JP4805077B2 - Photosensitive composition for color filter, color filter, and method for producing the same - Google Patents

Description

  The present invention relates to a photosensitive composition for a color filter used for a liquid crystal display device (LCD), a solid-state imaging device (CCD, CMOS, etc.), a color filter, and a method for producing the same.

A color filter is an indispensable component for a liquid crystal display.
A liquid crystal display is more compact than a CRT as a display device and is equivalent or better in terms of performance, and is thus being replaced by a CRT as a television screen, a personal computer screen, or other display device. In recent years, the development trend of liquid crystal displays is moving from conventional monitor applications where the screen has a relatively small area to TV applications where a large screen and high image quality are required.

  Liquid crystal displays for TV use are required to have higher image quality than those for conventional monitor applications. On the other hand, in the color filter for a solid-state image sensor, further higher definition is desired.

Usually, a photosensitive composition for a color filter needs to be irradiated with high-energy radiation when it is cured. When a colored pattern of a color filter is formed using such a photosensitive composition having insufficient curing sensitivity, if the irradiation dose is insufficient, problems such as missing or missing patterns, a remaining film rate or a decrease in pixel intensity may be caused. To do.
Further, when a colorant is contained at a high concentration as in a color filter, further high sensitivity is desired since exposure does not easily reach the support interface.

As described above, for a photosensitive composition suitable for producing a color filter, it is necessary to improve the color reproducibility of the color filter and to reduce the exposure amount during exposure by increasing the substrate size. It is necessary to improve both the degree of exposure polymerization of the product and the alkali solubility.
In addition, as the substrate size increases, a highly sensitive photosensitive composition that maintains a pattern shape for a long time even in a developing solution in a developing process and does not cause chipping or peeling of the pattern is required.

In order to improve the degree of exposure polymerization, introduction of a chain transfer agent such as a polyfunctional thiol has been studied, and a photosensitive composition containing a polyfunctional thiol compound has been proposed (see Patent Document 1).
Moreover, the photosensitive composition containing a specific (meth) acrylate monomer is also proposed for alkali solubility improvement (refer patent document 2).
However, in both cases, the improvement in the degree of exposure polymerization and the improvement in alkali solubility cannot be achieved at present.
Japanese Patent No. 3120547 Japanese Patent Laid-Open No. 10-62986

The present invention has been made in consideration of the above-mentioned problems in the prior art, and an object thereof is to achieve the following object.
That is, the object of the present invention is a photosensitizer for a color filter which is cured with high sensitivity and has excellent removability of an uncured part and has good pattern forming property even when containing a colorant in a high concentration. It is to provide a composition.
Furthermore, another object of the present invention is to provide a color filter having a color pattern having a high color reproducibility and a good shape, using the photosensitive composition of the present invention, and the color filter with high productivity. It is to provide a manufacturing method that can be manufactured.
Another object of the present invention is to provide a liquid crystal display device having the color filter.

  As a result of intensive studies, the present inventor has found that the above problems can be solved by the photosensitive composition for color filters of the present invention. That is, the means for solving the above problems are as follows.

<1> (A) Colorant, (B) Alkali-soluble resin, (C) Photopolymerizable compound having hydrophilic group and ethylenically unsaturated bond, (D) Thiol compound, (E) Lophine dimer, (F) The photosensitive composition for color filters containing the sensitizing dye represented by the following general formula (D-8) , and (G) solvent.

In General Formula (D-8), A represents an aromatic ring or a hetero ring which may have a substituent, X represents an oxygen atom, and Y represents —N (R ³ ) —. R ¹ , R ² , and R ³ each independently represent a hydrogen atom or a monovalent nonmetallic atomic group, and A, R ¹ , R ² , and R ³ are each bonded to each other to form an aliphatic group Or you may form an aromatic ring.
<2> The photosensitive composition for a color filter according to <1>, wherein the photopolymerizable compound (C) has an ethylenically unsaturated bond number of 2 or more.
<3> The photosensitive composition for a color filter according to <1> or <2>, wherein the photopolymerizable compound (C) has 4 or more hydrophilic groups.

<4> The photosensitive composition for a color filter according to any one of <1> to <3>, wherein the hydrophilic group of the photopolymerizable compound (C) is an alkylene oxide group.
<5> The photosensitive composition for a color filter according to any one of <1> to <4>, wherein the thiol compound has a structure represented by the following general formula (I).

  In general formula (I), R represents an alkyl group or an aryl group, and A represents an atomic group that forms a heterocycle with N═C—N.

< 6 > A color filter having a colored pattern using the photosensitive composition for a color filter according to any one of <1> to < 5 > on a support.
< 7 > A step of applying a photosensitive composition for a color filter according to any one of <1> to < 5 > on a support to form a colored curable composition layer, and the colored curable composition A method for producing a color filter, comprising: exposing a physical layer through a mask; and developing the colored curable composition layer after exposure to form a colored pattern.
< 8 > A liquid crystal display device having the color filter according to < 6 >.

According to the present invention, even when the colorant is contained in a high concentration, the photosensitive composition for color filters that is cured with high sensitivity, has excellent removal of uncured parts, and has good pattern forming properties. Can be provided.
Furthermore, the present invention provides a color filter having a color pattern having a high color reproducibility and a good shape, using the photosensitive composition of the present invention, and a production method capable of producing the color filter with high productivity. be able to. In addition, a liquid crystal display element having the color filter can be provided.

  Hereinafter, the photosensitive composition for color filters of this invention, the color filter which uses this photosensitive composition for color filters, and its manufacturing method are demonstrated in detail.

-Photosensitive composition for color filter-
The photosensitive composition for color filters of the present invention comprises (A) a colorant, (B) an alkali-soluble resin, (C) a photopolymerizable compound having a hydrophilic group and an ethylenically unsaturated bond (hereinafter referred to as specific photopolymerizable). And (D) a thiol compound, (E) a lophine dimer, (F) a sensitizing dye represented by the above general formula (D-8) , and (G) a solvent. It is characterized by.
Hereinafter, each component contained in the photosensitive composition for color filters of the present invention (hereinafter sometimes simply referred to as “photosensitive composition”) will be described in order.

<(C) Specific photopolymerizable compound>
The specific photopolymerizable compound (C) that can be used in the present invention is an addition polymerizable compound having at least one ethylenically unsaturated double bond and a compound having a hydrophilic group in the molecule.

  Examples of ethylenically unsaturated double bonds include vinyl groups, unsaturated carboxylic acids (for example, (meth) acrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.) and esters and amides of unsaturated phosphonic acids. , Styrene, vinyl ether and the like, among which (meth) acrylic acid is preferable.

  The specific polymerizable compound of the present invention has at least one ethylenically unsaturated bond, preferably 2 to 18, more preferably 4 to 12.

  Examples of the hydrophilic group include a hydroxyl group and an alkylene oxide group, and an alkylene oxide group is most preferable. By using an alkylene oxide group, the effect of improving alkali solubility is most prominent.

  The specific photopolymerizable compound of the present invention has at least one, preferably 4 to 54, more preferably 8 to 42, the above hydrophilic group.

That is, the specific photopolymerizable compound has a hydrophilic group capable of improving alkali solubility in addition to the ethylenically unsaturated double bond group.
Since the specific photopolymerizable compound of the present invention is multifunctional as described above, the specific photopolymerizable compound is used in combination with a specific photopolymerization initiator described later, so that it is cured with high sensitivity in the exposed area. A degree of polymerization is obtained, and in an unexposed area, the removability with an alkaline aqueous solution is excellent.

  The (C) specific photopolymerizable compound of the present invention has a chemical form such as a monomer, a prepolymer, that is, a dimer, a trimer and an oligomer, or a mixture thereof and a copolymer thereof. Examples of monomers and copolymers thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), and esters and amides thereof. In this case, an ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound, or an amide of an unsaturated carboxylic acid and an aliphatic polyvalent amine compound is used.

  Specific examples of the monomer of an ester of an aliphatic polyhydric alcohol compound and an unsaturated carboxylic acid include acrylic acid esters such as ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, and tetramethylene glycol. Diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate , Tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate , Pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer, isocyanuric acid There are EO-modified triacrylate and the like.

  Methacrylic acid esters include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, 1,3-butanediol dimethacrylate, Hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3-methacryloxy- 2-hydroxypro ) Phenyl] dimethyl methane, bis - [p- (methacryloxyethoxy) phenyl] dimethyl methane.

  Examples of other esters include aliphatic alcohol esters described in JP-B-51-47334 and JP-A-57-196231, JP-A-59-5240, JP-A-59-5241, and JP-A-2-226149. Those having the aromatic skeleton described above and those having an amino group described in JP-A-1-165613 are also preferably used. Furthermore, the ester monomers described above can also be used as a mixture.

  Also, urethane acrylates such as those described in JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765, JP-B-58-49860, JP-B-56-17654, Urethane compounds having an ethylene oxide skeleton described in JP-B-62-39417 and JP-B-62-39418 are also suitable.

  Other examples include polyester acrylates, epoxy resins and (meth) acrylic acid as described in JP-A-48-64183, JP-B-49-43191, JP-B-52-30490, and JP-A-52-30490. Mention may be made of polyfunctional acrylates and methacrylates such as reacted epoxy acrylates. Further, specific unsaturated compounds described in JP-B-46-43946, JP-B-1-40337 and JP-B-1-40336, vinylphosphonic acid compounds described in JP-A-2-25493, and the like can also be mentioned. . In some cases, a structure containing a perfluoroalkyl group described in JP-A-61-22048 is preferably used. Furthermore, Journal of Japan Adhesion Association vol. 20, no. 7, pages 300 to 308 (1984), which are introduced as photocurable monomers and oligomers, can also be used.

  Examples of the polymer having an ether group constituting a hydrophilic group in the specific photopolymerizable compound include polyalkylene oxide, polyoxyalkylene glycol, polyvinyl ether, silicon resin, and cellulose ethers (methyl cellulose, ethyl cellulose, etc.). Polyalkylene oxide is more preferable.

  Examples of ether acrylates include di (meth) acrylates of alkylene oxide modified products of bisphenols such as bisphenol A, bisphenol F, and bisphenol S; hydrogenated bisphenols such as hydrogenated bisphenol A, hydrogenated bisphenol F, and hydrogenated bisphenol S. A di (meth) acrylate of a triol obtained by adding 1 mol or more of a cyclic ether compound such as ethylene oxide, propylene oxide, butylene oxide to 1 mol of trimethylolpropane or glycerin. (Meth) acrylate; trio obtained by adding 1 mol or more of a cyclic ether compound such as ethylene oxide, propylene oxide, butylene oxide to 1 mol of pentaerythritol or ditrimethylolpropane Mono-, di-, tri-, or tetra (meth) acrylates of hexa; 3 to 6 functional (meth) of hexaol in which 1 mol or more of cyclic ether compound such as ethylene oxide, propylene oxide, butylene oxide is added to 1 mol of dipentaerythritol Examples include polyfunctional (poly) ether (meth) acrylates such as acrylate.

  Among the monomers having one or more ethylenically unsaturated double bonds in the molecule, the monomer having one photopolymerizable unsaturated bond in the molecule is not particularly limited. For example, methyl methacrylate, butyl methacrylate, 2 -Alkyl methacrylate such as ethylhexyl methacrylate, alkyl acrylate such as methyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, aralkyl methacrylate such as benzyl methacrylate, aralkyl acrylate such as benzyl acrylate, alkoxyalkyl methacrylate such as butoxyethyl methacrylate, butoxyethyl acrylate, etc. Alkoxyalkyl acrylate, aminoalkyl methacrylate such as N, N-dimethylaminoethyl methacrylate, N, N-dimethyla (Polyalkylene glycol alkyl ether) such as aminoalkyl acrylate such as noethyl acrylate, methacrylate ester of (diethylene glycol ethyl ether), methacrylate ester of (triethylene glycol butyl ether), methacrylate ester of (dipropylene glycol methyl ether) (Polyalkylene glycol alkyl ether) acrylic acid esters such as (diethylene glycol ethyl ether) acrylic acid ester, (triethylene glycol butyl ether) acrylic acid ester, (dipropylene glycol methyl ether) acrylic acid ester , (Hexaethylene glycol phenyl ether) methacrylate ester etc. (Polyether glycol aryl ether) acrylic acid ester such as (hexaethylene glycol phenyl ether) acrylic acid ester, dicyclopentanyl methacrylate, dicyclopentanyl acrylate, isobornyl methacrylate, methoxy Cyclodecatriene methacrylate, isobornyl acrylate, methoxylated cyclodecatriene acrylate, glycerol methacrylate, glycerol acrylate, fluorinated alkyl methacrylates such as heptadecafluorodecyl methacrylate, fluorinated alkyl acrylates such as heptadecafluorodecyl acrylate, 2- Examples thereof include hydroxyethyl methacrylate and 2-hydroxyethyl acrylate.

  Of the monomers having one or more ethylenically unsaturated double bonds in the molecule, the monomer having two or more ethylenically unsaturated double bonds in the molecule is not particularly limited. For example, bisphenol A dimethacrylate 1,4-butanediol dimethacrylate, 1,3-butylene glycol dimethacrylate, diethylene glycol dimethacrylate, glycerol dimethacrylate, neopentyl glycol dimethacrylate, polyethylene glycol dimethacrylate, polypropylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, triethylene glycol Methylolpropane trimethacrylate, pentaerythritol trimethacrylate, tris (methacryloxyethyl) isocyanurate, pentaerythritol tetrameth Chryrate, dipentaerythritol tetramethacrylate, dipentaerythritol hexamethacrylate, dipentaerythritol pentamethacrylate, bisphenol A diacrylate, 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, diethylene glycol diacrylate, glycerol diacrylate , Neopentyl glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, tetraethylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, tris (acryloxyethyl) isocyanurate, pentaerythritol tetraacrylate, dipenta Erythritol La acrylate, dipentaerythritol hexaacrylate, and dipentaerythritol pentaacrylate, and the like.

  Examples of the monomer having two or more ethylenically unsaturated double bonds in the molecule include diacrylates of alkylene oxide adducts of bisphenol A represented by the following general formula (A), represented by the general formula (B): Bisphenol A modified with epichlorohydrin and addition ester of acrylic acid, bisphenol A dimethacrylate, 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, diethylene glycol dimethacrylate, glycerol dimethacrylate, neopentyl glycol Diacrylate, diacrylate of alkylene oxide adduct of phosphoric acid represented by general formula (C), epichlorine modified product of phthalic acid represented by general formula (D) and addition esterified product of acrylic acid, polyethylene glycol The di Chryrate, polypropylene glycol dimethacrylate, tetraethylene glycol diacrylate, 1,6-hexanediol epichlorine modified product of general formula (E) and addition esterified product of acrylic acid (having two aquilyl groups in one molecule) ), Trimethylolpropane triacrylate, pentaerythritol triacrylate, triacrylate of an alkyne oxide adduct of phosphoric acid represented by the general formula (F), an alkylene oxide adduct of trimethylolpropane represented by the general formula (G) Triacrylate, tris (tacryloxyethyl) isocyanurate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol Such as Le penta acrylate. These monomers can be used alone or in combination of two or more.

  In general formula (A), R represents an ethylene group or a propylene group, and m and n each independently represent an integer of 1 to 20.

  In the general formula (B), m and n each independently represents an integer of 1 to 10.

  In general formula (C), R represents an ethylene group or a propylene group, and m and n each independently represents an integer of 1 to 20.

  In the general formula (D), m and n each independently represents an integer of 1 to 10.

  In general formula (E), m and n each independently represent an integer of 1 to 20.

  In General Formula (F), R represents an ethylene group or a propylene group, and three m's each independently represent an integer of 1 to 20.

  In General Formula (G), R represents an ethylene group or a propylene group, and m, m ′, and m ″ each independently represent an integer of 1-20.

About these addition polymerizable compounds, the details of usage methods such as the structure, single use or combination, addition amount and the like can be arbitrarily set according to the final performance design of the photosensitive composition. For example, it is selected from the following viewpoints.
From the viewpoint of sensitivity, a structure having a large unsaturated group content per molecule is preferable, and in many cases, a bifunctional or higher functionality is preferable. Further, in order to increase the strength of the cured film, those having three or more functionalities are preferable, and further, different functional numbers and different polymerizable groups (for example, acrylic acid ester, methacrylic acid ester, styrene compound, vinyl ether compound). A method of adjusting both sensitivity and intensity by using a combination of these materials is also effective.
From the viewpoint of alkali solubility, a structure having a large hydrophilic group content per molecule is preferable, and tetrafunctional or higher is preferable. A polymerizable compound containing an alkylene oxide group as the hydrophilic group is most preferable.
In addition, the compatibility of the addition polymerization compound with other components (for example, photopolymerization initiator, colorant (pigment, dye), binder polymer, etc.) contained in the photosensitive composition is also improved. The selection / use method is an important factor. For example, the compatibility may be improved by using a low-purity compound or using two or more kinds in combination. In addition, a specific structure may be selected for the purpose of improving adhesion with a substrate or the like.

  The content of the specific photopolymerizable compound is preferably 10 to 50% by mass, more preferably 10 to 40% by mass, and more preferably 15 to 30% by mass in the total solid content of the photosensitive composition. More preferably.

  Moreover, in this invention, in addition to (C) specific photopolymerizable compound, unless the effect of this invention is impaired, a general radical polymerizable compound can be used together. As a general radical polymerizable compound, it may be used alone or in combination of two or more. As a general radical polymerizable compound, a compound widely known as a compound having an ethylenically unsaturated double bond in the industrial field can be used without particular limitation.

<(A) Colorant>
The photosensitive composition of the present invention contains a colorant.
There is no restriction | limiting in particular in the coloring agent contained in the photosensitive composition of this invention, A conventionally well-known various dye and pigment can be used 1 type or in mixture of 2 or more types. The colorant is preferably a pigment from the viewpoint of light resistance.

  As the pigment that can be used in the photosensitive composition of the present invention, conventionally known various inorganic pigments or organic pigments can be used. Further, considering that it is preferable to have a high transmittance, whether it is an inorganic pigment or an organic pigment, it is preferable to use a fine one as much as possible, and considering the handling properties, the average particle diameter of the pigment is 0.01 μm to 0.1 μm is preferable, and 0.01 μm to 0.05 μm is more preferable. Examples of the inorganic pigment include metal compounds represented by metal oxides, metal complex salts, and the like. Specifically, iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, zinc And metal oxides such as antimony, and composite oxides of the above metals.

As an organic pigment, for example,
CI Pigment Yellow 11, 24, 31, 53, 83, 93, 99, 108, 109, 110, 138, 139, 147, 150, 151, 154, 155, 167, 180, 185, 199,;
CI Pigment Orange 36, 38, 43, 71;
CI Pigment Red 81, 105, 122, 149, 150, 155, 171, 175, 176, 177,209, 220, 224, 242, 254, 255, 264, 270;
CI pigment violet 19, 23, 32, 39;
CI Pigment Blue 1, 2, 15, 15: 1, 15: 3, 15: 6, 16, 22, 60, 66;
CI Pigment Green 7, 36, 37;
CI Pigment Brown 25, 28;
CI pigment black 1, 7;
Examples thereof include carbon black.

  In the present invention, those having a basic N atom in the structural formula of the pigment can be preferably used. These pigments having a basic N atom exhibit good dispersibility in the composition of the present invention. Although the cause is not fully elucidated, it is presumed that the good affinity between the photosensitive polymerization component and the pigment has an influence.

  Examples of the pigment that can be preferably used in the present invention include the following. However, the present invention is not limited to these.

CI Pigment Yellow 11, 24, 108, 109, 110, 138, 139, 150, 151, 154, 167, 180, 185,
CI Pigment Orange 36, 71,
CI Pigment Red 122, 150, 171, 175, 177, 209, 224, 242, 254, 255, 264,
CI Pigment Violet 19, 23, 32,
CI Pigment Blue 15: 1, 15: 3, 15: 6, 16, 22, 60, 66,
CI Pigment Black 1

  These organic pigments can be used alone or in various combinations in order to increase color purity. Specific examples of the above combinations are shown below. For example, as a red pigment, an anthraquinone pigment, a perylene pigment, a diketopyrrolopyrrole pigment alone or at least one of them, a disazo yellow pigment, an isoindoline yellow pigment, a quinophthalone yellow pigment or a perylene red pigment , Etc. can be used. For example, as an anthraquinone pigment, C.I. I. Pigment red 177, and perylene pigments include C.I. I. Pigment red 155, C.I. I. Pigment Red 224, and diketopyrrolopyrrole pigments include C.I. I. Pigment red 254, and C.I. I. Mixing with Pigment Yellow 139 is preferred. The mass ratio of the red pigment to the yellow pigment is preferably 100: 5 to 100: 50. By setting it as the above range, the light transmittance from 400 nm to 500 nm can be suppressed, and the color purity can be increased. In addition, color reproducibility is improved. In particular, the mass ratio is optimally in the range of 100: 10 to 100: 30. In the case of a combination of red pigments, it can be adjusted in accordance with the chromaticity.

  As the green pigment, a halogenated phthalocyanine pigment can be used alone, or a mixture thereof with a disazo yellow pigment, a quinophthalone yellow pigment, an azomethine yellow pigment or an isoindoline yellow pigment can be used. For example, C.I. I. Pigment Green 7, 36, 37 and C.I. I. Pigment yellow 83, C.I. I. Pigment yellow 138, C.I. I. Pigment yellow 139, C.I. I. Pigment yellow 150, C.I. I. Pigment yellow 180 or C.I. I. Mixing with Pigment Yellow 185 is preferred. The mass ratio of the green pigment to the yellow pigment is preferably 100: 5 to 100: 150. When the mass ratio is less than 100: 5, it is difficult to suppress the light transmittance of 400 nm to 450 nm, and the color purity may not be improved. When the ratio exceeds 100: 150, the dominant wavelength becomes longer and the deviation from the NTSC target hue may increase. The mass ratio is particularly preferably in the range of 100: 30 to 100: 120.

  As the blue pigment, a phthalocyanine pigment can be used alone, or a mixture thereof with a dioxazine purple pigment can be used. For example, C.I. I. Pigment blue 15: 6 and C.I. I. Mixing with pigment violet 23 is preferred. The mass ratio of the blue pigment to the violet pigment is preferably 100: 0 to 100: 30, more preferably 100: 10 or less.

  Further, as the pigment for the black matrix, carbon, titanium black, iron oxide, titanium oxide alone or a mixture thereof is used.

In the present invention, when the colorant is a dye, it can be uniformly dissolved in the composition to obtain a photosensitive composition.
The dye that can be used as the colorant contained in the photosensitive composition of the present invention is not particularly limited, and conventionally known dyes for color filters can be used. For example, Japanese Patent Application Laid-Open No. 64-90403, Japanese Patent Application Laid-Open No. 64-91102, Japanese Patent Application Laid-Open No. 1-94301, Japanese Patent Application Laid-Open No. 6-11614, No. 2592207, US Pat. No. 4,808,501. Specification, US Pat. No. 5,667,920, US Pat. No. 5,059,500, JP-A-5-333207, JP-A-6-35183, JP-A-6-51115 JP-A-6-194828, JP-A-8-21599, JP-A-4-249549, JP-A-10-123316, JP-A-11-302283, JP-A-7-286107, JP 2001-4823, JP-A-8-15522, JP-A-8-29771, JP-A-8-146215, JP-A-11-3434. 7, JP-A-8-62416, JP-A-2002-14220, JP-A-2002-14221, JP-A-2002-14222, JP-A-2002-14223, JP-A-8-302224 The dyes disclosed in JP-A-8-73758, JP-A-8-179120, JP-A-8-151531, and the like can be used.

  The chemical structure includes pyrazole azo, anilino azo, triphenyl methane, anthraquinone, anthrapyridone, benzylidene, oxonol, pyrazolotriazole azo, pyridone azo, cyanine, phenothiazine, pyrrolopyrazole azomethine, Xanthene-based, phthalocyanine-based, benzopyran-based and indigo-based dyes can be used.

In the case of a resist system that performs water or alkali development, an acidic dye and / or a derivative thereof may be suitably used from the viewpoint of completely removing the binder and / or dye in the light non-irradiated part by development.
In addition, a direct dye, a basic dye, a mordant dye, an acid mordant dye, an azoic dye, a disperse dye, an oil-soluble dye, a food dye, and / or a derivative thereof can be usefully used.

The acidic dye is not particularly limited as long as it has an acidic group such as sulfonic acid or carboxylic acid, but is soluble in an organic solvent or a developer, salt-forming with a basic compound, absorbance, and other components in the composition. It is selected in consideration of all required performance such as interaction with components, light resistance, heat resistance and the like.
Specific examples of the acid dye are shown below, but are not limited thereto. For example,
acid alizarin violet N; acid black 1, 2, 24, 48; acid blue 1, 7, 9, 15, 18, 23, 25, 27, 29, 40, 45, 62, 70, 74, 80, 83, 86 , 87, 90, 92, 103, 112, 113, 120, 129, 138, 147, 158, 171, 182, 192, 243, 324: 1; acid chroma violet K; acid Fuchsin; acid green 1, 3, 5 , 9, 16, 25, 27, 50; acid orange 6, 7, 8, 10, 12, 50, 51, 52, 56, 63, 74, 95; acid red 1, 4, 8, 14, 17, 18 , 26, 27, 29, 31, 34, 35, 37, 42, 44, 50, 51, 52, 57, 66, 73, 0, 87, 88, 91, 92, 94, 97, 103, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 158, 176, 183, 198, 211, 215, 216 217,249,252,257,260,266,274; acid violet 6B, 7,9,17,19; acid yellow 1,3,7,9,11,17,23,25,29,34,36, 42, 54, 72, 73, 76, 79, 98, 99, 111, 112, 114, 116, 184, 243; Food Yellow 3; and derivatives of these dyes.

Among these, acid black 24; acid blue 23, 25, 29, 62, 80, 86, 87, 92, 138, 158, 182, 243, 324: 1; acid orange 8, 51, 56, 63 , 74; acid red 1,4,8,34,37,42,52,57,80,97,114,143,145,151,183,217; acid violet 7; acid yellow 17, 25, 29, 34 42, 72, 76, 99, 111, 112, 114, 116, 184, 243; acidgreen 25 and derivatives of these dyes are preferred.
Other than the above, azo, xanthene and phthalocyanine acid dyes are also preferred. I. Solvent Blue 44, 38; C.I. I. Acid dyes such as Solvent orange 45; Rhodamine B, Rhodamine 110, and derivatives of these dyes are also preferably used.

  Among them, as the colorant (A), triallylmethane, anthraquinone, azomethine, benzylidene, oxonol, cyanine, phenothiazine, pyrrolopyrazole azomethine, xanthene, phthalocyanine, benzopyran, indigo A colorant selected from pyrazole azo, anilino azo, pyrazolotriazole azo, pyridone azo, and anthrapyridone is preferable.

The colorant that can be used in the present invention is a dye or a pigment having an average particle diameter r (unit: nm) of 20 ≦ r ≦ 300, preferably 25 ≦ r ≦ 250, particularly preferably 30 ≦ r ≦ 200. desirable. By using a pigment having such an average particle diameter r, a colored pixel having a high contrast ratio and a high light transmittance can be obtained. The “average particle diameter” as used herein means the average particle diameter of secondary particles in which primary particles (single microcrystals) of the pigment are aggregated.
In addition, the particle size distribution of the secondary particles of the pigment that can be used in the present invention (hereinafter, simply referred to as “particle size distribution”) is 70% by mass of the secondary particles falling within (average particle size ± 100) nm. As mentioned above, it is desirable that it is 80 mass% or more.

  The pigment having the above average particle size and particle size distribution is preferably a commercially available pigment mixed with other pigments optionally used (average particle size is usually above 300 nm), preferably with a dispersant and a solvent. The pigment mixture can be prepared by mixing and dispersing while pulverizing using a pulverizer such as a bead mill or a roll mill. The pigment thus obtained is usually in the form of a pigment dispersion.

As content of (A) coloring agent contained in the photosensitive composition of this invention, it is preferable that it is 25-95 mass% in the total solid of a photosensitive composition, and 25-80 mass% is more. Preferably, 30 to 70% by mass is more preferable.
If the amount of the colorant is too small, there is a tendency that an appropriate chromaticity cannot be obtained when a color filter is produced from the photosensitive composition of the present invention. On the other hand, if the amount is too large, the photocuring does not proceed sufficiently and the strength as a film is lowered, and the development latitude during alkali development tends to be narrow.

<(B) Alkali-soluble resin>
The photosensitive composition in the present invention contains at least one alkali-soluble resin (hereinafter also referred to as “binder according to the present invention”). The binder according to the present invention is not particularly limited as long as it is alkali-soluble, but is preferably selected from the viewpoints of heat resistance, developability, availability, and the like.

The alkali-soluble binder is preferably a linear organic polymer that is soluble in an organic solvent and can be developed with a weak alkaline aqueous solution.
As such a “linear organic polymer”, a known one can be arbitrarily used. Preferably, a linear organic polymer that is soluble or swellable in water or weak alkaline water is selected to enable water development or weak alkaline water development. The linear organic polymer is selected and used not only as a film forming agent but also according to the use as water, weak alkaline water or an organic solvent developer.
For example, when a water-soluble organic polymer is used, water development becomes possible. Examples of such linear organic polymers include radical polymers having a carboxylic acid group in the side chain, such as JP-A-59-44615, JP-B-54-34327, JP-B-58-12777, and JP-B-54-25957. , JP-A-54-92723, JP-A-59-53836, JP-A-59-71048, that is, a resin obtained by homopolymerizing or copolymerizing a monomer having a carboxyl group, acid anhydride Resins in which acid anhydride units are hydrolyzed, half-esterified or half-amidated, or epoxy acrylate modified with unsaturated monocarboxylic acid and acid anhydride, etc. It is done. Examples of the monomer having a carboxyl group include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, 4-carboxylstyrene, and the monomer having an acid anhydride includes maleic anhydride. It is done.
Similarly, there is an acidic cellulose derivative having a carboxylic acid group in the side chain. In addition, those obtained by adding a cyclic acid anhydride to a polymer having a hydroxyl group are useful.

  When an alkali-soluble resin is used as a copolymer, a monomer other than the above-mentioned monomers can also be used as the compound to be copolymerized. Examples of other monomers include the following compounds (1) to (12).

(1) 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 3-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl methacrylate, 4-hydroxybutyl methacrylate Acrylic acid esters and methacrylic acid esters having an aliphatic hydroxyl group such as
(2) Methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, isobutyl acrylate, amyl acrylate, hexyl acrylate, 2-ethylhexyl acrylate, octyl acrylate, benzyl acrylate, acrylic acid-2- Alkyl acrylates such as chloroethyl, glycidyl acrylate, 3,4-epoxycyclohexylmethyl acrylate, vinyl acrylate, 2-phenylvinyl acrylate, 1-propenyl acrylate, allyl acrylate, 2-allyloxyethyl acrylate, propargyl acrylate;

(3) Methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, isobutyl methacrylate, amyl methacrylate, hexyl methacrylate, 2-ethylhexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, methacrylic acid-2- Alkyl methacrylates such as chloroethyl, glycidyl methacrylate, 3,4-epoxycyclohexylmethyl methacrylate, vinyl methacrylate, 2-phenylvinyl methacrylate, 1-propenyl methacrylate, allyl methacrylate, 2-allyloxyethyl methacrylate, and propargyl methacrylate.
(4) Acrylamide, methacrylamide, N-methylolacrylamide, N-ethylacrylamide, N-hexylmethacrylamide, N-cyclohexylacrylamide, N-hydroxyethylacrylamide, N-phenylacrylamide, N-nitrophenylacrylamide, N-ethyl- Acrylamide or methacrylamide such as N-phenylacrylamide, vinylacrylamide, vinylmethacrylamide, N, N-diallylacrylamide, N, N-diallylmethacrylamide, allylacrylamide, allylmethacrylamide.

(5) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, and phenyl vinyl ether.
(6) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate and vinyl benzoate.
(7) Styrenes such as styrene, α-methylstyrene, methylstyrene, chloromethylstyrene, and p-acetoxystyrene.
(8) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone.
(9) Olefins such as ethylene, propylene, isobutylene, butadiene, and isoprene.

(10) N-vinylpyrrolidone, acrylonitrile, methacrylonitrile and the like.
(11) Unsaturated imides such as maleimide, N-acryloylacrylamide, N-acetylmethacrylamide, N-propionylmethacrylamide, N- (p-chlorobenzoyl) methacrylamide.
(12) A methacrylic acid monomer having a hetero atom bonded to the α-position. For example, compounds described in Japanese Patent Application No. 2001-115595, Japanese Patent Application No. 2001-115598, and the like can be mentioned.

  Among these, a (meth) acrylic resin having an allyl group, a vinyl ester group, and a carboxyl group in the side chain and a side chain described in JP-A Nos. 2000-187322 and 2002-62698 are doubled. An alkali-soluble resin having a bond and an alkali-soluble resin having an amide group in the side chain described in JP-A No. 2001-242612 are preferable because of excellent balance of film strength, sensitivity, and developability.

In addition, Japanese Patent Publication No. 7-2004, Japanese Patent Publication No. 7-120041, Japanese Patent Publication No. 7-120042, Japanese Patent Publication No. 8-12424, Japanese Patent Laid-Open No. 63-287944, Japanese Patent Laid-Open No. 63-287947, Japanese Patent Laid-Open No. Urethane binder polymers containing acid groups described in No. 271741 and Japanese Patent Application No. 10-116232, and urethane binder polymers having acid groups and double bonds in side chains as described in JP-A No. 2002-107918 Is excellent in strength, and is advantageous in terms of printing durability and suitability for low exposure.
In addition, the acetal-modified polyvinyl alcohol-based binder polymer having an acid group described in European Patent 993966, European Patent 1204000, Japanese Patent Application Laid-Open No. 2001-318463, and the like is preferable because of its excellent balance of film strength and developability.
In addition, polyvinyl pyrrolidone, polyethylene oxide, and the like are useful as the water-soluble linear organic polymer. In order to increase the strength of the cured film, alcohol-soluble nylon, polyether of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin, and the like are also useful.

The alkali-soluble resin that can be used in the present invention can be synthesized by a conventionally known method. Solvents used in the synthesis include, for example, tetrahydrofuran, ethylene dichloride, cyclohexanone, methyl ethyl ketone, acetone, methanol, ethanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, 2-methoxyethyl acetate, diethylene glycol dimethyl ether, 1-methoxy. Examples include 2-propanol, 1-methoxy-2-propyl acetate, N, N-dimethylformamide, N, N-dimethylacetamide, toluene, ethyl acetate, methyl lactate, ethyl lactate, dimethyl sulfoxide, and water. These solvents are used alone or in combination of two or more.
Examples of the radical polymerization initiator used when synthesizing the alkali-soluble resin that can be used in the present invention include known compounds such as an azo initiator and a peroxide initiator.

  Of the various alkali-soluble resins, an acrylic resin is preferable, and the acrylic resin is selected from benzyl (meth) acrylate, (meth) acrylic acid, hydroxyethyl (meth) acrylate, (meth) acrylamide, and the like. A copolymer composed of a monomer, KS resist-106 (manufactured by Osaka Organic Chemical Industry Co., Ltd.), cyclomer P series (manufactured by Daicel Chemical Industries, Ltd.) and the like are preferable.

The alkali-soluble resin is preferably a polymer having a weight average molecular weight (polystyrene conversion value measured by GPC method) of 1000 to 2 × 10 ⁵ , more preferably 2000 to 1 × 10 ⁵ , and more preferably 5000 to 5 ×. 10 ⁴ polymers are particularly preferred.
In addition, these alkali-soluble resins may be random polymers, block polymers, graft polymers, or the like.

  As content in the photosensitive composition of the said alkali-soluble resin, 1-30 mass% is preferable with respect to the total solid of this composition, 2-25 mass% is more preferable, 5-20 mass% is Particularly preferred.

<(E) Photopolymerization initiator>
The photopolymerization initiator of the present invention is a compound that is decomposed by light and initiates and accelerates the polymerization of the aforementioned polymerizable compound, and preferably has an absorption in a wavelength region of 300 to 500 nm. Moreover, a photoinitiator can be used individually or in combination of 2 or more types.

  Examples of the photopolymerization initiator include organic halogenated compounds, oxydiazole compounds, carbonyl compounds, ketal compounds, benzoin compounds, acridine compounds, organic peroxide compounds, azo compounds, coumarin compounds, azide compounds, metallocene compounds, biimidazoles. System compounds (lophine dimer compounds), organic boric acid compounds, disulfonic acid compounds, oxime ester compounds, onium salt compounds, and acylphosphine (oxide) compounds.

  Specific examples of the organic halogenated compound include Wakabayashi et al., “Bull Chem. Soc Japan” 42, 2924 (1969), US Pat. No. 3,905,815, Japanese Patent Publication No. 46-4605, JP 48-36281, JP 55-3070, JP 60-239736, JP 61-169835, JP 61-169837, JP 62-58241, JP 62 -212401, JP-A-63-70243, JP-A-63-298339, M.S. P. Hutt “Journal of Heterocyclic Chemistry” 1 (No 3), (1970) ”, and the oxazole compound and s-triazine compound substituted with a trihalomethyl group.

  As the s-triazine compound, more preferably, an s-triazine derivative in which at least one mono-, di-, or trihalogen-substituted methyl group is bonded to the s-triazine ring, specifically, for example, 2,4,6- Tris (monochloromethyl) -s-triazine, 2,4,6-tris (dichloromethyl) -s-triazine, 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6- Bis (trichloromethyl) -s-triazine, 2-n-propyl-4,6-bis (trichloromethyl) -s-triazine, 2- (α, α, β-trichloroethyl) -4,6-bis (trichloro Methyl) -s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloro) Methyl) -s-triazine, 2- (3,4-epoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-chlorophenyl) -4,6-bis (trichloromethyl)- s-triazine, 2- [1- (p-methoxyphenyl) -2,4-butadienyl] -4,6-bis (trichloromethyl) -s-triazine, 2-styryl-4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (pi-propyloxystyryl) -4,6-bis (trichloromethyl)- s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-natoxynaphthyl) -4,6-bis (trichloromethyl) s-triazine, 2-phenylthio-4,6-bis (trichloromethyl) -s-triazine, 2-benzylthio-4,6-bis (trichloromethyl) -s-triazine, 2,4,6-tris (dibromomethyl) ) -S-triazine, 2,4,6-tris (tribromomethyl) -s-triazine, 2-methyl-4,6-bis (tribromomethyl) -s-triazine, 2-methoxy-4,6- Bis (tribromomethyl) -s-triazine and the like can be mentioned.

  Examples of the oxydiazole compound include 2-trichloromethyl-5-styryl-1,3,4-oxodiazole, 2-trichloromethyl-5- (cyanostyryl) -1,3,4-oxodiazole, 2- Examples include trichloromethyl-5- (naphth-1-yl) -1,3,4-oxodiazole, 2-trichloromethyl-5- (4-styryl) styryl-1,3,4-oxodiazole, and the like. .

  Examples of the carbonyl compound include benzophenone, Michler ketone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 2-chlorobenzophenone, 4-bromobenzophenone, 2-carboxybenzophenone and other benzophenone derivatives, 2,2-dimethoxy-2 -Phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, α-hydroxy-2-methylphenylpropanone, 1-hydroxy-1-methylethyl- (p-isopropylphenyl) ketone, 1-hydroxy -1- (p-dodecylphenyl) ketone, 2-methyl- (4 ′-(methylthio) phenyl) -2-morpholino-1-propanone, 1,1,1-trichloromethyl- (p-butylphenyl) , Acetophenone derivatives such as 2-benzyl-2-dimethylamino-4-morpholinobutyrophenone, thioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone Thioxanthone derivatives such as 2,4-diisopropylthioxanthone, and benzoic acid ester derivatives such as ethyl p-dimethylaminobenzoate and ethyl p-diethylaminobenzoate.

  Examples of the ketal compound include benzyl methyl ketal and benzyl-β-methoxyethyl ethyl acetal.

  Examples of the benzoin compound include mbenzoin isopropyl ether, benzoin isobutyl ether, benzoin methyl ether, methyl o-benzoylbenzoate, and the like.

  Examples of the acridine compound include 9-phenylacridine, 1,7-bis (9-acridinyl) heptane, and the like.

  Examples of the organic peroxide compound include trimethylcyclohexanone peroxide, acetylacetone peroxide, 1,1-bis (tert-butylperoxy) -3,3,5-trimethylcyclohexane, 1,1-bis (tert-butylperoxide). Oxy) cyclohexane, 2,2-bis (tert-butylperoxy) butane, tert-butyl hydroperoxide, cumene hydroperoxide, diisopropylbenzene hydroperoxide, 2,5-dimethylhexane-2,5-dihydroper Oxide, 1,1,3,3-tetramethylbutyl hydroperoxide, tert-butylcumyl peroxide, dicumyl peroxide, 2,5-dimethyl-2,5-di (tert-butylperoxy) hexane, 2 , -Oxanoyl peroxide, succinic peroxide, benzoyl peroxide, 2,4-dichlorobenzoyl peroxide, diisopropyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, di-2-ethoxyethyl peroxydicarbonate , Dimethoxyisopropyl peroxycarbonate, di (3-methyl-3-methoxybutyl) peroxydicarbonate, tert-butyl peroxyacetate, tert-butyl peroxypivalate, tert-butyl peroxyneodecanoate, tert- Butyl peroxyoctanoate, tert-butyl peroxylaurate, tersyl carbonate, 3,3 ′, 4,4′-tetra- (t-butylperoxycarbonyl) benzophenone, 3,3 ′, 4 '-Tetra- (t-hexylperoxycarbonyl) benzophenone, 3,3', 4,4'-tetra- (p-isopropylcumylperoxycarbonyl) benzophenone, carbonyldi (t-butylperoxydihydrogen diphthalate) , Carbonyldi (t-hexylperoxydihydrogen diphthalate) and the like.

  Examples of the azo compound include azo compounds described in JP-A-8-108621.

  Examples of the coumarin compound include 3-methyl-5-amino-((s-triazin-2-yl) amino) -3-phenylcoumarin, 3-chloro-5-diethylamino-((s-triazin-2-yl). ) Amino) -3-phenylcoumarin, 3-butyl-5-dimethylamino-((s-triazin-2-yl) amino) -3-phenylcoumarin, and the like.

  Examples of the azide compound include organic azide compounds described in U.S. Pat. No. 2,848,328, U.S. Pat. No. 2,852,379 and U.S. Pat. No. 2,940,553, 2,6-bis (4-azidobenzylidene) -4-ethyl. And cyclohexanone (BAC-E).

  Examples of the metallocene compound include JP-A-59-152396, JP-A-61-151197, JP-A-63-41484, JP-A-2-249, JP-A-2-4705, Various titanocene compounds described in JP-A-5-83588, such as di-cyclopentadienyl-Ti-bis-phenyl, di-cyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl, di -Cyclopentadienyl-Ti-bis-2,4-di-fluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,4,6-trifluorophen-1-yl, di- Cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,3,4,5,6-pentaful Lophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,6-difluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,4,6-trifluoropheny -1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,4 , 5,6-pentafluorophen-1-yl, iron-arene complexes described in JP-A-1-304453 and JP-A-1-152109, and the like.

As the biimidazole compound, for example, a hexaarylbiimidazole compound is preferable.
Examples of the hexaarylbiimidazole compound include JP-B-6-29285, U.S. Pat. Nos. 3,479,185, 4,311,783, 4,622,286, and JP-B-45- No. 37377 and JP-B-44-86516, specifically, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2 '-Bis (o-bromophenyl)) 4,4', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o, p-dichlorophenyl) -4,4 ', 5,5'-tetra Phenylbiimidazole, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetra (m-methoxyphenyl) biidazole, 2,2′-bis (o, o′-dichlorophenyl)- 4,4 ', 5 '-Tetraphenylbiimidazole, 2,2'-bis (o-nitrophenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-methylphenyl) -4, Examples thereof include 4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-trifluorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, and the like.

  Examples of the organic borate compound include JP-A-62-143044, JP-A-62-1050242, JP-A-9-188585, JP-A-9-188686, JP-A-9-188710, JP-A-2000. -131837, Japanese Patent Application Laid-Open No. 2002-107916, Japanese Patent No. 2764769, Japanese Patent Application No. 2000-310808, etc., and Kunz, Martin “Rad Tech '98. Proceeding April 19-22, 1998, Chicago”. Organoboron salts described in JP-A-6-157623, JP-A-6-175564, JP-A-6-175561, JP-A-6-175554 In Japanese Patent Laid-Open No. 6-175553 Organoboron iodonium complexes, organoboron phosphonium complexes described in JP-A-9-188710, JP-A-6-348011, JP-A-7-128785, JP-A-7-140589, JP-A-7- Specific examples include organoboron transition metal coordination complexes such as those described in Japanese Patent No. 306527 and Japanese Patent Laid-Open No. 7-292014.

  Examples of the disulfone compound include compounds described in JP-A No. 61-166544 and Japanese Patent Application No. 2001-132318.

  Examples of oxime ester compounds include J.M. C. S. Perkin II (1979) 1653-1660), J. MoI. C. S. Perkin II (1979) 156-162, Journal of Photopolymer Science and Technology (1995) 202-232, JP-A 2000-66385, compounds described in JP-A 2000-80068, JP-T 2004-534797 Compounds and the like.

  Examples of onium salt compounds include S.I. I. Schlesinger, Photogr. Sci. Eng. , 18, 387 (1974), T.A. S. Bal et al, Polymer, 21, 423 (1980), diazonium salts described in U.S. Pat. No. 4,069,055, ammonium salts described in JP-A-4-365049, U.S. Pat. No. 4,069, No. 055, No. 4,069,056, phosphonium salts described in European Patent Nos. 104 and 143, U.S. Pat. Nos. 339,049 and 410,201, JP Examples include iodonium salts described in JP-A No. -150848 and JP-A-2-296514.

  The iodonium salt that can be suitably used in the present invention is a diaryl iodonium salt, and is preferably substituted with two or more electron donating groups such as an alkyl group, an alkoxy group, and an aryloxy group from the viewpoint of stability. . In addition, as another preferable form of the sulfonium salt, an iodonium salt in which one substituent of the triarylsulfonium salt has a coumarin or an anthraquinone structure and absorption at 300 nm or more is preferable.

Examples of the sulfonium salt that can be suitably used in the present invention include European Patent Nos. 370,693, 390,214, 233,567, 297,443, 297,442, and U.S. Pat. 933,377, 161,811, 410,201, 339,049, 4,760,013, 4,734,444, 2,833,827, Germany Examples thereof include sulfonium salts described in the specifications of Patent Nos. 2,904,626, 3,604,580, and 3,604,581, and are preferably electron withdrawing groups from the viewpoint of stability. It is preferably substituted. The electron withdrawing group preferably has a Hammett value greater than zero. Preferred electron-withdrawing groups include halogen atoms and carboxylic acids.
Other preferable sulfonium salts include sulfonium salts in which one substituent of the triarylsulfonium salt has a coumarin or anthraquinone structure and absorbs at 300 nm or more. As another preferable sulfonium salt, a sulfonium salt in which the triarylsulfonium salt has an allyloxy group or an arylthio group as a substituent and has absorption at 300 nm or more can be mentioned.

  Moreover, as an onium salt compound, J.M. V. Crivello et al, Macromolecules, 10 (6), 1307 (1977), J. MoI. V. Crivello et al, J.A. Polymer Sci. , Polymer Chem. Ed. , 17, 1047 (1979), a selenonium salt described in C.I. S. Wen et al, Teh, Proc. Conf. Rad. Curing ASIA, p478 Tokyo, Oct (1988), and onium salts such as arsonium salts.

  Examples of the acylphosphine (oxide) compound include Irgacure 819, Darocur 4265, Darocur TPO and the like manufactured by Ciba Specialty Chemicals.

  The photopolymerization initiator used in the present invention is most preferably at least one compound selected from the group consisting of a trihalomethyltriazine compound, a biimidazole compound, and an oxime compound from the viewpoint of increasing sensitivity, and a biimidazole compound. Compounds are most preferred.

  It is preferable that content of the photoinitiator contained in the photosensitive composition of this invention is 0.1-40 mass% with respect to the total solid of a photosensitive composition, More preferably, it is 0.1 30% by mass, particularly preferably 0.3 to 20% by mass. Within this range, good sensitivity and pattern formability can be obtained.

  In the present invention, from the viewpoint of the decomposition efficiency of the photopolymerization initiator, the mass ratio of the photopolymerization initiator to the sensitizing dye described later (photopolymerization initiator / sensitizing dye) is 1.0 to 6. 0.0, preferably 1.5 to 4.5, and more preferably 1.8 to 3.5.

<(D) Thiol compound>
The thiol compound in the present invention can act as a co-sensitizer. The co-sensitizer has functions such as further improving the sensitivity of the sensitizing dye and the initiator to actinic radiation, or suppressing inhibition of polymerization of the polymerizable compound by oxygen.
Specific examples of the thiol compound include ethylene glycol bisthiopropionate (EGTP), butanediol bisthiopropionate (BDTP), trimethylolpropane tristhiopropionate (TMTP), pentaerythritol tetrakisthiopropionate ( PETP), mercaptopropionic acid derivatives such as THEIC-BMPA represented by the following formula; ethylene glycol bisthioglycolate (EGTG), butanediol bisthioglycolate (BDTG), hexanediol bisthioglycolate (HDTG), triglyceride Thioglycolic acid derivatives such as methylolpropane tristhioglycolate (TMTG) and pentaerythritol tetrakisthioglycolate (PETG); 1,2-benzenedithiol, 1,3-benzene Thiol, 1,2-ethanedithiol, 1,3-propanedithiol, 1,6-hexamethylenedithiol, 2,2 ′-(ethylenedithio) diethanethiol, meso-2,3-dimercaptosuccinic acid, p- Examples include thiols such as xylenedithiol and m-xylenedithiol; mercaptoethers such as di (mercaptoethyl) ether. These can be used alone or in combination of two or more.

  As for the thiol compound used by this invention, what is represented by the following general formula (I) is more preferable.

(In general formula (I), R represents an alkyl group or an aryl group, and A represents an atomic group that forms a heterocycle with N = CN.)

In general formula (I), R represents an alkyl group or an aryl group.
Examples of the alkyl group include linear, branched, or cyclic alkyl groups having 1 to 20 carbon atoms, linear groups having 1 to 12 carbon atoms, and 3 to 12 carbon atoms. More preferred are branched alkyl groups and cyclic alkyl groups having 5 to 10 carbon atoms.
Specific examples thereof include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, octadecyl group. , Eicosyl group, isopropyl group, isobutyl group, s-butyl group, t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group , 2-norbornyl group and the like.

  Examples of the aryl group include a monocyclic structure, one to three benzene rings forming a condensed ring, and a benzene ring and a five-membered unsaturated ring forming a condensed ring. Specific examples include a phenyl group, a naphthyl group, an anthryl group, a phenanthryl group, an indenyl group, an acenaphthenyl group, a fluorenyl group, and the like. Among these, a phenyl group and a naphthyl group are more preferable.

  These alkyl groups and aryl groups may further have a substituent. Examples of the substituent that can be introduced include linear, branched or cyclic alkyl groups having 1 to 20 carbon atoms, and the number of carbon atoms. A linear, branched or cyclic alkenyl group having 2 to 20 carbon atoms, an alkynyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an acyloxy group having 1 to 20 carbon atoms, and 2 carbon atoms -20 alkoxycarbonyloxy group, aryloxycarbonyloxy group having 7-20 carbon atoms, carbamoyloxy group having 1-20 carbon atoms, carbonamido group having 1-20 carbon atoms, 1-20 carbon atoms Sulfonamide group, carbamoyl group having 1 to 20 carbon atoms, sulfamoyl group, substituted sulfamoyl group having 1 to 20 carbon atoms, alkoxy group having 1 to 20 carbon atoms, carbon atom An aryloxy group having 6 to 20 carbon atoms, an aryloxycarbonyl group having 7 to 20 carbon atoms, an alkoxycarbonyl group having 2 to 20 carbon atoms, an N-acylsulfamoyl group having 1 to 20 carbon atoms, and 1 carbon atom -20 N-sulfamoylcarbamoyl group, C1-C20 alkylsulfonyl group, C6-C20 arylsulfonyl group, C2-C20 alkoxycarbonylamino group, C7-20 Aryloxycarbonylamino group, amino group, substituted amino group having 1 to 20 carbon atoms, imino group having 1 to 20 carbon atoms, ammonio group having 3 to 20 carbon atoms, carboxyl group, sulfo group, oxy group, Mercapto group, alkylsulfinyl group having 1 to 20 carbon atoms, arylsulfinyl group having 6 to 20 carbon atoms, and 1-2 carbon atoms Alkylthio group, arylthio group having 6 to 20 carbon atoms, ureido group having 1 to 20 carbon atoms, heterocyclic group having 2 to 20 carbon atoms, acyl group having 1 to 20 carbon atoms, sulfamoylamino group A substituted sulfamoylamino group having 1 to 2 carbon atoms, a silyl group having 2 to 20 carbon atoms, an isocyanate group, an isocyanide group, a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, etc.), a cyano group, A nitro group, an onium group, etc. are mentioned.

In the general formula (I), A represents an atomic group that forms a heterocycle with N═C—N.
Examples of atoms constituting this atomic group include a carbon atom, a nitrogen atom, a hydrogen atom, a sulfur atom, and a selenium atom.
The heterocycle formed by A and N═C—N may further have a substituent. Examples of the substituent that can be introduced include substituents that can be introduced into the alkyl group and aryl group. The same thing is mentioned.

  Moreover, as a thiol compound, More preferably, it is represented by the following general formula (II) or general formula (III).

In general formula (II), R ¹ represents an aryl group, and X represents a hydrogen atom, a halogen atom, an alkoxy group, an alkyl group, or an aryl group.

In general formula (III), R ² represents an alkyl group or an aryl group, and X represents a hydrogen atom, a halogen atom, an alkoxy group, an alkyl group, or an aryl group.

  As a halogen atom in general formula (II) and (III), a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are preferable.

  As the alkoxy group in the general formulas (II) and (III), methoxy group, ethoxy group, propyloxy group, isopropyloxy group, butyloxy group, pentyloxy group, hexyloxy group, dodecyloxy group, benzyloxy group, allyloxy group Phenethyloxy group, carboxyethyloxy group, methoxycarbonylethyloxy group, ethoxycarbonylethyloxy group, methoxyethoxy group, phenoxyethoxy group, methoxyethoxyethoxy group, ethoxyethoxyethoxy group, morpholinoethoxy group, morpholinopropyloxy group, ant Loxyethoxyethoxy group, phenoxy group, tolyloxy group, xylyloxy group, mesityloxy group, cumyloxy group, methoxyphenyloxy group, ethoxyphenyloxy group, chlorophenyloxy group Group, bromophenyl group, acetyloxy group, benzoyloxy group, naphthyloxy group and the like.

The alkyl group in general formula (II) and (III) is synonymous with the alkyl group represented by R of general formula (I), and its preferable range is also the same.
Moreover, the aryl group in general formula (II) and (III) is synonymous with the aryl group represented by R of general formula (I), The preferable range is also the same.

  Each group in the general formulas (II) and (III) may further have a substituent, and the substituent can be introduced into the alkyl group or aryl group represented by R in the general formula (I). These are the same as those listed as examples of the substituent.

In general formulas (II) and (III), X is more preferably a hydrogen atom from the viewpoint of solubility in propylene glycol monomethyl ether acetate (hereinafter referred to as PGMEA as appropriate).
In general formula (II), R ¹ is most preferably a phenyl group from the viewpoints of sensitivity and PGMEA solubility.
In general formula (III), R ² is more preferably a methyl group, an ethyl group, a phenyl group, or a benzyl group from the viewpoints of sensitivity and PGMEA solubility.

  Of the general formulas (II) and (III), the compound represented by the general formula (III) is most preferable from the viewpoint of PGMEA solubility.

  These thiol compounds are described in J. Org. Appl. Chem. , 34, 2203-2207 (1961).

  In the photosensitive composition of the present invention, the compound represented by the general formula (I) may be used alone or in combination of two or more, and is represented by the general formula (II). A compound selected from the compounds, a compound selected from the compounds represented by the general formula (III), and a compound selected from may be used in combination.

  The content of these thiol compounds is preferably in the range of 0.1 to 30% by mass with respect to the mass of the total solid content of the photosensitive composition, from the viewpoint of improving the curing rate due to the balance between the polymerization growth rate and chain transfer. The range of 0.1-20 mass% is more preferable, and the range of 0.5-15 mass% is still more preferable.

<(F) Sensitizing dye>
The present invention contains a sensitizing dye for the purpose of improving the radical generation efficiency of the radical initiator and increasing the photosensitive wavelength.
The sensitizing dye that can be used in the present invention is preferably a compound that is sensitized by an electron transfer mechanism or an energy transfer mechanism with respect to a radical initiator, and is a compound represented by the following general formula (D-8). .

Examples of the sensitizing dye that can be used in combination with the compound represented by the following general formula (D-8) belong to the compounds listed below and have an absorption wavelength in the wavelength region of 300 nm to 450 nm. .
Examples of preferred sensitizing dyes that can be used in combination with the compound represented by the general formula (D-8) described below include those belonging to the following compounds and having an absorption wavelength in the 330 nm to 450 nm region. it can.
For example, polynuclear aromatics (for example, phenanthrene, anthracene, pyrene, perylene, triphenylene, 9,10-dialkoxyanthracene), xanthenes (for example, fluorescein, eosin, erythrosine, rhodamine B, rose bengal), thioxanthones (Isopropylthioxanthone, diethylthioxanthone, chlorothioxanthone), cyanines (eg thiacarbocyanine, oxacarbocyanine), merocyanines (eg merocyanine, carbomerocyanine), phthalocyanines, thiazines (eg thionine, methylene blue, toluidine blue) , Acridines (eg, acridine orange, chloroflavin, acriflavine), anthraquinones (eg, anthraquinone), squariums (eg Squalium), acridine orange, coumarins (eg 7-diethylamino-4-methylcoumarin), ketocoumarin, phenothiazines, phenazines, styrylbenzenes, azo compounds, diphenylmethane, triphenylmethane, distyrylbenzenes, carbazole , Porphyrins, spiro compounds, quinacridone, indigo, styryl, pyrylium compounds, pyromethene compounds, pyrazolotriazole compounds, benzothiazole compounds, barbituric acid derivatives, thiobarbituric acid derivatives, acetophenone, benzophenone, thioxanthone, Michler's ketone and other aromatics Examples include ketone compounds and heterocyclic compounds such as N-aryloxazolidinones.
Examples of more preferred sensitizing dyes that can be used in combination with the compound represented by the general formula (D-8) described later include compounds represented by the following general formulas (D-1) to (D-4).

(In formula (D-1), A ¹ represents a sulfur atom or NR ⁵⁰ , R ⁵⁰ represents an alkyl group or an aryl group, and L ¹ represents the basicity of the dye in combination with adjacent A ¹ and the adjacent carbon atom. Represents a nonmetallic atomic group forming a nucleus, R ⁵¹ and R ⁵² each independently represent a hydrogen atom or a monovalent nonmetallic atomic group, and R ⁵¹ and R ⁵² are bonded to each other to form an acidic nucleus of the dye W may represent an oxygen atom or a sulfur atom.)

(In Formula (D-2), Ar ¹ and Ar ² each independently represent an aryl group, and are linked via a bond with —L ² —, where L ² represents —O— or —S—. In addition, W is synonymous with that shown in Formula (D-1).)

(In the formula (D-3), A ² represents a sulfur atom or NR ⁵⁹ , L ³ represents a nonmetallic atomic group that forms a basic nucleus of the dye in combination with adjacent A ² and a carbon atom, and R ⁵³ , R ⁵⁴ , R ⁵⁵ , R ⁵⁶ , R ⁵⁷ and R ⁵⁸ each independently represents a monovalent nonmetallic atomic group, and R ⁵⁹ represents an alkyl group or an aryl group.)

(In Formula (D-4), A ³ and A ⁴ each independently represent —S— or —NR ⁶² — or —NR ⁶³ —, and R ⁶² and R ⁶³ each independently represent a substituted or unsubstituted alkyl group. Represents a substituted or unsubstituted aryl group, and L ⁴ and L ⁵ each independently represents a nonmetallic atomic group that forms a basic nucleus of a dye in cooperation with adjacent A ³ , A ⁴ and adjacent carbon atoms. And R ⁶⁰ and R ⁶¹ each independently represents a monovalent non-metallic atomic group, or can be bonded to each other to form an aliphatic or aromatic ring.)

The content of the sensitizing dye in the photosensitive composition of the present invention is preferably 0.1 to 20% by mass in terms of solid content from the viewpoints of light absorption efficiency to the deep part and initiation decomposition efficiency, and 0 More preferably, the content is 5 to 15% by mass.
A sensitizing dye may be used individually by 1 type, and may use 2 or more types together.

Also, tables in the photosensitive composition formula described below containing the present invention Preferred sensitizing dyes that can be used in combination in a compound represented by (D-8), the (D-1) ~ (D -4) In addition to the sensitizing dye to be used, at least one selected from compounds represented by the following general formulas (D-5) to (D- 7 ) may be mentioned. These may be used individually by 1 type, and may use 2 or more types together.

In General Formula (D-5) or General Formula (D-6), R ¹ and R ² each independently represent a monovalent substituent, and R ³ , R ⁴ , R ^5, and R ⁶ are each independently Represents a hydrogen atom or a monovalent substituent. n represents an integer of 0 to 5, n ′ represents an integer of 0 to 5, and n and n ′ are not both 0. When n is 2 or more, a plurality of R ¹ may be the same or different. When n ′ is 2 or more, a plurality of R ² may be the same or different.

  The compound represented by the general formula (D-5) is preferably a compound represented by the following general formula (D-7) from the viewpoints of sensitivity and colorability when a colorant is contained.

In General Formula (D-7), R ¹ and R ² each independently represent a monovalent substituent. n represents an integer of 0 to 5, and n ′ represents an integer of 1 to 5. When n is 2 or more, a plurality of R ¹ may be the same or different, and when n ′ is 2 or more, a plurality of R ² are the same or different. Also good.

In the formula (D-7), the monovalent substituent represented by ^{R 1} and ^{R 2,} the general formula (D-5) in the monovalent substituents represented by ^{R 1} and ^{R 2} synonymous The preferred range is also the same.

The compound represented by formula (D-5) or formula (D-6) preferably has a molar extinction coefficient ε at a wavelength of 365 nm of 500 mol ⁻¹ · L · cm ⁻¹ or more, and at a wavelength of 365 nm. ε is more preferably 3000mol ^-1 · L · ^{cm -1} or more, and most preferably ε at a wavelength of 365nm is 20000mol ^-1 · L · ^{cm -1} or more. It is preferable that the value of the molar extinction coefficient ε at each wavelength is in the above range because the sensitivity improvement effect is high from the viewpoint of light absorption efficiency.

Although the preferable specific example of a compound represented by general formula (D-5) or general formula (D-6) is illustrated below, this invention is not limited to these.
Note that in this specification, a chemical formula may be described by a simplified structural formula, and a solid line or the like that does not clearly indicate an element or a substituent particularly represents a hydrocarbon group. In the following specific examples, Me represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, n-Bu represents an n-butyl group, and Ph represents a phenyl group.

In the formula (D-8), A represents an aromatic ring or a hetero ring which may have a substituent, X represents an oxygen atom, Y is ^- N (R 3) - represents a. R ¹ , R ² , and R ³ each independently represent a hydrogen atom or a monovalent nonmetallic atomic group, and A, R ¹ , R ² , and R ³ are each bonded to each other to form an aliphatic group Or you may form an aromatic ring.

In General Formula (D-8), R ¹ , R ^2, and R ³ each independently represent a hydrogen atom or a monovalent nonmetallic atomic group. When R ¹ , R ² and R ³ represent a monovalent nonmetal atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aromatic group It is preferably a heterocyclic residue, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted alkylthio group, a hydroxyl group, or a halogen atom.

Compound represented by the general formula (D-8), from the viewpoint of decomposition efficiency of the photopolymerization initiator, Y is - N (R ³⁾ - is. R ³ each independently represents a hydrogen atom or a monovalent nonmetallic atomic group. Furthermore, Y is -N ^{(R 3)} - Ru der.

The compound represented by the general formula (D-8) according to the present invention can be further subjected to various chemical modifications for improving the characteristics of the photosensitive composition.
For example, the sensitizing dye and an addition polymerizable compound structure (for example, acryloyl group or methacryloyl group) are bonded by a method such as covalent bond, ionic bond, hydrogen bond, etc. Unnecessary precipitation suppression of the sensitizing dye from the film after exposure can be performed.
In addition, partial structures having radical generating ability in the sensitizing dye and the above-described photopolymerization initiator (for example, reductive decomposable sites such as alkyl halide, onium, peroxide, biimidazole, borate, amine, trimethylsilylmethyl) , An oxidatively cleavable site such as carboxymethyl, carbonyl, imine, etc.), the photosensitivity can be remarkably enhanced particularly in a state where the concentration of the starting system is low.

  In the photosensitive composition of the present invention, the compounds represented by the general formulas (D-5) to (D-8) may be used alone or in combination of two or more.

The compounds represented by the above general formulas (D-5) to (D-8) have a very high colorant concentration in the photosensitive composition, and the light transmittance of the formed colored pattern (photosensitive layer). Is added when the transmittance of light at 365 nm of the photosensitive layer when formed without adding a sensitizing dye is 10% or less. is Ru is remarkably exhibited.

In addition, in these sensitizing dyes contained in the photosensitive composition of the present invention, use in combination with a biimidazole (rophine dimer) photopolymerization initiator provides high initiator decomposition efficiency and sensitivity. you improve.

<(G) Solvent>
The photosensitive composition of the present invention contains at least one (G) solvent.
Specifically, the solvent is preferably selected from glycol ether solvents, alcohol solvents, ester solvents, ketone solvents, amide solvents, and chlorine-containing solvents.

  Examples of the glycol ether solvent include ethyl cellosolve (ethylene glycol monoethyl ether), methyl cellosolve (ethylene glycol monomethyl ether), butyl cellosolve (ethylene glycol monobutyl ether), methylmethoxybutanol (3-methyl-3-methoxybutanol), butyl Carbitol (diethylene glycol monobutyl ether), ethylene glycol monoethyl ether acetate, ethylene glycol mono-t-butyl ether, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether (1-methoxy-2-propanol), propylene glycol monoethyl ether (1 -Ethoxy-2-propanol), propylene glycol monoethyl ether Seteto, and the like are preferable.

  As the alcohol solvent, methanol, ethanol, isopropanol, normal propyl alcohol, isobutyl alcohol, normal butyl alcohol, and the like are preferable.

  Examples of the ester solvent include ethyl acetate, normal butyl acetate, isobutyl acetate, cellosolve acetate (ethylene glycol monomethyl ether acetate), methoxybutyl acetate (3-methoxybutyl acetate), 3-methyl-3-methoxybutyl acetate, 3- Ethyl ethoxypropionate (EEP) and lactic acid esters (for example, methyl lactate, ethyl lactate, propyl lactate, butyl lactate, etc.) are preferred.

  Examples of the ketone solvent include 2-butanone (MEK), methyl isobutyl ketone (MIBK), cyclohexanone, cyclopentanone, acetone, diacetone alcohol (4-hydroxy-4-methyl-2-pentanone), and isophorone (3, 3). 5,5-trimethyl-2-cyclohexen-1-one), diisobutyl ketone (2,6-dimethyl-4-heptanone) and the like are preferable.

  As the amide solvent, dimethylformamide (DMF), N-methylpyrrolidone (4-methylaminolactam or NMP) and the like are preferable.

  As the chlorine-containing solvent, 1,1,1-trichloroethane, trichloroethylene, perchloroethylene, methylene chloride, carbon tetrachloride, chloroform, dichloroethane, dichlorobenzene and the like are preferable.

  As content in the photosensitive composition of the solvent in this invention, 50-95 mass% is preferable with respect to this photosensitive composition, 65-95 mass% is more preferable, 75-90 mass% is still more preferable. When the content is within the above range, the solubility of the colorant in the composition and the temporal stability during storage after dissolution can be effectively improved.

  Among the above solvents, ethyl cellosolve (ethylene glycol monoethyl ether), methyl cellosolve (ethylene glycol monomethyl ether), butyl cellosolve (ethylene glycol monobutyl ether), methylmethoxybutanol (3-methyl-3-methoxybutanol), butyl carbitol ( Diethylene glycol monobutyl ether), ethylene glycol monoethyl ether acetate, ethylene glycol mono-t-butyl ether, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether (1-methoxy-2-propanol), propylene glycol monoethyl ether (1-ethoxy- 2-propanol), propylene glycol monoethyl ether acetate,

  Ethyl acetate, normal butyl acetate, isobutyl acetate, cellosolve acetate (ethylene glycol monomethyl ether acetate), methoxybutyl acetate (3-methoxybutyl acetate), 3-methyl-3-methoxybutyl acetate, ethyl 3-ethoxypropionate (EEP) , Methyl lactate, ethyl lactate, propyl lactate, butyl lactate,

  2-butanone (MEK), methyl isobutyl ketone (MIBK), cyclohexanone, cyclopentanone, diacetone alcohol (4-hydroxy-4-methyl-2-pentanone), isophorone (3,5,5-trimethyl-2-cyclo) Hexen-1-one), diisobutyl ketone (2,6-dimethyl-4-heptanone),

  N-methylpyrrolidone (4-methylaminolactam or NMP),

Methanol, ethanol, isopropanol, normal propyl alcohol, isobutyl alcohol, normal butyl alcohol, and the like are preferable.
Moreover, in the photosensitive composition of this invention, the said solvent can be used individually or in combination of 2 or more types.

  Furthermore, in preparing the photosensitive composition of the present invention, a solvent other than the solvents listed above may be used in combination. The other solvent is not particularly limited as long as the solubility of each component and the coating property of the photosensitive composition are satisfied, but it is particularly selected in consideration of the solubility, coating property, and safety of the colorant and binder. It is preferable that

  Examples of the other solvent include esters other than those exemplified above, such as amyl formate, isoamyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, alkyl esters, methyl oxyacetate, ethyl oxyacetate, oxy Butyl acetate, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, etc .;

  3-oxypropionic acid alkyl esters such as methyl 3-oxypropionate and ethyl 3-oxypropionate (eg, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, etc.); 2-oxypropionic acid alkyl esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate (for example, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, 2-methoxy Propyl propionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, methyl 2-methoxy-2-methylpropionate 2-ethoxy-2- Chirupuropion ethyl, etc.); methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate, etc .;

  Ethers other than those exemplified above, such as diethylene glycol dimethyl ether, tetrahydrofuran, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol propyl ether acetate, etc .;

  Ketones other than those exemplified above, for example, methyl ethyl ketone, 2-heptanone, 3-heptanone, etc .; aromatic hydrocarbons, for example, toluene, xylene and the like.

  Of these, methyl 3-ethoxypropionate, ethyl cellosolve acetate, diethylene glycol dimethyl ether, methyl 3-methoxypropionate, 2-heptanone, ethyl carbitol acetate, butyl carbitol acetate, and the like are preferable.

  The photosensitive composition of this invention may further contain the arbitrary components explained in full detail below as needed with above-described (A)-(G) component. Hereinafter, optional components that can be contained in the photosensitive composition of the present invention will be described.

<Dispersant>
When the photosensitive composition of this invention contains a pigment as (A) a coloring agent, it is preferable to add a dispersing agent from a viewpoint of improving the dispersibility of this pigment.

Dispersants (pigment dispersants) that can be used in the present invention include polymer dispersants [for example, polyamidoamines and salts thereof, polycarboxylic acids and salts thereof, high molecular weight unsaturated acid esters, modified polyurethanes, modified polyesters, modified polymers. (Meth) acrylate, (meth) acrylic copolymer, naphthalene sulfonic acid formalin condensate], polyoxyethylene alkyl phosphate ester, polyoxyethylene alkyl amine, alkanol amine, pigment derivative and the like.
The polymer dispersant can be further classified into a linear polymer, a terminal-modified polymer, a graft polymer, and a block polymer according to the structure.

  The polymer dispersant is adsorbed on the surface of the pigment and acts to prevent reaggregation. Therefore, a terminal-modified polymer, a graft polymer and a block polymer having an anchor site to the pigment surface can be mentioned as preferred structures. On the other hand, the pigment derivative has an effect of promoting the adsorption of the polymer dispersant by modifying the pigment surface.

  Specific examples of the pigment dispersant that can be used in the present invention include “Disperbyk-101 (polyamidoamine phosphate), 107 (carboxylic acid ester), 110 (copolymer containing an acid group), 130 (polyamide) manufactured by BYK Chemie. ), 161, 162, 163, 164, 165, 166, 170 (polymer copolymer) ”,“ BYK-P104, P105 (high molecular weight unsaturated polycarboxylic acid) ”,“ EFKA 4047, 4050, 4010, manufactured by EFKA, 4165 (polyurethane series), EFKA4330, 4340 (block copolymer), 4400, 4402 (modified polyacrylate), 5010 (polyesteramide), 5765 (high molecular weight polycarboxylate), 6220 (fatty acid polyester), 6745 (phthalocyanine) Derivatives), 6750 (azo) "Adisper PB821, PB822" manufactured by Ajinomoto Fan Techno Co., "Floren TG-710 (urethane oligomer)" manufactured by Kyoeisha Chemical Co., "Polyflow No. 50E, No. 300 (acrylic copolymer)", “Disparon KS-860, 873SN, 874, # 2150 (aliphatic polycarboxylic acid), # 7004 (polyetherester), DA-703-50, DA-705, DA-725” manufactured by Enomoto Kasei Co., Ltd., Kao “Demol RN, N (Naphthalenesulfonic acid formalin polycondensate), MS, C, SN-B (aromatic sulfonic acid formalin polycondensate)”, “Homogenol L-18 (polymer polycarboxylic acid)”, “ Emulgen 920, 930, 935, 985 (polyoxyethylene nonylphenyl ether) ”,“ acetamine 86 (stearylamine acetate) ", Lubrizol" Solsperse 5000 (phthalocyanine derivative), 22000 (azo pigment derivative), 13240 (polyesteramine), 3000, 17000, 27000 (polymer having a functional part at the end), 24000, 28000, 32000, 38500 (graft type polymer) ”,“ Nikkor T106 (polyoxyethylene sorbitan monooleate), MYS-IEX (polyoxyethylene monostearate) ”manufactured by Nikko Chemicals, and the like.

  These dispersants may be used alone or in combination of two or more. In the present invention, it is particularly preferable to use a combination of a pigment derivative and a polymer dispersant.

As content of the dispersing agent in this invention, it is preferable that it is 1-80 mass% with respect to a pigment, 5-70 mass% is more preferable, and 10-60 mass% is still more preferable.
Specifically, if a polymer dispersant is used, the amount of use thereof is preferably in the range of 5 to 100% by mass, more preferably in the range of 10 to 80% by mass with respect to the pigment. In the case of using a pigment derivative, the amount used is preferably in the range of 1 to 30% by mass, more preferably in the range of 3 to 20% by mass, based on the pigment, A range of 15% by mass is particularly preferable.

  In the present invention, when using a pigment and a dispersant as a colorant, the total content of the colorant and the dispersant is based on the total solid content of the photosensitive composition from the viewpoint of curing sensitivity and color density. It is preferably 25% by mass or more and 95% by mass or less, more preferably 25% by mass or more and 80% by mass or less, and further preferably 30% by mass or more and 70% by mass or less.

<Polymerization inhibitor>
In the present invention, a small amount of a thermal polymerization inhibitor may be added in order to prevent unnecessary thermal polymerization of a compound having an ethylenically unsaturated double bond that can be polymerized during the production or storage of the photosensitive composition. desirable.
Examples of the thermal polymerization inhibitor that can be used in the present invention include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl-6). -T-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt and the like.

  The addition amount of the thermal polymerization inhibitor is preferably about 0.01 to about 5% by mass with respect to the total solid content of the photosensitive composition. If necessary, a higher fatty acid derivative such as behenic acid or behenic acid amide may be added to prevent polymerization inhibition due to oxygen, and it may be unevenly distributed on the surface of the photosensitive layer in the course of drying after coating. . The amount of the higher fatty acid derivative added is preferably from about 0.5 to about 10% by weight of the total composition.

<Adhesion improver>
In the present invention, an adhesion improver can be added in order to improve the adhesion to the hard surface (substrate) as a base material. Examples of the adhesion improver include a silane coupling agent and a titanium coupling agent.

Examples of the silane coupling agent include γ- (2-aminoethyl) aminopropyltrimethoxysilane, γ- (2-aminoethyl) aminopropyldimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxy. Silane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-acryloxypropyltrimethoxysilane, γ-acryloxypropyl Triethoxysilane, γ-isocyanatopropyltrimethoxysilane, γ-isocyanatopropyltriethoxysilane, N-β- (N-vinylbenzylaminoethyl) -γ-aminopropyltrimethoxysilane / hydrochloride, γ-glycidoxypro Pyrtrimethoxysilane, γ-glycidoxypropyltriethoxysilane, aminosilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, vinyltriacetoxysilane, γ- Chloropropyltrimethoxysilane, hexamethyldisilazane, γ-anilinopropyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (β-methoxyethoxy) silane, octadecyldimethyl [3- (trimethoxysilyl) propyl ] Ammonium chloride, γ-chloropropylmethyldimethoxysilane, γ-mercaptopropylmethyldimethoxysilane, methyltrichlorosilane, dimethyldichlorosilane, trimethyl Chlorosilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, bisallyltrimethoxysilane, tetraethoxysilane, bis (trimethoxysilyl) hexane, phenyltrimethoxysilane, N- (3-acryloxy-2-hydroxy Propyl) -3-aminopropyltriethoxysilane, N- (3-methacryloxy-2-hydroxypropyl) -3-aminopropyltriethoxysilane, (methacryloxymethyl) methyldiethoxysilane, (acryloxymethyl) methyldimethoxysilane , Etc.
Among them, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-acryloxypropyltrimethoxysilane, γ-acryloxypropyltriethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltri Ethoxysilane and phenyltrimethoxysilane are preferred, and γ-methacryloxypropyltrimethoxysilane is most preferred.

  The addition amount of the adhesion improver is preferably 0.1 to 30% by mass, more preferably 0.5 to 10% by mass in the total solid content of the photosensitive composition.

  The photosensitive composition for a color filter of the present invention is cured with high sensitivity and has good storage stability. Moreover, the high adhesiveness to hard material surfaces, such as a board | substrate which applies a photosensitive composition, is shown.

-Color filter and manufacturing method thereof-
Next, the color filter of the present invention and the manufacturing method thereof will be described.
The color filter of the present invention is characterized by having a colored pattern formed on the support using the photosensitive composition for a color filter of the present invention.
Hereinafter, the color filter of the present invention will be described in detail through its manufacturing method (color filter manufacturing method of the present invention).

  The method for producing a color filter of the present invention comprises a step of applying a photosensitive composition for a color filter of the present invention on a support to form a colored curable composition layer (hereinafter appropriately referred to as “colored curable composition layer”). Abbreviated as “formation step”), a step of exposing the colored curable composition layer through a mask (hereinafter abbreviated as “exposure step” as appropriate), and the curable composition layer after exposure. And a step of forming a colored pattern by development (hereinafter abbreviated as “development step” as appropriate).

Specifically, the photosensitive composition of the present invention is applied directly or via another layer onto a support (substrate) to form a photopolymerizable composition layer (colored curable composition layer formation) Process), exposing through a predetermined mask pattern, curing only the irradiated film portion (exposure process), and developing with a developer (development process), each color (3 colors or 4 colors) A color filter of the present invention can be produced by forming a pattern-like film composed of pixels.
Hereafter, each process in the manufacturing method of this invention is demonstrated.

<Colored curable composition layer forming step>
In the colored curable composition layer forming step, the colored curable composition layer is formed by applying the curable composition of the present invention on the support.

Examples of the support that can be used in this step include soda glass, alkali-free glass, Pyrex (registered trademark) glass, quartz glass, plastic substrate, and those obtained by attaching a transparent conductive film to these. In addition, a photoelectric conversion element substrate used for an imaging element or the like, such as a silicon substrate, a complementary metal oxide semiconductor (CMOS), or the like can be given. These substrates may have black stripes that separate pixels.
Further, an undercoat layer may be provided on these supports, if necessary, in order to improve adhesion to the upper layer, prevent diffusion of substances, or flatten the substrate surface.

  As a coating method of the photosensitive composition of the present invention on the support, various coating methods such as slit coating, ink jet method, spin coating, roll coating, and screen printing method can be applied.

  As a coating film thickness of a photosensitive composition, 0.1-10 micrometers is preferable, 0.2-5 micrometers is more preferable, 0.5-3 micrometers is further more preferable.

  The photosensitive composition coated on the support is usually dried at 70 to 110 ° C. for about 2 to 4 minutes to form a colored curable composition layer.

<Exposure process>
In the exposure step, the colored curable composition layer formed in the colored curable composition layer forming step is exposed through a mask, and only the coating film portion irradiated with light is cured.
The exposure is preferably performed by irradiation of radiation, and as radiation that can be used for exposure, ultraviolet rays such as g-line and i-line are preferably used, and a high-pressure mercury lamp is more preferable. The irradiation intensity is preferably 5 mJ to 1500 mJ, more preferably 10 mJ to 800 mJ, and most preferably 10 mJ to 500 mJ.

<Development process>
Subsequent to the exposure step, an alkali development treatment (development step) is performed, and the light non-irradiated part in the exposure step is eluted in an alkaline aqueous solution. Thereby, only the photocured part remains.
The development temperature is usually 20 ° C. to 30 ° C., and the development time is 20 to 90 seconds.

  In the production method of the present invention, after performing the above-described curable composition layer forming step, exposure step, and development step, if necessary, the formed colored pattern is cured by heating and / or exposure. A process may be included.

  By repeating the above-described colored curable composition layer forming step, exposure step, and developing step (and, if necessary, the curing step) for the desired number of hues, a color filter having a desired hue is produced.

  Since the color filter of the present invention uses the photosensitive composition of the present invention, the formed colored pattern exhibits high adhesion to the support substrate, and the cured composition is excellent in development resistance. It is possible to form a high-resolution pattern that is excellent in exposure sensitivity, has good adhesion to the substrate of the exposed portion, and gives a desired cross-sectional shape.

-Liquid crystal display element-
The color filter in the present invention is used as a display element in combination with a liquid crystal display element, an electrophoretic display element, an electrochromic display element, PLZT, or the like. It can also be used for applications such as color cameras and other color filters.

Among the display devices, a liquid crystal display device is particularly preferable. The liquid crystal display device is described in, for example, “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by Kogyo Kenkyukai 1994)”. The liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to various types of liquid crystal display devices described in, for example, the “next generation liquid crystal display technology”. Among these, the present invention is particularly effective for a color TFT liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Further, the present invention can be applied to a liquid crystal display device with a wide viewing angle such as a lateral electric field driving method such as IPS and a pixel division method such as MVA. These methods are described, for example, on page 43 of "EL, PDP, LCD display-latest technology and market trends-(issued in 2001 by Toray Research Center Research Division)".
The display device of the present invention is configured by providing the color filter of the present invention described above, and this color filter is manufactured by the method of manufacturing the color filter of the present invention described above, so that light leakage is suppressed. Therefore, it is possible to display an image with excellent display quality in which the hue is good and display unevenness is prevented.

  In addition to the color filter, the liquid crystal display device can be configured using various known members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle compensation film. The above-described color filter of the present invention can be applied to a liquid crystal display device composed of these known members. Regarding these members, for example, “'94 Liquid Crystal Display Peripheral Materials / Chemicals Market” (Kentaro Shima, CMC Co., Ltd., published in 1994), “Current Status and Future Prospects of the 2003 Liquid Crystal Related Market (Part 2)” ( Table Yoshiyoshi, Fuji Chimera Research Institute, Inc., published in 2003).

EXAMPLES Hereinafter, although an Example demonstrates this invention further more concretely, it is not limited to a following example. Unless otherwise specified, “part” means “part by mass”.
≪Preparation of red dispersion≫
The following RED composition A was stirred for 1 hour using a homogenizer under the condition of 3000 rpm. The obtained mixed solution was finely dispersed for 4 hours with a bead disperser (trade name: Dispermat, manufactured by GETZMANN) using 0.3 mm zirconia beads to obtain a dispersion.

-RED composition A-Dispersion-Pigment Red 254 (average particle size 20 nm in SEM observation) 11 parts-Pigment Red 177 (average particle size 18 nm in SEM observation) 4 parts-Dispersant (trade name: Disperbyk-161, 8 parts 30% solution of propylene glycol monomethyl ether acetate, alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer 4 parts (= 75/25 [mass ratio] copolymer, weight average molecular weight Mw: 5000) Propylene glycol monomethyl ether acetate solution (solid content: 50% by mass)
・ Solvent: 73 parts of propylene glycol monomethyl ether acetate

[ Reference Example 1]
The following RED composition B was mixed and stirred to obtain a coating solution for the photosensitive composition.
-RED composition B-coating solution-100 parts of dispersion of RED composition A-Epoxy resin: (trade name: EHPE3150 manufactured by Daicel Chemical) 2 parts-polymerizable compound: ethoxylated dipentaerythritol hexaacrylate (EO number: 12)
8 parts Polymerization initiator: 2,2′-bis (O-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole 1.5 parts Michler's ketone 0.5 parts Mercaptobenzothiazole 0.5 Part / polymerization inhibitor: p-methoxyphenol 0.001 part / alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer 8 parts (= 75/25 [mass ratio] copolymer, weight average molecular weight Mw: 5000) Propylene glycol monomethyl ether acetate solution (solid content: 50% by mass)
-Fluorosurfactant: (trade name Megafac R30, manufactured by Dainippon Ink) 0.01 parts-Solvent: 80 parts of propylene glycol monomethyl ether acetate

[ Reference Example 2 , Example 3] [Comparative Examples 1-3]
The polymerizable compound of Reference Example 1, except that were changed as shown in Table 1 Polymerization initiator, in the same manner as in Reference Example 1 to obtain a coating solution of the photosensitive composition.

[Production of color filters]
1. Formation of the curable composition layer The curable composition containing the above pigment was applied as a resist solution to a 550 mm × 650 mm glass substrate under the conditions described below, and then allowed to stand for 10 minutes, followed by vacuum drying and pre-baking ( prebake) (100 ° C., 80 seconds) to form a photosensitive composition film.
(Slit application conditions)
Gap at the opening at the tip of the coating head: 50 μm
Coating speed: 100 mm / sec Clearance between substrate and coating head: 150 μm
Application thickness (dry thickness): 2 μm
Application temperature: 23 ° C

2. Exposure and development Thereafter, the photosensitive composition film is exposed in a pattern through a photomask using a 5 kw ultra-high pressure mercury lamp, and after the exposure, the entire surface of the coating film is an organic developer (trade name: CDK-1 Fuji). The film was covered with a 1% aqueous solution of Film Arch Co., Ltd., and rested for 90 seconds.
3. Heat treatment After standing still, pure water was sprayed in a shower to wash away the developer, and the coating film subjected to the photocuring treatment and development treatment was heated in an oven at 220 ° C. for 1 hour (post-baking).
The above steps 1 to 3 were repeated for each necessary color to form a color filter.

[Performance evaluation]
The exposure sensitivity, development margin, residue, and pattern cross-sectional shape of the photosensitive composition film formed above were evaluated as follows. The results are shown in Table 2.
1. Exposure sensitivity of coating film (colored layer),
Exposure was performed by changing the exposure dose to various exposure doses of 10 to 200 mJ / cm ² , and the exposure dose at which the pattern line width after post-baking was equivalent to the mask dimension was evaluated as exposure sensitivity. A smaller exposure sensitivity value indicates higher sensitivity.
2. Development margin, residue, pattern cross-sectional shape Development was performed by changing the development time to various times of 20 to 120 sec, and the development margin was evaluated from the pattern formation state.
Moreover, the substrate surface and cross-sectional shape after post-baking were observed with an optical microscope and SEM.
In the exposure step, the residue was evaluated based on the presence or absence of the residue by SEM observation of a region where light was not irradiated (unexposed portion).

<Development margin>
○: Pattern formation is completed by development time 40 sec, and there is no pattern defect until 120 sec. Δ: Pattern formation is completed by development time 60 sec, and there is no pattern defect up to 100 sec. X: Area where a good pattern is formed is 40 sec. Less than

<Residue>
A: No residue was observed at all in the unexposed area.
Δ: A slight residue was confirmed in the unexposed area, but it was practically unproblematic.
X: Residue was remarkably confirmed in the unexposed part.

<Pattern cross-sectional shape>
A: Tapered angle in the range of 30 to 70 degrees (forward taper)
○: Tapered angle in the range of 70 to 90 degrees (forward taper)
Δ: Taper angle is 90 degrees (rectangular)
X: The taper angle exceeds 90 degrees (reverse taper)

From the results shown in Table 2, all of the photosensitive compositions of the present invention had good exposure sensitivity and development margin, excellent pattern cross-sectional shape, and no residue in unexposed areas.
On the other hand, the photosensitive composition of the comparative example was inferior in all of the exposure sensitivity, the development margin, and the pattern cross-sectional shape, and a residue in the unexposed area was observed.

Claims (8)

(A) Colorant, (B) Alkali-soluble resin, (C) Photopolymerizable compound having hydrophilic group and ethylenically unsaturated bond, (D) Thiol compound, (E) Lophine dimer, (F) The following general formula A photosensitive composition for a color filter comprising a sensitizing dye represented by (D-8) and (G) a solvent.

In General Formula (D-8), A represents an aromatic ring or a heterocyclic ring, X represents an oxygen atom, and Y represents —N (R ³ ) —. R ¹ , R ² , and R ³ each independently represent a hydrogen atom or a monovalent nonmetallic atomic group, and A, R ¹ , R ² , and R ³ are each bonded to each other to form an aliphatic group Or you may form an aromatic ring.   The photosensitive composition for a color filter according to claim 1, wherein the number of ethylenically unsaturated bonds of the (C) photopolymerizable compound is 2 or more.   The photosensitive composition for a color filter according to claim 1 or 2, wherein the number of hydrophilic groups in the (C) photopolymerizable compound is 4 or more.   The photosensitive composition for a color filter according to any one of claims 1 to 3, wherein the hydrophilic group of the photopolymerizable compound (C) is an alkylene oxide group. The photosensitive composition for a color filter according to any one of claims 1 to 4, wherein the thiol compound has a structure represented by the following general formula (I).

In general formula (I), R represents an alkyl group or an aryl group, and A represents an atomic group that forms a heterocycle with N═C—N. A color filter comprising a colored pattern formed using the photosensitive composition for a color filter according to any one of claims 1 to 5 on a support. A step of applying a photosensitive composition for a color filter according to any one of claims 1 to 5 to form a colored curable composition layer on a support, and the colored curable composition layer And a step of developing the colored curable composition layer after the exposure to form a colored pattern. The method for producing a color filter comprising: A liquid crystal display element comprising the color filter according to claim 6 .