JP2897537B2 - Substrate cleaning device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate cleaning apparatus, and more particularly to a single-wafer processing brush cleaning apparatus.

[0002]

2. Description of the Related Art In a conventional substrate cleaning apparatus, as shown in FIG. 2, a conveying roller 4 supporting both ends of a substrate 12 to be cleaned is linearly arranged at a predetermined pitch in an upper opening of a receiving tank 13 for a cleaning liquid 11. And constitute a pass line.

[0003] A pair of rotating brush parts 5 orthogonal to and opposed to the pass line are disposed substantially at the center of the receiving tank 13, and further, a liquid storage tank 8 is provided below the receiving tank 13. The pipes are connected to each other.

Further, the cleaning liquid 1 is placed near the tip of the cleaning brush 6.
A spray nozzle 14 for supplying the nozzle 1 is disposed opposite to the pass line similarly to the rotary brush unit 5.

The spray nozzle 14 and the liquid storage tank 8
Is connected to the piping via the circulation pump 9 and the filter 10.

Next, the cleaning operation will be described. As shown in FIG. 1, while the substrate 12 is conveyed rightward along the path line by the conveying roller 4, the front and back surfaces of the substrate 12 are simultaneously scrubbed by the cleaning brush 6 attached to the tip of the rotating brush unit 5. Washed.

At this time, the cleaning liquid 11 is supplied to the vicinity of the tip of the cleaning brush 6 from the mouth of the spray nozzle 14 by the pressure of the circulation pump 9.

[0008]

In this conventional substrate cleaning apparatus, impurities such as particles removed from the surface of the substrate enter the inside of the brush as the cleaning processing time elapses, and the brush itself is gradually contaminated. Phenomenon occurs.

As a result, the surface of the substrate is rubbed by a contaminated brush, and there is a problem in terms of quality that the cleaning ability is significantly reduced.

Further, there is a problem that a large number of man-hours for frequently changing the brush are required.

An object of the present invention is to provide a substrate cleaning apparatus which prevents deterioration with time due to contamination of the brush itself.

[0012]

In order to achieve the above object, a substrate cleaning apparatus according to the present invention has an overflow layer tank, a shutter, a transport section, an ultrasonic oscillation section, and a rotating brush section. in the substrate cleaning apparatus, the over-<br/> Furo tank, washing liquid were housed, has an opening portion of the slit-shaped for performing loading and unloading of the substrate to near the upper edge of the opposite sides, wherein The shutter is located at the opening
Adjacent roll that moves up and down by its own weight in synchronization with the passage of the substrate
Provided as a shape, which is opened and closed by loading and unloading of the substrate, wherein the transport unit, the substrate between the opening of the overflow vessel is intended to convey immersed in the cleaning liquid, the ultrasonic generator is is intended to act ultrasonic waves in the cleaning liquid said overflow tank, the rotary brush unit is for cleaning a substrate by the cleaning brush in the cleaning liquid of the overflow tank.

[0013]

The cleaning brush is immersed in the cleaning liquid at all times, and the cleaning brush is ultrasonically cleaned to prevent contamination by the brush itself.

[0014]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings. FIG. 1 is a sectional view showing one embodiment of the present invention.

In FIG. 1, an overflow tank 1 for a cleaning liquid 11 has a slit-shaped opening 2 for carrying a substrate 12 in and out of an opposing side surface, and is synchronized with the passage of the substrate 12 adjacent to the opening 2. And a roll-shaped shutter unit 3 which moves up and down by its own weight, and an ultrasonic oscillator 7 arranged at the bottom of the tank 1.

As the transfer section of the substrate 12, transfer rollers 4 supporting both ends of the substrate 12 are arranged at a predetermined pitch on a straight line connecting the opposite openings 2 of the overflow tank 1.
A pass line of the substrate 12 is formed.

The rotating brush unit 5 is disposed substantially at the center of the overflow tank 1 orthogonally to the pass line of the substrate 12 with the cleaning brush 6 attached to the tip end downward.

A liquid storage tank 8 is disposed below the overflow tank 1, and the overflow tank 1 and the liquid storage tank 8 are
A circulation system is configured by being connected by a piping system of a recovery system of the cleaning liquid 11 and a piping system of a supply system including the circulation pump 9 and the filter 10.

Next, the cleaning operation will be described.
The substrate 2 is conveyed rightward along the pass line by the conveying roller 4, is conveyed into the liquid in the overflow tank 1 via the shutter 3 and the opening 2, and is cleaned by the cleaning brush 6 of the rotating brush 5. Is scrubbed.

The back surface of the substrate 12 and the cleaning brush 6
The ultrasonic action by the ultrasonic oscillator 7 (that is, the cavitation action when the oscillation frequency is in the 20 to 40 KHZ band,
In the vicinity of the 1 MHZ band, cleaning is performed by the action of vibration acceleration.

The cleaning liquid overflowing from the overflow tank 1 is collected in a liquid storage tank 8. The cleaning liquid in the liquid storage tank 8 is supplied by a circulation pump 9, is filtered through a filter 10, and is supplied into the overflow tank 1.

[0022]

As described above, according to the present invention, the cleaning brush is immersed in the overflowing cleaning liquid and is cleaned by the ultrasonic action of the ultrasonic oscillator. As a result, it is possible to prevent a reduction in cleaning ability due to contamination of the cleaning brush itself, and to improve the quality as compared with the related art.

[0023] In addition, the frequency of replacement of the cleaning brush is reduced, Ru it is possible to reduce the man-hours. In addition, shutter
The opening is adjacent to the opening of the overflow tank, and
As a roll shape that moves up and down under its own weight in synchronization with excess
Provided to open and close by loading and unloading substrates.
The mechanism that opens and closes the loading and unloading of substrates is forcibly opened and closed.
No need for an operating mechanism and electrical control, simplifying the structure
It can be aimed at, and with the substrate by the roll shutter
Opening and closing in close contact, reducing the degree of leakage of cleaning solution
Can be eliminated.

[Brief description of the drawings]

FIG. 1 is a sectional view showing an embodiment of the present invention.

FIG. 2 is a sectional view showing a conventional substrate cleaning apparatus.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Overflow tank 2 Opening 3 Shutter part 4 Conveyance roller 5 Rotating brush part 6 Cleaning brush 7 Ultrasonic oscillator 8 Liquid storage tank 9 Circulation pump 10 Filter 11 Cleaning liquid 12 Substrate 13 Receiving tank 14 Spray nozzle

Claims (1)

(57) [Claims] 1. A substrate cleaning apparatus having an overflow layer tank, a shutter section, a transport section, an ultrasonic oscillating section, and a rotating brush section, wherein the overflow tank stores a cleaning liquid and faces side surfaces facing each other. A slit-shaped opening for carrying in / out the substrate near the upper edge of the substrate, wherein the shutter portion passes through the substrate adjacent to the opening.
As a roll that moves up and down under its own weight in synchronization with
Vignetting, which opened and closed by the loading and unloading of the substrate, wherein the transport unit is intended to convey the substrate was immersed in the cleaning liquid between the opening of the overflow vessel, the ultrasonic generator, the overflow tank the cleaning liquid is intended to act ultrasound, the rotary brush unit, a substrate cleaning apparatus, characterized in that in the cleaning liquid of the overflow tank by washing the substrate by washing brushes.