JP2021183130A - Independent control of dual RF electrosurgery - Google Patents

Abstract

To provide a single electrosurgical generator capable of outputting simultaneous RF waveforms and capable of providing independent control of multiple ports.SOLUTION: An electrosurgical generator comprises a first radio frequency source including: a first power supply configured to output a first direct current waveform; a first radio frequency inverter coupled to the first power supply and configured to generate a monopolar radio frequency waveform from the first direct current waveform; and a first controller configured to control the first radio frequency inverter to output the monopolar radio frequency waveform. The generator also comprises a second radio frequency source including: a second power supply configured to output a second direct current waveform; a second radio frequency inverter coupled to the second power supply and configured to generate a bipolar radio frequency waveform simultaneously with the monopolar radio frequency waveform; and a second controller configured to control the second radio frequency inverter to output the bipolar radio frequency waveform.SELECTED DRAWING: Figure 1

Description

Cross-reference to related applications This application is the benefit of US Provisional Patent Applications 63 / 028,049, 63 / 028,009, 63 / 028,012, and 63 / 028,007. And claimed priority, each of which was filed on May 21, 2020. The entire contents of each of the aforementioned applications are incorporated herein by reference.

Background The present disclosure relates to systems and methods for controlling electrosurgery generators. In particular, the present disclosure relates to controlling multiple electrosurgical devices each delivering separate unipolar and / or bipolar radio frequency waveforms.

Electrosurgery involves applying a high radio frequency current to the surgical site to cut, ablate, dry, or coagulate tissue. In unipolar electrosurgery, the source or active electrodes deliver radiofrequency alternating current from the electrosurgical generator to the target tissue. The patient's return electrode is placed away from the active electrode to return the current to the generator.

In bipolar electrosurgery, the return electrode and the active electrode are placed in close proximity to each other, resulting in the formation of an electrical circuit between the two electrodes (eg, in the case of electrosurgical forceps). In this way, the applied current is limited to the body tissue positioned between the electrodes. Therefore, bipolar electrosurgery generally involves the use of equipment in which it is desired to achieve centralized delivery of electrosurgical energy between the two electrodes.

The current solution for dual-site surgery, i.e. using two electrosurgical instruments at the same time, is generally to use two electrosurgery generators. This solution is inherently cumbersome and costly. Therefore, there is a need for independent control of multiple ports of a single electrosurgical generator capable of outputting simultaneous RF waveforms.

The present disclosure provides an electrosurgical system comprising an electrosurgical generator having two radio frequency (RF) channels generated by two separate RF sources. Each of the sources includes a power source configured to output DC power and an RF power inverter configured to output RF waveforms. The individual RF waveforms are fed to the corresponding electrosurgical instrument, which can be unipolar or bipolar. Each of the sources is controlled by its own controller, each coupled to a common clock source. The electrosurgical generator performs wideband measurements of discontinuous or continuous signals from each source and simultaneously detects mutual conductance and crosstalk between RF sources. As used herein, mutual conductance is the current of an energy channel flowing through the contact impedance of the opposite channel, and crosstalk is radiative interference between energy channels within an electrosurgical generator.

According to one embodiment of the present disclosure, an electrosurgery generator is disclosed. The electric surgical generator is coupled to a first power source configured to output a first DC waveform and a first power source to generate a unipolar radio frequency waveform from the first DC waveform. A first radio frequency source having a configured first radio frequency inverter and a first controller configured to control the first radio frequency inverter to output a unipolar radio frequency waveform. include. The generator is also coupled to a second power source configured to output a second DC waveform and configured to generate a bipolar radio frequency waveform at the same time as the unipolar radio frequency waveform. It includes a second radio frequency source having a second radio frequency inverter and a second controller configured to control the second radio frequency inverter to output a bipolar radio frequency waveform.

According to one embodiment of the above embodiment, the generator is coupled to a first controller and a second controller, and a clock configured to synchronize the sampling operations of the first controller and the second controller. Including more sources. The unipolar radio frequency waveform has a first frequency, and the bipolar radio frequency waveform has a second frequency different from the first frequency. The first controller and the second controller are configured to perform frequency domain analysis of the unipolar radio frequency waveform and the bipolar radio frequency waveform, respectively. Each of the first controller and the second controller is further configured to detect mutual conductance between the first radio frequency source and the second radio frequency source based on frequency domain analysis. Each of the first controller and the second controller issues a warning in response to the detection of mutual conductance, or at least shuts off both the first radio frequency source and the second radio frequency source. Further configured to do one.

According to another aspect of the above embodiment, the first radio frequency source is coupled to a first radio frequency inverter and has a first active terminal further configured to be coupled to a unipolar electrosurgical instrument. Further included. The second radio frequency source further includes a second active terminal and a second return terminal coupled to the second radio frequency inverter and further configured to be coupled to the bipolar electrosurgical instrument. The first radio frequency source is a first return terminal configured to be coupled to at least one return electrode pad, the first radio frequency inverter coupled to the first radio frequency inverter and the second radio frequency inverter. Further includes a return terminal of 1. The first radio frequency source further comprises a first isolation transformer having a primary winding coupled to a first radio frequency inverter and a secondary winding coupled to a first active terminal and a return terminal. include. The second radio frequency source is a second isolation transformer having a primary winding coupled to a second radio frequency inverter and a secondary winding coupled to a second active terminal and a second return terminal. Including more vessels.

According to another embodiment of the present disclosure, an electrosurgery system is disclosed. The system includes a unipolar electrosurgery device, a bipolar electrosurgery device, and an electrosurgery generator. The generator comprises a first power source configured to output a first DC waveform, a first power source and a first radio frequency inverter coupled to a unipolar electrosurgical device. Includes radio frequency sources. The first radio frequency inverter is configured to supply a unipolar radio frequency waveform having a first frequency from a first DC waveform to a unipolar electrosurgical device. The first radio frequency source also includes a first controller configured to control the first radio frequency inverter. The generator also has a second power source configured to output a second DC waveform, a second power source and a second radio frequency inverter coupled to a bipolar electrosurgical device. Includes radio frequency sources. The second radio frequency inverter is configured to simultaneously generate a bipolar radio frequency waveform from the second DC waveform to the bipolar electrosurgical device. The second radio frequency source also includes a second controller configured to control the second radio frequency inverter.

According to one embodiment of the above embodiment, the electrosurgical generator further comprises a clock source coupled to a first controller and a second controller, and sampling operations of the first controller and the second controller. Is configured to synchronize. The unipolar radio frequency waveform has a first frequency, and the bipolar radio frequency waveform has a second frequency different from the first frequency. The first controller and the second controller are configured to perform frequency domain analysis of the unipolar radio frequency waveform and the bipolar radio frequency waveform, respectively. Each of the first controller and the second controller is further configured to detect mutual conductance between the first radio frequency source and the second radio frequency source based on frequency domain analysis. Each of the first controller and the second controller issues a warning in response to the detection of mutual conductance, or at least shuts off both the first radio frequency source and the second radio frequency source. Further configured to do one.

According to another aspect of the above embodiment, the first radio frequency source further comprises a first active terminal coupled to the first radio frequency inverter and is configured to be coupled to a unipolar electrosurgical device. Will be done. The second radio frequency source further includes a second active terminal coupled to the second radio frequency inverter and further configured to be coupled to the bipolar electrosurgical instrument. The electrosurgery system further comprises at least one return electrode pad, and the electrosurgery generator is a first coupled to at least one return electrode pad and a first radio frequency inverter and a second radio frequency inverter. Including the return terminal of. The first radio frequency source is a first isolation transformer having a primary winding coupled to a first radio frequency inverter and a secondary winding coupled to a first active terminal and a first return terminal. Including more vessels. The second radio frequency source is a second isolation transformer having a primary winding coupled to a second radio frequency inverter and a secondary winding coupled to a second active terminal and a second return terminal. Including more vessels.
For example, the present application provides the following items.
(Item 1)
It ’s a generator for electrosurgery.
The first radio frequency source,
A first power supply configured to output a first DC waveform,
The first radio frequency inverter coupled to the first power source and configured to generate a unipolar radio frequency waveform from the first DC waveform, and the first radio frequency inverter are controlled to control the single pole radio frequency inverter. A first radio frequency source, including a first controller configured to output a polar radio frequency waveform.
The second radio frequency source,
A second power supply configured to output a second DC waveform,
A second radio frequency inverter coupled to the second power source and configured to generate a bipolar radio frequency waveform at the same time as the unipolar radio frequency waveform, and the bipolar by controlling the second radio frequency inverter. An electrosurgical generator comprising a second radio frequency source, including a second controller configured to output a radio frequency waveform.
(Item 2)
The electrosurgery according to the above item, further comprising a clock source coupled to the first controller and the second controller and configured to synchronize the operations of the first controller and the second controller. Generator.
(Item 3)
The electrosurgery according to any one of the above items, wherein the unipolar radio frequency waveform has a first frequency, and the bipolar radio frequency waveform has a second frequency different from the first frequency. Generator for.
(Item 4)
The first controller and the second controller are configured to perform frequency domain analysis of the unipolar radio frequency waveform and the bipolar radio frequency waveform, respectively, according to any one of the above items. Generator for electrosurgery.
(Item 5)
Each of the first controller and the second controller further detects the mutual conductance between the first radio frequency source and the second radio frequency source based on the frequency domain analysis. The generator for electrosurgery according to any one of the above items, which is configured.
(Item 6)
Each of the first controller and the second controller issues a warning in response to the detection of the mutual conductance, or shuts off both the first radio frequency source and the second radio frequency source. The electrosurgical generator according to any one of the above items, further configured to do at least one of the above.
(Item 7)
The first radio frequency source is any one of the above items, further comprising a first active terminal coupled to the first radio frequency inverter and further configured to be coupled to a unipolar electrosurgical device. The generator for electrosurgery described in.
(Item 8)
The second radio frequency source further comprises a second active terminal and a second return terminal coupled to the second radio frequency inverter and further configured to be coupled to a bipolar electrosurgical device. The generator for electrosurgery according to any one of the above.
(Item 9)
The first radio frequency source is a first return terminal configured to be coupled to at least one return electrode pad, coupled to the first radio frequency inverter and the second radio frequency inverter. The electrosurgical generator according to any one of the above items, further including a first return terminal.
(Item 10)
The first radio frequency source has a first isolation having a primary winding coupled to the first radio frequency inverter and a secondary winding coupled to the first active terminal and the return terminal. The electrosurgical generator according to any one of the above items, further including a transformer.
(Item 11)
The second radio frequency source has a primary winding coupled to the second radio frequency inverter and a secondary winding coupled to the second active terminal and the second return terminal. 2. The electrosurgical generator according to any one of the above items, further including an isolation transformer.
(Item 12)
It ’s an electrosurgery system.
Unipolar electrosurgical equipment and
Bipolar electrosurgical equipment and
It ’s a generator for electrosurgery.
The first radio frequency source,
A first power supply configured to output a first DC waveform,
The unipolar radio frequency waveform which is the first radio frequency inverter coupled to the first power supply and the unipolar electric surgical device and has the first frequency from the first DC waveform is the unipolar electric. A first radio frequency source, including a first radio frequency inverter configured to supply surgical equipment, and a first controller configured to control the first radio frequency inverter.
The second radio frequency source,
A second power supply configured to output a second DC waveform,
A second radio frequency inverter coupled to the second power source and the bipolar electrosurgical device, from the second DC waveform to the bipolar electrosurgical device at the same time as the unipolar radio frequency waveform. A second radio frequency source, including a second radio frequency inverter configured to generate a bipolar radio frequency waveform, and a second controller configured to control the second radio frequency inverter. And, including, an electric surgery generator, and an electric surgery system.
(Item 13)
The electrosurgical generator further comprises a clock source coupled to the first controller and the second controller and configured to synchronize the operations of the first controller and the second controller. The electrosurgical system described in the above item.
(Item 14)
The electrosurgery according to any one of the above items, wherein the unipolar radio frequency waveform has a first frequency, and the bipolar radio frequency waveform has a second frequency different from the first frequency. system.
(Item 15)
The first controller and the second controller are configured to perform frequency domain analysis of the unipolar radio frequency waveform and the bipolar radio frequency waveform, respectively, according to any one of the above items. Electrosurgical system.
(Item 16)
Each of the first controller and the second controller further detects the mutual conductance between the first radio frequency source and the second radio frequency source based on the frequency domain analysis. The electrosurgical system according to any one of the above items, which is configured.
(Item 17)
Each of the first controller and the second controller issues a warning in response to the detection of the mutual conductance, or shuts off both the first radio frequency source and the second radio frequency source. The electrosurgical system according to any one of the above items, further configured to do, at least one of them.
(Item 18)
The first radio frequency source further comprises a first active terminal coupled to the first radio frequency inverter and further configured to be coupled to a unipolar electrosurgical device.
The second radio frequency source is coupled to any one of the above items, further comprising a second active terminal coupled to the second radio frequency inverter and further configured to be coupled to a bipolar electrosurgical device. The described electrosurgical system.
(Item 19)
Further comprising at least one return electrode pad, the electrosurgery generator is a first coupled to the at least one return electrode pad and the first radio frequency inverter and the second radio frequency inverter. The electrosurgical system according to any one of the above items, further comprising a return terminal of.
(Item 20)
The first radio frequency source has a primary winding coupled to the first radio frequency inverter and a secondary winding coupled to the first active terminal and the first return terminal. Including 1 isolation transformer,
The second radio frequency source has a primary winding coupled to the second radio frequency inverter and a secondary winding coupled to the second active terminal and the second return terminal. 2. The electrosurgical system according to any one of the above items, further comprising an isolation transformer.
(Summary)
The electric surgical generator is coupled to a first power source configured to output a first DC waveform and a first power source to generate a unipolar radio frequency waveform from the first DC waveform. A first radio frequency source comprising a configured first radio frequency inverter and a first controller configured to control the first radio frequency inverter to output a unipolar radio frequency waveform. include. The generator is also coupled to a second power source configured to output a second DC waveform and configured to generate a bipolar radio frequency waveform at the same time as the unipolar radio frequency waveform. It includes a second radio frequency source having a second radio frequency inverter and a second controller configured to control the second radio frequency inverter to output a bipolar radio frequency waveform.

The present disclosure can be understood by reference to the accompanying drawings when considered in conjunction with subsequent detailed description.

FIG. 3 is a perspective view of an electrosurgery system according to an embodiment of the present disclosure. It is a front view of the dual RF source electrosurgery generator of FIG. 1 according to one embodiment of the present disclosure. FIG. 3 is a schematic diagram of an electrosurgical generator of FIG. 1 coupled to two unipolar electrosurgical instruments and a shared return electrode pad according to an embodiment of the present disclosure. FIG. 3 is a schematic diagram of the electrosurgery generator of FIG. 1 coupled to two bipolar electrosurgery devices according to an embodiment of the present disclosure. FIG. 3 is a schematic diagram of the electrosurgical generator of FIG. 1 coupled to a unipolar electrosurgical device, a return electrode pad, and a bipolar electrosurgical device according to an embodiment of the present disclosure. According to the present disclosure, it is a schematic diagram of a clock source coupled to a first controller of a first RF source and a second controller of a second control source of the electrosurgical generator of FIG. It is a frequency response plot of the continuous RF waveform generated by the electrosurgical generator of FIG. 1 according to the present disclosure. It is a frequency response plot of the discontinuous RF waveform generated by the electrosurgical generator of FIG. 1 according to the present disclosure. FIG. 3 is a flow chart of a method of operating the electrosurgical generator of FIG. 1 to detect overcurrent and / or mutual conductance according to an embodiment of the present disclosure.

Embodiments of the electrosurgery system of the present disclosure will be described in detail with reference to the drawings, where similar reference numbers indicate the same or corresponding elements in each of several figures. As used herein, the term "distal" refers to the part of the combined surgical device that is closer to the patient and the term "proximal" refers to the part that is farther from the patient.

The term "application" may include a computer program designed to perform a function, task, or activity for the benefit of the user. An application can refer, for example, to software that operates locally or remotely, either as a stand-alone program or within a web browser, or other software that is understood by one of ordinary skill in the art to be an application. The application may run on a controller or on a user device, including, for example, a mobile device, an IOT device, a server system, or any programmable logic device.

No well-known function or configuration is described in detail below to avoid unnecessarily detailed and obscuring the present disclosure. Those skilled in the art will appreciate that the present disclosure may be adapted for use in either endoscopic, laparoscopic, or laparotomy equipment. It should also be understood that different electrical and mechanical connections as well as other considerations may apply to each particular type of equipment.

Electrosurgical generators according to the present disclosure can be used in unipolar and / or bipolar electrosurgical procedures, including, for example, cutting, coagulation, ablation, and vascular sealing procedures. The generator may include multiple outputs for interfacing with various ultrasonic and electrosurgical instruments such as ultrasonic dissector and hemostatic forceps, unipolar instruments, return electrode pads, bipolar electrosurgical forceps, footswitches, etc. .. In addition, the generator is an ultrasonic device that operates in various electrosurgical modes (eg, cutting, mixing, coagulation, splitting with hemostasis, lightning destruction, spraying, etc.) and procedures (eg, unipolar, bipolar, vascular sealing). And may include electronic circuits configured to generate radio frequency energy particularly suitable for powering electrosurgical devices.

Referring to FIG. 1, an electrosurgery system 10 is shown, wherein the electrosurgery system 10 is 2 of unipolar electrosurgery devices 20'and 20'' and / or bipolar electrosurgery devices 30'and 30'. Including one or more. Unipolar electrosurgical instruments 20'and 20'' have one or more active electrodes 23'and 23'' (eg, electrosurgical cutting probes, ablation electrodes (s), etc.) for treating a patient's tissue. include. The system 10 may include a plurality of return electrode pads 26 disposed to the patient to minimize the possibility of tissue damage by maximizing the overall contact area with the patient during use. Electrosurgical alternating current is supplied by the generator 100 to the equipment 20'and 20'via the supply lines 24'and 24'. The generator 100 is a dual source RF generator configured to supply a separate RF waveform to each of the devices 20'and 20'from the individual RF sources. AC RF current passes through the return electrode pad 26. And back to the generator 100 via the return line 28. In addition, the generator 100 and the return electrode pad 26 monitor contact between the tissue and the patient to ensure that sufficient contact exists between them. Can be configured to guarantee.

Bipolar electrosurgical instruments 30'and 30'are shown as tweezers with a pair of electrodes 33a'and 33b' and 33a'' and 33b', respectively, for treating a patient's tissue. In embodiments, the bipolar electrosurgical instruments 30'and 30 "can be a pair of forceps. The devices 30 ″ and 30 ″ are coupled to the generator 100 via cables 34 ″ and 34 ″. The generator 100 is a dual source RF generator configured to supply a separate RF waveform to each of the devices 30'and 30'from the individual RF sources.

Referring to FIG. 2, the front 102 of the generator 100 is shown. The generator 100 may include a plurality of ports 110, 112, 114, 116 for addressing various types of electrosurgical equipment and ports 118 for coupling to the return electrode pad 26. Ports 110 and 112 are configured to couple to the unipolar electrosurgical instruments 20'and 20'. Ports 114 and 116 are configured to couple to bipolar electrosurgical instruments 30'and 30'. The generator 100 includes a display 120 for providing the user with various output information (eg, intensity setting, treatment completion indicator, etc.). The display 120 is a touch screen configured to display menus corresponding to the device (eg, unipolar electrosurgical instruments 20'and 20'', bipolar electrosurgical instruments 30'and 30'', electrosurgical forceps, etc.). Is. The user also adjusts the input by simply touching the corresponding menu option. The generator 100 includes suitable input controls 122 (eg, buttons, activators, switches, touch screens, etc.) for controlling the generator 100.

The generator 100 is configured to operate in various modes and outputs unipolar and / or bipolar waveforms based on the mode selected for each of ports 110, 112, 114, 116. Each of the modes operates on the basis of a pre-programmed power curve that determines how much power is output by the generator 100 in different impedance ranges of the load (eg, tissue). Each power curve contains a control range of power, voltage, and current as defined by the strength setting selected by the user and the minimum impedance of the measured load.

The generator 100 may operate in the following unipolar modes including, but not limited to, cutting, mixing, splitting with hemostasis, lightning destruction, and spraying. The generator 100 may operate in the following bipolar modes, including bipolar coagulation, automatic bipolar operating in response to detection of tissue contact, and various algorithm controlled vascular sealing modes.

Each of the first and second RF waveforms can be either a unipolar or bipolar RF waveform, and each of them can be either continuous or discontinuous, with a carrier frequency of about 200 kHz to about 500 kHz. Can have. As used herein, a continuous waveform is a waveform with a 100% duty cycle. In embodiments, continuous waveforms are used to provide a cutting effect on the tissue. Conversely, a discontinuous waveform is, for example, a waveform having a discontinuous duty cycle of less than 100%. In embodiments, discontinuous waveforms are used to provide a coagulation effect on the tissue.

In cut mode, the generator 100 may supply a continuous sinusoidal waveform of a predetermined carrier frequency (eg, 472 kHz) with an impedance of about 100 Ω to about 2000 Ω and a crest factor of about 1.5. The disconnect mode power curve may include three regions: constant current to low impedance, constant power to medium impedance, and constant voltage to high impedance. In mixed mode, the generator may supply a burst of sinusoidal waveforms of a given frequency, which reoccurs at a first predetermined rate (eg, about 26.21 kHz). In one embodiment, the burst duty cycle can be about 50%. The crest factor of a one-cycle sinusoidal waveform can be about 1.5. The burst crest factor can be about 2.7.

The split mode with hemostasis may include a burst of sinusoidal waveforms at a predetermined frequency (eg, 472 kHz) that reoccurs at a second predetermined rate (eg, about 28.3 kHz). The duty cycle of the burst can be about 25%. The crest factor of one burst can be about 4.3 with an impedance of about 100Ω to about 2000Ω. The lightning destruction mode may include a burst of sinusoidal waveforms of a predetermined frequency (eg, 472 kHz) that reoccurs at a third predetermined rate (eg, about 30.66 kHz). The duty cycle of the burst can be about 6.5% and the crest factor of one burst cycle can be about 5.55 in the impedance range of about 100Ω to about 2000Ω. The spray mode may include a burst of sinusoidal waveforms of a predetermined frequency (eg, 472 kHz) that reoccurs at a fourth predetermined rate (eg, about 21.7 kHz). The duty cycle of the burst is about 4.6% and the crest factor of one burst cycle can be about 6.6 in the impedance range of about 100Ω to about 2,000Ω.

Referring to FIGS. 3-5, the generator 100 includes a dual source RF architecture in which each RF source is powered by a separate RF inverter, each powered by a separate DC power supply. More specifically, the generator 100 includes a first RF source 202 and a second RF source 302. Each of the sources 202 and 302 includes a first controller 204 and a second controller 304, a first power supply 206 and a second power supply 306, and a first RF inverter 208 and a second RF inverter 308. The power supplies 206 and 306 can be high voltage DC power supplies connected to a common AC power supply (eg, line voltage), providing high voltage DC power to the respective RF inverters 208 and 308, followed by the RF inverters. 208 and 308 convert DC power into a first RF waveform and a second RF waveform through the active terminals 210 and 310, respectively.

The system 10 is shown in various configurations, in which the generator 100 operates in any combination of unipolar and bipolar electrosurgical instruments 20', 20", 30', and 30'. The generator 100 includes a dual source RF architecture in which each RF source is powered by a separate RF inverter, each powered by a separate DC power supply. More specifically, the generator 100 includes a first RF source 202 and a second source 302. The first RF source 202 energizes ports 110 and 114 and the second RF source 302 energizes ports 112 and 116. Port 118 is shared between the first RF source 202 and the second RF source 302.

Each of the sources 202 and 302 includes a first controller 204 and a second controller 304, a first power supply 206 and a second power supply 306, and a first RF inverter 208 and a second RF inverter 308. The power supplies 206 and 306 can be high voltage DC power supplies connected to a common AC power supply (eg, line voltage), providing high voltage DC power to the respective RF inverters 208 and 308, followed by the RF inverters. 208 and 308 convert DC power into a first RF waveform and a second RF waveform through the active terminals 210 and 310, respectively. RF energy is returned there via the first return terminal 212 and the second return terminal 312, respectively.

The active terminal 210 and the return terminal 212 are coupled to the RF inverter 208 through an isolation transformer 214. The isolation transformer 214 includes a primary winding 214a coupled to the RF inverter 208 and a secondary winding 214b coupled to the active terminal 210 and the return terminal 212. Similarly, the active terminal 310 and the return terminal 312 are coupled to the RF inverter 308 through an isolation transformer 314. The isolation transformer 314 includes a primary winding 314a coupled to the RF inverter 308 and a secondary winding 314b coupled to the active terminal 310 and the return terminal 312.

Referring to FIG. 3, a dual unipolar generator 100 for use with unipolar electrosurgical instruments 20'and 20'' is shown to energize unipolar electrosurgical instruments 20'and 20''. Electrosurgical energy for is delivered through ports 110 and 112, respectively, and each of the ports 110 and 112 is coupled to active terminals 210 and 310, respectively. RF energy is returned through the return electrode pad 26 coupled to the port 118, which is then coupled to the shared return terminals 313 coupled to the return terminals 210 and 312. The secondary winding 214b of the isolation transformer 214 is coupled to the active terminal 210 and the return terminal 212. Similarly, the secondary winding 314b of the isolation transformer 314 is coupled to the active terminal 310 and the return terminal 312.

FIG. 4 shows a dual-pole bipolar generator 100 for use with bipolar electrosurgical instruments 30'and 30'', an RF for energizing bipolar electrosurgical instruments 30'and 30''. Energy is delivered through ports 114 and 116, each of which is coupled to an active terminal 210 and a return terminal 212, as well as an active terminal 310 and a return terminal 312, respectively.

FIG. 5 shows a combined unipolar / bipolar configuration generator 100 for use with the unipolar electrosurgical device 20'and the bipolar electrosurgical device 30'. The electrosurgical energy for energizing the unipolar electrosurgical device 20'and the bipolar electrosurgical device 30' is delivered through ports 110 and 116, respectively. In embodiments, the unipolar electrosurgical device 20'can be coupled to the other unipolar port 112, and similarly, the bipolar electrosurgical device 30'can be coupled to the other bipolar port 114. For the unipolar electrosurgical instrument 20', RF energy is returned through the return electrode pad 26 coupled to the port 118, which is then coupled to the return terminal 212. For the bipolar electrosurgical device 30', energy is returned through the same port 116 via the return terminal 312.

The generator 100 is the first in a dual unipolar configuration through the steering relay 315, based on the combination of unipolar electrosurgical equipment 20', 20'' and bipolar electrosurgical equipment 30', 30'' used. To couple the active terminals 210 and 310 and the return terminals 212 and 312 to various ports 110, 112, 114, 116, 118, such as coupling the return terminal 212 and the second return terminal 312 to the shared return terminal 313. It may include a plurality of configured steering relays or other switching devices (FIG. 3).

Continuing with reference to FIGS. 3-5, the RF inverters 208 and 308 are configured to operate in multiple modes, while the generator 100 corresponds to having a particular duty cycle, peak voltage, crest factor, etc. Output the waveform. In other embodiments, it is envisioned that the generator 100 may be obtained based on other types of suitable power supply topologies. The RF inverters 208 and 308 can be resonant RF amplifiers or non-resonant RF amplifiers, as illustrated. Non-resonant RF amplifier, as used herein, means an amplifier lacking a coordinator placed between an RF inverter and a load, such as a tissue, i.e. a conductor, a capacitor, or the like.

Controllers 204 and 304 may include a processor (not shown) operably connected to memory (not shown), the memory being read-only memory (ROM), random access memory (RAM), electrically erasable. It may include one or more of volatile, non-volatile, magnetic, optical, or electrical media such as programmable ROM (EEPROM), non-volatile RAM (NVRAM), or flash memory. Processors are described herein, including, but not limited to, hardware processors, field programmable gate arrays (FPGAs), digital signal processors (DSPs), central processing units (CPUs), microprocessors, and combinations thereof. It can be any suitable processor (eg, control circuit) adapted to perform a set of operations, calculations, and / or instructions. It will be appreciated by those skilled in the art that the processor may be substituted by using any logic processor (eg, a control circuit) adapted to perform the calculations and / or instruction sets described herein. NS.

Each of the controllers 204 and 304 is operably connected to the respective power supplies 206 and 306 and / or RF inverters 208 and 308, and the processor 100 is according to one of the open and / or closed control loop schemes. It is possible to control the output of the first RF source 202 and the second source 302. In a closed-loop control scheme, multiple sensors measure various tissue and energy characteristics (eg, tissue impedance, tissue temperature, output power, current and / or voltage, etc.) and provide feedback to each of controllers 204 and 304. This is a feedback control loop. The controllers 204 and 304 then control the respective power supplies 206 and 306, and / or the RF inverters 208 and 308 that adjust the DC and / or RF waveforms, respectively.

The generator 100 according to the present disclosure may also include a plurality of sensors 216 and 316, each monitoring the outputs of the first RF source 202 and the second RF source 302 of the generator 100. The sensors 216 and 316 can be any suitable voltage, current, power, and impedance sensor. In the embodiments shown in FIGS. 3-5, the sensor 216 is coupled to the lead wires 220a and 220b of the RF inverter 208. The leads 220a and 220b couple the RF inverter 208 to the primary winding 214a of the transformer 214. The sensor 316 is coupled to the lead wires 320a and 320b of the RF inverter 308. The leads 320a and 320b couple the RF inverter 308 to the primary winding 314a of the transformer 314. Therefore, the sensors 216 and 316 are configured to detect the voltage, current, and other electrical characteristics of the energy delivered to the active terminals 210 and 310 as well as the return terminals 212 and 312.

In a further embodiment, the sensors 216 and 316 may be coupled to the power supplies 206 and 306 and may be configured to detect the characteristics of the DC current supplied to the RF inverters 208 and 308. Controllers 204 and 304 also receive input signals from the generator 100's display 120 and input controls 122 and / or equipment 30'and 30'. Controllers 204 and 304 regulate the power output by the generator 100. , And / or in response to the input signal, perform other control functions on the generator 100.

RF inverters 208 and 308 include a plurality of switching elements 228a-228d and 328a-328d arranged in an H-bridge topology, respectively. In embodiments, RF inverters 208 and 308 may be configured according to any suitable topology including, but not limited to, half-bridge, full-bridge, push-pull, and the like. Suitable switching elements include voltage control devices such as transistors, field effect transistors (FETs), combinations thereof and the like. In embodiments, the FET can be formed from gallium nitride, aluminum nitride, boron nitride, silicon carbide, or any other suitable wide bandgap material.

The controllers 204 and 304 communicate with the RF inverters 208 and 308, in particular the switching elements 228a-228d and 328a-328d, respectively. The controllers 204 and 304 are configured to output control signals, which may be pulse width modulation (“PWM”) signals, to the switching elements 228a-228d and 328a-328d. In particular, the controller 204 is configured to modulate the control signals d1 supplied to the switching elements 228a to 228d of the RF inverter 208, and the controller 304 controls the control signals d2 supplied to the switching elements 328a to 328d of the RF inverter 308. Is configured to modulate. The control signals d1 and d2 provide PWM signals that operate the RF inverters 208 and 308 at their respective selected carrier frequencies. Additionally, the controllers 204 and 304 calculate the power characteristics of the outputs of the first RF source 202 and the second source 302 of the generator 100 to determine the voltage, current, and power at the outputs of the RF inverters 208 and 308. It is configured to control the outputs of the first RF source 202 and the second source 302, at least in part based on, but not limited to, the measured power characteristics, including but not limited to these.

Referring to FIGS. 3-6, each of the controllers 204 and 304 is coupled to a clock source 340 that acts as a common frequency source for each of the controllers 204 and 304, thus synchronizing the controllers 204 and 304. The clock source 340 is an electronic oscillation circuit that generates a clock signal for synchronizing the operations of the controllers 204 and 304. In particular, the sampling operations of controllers 204 and 304 are synchronized. Each of the controllers 204 and 304 produces an RF waveform based on the clock signal from the clock source 340 and the mode selected. Therefore, when the user selects one of the electrosurgery modes, each of the controllers 204 and 304 controls the respective RF inverters 208 and 308 to control the first and second RFs corresponding to the selected mode. It outputs the first and second control signals used to output the waveform. The modes selected for each of the first RF source 202 and the second source 302, as well as the corresponding RF waveforms, may be the same or different.

The RF waveforms have different carrier frequencies, so the first RF waveform has a first carrier frequency and the second RF waveform has a second carrier frequency. The two different carrier frequencies are selected so that the controllers 204 and 304 can discriminate or segregate the measured data in the frequency domain. The measurement data is collected by sensors 216 and 316 that monitor the outputs of the first RF source 202 and the second source 302. Controllers 204 and 304 use any suitable bandpath technique, or any technique that transforms the measured data into frequency domains such as the Discrete Fourier Transform (DFT) and Fast Fourier Transform (FFT), respectively, first. And the second RF waveform is analyzed. In embodiments, controllers 204 and 304 use an array of Gelzel filters directed at the carrier frequency of the RF waveform and its harmonics for continuous waveforms (eg, those used during cutting mode). obtain. For discontinuous waveforms, the Gelzel filter is directed to the repetition rate and harmonics of the repetition frequency of the waveform being analyzed. Filtering of measurement data can be performed by applications run by controllers 204 and 304, such as software instructions.

The frequencies of the first and second RF waveforms are selected to provide sufficient channel separation between the carrier frequencies of the first RF waveform and the second RF waveform, as determined by the bandpass Gerzel filter. Will be done. With reference to the frequency response plot 350 of FIG. 7, the frequency of the RF port on the opposite side of the continuous waveform is selected to be at the null point of the frequency response. This maximizes the source-to-source separation.

Referring to FIG. 8, a frequency response plot 360 of the discontinuous waveform is shown, with a separate Gerzel filter directed at the basic repetition rate and even and odd harmonics of the RF waveform being analyzed. Since the fundamental frequencies are not completely orthogonal, there is an overlap of certain harmonics. The overlap of sets of harmonics causes discontinuity in the Gerzel array plot. It is used to detect whether significant reciprocal conductance from one RF source is occurring at sensors 216 or 316 from another RF source. If it is desired to separate sources that contain the combined information in only one of the harmonics, the unaffected harmonics are used in combination with a percentage of the affected harmonics. NS. Separate cross-conductance information is used as a dose monitor to detect excessive cross-conductance situations.

In embodiments where both the first and second RF waveforms are discontinuous, the limited frequency space can be constrained. The discontinuous waveform can have a repetition rate of about 20 KHz to about 490 KHz. The repetition rate does not give a completely orthogonal solution in terms of signal processing. The technique for determining the power values of each of the first RF source 202 and the second source 302 to be used for independent control depends on the level of mutual conductance. Due to mutual conductance, the actual power is stored in the contact impedance. Therefore, the power to be controlled is based on the sum of the mutual conductance power stored in the contact impedance portion and the port source power stored in the contact impedance. In embodiments, the non-contact tissue impedance and the power stored in the return electrode pad 26 may also be included in the overall calibration of the particular RF port. When frequency discrimination is used for power control, before using the generator 100, the equipment 30'and 30', as well as the return electrode pad 26, are cable compensated for the cables 34'and 34' and the return line 28. Used in calibration procedures that take into account both harmonic overlap and mutual conductance. Mutual conductance can also be monitored as a mitigation measure for potential dose errors.

In embodiments, if one of the first and second RF waveforms is continuous and the other is discontinuous, the continuous RF waveform can be a higher Gerzel frequency of about 481 KHz and the discontinuous RF waveform is about. It can be at a lower frequency of 433 KHz, so that the frequency response of Gerzel is divisible by 45 (see FIGS. 7 and 8), and the concentration of discontinuous energy is less than or equal to its carrier frequency 433 KHz. There is almost no interference that occurs in.

In embodiments where the first and second RF waveforms are continuous, the preselected 433 KHz and 481 KHz intrinsic carrier frequencies are also constructive or constructive from the other source, as the continuous waveform is generally not a perfect sine wave. It follows the coherent sampling rules used to separate continuous RF sources in conjunction with a Gerzel filter to provide destructive coherent signal attenuation. The bandpass filter provides a signal passband area and a lower / upper signal blocking area. The level of blocking is variable and is based on the type of bandpass filter designed. Finite impulse response (FIR) filters provide a sink function (sin x / x) type amplitude-to-frequency response. The computationally efficient implementation of the Gelzel filter acts like a sampling function, as shown in plots 350 and 360 of FIGS. 7 and 8.

With reference to FIG. 9, a method for controlling the generator 100 is disclosed. The method provides simultaneous dual operation of the first RF source 202 and the RF second source 302. First, each of the first RF source 202 and the second RF source 302 is configured. As mentioned above, each mode is associated with a given RF waveform that can be unipolar or bipolar, and continuous or discontinuous, and is based on the desired tissue effect. The generator 100 is configured to operate in a dual unipolar, dual bipolar mode, or hybrid unipolar / bipolar configuration, while each of the first RF source 202 and the RF second source 302 is arbitrary. Output the appropriate unipolar or bipolar RF waveform. The user may configure each of the first RF source 202 and the RF second source 302, such as setting the power level. The first and second RF waveforms are output in response to the activation signal, which is lined by any user input through the device 20', 20'', 30', 30'' or the generator 100. I can be.

During operation, each of the first RF source 202 and the RF second source 302 continuously outputs the first and second RF waveforms while the mode is active. The first and second RF waveforms are separated by frequency domain and are measured by sensors 216 and 316 to measure the impedance of the tissue and the electrical characteristics of the waveform.

The first and second RF waveforms can be supplied simultaneously. During simultaneous RF waveform transmission, sensors 216 and 316 measure the characteristics of the first and second RF waveforms. The RF waveform carrier frequency and solidification repetition rate may be selected to provide coherent sampling under time-critical power calculation update rates. Controllers 204 and 304 utilize signal processing and / or time division techniques to discriminate simultaneously activated first and second query waveforms. Controllers 204 and 304 also determine the level of mutual conductance between the first RF source 202 and the second RF source 302. The carrier frequencies of the first and second RF waveforms are such that the carrier frequency provides coherent sampling at update rates for time-critical power calculations, providing a combination of effective frequency discrimination and mutual conductance detection. Is. The carrier frequency ratio can be varied from a Gerzel ratio of 45:50 to a Gerzel ratio of 49:51 to provide different response rates for tissue contact detection, eg, open circuit. The time-cascaded Gerzel calculation can also be used to shorten the time interval between the algorithm's power calculations.

In embodiments, the optimum frequency of the first and second waveforms can be determined by scanning the frequency response of the first RF source 202 and the second RF source 302 to identify the noise frequency. After identifying the noise carrier frequency, a quieter frequency is selected to avoid corruption of the first and second query waveforms, thereby avoiding false positives of tissue contact.

Sensors 216 and 316 work in conjunction with controllers 204 and 304 to perform wideband measurements of the first and second RF waveforms, respectively, with the first RF source 202 and the second RF source 302 at the same time. Detect mutual conductance between. In addition, during operation, the controllers 204 and 304 also provide overcurrent protection during dual operation by monitoring the total current through the return electrode pad 26. Controllers 204 and 304 calculate the overcurrent value by squaring the instantaneous current value as a movable value during any suitable period, which can be from about 15 seconds to about 60 seconds (I ^2). Movable values can be calculated per second, or at any other suitable repetition rate. The overcurrent value is then ^{compared to an overcurrent threshold that can be about 30A 2} , and if the threshold is exceeded within any 60 second window when monitored at a set speed (eg, once per second), RF. Both source 202 and second RF source 302 are blocked.

Each of the controllers 204 and 304 also utilizes a signal processing technique, ie, the Gelzel array plot described above, to discriminate between the first RF source 202 and the second RF source 302 operated simultaneously. Controllers 204 and 304 are also configured to use signal processing discrimination techniques to determine the level of mutual conductance between the first RF source 202 and the second RF source 302, if any. .. After the level of mutual conductance is determined, the level of mutual conductance is used as a safety mitigation measure during simultaneous unipolar or bipolar RF operation, i.e., as a dose error monitor. In particular, upon detection of mutual conductance by either controller 204 or 304, each of controllers 204 and 304 issues a warning in response to a dose error of mutual conductance and / or a first RF source 202 and a second. It is configured to shut down both of the RF sources 302 of.

Although some embodiments of the present disclosure have been shown in the drawings and / or described herein, the present disclosure is intended to be read herein as well, to the extent permitted by the art. As such, the present disclosure is not intended to be limited to these embodiments. Therefore, the above description should not be construed as a limitation, but as merely an example of a particular embodiment. Those skilled in the art will assume other modifications within the scope of the claims attached herein.

Claims (20)

It ’s a generator for electrosurgery.
The first radio frequency source,
A first power supply configured to output a first DC waveform,
The single radio frequency inverter coupled to the first power source and configured to generate a unipolar radio frequency waveform from the first DC waveform, and the single radio frequency inverter by controlling the first radio frequency inverter. A first radio frequency source, including a first controller configured to output a polar radio frequency waveform.
The second radio frequency source,
A second power supply configured to output a second DC waveform,
A second radio frequency inverter coupled to the second power source and configured to generate a bipolar radio frequency waveform at the same time as the unipolar radio frequency waveform, and the bipolar by controlling the second radio frequency inverter. An electrosurgical generator comprising a second radio frequency source, including a second controller configured to output a radio frequency waveform. The electrosurgery of claim 1, further comprising a clock source coupled to the first controller and the second controller and configured to synchronize the operations of the first controller and the second controller. Generator for. The electrosurgical generator according to claim 2, wherein the unipolar radio frequency waveform has a first frequency, and the bipolar radio frequency waveform has a second frequency different from the first frequency. The electrosurgical power generation according to claim 3, wherein the first controller and the second controller are configured to perform frequency domain analysis of the unipolar radio frequency waveform and the bipolar radio frequency waveform, respectively. Machine. Each of the first controller and the second controller further detects the mutual conductance between the first radio frequency source and the second radio frequency source based on the frequency domain analysis. The electric surgical generator according to claim 4, which is configured. Each of the first controller and the second controller issues a warning in response to the detection of the mutual conductance, or shuts off both the first radio frequency source and the second radio frequency source. The electrosurgical generator according to claim 5, further configured to do at least one of the things to do. The electricity according to claim 1, wherein the first radio frequency source further comprises a first active terminal coupled to the first radio frequency inverter and further configured to be coupled to a unipolar electrosurgical device. Surgical generator. The second radio frequency source further comprises a second active terminal and a second return terminal coupled to the second radio frequency inverter and further configured to be coupled to a bipolar electrosurgical device. 7. The electrosurgical generator according to 7. The first radio frequency source is a first return terminal configured to be coupled to at least one return electrode pad, coupled to the first radio frequency inverter and the second radio frequency inverter. The electrosurgical generator according to claim 8, further comprising a first return terminal. The first radio frequency source is a first isolation having a primary winding coupled to the first radio frequency inverter and a secondary winding coupled to the first active terminal and the return terminal. The electrosurgical generator according to claim 9, further comprising a transformer. The second radio frequency source has a primary winding coupled to the second radio frequency inverter and a secondary winding coupled to the second active terminal and the second return terminal. The electrosurgical generator according to claim 10, further comprising the isolation transformer of 2. It ’s an electrosurgery system.
Unipolar electrosurgical equipment and
Bipolar electrosurgical equipment and
It ’s a generator for electrosurgery.
The first radio frequency source,
A first power supply configured to output a first DC waveform,
The unipolar electric frequency waveform of the first radio frequency inverter coupled to the first power supply and the unipolar electrosurgical device and having the first frequency from the first DC waveform is the unipolar electric. A first radio frequency source, including a first radio frequency inverter configured to supply surgical equipment and a first controller configured to control the first radio frequency inverter.
The second radio frequency source,
A second power supply configured to output a second DC waveform,
A second radio frequency inverter coupled to the second power source and the bipolar electrosurgical device, from the second DC waveform to the bipolar electrosurgical device at the same time as the unipolar radio frequency waveform. A second radio frequency source, including a second radio frequency inverter configured to generate a bipolar radio frequency waveform and a second controller configured to control the second radio frequency inverter. And, including, an electric surgery generator, and an electric surgery system. The electrosurgical generator further comprises a clock source coupled to the first controller and the second controller and configured to synchronize the operations of the first controller and the second controller. The electrosurgical system according to claim 12. 13. The electrosurgical system of claim 13, wherein the unipolar radio frequency waveform has a first frequency and the bipolar radio frequency waveform has a second frequency different from the first frequency. 15. The electrosurgical system of claim 14, wherein the first controller and the second controller are configured to perform frequency domain analysis of the unipolar radio frequency waveform and the bipolar radio frequency waveform, respectively. Each of the first controller and the second controller further detects the mutual conductance between the first radio frequency source and the second radio frequency source based on the frequency domain analysis. The electrosurgical system according to claim 15, which is configured. Each of the first controller and the second controller issues a warning in response to the detection of the mutual conductance, or shuts off both the first radio frequency source and the second radio frequency source. The electrosurgical system of claim 16, further configured to do, at least one of them. The first radio frequency source further comprises a first active terminal coupled to the first radio frequency inverter and further configured to be coupled to a unipolar electrosurgical device.
12. The electrosurgery of claim 12, wherein the second radio frequency source further comprises a second active terminal coupled to the second radio frequency inverter and further configured to be coupled to a bipolar electrosurgery device. system. Further comprising at least one return electrode pad, the electrosurgery generator is a first coupled to the at least one return electrode pad, the first radio frequency inverter and the second radio frequency inverter. 18. The electrosurgical system of claim 18, further comprising a return terminal of. The first radio frequency source has a primary winding coupled to the first radio frequency inverter and a secondary winding coupled to the first active terminal and the first return terminal. Including 1 isolation transformer,
The second radio frequency source has a primary winding coupled to the second radio frequency inverter and a secondary winding coupled to the second active terminal and the second return terminal. 19. The electrosurgical system of claim 19, further comprising an isolation transformer of 2.

Images