JP4642559B2 - Impurity removal device - Google Patents

Impurity removal device Download PDF

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JP4642559B2
JP4642559B2 JP2005169332A JP2005169332A JP4642559B2 JP 4642559 B2 JP4642559 B2 JP 4642559B2 JP 2005169332 A JP2005169332 A JP 2005169332A JP 2005169332 A JP2005169332 A JP 2005169332A JP 4642559 B2 JP4642559 B2 JP 4642559B2
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gas
liquid contact
hydrophilic
water
eliminator
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JP2006341194A (en
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仁 稲葉
典明 岡村
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Takasago Thermal Engineering Co Ltd
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本発明は,気液接触によって処理空気中の可溶性ガスを吸収除去する不純物除去装置に関するものである。   The present invention relates to an impurity removal apparatus that absorbs and removes soluble gas in processing air by gas-liquid contact.

従来から,可溶性ガスを気液接触によって除去する方法には以下のようなものが提案されている。
(1)処理空気に直接水を噴霧することで,噴霧水滴との気液接触を行いガスを噴霧水中に吸収除去する方法(特許文献1参照)。この方法においては,噴霧水は,処理風洞内の下流に設置されたエリミネータによって捕獲除去され回収されるようになっている。
(2)気液接触面積をより大きくする目的で通気性のある充填材を上記(1)の方法に追加した方式(特許文献2参照)。これは,上記(1)の方法より,確実に気液接触面積を大きくできることから装置のコンパクト化が可能な手段である。ただし,本方式においても,充填材からの水滴の飛撒があるため,下流側へのエリミネータの設置は必須である。
(3)上記(2)の方式をさらにコンパクト化する方式として,金属性ハニカムを充填材として使用し,圧力損失の低減を図った方法(特許文献3参照)。この方法においては,充填材の上部から直配給水することで水の噴霧部分をなくし,装置のさらなるコンパクト化が可能になっている。ただし,充填材からの水滴の飛撒があるため,下流側へのエリミネータの設置は必須である。
(4)上記(3)の方式をさらにコンパクト化する方法として,気液接触目的で使用していた充填材を用いず,エリミネータ自体に気液接触の機能を持たせた方式がある(特許文献4参照)。親水性の素材で構成されたエリミネータを採用することで,エリミネータ表面に水膜を形成しガスを吸収除去,さらに本構造体自身がエリミネータ機能を有しているために飛散水は防止できるというものである。
Conventionally, the following methods for removing soluble gas by gas-liquid contact have been proposed.
(1) A method of absorbing and removing gas in spray water by performing gas-liquid contact with spray water droplets by spraying water directly onto the treated air (see Patent Document 1). In this method, the spray water is captured and recovered by an eliminator installed downstream in the processing wind tunnel.
(2) A method in which an air-permeable filler is added to the method (1) for the purpose of increasing the gas-liquid contact area (see Patent Document 2). This is a means capable of making the apparatus compact because the gas-liquid contact area can be surely increased as compared with the method (1). However, even in this method, there is a drop of water droplets from the filler, so it is essential to install an eliminator downstream.
(3) A method for further reducing the pressure loss by using a metallic honeycomb as a filler as a method for further compacting the method (2) (see Patent Document 3). In this method, by directly distributing water from the upper part of the filler, the water spray portion is eliminated, and the apparatus can be made more compact. However, because there is a drop of water droplets from the filler, it is essential to install an eliminator downstream.
(4) As a method for further reducing the method of (3) above, there is a method in which the eliminator itself has a function of gas-liquid contact without using the filler used for the purpose of gas-liquid contact (Patent Literature). 4). By adopting an eliminator made of a hydrophilic material, a water film is formed on the surface of the eliminator to absorb and remove gas. Furthermore, since the structure itself has an eliminator function, splash water can be prevented. It is.

特開2002−035524号公報JP 2002-035524 A 特開2002−005474号公報JP 2002-005474 A 特開2003−222363号公報JP 2003-222363 A 特開平09−239224号公報JP 09-239224 A

ところで気液接触法によって,気中に存在する可溶性ガスの除去においては次のような要件が満足される必要がある。
まず絶対必要な機能としては,気液接触面積×接触時間をより大きくすることでガス吸収率を高くできること。処理エリア下流側への水滴の飛散を防止できること。また望ましい機能及び性能としては,送風圧力損失が低いこと。そして給水量(循環水量)がなるべく少ないことが挙げられる。
By the way, in the removal of the soluble gas present in the air by the gas-liquid contact method, the following requirements must be satisfied.
First, as an absolutely necessary function, the gas absorption rate can be increased by increasing the gas-liquid contact area x contact time. It is possible to prevent water droplets from scattering to the downstream side of the treatment area. As a desirable function and performance, air pressure loss is low. And it is mentioned that there is as little water supply amount (circulation water amount) as possible.

以上の条件に照らして前記した従来技術を検討すると,まず特開2002−035524号公報に開示された技術では,気液接触面積×処理時間を大きくするためには,装置は大型でかつ循環水量も多くなるという問題があり,設置スペースの制約,装置コスト削減,運転コスト・エネルギー削減の要求が強くなるに従い,かかる技術を採用するのは難しくなっている。
また特開2002−005474号公報,特開2003−222363号公報に開示された技術では,充填材の採用によって循環水量の削減は達成できるが,下流側に水滴飛散防止のエリミネータを別途設置する必要があり,コンパクト化に限界がある。
そして特開平09−239224号公報においては,気液接触機能を全てエリミネータに持たせているために,圧力損失の削減に限界がある。なぜならば,エリミネータは原理的に慣性衝突により飛散水滴を捕獲するために,通風抵抗が単なる充填材に比べて高いからである。
Considering the above-described conventional technology in view of the above conditions, first, in the technology disclosed in Japanese Patent Application Laid-Open No. 2002-035524, in order to increase the gas-liquid contact area × treatment time, the apparatus is large and the amount of circulating water is large. As the requirements for installation space, equipment cost reduction, operation cost and energy reduction become stronger, it is difficult to adopt such technology.
Further, in the techniques disclosed in Japanese Patent Application Laid-Open Nos. 2002-005474 and 2003-222363, the amount of circulating water can be reduced by using a filler, but it is necessary to separately install an eliminator for preventing water droplet scattering on the downstream side. There is a limit to downsizing.
In Japanese Patent Application Laid-Open No. 09-239224, since the eliminator has all the gas-liquid contact function, there is a limit in reducing pressure loss. This is because the eliminator, in principle, captures scattered water droplets by inertial collision, and therefore has a higher ventilation resistance than a simple filler.

本発明はかかる点に鑑みてなされたものであり,気液接触によって可溶性ガスを処理空気から除去するための装置において,従来よりもコンパクト化,圧力損失の低減を可能にすることを目的とする。   The present invention has been made in view of the above points, and an object of the present invention is to make the apparatus more compact and reduce pressure loss than before in a device for removing soluble gas from processing air by gas-liquid contact. .

前記目的を達成するため,本発明の不純物除去装置は,気液接触によって処理空気中の可溶性ガスを吸収除去する装置であって,前記処理空気をその内部で上流から下流に流通させることが可能なチャンバと,前記チャンバ内に収容され,上流側に親水性素材からなる気液接触材を有し,下流側に親水性エリミネータを有する処理部と,前記気液接触材に水を供給する給水部と,を有し,前記気液接触材のみ,親水性材料で形成された複数の波板が,垂直に立てられた状態でチャンバ内の幅方向に並列して配置され,かつ,波板における突条部及び溝部が下流側に向けて斜め下方に向けられた第1の波板と,波板における突条部及び溝部が上流側に向けて斜め下方に向けられた第2の波板とが,交互に配置されている構造とし,前記気液接触材に向けて供給された水の一部が,当該気液接触材から直接前記親水性エリミネータに供給され,当該親水性エリミネータの表面を濡らすように構成されている。 In order to achieve the above object, the impurity removing device of the present invention is a device that absorbs and removes the soluble gas in the processing air by gas-liquid contact, and allows the processing air to flow from upstream to downstream inside thereof. A processing chamber having a gas-liquid contact material made of a hydrophilic material on the upstream side and a hydrophilic eliminator on the downstream side, and water supply for supplying water to the gas-liquid contact material A plurality of corrugated plates made of a hydrophilic material only, the gas-liquid contact material, and arranged in parallel in the width direction in the chamber in a vertically standing state. The first corrugated portion and the groove portion of the corrugated plate are directed obliquely downward toward the downstream side, and the second corrugated plate portion and the groove portion of the corrugated sheet are directed obliquely downward toward the upstream side. DOO is a structure that are alternately arranged, the gas-liquid contact Some of the water supplied toward the is supplied directly to the hydrophilic eliminator from the gas-liquid contact member is configured to wet the surface of the hydrophilic eliminator.

このように本発明においては,まず上流側に親水性素材からなる気液接触材を有し,下流側にも親水性エリミネータを配置しているので,両者とも気液接触による可溶性ガスの除去機能を有し,圧力損失の大きいエリミネータは水滴の捕獲性能を満足できる最小の構成とすることが可能になる。したがってその分圧力損失を削減できる。また気液接触材についても,親水性エリミネータがガス除去機能を有しているので,その分削減できる。この結果処理部全体としては,従来よりもコンパクト化を図ることができ,しかも低圧損化が達成できる。そして気液接触材に向けて供給された水の一部,当該気液接触材から直接前記親水性エリミネータに供給され,当該親水性エリミネータの表面を濡らすように構成したので,気液接触材と親水性エリミネータの双方に独立して給水する必要はなく,したがってかかる点からも装置全体としての大きさをコンパクトにすることができる。 As described above, in the present invention, the gas-liquid contact material made of a hydrophilic material is first provided on the upstream side, and the hydrophilic eliminator is disposed on the downstream side. The eliminator having a large pressure loss can have a minimum configuration that can satisfy the water droplet capturing performance. Therefore, the pressure loss can be reduced accordingly. The gas-liquid contact material can also be reduced by the hydrophilic eliminator because it has a gas removal function. As a result, the entire processing unit can be made more compact than before, and low pressure loss can be achieved. And part of the supplied toward the gas-liquid contact member water is fed directly to the hydrophilic eliminator from the gas-liquid contact member, it is arranged that wets the surface of the hydrophilic eliminator, gas-liquid contact member It is not necessary to supply water independently to both the hydrophilic eliminator and the size of the entire apparatus can be made compact from this point of view.

そして前記気液接触材のみ,親水性材料で形成された複数の波板が,垂直に立てられた状態でチャンバ内の幅方向に並列して配置され,かつ,波板における突条部及び溝部が下流側に向けて斜め下方に向けられた第1の波板と,波板における突条部及び溝部が上流側に向けて斜め下方に向けられた第2の波板とが,交互に配置されているので,気液接触材に供給された水のうち,第1の波板に対するものは,下流側の親水性エリミネータへと給水され,第2の波板に対するものは,気液接触材全体への配水に供される。すなわち,仮に突条部及び溝部が下流側に向けて斜め下方に向けられた第1の波板のみで構成すると,多くの水は下流端部側に流れてしまい,波板全体は濡れた状態になるが水の入れ替えが偏ることでガス除去性能は低下してしまう。この点波板における突条部及び溝部が下流側に向けて斜め下方に向けられた第1の波板と,波板における突条部及び溝部が上流側に向けて斜め下方に向けられた第2の波板とを,交互に配置すれば,突条部と突条部の交差部では水の流れが互いに逆向きのためぶつかり合い,その結果交差部周辺に多くの水を配水することができる。 Then the gas-liquid contact member only, a plurality of corrugated plates made of a hydrophilic material is arranged in parallel in the width direction of the chamber in a state of being erected vertically, and ridges in the corrugated plate and the groove The first corrugated plate that is directed obliquely downward toward the downstream side and the second corrugated plate in which the ridges and grooves in the corrugated plate are directed obliquely downward toward the upstream side are alternately arranged. Therefore, of the water supplied to the gas-liquid contact material, the water for the first corrugated plate is supplied to the downstream hydrophilic eliminator, and the water for the second corrugated plate is the gas-liquid contact material. It is used for water distribution to the whole. In other words, if only the first corrugated plate is formed with the ridges and grooves directed obliquely downward toward the downstream side, a large amount of water flows to the downstream end side, and the entire corrugated plate is wet. However, the gas removal performance deteriorates due to the uneven replacement of water. The first corrugated portion and the groove portion in the point wave plate are directed obliquely downward toward the downstream side, and the first corrugated portion and the groove portion in the corrugated sheet are directed obliquely downward toward the upstream side. If the two corrugated plates are arranged alternately, the flow of water collides with each other at the intersection of the ridge and the ridge, so that a lot of water is distributed around the intersection. it can.

前記第1の波板における突条部及び溝部の斜め下方の俯角は10°〜80°であり,前記第2の波板における突条部及び溝部の斜め下方の俯角は10°〜80°であることがよい。また前記各波板における突条部の頂上部と溝部の底部との間の高さ(「波」で言うところの振幅に相当)は3〜15mmであり,かつ隣り合う突条部の頂上部間の長さ(「波」で言うところの周期幅に相当)は5〜30mmがよい。   The diagonal angle of the ridge and groove in the first corrugated plate is 10 ° to 80 °, and the diagonal angle of the ridge and groove in the second corrugated plate is 10 ° to 80 °. There should be. The height between the top of the ridge and the bottom of the groove in each corrugated plate (corresponding to the amplitude referred to as “wave”) is 3 to 15 mm, and the top of adjacent ridges. The length between them (corresponding to the period width in terms of “wave”) is preferably 5 to 30 mm.

前記気液接触材の下流側端部と親水性エリミネータの上流側端部とが接していることが好ましいが,前記気液接触材の下流側端部と親水性エリミネータの上流側端部との間の距離が,1〜50mmであってもよい。   The downstream end of the gas-liquid contact material and the upstream end of the hydrophilic eliminator are preferably in contact with each other, but the downstream end of the gas-liquid contact material and the upstream end of the hydrophilic eliminator The distance between them may be 1 to 50 mm.

気液接触材に供給する給水部の構成は,例えば散水器によって気液接触材の上部から気液接触材に水を直接給水するものでもよく,また噴霧ノズルのように気液接触材の上流側から気液接触材に水を噴霧するものであってもよい。   The structure of the water supply unit that supplies the gas-liquid contact material may be such that water is supplied directly to the gas-liquid contact material from the upper part of the gas-liquid contact material by a watering device, or upstream of the gas-liquid contact material such as a spray nozzle. You may spray water on a gas-liquid contact material from the side.

本発明によれば,気液接触によって可溶ガスを処理空気から除去するための装置において,従来よりもコンパクトにすることができ,しかも圧力損失の低減を図ることが可能である。   According to the present invention, an apparatus for removing soluble gas from process air by gas-liquid contact can be made more compact than before, and pressure loss can be reduced.

以下,本発明の好ましい実施の形態について説明する。図1は,実施の形態にかかる不純物除去装置1の構成の概略を示しており,略角筒形状のチャンバ2の内部には,処理空気が流れる上流側から順に,入り口3,HEPAフィルタなどのフィルタ4,処理部5,ファン6,出口7が設けられている。ファン6は,気密性を確保するための適宜のパネル材8によって支持されている。   Hereinafter, preferred embodiments of the present invention will be described. FIG. 1 shows an outline of the configuration of an impurity removing apparatus 1 according to an embodiment. Inside a substantially rectangular tube-shaped chamber 2, an inlet 3, a HEPA filter, etc. A filter 4, a processing unit 5, a fan 6, and an outlet 7 are provided. The fan 6 is supported by an appropriate panel material 8 for ensuring airtightness.

処理部5は,親水性素材からなる気液接触材11と,親水性エリミネータ21とを有しており,本実施の形態においては,気液接触材11の下流側端部と,親水性エリミネータ21の上流側端部とは接触しており,これら両端部間の距離は0である。   The processing unit 5 includes a gas-liquid contact material 11 made of a hydrophilic material and a hydrophilic eliminator 21. In the present embodiment, the downstream end of the gas-liquid contact material 11 and a hydrophilic eliminator are provided. 21 is in contact with the upstream end, and the distance between both ends is zero.

気液接触材11は,2種類の波板12,13から構成されている。すなわち図2に示したように,第1の波板である波板12は,その突条部12a及び溝部12bが下流側に向けて斜め下方に向けられたものであり,第2の波板である波板13は,その突条部13a及び溝部13bが上流側に向けて斜め下方に向けられたものである。そしてこれらの波板12,13は,垂直に立てられた状態でチャンバ2内の幅方向に複数並列して配置され,かつ波板12と波板13とは交互に配置されている。そして気液接触材11の気流方向の長さMは,150mmに設定されている。   The gas-liquid contact material 11 is composed of two types of corrugated plates 12 and 13. That is, as shown in FIG. 2, the corrugated sheet 12 as the first corrugated sheet is such that the ridges 12a and the grooves 12b are directed obliquely downward toward the downstream side. The corrugated sheet 13 is such that the protrusion 13a and the groove 13b are directed obliquely downward toward the upstream side. A plurality of these corrugated plates 12 and 13 are arranged in parallel in the width direction in the chamber 2 in a vertically standing state, and the corrugated plates 12 and the corrugated plates 13 are alternately arranged. The length M in the airflow direction of the gas-liquid contact material 11 is set to 150 mm.

波板12,13は親水性の材料から構成されており,その一例としては,例えばポリエステル繊維の不織布をプレス成形し,シリカを添着したものを使用できる。もちろんその他各種の親水性素材を使用することが可能である。波板12,13自体の厚みは,0.5mm程度である。   The corrugated plates 12 and 13 are made of a hydrophilic material. For example, a corrugated sheet made of polyester fiber non-woven and press-fitted with silica can be used. Of course, various other hydrophilic materials can be used. The thickness of the corrugated plates 12 and 13 is about 0.5 mm.

また本実施の形態においては,図3に示したように,波板12における突条部12a及び溝部12bの斜め下方の俯角θ1は,30℃に設定されており,また波板13における突条部13a及び溝部13bの斜め下方の俯角θ2も,30℃に設定されている。これら俯角θ1,θ2は,10°〜80°の範囲で任意に設定できる。   Further, in the present embodiment, as shown in FIG. 3, the depression angle θ1 obliquely below the protrusion 12a and the groove 12b in the corrugated sheet 12 is set to 30 ° C., and the protrusion in the corrugated sheet 13 is provided. The depression angle θ2 obliquely below the portion 13a and the groove 13b is also set to 30 ° C. These depression angles θ1 and θ2 can be arbitrarily set in the range of 10 ° to 80 °.

さらに図4に示したように,波板12における突条部12aの頂上部と溝部12bの底部との間の高さhは5mmに設定され,隣り合う突条部の頂上部間の長さλは15mmに設定されている。高さhは3〜15mmの範囲が好ましく,長さλは5〜30mmの範囲が好ましい。   Further, as shown in FIG. 4, the height h between the top of the ridge 12a and the bottom of the groove 12b in the corrugated sheet 12 is set to 5 mm, and the length between the tops of adjacent ridges. λ is set to 15 mm. The height h is preferably in the range of 3 to 15 mm, and the length λ is preferably in the range of 5 to 30 mm.

一方,親水性エリミネータ21は,図1,図2に示したように,親水性材料をいわゆるつづら折りしてなるプレート22を垂直に立てて,気流と平行となるように,チャンバ2内に複数枚設置されて構成されている。親水性材料としては,例えばポリエステル繊維の不織布をプレス成形し,シリカを添着したものを使用できる。もちろんその他各種の親水性を有する材料を使用することが可能である。プレート22自体の厚みは,1.0mm程度である。また親水性エリミネータ21の気流方向の長さNは,60mmに設定されている。   On the other hand, as shown in FIG. 1 and FIG. 2, the hydrophilic eliminator 21 has a plurality of plates 22 in the chamber 2 so that the plate 22 formed by so-called spelling of the hydrophilic material is set up vertically and parallel to the air flow. Installed and configured. As the hydrophilic material, for example, a non-woven fabric of polyester fiber formed by press molding and silica can be used. Of course, other various hydrophilic materials can be used. The thickness of the plate 22 itself is about 1.0 mm. The length N of the hydrophilic eliminator 21 in the air flow direction is set to 60 mm.

図1に示したように,気液接触材11の上方に水,例えば純水を供給する給水部31は,本実施の形態では散水器を使用している。給水部31から給水された水は,波板12に供給されたものについては,図5に示したように波板12の突条部12a,溝部12bの表面を伝って下降していくが,突条部12a及び溝部12bは,下流側に俯角がつけられているので,その一部が後方へも流れていき,親水性エリミネータ21に供給される。一方波板13に供給されたものについては,図6に示したように波板13の突条部13a,溝部13bの表面を伝って下降していくが,突条部13a及び溝部13bは,上流側に俯角がつけられているので,その一部が前方へも流れていく。そして波板12,13はいずれも親水性材料によって構成されているので,波板12,13の表面全体は薄い水の膜に覆われており,常に濡れた状態となっている。   As shown in FIG. 1, the water supply part 31 which supplies water, for example, pure water, above the gas-liquid contact material 11 uses a sprinkler in this embodiment. As for the water supplied from the water supply part 31, the water supplied to the corrugated sheet 12 descends along the surfaces of the ridges 12a and grooves 12b of the corrugated sheet 12 as shown in FIG. Since the protrusion 12a and the groove 12b have a depression angle on the downstream side, part of the protrusion 12a also flows backward and is supplied to the hydrophilic eliminator 21. On the other hand, about what was supplied to the corrugated sheet 13, as shown in FIG. 6, it goes down along the surface of the protruding part 13a and the groove part 13b of the corrugated sheet 13, but the protruding part 13a and the groove part 13b are Since a depression is added on the upstream side, a part of it flows forward. Since the corrugated plates 12 and 13 are both made of a hydrophilic material, the entire surfaces of the corrugated plates 12 and 13 are covered with a thin water film and are always wet.

供給する水は,処理部5の下面に設置された受容部32からポンプ33でくみ上げ,供給管34から給水部31に供給されるようになっており,また気液接触材11,親水性エリミネータ21を伝って落下してきた水は,この受容部32によって受け止められる。したがって,気液接触材11に供給される水は,循環している。但し,蒸発などによって不足した分など,必要に応じて補給管35によって受容部32に補給される。また受容部32内の水は,適宜排水管36から循環系外に排水可能である。   The supplied water is pumped up by a pump 33 from a receiving part 32 installed on the lower surface of the processing part 5 and supplied to a water supply part 31 from a supply pipe 34, and the gas-liquid contact material 11, a hydrophilic eliminator. The water that has fallen along 21 is received by the receiving portion 32. Therefore, the water supplied to the gas-liquid contact material 11 circulates. However, the receiving portion 32 is replenished by the replenishment pipe 35 as necessary, such as a shortage due to evaporation or the like. Moreover, the water in the receiving part 32 can be appropriately drained out of the circulation system from the drain pipe 36.

本実施の形態にかかる不純物除去装置1は,以上の構成を有しており,処理空気がチャンバ2内に導入されると,フィルタ4で塵埃等が除去された後,まず気液接触材11を通過する。気液接触材11を構成する波板12,13の表面は,既述したように常に濡れた状態となっているから,波板12,13の突条部12a,13a,溝部12a,12bによって構成される空気の流路表面は常に水の薄い膜によって覆われ,処理空気が当該流路を流れる際に,前記表面の水と接触して,可溶ガスは当該水によって吸収,除去される。   The impurity removing apparatus 1 according to the present embodiment has the above-described configuration. When the processing air is introduced into the chamber 2, dust or the like is removed by the filter 4 and then the gas-liquid contact material 11 is firstly removed. Pass through. Since the surfaces of the corrugated plates 12 and 13 constituting the gas-liquid contact material 11 are always wet as described above, the protrusions 12a and 13a and the grooves 12a and 12b of the corrugated plates 12 and 13 are used. The surface of the air flow path is always covered with a thin film of water, and when the processing air flows through the flow path, it comes into contact with the water on the surface and the soluble gas is absorbed and removed by the water. .

そして気液接触材11を通過した空気は,今度は親水性エリミネータ21に慣性衝突する。このとき親水性エリミネータ21のプレート22も気液接触材11の波板12を伝ってきた水によって,その表面が濡れているため,処理空気中の可溶性ガスは,親水性エリミネータ21で保持された水との気液接触によって,吸収,除去される。もちろん親水性エリミネータ21自体は,エリミネータとして機能しているから,気液接触材11から飛散した液滴を受け止め,後方へ飛散させることはない。 Then, the air that has passed through the gas-liquid contact material 11 is then subjected to inertial collision with the hydrophilic eliminator 21. At this time, since the surface of the plate 22 of the hydrophilic eliminator 21 is also wetted by the water transmitted through the corrugated plate 12 of the gas-liquid contact material 11, the soluble gas in the processing air is held by the hydrophilic eliminator 21. Absorbed and removed by gas-liquid contact with water. Of course, since the hydrophilic eliminator 21 itself functions as an eliminator, it does not receive the liquid droplets scattered from the gas- liquid contact material 11 and scatter them backward.

以上のようにして気液接触材11と親水性エリミネータ21とによって可溶ガスが除去された空気は,清浄空気としてファン6によって出口7からチャンバ外へと導出される。   The air from which the soluble gas has been removed by the gas-liquid contact material 11 and the hydrophilic eliminator 21 as described above is led out of the chamber from the outlet 7 by the fan 6 as clean air.

このように本実施の形態にかかる不純物除去装置1では,後方への液滴,ミストの飛散防止を担っている親水性エリミネータ21自体も可溶性ガスの除去効果を有しているので,気液接触材11自体の負担を軽減させることができ,その分気液接触材11の気流方向の長さを短縮することができる。また親水性エリミネータ21も,最小限水滴の捕獲性能を有するもので足り,その分圧力損失の低減が図れる。   As described above, in the impurity removing apparatus 1 according to the present embodiment, the hydrophilic eliminator 21 itself, which is responsible for preventing the backward droplets and mist from being scattered, also has a soluble gas removing effect, so that the gas-liquid contact is performed. The burden on the material 11 itself can be reduced, and the length of the gas-liquid contact material 11 in the airflow direction can be shortened accordingly. The hydrophilic eliminator 21 is also sufficient to have a minimum water droplet capturing performance, and the pressure loss can be reduced accordingly.

さらに親水性エリミネータ21への給水については,気液接触材11に供給された水の一部が使用されているので,敢えて独立して親水性エリミネータ21に供給する必要はなく,その分給水部を省略でき,またポンプも別途も受ける必要はない。したがってかかる点からも装置全体がコンパクトになっている。   Furthermore, as for the water supply to the hydrophilic eliminator 21, since a part of the water supplied to the gas-liquid contact material 11 is used, it is not necessary to supply the hydrophilic eliminator 21 independently and its water supply unit There is no need to receive a pump separately. Therefore, the entire apparatus is also compact from this point.

なお前記実施の形態では,給水部31として散水器を使用したが,これに代えて噴霧ノズルを気液接触材11の上流側に設置して,気液接触材11に向けて水を噴霧するものを使用してもよい。   In the above embodiment, a watering device is used as the water supply unit 31. Instead, a spray nozzle is installed on the upstream side of the gas-liquid contact material 11 to spray water toward the gas-liquid contact material 11. Things may be used.

また前記実施の形態では,気液接触材11の下流側端部と,親水性エリミネータ21の上流側端部とが接触するように,気液接触材11と親水性エリミネータ21との間の距離は0にしていたが,適宜両者の間に距離をおいてこれらを設置してもよい。すなわち図7に示したように,気液接触材11の下流側端部と,親水性エリミネータ21の上流側端部との間の距離をLとすると,L=1〜50mmの範囲で両者を設置してもよい。   Moreover, in the said embodiment, the distance between the gas-liquid contact material 11 and the hydrophilic eliminator 21 so that the downstream edge part of the gas-liquid contact material 11 and the upstream edge part of the hydrophilic eliminator 21 may contact. Was set to 0, but they may be installed with a distance between them as appropriate. That is, as shown in FIG. 7, when the distance between the downstream end of the gas-liquid contact material 11 and the upstream end of the hydrophilic eliminator 21 is L, both are within a range of L = 1 to 50 mm. May be installed.

より詳述すると,
(1)給水を気液接触材11の上部から行い,かつ気液接触材11内部通過平均風速が3m/s未満の場合:
L=2mm以内とする。但し気液接触材11の構造として,その下流端部側に少なくとも5〜10%程度の循環水が到達できる構造とするのがよい。
(2)給水を気液接触材11の上部から行い,かつ気液接触材11内部通過平均風速が3m/s以上の場合:
通過風速が速くなると気液接触材11の下流端部からの飛散水が多くなることから,親水性エリミネータ21との間隔を上記(1)の場合より長くしても親水性エリミネータ21の表面は親水可能となる。但し,飛散水の落下角度(垂直方向に対して下流側に飛散する角度)が比較的小さいことから,L=20mm以内が好ましい。これ以上長くすると,親水性エリミネータ21上部側への給水量が減り,水の入れ替えが極端に少なくなってガス除去性能に影響が出るためである。
(3)給水が,気液接触材11の上流側からの噴霧方式の場合:
この場合は,噴霧水の一部は気液接触材11で捕獲されずに直接下流側の親水性エリミネータ21に到達できることから,親水性エリミネータ21と気液接触材11との間の設置間隔には制限はなくなるが,装置のコンパクト化を考慮した場合,より短いのが望ましいことには変わりない。
More specifically,
(1) When supplying water from the top of the gas-liquid contact material 11 and the average air speed passing through the gas-liquid contact material 11 is less than 3 m / s:
L = 2mm or less. However, as the structure of the gas-liquid contact material 11, it is preferable that at least 5 to 10% of circulating water reaches the downstream end side.
(2) When supplying water from the top of the gas-liquid contact material 11 and the average wind speed passing through the gas-liquid contact material 11 is 3 m / s or more:
When the passing wind speed increases, the amount of scattered water from the downstream end of the gas-liquid contact material 11 increases. Therefore, even if the distance from the hydrophilic eliminator 21 is longer than in the case (1), the surface of the hydrophilic eliminator 21 is It becomes hydrophilic. However, since the falling angle of the scattered water (the angle at which it scatters downstream with respect to the vertical direction) is relatively small, L is preferably within 20 mm. If the length is longer than this, the amount of water supplied to the upper side of the hydrophilic eliminator 21 is reduced, and the replacement of water is extremely reduced, which affects the gas removal performance.
(3) When the water supply is sprayed from the upstream side of the gas-liquid contact material 11:
In this case, since a part of the spray water can reach the downstream hydrophilic eliminator 21 without being captured by the gas-liquid contact material 11, the installation interval between the hydrophilic eliminator 21 and the gas-liquid contact material 11 is increased. Is no longer a limitation, but it is still desirable to be shorter when considering compact equipment.

次に上記本実施の形態にかかる不純物除去装置1を実際に運転した際の結果について説明する。
まず処理条件としては,単位処理空気当たりの給水量L/G(L:補給水の質量,G:処理空気の質量)が0.05,処理風速を2.5mとした。
圧力損失=105Pa
飽和効率=95%(飽和効率は,気液接触効率を示す一つの指標で,この
数値が高いほどガス除去性能も高いことを意味する。)
装置サイズ(気流方向)=0.3m
Next, the results when the impurity removal apparatus 1 according to the present embodiment is actually operated will be described.
First, as treatment conditions, the water supply amount L / G (L: mass of makeup water, G: mass of treatment air) per unit treatment air was 0.05, and the treatment wind speed was 2.5 m.
Pressure loss = 105Pa
Saturation efficiency = 95% (Saturation efficiency is an index indicating gas-liquid contact efficiency. The higher this value, the higher the gas removal performance.)
Device size (air flow direction) = 0.3m

一方,特許文献1〜4に公表されている各性能は以下のようになっている
圧力損失 200〜460Pa(エリミネータの圧損含む)at2.5m/s換算
飽和効率 91〜96%
装置サイズ(気流方向)=1〜3.5m
On the other hand, each performance disclosed in Patent Documents 1 to 4 is as follows: Pressure loss 200 to 460 Pa (including pressure loss of eliminator) at 2.5 m / s equivalent Saturation efficiency 91 to 96%
Device size (air flow direction) = 1 to 3.5m

このように,実施の形態にかかる不純物除去装置1は,圧力損失と装置サイズに関して,従来技術に対して大幅削減を達成した。一方,飽和効率においては同等である。したがって本発明によれば,設置スペースおよび装置コストの削減と送風動力エネルギーおよびコストの大幅削減を達成することが可能である。   As described above, the impurity removing apparatus 1 according to the embodiment achieves a significant reduction with respect to the prior art with respect to pressure loss and apparatus size. On the other hand, the saturation efficiency is equivalent. Therefore, according to the present invention, it is possible to achieve a reduction in installation space and device cost and a significant reduction in blast power energy and cost.

本発明は,可溶性ガスを除去し,かつ水滴やミストを処理後の空気に排出させないことから,例えば半導体工場や精密部品工場などに清浄空気を供給する際に特に有用である。   The present invention is particularly useful when supplying clean air to, for example, a semiconductor factory or a precision parts factory, because soluble gas is removed and water droplets and mist are not discharged into the processed air.

実施の形態にかかる不純物除去装置の構成の概略を示す説明図である。It is explanatory drawing which shows the outline of a structure of the impurity removal apparatus concerning embodiment. 実施の形態にかかる不純物除去装置における処理部の斜視図である。It is a perspective view of the process part in the impurity removal apparatus concerning embodiment. 2種類の波板における突条部の俯角を示す説明図である。It is explanatory drawing which shows the depression angle of the protrusion part in two types of corrugated sheets. 波板の突条部間の距離と突条部と溝部との間の高さを示す説明図である。It is explanatory drawing which shows the distance between the rib parts of a corrugated sheet, and the height between a rib part and a groove part. 第1の波板における水の流れを示す説明図である。It is explanatory drawing which shows the flow of the water in a 1st corrugated sheet. 第2の波板における水の流れを示す説明図である。It is explanatory drawing which shows the flow of the water in a 2nd corrugated sheet. 気液接触材と親水性エリミネータとの間の距離を説明するための斜視図である。It is a perspective view for demonstrating the distance between a gas-liquid contact material and a hydrophilic eliminator.

符号の説明Explanation of symbols

1 不純物除去装置
2 チャンバ
5 処理部
11 気液接触材
12,13 波板
12a,13a 突条部
12b,13b 溝部
21 親水性エリミネータ
31 給水部
DESCRIPTION OF SYMBOLS 1 Impurity removal apparatus 2 Chamber 5 Processing part 11 Gas-liquid contact material 12, 13 Corrugated plate 12a, 13a Projection part 12b, 13b Groove part 21 Hydrophilic eliminator 31 Water supply part

Claims (7)

気液接触によって処理空気中の可溶性ガスを吸収除去する装置であって,
前記処理空気をその内部で上流から下流に流通させることが可能なチャンバと,
前記チャンバ内に収容され,上流側に親水性素材からなる気液接触材を有し,下流側に親水性エリミネータを有する処理部と,
前記気液接触材に水を供給する給水部と,
を有し,
前記気液接触材のみ,親水性材料で形成された複数の波板が,垂直に立てられた状態でチャンバ内の幅方向に並列して配置され,かつ,波板における突条部及び溝部が下流側に向けて斜め下方に向けられた第1の波板と,波板における突条部及び溝部が上流側に向けて斜め下方に向けられた第2の波板とが,交互に配置されている構造とし,
前記気液接触材に向けて供給された水の一部が,当該気液接触材から直接前記親水性エリミネータに供給され,当該親水性エリミネータの表面を濡らすように構成されたことを特徴とする,不純物除去装置。
A device that absorbs and removes soluble gas in the processing air by gas-liquid contact,
A chamber capable of circulating the processing air from upstream to downstream in the interior;
A processing unit housed in the chamber, having a gas-liquid contact material made of a hydrophilic material on the upstream side, and having a hydrophilic eliminator on the downstream side;
A water supply unit for supplying water to the gas-liquid contact material;
Have
A plurality of corrugated plates made of a hydrophilic material only in the gas-liquid contact material are arranged in parallel in the width direction in the chamber in a vertically standing state, and protrusions and grooves on the corrugated plates are provided. The first corrugated plate directed obliquely downward toward the downstream side and the second corrugated plate in which the ridges and the grooves in the corrugated plate are directed obliquely downward toward the upstream side are alternately arranged. Structure,
A part of the water supplied toward the gas-liquid contact material is directly supplied from the gas-liquid contact material to the hydrophilic eliminator, and is configured to wet the surface of the hydrophilic eliminator. Impurity removal device.
前記第1の波板における突条部及び溝部の斜め下方の俯角は10°〜80°であり,前記第2の波板における突条部及び溝部の斜め下方の俯角は10°〜80°であることを特徴とする,請求項1記載の不純物除去装置。 The diagonal angle of the ridge and groove in the first corrugated plate is 10 ° to 80 °, and the diagonal angle of the ridge and groove in the second corrugated plate is 10 ° to 80 °. characterized in that there, impurity removal apparatus according to claim 1. 前記各波板における突条部の頂上部と溝部の底部との間の高さは3〜15mmであり,かつ隣り合う突条部の頂上部間の長さは5〜30mmであることを特徴とする,請求項1又は2に記載の不純物除去装置。 The height between the top of the ridge and the bottom of the groove in each corrugated plate is 3 to 15 mm, and the length between the tops of adjacent ridges is 5 to 30 mm. The impurity removal apparatus according to claim 1 or 2 . 前記気液接触材の下流側端部と親水性エリミネータの上流側端部とが接していることを特徴とする,請求項1〜3のいずれかに記載の不純物除去装置。 Characterized in that the upstream end of the downstream end portion and a hydrophilic eliminator of the gas-liquid contact member is in contact, impurity removal device according to any one of claims 1 to 3. 前記気液接触材の下流側端部と親水性エリミネータの上流側端部との間の距離は,1〜50mmであることを特徴とする,請求項1〜3のいずれかに記載の不純物除去装置。 The impurity removal according to any one of claims 1 to 3 , wherein the distance between the downstream end of the gas-liquid contact material and the upstream end of the hydrophilic eliminator is 1 to 50 mm. apparatus. 前記給水部は,気液接触材の上部から気液接触材に水を直接給水するものであることを特徴とする,請求項1〜5のいずれかに記載の不純物除去装置。 The water supply unit is characterized in that it is intended to feed water directly water into gas-liquid contact member from the upper part of the gas-liquid contact member, an impurity removing device according to claim 1. 前記給水部は,気液接触材の上流側から気液接触材に水を噴霧するものであることを特徴とする,請求項1〜5のいずれかに記載の不純物除去装置。 The water supply unit is characterized in that it is intended to spray water into the gas-liquid contact member from the upstream side of the gas-liquid contact member, an impurity removing device according to claim 1.
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JPH09239224A (en) * 1996-03-06 1997-09-16 Takasago Thermal Eng Co Ltd Apparatus for removing gas impurity
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JP2004351416A (en) * 2003-05-16 2004-12-16 Sulzer Chemtech Ag Use of metal fibrous packing with cross-channel structure

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