JP3183308B2 - Continuous automatic dilution system for developer - Google Patents
Continuous automatic dilution system for developerInfo
- Publication number
- JP3183308B2 JP3183308B2 JP20905992A JP20905992A JP3183308B2 JP 3183308 B2 JP3183308 B2 JP 3183308B2 JP 20905992 A JP20905992 A JP 20905992A JP 20905992 A JP20905992 A JP 20905992A JP 3183308 B2 JP3183308 B2 JP 3183308B2
- Authority
- JP
- Japan
- Prior art keywords
- developer
- concentration
- amount
- control valve
- developing solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B28/00—Compositions of mortars, concrete or artificial stone, containing inorganic binders or the reaction product of an inorganic and an organic binder, e.g. polycarboxylate cements
- C04B28/14—Compositions of mortars, concrete or artificial stone, containing inorganic binders or the reaction product of an inorganic and an organic binder, e.g. polycarboxylate cements containing calcium sulfate cements
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体製造工程などで
ポジ型レジストを現像する際に用いられるアルカリ系現
像液を製造するための現像液の自動希釈装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an automatic developer diluting apparatus for producing an alkaline developer used for developing a positive resist in a semiconductor manufacturing process or the like.
【０００２】[0002]
【従来の技術】近年の半導体工業の発展は著しく、特に
最近の半導体集積回路は、超ＬＳＩに代表されるよう
に、高集積化に伴い回路を描画する際の最小線幅を次第
に微細化し、レジストパターンを精度良く形成すること
が要望されている。この要望に応えるものとしてポジ型
レジストがあり、従来のネガ型レジストよりも解像度が
優れていることから、高集積化された回路の描画などに
多く用いられている。2. Description of the Related Art In recent years, the development of the semiconductor industry has been remarkable. Particularly, in recent semiconductor integrated circuits, as represented by a super LSI, a minimum line width for drawing a circuit has been gradually reduced along with high integration. It is desired to form a resist pattern with high accuracy. Positive resists meet this demand, and have higher resolution than conventional negative resists, and are therefore often used for drawing highly integrated circuits.
【０００３】ポシ型レジストの現像液としては、一般に
テトラメチルアンモニウムハイドロオキサイドやトリメ
チルモノエタノールアンモニウムハイドロオキサイド等
のアルカリ水溶液が使用されるが、レジストの高解像
力、正確な寸法精度を得るために、この現像液はレジス
トと同程度の重要性を持つと言われている。即ち画像の
きれ、優れた解像力、安定性を得るためには、使用する
ポジ型レジストに合わせた濃度の現像液が必要である。
特に近年の半導体の高集積化に伴い、パターン寸法も微
細化が進んでサブミクロン時代に入り、レジストの実効
感度のばらつきを小さくするために現像濃度の精度の向
上が課題となっている。As a developing solution for the positive resist, an aqueous alkali solution such as tetramethylammonium hydroxide or trimethylmonoethanolammonium hydroxide is generally used. This developer is said to be as important as the resist. That is, in order to obtain image sharpness, excellent resolution and stability, a developing solution having a concentration suitable for the positive resist to be used is required.
In particular, with the recent increase in the degree of integration of semiconductors, the pattern dimensions have been miniaturized, and the submicron era has been entered. In order to reduce the variation in the effective sensitivity of the resist, improvement in the accuracy of the development density has become an issue.
【０００４】この現像液の濃度を高精度で管理すること
は極めて困難であり、これまで半導体工場などの現像液
を使用する側ではこの管理を行うことができないので、
現像現液を超純水で希釈して所望の濃度に調製された現
像液を購入して使用されている。現像原液の希釈倍率
は、原液の濃度や使用目的等により異なるが、通常は５
〜１０倍程度である。なお現像原液の希釈装置としては
特開昭６４−２７６２４号に導電率測定によって濃度を
調製する装置が提案されている。[0004] It is extremely difficult to control the concentration of the developer with high accuracy, and this control cannot be performed by a developer using a developer such as a semiconductor factory.
A developing solution prepared by diluting a developing solution with ultrapure water to a desired concentration is purchased and used. The dilution ratio of the undiluted developing solution varies depending on the concentration of the undiluted solution, the purpose of use, and the like.
It is about 10 to 10 times. Note The diluting device undiluted developing solution has been proposed a device for preparing a concentration by conducting measurement in JP 64 No. -27624.
【０００５】[0005]
【発明が解決しようとする課題】調製した現像液は希釈
倍率に応じて液量が増大し、またその種類が多くなる。
従って半導体工場などの現像液を使用する側で所望の濃
度に調製された現像液を購入して使用する場合には、容
器への充填作業、多くの種類の容器の管理、その運搬等
の費用がかさみ、結果として現像液のコストが増大す
る。また現像液が調製されてから使用されるまでの期間
が長くなることから、その現像液が劣化するという課題
もある。The amount of the prepared developer increases in accordance with the dilution ratio, and the type of the developer increases.
Therefore, when purchasing and using a developer adjusted to a desired concentration on the side of a developer using a developer such as a semiconductor factory, costs for filling the containers, managing many types of containers, transporting the containers, and the like. And the cost of the developer increases as a result. Further, since the period from when the developer is prepared to when it is used becomes longer, there is another problem that the developer deteriorates.
【０００６】また特開昭６４−２７６２４号に記載され
ている如き導電率測定によって濃度を調製・制御する装
置は、精度が不充分であり、半導体の高集積化に伴って
要求される現像液の精度に対応することが困難である。
本発明の目的は、ポジ型レジストの現像液を半導体工場
などの使用する側で所望の濃度に調製することができる
ように、高い精度で連続して自動的に管理する現像液の
希釈装置を提供することにある。[0006] device for preparing and controlling the concentration by which such conductivity measurement is described in JP 64 No. -27624, the accuracy is insufficient, the developer is required along with high integration of a semiconductor It is difficult to cope with the accuracy of.
An object of the present invention is to provide a developer diluting apparatus that automatically and continuously controls a developer of a positive resist so as to be able to adjust the developer to a desired concentration at a use side such as a semiconductor factory with high precision. To provide.
【０００７】[0007]
【課題を解決するための手段】発明者等は上記の如き課
題を有する現像液の自動希釈装置について鋭意検討し、
先に調合槽にロードセルを用いて現像原液と希釈水量を
測定し、電位差測定による自動滴定装置により現像液の
濃度を測定し、シーケンスコントローラーにより管理す
る装置を見出し、特許出願を行った（特開平５−２１６
２４１号）。この装置は極めて高い精度で現像液濃度を
自動的に管理することができるが、滴定により濃度を検
出するので連続的に測定を行うことができない。発明者
等は現像液の自動希釈装置について更に検討を行った結
果、この電位差測定による自動滴定装置に代えて超音波
伝搬速度測定装置（以下、超音波計と称する）を用いれ
ば連続的に高精度で現像液濃度を自動的に管理すること
ができ、オンライン測定装置に好適に使用できることを
見いだし、本発明に到達した。Means for Solving the Problems The inventors have diligently studied an automatic developer dilution apparatus having the above-mentioned problems,
Previously using load cell preparation tank was measured with the undiluted developer solution dilution water, the concentration of the developer was measured by an automatic titrator by potentiometric, we found a device for managing the sequence controller, was filed a patent application (JP-A 5-216
No. 241 ). Although this apparatus can automatically control the developer concentration with extremely high accuracy, it cannot detect the concentration continuously by titration. The inventors have further studied an automatic diluting device for a developing solution. As a result, if an ultrasonic propagation velocity measuring device (hereinafter referred to as an ultrasonic meter) is used instead of the automatic titration device based on the potential difference measurement, the high continuous concentration can be obtained. The inventors have found that the developer concentration can be automatically controlled with high accuracy and can be suitably used for an online measuring device, and have reached the present invention.
【０００８】即ち本発明は、ポジ型レジストの現像原液
を超純水で希釈するに際し、調合槽3 の液量の重量を測
定するロードセル8 と、調合槽3 の液の濃度を連続的に
測定する超音波伝搬速度測定装置12、現像原液の送液量
を制御する制御弁5 および微量制御弁13、超純水の送液
量を制御する制御弁7 および微量制御弁14を備え、シー
ケンスコントローラー9 により制御することを特徴とす
る現像原液の連続自動希釈装置である。[0008] The present invention, when the undiluted developer solution of a positive resist is diluted with ultrapure water, and the load cell 8 for measuring the weight of the amount of liquid preparation tank 3, continuously the concentration of the liquid preparation tank 3
Ultrasonic wave propagation velocity measuring device 12 for measuring, feed rate of the undiluted developer solution
Control valve 5 and micro-control valve 13 to control ultrapure water
This is a continuous automatic dilution apparatus for developing undiluted solution , comprising a control valve 7 for controlling the amount and a minute amount control valve 14 and controlled by a sequence controller 9 .
【０００９】ポシ型レジストの現像液としては、燐酸ソ
ーダ、苛性ソーダ、珪酸ソーダ、またはその他の無機ア
リカリ等との混合物からなる無機アルカリ水溶液が用い
られるが、アルカリメタルの汚染が心配される場合には
メタルを含まないアミン系の有機アルカリ水溶液が用い
られる。このようなアミン系のポシ型レジストの現像液
としてはテトラメチアンモニウムハイドロオキサイド
（以下、ＴＭＡＨと称する）やトリメチルモノエタノー
ルアンモニウムオキサイドが挙げられ、広く使用されて
いる。As a developing solution for the posi-type resist, an aqueous solution of an inorganic alkali composed of a mixture of sodium phosphate, caustic soda, sodium silicate, or other inorganic alkalis is used. Is a metal-free amine-based organic alkali aqueous solution. Tetramethyammonium hydroxide (hereinafter, referred to as TMAH) and trimethylmonoethanolammonium oxide are widely used as a developing solution for such an amine-based positive resist.
【００１０】本発明において調合槽の液量測定にロード
セルが用いる。ロードセルは重量の変動を幾つかの差圧
検出端（Dpセル）に信号として取り出して制御するため
に一般に用いられるものであり、通常に４ケ所にDpセル
を使用し偏荷重をすばやく吸収する方式が用いられる。
本発明ではこのロードセルを用いて調合槽の重量を測定
することにより、調合槽に導入された現像原液量および
希釈水量を正確且つ迅速に測定でき、希釈装置を好適に
制御・管理することができる。In the present invention, a load cell is used for measuring the amount of liquid in the mixing tank. Load cells are generally used to control the fluctuation of weight by taking out signals as signals to several differential pressure detection terminals (Dp cells). Normally, four types of Dp cells are used to quickly absorb uneven loads. Is used.
In the present invention, by measuring the weight of the mixing tank using this load cell, the amount of the undiluted developing solution and the amount of dilution water introduced into the mixing tank can be accurately and quickly measured, and the diluting apparatus can be suitably controlled and managed. .
【００１１】また本発明において現像液の濃度は超音波
計により行われる。この超音波計は超音波発振器と超音
波変換器等により構成されており、温度補償付きのもの
が用いられる。超音波の伝搬速度は現像液の濃度を高精
度に測定し、演算処理装置（ＣＰＵ）により演算を行い
その信号がシーケンスコントローラーに送られる。In the present invention, the concentration of the developer is measured by an ultrasonic meter. This ultrasonic meter includes an ultrasonic oscillator, an ultrasonic converter, and the like, and has a temperature compensation. As for the propagation speed of the ultrasonic wave, the concentration of the developing solution is measured with high accuracy, and an arithmetic processing unit (CPU) calculates the signal, and the signal is sent to the sequence controller.
【００１２】本発明に用いられるシーケンスコントロー
ラーは、通常、小型電算機が用いられ、濃度設定値によ
り決められた量を調合槽に送液し、各液量および濃度測
定値等を記憶させ、これらのデータを基に補充すべき現
像原液量および希釈水量が計算され、コントローラーに
より制御弁の操作が行われる。これらの補充すべき液量
の操作には別に微量制御弁を設置することが望ましい。
またシーケンスコントローラーには各制御弁、ポンプ、
超音波計等で行われる各々の操作がタイマーにより自動
的に行われるように設定されており、従って本発明の自
動希釈装置では目的とする現像液の濃度と製造量をシー
ケンスコントローラーに入力することにより目的とする
高精度の濃度の現像液が自動的に得られる。As the sequence controller used in the present invention, a small computer is usually used, and the amount determined by the concentration set value is sent to the preparation tank, and each liquid amount and measured concentration value are stored. Is calculated based on the above data, and the controller operates the control valve by the controller. It is desirable to separately install a minute control valve for the operation of the liquid amount to be replenished.
The sequence controller has control valves, pumps,
Each operation performed by an ultrasonic meter or the like is set to be automatically performed by a timer.Therefore, in the automatic dilution apparatus of the present invention, it is necessary to input a concentration and a production amount of a target developer to a sequence controller. As a result, a developer having a desired high-precision concentration is automatically obtained.
【００１３】次に図面を用いて本発明を説明する。図１
は本発明による現像液の希釈装置の系統図の一例を示
す。本発明の希釈装置は、上記のロードセルを有する調
合槽3および超音波計12の他に現像原液を貯留する原料
槽1 、現像原液の移送ポンプ2、調合槽の循環ポンプ10
及び各制御弁とそれらを制御するシーケンスコントロー
ルユニット9 、各機器を接続する配管類、電気計装類な
どによって構成される。Next, the present invention will be described with reference to the drawings. FIG.
FIG. 1 shows an example of a system diagram of a developer diluting apparatus according to the present invention. The diluting apparatus of the present invention comprises a raw material tank 1 for storing an undiluted developing solution, a transfer pump 2 for an undiluted developing solution, and a circulation pump 10
And each control valve and a sequence control unit 9 for controlling the control valves, piping for connecting each device, electric instrumentation, and the like.
【００１４】現像液の調合は、最初に現像原液槽1 より
移送ポンプ2 を用いて現像原液を調合槽3 に送液し、所
定量になったら移送ポンプ2 を停止する。現像原液の移
送量は制御弁4 および制御弁5 によって制御される。次
に配管6 より超純水が調合槽3 に送液される。超純水量
は制御弁7 により制御され、設定量となったら閉止す
る。調合槽に送液される各液量はロードセル8 により測
定し、シーケンスコントローラー9 を通して各制御弁お
よびポンプが迅速・正確に制御される。To prepare the developing solution, first, the developing solution is supplied from the developing solution tank 1 to the preparing tank 3 by using the transfer pump 2, and when the amount of the developing solution reaches a predetermined value, the transfer pump 2 is stopped. The transfer amount of the developing solution is controlled by the control valve 4 and the control valve 5. Next, ultrapure water is sent to the preparation tank 3 from the pipe 6. The ultrapure water amount is controlled by the control valve 7, and is closed when the set amount is reached. The amount of each liquid sent to the preparation tank is measured by the load cell 8, and each control valve and pump are controlled quickly and accurately through the sequence controller 9.
【００１５】調合槽に現像原液および超純水が送液され
た後、調合槽内の液を循環ポンプ10を用いて制御弁11に
より循環液量が制御されながら一定時間混合する。次に
混合液の一部が超音波計12に送られ、混合液の濃度が測
定される。この濃度測定は温度補償付超音波計を用いる
ことにより、高精度の測定値が得られる。After the undiluted developing solution and ultrapure water have been sent to the blending tank, the liquid in the blending tank is mixed for a certain period of time using the circulating pump 10 while the amount of circulating liquid is controlled by the control valve 11. Next, a part of the mixed solution is sent to the ultrasonic meter 12, and the concentration of the mixed solution is measured. For this concentration measurement, a highly accurate measured value can be obtained by using an ultrasonic meter with temperature compensation.
【００１６】現像原液および超純水の送液量の制御に
は、制御弁5 および7 の他に微量制御弁13および14が設
置されている。混合液の濃度が目的とする設定値と比較
され、設定値を下回る場合にはシーケンスコントローラ
ー9 により微量制御弁13を制御して測定結果より求めら
れた現像原液の追加量が送液される。また混合液の濃度
が設定値を上回る場合には微量制御弁14を制御して測定
結果より求められた超純水の追加量が送液される。For controlling the feed rates of the undiluted developing solution and the ultrapure water, control valves 13 and 14 are provided in addition to the control valves 5 and 7. The concentration of the mixed solution is compared with the target set value. If the concentration is lower than the set value, the sequence controller 9 controls the minute control valve 13 to send an additional amount of the undiluted developing solution obtained from the measurement result. If the concentration of the mixed solution exceeds the set value, the micro control valve 14 is controlled to send an additional amount of ultrapure water obtained from the measurement result.
【００１７】シーケンスコントローラー9 においては、
設定時間により各ポンプの稼働停止が行われると共に、
調合槽に送液された各液量および濃度測定値が記憶され
ており、これらのデータを基に追加すべき送液量が計算
されて各微量制御弁の操作が行われる。またシーケンス
コントローラー9 では、各機器、ポンプおよび制御弁の
一連の操作がタイマーにより自動的に操作されて目的と
する濃度の現像液が得られる。In the sequence controller 9,
While the operation of each pump is stopped by the set time,
The amount of each liquid sent to the mixing tank and the measured value of the concentration are stored, and the amount of liquid to be added is calculated based on these data, and the operation of each minute control valve is performed. In the sequence controller 9, a series of operations of each device, pump, and control valve are automatically operated by a timer to obtain a developer having a target concentration.
【００１８】測定精度を考慮して調合槽内の現像液の濃
度が所定の濃度規格範囲内であることが確認された後、
制御弁15を用いて調合槽より現像液を製品として抜き出
して配管16から製品槽に送られる。なお前述の如くポレ
ジスト用のアルカリ系現像液は外気と接触すると空気中
の酸素や炭酸ガスとの反応や水分の吸収等による影響を
受けるので、現像原液槽、調合槽および製品槽等は全て
乾燥した不活性ガスによるシールが行われる。After it has been confirmed that the concentration of the developer in the preparation tank is within a predetermined concentration specification range in consideration of measurement accuracy,
The developer is extracted as a product from the preparation tank using the control valve 15 and sent to the product tank via the pipe 16. As mentioned above, the alkaline developing solution for photoresist is affected by the reaction with oxygen and carbon dioxide gas in the air and the absorption of moisture when it comes into contact with the outside air, so the developing stock solution tank, blending tank and product tank are all dried. Sealing with the inert gas is performed.
【００１９】[0019]
【実施例】図１において３m3の現像原液槽および５m3の
調合槽を用い、ポシ型レジストの現像原液としてＴＭＡ
Ｈ約15重量% からＴＭＡＨ設定濃度 2.380重量% 及び 2
5000重量% の現像液を製造した。各 5バッチの操作にお
ける製品濃度は表１に示す通りであり、ＴＭＡＨ濃度の
誤差範囲が 0.01 重量% 以内であった。EXAMPLES Using blending tank of the undiluted developer solution tank and 5 m 3 of 3m 3 in FIG. 1, TMA as a developing stock Po Shi resist
H about 15% by weight to TMAH concentration 2.380% by weight and 2
A 5000% by weight developer was prepared. The product concentration in each of the five batch operations was as shown in Table 1, and the error range of the TMAH concentration was within 0.01% by weight.
【００２０】 表１ 設定値 (重量%) 2.380 2.500 ────────────────────────── 製品濃度 (重量%) 1 バッチ 2.379 2.510 2 バッチ 2.388 2.501 3 バッチ 2.382 2.515 4 バッチ 2.381 2.520 5 バッチ 2.378 2.506 ──────────────────────────Table 1 Set value (wt%) 2.380 2.500 ────────────────────────── Product concentration (wt%) 1 batch 2.379 2.510 2 Batch 2.388 2.501 3 Batch 2.382 2.515 4 Batch 2.381 2.520 5 Batch 2.378 2.506 ──────────────────────────
【００２１】[0021]
【発明の効果】本発明の現像液希釈装置では実施例に示
される如くＴＭＡＨ濃度の誤差範囲が0.01 重量% 以内
の高精度に制御することができる。本発明の現像液希釈
装置はロードセルにより調合槽の液量を自動的に測定
し、超音波計を用い、シーケンスコントローラーにより
各機器および制御弁等の操作が行われることから、殆ど
人手を要せずに目的とする濃度の現像液が高精度で連続
的に得られる。また超音波計は配管内に直接に取り付け
ることができ、メンテナンスが容易であり、オンライン
測定装置として好適に用いられる。これにより半導体工
場などの現像液を使用する側で目的とする濃度の現像液
を迅速に得られることになり、容器への充填作業や、運
搬・管理等の費用が削減されると共に、高精度の濃度の
現像液が容易に得られることから従来のものに比べてよ
り高精度のレジストパターンの現像を行うことができる
ようになる。According to the present invention, the error range of the TMAH concentration can be controlled with high accuracy within 0.01% by weight as shown in the embodiment. The developer diluting apparatus of the present invention automatically measures the amount of liquid in the preparation tank using a load cell, uses an ultrasonic meter, and operates various devices and control valves using a sequence controller. And a developer having a desired concentration can be continuously obtained with high precision. Further, the ultrasonic meter can be directly mounted in the pipe, is easy to maintain, and is suitably used as an online measuring device. As a result, a developer having a desired concentration can be quickly obtained on the side where a developer is used, such as in a semiconductor factory, so that costs for container filling work, transportation and management, etc. are reduced, and high precision is achieved. Since a developing solution having a concentration of is easily obtained, it becomes possible to develop a resist pattern with higher precision than the conventional one.
【００２２】[0022]
【図１】系統図 本発明による現像液の希釈装置の系統図の一例を示す。FIG. 1 is a system diagram showing an example of a system diagram of a developer diluting apparatus according to the present invention.
1 現像原液槽 2 移送ポンプ 3 調合槽 8 ロードセル 9 シーケンスコントローラー 10 循環ポンプ 12 超音波伝搬速度測定装置 1 Undeveloped solution tank 2 Transfer pump 3 Mixing tank 8 Load cell 9 Sequence controller 10 Circulation pump 12 Ultrasonic propagation velocity measuring device
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7，ＤＢ名) B01F 1/00 B01F 3/00 - 3/22 B01F 15/00 - 15/06 H01L 21/30 G05D 21/00 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. 7 , DB name) B01F 1/00 B01F 3/00-3/22 B01F 15/00-15/06 H01L 21/30 G05D 21 / 00
Claims (1)
するに際し、調合槽3の液量の重量を測定するロードセ
ル8 と、調合槽3 の液の濃度を連続的に測定する超音波
伝搬速度測定装置12、現像原液の送液量を制御する制御
弁5 および微量制御弁13、超純水の送液量を制御する制
御弁7 および微量制御弁14を備え、シーケンスコントロ
ーラー9 により制御することを特徴とする現像原液の連
続自動希釈装置。Upon the undiluted developing solution according to claim 1 positive resist diluted with ultrapure water, and the load cell 8 for measuring the weight of the amount of liquid preparation tank 3, the ultrasonic measuring the concentration of the liquid preparation tank 3 is continuously Propagation velocity measuring device 12 , control to control the amount of developing stock solution
Valve 5 and micro control valve 13, a system for controlling the amount of ultrapure water
A continuous automatic dilution apparatus for a developing solution , comprising a control valve 7 and a minute control valve 14 , and controlled by a sequence controller 9 .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20905992A JP3183308B2 (en) | 1992-08-05 | 1992-08-05 | Continuous automatic dilution system for developer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20905992A JP3183308B2 (en) | 1992-08-05 | 1992-08-05 | Continuous automatic dilution system for developer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0661136A JPH0661136A (en) | 1994-03-04 |
| JP3183308B2 true JP3183308B2 (en) | 2001-07-09 |
Family
ID=16566578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20905992A Expired - Fee Related JP3183308B2 (en) | 1992-08-05 | 1992-08-05 | Continuous automatic dilution system for developer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3183308B2 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09162094A (en) * | 1995-12-05 | 1997-06-20 | Tokuyama Corp | Method for diluting original developer |
| FR2761902B1 (en) * | 1997-04-11 | 1999-05-14 | Labeille Sa | ULTRA-PURE CHEMICAL DILUTION SYSTEM FOR THE MICRO-ELECTRONIC INDUSTRY |
| US7201290B2 (en) * | 2003-05-12 | 2007-04-10 | Ecolab Inc. | Method and apparatus for mass based dispensing |
| JP2008031115A (en) * | 2006-07-31 | 2008-02-14 | Sunstar Inc | Method and apparatus for producing liquid composition |
| JP4923882B2 (en) * | 2006-09-07 | 2012-04-25 | 三菱化学エンジニアリング株式会社 | Photoresist supply apparatus and photoresist supply method |
| JP2018120895A (en) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | Developing device |
| JP2018120901A (en) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | Development device |
| JP7344171B2 (en) * | 2020-03-31 | 2023-09-13 | 株式会社オービック | Manufacturing control device, manufacturing control method, and manufacturing control program |
-
1992
- 1992-08-05 JP JP20905992A patent/JP3183308B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0661136A (en) | 1994-03-04 |
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