JP3726495B2 - Two-terminal nonlinear element, liquid crystal display panel using the nonlinear element, and electronic device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a two-terminal nonlinear element suitable for use as a switching element for driving a pixel electrode in, for example, a liquid crystal display panel, a manufacturing method thereof, a liquid crystal display panel using the nonlinear element, and an electronic apparatus.
[0002]
[Prior art]
In general, an active matrix liquid crystal display panel includes an element array substrate in which nonlinear (switching) elements are provided on each of the pixel electrodes arranged in a matrix, a counter substrate on which a color filter or the like is formed, and both of these. It is composed of liquid crystal filled between the substrate and each non-linear element is driven to control the alignment state of the liquid crystal for each pixel, thereby displaying predetermined information.
[0003]
Here, the nonlinear elements are mainly classified into a three-terminal nonlinear element such as a thin film transistor (TFT) and a two-terminal nonlinear element such as a thin film diode (TFD). However, the latter two-terminal type non-linear element is more advantageous in that a short circuit failure between wirings does not occur in principle because there is no wiring intersection, and further, the film forming process and the photolithography process can be shortened. is there.
[0004]
Such a two-terminal type non-linear element generally has a conductor-insulator-conductor sandwich structure, and has such a bidirectional diode switching characteristic.
[0005]
On the other hand, in recent years, there has been an increasing demand for liquid crystal display panels to be a reflective type by eliminating the backlight, for reasons such as device miniaturization, weight reduction, and low power consumption.
[0006]
Here, when a liquid crystal display panel using a two-terminal type non-linear element is made a reflection type, simply adding a reflection plate to the polarizing plate provided on the back surface of the liquid crystal display panel, or It is possible by substitution. However, since the light transmittance of the polarizing plate is low, the entire screen becomes dark, and so-called paper whitening cannot be achieved.
[0007]
Therefore, first, the pixel electrode and the second conductor are integrated, and both are made of a highly reflective metal film such as aluminum. Second, the liquid crystal molecules are substantially vertically aligned in the absence of voltage application. It is conceivable to construct a reflective liquid crystal display panel using a two-terminal nonlinear element by avoiding the use of a polarizing plate having a low transmittance as much as possible by using SH (super homeotropic) type liquid crystal.
[0008]
[Problems to be solved by the invention]
However, since pure aluminum is poor in corrosion resistance and heat resistance, there is a problem that the quality and reliability of the liquid crystal display panel are deteriorated as it is.
[0009]
The present invention has been made in view of such circumstances, and an object of the present invention is a two-terminal type capable of maintaining high quality and reliability when applied to a liquid crystal display panel. A non-linear element, a manufacturing method thereof, and a liquid crystal display panel and an electronic device having a bright screen using the non-linear element.
[0012]
[Means for Solving the Problems]
To achieve the above object, a first conductor formed of tantalum alone or a tantalum alloy on a substrate, an insulator formed by anodizing the surface of the first conductor, and a laminate on the insulator In the two-terminal nonlinear element including the second conductor, a metal obtained by adding neodymium to aluminum is used as the second conductor.
[0013]
According to this configuration, in the two-terminal nonlinear element, not only the corrosion resistance and heat resistance are improved, but also the shift of current-voltage characteristics, drift, and the like can be improved.
[0014]
Further, the first conductor is a metal obtained by adding tungsten to tantalum.
[0015]
The second conductor and the pixel electrode for driving the liquid crystal layer are integrated.
[0016]
According to this configuration, it is possible to omit the film formation process and the photolithography process of the second conductor or the pixel electrode.
[0017]
Further, the liquid crystal panel substrate having the above-described two-terminal nonlinear element and the counter substrate having the counter electrode are disposed at an appropriate interval, and the liquid crystal panel is disposed in the gap between the liquid crystal panel substrate and the counter substrate. Is enclosed.
[0018]
According to this configuration, not only the corrosion resistance and heat resistance are improved in the two-terminal nonlinear element, but also the current-voltage characteristic shift and drift are improved. Reduction can be achieved.
[0019]
An electronic apparatus is characterized by including the above-described liquid crystal display panel. As an electronic device to which such a liquid crystal display panel is applied, for example, a car navigation system, a portable information terminal device, and other various electronic devices can be considered.
[0020]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[0021]
<TFD element>
First, a two-terminal nonlinear element according to an embodiment of the present invention will be described. This two-terminal nonlinear element is used, for example, as a TFD element that drives each pixel of an active matrix liquid crystal display device. Here, FIG. 1A is a plan view showing a layout for one pixel in a liquid crystal panel substrate to which the TFD element is applied, and FIG. 1B shows the structure of the TFD element in FIG. It is sectional drawing shown along the AA in FIG.
[0022]
As shown in these drawings, the TFD element 20 is formed on the upper surface of the insulating film 31 formed on the substrate 30 as a base, and the first conductor film 22 in order from the insulating film 31 side, It is composed of an oxide film 24 as an insulator and a second conductor film 26, and adopts a conductor-insulator-conductor sandwich structure. With this structure, the TFD element has bidirectional diode switching characteristics.
[0023]
The first conductor film 22 constituting the TFD element 20 becomes the scanning line 12 as one terminal as it is, while the second conductor film 26 becomes the pixel electrode 36 as the other terminal as it is.
[0024]
The board | substrate 30 has insulation and transparency, for example, is comprised from glass, a plastics, etc. Here, the reason why the insulating film 31 serving as the base is provided is to prevent the first conductor film 22 from being peeled off from the base by the heat treatment after the deposition of the second conductor film 26, and to the first conductor This is to prevent impurities from diffusing into the film 22. Therefore, if this does not cause a problem, the insulating film 31 can be omitted.
[0025]
The first conductor film 22 is a conductive metal thin film, and is made of, for example, tantalum alone or a tantalum alloy. The oxide film 24 is an insulating film formed by, for example, anodizing the surface of the first conductor film 22 in the chemical conversion liquid. The second conductor film 26 is a conductive metal thin film and is made of a metal obtained by adding a small amount of a rare earth element, in particular, a lanthanoid element such as neodymium, samarium, or cerium to aluminum. The pixel electrode 36 is formed integrally with the second conductor film 26.
[0026]
<Manufacturing process of TFD element (1)>
Next, a manufacturing process of the TFD element 20 as the nonlinear element shown in FIG. 1 will be described.
[0027]
(1) First, as shown in FIG. 2, the insulating film 31 is formed on the upper surface of the substrate 30. The insulating film 31 is made of, for example, tantalum oxide, and is formed by a method of thermally oxidizing a tantalum film deposited by a sputtering method, a sputtering using a target made of tantalum oxide, or a co-sputtering method. As described above, the insulating film 31 is provided mainly for the purpose of improving the adhesion of the first conductor film 22 and preventing the diffusion of impurities from the substrate 30. 50 to 200 nm is sufficient.
[0028]
(2) Next, the first conductor film 22 is formed on the upper surface of the insulating film 31. The composition of the first conductor film 22 is made of, for example, tantalum alone or a tantalum alloy. When a tantalum alloy is used, an element belonging to Groups 6 to 8 in the periodic table such as tungsten, chromium, molybdenum, rhenium, yttrium, lanthanum, dysprolium may be added to tantalum as the main component. . In particular, the element to be added is preferably tungsten, and the content is preferably 0.1 to 6% by weight, for example.
[0029]
Further, the first conductor film 22 can be formed by a sputtering method, an electron beam evaporation method, or the like. When forming the first conductor film 22 made of a tantalum alloy, a sputtering method using a mixed target, A co-sputtering method, an electron beam evaporation method, or the like is used.
[0030]
Note that a suitable value for the thickness of the first conductor film 22 is selected depending on the use of the TFD element, and is usually about 100 to 500 nm.
[0031]
(3) The first conductor film 22 is patterned by photolithography and etching techniques that are generally used.
[0032]
(4) Subsequently, an oxide film 24 is formed on the surface of the first conductor film 22. Specifically, the surface of the first conductor film 22 is formed by oxidation by an anodic oxidation method. At this time, the surface of the scanning line 12 is also oxidized simultaneously to form an insulating film. A preferable value for the thickness of the oxide film 24 is selected depending on the application, and is set to, for example, about 20 to 70 nm. Although the chemical conversion liquid used for anodization is not specifically limited, For example, 0.01-0.1 weight% citric acid aqueous solution can be used.
[0033]
(5) Next, the second conductor film 26 is formed. As described above, the second conductor film 26 is made of a metal obtained by adding a small amount of a rare earth element, particularly a lanthanoid element such as neodymium, samarium, or cerium, to aluminum, and is formed by depositing by a sputtering method or the like. ing. The film thickness of the second conductor film 26 is, for example, about 50 to 300 nm.
[0034]
(6) Then, the second conductor film 26 is patterned by a commonly used photolithography and etching technique with the pixel electrode 36 also integrated.
[0035]
By such a process, a plurality of TFD elements 20 are formed in a matrix on the substrate 30 to form an element array substrate.
[0036]
<Other examples of TFD elements>
Next, another example of the TFD element will be described.
[0037]
<Back-to-back structure>
Next, a TFD element having a back-to-back structure will be described as another example of the TFD element. FIG. 3A is a plan view showing a layout for one pixel in a liquid crystal panel substrate to which the TFD element is applied, and FIG. 3B shows the structure of the TFD element along the line BB. It is sectional drawing.
[0038]
The back-to-back structure refers to a structure in which two diodes are connected in series in opposite directions in order to symmetrize nonlinear characteristics. For this reason, as shown in the figure, the TFD element 40 has a structure in which the first TFD element 40a and the second TFD 40b are connected in series with opposite polarities.
[0039]
Specifically, the substrate 30, the insulating film 31 formed on the surface, the first conductor film 42, the oxide film 44 formed on the surface by anodic oxidation, and the surface formed on the surface are mutually connected. The second conductive films 46a and 46b are separated from each other.
[0040]
The second conductor film 46a in the first TFD element 40a becomes the scanning line 48 as it is, while the second conductor film 46b in the second TFD element 40b becomes the pixel electrode 45 as it is. Note that the oxide film 44 is set to have a thickness smaller than that of the oxide film 24 in the TFD element 20 shown in FIG. Further, the specific configuration of each component such as the first conductor film 42, the oxide film 44, and the second conductor films 46a and 46b is the same as that of the TFD element 20 described above, and thus the description thereof is omitted. I decided to.
[0041]
In addition, the symmetry of the nonlinear characteristic can be ensured by a ring-shaped element in which two diodes are connected in parallel in opposite directions.
[0042]
<Manufacturing process of TFD element (2)>
Next, a manufacturing process of the TFD element 40 having the back-to-back structure as shown in FIG. 3 will be described.
[0043]
(1) First, as shown in FIG. 4, an insulating film 31 is formed on the upper surface of the substrate 30. This step is the same as the step (1) shown in FIG.
[0044]
(2) Next, the first conductor film 42 is formed on the upper surface of the insulating film 31. This process is also the same as the process (2) shown in FIG.
[0045]
(3) Then, the first conductor film 42 is patterned by a commonly used photolithography and etching technique.
[0046]
(4) Subsequently, an oxide film 44 is formed on the surface of the first conductor film 42. Specifically, the anodic oxidation method is used as in the step (4) shown in FIG. Thereby, the surface of the scanning line 48 is also oxidized simultaneously. However, the film thickness of the oxide film 44 is about half of the film thickness of the oxide film 22 shown in FIG.
[0047]
(5) Next, the second conductor film 46 is formed. This step is the same as the step (5) shown in FIG.
[0048]
(6) Further, as shown in FIG. 5, the second conductor film 26 is patterned by a commonly used photolithography and etching technique with the pixel electrode 45 integrated therewith.
[0049]
(7) Then, the first conductor film 42 on which the oxide film 44 is formed, and a portion 49 indicated by a broken line in the drawing is patterned by a commonly used photolithography and etching technique to obtain a scanning line. The first conductor film, which is the lower layer of 48, is separated.
[0050]
By such a process, the back-to-back structure TFD elements 40 including the first TFD elements 40a and the second TFD elements 40b are formed in a matrix on the substrate 30 to form an element array substrate.
[0051]
The manufacturing process of the TFD element having the back-to-back structure is not limited to the order of the above steps (1) to (7). For example, the surface of the first conductor film 42 is oxidized by the step (4). It is also possible to perform the steps (5) and (6) after separating from the scanning line 48 by the step (7) immediately after the film 22 is formed.
[0052]
<Consideration of characteristics of TFD element>
Next, the superiority of the TFD element according to the present embodiment will be examined. Here, the inventors of the present invention use a conventionally used chromium as the material of the second conductor film of the TFD element and a metal obtained by adding neodymium to aluminum as in the present embodiment. A comparison experiment was conducted with In this experiment, the amount of neodymium added to aluminum was 1.0% by weight (= 0.19 atomic%).
[0053]
First, the shift of the current-voltage characteristic in the TFD element will be examined. Here, the shift of the current-voltage characteristic means that, in FIG. 7, the original current-voltage characteristic (1) fluctuates as shown in (2) while maintaining its shape by driving the TFD element. To do. When such a fluctuation occurs, the current value for the same voltage value is different, and the contrast changes. That is, a contrast difference occurs in the entire screen even when the same gradation level is displayed. This contrast difference appears as so-called burn-in.
[0054]
As shown in FIG. 6A, the slope of the shift change with respect to the current value change is smaller in the case of using a metal obtained by adding neodymium to aluminum than in the case of using chromium as the second conductor. I understand that. The current value in the figure is a value when a constant voltage (4 V) is applied to both ends of the TFD element.
[0055]
Therefore, in this embodiment, compared with the case of using chromium, the shift of the current-voltage characteristic can be suppressed to be small, so that the so-called burn-in can be reduced.
[0056]
Next, the drift of the current-voltage characteristic in the TFD element will be examined. Here, the drift of the current-voltage characteristic means that the original current-voltage characteristic (1) in FIG. 7 varies as shown in (3), for example, by applying a voltage to both ends of the TFD element. Asymmetrical in positive and negative. When asymmetric as described above, a difference occurs in current values at positive and negative voltages having the same absolute value, and a DC offset voltage in the positive and negative periods is generated, which appears as an afterimage on the screen.
[0057]
Now, as shown in FIG. 6B, the drift value is 0.15 to 0.2 V when chromium is used as the second conductor, whereas the drift value is 0.1 when the metal obtained by adding neodymium to aluminum is used. Since it is V or less, it can be seen that the latter is smaller. In addition, the current value in the figure is a value when a constant current value flows through the TFD element.
[0058]
Further, this drift is reduced when a metal obtained by adding tungsten to tantalum is used as the first conductor, and further, when a metal obtained by adding neodymium to aluminum is used as the second conductor as in the present embodiment, It was found that it decreased more.
[0059]
Therefore, in this embodiment, compared with the case of using chromium, the drift of the current-voltage characteristic is suppressed to be small, which is advantageous in that the afterimage is small.
[0060]
Therefore, when the TFD element according to the present embodiment is applied to a liquid crystal display panel, it is possible to reduce image sticking and afterimage.
[0061]
Note that the steepness, shift, and drift of the current-voltage characteristics in the TFD element can be improved only by using a metal obtained by adding neodymium to aluminum as the second conductor film 26. Even if the pixel electrode 36 is formed of a transparent conductive film such as ITO (Indium Tin Oxide) without being integrated with the pixel electrode 36, the same effect can be obtained. However, in addition to the steps (1) to (6) shown in FIG. 2 or the steps (1) to (7) shown in FIG. 4 and FIG. Is required separately.
[0062]
<LCD panel>
Next, an example of a liquid crystal display panel to which the TFD element 20 (40) created by the manufacturing process described above is applied will be described. FIG. 8 is a block diagram showing an example of the equivalent circuit.
[0063]
As shown in this figure, in the liquid crystal display panel 10, a pixel region 16 is formed at each intersection of the scanning line 12 and the data line 14, and each pixel region 16 includes a liquid crystal display element (liquid crystal layer) 18 and a TFD. The element 20 is connected in series. Here, each scanning line 12 is driven by a scanning signal driving circuit 100, and each data line 14 is driven by a data signal driving circuit 110.
[0064]
In FIG. 8, the TFD element 20 is connected to the scanning line side and the liquid crystal layer 18 is connected to the data line side. On the contrary, the TFD element 20 is connected to the data line side and the liquid crystal layer 18 is connected to the data line side. The layer 18 may be provided on the scanning line side.
[0065]
Further, the structure of the liquid crystal display panel 10 will be described. FIG. 9 is a partially broken perspective view schematically showing an example thereof. As shown in this figure, the liquid crystal display panel 10 includes an element array substrate 30 and a counter substrate 32 disposed to face the element array substrate 30. The counter substrate 32 is made of, for example, a glass substrate.
[0066]
In the element array substrate 30, a plurality of pixel electrodes 36 are arranged in a matrix. Here, the pixel electrodes 36 arranged in the same row are connected to one of the plurality of scanning lines 12 extending in a strip shape in the row direction via the TFD element 20.
[0067]
On the other hand, in the counter substrate 32, the plurality of data lines 14 extend in a strip shape in the column direction orthogonal to the extending direction of the scanning lines 12 and intersect the pixel electrodes 36 of the element array substrate 30. Is formed.
[0068]
Now, the element array substrate 30 and the counter substrate 32 configured as described above have a certain gap (gap) due to the sealant applied along the periphery of one of the substrates and the appropriately dispersed spacers. In this closed space, for example, SH (super homeotropic) type liquid crystal is sealed to form a liquid crystal layer 18 (see FIG. 8).
[0069]
On the other hand, as the scanning signal driving circuit 100 in FIG. 8 sequentially supplies scanning signals of a predetermined voltage to each TFD element 20 via the scanning lines 12, the data signal driving circuit 110 displays the gradation level of display. A data signal having a pulse width corresponding to is sequentially supplied via the data line 14.
[0070]
Then, the current value of the TFD element 20 changes based on the potential difference applied to the scanning line 12 and the data line 14, and the liquid crystal layer 18 is charged / discharged. As a result, the display state, non-display state of the liquid crystal layer 18 or It is switched to the intermediate state. Thereby, the display operation of the liquid crystal layer 18 is controlled.
[0071]
In addition, the counter substrate 32 is provided with a color filter arranged in, for example, a striped mosaic shape or a triangle shape according to the use of the liquid crystal display panel 10, and further, for example, a metal such as chromium or nickel. A black matrix such as resin black in which a material, carbon, titanium, or the like is dispersed in a photoresist is provided.
[0072]
Further, in the liquid crystal display panel 10, if polymer dispersed liquid crystal dispersed as fine particles in a molecule is used, an alignment film, a polarizing plate, and the like become unnecessary, so that the light use efficiency is increased. This is advantageous in terms of higher brightness and lower power consumption.
[0073]
<Electronic equipment: Part 1>
Next, some examples in which such a liquid crystal display panel 10 is used in an electronic device will be described.
[0074]
First, a video projector using this liquid crystal display panel as a light valve will be described. FIG. 10 is a plan view showing a configuration example of a video projector.
[0075]
As shown in this figure, a lamp unit 1102 including a white light source such as a halogen lamp is provided inside the video projector 1100. The projection light emitted from the lamp unit 1102 is separated into three primary colors of RGB by a plurality of mirrors 1106, 1106,... And two dichroic mirrors 1108 disposed in the light guide 1104, and corresponds to each primary color. The light enters the liquid crystal panels 1110R, 1110B, and 1110G as light valves.
[0076]
The configurations of the liquid crystal panels 1110R, 1110B, and 1110G are as described above, and are driven by R, G, and B primary color signals supplied from a video signal processing circuit (not shown). Now, the light modulated by these liquid crystal panels is incident on the dichroic prism 1112 from three directions. In this dichroic prism 1112, R and B light is refracted at 90 degrees, while G light travels straight. Accordingly, as a result of the synthesis of the images of the respective colors, a color image is projected onto the screen or the like via the projection lens 1114.
[0077]
When the liquid crystal display panel 10 is applied to a projector as described above, the liquid crystal panels 1110R, 1110B, and 1110G are transmissive, so that the pixel electrode is formed of a transparent conductive film such as ITO and is formed separately from the second conductor. It will be.
[0078]
Further, since light corresponding to the primary colors R, G, and B is incident on the liquid crystal panels 1110R, 1110B, and 1110G by the dichroic mirror 1108, it is not necessary to provide a color filter on the counter substrate 32.
[0079]
<Electronic equipment: Part 2>
Further, an example in which the liquid crystal display panel is applied to a personal computer will be described. FIG. 11 is a front view showing the configuration of the personal computer. In the figure, a personal computer 1200 includes a main body 1204 provided with a keyboard 1202 and a liquid crystal display 1206. The liquid crystal display 1206 is configured by adding a color filter and a backlight to the liquid crystal display panel 10 described above.
[0080]
<Electronic equipment: Part 3>
Next, an example in which the liquid crystal display panel is applied to a pager will be described. FIG. 12 is an exploded perspective view showing the structure of the pager. As shown in this figure, the pager 1300 has a configuration in which the liquid crystal display panel 10 is accommodated together with a light guide 1306 including a backlight 1306a, a circuit board 1308, and first and second shield plates 1310 and 1312 in a metal frame 1302. It has become. The liquid crystal display panel 10 and the circuit board 10 are electrically connected to each other by the two elastic conductors 1314 and 1316 for the counter substrate 32 and by the film tape 1318 for the element array substrate 30. .
[0081]
In addition to the electronic devices described with reference to FIGS. 10 to 12, a liquid crystal television, a viewfinder type, a monitor direct view type video tape recorder, a car navigation device, an electronic notebook, a calculator, a word processor, a workstation, Examples of electronic devices include mobile phones, videophones, POS terminals, devices equipped with touch panels, and the like. Needless to say, the present invention can be applied to these various electronic devices.
[0082]
【The invention's effect】
As described above, according to the present invention, in the two-terminal nonlinear element composed of the first conductor-insulator-second conductor, a metal obtained by adding a rare earth element to Al is used as the second conductor. As a result, compared to the case of using pure Al, not only the corrosion resistance and heat resistance are improved, but also the steepness, shift, and drift of the current-voltage characteristics in the two-terminal nonlinear element are improved. When applied to a liquid crystal display panel, it is possible to reduce burn-in and afterimages.
[Brief description of the drawings]
FIG. 1A is a plan view showing a layout of one pixel of a liquid crystal panel substrate to which a TFD element according to an embodiment of the present invention is applied, and FIG. It is sectional drawing.
FIGS. 2 (1) to (6) are diagrams showing a manufacturing process of the TFD element, respectively.
3A is a plan view showing a layout for one pixel of a liquid crystal panel substrate to which another TFD element is applied, and FIG. 3B is a cross-sectional view taken along the line BB in FIG. is there.
FIGS. 4A to 4E are diagrams showing a manufacturing process of the TFD element, respectively. FIGS.
FIGS. 5A and 5B are views showing a manufacturing process of the TFD element, respectively. FIGS.
FIGS. 6A and 6B are diagrams for explaining the superiority of current-voltage characteristics of TFD elements, respectively.
FIG. 7 is a diagram for explaining shift and drift in current-voltage characteristics of a TFD element.
FIG. 8 is a block diagram illustrating a configuration of a liquid crystal display panel and a driving circuit thereof.
FIG. 9 is a partially broken perspective view showing a configuration of a liquid crystal display panel.
FIG. 10 is a cross-sectional view illustrating a configuration of a liquid crystal projector as an example of an electronic apparatus to which a liquid crystal display panel is applied.
FIG. 11 is a front view illustrating a configuration of a personal computer as an example of an electronic apparatus to which a liquid crystal display panel is applied.
FIG. 12 is an exploded perspective view illustrating a configuration of a pager as an example of an electronic apparatus to which a liquid crystal display panel is applied.
[Explanation of symbols]
10. Liquid crystal display panel 12, 48. Scanning line 14. Data line 18. Liquid crystal layer 20, 40. TFD element 22. First conductor film (first conductor)
24 …… Oxide film (insulator)
26 …… Second conductor film (second conductor)
30 …… (element array) substrate 32 …… opposite substrate 36, 45 …… pixel electrode

Claims (5)

A first conductor formed of tantalum alone or a tantalum alloy on a substrate; an insulator formed by anodizing the surface of the first conductor; a second conductor stacked on the insulator; In a two-terminal nonlinear element consisting of
A two-terminal nonlinear element using a metal obtained by adding neodymium to aluminum as the second conductor.   The two-terminal nonlinear element according to claim 1, wherein a metal obtained by adding tungsten to tantalum is used as the first conductor.   3. The two-terminal nonlinear element according to claim 1, wherein the second conductor and the pixel electrode for driving the liquid crystal layer are integrated.   A liquid crystal panel substrate having the two-terminal nonlinear element according to any one of claims 1 to 3 and a counter substrate having a counter electrode are disposed at an appropriate interval. A liquid crystal display panel, wherein liquid crystal is sealed in a gap with a counter substrate.   An electronic apparatus comprising the liquid crystal display panel according to claim 4.

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