JP4831324B2 - Resist underlayer film forming composition containing sulfone - Google Patents

Description

The present invention relates to a coating resist underlayer film forming composition for lithography that is effective at the time of processing a semiconductor substrate, and a photoresist pattern forming method using the coating resist underlayer film forming composition. More specifically, in a lithography process for manufacturing a semiconductor device using exposure light having a wavelength of 248 nm, 193 nm, or 157 nm, formation of an antireflection film containing a compound or polymer compound that effectively absorbs reflected light from the substrate It relates to a composition.

Conventionally, in the manufacture of semiconductor devices, fine processing by lithography using a photoresist composition has been performed. The microfabrication forms a thin film of a photoresist composition on a semiconductor substrate such as a silicon wafer, and is irradiated with an actinic ray such as ultraviolet rays through a mask pattern on which a semiconductor device pattern is drawn, and developed. This is a processing method for etching a semiconductor substrate using the obtained photoresist pattern as a protective film. However, in recent years, the degree of integration of semiconductor devices has increased, and actinic rays used tend to be shortened from i-line (wavelength 365 nm) and KrF excimer laser (wavelength 248 nm) to ArF excimer laser (wavelength 193 nm). It is in. Accordingly, the influence of diffuse reflection of active rays from the semiconductor substrate and standing waves has become a serious problem. Therefore, a method of providing an antireflection film (Bottom Anti-Reflective Coating: BARC) between the photoresist and the semiconductor substrate has been widely studied. In addition, studies on fine processing by lithography using an F2 excimer laser (wavelength 157 nm), which is a light source having a shorter wavelength, have been conducted.

  As an antireflection film, an inorganic antireflection film such as titanium, titanium dioxide, titanium nitride, chromium oxide, carbon, and α-silicon, and an organic antireflection film made of a light-absorbing substance and a polymer compound are known. The former requires equipment such as a vacuum deposition apparatus, a CVD apparatus, and a sputtering apparatus for film formation, whereas the latter is advantageous in that no special equipment is required, and many studies have been made. For example, an acrylic resin type antireflection film having a hydroxyl group that is a crosslinking reaction group and a light absorbing group in the same molecule, a novolak resin type antireflection film having a hydroxyl group that is a crosslinking reaction group and a light absorbing group in the same molecule, etc. (For example, see Patent Document 1 and Patent Document 2).

  Physical properties desired as an organic antireflective coating material include large absorbance to light and radiation, no intermixing with the photoresist layer (insoluble in the photoresist solvent), application or heating There may be no low molecular diffusion material from the antireflection film material into the top coat resist during drying, and the dry etching rate may be higher than that of the photoresist (for example, Non-Patent Document 1, Non-Patent Document 2, Non-Patent). Reference 3).

  In recent years, in a lithography process using a KrF excimer laser or an ArF excimer laser, the processing dimension has been reduced, that is, the photoresist pattern to be formed has been reduced in size. As the miniaturization of the photoresist pattern proceeds, it has become desirable to reduce the thickness of the photoresist in order to prevent the photoresist pattern from collapsing. And when photoresist is used as a thin film, it can be removed by etching in a shorter time in order to suppress the decrease in the thickness of the photoresist layer in the removal process by etching of the organic antireflection film used together. Organic antireflective coatings have been desired. That is, in order to shorten the etching removal process, an organic antireflection film that can be used in a thinner film than before, or an organic antireflection film that has a higher etching rate selection ratio with a photoresist than before is required. It has come to be.

  By the way, the examination of the technology of the antireflection film so far has been mainly performed with respect to a lithography process using irradiation light with wavelengths of 365 nm, 248 nm, and 193 nm. In such studies, light-absorbing components and light-absorbing groups that efficiently absorb light of each wavelength have been developed and used as one component of organic antireflection coating compositions. For example, using a lower layer film containing a benzophenone light-absorbing substance or a bisphenol S light-absorbing substance (see, for example, Patent Document 3), 365 nm irradiation light is generated by condensation of 4-hydroxyacetophenone and 4-methoxybenzaldehyde. That the chalcone dye is effective (for example, see Patent Document 4), and that the naphthamene group-containing polymer having a specific structure exhibits a large absorbance for the irradiation light of 248 nm (for example, see Patent Document 5), The resin binder composition containing a phenyl group unit is excellent for irradiation light (see, for example, Patent Document 6), and a compound containing a halogen atom (especially bromine or iodine) is excellent for the irradiation light of 157 nm. (For example, see Patent Document 7).

Further, it is described that polysulfone resin is used as an antireflection film (see, for example, Patent Document 8).
US Pat. No. 5,919,599 US Pat. No. 5,693,691 JP-A-8-87115 Japanese National Patent Publication No. 11-511194 JP 10-186671 A JP 2000-187331 A JP 2002-41482 A US Pat. No. 5,368,889

Tom Lynch and three others, “Properties and Performance of Near UV Reflectivity Control Layers” (USA), In-Advanced Inresist Technology and Processing Advances in Resist Technology and Processing XI, edited by Omcaram Nalamasu, Proceedings of SPIE, 1994, Vol. 2195 (Vol. 2195). 225-229

G. Taylor and 13 others, “Methacrylate Resist and Antireflective Coating for 193 nm Lithography” (USA), In-microlithography and 1999 In-process resist X technology (In Microlithography 1999: Advances in Resist Technology and Processing XVI), edited by Will Conley, Proceedings of SPIE, 1999, 3678. (Vol. 3678), p. 174-185

Jim D. Meador and 6 others, “Recent Progress in 193 nm Antireflective Coatings” (USA), In-microlithography 1999: Advanced In-resist Technology and Processing XVI (In Microlithography 1999: Advances in Resist Technology and Processing XVI), edited by Will Conley, Proceedings of SPIE, Vol. 36, 78, 36, p. 800-809

  The present invention relates to an antireflection film-forming composition for lithography for an antireflection film having strong absorption for light having a short wavelength, particularly light having a wavelength of 248 nm, 193 nm, or 157 nm. Further, the present invention is a reflection that can be used in a lithography process for manufacturing a semiconductor device using irradiation light of a KrF excimer laser (wavelength 248 nm), an ArF excimer laser (wavelength 193 nm), or an F2 excimer laser (wavelength 157 nm). An object of the present invention is to provide an anti-film forming composition. Further, the present invention effectively absorbs the reflected light from the substrate when the irradiation light of the KrF excimer laser, ArF excimer laser or F2 excimer laser is used for fine processing, and does not cause intermixing with the photoresist layer, By optimizing the structure, the dry etching rate can be greatly increased or decreased as compared with the photoresist. Further, in the subsequent removal process, it is not dissolved in a resist solvent such as PGME or PGMEA due to its dissolution characteristics as well as dry ashing using oxygen or the like, but it is easily dissolved in a ketone solvent such as cyclohexanone. The process merit comes out in the removability. Further, by optimizing the sulfone structure, it can be made soluble in a developer such as NMD-3, and an antireflection film and a resist underlayer film soluble in the developer can be obtained. Providing a resist underlayer film (for example, antireflection film) forming composition for a resist underlayer film (for example, antireflection film) for lithography, and a lithography resist using the resist underlayer film (antireflection film) forming composition An object of the present invention is to provide a method for forming a lower layer film (antireflection film) and a method for forming a photoresist pattern.

As a first aspect of the present invention, a resist underlayer film forming composition for a lithography process for manufacturing a semiconductor device comprising a resin having a sulfone bond,
As a second aspect, the resin is a resist underlayer film forming composition for a lithography process according to the first aspect, wherein a sulfone bond is introduced into a main chain or a side chain connected to the main chain,
As a third aspect, the resin has the formula (1):

[However, Q is a formula (2)-a formula (15):

(Wherein, _{R 1} is each a hydrogen atom, or a halogen atom, Y represents an alkyl group having 1 to 40 carbon atoms, an aryl group having 5 to 40 carbon atoms, cyclic aliphatic group having 5-40 carbon atoms, a heterocyclic group An ether group, an ester group, a silicon-containing organic group, a tin-containing organic group, a hydroxyl group, a halogen group, a nitro group, a cyano group, an amino group, a sulfonyl group, a sulfonic acid group, or a combination thereof. It is a substituted or unsubstituted alkyl group composed of ˜40, Ar is a substituted or unsubstituted aryl group composed of 5 to 40 carbon atoms, and Cy is a substituted or unsubstituted cyclic aliphatic composed of 5 to 40 carbon atoms. A divalent organic group selected from the group or a combination thereof. m represents the number of repeating units of 3 to 10,000. A composition for forming a resist underlayer film for a lithography process according to the first aspect, having the structure of
As a fourth aspect, the resist underlayer film forming composition for a lithography process according to the third aspect, wherein Q is a divalent organic group consisting of Formula (2), Formula (3), Formula (12), or a combination thereof,
As a fifth aspect, the resin has the formula (16):

(However, R ₂ is a substituent of a hydrogen atom of the benzene ring, and each of them is a hydroxyl group, a halogen group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an alkenyl group having 1 to 6 carbon atoms. , A nitro group, a cyano group, or a combination thereof, n is an integer of 0 to 4. Q is an oxygen atom, a carboxyl group, a divalent organic group selected from the above formulas (2) to (15), Or m represents a number of repeating units of 3 to 10000.) The resist underlayer film forming composition for a lithography process according to the first aspect,
As a sixth aspect, the lithography according to the first aspect, wherein Q is a divalent organic group comprising an oxygen atom, formula (4), formula (6), formula (9), formula (11), or a combination thereof. Resist underlayer film forming composition for process,
As a seventh aspect, the resist underlayer film forming composition for lithography according to any one of the first to sixth aspects is applied on a semiconductor substrate and baked at 50 to 300 ° C. to form a resist underlayer film. A method of manufacturing a semiconductor device including a process,
As an eighth aspect, the resist underlayer film forming composition according to any one of the first to sixth aspects is applied onto a semiconductor substrate and baked to form a resist underlayer film, and photo resist is formed on the resist underlayer film. A method of manufacturing a semiconductor device in which a resist is coated, a substrate coated with the resist underlayer film and the photoresist is exposed, developed, and an image is transferred onto the substrate by dry etching to form an integrated circuit element; and
As a ninth aspect, a step of applying a resist underlayer film forming composition for lithography according to any one of the first to sixth aspects on a semiconductor substrate and baking to form a resist underlayer film, the resist underlayer film A step of forming a hard mask thereon, a step of forming a resist film on the hard mask, a step of forming a resist pattern by exposure and development, a step of etching the hard mask by the resist pattern, and a patterned hard mask The method for manufacturing a semiconductor device includes a step of etching a resist underlayer film by a step and a step of processing a semiconductor substrate by a patterned resist underlayer film.

  The present invention relates to an antireflection film-forming composition and a resist underlayer film-forming composition characterized by containing a sulfone structure, and short-wave irradiation light, particularly KrF excimer laser (wavelength 248 nm), ArF excimer It can be used for a lithography process for manufacturing a semiconductor device using irradiation light of a laser (wavelength 193 nm) or F2 excimer laser (wavelength 157 nm).

  The resist underlayer film forming composition for a lithography process of the present invention basically comprises a resin containing a sulfone structure and a solvent. Therefore, it does not contain a crosslinkable compound or a crosslinking catalyst. This is because the resist underlayer film forming composition of the present invention has solvent selectivity without crosslinking. With solvent selectivity, the resist underlayer film forming composition is applied onto a semiconductor substrate and baked, and then a photoresist forming composition is applied thereon. Since it is not dissolved in a solvent (for example, propylene glycol monomethyl ether or propylene glycol monomethyl ether acetate) in the photoresist forming composition, intermixing with the photoresist forming composition does not occur. Then, the photoresist forming composition is baked to form a photoresist layer, and exposure and development are performed. Using the photoresist pattern, dry etching of the resist underlayer film is performed, and a resist pattern composed of the photoresist layer and the underlayer film layer is formed. It is formed. Thereafter, the substrate is processed by the formed resist pattern. In the conventional method, the resist pattern which becomes unnecessary after processing the substrate is incinerated and removed by an ashing process. However, since the ashing process places a thermal burden (damage) on the substrate, it is preferable if it can be removed by a solvent. In the present invention, the ashing process that has been conventionally performed is not performed, and the removal with a removal solvent (for example, cyclohexanone, γ-butyllactone) is possible. In this way, the solvent selection is not to dissolve in the solvent (for example, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate) in the photoresist forming composition, but to dissolve in the removal solvent (for example, cyclohexanone, γ-butyllactone). As a result, the ashing process becomes unnecessary, and thermal damage to the substrate can be reduced (Effect 1).

  Further, when a coating failure of the resist underlayer film or the photoresist film occurs in the manufacturing process of the semiconductor device, the substrate itself is usually discarded. However, since the resist underlayer film forming composition of the present invention is dissolved in a removal solvent (for example, cyclohexanone, γ-butyllactone), the resist underlayer film or the photo resist is removed by washing the semiconductor substrate in which the coating failure has occurred with the removal solvent. The resist film can be washed away, and by applying them again, the defective product can be regenerated (reworked) without discarding the semiconductor substrate (effect 2).

  In addition, when the baking process is performed after applying the resist underlayer film forming composition to the semiconductor substrate, the crosslinking compound or the crosslinking catalyst becomes a sublimate in the baking process and adheres to the draft chamber, and falls on the substrate. It may become a foreign material and cause defects. However, the resist underlayer film forming composition of the present invention does not contain a crosslinkable compound and a crosslinking catalyst, and the baking after applying the resist underlayer film forming composition to the semiconductor substrate is only evaporation of the solvent, which is long. Since no firing time is required, the amount of low molecular component sublimates is small as a result. Therefore, it is possible to reduce the occurrence of defects caused by foreign matter due to the fall of the sublimate (Effect 3).

  Such an effect is because the resist underlayer film forming composition of the present invention does not require thermosetting. The structure which does not require thermosetting (non-thermosetting) is made by using a resin having a sulfone bond.

  In addition, there is a problem that the cross-sectional shape tends to be squeezed when a photoresist pattern is formed by baking a photoresist forming composition to form a photoresist layer, and then performing exposure and development. By using the membrane containing the sulfone bond of the present invention, it is possible to effectively adjust the shape from rectangular to undercut (effect 4).

  In addition, by designing a molecule in which a sulfone group and a conjugated bond are adjacent to each other, absorption can be provided not only at 193 nm but also at other exposure wavelength regions such as 248 nm (effect 5).

  The present invention is a resist underlayer film forming composition for a lithography process for manufacturing a semiconductor device containing a resin having a sulfone bond. The resin has a sulfone structure introduced in the main chain or a side chain connected to the main chain.

  The antireflection film-forming composition of the present invention comprises a resin having a sulfone bond and a solvent, and contains a catalyst, a surfactant and the like as optional components. The solid content of the resist underlayer film forming composition for lithography of the present invention is, for example, 0.1 to 50% by mass, and for example, 0.5 to 30% by mass. Here, the solid content is obtained by removing the solvent component from all the components of the resist underlayer film forming composition.

  In the antireflection film-forming composition of the present invention, the amount of the resin having a sulfone bond is 10% by mass or more per total solid content, for example, 30% to 99% by mass, for example, 50% by mass. It is -99 mass%, Furthermore, it is 60 mass%-95 mass%, for example.

  The resin having a sulfone bond used in the present invention can be a resin having the structure of formula (1). In the resin having the structure of the formula (1), Q represents a divalent organic group selected from the formulas (2) to (15) or a divalent organic group obtained by combining them. In the above formula, each R1 is a hydrogen atom or a halogen atom, and the halogen atom is a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Y is an alkyl group having 1 to 40 carbon atoms, an aryl group having 5 to 40 carbon atoms, a cyclic aliphatic group having 5 to 40 carbon atoms, a heterocyclic group, an ether group, an ester group, a silicon-containing organic group, or a tin-containing organic group. , Hydroxyl group, halogen group, nitro group, cyano group, amino group, sulfonyl group, sulfonic acid group, or a combination thereof, R is a substituted or unsubstituted alkyl group having 1 to 40 carbon atoms, and Ar is It is a substituted or unsubstituted aryl group having 5 to 40 carbon atoms, and Cy represents a substituted or unsubstituted cyclic aliphatic group having 5 to 40 carbon atoms. Halogen groups are derived from fluorine, chlorine, bromine and iodine. The aryl group is a substituted or unsubstituted phenyl group, naphthyl group, anthryl group and the like. The heterocyclic group is an organic group derived from a heterocyclic ring such as furan, thiophene, pyrrole, pyran, thiopyran, pyridine, thiazole, imidazole, pyrimidine, triazine, indole, quinoline, and purine. The environmental aliphatic group is an organic group derived from cyclopentane, cyclohexane, cyclodecane or the like. In particular, Q in formula (1) is preferably formula (2), formula (3), formula (12) or a combination thereof.

The resin having a sulfone bond represented by the formula (1) is obtained by radical polymerization of sulfur dioxide and a compound having a carbon-carbon multiple bond (double bond, triple bond). This reaction is preferably carried out in a solution state in which sulfur dioxide is excessively used as a solvent, or sulfur dioxide is dissolved in an organic solvent such as N, N-dimethylformamide, N, N-dimethylacetamide, or dimethylsulfoxide.
In this reaction, the resin having the structure of the formula (1) is obtained by polymerization by combining two or more kinds of compounds. In this polymerization reaction, a radical initiator such as tert-butyl hydroperoxide, AIBN, or 2,2′-azobis (isobutyric acid) dimethyl can be used as a catalyst for the radical reaction. The reaction temperature and reaction time of the above reaction depend on the compound used, concentration, etc., but are appropriately selected from the range of reaction time of 0.1 to 100 hours and reaction temperature of 20 ° C to 200 ° C. When using a catalyst, it can be used in 0.001-50 mass% with respect to the total mass of the compound to be used.
In the resin having the structure of formula (1), the number m of repeating units is 3 to 10,000, or 3 to 1000, or 10 to 1000. The weight average molecular weight is 300 to 1,000,000, preferably 300 to 100,000.

  In the resist underlayer film composition of the present invention containing a resin having the structure of the formula (1), when the resist underlayer film is an antireflection film, the characteristics of the antireflection film, in particular, the absorption characteristics with respect to irradiation light used in the lithography process The attenuation coefficient, refractive index, etc. greatly depend on the type of compound used for the synthesis of the resin having the structure of formula (1). Further, when an antireflection film is formed with the resist underlayer film forming composition of the present invention, the compound used for the synthesis of the resin having the structure of the formula (1) to be used can be used for the time required for the removal step by etching. Kind is the one that affects.

The combination of the compounds used in the reaction for obtaining the non-aromatic main chain polysulfone is a combination of a sulfur dioxide gas and a compound having a double bond or a triple bond, and any compound can be used as long as it is a polymerizable compound. Can also be used. The comonomer species include propene, propyne, butene, butyne, pentene, pentyne, hexene, hexyne, heptene, heptine, octene, octyne, nonene, nonine, decene, decine, dodecene, dodecin, undecene, undecine, tridecene, tridecine. , Tetradecene, tetradecyne, hexadecene, hexadecine, styrene, phenylacetylene, allyltrimethylsilane, allylphenylsulfone, cyclohexene, cyclohexyne, cyclopentene, cyclopentine, norbornene, norbornadiene, allyl acetate, sulfolene, butenyltrimethylsilane, allyl alcohol, allylpenta Fluorobenzene, allyl phenyl ether, allyl phenol, 5-hexen-1-ol, 5-hexyne-1-one 9-decen-1-ol, allylrhodanine, 1-allyl-2-thiourea, allyl perfluoro-n-nonanoate, allyl trifluoroacetate, 4-phenyl-1-butene, allylbenzene, methylenecyclohexane, 4-phenyl-1 -Butyne, allyroutine n-butyl, ethynylbenzene, allylphenylsulfone, cyclohexene, cyclopentene, allyl acetate, monoallyl isocyanuric acid, 3,4-dihydro-2H-pyran, hexadecene, hexadecyne, allylbenzene, methylenecyclohexane, etc. These can be used alone or in combination of two or more.
Resins having the structure of the above formula (1) are, for example, [1-1] to [1-36]:

Is mentioned.
Examples of the resin having a sulfone bond used in the present invention include a resin having a structure of the formula (16).
In the resin having the structure of the formula (16), the number m of repeating units is 3 to 10,000, or 3 to 1000, or 10 to 1000. The weight average molecular weight is 300 to 1,000,000, preferably 300 to 100,000.
However, R < ₂ > is a substituent of the hydrogen atom of a benzene ring, Comprising: Each is a hydroxyl group, a halogen group, a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C6 alkenyl group, A nitro group, a cyano group, or a combination thereof is shown, and n is an integer of 0 to 4.

In the formula (16), Q represents an oxygen atom, a carboxyl group, a divalent organic group selected from the above formulas (2) to (15), or a divalent organic group obtained by combining them. In particular, an oxygen atom, a divalent organic group composed of Formula (4), Formula (6), Formula (9), Formula (11), or a combination thereof is preferable.
In R ₂ described above, the halogen group is a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom. Examples of the alkyl group having 1 to 6 carbon atoms include a methyl group, an ethyl group, a propyl group, an isopropyl group, a t-butyl group, and a pentyl group. Examples of the alkoxy group having 1 to 6 carbon atoms include a methoxy group, an ethoxy group, a propoxy group, and a t-butoxy group. An allyl group or the like is preferably used as the alkenyl group having 1 to 6 carbon atoms. n is the number of R1 substituted with the hydrogen atom of a benzene ring, and is an integer of 0-4, respectively.
The resin having the structure of the formula (16) is obtained by a reaction between a bisphenol S compound or a dicarboxydiphenyl sulfone compound and an aromatic compound, or a reaction between a bisphenol S compound and a diruruboxy diphenyl sulfone compound.
Such a resin having the structure of the formula (16) is obtained by using a bisphenol S compound in an organic solvent such as toluene, nitrobenzene, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidinone. It is preferable to carry out the reaction using a Dean-Stark trap in a solution state or a bulk in which the aromatic compound is dissolved. In this reaction, the bisphenol S-based compound and the aromatic compound can be used in combination of two or more compounds. In this reaction, a base such as potassium carbonate can also be used as a catalyst for this reaction. The reaction temperature and reaction time of this reaction depend on the compound used, concentration, etc., but are appropriately selected from the range of reaction time of 0.1 to 100 hours and reaction temperature of 20 ° C to 200 ° C. When using a catalyst, it can be used in 0.001-50 mass% with respect to the total mass of the compound to be used.

  In the resist underlayer film composition of the present invention containing the compound represented by the formula (16), the characteristics of the resist underlayer film (for example, antireflection film) formed from the resist underlayer film (for example, antireflection film) formation composition, In particular, the light absorption characteristics, the attenuation coefficient, the refractive index, and the like for the irradiation light used in the lithography process largely depend on the type of the compound of the formula (16) used in this reaction. Also, the formula (16) used for the time required for the step of removing the resist underlayer film (for example, antireflection film) formed from the resist underlayer film (for example, antireflection film) forming composition of the present invention by etching. The type of compound used in the synthesis affects the resin having the structure:

  Examples of the combination of compounds used in the reaction for obtaining the aromatic polysulfone include bisphenol S, 3,3′5,5′-tetramethyl-4,4′-dihydroxy-diphenylsulfone, and 4,4′-dicarboxy. Diphenylsulfone, and the like, bisphenol A, biphenol, 2,2-bis (4-hydroxy-3-methylphenyl) propane, 2,2-bis (4-hydroxyphenyl) hexafluoropropane, 9,9-bis (4- Hydroxyphenyl) fluorene, 1,1-bis (4-hydroxyphenyl) cyclohexane, 2,2-bis (4-hydroxy-3,5-dimethylphenyl) propane and the like.

  Resins having the structure of the formula (16) are, for example, [2-1] to [2-15]:

Is mentioned.

In the present invention, in order to give absorption at each specific wavelength, examples of the light-absorbing compound include phenyl compounds, benzophenone compounds, benzotriazole compounds, azo compounds, naphthalene compounds, anthracene compounds, anthraquinone compounds, triazine compounds, triazine trione compounds. A quinoline compound or the like can be used. Phenyl compounds, naphthalene compounds, anthracene compounds, triazine compounds, and triazine trione compounds are preferably used.
In addition to the above, the composition for forming a resist underlayer film (for example, an antireflection film) of the present invention may contain other rheology adjusting agents, adhesion assistants, surfactants, and the like as necessary.

  The rheology modifier mainly improves the fluidity of the resist underlayer film (antireflection film) forming composition, and in particular, enhances the filling property of the resist underlayer film (antireflection film) forming composition into the hole in the baking process. Add for purpose. Specific examples include phthalic acid derivatives such as dimethyl phthalate, diethyl phthalate, diisobutyl phthalate, dihexyl phthalate, butyl isodecyl phthalate, adipic acid derivatives such as dinormal butyl adipate, diisobutyl adipate, diisooctyl adipate, octyl decyl adipate, Mention may be made of maleic acid derivatives such as normal butyl maleate, diethyl maleate and dinonyl maleate, oleic acid derivatives such as methyl oleate, butyl oleate and tetrahydrofurfuryl oleate, or stearic acid derivatives such as normal butyl stearate and glyceryl stearate. it can. These rheology modifiers are usually blended in a proportion of less than 30% by mass in the total composition of the antireflection film material for lithography.

  Adhesion aids are added mainly for the purpose of improving the adhesion between the substrate or photoresist and the resist underlayer film (antireflection film) forming composition and preventing the photoresist from being peeled off particularly during development. Specific examples include chlorosilanes such as trimethylchlorosilane, dimethylvinylchlorosilane, methyldiphenylchlorosilane, chloromethyldimethylchlorosilane, trimethylmethoxysilane, dimethyldiethoxysilane, methyldimethoxysilane, dimethylvinylethoxysilane, diphenyldimethoxysilane, Alkoxysilanes such as enyltriethoxysilane, hexamethyldisilazane, N, N′-bis (trimethylsilyl) urea, silazanes such as dimethyltrimethylsilylamine, trimethylsilylimidazole, vinyltrichlorosilane, γ-chloropropyltrimethoxysilane, γ -Silanes such as aminopropyltriethoxysilane and γ-glycidoxypropyltrimethoxysilane, benzotriazole, benzimidazole , Indazole, imidazole, 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, urazole, thiouracil, mercaptoimidazole, mercaptopyrimidine, etc., 1,1-dimethylurea, 1,3 -Urea such as dimethylurea or thiourea compounds. These adhesion assistants are generally blended in a proportion of less than 5% by mass, preferably less than 2% by mass, in the entire composition of the resist underlayer film for lithography (antireflection film).

  In the resist underlayer film (antireflection film) forming composition of the present invention, there is no occurrence of pinholes and setups, and a surfactant can be blended in order to further improve the applicability to surface unevenness. Examples of the surfactant include polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene cetyl ether, polyoxyethylene alkyl ethers such as polyoxyethylene oleyl ether, polyoxyethylene octylphenol ether, polyoxyethylene nonyl Polyoxyethylene alkyl allyl ethers such as phenol ether, polyoxyethylene / polyoxypropylene block copolymers, sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan monooleate, sorbitan trioleate, sorbitan tristearate Sorbitan fatty acid esters such as rate, polyoxyethylene sorbitan monolaurate, polyoxyethylene sol Nonionic surfactants such as polyoxyethylene sorbitan fatty acid esters such as tan monopalmitate, polyoxyethylene sorbitan monostearate, polyoxyethylene sorbitan trioleate, polyoxyethylene sorbitan tristearate, EFTTOP EF301, EF303, EF352 (Manufactured by Tochem Products Co., Ltd.), Megafuk F171, F173 (manufactured by Dainippon Ink Co., Ltd.), Florard FC430, FC431 (manufactured by Sumitomo 3M), Asahi Guard AG710, Surflon S-382, SC101, SC102, Fluorosurfactants such as SC103, SC104, SC105, and SC106 (Asahi Glass Co., Ltd.), organosiloxane polymer KP341 (Shin-Etsu Chemical Co., Ltd.), and the like can be mentioned. The compounding amount of these surfactants is usually 0.2% by mass or less, preferably 0.1% by mass or less, in the total composition of the resist underlayer film (antireflection film) for lithography of the present invention. These surfactants may be added alone or in combination of two or more.

  Solvents used in the resist underlayer film (antireflection film) forming composition of the present invention include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol , Propylene glycol propyl ether acetate, toluene, xylene, methyl ethyl ketone, cyclopentanone, cyclohexanone, 2-hydroxyethyl propionate, ethyl 2-hydroxy-2-methylpropionate, ethyl ethoxy acetate, ethyl hydroxyacetate, 2-hydroxy-3 -Methyl methyl butanoate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3-ethoxy Ethyl propionate, methyl 3-ethoxypropionate, methyl pyruvate, ethyl pyruvate, ethyl acetate, butyl acetate. These organic solvents are used alone or in combination of two or more.

  In the present invention, any solvent can be used for the resist underlayer film (antireflection film) forming composition as long as it dissolves the polymer component. Then, the resist underlayer film forming composition is applied onto a semiconductor substrate and baked to a temperature at which the solvent is evaporated. After the solvent is removed and the resist underlayer film is formed, a photoresist composition is overcoated thereon. It does not dissolve in the solvent of the composition (for example, propylene glycol monomethyl ether or propylene glycol monomethyl ether acetate), but dissolves only in the solvent for removing the photoresist film and the resist underlayer film (for example, cyclohexanone, γ-butyllactone).

  As the photoresist applied to the upper layer of the resist underlayer film (antireflection film) in the present invention, either a negative type or a positive type can be used. A chemically amplified resist comprising a photoacid generator and a binder having a group that decomposes with an acid to increase the alkali dissolution rate, and a low resistance that decomposes with an alkali-soluble binder, a photoacid generator and an acid to increase the alkali dissolution rate of the resist. Chemical amplification resist consisting of molecular compounds, chemical amplification consisting of a low molecular weight compound that decomposes with a photoacid generator and an acid to increase the alkali dissolution rate, and a binder with a group that increases the alkali dissolution rate with an acid. There are mold resists, for example, trade name APEX-E manufactured by Shipley. In addition, Proc. SPIE, Vol. 3999, 330-334 (2000), Proc. SPIE, Vol. 3999, 357-364 (2000), Proc. SPIE, Vol. 3999, 365-374 (2000) can also be mentioned.

  As a developer for a positive photoresist having a resist underlayer film (antireflection film) formed using the resist underlayer film (antireflection film) material for lithography of the present invention, sodium hydroxide, potassium hydroxide, sodium carbonate , Inorganic alkalis such as sodium silicate, sodium metasilicate, and aqueous ammonia, primary amines such as ethylamine and n-propylamine, secondary amines such as diethylamine and di-n-butylamine, triethylamine, and methyldiethylamine Alkalis such as tertiary amines, alcohol amines such as dimethylethanolamine and triethanolamine, quaternary ammonium salts such as tetramethylammonium hydroxide, tetraethylammonium hydroxide and choline, cyclic amines such as pyrrole and piperidine, etc. Water-soluble It can be used. Furthermore, an appropriate amount of an alcohol such as isopropyl alcohol or a nonionic surfactant may be added to the alkaline aqueous solution. Of these, preferred developers are quaternary ammonium salts, more preferably tetramethylammonium hydroxide and choline.

  Next, the photoresist pattern forming method of the present invention will be described. A spinner on a substrate (for example, a silicon / silicon dioxide coated substrate, a silicon nitride substrate, a glass substrate, an ITO substrate, etc.) used for manufacturing a precision integrated circuit device. The resist underlayer film (antireflection film) forming composition is applied by an appropriate coating method such as a coater and then baked (baked) and cured to form a resist underlayer film (antireflection film). Here, the film thickness of the resist underlayer film (antireflection film) is, for example, 0.01 to 3.0 [mu] m, and for example, 0.03 to 1.0 [mu] m. Moreover, as conditions for baking after application | coating, it is 0.5 to 120 minutes at 80-250 degreeC, for example, and is 0.5 to 10 minutes at 150-250 degreeC, for example. Thereafter, a photoresist is applied, exposed through a predetermined mask, developed, rinsed and dried to obtain a good photoresist pattern. If necessary, post-exposure heating (PEB: Post Exposure Bake) can also be performed. Then, the resist underlayer film (antireflection film) where the photoresist has been developed and removed by the above-described process can be removed by dry etching or wet processing such as a solvent or a remover to form a desired pattern on the substrate. .

  The resist underlayer film (antireflection film) characterized by containing the polymer compound (resin) of the present invention has a property of efficiently absorbing irradiation light having a wavelength of 248 nm, a wavelength of 193 nm, or a wavelength of 157 nm. Therefore, the effect of preventing the reflected light from the substrate is high, and as a result, the upper layer photoresist pattern can be satisfactorily formed. Moreover, the resist underlayer film (antireflection film) produced from the resist underlayer film (antireflection film) forming composition containing the polymer compound (resin) of the present invention is a heteroatom as represented by the olefin sulfone structure. Various dry etching rates can be obtained by containing a large amount of (nitrogen atoms, oxygen atoms) or by reducing the amount of hetero elements as represented by the aromatic sulfone type.

  Furthermore, the resist underlayer film (antireflection film) formed from the resist underlayer film (antireflection film) forming composition of the present invention is easily dissolved in cyclohexanone and the like, but is soluble in alcohol solvents that are usually used as resist solvents. It is possible to have a unique dissolution property that does not mix with the resist without crosslinking. In addition, it is insoluble in a resist solvent, but can also be made soluble in a developer, so that it can also be used as a developer-soluble resist underlayer film (antireflection film) forming composition.

  Furthermore, the resist underlayer film (antireflection film) formed from the resist underlayer film (antireflection film) forming composition of the present invention has a function of preventing reflected light depending on process conditions, and further, between the substrate and the photoresist. Prevention of interaction, prevention of adverse effects on the substrate of materials used for photoresist or substances exposed to photoresist, or prevention of adverse effects on the photoresist of substances generated from the substrate during exposure or heating It can be used as a film having functions such as.

  Furthermore, aromatic polysulfone and alkyne-sulfone are likely to have absorption at 248 nm, and can be applied as an antireflection film for 248 nm.

Synthesis example 1
In a flask equipped with a stirrer, Dean-Stark trap and condenser, 3.08 g of 4,4′-dichloro-diphenyl-sulfone, 2.68 g of bis (4-hydroxyphenyl) propane, 4.45 g of potassium carbonate, N-methyl-2 -A mixture of 40 g of pyrrolidinone and 10 g of toluene was added. Then, while flowing the value nitrogen, it was heated to 160 ° C. and reacted for 16 hours. Next, the mixture was cooled to room temperature and then poured into methanol for reprecipitation purification. Thereafter, it was washed with water and vacuum-dried at 50 ° C. for 1 day to obtain the desired product. When GPC analysis of the obtained resin was performed, the weight average molecular weight was 5100 in terms of standard polystyrene. In addition, it is estimated that the reaction product obtained by this synthesis example includes a polymer having the formula [2-1] structural unit.

Synthesis example 2
In a flask equipped with a stirrer, Dean-Stark trap and condenser, 3.08 g of 4,4′-dichloro-diphenyl-sulfone, 3.75 g of 9,9-bis (4-hydroxyphenyl) fluorene, 4.45 g of potassium carbonate, A mixture of 40 g of N-methyl-2-pyrrolidinone and 10 g of toluene was added. Then, while flowing the value nitrogen, it was heated to 160 ° C. and reacted for 16 hours. Next, the mixture was cooled to room temperature and then poured into methanol for reprecipitation purification. Thereafter, it was washed with water and vacuum-dried at 50 ° C. for 1 day to obtain the desired product. When GPC analysis of the obtained resin was performed, the weight average molecular weight was 22800 in terms of standard polystyrene. In addition, it is estimated that the reaction product obtained by this synthesis example includes a polymer having the formula [2-7] structural unit.

Synthesis example 3
A stirrer chip and 2 g of 1-hexadecene were added to a pressure-resistant polymerization tube, and 0.01 g of tert-butyl hydroperoxide was introduced as a starting material while cooling at -78 ° C. Thereafter, the inside of the polymerization tube was evacuated, and 10 g of liquid SO ₂ gas was introduced. After the introduction, the mixture was stirred at −15 ° C. for 24 hours. Next, the mixture was poured into hexane to stop the polymerization, and the SO ₂ gas was evaporated. Then, the reprecipitated polymer was taken out, washed, and vacuum-dried at 30 ° C. for 1 day to obtain the desired product. The reaction product obtained by this synthesis example is presumed to contain a polymer having the formula [1-26] structural unit.

Synthesis example 4
Stirrer chips and 2 g of 4-phenyl-1-butene were added to a pressure resistant polymerization tube, and 0.01 g of tert-butyl hydroperoxide was introduced as a starting material while cooling at -78 ° C. Thereafter, the inside of the polymerization tube was evacuated, and 10 g of liquid SO ₂ gas was introduced. After the introduction, the mixture was stirred at −15 ° C. for 24 hours. Next, the mixture was poured into hexane to stop the polymerization, and the SO ₂ gas was evaporated. Then, the reprecipitated polymer was taken out, washed, and vacuum-dried at 30 ° C. for 1 day to obtain the desired product.
The reaction product obtained by this synthesis example is presumed to contain a polymer having the formula [1-28] structural unit.

Synthesis example 5
Stirrer chips and 2 g of 1-tetradecene were added to the pressure-resistant polymerization tube, and 0.01 g of tert-butyl hydroperoxide was introduced as a starting material while cooling at -78 ° C. Thereafter, the inside of the polymerization tube was evacuated, and 10 g of liquid SO ₂ gas was introduced. After the introduction, the mixture was stirred at −15 ° C. for 24 hours. Next, the mixture was poured into hexane to stop the polymerization, and the SO ₂ gas was evaporated. Then, the reprecipitated polymer was taken out, washed, and vacuum-dried at 30 ° C. for 1 day to obtain the desired product. The reaction product obtained by this synthesis example is presumed to contain a polymer having the formula [1-32] structural unit.

Synthesis Example 6
Stirrer chips and 2 g of 1-dodecene were added to the pressure-resistant polymerization tube, and 0.01 g of tert-butyl hydroperoxide was introduced as a starting material while cooling at -78 ° C. Thereafter, the inside of the polymerization tube was evacuated, and 10 g of liquid SO ₂ gas was introduced. After the introduction, the mixture was stirred at −15 ° C. for 24 hours. Next, the mixture was poured into hexane to stop the polymerization, and the SO ₂ gas was evaporated. Then, the reprecipitated polymer was taken out, washed, and vacuum-dried at 30 ° C. for 1 day to obtain the desired product. The reaction product obtained by this synthesis example is presumed to contain a polymer having the formula [1-36] structural unit.

Comparative Synthesis Example 1
10 g of cresol novolac resin (Asahi Ciba Co., Ltd., trade name ECN1299, weight average molecular weight 3900) was added to 80 g of propylene glycol monomethyl ether and dissolved. To the solution, 9.7 g of 9-anthracenecarboxylic acid and 0.26 g of benzyltriethylammonium chloride were added and reacted at 105 ° C. for 24 hours to obtain a resin compound of formula (17). When GPC analysis of the obtained resin compound was performed, the weight average molecular weight was 5600 in standard polystyrene conversion.

Example 1
After adding 0.3 g of the resin obtained in Synthesis Example 1 and 9.7 g of the solvent cyclohexanone, the mixture was filtered using a polyethylene microfilter having a pore size of 0.10 to prepare an antireflection film-forming composition.

Example 2
An antireflection film-forming composition was prepared in the same manner as in Example 1 except that the resin obtained in Synthesis Example 2 was used instead of the resin obtained in Synthesis Example 1.

Example 3
An antireflection film-forming composition was prepared in the same manner as in Example 1 except that the resin obtained in Synthesis Example 3 was used instead of the resin obtained in Synthesis Example 1.

Example 4
An antireflection film-forming composition was prepared in the same manner as in Example 1 except that the resin obtained in Synthesis Example 4 was used instead of the resin obtained in Synthesis Example 1.

Example 5
An antireflection film-forming composition was prepared in the same manner as in Example 1 except that the resin obtained in Synthesis Example 5 was used instead of the resin obtained in Synthesis Example 1.

Example 6
An antireflection film-forming composition was prepared in the same manner as in Example 1 except that the resin obtained in Synthesis Example 6 was used instead of the resin obtained in Synthesis Example 1.

Comparative Example 1
To 10 g of the solution having 2 g of the resin obtained in Comparative Synthesis Example 1, 0.5 g of tetramethoxymethyl glycoluril (trade name Powder Link 1174, manufactured by Mitsui Cytec Co., Ltd.) and 0.03 g of p-toluenesulfonic acid are mixed, and propylene is added. A solution was prepared by dissolving in 37.3 g of glycol monomethyl ether and 19.4 g of cyclohexanone. Then, it filtered using the polyethylene micro filter with a hole diameter of 0.10 micrometer, and prepared the anti-reflective film formation composition solution.

Comparative Example 2
0.5 g of the crosslinkable compound MX-750 (manufactured by Nicalak, substituted with an average of 3.7 methoxymethylol groups per melamine ring), 0.5 g of bisphenol S, 19 g of propylene glycol monomethyl Dissolved in ether acetate, a fluorosurfactant (manufactured by Sumitomo 3M, trade name Fc-430) was added to a concentration of 1000 ppm to obtain a solution. Then, it filtered using the polyethylene micro filter with a hole diameter of 0.10 micrometer, and prepared the anti-reflective film formation composition.

  The solutions obtained in Examples 1 to 6 and Comparative Example 1 were applied onto a silicon wafer using a spinner. Heating was performed at 205 ° C. for 1 minute on a hot plate to form an antireflection film (film thickness: 0.03 μm). This antireflection film is immersed in a solvent used for resist, for example, propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), alkaline developer (NMD-3), and the difference in film thickness before and after the treatment is determined. It was confirmed whether there was solvent resistance by looking. In addition, it was also confirmed whether or not the film was dissolved in cyclohexanone (CYH), which is a polymer solvent, even after film formation. The results are shown in Table 1.

[Table 1]
table 1
――――――――――――――――――――――――――――――――――――
Solvent resistance test (Difference in film thickness before and after treatment, unit is nm)
NMD-3 PGME PGMEA CYH
――――――――――――――――――――――――――――――――――――
Example 1 0 -1 -4 Total dissolution example 2 _ 0 -3 Total dissolution example 3 Total dissolution -1 -1 Total dissolution example 4 0 -1 -4 Total dissolution example 5 Total dissolution -1 -4 Total Example 6 of dissolution Total dissolution -1 -1 Total dissolution comparative example 1 0 0 0 0
Comparative Example 2 0 0 0 0
――――――――――――――――――――――――――――――――――――

A normal antireflection film typified by Comparative Example 1 is thermally cured with a crosslinking agent. Therefore, it has a characteristic that it does not dissolve in a solvent after film formation. In Comparative Example 2, the crosslinkable compound and bisphenol S (monomer) are contained, but the reaction between bisphenol S and the crosslinkable compound occurs during heating of the antireflection film, and solvent selectivity occurs in the obtained antireflection film. Absent.
However, for example, polysulfone as shown in Examples 1 to 6 can obtain solvent resistance using the difference in solubility of the polymer without being thermally cured with a crosslinking agent or the like, and patterning a resist on the polysulfone film. Can do. Therefore, in the lithography process, the film can be quickly removed by exposing the cyclohexanone solvent when removing the antireflection film.

Further, for example, poly (olefin-sulfone) as typified by Example 3, Example 5 and Example 6 dissolves in the developer and cyclohexanone, but does not dissolve in PGME or PGMEA. Therefore, it can be applied as a developer-soluble antireflection film.
Test of optical parameters The antireflection film-forming compositions obtained in Examples 1 to 6 and Comparative Example 1 were applied on a silicon wafer by a spinner. Heating was performed at 205 ° C. for 1 minute on a hot plate to form an antireflection film (film thickness: 0.03 μm). These antireflection films were measured for refractive index (n value) and attenuation coefficient (k value) at a wavelength of 193 nm using a spectroscopic ellipsometer (manufactured by JA Woollam, VUV-VASE VU-302). . The evaluation results are shown in Table 2.
Measurement of dry etching rate The antireflection film-forming compositions obtained in Examples 1 to 6 and Comparative Example 1 were applied onto a silicon wafer by a spinner. Heating was performed at 205 ° C. for 1 minute on a hot plate to form an antireflection film (film thickness: 0.03 μm). The dry etching rate (the amount of decrease in film thickness per unit time) was measured using RIE system ES401 manufactured by Nippon Scientific under the condition that CF ₄ was used as the dry etching gas.

Similarly, a photoresist solution (manufactured by Sumitomo Chemical Co., Ltd., trade name PAR710) was applied onto a silicon wafer by a spinner and heated on a hot plate at 90 ° C. for 1 minute to form a photoresist layer. The dry etching rate was measured using a RIE system ES401 manufactured by Japan Scientific under the condition that CF ₄ was used as the dry etching gas. The results are shown in Table 2. In Table 2, Table 2 shows the etching rate of the antireflection film formed from each example when the dry etching rate of the photoresist is 1.00.

[Table 2]
Table 2
―――――――――――――――――――――――――――――――――――
N / k at 193 nm n / k selectivity at 248 nm ――――――――――――――――――――――――――――――――――――
Example 1 1.57 / 0.77 1.76 / 0.23 1
Example 2--0.9
Example 3 1.61 / 0.01 1.52 / 0.01 1.9
Example 4 1.94 / 0.76 1.74 / 0.01 1.3
Example 5 ― ― ―
Example 6 ― ― ―
Comparative Example 1 1.60 / 0.47 1.55 / 0.60 0.9
―――――――――――――――――――――――――――――――――――

  In the case of an aromatic polysulfone, the antireflection film obtained from the antireflection film-forming composition of the present invention has a sufficiently effective refractive index and attenuation coefficient for not only 193 nm but also 248 nm light. I understand. Poly (olefin-sulfone) did not have an attenuation coefficient unless both 193 nm and 248 nm had a benzene ring, but poly (alkyne-sulfone) was found to have an attenuation coefficient at 193 nm and 248 nm.

  It can be seen that poly (olefin-sulfone), in particular, has a large dry etching rate selectivity with respect to the photoresist. Therefore, the time required for removing the antireflection film by dry etching can be shortened, and the undesirable phenomenon of a decrease in the thickness of the photoresist layer accompanying removal of the antireflection film by dry etching can be suppressed. It can be said.

Evaluation of Photoresist Pattern Shape The solution of the antireflection film forming composition prepared in Example 1 and Comparative Example 1 was applied onto a silicon wafer by a spinner. An antireflection film was formed by baking on a hot plate at 205 ° C. for 1 minute. On this antireflection film, a commercially available photoresist solution (trade name AR1221J, manufactured by JSR Corporation) was applied by a spinner and heated on a hot plate at 130 ° C. for 90 seconds to form a photoresist film (thickness 0). .25 μm) was formed. Then, using an ASML PAS5500 / 1100 scanner (wavelength 193 nm, NA, σ: 0.75, 0.89 / 0.55 (ANNNULAR)), the line width of the photoresist and the width between the lines after development. Was 0.10 μm, that is, 0.10 μmL / S (dense line), and exposure was performed through a mask set so that nine such lines were formed.

  Thereafter, post-exposure heating was performed on a hot plate at 130 ° C. for 90 seconds. After cooling, it was developed with a 0.26N aqueous tetramethylammonium hydroxide solution as a developer in an industrial standard 60 second single paddle process.

  The cross section of the obtained photoresist pattern was observed with a scanning electron microscope (SEM). As a result, in Example 1, the resist shape could be made rectangular. A resist shape that does not depend on the baking temperature is obtained because it is not thermally cured by a crosslinking agent.

Sublimation quantitative test (QCM method)
The solution of the antireflection film forming composition prepared in Example 1 and Comparative Example 1 was applied onto a silicon wafer by a spinner. The wafer coated with the antireflection film was set in a sublimation measuring apparatus integrated with a hot plate adjusted to 205 ° C., and the baking and sublimation were collected for 120 seconds by a QCM sensor and quantified.
In the measurement, the hot plate is heated to 205 ° C., the pump flow rate is set to 1 m ³ / s, and the first 60 seconds is left for aging. Immediately after that, the wafer coated with the antireflection film was quickly put on the hot plate from the slide opening (installed with the measurement object), and the sublimate was collected from the time point of 60 seconds to the time point of 180 seconds (120 seconds). .

  In addition, a nozzle with a diameter of 2 mm is attached to the flow attachment (detection portion) that connects the QCM sensor and the collection funnel portion, and the distance between the sensor and the nozzle is kept at 0.5 mm. The QCM sensor uses an electrode made of a compound containing silicon and aluminum, and has a crystal resonator diameter (sensor diameter) of 14 mm, a crystal resonator surface electrode diameter of 5 mm, and a resonance frequency of 9 MHz. .

  As a result, the sublimation amount of the antireflection film obtained from the antireflection film-forming composition prepared in Example 1 is the antireflection film obtained from the antireflection film-forming composition containing a large amount of low molecular weight components prepared in Comparative Example 1. The amount of the sublimate of the film was 1/5 of the amount, and the amount of sublimate could be significantly reduced.

  Moreover, the amount of sublimation of the antireflection film obtained from the antireflection film forming composition prepared in Example 1 is the antireflection film obtained from the antireflection film forming composition containing a large amount of low molecular weight components prepared in Comparative Example 2. The amount of the sublimate of the film was 1/5 of the amount, and the amount of sublimate could be significantly reduced.

  The resist underlayer film obtained from the resist underlayer film forming composition for the lithography process of the present invention can be applied to an ashing-less process in which no ashing process is performed, or to a rework process due to poor application of the resist underlayer film forming composition It is. In addition, since the resist underlayer film forming composition does not contain a crosslinkable compound or a crosslinking catalyst, the amount of sublimated material in the baking process is small, so that the sublimated material adhering to the chamber falls onto the substrate and becomes a foreign substance, generating defects. Is less likely to cause problems. By utilizing such characteristics, it can be suitably used in a lithography process for manufacturing a semiconductor device.

Claims (4)

Formula (1) :

[However, Q is the formula (2), formula (3), formula (12) :

(Wherein, _{R 1} is each a hydrogen atom, or a halogen atom, Y represents an alkyl group having 1 to 40 carbon atoms, an aryl group having 5 to 40 carbon atoms, cyclic aliphatic group having 5-40 carbon atoms, a heterocyclic group , Ether group, ester group, silicon-containing organic group, tin-containing organic group, hydroxyl group, halogen group, nitro group, cyano group, amino group, sulfonyl group, sulfonic acid group, or a combination thereof, Cy having 5 carbon atoms A substituted or unsubstituted cycloaliphatic group consisting of ˜40. ) A divalent organic group selected from) or a combination thereof. m represents the number of repeating units of 3 to 10,000. A composition for forming a resist underlayer film for a lithography process for manufacturing a semiconductor device, comprising a resin having a sulfone bond. A method for producing a semiconductor device, comprising: applying a resist underlayer film forming composition for lithography according to claim 1 or 2 onto a semiconductor substrate, and baking the composition at 50 to 300 ° C. to form a resist underlayer film. The resist underlayer film-forming composition according to claim 1 or 2 is applied onto a semiconductor substrate and baked to form a resist underlayer film, and a photoresist is coated on the resist underlayer film. A method of manufacturing a semiconductor device in which an integrated circuit element is formed by exposing a substrate coated with a photoresist, developing the substrate, and transferring an image onto the substrate by dry etching. A step of applying a resist underlayer film forming composition for lithography according to claim 1 or 2 onto a semiconductor substrate and baking the composition to form a resist underlayer film, a step of forming a hard mask on the resist underlayer film, A step of forming a resist film on the hard mask, a step of forming a resist pattern by exposure and development, a step of etching the hard mask by the resist pattern, and a step of etching the resist underlayer film by the patterned hard mask, pattern A method for manufacturing a semiconductor device, comprising a step of processing a semiconductor substrate with a patterned resist underlayer film.