JP3399642B2 - Method for forming semiconductor light emitting element layer - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a semiconductor light emitting device layer provided on a substrate, and more particularly to a display made of a gallium nitride based thin film and a light emitting diode and a laser diode in the ultraviolet region to the blue region which are optimal for optical communication. The present invention relates to a method of forming a semiconductor light emitting device such as.

[0002]

2. Description of the Related Art A visible light region light emitting diode (LED) using a semiconductor element is used as a display element in a wide field. However, conventionally, a short-wavelength light emitting diode and a laser diode in the ultraviolet region to the blue region have not been put into practical use. Such a short-wavelength light emitting diode is urgently developed especially for a display which requires three primary colors. For the light emitting diode and laser diode in the ultraviolet to blue region, in addition to SiC, Z
Those using compound semiconductors such as nSe, ZnS and GaN have been reported.

Of these, gallium nitride (GaN) is mostly MOCVD (Metal Or
ganic CVD: metalorganic CVD) method, or V
A film is formed by a PE (Vapour Phase Epitaxy) method (for example, Journal of Applied Physi).
cs, 56 p. 2367-2368 (1984)). However, in these methods, it is necessary to raise the reaction temperature, not only is the production difficult, but it is difficult for the nitrogen to decompose in order to obtain active nitrogen, and nitrogen is insufficient as a whole. Becomes extremely large,
Good semiconductor characteristics cannot be obtained.

In order to realize film formation at low temperature, attempts have been made to activate a nitrogen source by an electron shower (for example, Jap. J. Appl. Phys., 2).
0p. L545 (1981)), it is said that the improvement of the film quality is insufficient even by this method. Further, it has been considered to form a film using a highly active nitrogen source so as not to cause a shortage of nitrogen. Atomic nitrogen and nitrogen ions are available as highly active nitrogen sources, but conventional techniques using plasma (for example, J. Vac. Sci. Te.
cnol. , A7 p. 701 (1989)) and the like, it is said that it is difficult to efficiently generate these.

Further, the conventional method using an electron shower and the method using low temperature plasma have a problem that the apparatus is large and complicated.

In view of such problems, a method using nitrogen trifluoride as a nitrogen source has been conventionally proposed (Japanese Patent Laid-Open No. 5-29220). The film forming technology disclosed in this publication aims to obtain a gallium nitride based semiconductor thin film that is optimal for an optical device in the ultraviolet to blue region, and uses gallium nitride based semiconductor thin film with nitrogen trifluoride as a nitrogen source. It is produced by a film forming method using a vacuum device such as a gas source MBE.

[0007]

However, in the film forming method disclosed in the above publication, fluorine is generated from nitrogen trifluoride as a nitrogen source during the film growth process, and this fluorine is formed. It may be contained in the semiconductor film and affect the characteristics. Further, there is a problem that the gallium atoms evaporated from the gallium source react with the fluorine generated from nitrogen trifluoride to form gallium fluoride (GaF _x ) having a high vapor pressure, which lowers the efficiency of film formation.

The present invention has been made in view of the above-mentioned drawbacks of the prior art, and it is a semiconductor element layer capable of efficiently forming a gallium nitride thin film with a simple structure without deteriorating the characteristics of the semiconductor film due to fluorine. It is intended to provide a forming method.

[0009]

In order to achieve the above object, a method for forming a semiconductor light emitting device layer according to the present invention is a film forming method which does not use plasma or electron shower, and is a gas which is easily decomposed as a nitrogen source. Is used. That is, in the method for forming a semiconductor light emitting device layer according to the present invention, as the first invention, in the method for forming a gallium nitride based thin film on a substrate in vacuum, nitrogen trichloride (NCl ₃ ) is used as a nitrogen source. A method for forming a semiconductor light emitting device layer comprising a gallium nitride-based thin film is provided.

Further, in the present invention, as a second invention, in a method of forming a gallium nitride thin film on a substrate in vacuum, nitrogen trifluoride (NF ₃ ) is used as a nitrogen source.
Containing a hydrogen atom (H) reactive with nitrogen fluoride
There is provided a method for forming a semiconductor light emitting device layer made of a gallium nitride-based thin film, which is used together with a gas .

In a preferred embodiment, the substrate is
It is characterized in that it is a single crystal substrate or a glass substrate made of a III-V group compound or a II-VI group compound.

A further preferred embodiment is characterized in that a substrate having a sapphire R surface is used as the substrate.

[0013]

In the first aspect of the invention, since nitrogen trichloride is easily decomposed and does not contain fluorine, it is an optimum nitrogen source, and chlorine derived therefrom does not form a reaction product with high vapor pressure with gallium. The gallium nitride thin film can be efficiently grown on the substrate in vacuum without adversely affecting the film process.

In the second invention, the fluorine generated from nitrogen trifluoride during the reaction process can be removed from the reaction system in the form of H + F → HF ↑ by hydrogen generated from the gas containing hydrogen atoms. It is possible to prevent the possibility that fluorine will enter the growth film and deteriorate semiconductor characteristics.

[0015]

EXAMPLES First, an outline of a method for producing a gallium nitride (GaN) -based thin film will be described. In the method for producing a gallium nitride based thin film according to the present invention, various methods for forming a thin film in vacuum can be used. For example, low pressure CVD method, low pressure MOCVD method, sputtering method, vacuum vapor deposition method, MONBE (Metal Organic)
Molecular Beam Epitaxy) method,
And the gas source MBE method. Among particular gas source MBE method, the pressure in the thin film formed in the following 10 ^-3 Pa, since the active nitrogen and gallium vapor is deposited to reach the substrate surface without colliding with each other,
Particularly preferred.

As the nitrogen source in the present invention, nitrogen trichloride or a mixed gas mainly containing nitrogen trichloride can be used. As the gas mixed with nitrogen trichloride, an inert gas such as nitrogen, argon or helium can be used. Further, nitrogen trifluoride as a nitrogen source in the present invention has reactivity with this nitrogen trifluoride.
Can be used with a gas containing hydrogen atoms . Examples of the gas containing hydrogen atoms include H ₂ and H ₂ S.

As a method of supplying a gas such as nitrogen trichloride as the nitrogen source, a gas cell may be used.
By installing a tube of N, alumina, quartz, stainless steel, etc. in the thin film growth apparatus with the opening facing the substrate surface, and connecting a valve, a flow rate control device, and a pressure control device, the supply amount can be controlled and the supply can be controlled. The start and stop are controlled. The use of a cracking gas cell is also preferable in that nitrogen trichloride is decomposed and active nitrogen is efficiently supplied to the substrate surface. A cracking gas cell is one that heats nitrogen trichloride in the presence of a catalyst to efficiently generate active nitrogen, and as a catalyst,
It is preferable to use ceramics such as alumina, silica, boron nitride, and silicon carbide that are fibrous or porous and have a large surface area. The cracking temperature needs to be changed depending on the type of catalyst and the supply amount of nitrogen trichloride, but is preferably set in the range of 100 ° C to 500 ° C.

The substrate used in the present invention is Si, A
l ₂ O ₃ , ZnO, MgO, SiC, or GaAs, I
Group III-V compounds such as nAs, II- such as ZnSe
A single crystal substrate such as a VI compound or a glass substrate such as quartz or MESA glass is used. Substrate is heated at 200 ℃
To 900 ° C. In addition, an amorphous substance such as AlN, GaN, Si, or SiC as a buffer layer between the substrate and the gallium nitride thin film formed thereon, or a single crystal substance such as Al.
N, ZnO, or SiC can be provided.
Above all, it is preferable to use an R-plane substrate of sapphire (Al ₂ O ₃ ). It is more preferable to use a surface obtained by rotating this sapphire R surface by 9.2 degrees about the R surface projection of the sapphire c axis.

The gallium nitride thin film in the present invention is
For example, in addition to gallium nitride (GaN), Ga _1-X Al
GaN such as _X N, Ga _1-X In _X N, Ga _1-X B _X N
It is a mixed crystal compound thin film mainly composed of. Furthermore, G
Carrier density control, p-type control, and n-type control can be performed by doping impurities when manufacturing an aN-based thin film. As the dopant, Mg, Zn, Be, Sb, Si, G
e, C, Sn, Hg, As, or P. Further, according to the thin film manufacturing method of the present invention, chlorine may be mixed in the thin film to some extent, but the electrical and optical properties of the thin film are not deteriorated.

In the case of actually manufacturing a light emitting device or a laser diode using a GaN-based thin film, a pn junction or a single hetero structure is formed by combining these mixed crystal GaN-based thin films or doped GaN-based thin films. A device having a double hetero structure, a quantum well structure, a superlattice structure, or the like is manufactured .

As a specific example, a method of forming a GaN-based thin film using the gas source MBE method will be described below. FIG. 1 is a diagram showing a main configuration of a reaction apparatus used for carrying out the method of the present invention. The structure of the reaction device itself is the same as that of a known MBE device. Into the reaction chamber 1 consisting of a vacuum chamber, the first, second and third Knudsen cell (crucible) 2, 3, 4, and cladding for introducing a reaction gas for accommodating the source of the crystal growth material
A king gas cell 5 is provided. A heating coil is wound around each cell 2, 3, 4, and 5. A substrate holder 6 is provided in the reaction chamber 1.
The substrate 7 is fixedly held on the substrate. The substrate holder 6 includes a heating device (not shown) for heating the substrate. Each Knudsen cell 2, 3, 4 is equipped with shutters 8, 9, 10 to control the supply of sauce
It is Furthermore, the reaction chamber 1 the exhaust pipe 11 connected to the exhaust device (not shown) is connected, it kept evacuated predetermined vacuum pressure of the reaction chamber 1 as indicated by the arrow A.

(Example 1) Sapphire R was used as the substrate 7.
9. A surface is used, and the R-plane projection of the sapphire c-axis is used as an axis.
The substrate has a plane orientation rotated by 2 degrees. The substrate 7 is heated to 200 ° C. to 900 ° C. by the heating device of the substrate holder 6. The substrate 7 is carried into the reaction chamber 1 by a carrier device (not shown). After heating the substrate 7 to 900 ° C.,
A predetermined growth temperature is set, and a GaN thin film having a thickness of 0.4 to 10 μm is formed on the substrate 7 at a growth rate of 0.01 to 3 nm / sec.

Gallium metal was placed in the first Knudsen cell 2 and the evaporation amount was 10 ¹³ to 10 ¹⁹ / in the substrate surface.
It was heated to a temperature of cm · sec. The cell temperature at this time was 1020 ° C. Nitrogen trichloride was introduced as a nitrogen source using a cracking gas cell 5 having alumina fibers filled therein. At this time, the cracking gas cell 5 is heated to 200 ° C., and an amount of 5 sccm is applied to the substrate 7
It was supplied so that it could be directly sprayed onto. The introduction amount was set to be 10 ¹⁶ to 10 ²⁰ / cm · sec on the substrate surface.

In this way, nitrogen trichloride was introduced into the reaction chamber 1, and at the same time, the shutter 8 of the first crucible (Knudsen cell) 2 containing gallium was opened to give 0.12.
A gallium nitride thin film was formed on the substrate at a film forming rate of nm / sec. At this time, the pressure was 1 to 5 × 10 ⁻⁴ Pa.

The second Knudsen cell 3 contains In, A
l, As, or Sb is added, and the film formation process is executed by controlling the temperature and the time with the shutter 9 so that a mixed crystal compound semiconductor having a predetermined composition is obtained. In addition, in the third Knudsen cell 4, Mg, Zn, Be, Si, Ge,
C, Sn, Hg, As, or P is added, and doping is performed by controlling the temperature and the time by the shutter 10 so that a mixed crystal compound semiconductor having a predetermined composition is obtained.

With such a method, first, the sapphire R-plane substrate 7 having the above-mentioned plane orientation is carried into the reaction chamber 1 by a transporting means (not shown), heated to 900 ° C., and then brought to a predetermined growth temperature. The GaN-based thin film having a thickness of 0.4 to 10 μm is set on the substrate 7 at a growth rate of 0.01 to 3 nm / sec.
It is formed according to the purpose.

In Example 1, since nitrogen trichloride, which is easily decomposed, was used as the nitrogen source, the thin film growth process proceeded efficiently, and the film formation efficiency due to fluorine decreased and the incorporation of fluorine into the film caused. A high-quality gallium nitride-based thin film could be formed without the possibility of characteristic deterioration. This GaN
When the carrier density of the system thin film was measured by the Van der Pauw method, it was 10 ¹⁷ to 10 ²⁰ / cm ³ . Further, when the cathodoluminescence at 200 K was measured, a spectrum having a peak near 3.5 eV was obtained. Further, when this GaN-based thin film was used as a light emitting element layer, good characteristics were exhibited.

(Embodiment 2) In this embodiment, a mixed gas of nitrogen trifluoride and hydrogen is used as the nitrogen source instead of the nitrogen trichloride used in the first embodiment. In order to introduce the mixed gas of nitrogen trifluoride and hydrogen into the reaction chamber 1, two cracking gas cells 5 each having alumina fibers filled therein were used in the same manner as in Example 1, and 2
The amount of each 5 sccm was directly blown onto the substrate 7 while being heated to 00 ° C. At this time, the amount of gas introduced is 10 ¹⁶ to 10 ²⁰ / cm · sec on the substrate surface.
Was set. The rest of the apparatus configuration and steps are substantially the same as in the first embodiment.

In the second embodiment, the fluorine generated from nitrogen trifluoride reacts with hydrogen gas to generate H + F → HF.
↑ never fluorine becomes a form to produce a reaction of a metal source and a reaction to high vapor pressure or are incorporated into the during the deposition of. Therefore, also in this embodiment, a high-quality gallium nitride-based thin film is formed without fear of deterioration of characteristics due to fluorine or reduction of film forming efficiency. When the carrier density of the thin film of this example was measured by the Van der Pauw method, it was 10 ¹⁷ to 10 ²⁰ / cm ³ . Also, 2
When the cathodoluminescence at 00 K was measured,
A spectrum having a peak near 3.5 eV was obtained. Further, when this gallium nitride-based thin film was used as a light emitting device layer, good characteristics were exhibited. The present invention is not limited to the above embodiment.

[0030]

As described above, according to the method for forming a gallium nitride-based thin film of the present invention, film formation can be performed at a low temperature by using a vacuum film forming apparatus that has a simple structure and can easily control the carrier density. By using nitrogen trichloride, which can be decomposed and is easy to decompose as a nitrogen source, the thin film growth process proceeds efficiently, and there is no risk of deterioration of film formation efficiency due to fluorine and deterioration of characteristics due to incorporation of fluorine into the film, thus providing high quality. The gallium nitride-based thin film can be formed.

Nitrogen trifluoride is used as a nitrogen source.
Gas containing hydrogen atoms having reactivity with nitrogen fluoride
By using a mixture with, fluorine generated from the nitrogen trifluoride, hydrogen and reacts with H + F → HF ↑ fluorine takes the form of a high reacts with the metal source or be incorporated into the during the deposition vapor pressure Since no reaction product is generated, a high-quality gallium nitride-based thin film is formed without fear of deterioration of characteristics due to fluorine and deterioration of film formation efficiency.

[Brief description of drawings]

FIG. 1 is a main part configuration diagram of an apparatus for performing a method of the present invention.

[Explanation of symbols]

1: Reaction chamber 2, 3, 4: Knudsen cell (crucible) 5: Cracking gas cell (gas introduction cell) 6: substrate holder 7: substrate 8, 9, 10: Shutter 11: Exhaust pipe

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Claims (4)

(57) [Claims] 1. A method for forming a gallium nitride based thin film on a substrate in a vacuum, wherein nitrogen trichloride is used as a nitrogen source. 2. A method for forming a gallium nitride-based thin film on a substrate in a vacuum, wherein nitrogen trifluoride is used as a nitrogen source ,
Containing a hydrogen atom reactive with this nitrogen trifluoride
A method for forming a semiconductor light emitting device layer comprising a gallium nitride-based thin film, which is used together with a gas . 3. The semiconductor made of a gallium nitride-based thin film according to claim 1, wherein the substrate is a single crystal substrate made of a III-V group compound or a II-VI group compound or a glass substrate. Method for forming light emitting element layer. 4. The method for forming a semiconductor light emitting element layer made of a gallium nitride-based thin film according to claim 3, wherein a substrate having a sapphire R surface is used as the substrate.