JP2660943B2 - Circuit board bonding method - Google Patents

Circuit board bonding method

Info

Publication number
JP2660943B2
JP2660943B2 JP35539891A JP35539891A JP2660943B2 JP 2660943 B2 JP2660943 B2 JP 2660943B2 JP 35539891 A JP35539891 A JP 35539891A JP 35539891 A JP35539891 A JP 35539891A JP 2660943 B2 JP2660943 B2 JP 2660943B2
Authority
JP
Japan
Prior art keywords
electrode
circuit board
photosensitive adhesive
electrodes
adhesive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP35539891A
Other languages
Japanese (ja)
Other versions
JPH05152737A (en
Inventor
栄一 小川
博司 駒野
俊身 青山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO OKA KOGYO KK
NEC Corp
Original Assignee
TOKYO OKA KOGYO KK
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO OKA KOGYO KK, Nippon Electric Co Ltd filed Critical TOKYO OKA KOGYO KK
Priority to JP35539891A priority Critical patent/JP2660943B2/en
Priority to US07/978,720 priority patent/US5318651A/en
Priority to EP92120208A priority patent/EP0544294B1/en
Priority to SG1996004470A priority patent/SG44626A1/en
Priority to DE69208601T priority patent/DE69208601T2/en
Publication of JPH05152737A publication Critical patent/JPH05152737A/en
Priority to US08/217,973 priority patent/US5545281A/en
Application granted granted Critical
Publication of JP2660943B2 publication Critical patent/JP2660943B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は回路基板の接着方法に関
し、特に加熱処理により接着性を示す感光性接着剤を用
いることにより、微細なパターン電極同士を確実に接続
することができる回路基板の接着方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for bonding circuit boards, and more particularly, to a method for bonding fine pattern electrodes to each other by using a photosensitive adhesive exhibiting adhesiveness by heat treatment. Related to the bonding method.

【0002】[0002]

【従来の技術】回路基板同士を接続して成る回路基板
は、従来各回路基板の電極をハンダ付けすることによっ
て製造されている。この方法はハンダを加熱溶融して電
極同士を接続するために、回路板の電極間ピッチが微細
な場合には電極間に短絡が生じやすいという問題があ
り、ハンダ付けという高温処理による回路基板への熱的
な問題を回避するため、最近では異方導電性接着剤を用
いて回路板同士を接着する方法が用いられている。
2. Description of the Related Art Circuit boards formed by connecting circuit boards are conventionally manufactured by soldering electrodes of each circuit board. Since this method heats and melts the solder to connect the electrodes, if the pitch between the electrodes on the circuit board is very small, there is a problem that short-circuiting easily occurs between the electrodes. In order to avoid the above-mentioned thermal problem, a method of bonding circuit boards to each other using an anisotropic conductive adhesive has recently been used.

【0003】異方導電性接着剤は接着剤中に導電性粒子
を分散させ、加圧することで導電性粒子が凝集固着し、
その厚み方向に対してのみ導電性を示し、それ以外の方
向に対しては非導電性を示す。この異方導電性を利用し
て、接着したい電極の表面にこの異方導電性接着剤層を
形成し電極間に介在した異方導電性接着剤層をその厚み
方向に加圧して導電性粒子によって両電極間の電気的接
続が行われる。
The anisotropic conductive adhesive disperses conductive particles in the adhesive and presses the conductive particles to coagulate and fix.
It shows conductivity only in its thickness direction, and shows non-conductivity in other directions. Utilizing this anisotropic conductivity, this anisotropic conductive adhesive layer is formed on the surface of the electrode to be bonded, and the anisotropic conductive adhesive layer interposed between the electrodes is pressed in the thickness direction to form the conductive particles. The electrical connection between the two electrodes is established.

【0004】しかしながら、異方導電性接着剤を用いる
方法では、接続する電極間のピッチが150μm以上の
広い場合は良好に相互に接続することができるが、これ
以下の微細な電極間のピッチを有する場合には、接着剤
に分散した導電性粒子のため導電可能な状態が生じ、短
絡の原因となる。
However, in the method using an anisotropic conductive adhesive, when the pitch between the electrodes to be connected is as wide as 150 μm or more, the interconnections can be well connected to each other. In the case of having the conductive particles, a conductive state occurs due to the conductive particles dispersed in the adhesive, which causes a short circuit.

【0005】また、電極の微細化に対応するため回路板
上へ光硬化性接着剤を塗布し、電極部分以外を光硬化さ
せることで電極上のみに粘着性を残し、ここへ導電性粒
子を付着させたのち、その上に光硬化性接着剤を塗布
し、回路板を重ね合せて加圧しながら光照射することに
よって回路板を接着させる方法も知られている(特開平
3−131089号公報)。しかしながら、この方法に
おいても近年の微細化には十分に対応できず、特に電極
間のピッチが50μm以下になると短絡しやすく実用的
な方法ではなく、電極間の微細化にも十分に対応できる
回路基板の接着方法の開発が強く要望されている。
Further, in order to cope with the miniaturization of electrodes, a photocurable adhesive is applied onto a circuit board, and photocuring is performed on portions other than the electrode portions, thereby leaving adhesiveness only on the electrodes, and allowing the conductive particles to move there. There is also known a method in which a photocurable adhesive is applied thereon, and the circuit boards are bonded by superimposing the circuit boards and irradiating the circuit boards with light while applying pressure (Japanese Unexamined Patent Publication (Kokai) No. 3-131089). ). However, even this method cannot sufficiently cope with recent miniaturization. In particular, when the pitch between electrodes is 50 μm or less, a short circuit is likely to occur, which is not a practical method, and a circuit that can sufficiently cope with miniaturization between electrodes. There is a strong demand for the development of a method for bonding substrates.

【0006】[0006]

【発明が解決しようとする課題】本発明者らは、上記要
望に鑑み、微細な電極間ピッチを有する回路板の有効な
接着方法を開発すべく鋭意研究を重ねた結果、加熱処理
により接着性を示す感光性接着剤を回路板同士の接続、
特に回路板の電極間の接着に適用することにより前記目
的が達成されることを見いだし、本発明をなすに至っ
た。
SUMMARY OF THE INVENTION In view of the above demand, the present inventors have conducted intensive studies to develop an effective method for bonding circuit boards having a fine pitch between electrodes. A photosensitive adhesive indicating the connection between circuit boards,
In particular, the present inventors have found that the object can be achieved by applying the present invention to bonding between electrodes of a circuit board, and have accomplished the present invention.

【0007】[0007]

【課題を解決するための手段】本発明は、第1電極が形
成された第1回路板と前記第1電極に対応する位置に第
2電極が形成された第2回路板とを重ねて前記第1電極
と前記第2電極とを接続する回路基板の接着方法におい
て、第1回路板の第1電極上および前記第1電極が形成
されていない部分上に感光性接着剤を塗布、乾燥して感
光性接着剤層を形成する工程、該感光性接着剤層に活性
光線を選択的に照射したのち、現像処理を施すことによ
り、前記第1電極上の該感光性接着剤層のみを除去し、
次いで加熱処理を行い、前記第1電極の間に残余した該
感光性接着剤層に接着性を付与する工程、前記第1回路
板と第2回路板とを重ね合わせ、加熱圧着し、前記第1
電極と第2電極とを電気的に接続する工程及び前記第1
電極と前記第2電極とが接続された前記第1回路板と前
記第2回路板からなる回路基板に加熱処理および/また
は活性光線の照射処理を施す工程、を含むことを特徴と
する回路基板の接着方法である。
According to the present invention, a first circuit board having a first electrode formed thereon is overlapped with a second circuit board having a second electrode formed at a position corresponding to the first electrode. In a method of bonding a circuit board for connecting a first electrode and the second electrode, a photosensitive adhesive is applied on the first electrode of the first circuit board and on a portion where the first electrode is not formed, and dried. Forming a photosensitive adhesive layer by irradiating the photosensitive adhesive layer with actinic rays selectively, and then performing a development process to remove only the photosensitive adhesive layer on the first electrode. And
Next, a heating process is performed to impart adhesiveness to the photosensitive adhesive layer remaining between the first electrodes, the first circuit board and the second circuit board are overlapped, and heat-pressed, 1
Electrically connecting the electrode and the second electrode;
Applying a heat treatment and / or an actinic ray irradiation treatment to a circuit board composed of the first circuit board and the second circuit board to which an electrode and the second electrode are connected. Is a bonding method.

【0008】以下、本発明を詳細に説明する。本発明の
回路基板の接着方法は第1図にみるように半導体基板、
プリント基板、ガラス基板、セラミック基板などの絶縁
基板1の上にITO(インジウム、酸化スズ)、Ti、
Ta、Mo、Ni、Al、Cu、Au、Sn、Pbなど
の導電体またはこれらの合金からなる第1電極2が形成
された第1回路板上に、第2図のごとく感光性接着剤を
第1電極2上および第1電極2が形成されていない部分
上にロールコーター、カーテンフローコーター、スクリ
ーン印刷、スプレーコーター、スピンコーターなどによ
り塗布し、乾燥して感光性接着剤層3を形成したのち、
第3図に示すように第1電極2に対応する部分が遮光さ
れたマスク4を介して選択的に紫外線等の活性光線を照
射し又はガラス基板など透明な基板を用いた場合には基
板裏面から活性光線を照射し、第4図のごとく未照射部
分を現像液を用いて除去することで第1電極2の間にの
み感光性接着剤層3′を残余させたのち加熱処理を施す
ことにより感光性接着剤層3に接着性を付与させ、次い
で第5図に示すように半導体基板、プリント基板、ガラ
ス基板、セラミック基板などの絶縁基板5にTi、T
a、Mo、Ni、Alなどの導電体またはこれらの合金
からなる第1電極2に対応した第2電極6が形成された
第2回路板を重ね合わせ、加熱圧着させることにより第
1電極2と第2電極6を接続させたのち、全体を加熱処
理および/または紫外線等の活性光線の照射処理をし、
第1回路板と第2回路板とを感光性接着剤により完全接
着させることで接着性に優れ、かつ微細な電極間を有す
る回路板においても短絡などの問題点のない回路基板の
接着ができる。
Hereinafter, the present invention will be described in detail. As shown in FIG. 1, the method for bonding a circuit board according to the present invention comprises the steps of:
On an insulating substrate 1 such as a printed circuit board, a glass substrate, a ceramic substrate, etc., ITO (indium, tin oxide), Ti,
As shown in FIG. 2, a photosensitive adhesive is applied on a first circuit board on which a first electrode 2 made of a conductor such as Ta, Mo, Ni, Al, Cu, Au, Sn, or Pb or an alloy thereof is formed. The photosensitive adhesive layer 3 was formed by applying a roll coater, a curtain flow coater, a screen printing, a spray coater, a spin coater, or the like on the first electrode 2 and a portion where the first electrode 2 was not formed, and then drying. Later
As shown in FIG. 3, a portion corresponding to the first electrode 2 is selectively irradiated with actinic rays such as ultraviolet rays through a mask 4 in which light is shielded, or when a transparent substrate such as a glass substrate is used, the back surface of the substrate is used. Irradiating with actinic light from above, and removing the unirradiated portion using a developing solution as shown in FIG. 4 so that the photosensitive adhesive layer 3 ′ is left only between the first electrodes 2 and then subjected to heat treatment. To give the photosensitive adhesive layer 3 an adhesive property, and then, as shown in FIG. 5, Ti, T
The second circuit board on which the second electrode 6 corresponding to the first electrode 2 made of a conductor such as a, Mo, Ni, or Al, or an alloy thereof is formed, and the first circuit board 2 is bonded to the first circuit board 2 by heating and pressing. After the second electrode 6 is connected, the whole is subjected to heat treatment and / or irradiation treatment with actinic rays such as ultraviolet rays,
By completely bonding the first circuit board and the second circuit board with a photosensitive adhesive, it is possible to bond a circuit board which is excellent in adhesiveness and free from problems such as a short circuit even in a circuit board having fine electrodes. .

【0009】上記した本発明の接着方法において用いら
れる感光性接着剤としては、紫外線等の活性光線の照射
により硬化し、その硬化物が加熱処理により接着性を示
すものであればよく、具体的にはクレゾールノボラック
型エポキシ樹脂、フェノールノボラック型エポキシ樹
脂、グリシジルアミン型エポキシ樹脂、ビフエニル型エ
ポキシ樹脂及びそれらの臭素付加物から選ばれる少なく
とも1種と不飽和塩基酸とを反応させて得られるエステ
ル化樹脂と光重合開始剤とを含有するものが使用でき、
特にクレゾールノボラック型エポキシ樹脂とフェノール
ノボラック型エポキシ樹脂から選ばれる少なくとも1種
と不飽和塩基酸との反応で得られるエステル化樹脂と光
重合開始剤とを含有するものが好ましく使用することが
できる。この場合クレゾールノボラック型エポキシ樹脂
はクレゾールとホルムアルデヒドから得られるクレゾー
ルノボラック樹脂にエピクロルヒドリンもしくはメチル
エピクロルヒドリンを反応させて得られ、また同様にし
てフェノールノボラック型エポキシ樹脂もフェノールと
ホルムアルデヒドから得たフェノールノボラック樹脂に
エピクロルヒドリンもしくはメチルエピクロルヒドリン
を反応させて得ることができる。
The photosensitive adhesive used in the above-described bonding method of the present invention may be any as long as it is cured by irradiation with actinic rays such as ultraviolet rays and the cured product shows adhesiveness by heat treatment. Is esterification obtained by reacting at least one selected from cresol novolak type epoxy resin, phenol novolak type epoxy resin, glycidylamine type epoxy resin, biphenyl type epoxy resin and bromine adduct thereof with an unsaturated basic acid. Those containing a resin and a photopolymerization initiator can be used,
In particular, those containing a photopolymerization initiator and an esterified resin obtained by a reaction of at least one selected from a cresol novolak type epoxy resin and a phenol novolak type epoxy resin with an unsaturated basic acid can be preferably used. In this case, the cresol novolak type epoxy resin is obtained by reacting epichlorohydrin or methyl epichlorohydrin with a cresol novolak resin obtained from cresol and formaldehyde. Alternatively, it can be obtained by reacting methyl epichlorohydrin.

【0010】上記クレゾールノボラック型エポキシ樹脂
および/またはフェノールノボラック型エポキシ樹脂と
反応する不飽和塩基酸としては、アクリル酸、メタクリ
ル酸、クロトン酸、マレイン酸モノメチル、マレイン酸
モノプロピル、マレイン酸モノブチル、ソルビン酸など
があり、これらは単独でも2種以上組み合わせて用いて
もよい。
The unsaturated basic acid which reacts with the cresol novolak type epoxy resin and / or phenol novolak type epoxy resin includes acrylic acid, methacrylic acid, crotonic acid, monomethyl maleate, monopropyl maleate, monobutyl maleate, sorbin There are acids and the like, which may be used alone or in combination of two or more.

【0011】上記エポキシ樹脂と不飽和塩基酸との反応
に用いるエステル化触媒としては、ジエチルアミン塩酸
塩、ジエチルアミン酢酸塩、トリエチルアミンなどの2
級、3級アミン類が使用できる。
The esterification catalyst used in the reaction between the epoxy resin and the unsaturated basic acid includes diethylamine hydrochloride, diethylamine acetate, triethylamine and the like.
Primary and tertiary amines can be used.

【0012】また光重合開始剤としては、例えばベンゾ
フェノン、4,4′−ジメチルアミノベンゾフェノン、
4,4′−ジエチルアミノベンゾフェノンなどのベンゾ
フェノン類、2−エチルアントラキノン、tert−ブ
チルアントラキノンなどのアントラキノン類、ベンゾイ
ンエチルエーテル、ベンゾインイソプロピルエーテルな
どのベンゾインアルキルエーテル類、2,2−ジメトキ
シ−2−フェニルアセトフェノン、2,2−ジエトキシ
アセトフェノン、2−クロロチオキサントン、ジエチル
チオキサントン、2−ヒドロキシ−2−メチルプロピオ
フェノン、4′−イソプロピル−2−ヒドロキシ−2−
メチルプロピオフェノンなどがあり、これらのうちの1
種または2種以上を前記エステル化樹脂に対し2〜10
重量%の範囲で配合するのが好ましい。
Examples of the photopolymerization initiator include benzophenone, 4,4'-dimethylaminobenzophenone,
Benzophenones such as 4,4'-diethylaminobenzophenone, anthraquinones such as 2-ethylanthraquinone and tert-butylanthraquinone, benzoin alkyl ethers such as benzoin ethyl ether and benzoin isopropyl ether, and 2,2-dimethoxy-2-phenylacetophenone 2,2-diethoxyacetophenone, 2-chlorothioxanthone, diethylthioxanthone, 2-hydroxy-2-methylpropiophenone, 4'-isopropyl-2-hydroxy-2-
And methylpropiophenone, one of these.
2 to 10 or more kinds of the esterified resin
It is preferable to mix in the range of weight%.

【0013】上記の感光性接着剤は、紫外線等の活性光
線により硬化し、その硬化物は加熱処理を施すことで、
接着性を示さなくてはならないが、この場合の加熱処理
温度としては50〜100℃、好ましくは65〜90℃
の範囲である。この温度が50℃未満では良好な接着性
を与えることができないため好ましくなく、逆に100
℃を超えると良好な形状のパターンを得ることができず
好ましくない。
The above-mentioned photosensitive adhesive is cured by actinic rays such as ultraviolet rays, and the cured product is subjected to heat treatment.
Although it must show adhesiveness, the heat treatment temperature in this case is 50 to 100 ° C., preferably 65 to 90 ° C.
Range. If the temperature is lower than 50 ° C., it is not preferable because good adhesiveness cannot be provided.
When the temperature exceeds ℃, a pattern having a good shape cannot be obtained, which is not preferable.

【0014】また、本発明の接着方法で用いられる上記
の感光性接着剤は有機溶媒に溶解させた塗布液の形で用
いるのが実用的であり、このような有機溶媒としては、
エチレングリコールモノエチルエーテル、エチレングリ
コールモノエチルエーテルアセテート、エチレングリコ
ールモノブチルエーテル、エチレングリコールモノブチ
ルエーテルアセテート、プロピレングリコールモノメチ
ルエーテル、プロピレングリコールモノメチルエーテル
アセテート、メチルエチルケトン、メチルイソブチルケ
トン、1,1,1−トリクロロエタン、トリクロロエチ
レンなどの1種または2種以上を混合して用いることが
できる。
The above-mentioned photosensitive adhesive used in the bonding method of the present invention is practically used in the form of a coating solution dissolved in an organic solvent.
Ethylene glycol monoethyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, methyl ethyl ketone, methyl isobutyl ketone, 1,1,1-trichloroethane, trichloroethylene Or a mixture of two or more.

【0015】また、上記の感光性接着剤は、紫外線等の
活性光線を選択的に照射したのち、活性光線の未照射部
分を現像処理により除去するが、この現像処理に用いる
現像液としては、炭酸ナトリウムや水酸化ナトリウムな
どの無機アルカリ水溶液、第4級アンモニウム塩やアミ
ン類などの有機アルカリ水溶液またはトリクロロエタ
ン、酢酸ブチル、キシレン、エチレングリコールモノブ
チルエーテルアセテートなどの有機溶剤が挙げられる。
The above photosensitive adhesive is selectively irradiated with actinic rays such as ultraviolet rays, and then the unirradiated portions of the actinic rays are removed by a developing treatment. Examples thereof include aqueous inorganic alkali solutions such as sodium carbonate and sodium hydroxide, aqueous organic alkali solutions such as quaternary ammonium salts and amines, and organic solvents such as trichloroethane, butyl acetate, xylene, and ethylene glycol monobutyl ether acetate.

【0016】また、上記の感光性接着剤には必要に応じ
て相容性のある樹脂、染料、顔料などの着色剤、界面活
性剤などを添加してもよい。
If necessary, a compatible resin, a coloring agent such as a dye or a pigment, a surfactant, or the like may be added to the photosensitive adhesive.

【0017】本発明の接着方法では、第1回路板と第2
回路板とを重ね合わせ、加熱圧着し、第1電極と第2電
極とを接続させたのち、全体を加熱処理および/または
紫外線等の活性光線による照射処理を施すことで感光性
接着剤層を完全に硬化させ、第1回路板と第2回路板と
を完全接着させるが、この場合の加熱処理としては温度
140〜180℃の範囲で行うのが好ましい。加熱温度
が140℃未満では完全な接着ができないので好ましく
なく、また、180℃を超えると接着性には問題はない
が、基板や電極に悪影響を与えるため好ましくない。
According to the bonding method of the present invention, the first circuit board and the second
After the circuit board is overlaid and heated and pressed to connect the first electrode and the second electrode, the whole is subjected to heat treatment and / or irradiation treatment with actinic rays such as ultraviolet rays to form a photosensitive adhesive layer. The first circuit board and the second circuit board are completely cured, and the heat treatment in this case is preferably performed at a temperature in the range of 140 to 180 ° C. If the heating temperature is lower than 140 ° C., it is not preferable because complete adhesion cannot be achieved, and if it is higher than 180 ° C., there is no problem in the adhesiveness, but it is not preferable because it adversely affects the substrate and the electrodes.

【0018】また、加熱圧着の手段としては、コンスタ
ントヒート方式が有効に用いられる。
As a means for thermocompression bonding, a constant heat method is effectively used.

【0019】本発明の接着方法では第1電極と第2電極
とを接続させる際に、第1電極と第2電極との接続をA
u、Sn、In合金などの導電体を第1電極上または第
2電極上に付着させ、それらの導電体を介して接続させ
てもよい。
In the bonding method of the present invention, when connecting the first electrode and the second electrode, the connection between the first electrode and the second electrode is set to A.
A conductor such as u, Sn, or In alloy may be attached to the first electrode or the second electrode, and connected via those conductors.

【0020】[0020]

【発明の効果】本発明の回路基板の接着方法では、加熱
処理により接着性を示す感光性接着剤を用いることで、
電極間にのみ感光性接着剤を選択的に形成させ、電極同
士を直接接続することができるため、電極間の幅に関係
なく、例えば50μm以下の電極パターンが形成された
回路基板同士の接続も容易に、かつ確実にでき、短絡な
どの問題を解消することができるため、極めて実用的で
ある。
According to the circuit board bonding method of the present invention, by using a photosensitive adhesive exhibiting adhesiveness by heat treatment,
Since the photosensitive adhesive is selectively formed only between the electrodes and the electrodes can be directly connected to each other, the connection between circuit boards having an electrode pattern of, for example, 50 μm or less is also possible regardless of the width between the electrodes. This is extremely practical because it can be easily and reliably performed and problems such as short circuits can be eliminated.

【0021】以下実施例により本発明をより具体的に説
明するが、本発明はこれにより何ら限定されるものでは
ない。
Hereinafter, the present invention will be described more specifically with reference to Examples, but the present invention is not limited thereto.

【0022】[0022]

【実施例1】 テトラヒドロ無水フタル酸を付加した フェノールノボラック型エポキシアクリレート樹脂 7.5g テトラヒドロ無水フタル酸を付加した クレゾールノボラック型エポキシアクリレート樹脂 17.9g クレゾールノボラック型エポキシ樹脂 14.4g (エピクロンN−673大日本インキ化学工業社製) ウレタンオリゴマー 8.3g 2−メチル−[4−(メチルチオ)フェニル]−2−モルフオリノ −1−プロパン 1.8g ジエチルチオキサントン 1.1g プロピレングリコールモノメチルエーテルアセテート 49.0g を混合溶解して感光性接着剤の溶液を調製した。Example 1 Phenol novolak type epoxy acrylate resin to which tetrahydrophthalic anhydride was added 7.5 g Cresol novolak type epoxy acrylate resin to which tetrahydrophthalic anhydride was added 17.9 g Cresol novolak type epoxy resin 14.4 g (Epiclon N-673) Dainippon Ink and Chemicals, Inc.) Urethane oligomer 8.3 g 2-Methyl- [4- (methylthio) phenyl] -2-morpholino-1-propane 1.8 g Diethylthioxanthone 1.1 g 49.0 g of propylene glycol monomethyl ether acetate The mixture was dissolved to prepare a photosensitive adhesive solution.

【0023】次いで40μmの電極間ピッチを有する2
5μm幅で膜厚0.5μmのITO膜パターンが形成さ
れたガラス基板上に、上記感光性接着剤の溶液をスピン
ナーにより塗布し、ホットプレート上で90℃、5分間
乾燥して膜厚10μmの感光性接着剤層を得た。
Next, the second electrode having a pitch between electrodes of 40 μm
A solution of the above photosensitive adhesive was applied on a glass substrate on which an ITO film pattern having a width of 5 μm and a thickness of 0.5 μm was formed by a spinner, dried at 90 ° C. for 5 minutes on a hot plate, and dried to a thickness of 10 μm. A photosensitive adhesive layer was obtained.

【0024】つぎに、ガラス基板上のITO膜パターン
に対応する遮光部を有するマスクを介して、活性光線を
選択的に照射したのち、5重量%トリエタノールアミン
水溶液に25℃で3分間浸漬することで、ITO膜パタ
ーン上の感光性接着剤層だけを選択的に溶解除去した。
Next, after selectively irradiating with an actinic ray through a mask having a light-shielding portion corresponding to the ITO film pattern on the glass substrate, it is immersed in a 5% by weight aqueous solution of triethanolamine at 25 ° C. for 3 minutes. As a result, only the photosensitive adhesive layer on the ITO film pattern was selectively dissolved and removed.

【0025】次いで、ITO膜パターンに対応する形で
Auパターンが形成されたシリコンウエハーを、そのA
uパターンとガラス基板上のITO膜パターンとが接続
するように位置合わせし、ガラス基板とシリコンウエハ
ーとを80℃の加熱温度、2.5kg/cmの圧力で
加熱圧着させた。
Next, a silicon wafer on which an Au pattern was formed in a form corresponding to the ITO
The u pattern and the ITO film pattern on the glass substrate were aligned so as to be connected, and the glass substrate and the silicon wafer were heated and pressed at a heating temperature of 80 ° C. and a pressure of 2.5 kg / cm 2 .

【0026】この後、ガラス基板側から紫外線を3J/
cmの強度で1分間全面照射し、感光性接着剤層を完
全に硬化させ、ガラス基板とシリコンウエハー同士を完
全に接着させることで、電極同士が良好に接続された回
路基板が得られた。
Thereafter, ultraviolet rays were applied at 3 J / from the glass substrate side.
By irradiating the entire surface with an intensity of 1 cm 2 for 1 minute, the photosensitive adhesive layer was completely cured, and the glass substrate and the silicon wafer were completely adhered to each other, whereby a circuit board having well-connected electrodes was obtained. .

【0027】[0027]

【実施例2】実施例1において、感光性接着剤層を完全
に硬化させるため行ったガラス基板側からの紫外線の全
面照射処理に代えて、オーブン中で150℃で30分間
の加熱処理にした以外は実施例1と同様の操作により回
路基板を得た。この回路基板の電極同士も良好に接続さ
れていることが確認された。
Example 2 In Example 1, instead of performing the entire surface irradiation of ultraviolet rays from the glass substrate side for completely curing the photosensitive adhesive layer, a heat treatment at 150 ° C. for 30 minutes was performed in an oven. Except for the above, a circuit board was obtained in the same manner as in Example 1. It was confirmed that the electrodes of this circuit board were also well connected.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の接着方法の工程を示す。FIG. 1 shows the steps of the bonding method of the present invention.

【図2】本発明の接着方法の工程を示す。FIG. 2 shows the steps of the bonding method of the present invention.

【図3】本発明の接着方法の工程を示す。FIG. 3 shows the steps of the bonding method of the present invention.

【図4】本発明の接着方法の工程を示す。FIG. 4 shows the steps of the bonding method of the present invention.

【図5】本発明の接着方法の工程を示す。FIG. 5 shows the steps of the bonding method of the present invention.

【符号の説明】[Explanation of symbols]

1 絶縁基板 2 第1電極 3 感光性接着剤層 3′活性光線照射後の感光性接着剤層 4 マスク 5 絶縁基板 6 第2電極 REFERENCE SIGNS LIST 1 insulating substrate 2 first electrode 3 photosensitive adhesive layer 3 ′ photosensitive adhesive layer after irradiation with active light 4 mask 5 insulating substrate 6 second electrode

フロントページの続き (72)発明者 青山 俊身 神奈川県川崎市中原区中丸子150番地 東京応化工業株式会社内 (56)参考文献 特開 平3−131089(JP,A) 実開 昭62−191176(JP,U)Continuation of the front page (72) Inventor Toshimi Aoyama 150 Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa Prefecture Within Tokyo Ohka Kogyo Co., Ltd. (56) References JP-A-3-131089 (JP, A) Jpn. JP, U)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 第1電極が形成された第1回路板と前記
第1電極に対応する位置に第2電極が形成された第2回
路板とを重ねて前記第1電極と前記第2電極とを接続す
る回路基板の接着方法において、 (イ)第1回路板の第1電極上および前記第1電極が形
成されていない部分上に感光性接着剤を塗布、乾燥して
感光性接着剤層を形成する工程、 (ロ)該感光性接着剤層に活性光線を選択的に照射した
のち、現像処理を施すことにより、前記第1電極上の該
感光性接着剤層のみを除去し、次いで加熱処理を行い、
前記第1電極の間に残余した該感光性接着剤層に接着性
を付与する工程、 (ハ)前記第1回路板と第2回路板とを重ね合わせ、加
熱圧着し、前記第1電極と第2電極とを電気的に接続す
る工程及び (ニ)前記第1電極と前記第2電極とが接続された前記
第1回路板と前記第2回路板からなる回路基板に加熱処
理および/または活性光線の照射処理を施す工程を含む
ことを特徴とする回路基板の接着方法。
1. A first circuit board on which a first electrode is formed and a second circuit board on which a second electrode is formed at a position corresponding to the first electrode, and the first electrode and the second electrode are overlapped. And (b) applying a photosensitive adhesive on the first electrode of the first circuit board and on a portion where the first electrode is not formed, and drying and applying the photosensitive adhesive. Forming a layer; (b) selectively irradiating the photosensitive adhesive layer with actinic rays, and then subjecting the photosensitive adhesive layer to a development treatment to remove only the photosensitive adhesive layer on the first electrode; Next, heat treatment is performed,
(C) superimposing the first circuit board and the second circuit board, and pressing them by heating and pressing, so that the first electrode and the first electrode are bonded to each other. Electrically connecting the second electrode with the second electrode; and (d) heat-treating and / or heating the circuit board including the first circuit board and the second circuit board to which the first electrode and the second electrode are connected. A method for bonding a circuit board, comprising a step of irradiating an actinic ray.
JP35539891A 1991-11-27 1991-11-27 Circuit board bonding method Expired - Lifetime JP2660943B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP35539891A JP2660943B2 (en) 1991-11-27 1991-11-27 Circuit board bonding method
US07/978,720 US5318651A (en) 1991-11-27 1992-11-19 Method of bonding circuit boards
EP92120208A EP0544294B1 (en) 1991-11-27 1992-11-26 Method of bonding circuit boards
SG1996004470A SG44626A1 (en) 1991-11-27 1992-11-26 Method of bonding circuir boards
DE69208601T DE69208601T2 (en) 1991-11-27 1992-11-26 Process for connecting printed circuit boards
US08/217,973 US5545281A (en) 1991-11-27 1994-03-25 Method of bonding circuit boards

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35539891A JP2660943B2 (en) 1991-11-27 1991-11-27 Circuit board bonding method

Publications (2)

Publication Number Publication Date
JPH05152737A JPH05152737A (en) 1993-06-18
JP2660943B2 true JP2660943B2 (en) 1997-10-08

Family

ID=18443711

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35539891A Expired - Lifetime JP2660943B2 (en) 1991-11-27 1991-11-27 Circuit board bonding method

Country Status (1)

Country Link
JP (1) JP2660943B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005052688A2 (en) 2003-11-25 2005-06-09 Tokyo Ohka Kogyo Co., Ltd. Chemically amplified positive photosensitive thermosetting resin composition method of forming cured article and method of producing functional device
JP2008252132A (en) * 2004-09-15 2008-10-16 Seiko Epson Corp Method of mounting semiconductor device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6205955B2 (en) * 2013-07-31 2017-10-04 日立化成株式会社 Manufacturing method of semiconductor device and semiconductor device obtained by the manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005052688A2 (en) 2003-11-25 2005-06-09 Tokyo Ohka Kogyo Co., Ltd. Chemically amplified positive photosensitive thermosetting resin composition method of forming cured article and method of producing functional device
JP2008252132A (en) * 2004-09-15 2008-10-16 Seiko Epson Corp Method of mounting semiconductor device

Also Published As

Publication number Publication date
JPH05152737A (en) 1993-06-18

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