JP2707530B2 - Plating method - Google Patents

Plating method

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Publication number
JP2707530B2
JP2707530B2 JP4361185A JP36118592A JP2707530B2 JP 2707530 B2 JP2707530 B2 JP 2707530B2 JP 4361185 A JP4361185 A JP 4361185A JP 36118592 A JP36118592 A JP 36118592A JP 2707530 B2 JP2707530 B2 JP 2707530B2
Authority
JP
Japan
Prior art keywords
plating
vibration
stirring
water washing
degreasing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP4361185A
Other languages
Japanese (ja)
Other versions
JPH06220697A (en
Inventor
龍晋 大政
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Techno KK
Original Assignee
Nihon Techno KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Techno KK filed Critical Nihon Techno KK
Priority to JP4361185A priority Critical patent/JP2707530B2/en
Publication of JPH06220697A publication Critical patent/JPH06220697A/en
Application granted granted Critical
Publication of JP2707530B2 publication Critical patent/JP2707530B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Mixers With Rotating Receptacles And Mixers With Vibration Mechanisms (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【技術分野】本発明は、めっき方法に関する。TECHNICAL FIELD The present invention relates to a plating method.

【0002】[0002]

【従来技術】めっきは、めっきの前処理段階、めっき処
理段階、めっきの後処理段階より構成されるが現実に
は、たとえば銅めっき(このときは前段のみ)およびニ
ッケルめっき(全工程が必要)を例にとると、有機溶剤
脱脂−煮沸脱脂−水洗−電解脱脂−一次水洗−二次水洗
−銅ストライク−銅めっき−回収−一次水洗−二次水洗
−酸中和−一次水洗−二次水洗−ニッケルめっき−回収
−一次水洗−二次水洗−中和−水洗−湯洗−乾燥という
多数の工程を必要としている。このように多数の工程が
必要となる最大の原因は各処理液と被めっき物との均一
な接触が充分に行われていない点にある。しかも、脱脂
処理に用いる有機溶剤の代表であるトリクロロエチレン
は公害発生源としてマークされている存在であり、これ
を使用しない方法の出現が強く望まれている。また、小
物のめっきには、バレルめっき法が使用されている。こ
のバレルめっき法はバレルにその容積の1/2〜1/3
の小物を入れ、バレルを回転させながら脱脂、水洗、め
っき、水洗などを行うことにより、小物のめっきを効率
よく行う方法として実用化されている。しかしながら、
バレルを回転させているにもかかわらず、その中の小物
はなかなか均一にめっき液等と接触することが困難であ
り、とくに袋穴のあるものとか、複雑な形状のものなど
にはこの傾向が著しい。その対策としてめっき液の充分
な撹拌が必要とされているが、ここにもいろいろの問題
点が存在している。撹拌手段としては、ポンプによる循
環撹拌があり、これはめっき液を酸化させることがない
点では好ましい手段ではあるが、撹拌効率が悪いので、
実用性に乏しい。エアレーションも有効な撹拌手段では
あるが、めっき液を酸化させるので、青化浴においては
炭酸塩を生成するなどの問題点があり、めっき装置にエ
アレーション手段を組みこむことができない。
2. Description of the Related Art Plating consists of a pretreatment stage of plating, a plating treatment stage, and a post-treatment stage of plating. In reality, for example, copper plating (only the former stage) and nickel plating (all processes are required) For example, organic solvent degreasing-boiling degreasing-water washing-electrolytic degreasing-primary water washing-secondary water washing-copper strike-copper plating-recovery-primary water washing-secondary water washing-acid neutralization-primary water washing-secondary water washing It requires a number of steps of-nickel plating-recovery-primary water washing-secondary water washing-neutralization-water washing-hot water washing-drying. The greatest reason why such a large number of steps are required is that uniform contact between each processing solution and the object to be plated is not sufficiently performed. Moreover, trichloroethylene, which is a representative of the organic solvent used in the degreasing treatment, is marked as a source of pollution, and there is a strong demand for a method that does not use it. Barrel plating is used for plating small items. In this barrel plating method, the barrel is 1 / to 2〜 of its volume.
This method has been put to practical use as a method for efficiently plating small items by putting debris therein and performing degreasing, rinsing, plating, and rinsing while rotating the barrel. However,
Despite rotating the barrel, it is difficult for the small items in it to come in contact with the plating solution, etc., and this tendency is particularly noticeable for those with blind holes or those with complicated shapes. Remarkable. As a countermeasure, sufficient stirring of the plating solution is required, but there are also various problems here. As the stirring means, there is circulation stirring by a pump, which is a preferable means in that the plating solution is not oxidized, but since the stirring efficiency is poor,
Poor practicality. Aeration is also an effective agitation means, but it oxidizes the plating solution, so there is a problem such as the formation of carbonate in a bluing bath, and the aeration means cannot be incorporated in the plating apparatus.

【0003】[0003]

【目的】本発明の目的の第一は、めっき法において、被
めっき物とめっき液や脱脂液などの液体との接触を充分
に行うために有効な方法を提供する点にある。本発明の
目的の第二は、有機溶剤を使用する必要のない新しいめ
っき方法を提供する点にある。
A first object of the present invention is to provide an effective method for sufficiently contacting an object to be plated with a liquid such as a plating solution or a degreasing solution in a plating method. A second object of the present invention is to provide a new plating method that does not require the use of an organic solvent.

【0004】[0004]

【構成】本発明は、めっきの前処理段階、めっき処理段
階およびめっきの後処理段階のすべての処理段階におけ
る少なくともその一工程で振動撹拌を行うめっき方法で
あって、前記振動撹拌が15〜60Hzの振動モーター
の発生する振動を与えられた振動棒に結合した多段で、
かつ傾斜角度を有する振動羽根により発生されたもので
あることを特徴とするめっき方法に関する。本発明の1
つの好ましい態様は、前記振動羽根が水平方向を基準に
して傾斜角度が45°以内の範囲、好ましくは10〜2
0°の範囲で傾斜していることである。本発明のもう1
つの好ましい態様は、めっきの前処理段階における煮沸
脱脂工程、水洗工程;めっきの処理段階におけるめっき
工程;めっきの後処理段階における水洗工程、必要に応
じて酸中和工程、水洗工程の各工程において振動撹拌を
行なうめっき方法である。本発明は、振動撹拌手段を採
用していることにより、めっきの前処理段階において有
機溶剤による脱脂工程を省略しても、有機溶剤による脱
脂工程を含む従来法に較べて優るとも劣らない効果を発
揮する。特にめっき対象物がバレルに充填された複数の
物品とくに多数の小物類である場合、すなわち、バレル
めっきの場合には、本発明方法は特に顕著な効果を奏す
る。バレルは外周に多数の小孔が設けられてはいるが、
そのなかにおける液体の流動は極めて悪く、ほとんど流
動していないのが実状である。ところが驚くべきことに
振動撹拌を行なうと、バレル内の液体が見事に流動し、
新しい液体が、それぞれの小物に充分接触できるように
なったのである。
The present invention relates to a plating method in which vibration stirring is performed in at least one of all of the pretreatment stage, plating treatment stage, and post-treatment stage of plating. The vibration generated by the vibration motor is multistage coupled to the given vibration rod,
The present invention also relates to a plating method characterized by being generated by vibrating blades having an inclination angle. 1 of the present invention
One preferred mode is that the vibrating blade has a tilt angle within 45 ° with respect to the horizontal direction, preferably 10 to 2 degrees.
That is, it is inclined in the range of 0 °. Another of the present invention
One preferred embodiment is a boiling degreasing step and a washing step in a pretreatment step of plating; a plating step in a plating treatment step; a washing step in a post-treatment step of plating, an acid neutralizing step as necessary, and a washing step. This is a plating method that performs vibration stirring. The present invention employs the vibration stirring means, so that even if the degreasing step with an organic solvent is omitted in the pretreatment stage of plating, the effect is not inferior to the conventional method including the degreasing step with an organic solvent. Demonstrate. In particular, when the object to be plated is a plurality of articles filled in a barrel, particularly a large number of small items, that is, in the case of barrel plating, the method of the present invention has a particularly remarkable effect. Although the barrel has many small holes on the outer circumference,
Among them, the flow of the liquid is extremely poor, and in reality, it hardly flows. However, surprisingly, when the vibratory stirring is performed, the liquid in the barrel flows wonderfully,
The new liquid is now in good contact with each item.

【0005】振動撹拌は、15〜60Hz、好ましくは
25〜40Hzで振動を発生させる、振動モータによる
振動を液中の振動板に伝え、液体にこの振動を伝えるこ
とにもとづく本発明者が開発した新しい撹拌手段であ
り、その基本的考え方は特公平6−71544号(特開
平3−275130号)公報に開示したとおりであり、
これによれば液槽中の振動板の振動幅は8〜20mm、
振動数は200〜600回/分である。また、その変形
撹拌手段は特願平4−286544号として平成4年9
月14日に出願している。なお、振動板の振幅は、2〜
30mm好ましくは、10〜15mmである。
[0005] Vibration agitation generates vibration at 15 to 60 Hz, preferably 25 to 40 Hz. Vibration generated by a vibration motor is transmitted to a vibration plate in a liquid and transmitted to the liquid by the inventor. It is a new stirring means, and its basic concept is as disclosed in Japanese Patent Publication No. Hei 6-71544 (Japanese Patent Laid-Open No. 3-275130).
According to this, the vibration width of the diaphragm in the liquid tank is 8 to 20 mm,
The frequency is 200-600 times / minute. The deformation stirring means is disclosed in Japanese Patent Application No. 4-286544.
Filed on March 14. The amplitude of the diaphragm is 2 to
It is 30 mm, preferably 10 to 15 mm.

【0006】本発明で使用する振動撹拌手段を設けため
っき装置を図1〜4に示す。めっき工程以外で使用する
ときは図2で示す電極27は不要である。振動撹拌手段
は、振動モーター26で発生した振動を振動枠23、振
動棒21を介して振動羽根群22、22……に伝える。
振動羽根群は図2、3に明示されているように槽29の
両側に設置する。振動モーター26よりの振動が槽29
本体に影響しないようにするため、振動枠23はスプリ
ング24と台座25を介して本体に取付けられている。
振動羽根は、やゝ傾斜をつけて取付ける。傾斜の程度は
水平方向を基準にして最大で45゜、好ましくは10〜
20゜の角度で取付けることが好ましい。振動羽根に傾
斜が設けられていると、液は振動と共に流動が加わり、
より一層被めっき物と液との接触状態が改善される。本
発明の実施例では傾斜角度を15゜でセットした。振動
羽根の幅は特に制限はないが30mm以上程度あれば充
分その効力を発揮する。通常30〜100mm、好まし
くは50〜80mm程度である。撹拌羽根同士の間隔は
とくに制限はないが通常10〜80mm、好ましくは3
0〜40mmであり、本実施例では35mm間隔とし
た。また、左右の振動羽根22の位置は、同一の高さで
もよいが、やゝずらせた位置に設けることもできる。最
上位の振動羽根は液面から約100mm下の位置にする
ことが好ましい。これより上に設けるとその振幅により
多少異なるが、液が飛び散るので好ましくない。最下位
の振動羽根は底から約50mm上の位置とすることが好
ましい。本発明実施例の振動羽根は幅80mm、長さ4
00mm、間隔35mmとした。
FIGS. 1 to 4 show a plating apparatus provided with a vibration stirring means used in the present invention. The electrode 27 shown in FIG. 2 is unnecessary when used other than in the plating step. The vibration stirring means transmits the vibration generated by the vibration motor 26 to the vibration blade groups 22, 22... Via the vibration frame 23 and the vibration rod 21.
The vibrating blade group is installed on both sides of the tank 29 as clearly shown in FIGS. Vibration from vibration motor 26 is applied to tank 29
The vibration frame 23 is attached to the main body via a spring 24 and a pedestal 25 so as not to affect the main body.
Install the vibrating blade with a slight inclination. The degree of inclination is 45 ° at the maximum with respect to the horizontal direction, preferably 10 to
Preferably, it is mounted at an angle of 20 °. If the vibrating blade is provided with a slope, the liquid will flow along with the vibration,
The contact state between the object to be plated and the solution is further improved. In the embodiment of the present invention, the inclination angle is set at 15 °. The width of the vibrating blade is not particularly limited, but the effect is sufficiently exhibited if it is at least about 30 mm. It is usually about 30 to 100 mm, preferably about 50 to 80 mm. The distance between the stirring blades is not particularly limited, but is usually 10 to 80 mm, preferably 3 to 80 mm.
The distance is 0 to 40 mm, and in this embodiment, the distance is 35 mm. The positions of the left and right vibrating blades 22 may be the same, but may be provided at slightly shifted positions. The uppermost vibrating blade is preferably located at a position about 100 mm below the liquid level. If it is provided above this, it slightly varies depending on its amplitude, but it is not preferable because the liquid scatters. The lowest vibrating blade is preferably located at a position about 50 mm above the bottom. The vibrating blade of the embodiment of the present invention has a width of 80 mm and a length of 4 mm.
The distance was set to 00 mm and the interval to 35 mm.

【0007】以下の実施例は、銅めっきの上にニッケル
めっきを行う態様を説明するものであるが、本発明は、
この実施例により限定されることなく、亜鉛、すず、
銅、ニッケル、クロム、銀、金など各種金属、合金類の
めっきにすべて顕著な効果を奏するものである。
The following example describes an embodiment in which nickel plating is performed on copper plating.
Without being limited by this example, zinc, tin,
It has a remarkable effect on the plating of various metals and alloys such as copper, nickel, chromium, silver, and gold.

【0008】[0008]

【実施例】実施例1 (工程) (1)煮沸脱脂(振動撹拌付)、(2)水洗(振動撹拌
付)、(3)一般水洗、(4)銅ストライク、(5)銅
めっき(振動撹拌付)、(6)回収、(7)水洗(振動
撹拌付)、(8)一般水洗、(9)酸中和(振動撹拌
付)、(10)水洗(振動撹拌付)、(11)ニッケル
めっき(振動撹拌付)、(12)回収、(13)水洗
(振動撹拌付)、(14)一般湯洗、(15)乾燥より
なる15工程。 振動条件 振動モーターへの供給電源 50Hz 振動羽根の傾斜角度 15°
EXAMPLES Example 1 (Steps) (1) Boiling degreasing (with vibration stirring), (2) water washing (with vibration stirring), (3) general water washing, (4) copper strike, (5) copper plating (vibration) (With stirring), (6) recovery, (7) water washing (with vibration stirring), (8) general water washing, (9) acid neutralization (with vibration stirring), (10) water washing (with vibration stirring), (11) 15 steps of nickel plating (with vibration stirring), (12) recovery, (13) water washing (with vibration stirring), (14) general hot water washing, and (15) drying. Vibration conditions Power supply to vibration motor 50Hz Vibration blade inclination angle 15 °

【0009】(めっき対象物とめっき法) L字状をした接極子(幅約7mm,全長約30mm)
(目視により油汚れが多く付着していた)をバレルめっ
き法によりめっきした。 (煮沸脱脂) 苛性ソーダ、炭酸ソーダ、りん酸ソーダ、トリポリリン
酸ソーダおよび界面活性剤を含有する水溶液を使用、液
温;70℃、浸漬時間;5分。 (銅めっき浴) シアン化銅 46.2g/リットル シアン化ナトリウム 35g/リットル 炭酸ナトリウム 26.5g/リットル 遊離シアン分 13.5g/リットル 電流密度 5.0A/dm2 電解時間 90分 pH 12.3 温度 50℃ 銅メッキ膜厚 12±2μ 有機光沢剤 5リットル/M バレル 350φ×500L 穴径5m/mφ 槽寸法 700×500×700H(200リットル) バレル数 3連 (ニッケルめっき浴) 硫酸ニッケル 243.6g/リットル 塩化ニッケル 48.5g/リットル ホウ酸 34.2g/リットル 電流密度 5.0A/dm2 電解時間 30分 pH 4.8 温度 48℃ ニッケル膜厚 2±0.5μ 有機光沢剤 8リットル/M バレル 350φ×500L 穴径5m/mφ 槽寸法 600×1,200×700(430リットル) バレル数 2連
(Plating object and plating method) L-shaped armature (approximately 7 mm in width and approximately 30 mm in total length)
(A lot of oil stains adhered visually) was plated by barrel plating. (Boiled degreasing) An aqueous solution containing caustic soda, sodium carbonate, sodium phosphate, sodium tripolyphosphate and a surfactant was used. Liquid temperature: 70 ° C, immersion time: 5 minutes. (Copper plating bath) Copper cyanide 46.2 g / L Sodium cyanide 35 g / L Sodium carbonate 26.5 g / L Free cyanide content 13.5 g / L Current density 5.0 A / dm 2 Electrolysis time 90 minutes pH 12.3 Temperature 50 ° C Copper plating film thickness 12 ± 2μ Organic brightener 5 liter / M barrel 350φ × 500L Hole diameter 5m / mφ Tank size 700 × 500 × 700H (200 liter) Number of barrels 3 (nickel plating bath) Nickel sulfate 243. 6 g / liter Nickel chloride 48.5 g / liter Boric acid 34.2 g / liter Current density 5.0 A / dm 2 Electrolysis time 30 minutes pH 4.8 Temperature 48 ° C Nickel film thickness 2 ± 0.5 μ Organic brightener 8 liter / M barrel 350φ × 500L Hole diameter 5m / mφ Tank size 600 × 1,200 × 700 (430 Liters) barrel 2 stations

【0010】比較例1 実施例1と同レベルのめっきを達成するためには、従来
の工程は次の通り22工程が必要である。 (工程) (1)有機溶剤脱脂、(2)煮沸脱脂、(3)水洗、
(4)電解脱脂、(5)一次水洗、(6)二次水洗、
(7)銅ストライク、(8)銅めっき、(9)回収、
(10)一次水洗、(11)二次水洗、(12)酸中
和、(13)一次水洗、(14)二次水洗、(15)ニ
ッケルめっき、(16)回収、(17)一次水洗、(1
8)二次水洗、(19)中和、(20)水洗、(21)
湯洗、(22)乾燥 (めっき対象物とめっき法) 実施例と同一。 (有機溶剤脱脂) 実施例と同一。 (煮沸脱脂) 振動撹拌のかわりに浸漬方法(撹拌なし)を用いた以外
は、実施例と同一。 (銅めっき浴)と(ニッケル浴) いずれも振動撹拌にかわる積極的撹拌を行わなかった
(バレルめっきの場合はエアレーションを行ってもバレ
ルが邪魔をして全く効果がないことが知られている。)
以外は実施例1と同一。
Comparative Example 1 In order to achieve the same level of plating as in Example 1, the conventional steps require the following 22 steps. (Steps) (1) Organic solvent degreasing, (2) Boiling degreasing, (3) Rinsing with water,
(4) electrolytic degreasing, (5) primary water washing, (6) secondary water washing,
(7) Copper strike, (8) Copper plating, (9) Recovery,
(10) Primary water washing, (11) Secondary water washing, (12) Acid neutralization, (13) Primary water washing, (14) Secondary water washing, (15) Nickel plating, (16) Recovery, (17) Primary water washing, (1
8) secondary washing, (19) neutralization, (20) washing with water, (21)
Hot water washing, (22) drying (plating target and plating method) Same as in the example. (Organic solvent degreasing) Same as Example. (Boiled degreasing) Same as Example except that the immersion method (no stirring) was used instead of the vibration stirring. Both (copper plating bath) and (nickel bath) did not perform active stirring instead of vibration stirring. (In the case of barrel plating, it is known that even if aeration is performed, the barrel disturbs and has no effect. .)
Other than the above, it is the same as Example 1.

【0011】[0011]

【表1】 [Table 1]

【0012】[0012]

【考察】(1)残留油分について、 1,1,1−トリクロルエタンのような有機溶剤を使用
しないにも拘らず、有機溶剤を使用した従来法に較べて
優るとも劣らない脱脂効果を挙げている。また、煮沸脱
脂工程には、界面活性剤が存在することに伴い泡立ちが
問題となるが、振動撹拌によるときは不思議とほとんど
泡立ちがなく、また被めっき物表面からの油の離脱も極
めてスムースである。
[Discussion] (1) Regarding the residual oil content, a degreasing effect that is not inferior to or less than that of a conventional method using an organic solvent is given despite not using an organic solvent such as 1,1,1-trichloroethane. I have. Also, in the boiling degreasing step, foaming becomes a problem due to the presence of a surfactant, but when vibrating agitation, there is almost no foaming, and the separation of oil from the surface of the plating object is extremely smooth. is there.

【0013】(2)水洗効率について 表1にみられるとおり、本発明の水洗効果は比較例と較
べて抜群である。比較例は一次、二次と二回に分けて水
洗しているのに対して、実施例では一回の水洗で充分で
あり、かつその水洗効果も表1のデータからみて約3〜
8倍である。
(2) Rinsing efficiency As shown in Table 1, the rinsing effect of the present invention is excellent as compared with the comparative example. In the comparative example, primary and secondary washing is performed twice, whereas in the embodiment, one washing is sufficient, and the washing effect is about 3 to 3 in view of the data in Table 1.
It is eight times.

【0014】(3)電流効率、電流密度への影響につい
て、 電流密度を上げると生産性が上がるから電流密度を上げ
ることはたいへん好ましいことであるが、電流密度をあ
げてゆくとある段階で過電流となり、製品にヤケやコゲ
が生じ、まためっき中にガスが発生し製品にピットが生
じたりする。ところが、振動撹拌を採用すると製品に、
ヤケ、コゲ、ピットが発生する限界となる電流密度が従
来法に較べて大幅に上昇した。
(3) Regarding the influence on the current efficiency and the current density, it is very preferable to increase the current density because the productivity is increased when the current density is increased. An electric current is generated, causing burns and burns on the product, and gas is generated during plating, causing pits on the product. However, when vibration agitation is adopted,
The current density, which is the limit for the occurrence of burns, burns, and pits, is greatly increased as compared with the conventional method.

【0015】[0015]

【表2】 [Table 2]

【表3】 [Table 3]

【表4】 [Table 4]

【表5】 [Table 5]

【0016】(4)省スペース、省エネルギー高生産性
について、 実施例と比較例をみれば明らかなとおり、従来法に較べ
て本発明は工程数が大幅に少なくなる結果、省スペー
ス、省エネルギー、高生産性を達成することができた。
同一生産高を達成するのに実施例は比較例の約1/3の
時間ですむ。
(4) Space saving and energy saving As is clear from the examples and comparative examples, the present invention greatly reduces the number of steps as compared with the conventional method, resulting in space saving, energy saving and high productivity. Productivity could be achieved.
The example requires about one-third the time of the comparative example to achieve the same output.

【0017】(5)炭酸塩について 比較例では、銅めっき浴中に多量の炭酸塩が生じるた
め、これを取り除く作業が必要である。比較例の場合は
多量の炭酸塩が発生するだけでなく、槽壁等に固着する
から、これを除去するのが大変である。これに対して、
実施例においては、ある程度の炭酸塩が発生している
が、槽壁に固着せず、系中に分散しているので濾過によ
り簡単に分離できる。
(5) Carbonate In the comparative example, since a large amount of carbonate is generated in the copper plating bath, it is necessary to remove the carbonate. In the case of the comparative example, not only a large amount of carbonate is generated, but also it adheres to the tank wall or the like, so it is difficult to remove it. On the contrary,
In the embodiment, although a certain amount of carbonate is generated, it does not adhere to the tank wall and is dispersed in the system, so that it can be easily separated by filtration.

【0018】(6)光沢剤の使用量について、 下記の表に示すとおり、実施例では比較例に較べて有機
光沢剤の使用量が1/2〜1/3に減少した。
(6) As shown in the table below, the amount of the organic brightener used in the examples was reduced to 1/2 to 1/3 as compared with the comparative example.

【表6】 [Table 6]

【表7】 [Table 7]

【0019】(7)ニッケルめっき浴におけるホウ酸の
働きについて、 ホウ酸は、めっきが行われている周辺領域の水素イオン
消費を補い、めっき面の物性向上に役立つ重要な試薬で
あり、とくにニッケルめっきにおいてはめっき浴中での
ホウ酸の不均一に基因する焦げ、ざらつき等が発生しや
すい。ところが、本発明によれば、このような不都合は
全く発生しない。
(7) Regarding the function of boric acid in the nickel plating bath Boric acid is an important reagent that supplements the consumption of hydrogen ions in the peripheral region where plating is being performed and is useful for improving the physical properties of the plated surface. In plating, scorching, roughness, and the like due to unevenness of boric acid in a plating bath are likely to occur. However, according to the present invention, such inconvenience does not occur at all.

【0020】(8)本発明により形成されためっき面
は、柔軟性に富み、内部応力が低いという優れた物性を
有する。 ニッケルめっき面について測定した結果は次のとおりで
ある。
(8) The plated surface formed according to the present invention has excellent physical properties such as high flexibility and low internal stress. The results measured for the nickel-plated surface are as follows.

【表8】 (9)めっき不良率を低減させたニッケルめっきのさい
の不良率は次のとおりである。
[Table 8] (9) The defective rate of nickel plating with reduced plating defective rate is as follows.

【表9】 (10) めっき膜厚のバラツキが著しく少なくなっ
た。これを銅めっき膜について測定したデータをつぎに
示す。
[Table 9] (10) Variation in plating film thickness was significantly reduced. The data measured for the copper plating film are shown below.

【表10】 [Table 10]

【0021】[0021]

【効果】本発明は、従来法に較べて大幅に工程数を少な
くすることができ、省エネルギーを達成でき、生産効果
が著しく向上した。とくに、本発明によれば有機溶剤の
使用を回避することができるので、公害問題解決に寄与
する点が大である。また、本発明によるめっき物は従来
法によるものに較べて物性が著しく向上している。
According to the present invention, the number of steps can be greatly reduced as compared with the conventional method, energy saving can be achieved, and the production effect is remarkably improved. In particular, according to the present invention, the use of an organic solvent can be avoided, so that it greatly contributes to solving pollution problems. Further, the physical properties of the plated product of the present invention are remarkably improved as compared with those of the conventional method.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明実施例のめっき方法に用いる振動撹拌装
置の上面図である。
FIG. 1 is a top view of a vibration stirrer used in a plating method according to an embodiment of the present invention.

【図2】本発明の実施例に用いた撹拌装置の側面図であ
る。
FIG. 2 is a side view of the stirring device used in the embodiment of the present invention.

【図3】本発明の実施例に用いた撹拌装置のもう一方の
側からみた側面図である。
FIG. 3 is a side view of the stirring device used in the embodiment of the present invention as viewed from the other side.

【図4】本発明の実施例に用いた撹拌装置の要部のみの
斜視図である。
FIG. 4 is a perspective view of only a main part of the stirring device used in the embodiment of the present invention.

【符号の説明】[Explanation of symbols]

21 振動棒 22 振動羽根 23 振動枠 24 スプリング 25 台座 26 振動モーター 27 電極 28 加熱用電極 29 槽 30 バレル DESCRIPTION OF SYMBOLS 21 Vibration bar 22 Vibrating blade 23 Vibration frame 24 Spring 25 Pedestal 26 Vibration motor 27 Electrode 28 Heating electrode 29 Tank 30 Barrel

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 めっきの前処理段階、めっき処理段階お
よびめっきの後処理段階のすべての処理段階における少
なくともその一工程で振動撹拌を行うめっき方法であっ
て、前記振動撹拌が15〜60Hzの振動モーターの発
生する振動を与えられた振動棒に結合した多段で、かつ
傾斜角度を有する振動羽根により発生されたものである
ことを特徴とするめっき方法。
1. A plating method in which vibration stirring is performed in at least one of all of a pretreatment step, a plating treatment step, and a post-treatment step of plating, wherein the vibration stirring is performed at a frequency of 15 to 60 Hz. A plating method characterized in that the plating is generated by a multi-stage vibrating blade having an inclined angle coupled to a vibrating rod provided with vibration generated by a motor.
【請求項2】 前記傾斜角度が10〜20°である請求
項1記載のめっき方法。
2. The plating method according to claim 1, wherein the inclination angle is 10 to 20 °.
【請求項3】 めっきの前処理段階における煮沸脱脂工
程、水洗工程;めっき処理段階におけるめっき工程;め
っきの後処理段階における水洗工程、酸中和工程、水洗
工程の各工程において前記振動撹拌を行う請求項1また
は2記載のめっき方法。
3. The vibration stirring is performed in each step of a boiling degreasing step, a washing step in a plating pretreatment step, a plating step in a plating step, a washing step, an acid neutralizing step, and a washing step in a plating post-treatment step. The plating method according to claim 1.
【請求項4】 前記めっきの前処理工程が有機溶剤によ
る脱脂工程を使用しないものである請求項1、2または
3記載のめっき方法。
4. The plating method according to claim 1, wherein the pretreatment step of plating does not use a degreasing step using an organic solvent.
【請求項5】 めっき対象物がバレルに充填された複数
の物品である請求項1、2、3または4記載のめっき方
法。
5. The plating method according to claim 1, wherein the object to be plated is a plurality of articles filled in a barrel.
JP4361185A 1992-12-28 1992-12-28 Plating method Expired - Lifetime JP2707530B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4361185A JP2707530B2 (en) 1992-12-28 1992-12-28 Plating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4361185A JP2707530B2 (en) 1992-12-28 1992-12-28 Plating method

Publications (2)

Publication Number Publication Date
JPH06220697A JPH06220697A (en) 1994-08-09
JP2707530B2 true JP2707530B2 (en) 1998-01-28

Family

ID=18472543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4361185A Expired - Lifetime JP2707530B2 (en) 1992-12-28 1992-12-28 Plating method

Country Status (1)

Country Link
JP (1) JP2707530B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010023997A1 (en) 2008-09-01 2010-03-04 日本テクノ株式会社 Liquid material comprising hydrogen and oxygen, regasified gas comprising hydrogen and oxygen produced from the liquid material, process and apparatus for producing the liquid material and regasified gas, and fuel that does not evolve carbon dioxide and comprises the liquid material and regasified gas

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2911350B2 (en) * 1993-11-02 1999-06-23 日本テクノ株式会社 Surface treatment method and surface treatment device used therefor
JP3098966B2 (en) * 1995-12-12 2000-10-16 日本ペイント株式会社 Phosphate conversion treatment method for metal moldings
JP3046594B1 (en) 1999-04-02 2000-05-29 日本テクノ株式会社 Anodizing system for metals utilizing vibrating flow agitation
US7459071B2 (en) 2001-05-02 2008-12-02 Japan Techno Co., Ltd. Hydrogen-oxygen gas generator and method of generating hydrogen-oxygen gas using the generator
WO2003000395A1 (en) 2001-06-25 2003-01-03 Japan Techno Co., Ltd. Vibratingly stirring apparatus, and device and method for processing using the stirring apparatus
US7964104B2 (en) 2003-05-02 2011-06-21 Japan Techno Co., Ltd. Active antiseptic water or active water-based fluid, and production method and apparatus for the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5767192A (en) * 1980-10-11 1982-04-23 C Uyemura & Co Ltd High-speed plating method
JPS59185873A (en) * 1983-04-05 1984-10-22 Nec Corp Ignition system
JPH0671544B2 (en) * 1990-03-26 1994-09-14 日本テクノ株式会社 Method and apparatus for stirring liquid in liquid tank
JPH03294497A (en) * 1990-04-12 1991-12-25 C Uyemura & Co Ltd Surface treatment in small hole

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010023997A1 (en) 2008-09-01 2010-03-04 日本テクノ株式会社 Liquid material comprising hydrogen and oxygen, regasified gas comprising hydrogen and oxygen produced from the liquid material, process and apparatus for producing the liquid material and regasified gas, and fuel that does not evolve carbon dioxide and comprises the liquid material and regasified gas

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