JP2672491B2 - Shadow mask - Google Patents

Shadow mask

Info

Publication number
JP2672491B2
JP2672491B2 JP59158622A JP15862284A JP2672491B2 JP 2672491 B2 JP2672491 B2 JP 2672491B2 JP 59158622 A JP59158622 A JP 59158622A JP 15862284 A JP15862284 A JP 15862284A JP 2672491 B2 JP2672491 B2 JP 2672491B2
Authority
JP
Japan
Prior art keywords
shadow mask
plate material
oxide layer
iron
nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59158622A
Other languages
Japanese (ja)
Other versions
JPS6139345A (en
Inventor
普三 菅井
孝 久世
二三男 盛
典章 八木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP59158622A priority Critical patent/JP2672491B2/en
Publication of JPS6139345A publication Critical patent/JPS6139345A/en
Application granted granted Critical
Publication of JP2672491B2 publication Critical patent/JP2672491B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/14Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)

Description

【発明の詳細な説明】 [発明の技術分野] 本発明はシャドウマスクに関し、更に詳しくは、高精
度・高精細のシャドウマスクに関する。 [発明の技術的背景とその問題点] カラー受像管蛍光面の直前には、所定の設計基準に基
づいて穿設された多数の開口(ドット状,すだれ状)を
有するシャドウマスクが配設されている。 このシャドウマスクの材料としては、通常、厚み約0.
15mmの薄い軟鋼板が採用される。最近では、低熱膨張特
性を備えた鉄−ニッケル系合金であるインバ合金(Inva
r)が採用され始めている。 このシャドウマスクの板材は次のように製造されてい
る。 まず、素材を溶解・鍛造し、その後熱間圧延を施し板
材とし、次にあらさ80メッシュ程度の機械研削(バフ研
磨,ベルト研削,スカルピング等)で板材の表面に生成
した酸化物をおとし、その後冷間圧延と焼鈍とを繰り返
し、最終に仕上げ圧延を施してシャドウマスク用板材が
製造される。 次にこの板材を用いてシャドウマスクは、次のように
製造されている。 まず、この板材を洗浄し、フォトレジストを塗り露光
した後、塩化第二鉄でエッチングすることにより開孔を
形成する。 その後、全体にプレス加工を施して所定の曲率半径の
湾曲面を形成し、最後にスチームで酸化して熱輻射能の
向上・反乱射防止のためにその表面全体を黒化する。 しかしながら、上記のようにして製造されたシャドウ
マスクは、エッチングの際、幅0.5〜5mm程度のスジ状の
ムラが発生することがあった。本発明者らは、このスジ
ムラを研究したところ、このスジムラは、シャドウマス
クの開孔速度がスジ状の部分と、そうでない部分とで異
なり、その結果、光の透過率が異なることにより、スジ
状のムラとして見えるものであることをつきとめた。 [発明の目的] 本発明は、スジムラのないシャドウマスクを提供する
ことを目的とする。 [発明の概要] 本発明者らは、シャドウマスクを鋭意研究した結果、
のスジムラは、板材の圧延方向に発生し、更に板材の製
造工程中、主に酸化物を板材表面から除去する仕方に依
存して発生することを見い出した。 本発明は、この知見をもとに完成されたものである。 即ち、本発明のシャドウマスクは、熱間圧延後、仕上
げ圧延前に表面酸化層が均一かつ残存することなく除去
された、鉄−ニッケル系合金または鉄−ニッケル−コバ
ルト系合金からなることを特徴とするものである。 即ち、熱間圧延後、仕上げ圧延前の酸化層除去は、板
材に対して連続的にバフ研磨,ベルト研削,スカルピン
グ等の機械研削で行なわれているが、例えば、表面酸化
層が均一に除去されていないと、その跡はスジ状にのこ
る。しかし、その後工程の冷間圧延で表面は平滑になる
が、この板材を用いてシャドウマスクを製造すると、板
材の表面には、スジ状のエッチングしやすい所と、エッ
チングしにくい所とが残っている為、エッチング工程で
スジムラが現われてくる。 なお、表面酸化層を除去する際に、表面酸化層を残存
することなく完全に除去することが必要である。これは
均一除去の際に表面酸化層が残存すると、後のエッチン
グ工程においてスジムラが発生しやすくなるためであ
る。 したがって、表面酸化層を均一かつ残存することなく
除去することにより、このスジムラは防止できる。 この防止方法としては、圧延方向に依存しない研磨方
法であれば良く、例えば、化学的研磨方法及びサンドブ
ラスト法等がある。 即ち、酸等の液体あるいは固体粉末を吹きつける方法
を用いることにより、表面酸化層を均一かつ残存するこ
となく除去できる。又、圧延方向に依存する機械研削を
用いる場合でも、複数回に分け、順次あらさを変えて処
理を行なうことにより、表面酸化層を均一かつ残存する
ことなく除去できる。 具体的には、まず熱間圧延後、60〜100メッシュ程度
のあらさの第1の機械研削を行ない、次に150〜300メッ
シュ程度のあらさの第2の機械研削を行なうと良い。
又、第2の機械研削としては、冷間圧延と焼鈍とを繰り
返す工程中に行なわれるのが望ましい。 以上述べた機械研削方法としては、ベルト研削,バフ
研磨,スカルピング等が工業的に使用しやすい。 次にシャドウマスクの素材としては、インバ合金(36
Ni−Fe合金),Ni−Fe−Co系合金等があるが、このう
ち、インバ合金,Ni−Fe−Co系合金は、そのエッチング
速度が軟鋼板に比べて著しく小さく、特にスジムラが発
生しやすい為、本発明は有効である。 [発明の実施例] ピッチ0.38mmの円状開孔を有する14インチ用の鉄−ニ
ッケル系合金または鉄−ニッケル−コバルト系合金から
なるシャドウマスクを第1表に示すように製造し、そこ
にスジムラが発生するかどうかを観察した。 この表から明らかな如く、本発明の実施例のシャドウ
マスクは、スジムラが少なく、良好にシャドウマスクと
いうことができる。 [発明の効果] 以上述べた如く、本発明は、熱間圧延後、仕上げ圧延
前に表面酸化層が均一かつ残存することなく除去された
ことにより、スジムラの少ない良好な鉄−ニッケル系合
金または鉄−ニッケル−コバルト系合金からなるシャド
ウマスクを提供できる。
Description: TECHNICAL FIELD The present invention relates to a shadow mask, and more particularly, to a high-precision and high-definition shadow mask. [Technical Background of the Invention and Problems Thereof] A shadow mask having a large number of apertures (dots, blinds) formed on the basis of a predetermined design standard is arranged immediately in front of a fluorescent screen of a color picture tube. ing. As a material for this shadow mask, usually, the thickness is about 0.
15mm thin mild steel plate is adopted. Recently, Inva alloy (Inva alloy), which is an iron-nickel alloy with low thermal expansion characteristics, has been developed.
r) is starting to be adopted. The plate material of this shadow mask is manufactured as follows. First, the material is melted and forged, then hot rolled to make a plate material, and then the oxide generated on the surface of the plate material by mechanical grinding (buffing, belt grinding, scalping, etc.) with a roughness of about 80 mesh is removed, and then Cold rolling and annealing are repeated, and finally, final rolling is performed to manufacture a shadow mask plate material. Next, a shadow mask is manufactured using this plate material as follows. First, this plate material is washed, a photoresist is applied and exposed, and then an opening is formed by etching with ferric chloride. Then, the whole surface is subjected to press working to form a curved surface having a predetermined radius of curvature, and finally it is oxidized by steam to blacken the entire surface for improving heat radiation ability and preventing reverberation. However, the shadow mask manufactured as described above may have streaky unevenness with a width of about 0.5 to 5 mm during etching. The present inventors have studied this uneven streaks and found that the uneven streaks are caused by the difference in the opening speed of the shadow mask between the streak-shaped portion and the non-streaked portion, resulting in different light transmittance. I found that it looks like unevenness. [Object of the Invention] An object of the present invention is to provide a shadow mask free of uneven streaks. [Summary of the Invention] The present inventors have conducted extensive research on shadow masks,
It was found that the uneven streaks are generated in the rolling direction of the plate material, and further mainly during the manufacturing process of the plate material depending on the method of removing oxides from the surface of the plate material. The present invention has been completed based on this finding. That is, the shadow mask of the present invention is composed of an iron-nickel-based alloy or an iron-nickel-cobalt-based alloy that is removed after hot rolling and before finish rolling without uniformly and without remaining a surface oxide layer. It is what That is, after hot rolling and before finish rolling, the oxide layer is removed by mechanical grinding such as buffing, belt grinding, and scalping continuously on the plate material. For example, the surface oxide layer is uniformly removed. If not done, the trace will appear like a streak. However, the surface is smoothed by cold rolling in the subsequent process, but when a shadow mask is manufactured using this plate material, streak-like easy etching spots and hard-to-etch rest areas remain on the surface of the plate material. As a result, uneven streaks appear in the etching process. In addition, when removing the surface oxide layer, it is necessary to completely remove the surface oxide layer without remaining. This is because if a surface oxide layer remains during uniform removal, streaks are likely to occur in a subsequent etching step. Therefore, this uneven streaks can be prevented by removing the surface oxide layer uniformly and without remaining. As a method for preventing this, any polishing method that does not depend on the rolling direction may be used, and examples thereof include a chemical polishing method and a sandblast method. That is, by using a method of spraying a liquid such as an acid or a solid powder, the surface oxide layer can be removed uniformly and without remaining. Further, even when mechanical grinding depending on the rolling direction is used, the surface oxide layer can be removed uniformly and without remaining by performing the processing in a plurality of times and sequentially changing the roughness. Specifically, it is preferable that first, after hot rolling, first mechanical grinding with a roughness of about 60 to 100 mesh is performed, and then second mechanical grinding with a roughness of about 150 to 300 mesh is performed.
The second mechanical grinding is preferably performed during the process of repeating cold rolling and annealing. As the mechanical grinding method described above, belt grinding, buffing, scalping, etc. are industrially easy to use. Next, the material for the shadow mask is Invar alloy (36
Ni-Fe alloys), Ni-Fe-Co alloys, etc., but among them, Invar alloys and Ni-Fe-Co alloys have a significantly lower etching rate than mild steel sheets, and in particular streaks occur. The present invention is effective because it is easy. [Examples of the Invention] A shadow mask made of an iron-nickel alloy or an iron-nickel-cobalt alloy for 14 inches having circular holes with a pitch of 0.38 mm was manufactured as shown in Table 1, and was formed therein. It was observed whether streaks occur. As is clear from this table, the shadow mask of the example of the present invention has less streaking and can be said to be a good shadow mask. [Effects of the Invention] As described above, the present invention provides a good iron-nickel-based alloy having less streaks by removing the surface oxide layer uniformly and without remaining after hot rolling and before finish rolling. A shadow mask made of an iron-nickel-cobalt-based alloy can be provided.

フロントページの続き (72)発明者 盛 二三男 横浜市磯子区新杉田町8 株式会社東芝 横浜金属工場内 (72)発明者 八木 典章 横浜市磯子区新杉田町8 株式会社東芝 横浜金属工場内 (56)参考文献 特開 昭57−92178(JP,A) 特開 昭55−62123(JP,A) 特開 昭58−204129(JP,A)Continuation of front page    (72) Inventor Fumio Mori               8 Shinsita-cho, Isogo-ku, Yokohama-shi Toshiba Corporation               Inside Yokohama Metal Factory (72) Inventor Noriaki Yagi               8 Shinsita-cho, Isogo-ku, Yokohama-shi Toshiba Corporation               Inside Yokohama Metal Factory                (56) Reference JP-A-57-92178 (JP, A)                 JP-A-55-62123 (JP, A)                 JP-A-58-204129 (JP, A)

Claims (1)

(57)【特許請求の範囲】 1.熱間圧延後、仕上げ圧延前に表面酸化層が均一かつ
残存することなく除去された、鉄−ニッケル系合金また
は鉄−ニッケル−コバルト系合金からなることを特徴と
するシャドウマスク。
(57) [Claims] A shadow mask comprising an iron-nickel-based alloy or an iron-nickel-cobalt-based alloy in which a surface oxide layer has been removed uniformly and without remaining after hot rolling and before finish rolling.
JP59158622A 1984-07-31 1984-07-31 Shadow mask Expired - Lifetime JP2672491B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59158622A JP2672491B2 (en) 1984-07-31 1984-07-31 Shadow mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59158622A JP2672491B2 (en) 1984-07-31 1984-07-31 Shadow mask

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP9149915A Division JP3049388B2 (en) 1997-05-26 1997-05-26 Method of manufacturing material for shadow mask

Publications (2)

Publication Number Publication Date
JPS6139345A JPS6139345A (en) 1986-02-25
JP2672491B2 true JP2672491B2 (en) 1997-11-05

Family

ID=15675729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59158622A Expired - Lifetime JP2672491B2 (en) 1984-07-31 1984-07-31 Shadow mask

Country Status (1)

Country Link
JP (1) JP2672491B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0738297B2 (en) * 1986-06-02 1995-04-26 株式会社東芝 Amber alloy original plate for shed mask
JPH0738296B2 (en) * 1986-06-02 1995-04-26 株式会社東芝 Amber alloy original plate for shed mask
US4929864A (en) * 1987-12-02 1990-05-29 Zenith Electronics Corporation NI-based FTM shadow masks having a nickel phosphide black layer
FR2664226B2 (en) * 1990-04-05 1992-09-25 Mesnel Sa Ets PROCESS AND DEVICE FOR THE PLACEMENT OF A U-SECTION PROFILE ON AN AUTOMOBILE BODYWORK OR THE LIKE.
JPH071675B2 (en) * 1990-08-22 1995-01-11 大日本スクリーン製造株式会社 Shadow mask manufacturing method and shadow mask plate material

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5792178A (en) * 1980-11-28 1982-06-08 Dainippon Screen Mfg Co Ltd Pretreatment of mild steel plate

Also Published As

Publication number Publication date
JPS6139345A (en) 1986-02-25

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