JP5177933B2 - Partition wall composition, pixel forming substrate using the same, and pixel forming method - Google Patents

Description

  The present invention relates to a barrier rib composition, a pixel forming substrate using the same, and a method for forming a pixel. More specifically, the present invention relates to a partition wall composition suitably used for producing a color filter by an inkjet method, a pixel formation substrate using the same, and a pixel formation method.

A color filter is a surface of a transparent substrate such as glass, in which three or more kinds of fine stripe-shaped filter segments of different hues are arranged in parallel or intersecting, or fine mosaic-like filter segments are arranged vertically and horizontally. It is made up of things arranged in A light shielding region (black matrix) having a certain width is provided between the filter segments in order to increase the display contrast of the color filter.
Currently, a color filter is manufactured by repeating a process of applying, drying, exposing, developing, and curing a photoresist solution in which a pigment is dispersed on a transparent substrate. Therefore, productivity is low and the demand for cost reduction is high.

In accordance with this requirement, the manufacturing method and manufacturing equipment have been reviewed, and in particular, a manufacturing method of a color filter by an inkjet method, which is easy to downsize the manufacturing apparatus and has high productivity, has attracted attention. In addition, due to recent advances in head and ink technology, pigments have begun to be used in inkjet inks. As a result, light resistance and fastness have improved, and the possibility of applying the inkjet method to color filter applications has begun. It was.
The formation of the filter segment by the ink jet method is performed by providing a partition wall on a transparent substrate in advance and filling ink into the gap divided by the partition wall by the ink jet method.

However, when ink is filled in the gaps separated by the partition walls, the ink spreads over the partition walls and the ink mixes in the adjacent areas, causing a phenomenon of color mixing that impairs the hue of the filter segment. A film having good wettability with respect to ink is formed at a portion where the ink is formed, and a film having poor wettability with respect to ink is formed in the gaps between the plurality of color filters (see, for example, Patent Document 1). .
Further, by providing a silicon rubber layer on the upper part of the partition wall, ink repellency is imparted to prevent ink color mixing (for example, see Patent Document 2), and a silicone compound layer having a surface energy of 5 to 43 dyne / cm. Has also been formed in the light shielding part (see, for example, Patent Document 3).

JP 59-75205 A JP 4-123005 A JP-A-10-197716

However, the former method is still insufficient when high-definition patterning is required. Moreover, since the latter method is performed after forming the black matrix, the number of steps increases.
On the other hand, when a silicone compound or fluorine compound, which is an ink repellent material, is contained in the partition walls, the compatibility with other components constituting the partition walls is poor, so the strength of the partition walls is reduced, causing problems in pattern formation. is what happened. On the contrary, when an ink repellent material having high compatibility was contained, effective ink repellency could not be obtained. Furthermore, since the ink repellent material bleeds from the partition walls and contaminates the transparent substrate, ink repellency occurs, which causes a coating film defect of the color filter.

  In view of the various disadvantages of the conventional technology, an object of the present invention is to provide a partition composition that can prevent ink bleeding and color mixing. Another object of the present invention is to provide a pixel forming substrate capable of preventing ink bleeding and color mixing when pixels are formed by an inkjet method, and a method for forming pixels without causing ink bleeding and color mixing. And

  The partition wall composition of the present invention contains a vinyl polymer having an ethylenically unsaturated double bond and a fluoroalkyl group, whereby a fluoroalkyl group is formed on the upper surface of the partition wall formed using the partition wall composition. It is a composition for partition walls containing a polymer in which an oriented polymer is oriented, that is, a vinyl polymer having an ethylenically unsaturated double bond and a fluoroalkyl group.

Moreover, the pixel forming substrate of the present invention has a partition formed on the base material by the above-mentioned partition composition, and when irradiated with active energy rays, it undergoes a polymerization reaction of ethylenically unsaturated double bonds. Since the vinyl polymer having a fluoroalkyl group is set in the network structure of the partition wall, the vinyl polymer having a fluoroalkyl group does not bleed from the partition wall portion to the base material portion.
Furthermore, the pixel forming method of the present invention is a method of forming a pixel by filling an ink in an area divided by the partition wall of the pixel forming substrate by an ink jet method. Pixels can be formed without color mixing.

Since the partition wall composition of the present invention contains a vinyl polymer having an ethylenically unsaturated double bond and a fluoroalkyl group, the partition wall formed using the partition wall composition has a fluoroalkyl on its upper surface. The polymer having groups is oriented, whereby the upper surface has ink repellency. Furthermore, since the vinyl polymer having fluoroalkyl groups constituting the partition walls is set in the network structure of the partition walls by a crosslinking reaction by active energy, the vinyl polymer having fluoroalkyl groups from the partition walls to the base material is bleeded. There is nothing to do.
Further, according to the pixel forming method using the image forming substrate having the partition walls formed by the partition wall composition of the present invention, the pixels can be formed without causing ink bleeding or color mixing.

First, the partition wall composition will be described.
The vinyl polymer contained in the partition wall composition is a vinyl polymer having an ethylenically unsaturated double bond and a fluoroalkyl group, and is oriented on the upper surface of the partition wall when the partition wall is formed using the partition wall composition. It works to prevent ink bleeding and color mixing. More specifically, the fluoroalkyl group in the vinyl polymer functions to repel ink and prevent ink bleeding and color mixing due to the ink entering the adjacent region beyond the partition.

  In addition, when the ethylenically unsaturated double bond in the vinyl polymer is irradiated with active energy rays, the oriented vinyl polymer is set in the network structure of the partition wall, and the vinyl polymer is transferred from the partition wall portion to the base material portion. It works to prevent the polymer from bleeding. In particular, when the barrier rib composition is prepared as an alkali-developable photoresist, it is cross-linked by active energy ray exposure, so there is little film loss during alkali development, and ink repellency in and between substrates. There is little variation.

The vinyl polymer can be produced by a one-stage method or a two-stage method, but the two-stage method is preferred because the vinyl polymer can be produced stably.
In the one-step method, a monomer having an ethylenically unsaturated double bond and a fluoroalkyl group is polymerized with a monomer having an ethylenically unsaturated double bond and other active energy ray reactive functional groups. Vinyl polymers can be produced.

In the two-stage method, a monomer (a) having an ethylenically unsaturated double bond and a fluoroalkyl group and a monomer other than (a) having an ethylenically unsaturated double bond and a reactive functional group Reaction in polymer (A) with polymer (A) of (b) and monomer (c) having an ethylenically unsaturated double bond other than (a) and (b) if necessary It can manufacture by making the compound (B) which has a functional group and an ethylenically unsaturated double bond which can react with an ionic functional group react.
The monomer (a) having an ethylenically unsaturated double bond and a fluoroalkyl group is indispensable for imparting ink repellency to the upper surface of the partition wall.

Specific examples of the monomer (a) having an ethylenically unsaturated double bond and a fluoroalkyl group include 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3,3-penta Fluoropropyl (meth) acrylate, 2- (perfluorobutyl) ethyl (meth) acrylate, 2- (perfluorohexyl) ethyl (meth) acrylate, 2- (perfluorooctyl) ethyl (meth) acrylate, 2- (perfluoro- 3-methylbutyl) ethyl (meth) acrylate, 2- (perfluoro-7-methyloctyl) ethyl (meth) acrylate, 1H, 1H, 3H-tetrafluoropropyl (meth) acrylate, 1H, 1H, 5H-octafluoropentyl (meth) ) Acrylate, 1H, 1H, 7H-dodecafluoroheptyl Meth) acrylate, 1H, 1H, 9H- hexadecafluoro nonyl (meth) acrylate.
A monomer (a) can be used 1 type or in mixture of 2 or more types according to required performance.

  The copolymerization ratio of the monomer (a) in the polymer (A) is preferably 1 to 90% by weight, more preferably 5 to 60% by weight, based on the total weight of the monomers constituting the polymer. %, Particularly preferably 10 to 40% by weight. When the copolymerization ratio of the monomer (a) is less than 1% by weight, it becomes difficult to impart sufficient ink repellency to the upper surface of the partition wall, and when it exceeds 90% by weight, the photocrosslinking component Therefore, the polymer (A) bleeds on the bottom surface of the partition wall, and the ink is repelled when the ink is filled in the region divided by the partition wall, resulting in a coating film defect.

The monomer (b) other than (a) having an ethylenically unsaturated double bond and a reactive functional group is a starting point for introducing an ethylenically unsaturated double bond into the polymer (A) polymerized in the first stage. It is indispensable in order to suppress the bleeding of the vinyl polymer and form a tough partition wall by setting the partition wall composition on the base material after crosslinking the vinyl polymer with active energy rays. .
Examples of the reactive functional group include a hydroxyl group, a carboxyl group, an isocyanate group, and an epoxy group.

  Specific examples of the monomer (b) having a hydroxyl group include 2-hydroxyethyl (meth) acrylate, 1-hydroxypropyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 4-hydroxybutyl (meth). Examples include acrylate, polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, polytetramethylene glycol mono (meth) acrylate, and hydroxystyrene.

Specific examples of the monomer (b) having a carboxyl group include acrylic acid, methacrylic acid, crotonic acid, maleic acid, fumaric acid, itaconic acid, and citraconic acid.
Specific examples of the monomer (b) having an isocyanate group include (meth) acryloyloxyethyl isocyanate, (meth) acryloyloxypropyl isocyanate, 2-hydroxyethyl (meth) acrylate, and 4-hydroxybutyl (meth). Examples thereof include those obtained by reacting a hydroxyalkyl (meth) acrylate such as acrylate with a polyisocyanate such as toluene diisocyanate and isophorone diisocyanate.

Specific examples of the monomer (b) having an epoxy group include glycidyl (meth) acrylate, glycidyl cinnamate, glycidyl allyl ether, glycidyl vinyl ether, vinylcyclohexane monoepoxide, 1,3-butadiene monoepoxide, and the like.
A monomer (b) can be used 1 type or in mixture of 2 or more types according to required performance.

  The copolymerization ratio of the monomer (b) in the polymer (A) is preferably 10 to 90% by weight, more preferably 20 to 80% by weight based on the total weight of the monomers constituting the polymer. %, Particularly preferably 25 to 70% by weight. When the copolymerization ratio of the monomer (b) is less than 10% by weight, it becomes difficult to obtain sufficient photocurability, and when it exceeds 90% by weight, the ink repellency of the partition upper surface is lowered. To do.

The monomer (c) having an ethylenically unsaturated double bond other than (a) and (b) improves the compatibility between the vinyl polymer and other components contained in the partition wall composition, and Used to impart physical properties such as hardness, toughness, and scratch resistance. Monomers (c) include (i) (meth) acrylic acid derivatives, (ii) aromatic vinyl monomers, (iii) olefinic hydrocarbon monomers, (iv) vinyl ester monomers, ( v) vinyl halide monomers, (vi) vinyl ether monomers, and the like.
(i) Specific examples of (meth) acrylic acid derivatives include alkyl (meth) acrylates such as (meth) acrylonitrile, methyl (meth) acrylate, butyl (meth) acrylate, ethylhexyl (meth) acrylate, and stearyl (meth) acrylate. , Benzyl (meth) acrylate and the like.

(ii) Specific examples of the aromatic vinyl monomer include styrenes such as styrene, methylstyrene, ethylstyrene, chlorostyrene, monofluoromethylstyrene, difluoromethylstyrene, and trifluoromethylstyrene.
(iii) Specific examples of the olefinic hydrocarbon monomer include ethylene, propylene, butadiene, isobutylene, isoprene, and 1,4-pentadiene.
Specific examples of the (iv) vinyl ester monomer include vinyl acetate.
Specific examples of the (v) vinyl halide monomer include vinyl chloride and vinylidene chloride.
(vi) Specific examples of the vinyl ether monomer include vinyl methyl ether.

These monomers may be used in combination of two or more.
The copolymerization ratio of the monomer (c) in the polymer (A) is preferably 0 to 89% by weight, more preferably 0 to 75% by weight based on the total weight of the monomers constituting the polymer. %, Particularly preferably 0 to 65% by weight. When the copolymerization ratio of the monomer (c) exceeds 89% by weight, the ink repellency is lowered and sufficient photocurability cannot be obtained.

  The polymer (A) can be synthesized by a known method, for example, solution polymerization. Solvents used during polymerization include ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone, ethers such as tetrahydrofuran, dioxane, ethylene glycol dimethyl ether and diethylene glycol dimethyl ether, aromatics such as benzene, toluene, xylene and cumene, and acetic acid. Esters such as ether and butyl acetate can be used. Two or more solvents may be mixed and used. The monomer concentration during polymerization is preferably 0 to 80% by weight.

Examples of the polymerization initiator include ordinary peroxides or azo compounds such as benzoyl peroxide, azoisobutylvalenonitrile, azobisisobutyronitrile, di-t-butyl peroxide, t-butyl perbenzoate, and t-butyl. Peroctoate, cumene hydroxyperoxide and the like are used, and the polymerization temperature is preferably 50 to 140 ° C, more preferably 70 to 140 ° C.
The preferred weight average molecular weight of the resulting polymer (A) is 2,000 to 100,000.

To the polymer (A) having a reactive functional group and a fluoroalkyl group thus obtained, a compound (B) having a functional group capable of reacting with the reactive functional group and an ethylenically unsaturated double bond is added. By reacting, a vinyl polymer having an ethylenically unsaturated double bond and a fluoroalkyl group is obtained.
In the polymer (A) and the compound (B), the number of functional groups possessed by the compound (B) that can react with the reactive functional group is the number of reactive functional groups possessed by the polymer (A). The reaction is preferably performed at a ratio of 100%, but may be performed at a ratio of less than 100% if sufficient photocurability is obtained.

When leaving unreacted reactive functional groups, a crosslinking agent and a crosslinking catalyst are added, and the remaining unreacted reactive functional groups are thermally cured to increase the crosslink density of the coating film, thereby producing a color filter. It is possible to ensure the solvent resistance of the partition walls required in the subsequent process.
When the ratio of the number of reactive functional groups of the compound (B) to the number of reactive functional groups of the polymer (A) is less than 1%, the crosslinking density of the vinyl polymer by active energy ray exposure is low, and the substrate Variations in ink repellency between the inside and between the substrates occur. On the other hand, if it exceeds 50%, the effect of thermosetting is reduced, and the solvent resistance of the partition walls is lowered.

As the combination of the reactive functional group and the functional group capable of reacting with the reactive functional group, various known combinations as shown below can be adopted.
(1) When the reactive functional group is a hydroxyl group, reaction with an isocyanate group, a halogen group, a carboxyl group or an epoxy group.
(2) When the reactive functional group is a carboxyl group, reaction with an epoxy group or a hydroxyl group.
(3) When the reactive functional group is an isocyanate group, reaction with a hydroxyl group or an amino group.
(4) When the reactive functional group is an epoxy group, it reacts with a carboxyl group or a hydroxyl group.

A catalyst can be used when reacting the reactive functional group of the polymer (A) with the functional group of the compound (B) that can react with the reactive functional group.
As the catalyst, when the reactive functional group is a hydroxyl group, it is preferable to use acidic compounds and their ammonium salts, lower amine salts, polyvalent metal salts and the like. In the case of a carboxyl group, it is preferable to use acidic compounds and their ammonium salts, lower amine salts, polyvalent metal salts and the like. In the case of an isocyanate group, it is preferable to use amines, metal salt compounds and the like. In the case of an epoxy group, it is preferable to use amines.

Specific examples of the acidic compound include formic acid, acetic acid, propionic acid, itaconic acid, oxalic acid, maleic acid, phthalic anhydride, benzoic acid, p-toluenesulfonic acid, benzenesulfonic acid, dodecylbenzenesulfonic acid, trichloroacetic acid, phosphorus Examples thereof include acid, monoalkyl phosphoric acid, dialkyl phosphoric acid, phosphoric acid ester of β-hydroxyethyl (meth) acrylate, monoalkyl phosphorous acid, dialkyl phosphorous acid and the like.
Specific examples of amines include dicyclohexylamine, triethylamine, N, N-dimethylbenzylamine, N, N, N ′, N′-tetramethyl-1,3-butanediamine, diethanolamine, triethanolamine, and cyclohexylethylamine. Is mentioned.

Specific examples of metal salt compounds include sodium acetate, tin octylate, lead octylate, cobalt octylate, zinc octylate, calcium octylate, lead naphthenate, cobalt naphthenate, dibutyltin dioctate, dibutyltin dilaurate, dibutyltin Examples thereof include malate dibutyltin di (2-ethylhexoate).
Two or more kinds of catalysts may be mixed and used, and the amount used in the case of using the catalyst is 0.01 to 10 parts by weight with respect to 100 parts by weight of the total of the polymer (A) and the compound (B). Is more preferable, and the range of 0.01 to 5 parts by weight is more preferable.

When the vinyl polymer has a reactive functional group, it is preferable to contain various crosslinking agents in the partition wall composition in order to thermally crosslink the vinyl polymer. Representative crosslinking agents include hydrazines, polyamines, polyisocyanates, dicarboxylic acids, polyhydric epoxy compounds, polyhydric alcohols, polyhydric phenols, and the like.
Specific examples of hydrazines include hydrazine and adipic acid dihydrazide.

  Specific examples of polyamines include ethylenediamine, propanediamine, butanediamine, pentanediamine, hexanediamine, diaminooctane, diaminodecane, diaminododecane, 1,6-hexamethylenediamine, 2,5-dimethyl-2,5-hexamethylene. Linear diamine such as diamine, polyoxypropylene diamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, mensendiamine, isophoronediamine, bis (4-amino-3-methyldicyclohexyl) methane, diaminodicyclohexylmethane, 3, 9-bis (3-aminopropyl) -2,4,8,10-tetraoxaspiro [5,5] undecane, 1,4-bis (2-amino-2-methylpropyl) piperazine, m-xylenediamine , Polycyclohexyl polyamine, cyclic diamines such as bis (aminomethyl) bicyclo [2 · 2 · 1] heptane, methylene bis (furanmethanamine), triethylenetetramine, tetraethylenepentamine, diethylenetriamine and the like.

Specific examples of the polyisocyanate include toluylene diisocyanate, naphthylene-1,5-diisocyanate, o-toluylene diisocyanate, diphenylmethane diisocyanate, trimethylhexamethylene diisocyanate, isophorone diisocyanate, 4,4′-diphenylmethane diisocyanate, hexamethylene diisocyanate, m. -Diisocyanates such as xylene diisocyanate, p-xylene diisocyanate, lysine diisocyanate, hydrogenated 4,4'-diphenylmethane diisocyanate, hydrogenated tolylene diisocyanate, or both end isocyanate adducts of these with glycols or diamines, triphenylmethane Examples include triisocyanate and polymethylene polyphenyl isocyanate. .
Specific examples of dicarboxylic acids include oxalic acid, malonic acid, succinic acid, glutaric acid, hexanedioic acid, citric acid, maleic acid, methylnadic acid, dodecenyl succinic acid, sebacic acid, pyromellitic acid, hexahydrophthalic acid, tetrahydrophthalic acid An acid etc. are mentioned.

  Specific examples of the polyvalent epoxy compound include ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, tripropylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, 1, Bisepoxy compounds such as 6-hexanediol diglycidyl ether and phthalic acid diglycidyl ester, trade name Epicoat 801, 802, 807, 815, 827, 828, 834, 815X, 815XA1, 828EL, 828XA manufactured by Yuka Shell Epoxy Co., Ltd. , 1001, 1002, 1003, 1055, 1004, 1004AF, 1007, 1009, 1010, 1003F, 1004F, 100 F, 1100L, 834X90, 1001B80, 1001X70, 1001X75, 1001T75, 5045B80, 5046B80, 5048B70, 5049B70, 5050T60, 5050, 5051, 152, 154, 180S65, 180H65, 1031S, 1032H60, 604, 157S70, etc. .

Specific examples of the polyhydric alcohol include diols such as 1,4-butanediol and 2,3-butanediol, 1,1,1-trimethylolpropane ethylene glycol, diethylene glycol, glycerin, erythritol, arabitol, xylitol, sorbitol, Examples include dulcitol and mannitol.
Specific examples of the polyhydric phenol include catechol, resorcin, hydroquinone, guaiacol, hexyl resorcin, pyrogallol, trihydroxybenzene, phloroglucin, and dimethylolphenol.

When the reactive functional group of the vinyl polymer is a hydroxyl group or a carboxyl group, it is preferable to use a polyisocyanate, a polyvalent epoxy compound, or the like as a crosslinking agent.
In the case of an isocyanate group, it is preferable to use a polyhydric alcohol, dicarboxylic acid or the like as a crosslinking agent.
In the case of an epoxy group, it is preferable to use dicarboxylic acid, polyhydric alcohol, polyhydric phenol, polyamine or the like as a crosslinking agent.
Two or more types of crosslinking agents may be mixed and used. When the crosslinking agent is contained, the amount used is 0.1 to 30 parts by weight with respect to 100 parts by weight of the nonvolatile content of the partition wall composition. More preferably, it is the range of 0.1-10 weight part.

Further, in the partition wall composition, when the vinyl polymer has a reactive functional group, in order to promote the reaction between the reactive functional groups or the reaction between the reactive functional group and the crosslinking agent, Depending on the functional group, various crosslinking catalysts can be included. As the crosslinking catalyst, the acid compounds exemplified above and ammonium salts thereof, lower amine salts or polyvalent metal salts, amines, metal salt compounds, and metal complex compounds can be used.
Specific examples of metal complex compounds include aluminum triacetylacetonate, iron triacetylacetonate, manganese tetraacetylacetonate, nickel tetraacetylacetonate, chromium hexaacetylacetonate, titanium tetraacetylacetonate, and cobalt tetraacetylacetonate. Etc.

Among these cross-linking catalysts, when the reactive functional group of the vinyl polymer is a hydroxyl group, it is preferable to use acidic compounds and their ammonium salts, lower amine salts, polyvalent metal salts and the like.
In the case of a carboxyl group, it is preferable to use acidic compounds and their ammonium salts, lower amine salts, polyvalent metal salts and the like.
In the case of an isocyanate group, it is preferable to use amines, metal salt compounds and the like.
In the case of an epoxy group, it is preferable to use amines.
Two or more types of crosslinking catalysts may be used as a mixture. The amount of the crosslinking catalyst used is 0.01 to 10 parts by weight with respect to 100 parts by weight of the nonvolatile content of the partition wall composition. More preferably, it is the range of 0.01-5 weight part.

Moreover, the compound for partition can also be made to contain the compound which has an ethylenically unsaturated double bond. As a result, it is possible to increase the crosslinking density of the coating film and ensure the solvent resistance of the partition walls required in the subsequent steps of color filter production.
As the compound having an ethylenically unsaturated double bond, monomers, oligomers, photosensitive resins and the like can be used.
Monomers include monofunctional monomers such as 2-hydroxy (meth) acrylate and β- (meth) acryloyloxyethyl hydrogen succinate, ethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neo Bifunctional monomers such as pentyl glycol di (meth) acrylate, 2,2-bis [4- (methacryloxyethoxy) phenyl] propane, 2,2-bis [4-acryloxydiethoxy] phenyl] propane, trimethylolpropane tri Trifunctional or higher functional monomers such as (meth) acrylate and tetramethylolmethanetetra (meth) acrylate are exemplified. On the other hand, examples of the oligomer include dipentaerythritol hexaacrylate, hexaacrylate of caprolactone adduct of dipentaerythritol, melamine acrylate, epoxy (meth) acrylate prepolymer, and the like. These may be used in combination of two or more.

  In addition, when forming a pixel forming substrate using the partition wall composition of the present invention, when the vinyl polymer in the partition wall composition is crosslinked by ultraviolet irradiation, an ethylenically unsaturated double bond In order to accelerate the photopolymerization reaction, it is preferable to include a photoinitiator in the barrier rib composition.

  As photoinitiators, 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, diethoxyacetophenone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1one, 1-hydroxycyclohexyl Acetophenone photoinitiators such as phenyl ketone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzyl Benzoin series such as dimethyl ketal, benzophenone series photoinitiator, benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4 Benzophenone photoinitiators such as benzoyl-4'-methyldiphenyl sulfide, thioxanthone photoinitiators such as thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diisopropylthioxanthone Agent, 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2-piperonyl--4,6-bis (trichloromethyl) -s-triazine, 2,4- Bis (trichloromethyl) -6-styryl s-triazine, 2- (naphth-1-yl) -4,6-bis (to Chloromethyl) -s-triazine, 2- (4-methoxy-naphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2,4-trichloromethyl- (piperonyl) -6-triazine Triazine photoinitiators such as 2,4-trichloromethyl (4′-methoxystyryl) -6-triazine, carbazole photoinitiators, imidazole photoinitiators and the like are used.

  The photoinitiator may be used in combination of two or more, but as a sensitizer, α-acyloxy ester, acylphosphine oxide, methylphenylglyoxylate, benzyl, 9,10-phenanthrene Compounds such as quinone, camphorquinone, ethylanthraquinone, 4,4′-diethylisophthalophenone, 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, 4,4′-diethylaminobenzophenone Can also be used together.

When coloring the partition walls, the partition wall composition of the present invention is added to carbon black, titanium black, aniline black, anthraquinone black pigment, perylene black pigment, specifically CI pigment black 1, 6, 7, 12 , 20, 31, 32 and the like can be contained. Among black pigments, carbon black is preferably used from the viewpoint of cost and light shielding properties. Carbon black may be surface-treated with a resin or the like.
The black pigment content in the partition wall composition is preferably 3 to 80% by weight based on the nonvolatile content of the partition wall composition. When the content of the black pigment is less than 3% by weight, the light shielding property per unit film thickness is lowered, and when it exceeds 80% by weight, it is difficult to form a thin film.

  In addition, the partition wall composition of the present invention includes an azo pigment other than a black pigment, a phthalocyanine pigment, a selenium pigment, an indigo pigment, a perinone pigment, a perylene pigment, for the purpose of improving dispersibility and adjusting hue. Includes phthalone pigments, dioxazine pigments, quinacridone pigments, isoindolinone pigments, metal complex pigments, methine / azomethine pigments, diketopyrrolopyrrole pigments, derivatives of these pigments, extender pigments and dyes Also good.

  The composition ratio of the vinyl polymer in the partition wall composition is such that the content of the monomer (a) is 0.01 to 10% by weight, particularly 0.01 to 0% based on the nonvolatile content of the partition wall composition. The ratio is preferably 4% by weight. When the content of the monomer (a) is less than 0.01% by weight, it becomes difficult to impart sufficient ink repellency to the upper surface of the partition wall. When the composition is prepared as an alkali development type photosensitive resist and partition walls are formed on the substrate, uneven development and defects in the partition walls are likely to occur.

  The barrier rib composition of the present invention comprises a vinyl polymer having an ethylenically unsaturated double bond and a fluoroalkyl group, and optionally a crosslinking agent, a crosslinking catalyst, a compound having an ethylenically unsaturated double bond, a photoinitiator It can be obtained by mixing and dissolving agents, pigments, additives and the like in a solvent. Solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and other ketones, tetrahydrofuran, dioxane, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, and other ethers, hexane, heptane, octane and other hydrocarbons, benzene, toluene, xylene, cumene. Are selected according to the monomer composition of the polymer from among aromatics such as ethers and esters such as ether acetate and butyl acetate. Two or more solvents may be mixed and used.

When the partition wall composition is not colored, the method for manufacturing the partition wall composition is not particularly limited, but usually, a vinyl polymer polymerization solution and an additive component such as a cross-linking agent are mixed, and a stirring blade and a shaker are mixed. What is necessary is just to stir with a stirrer, a rotary stirrer, etc.
When coloring the barrier rib composition, disperse the pigment, the polymer solution of vinyl polymer, and if necessary, the resin-type or surfactant-type pigment dispersant, the pigment derivative, the anthraquinone derivative, the triazine derivative, etc. And the pigment is dispersed until it has a desired average particle size and particle size distribution. The raw materials may be mixed and dispersed all at once, or may be mixed and dispersed separately in consideration of the characteristics and economics of each raw material.

As the disperser, a sand mill, a bead mill, an agitator mill, a dyno mill, a ball mill and the like are suitable. If there is a viscosity region suitable for pigment dispersion in each disperser, the viscosity is adjusted by changing the ratio of the polymer and the pigment.
The partition wall composition is preferably filtered by a filter or a centrifugal method for the purpose of removing coarse particles and foreign matters after being dispersed by a disperser.

Further, in order to improve the coating property of the partition wall composition, the viscosity may be adjusted by adding a solvent and stirring or concentrating uniformly.
In the composition for partition walls, the filler, thixotropy imparting agent, anti-aging agent, antioxidant, antistatic agent, flame retardant, thermal conductivity improver, plasticizer, anti-sagging are within the range that does not interfere with the effect of the present invention. Various additives such as an agent, an antifouling agent, an antiseptic, a bactericidal agent, an antifoaming agent, a leveling agent, and an ultraviolet absorber may be contained.

Next, a pixel forming substrate having a partition formed of a partition wall composition on the substrate will be described.
As the substrate, a glass plate, a resin plate such as polycarbonate, polymethyl methacrylate, polyethylene terephthalate, a resin film, or the like can be used. When the obtained pixel forming substrate is used for manufacturing a color filter, a transparent substrate having a transmittance of 80% or more, particularly preferably 95% or more in the entire wavelength region of the visible light region (400 to 700 nm) is used. preferable.
The partition walls can be formed on the substrate by a gravure offset printing method, a waterless offset printing method, a silk screen printing method, a photolithography method using a solvent developing type or an alkali developing type photosensitive resist, or a colloidal particle made of a vinyl polymer. Electrodeposition method in which partition walls are electrodeposited on a transparent conductive film by electrophoresis, and a transfer method in which a partition layer formed in advance on the surface of a transfer base sheet is transferred onto a substrate.

Since the printing method can be patterned only by repeating printing and drying, the partition wall manufacturing method is low in cost and excellent in mass productivity. Furthermore, it is possible to print a fine pattern having high dimensional accuracy and smoothness by the development of printing technology. When manufacturing a partition by a printing method, control of the fluidity | liquidity of the composition for a partition on a printing machine is important.
The photolithographic method using a solvent development type or alkali development type photosensitive resist is a method in which a partition wall resist is applied on a substrate by a coating method such as spin coating, slit coating, roll coating, and then exposed to ultraviolet rays through a photomask. In this method, the unexposed area is washed away with a solvent or an alkali developer to form a desired pattern to form a partition wall. According to this method, the partition wall can be formed with higher accuracy than the above printing method.

Finally, a pixel formation method using the pixel formation substrate will be described.
The pixels are formed by filling an aqueous or oil-based ink into an area partitioned by the partition walls of the pixel forming substrate by an ink jet method.
The ink mainly contains a coloring component, a binder resin component, and a solvent component. The water-based ink is composed of water and, if necessary, a water-soluble organic solvent, contains a water-soluble or water-dispersible resin as a binder resin component, and optionally contains various auxiliary agents. The oil-based ink has an organic solvent as a solvent, contains a resin soluble in an organic solvent as a binder resin component, and contains various auxiliary agents as necessary. As the coloring component, it is preferable to use pigments and dyes excellent in heat resistance, light resistance and the like. The binder resin component is preferably a transparent resin having excellent heat resistance, and examples thereof include, but are not limited to, an acrylic resin, a melamine resin, and a urethane resin.

Examples of the present invention will be described below, but the present invention is not limited to the examples. In the examples, parts and% represent parts by weight and% by weight. Moreover, the weight average molecular weight of the polymer was measured by GPC (polystyrene conversion).
Moreover, in the Example of this application, polymer A2-A5 and Examples 3-6 are reference examples.
(Synthesis of IPDI adduct)
After heating 222 parts of isophorone diisocyanate (IPDI) to 80 ° C. in a 1 L four-necked flask in a nitrogen stream, 116 parts of 2-hydroxyethyl acrylate and 0.13 part of hydroquinone were added dropwise over 2 hours, and then at 80 ° C. The mixture was reacted for 3 hours to obtain a compound having a liquid isocyanate group and a vinyl group (IPDI adduct molecular weight 338).

(Synthesis of Polymer A1)
4-perfluorooctylethyl methacrylate 20 parts, 2-hydroxyethyl (meth) acrylate 40 parts, butyl (meth) acrylate 40 parts, methyl ethyl ketone (MEK) 200 parts with a cooling tube, a stirrer, and a thermometer Charge to a flask, raise the temperature to 80 ° C. while stirring under a nitrogen stream, add 1.6 parts of azobisisobutyronitrile, conduct a polymerization reaction for 2 hours, and further add 0.4 part of azobisisobutyronitrile. In addition, polymerization was carried out for 2 hours. Next, 104 parts of IPDI adduct (a ratio in which the number of isocyanate groups and the number of hydroxyl groups are equal) and 1 part of tin octylate dissolved in 20 parts of methyl ethyl ketone (MEK) are dropped in about 10 minutes. The reaction was carried out at 2 ° C. for 2 hours.
Cyclohexanone was added to the solution so that the non-volatile content was 10% to obtain a polymer A1 solution. The weight average molecular weight of the polymer A1 was about 20,000.

(Synthesis of polymer A2)
2-perfluorooctylethyl methacrylate 30 parts, 1H, 1H, 7H-dodecafluoroheptyl methacrylate (trade name: M-5610, Daikin Chemicals Sales Co., Ltd.) 2-hydroxyethyl (meth) acrylate 5 parts, methyl ethyl ketone (MEK) 200 parts was charged into a four-necked flask equipped with a condenser, a stirrer, and a thermometer, heated to 80 ° C. while stirring under a nitrogen stream, and 1.6 parts of azobisisobutyronitrile was added for 2 hours. A polymerization reaction was carried out, and 0.4 parts of azobisisobutyronitrile was further added to carry out polymerization for 2 hours. Then, 5.2 parts of IPDI adduct and 1 part of tin octylate dissolved in 20 parts of methyl ethyl ketone (MEK) were dropped in about 10 minutes, and reacted for 2 hours after dropping.
Cyclohexanone was added to the solution so that the non-volatile content was 10% to obtain a polymer A2 solution. The weight average molecular weight of the polymer A2 was about 18,000.

(Synthesis of Polymer A3)
0.1 part of 2-perfluorooctylethyl methacrylate, 40 parts of 2-hydroxyethyl (meth) acrylate, 59.9 parts of butyl (meth) acrylate, 200 parts of methyl ethyl ketone (MEK) are equipped with a condenser, a stirrer, and a thermometer. The mixture was charged into a four-necked flask, heated to 80 ° C. with stirring under a nitrogen stream, and 1.6 parts of azobisisobutyronitrile was added to conduct a polymerization reaction for 2 hours. 4 parts were added and polymerization was carried out for 2 hours. Then, 41.6 parts of IPDI adduct and 2 parts of tin octylate dissolved in 20 parts of methyl ethyl ketone (MEK) were dropped in about 10 minutes, and reacted for 2 hours after dropping.
Cyclohexanone was added to the solution so that the non-volatile content was 10% to obtain a polymer A3 solution. The weight average molecular weight of the polymer A3 was about 22,000.

(Synthesis of Polymer A4)
1H, 1H, 7H-dodecafluoroheptyl methacrylate 10 parts, 2-perfluorooctylethyl methacrylate 30 parts, methacryloyloxyethyl isocyanate 60 parts, methyl ethyl ketone (MEK) 200 parts, equipped with a condenser, a stirrer, and a thermometer Charge into a neck flask, raise the temperature to 80 ° C. while stirring under a nitrogen stream, add 1.6 parts of azobisisobutyronitrile, conduct a polymerization reaction for 2 hours, and further 0.4 parts of azobisisobutyronitrile. And polymerization was carried out for 2 hours. Subsequently, 28.2 parts of 2-hydroxyethyl acrylate and 1 part of tin octylate dissolved in 20 parts of methyl ethyl ketone (MEK) were added dropwise in about 10 minutes, and reacted for 2 hours after the addition.
Cyclohexanone was added to the solution so that the nonvolatile content was 10%, to obtain a polymer A4 solution. The weight average molecular weight of the polymer A4 was about 23,000.

(Synthesis of polymer A5)
1H, 1H, 7H-dodecafluoroheptyl methacrylate 30 parts, 2-perfluorooctylethyl methacrylate 30 parts, glycidyl (meth) acrylate 40 parts, methyl ethyl ketone (MEK) 200 parts equipped with a condenser, a stirrer, and a thermometer 4 The mixture was charged into a one-necked flask, heated to 80 ° C. with stirring under a nitrogen stream, and 1.6 parts of azobisisobutyronitrile was added to conduct a polymerization reaction for 2 hours. Further, azobisisobutyronitrile 0.4 Polymerization was carried out for 2 hours by adding a portion. Next, a solution prepared by dissolving 20.3 parts of acrylic acid and 0.3 part of tetraammonium bromide with 20 parts of methyl ethyl ketone (MEK) was dropped in about 10 minutes and reacted for 2 hours after dropping.
Cyclohexanone was added to the solution so that the non-volatile content was 10% to obtain a polymer A5 solution. The weight average molecular weight of the polymer A5 was about 17,000.

(Synthesis of polymer C)
Put 250 parts of cyclohexanone in a reaction vessel, heat to 100 ° C. while injecting nitrogen gas into the vessel, and at the same temperature, 24 parts of styrene, 24 parts of methacrylic acid, 26 parts of methyl methacrylate, 26 parts of butyl methacrylate, and A mixture of 4 parts of azobisisobutyronitrile was added dropwise over 1 hour and reacted at 100 ° C. for 3 hours. Then, 0.6 part of azobisisobutyronitrile dissolved in 30 parts of cyclohexanone was added. Further, the polymerization was carried out by continuing the reaction at 100 ° C. for 1 hour. Cyclohexanone was added to this solution so that the non-volatile content was 20% to obtain a polymer C solution. The weight average molecular weight of the polymer C was about 40,000.

(Preparation of fluorine compound D1 solution)
2-perfluorooctylethyl methacrylate was dissolved in cyclohexanone to obtain a fluorine compound D1 solution having a concentration of 2%.
(Preparation of fluorine compound D2 solution)
1H, 1H, 7H-dodecafluoroheptyl methacrylate was dissolved in cyclohexanone to obtain a fluorine compound D2 solution having a concentration of 2%.

[Example 1]
7.5 parts of carbon black ("Pritex 75" manufactured by Degussa), 0.5 part of dispersant, 27.0 parts of polymer C solution, and 32.0 parts of cyclohexanone are uniformly mixed, and glass beads having a diameter of 1 mm are used. Then, the mixture was dispersed with a sand mill for 5 hours to prepare a black dispersion. To the obtained black dispersion, 2.0 parts of the polymer A1 solution, 5.4 parts of trimethylolpropane triacrylate (“NK ester ATMPT” manufactured by Shin-Nakamura Chemical Co., Ltd.), a photoinitiator (“Irgacure 907” manufactured by Ciba Geigy) )) 0.6 parts, a mixture of sensitizer ("EAB-F" manufactured by Hodogaya Chemical Co., Ltd.) 0.4 parts, and cyclohexanone 24.6 parts were stirred and mixed uniformly, and then filtered through a 1 µm filter to obtain an alkali. A development type black photosensitive resist (a composition for partition walls) was prepared.
The obtained alkali-developable black photosensitive resist was applied to a 100 mm × 100 mm, 1.1 mm thick glass substrate using a spin coater so that the dry film thickness was 1.0 μm, and the coating was performed at 70 ° C. for 20 minutes. Dried.
Next, using an ultrahigh pressure mercury lamp, UV light having a light amount of 200 mJ was irradiated from the resist coating surface side through a mask film, and then development was performed by immersing the coated substrate in a 2% aqueous sodium carbonate solution for about 20 seconds. However, 100 μm × 100 μm partition walls with no development unevenness could be formed. Then, it heated at 180 degreeC for 1 hour, and produced the substrate for pixel formation.
The pigment ink for the solvent-type color filter (surface tension) is obtained in the region divided by the partition wall of the obtained pixel forming substrate (the concave portion surrounded by the convex portion) using an ink jet recording apparatus until a desired concentration is obtained. 30 mN / m) was discharged, and a color filter composed of a fine filter segment pattern of red, green, and blue was produced. When the color filter thus prepared was observed with an optical microscope, the ink repellency of the partition walls was good, and no color mixing due to bleeding or protrusion was observed. In addition, no coating film defects were observed. Furthermore, there was little variation in ink repellency within and between substrates.

[Example 2]
71.5 parts of polymer C solution, 2.0 parts of polymer A1 solution, 9.5 parts of trimethylolpropane triacrylate (“NK ester ATMPT” manufactured by Shin-Nakamura Chemical Co., Ltd.), photoinitiator (“Irgacure” manufactured by Ciba Geigy) 907 "), 0.6 parts of a sensitizer (" EAB-F "manufactured by Hodogaya Chemical Co., Ltd.) and 16 parts of cyclohexanone are uniformly stirred and mixed, and then filtered through a 1 [mu] m filter to obtain an alkali developing colorless photosensitivity. Resist (partition wall composition) was prepared.
When the photosensitive resist obtained on the glass substrate was applied and dried, exposed and developed in the same manner as in Example 1, 100 μm × 100 μm partition walls with no development unevenness could be formed. Then, it heated at 180 degreeC for 1 hour, and produced the substrate for pixel formation.
Ink was ejected into the region divided by the partition walls of the obtained pixel formation substrate (concave portion surrounded by the convex portion) in the same manner as in Example 1, and the red, green, and blue fine filter segments were formed. A color filter composed of patterns was created. When the color filter thus prepared was observed with an optical microscope, the ink repellency of the partition walls was good, and no color mixing due to bleeding or protrusion was observed. In addition, no coating film defects were observed. Furthermore, there was little variation in ink repellency within and between substrates.

[Example 3]
Carbon black (Degussa "Pritex 75") 7.5 parts, dispersant 0.5 part, polymer C solution 24.5 parts, and cyclohexanone 32.0 parts are uniformly mixed, and glass beads having a diameter of 1 mm are used. Then, the mixture was dispersed with a sand mill for 5 hours to prepare a black dispersion. In the obtained black dispersion, 2.0 parts of a polymer A4 solution, 0.8 part of a crosslinking agent (“Hexamethylene glycol” manufactured by Wako Pure Chemical Industries, Ltd.), a crosslinking catalyst (“tin octylate” manufactured by Nippon Chemical Industry Co., Ltd.) ) 0.2 part, 4.9 parts of trimethylolpropane triacrylate (“NK ESTER ATMPT” manufactured by Shin-Nakamura Chemical Co., Ltd.), 0.6 part of photoinitiator (“Irgacure 907” manufactured by Ciba Geigy), sensitizer ( 0.4 part of Hodogaya Chemical Co., Ltd. “EAB-F”) and 26.6 parts of cyclohexanone were uniformly stirred and mixed, and then filtered through a 1 μm filter to obtain an alkali developing type black photosensitive resist (composite composition). Produced.
When the photosensitive resist obtained on the glass substrate was applied and dried, exposed and developed in the same manner as in Example 1, 100 μm × 100 μm partition walls with no development unevenness could be formed. Then, it heated at 180 degreeC for 1 hour, and produced the substrate for pixel formation.
Ink was ejected into the region divided by the partition walls of the obtained pixel formation substrate (concave portion surrounded by the convex portion) in the same manner as in Example 1, and the red, green, and blue fine filter segments were formed. A color filter composed of patterns was created. When the color filter thus prepared was observed with an optical microscope, the ink repellency of the partition walls was good, and no color mixing due to bleeding or protrusion was observed. In addition, no coating film defects were observed. Furthermore, there was little variation in ink repellency within and between substrates.

[Example 4]
7.5 parts of carbon black ("Pritex 75" manufactured by Degussa), 0.5 part of dispersant, 27.0 parts of polymer C solution, and 32.0 parts of cyclohexanone are uniformly mixed, and glass beads having a diameter of 1 mm are used. Then, the mixture was dispersed with a sand mill for 5 hours to prepare a black dispersion. To the obtained black dispersion, 2.0 parts of a polymer A5 solution, 5.4 parts of trimethylolpropane triacrylate (“NK ester ATMPT” manufactured by Shin-Nakamura Chemical Co., Ltd.), a photoinitiator (“Irgacure 907” manufactured by Ciba Geigy) ] 0.6 parts, 0.4 part of sensitizer ("EAB-F" manufactured by Hodogaya Chemical Co., Ltd.), and 24.6 parts of cyclohexanone were uniformly stirred and mixed, and then filtered through a 1 µm filter to obtain an alkali developing type. A black photosensitive resist (compartment composition) was prepared.
When the photosensitive resist obtained on the glass substrate was applied and dried, exposed and developed in the same manner as in Example 1, 100 μm × 100 μm partition walls with no development unevenness could be formed. Then, it heated at 180 degreeC for 1 hour, and produced the substrate for pixel formation.
Ink was ejected into the region divided by the partition walls of the obtained pixel formation substrate (concave portion surrounded by the convex portion) in the same manner as in Example 1, and the red, green, and blue fine filter segments were formed. A color filter composed of patterns was created. When the color filter thus prepared was observed with an optical microscope, the ink repellency of the partition walls was good, and no color mixing due to bleeding or protrusion was observed. In addition, no coating film defects were observed. Furthermore, there was little variation in ink repellency within and between substrates.

[Example 5]
As in Example 4, 3.0 parts of the polymer A2 solution, 5.3 parts of trimethylolpropane triacrylate (“NK ester ATMPT” manufactured by Shin-Nakamura Chemical Co., Ltd.), photoinitiator (“Irga” manufactured by Ciba Geigy Co., Ltd.) were used. Cure 907 ") 0.6 part Sensitizer (" EAB-F "manufactured by Hodogaya Chemical Co., Ltd.) 0.4 part and cyclohexanone 23.7 parts are uniformly stirred and mixed, then filtered through a 1 m filter and alkali development Type black photosensitive resist (compartment composition) was prepared.
When the photosensitive resist obtained on the glass substrate was applied, dried, exposed and developed in the same manner as in Example 1, a development unevenness and a pattern defect portion were slightly observed, but a partition of 100 μm × 100 μm Was formed. Then, it heated at 180 degreeC for 1 hour, and produced the substrate for pixel formation.
Ink was ejected into the region divided by the partition walls of the obtained pixel formation substrate (concave portion surrounded by the convex portion) in the same manner as in Example 1, and the red, green, and blue fine filter segments were formed. A color filter composed of patterns was created. When the color filter thus prepared was observed with an optical microscope, the ink repellency of the partition walls was good, and no color mixing due to bleeding or protrusion was observed, but it was caused by bleeding of the ink repellent agent at the bottom of the partition walls. Ink repelling was seen. There was little variation in the ink repellency within and between the substrates.

[Example 6]
7.5 parts of carbon black ("Pritex 75" manufactured by Degussa), 0.5 part of a dispersant, 21.0 parts of a polymer C solution, and 32.0 parts of cyclohexanone are uniformly mixed, and glass beads having a diameter of 1 mm are used. Then, after dispersing for 5 hours with a sand mill, a black dispersion was prepared. To the obtained black dispersion, 26.0 parts of polymer A3 solution, 4.2 parts of trimethylolpropane triacrylate (“NK ester ATMPT” manufactured by Shin-Nakamura Chemical Co., Ltd.), photoinitiator (“Irgacure 907” manufactured by Ciba Geigy Co., Ltd.) ] 0.6 parts Sensitizer ("EAB-F" manufactured by Hodogaya Chemical Co., Ltd.) 0.4 part and cyclohexanone 7.8 parts are stirred and mixed uniformly, and then filtered through a 1 µm filter to obtain an alkali developing black. A photosensitive resist (compartment composition) was prepared.
When the photosensitive resist obtained on the glass substrate was applied and dried, exposed and developed in the same manner as in Example 1, 100 μm × 100 μm partition walls with no development unevenness could be formed. Then, it heated at 180 degreeC for 1 hour, and produced the substrate for pixel formation.
Ink was ejected into the region divided by the partition walls of the obtained pixel formation substrate (concave portion surrounded by the convex portion) in the same manner as in Example 1, and the red, green, and blue fine filter segments were formed. A color filter composed of patterns was created. When the color filter thus prepared was observed with an optical microscope, there was ink repellency of the partition walls, and no bleeding or protrusion was observed when the first color ink was ejected. Bleeding was observed when the ink was discharged, and slight color mixing due to protrusion was observed. However, no coating film defects were observed. Furthermore, there was little variation in ink repellency within and between substrates.

[Comparative Example 1]
In the same black dispersion as in Example 4, 1.0 part of the fluorine compound D1 solution, 5.6 parts of trimethylolpropane triacrylate (“NK ESTER ATMPT” manufactured by Shin-Nakamura Chemical Co., Ltd.), photoinitiator (“Ciba Geigy” Irgacure 907 ”) 0.6 parts A mixture of 0.4 part of a sensitizer (“ EAB-F ”manufactured by Hodogaya Chemical Co., Ltd.) and 25.4 parts of cyclohexanone was stirred and mixed uniformly, and then filtered through a 1 μm filter. Then, an alkali development type black photosensitive resist (a composition for partition walls) was prepared.
When the photosensitive resist obtained on the glass substrate was applied and dried, exposed and developed in the same manner as in Example 1, 100 μm × 100 μm partition walls with no development unevenness could be formed. Then, it heated at 180 degreeC for 1 hour, and produced the substrate for pixel formation.
Ink was ejected into the region divided by the partition walls of the obtained pixel formation substrate (concave portion surrounded by the convex portion) in the same manner as in Example 1, and the red, green, and blue fine filter segments were formed. A color filter composed of patterns was created. When the color filter thus prepared was observed with an optical microscope, the ink repellency of the partition walls was insufficient, and color mixing due to protrusion was observed. Furthermore, there were many variations in ink repellency within and between substrates.

[Comparative Example 2]
An alkali developing type black photosensitive resist (compartment composition) was prepared in the same manner as in Comparative Example 2 except that the fluorine compound D1 solution was changed to the fluorine compound D2 solution.
When the photosensitive resist obtained on the glass substrate was applied, dried, exposed, and developed in the same manner as in Example 1, a partition wall of 100 μm × 100 μm where uneven development and pattern defects were found could be formed. . Then, it heated at 180 degreeC for 1 hour, and produced the substrate for pixel formation.
Ink was ejected into the region divided by the partition walls of the obtained pixel formation substrate (concave portion surrounded by the convex portion) in the same manner as in Example 1, and the red, green, and blue fine filter segments were formed. A color filter composed of patterns was created. When the color filter thus prepared was observed with an optical microscope, the ink repellency of the partition walls was insufficient, and color mixing due to protrusion was observed. Furthermore, there were many variations in ink repellency within and between substrates.

Claims (6)

Monomers (a) 1 to 20% by weight having an ethylenically unsaturated double bond and a fluoroalkyl group, and monomers other than (a) having an ethylenically unsaturated double bond and a reactive functional group (b) 10) to 90% by weight of the polymer (A) and (c) 0 to 89% by weight of the monomer (c) having an ethylenically unsaturated double bond other than (a) and (b). It has an ethylenically unsaturated double bond and a fluoroalkyl group which are reacted with a functional group capable of reacting with a group and a compound (B) having an ethylenically unsaturated double bond and which participate in a polymerization reaction by irradiation with active energy rays. A partition composition comprising a vinyl polymer. 2. The partition wall composition according to claim 1, wherein the content of the monomer (a) is 0.01 to 10% by weight based on the weight of the nonvolatile content of the partition wall composition. Furthermore, the composition for partition walls of Claim 1 or 2 containing the compound which has an ethylenically unsaturated double bond. Furthermore, the composition for barrier ribs of Claim 3 containing a photoinitiator. A pixel forming substrate having a partition wall formed on the base material by the partition wall composition according to any one of claims 1 to 4. 6. A method for forming a pixel according to claim 5, wherein the pixel is formed by filling an ink in an area partitioned by the partition wall of the pixel forming substrate according to claim 5.