other structural example of the organic light emitting element shown in FIG. It is sectional drawing showing the structure of the organic light emitting element used for the display apparatus which concerns on the 4th Embodiment of this invention. FIG. 17 is a cross-sectional view illustrating another configuration of the organic light emitting element illustrated in FIG. 16. FIG. 17 is a cross-sectional view illustrating still another configuration of the organic light emitting device illustrated in FIG. 16. FIG. 17 is a cross-sectional view illustrating a method of manufacturing the display device illustrated in FIG. 16 in order of steps. FIG. 20 is a cross-sectional diagram illustrating a process following the process in FIG. 19. FIG. 18 is a cross-sectional view illustrating a method of manufacturing the display device illustrated in FIG. 17 in order of steps. FIG. 22 is a cross-sectional diagram illustrating a process following the process in FIG. 21. It is a top view showing the structure of the display apparatus which concerns on the 5th Embodiment of this invention. FIG. 24 is a cross-sectional view illustrating a configuration of two adjacent pixels illustrated in FIG. 23. 10 is a cross-sectional view illustrating a configuration of two adjacent pixels according to Modification 1. FIG. FIG. 26 is a cross-sectional view illustrating a method of manufacturing the display device illustrated in FIG. 25 in order of steps. FIG. 27 is a cross-sectional diagram illustrating a process following the process in FIG. 26. 10 is a cross-sectional view illustrating a configuration of two adjacent pixels according to Modification 2. FIG. FIG. 29 is a cross-sectional view illustrating a method of manufacturing the display device illustrated in FIG. 28 in order of steps. FIG. 30 is a cross-sectional diagram illustrating a process following the process in FIG. 29. 10 is a cross-sectional view illustrating a configuration of two adjacent pixels according to Modification 3. FIG. It is a top view showing schematic structure of the module containing the display apparatus of each said embodiment. It is a perspective view showing the external appearance of the application example 1 of the display apparatus of each said embodiment. (A) is a perspective view showing the external appearance seen from the front side of the application example 2, (B) is a perspective view showing the external appearance seen from the back side. 12 is a perspective view illustrating an appearance of application example 3. FIG. 14 is a perspective view illustrating an appearance of application example 4. FIG. (A) is a front view of the application example 5 in an open state, (B) is a side view thereof, (C) is a front view in a closed state, (D) is a left side view, and (E) is a right side view, (F) is a top view and (G) is a bottom view. It is a top view showing the other example of the planar shape of the 1st area | region and 2nd area | region of the organic light emitting element shown in FIG. FIG. 10 is a plan view illustrating still another example of the planar shape of the first region and the second region of the organic light emitting device illustrated in FIG. 2. FIG. 10 is a plan view illustrating still another example of the planar shape of the first region and the second region of the organic light emitting device illustrated in FIG. 2.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

(First embodiment)
FIG. 1 shows a configuration of a display device using an organic light emitting element according to a first embodiment of the present invention. This display device is used as an ultra-thin organic light emitting color display device or the like. For example, a plurality of organic light emitting elements 10R, which will be described later, are formed on a substrate 11 made of glass, silicon (Si) wafer, resin, or the like. A display area 110 in which 10G and 10B are arranged in a matrix is formed, and a signal line driving circuit 120 and a scanning line driving circuit 130, which are drivers for displaying images, are formed around the display area 110. Is.

  A pixel drive circuit 140 is formed in the display area 110. FIG. 2 illustrates an example of the pixel driving circuit 140. The pixel driving circuit 140 is formed below the first electrode 15 described later, and includes a driving transistor Tr1 and a writing transistor Tr2, a capacitor (holding capacitor) Cs therebetween, a first power supply line (Vcc), and a second power source line (Vcc). This is an active drive circuit having an organic light emitting element 10R (or 10G, 10B) connected in series to the drive transistor Tr1 between power supply lines (GND). The driving transistor Tr1 and the writing transistor Tr2 are configured by a general thin film transistor (TFT (Thin Film Transistor)), and the configuration may be, for example, an inverted staggered structure (so-called bottom gate type) or a staggered structure (top gate type). There is no particular limitation.

  In the pixel driving circuit 140, a plurality of signal lines 120A are arranged in the column direction, and a plurality of scanning lines 130A are arranged in the row direction. An intersection between each signal line 120A and each scanning line 130A corresponds to one of the organic light emitting elements 10R, 10G, and 10B (sub pixel). Each signal line 120A is connected to the signal line drive circuit 120, and an image signal is supplied from the signal line drive circuit 120 to the source electrode of the write transistor Tr2 via the signal line 120A. Each scanning line 130A is connected to the scanning line driving circuit 130, and a scanning signal is sequentially supplied from the scanning line driving circuit 130 to the gate electrode of the writing transistor Tr2 via the scanning line 130A.

  FIG. 3 illustrates an example of a planar configuration of the display area 110. In the display area 110, an organic light emitting element 10R that generates red light, an organic light emitting element 10G that generates green light, and an organic light emitting element 10B that generates blue light are sequentially formed in a matrix. Has been. A combination of adjacent organic light emitting elements 10R, 10G, and 10B constitutes one pixel (pixel) 10.

  FIG. 4 shows a planar configuration of the organic light emitting devices 10R, 10G, and 10B shown in FIG. 3, and FIG. 5 shows a common sectional configuration thereof. The organic light emitting elements 10R, 10G, and 10B are respectively arranged from the substrate 11 side from the driving transistor Tr1, the planarization insulating film 13, the step forming layer 14, the first electrode 15 as an anode, and the interelectrode between the pixel driving circuit 140 described above. The insulating film 16, the distance adjusting layer 17, the organic layer 18 including the light emitting layer 18C described later, and the second electrode 19 as a cathode are stacked in this order. In addition, the light emitting layer 18C is divided, for example, into a first region 21 in the central portion and a second region 22 in the left and right portions in the planar shape.

  Such organic light emitting devices 10R, 10G, and 10B are covered with a protective film 30 such as silicon nitride (SiNx), and a sealing substrate 50 made of glass or the like with an adhesive layer 40 interposed between the protective film 30 and the adhesive layer 40. Is sealed by being bonded over the entire surface.

  In the organic light emitting devices 10R, 10G, and 10B, the first electrode 15 functions as a reflective layer, while the second electrode 19 functions as a semi-transmissive reflective layer. 15 and the second electrode 19 constitute a resonator structure that resonates the light generated in the light emitting layer 18C.

That is, in the organic light emitting devices 10R, 10G, and 10B, the end surface of the first electrode 15 on the light emitting layer 18C side is the first end portion P1, and the end surface of the second electrode 19 on the light emitting layer 18C side is the second end portion P2. The organic layer 18 is used as a resonance part, and a resonator structure in which light generated in the light emitting layer 18C is resonated and extracted from the second end P2 side is provided. With this resonator structure, the light generated in the light emitting layer 18C causes multiple interference and acts as a kind of narrow band filter, thereby reducing the half width of the spectrum of the extracted light. Purity can be improved. In addition, external light incident from the sealing substrate 50 side can also be attenuated by multiple interference, and the organic light emitting element 10R can be combined with a color filter 51 described later or a retardation plate and a polarizing plate (not shown). , 10G, 10B, the reflectance of external light can be made extremely small.

  The drive transistor Tr1 is electrically connected to the first electrode 15 through a connection hole 13A provided in the planarization insulating film 13.

  The planarization insulating film 13 is for planarizing the surface of the substrate 11 on which the pixel driving circuit 140 is formed, and is formed of a material having a high pattern accuracy because a fine connection hole 13A is formed. Is preferred. As a constituent material of the planarization insulating film 13, for example, an organic material such as polyimide or an inorganic material such as silicon oxide (SiO2) can be used.

The step forming layer 14 is provided only in the second region 22 on the substrate 11 and is used to form a step shape on the end surface of the first electrode 15 on the light emitting layer 18C side. The step forming layer 14 is formed of, for example, aluminum (Al), molybdenum (Mo), titanium (Ti), chromium (Cr), gold (Au), platinum (Pt), nickel (Ni), copper (Cu), tungsten ( W) or silver (Ag) or other elemental metal element or alloy. Further, the step forming layer 14 may be an insulating film such as silicon oxide (SiO 2) or silicon nitride (SiN x).

  The first electrode 15 also serves as a reflective layer, and it is desirable to increase the luminous efficiency to have as high a reflectance as possible. The first electrode 15 has, for example, a thickness in the stacking direction (hereinafter simply referred to as a thickness) of 100 nm or more and 1000 nm or less, and chromium (Cr), gold (Au), platinum (Pt), nickel (Ni), copper (Cu ), Tungsten (W), silver (Ag), or other elemental elements or alloys of metal elements. A part of the first electrode 15 in the second region 22 is formed on the step forming layer 14. Thereby, the end surface of the first electrode 15 on the light emitting layer 18 </ b> C side, that is, the first end portion P <b> 1 of the resonator structure described above has a step shape corresponding to the step forming layer 14.

  The interelectrode insulating film 16 is intended to ensure insulation between the first electrode 15 and the second electrode 19 and to accurately form the light emitting region composed of the first region 21 and the second region 22. For example, it is made of a photosensitive resin. The interelectrode insulating film 16 is provided with an opening corresponding to the light emitting region. Note that the organic layer 18 and the second electrode 19 are continuously provided not only on the first region 21 and the second region 22 but also on the interelectrode insulating film 16, but light emission occurs between the interelectrode insulating layers. Only the opening of the membrane 16.

  The distance adjustment layer 17 is for varying the optical distance between the first end P1 and the second end P2 according to the step shape, and buryes the step shape of the first electrode 15 and the second step. A flat surface 17A is provided on the electrode 19 side. That is, by providing the distance adjustment layer 17, the second end P2 becomes flat, and the optical distance L1 between the first end P1 and the second end P2 of the resonator in the first region 21 ( Hereinafter, simply “optical distance L1 in the first region 21”) and optical distance L2 between the first end P1 and the second end P2 of the resonator in the second region 22 (hereinafter simply referred to as “optical distance L1”). "The optical distance L2 in the second region 22") is different from each other. Thereby, in this organic light emitting element 10R, 10G, 10B, the resonance wavelength (peak wavelength of the spectrum of the extracted light) of the resonator in each of the first region 21 and the second region 22 is made different. The half-width of the spectrum obtained by synthesizing the spectrum of light extracted from each of the second regions 22 can be widened to improve the viewing angle characteristics.

  For this purpose, it is preferable that the optical distance L1 in the first region 21 and the optical distance L2 in the second region 22 satisfy Equation 1.

(Equation 1)
L1 = Lave + ΔL
L2 = Lave−ΔL
(2Lave) / λ + Φ / (2π) = m
Where Lave is the average optical distance between the optical distance L1 in the first region 21 and the optical distance L2 in the second region 22, and Φ is the phase shift Φ1 of the reflected light generated at the first end P1 and the second The sum (Φ = Φ1 + Φ2) (rad) of the phase shift Φ2 of the reflected light generated at the end portion P2, λ is the peak wavelength of the spectrum of light desired to be extracted from the second end portion P2, and m is positive for Lave Each represents an integer. In Equation 1, L1, L2, Lave, and λ may have the same unit, for example, (nm) as a unit.)

  In Equation 1, the third equation relating to the average optical distance Lave is such that the resonance wavelength of the resonator (the peak wavelength of the extracted light spectrum) matches the peak wavelength of the desired light spectrum, and the light extraction efficiency is maximized. It is for. In practice, this average optical distance Lave is preferably the case where m in the third equation of Formula 1 is 0 or 1.

  As can be seen from Equation 1, in this embodiment, even if the order m is the same, the optical distance L1 of the first region 21 and the optical distance L2 of the second region 22 can be made different from each other. Therefore, for example, if m = 1, the thickness of the organic layer 18 can be increased to reduce non-light emitting defects, and both improvement in productivity and good viewing angle characteristics can be achieved. On the other hand, in the conventional patent document 3, the order m is set to be different from, for example, 0 and 1 in order to provide a difference in optical distance. Therefore, in the area where m = 0, compared to the area where m = 1. As a result, the thickness of the organic layer is reduced, and non-luminous defects are likely to increase. Further, the difference in optical distance (| L2−L1 |) between m = 0 and m = 1 is as large as about 120 nm in blue when converted to the thickness of ITO (Indium Tin Oxide) or an organic layer. The process of forming a step has become more difficult than in the case of making the same.

  ΔL in the first and second expressions of Equation 1 is preferably within 5% of the average optical distance Lave, and more preferably within 2% to 5%. This is because if it exceeds 5%, the light extraction efficiency may be significantly reduced, and if it is less than 2%, a sufficient effect cannot be obtained.

  FIG. 6 shows a spectrum obtained by synthesizing the spectrum of each resonator filter in the first region 21 and the second region 22 when ΔL is changed under the condition that Formula 1 satisfies m = 1. . The organic light-emitting element has a 95-nm-thick hole injection layer, a 95-nm-thick hole transport layer, a 25-nm-thick light-emitting layer that generates green light, a 20-nm-thick electron transport layer on the first electrode 15; The second electrode having a thickness of 8 nm was sequentially laminated, the area ratio between the first region 21 and the second region 22 was 1: 1, and the peak wavelength λ of the spectrum of light to be extracted was 530 nm.

  As shown in FIG. 6, when ΔL is ± 5% of the average optical distance Lave, ± 0%, that is, the optical distance L1 in the first region 21 and the optical distance L2 in the second region 22 are The half width of the synthesized spectrum is wider than when equal or ± 2%. That is, it can be seen that the resonator effect is relaxed.

  7 and 8 are the conditions that hold when Equation 1 is m = 1, and when ΔL is changed, the screen is viewed from the direction of 45 ° obliquely with respect to the screen viewed from the front (viewing angle 0 °). This shows the relationship between the relative luminance and color difference Δu′v ′ (viewing angle 45 °) and the thickness variation of the organic layer 18. The configuration of the organic light emitting device, the area ratio between the first region 21 and the second region 22, and the peak wavelength λ of the spectrum of light to be extracted are the same as those shown in FIG.

  As shown in FIG. 7, when ΔL is ± 5% of the average optical distance Lave, the luminance change due to the viewing angle is smaller than when ± L is set to ± 0% or ± 2%. Further, as shown in FIG. 8, the maximum value of the color difference Δu′v ′ is reduced when the variation in the thickness of the organic layer 18 is 2% or more. That is, it can be seen that the viewing angle characteristics can be improved.

  Although FIG. 6 and FIG. 8 have described the case of m = 1, the same effect can be obtained in the case of other m values including m = 0.

  Such a distance adjustment layer 17 is only required to be provided between the first electrode 15 and the second electrode 19, and the position and the constituent material thereof are not particularly limited. For example, the distance adjustment layer 17 includes the first electrode 15 and the organic layer 18. It is preferable to be formed of the same material as the hole injection layer 18A of the organic layer 18 to be described later. This is because it can also serve as the hole injection layer 18A. Alternatively, the distance adjustment layer 17 is provided between the hole injection layer 18A and the light emitting layer 18C of the organic layer 18 and is made of the same organic material as the hole transport layer 18B, and also serves as the hole transport layer 18B. It may be. Further, as shown in FIG. 9, the distance adjusting layer 17 may be provided separately from the hole injection layer 18A or the hole transport layer 18B.

  The organic layer 18 shown in FIG. 5 has a configuration in which, for example, a hole injection layer 18A, a hole transport layer 18B, a light emitting layer 18C, and an electron transport layer 18D are stacked in this order from the first electrode 15 side. Of these layers, layers other than the light emitting layer 18C may be provided as necessary. Further, the organic layer 18 may have a different configuration depending on the emission color of the organic light emitting elements 10R, 10G, and 10B. The hole injection layer 18A is a buffer layer for improving hole injection efficiency and preventing leakage. The hole transport layer 18B is for increasing the efficiency of transporting holes to the light emitting layer 18C. The light emitting layer 18C generates light by recombination of electrons and holes by applying an electric field. The electron transport layer 18D is for increasing the efficiency of electron transport to the light emitting layer 18C. An electron injection layer (not shown) made of LiF, Li2O, or the like may be provided between the electron transport layer 18D and the second electrode 19.

  The hole injection layer 18A of the organic light emitting device 10R has, for example, a thickness of 5 nm to 300 nm and is 4,4 ′, 4 ″ -tris (3-methylphenylphenylamino) triphenylamine (m-MTDATA) or 4 , 4 ′, 4 ″ -tris (2-naphthylphenylamino) triphenylamine (2-TNATA). The hole transport layer 18B of the organic light emitting element 10R has, for example, a thickness of 5 nm to 300 nm and is made of bis [(N-naphthyl) -N-phenyl] benzidine (α-NPD). The light emitting layer 18C of the organic light emitting element 10R has, for example, a thickness of 10 nm or more and 100 nm or less, and 2,6-bis [4- [N- (4-methoxyphenyl) -N— in 8-quinolinol aluminum complex (Alq3). Phenyl] aminostyryl] naphthalene-1,5-dicarbonitrile (BSN-BCN) is mixed with 40% by volume. For example, the electron transport layer 18D of the organic light emitting element 10R has a thickness of 5 nm to 300 nm and is made of Alq3.

  For example, the hole injection layer 18A of the organic light emitting element 10G has a thickness of 5 nm to 300 nm and is made of m-MTDATA or 2-TNATA. The hole transport layer 18B of the organic light emitting element 10G has, for example, a thickness of 5 nm to 300 nm and is made of α-NPD. The light emitting layer 18C of the organic light emitting element 10G has, for example, a thickness of 10 nm or more and 100 nm or less, and is configured by mixing 3% by volume of Alq3 and Coumarin 6 (Coumarin 6). The electron transport layer 18D of the organic light emitting element 10G has a thickness of 5 nm to 300 nm, for example, and is made of Alq3.

  The hole injection layer 18A of the organic light emitting element 10B has, for example, a thickness of 5 nm to 300 nm and is made of m-MTDATA or 2-TNATA. The hole transport layer 18B of the organic light emitting element 10B has, for example, a thickness of 5 nm to 300 nm and is made of α-NPD. The light emitting layer 18C of the organic light emitting element 10B has, for example, a thickness of 10 nm to 100 nm, and is configured by spiro 6Φ (spiro6Φ). For example, the electron transport layer 18D of the organic light emitting element 10B has a thickness of 5 nm to 300 nm and is made of Alq3.

  The second electrode 19 shown in FIG. 5 has, for example, a thickness of 5 nm to 50 nm, and is made of a simple substance or an alloy of a metal element such as aluminum (Al), magnesium (Mg), calcium (Ca), or sodium (Na). It is configured. Among these, an alloy of magnesium and silver (MgAg alloy) or an alloy of aluminum (Al) and lithium (Li) (AlLi alloy) is preferable.

  The adhesive layer 40 shown in FIG. 5 is made of, for example, a thermosetting resin or an ultraviolet curable resin.

  The sealing substrate 50 shown in FIG. 5 is located on the second electrode 19 side of the organic light emitting elements 10R, 10G, and 10B, and seals the organic light emitting elements 10R, 10G, and 10B together with the adhesive layer 40. It is made of a material such as glass that is transparent to the light generated by the organic light emitting devices 10R, 10G, and 10B. For example, a color filter 51 is provided on the sealing substrate 50, and the light generated in the organic light emitting elements 10R, 10G, and 10B is taken out and reflected by the organic light emitting elements 10R, 10G, and 10B and the wiring therebetween. It absorbs extraneous light and improves contrast.

The color filter 51 may be provided on either side of the sealing substrate 50, but is preferably provided on the organic light emitting elements 10R, 10G, and 10B side. This is because the color filter 51 is not exposed on the surface and can be protected by the adhesive layer 40. In addition, since the distance between the light emitting layer 18C and the color filter 51 is narrowed, it is possible to prevent light emitted from the light emitting layer 18C from entering the adjacent color filter 51 and causing color mixing. Because. The color filter 51 includes a red filter, a green filter, and a blue filter (all not shown), and is sequentially arranged corresponding to the organic light emitting elements 10R, 10G, and 10B.

  Each of the red filter, the green filter, and the blue filter is, for example, rectangular and has no gap. These red filter, green filter and blue filter are each composed of a resin mixed with a pigment, and by selecting the pigment, the light transmittance in the target red, green or blue wavelength region is high, The light transmittance in the wavelength range is adjusted to be low.

  Further, the wavelength range with high transmittance in the color filter 51 coincides with the peak wavelength λ of the spectrum of light desired to be extracted from the resonator structure. Thereby, only the external light incident from the sealing substrate 50 has a wavelength equal to the peak wavelength λ of the spectrum of the light to be extracted, passes through the color filter 51, and the external light of other wavelengths is the organic light emitting device. Intrusion into 10R, 10G, and 10B is prevented.

  This display device can be manufactured, for example, as follows.

  10 to 12 show the manufacturing method of this display device in the order of steps. First, as shown in FIG. 10A, a pixel drive circuit 140 including a drive transistor Tr1 is formed on a substrate 11 made of the above-described material, and then a planarization insulation is performed by applying a photosensitive resin to the entire surface. A film 13 is formed, and the planarization insulating film 13 is patterned into a predetermined shape by exposure and development, and a connection hole 13A is formed and baked.

  Next, as shown in FIG. 10B, the step forming layer 14 made of the above-described material is formed by, eg, sputtering. Subsequently, a resist pattern (not shown) is formed on the step forming layer 14 using a lithography technique, and the step forming layer 14 is selectively removed by wet etching using the resist pattern as a mask, so that the second region is formed. The step forming layer 14 is formed only on 22.

  After that, as shown in FIG. 11A, the first electrode 15 made of the above-described material is formed by, for example, sputtering, and the first electrode 15 is selectively removed by wet etching, so that each organic light-emitting element is formed. Separate every 10R, 10G, 10B. Thereby, a stepped shape as shown in FIG. 5 is formed on the upper surface of the first electrode 15.

  After forming the first electrode 15, as shown in FIG. 11A, a photosensitive resin is applied over the entire surface of the substrate 11, and light emission including the first region 21 and the second region 22 is performed, for example, by photolithography. An interelectrode insulating film 16 is formed by providing an opening corresponding to the region and baking.

  After the interelectrode insulating film 16 is formed, as shown in FIG. 11B, the distance adjusting layer 17 made of the above-described material is formed on the first electrode 15 by, for example, a vacuum deposition method. By heating the distance adjusting layer 17 to a temperature equal to or higher than the glass transition point of the constituent material, the step shape of the first electrode 15 is embedded and the upper surface 17A is flattened as shown in FIG.

  After the distance adjustment layer 17 is formed, the hole injection layer 18A, the hole transport layer 18B, the light emitting layer 18C, the electron transport layer 18D, and the second electrode 19 made of the above-described thickness and material are sequentially formed by, for example, vapor deposition. Then, organic light emitting devices 10R, 10G, and 10B as shown in FIG. 5 are formed. At this time, since the step shape of the first electrode 15 is embedded by the distance adjustment layer 17 and the upper surface 17A is a flat surface, the end surface of the second electrode 19 on the light emitting layer 18C side, that is, the second end portion P2 is flat. become. Subsequently, the protective film 30 made of the above-described material is formed on the organic light emitting elements 10R, 10G, and 10B.

  Further, for example, a red filter material is formed on the sealing substrate 50 made of the above-described material by applying a red filter material by spin coating or the like, and patterning and baking by a photolithography technique. Subsequently, similarly to the red filter, a blue filter and a green filter are sequentially formed.

  After that, an adhesive layer 40 is formed on the protective film 30, and the sealing substrate 50 is bonded with the adhesive layer 40 in between. In that case, it is preferable to arrange | position the surface in which the color filter 51 of the board | substrate 50 for sealing was formed in the organic light emitting element 10R, 10G, 10B side. Thus, the display device shown in FIG. 3 is completed.

  In the display device thus obtained, a scanning signal is supplied to each pixel from the scanning line driving circuit 130 via the gate electrode of the writing transistor Tr2, and an image signal is supplied from the signal line driving circuit 120 to the writing transistor. It is held in the holding capacitor Cs via Tr2. That is, the driving transistor Tr1 is controlled to be turned on / off in accordance with the signal held in the holding capacitor Cs, whereby the driving current Id is injected into each of the organic light emitting elements 10R, 10G, and 10B, so that holes, electrons, Recombine to emit light. This light is multiple-reflected between the first electrode 15 and the second electrode 19, passes through the second electrode 19, the color filter 51, and the sealing substrate 50 and is extracted. At this time, in the present embodiment, as shown in FIG. 5, the first end P <b> 1 of the resonator structure has a step shape, and the step shape is buried and flattened by the distance adjustment layer 17. As a result, the second end portion P2 becomes flat, and the optical distance L1 in the first region 21 and the optical distance L2 in the second region 22 are different from each other. And the second region 22 have different peak wavelengths. Therefore, the light extracted from each element is a combination of them, and the half width of the spectrum becomes wider than that of the conventional optical element having the same optical distance, that is, the viewing angle characteristics are improved.

  As described above, in the present embodiment, the first end P1 of the resonator structure has a step shape, and the step shape is embedded and flattened by the distance adjustment layer 17, thereby flattening the second end P2. In addition, since the optical distance L1 in the first region 21 and the optical distance L2 in the second region 22 are made different from each other, the spectrum of light extracted from each of the first region 21 and the second region 22 is different. By making the peak wavelengths different, the full width at half maximum of the synthesized spectrum can be increased, and the viewing angle characteristics can be improved. In addition, it is no longer necessary to form a concave structure, a light diffusion layer, a light refraction layer, or other structure that may scatter external light on the transparent substrate as in the past. This is also advantageous in terms of cost.

  Furthermore, a transparent conductive film for adjusting the optical distance is not necessary, and there is no fear of occurrence of non-light emitting defects or a decrease in aperture ratio. Furthermore, a complicated patterning process for changing the thickness of the transparent conductive film is unnecessary, which is advantageous in terms of manufacturing cost. Therefore, a display device including high-quality organic light-emitting elements 10R, 10G, and 10B can be realized with a simple configuration and process.

(Second Embodiment)
FIG. 13 illustrates a cross-sectional configuration of the organic light emitting elements 10R, 10G, and 10B of the display device according to the second embodiment of the present invention. In the organic light emitting devices 10R, 10G, and 10B, a step is formed at the interface of the first electrode 15 on the light emitting layer 18C side, so that the arrangement relationship between the driving transistor Tr1 of the pixel driving circuit 140 and the first electrode 15 is adjusted. Since the display device is the same as that of the first embodiment except that the step forming layer 14 is not provided, the same components are denoted by the same reference numerals. .

  The drive transistor Tr <b> 1 is provided in the second region 22 on the substrate 11. By sufficiently increasing the step generated by the drive transistor Tr1, a step reflecting the drive transistor Tr1 remains on the surface of the planarization insulating film 13. As a result, the end face of the first electrode 15 on the light emitting layer 18C side, that is, the first end P1 of the resonator structure can have a step shape corresponding to the shape of the drive transistor Tr1. Except for this, the first electrode 15 is configured in the same manner as in the first embodiment.

  In FIG. 13, the drive transistor Tr <b> 1 has an inverted stagger structure (so-called bottom gate type). In the drive transistor Tr1, for example, a gate electrode 151 made of a metal material such as molybdenum (Mo), aluminum (Al), or chromium (Cr) is provided on the substrate 11, and silicon nitride is formed so as to cover the gate electrode 151. Alternatively, a gate insulating film 152 made of silicon oxide and a channel layer 153 made of a semiconductor thin film such as amorphous silicon are sequentially formed. An insulating channel protective film 154 is provided in the center region of the channel layer 153 above the gate electrode 151. A source electrode 155S and a drain electrode 155D made of an n-type semiconductor thin film such as n-type amorphous silicon are formed on both sides of the channel layer 153 exposed from the channel protective film 154. The source electrode 155S and the drain electrode 155D are separated from each other by the channel protective film 154, and a source wiring 156S and a drain wiring 156D in which a titanium (Ti) layer, an aluminum (Al) layer, and a titanium (Ti) layer are sequentially stacked. Each is formed, and the whole is further covered with a protective film 157 made of silicon nitride or the like. Incidentally, the configuration of the staggered (so-called top gate type) driving transistor Tr1 is the same except that the stacking order of the above-described components is reversed.

  It is preferable that the optical distance L1 in the first region 21 and the optical distance L2 in the second region 22 satisfy Equation 1 as in the first embodiment.

  This display device can be manufactured, for example, as follows.

  First, the pixel driving circuit 140 is formed on the substrate 11. At that time, the drive transistor Tr <b> 1 is formed in the second region 22. That is, the gate electrode 151 made of the above-described material is formed by, for example, sputtering, and is formed into a predetermined pattern by, for example, photolithography and dry etching or wet etching. Next, the gate insulating film 152 made of the above-described material is formed on the entire surface of the substrate 11. Subsequently, a channel layer 153, a channel protective film 154, a source electrode 155S and a drain electrode 155D, and a source wiring 156S and a drain wiring 156D made of the above-described material are sequentially formed in a predetermined shape on the gate insulating film 152. After that, the driving transistor Tr1 is formed by covering the whole with the protective film 157 made of the above-described material.

  After the pixel driving circuit 140 including the driving transistor Tr1 is formed, the planarization insulating film 13, the first electrode 15, the interelectrode insulating film 16, the distance adjusting layer 17, and the organic layer 18 are formed in the same manner as in the first embodiment. And the 2nd electrode 19 is formed in order and organic light emitting element 10R, 10G, 10B is formed.

  After that, the protective film 30 and the adhesive layer 40 are formed on the organic light emitting elements 10R, 10G, and 10B, and the sealing substrate 50 provided with the color filter 51 is bonded. Thus, the display device shown in FIG. 13 is completed.

  The operation of this display device is the same as that of the first embodiment.

  Thus, in the present embodiment, the first step P1 of the resonator structure is made to have a step shape corresponding to the shape of the drive transistor Tr1 by using the step generated by the drive transistor Tr1. In addition to the same effects as those of the embodiment, it is not necessary to form the step forming layer 14, and the configuration and the manufacturing process can be further simplified.

  In the present embodiment, the first electrode 15 is formed on the drive transistor Tr1 so that the first end portion P1 has a stepped shape. However, the first electrode 15 is not limited to the drive transistor Tr1, and is retained. The first end P1 may have a step shape depending on the positional relationship between the capacitor Cs or the write transistor Tr2 and the first electrode 15.

  Alternatively, the signal line 120A, the scanning line 130A, or the power supply line may be arranged in the second region 22 on the substrate 11, and the first electrode 15 may be formed thereon. In this case, if the thickness of the wiring is increased in order to increase the level difference, the wiring resistance is lowered, which is advantageous in increasing the size of the display device. Alternatively, if the wiring is multi-layered in order to increase the level difference, the aperture ratio can be increased, and the current density flowing in the organic light emitting elements 10R, 10G, and 10B can be reduced and the life can be improved. it can.

  Further, when an auxiliary wiring is formed in order to reduce the resistance of the second electrode 19, the first end portion P1 can have a step shape by forming the first electrode 15 on the auxiliary wiring. is there.

  Further, in addition to the drive transistor Tr1, the wiring or the auxiliary wiring of the present embodiment, a step forming layer 14 similar to that of the first embodiment may be formed on the planarization insulating film 13.

(Third embodiment)
FIG. 14 illustrates a cross-sectional configuration of the organic light emitting elements 10R, 10G, and 10B of the display device according to the third embodiment of the present invention. The organic light emitting devices 10R, 10G, and 10B are the same as the display device described in the first embodiment, except that the step forming layer 14 is made of the same material as that of the driving transistor Tr1. Therefore, the same components will be described below with the same reference numerals.

  The step forming layer 14 is provided in the second region 22 on the substrate 11 and is made of the same material as the source wiring 156S and the drain wiring 156D of the driving transistor Tr1. That is, the step forming layer 14 has a configuration in which, for example, a titanium (Ti) layer 166A, an aluminum (Al) layer 166B, a titanium (Ti) layer 166C, and a protective film 157 are stacked in this order.

  A first electrode 15 is formed on the step forming layer 14 with the planarizing insulating film 13 therebetween. By making the step generated by the step forming layer 14 sufficiently large, a step reflecting the step forming layer 14 remains on the surface of the planarization insulating film 13. As a result, the end face of the first electrode 15 on the light emitting layer 18C side, that is, the first end P1 of the resonator structure can have a step shape corresponding to the shape of the drive transistor Tr1. Except for this, the first electrode 15 is configured in the same manner as in the first embodiment.

  It is preferable that the optical distance L1 in the first region 21 and the optical distance L2 in the second region 22 satisfy Equation 1 as in the first embodiment.

  In this display device, for example, when the driving transistor Tr1 of the pixel driving circuit 140 is formed, except that the step forming layer 14 having the above-described material and laminated structure is formed in the second region 22 on the substrate 11, It can be manufactured in the same manner as in the second embodiment.

  The operation and effect of this display device are the same as those of the second embodiment.

  In the present embodiment, the step forming layer 14 is formed using the same material and stacked structure as the source wiring 156S and the drain wiring 156D of the driving transistor Tr1, but the step forming layer 14 is driven. It may have the same material and stacked structure as the other layers of the transistor Tr1. For example, as shown in FIG. 15, the step forming layer 14 includes a layer 161 made of the same material as the gate electrode 151 of the driving transistor Tr1, a layer 163 made of the same material as the gate insulating film 122 and the channel layer 153, and a channel protective layer. A layer 164 made of the same material as 154, a layer 165 made of the same material as the source electrode 155S and the drain electrode 155D, and a layer 166 made of the same material as the source wiring 156S and the drain wiring 156D may be used. Thus, by forming the step forming layer 14 using more layers of the driving transistor Tr1, a higher step can be formed.

  Further, the step forming layer 14 may have the same material and laminated structure as the storage capacitor Cs or the writing transistor Tr2, or the wiring such as the signal line 120A, the scanning line 130A or the power supply line, or lower the resistance of the second electrode 19. For example, the same material and laminated structure as the auxiliary wiring may be used.

  Further, in addition to the step forming layer 14 of the present embodiment, a step forming layer 14 similar to that of the first embodiment is formed on the planarization insulating film 13 so as to form a higher step. Good.

(Fourth embodiment)
Next, a display device according to a fourth embodiment of the present invention will be described. This display device is described in the first embodiment except that the first electrode 15 is formed on the concavo-convex structure 61 provided on the substrate 11 as shown in FIG. This is the same as the display device.

  The uneven structure 61 is made of, for example, a photosensitive resin and has an uneven shape on the surface on the first electrode 15 side. The concavo-convex structure 61 may be composed of a single layer as shown in FIG. 16, or a plurality of protrusions 61A as shown in FIG. 17, and a continuous coating layer 61B covering the protrusions 61A. The surface of the coating layer 61B on the first electrode 15 side may have a concavo-convex shape corresponding to the protrusion 61A. The concavo-convex structure 61 may serve as the planarization insulating film 13 described in the first embodiment and may have a connection hole 61C.

  The end surface of the first electrode 15 on the light emitting layer 18 </ b> C side is a first end P <b> 1 having a continuous uneven shape corresponding to the uneven structure 61. On the first electrode 15, there is provided a distance adjusting layer 17 having a concavo-convex shape and having a flat surface 17A on the light emitting layer 18C side, the second end P2 becomes flat, and the first end The optical distance L between the first end P1 and the second end P2 changes continuously according to the uneven shape of P1. Thereby, in the organic light emitting devices 10R, 10G, and 10B, the peak wavelength of the spectrum of the extracted light is continuously changed according to the optical distance L, the half width of the spectrum obtained by synthesizing them is widened, and the field of view Angular characteristics can be improved.

  The uneven shape of the first end P1 is preferably an extremely low-angle unevenness with an average inclination angle of 2 ° or less, for example. This is because the uneven shape with a large inclination angle increases the scattering of external light and may cause a decrease in contrast.

Distance adjustment layer 17, for example, is constituted by the hole injection layer 18A or the same organic material and a hole transport layer 18B of the organic layer 18, also serve as a hole injection layer 18A or the hole transport layer 18B Good. Further, as shown in FIG. 18, the distance adjusting layer 17 may be provided separately from the hole injection layer 18A or the hole transport layer 18B .

  This display device can be manufactured, for example, as follows.

  19 and 20 show the manufacturing method of this display device in the order of steps. This manufacturing method represents a case where the first electrode 15 is formed on the single-layered concavo-convex structure 61 as shown in FIG.

  First, as shown in FIG. 19A, a photosensitive resin film 71 is formed by applying a photosensitive resin on the substrate 11 on which the pixel driving circuit 140 including the driving transistor Tr1 is formed.

  Next, as shown in FIG. 19B, the photosensitive resin film 71 is exposed and developed by, for example, a photolithography method using a halftone reticle 72 or two reticles to form a concavo-convex structure 61. At this time, as a method of forming the unevenness of the ultra low angle, for example, the reticle pattern used for exposure may be a pattern finer than the resolution of the exposure machine, or other methods are not limited thereto. It may be used. When the uneven structure 61 also serves as the planarization insulating film 13, the connection hole 61C may be formed at the same time.

  Subsequently, as shown in FIG. 20A, after the concavo-convex structure 61 is baked, the first electrode 15 is formed on the concavo-convex structure 61 by, for example, sputtering. As a result, a continuous uneven shape corresponding to the uneven structure 61 is formed on the end surface of the first electrode 15 on the light emitting layer 18C side. Thereafter, as shown in FIG. 20A, a photosensitive resin is applied in the same manner as in the first embodiment, and is molded, for example, by photolithography, and baked. Form.

  After the interelectrode insulating film 16 is formed, the distance adjusting layer 17 made of the above-described material is formed on the first electrode 15 by, for example, a vacuum deposition method, and the temperature above the glass transition point of the constituent material of the distance adjusting layer 17 As shown in FIG. 20B, the surface 17A on the light emitting layer 18C side of the distance adjusting layer 17 is flattened.

  After forming the distance adjustment layer 17, the organic layer 18 and the second electrode 19 are sequentially formed on the distance adjustment layer 17. At that time, when the distance adjustment layer 17 and the hole injection layer 18A or the hole transport layer 18B are made of the same material, the hole injection layer 18A or the hole transport layer 18B is formed again separately from the distance adjustment layer 17. Alternatively, they may be omitted and only the light emitting layer 18C and the electron transport layer 18D may be formed.

  After that, the protective film 30 and the adhesive layer 40 are formed on the organic light emitting elements 10R, 10G, and 10B, and the sealing substrate 50 provided with the color filter 51 is bonded. Thus, the display device shown in FIG. 16 is completed.

  Moreover, this display device can also be manufactured as follows.

  21 and 22 show another method for manufacturing the display device in the order of steps. This manufacturing method represents a case where the first electrode 15 is formed on the concavo-convex structure 61 in which a plurality of protrusions 61A as shown in FIG. 17 are covered with a covering layer 61B.

  First, as shown in FIG. 21A, a photosensitive resin film is formed by applying a photosensitive resin on the substrate 11 on which the pixel driving circuit 140 including the driving transistor Tr1 is formed. The resin film is exposed and developed by, for example, a photolithography method using a mask 81 to form a protrusion 61A, and is baked.

  Next, as shown in FIG. 21B, the protrusion 61A is covered with a coating layer 61B by applying a photosensitive resin again onto the substrate 11 on which the protrusion 61A is formed.

  Subsequently, as shown in FIG. 22A, a connection hole 61C is formed in the coating layer 61B by a photolithography method using a mask 82, for example, and is baked.

  Subsequently, as shown in FIG. 22B, the first electrode 15 is formed on the uneven structure 61 by, for example, sputtering. As a result, a continuous uneven shape corresponding to the uneven structure 61 is formed on the end surface of the first electrode 15 on the light emitting layer 18C side.

  After that, a photosensitive resin is applied in the same manner as in the manufacturing method described above, and is formed, for example, by photolithography, and baked to form the interelectrode insulating film 16. Subsequently, in the same manner as in the manufacturing method described above, the distance adjustment layer 17 is formed on the first electrode 15, and the distance adjustment layer 17 is heated to a temperature equal to or higher than the glass transition point of the constituent material of the distance adjustment layer 17. The surface 17A on the light emitting layer 18C side of 17 is flattened.

  After the distance adjustment layer 17 is formed, the organic layer 18 and the second electrode 19 are sequentially formed in the same manner as in the manufacturing method described above. After that, the protective film 30 and the adhesive layer 40 are formed on the organic light emitting elements 10R, 10G, and 10B, and the sealing substrate 50 provided with the color filter 51 is bonded. Thus, the display device shown in FIG. 17 is completed.

  In this display device, when a predetermined voltage is applied between the first electrode 15 and the second electrode 19, light emission occurs in the same manner as in the first embodiment. Multiple reflection is performed between the second electrode 19 and the second electrode 19. At this time, since the first end portion P1 has a continuous uneven shape, and this uneven shape is embedded and flattened by the distance adjusting layer 17, the optical distance L continuously changes. The peak wavelength of the spectrum of the extracted light also changes continuously according to the optical distance L, and the full width at half maximum of the spectrum obtained by synthesizing them is widened. Therefore, viewing angle characteristics are improved.

  As described above, in the present embodiment, the optical distance L is continuously changed by making the first end portion P1 have a continuous uneven shape and embedding and flattening the uneven shape with the distance adjustment layer 17. Since it did in this way, the peak wavelength of the spectrum of the taken-out light can be continuously changed according to the optical distance L, and a viewing angle characteristic can be improved.

  As described above, in the first to fourth embodiments, regions having different optical distances are provided in each organic light emitting element. However, the optical distances are different between adjacent organic light emitting elements of the same color. May be. Examples thereof will be described below.

(Fifth embodiment)
FIG. 23 illustrates an example of a planar configuration of the display area 110 of the display device according to the fifth exemplary embodiment of the present invention. In this display device, in the organic light emitting devices 10R1 and 10R2 that are included in the adjacent pixels 101 and 102 and have the same emission wavelength, the optical distances LR1 and LR2 between the first end P1 and the second end P2 are mutually equal. Is different. Similarly, the organic light emitting elements 10G1 and 10G2 have different optical distances LG1 and LG2, and the organic light emitting elements 10B1 and 10B2 have different optical distances LB1 and LB2. Each of the organic light emitting devices 10R1, 10R2, 10G1, 10G2, 10B1, and 10B2 is not divided into the first region 21 and the second region 22, and the optical distance in each device is the same. Thereby, in this display device, the peak wavelength of the spectrum of the light extracted from the organic light emitting elements 10R1, 10R2, 10G1, 10G2, 10B1, 10B2 having the same emission wavelength can be made different, and the viewing angle characteristics can be improved. It can be done.

  The pixels 101 and 102 are arranged alternately, for example, but may be arranged in a straight line, and this is not limited as long as there is no problem in view. In FIG. 23, the pixel 101 is represented by shading.

  FIG. 24 illustrates a cross-sectional configuration of adjacent pixels 101 and 102. A step forming layer 14 is formed in the region of the pixel 102 of the substrate 11. The first electrode 15 of the pixel 102 is formed on the step forming layer 14, thereby providing a height difference between the first electrode 15 of the pixel 101 and the first electrode 15 of the pixel 102. It has been. That is, the end face on the light emitting layer 18 </ b> C side of the first electrode 15 of the pixels 101 and 102 is a first end P <b> 1 having a height difference corresponding to the step forming layer 14. On the first electrode 15, a distance adjustment layer 17 having a flat surface 17 </ b> A is provided on the second electrode 19 side while embedding the height difference of the first electrode 15 of the pixels 101 and 102. The portion P2 becomes flat, and the optical distance between the first end portion P1 and the second end portion P2 differs according to the height difference of the first electrodes 15 of the pixels 101 and 102. Except for this, the organic light emitting elements 10R1, 10R2, 10G1, 10G2, 10B1, and 10B2 are configured in the same manner as in the first embodiment.

  Similar to the first embodiment, the distance adjustment layer 17 is made of the same organic material as the hole injection layer 18A or the hole transport layer 18B of the organic layer 18, and the hole injection layer 18A or hole It may also serve as the transport layer 18B. Although not shown, the distance adjustment layer 17 may be provided separately from the hole injection layer 18A or the hole transport layer 18B.

  The optical distance LR1 in the organic light emitting element 10R1 and the optical distance LR2 in the organic light emitting element 10R2 preferably satisfy Equation 2. The optical distance LG1 in the organic light emitting element 10G1 and the optical distance LG2 in the organic light emitting element 10G2 preferably satisfy Equation 3. The optical distance LB1 in the organic light emitting element 10B1 and the optical distance LB2 in the organic light emitting element 10B2 preferably satisfy Equation 4.

(Equation 2)
LR1 = LRave + ΔLR
LR2 = LRave−ΔLR
(2LRave) / λ + Φ / (2π) = m
(Where LRave is the average optical distance between the optical distance LR1 in the organic light emitting element 10R1 and the optical distance LR2 in the organic light emitting element 10R2, and Φ is the phase shift Φ1 of the reflected light generated at the first end P1 and the second The sum (Φ = Φ1 + Φ2) (rad) with the phase shift Φ2 of the reflected light generated at the end P2, λ is the peak wavelength of the spectrum of light desired to be extracted from the second end P2, and m is positive for LRave Each represents an integer.Note that in Mathematical Formula 2, LR1, LR2, LRave and λ may have the same unit, for example, (nm) as a unit.)
(Equation 3)
LG1 = LGave + ΔLG
LG2 = LGave−ΔLG
(2LGave) / λ + Φ / (2π) = m
(Where LGave is the average optical distance between the optical distance LG1 of the organic light emitting element 10G1 and the optical distance LG2 of the organic light emitting element 10G2, and Φ is the phase shift Φ1 of the reflected light generated at the first end P1 and the second The sum (Φ = Φ1 + Φ2) (rad) of the phase shift Φ2 of the reflected light generated at the end P2, λ is the peak wavelength of the spectrum of light desired to be extracted from the second end P2, and m is positive for LGave (In Equation 3, LG1, LG2, LGave and λ need only be in common, but for example, the unit is (nm).)
(Equation 4)
LB1 = LBave + ΔLB
LB2 = LBave−ΔLB
(2LBave) / λ + Φ / (2π) = m
(Where LBave is the average optical distance between the optical distance LB1 in the organic light emitting element 10B1 and the optical distance LB2 in the organic light emitting element 10B2, and Φ is the phase shift Φ1 of the reflected light generated at the first end P1 and the second The sum (Φ = Φ1 + Φ2) (rad) of the phase shift Φ2 of the reflected light generated at the end P2, λ is the peak wavelength of the spectrum of light desired to be extracted from the second end P2, and m is positive for LBave (In Equation 4, LB1, LB2, LBave, and λ need only be in common, but for example, (nm) is the unit.)

  Equations 2 to 4 express Equation 1 for each emission color (R, G, B), and the meanings of the first to third equations are the same as those in Equation 1.

  This display device can be manufactured in the same manner as in the first embodiment, for example, except that the step forming layer 14 is formed in a region where the pixel 102 is to be formed.

  In the display device according to the present embodiment, when a predetermined voltage is applied between the first electrode 15 and the second electrode 19, light emission occurs in the same manner as in the first embodiment. Multiple reflection occurs between the first electrode 15 and the second electrode 19, and the light is extracted from the second electrode 19 side. At this time, in the organic light emitting devices 10R1 and 10R2 included in the adjacent pixels 101 and 102 and having the same emission wavelength, the optical distances LR1 and LR2 between the first end P1 and the second end P2 are different from each other. Therefore, the light extracted from each of the organic light emitting elements 10R1 and 10R2 has a different peak wavelength of the spectrum. Therefore, when the organic light emitting elements 10R1 and 10R2 emit light at the same time, as in the first embodiment, the full width at half maximum of the combined spectrum is expanded and the viewing angle characteristics are improved. The same applies to the other organic light emitting elements 10G1 and 10G2 and between the organic light emitting elements 10B1 and 10B2.

  As described above, in the present embodiment, in the organic light emitting devices 10R1, 10R2, 10G1, 10G2, or 10B1, 10B2 included in the adjacent pixels 101, 102 and having the same emission wavelength, the first end P1 and the second end Since the optical distances LR1, LR2, LG1, LG2, or LB1, LB2 with the end portion P2 are made different from each other, the peak wavelengths of the spectrum of light extracted from the elements having the same emission wavelength can be made different. And viewing angle characteristics can be improved.

  In the above embodiment, the optical distances LR1, LG1, LB1 and the optical distances LR2, LG2, LB2 are different from each other using the step forming layer 14 and the distance adjusting layer 17 as in the first embodiment. However, as in the second or third embodiment, the optical distances LR1, LG1, LB1 and the optical distance LR2 are made using the steps caused by the drive transistor Tr1 and the wiring. , LG2 and LB2 may be different from each other.

  Hereinafter, with respect to the fifth embodiment, modified examples 1 to 3 in which the optical distances LR1, LG1, LB1 and the optical distances LR2, LG2, LB2 are made different from each other by another configuration will be described. In these modified examples 1 to 3, the optical distances LR1, LG1, LB1 and the optical distances LR2, LG2, LB2 are made different from each other by using the configuration of the first electrode 15 or the thickness difference of the organic layer 18. Is.

(Modification 1)
FIG. 25 illustrates a cross-sectional configuration of the pixels 101 and 102 according to the first modification. In this display device, a first electrode 15 is formed by laminating a reflective electrode 15A made of an alloy containing silver (Ag) and a transparent electrode 15B in this order from the substrate 11 side. In this case, the transparent electrode 15B of the pixel 101 has a configuration in which a lower layer 15BB made of polycrystalline ITO and an upper layer 15BT made of amorphous ITO or IZO are sequentially stacked, and the transparent electrode 15B of the pixel 102 has only the lower layer 15BB. .

  This display device can be manufactured, for example, as follows.

  26 and 27 show the manufacturing method of this display device in the order of steps. First, as shown in FIG. 26A, the pixel drive circuit 140 including the drive transistor Tr1 and the planarization insulating film 13 are formed on the substrate 11 made of the above-described material in the same manner as in the first embodiment. After the formation, the reflective electrode 15A made of the above-described material and the transparent electrode 15B made of the lower layer 15BB and the upper layer 15BT are sequentially formed by sputtering, for example.

  Next, a resist pattern (not shown) is formed on the upper layer 15BT by using, for example, a lithography technique, and as shown in FIG. 26B, wet etching using the resist pattern as a mask is performed. The upper layer 15BT is selectively removed. At this time, for example, the lower layer 15BB is made of polycrystalline ITO, the upper layer 15BT is made of amorphous ITO or IZO, and a mixed solution of phosphoric acid, nitric acid and acetic acid is used as a wet etching solution, so that amorphous ITO or IZO and polycrystalline Using the wet etching selectivity with ITO, only the upper layer 15BT can be selectively removed.

  Further, as shown in FIG. 27, the transparent electrode 15B and the reflective electrode 15A are selectively removed by, for example, dry etching to separate each of the organic light emitting elements 10R, 10G, and 10B. One electrode 15 is formed.

  After that, an interelectrode insulating film 16 (see FIG. 5) is provided in a region between the first electrodes 15, and the hole injection layer 18A, the hole transport layer 18B, The light emitting layer 18C, the electron transport layer 18D, and the second electrode 19 are sequentially formed to form the organic light emitting devices 10R, 10G, and 10B as shown in FIG. Subsequently, the protective film 30 and the adhesive layer 40 are formed on the organic light emitting elements 10R, 10G, and 10B, and the sealing substrate 50 provided with the color filter 51 is bonded. Thus, the display device shown in FIG. 25 is completed.

(Modification 2)
FIG. 28 illustrates another configuration example of the first electrode 15. The first electrode 15 of this modification has a laminated structure that alternately includes the reflective electrodes 15A and the transparent electrodes 15B. The first electrode 15 of the pixel 101 includes a first reflective electrode 15A1 made of an alloy containing silver (Ag), a first transparent electrode 15B1 made of polycrystalline ITO, a second reflective electrode 15A2 made of an alloy containing silver (Ag), and A second transparent electrode 15B2 made of polycrystalline ITO is laminated in this order from the substrate 11 side. The first electrode 15 of the pixel 102 has a configuration in which a first reflective electrode 15A1 and a first transparent electrode 15B1 are stacked in this order from the substrate 11 side. The thicknesses of the first transparent electrode 15B1 and the second transparent electrode 15B2 differ depending on the optical distances LR1, LG1, LB1 and the optical distances LR2, LG2, LB2, and the second transparent electrode 15B2 is the first transparent electrode 15B1. The thickness is thicker than. The position of the first end P11 in the pixel 101 is the end surface of the second reflective electrode 15A2 on the light emitting layer 18C side, and the position of the first end P12 in the pixel 102 is on the light emitting layer 18C side of the first reflective electrode 15A1. It is an end face.

  This display device can be manufactured, for example, as follows.

  29 and 30 show the manufacturing method of this display device in the order of steps. First, as shown in FIG. 29A, the pixel drive circuit 140 including the drive transistor Tr1 and the planarization insulating film 13 are formed on the substrate 11 made of the above-described material in the same manner as in the first embodiment. After the formation, the first reflective electrode 15A1, the first transparent electrode 15B1, the second reflective electrode 15A2, and the second transparent electrode 15B2 made of the above-described materials are sequentially formed by sputtering, for example. At this time, for example, the first transparent electrode 15B1 is made of polycrystalline ITO, and the second reflective electrode 15A2 is made of an alloy containing silver (Ag).

  Next, a resist pattern (not shown) is formed on the second transparent electrode 15B2 by using, for example, a lithography technique. As shown in FIG. 29B, the region other than the pixel 101 is formed by, for example, dry etching. The second transparent electrode 15B2 and a part of the second reflective electrode 15A2 in the thickness direction are selectively removed.

  Furthermore, as shown in FIG. 30A, the remaining portion in the thickness direction of the second reflective electrode 15A2 is selectively removed by wet etching using, for example, a mixed solution of phosphoric acid, nitric acid and acetic acid as an etching solution, The first transparent electrode 15B1 is exposed. At this time, only the second reflective electrode 15A2 can be removed by the wet etching selectivity between the ITO and the alloy containing silver (Ag).

  Subsequently, as shown in FIG. 30B, the first transparent electrode 15B1 and the first reflective electrode 15A1 are removed by dry etching, for example, and separated into the respective organic light emitting elements 10R, 10G, and 10B. The first electrode 15 as shown is formed.

  Thereafter, an interelectrode insulating film 16 (see FIG. 5) is provided in a region between the first electrodes 15, and the hole injection layer 18A, the hole transport layer 18B, the light emitting layer 18C, and the electrons are formed in the same manner as described above. The transport layer 18D and the second electrode 19 are sequentially formed to form the organic light emitting devices 10R, 10G, and 10B as shown in FIG. After that, the protective film 30 and the adhesive layer 40 are formed on the organic light emitting elements 10R, 10G, and 10B, and the sealing substrate 50 provided with the color filter 51 is bonded. Thus, the display device shown in FIG. 28 is completed.

(Modification 3)
FIG. 31 illustrates a cross-sectional configuration of the pixels 101 and 102 according to the third modification. In this display device, the organic layer 18 of the pixel 101 is thicker than the pixel 102. In this case, for example, the thickness of any one layer or two or more layers among the hole injection layer 18A, the hole transport layer 18B, the light emitting layer 18C, and the electron transport layer 18D may be made different. In particular, it is preferable to vary the thickness of the hole injection layer 18A or the hole transport layer 18B. This is because the hole injection layer 18A or the hole transport layer 18B has high carrier mobility and small voltage dependency on the thickness. In general, changing the thickness of the light-emitting layer 18C or the electron transport layer 18D has a large effect on the driving voltage of the device. The voltage is high at a thick part and the voltage is low at a thin part. May occur.

  In general, the constituent material of the hole injection layer 18A includes a phthalocyanine compound, an amine compound, an azaaryl compound, or the like. However, in the case where the pixel 101 and the pixel 102 have different thicknesses as in the present embodiment, Azaanthracene derivatives or azatriphenylene derivatives which are azaaryl compounds are preferred.

  This display device can be manufactured, for example, as follows.

  First, on the substrate 11, in the same manner as in the first embodiment, the pixel driving circuit 140 including the driving transistor Tr1 made of the above-described material, the planarization insulating film 13, the first electrode 15, and the interelectrode insulating film 16 are provided. Form.

Next, the hole injection layer 18A, the hole transport layer 18B, the light emitting layer 18C, the electron transport layer 18D, and the second electrode 19 are sequentially formed on the first electrode 15. At that time, the thickness of the organic layer 18 is made different between the pixel 101 and the pixel 102. As a method for forming the organic layer 18 with different thicknesses, any of general methods used for forming the organic layer 18 such as a vapor deposition method using a mask, an ink jet method, a laser transfer method, or a printing method can be used.

  Subsequently, the protective film 30 and the adhesive layer 40 are formed on the organic light emitting elements 10R, 10G, and 10B, and the sealing substrate 50 provided with the color filter 51 is bonded. Thus, the display device shown in FIG. 31 is completed.

(Modules and application examples)
Hereinafter, application examples of the display device described in the first to fifth embodiments will be described. The display device in each of the above embodiments is a television device, a digital camera, a notebook personal computer, a mobile terminal device such as a mobile phone, or a video camera, such as an externally input video signal or an internally generated video signal. The present invention can be applied to display devices for electronic devices in various fields that display images or videos.

(module)
The display device of each of the above embodiments is incorporated into various electronic devices such as application examples 1 to 5 described later, for example, as a module shown in FIG. In this module, for example, a region 210 exposed from the sealing substrate 50 and the adhesive layer 40 is provided on one side of the substrate 11, and wirings of the signal line driving circuit 120 and the scanning line driving circuit 130 are provided in the exposed region 210. An external connection terminal (not shown) is formed by extending. The external connection terminal may be provided with a flexible printed circuit (FPC) 220 for signal input / output.

(Application example 1)
FIG. 33 illustrates an appearance of a television device to which the display device of each of the above embodiments is applied. The television apparatus has, for example, a video display screen unit 300 including a front panel 310 and a filter glass 320, and the video display screen unit 300 is configured by the display device according to each of the above embodiments. .

(Application example 2)
FIG. 34 shows the appearance of a digital camera to which the display device of each of the above embodiments is applied. The digital camera includes, for example, a flash light emitting unit 410, a display unit 420, a menu switch 430, and a shutter button 440. The display unit 420 is configured by the display device according to each of the above embodiments. Yes.

(Application example 3)
FIG. 35 shows the appearance of a notebook personal computer to which the display device of each of the above embodiments is applied. The notebook personal computer has, for example, a main body 510, a keyboard 520 for inputting characters and the like, and a display unit 530 for displaying an image. The display unit 530 is a display according to each of the above embodiments. It is comprised by the apparatus.

(Application example 4)
FIG. 36 shows the appearance of a video camera to which the display device of each of the above embodiments is applied. This video camera has, for example, a main body 610, a subject photographing lens 620 provided on the front side surface of the main body 610, a start / stop switch 630 at the time of photographing, and a display 640. Reference numeral 640 denotes the display device according to each of the above embodiments.

(Application example 5)
FIG. 37 shows the appearance of a mobile phone to which the display device of each of the above embodiments is applied. For example, the mobile phone is obtained by connecting an upper housing 710 and a lower housing 720 with a connecting portion (hinge portion) 730, and includes a display 740, a sub-display 750, a picture light 760, and a camera 770. Yes. The display 740 or the sub-display 750 is configured by the display device according to each of the above embodiments.

  While the present invention has been described with reference to the embodiment, the present invention is not limited to the above embodiment, and various modifications can be made. For example, in the first to third embodiments, the case where the light emitting layer 18C is divided into the first region 21 at the center and the second region 22 at the left and right in the planar shape has been described. The first area 21 and the second area 22 may be divided into a right half and a left half in the planar shape as shown in FIG. 38, or divided into an upper half and a lower half as shown in FIG. It may be done. Moreover, as shown in FIG. 40, it may be divided by an oblique boundary line, and can be selected within a range that causes no problem in visual recognition.

  Further, the step forming layer 14 is not limited to a partial region of the substrate 11 and may be formed on the entire surface of the substrate 11. In that case, by changing the thickness of the step forming layer 14, a step can be formed on the end surface of the first electrode 15 on the light emitting layer 18C side.

  Furthermore, although the case where the first end portion P1 has a continuous uneven shape has been described in the fourth embodiment, at least one of the first end portion P1 and the second end portion P2 is continuous. What is necessary is just to have an uneven | corrugated shape.

  In addition, the organic light emitting elements 10R, 10G, and 10B are not limited to two of the first region 21 and the second region 22, and may be divided into three or more regions. In this case, the optical distance may be different in at least two of the regions.

Furthermore, for example, the material and thickness of each layer described in the above embodiment, or the film formation method and film formation conditions are not limited, and other materials and thicknesses may be used, or other film formation methods. Alternatively, film forming conditions may be used. For example, in the above embodiment, the first electrode 15, the organic layer 18, and the second electrode 19 are stacked on the substrate 11 in this order from the substrate 11 side, and light is extracted from the sealing substrate 50 side. As described above, the stacking order is reversed, and the second electrode 19, the organic layer 18, and the first electrode 15 are sequentially stacked on the substrate 11 from the substrate 11 side. Light can also be extracted.

  In addition, for example, in the above embodiment, the case where the first electrode 15 is the anode and the second electrode 19 is the cathode has been described. However, the anode and the cathode are reversed, and the first electrode 15 is the cathode, The electrode 19 may be an anode. Further, the first electrode 15 is a cathode and the second electrode 19 is an anode, and the second electrode 19, the organic layer 18, and the first electrode 15 are stacked on the substrate 11 in this order from the substrate 11 side. It is also possible to extract light from the side.

  Furthermore, in the above embodiment, the configuration of the organic light emitting elements 10R, 10G, and 10B has been specifically described. However, it is not necessary to include all layers, and other layers may be further included. . For example, the first electrode 15 and the organic layer 18 are made of chromium oxide (III) (Cr2O3), ITO (Indium-Tin Oxide: indium (In) and tin (Sn) oxide mixed film), or the like. A thin film layer for hole injection may be provided. Further, for example, the first electrode 15 or the reflective electrode 15A can be a dielectric multilayer film.

  In addition, in the above-described embodiment, the case where the second electrode 19 is composed of a semi-transmissive reflective layer has been described. However, the second electrode 19 includes a semi-transmissive reflective layer and a transparent electrode. It is good also as a structure laminated | stacked in order from the 15 side. This transparent electrode is for lowering the electric resistance of the semi-transmissive reflective layer, and is made of a conductive material having sufficient translucency for the light generated in the light emitting layer. As a material constituting the transparent electrode, for example, ITO or a compound containing indium, zinc (Zn), and oxygen is preferable. This is because good conductivity can be obtained even if the film is formed at room temperature. The thickness of the transparent electrode can be, for example, 30 nm or more and 1000 nm or less. In this case, a semi-transparent reflective layer is used as one end, and the other end is provided at a position facing the semi-transparent electrode with the transparent electrode in between. You may make it do. Furthermore, after providing such a resonator structure, the organic light emitting elements 10R, 10G, and 10B are covered with a protective film 30, and the protective film 30 has a refractive index comparable to that of the material constituting the transparent electrode. It is preferable that the protective film 30 be part of the resonance part if it is made of a material having the same.

  Furthermore, according to the present invention, the second electrode 19 is formed of a transparent electrode, and the reflectance of the end surface of the transparent electrode opposite to the organic layer 18 is increased so that the light emitting layer 18C of the first electrode 15 is formed. The present invention can also be applied to a case in which a resonator structure in which the end face on the side is the first end and the end face opposite to the organic layer of the transparent electrode is the second end is configured. For example, the transparent electrode may be brought into contact with the atmospheric layer, the reflectance of the boundary surface between the transparent electrode and the atmospheric layer may be increased, and this boundary surface may be used as the second end portion. Further, the reflectance at the boundary surface with the adhesive layer may be increased, and this boundary surface may be the second end portion. Furthermore, the organic light emitting elements 10R, 10G, and 10B may be covered with the protective film 30, the reflectance at the boundary surface with the protective film 30 may be increased, and this boundary surface may be the second end portion.

  In addition, in each of the above embodiments, the case of an active matrix display device has been described. However, the present invention can also be applied to a passive matrix display device. Furthermore, the configuration of the pixel driving circuit for active matrix driving is not limited to that described in each of the above embodiments, and a capacitor or a transistor may be added as necessary. In that case, a necessary driving circuit may be added in addition to the signal line driving circuit 120 and the scanning line driving circuit 130 described above in accordance with the change of the pixel driving circuit.

  DESCRIPTION OF SYMBOLS 10,101,102 ... Pixel, 10R, 10G, 10B ... Organic light emitting element, 11 ... Substrate, 13 ... Planarization insulating film, 14 ... Step forming layer, 15 ... First electrode, 15A ... Reflective electrode, 15A1 ... First Reflective electrode, 15A2 ... second reflective electrode, 15B ... transparent electrode, 15B1 ... first transparent electrode, 15B2 ... second transparent electrode, 15BB ... lower layer, 15BT ... upper layer, 16 ... interelectrode insulating film, 17 ... distance adjustment layer, 17A ... upper surface, 18 ... organic layer, 18A ... hole injection layer, 18B ... hole transport layer, 18C ... light emitting layer, 18D ... electron transport layer, 19 ... second electrode, 21 ... first region, 22 ... second Region 30. Protective film 40. Adhesive layer 50. Substrate for sealing 51. Color filter 61. Concavity and convexity structure 61 A Projection portion 61 B Cover layer 61 C Connection hole P 1 First end , P2 ... second end

Claims (10)

A resonator structure including a first electrode, an organic layer including a light emitting layer, and a second electrode in order on a substrate, and resonating light generated in the light emitting layer between the first end and the second end. A display element comprising:
An uneven structure having an uneven shape on the surface on the first electrode side is provided on the substrate,
The first electrode is provided on the concavo-convex structure,
The end surface of the first electrode on the light emitting layer side is the first end portion having a concavo-convex shape in which the height continuously changes corresponding to the concavo-convex structure and the surface is a curved surface,
Between the first electrode and the second electrode, by providing a distance adjusting layer that embeds the uneven shape and has a flat surface on the second electrode side, the second end becomes flat. The optical distance between the first end and the second end changes continuously according to the uneven shape,
The display element whose average inclination | tilt angle of the uneven | corrugated shape of a said 1st edge part is 2 degrees or less . The display element according to claim 1, wherein the distance adjustment layer is made of the same material as that of one layer of the organic layer. The concavo-convex structure has a plurality of projections provided on the substrate and a coating layer that covers the plurality of projections and is continuously provided, and the surface of the coating layer on the first electrode side There display element according to claim 1 or 2 has a concave-convex shape corresponding to the plurality of protrusions. The relief structure, the display device according to claim 1 or 2 is constituted by one layer. A pixel driving circuit is provided on the substrate as a driving circuit for the display element,
The relief structure, the display device according to any one of the to the pixel drive circuit claims 1 also serves as a planarization insulating film for flattening a surface of the substrate provided 4. A resonator structure including a first electrode, an organic layer including a light emitting layer, and a second electrode in order on a substrate, and resonating light generated in the light emitting layer between the first end and the second end. A display element manufacturing method comprising
Forming a single-layer concavo-convex structure having a concavo-convex shape on the surface on the first electrode side on the substrate;
The first electrode is provided on the concavo-convex structure, and the end surface of the first electrode on the light emitting layer side has a concavo-convex shape in which the height continuously changes corresponding to the concavo-convex structure and the surface is a curved surface. Having the first end portion having,
While embedding the uneven shape between the first electrode and the second electrode and providing a distance adjustment layer having a flat surface on the second electrode side, the second end is made flat, Continuously changing the optical distance between the first end and the second end according to the uneven shape,
In the step of forming the concavo-convex structure, the photosensitive resin film is exposed and developed by a photolithography method using a half-tone reticle or two reticles, and the reticle pattern used for exposure is finer than the resolution of the exposure machine. A method for manufacturing a display element, wherein an average inclination angle of the concavo-convex shape of the first end portion is set to 2 ° or less by forming a pattern. The method for manufacturing a display element according to claim 6, wherein the distance adjustment layer is made of the same material as that of one layer of the organic layer. A pixel driving circuit is provided on the substrate as a driving circuit for the display element,
The method for manufacturing a display element according to claim 6 , wherein the concavo-convex structure also serves as a planarization insulating film that planarizes a surface of the substrate on which the pixel driving circuit is provided. A resonator structure including a first electrode, an organic layer including a light emitting layer, and a second electrode in order on a substrate, and resonating light generated in the light emitting layer between the first end and the second end. A display device comprising a display element having
An uneven structure having an uneven shape on the surface on the first electrode side is provided on the substrate,
The first electrode is provided on the concavo-convex structure,
The end surface of the first electrode on the light emitting layer side is the first end portion having a concavo-convex shape in which the height continuously changes corresponding to the concavo-convex structure and the surface is a curved surface,
Between the first electrode and the second electrode, by providing a distance adjusting layer that embeds the uneven shape and has a flat surface on the second electrode side, the second end becomes flat. The optical distance between the first end and the second end changes continuously according to the uneven shape,
The display device having an average inclination angle of the concavo-convex shape of the first end portion of 2 ° or less . A resonator structure including a first electrode, an organic layer including a light emitting layer, and a second electrode in order on a substrate, and resonating light generated in the light emitting layer between the first end and the second end. A manufacturing method of a display device including a display element having,
Forming a single-layer concavo-convex structure having a concavo-convex shape on the surface on the first electrode side on the substrate;
The first electrode is provided on the concavo-convex structure, and the end surface of the first electrode on the light emitting layer side has a concavo-convex shape in which the height continuously changes corresponding to the concavo-convex structure and the surface is a curved surface. Having the first end portion having,
While embedding the uneven shape between the first electrode and the second electrode and providing a distance adjustment layer having a flat surface on the second electrode side, the second end is made flat, Continuously changing the optical distance between the first end and the second end according to the uneven shape,
In the step of forming the concavo-convex structure, the photosensitive resin film is exposed and developed by a photolithography method using a half-tone reticle or two reticles, and the reticle pattern used for exposure is finer than the resolution of the exposure machine. A method for manufacturing a display device , wherein an average inclination angle of the concavo-convex shape of the first end portion is set to 2 ° or less by forming a pattern.

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