JP3469999B2 - Adsorber manufacturing method - Google Patents

Adsorber manufacturing method

Info

Publication number
JP3469999B2
JP3469999B2 JP28797696A JP28797696A JP3469999B2 JP 3469999 B2 JP3469999 B2 JP 3469999B2 JP 28797696 A JP28797696 A JP 28797696A JP 28797696 A JP28797696 A JP 28797696A JP 3469999 B2 JP3469999 B2 JP 3469999B2
Authority
JP
Japan
Prior art keywords
glass
suction
adsorption
wall
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP28797696A
Other languages
Japanese (ja)
Other versions
JPH10128634A (en
Inventor
宏司 寺本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP28797696A priority Critical patent/JP3469999B2/en
Publication of JPH10128634A publication Critical patent/JPH10128634A/en
Application granted granted Critical
Publication of JP3469999B2 publication Critical patent/JP3469999B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04Arrangements of vacuum systems or suction cups
    • B65G2249/045Details of suction cups suction cups

Landscapes

  • Porous Artificial Stone Or Porous Ceramic Products (AREA)
  • Ceramic Products (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Jigs For Machine Tools (AREA)
  • Manipulator (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、真空吸着装置の吸
着面を構成する吸着盤の製造方法に関するものであり、
特に、サイズの異なる半導体ウエハやガラス基板等の被
吸着物を保持するのに適するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a suction plate which constitutes a suction surface of a vacuum suction device,
In particular, it is suitable for holding objects to be adsorbed such as semiconductor wafers and glass substrates having different sizes.

【0002】[0002]

【従来の技術】従来、半導体や液晶基板の製造工程では
被吸着物である半導体ウエハや液晶用ガラス基板等を固
定したり搬送するために真空吸着装置が使用されてい
る。
2. Description of the Related Art Conventionally, in a manufacturing process of a semiconductor or a liquid crystal substrate, a vacuum suction device has been used to fix or convey a semiconductor wafer, a glass substrate for liquid crystal or the like which is an object to be attracted.

【0003】例えば、図9(a)、(b)にマルチタイ
プと呼ばれる真空吸着装置81の構造を示すように、中
央の円盤状をした吸着部材83のまわりに第1の仕切部
材87を介して第2の環状吸着部材84を有するととも
に、さらにそのまわりに第2の仕切部材88を介して第
3の環状吸着部材85を備えた板状体からなる吸着盤8
2と、該吸着盤82を囲繞する凹部95を有する保持基
体91とからなり、上記吸着盤82は吸着部材83、8
4、85を多孔質セラミックスで形成するとともに、仕
切部材87、88を緻密質セラミックスで形成し、それ
ぞれをガラス89で接合したものがあった。
For example, as shown in FIGS. 9 (a) and 9 (b) showing the structure of a vacuum suction device 81 called a multi type, a first partition member 87 is provided around a disk-shaped suction member 83 in the center. And a second annular suction member 84, and a suction plate 8 made of a plate-like body around which a second partition member 88 is provided and a third annular suction member 85.
2 and a holding base 91 having a concave portion 95 surrounding the suction plate 82, and the suction plate 82 has suction members 83, 8
There was one in which 4, 85 were made of porous ceramics, partition members 87, 88 were made of dense ceramics, and they were joined by glass 89.

【0004】また、上記保持基体91の凹部95の底面
には吸着盤82の各吸着部材83、84、85と対応す
る位置に環状の溝92、93、94を備え、これらの溝
92、93、94に連通する吸気孔102、103、1
04を介して真空ポンプ(不図示)により真空吸引する
ことで、吸着面86に載置する被吸着物(不図示)を吸
着保持するようになっている。
Further, on the bottom surface of the concave portion 95 of the holding base 91, annular grooves 92, 93, 94 are provided at positions corresponding to the respective suction members 83, 84, 85 of the suction plate 82, and these grooves 92, 93 are provided. , 94 to the intake holes 102, 103, 1
By vacuum suction via a vacuum pump (not shown) via 04, an object to be sucked (not shown) mounted on the suction surface 86 is sucked and held.

【0005】そして、吸着盤82は各吸着部材83、8
4、85が仕切部材37、38により仕切られて独立し
ていることから、各吸気孔102、103、104の開
閉を制御することで大きさの異なる被吸着物を一つの真
空吸着装置81で保持できるようになっている。
The suction plate 82 is provided with the suction members 83, 8
Since the members 4 and 85 are separated by the partition members 37 and 38 and are independent of each other, by controlling the opening and closing of the intake holes 102, 103 and 104, the objects to be attracted having different sizes can be handled by the single vacuum adsorption device 81. It can be held.

【0006】このような真空吸着装置81を構成する吸
着盤82は、吸着部材83をなす多孔質セラミック製の
円盤体と、吸着部材84、85をなす多孔質セラミック
製のリング体、および仕切部材37、38をなす緻密質
セラミックスからなるリング体とを別々に成形・焼成し
て形成したあとそれぞれをはめ込み、接合部分をガラス
89でもって溶着により一体化して形成されたものがあ
った。
A suction plate 82 constituting such a vacuum suction device 81 has a disk body made of a porous ceramic which constitutes a suction member 83, a ring body made of a porous ceramic which constitutes the suction members 84 and 85, and a partition member. In some cases, the ring bodies 37 and 38 made of dense ceramics were separately formed and fired, and then the pieces were fitted into each other, and the joint portions were fused and integrated with glass 89.

【0007】[0007]

【発明が解決しようとする課題】ところが、吸着盤82
を製作する場合、吸着部材83をなす円盤体及び吸着部
材84、85をなすリング体と、仕切部材87、88を
なすリング体とをそれぞれ隙間なくはめ込む必要がある
のであるが、精密に切削加工を施したとしても必ず隙間
ができ、両者を接合するためにガラス89による融着を
行ったとしても接合部分に0.1mm以上の隙間が残る
ことから吸着盤82の接合強度が弱く、このような吸着
盤82でもって被吸着物を保持しようとすると上記隙間
から空気が漏れ、所望の吸着力が得られないといった恐
れがあった。
However, the suction plate 82
When manufacturing the above, it is necessary to fit the disk body forming the suction member 83 and the ring body forming the suction members 84 and 85 and the ring bodies forming the partition members 87 and 88, respectively, without any gaps, but it is possible to perform a precise cutting process. However, even if the gap is formed, a gap is always formed, and even if the glass 89 is fused to join the two, a gap of 0.1 mm or more remains in the joined portion, so the joining strength of the suction cup 82 is weak. If an object to be adsorbed is held by the suction plate 82, air may leak from the gap and a desired suction force may not be obtained.

【0008】また、吸着部材83、84、85と仕切部
材87、88とが同じ組成のセラミックスで形成されて
いたとしても多孔質セラミックスは緻密質セラミックス
に比べ強度、硬度が小さいことから、緻密質セラミック
スからなるリング体(仕切部材87、88)に多孔質セ
ラミックスからなる円盤体(吸着部材83)及びリング
体(吸着部材84、85)を嵌め込む時に欠けやチッピ
ングを生じ、酷い場合には吸着面82に大きな窪みがで
きるため、吸着保持する被吸着物が半導体ウエハのよう
に薄肉のものである時にはウエハの平坦精度が低下する
といった恐れもあった。
Even if the adsorbing members 83, 84, 85 and the partitioning members 87, 88 are made of ceramics having the same composition, the porous ceramics are smaller in strength and hardness than the dense ceramics, so When the disc body (adsorption member 83) made of porous ceramics and the ring body (adsorption members 84, 85) are fitted into the ring body (partitioning members 87, 88) made of ceramics, chipping or chipping occurs, and in severe cases, adsorption is performed. Since a large depression is formed on the surface 82, the flatness accuracy of the wafer may decrease when the object to be attracted and held by suction is a thin wafer such as a semiconductor wafer.

【0009】しかも、上記吸着盤82の吸着面86は、
被吸着物を高精度に保持するために優れた平坦精度に仕
上げる必要があるのであるが、吸着盤82は緻密質セラ
ミックスからなる仕切部材87、88と多孔質セラミッ
クスからなる吸着部材83、84、85およびガラス8
9とからなるために研摩加工を施すと硬度差の違いによ
り緻密質セラミックスからなる仕切部材87、88に比
べて硬度の小さい多孔質セラミックスからなる吸着部材
83、84、85およびガラス38が大きく削られ、吸
着面86の平坦度を10μm程度にしかできず、これ以
上平坦精度を高めることは難しいものであった。
Moreover, the suction surface 86 of the suction plate 82 is
Although it is necessary to finish the object to be adsorbed with high accuracy to an excellent flatness accuracy, the adsorption plate 82 has partition members 87 and 88 made of dense ceramics and adsorption members 83 and 84 made of porous ceramics. 85 and glass 8
When the polishing process is performed, the adsorption members 83, 84, 85 and the glass 38, which are made of porous ceramics and have a hardness smaller than that of the partition members 87, 88, which are made of the dense ceramics, are largely scraped due to the difference in hardness. Therefore, the flatness of the suction surface 86 can only be about 10 μm, and it is difficult to further improve the flatness accuracy.

【0010】[0010]

【0011】[0011]

【課題を解決するための手段】そこで、本発明は上記課
題に鑑み、本発明は被吸着物を吸着保持する吸着面が、
複数個の多孔質セラミックスからなる吸着部材と、これ
ら吸着部材同士を接合するガラス融着壁とからなる 吸着
盤の製造方法において、上記ガラス融着壁に対応する凸
壁部を有する金型内にセラミック原料を充填して加圧成
形することで上記凸壁部に対応する溝を備えた成形体を
製作し、この成形体をセラミック原料が完全に焼結する
のに必要な温度より若干低い温度で焼成して多孔質セラ
ミック体を製作したあと、該多孔質セラミック体の溝に
ガラスペーストを充填して硬化させて上記ガラス融着壁
を形成し、しかるのち、上記ガラス融着壁のない多孔質
セラミック体の部分を研削加工により取り除くことで
多孔質セラミックスからなる吸着部材とガラス融着壁と
を交互に配設してなる板状の吸着盤を製造するものであ
る。
Therefore, the present invention is based on the above-mentioned section.
In view of the problem, the present invention has an adsorption surface for adsorbing and holding an object to be adsorbed,
Adsorption member composed of a plurality of porous ceramics, and
In a method for manufacturing an adsorption disk composed of a glass fusing wall for joining adsorbing members to each other, by filling a ceramic raw material into a mold having a convex wall portion corresponding to the glass fusing wall and performing pressure molding. After manufacturing a molded body having a groove corresponding to the convex wall portion and firing the molded body at a temperature slightly lower than a temperature required for completely sintering the ceramic raw material, a porous ceramic body is manufactured. The glass fusion wall is filled with glass paste in the groove of the porous ceramic body and hardened.
And then the porous glass without the glass fusion wall
By removing the part of the ceramic body by grinding ,
It is intended to manufacture a plate-shaped adsorption board in which adsorption members made of porous ceramics and glass fusing walls are alternately arranged.

【0012】さらに、本発明は焼失材を添加したセラミ
ック原料を、ガラス融着壁に対応する凸壁部を有する金
型内に充填して加圧成形することで上記凸壁部に対応す
る溝を備えた成形体を製作し、この成形体をセラミック
原料が完全に焼結するのに必要な温度で焼成して多孔質
セラミック体を製作したあと、多孔質セラミック体の溝
にガラスペーストを充填して硬化させて上記ガラス融着
壁を形成し、しかるのち、上記ガラス融着壁のない多孔
質セラミック体の部分を研削加工により取り除くこと
、多孔質セラミックスからなる吸着部材とガラス融着
壁とを交互に配設してなる板状の吸着盤を製造するもの
である。
Further, according to the present invention, the ceramic raw material to which the burned material is added is filled into a mold having a convex wall portion corresponding to the glass fusing wall and pressure-molded to form a groove corresponding to the convex wall portion. After forming a molded body with the above, and firing this molded body at the temperature necessary to completely sinter the ceramic raw material to manufacture a porous ceramic body, fill the groove of the porous ceramic body with glass paste. And then cure to fuse the above glass
Forming a wall, and then the above-mentioned glass fusion wall without porosity
To remove parts of fine ceramic body by grinding
Then, a plate-shaped suction plate in which suction members made of porous ceramics and glass fusing walls are alternately arranged is manufactured.

【0013】[0013]

【発明の実施の形態】以下、本発明の実施形態を説明す
る。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below.

【0014】図1は本発明の吸着盤2を具備する真空吸
着装置1を示す図であり、(a)は斜視図、(b)はX
−X線断面図である。
1A and 1B are views showing a vacuum suction device 1 equipped with a suction plate 2 of the present invention. FIG. 1A is a perspective view, and FIG.
It is a X-ray sectional view.

【0015】この真空吸着装置1は、中央の円盤状をし
た吸着部材21のまわりに、環状のガラス融着壁24を
介して第2の環状をした吸着部材22を有するととも
に、さらにそのまわりに環状のガラス融着壁25を介し
て第3の環状をした吸着部材23を備えた円板状の板状
体からなり、該板状体の一表面を吸着面5としてなる吸
着盤2と、該吸着盤2の外周を囲繞する環状壁35を備
え、該環状壁35の内側に上記吸着盤2を嵌入する凹部
34を備えた保持基体3とからなり、上記吸着盤2は吸
着面5が保持基体3の環状壁35と同一平面上に位置す
るように配置してある。
This vacuum suction device 1 has a second disk-shaped suction member 22 around a disk-shaped suction member 21 in the center through a glass fusion wall 24 having an annular shape, and further around it. A suction plate 2 comprising a disk-shaped plate-like body having a third annular suction member 23 via an annular glass fusing wall 25, and one surface of the plate-shaped body serving as a suction surface 5; The suction base 2 includes an annular wall 35 surrounding the outer circumference of the suction base 2, and a holding base 3 having a recess 34 in which the suction base 2 is fitted inside the annular wall 35. It is arranged so as to be located on the same plane as the annular wall 35 of the holding base 3.

【0016】上記吸着盤2を構成する吸着部材21、2
2、23は、いずれも同一組成でかつ気孔率30〜40
%、平均気孔径5〜200μmの多孔質セラミックスに
より形成してあり、これらの吸着部材21、22、23
同士を接合するガラス融着壁24、25の幅tは0.5
〜2.0mmとしてある。なお、ガラス融着壁24、2
5の幅tとは、各吸着部材21、22、23間にのみ介
在するガラス部分の厚みのことである。
Adsorption members 21, 2 constituting the adsorption plate 2
2 and 23 have the same composition and a porosity of 30 to 40
%, A porous ceramics having an average pore diameter of 5 to 200 μm, and these adsorption members 21, 22, 23
The width t of the glass fusing walls 24 and 25 for joining the two is 0.5.
~ 2.0 mm. The glass fusing walls 24, 2
The width t of 5 is the thickness of the glass portion interposed only between the suction members 21, 22, and 23.

【0017】また、保持基体3の凹部34の底面中央に
は、上記吸着盤2の円盤状をした吸着部材21と連通す
るホール31を穿設するとともに、該ホール31を中心
に吸着盤2の環状をした吸着部材22、23と各々連通
する同心円状の環状溝32、33をそれぞれ穿設してあ
り、これらのホール31及び環状溝32、33と連通す
る吸気孔41、42、43を介して真空ポンプ(不図
示)により真空吸引することで、吸着面5に載置した被
吸着物(不図示)を吸着保持するようになっている。
A hole 31 communicating with the disk-shaped suction member 21 of the suction plate 2 is formed in the center of the bottom surface of the recess 34 of the holding substrate 3, and the suction plate 2 is centered around the hole 31. Concentric annular grooves 32 and 33 are formed to communicate with the suction members 22 and 23 having an annular shape, respectively, and through intake holes 41, 42 and 43 that communicate with the holes 31 and the annular grooves 32 and 33, respectively. By vacuum suction by a vacuum pump (not shown), an object to be adsorbed (not shown) placed on the adsorption surface 5 is adsorbed and held.

【0018】また、この吸着盤2は各吸着部材21、2
2、23がガラス融着壁24、25により仕切られて独
立していることから、各吸気孔41、42、43の開閉
を制御することで大きさの異なる被吸着物を一つの真空
吸着装置1で保持することができる。
The suction plate 2 is provided with the suction members 21, 2
Since 2 and 23 are separated by the glass fusing walls 24 and 25 and are independent of each other, by controlling the opening and closing of the intake holes 41, 42, and 43, the objects to be adsorbed having different sizes are combined into one vacuum adsorption device. It can be held at 1.

【0019】このように、本発明に係る吸着盤2は、各
吸着部材21、22、23がいずれも同一組成の多孔質
セラミックスからなり、同じ平均気孔径及び気孔率を有
するとともに、従来の吸着盤82のような緻密質セラミ
ックスからなる仕切部材87、88を有していないこと
から、吸着面5に研摩加工を施せば、各吸着部材21、
22、23とも同じ量だけ削ることができる。しかも、
各吸着部材21、22、23を接合するガラス融着壁2
4、25の幅tは0.5〜2.0mmと非常に小さいこ
とから、ガラス融着壁24、25が吸着部材21、2
2、23に比べて削られたとしても、吸着面5の平坦精
度に与える影響が少なく、吸着面5の平坦精度を大幅に
高めることができる。
As described above, in the adsorption plate 2 according to the present invention, each of the adsorption members 21, 22 and 23 is made of porous ceramics having the same composition, has the same average pore diameter and porosity, and has a conventional adsorption property. Since the partition members 87 and 88 made of dense ceramics such as the board 82 are not provided, if the suction surface 5 is subjected to polishing processing, each suction member 21,
Both 22 and 23 can be cut by the same amount. Moreover,
A glass fusing wall 2 for joining the adsorbing members 21, 22, 23
Since the width t of 4 and 25 is as small as 0.5 to 2.0 mm, the glass fusing walls 24 and 25 are attached to the suction members 21 and 2.
Even if it is scraped as compared with Nos. 2 and 23, there is little influence on the flatness accuracy of the suction surface 5, and the flatness accuracy of the suction surface 5 can be significantly improved.

【0020】その為、本発明に係る吸着盤2を具備する
真空吸着装置1を用いれば、半導体ウエハのように薄肉
で変形し易い被吸着物を吸着保持したとしても吸着面5
の平坦精度にならわせて精度良く保持することができ、
保持した被吸着物の表面に研摩加工等の処理を施したと
してもガラス融着壁24、25の形状が模様として写し
出されることはなく、吸着面5の平坦精度にならわせて
平坦に仕上げることができる。
Therefore, by using the vacuum suction device 1 provided with the suction plate 2 according to the present invention, the suction surface 5 can be held even if an object to be sucked that is thin and easily deformed, such as a semiconductor wafer, is sucked and held.
Can be held with high accuracy by following the flatness accuracy of
Even if the surface of the held object to be adsorbed is subjected to processing such as polishing, the shapes of the glass fusing walls 24 and 25 are not projected as a pattern, and the surface is finished to be flat according to the flatness accuracy of the adsorbing surface 5. You can

【0021】また、本発明に係る吸着盤2は、吸着面5
における吸着部材21、22、23の占める割合が大き
く、被吸着物のほぼ全面を吸着保持することができるた
め、従来の同径をした吸着盤82と比べてより大きな吸
引力でもって被吸着物を吸着保持することができる。
The suction plate 2 according to the present invention has a suction surface 5
Since the adsorbing members 21, 22, 23 occupy a large proportion of the adsorbing member, and almost the entire surface of the adsorbed object can be adsorbed and held, the adsorbed object has a larger suction force than the conventional suction plate 82 having the same diameter. Can be adsorbed and held.

【0022】なお、ガラス融着壁24、25の幅tを
0.5〜2.0mmとしたのは、幅tが2.0mmより
大きくなると、多孔質セラミックスからなる吸着部材2
1、22、23に比べて削られるガラス融着壁24、2
5の割合が多くなりすぎるために吸着面5の平坦精度を
それほど高めることができず、また、吸着盤2の強度が
低下するために、被吸着物を真空吸引すると吸着面5が
凹状に変形し、被吸着物を精度良く保持することができ
なくなるからであり、逆に、幅tを0.5mm未満とす
ることは製造上難しいからである。
The width t of the glass fusing walls 24 and 25 is set to 0.5 to 2.0 mm, because when the width t is larger than 2.0 mm, the adsorption member 2 made of porous ceramics is used.
Glass fusing walls 24, 2 that are cut compared to 1, 22, 23
Since the ratio of 5 is too large, the flatness accuracy of the suction surface 5 cannot be increased so much, and the strength of the suction plate 2 is reduced, so that the suction surface 5 is deformed into a concave shape when the suction target is vacuum-sucked. However, it is difficult to accurately hold the object to be adsorbed, and conversely, it is difficult to make the width t less than 0.5 mm in manufacturing.

【0023】次に、図1に示す真空吸着装置1に備える
吸着盤2の製造方法について説明する。
Next, a method of manufacturing the suction plate 2 provided in the vacuum suction device 1 shown in FIG. 1 will be described.

【0024】まず、図2(a)に示すようなガラス融着
壁24、25に対応する環状の凸壁部54、55を同心
円状に突設させてなる金型50を用意し、この金型50
内に図3(a)に示すようにセラミック原料70を充填
したあと、図3(b)に示すような上パンチ60を下降
させて加圧成形することで、図4(a)、(b)に示す
ような金型60の凸壁部54、55に対応した環状溝7
4、75を同心円状に備えてなる成形体71を製作す
る。
First, as shown in FIG. 2 (a), a mold 50 is prepared in which annular convex wall portions 54 and 55 corresponding to the glass fusing walls 24 and 25 are concentrically projected. Mold 50
After the ceramic raw material 70 is filled in the inside as shown in FIG. 3A, the upper punch 60 as shown in FIG. The annular groove 7 corresponding to the convex wall portions 54 and 55 of the mold 60 as shown in FIG.
A molded body 71 having concentric circles 4 and 75 is manufactured.

【0025】ここでセラミック原料70とは、アルミ
ナ、炭化珪素などを主体とし、これらの原料にバインダ
ーと溶媒を添加混合して形成した造粒体のことであり、
例えば、アルミナを主体とする時には焼結助剤としてM
gO、SiO2 、CaO、TiO2 等を添加したセラミ
ック原料70を用いれば良く、炭化珪素を主体とする時
には焼結助剤としてAl2 3 とY2 3 又はBとCを
添加したセラミック原料70を使用すれば良い。
Here, the ceramic raw material 70 is a granulated body mainly composed of alumina, silicon carbide, etc., and a binder and a solvent are added to and mixed with these raw materials,
For example, when the main component is alumina, M is used as a sintering aid.
A ceramic raw material 70 to which gO, SiO 2 , CaO, TiO 2 or the like is added may be used. When the main component is silicon carbide, a ceramic containing Al 2 O 3 and Y 2 O 3 or B and C as a sintering aid is used. The raw material 70 may be used.

【0026】また、上パンチ60の先端面には金型50
の底面に突設する凸壁部54、55間に対応する環状の
凸部61、62、63を設けてあり、加圧成形時に金型
50に備える凸壁部54、55上部に充填されたセラミ
ック原料70aと凸壁部54、55以外の部分に充填さ
れたセラミック原料70bに加える圧力を一定にし、原
料粉末の詰まりが均一となるようにしてある。
The die 50 is provided on the tip surface of the upper punch 60.
Corresponding annular convex portions 61, 62, 63 are provided between the convex wall portions 54, 55 protruding from the bottom surface of the mold, and are filled in the upper portions of the convex wall portions 54, 55 provided in the mold 50 at the time of pressure molding. The pressure applied to the ceramic raw material 70a and the ceramic raw material 70b filled in the portions other than the convex wall portions 54 and 55 is made constant so that the raw material powder is uniformly clogged.

【0027】次に、後述する環状溝74、75へのガラ
スペーストの注入時にガラスペーストが成形体71内に
流れ込むことを防ぐため、図4(a)、(b)に示す成
形体71をセラミック原料70を完全に焼結させる温度
よりも若干低い温度にて焼成し、気孔率30〜40%、
平均気孔径5〜200μmの多孔質セラミック体を形成
する。
Next, in order to prevent the glass paste from flowing into the molded body 71 at the time of injecting the glass paste into the annular grooves 74 and 75 which will be described later, the molded body 71 shown in FIGS. Firing at a temperature slightly lower than the temperature at which the raw material 70 is completely sintered, porosity of 30 to 40%,
A porous ceramic body having an average pore diameter of 5 to 200 μm is formed.

【0028】具体的には、アルミナを主体とするセラミ
ック原料70を用いた時には、大気雰囲気にて1100
〜1200℃程度の温度で2時間程度焼成すれば良く、
炭化珪素を主体とするセラミック原料70を用いた時に
は、不活性ガス雰囲気にて1800〜1900℃程度の
温度で2時間程度焼成すれば良い。
Specifically, when the ceramic raw material 70 mainly composed of alumina is used, 1100 is used in the air atmosphere.
It may be fired at a temperature of about 1200 ° C for about 2 hours,
When the ceramic raw material 70 mainly containing silicon carbide is used, it may be fired in an inert gas atmosphere at a temperature of about 1800 to 1900 ° C. for about 2 hours.

【0029】しかるのち、焼結した多孔質セラミック体
の環状溝74、75に粘度調整したガラスペーストを注
入し、1100〜1200の温度で焼成することでガラ
スを硬化させ、図5(a)、(b)に示すようなガラス
融着壁24、25を有する多孔質セラミック体76を形
成したあと、ガラス融着壁24、25のない部分を研削
加工により取り除くことで、図6(a)、(b)に示す
ような複数個の多孔質セラミックスからなる吸着部材2
1、22、23と、これら吸着部材21、22、23同
士を接合するガラス融着壁24、25とを交互に配設し
てなる板状の吸着盤2を得ることができる。
Then, the viscosity-adjusted glass paste is injected into the annular grooves 74 and 75 of the sintered porous ceramic body, and the glass is cured by firing at a temperature of 1100 to 1200, as shown in FIG. After forming the porous ceramic body 76 having the glass fusing walls 24 and 25 as shown in (b), the portion without the glass fusing walls 24 and 25 is removed by grinding to obtain the structure shown in FIG. Adsorption member 2 made of a plurality of porous ceramics as shown in (b)
It is possible to obtain the plate-shaped suction plate 2 in which 1, 22, 23 and glass fusing walls 24, 25 for joining the suction members 21, 22, 23 are alternately arranged.

【0030】このように本発明では、予めガラス融着壁
24、25に対応する溝77、78を有する多孔質セラ
ミック体76を形成し、上記溝77、78にガラスペー
ストを充填して焼成することでガラスを硬化させたあ
と、所定の形状に研削加工を施して製作するようにした
ことから、従来の吸着盤82のように別々に形成した吸
着部材83、84、85と仕切部材87、88とを高精
度に加工して嵌め合わせるといった作業が必要がなく容
易に製作することができる。
As described above, in the present invention, the porous ceramic body 76 having the grooves 77 and 78 corresponding to the glass fusing walls 24 and 25 is formed in advance, and the grooves 77 and 78 are filled with the glass paste and fired. After the glass is hardened in this manner, it is manufactured by grinding the glass into a predetermined shape. Therefore, the suction members 83, 84, 85 and the partition member 87, which are separately formed like the conventional suction plate 82, are manufactured. It is possible to manufacture easily without the work of processing with high precision and fitting.

【0031】しかも、多孔質セラミック体76の溝7
7、78には十分な量のガラスを充填してガラス融着壁
24、25を形成することができるため、吸着盤2を構
成する吸着部材21、22、23とガラス融着壁24、
25との間には隙間がなく、両者を強固に接合すること
ができる。
Moreover, the groove 7 of the porous ceramic body 76
Since the glass fusing walls 24, 25 can be formed by filling a sufficient amount of glass in 7, 78, the adsorbing members 21, 22, 23 and the glass fusing wall 24, which constitute the suction plate 2,
There is no gap between the two and 25, and both can be firmly joined.

【0032】その上、多孔質セラミック体76の溝7
7、78の幅を小さくしてもガラスペーストの粘度を調
整することで十分な量のガラスを充填することができる
ため、ガラス融着壁24、25の幅tが0.5〜2.0
mmと非常に小さな吸着盤2の製作も可能である。
In addition, the groove 7 of the porous ceramic body 76
Even if the width of 7, 78 is reduced, a sufficient amount of glass can be filled by adjusting the viscosity of the glass paste. Therefore, the width t of the glass fusing walls 24, 25 is 0.5 to 2.0.
It is possible to manufacture the suction cup 2 having a very small size of mm.

【0033】一方、上記吸着盤2の製造工程において、
多孔質セラミック体76の他の製造方法として、セラミ
ック原料70に、ポリエチレン、ポリビニルアルコー
ル、ポリプロピレン、酢酸ビニール、アクリル樹脂、セ
ルロース、炭化カルシウム、炭化マグネシウムなどの焼
成時に燃えてなくなる焼失材を添加し、この原料を吸着
盤2のガラス融着壁24、25に対応する環状の凸壁部
54、55を有する金型50内に充填して加圧成形する
ことで図4(a)、(b)に示すような金型60の凸壁
部54、55に対応した環状溝74、75を同心円状に
備えてなる成形体71を製作し、しかるのち、この成形
体71を構成するセラミック原料70を完全に焼結させ
る温度にて焼成することで形成することもできる。
On the other hand, in the manufacturing process of the suction plate 2,
As another method of manufacturing the porous ceramic body 76, a burnable material such as polyethylene, polyvinyl alcohol, polypropylene, vinyl acetate, acrylic resin, cellulose, calcium carbide, or magnesium carbide that does not burn when fired is added to the ceramic raw material 70, This raw material is filled in a mold 50 having annular convex wall portions 54 and 55 corresponding to the glass fusing walls 24 and 25 of the suction plate 2 and pressure-molded to thereby perform the molding as shown in FIGS. A molded body 71 having annular grooves 74 and 75 corresponding to the convex wall portions 54 and 55 of the mold 60 as shown in FIG. 2 is concentrically provided, and then the ceramic raw material 70 constituting the molded body 71 is manufactured. It can also be formed by firing at a temperature for complete sintering.

【0034】この方法によれば、セラミック原料70を
完全に焼結させる温度にて焼成することができるため、
より高硬度、高強度を有する吸着盤2の製作が可能であ
る。
According to this method, since the ceramic raw material 70 can be fired at a temperature at which it is completely sintered,
It is possible to manufacture the suction plate 2 having higher hardness and higher strength.

【0035】具体的には、セラミック原料70に対し、
2〜30重量%の範囲で焼失材を添加した原料を所定の
形状に成形し、セラミック原料70がアルミナを主体と
するものである時には、大気雰囲気にて1600〜18
00℃程度の温度で1〜2時間程度焼成すれば良く、炭
化珪素を主体とするセラミック原料70を用いた時に
は、1900〜2000℃程度の温度で1〜2時間程度
焼成することで三次元網目構造を有する多孔質セラミッ
ク体76を得ることができる。
Specifically, for the ceramic raw material 70,
A raw material added with burned material in the range of 2 to 30% by weight is molded into a predetermined shape, and when the ceramic raw material 70 is mainly composed of alumina, 1600 to 18 in an air atmosphere.
It may be fired at a temperature of about 00 ° C. for about 1 to 2 hours. When the ceramic raw material 70 mainly composed of silicon carbide is used, it is fired at a temperature of about 1900 to 2000 ° C. for about 1 to 2 hours to form a three-dimensional mesh. A porous ceramic body 76 having a structure can be obtained.

【0036】また、この方法を用いれば、セラミック原
料70としてアルミナや炭化珪素以外に窒化珪素やジル
コニアを主体とするセラミック原料70を使用すること
もでき、例えば、窒化珪素を主体とする場合、焼結助剤
としてAl2 3 とY2 3を添加したセラミック原料
70を用い、窒素雰囲気にて1700〜1800℃程度
の温度で2時間程度焼成すれば良く、ジルコニアを主体
とする時には安定化剤としてY2 3 、CaO、Mg
O、CeO2 等添加したセラミック原料70を用い、大
気雰囲気にて1400〜1650℃程度の温度で2時間
程度焼成すれば良い。
By using this method, it is possible to use, as the ceramic raw material 70, a ceramic raw material 70 mainly composed of silicon nitride or zirconia in addition to alumina or silicon carbide. It is sufficient to use a ceramic raw material 70 to which Al 2 O 3 and Y 2 O 3 are added as a co-agent, and to calcinate it in a nitrogen atmosphere at a temperature of about 1700 to 1800 ° C. for about 2 hours. When zirconia is the main constituent, it is stabilized. Y 2 O 3 , CaO, Mg as agents
The ceramic raw material 70 added with O, CeO 2 or the like may be used and fired in the air at a temperature of about 1400 to 1650 ° C. for about 2 hours.

【0037】さらに、前述した製造方法では多孔質セラ
ミック体76の表面に形成する溝77、78を金型50
の底面に形成した凸壁部54、55により形成したが、
予め板状の多孔質セラミック体75を形成しておき、そ
の表面に研削加工を施すことでガラス融着壁24、25
の形状に合致した溝77、78を形成しても構わない。
Further, in the above-mentioned manufacturing method, the grooves 77 and 78 formed on the surface of the porous ceramic body 76 are formed in the mold 50.
The convex walls 54 and 55 formed on the bottom surface of the
The plate-shaped porous ceramic body 75 is formed in advance, and the glass fusion walls 24, 25 are formed by grinding the surface thereof.
The grooves 77 and 78 that match the shape of the above may be formed.

【0038】なお、図1ではガラス融着壁24、25の
形状を環状としたものを示したが、これらについても金
型50に突設する凸壁部54、55の形状をそれぞれ変
えることで、図7(a)に示すようなガラス融着壁2
4、25が三角形をしたしたものや、図7(b)、
(c)に示すような吸着盤2そのものが角板や楕円板を
したもので、その外形状と相似のガラス融着壁24、2
5を有するもの、あるいは図7(d)に示すような板状
の吸着盤26と細板状のガラス融着壁27とが交互に配
設された板状体をしたものなど使用目的に応じて適宜変
更することができる。
In FIG. 1, the glass fusing walls 24 and 25 are shown to have a ring shape. However, the shape of the convex wall portions 54 and 55 projecting from the mold 50 can be changed for these as well. , A glass fusing wall 2 as shown in FIG.
4 and 25 have a triangular shape, and FIG. 7 (b),
The suction plate 2 itself as shown in (c) is a square plate or an elliptical plate, and the glass fusing walls 24, 2 similar to the outer shape thereof.
5 or a plate-shaped body in which plate-shaped suction plates 26 and thin plate-shaped glass fusing walls 27 are alternately arranged as shown in FIG. 7D, depending on the purpose of use. Can be changed as appropriate.

【0039】次に、本発明の他の実施形態について説明
する。
Next, another embodiment of the present invention will be described.

【0040】図8は本発明の他の吸着盤2を具備する真
空吸着装置1を示す図であり、(a)は斜視図、(b)
はY−Y線断面図である。
8A and 8B are views showing a vacuum suction device 1 provided with another suction plate 2 of the present invention, wherein FIG. 8A is a perspective view and FIG.
FIG. 6 is a sectional view taken along line YY

【0041】この真空吸着装置1は、基本的な構造は図
1と同じであるが、吸着盤2の吸着面5を保持基体3の
環状壁35より突出させてあり、吸着盤2の最外周に膜
厚が1〜2mm程度のガラスや樹脂からなるシール膜4
を被着したものである。
This vacuum suction device 1 has the same basic structure as that of FIG. 1, but the suction surface 5 of the suction plate 2 is made to project from the annular wall 35 of the holding substrate 3, and the outermost periphery of the suction plate 2 is provided. A sealing film 4 made of glass or resin having a film thickness of about 1 to 2 mm
It is the one that is attached.

【0042】この構造によれば、吸着盤2の吸着面5の
みで被吸着物を保持することができるため、より精度良
く被吸着物を保持することができる。
According to this structure, since the object to be adsorbed can be held only by the adsorption surface 5 of the adsorption platen 2, the object to be adsorbed can be held more accurately.

【0043】[0043]

【実施例】ガラス融着壁24、25の幅tをそれぞれ変
化させた吸着盤2を試作し、これらの吸着盤2の吸着面
5に研摩加工を施した時の平坦精度について測定を行っ
た。
EXAMPLE A suction cup 2 having different widths t of the glass fusing walls 24 and 25 was prototyped, and the flatness accuracy when the suction surface 5 of each of the suction cups 2 was subjected to polishing was measured. .

【0044】本実験で使用する吸着盤2は、Al2 3
粉末90重量%に対し、焼結助剤としてSiO2 粉末を
10重量%添加し、溶媒及びバインダーとともに混練乾
燥させたあと、このセラミック原料を2重の環状凸壁部
54、55を有する金型50内に充填して300kg/
cm2 程度の圧力で加圧成形し、しかるのち、大気雰囲
気中で1200℃の温度で2時間焼成することで、表面
に2重の環状溝74、75を有するとともに、気孔率3
8%、平均気孔径50μmのアルミナセラミックスから
なる多孔質セラミック体76を形成し、次に、多孔質セ
ラミック体76の環状溝74、75にガラスペーストを
注入して1100℃程度の温度で焼成することでガラス
を硬化させ、しかるのち切削加工を施すことにより外径
200mm、厚み7mmの板状体を切り出したものを使
用した。
The adsorption disk 2 used in this experiment is made of Al 2 O 3
10% by weight of SiO 2 powder as a sintering aid was added to 90% by weight of the powder, and the mixture was kneaded and dried with a solvent and a binder, and then this ceramic raw material was molded into a mold having double annular convex walls 54 and 55. 300 kg /
By press-molding at a pressure of about cm 2 and then firing at a temperature of 1200 ° C. for 2 hours in an air atmosphere, the surface has double annular grooves 74 and 75 and a porosity of 3
A porous ceramic body 76 made of alumina ceramics having an average pore diameter of 50 μm and 8% is formed, and then glass paste is injected into the annular grooves 74 and 75 of the porous ceramic body 76 and fired at a temperature of about 1100 ° C. Thus, the glass was hardened, and after that, a plate-like body having an outer diameter of 200 mm and a thickness of 7 mm was cut out by cutting to be used.

【0045】そして、この板状体の一表面にダイヤモン
ド砥粒を用いて研摩加工を施して吸着面5を形成し、こ
の吸着面5の表面状態を真直度測定器で測定した。
Then, one surface of the plate-shaped body was subjected to polishing using diamond abrasive grains to form a suction surface 5, and the surface condition of the suction surface 5 was measured by a straightness measuring instrument.

【0046】なお、基準試料として気孔率、平均気孔径
が上記吸着盤2と同じアルミナセラミックスを用意し、
同様にダイヤモンド砥粒を用いて研摩加工を施したとこ
ろ、その平坦度は0.3μmであった。
Alumina ceramics having the same porosity and average pore size as those of the adsorption plate 2 were prepared as a reference sample.
Similarly, when polishing was performed using diamond abrasive grains, the flatness was 0.3 μm.

【0047】それぞれの結果は表1に示す通りである。The respective results are shown in Table 1.

【0048】[0048]

【表1】 [Table 1]

【0049】この結果、ガラス融着壁24、25の幅t
が3mmであると、多孔質セラミックスからなる吸着部
材21、22、23に比べて多く削られるガラス融着壁
24、25の幅tが長すぎるために吸着面5の平坦度は
3μm程度としかできなかった。
As a result, the width t of the glass fusing walls 24, 25 is t.
Is 3 mm, the flatness of the adsorbing surface 5 is only about 3 μm because the width t of the glass fusing walls 24, 25 that are abraded more than the adsorbing members 21, 22, 23 made of porous ceramics is too long. could not.

【0050】これに対し、ガラス融着壁24、25の幅
tが2mm以下であれば、多孔質セラミックスからなる
吸着部材21、22、23に比べて多く削られたとして
も、その幅tが狭いことから吸着面5の平坦精度に与え
る影響は少なく、平坦度を1μm以下とすることができ
た。特に、ガラス融着壁24、25の幅tを0.5mm
としたものにおいては、吸着面5の平坦度を0.3μm
とガラス融着壁24、25のない基準試料と同等の平坦
精度を得ることができた。
On the other hand, when the width t of the glass fusing walls 24 and 25 is 2 mm or less, the width t is larger than that of the adsorbing members 21, 22 and 23 made of porous ceramics. Since it is narrow, it has little influence on the flatness of the suction surface 5, and the flatness can be set to 1 μm or less. In particular, the width t of the glass fusing walls 24 and 25 is 0.5 mm.
The flatness of the suction surface 5 is 0.3 μm.
It was possible to obtain the same flatness accuracy as that of the reference sample without the glass fusing walls 24 and 25.

【0051】このことから、ガラス融着壁24、25の
幅tを2mm以下とすれば吸着面5を優れた平坦精度に
仕上げることができることが判る。
From this, it is understood that the suction surface 5 can be finished with excellent flatness accuracy by setting the width t of the glass fusing walls 24 and 25 to 2 mm or less.

【0052】[0052]

【発明の効果】以上のように、本発明によれば、従来の
吸着盤のような緻密質セラミックスからなる仕切部材が
なく、吸着面の研摩加工時に硬度の低いガラス融着壁が
吸着部材に比べて大きく削られたとしてもその幅が非常
に小さいことから、吸着面の平坦精度を高精度に仕上げ
ることができるとともに、十分な強度を有することから
被吸着物を真空吸引しても吸着面が凹状に変形すること
がない。
As described above , according to the present invention, there is no partition member made of dense ceramics unlike the conventional suction plate, and the glass fusing wall having a low hardness at the time of polishing the suction surface is used as the suction member. Even if it is greatly shaved, its width is very small, so that the flatness of the suction surface can be finished with high accuracy, and since it has sufficient strength, the suction surface can be suctioned even if the suction target is vacuum-sucked. Does not deform into a concave shape.

【0053】その為、吸着面に吸着保持した被吸着物の
表面を研摩してもガラス融着壁の形状が模様として写し
出されることがなく、吸着面の平坦精度にならわせて被
吸着物を吸着保持することができる。
Therefore, even if the surface of the object to be adsorbed and held on the adsorbing surface is polished, the shape of the glass fusion wall is not projected as a pattern, and the object to be adsorbed is made to follow the flatness of the adsorbing surface. Can be held by adsorption.

【0054】しかも、ガラス融着壁の幅が小さいことか
ら、吸着面における吸着部材の占める割合を大きくする
ことができ、従来の同径をした吸着盤と比べてより大き
な吸引力でもって被吸着物を吸着保持することができ
る。
Moreover, since the width of the glass fusing wall is small, the ratio of the adsorbing member to the adsorbing surface can be increased, and the adsorbed material can be adsorbed with a larger suction force than the conventional suction disk having the same diameter. Objects can be adsorbed and held.

【0055】また、本発明によれば、従来の吸着盤のよ
うに別々に形成した吸着部材と仕切部材とを高精度に加
工して嵌め合わせるといった作業が必要がなく容易に製
作することができる。しかも、多孔質セラミック体の溝
には十分な量のガラスを充填してガラス融着壁を形成す
ることができるため、吸着盤を構成する複数個の吸着部
材同士を強固に接合することができ、十分な強度を持っ
た吸着盤を得ることができる。
Further , according to the present invention, it is possible to easily manufacture the suction member and the partition member, which are separately formed as in the conventional suction plate, without the work of highly accurately processing and fitting them together. . Moreover, since the glass fusing wall can be formed by filling the groove of the porous ceramic body with a sufficient amount of glass, it is possible to firmly bond the plurality of suction members constituting the suction plate. It is possible to obtain a suction cup having sufficient strength.

【0056】その上、多孔質セラミック体の溝の幅を小
さくしてもガラスペーストの粘度を調整することで十分
な量のガラスを充填することができるため、ガラス融着
壁の幅が非常に小さな吸着盤も製作することができる。
In addition, even if the width of the groove of the porous ceramic body is reduced, a sufficient amount of glass can be filled by adjusting the viscosity of the glass paste, so that the width of the glass fusion wall is very large. Small suction cups can also be manufactured.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る吸着盤を備える真空吸着装置を示
す図であり、(a)は一部を破断した斜視図、(b)は
そのX−X線断面図である。
FIG. 1 is a diagram showing a vacuum suction device provided with a suction plate according to the present invention, (a) is a partially broken perspective view, and (b) is a sectional view taken along line XX thereof.

【図2】本発明に係る吸着盤を製作するための金型を示
す斜視図である。
FIG. 2 is a perspective view showing a mold for manufacturing the suction plate according to the present invention.

【図3】(a)、(b)は本発明に係る吸着盤の製造方
法を説明するための各工程毎の断面図である。
3 (a) and 3 (b) are cross-sectional views for each step for explaining the method of manufacturing the suction cup according to the present invention.

【図4】本発明に係る吸着盤の製造途中の成形体を示す
図であり、(a)は斜視図、(b)はそのA−A線断面
図である。
FIG. 4 is a diagram showing a molded body in the process of manufacturing the suction cup according to the present invention, in which (a) is a perspective view and (b) is a sectional view taken along line AA.

【図5】本発明に係る吸着盤の製造途中の多孔質セラミ
ック体を示す図であり、(a)は斜視図、(b)はその
B−B線断面図である。
5A and 5B are views showing a porous ceramic body in the process of manufacturing an adsorption disk according to the present invention, FIG. 5A is a perspective view, and FIG. 5B is a sectional view taken along line BB.

【図6】本発明に係る吸着盤を示す図であり、(a)は
斜視図、(b)はC−C線断面図である。
6A and 6B are views showing a suction plate according to the present invention, in which FIG. 6A is a perspective view and FIG. 6B is a sectional view taken along line CC.

【図7】(a)〜(d)は本発明に係る他の吸着盤を示
す斜視図である。
7 (a) to (d) are perspective views showing another suction plate according to the present invention.

【図8】本発明に係る他の真空吸着装置を示す図であ
り、(a)は斜視図、(b)はY−Y線断面図である。
FIG. 8 is a diagram showing another vacuum suction device according to the present invention, in which (a) is a perspective view and (b) is a sectional view taken along line YY.

【図9】従来のマルチタイプの吸着盤を備える真空吸着
装置を示す図であり、(a)は一部を破断した斜視図、
(b)はそのZ−Z線断面図である。
FIG. 9 is a view showing a vacuum suction device provided with a conventional multi-type suction plate, (a) is a partially broken perspective view,
(B) is the ZZ sectional view.

【符号の説明】[Explanation of symbols]

1・・・真空吸着装置、 2・・・吸着盤、 3・・・
保持基体、5・・・吸着面、 21、22、23・・・
吸着部材、24、25・・・ガラス融着壁、 31・・
・ホール、32、33・・・環状溝、 34・・・凹
部、 35・・・環状壁、41、42、43・・・吸気
1 ... Vacuum suction device, 2 ... Suction plate, 3 ...
Holding substrate, 5 ... suction surface, 21, 22, 23 ...
Adsorption member, 24, 25 ... Glass fusion wall, 31 ...
・ Hole, 32, 33 ... Annular groove, 34 ... Recess, 35 ... Annular wall, 41, 42, 43 ... Intake hole

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI H01L 21/027 H01L 21/68 P 21/68 21/30 503C (58)調査した分野(Int.Cl.7,DB名) B23Q 3/08 H01L 21/027 H01L 21/68 B65G 49/06 B65G 49/07 C04B 37/00 C04B 38/00 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 identification code FI H01L 21/027 H01L 21/68 P 21/68 21/30 503C (58) Fields investigated (Int.Cl. 7 , DB name) B23Q 3/08 H01L 21/027 H01L 21/68 B65G 49/06 B65G 49/07 C04B 37/00 C04B 38/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 被吸着物を吸着保持する吸着面が、複数個
の多孔質セラミックスからなる吸着部材と、これら吸着
部材同士を接合するガラス融着壁とからなる吸着盤の製
造方法において、上記ガラス融着壁に対応する凸壁部を
有する金型内にセラミック原料を充填して加圧成形する
ことで上記凸壁部に対応する溝を備えた成形体を製作
し、この成形体をセラミック原料が完全に焼結するのに
必要な温度より若干低い温度で焼成して多孔質セラミッ
ク体を製作したあと、該多孔質セラミック体の溝にガラ
スペーストを充填して硬化させて上記ガラス融着壁を形
成し、しかるのち、上記ガラス融着壁のない多孔質セラ
ミック体の部分を研削加工により取り除くことで、多孔
質セラミックスからなる吸着部材とガラス融着壁とを交
互に配設してなる板状の吸着盤を形成することを特徴と
する吸着盤の製造方法。
1. A method for manufacturing an adsorption disk, wherein an adsorption surface for adsorbing and holding an object to be adsorbed comprises an adsorption member made of a plurality of porous ceramics, and a glass fusing wall joining these adsorption members together. A ceramic body is filled with a ceramic raw material in a mold having a convex wall portion corresponding to a glass fusing wall and pressure molding is performed to manufacture a molded body having a groove corresponding to the convex wall portion. After the raw material is fired at a temperature slightly lower than the temperature required for complete sintering, a porous ceramic body is manufactured, and then a groove of the porous ceramic body is filled with a glass paste to be cured and the above glass fusion is performed. Shape the wall
Forms, after accordingly, without the glass melting Chakukabe porous Sera
Manufacture of a suction plate characterized by forming a plate-shaped suction plate by alternately arranging a suction member made of porous ceramics and a glass fusing wall by removing a portion of the mick body by grinding. Method.
【請求項2】 被吸着物を吸着保持する吸着面が複数個の
多孔質セラミックスからなる吸着部材と、これら吸着部
材同士を接合するガラス融着壁とからなる吸着盤の製造
方法において、上記ガラス融着壁に対応する凸壁部を有
する金型内に焼失材を加えたセラミック原料を充填して
加圧成形することで上記凸壁部に対応する溝を備えた成
形体を製作し、この成形体をセラミック原料が完全に焼
結するのに必要な温度で焼成して多孔質セラミック体を
製作したあと、該多孔質セラミック体の溝にガラスペー
ストを充填して硬化させて上記ガラス融着壁を形成し
しかるのち、上記ガラス融着壁のない多孔質セラミック
体の部分を研削加工により取り除くことで、多孔質セラ
ミックスからなる吸着部材とガラス融着壁とを交互に配
設してなる板状の吸着盤を形成することを特徴とする吸
着盤の製造方法。
2. A method for manufacturing an adsorption disk comprising an adsorption member having an adsorption surface made of a plurality of porous ceramics for adsorbing and holding an object to be adsorbed, and a glass fusing wall for adhering these adsorption members to each other. A molding having a groove corresponding to the convex wall portion is manufactured by filling a ceramic raw material to which a burnout material has been added into a mold having a convex wall portion corresponding to the fusion wall and pressure molding, After the formed body is fired at a temperature necessary for completely sintering the ceramic raw material to manufacture a porous ceramic body, a groove of the porous ceramic body is filled with a glass paste and cured to cure the glass fusion. Forming a wall ,
After that, the above-mentioned porous ceramic without glass fusion wall
A method for manufacturing an adsorption plate, which comprises removing a body part by grinding to form a plate-shaped adsorption plate in which adsorption members made of porous ceramics and glass fusing walls are alternately arranged. .
JP28797696A 1996-10-30 1996-10-30 Adsorber manufacturing method Expired - Fee Related JP3469999B2 (en)

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JP3469999B2 true JP3469999B2 (en) 2003-11-25

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