JP4590722B2 - Substrate manufacturing method for mounting optical components - Google Patents

Substrate manufacturing method for mounting optical components Download PDF

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Publication number
JP4590722B2
JP4590722B2 JP2000371096A JP2000371096A JP4590722B2 JP 4590722 B2 JP4590722 B2 JP 4590722B2 JP 2000371096 A JP2000371096 A JP 2000371096A JP 2000371096 A JP2000371096 A JP 2000371096A JP 4590722 B2 JP4590722 B2 JP 4590722B2
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Japan
Prior art keywords
optical
glass substrate
wiring layer
optical component
photosensitive glass
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JP2000371096A
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Japanese (ja)
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JP2002174742A (en
Inventor
淳 佐々木
健太 四井
初音 原
守 石崎
浩二 市川
健人 塚本
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Toppan Inc
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Toppan Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation

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  • Optical Couplings Of Light Guides (AREA)
  • Optical Integrated Circuits (AREA)
  • Structure Of Printed Boards (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は光部品を搭載する光部品搭載用基板、及び光部品搭載用基板に光部品等を搭載した実装基板、更に実装基板が導電性バンプを介して接合しているプリント基板に関する。
【0002】
【従来の技術】
より速く演算処理が行えるコンピュータを作るために、CPUのクロック周波数は益々増大する傾向にあり、現在では1GHzオーダーのものが出現するに至っている。この結果、コンピュータの中のプリント基板上の銅による電気配線には高周波電流の流れる部分が存在する事になるので、ノイズの発生により誤動作を生じたり、また電磁波が発生して周囲に悪影響を与えることにもなる。
【0003】
このような問題を解決するために、プリント基板上の銅による電気配線の一部を光ファイバー又は光導波路(以下、光配線という)に置き換え、電気信号の代わりに光信号を利用することが行われている。なぜなら、光信号の場合は、ノイズ及び電磁波の発生を抑えられるからである。
【0004】
一般的にはIC等と同じようにレーザーダイオード(LD)やフォトダイオード(PD)等の光電素子は基板表面に実装され、導波路によって基板表面で信号電送を行っている。このような光回路においては、IC等電気部品の数が増加してくると光導波路を交差させる必要が生じ、光導波路と光電素子との光軸合わせが次第に困難になるという問題を抱えている。
【0005】
更に詳述すると、現在低損失光ファイバの開発による光通信システムの実用化に伴い、種々の光通信用部品の開発が望まれている。そして、これら光部品を高密度に実装する光配線技術、特に光導波路技術の確立が望まれている。一般に、光導波路には、▲1▼光損失が小さい、▲2▼製造が容易、▲3▼コア、クラッドの屈折率差を制御できる等の条件が要求される。これまでに低損失な光導波路としては石英系が主に検討されている。光ファイバーで実証済みのように石英は光透過性が極めて良好であるため導波路とした場合も波長が1. 3μm帯においても0. 1dB/ cm以下の低損失化が達成されている。しかし、石英は柔軟性に乏しくシリコン基板上等に作製する必要があり、そのままプリント基板に搭載するなら、電気部品の接続に多大な制約を受けてしまう問題を抱えていた。
【0006】
一方、近年上記光導波路の中でポリマを用いた光導波路は簡易なプロセスで低コストに製造できる可能性があることから注目されている。一例としての、ポリメチルメタクリレート(PMMA)、ポリスチレン(PS)、ポリカーボネート(PC)等のプラスチック系光導波路は石英系光導波路と比較して可視波長より長波長領域での十分な低光損失が達成されていない等の欠点はあるが、低い温度での形成が可能であり、加工が容易である。製造方法はシリコン基板等の基材上に低屈折率のポリマ材料からなるクラッドと高屈折率のポリマ材料からなるコア層を順次形成し、フォトレジストパターンをマスクとしてドライエッチングプロセスを行う。こうして断面概略矩形状のポリマコア層を加工した後、再び低屈折率のポリマ材料によって上部にクラッド層を形成しトータル膜厚で30〜60μmの光導波路が形成される。
【0007】
上記工程の後、光導波路をシリコン等の基材からフッ酸等を用いて剥離し、電気配線板へ接着剤を用いて貼り合わせ、光部品搭載用基板が作られる。
【0008】
しかしながら、ポリマー光導波路をシリコン基板などから剥離し一度フィルムにすると、熱膨張係数差起因で収縮が生じてしまい、電気配線板への十分な張り合わせ精度を得られず問題となっていた。場合によっては収縮要因によってクラック等の問題を伴い屈折率が変動し光導波路の光損失も生じ、まだ実用化に至っていない。また、電気配線板に張り合わせる際の上下方向の精度も厳しく、光学部品搭載と同じ±1μm以下が要求され、張り合わせには多大な困難を伴っていた。
【0009】
【発明が解決しようとする課題】
本発明は、係る従来技術の状況に鑑みてなされたもので、電気部品や光部品の光導波路上への高密度実装が可能で、しかも光導波路と光部品との光軸合わせを容易に実現できる光部品搭載用基板及びプリント板の提供を課題とする。
【0010】
本発明の一実施形態は、感光性ガラス基板の一面に光部品搭載部、他面に光配線層を少なくとも有する光部品搭載用基板の製造方法であって、前記感光性ガラス基板を紫外線照射によって露光し、熱処理及び酸処理による現像処理を行うことにより該感光性ガラス基板を貫通するビアホールを形成する工程と、前記ビアホールを樹脂で穴埋めすることにより前記感光性ガラス基板の一方の面を平滑な状態にする工程と、前記ビアホールが前記樹脂で穴埋めされた前記感光性ガラス基板の前記一方の面に光配線材料を塗布する工程と、前記光配線材料をパターニングし、コア及びクラッドを有する光配線層を形成する工程と、光部品と光配線層のコアとを光学的に結合するための光路変換ミラーを前記光配線層中に形成する工程と、前記光配線層が形成された前記感光性ガラス基板を加熱し、前記ビアホールに充填された前記樹脂を熱分解する工程と、前記光配線層に、前記ビアホールと対応する位置に貫通孔を形成する工程と、めっきにより前記ビアホール内および前記貫通孔内に導体を析出させると共に、前記感光性ガラス基板の前記一方の面と対向する他方の面、並びに、前記感光性ガラス基板の前記一方の面上に形成された光配線層の表面、のいずれからも突出するように、めっきを十分成長させることにより、前記感光性ガラス基板の他方の面上に、光部品と接続するパッドを形成するとともに、前記光配線層の表面上に、バンプを形成する工程と、を備えたことを特徴とする光部品搭載用基板製造方法である。
また、前記感光性ガラス基板は、Au、CeO2、からなる群から選ばれた少なくとも1つ以上の材料を含むことが好ましい。
【0011】
【発明の実施の形態】
以下、本発明の実施の形態を図面を用いて説明する。図1は本発明の光部品搭載用基板及び実装基板を示す説明図である。本発明の光部品搭載用基板10は、ガラス基板1の一面に光部品搭載部、他面にコアとクラッドから構成された光配線層を少なくとも有するとともに、前記光部品搭載部と導通し、ガラス基板を貫通するビアホールを具備する。これに更に光部品14、電気部品15を搭載し、実装基板となる。そして、実装基板(光部品搭載用基板10)は図中下側に示したプリント基板20と接続される。
【0012】
更に詳述すると、光部品搭載用基板10は基材としてガラス基板1を用いる。このガラス基板の一面に光部品搭載部(パッド、電気配線等)、他面にコアとクラッドから構成された光配線層を少なくとも形成する。また、ガラス基板1には貫通する孔2があけられている。各孔2の内部はメッキで設けた導体によって埋められており、下部にはプリント配線20の電極21の位置に対応するバンプが設けられている。これにより光部品と電気部品と、プリント配線基板20側の電極を電気的に接続する事ができる。
【0013】
この構成を採用することにより、光導波路を剥離しフィルムにするといった工程が不要であるとともに、電気配線板との位置精度も良好となる。更に、不透明な基板の一面に光部品搭載部、他面に光配線層の構成を採用すると、光部品搭載部と光配線層ミラーの間の基板にレーザー光を通過させるための開口部を設ける必要が有るが、本発明の光部品搭載用基板の場合、ガラス基板がレーザー光を吸収しなければ、必ずしも開口部を設ける必要はない。
【0014】
次に、図1に示した光部品搭載用基板10の製造方法について説明する。図2〜10は光部品搭載用基板10の製造工程を示す工程図である。尚、説明中の光部品搭載(電気配線層)形成面をa面、バンプ及び光配線層形成面をb面とする。
【0015】
ガラス基板1はLi2 O−Al2 3 −SiO2 (Au, CeO2 )系の化学的加工性を有する感光性ガラス板であることが好ましい。また、このガラス基板1のa及びb面は優れた平滑性を有している。このガラス基板に孔状を有したフォトマスクを介してHg−Xeランプを100mJ/ cm2 照射し(図2参照)、現像を行った。この感光性ガラス中の成分であるAu、CeO2 は、紫外線照射によって露光されると、露光部分に感光性金属Au、CeO2 の粒子からなる核が生成し潜像(図示せず)を形成できる。
【0016】
その後、露光によって潜像を形成したガラスを550℃乃至620℃で熱処理し、酸に溶出し易い結晶を析出させる。この熱処理により、上記露光部分(潜像)内に存在する感光性金属の粒子を核として、リチウムメタシリケート結晶が析出する。このようにして得た結晶は酸に容易に溶解する性質を有するので、希弗化水素酸で酸処理して、現像処理を行った(図3参照)。
【0017】
上記の工程による処理の結果、感光性のガラス基板1にビアホール2が形成される。このビアホールは感光性のガラス基板1を貫通する孔であり、接続すべきプリント基板20側の電極の位置と合致するように形成されている。
【0018】
ビアホール2が形成された感光性のガラス基板1のb面に、光又は熱硬化性の樹脂3でビアホール2を充填しガラス基板1のb面を平滑な状態にした後、光配線層材料(例えばポリイミド)で下部クラッド4、コア5と順次塗布する(図4参照)。
【0019】
次いで、光導波路材の上部にフォトレジスト6を塗布し(図5参照)、導波路パターン用マスクで露光、フォトレジスト6を現像し、露光された部分を除去する。そして、反応性イオンエッチングによって断面が矩形状になるようにコアをパターニングし、次いでフォトレジスト5を除去する。
【0020】
なお、前記コアは、直線、曲線、S字曲線、平行線などの少なくとも1つを有して形成されている。
【0021】
更にコア配線パターンの所定の個所にAl膜等が蒸着されたミラー7を形成し、再び上部クラッド8を塗布し光配線層9を形成する(図6、図7参照)。ミラーは上部クラッドを塗布する前にレーザー等によりコアパターンに対して概略45°に加工し、Al膜を選択的に蒸着する。尚、この時、光部品搭載のためのアライメントマークをAl膜で下部クラット上の任意の位置に形成しておく。
【0022】
この後、約350℃で光配線層の加熱処理工程を行う。ビアホール2に充填した樹脂はここで熱分解し除去される(図8参照)。樹脂の分解成分がホール内に残る場合は、重クロム酸、過マンガン酸等で有機残さを除去できる。
【0023】
感光性ガラス基板1のビアホール2の位置に合致するように、光配線層へレーザー照射等によりブラインドビア状に追加加工を施し、光配線層側にもビアホール2を形成する。そして、メッキによりビアホール2内に導体を析出させると共に、ガラス基板の面よりも突出するように、めっきを十分成長させバンプ11及びパッド12を形成する(図9参照)。
【0024】
なお、メッキを行う際には、ビアホール2の内壁表面にのみ低粘度の接着剤層を選択的に塗布し、接着剤層上へメッキ処理を施すことにより、感光性ガラス界面とメッキ金属膜の接着性をさらに向上させることが出来る。
【0025】
以上のようにして製造された光部品搭載用基板10上部へ、光学素子(LD、PD)及びLSIチップ等を、ミラー工程と同時に下部クラッドに形成したアライメントマークを頼りに光軸がずれないように搭載することにより実装基板を作成する。感光性ガラス基板1は表面平滑である為、アライメントマークとの高さ方向の距離を正確に把握できるので、光部品搭載用基板10の端面に光軸がずれないように光学部品を設置することも可能である。更に、この後、光部品搭載用基板10自体をプリント基板に接続し図1の第1の例を完成させる。
【0026】
PD・LDといった光学部品やLSIといった電気部品はリード線或いはバンプを介して光部品搭載用基板上部の配線パターンに接続されている。一方、プリント基板20の上面には、光部品搭載用基板10のバンプ11と電気的に接続するための電極21が設けられ、相互に接続されている。これにより、PD、LDといった光学部品やLSIといった電気部品とプリント基板20とが電気的に接続される。
【0027】
また、プリント基板20からの電気信号の一部がLDにより光信号に変換され、その光信号は導波路へと入射されていく。そして、光信号がミラーで反射され光導波路内を伝送し、再びミラー反射されPDで電気信号に変換され、LSI等で信号処理が行われる。こうして電気的な接続と光接続が高信頼性で実現できる。このような光部品搭載用基板を複数個プリント基板に搭載し光通信装置、光情報装置の高度化を図っても良い。
【0028】
図10は本発明の光部品搭載用基板及び実装基板を搭載したプリント基板の第2の例を示す図である。これは、光部品搭載部が電気配線層13であり、多層構造となっている場合の例である。
【0029】
この例に示す光部品搭載用基板10において感光性ガラス基板1のビアホール2は、導電性物質で埋められており光配線層の配線電極及びその上層の金属材料と絶縁材料から構成された電気配線層13の配線電極が光部品や電気部品の電極に電気配線密度を対応させてビアホール2と接続されている。ここで電気配線層13は、公知のアディティブ法やサブトラクト法を用いて形成することができる。
【0030】
一方、ガラス基板b面に形成されたビアホール2からのバンプ11の位置はプリント基板20の電極21に合致すべき位置となっている。
【0031】
このようにして、製造された光部品搭載用基板10を用いて光学素子(LD、PD)及びLSI(ベア)チップ等を上部に搭載し、光部品搭載用基板をプリント基板に接続される。このようにして、プリント基板20からの電気信号の一部がLDによって光信号によって変換され、ミラーで反射された光信号が光導波路内を伝送する。光伝送した信号は再びミラーで90°光路変換されPDで電気信号に変換され、LSI等で信号処理される。こうして電気的な接続と光接続が高信頼性で実現できる。
【0032】
尚、光導波路には、石英、ポリカーボネート、ポリメタクリル酸メチル、ポリスチレンからなるポリマー材料であるか、或いはSiO2 - Ge2 、ZrF4 - BaF2 - GdF3 - AlF3 、As- S、As- Ge- Seなどからなるガラス系或いはCsBr、KRS- 5などからなる結晶系の何れかを用いて構成しても同図10の様になる。
【0033】
【発明の効果】
本発明の光部品搭載用基板は、直接ガラス基板上に配線した光配線層を形成する。従って、光学部品と光配線層の光軸合わせは高精度となる。また、光配線層(導波路フィルム)を剥離させないため、収縮に伴う屈折率といった諸物性の変動もない。更に、光部品搭載部が電気配線層であれば、光部品搭載部に搭載される光部品、電気部品の電極に電気配線密度を対応させた実装基板の提供が可能となり、ビアホールと導電性バンプを介して低配線密度のプリント基板に接続できる。
【0034】
以上のようにして、伝送路としての光導波路の接続特性や信頼性に格段に優れまた、配線設計の自由度の高い、安価で実用的な光部品搭載用基板及び実装基板、並びにプリント基板を提供できる。
【0035】
【図面の簡単な説明】
【図1】本発明の光部品搭載用基板、実装基板並びにプリント基板を示す説明図である。
【図2】光部品搭載用基板の製造工程を示す説明図である。
【図3】光部品搭載用基板の製造工程を示す説明図である。
【図4】光部品搭載用基板の製造工程を示す説明図である。
【図5】光部品搭載用基板の製造工程を示す説明図である。
【図6】光部品搭載用基板の製造工程を示す説明図である。
【図7】光部品搭載用基板の製造工程を示す傾斜図である。
【図8】光部品搭載用基板の製造工程を示す説明図である。
【図9】光部品搭載用基板を示す説明図である。
【図10】本発明の光部品搭載用基板、実装基板並びにプリント基板を示す説明図である。
【符号の説明】
1・・・ガラス基板
2・・・孔(ビアホール)
3・・・光又は熱硬化性樹脂
4・・・下部クラッド
5・・・コア
6・・・フォトレジスト
7・・・ミラー
8・・・上部クラッド
9・・・光配線層
10・・・光部品搭載用基板
11・・・バンプ
12・・・パット
13・・・電気配線層
14・・・光部品
15・・・電気部品
20・・・プリント基板
21・・・電極
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an optical component mounting substrate on which an optical component is mounted, a mounting substrate in which an optical component or the like is mounted on the optical component mounting substrate, and a printed circuit board in which the mounting substrate is bonded via conductive bumps.
[0002]
[Prior art]
In order to make a computer that can perform arithmetic processing faster, the clock frequency of the CPU tends to increase more and more, and now the one of the order of 1 GHz has appeared. As a result, there is a portion where high-frequency current flows in the copper electrical wiring on the printed circuit board in the computer, so that malfunctions may occur due to the generation of noise, and electromagnetic waves may be generated, adversely affecting the surroundings. It will also be.
[0003]
In order to solve such problems, a part of the electrical wiring made of copper on the printed circuit board is replaced with an optical fiber or an optical waveguide (hereinafter referred to as an optical wiring), and an optical signal is used instead of the electrical signal. ing. This is because the generation of noise and electromagnetic waves can be suppressed in the case of optical signals.
[0004]
Generally, like an IC or the like, a photoelectric element such as a laser diode (LD) or a photodiode (PD) is mounted on a substrate surface, and signal transmission is performed on the substrate surface by a waveguide. In such an optical circuit, when the number of electrical components such as ICs increases, it is necessary to cross the optical waveguide, and there is a problem that the optical axis alignment between the optical waveguide and the photoelectric element becomes increasingly difficult. .
[0005]
More specifically, along with the practical application of optical communication systems through the development of low-loss optical fibers, development of various optical communication components is desired. And establishment of the optical wiring technique which mounts these optical components in high density, especially an optical waveguide technique is desired. In general, optical waveguides are required to satisfy the following conditions: (1) small optical loss, (2) easy manufacture, and (3) control of refractive index difference between core and clad. So far, quartz-based optical waveguides have been mainly studied as low-loss optical waveguides. As demonstrated by optical fibers, quartz has extremely good light transmission, so that a loss of 0.1 dB / cm or less is achieved even when a waveguide is used, and even when the wavelength is 1.3 μm. However, quartz has poor flexibility and needs to be produced on a silicon substrate or the like. If it is mounted on a printed circuit board as it is, there is a problem that connection of electric parts is greatly restricted.
[0006]
On the other hand, in recent years, an optical waveguide using a polymer among the optical waveguides has attracted attention because it may be manufactured at a low cost by a simple process. As an example, plastic optical waveguides such as polymethyl methacrylate (PMMA), polystyrene (PS), and polycarbonate (PC) achieve sufficiently low optical loss in the wavelength region longer than the visible wavelength compared to quartz optical waveguides. Although there are drawbacks such as not being performed, formation at a low temperature is possible and processing is easy. In the manufacturing method, a clad made of a low refractive index polymer material and a core layer made of a high refractive index polymer material are sequentially formed on a base material such as a silicon substrate, and a dry etching process is performed using the photoresist pattern as a mask. After the polymer core layer having a substantially rectangular cross section is processed in this way, a clad layer is formed on the upper portion again with a low refractive index polymer material to form an optical waveguide having a total film thickness of 30 to 60 μm.
[0007]
After the above process, the optical waveguide is peeled off from a base material such as silicon using hydrofluoric acid or the like, and bonded to the electric wiring board using an adhesive to produce an optical component mounting substrate.
[0008]
However, once the polymer optical waveguide is peeled off from a silicon substrate or the like to form a film, shrinkage occurs due to a difference in thermal expansion coefficient, and sufficient bonding accuracy to the electric wiring board cannot be obtained. In some cases, the refractive index fluctuates with a problem such as a crack due to a shrinkage factor, causing optical loss of the optical waveguide, and has not yet been put into practical use. In addition, the accuracy in the vertical direction when pasting to the electric wiring board is strict, and the same ± 1 μm or less as that of the optical component mounting is required, and the pasting is accompanied with great difficulty.
[0009]
[Problems to be solved by the invention]
The present invention has been made in view of the state of the related art, and enables high-density mounting of an electrical component or an optical component on an optical waveguide, and easily realizes optical axis alignment between the optical waveguide and the optical component. An object is to provide an optical component mounting substrate and a printed board that can be used.
[0010]
One embodiment of the present invention is a method for manufacturing an optical component mounting substrate having at least one optical component mounting portion on one surface and an optical wiring layer on the other surface, and the photosensitive glass substrate is irradiated with ultraviolet rays. A step of forming a via hole penetrating the photosensitive glass substrate by performing exposure and heat treatment and development treatment by acid treatment; and filling one surface of the photosensitive glass substrate with a resin to smooth the one surface of the photosensitive glass substrate A step of applying an optical wiring material to the one surface of the photosensitive glass substrate in which the via hole is filled with the resin, and an optical wiring having a core and a clad by patterning the optical wiring material Forming a layer, forming an optical path conversion mirror in the optical wiring layer for optically coupling the optical component and the core of the optical wiring layer, and the optical wiring Heating the photosensitive glass substrate formed with a thermal decomposition of the resin filled in the via hole, forming a through hole in the optical wiring layer at a position corresponding to the via hole, and plating A conductor is deposited in the via hole and in the through-hole, and is formed on the other surface facing the one surface of the photosensitive glass substrate and on the one surface of the photosensitive glass substrate. By sufficiently growing the plating so as to protrude from any of the surfaces of the optical wiring layer, a pad connected to an optical component is formed on the other surface of the photosensitive glass substrate, and the optical wiring layer And a step of forming bumps on the surface of the optical component mounting substrate.
The photosensitive glass substrate preferably contains at least one material selected from the group consisting of Au and CeO2.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is an explanatory view showing an optical component mounting board and a mounting board according to the present invention. The optical component mounting substrate 10 of the present invention has at least an optical wiring layer composed of an optical component mounting portion on one surface of the glass substrate 1 and a core and a clad on the other surface, and is electrically connected to the optical component mounting portion. A via hole penetrating the substrate is provided. Further, an optical component 14 and an electrical component 15 are mounted thereon to form a mounting board. The mounting board (optical component mounting board 10) is connected to the printed board 20 shown on the lower side in the figure.
[0012]
More specifically, the optical component mounting substrate 10 uses the glass substrate 1 as a base material. At least an optical wiring layer composed of a core and a clad is formed on one surface of the glass substrate and an optical component mounting portion (pad, electrical wiring, etc.) on the other surface. Further, the glass substrate 1 is provided with a through hole 2. The inside of each hole 2 is filled with a conductor provided by plating, and a bump corresponding to the position of the electrode 21 of the printed wiring 20 is provided below. Thereby, the optical component, the electrical component, and the electrode on the printed wiring board 20 side can be electrically connected.
[0013]
By adopting this configuration, the process of peeling the optical waveguide to form a film is unnecessary, and the positional accuracy with respect to the electric wiring board is also improved. Further, when an optical component mounting portion is adopted on one surface of the opaque substrate and an optical wiring layer is formed on the other surface, an opening for allowing laser light to pass through the substrate between the optical component mounting portion and the optical wiring layer mirror is provided. Although it is necessary, in the case of the optical component mounting substrate of the present invention, it is not always necessary to provide an opening unless the glass substrate absorbs laser light.
[0014]
Next, a manufacturing method of the optical component mounting substrate 10 shown in FIG. 1 will be described. 2 to 10 are process diagrams showing the manufacturing process of the optical component mounting board 10. The optical component mounting (electrical wiring layer) forming surface in the explanation is a surface, and the bump and optical wiring layer forming surface is b surface.
[0015]
The glass substrate 1 is preferably a photosensitive glass plate having a chemical workability of Li 2 O—Al 2 O 3 —SiO 2 (Au, CeO 2 ) system. Further, the a and b surfaces of the glass substrate 1 have excellent smoothness. The glass substrate was irradiated with 100 mJ / cm 2 of a Hg—Xe lamp through a photomask having a hole shape (see FIG. 2) and developed. When the components Au and CeO 2 in the photosensitive glass are exposed by ultraviolet irradiation, nuclei composed of particles of the photosensitive metal Au and CeO 2 are formed in the exposed portion to form a latent image (not shown). it can.
[0016]
Thereafter, the glass on which the latent image has been formed by exposure is heat-treated at 550 ° C. to 620 ° C., thereby precipitating crystals that easily elute into the acid. By this heat treatment, lithium metasilicate crystals are precipitated with the photosensitive metal particles present in the exposed portion (latent image) as nuclei. The crystals thus obtained have a property of being easily dissolved in an acid, and thus were subjected to an acid treatment with dilute hydrofluoric acid and a development treatment (see FIG. 3).
[0017]
As a result of the above process, a via hole 2 is formed in the photosensitive glass substrate 1. The via hole is a hole that penetrates the photosensitive glass substrate 1 and is formed so as to coincide with the position of the electrode on the printed circuit board 20 side to be connected.
[0018]
The surface b of the photosensitive glass substrate 1 on which the via hole 2 is formed is filled with the via hole 2 with light or thermosetting resin 3 to make the surface b of the glass substrate 1 smooth, and then an optical wiring layer material ( The lower clad 4 and the core 5 are sequentially applied with polyimide, for example (see FIG. 4).
[0019]
Next, a photoresist 6 is applied to the upper portion of the optical waveguide material (see FIG. 5), exposed with a waveguide pattern mask, the photoresist 6 is developed, and the exposed portion is removed. Then, the core is patterned so that the cross section becomes rectangular by reactive ion etching, and then the photoresist 5 is removed.
[0020]
The core is formed to have at least one of a straight line, a curved line, an S-shaped curve, a parallel line, and the like.
[0021]
Further, a mirror 7 on which an Al film or the like is deposited is formed at a predetermined portion of the core wiring pattern, and an upper clad 8 is applied again to form an optical wiring layer 9 (see FIGS. 6 and 7). Before applying the upper clad, the mirror is processed to approximately 45 ° with respect to the core pattern by a laser or the like, and an Al film is selectively deposited. At this time, an alignment mark for mounting an optical component is formed at an arbitrary position on the lower clat with an Al film.
[0022]
Thereafter, a heat treatment process of the optical wiring layer is performed at about 350.degree. The resin filled in the via hole 2 is thermally decomposed and removed here (see FIG. 8). When the decomposition component of the resin remains in the hole, the organic residue can be removed with dichromic acid, permanganic acid or the like.
[0023]
The optical wiring layer is additionally processed in a blind via shape by laser irradiation or the like so as to match the position of the via hole 2 of the photosensitive glass substrate 1, and the via hole 2 is also formed on the optical wiring layer side. Then, the conductor is deposited in the via hole 2 by plating, and the plating is sufficiently grown so as to protrude from the surface of the glass substrate to form bumps 11 and pads 12 (see FIG. 9).
[0024]
When plating is performed, a low-viscosity adhesive layer is selectively applied only to the inner wall surface of the via hole 2, and a plating process is performed on the adhesive layer, so that the photosensitive glass interface and the plated metal film are removed. Adhesiveness can be further improved.
[0025]
An optical element (LD, PD), LSI chip, and the like on the optical component mounting substrate 10 manufactured as described above are relied on the alignment mark formed in the lower clad simultaneously with the mirror process so that the optical axis is not shifted. A mounting board is created by mounting on the board. Since the photosensitive glass substrate 1 has a smooth surface, the distance in the height direction from the alignment mark can be accurately grasped, so that the optical component is installed on the end face of the optical component mounting substrate 10 so that the optical axis is not shifted. Is also possible. Thereafter, the optical component mounting board 10 itself is connected to the printed board to complete the first example of FIG.
[0026]
Optical components such as PD / LD and electrical components such as LSI are connected to the wiring pattern on the optical component mounting board via lead wires or bumps. On the other hand, electrodes 21 for electrical connection with the bumps 11 of the optical component mounting substrate 10 are provided on the upper surface of the printed circuit board 20 and are connected to each other. As a result, optical components such as PD and LD and electrical components such as LSI and the printed circuit board 20 are electrically connected.
[0027]
Further, a part of the electrical signal from the printed circuit board 20 is converted into an optical signal by the LD, and the optical signal is incident on the waveguide. Then, the optical signal is reflected by the mirror and transmitted through the optical waveguide, reflected again by the mirror, converted into an electric signal by the PD, and signal processing is performed by an LSI or the like. Thus, electrical connection and optical connection can be realized with high reliability. A plurality of such optical component mounting boards may be mounted on a printed circuit board to enhance the optical communication device and the optical information device.
[0028]
FIG. 10 is a diagram showing a second example of the optical component mounting board and the printed board on which the mounting board of the present invention is mounted. This is an example where the optical component mounting portion is the electrical wiring layer 13 and has a multilayer structure.
[0029]
In the optical component mounting substrate 10 shown in this example, the via hole 2 of the photosensitive glass substrate 1 is filled with a conductive substance, and an electric wiring composed of a wiring electrode of the optical wiring layer and a metal material and an insulating material on the upper layer. The wiring electrode of the layer 13 is connected to the via hole 2 in correspondence with the electric wiring density of the electrode of the optical component or the electric component. Here, the electrical wiring layer 13 can be formed using a known additive method or subtract method.
[0030]
On the other hand, the position of the bump 11 from the via hole 2 formed on the surface of the glass substrate b is a position to be matched with the electrode 21 of the printed circuit board 20.
[0031]
The optical component mounting substrate 10 thus manufactured is used to mount optical elements (LD, PD), LSI (bare) chips, and the like on the top, and the optical component mounting substrate is connected to the printed circuit board. In this way, a part of the electrical signal from the printed circuit board 20 is converted into an optical signal by the LD, and the optical signal reflected by the mirror is transmitted through the optical waveguide. The optically transmitted signal is again converted by a mirror by 90 °, converted to an electric signal by a PD, and processed by an LSI or the like. Thus, electrical connection and optical connection can be realized with high reliability.
[0032]
Incidentally, in the optical waveguide, quartz, polycarbonate, polymethyl methacrylate, or a polymeric material composed of polystyrene, or SiO 2 - Ge 2, ZrF 4 - BaF 2 - GdF 3 - AlF 3, As- S, As- Even if it is configured by using either a glass system made of Ge-Se or the like, or a crystal system made of CsBr, KRS-5, or the like, the result is as shown in FIG.
[0033]
【The invention's effect】
The optical component mounting substrate of the present invention forms an optical wiring layer wired directly on a glass substrate. Therefore, the optical axis alignment between the optical component and the optical wiring layer is highly accurate. Further, since the optical wiring layer (waveguide film) is not peeled off, there is no change in various physical properties such as refractive index due to shrinkage. Furthermore, if the optical component mounting portion is an electrical wiring layer, it is possible to provide a mounting substrate that corresponds to the electrical wiring density of the optical component mounted on the optical component mounting portion and the electrodes of the electrical component, and via holes and conductive bumps can be provided. It can be connected to a printed circuit board with low wiring density via
[0034]
As described above, the connection characteristics and reliability of the optical waveguide as the transmission line are remarkably excellent, and the inexpensive and practical optical component mounting board and mounting board as well as the printed board with a high degree of freedom in wiring design. Can be provided.
[0035]
[Brief description of the drawings]
FIG. 1 is an explanatory diagram showing an optical component mounting board, a mounting board, and a printed board according to the present invention.
FIG. 2 is an explanatory view showing a manufacturing process of an optical component mounting board.
FIG. 3 is an explanatory diagram showing a manufacturing process of an optical component mounting board.
FIG. 4 is an explanatory diagram showing a manufacturing process of an optical component mounting board.
FIG. 5 is an explanatory diagram showing a manufacturing process of an optical component mounting board.
FIG. 6 is an explanatory view showing a manufacturing process of an optical component mounting board.
FIG. 7 is a tilt view showing a manufacturing process of the optical component mounting board.
FIG. 8 is an explanatory diagram showing a manufacturing process of an optical component mounting board.
FIG. 9 is an explanatory diagram showing an optical component mounting board.
FIG. 10 is an explanatory view showing an optical component mounting board, a mounting board, and a printed board according to the present invention.
[Explanation of symbols]
1 ... Glass substrate 2 ... Hole (via hole)
DESCRIPTION OF SYMBOLS 3 ... Light or thermosetting resin 4 ... Lower clad 5 ... Core 6 ... Photoresist 7 ... Mirror 8 ... Upper clad 9 ... Optical wiring layer 10 ... Light Component mounting substrate 11 ... Bump 12 ... Pat 13 ... Electrical wiring layer 14 ... Optical component 15 ... Electrical component 20 ... Printed circuit board 21 ... Electrode

Claims (2)

感光性ガラス基板の一面に光部品搭載部、他面に光配線層を少なくとも有する光部品搭載用基板の製造方法であって、前記感光性ガラス基板を紫外線照射によって露光し、熱処理及び酸処理による現像処理を行うことにより該感光性ガラス基板を貫通するビアホールを形成する工程と、前記ビアホールを樹脂で穴埋めすることにより前記感光性ガラス基板の一方の面を平滑な状態にする工程と、前記ビアホールが前記樹脂で穴埋めされた前記感光性ガラス基板の前記一方の面に光配線材料を塗布する工程と、前記光配線材料をパターニングし、コア及びクラッドを有する光配線層を形成する工程と、光部品と光配線層のコアとを光学的に結合するための光路変換ミラーを前記光配線層中に形成する工程と、前記光配線層が形成された前記感光性ガラス基板を加熱し、前記ビアホールに充填された前記樹脂を熱分解する工程と、前記光配線層に、前記ビアホールと対応する位置に貫通孔を形成する工程と、めっきにより前記ビアホール内および前記貫通孔内に導体を析出させると共に、前記感光性ガラス基板の前記一方の面と対向する他方の面、並びに、前記感光性ガラス基板の前記一方の面上に形成された光配線層の表面、のいずれからも突出するように、めっきを十分成長させることにより、前記感光性ガラス基板の他方の面上に、光部品と接続するパッドを形成するとともに、前記光配線層の表面上に、バンプを形成する工程と、を備えたことを特徴とする光部品搭載用基板製造方法。An optical component mounting substrate manufacturing method comprising an optical component mounting portion on one surface of an photosensitive glass substrate and an optical wiring layer on the other surface, wherein the photosensitive glass substrate is exposed by ultraviolet irradiation, heat treatment and acid treatment A step of forming a via hole penetrating the photosensitive glass substrate by performing a development process, a step of filling one surface of the photosensitive glass substrate with a resin by filling the via hole with a resin, and the via hole. A step of applying an optical wiring material to the one surface of the photosensitive glass substrate filled with the resin, a step of patterning the optical wiring material to form an optical wiring layer having a core and a cladding, Forming an optical path conversion mirror in the optical wiring layer for optically coupling a component and the core of the optical wiring layer; and the photosensitive having the optical wiring layer formed thereon. Heating the glass substrate and thermally decomposing the resin filled in the via hole; forming a through hole in the optical wiring layer at a position corresponding to the via hole; and plating in the via hole and the through hole A conductor is deposited in the hole, and the other surface of the photosensitive glass substrate facing the one surface, and the surface of the optical wiring layer formed on the one surface of the photosensitive glass substrate, By sufficiently growing the plating so as to protrude from either, a pad connected to the optical component is formed on the other surface of the photosensitive glass substrate, and a bump is formed on the surface of the optical wiring layer. And a step of forming the optical component mounting substrate manufacturing method. 前記感光性ガラス基板は、Au、CeO2、からなる群から選ばれた少なくとも1つ以上の材料を含むことを特徴とする請求項1に記載の光部品搭載用基板製造方法。The method for manufacturing a substrate for mounting an optical component according to claim 1, wherein the photosensitive glass substrate includes at least one material selected from the group consisting of Au and CeO 2.
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