JP2019164264A - Pattern drawing apparatus and pattern drawing method - Google Patents

Abstract

To provide a technology that reduces the cost-up of apparatus and the complication of control when photographing multiple marks formed on a substrate with multiple cameras.SOLUTION: A pattern drawing apparatus 1 is an apparatus for forming a pattern by emitting light onto a substrate 9 having a plurality of marks 91 formed on the surface thereof. The pattern drawing apparatus 1 includes: cameras 5a and 5d for photographing a plurality of marks 91 formed on the substrate 9; a coupling tool 52a for connecting the cameras 5a and 5d in an arrayed state in an X-axis direction (array direction); an array-direction moving mechanism 54a for integrally moving the cameras 5a and 5d in the X axis direction; and a main scanning mechanism 35 (scan direction moving mechanism) for moving a stage 2 in a Y-axis direction (scan direction).SELECTED DRAWING: Figure 8

Description

  The present invention relates to a technique for drawing a pattern on a substrate, and more particularly to a technique for specifying the position of a substrate. Substrates to be processed include semiconductor substrates, FPD (Flat Panel Display) substrates such as liquid crystal display devices and organic EL (Electroluminescence) display devices, optical disk substrates, magnetic disk substrates, magneto-optical disk substrates, and photomasks. Substrate, ceramic substrate, solar cell substrate, and printed circuit board.

  In some cases, a pattern drawing apparatus is used that draws a predetermined pattern by irradiating light onto a photosensitive material applied to a substrate. A conventional pattern drawing apparatus includes a stage that moves while holding the substrate in a horizontal posture, and a plurality of optical heads that irradiate light onto the upper surface of the substrate while moving the substrate. In the pattern drawing apparatus, a pattern is drawn at a predetermined position on the upper surface of the substrate by irradiating light intermittently from a plurality of optical heads while moving the substrate.

  In such a pattern drawing apparatus, an alignment process for correcting the position of the substrate held on the stage is performed in order to draw a pattern at an accurate position on the upper surface of the substrate. In the alignment process, for example, an alignment mark formed in advance on the upper surface of the substrate is photographed by an alignment camera in the apparatus, and the positional deviation of the substrate is corrected based on the photographed alignment mark image.

  As a prior art related to the present invention, there is one described in Patent Document 1, for example. Patent Document 1 describes that a plurality of alignment marks are photographed with an alignment camera.

JP 2009-192893 A

  By the way, when photographing a plurality of alignment marks (hereinafter referred to as “marks”) with a plurality of alignment cameras (hereinafter referred to as “cameras”), the respective cameras are arranged in the arrangement direction according to the positions of the marks. Move. And each mark can be efficiently image | photographed by moving a board | substrate relatively to the scanning direction which cross | intersects the arrangement direction of a camera with respect to each camera.

  However, in the case of using a plurality of cameras, the movement mechanism becomes complicated, for example, the operation axes for moving each camera in the arrangement direction are required by the number of cameras. For this reason, various problems, such as the cost increase of an apparatus and complication of control, generate | occur | produce.

  SUMMARY OF THE INVENTION An object of the present invention is to provide a technique for reducing the cost of the apparatus and the complexity of control when photographing a plurality of marks formed on a substrate with a plurality of cameras.

  In order to solve the above-described problem, a first aspect is a pattern drawing apparatus that draws a pattern on a substrate having a plurality of marks formed on a surface, the substrate holding unit that holds the substrate, and the marks on the substrate. A first camera group including a plurality of cameras to be photographed; a first connector for connecting the plurality of cameras of the first camera group in an array direction; and the first connector that is connected by the first connector. An arrangement direction moving mechanism for integrally moving the first camera group in the arrangement direction, and a scan direction for moving the first camera group relative to the substrate holder in a scan direction intersecting the arrangement direction. A moving mechanism.

  A 2nd aspect is a pattern drawing apparatus of a 1st aspect, Comprising: The said board | substrate holding | maintenance part can hold | maintain in the state which arranged the said some board | substrate in the said arrangement direction, The said 1st camera group is the said 1st connection By means of a tool, the marks formed at the same position on each of the plurality of substrates held by the substrate holding part are connected at intervals capable of being photographed.

  A 3rd aspect is a pattern drawing apparatus of the 1st aspect or the 2nd aspect, Comprising: The 2nd camera group containing the several camera which image | photographs the said mark in the said board | substrate, The said several camera of the said 2nd camera group A second connector that is connected in an arrangement state in the arrangement direction, and the arrangement direction moving mechanism moves the first camera group relative to the second camera group in the arrangement direction. In addition, the scan direction moving mechanism moves the first camera group and the second camera group integrally in the scan direction.

  A fourth aspect is the pattern drawing apparatus according to any one of the first aspect to the third aspect, wherein the first connector is capable of changing an interval between the plurality of cameras of the first camera group. Provide mechanism.

  A fifth aspect is a pattern drawing method for processing a substrate having a plurality of marks formed on the surface, wherein (a) a step of holding the substrate, (b) a first connection after the step (a) A step of integrally moving a first camera group including a plurality of cameras connected in a state of being arranged in an arrangement direction by a tool in the arrangement direction in accordance with the positions of the plurality of marks on the substrate; ) After the step (b), including a step of moving the first camera group relative to the substrate in a scanning direction intersecting the arrangement direction.

  According to the pattern drawing apparatus of the first aspect, since the first camera group is connected by the first connector, the moving mechanism can be simplified as compared with the case where each camera is individually moved in the arrangement direction. . For this reason, the cost increase of the apparatus and the complexity of the control can be reduced.

  According to the pattern drawing apparatus of the second aspect, each mark formed at the same position on each substrate by moving in the scanning direction can be photographed by the first camera group.

  According to the pattern drawing apparatus of the third aspect, a plurality of first and second camera groups coupled by the first coupling tool and the second coupling tool are relatively moved in the arrangement direction, so that a plurality of lines are arranged in the arrangement direction of the substrates. Each camera can be moved to the position of the mark. In this state, by moving the first and second camera groups in the scanning direction, it is possible to photograph multiple rows of marks.

  According to the pattern drawing apparatus of the fourth aspect, the first connecting tool can change the intervals of the plurality of cameras and connect them by the interval variable mechanism. Thereby, the interval between the cameras can be adjusted in accordance with the interval in the arrangement direction of the plurality of marks.

  According to the pattern drawing method of the fifth aspect, since the first camera group is connected by the first connector, the moving mechanism can be simplified as compared with the case where each camera is individually moved in the arrangement direction. . For this reason, the cost increase of the apparatus and the complexity of the control can be reduced.

FIG. 1 is a schematic side view showing a pattern drawing apparatus 1 according to the first embodiment. FIG. 2 is a schematic plan view showing the cameras 5a to 5f of the first embodiment. FIG. 3 is a schematic perspective view showing the cameras 5a and 5d and the arrangement direction moving mechanism 54a of the first embodiment. FIG. 4 is a schematic plan view showing the cameras 5a and 5d and the arrangement direction moving mechanism 54a of the first embodiment. FIG. 5 is a schematic perspective view showing the drawing head 60 of the first embodiment. FIG. 6 is a block diagram illustrating a configuration of the control unit 7 according to the first embodiment. FIG. 7 is a diagram illustrating a flow of mark position acquisition processing according to the first embodiment. FIG. 8 is a schematic plan view showing how the cameras 5a to 5f are moved in the arrangement direction. FIG. 9 is a schematic plan view showing the connector 52a1 of the second embodiment.

  Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. In addition, the component described in this embodiment is an illustration to the last, and is not a thing of the meaning which limits the scope of the present invention only to them. In the drawings, the size and number of each part may be exaggerated or simplified as necessary for easy understanding.

<1. First Embodiment>
FIG. 1 is a schematic side view showing a pattern drawing apparatus 1 according to the first embodiment. The pattern drawing apparatus 1 irradiates light (drawing light) spatially modulated in accordance with CAD data or the like on the upper surface of the substrate 9 on which a layer such as a resist is formed, thereby exposing (drawing) a pattern (for example, a circuit pattern). ). The substrate 9 to be processed by the pattern drawing apparatus 1 is, for example, a printed circuit board, a semiconductor substrate, a liquid crystal display device or an FPD (Flat Panel Display) substrate such as an organic EL (Electroluminescence) display device, an optical disk substrate, or a magnetic disk. Substrate, magneto-optical disk substrate, photomask substrate, ceramic substrate, solar cell substrate and the like. In the following description, it is assumed that the substrate 9 is formed in a rectangular plate shape.

  The pattern drawing apparatus 1 includes a base 15, a gate-shaped support frame 16, a stage 2, a stage driving mechanism 3, a stage position measuring unit 4, a camera 5, a drawing unit 6, and a control unit 7.

  The stage 2 is a holding unit that holds the substrate 9. The stage 2 is disposed on the base 15. Specifically, the stage 2 has, for example, a flat outer shape, and the substrate 9 is placed and held on the upper surface of the stage 2 in a horizontal posture. The stage 2 can hold a plurality of substrates 9 simultaneously. For example, a plurality of suction holes (not shown) are formed on the upper surface of the stage 2, and a negative pressure (suction pressure) is formed in the suction holes, so that the substrate 9 placed on the stage 2 is removed. It is fixedly held on the upper surface of the stage 2. The configuration for holding the substrate 9 is not limited to this. For example, the substrate 9 may be bonded onto the stage 2 using an adhesive sheet or the like.

<Stage drive mechanism 3>
The stage drive mechanism 3 moves the stage 2 relative to the base 15. The stage drive mechanism 3 is disposed on the base 15.

  Specifically, the stage drive mechanism 3 includes a rotation mechanism 31 that rotates the stage 2 in the rotation direction (rotation direction around the Z axis (θ axis direction)), and a support plate that supports the stage 2 via the rotation mechanism 31. 32 and a sub-scanning mechanism 33 that moves the support plate 32 in the sub-scanning direction (X-axis direction). The stage drive mechanism 3 further includes a base plate 34 that supports the support plate 32 via the sub-scanning mechanism 33, and a main scanning mechanism 35 that moves the base plate 34 in the main scanning direction (Y-axis direction).

  The rotation mechanism 31 rotates the stage 2 around a rotation axis A that passes through the center of the upper surface of the stage 2 (mounting surface of the substrate 9) and is perpendicular to the mounting surface. For example, the rotation mechanism 31 is provided at the lower end of the rotation shaft portion 311 and the rotation shaft portion 311 which are fixed to the back surface side of the mounting surface and extend along the vertical axis, and rotate the rotation shaft portion 311. A rotation drive unit (for example, a rotation motor) 312 may be included. In this configuration, the rotation drive unit 312 rotates the rotation shaft portion 311, whereby the stage 2 rotates about the rotation axis A in the horizontal plane.

  The sub-scanning mechanism 33 includes a linear motor 331 configured by a mover attached to the lower surface of the support plate 32 and a stator laid on the upper surface of the base plate 34. In addition, a pair of guide members 332 extending in the sub-scanning direction is laid on the base plate 34, and the guide members 332 slide between the guide members 332 and the support plate 32 while sliding on the guide members 332. Ball bearings that can move along are installed. That is, the support plate 32 is supported on the pair of guide members 332 via the ball bearing. When the linear motor 331 is operated in this configuration, the support plate 32 moves smoothly along the sub-scanning direction while being guided by the guide member 332.

  The main scanning mechanism 35 includes a linear motor 351 configured by a mover attached to the lower surface of the base plate 34 and a stator laid on the base 15. In addition, a pair of guide members 352 extending in the main scanning direction is laid on the base 15, and an air bearing is installed between each guide member 352 and the base plate 34, for example. Air is always supplied from utility equipment to the air bearing, and the base plate 34 is supported in a floating manner on the guide member 352 in a non-contact manner by the air bearing. When the linear motor 351 is operated in this configuration, the base plate 34 smoothly moves without friction along the main scanning direction while being guided by the guide member 352.

<Stage position measurement unit 4>
The stage position measurement unit 4 measures the position of the stage 2. Specifically, the stage position measurement unit 4 emits laser light from the outside of the stage 2 toward the stage 2 and receives the reflected light, for example. The stage position measurement unit 4 measures the position of the stage 2 (specifically, the Y position along the main scanning direction and the θ position along the rotation direction) from the interference between the reflected light and the emitted light. The laser length measuring instrument is configured.

<Camera 5>
The camera 5 is an optical device that takes an image of the upper surface of the substrate 9 held on the stage 2. The camera 5 is supported by the support frame 16. The camera 5 includes, for example, a lens barrel, a focusing lens, a CCD image sensor, and a drive unit. The lens barrel is connected to an illumination unit 500 that supplies illumination light for photographing (however, light having a wavelength that does not sensitize resist on the substrate 9 is selected as illumination light) via a fiber cable or the like. Has been. The CCD image sensor is composed of an area image sensor (two-dimensional image sensor) or the like. The drive unit is configured by a motor or the like, and drives the focusing lens to change its height position. The drive unit adjusts the height position of the focusing lens to perform autofocus.

  In the camera 5 having such a configuration, light emitted from the illumination unit 500 is introduced into the lens barrel and guided to the upper surface of the substrate 9 on the stage 2 via the focusing lens. The reflected light is received by the CCD image sensor. Thereby, photographing data of the mark 91 (see FIG. 8) formed on the upper surface of the substrate 9 is acquired. This photographing data is sent to the control unit 7 and used for alignment (positioning) of the substrate 9.

  The pattern drawing apparatus 1 includes six cameras 5. The six cameras 5 are attached to the support frame 16 in a state of being arranged in the X-axis direction. In the following description, the six cameras 5 are sequentially referred to as cameras 5a, 5b, 5c, 5d, 5e, and 5f from the + X side to the −X side.

  FIG. 2 is a schematic plan view showing the cameras 5a to 5f of the first embodiment. FIG. 3 is a schematic perspective view showing the cameras 5a and 5d and the arrangement direction moving mechanism 54a of the first embodiment. FIG. 3 is a diagram illustrating a state in which the arrangement direction moving mechanism 54a is viewed obliquely from the −Y side front surface toward the −X side. FIG. 4 is a schematic plan view showing the cameras 5a and 5d and the arrangement direction moving mechanism 54a of the first embodiment.

  First, as schematically shown in FIG. 2, two cameras 5a and 5d (first camera group) are connected by a connecting tool 52a (first connecting tool), and two cameras 5b and 5e (second camera group) are connected. ) Are connected by a connector 52b (second connector), and the two cameras 5c and 5f (third camera group) are connected by a connector 52c (third connector).

  Each of the couplers 52a to 52c is a member extending in the X-axis direction. The connector 52a connects the cameras 5a and 5d with a predetermined interval in the X-axis direction. Similarly, the connecting tools 52b and 52c connect the cameras 5b and 5e and the cameras 5c and 5f, respectively, in a state where they are arranged in parallel at a predetermined interval in the X-axis direction. In the present embodiment, the X-axis direction corresponds to the arrangement direction. In addition, in this embodiment, although each connector 52a-52c has connected the two cameras 5, respectively, you may connect the three or more cameras 5. FIG.

  The pattern drawing apparatus 1 includes an arrangement direction moving mechanism 54 (54a, 54b, 54c). The arrangement direction moving mechanism 54a integrally moves the cameras 5a and 5d, the arrangement direction moving mechanism 54b integrally moves the cameras 5b and 5e, and the arrangement direction moving mechanism 54c integrally moves the cameras 5c and 5f in the X axis direction. The arrangement direction moving mechanisms 54a to 54c are provided in multiple stages in the vertical direction (Z-axis direction).

  As shown in detail in FIGS. 3 and 4, the arrangement direction moving mechanism 54 a includes a ball screw 541, a rotation drive unit 542, slide units 543 a and 543 b, and a guide unit 544.

  The ball screw 541 and the guide part 544 extend in the X-axis direction. The ball screw 541 is accommodated in the guide portion 544. The rotation drive unit 542 rotates the ball screw 541 around the X axis.

  The guide portion 544 holds the slide portions 543a and 543b so as to be movable in the X-axis direction. Specifically, the guide part 544 holds the slide parts 543a and 543b so as to be slidable from above and below. The guide part 544 regulates the movement direction so that the slide parts 543a and 543b move only in the X-axis direction.

  The ball screw 541 passes through the slide portions 543a and 543b in the X-axis direction. The slide portion 543 a has a screw hole that is screwed into the ball screw 541. The slide portion 543b has an insertion hole 543H having an inner diameter larger than the outer diameter (thread diameter) of the ball screw 541. The slide portion 543b is held by the guide portion 544 without being in contact with the ball screw 541.

  A connector 52a is arranged on the −Y side of the guide portion 544. And the connection tool 52a is connected with the slide parts 543a and 543b hold | maintained inside the guide part 544. FIG. As shown in FIG. 3, cameras 5a and 5d are attached to the surface on the −Y side of the connector 52a. The slide part 543a is provided at a position overlapping the camera 5a in the Y axis direction, and the slide part 543b is provided at a position overlapping the camera 5d in the Y axis direction.

  When the rotation drive unit 542 rotates the ball screw 541 in the forward or reverse direction, the slide unit 543a moves in the + X direction or the −X direction. As the slide portion 543a moves, the connector 52a moves in the + X direction or the -X direction. At this time, the slide portion 543b connected to the connector 52a is guided by the guide portion 544 and moves in the + X direction or the −X direction. Further, as the connector 52a moves in the + X direction or the −X direction, the cameras 5a and 5d move integrally in the + X direction or the −X direction.

  The arrangement direction moving mechanisms 54b and 54c have the same configuration as the arrangement direction movement mechanism 54a. The arrangement direction moving mechanisms 54a to 54c move the couplers 52a to 52c in the X-axis direction so as not to contact each other.

  Returning to FIG. 1, the drawing unit 6 is an optical device that forms drawing light. The pattern drawing apparatus 1 includes a plurality of (for example, five) drawing units 6. However, it is not essential that the number of the drawing units 6 to be mounted is plural, and may be one.

  FIG. 5 is a schematic perspective view showing the drawing head 60 of the first embodiment. The drawing unit 6 includes a drawing head 60, a light source device 61, a spatial light modulation device 62, and a projection optical system 63. The light source device 61, the spatial light modulation device 62, and the projection optical system 63 are supported by the support frame 16 (see FIG. 1). Specifically, for example, the light source device 61 is accommodated in an accommodation box placed on the top plate of the support frame 16. The spatial light modulation device 62 and the projection optical system 63 are accommodated in an accommodation box fixed to the + Y side of the support frame 16.

  The light source device 61 emits light toward the drawing head 60. Specifically, the light source device 61 includes, for example, a laser oscillator that emits laser light. The light source device 61 includes an illumination optical system 613 that converts light (spot beam) emitted from a laser oscillator into linear light having a uniform intensity distribution (that is, a line beam having a light beam cross-section in a band shape). The illumination optical system 613 guides the light output from the light source device 61 to the spatial light modulation device 62. The illumination optical system 613 includes, for example, a lens 614 and a mirror 615.

  The spatial light modulation device 62 includes, for example, a DMD (digital micromirror device). The DMD includes a group of micro mirror surfaces whose directions can be individually changed. A large number of micromirror surfaces are formed on a silicon substrate, and the large number of micromirror surfaces are arranged in two dimensions (that is, arranged in an array aligned in two directions perpendicular to each other).

  In the spatial light modulation device 62, each micromirror surface is inclined by a predetermined angle with respect to the surface of the silicon substrate by electrostatic action in accordance with the data written in the memory cell corresponding to each micromirror surface. Then, light (that is, spatially modulated light) formed only by the reflected light from the micro-mirror surface in a posture corresponding to the predetermined ON state is guided to the projection optical system 63. As the spatial light modulation device 62, a GLV (Grating Light Valve) which is a reflection type and diffraction grating type spatial light modulator may be employed.

  The light spatially modulated by the spatial light modulation device 62 is guided to the substrate 9 (see FIG. 1) on the stage 2 by the projection optical system 63. The light from the projection optical system 63 is irradiated to the irradiation region on the substrate 9 that is optically conjugate with respect to the micromirror surface group of the spatial light modulation device 62.

  FIG. 6 is a block diagram illustrating a configuration of the control unit 7 according to the first embodiment. The control unit 7 is electrically connected to each unit included in the pattern drawing device 1 and controls the operation of each unit of the pattern drawing device 1 while executing various arithmetic processes.

  The control unit 7 is configured as a general computer in which a CPU 71, a ROM 72, a RAM 73, a storage device 74, and the like are interconnected via a bus line 75. The ROM 72 stores basic programs and the like. The RAM 73 is used as a work area when the CPU 71 performs a predetermined process. The storage device 74 is configured by a non-volatile storage device such as a flash memory or a hard disk device. A program PG is installed in the storage device 74. In accordance with the procedure described in the program PG, the CPU 71 as the main control unit performs arithmetic processing, so that the control unit 7 includes the substrate data processing unit 711, the array direction movement control unit 713, the scan direction movement control unit 715, It functions as an image processing unit 717. Each function may be realized by hardware configured by a dedicated logic circuit.

  The substrate data processing unit 711 captures substrate data related to the substrate 9 placed on the stage 2. The board data includes the size of the board 9 and position information on the board 9 where the mark 91 is formed. The board data is stored in the storage device 74, for example. From the substrate data taken in by the substrate data processing unit 711, the placement position of the substrate 9 on the stage 2 is specified. Further, the position (X axis coordinate and Y axis coordinate) of the mark 91 on the substrate 9 placed on the stage 2 in the pattern drawing apparatus 1 can be specified from the substrate data.

  The arrangement direction movement control unit 713 controls movement of the plurality of cameras 5a to 5f in the arrangement direction (X-axis direction) by controlling the arrangement direction movement mechanisms 54a to 54c. Here, the arrangement direction movement control unit 713 aligns each of the cameras 5a to 5f with the X axis as the arrangement direction in accordance with the X axis direction positions of the plurality of marks 91 specified from the board data captured by the board data processing unit 711. Move in the direction.

  The scanning direction movement control unit 715 moves the stage 2 in the Y-axis direction by controlling the main scanning mechanism 35 (scanning direction movement mechanism). By moving the stage 2 in the Y-axis direction, the substrate 9 can be moved in the Y-axis direction. Accordingly, the substrate 9 can be moved relative to the plurality of cameras 5 or the plurality of drawing heads 60 in the Y-axis direction (scanning direction).

  The image processing unit 717 specifies the position of the mark 91 by performing image processing on image data obtained by photographing each of the cameras 5a to 5f.

  The control unit 7 includes an input unit 76, a display unit 77, and a communication unit 78 connected to the bus line 75. The input unit 76 is an input device configured by a keyboard and a mouse, for example, and accepts various operations (operations such as inputting commands and various data) from the operator. The input unit 76 may be configured with various switches, a touch panel, and the like. The display unit 77 is a display device that includes a liquid crystal display device, a lamp, and the like, and displays various types of information under the control of the CPU 71. The communication unit 78 has a data communication function for transmitting / receiving commands and data to / from an external device via a network.

  FIG. 7 is a diagram illustrating a flow of mark position acquisition processing according to the first embodiment. First, the substrate 9 carried into the pattern drawing apparatus 1 from the outside is carried onto the stage 2, and the substrate 9 is held at a fixed position on the stage 2 (step S10). The number of substrates 9 held on the stage 2 may be one or plural.

  When the loading of the substrate 9 is completed, the mark position acquisition process is started. Specifically, the control unit 7 takes in the substrate data (step S11). More specifically, the substrate data processing unit 711 reads, from the storage device 74, the substrate data in which the position information of the mark 91 on the substrate 9 held on the stage 2 and the size of the substrate 9 are recorded. When substrate data relating to a plurality of types of substrates is stored in the storage device 74, the substrate data processing unit 711 refers to a processing recipe in which the types of substrates to be processed, processing contents, and the like are recorded, or is designated by an operator. The substrate 9 held on the stage 2 may be specified by receiving

  Subsequently, the substrate data processing unit 711 converts the coordinate system on the substrate 9 into the X-axis / Y-axis coordinate system in the pattern drawing apparatus 1 based on the substrate data (step S12). Specifically, the substrate data processing unit 711 specifies a position (held position) held on the stage 2 based on the size of the substrate 9 obtained from the substrate data. Then, the substrate data processing unit 711 obtains a coordinate conversion formula for converting the coordinate system on the substrate 9 into the X-axis / Y-axis coordinate system in the pattern drawing apparatus 1 from the held position.

  Subsequently, the substrate data processing unit 711 calculates the movement start positions of the cameras 5a to 5f (step S13). Specifically, the X-axis coordinates of the plurality of marks 91 formed on the substrate 9 are specified based on the substrate data in which the position information of the mark 91 is recorded and the coordinate conversion formula obtained in step S12. These X-axis coordinates are taken as the movement start positions of the cameras 5a to 5f.

  After step S13, the arrangement direction movement control unit 713 moves the cameras 5a to 5f in the X axis direction in accordance with the position of the mark 91 in the X axis direction (arrangement direction) (step S14). In the present embodiment, the cameras 5a and 5d, the cameras 5b and 5e, and the cameras 5c and 5f are coupled by the coupling tools 52a to 52c, and thus move integrally in the X-axis direction. In step S <b> 14, the arrangement direction movement control unit 713 moves the cameras 5 a to 5 f so as to correspond to the positions of the plurality of marks 91 in the X-axis direction.

  FIG. 8 is a schematic plan view showing how the cameras 5a to 5f are moved in the arrangement direction. In the example shown in FIG. 8, two substrates 9 of the same size are held on the stage 2 so as to be arranged in parallel at a predetermined interval in the X-axis direction. Each substrate 9 has a rectangular shape. A total of eight marks 91 are formed on each substrate 9. Specifically, the mark 91 is formed at each of the four corners of each substrate 9 and at each center of the four sides of each substrate 9. That is, on each substrate 9 held on the stage 2, six rows of marks 91 arranged in the Y-axis direction are arranged in three rows in the X-axis direction.

  Here, the rows of the three marks 91 on the + X side substrate 9 are sequentially referred to as mark rows 92a, 92b, and 92c from the + X side to the −X side. Further, the rows of the three marks 91 on the −X side substrate 9 are sequentially referred to as mark rows 92d, 92e, and 92f from the + X side to the −X side. Each of the mark rows 92a, 92c, 92d, and 92f includes three marks 91 arranged at equal intervals in the Y-axis direction, and each of the mark rows 92b and 92e includes two marks 91 arranged at equal intervals in the Y-axis direction. .

  The interval between the cameras 5a and 5d connected by the connector 52a is equal to the interval between the mark rows 92a and 92d. Therefore, as shown in FIG. 8, when the arrangement direction movement control unit 713 aligns the X-axis direction position of the camera 5a with the mark row 92a, the X-axis direction position of the camera 5d is matched with the mark row 92d.

  Similarly, the interval between the cameras 5b and 5e connected by the connector 52b is equal to the interval between the mark rows 92b and 92e. Therefore, when the arrangement direction movement control unit 713 matches the X-axis direction position of the camera 5b with the mark row 92b as shown in FIG. 8, the X-axis direction position of the camera 5e matches the mark row 92e of the −X side substrate 9. It is done.

  Further, the interval between the cameras 5c and 5f connected by the connector 52c is equal to the interval between the mark rows 92c and 92f. Therefore, when the arrangement direction movement control unit 713 matches the X-axis direction position of the camera 5c with the mark row 92c as shown in FIG. 8, the X-axis direction position of the camera 5f is matched with the mark row 92f.

  Returning to FIG. 7, when the arrangement direction movement control unit 713 moves each of the cameras 5a to 5f to the photographing start position, the scanning direction movement control unit 715 moves the stage 2 in the Y-axis direction that is the scanning direction (step S15). . Thereby, each of the cameras 5a to 5f photographs each mark 91 passing below.

  When one relative movement in the Y-axis direction with respect to the substrate 9 of the cameras 5a to 5f is completed in step S15, the control unit 7 determines whether or not all the marks 91 have been photographed based on the substrate data. (Step S16). When there is an unphotographed mark 91 (No in step S16), the control unit 7 executes steps S13 to S15 again. In this way, steps S13 to S16 are repeatedly executed until shooting of all the marks 91 to be shot is completed. When photographing of all the marks 91 is completed (Yes in step S16), the control unit 7 ends the mark acquisition process.

  In the example shown in FIG. 8, as described above, the cameras 5a to 5f are arranged at positions in the X-axis direction corresponding to the mark rows 92a to 92f in step S14. From this state, by moving the substrate 9 relative to the cameras 5a to 5f in the + Y direction (scan direction) in step S15, the marks 91 constituting the mark rows 92a to 92f can be photographed. . In this example, it is possible to photograph all the marks 91 formed on the two substrates 9 by one scan in the + Y direction.

  As described above, in the pattern drawing apparatus 1, the plurality of cameras 5a to 5f are arranged in the X-axis direction. Therefore, a plurality of rows (mark rows 92a to 92f in the example shown in FIG. 8) are arranged in the X-axis direction by the relative movement of the cameras 5a to 5f in one scanning direction (Y-axis direction). A plurality of marks 91 can be photographed. Therefore, the photographing time of the mark 91 can be shortened.

  Further, a plurality of cameras 5 (for example, cameras 5a and 5d) arranged in parallel in the X-axis direction can be connected to move integrally in the X-axis direction. For this reason, a moving mechanism can be simplified rather than the case where the mechanism to which each camera 5 is moved to an X-axis direction independently is provided. Therefore, an increase in cost of the pattern drawing apparatus 1 due to the provision of the plurality of cameras 5 can be reduced. In addition, since the control mechanism can be simplified, the complexity of the control can be reduced.

<2. Second Embodiment>
Next, a second embodiment will be described. In the following description, elements having the same functions as the elements already described may be denoted by the same reference numerals or symbols added with alphabetic characters, and detailed description may be omitted.

  FIG. 9 is a schematic plan view showing the connector 52a1 of the second embodiment. The couplers 52a to 52c may include a configuration that makes the couplers 52a to 52c longer or shorter in the X-axis direction.

  As shown in FIG. 9, the connection tool 52a1 of 2nd Embodiment connects the cameras 5a and 5d similarly to the connection tool 52a. The connecting tool 52a1 includes a pair of fixing members 521a and 521b, a connecting member 522, and fixing tools 523a and 523b.

  The fixing member 521a has one side (−Y side) fixed to the camera 5a and the other side (+ Y side) fixed to the slide portion 543a. The fixing member 521b has one side fixed to the camera 5d and the other side fixed to the slide portion 543b.

  The connecting member 522 is a member formed in a long plate shape extending in the X-axis direction. End portions on both sides of the connecting member 522 are connected to the fixing members 521a and 521b by the fixing tools 523a and 523b, respectively. The fixing tools 523a and 523b are members that connect the connecting member 522 to the fixing members 521a and 521b so that the connection can be released. The fixing tools 523a and 523b are fastening means such as bolts, for example.

  In the connector 52a1, the connecting member 522 can be attached and detached. For this reason, the space | interval of the X-axis direction between the cameras 5a and 5d can be changed by connecting between the fixing members 521a and 521b by the connection member 522 of different length. Thereby, the space | interval between the cameras 5a and 5d can be changed corresponding to the space | interval of the X-axis direction of the some mark 91. FIG.

  In the connecting tool 52a1, the fixing members 521a and 521b, the connecting member 522, and the fixing tools 523a and 523b are an example of an interval variable mechanism that can change the interval between the two cameras 5a and 5d. The interval variable mechanism is not limited to such a configuration.

  For example, in the connection tool 52a1, for example, when the fixing tool 523a is a bolt, a plurality of bolt insertion holes arranged in the X-axis direction may be provided in the + X side end portion (or the fixing member 521a) of the connection member 522. In this case, the connection position of the connection member 522 connected to the fixing member 521a can be changed by changing the bolt insertion hole through which the fixing tool 523a passes. Therefore, the connecting tool 52a1 can be lengthened or shortened, and these can be connected while the interval between the cameras 5a and 5d is variable. In addition, in connection member 522 (or fixing member 521a), instead of providing a plurality of bolt insertion holes, a long bolt insertion hole extending in the X-axis direction may be provided.

  Although the present invention has been described in detail, the above description is illustrative in all aspects, and the present invention is not limited thereto. It is understood that countless variations that are not illustrated can be envisaged without departing from the scope of the present invention. The configurations described in the above embodiments and modifications can be appropriately combined or omitted as long as they do not contradict each other.

DESCRIPTION OF SYMBOLS 1 Pattern drawing apparatus 2 Stage 3 Stage drive mechanism 35 Main scanning mechanism (scan direction moving mechanism)
5a, 5d camera (first camera group)
5b, 5e camera (second camera group)
5c, 5f camera (third camera group)
52a, 52a1 connector (first connector)
52b connector (second connector)
52c Connector 54a-54c Array direction moving mechanism 541 Ball screw 542 Rotation drive part 543H Insertion hole 543a, 543b Slide part 544 Guide part 6 Drawing unit 60 Drawing head 7 Control part 711 Substrate data processing part 713 Array direction movement control part 715 Scan direction Movement control unit 9 Substrate 91 Mark 92a to 92f Mark row

Claims (5)

A pattern drawing apparatus for drawing a pattern on a substrate having a plurality of marks formed on a surface thereof,
A substrate holder for holding the substrate;
A first camera group including a plurality of cameras for photographing the mark on the substrate;
A first connector for connecting the plurality of cameras of the first camera group in a state of being arranged in an arrangement direction;
An arrangement direction moving mechanism for integrally moving the first camera group connected by the first connector in the arrangement direction;
A scanning direction moving mechanism that relatively moves the first camera group in a scanning direction intersecting the arrangement direction with respect to the substrate holding unit;
A pattern drawing apparatus. The pattern drawing apparatus according to claim 1,
The substrate holding unit can hold a plurality of the substrates arranged in the arrangement direction,
The first camera group is connected to the first drawing by a pattern drawing in which the marks formed at the same position of each of the plurality of substrates held by the substrate holding part are connected at intervals capable of photographing. apparatus. The pattern drawing apparatus according to claim 1 or 2,
A second camera group including a plurality of cameras that photograph the mark on the substrate;
A second connector for connecting the plurality of cameras of the second camera group in a state of being arranged in the arrangement direction;
Further comprising
The arrangement direction moving mechanism moves the first camera group relative to the second camera group in the arrangement direction, and
The pattern drawing apparatus, wherein the scan direction moving mechanism moves the first camera group and the second camera group integrally in the scan direction. The pattern drawing apparatus according to any one of claims 1 to 3,
The first connector includes a variable pattern mechanism that can change a distance between the plurality of cameras of the first camera group. A pattern drawing method for processing a substrate having a plurality of marks formed on a surface thereof,
(a) holding the substrate;
(b) After the step (a), a first camera group including a plurality of cameras connected in a state of being arranged in the arrangement direction by the first connector is adjusted to the positions of the plurality of marks on the substrate. A step of integrally moving in the arrangement direction;
(c) after the step (b), moving the first camera group relative to the substrate in a scan direction intersecting the arrangement direction;
A pattern drawing method including:

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