JP2963260B2 - Epoxy resin composition - Google Patents

Epoxy resin composition

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Publication number
JP2963260B2
JP2963260B2 JP32927791A JP32927791A JP2963260B2 JP 2963260 B2 JP2963260 B2 JP 2963260B2 JP 32927791 A JP32927791 A JP 32927791A JP 32927791 A JP32927791 A JP 32927791A JP 2963260 B2 JP2963260 B2 JP 2963260B2
Authority
JP
Japan
Prior art keywords
epoxy resin
curing agent
amount
solder
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP32927791A
Other languages
Japanese (ja)
Other versions
JPH05166974A (en
Inventor
勝豊 友国
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
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Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP32927791A priority Critical patent/JP2963260B2/en
Publication of JPH05166974A publication Critical patent/JPH05166974A/en
Application granted granted Critical
Publication of JP2963260B2 publication Critical patent/JP2963260B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、耐半田ストレス性に優
れた半導体封止用エポキシ樹脂組成物に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation having excellent solder stress resistance.

【0002】[0002]

【従来の技術】高集積ICデバイスは、そのほとんどが
信頼性、コスト及び量産性に優れるエポキシ樹脂封止材
料による樹脂封止方式により封止されている。エポキシ
樹脂封止材料としては、耐熱性、耐湿性、成形性に優れ
たオルソクレゾールノボラックエポキシ樹脂とノボラッ
ク型フェノール樹脂で構成される樹脂組成物が用いられ
ている。しかし、近年の高集積化、多機能化に伴ない、
高集積ICパッケージは、素子の大型化、実装合理化に
伴うパッケージの小型化、薄形化の傾向が強く、従来の
DIPタイプから、小型、薄型のSOJ、SOP、QF
P、TSOPタイプの表面実装型パッケージへ急速に移
行している。
2. Description of the Related Art Most highly integrated IC devices are sealed by a resin sealing method using an epoxy resin sealing material which is excellent in reliability, cost and mass productivity. As an epoxy resin sealing material, a resin composition composed of an orthocresol novolak epoxy resin and a novolak type phenol resin having excellent heat resistance, moisture resistance, and moldability is used. However, with the recent high integration and multifunctionality,
Highly integrated IC packages tend to have smaller and thinner packages due to larger elements and more streamlined mounting, and are smaller and thinner than conventional DIP types in SOJ, SOP, and QF.
There is a rapid shift to P, TSOP type surface mount packages.

【0003】このことは、従来のDIPタイプと違い半
田付け時にパッケージそのものが215〜260℃の高
温にさらされることとなり、大型チップを小型で薄いパ
ッケージに封入した表面実装タイプのパッケージは大き
な応力を受け、パッケージ樹脂のクラック、チップ界面
の剥離を引き起こし、ICパッケージの信頼性に致命的
な問題となっている。これらの表面実装型パッケージを
封止するのに適した信頼性の高い封止用樹脂組成物が望
まれている。
This means that the package itself is exposed to a high temperature of 215 to 260 ° C. at the time of soldering, unlike the conventional DIP type, and the surface mount type package in which a large chip is sealed in a small and thin package has a large stress. This causes cracking of the package resin and separation of the chip interface, which is a fatal problem for the reliability of the IC package. A highly reliable encapsulating resin composition suitable for encapsulating these surface mount packages is desired.

【0004】これらの問題を解決するために半田付け時
の熱衝撃を緩和する目的で、熱可塑性オリゴマーの添加
(特開昭62−115849号公報)や各種シリコーン
化合物の添加(特開昭62−115850号公報、62
−116654号公報、62−128162号公報)、
更にはシリコーン変性(特開昭62−136860号公
報)などの手法で対処しているがいずれも半田付け時に
パッケージにクラックが生じてしまい信頼性の優れた半
導体封止用エポキシ樹脂組成物を得るまでには至らなか
った。
In order to solve these problems, addition of thermoplastic oligomers (Japanese Patent Laid-Open No. 62-15849) and addition of various silicone compounds (Japanese Patent Laid-Open No. No. 115850, 62
-116654, 62-128162),
Furthermore, a method such as silicone modification (Japanese Unexamined Patent Publication No. 62-136860) is used, but in any case, a crack occurs in the package at the time of soldering, and a highly reliable epoxy resin composition for semiconductor encapsulation is obtained. Did not reach.

【0005】一方、半田付け時の耐熱ストレス性つまり
耐半田ストレス性に優れた半導体封止用エポキシ樹脂組
成物を得るために、樹脂系としてビフェニル型エポキシ
樹脂の使用(特開昭64−65116号公報)等が、検
討されてきたがビフェニル型エポキシ樹脂の使用により
リードフレームとの密着性及び低吸水性が向上し、耐半
田ストレス性の向上、特にクラック発生が低減するが、
耐熱性が劣るため特に250℃以上のような高温では耐
半田ストレス性が不十分である。
On the other hand, in order to obtain an epoxy resin composition for semiconductor encapsulation having excellent heat stress resistance during soldering, that is, excellent solder stress resistance, a biphenyl type epoxy resin is used as a resin system (Japanese Patent Application Laid-Open No. 64-65116). Publication) has been studied, but the use of a biphenyl type epoxy resin improves the adhesion to the lead frame and low water absorption, and improves the solder stress resistance, and in particular, reduces the occurrence of cracks.
Since the heat resistance is inferior, the solder stress resistance is insufficient particularly at a high temperature such as 250 ° C. or higher.

【0006】[0006]

【発明が解決しようとする課題】本発明は、成形性およ
び信頼性を劣化させることなく半田付け時の半田耐熱性
に優れた半導体封止用エポキシ樹脂組成物を提供するも
のである。
SUMMARY OF THE INVENTION An object of the present invention is to provide an epoxy resin composition for semiconductor encapsulation which has excellent solder heat resistance during soldering without deteriorating formability and reliability.

【0007】[0007]

【課題を解決するための手段】本発明は(A)下記式
(1)で示されるオルソクレゾールとβ−ナフトールの
共縮合ノボラックエポキシ樹脂を総エポキシ樹脂量の3
0〜100重量%含むエポキシ樹脂、
According to the present invention, there is provided (A) a co-condensed novolak epoxy resin of orthocresol and β-naphthol represented by the following formula (1):
An epoxy resin containing 0 to 100% by weight,

【0008】[0008]

【化3】 (n=1〜6)Embedded image (N = 1-6)

【0009】(B)下記式(2)で示されるフェノール
樹脂硬化剤を総硬化剤量に対して30〜100重量%含
む硬化剤、
(B) a curing agent containing a phenolic resin curing agent represented by the following formula (2) in an amount of 30 to 100% by weight based on the total amount of the curing agent;

【0010】[0010]

【化4】 Embedded image

【0011】(式中のR1 、R2 は水素、ハロゲン、低
級アルキル基の中から選択される同一もしくは異なる原
子または基、n=1〜6) (C)無機質充填材及び (D)硬化促進剤 を必須成分とする半導体封止用エポキシ樹脂組成物で、
従来のエポキシ樹脂組成物に比べ非常に優れた耐半田耐
熱性を有するものである。
(Wherein R 1 and R 2 are the same or different atoms or groups selected from hydrogen, halogen and lower alkyl groups, n = 1 to 6) (C) inorganic filler and (D) curing An epoxy resin composition for semiconductor encapsulation containing an accelerator as an essential component,
It has extremely excellent soldering heat resistance compared to conventional epoxy resin compositions.

【0012】本発明に用いるオルソクレゾールとβ−ナ
フトールの共縮合ノボラックエポキシ樹脂は、オルソク
レゾールとβ−ナフトールをホルムアルデヒドより共縮
合されたノボラック樹脂のエポキシ化物であり、その共
縮合時のβ−ナフトール量は50重量%以上が望まし
く、式(1)の構造を主とする化合物である。更にnは
1〜6で、6を越えると成形時の流動性に劣る。式
(1)は、低吸水性に優れ、樹脂の線膨張係数が小さ
く、成形時の離型性に優れるという特徴を有し、半田付
け時のハンダ耐熱性に良好な結果を示す。このオルソク
レゾールとβ−ナフトール共縮合ノボラックエポキシ樹
脂の使用量は、これを調節することにより半田耐熱性を
最大限に引き出すことができる。
The co-condensed novolak epoxy resin of ortho-cresol and β-naphthol used in the present invention is an epoxidized product of a novolak resin obtained by co-condensing ortho-cresol and β-naphthol from formaldehyde. The amount is desirably 50% by weight or more, and the compound mainly has the structure of the formula (1). Further, n is 1 to 6, and when n exceeds 6, the fluidity during molding is poor. Formula (1) has characteristics of excellent low water absorption, a small coefficient of linear expansion of the resin, and excellent releasability at the time of molding, and shows good results in solder heat resistance at the time of soldering. By adjusting the amount of the ortho-cresol and β-naphthol co-condensed novolak epoxy resin, solder heat resistance can be maximized by adjusting the amount.

【0013】半田耐熱性の効果をだすためにはオルソク
レゾールとβ−ナフトール共縮合ノボラックエポキシ樹
脂を総エポキシ樹脂量の30重量%以上好ましくは60
重量%以上の使用が望ましい。30重量%未満では、低
吸水性、低線膨張係数が充分に得られず、半田耐熱性が
不充分である。オルソクレゾールとβ−ナフトール共縮
合ノボラックエポキシ樹脂以外の他のエポキシ樹脂を併
用する場合、用いるエポキシ樹脂とは、エポキシ基を有
するポリマー全般をいう。たとえばビスフェノール型エ
ポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビ
フェニル型エポキシ樹脂、フェノールノボラック型エポ
キシ樹脂及びトリフェノールメタン型エポキシ樹脂、ア
ルキル変性トリフェノールメタン型エポキシ樹脂等の3
官能型エポキシ樹脂、トリアジン核含有エポキシ樹脂等
のことをいう。
In order to obtain the effect of solder heat resistance, ortho-cresol and β-naphthol co-condensed novolak epoxy resin are used in an amount of 30% by weight or more, preferably 60% by weight of the total epoxy resin amount.
It is desirable to use not less than weight%. If it is less than 30% by weight, low water absorption and low coefficient of linear expansion cannot be sufficiently obtained, and solder heat resistance is insufficient. When an epoxy resin other than ortho-cresol and β-naphthol co-condensed novolak epoxy resin is used in combination, the epoxy resin used generally refers to any polymer having an epoxy group. For example, bisphenol type epoxy resin, cresol novolak type epoxy resin, biphenyl type epoxy resin, phenol novolak type epoxy resin, triphenolmethane type epoxy resin, and alkyl modified triphenolmethane type epoxy resin.
It refers to a functional epoxy resin, a triazine nucleus-containing epoxy resin and the like.

【0014】式(2)で示されるフェノール樹脂硬化剤
は骨格中のパラキシレンを変性したものである。式中の
nは1〜6で、R1 、R2 は水素、ハロゲン、低級アル
キル基の中から選択される同一もしくは異なる原子また
は基である。これらの中で、nが6を越えると成形時の
流動性に劣る。低級アルキル基は炭素が1〜4で、4を
越えると、成形時の流動性が劣る。R1、R2としはそれ
ぞれ水素原子が好ましい。特徴としてはガラス転移温度
以上での弾性率が低く、半田付け時の内部応力が低い。
また、チップ及びリードフレームとの密着性及び低吸水
性に優れるなどの特徴を有することから耐半田ストレス
性に良好な結果を示す。このフェノール樹脂硬化剤の使
用量は、全硬化剤量に対して30重量%以上が好まし
く、更に好ましくは60重量%以上の使用が望ましい。
30重量%未満だと、リードフレームとの密着性及び低
吸水性が向上せず、耐半田ストレス性が不充分である。
The phenol resin curing agent represented by the formula (2) is obtained by modifying para-xylene in the skeleton. In the formula, n is 1 to 6, and R 1 and R 2 are the same or different atoms or groups selected from hydrogen, halogen, and lower alkyl groups. Among these, when n exceeds 6, the fluidity during molding is poor. When the lower alkyl group has 1 to 4 carbon atoms and exceeds 4, the fluidity during molding is poor. Each of R 1 and R 2 is preferably a hydrogen atom. Features include low elastic modulus above the glass transition temperature and low internal stress during soldering.
In addition, it has characteristics such as excellent adhesion to the chip and the lead frame and low water absorption. The amount of the phenol resin curing agent used is preferably at least 30% by weight, more preferably at least 60% by weight, based on the total amount of the curing agent.
If it is less than 30% by weight, the adhesion to the lead frame and the low water absorption are not improved, and the solder stress resistance is insufficient.

【0015】式(2)で示されるフェノール樹脂硬化剤
以外に他のフェノール樹脂硬化剤を併用する場合、用い
るフェノール樹脂硬化剤とはフェノール性水酸基を有す
るポリマー全般をいう。例えば、一般にフェノールノボ
ラック樹脂、クレゾールノボラック樹脂、ジシクロペン
タジエン変性フェノール樹脂、ジシクロペンタジエン変
性フェノール樹脂とフェノールノボラック及びクレゾー
ルノボラック樹脂との共縮合物、パラキシレン変性フェ
ノール樹脂等を用いることができる。
When a phenol resin curing agent other than the phenol resin curing agent represented by the formula (2) is used in combination, the phenol resin curing agent used generally refers to any polymer having a phenolic hydroxyl group. For example, phenol novolak resins, cresol novolak resins, dicyclopentadiene-modified phenol resins, co-condensates of dicyclopentadiene-modified phenol resins with phenol novolak and cresol novolak resins, and para-xylene-modified phenol resins can be used.

【0016】本発明で用いる無機質充填材としては、溶
融シリカ粉末、球状シリカ粉末、結晶シリカ粉末、二次
凝集シリカ粉末、多孔質シリカ粉末を粉砕したシリカ粉
末、アルミナ等が挙げられ、特に溶融シリカ粉末、球状
シリカ粉末及び溶融シリカ粉末と球状シリカ粉末との混
合物が好ましい。また無機質充填材の配合量としては、
耐半田ストレス性と成形性のバランスから、総樹脂組成
物中に70〜90重量%含まれるものが望ましい。
Examples of the inorganic filler used in the present invention include fused silica powder, spherical silica powder, crystalline silica powder, secondary aggregated silica powder, silica powder obtained by pulverizing porous silica powder, and alumina. Powders, spherical silica powders and mixtures of fused silica powder and spherical silica powder are preferred. In addition, as the compounding amount of the inorganic filler,
From the balance between solder stress resistance and moldability, it is desirable that the total resin composition contains 70 to 90% by weight.

【0017】さらに本発明に用いる硬化促進剤はエポキ
シ基と水酸基の反応を促進するものであれば良く、一般
に封止材料に使用されているものを広く使用することが
できる。例えばトリフェニルホスフィン(TPP)、ト
リブチルホスフィン、トリ(4−メチルフェニル)ホス
フィン等の有機ホスフィン化合物、トリブチルアミン、
トリエチルアミン、ベンジルジメチルアミン、トリスジ
メチルアミノメチルフェノール、1,8−ジアザビシク
ロ[5,4,0]−7−ウンデセン(DBU)等の第3
級アミン、2−メチルイミダゾール、2−フェニルイミ
ダゾール、2−エチル−4−メチルイミダゾール等のイ
ミダゾール化合物等が挙げられる。これらを単独で用い
ても、あるいはその2種以上を併用することも可能であ
る。
Further, the curing accelerator used in the present invention may be any one which promotes the reaction between an epoxy group and a hydroxyl group, and those generally used for a sealing material can be widely used. For example, organic phosphine compounds such as triphenylphosphine (TPP), tributylphosphine, and tri (4-methylphenyl) phosphine; tributylamine;
Tertiary amines such as triethylamine, benzyldimethylamine, trisdimethylaminomethylphenol, and 1,8-diazabicyclo [5,4,0] -7-undecene (DBU);
And imidazole compounds such as secondary amine, 2-methylimidazole, 2-phenylimidazole and 2-ethyl-4-methylimidazole. These can be used alone or in combination of two or more.

【0018】本発明の組成物は前述のもの以外、必要に
応じてカーボンブラック等の着色剤、カルナバワック
ス、合成ワックス等の離型剤、ブロム化エポキシ、三酸
化アンチモン等の難燃剤、γ−グリシドキシプロピルト
リメトキシシラン等のカップリング剤、シリコーンゴ
ム、ポリブタジエン等のゴム成分を添加することができ
る。
The composition of the present invention may further contain a coloring agent such as carbon black, a release agent such as carnauba wax and synthetic wax, a flame retardant such as brominated epoxy and antimony trioxide, and a γ- Coupling agents such as glycidoxypropyltrimethoxysilane and rubber components such as silicone rubber and polybutadiene can be added.

【0019】又、本発明の封止用エポキシ樹脂組成物を
成形材料として製造するには、エポキシ樹脂、硬化剤、
硬化促進剤、充填剤、その他の添加剤をミキサー等によ
って十分に均一に混合した後、さらに熱ロールまたはニ
ーダー等で溶融混練し、冷却後粉砕して成形材料とする
ことができる。これらの成形材料は電子部品あるいは電
気部品の封止、被覆、絶縁等に適用することができる。
In order to produce the encapsulating epoxy resin composition of the present invention as a molding material, an epoxy resin, a curing agent,
After a curing accelerator, a filler, and other additives are sufficiently and uniformly mixed by a mixer or the like, the mixture is further melt-kneaded by a hot roll or a kneader, cooled, and pulverized to obtain a molding material. These molding materials can be applied to sealing, coating, insulating and the like of electronic parts or electric parts.

【0020】[0020]

【実施例】以下本発明を実施例で具体的に説明する。The present invention will be specifically described below with reference to examples.

【0021】実施例1 下記組成物 オルソクレゾールとβ−ナフトールの共縮合ノボラックエポキシ樹脂 (nはn=3が70重量%、n=4が30重量%の混合物、 エポキシ当量225、軟化点84℃) 13.5重量部 下記式(3)で示されるフェノール樹脂硬化剤 (nはn=2が30重量%、n=3が70重量%の混合物、 水酸基当量175.軟化点75℃) 10.5重量 部Example 1 Co-condensed novolak epoxy resin of orthocresol and β-naphthol (n is a mixture of 70% by weight of n = 3 and 30% by weight of n = 4, epoxy equivalent 225, softening point 84 ° C.) 13.5 parts by weight A phenolic resin curing agent represented by the following formula (3) (n is a mixture of 30% by weight for n = 2 and 70% by weight for n = 3, hydroxyl equivalent 175, softening point 75 ° C.) 5 parts by weight

【0022】[0022]

【化5】 Embedded image

【0023】 溶融シリカ粉末 75重量部 トリフェニルホスフィン 0.2重量部 カーボンブラック 0.3重量部 カルナバワックス 0.5重量部 をミキサーで常温で混合し、70〜100℃で2軸ロー
ルにより混練し、冷却後粉砕した成形材料とした得られ
た成形材料をタブレット化し、低圧トランスファー成形
機にて175℃、70kg/cm2 、120秒の条件で半田
クラック試験用として6×6mmのチップを52pパッケ
ージに封入し、また半田耐湿試験用として3×6mmのチ
ップを16pSOPパッケージに封入した。封止したテ
スト用素子について下記の半田クラック試験及び半田耐
湿性試験を行った。
75 parts by weight of fused silica powder 0.2 parts by weight of triphenylphosphine 0.3 parts by weight of carbon black 0.5 parts by weight of carnauba wax are mixed at room temperature with a mixer, and kneaded at 70-100 ° C. with a biaxial roll. After cooling, the obtained molding material was converted into a tablet, and the resulting molding material was tabletted, and a low pressure transfer molding machine was used to package a 6 × 6 mm chip in a 52p package for solder crack testing at 175 ° C., 70 kg / cm 2 and 120 seconds. And a 3 × 6 mm chip was sealed in a 16 pSOP package for a solder moisture resistance test. The sealed test element was subjected to the following solder crack test and solder moisture resistance test.

【0024】半田クラック試験:封止したテスト用素子
を85℃、85%RHの環境下で48Hr及び72Hr
処理し、その後260℃の半田槽に10秒間浸漬後、顕
微鏡で外部クラックを観察した。 半田耐湿性試験:封止したテスト用素子を85℃、85
%RHの環境下で72Hr処理しその後260℃の半田
槽に10秒間浸漬後、プレッシャークッカー試験(12
5℃、100%RH)を行い、回路のオープン不良を測
定した。 試験結果を表1に示す。
Solder crack test: The sealed test element was subjected to 48 hours and 72 hours under an environment of 85 ° C. and 85% RH.
After the treatment, it was immersed in a solder bath at 260 ° C. for 10 seconds, and external cracks were observed with a microscope. Solder moisture resistance test: Sealed test element at 85 ° C, 85
% RH environment and then immersed in a solder bath at 260 ° C. for 10 seconds, followed by a pressure cooker test (12
5 ° C., 100% RH), and the open failure of the circuit was measured. Table 1 shows the test results.

【0025】実施例2〜5 表1の処方にしたがって配合し、実施例1と同様にして
成形材料を得た。この成形材料でテスト用素子を封止し
た成形品を得、この成形品を用いて実施例1と同様に半
田クラック試験及び半田耐湿性試験を行った。試験結果
を表1に示す。
Examples 2 to 5 Compounded according to the formulation shown in Table 1, and a molding material was obtained in the same manner as in Example 1. A molded product in which a test element was sealed with this molding material was obtained, and a solder crack test and a solder moisture resistance test were performed using this molded product in the same manner as in Example 1. Table 1 shows the test results.

【0026】比較例1〜5 表1の処方にしたがって配合し、実施例1と同様にして
成形材料を得た。この成形材料でテスト用素子を封止し
た成形品を得、この成形品を用いて実施例1と同様に半
田クラック試験及び半田耐湿性試験を行った。試験結果
を表1に示す。
Comparative Examples 1 to 5 Compounded according to the formulation shown in Table 1, and a molding material was obtained in the same manner as in Example 1. A molded product in which a test element was sealed with this molding material was obtained, and a solder crack test and a solder moisture resistance test were performed using this molded product in the same manner as in Example 1. Table 1 shows the test results.

【0027】[0027]

【表1】 [Table 1]

【0028】[0028]

【発明の効果】耐熱性、低吸水性、可撓性に優れた樹脂
組成物が得られる。プリント回路基板に表面実装する高
集積ICパッケージ用封止材料として半田付け時の半田
耐熱性に非常に優れている。
According to the present invention, a resin composition having excellent heat resistance, low water absorption and flexibility can be obtained. As a sealing material for highly integrated IC packages that are surface-mounted on a printed circuit board, they are extremely excellent in solder heat resistance during soldering.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 (A)下記式(1)で示されるオルソク
レゾールとβ−ナフトールの共縮合ノボラックエポキシ
樹脂を総エポキシ樹脂量の30〜100重量%含むエポ
キシ樹脂、 【化1】 (n=1〜6) (B)下記式(2)で示されるフェノール樹脂硬化剤を
総硬化剤量に対して30〜100重量%含む硬化剤、 【化2】 (式中のR1 、R2 は水素、ハロゲン、低級アルキル基
の中から選択される同一もしくは異なる原子または基、
n=1〜6) (C)無機質充填材及び (D)硬化促進剤 を必須成分とする半導体封止用エポキシ樹脂組成物。
(A) an epoxy resin containing a co-condensed novolak epoxy resin of orthocresol and β-naphthol represented by the following formula (1) in an amount of 30 to 100% by weight based on the total epoxy resin amount: (N = 1-6) (B) a curing agent containing a phenolic resin curing agent represented by the following formula (2) in an amount of 30 to 100% by weight based on the total amount of the curing agent; (Wherein R 1 and R 2 are the same or different atoms or groups selected from hydrogen, halogen, and lower alkyl groups;
n = 1 to 6) An epoxy resin composition for semiconductor encapsulation comprising (C) an inorganic filler and (D) a curing accelerator as essential components.
JP32927791A 1991-12-13 1991-12-13 Epoxy resin composition Expired - Fee Related JP2963260B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32927791A JP2963260B2 (en) 1991-12-13 1991-12-13 Epoxy resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32927791A JP2963260B2 (en) 1991-12-13 1991-12-13 Epoxy resin composition

Publications (2)

Publication Number Publication Date
JPH05166974A JPH05166974A (en) 1993-07-02
JP2963260B2 true JP2963260B2 (en) 1999-10-18

Family

ID=18219656

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32927791A Expired - Fee Related JP2963260B2 (en) 1991-12-13 1991-12-13 Epoxy resin composition

Country Status (1)

Country Link
JP (1) JP2963260B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8424652B2 (en) 2007-03-23 2013-04-23 Otis Elevator Company Electromagnet and elevator door coupler
MY153770A (en) * 2008-08-01 2015-03-13 Sumitomo Bakelite Co Resin composition for encapsulating semiconductor and semiconductor device using the same
JP5708306B2 (en) * 2011-06-30 2015-04-30 Dic株式会社 Epoxy resin, curable resin composition, cured product thereof, semiconductor sealing material, and printed wiring board
JP6302280B2 (en) * 2014-02-21 2018-03-28 日本化薬株式会社 Epoxy resin, curable resin composition and cured product

Also Published As

Publication number Publication date
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