JP4283653B2 - Block for gas supply unit - Google Patents

Description

  The present invention relates to a gas supply unit block for mounting a supply valve, a purge valve, a check valve, a mass flow controller, and the like, which are mainly configured in a process gas supply unit used in a semiconductor manufacturing process.

Conventionally, a process gas supply unit as shown in Patent Document 1 has been developed in a semiconductor manufacturing process. A manifold as described below is configured as a block for the process gas supply unit.
Then, the outline | summary of the process gas supply unit shown in patent document 1 is shown below.
8 is a cross-sectional view of the process gas supply unit of Patent Document 1, FIG. 10 is a top view of the process gas supply unit of Patent Document 1, and FIG. 9 is a cross-sectional view of the check valve of Patent Document 1. It is (A arrow view of FIG. 10).

As shown in a cross-sectional view in FIG. 8, the process gas supply unit 101 disclosed in Patent Document 1 includes a supply valve 144 for supplying process gas, a purge valve 141 for supplying purge gas, A check valve 142 for preventing backflow is attached from above.
Here, the internal structure of the manifold 111 will be described. A process gas external inlet 161 is formed at the left end of the manifold 111. The process gas external inlet 161 and the input port 156 of the supply valve 144 are communicated by a process gas input flow path 123. The process gas input channel 123 extends horizontally from the process gas external inlet 161 and is formed in the upper surface direction of the manifold 111 by the vertical channel part 123a. A process gas external outlet 162 is formed at the right end of the manifold 111. The process gas external outlet 162 and the output port 157 of the supply valve 144 are connected by a process gas output flow path 122. The process gas output flow path 122 extends horizontally from the process gas external outlet 162 and is formed in the upper surface direction of the manifold 111 by the vertical flow path portion 122a.

  The output port 152 of the purge valve 141 is communicated with the process gas output flow path 122 by the purge output flow path 124. Further, the input port 151 of the purge valve 141 communicates with the output port 153 of the check valve 142 through a substantially V-shaped check valve output flow path 121 as shown in FIG. Further, as shown in FIG. 9, a lower flow path block 112 and a lower flow path block 113 are fixed to the lower surface of the manifold 111. The oblique flow path 125 and the cross flow path 126 constitute a purge gas input flow path, and the input port 158 of the check valve 142 is formed as an oblique flow path 125, a vertical portion 126a, and a vertical portion 126b. , And a purge gas external inlet 155.

Next, the operation of the process gas supply unit shown in Patent Document 1 having the above configuration will be described.
The process gas external outlet 162 is connected to a vacuum chamber in a semiconductor manufacturing process via a mass flow controller (not shown). Further, the process gas external inlet 161 is connected to a process gas supply source. By opening the supply valve 144 with the purge valve 141 closed, the process gas passes through the process gas input flow path 123, the input port 156 and output port 157 of the supply valve 144, and the process gas output flow path 122. It flows from the gas external outlet 162 to the mass flow controller.

Here, when it is detected by the mass flow controller that a predetermined amount of process gas has flowed, the supply valve 144 is closed and supply of the process gas is stopped. Then, the outlet side of the mass flow controller is switched from the vacuum chamber to the exhaust means. Thereafter, the purge valve 141 is opened, and an inert gas such as nitrogen gas is used as the purge gas. The purge gas external inlet 155, the cross flow channel 126, the oblique flow channel 125, the input port 158 and the output port 153 of the check valve 142, the reverse The gas flows to the process gas output flow path 122 through the stop valve output flow path 121, the input port 151 and output port 152 of the purge valve 141, and the purge output flow path 124. Thereby, the process gas remaining in the process gas output flow path 122 and the mass flow controller is excluded.
Japanese Patent Laid-Open No. 10-311451 (paragraphs 0013, 0020, 0021, 0023, 0024, FIG. 1-3)

However, the process gas supply unit disclosed in Patent Document 1 has the following problems.
As shown in FIG. 9, the input port 158 of the check valve 142 is connected to the purge gas external inlet 155 by an oblique flow path 125 formed obliquely, and a cross flow path 126 having a vertical portion 126a and a vertical portion 126b. Yes. That is, the check valve 142 does not have the purge gas external inlet integrated in the vertical direction, and the manifold 111 has a specification corresponding to the check valve 142.

  Therefore, as shown in FIG. 10, it is necessary to form the purge gas external inlet 155 of the check valve 142 in a direction perpendicular to the line direction of the process gas supply unit. It is not possible to save space in the semiconductor manufacturing process by integrating the units.

  The present invention has been made in order to solve the problem of Patent Document 1, and an object of the present invention is to provide a gas supply unit block capable of serializing process gas supply units.

  In order to achieve the object, in the invention according to claim 1, in the block for the gas supply unit in which a plurality of gas flow paths are formed, the first port, the second port, and the third port are aligned on the upper surface of the block. A port, a fourth port are formed, the first port and the third port are communicated, and the block is crossed perpendicularly on a straight line connecting the upper surface of the block and the first port to the fourth port. The first gas flow path formed in the first divided portion when divided, the second port and the fourth port communicate with each other, and formed in the second divided portion when the block is divided in the cross section. And a second gas flow path.

  In order to achieve the above object, in the invention according to claim 2, in the gas supply unit block according to claim 1, the first gas flow path and the second gas flow path are formed in a V shape. Features.

  In order to achieve the above object, in the invention according to claim 3, in the gas supply unit block according to claim 1, the first gas flow path and the second gas flow path are formed in a U-shape. Features.

  In order to achieve the above object, in the invention of the gas supply unit according to claim 4, in the gas supply unit block according to claim 1, the first gas flow path is formed in a V shape, and the second gas flow path is formed. Is formed in a U-shape.

  In order to achieve the above object, the invention of the gas supply unit according to claim 5 has the gas supply unit block according to any one of claims 1 to 4.

  In order to achieve the above object, in the invention of the process gas supply unit according to claim 6, in the gas supply unit of claim 5, an input port of a purge valve for supplying an inert gas is arranged in the first port. An output port of the purge valve is disposed in the second port, an output port of a check valve connected to an inert gas source is disposed in the third port, and an input port of a mass flow controller for adjusting a gas flow rate is provided. It is arranged at the fourth port.

  The block for a gas supply unit of the present invention is a block for a gas supply unit in which a plurality of gas flow paths are formed. The first port, the second port, the third port, and the fourth port are aligned on the upper surface of the block. And the first port and the third port are communicated, and the block is divided in a cross section perpendicular to a straight line connecting the upper surface of the block and the first port to the fourth port. A second gas flow formed in the second divided portion when the first gas flow path formed in the one divided portion, the second port and the fourth port are communicated, and the block is divided in the cross section. Since it has a channel, it is possible to serially arrange the gas supply units by arranging each device such as an on-off valve in series, and to save space in the semiconductor manufacturing process by integrating a plurality of units.

<First Embodiment>
1st Embodiment about the block for gas supply units of this invention is described.
First, the structure of the block 1 for gas supply units of 1st Embodiment is demonstrated. As shown in FIG. 1, a counterbore for accommodating the first port 11, the second port 12, the third port 13, the fourth port 14, the screw hole 15, and the bolt head on the top surface of the gas supply unit block 1. The provided through hole 16 is formed. A V-shaped first gas flow path 21 is formed between the first port 11 and the third port 13, and a V-shaped second gas flow path is also formed between the second port 12 and the fourth port 14. 22 is formed. The first gas passage 21 and the second gas passage 22 intersect perpendicularly on a straight line connecting the upper surface of the gas supply unit block 1 and the first port 11 to the fourth port 14 so as not to intersect each other. When it is considered that the block is divided in a cross section, each of the first divided portion 31 and the second divided portion 32 is formed obliquely.

Here, a processing procedure of the first gas channel 21 and the second gas channel 22 will be described.
First, a counterbore for gasket is provided at the position of the first port 11 to the fourth port 14 on the upper surface of the block. Next, an escape hole for inserting a drill is provided by an end mill or the like, and a drill is inserted from the escape hole at a predetermined angle for each port to provide a cutting hole in the block to a predetermined depth. Thereafter, the abutting surface of the cutting hole is shaped again with an end mill or the like. In this way, the first gas channel 21 and the second gas channel 22 are formed in a V shape.

Next, as a gas supply unit using the gas supply unit block 1 of the first embodiment having the above-described configuration, for example, a gas supply unit 4 as shown in FIGS. 2 and 3 will be described.
First, the configuration of the gas supply unit 4 will be described. In the gas supply unit 4, a lower flow path block unit 60 including various gas supply unit blocks is formed on the upper part of the base block 63, and each device such as an on-off valve is formed on the upper part thereof.
As each device such as the on-off valve, a manual valve 45, a regulator 46, a pressure transducer 47, a supply valve 44, a purge valve 41, a check valve 42, a mass flow controller 43, and a shut-off valve 48 are configured.
Further, a process gas external inlet 61 and a process gas external outlet 62 are formed at the inlet and outlet of the gas supply path of the lower flow path block unit 60.

Here, the gas supply unit block 1 constituting the lower flow path block portion 60 is attached to the base block 63 by two bolts from the upper surface side in the through hole 16 (not shown). And in the screw hole 15 of the block 1 for gas supply units, the purge valve 41, the check valve 42, and the mass flow controller 43 are each attached with the volt | bolt from the upper surface side. Specifically, the first port 11 of the gas supply unit block 1 has an input port 51 of the purge valve 41, the second port 12 has an output port 52 of the purge valve 41, and the third port 13 has a check valve. The output port 53 of 42 and the input port 54 of the mass flow controller 43 are attached to the fourth port 14. Here, the check valve 42 has a purge gas external inlet 55 integrated in the vertical direction and is connected to an inert gas source.
Note that the screw holes 15 of the gas supply unit block 1 are provided with the first ports 11 to 11 in order to secure the sealability between the ports of the gas supply unit block 1 and the input / output ports of the devices by the tightening force of the bolts. It is arranged on both sides of the fourth port 14.

Next, the operation of the gas supply unit 4 having the above configuration will be described.
First, the process gas external outlet 62 is connected to a vacuum chamber (not shown) in the semiconductor manufacturing process. On the other hand, the process gas external inlet 61 is connected to a process gas supply source (not shown). When the supply valve 44 is opened with the purge valve 41 closed, the process gas is supplied from the manual valve 45, the regulator 46, the pressure transducer 47, the supply valve 44, the purge valve 41, the second gas flow path 22, and the mass flow controller 43. , Flows through the shutoff valve 48 to the process gas external outlet 62.

  Here, when it is detected by the mass flow controller 43 that a predetermined amount of process gas has flowed, the supply valve 44 is closed and the supply of the process gas is stopped. Then, the outlet side of the mass flow controller 43 is switched from the vacuum chamber to the exhaust means. Thereafter, in order to remove the process gas remaining in each process gas flow path from the output port 52 of the purge valve 41 to the process gas external outlet 62, the purge valve 41 is opened and an inert gas such as nitrogen is used as the purge gas. Purge gas external inlet 55, check valve 42 output port 53, first gas flow path 21, purge valve 41 input port 51 and output port 52, second gas flow path 22, mass flow controller 43, shut-off valve 48. Through to the process gas external outlet 62.

The following effects can be obtained by the first embodiment having the configuration and operation described above.
The gas supply unit block 1 has a first port 11, a second port 12, a third port 13, and a fourth port 14 formed in a straight line on the upper surface, and the first port 11 and the third port 13 communicate with each other. Since the first gas flow path 21 formed in the first divided part 31, the second port 12 and the fourth port 14 are communicated with each other and the second gas flow path 22 is formed in the second divided part 32, the on-off valve The gas supply units can be serialized by arranging the devices such as in series, and the semiconductor manufacturing process can be saved by integrating a plurality of units.

  In the gas supply unit block 1, the first gas flow path 21 and the second gas flow path 22 are formed in a V shape, so that gas stays in the first gas flow path 21 and the second gas flow path 22. An effect that is difficult to do is obtained. In addition, in forming the gas flow path, it can be easily formed by opening two oblique holes in the reverse direction with a drill or the like, and is easy to clean after processing and after processing. The effect that oil content etc. can be removed sufficiently is acquired.

  Since the gas supply unit 4 includes the gas supply unit block 1, the purge valve 41, the check valve 42, and the mass flow controller 43 are arranged in series, and the gas supply unit 4 can be serialized. The integration of these units can save space in the semiconductor manufacturing process.

  In the gas supply unit 4, the input port 51 of the purge valve 41 is disposed in the first port 11, the output port 52 of the purge valve 41 is disposed in the second port 12, and the output port 53 of the check valve 42 is the third port. 13 and the input port 54 of the mass flow controller 43 is arranged at the fourth port 14, so that the purge valve 41, the check valve 42, and the mass flow controller 43 can be arranged in series. The supply units 4 can be serialized, and the space for the semiconductor manufacturing process can be saved by integrating a plurality of units. That is, unlike the gas supply unit of Patent Document 1 shown in FIG. 10, it is not necessary to form the purge gas external inlet 155 of the check valve 142 in the direction perpendicular to the line direction, and the gas supply units 4 can be serialized. Thus, it is possible to save space in the semiconductor manufacturing process by integrating a plurality of units.

Second Embodiment
A second embodiment of the gas supply unit block of the present invention will be described.
First, the structure of the block 2 for gas supply units of 2nd Embodiment is demonstrated. As shown in FIG. 4, the sealing material 27 is comprised with respect to the said 1st Embodiment, and the 1st gas flow path 23 and the 2nd gas flow path 24 are formed in the U-shape.
Since other configurations are the same as those of the first embodiment, description thereof will be omitted below.

Here, a processing procedure of the first gas channel 23 and the second gas channel 24 will be described.
First, a counterbore for gasket is provided at the position of the first port 11 to the fourth port 14 on the upper surface of the block. Next, an escape hole for inserting a drill is provided by an end mill or the like, and a drill is inserted from the escape hole at a predetermined angle for each port to provide a cutting hole in the block to a predetermined depth. Thereafter, the abutting surface of the cutting hole is shaped again with an end mill or the like. On the other hand, a drill is applied to a predetermined position on the side surface of the block perpendicularly to the surface to provide a cutting hole in the block to a predetermined depth. Thereafter, the abutting surface of the cutting hole is shaped with an end mill or the like. Further, in order to prevent gas leakage from the gas flow path, the sealing material 27 is injected into the drill insertion portion. In this way, the first gas passage 23 and the second gas passage 24 are formed in a U shape.

  Next, as a gas supply unit using the gas supply unit block 2 of the second embodiment having the above-described configuration, for example, a gas supply unit 5 as shown in FIG. 5 is conceivable. Since it is the same as 1st Embodiment, the following description is abbreviate | omitted.

The following effects can be obtained by the second embodiment having the above configuration and operation.
In the gas supply unit block 2, the first gas flow path 23 and the second gas flow path 24 are formed in a U-shape. It is not necessary to insert at a predetermined angle and cut deep inside the block, and from the side surface of the block, the drill may be cut perpendicularly to the surface. Therefore, it is easy to position a cutting tool such as a drill or an end mill, and an effect of reducing variation in processing accuracy of the gas flow path for each block can be obtained.

  Since other effects are the same as those of the first embodiment, the following description is omitted.

<Third Embodiment>
3rd Embodiment about the block for gas supply units of this invention is described.
As shown in FIG. 6, the configuration of the gas supply unit block 3 of the third embodiment is such that the first gas passage 25 is formed in a V shape and the second gas passage 26 is formed in a U shape.
In addition, since the other structure is the same as 1st Embodiment or 2nd Embodiment, description is abbreviate | omitted below.

  Further, the processing procedures of the first gas flow path 25 and the second gas flow path 26 are the same as those in the first embodiment and the second embodiment, and thus the following description is omitted.

  Next, as a gas supply unit using the gas supply unit block 3 of the third embodiment having the above-described configuration, for example, a gas supply unit 6 as shown in FIG. 7 is conceivable. Since it is the same as 1st Embodiment or 2nd Embodiment, the following description is abbreviate | omitted.

  Since the effects obtained by the third embodiment having the above-described configuration and action are also the same as those of the first embodiment or the second embodiment, the following description is omitted.

  In addition, this invention is not limited to the said embodiment, A various change is possible in the range which does not deviate from the meaning.

It is drawing which shows the block for gas supply units of 1st Embodiment. It is a top view of the process gas supply unit using the block for gas supply units of 1st Embodiment. It is a top view of the process gas supply unit using the block for gas supply units of 1st Embodiment. It is drawing which shows the block for gas supply units of 2nd Embodiment. It is a top view of the process gas supply unit using the block for gas supply units of 2nd Embodiment. It is drawing which shows the block for gas supply units of 3rd Embodiment. It is a top view of the process gas supply unit using the block for gas supply units of 3rd Embodiment. It is sectional drawing which shows the process gas supply unit of patent document 1. FIG. It is sectional drawing which shows the non-return valve of patent document 1 (A arrow line view of FIG. 10). It is a top view which shows the process gas supply unit of patent document 1. FIG.

Explanation of symbols

1 Block for gas supply unit (first embodiment)
2 Gas supply unit block (second embodiment)
3 Gas supply unit block (third embodiment)
4 Process gas supply unit (first embodiment)
5 Process gas supply unit (second embodiment)
6 Process gas supply unit (third embodiment)
11 1st port 12 2nd port 13 3rd port 14 4th port 21 1st gas flow path 22 2nd gas flow path 23 1st gas flow path 24 2nd gas flow path 25 1st gas flow path 26 2nd gas Flow path 31 First division part 32 Second division part 41 Purge valve 42 Check valve 43 Mass flow controller

Claims (6)

In the block for the gas supply unit in which a plurality of gas flow paths are formed,
A first port, a second port, a third port, and a fourth port are formed in a straight line on the upper surface of the block,
A first divided portion when the first port and the third port communicate with each other and the block is divided at a cross section perpendicular to a straight line connecting the upper surface of the block and the first port to the fourth port. A first gas flow path formed;
A gas supply unit block having a second gas flow path formed in a second divided portion when the second port and the fourth port are communicated and the block is divided in the cross section. The gas supply unit block according to claim 1,
The block for a gas supply unit, wherein the first gas channel and the second gas channel are formed in a V shape. The gas supply unit block according to claim 1,
The block for a gas supply unit, wherein the first gas channel and the second gas channel are formed in a U-shape. The gas supply unit block according to claim 1,
The block for a gas supply unit, wherein the first gas flow path is formed in a V shape and the second gas flow path is formed in a U shape.   A gas supply unit comprising the gas supply unit block according to any one of claims 1 to 4. The gas supply unit according to claim 5, wherein
An input port of a purge valve for supplying an inert gas is disposed in the first port,
An output port of the purge valve is disposed in the second port;
An output port of a check valve connected to an inert gas source is located at the third port;
A gas supply unit, wherein an input port of a mass flow controller for adjusting a gas flow rate is arranged in the fourth port.

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