JP2017072693A - Hologram structure - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a hologram structure excellent in forgery preventing property and designing property.SOLUTION: The hologram structure has a hologram layer having a reflective hologram formation region and a transmissive hologram formation region, and a vapor deposition layer formed to be in contact with a rugged surface of the reflective hologram formation region of the hologram layer. A phase type Fourier transform hologram, which converts incident light from a point light source into a desired optical image is recorded in the reflective hologram formation region and the transmissive hologram formation region.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a hologram structure having excellent anti-counterfeiting properties and design properties.

A hologram is the one where the wavefront of object light is recorded on the photosensitive material as interference fringes by interfering two lights with the same wavelength (object light and reference light), and the same wavelength as the reference light at the time of interference fringe recording When the light is applied, a diffraction phenomenon occurs due to interference fringes, and the same wavefront as the original object light can be reproduced. Holograms are widely used for anti-counterfeiting and the like because they have advantages such as beautiful appearance and relatively difficult replication.
As a method of using a hologram, a method of reproducing as a light image by transmitting or reflecting reference light with respect to the hologram is known.
For example, Patent Document 1 describes that authentication is performed using an optical image reproduced by projecting diffracted light reflected by a laser reflection hologram onto a screen.

Japanese Patent No. 487964

  However, there is a problem that it is difficult to impart a high level of anti-counterfeiting effect and a design with only a light image projected on a screen as described in Patent Document 1.

  The present invention has been made in view of the above problems, and has as its main object to provide a hologram structure excellent in forgery prevention and design.

  In order to achieve the above object, the present invention provides a hologram layer having a reflection hologram formation region and a transmission hologram formation region, and a vapor deposition layer formed so as to be in contact with the uneven surface of the reflection hologram formation region of the hologram layer. And a phase-type Fourier transform hologram that converts light incident from a point light source into a desired optical image is recorded in the reflection hologram formation region and the transmission hologram formation region. A hologram structure is provided.

According to the present invention, light incident from a point light source is converted into a desired light image in a reflection hologram formation region and a transmission hologram formation region (hereinafter, both regions may be collectively referred to as a hologram formation region). Since the phase-type Fourier transform hologram is recorded, the hologram structure can reproduce an optical image in a hologram forming region in a plan view by a point light source.
Further, the hologram structure has a reflection hologram formation region and a transmission hologram formation region, so that depending on the position of the point light source, that is, whether the point light source is the observation surface side or the opposite side of the observation surface, Different light images can be observed.
For this reason, the hologram structure has excellent anti-counterfeiting properties and design properties.

In the present invention, it is preferable that the reflection hologram formation region and the transmission hologram formation region overlap in plan view.
By overlapping the two regions in plan view, it is possible to reproduce the optical images recorded in the reflection hologram forming region and the transmission hologram forming region in the same region in plan view of the hologram structure.
Therefore, for example, the hologram structure provides different designs by changing the position of the point light source in the same area, or only an observer who knows that both areas are formed in the same area. In addition, information can be provided by changing the position of the point light source.
This is because the hologram structure is excellent in anti-counterfeiting and design properties when the two regions overlap in plan view.

In the present invention, a phase type Fourier transform hologram for recording light incident from a point light source into the optical image is recorded in at least one of the reflection hologram formation region and the transmission hologram formation region of the hologram layer. It is preferable that a hologram cell and a diffraction grating cell which is formed on the same plane as the hologram cell and draws a diffraction grating pattern by being arranged in a pattern in plan view are preferably arranged. The hologram structure can reproduce both the optical image and the diffraction grating pattern in the hologram forming region.
Therefore, by combining the optical image and the diffraction grating pattern, the hologram structure becomes excellent in anti-counterfeiting and design properties.

  In the present invention, the diffraction grating pattern is preferably a planar diffraction grating pattern that can reproduce the pattern in a planar manner. This is because the hologram structure is excellent in anti-counterfeiting and design properties by being able to combine a plane diffraction grating pattern and an optical image. Moreover, it is easy to make the plane diffraction grating pattern high in brightness, and a diffraction grating pattern with excellent visibility can be reproduced.

  In the present invention, the diffraction grating pattern is preferably a three-dimensional diffraction grating pattern that can be reproduced three-dimensionally. This is because it becomes possible to combine a three-dimensional diffraction grating pattern and an optical image, so that the hologram structure has excellent anti-counterfeiting properties and design properties.

  In the present invention, the hologram structure preferably has an adhesive layer formed on the surface of the vapor deposition layer opposite to the hologram layer, and is used as a hologram seal. This is because the hologram structure can easily impart anti-counterfeiting properties and design properties to the adherend by being used as a hologram seal.

  In the present invention, the hologram structure is a heat seal layer formed on the surface of the vapor deposition layer opposite to the hologram layer, and a release formed on the surface of the hologram layer opposite to the vapor deposition layer. It has an easy layer and a peeling substrate formed on the surface of the easy peeling layer opposite to the hologram layer, and is preferably used as a hologram transfer foil. This is because the hologram structure can easily impart anti-counterfeiting and design properties to the adherend by being used as a hologram transfer foil.

  In the present invention, the hologram structure is preferably used as an information recording medium. This is because the hologram structure is excellent in anti-counterfeiting properties and design properties, and therefore can be an information recording medium excellent in anti-counterfeiting properties and design properties.

  The present invention has an effect that a hologram structure excellent in forgery prevention and design properties can be provided.

It is a schematic plan view which shows an example of the hologram structure of this invention. It is the sectional view on the AA line of FIG. It is a schematic plan view which shows the other example of the hologram structure of this invention. FIG. 4 is a sectional view taken along line BB in FIG. 3. It is explanatory drawing explaining the usage example of the hologram structure of this invention. It is explanatory drawing explaining the usage example of the hologram structure of this invention. It is explanatory drawing explaining the reproducing method of the optical image using a hologram structure. It is explanatory drawing explaining the reproducing method of the optical image using a hologram structure. It is explanatory drawing explaining the reproducing method of the optical image using a hologram structure. It is a schematic plan view explaining the hologram formation area in the present invention. It is explanatory drawing explaining arrangement | positioning of the hologram cell in this invention. It is explanatory drawing explaining the uneven | corrugated surface of the hologram cell in this invention. It is explanatory drawing explaining the hologram cell in this invention. It is explanatory drawing explaining arrangement | positioning of the hologram formation area in this invention. It is explanatory drawing explaining arrangement | positioning of the hologram formation area in this invention. It is explanatory drawing explaining arrangement | positioning of the hologram formation area in this invention. It is a schematic plan view which shows the other example of the hologram structure of this invention. It is CC sectional view taken on the line of FIG. It is explanatory drawing explaining the usage example of the hologram structure of this invention. It is explanatory drawing explaining the diffraction grating pattern in this invention. It is explanatory drawing explaining the diffraction grating cell in this invention. It is explanatory drawing explaining the image display layer in this invention. It is a schematic sectional drawing which shows the other example of the hologram structure of this invention. It is a schematic sectional drawing which shows the other example of the hologram structure of this invention. It is a schematic sectional drawing which shows the other example of the hologram structure of this invention. It is a schematic sectional drawing which shows the other example of the hologram structure of this invention. It is a schematic sectional drawing which shows the other example of the hologram structure of this invention.

Hereinafter, the hologram structure of the present invention will be described in detail.
The hologram structure of the present invention has a hologram layer having a reflection hologram formation region and a transmission hologram formation region, and a vapor deposition layer formed so as to be in contact with the uneven surface of the reflection hologram formation region of the hologram layer. The reflection hologram forming area and the transmission hologram forming area are recorded with a phase type Fourier transform hologram that converts light incident from a point light source into a desired optical image. is there.

Such a hologram structure of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic plan view showing an example of a hologram structure of the present invention, and FIG. 2 is a cross-sectional view taken along line AA of FIG.
FIG. 3 is a schematic plan view showing another example of the hologram structure of the present invention, and FIG. 4 is a cross-sectional view taken along the line BB of FIG.
As illustrated in FIGS. 1 to 4, the hologram structure 10 of the present invention includes a hologram layer 1 having a reflection hologram formation region 11 and a transmission hologram formation region 12, and the reflection hologram formation of the hologram layer 1. A vapor deposition layer 2 formed so as to be in contact with the concavo-convex surface of the region 11, and the light incident from the point light source is converted into a desired light image in the reflective hologram forming region 11 and the transmission hologram forming region 12. A phase-type Fourier transform hologram to be converted is recorded.

1 to 4 show an example in which a transparent substrate 3 is laminated on the surface of the hologram layer 1 opposite to the vapor deposition layer 2.
1 to 4 show holograms on which phase-type Fourier transform holograms are recorded, in which the reflection-type hologram formation region 11 and the transmission-type hologram formation region 12 each convert light incident from a point light source into the optical image. A cell that converts light incident from a point light source arranged on the observation surface side as a cell into a desired light image (hereinafter, simply referred to as a reflection type cell) 11a and an observation surface. This example shows an example in which a plurality of light sources 12a that convert light incident from a point light source into a desired light image (hereinafter simply referred to as a transmissive cell) 12a are arranged.
FIG. 1 and FIG. 2 show an example in which a reflection hologram forming region 11 and a transmission hologram forming region 12 have an overlapping region 13 that overlaps in plan view, and the reflection hologram forming region 11 and the transmission hologram forming region 12 all overlap. Is shown. 3 and 4 show an example in which the reflection hologram forming region 11 and the transmission hologram forming region 12 are arranged so as not to overlap in plan view but to be separated from each other in plan view.

  In FIG. 1 and FIG. 3, the description of the transparent base material is omitted for easy explanation. In FIG. 1, a region surrounded by a broken line is a reflection hologram forming region 11 and a transmission hologram forming region 12. In FIG. 3, the area surrounded by the broken line is the reflection hologram forming area 11, and the area surrounded by the one-dot broken line is the transmission hologram forming area 12.

According to the present invention, a phase-type Fourier transform hologram that records light incident from a point light source into a desired optical image is recorded in the hologram forming region, so that the hologram structure is viewed in plan by the point light source. An optical image can be reproduced in the upper hologram forming area.
In addition, the hologram structure has a reflection hologram formation region and a transmission hologram formation region, so that when a point light source is arranged on the observation surface side with respect to the hologram structure, a dot is formed in the reflection hologram formation region. When the light source is arranged on the side opposite to the observation surface, the optical image recorded in each hologram forming area can be clearly reproduced in the transmission hologram forming area.
On the other hand, when the point light source is arranged on the observation surface side with respect to the transmission hologram forming region and when the point light source is arranged on the side opposite to the observation surface with respect to the reflection hologram forming region, the respective hologram formation The optical image recorded in the area cannot be reproduced clearly.
For this reason, the hologram structure can observe different light images depending on the position of the point light source, that is, whether the point light source is on the observation surface side or the opposite side of the observation surface.

For example, by recording different light images in the reflection hologram formation region and the transmission hologram formation region, the point light source 31 is arranged on the observation surface side as shown in FIG. 5 (FIG. 5A). The observer 30 has a light image (hereinafter sometimes referred to as a first light image) 21 recorded in the reflection hologram forming region 11 in the reflection hologram forming region 11 (in FIG. “2”) can be observed, and as shown in FIG. 6, by arranging the point light source 31 on the side opposite to the observation surface (FIG. 6A), the observer 30 can enter the transmission hologram forming region 12. It is possible to observe an optical image (hereinafter sometimes referred to as a second optical image) 22 (the numeral “3” in FIG. 6B) recorded in the transmission hologram forming region 12.
As described above, the hologram structure can observe different light images depending on the position of the point light source, that is, whether the point light source is on the observation surface side or the opposite side of the observation surface.
Therefore, for example, the hologram structure provides different designs by changing the position of the point light source, or provides information by changing the position of the point light source only to an observer who knows the existence of both regions. It becomes possible.
In addition, the hologram structure can reproduce the first light image in the reflection hologram formation area by sunlight during the daytime, and can enter the transmission hologram formation area by light such as stars, moon, illumination, and fireworks at night. Different light images can be reproduced in the daytime and at night, such as the second light image being reproducible.
Thus, the hologram structure has excellent anti-counterfeiting properties and design properties.
5 and 6 show an example in which the hologram structure has an overlapping region 13 where the reflection hologram forming region 11 and the transmission hologram forming region 12 overlap in plan view.

In addition, the hologram structure can easily perform authenticity determination and design development without separately preparing a screen or the like for projecting an optical image.
Furthermore, since the optical image can be reproduced only when receiving light from a point light source, the hologram structure has excellent anti-counterfeiting properties and design properties.

The hologram structure of the present invention has a hologram layer and a vapor deposition layer.
Hereinafter, each configuration in the hologram structure of the present invention will be described.

1. Hologram layer The hologram layer in the present invention has a reflection hologram formation region and a transmission hologram formation region.

(1) Reflective hologram forming area The reflective hologram forming area is an area where a phase type Fourier transform hologram that converts light incident from a point light source into a desired optical image is recorded.

Here, the recording of the phase type Fourier transform hologram means that the phase information of the Fourier transform image obtained through the Fourier transform of the original image is multi-valued and recorded as the depth. Therefore, an uneven surface is formed in the reflection hologram forming region of the hologram layer in which the phase Fourier transform hologram is recorded.
The hologram layer converts light incident from a point light source into a desired light image, that is, functions as a Fourier transform lens, by the difference in height of the uneven shape that forms the uneven surface of the reflection hologram forming region. With such a function, light incident from an arbitrary point light source is diffracted in a plurality of predetermined directions, and a predetermined image is formed as an optical image. The above function may be referred to as a “Fourier transform lens function”.

  The reflection hologram forming area is a reflection type, and when a point light source is arranged on the observation surface side and the hologram layer is viewed in plan from the observation surface side, an optical image can be reproduced in the reflection hologram formation area. Is.

  The reflection hologram forming area refers to an area in which light incident from a point light source can be converted into a desired optical image, and specifically, a rectangular with a minimum area that can include all of the reflection cells. It is an area surrounded by.

The size of the reflection hologram forming area in plan view is such that the entire image of the optical image is visible in the reflection hologram forming area, and the optical image reproduced in the reflection hologram forming area. In addition, it is preferable that the size of the diffraction grating pattern be easily visible to an observer.
As illustrated in FIG. 7, when the planar size of the reflection hologram forming region 11 is small and the position of the point light source 31 from the hologram structure 10 is far (FIG. 7A), the observer 30 In some cases, only a part of the entire image of the first light image 21 (the letter “E” in FIG. 7) is visible (FIG. 7B). Further, as illustrated in FIG. 8, in order to make it possible to visually recognize all the entire images of the first light image 21 in the reflection hologram forming region 11 having a small size in plan view, the point light source 31 is provided with the hologram structure 10. In this case, the size of the reproduced first optical image 21 (the letter “E” in FIG. 8) is small, and the observer 30 It becomes difficult to visually recognize the information displayed by the first light image 21 (FIG. 8B).
On the other hand, as illustrated in FIG. 9, even when the point light source 31 is separated from the hologram structure 10 when the reflection-type hologram forming region 11 has a planar view size of a predetermined size or more. (FIG. 9A), the observer 30 can visually recognize all of the entire image of the first optical image 21 (the letter “E” in FIG. 9) in the reflection hologram forming region 11 (FIG. 9 ( b)). Further, the viewer 30 can easily view the information displayed by the reproduced first light image 21.

In the present invention, the size in plan view is preferably in the range of 5 mm square to 50 mm square, particularly preferably in the range of 5 mm square to 30 mm square, particularly 5 mm square to 15 mm square. It is preferable to be within the following range. This is because, when the lower limit of the size in plan view is within the above-described range, the hologram structure can easily see the optical image in the reflection hologram forming region. As a result, the anti-counterfeiting property and the design property are excellent.
In addition, since the upper limit of the size in plan view is within the above-described range, the hologram structure can be reduced in cost, and an image display layer or the like for displaying an image used in combination with an optical image or the like can be formed. This is because it becomes easy.
In addition, the planar view size of the reflection hologram forming region being 5 mm square or more means that the reflection hologram forming region has a planar view shape including at least a 5 mm square area. Therefore, when the reflective hologram forming region is rectangular, it means that the length of the short side is 5 mm or more, and when the reflective hologram forming region is square, It means that the length of one side is 5 mm or more.

As shown in FIG. 10 (a), the reflection hologram forming region is composed of one hologram cell on which a phase type Fourier transform hologram is recorded, which converts light incident from a point light source into the optical image. Although it may be a reflection hologram forming region 11 (hereinafter, simply referred to as a single hologram region) composed of one reflection cell 11a, as shown in FIG. This is a reflection hologram forming region 11 (hereinafter sometimes referred to as a large format hologram region) in which a plurality of reflection cells 11a are arranged and enlarged.
Note that “E” in FIG. 10 is a first optical image 21 that is expressed in a single or large hologram region.

When the reflection hologram forming area is a large hologram area, the reflection hologram forming area can be accurately formed as a planar view size of the reflection cell which is an individual hologram cell constituting the reflection hologram forming area. If it is.
The size in plan view is preferably in the range of 0.25 mm square to 5 mm square. This is because, when the size in plan view is within the above-described range, the hologram structure can easily reproduce the optical image in the reflection hologram forming region.
Note that the size in plan view refers to the size of the smallest square that can include a reflective cell. Accordingly, when the reflective cell is a square with a side of 1 mm, the size in plan view is 1 mm square. Further, when the shape of the reflective cell in plan view is a circle having a diameter of 1 mm, the size in plan view is 1 mm square.

  The ratio of the area of the reflection type cell in the reflection type hologram forming area in plan view is not particularly limited as long as a desired optical image can be reproduced, but it is 25% or more. Of these, 50% or more is desirable. This is because, since the area ratio is in the above-described range, the hologram structure can clearly reproduce an optical image.

The distribution in the reflection hologram forming region of the reflection type cell may be uniform or may be uneven in distribution.
The optical image recorded in the reflective hologram forming area tends to be reproduced with high definition in an area where many reflective cells are distributed in the reflective hologram forming area.
For this reason, when the distribution is uniform, the hologram structure can reproduce an optical image with uniform definition in the reflection hologram formation region.
On the other hand, when the distribution is biased, the hologram structure can reproduce a light image with high definition in a region where a large number of reflective cells are distributed in the reflective hologram forming region. Because.
For example, as illustrated in FIG. 11A, when the total area of the reflection type cell 11a is larger in the B region than in the A region, when the point light source is arranged on the observation surface side, it is illustrated in FIG. Thus, the first optical image 21 recorded in the reflection hologram forming area 11 (the number “2” in FIG. 11B) is clearly reproduced in the area B of the reflection hologram forming area 11. , A area can be reproduced with lower definition than B area.
Note that the reflection hologram forming region 11 in FIG. 11A has a flat region 11b where surface irregularities are not formed at a location where the reflection type cell 11a is not disposed. In addition to such a flat region, a diffraction cell, a transmission cell, etc., which will be described later, are disposed at a location where the reflective cell is not disposed, so that the distribution of the reflective cell can be biased.
The distribution is, for example, the total of the reflection-type cells formed in the adjacent divided rectangular areas by dividing the reflection-type hologram forming area into two, three, four, nine, etc. in the same shape rectangle. It can be evaluated by comparing the areas. FIG. 11 shows an example in which the reflection hologram forming region is evaluated by dividing it into two rectangles having the same shape.

  The planar shape of the reflective cell may be any shape as long as it can form a reflective hologram forming region having a desired planar shape. Specifically, the shape in plan view is a square shape, a rectangular shape, a trapezoidal shape, a triangular shape, a pentagonal shape, a hexagonal shape or other polygonal shape, a circular shape, an elliptical shape, a star shape, a heart shape, or the like. However, from the viewpoint of easy formation of the reflection hologram forming region, a square shape or a rectangular shape is usually used.

The uneven shape on the uneven surface of the reflection type cell is obtained by arranging a plurality of multi-valued Fourier transform images formed on the basis of image data of an original image to be displayed as a light image in a vertical and horizontal direction to a desired range. This corresponds to the pattern of the Fourier transform image.
As a method for forming such a concavo-convex surface of the reflective cell in the reflective hologram forming region, any method can be used as long as it can form a concavo-convex surface capable of converting light incident from a point light source into a desired optical image. A conventional Fourier transform hologram forming method can be used.
Specifically, the above forming method forms a master original having an uneven pattern corresponding to a Fourier transform image, and the unevenness of the original is applied to a coating film of a resin material such as an ultraviolet curable resin formed on a substrate such as PET. The method of forming the uneven | corrugated surface of a reflection type cell by transferring a pattern can be mentioned.
Moreover, the hologram layer which has the reflection type hologram formation area | region where the several reflection type cell is arrange | positioned can be formed by performing transcription | transfer of the uneven | corrugated pattern of a master original plate several times.

As a method for forming a master original plate, a Fourier transform image is formed by calculation based on image data of an original image to be displayed. Next, the data obtained by converting the Fourier transform image data into a binary value or more is converted into electron beam drawing data, and the electron beam drawing data is arranged in a desired range. For example, 10 pieces of electron beam drawing data are arranged in the vertical and horizontal directions. Next, a method of creating a master original with an electron beam drawing apparatus based on the arranged data for electron beam drawing can be used.
When binarized data of the Fourier transform image is used as the electron beam drawing data, the uneven shape of the uneven surface is a two-step uneven shape as shown in FIG. In the case of using a valuated one, a four-step uneven shape is formed as shown in FIG.
In the present invention, it is preferable that the data of the Fourier transform image is multivalued to four or more values, that is, the concavo-convex shape is a concavo-convex shape having four or more steps. In the hologram structure, in which a Fourier transform image is obtained by binarization, the optical image reproduced in the reflection hologram forming region displays two images having a mirror image relationship, whereas four hologram images are displayed. In the case of the one obtained by the multi-value conversion more than the value conversion, the light image reproduced in the reflection hologram forming region can display one image. For this reason, the hologram structure can set the shape of the optical image with a high degree of freedom.

The lattice pitch on the uneven surface may be any as long as it can convert light incident from a point light source into a desired light image.
Specifically, the lattice pitch is preferably in the range of 1.0 μm to 80.0 μm. This is because, when the grating pitch is within the above-described range, the hologram structure can easily reproduce the optical image into the reflection hologram forming region.
Note that the lattice pitch refers to, for example, the width indicated by P in FIG.

Here, as illustrated in FIG. 13, the point light source 31 is disposed at a predetermined distance L1 with respect to the reflective hologram forming region 11 of the hologram structure 10, and the predetermined distance L2 from the reflective hologram forming region 11. When the observer 30 observes the reflection hologram forming area 11 at the position of (2), in order for the observer 30 to observe the entire image of the optical image in the entire area of the reflection hologram forming area 11, the following expression is used for the grating pitch: (1) can be established.
Λ is the wavelength of the diffracted light, P is the grating pitch of the concavo-convex surface, θ1 is the incident angle for reaching the end of the reflective hologram forming region from the light source, and θ2 is the diffraction from the end of the reflective hologram forming region. The diffraction angle for light to reach the observer, and n is the order of diffraction.
P = nλ / (sin θ1 + sin θ2) (1)

As a specific calculation example of the grating pitch, when the reflection hologram forming region is a square shape having a side of 15 mm, L1 is 50 mm, L2 is 300 mm, and light has a wavelength of 550 nm, sin θ2 = 0. Is 025 and sin θ1 = 0.148, and the grating pitch P necessary for the observer to observe the entire image of the optical image in the entire area of the reflection hologram forming area is calculated to be 3179 nm at the shortest.
Further, when the reflection hologram forming region is a square shape having a side of 15 mm, L1 is 1990 mm, L2 is 2000 mm, and light having a wavelength of 550 nm, sin θ2 = 0.00374 and sin θ1 = 0.00377. The lattice pitch P is calculated to be 73236 nm at the shortest.
Further, when the reflection hologram forming region is a square shape having a side of 10 mm, L1 is 60 mm, L2 is 60 mm, and light has a wavelength of 550 nm, sin θ2 = 0.083 and sin θ1 = 0.083. The lattice pitch P is calculated to be 3313 nm at the shortest.

The depth of the uneven shape may be any depth as long as a desired optical image can be reproduced. The depth can be, for example, in the range of 0.05 μm to 0.5 μm, and in particular, the depth is preferably in the range of 0.1 μm to 0.2 μm. This is because, when the depth is within the above-described range, the hologram structure can stably reproduce the optical image.
For example, the depth is indicated by D in FIG.

As for the depth of the concavo-convex shape, when the concavo-convex shape on the concavo-convex surface of the reflective hologram forming region is a quaternary type (four steps) obtained by converting the Fourier transform image data into a quaternary type (four steps), In the region, the following expression (2) can be established.
Note that λ is the wavelength of the diffracted light as in the formula (1).
D = λ / 6 + λ / 12 (2)

  As a specific calculation example of the depth of the concavo-convex shape, when light having a wavelength of 550 nm is diffracted in the reflection hologram forming region, the concavo-convex depth D is calculated as 550 nm / 6 + 550 nm / 12≈140 nm. .

  In the reflective hologram forming region, the wavelength of the point light source capable of exhibiting the above-described Fourier transform lens function is not particularly limited, and a desired wavelength can be targeted. Further, the wavelength of the point light source is not limited to monochromatic light of one wavelength, but may be light including multiple wavelengths, and may be white light.

(2) Transmission hologram forming area The transmission hologram forming area is an area in which a phase Fourier transform hologram that converts light incident from a point light source into a desired optical image is recorded.

  The transmission hologram forming area is usually formed on the same plane as the reflection hologram forming area. Here, being formed on the same plane means that the reflection type cell and the transmission type cell are formed on the same surface of the hologram layer. That is, both the uneven surface of the reflective cell and the uneven surface of the transmission cell are formed on the same surface of the hologram layer.

  The transmission hologram forming region is a region in which a point light source is arranged on the side opposite to the observation surface, and a light image can be reproduced in the transmission hologram formation region when the hologram layer is viewed in plan from the observation surface side. .

  The transmission hologram forming region can be the same as the contents described in the section “(1) Reflection hologram forming region” except for the depth of the concave and convex shapes, and the description thereof is omitted here. .

  The depth of the uneven shape may be any depth as long as a desired optical image can be reproduced. The depth can be, for example, in the range of 0.5 μm to 1.5 μm, and preferably in the range of 0.6 μm to 1.2 μm. This is because, when the depth is within the above-described range, the hologram structure can stably reproduce the optical image.

As for the depth of the concavo-convex shape, when the concavo-convex shape on the concavo-convex surface of the transmission hologram forming region is a quaternary type (four steps) obtained by converting the Fourier transform image data into a quaternary type (four steps), In the region, the following equation (3) can be established.
Note that λ is the wavelength of the diffracted light as in the formula (1).
D = λ + λ / 2 (3)

  As a specific calculation example of the depth of the concavo-convex shape, assuming that light having a wavelength of 550 nm is diffracted, the concavo-convex depth D is calculated as 550 nm + 550 nm / 2≈825 nm in the transmission hologram forming region.

(3) Arrangement of hologram forming region The reflection hologram forming region and the transmission hologram forming region may not overlap in plan view, but preferably overlap in plan view.
By overlapping the two regions in plan view, it is possible to reproduce the optical images recorded in the reflection hologram forming region and the transmission hologram forming region in the same region in plan view of the hologram structure.
Therefore, for example, the hologram structure provides different designs by changing the position of the point light source in the same area, or only an observer who knows that both areas are formed in the same area. In addition, information can be provided by changing the position of the point light source.
Further, the hologram structure has an unexpected feature that different light images can be reproduced depending on the position of the point light source in the same region, and only the reflection hologram forming region is formed, that is, the point light source. It is possible to disguise that the optical image is reproduced only when the is placed on the observation surface side.
This is because the hologram structure is more excellent in anti-counterfeiting and design properties when the two regions overlap in plan view.

  1 and 2 described above show an example in which the reflection hologram forming region 11 and the transmission hologram forming region 12 overlap in plan view, and FIGS. 3 and 4 show the reflection hologram forming region 11. In addition, an example in which the transmission hologram forming regions 12 are arranged apart from each other without overlapping in plan view is shown.

  In addition, when the reflection hologram forming area and the transmission hologram forming area are in contact with each other, the two areas are adjacent to each other without overlapping in plan view, and are included when both areas do not overlap in plan view. It is.

When the reflection hologram formation region and the transmission hologram formation region overlap in plan view, at least one region needs to be a large hologram region.
Therefore, as a combination of hologram forming areas when both areas overlap, as shown in FIG. 14A, the reflection hologram forming area 11 is a single hologram area, and the transmission hologram forming area 12 is a large hologram area. 14B, a combination in which the reflection hologram forming region 11 is a large hologram region and the transmission hologram forming region 12 is a single hologram region as illustrated in FIG. 14B, and is illustrated in FIG. 14C. As described above, the reflection hologram forming area 11 and the transmission hologram forming area 12 are either a combination of large areas.

When the reflection hologram formation region and the transmission hologram formation region overlap in plan view, the overlapping state of both regions may be a state in which at least a part of the reflection hologram formation region and the transmission hologram formation region overlap each other. It is preferable that all of one region is included in the other region. The hologram structure has an unexpected feature that different light images can be reproduced depending on the position of the point light source in the same region, and is excellent in wearing as if only a reflective hologram forming region is formed. Because it becomes a thing.
In addition, when all of one area is included in the other area, the overlapping state of both areas is that all of at least one of the reflection hologram forming area and the transmission hologram forming area is included in the other area. As long as both regions overlap, that is, both regions having the same shape in plan view are arranged in the same region, the reflection hologram forming region, the transmission hologram forming region, and the overlapping of both It is preferable that the regions are in the same position in plan view. Since it becomes possible to reproduce two optical images in the same region of the hologram structure, for example, it becomes more excellent by having unexpectedness, wearing only a reflection type hologram forming region, etc. . For this reason, the hologram structure is excellent in design and anti-counterfeiting properties.
14A to 14C described above show an example in which only a part of the reflection hologram formation region and the transmission hologram formation region overlap each other.
FIGS. 15A and 15B show examples in which one of the reflection hologram formation region and the transmission hologram formation region is included in the other region having a larger area than the one region. FIG. 15C shows an example in which both areas having the same planar view shape are arranged at the same place and all the areas overlap.

The arrangement of the reflection type cell and the transmission type cell in the overlapping region where the reflection type hologram formation region and the transmission type hologram formation region overlap in plan view is such that a desired optical image is obtained in each of the reflection type hologram formation region and the transmission type hologram formation region. As long as it is reproducible. In the above arrangement, for example, as illustrated in FIG. 14C described above, a reflective cell assembly in which one or more reflective cells are arranged in a strip shape and one or more transmissive cells are arranged in a strip shape. Stripes in which transmissive cell assemblies are alternately arranged, as illustrated in FIGS. 15C and 15D, which have already been described, and a reflective cell assembly including one or more reflective cells and one or more transmissions The transmission cell aggregate including the type cells may be a grid pattern or the like alternately arranged in the first direction and the second direction orthogonal to the first direction.
In FIG. 14C, two band-like reflective cell aggregates and transmissive cell aggregates are alternately arranged, and four band-shaped reflective cell aggregates and four transmissive cell aggregates are provided. An example including a reflective cell and a transmissive cell is shown.
FIG. 15 (c) includes eight reflective cell assemblies and transmissive cell assemblies, each of which has one reflective cell and one transmissive cell assembly. An example including this is shown.
FIG. 15D includes two reflective cell assemblies and two transmissive cell assemblies, each having four reflective cell assemblies and four transmissive cell assemblies. An example including a cell is shown.

The total area occupied by the reflection type cells and the total area occupied by the transmission type cells in the entire overlapping area where the reflection type hologram formation area and the transmission type hologram formation area overlap in plan view may be the same or different. May be. Since the total area of each of the reflection type cell and the transmission type cell in the overlapping region is the same, the hologram structure is recorded in the optical image recorded in the reflection type hologram forming region and the transmission type hologram forming region in the overlapping region. This is because the reproduced optical image can be reproduced with the same degree of definition.
In addition, since the total area of each of the reflection type cell and the transmission type cell in the overlapping region is different, the hologram structure is recorded in the optical image recorded in the reflection type hologram forming region and the transmission type hologram forming region in the overlapping region. This is because the reproduced optical image can be reproduced with different sharpness.
For example, as illustrated in FIG. 16A, when the total area of the reflective cells 11a in the overlapping region 13 is larger than the total area of the transmissive cells 12a, the hologram structure is illustrated in FIG. As described above, when the point light source is arranged on the observation surface side, the first optical image 21 recorded in the reflection hologram forming region 11 can be reproduced clearly, while being illustrated in FIG. In addition, when the point light source is arranged on the side opposite to the observation surface, the second optical image 22 recorded in the transmission hologram forming area 12 can be reproduced more clearly than the first optical image. . By adopting such a configuration, for example, it becomes easy to dispose if only the reflection hologram formation region is formed as the hologram formation region, and the hologram structure is observed to know the existence of the transmission hologram formation region. It becomes easy to provide information only to a person.
As described above, the difference in the sharpness of the optical image can be provided depending on the position of the point light source, so that the hologram structure has excellent design properties and anti-counterfeiting properties.
FIG. 16 shows an example in which the reflection hologram forming region 11 and the transmission hologram forming region 12 all overlap.

(4) Diffraction grating cell In the hologram formation region, only a hologram cell in which a phase Fourier transform hologram is recorded that converts light incident from a point light source into the optical image may be disposed. At least one of the reflection hologram formation region and the transmission hologram formation region is formed on the same plane as the hologram cell and the hologram cell, and a diffraction grating pattern is drawn by being arranged in a pattern in plan view. The diffraction grating cell to be arranged may be arranged.
A hologram cell in which a phase-type Fourier transform hologram is recorded that converts light incident from a point light source into a desired light image and a diffraction grating cell that draws a diffraction grating pattern are disposed in the hologram formation region. Both the optical image and the diffraction grating pattern can be reproduced in the hologram forming area.
For example, when the reflective hologram forming region has a reflective cell and a diffraction grating cell, both the optical image and the diffraction grating pattern can be reproduced in the reflective hologram forming region.
Therefore, by combining the optical image and the diffraction grating pattern, the hologram structure is excellent in anti-counterfeiting and design properties.

A hologram structure in which hologram cells and diffraction grating cells are arranged in the hologram forming region will be described with reference to the drawings.
FIG. 17 is a schematic plan view showing another example of the hologram structure, and FIG. 18 is a cross-sectional view taken along the line CC of FIG.
As illustrated in FIG. 17 and FIG. 18, the hologram structure 10 of the present invention converts light incident from a point light source into a desired optical image in both the reflection hologram formation region 11 and the transmission hologram formation region 12. The reflection type cell 11a and the transmission type cell 12a, which are hologram cells on which phase type Fourier transform holograms are recorded, are formed on the same plane as these hologram cells (11a and 12a), and are formed in a pattern in plan view. The diffraction grating cell 14a which draws the diffraction grating pattern 14 by being arrange | positioned shall be arrange | positioned.
17 and 18 show an example in which the diffraction grating pattern 14 is a letter “F” drawn by the diffraction grating cell 14a.

A usage example of a hologram structure in which diffraction grating cells are arranged in the hologram forming region will be described with reference to the drawings.
FIG. 19 is an explanatory diagram for explaining an example of use of the hologram structure. As shown in FIG. 19 (a), for example, before reproducing an optical image that receives reference light such as sunlight and does not have a point light source disposed therein, it is drawn as a diffraction grating pattern 14 in the reflection hologram forming region 11. Only the letter “F” is observed, and as shown in FIG. 19B, after reproducing the optical image in which the point light source is arranged on the reflection hologram forming region 11, the diffraction grating pattern 14 and the first optical image 21 are obtained. Thus, an example in which the hologram structure is used so that the letter “E” is observed can be given.
Thus, for example, an observer who does not know that a reflective cell capable of reproducing an optical image is arranged in addition to a diffraction grating cell that draws a diffraction grating pattern in the hologram formation area, that is, the hologram formation area is a diffraction grating cell. An observer who does not know that it is a reflection hologram forming region only observes the letter “F” and only an observer who knows that the reflection type cell is arranged. , “E” can be observed.
As described above, the hologram structure of the present invention has, for example, an anti-counterfeiting effect by allowing only an observer who knows the configuration of the hologram structure to recognize an image combining a light image and a diffraction grating pattern. It can be expressed.
FIG. 19 shows an example in which the hologram forming area where the diffraction grating cells are arranged is the reflection hologram forming area 11.

  Here, being formed on the same plane means that the hologram cell and the diffraction grating cell are formed on the same surface of the hologram layer. That is, the hologram cell, that is, both the uneven surface of the reflection type cell and the transmission type cell and the uneven surface of the diffraction grating cell are formed on the same surface of the hologram layer.

The location of the diffraction grating cell may be a hologram forming region, that is, at least one of a reflection hologram forming region and a transmission hologram forming region, but may be formed in both regions. Good.
FIG. 17 and FIG. 18 already described show examples in which the diffraction grating cell 14a is formed in both regions (11 and 12), and more specifically, overlap between both regions (11 and 12). An example in which only the region 13 is formed is shown.

The diffraction grating pattern is one in which a pattern having a diffraction grating cell is reproduced by irradiating visible light as reference light.
Here, the diffraction grating pattern is a pattern drawn by diffraction grating cells arranged in a pattern in plan view. The original pattern is divided into, for example, grid-like fine cells, and the divided fine cells are diffraction gratings. It is drawn by replacing with a cell.
FIG. 17 that has already been described shows an example in which the diffraction grating pattern 14 is drawn by arranging the diffraction grating cells 14 a in the pattern of the letter “F”. , The letter “F” is reproduced as the diffraction grating pattern 14 in the reflection hologram formation region 11 and the transmission hologram formation region 12.

As the above-mentioned pattern, it is preferable that anti-counterfeiting and design properties can be improved by combining with a light image.
Specifically, the design can be appropriately set according to the use of the hologram structure of the present invention, and examples thereof include patterns, line drawings, characters, figures, symbols and the like.
In addition, as a pattern that can improve the anti-counterfeiting property and the design property in comparison with the case of the light image alone by combining with the light image, specifically, examples shown in FIGS. 20 (a) and (b). As shown in FIG. 20C, an arrow pointing to the reproduction location of the optical image, a frame surrounding the reproduction location of the optical image, a symbol used to recognize the optical image such as a character indicating the reproduction location of the optical image, When the optical image represents a part of the graphic as illustrated in (d), the pattern representing the other part of the graphic, illustrated in FIGS. 17, 20 (e) and 20 (f) already described. Thus, when the light image is an image representing a part of a character string or a number sequence, a pattern representing another part of the character string or the number sequence, and when the light image is an image representing the sun, The above holo such as a symbol representing the background of clouds, sky, etc. It can be given a design such as to form an image with one unity in combination with the light image to be reproduced ram forming region.
20 (a), (c), and (e) each show a state before optical image reproduction, and FIGS. 20 (b), (d), and (f) each show a state during optical image reproduction. Is shown.
In FIGS. 20A and 20B, the diffraction grating pattern 14 is an arrow indicating a reproduction position of the first optical image 21 in the reflection hologram forming region 11. 20C and 20D, the diffraction grating pattern 14 is a part of an ellipse and can display one ellipse in combination with other parts of the ellipse indicated by the first light image 21. is there. 20E and 20F, the diffraction grating pattern 14 is a part of the character string “real” and is combined with the other part of the character string “real” shown by the first optical image 21. One meaningful character string “real” can be displayed.
FIG. 20 shows an example in which the hologram forming area where the diffraction grating cells are arranged is the reflective hologram forming area 11.

The diffraction grating symbol may be a planar diffraction grating symbol that can reproduce the symbol in plan, or a three-dimensional diffraction grating symbol that can reproduce the symbol in three dimensions.
Since the diffraction grating pattern is a plane diffraction grating pattern, it becomes possible to combine the plane diffraction grating pattern and the optical image, so that the hologram structure has excellent anti-counterfeiting and design properties. It is. Moreover, it is easy to make the plane diffraction grating pattern high in brightness, and a diffraction grating pattern with excellent visibility can be reproduced.
Since the above-mentioned diffraction grating pattern is a three-dimensional diffraction grating pattern, it becomes possible to combine a three-dimensional diffraction grating pattern and an optical image, so that the hologram structure has excellent anti-counterfeiting and design properties. is there.
The diffraction grating pattern may be a plane diffraction grating pattern, a three-dimensional diffraction grating pattern, or a combination of both.

As a method for forming the above-mentioned plane diffraction grating pattern, a method can be used in which the diffraction grating pattern is drawn using diffraction grating cells having the same amplitude of diffracted light.
Further, as a method for making the amplitude of the diffracted light to be approximately the same, as described in Japanese Patent No. 4998438, a region where the diffraction grating of the diffraction grating cell is formed (hereinafter simply referred to as a diffraction grating formation region). In the same area). That is, the plane diffraction grating pattern can be drawn by spreading diffraction grating cells having the same area of the diffraction grating formation region. In addition, as for the area of the diffraction grating forming region, the diffraction grating cell having the same area as the diffraction grating forming region may be used as long as the plane diffraction grating pattern can be reproduced. It is appropriately set according to the size of the diffraction grating pattern, the presence or absence of color display, and the like.

Examples of a method for forming the three-dimensional diffraction grating pattern include a method in which a diffraction grating cell having a large amplitude of diffracted light is arranged closer to the center than to the end of the diffraction grating.
More specifically, in FIG. 17, the letter “F” is drawn by drawing lines in which three diffraction grating cells are arranged in the width direction (for example, 14a1, 14a2, and 14a3). In this case, by making the diffraction grating cell 14a2 arranged at the center side closer to the diffraction grating cells 14a1 and 14a3 arranged at the end side in the width direction of the drawing line, a diffraction grating cell having a larger amplitude of diffracted light, When the reference light is irradiated, it is possible to reproduce the character “F” so that it appears three-dimensionally.
Further, as a method of increasing the amplitude of the diffracted light from the end side to the center side, as described in Japanese Patent No. 498494938, the diffraction grating forming region has a wide area from the end side to the center side. A method of arranging lattice cells can be mentioned. In other words, the three-dimensional diffraction grating pattern may have a diffraction grating cell in which the area of the diffraction grating forming region is larger than the end part side of the diffraction grating pattern.
For example, as illustrated in FIG. 21, which is an enlarged view of the diffraction grating cells 14a1 to 14a3 in FIG. 17, the diffraction grating cells 14a1 and 14a3 arranged on the end side in the width direction of the drawing line are closer to the center side. The arranged diffraction grating cell 14a2 can be a diffraction grating cell having a wide area of the diffraction grating forming region 14b.

The ratio of the area of the diffraction grating cell in the hologram forming region in plan view is not particularly limited as long as a desired diffraction grating pattern can be drawn.
The ratio of the total area of the diffraction grating cells to the total area of the reflection cells in the reflection hologram formation area (total area of diffraction grating cells / total area of reflection cells) and the above in the transmission hologram formation area As a ratio of the total area of the diffraction grating cell to the total area of the transmission cell (total area of the diffraction grating cell / total area of the transmission cell), both the optical image and the diffraction grating pattern can be reproduced clearly. Although not particularly limited, in the case where the diffraction grating pattern is a plane diffraction grating pattern, it is preferably within a range of 1/4 to 3/2. 1 is preferable, and 5/8 to 7/8 is particularly preferable. This is because, when the area ratio is within the above range, the hologram structure has excellent visibility of both the optical image and the planar diffraction grating pattern.
Further, the ratio of the area (the total area of the diffraction grating cells / the total area of the reflection type cells and the total area of the diffraction grating cells / the total area of the transmission type cells) is determined when the diffraction grating pattern is a three-dimensional diffraction grating pattern. Are preferably in the range of 1/3 to 3, particularly preferably in the range of 2/3 to 2, and particularly preferably in the range of 1 to 5/3. . This is because, when the area ratio is within the above-described range, the hologram structure has excellent visibility of both the optical image and the three-dimensional diffraction grating pattern.

The grating pitch, grating angle, and grating density (area ratio of the grating cell occupied by the diffraction grating cell with respect to the pattern) of the diffraction grating cell are appropriately set according to the pattern reproduced when the reference light is irradiated. Is.
For example, by setting the grating pitch to about 1.2 μm, about 1.0 μm, and about 0.8 μm, respectively, the light for wavelengths of 600 nm (for red), 500 nm (for green), and 400 nm (for blue) is diffracted, respectively. By doing so, a color image can be reproduced.
Further, various symbols can be expressed by the lattice angle and the lattice density.

  The size of the diffraction grating cell in plan view can be appropriately set according to the diffraction grating pattern to be reproduced, and can be set to, for example, 5 μm square or more and 100 μm square or less. This is because a high-definition diffraction grating pattern can be drawn with the size in plan view. In addition, it is possible to conceal the existence of individual diffraction grating cells for drawing a diffraction grating pattern.

  The shape of the diffraction grating cell in plan view can be appropriately set according to the diffraction grating pattern to be reproduced. For example, the reflection type cell described in the section “(1) Reflection hologram forming region” The same can be said.

  The method of forming the concavo-convex surface of the diffraction grating cell in the hologram forming region can be the same as the general diffraction grating pattern forming method.

The reference light used for reproducing the diffraction grating pattern is not particularly limited, and those used for general holograms can be used.
Specifically, light including visible light can be used as the reference light.
For example, the reference light can be the same as the point light source used for reproducing the optical image recorded in the hologram cell in the hologram forming area. This is because the diffraction grating pattern can be reproduced simultaneously with the reproduction of the optical image recorded in the hologram forming area.
The light source of the reference light is not limited to a point light source, and may be parallel light or the like.
For example, the hologram structure can be reproduced in a bright place where reference light from a light source other than the point light source is irradiated, and in the bright place, the point light source is placed on the hologram forming region. The optical image can also be reproduced by arranging in the position.

(5) Others The material constituting the hologram layer is not particularly limited as long as it can form an uneven shape for exhibiting the above-described Fourier transform lens function in the hologram forming region and exhibits a predetermined refractive index. . The refractive index of the material constituting the hologram layer is not particularly limited, and can be appropriately set according to the use of the hologram structure of the present invention.
Moreover, the wavelength used as the reference | standard of the said refractive index is not specifically limited, What is necessary is just to select suitably from the range of 400 nm-750 nm. In particular, in the present invention, the refractive index at a wavelength of 555 nm is preferably in the range of 1.3 to 2.0, and particularly preferably in the range of 1.33 to 1.8. Here, the refractive index can be measured by a spectroscopic ellipsometer.

  As a material of the hologram layer, resin materials conventionally used for forming relief holograms, for example, cured products of curable resins such as thermosetting resins, ultraviolet curable resins, ionizing radiation curable resins, A thermoplastic resin or the like can be used.

  Examples of the thermosetting resin include unsaturated polyester resins, acrylic modified urethane resins, epoxy modified acrylic resins, epoxy modified unsaturated polyester resins, alkyd resins, and phenol resins. Examples of the thermoplastic resin include acrylate resin, acrylamide resin, nitrocellulose resin, polystyrene resin, and the like. These resins may be homopolymers or copolymers composed of two or more components. Moreover, these resin may be used independently and may use 2 or more types together.

  The thermosetting resin or thermoplastic resin described above includes various isocyanate compounds, metal soaps such as cobalt naphthenate and zinc naphthenate, organic peroxides such as benzoyl peroxide and methyl ethyl ketone peroxide, benzophenone, acetophenone, anthraquinone, naphthoquinone, A thermal or ultraviolet curing agent such as azobisisobutyronitrile or diphenyl sulfide may be included.

  Examples of the ionizing radiation curable resin include an epoxy-modified acrylate resin, a urethane-modified acrylate resin, an acrylic-modified polyester resin, and the like. Among them, a urethane-modified acrylate resin is preferable, and particularly shown in JP-A-2007-017643. A urethane-modified acrylic resin represented by the following chemical formula is preferred.

  When the ionizing radiation curable resin is cured, a monofunctional or polyfunctional monomer, oligomer, or the like can be used in combination for the purpose of adjusting the cross-linked structure and viscosity. Examples of the monofunctional monomer include mono (meth) acrylates such as tetrahydrofurfuryl (meth) acrylate, hydroxyethyl (meth) acrylate, vinylpyrrolidone, (meth) acryloyloxyethyl succinate, and (meth) acryloyloxyethyl phthalate. Etc. In addition, as a bifunctional or higher monomer, classified according to a skeleton structure, polyol (meth) acrylate (for example, epoxy-modified polyol (meth) acrylate, lactone-modified polyol (meth) acrylate, etc.), polyester (meth) acrylate, epoxy (meth) ) Acrylate, urethane (meth) acrylate, other polybutadiene, isocyanuric acid, hydantoin, melamine, phosphoric acid, imide, phosphazene, and other poly (meth) acrylates. Furthermore, various monomers, oligomers, and polymers that are ultraviolet and electron beam curable can be used.

  More specifically, examples of the bifunctional monomer and oligomer include polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and 1,6-hexanediol di (meth). An acrylate etc. are mentioned. Examples of the trifunctional monomer, oligomer, and polymer include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, and aliphatic tri (meth) acrylate. Examples of tetrafunctional monomers and oligomers include pentaerythritol tetra (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, and aliphatic tetra (meth) acrylate. Examples of pentafunctional or higher functional monomers and oligomers include dipentaerythritol penta (meth) acrylate and dipentaerythritol hexa (meth) acrylate. Examples of the monomer and oligomer include (meth) acrylate having a polyester skeleton, a urethane skeleton, and a phosphazene skeleton. The number of functional groups is not particularly limited, but if the number of functional groups is less than 3, the heat resistance tends to decrease, and if it exceeds 20, the flexibility tends to decrease. The thing within the range of 3-20 is preferable.

  The content of the monofunctional or polyfunctional monomer and oligomer as described above can be appropriately adjusted, but it is usually preferably 50 parts by weight or less with respect to 100 parts by weight of the ionizing radiation curable resin. The range of 0.5 to 20 parts by weight is preferable.

  In addition, the hologram layer may be a photopolymerization initiator, a polymerization inhibitor, an anti-degradation agent, a plasticizer, a lubricant, a colorant such as a dye or pigment, a surfactant, an antifoaming agent, a leveling agent, a thixotropic property, if necessary. You may add additives, such as an imparting agent, suitably.

The film thickness of the hologram layer is preferably in the range of 0.05 mm to 5 mm, more preferably in the range of 0.1 mm to 3 mm, when the hologram layer has self-supporting properties. On the other hand, when the hologram layer does not have a self-supporting property and is formed on a transparent substrate to be described later, the film thickness of the hologram layer is preferably within a range of 0.1 μm to 50 μm, particularly 2 μm to 20 μm. It is preferable to be within the range.
The film thickness of the hologram layer is specifically the distance indicated by a in FIGS. 2 and 4 already described.
The size of the hologram layer in plan view can be appropriately set according to the use of the hologram structure of the present invention.

The hologram layer in the present invention has at least a hologram forming region, but may have a region where a concavo-convex shape is not formed (non-hologram forming region) in addition to the hologram forming region.
The proportion of each region in the hologram layer is not particularly limited and can be appropriately selected depending on the application.

2. Vapor deposition layer The vapor deposition layer in this invention is formed so that the uneven | corrugated surface of the said reflection type hologram formation area of the said hologram layer may be touched.

As a formation place of a vapor deposition layer, what is necessary is just to cover the uneven | corrugated surface of a reflection type hologram formation area at least.
Here, covering at least the uneven surface of the reflective hologram forming area means covering the uneven surface of all the reflective cells constituting the reflective hologram forming area. It is preferable to cover the surface. This is because it is easy to form a vapor deposition layer.
Moreover, it is preferable that the said formation location covers the uneven | corrugated surface of the said transmission type hologram formation area of the said hologram layer. This is because the hologram structure can easily reproduce the optical image recorded in the transmission hologram forming region.
The said formation location may cover the whole surface of the surface in which the uneven | corrugated surface of the hologram layer was formed. This is because the vapor deposition layer can be easily formed.
Note that FIG. 2 described above shows an example in which the above-mentioned formation location covers the entire surface of the hologram layer where the uneven surface is formed.

When the vapor deposition layer is used in a reflective hologram forming region, the vapor deposition layer may have transparency or may have reflectivity.
In the case where the vapor deposition layer is a transparent vapor deposition layer having transparency, the hologram structure is such that the reflection hologram forming region does not have gloss when viewed in plan. For this reason, the hologram structure has a reflection hologram forming region concealed, and the hologram structure has excellent anti-counterfeiting properties.
On the other hand, when the vapor deposition layer is a reflective vapor deposition layer having reflectivity, the hologram structure can reproduce a light image clearly in the reflection hologram formation region. Therefore, the hologram structure can easily acquire information.

Moreover, the said vapor deposition layer has a transparency, when used for a transmission hologram formation area.
When the said vapor deposition layer is formed in both the area | regions of a reflection type hologram formation area and a transmission type hologram formation area, it is preferable that both areas are transparent vapor deposition layers. This is because the vapor deposition layer can be formed using the same material for both the reflection hologram formation region and the transmission hologram formation region, and the vapor deposition layer can be easily formed.

The transparent vapor-deposited layer preferably has a total light transmittance (hereinafter sometimes simply referred to as light transmittance) of 80% or more, and more preferably 90% or more. This is because the hologram structure is such that the hologram forming region is more concealed due to the light transmittance.
In addition, the said light transmittance is the value measured by JISK7361-1 (the test method of the total light transmittance of a plastic-transparent material).

The material constituting the vapor deposition layer is not particularly limited as long as it is a material that produces a refractive index difference with the hologram layer. Examples of materials that can form the reflective vapor deposition layer include Mg, Al, Ti, Cr, Fe, Co, Ni, Cu, Zn, Ga, Ge, Se, Rb, Pd, Ag, Cd, In, and Sn. , Sb, Te, Au, Pb, or Bi.
Moreover, as a material which can form the said transparent vapor deposition layer, the said metal oxide can be mentioned, for example.
The said material can also use what combined single or 2 or more materials.

The thickness of the vapor-deposited layer can be appropriately set from the viewpoints of light image reproducibility, color tone, design, application, etc., for example, preferably within a range of 50 mm to 1 μm, and more preferably within a range of 100 mm to 1000 mm. It is preferable that
In addition, the thickness is preferably 200 mm or less from the viewpoint of providing transparency to the vapor deposition layer, and may be more than 200 mm from the viewpoint of providing concealment to the vapor deposition layer. preferable.
In addition, the thickness of the said vapor deposition layer is specifically the distance shown by b of already demonstrated FIG. 2 and FIG.

  As a formation method of the said vapor deposition layer, the formation method of a general vapor deposition layer can be used, A vacuum vapor deposition method, sputtering method, an ion plating method etc. can be mentioned.

3. Other Configurations The hologram structure of the present invention has a hologram layer, but may have other configurations as necessary.

(1) Transparent substrate The hologram structure of the present invention may have a transparent substrate formed on the surface of the hologram layer opposite to the vapor deposition layer. It is because the thermal or mechanical strength of the hologram structure of the present invention can be increased by having a transparent substrate.

The transparent substrate may be formed so as to be in direct contact with the hologram layer, or may be formed via another layer.
For example, the transparent substrate can be bonded to the hologram layer surface via an interlayer adhesive layer described later.

  The light transmittance of the transparent substrate is preferably 80% or more, and more preferably 90% or more. This is because by making the light transmittance of the transparent substrate within the above-mentioned range, the hologram structure becomes easy to visually recognize the optical image.

  Moreover, the said transparent base material is so preferable that a haze value is low, Specifically, the thing whose haze value is in the range of 0.01%-5% is preferable, and in particular within the range of 0.01%-3%. Some are preferred, especially those in the range of 0.01% to 1.5%. This is because by setting the haze value of the transparent substrate within the above range, it is possible to display an optical image that appears in the hologram forming region without impairing the visibility. In addition, the haze value of the said transparent base material shall be the value measured based on JISK7136.

  The constituent material of the transparent substrate is not particularly limited as long as it exhibits the above light transmittance and haze value. For example, polyethylene terephthalate, polycarbonate, acrylic resin, cycloolefin resin, polyester resin, polystyrene resin A glass such as a resin film such as an acrylic styrene resin, quartz glass, Pyrex (registered trademark), or a synthetic quartz plate can be used. Among these, as the transparent substrate, it is preferable to use a resin film from the viewpoint of light weight and less risk of breakage and the like, and polycarbonate is optimal from the viewpoint of birefringence.

The transparent substrate may contain an additive as necessary.
Examples of the additive include a dispersant, a filler, a plasticizer, and an antistatic agent.

  The film thickness of the transparent substrate may be any thickness that can provide rigidity and strength for supporting the hologram layer and the like, and is preferably about 0.005 mm to 5 mm, for example. It is preferably within a range of 02 mm to 1 mm. Further, the shape of the transparent substrate is not particularly limited, and can be appropriately selected according to the usage form of the hologram structure of the present invention.

  In order to improve the adhesiveness with the other layers, for example, the surface of the transparent substrate may be subjected to corona treatment or the like.

(2) Image Display Layer The hologram structure of the present invention preferably has an image display layer that displays an image used in combination with the optical image.
This is because an image displayed by the image display layer and an optical image reproduced in the hologram forming region can be combined, and the hologram structure has excellent anti-counterfeiting and design properties. .

Here, the image is not particularly limited as long as it can improve anti-counterfeiting and design properties by combining with an optical image. The image may be used in combination with a diffraction grating pattern formed in the hologram forming region.
Specifically, the image can be set as appropriate according to the application of the hologram structure of the present invention. For example, not only patterns, line drawings, characters, figures, symbols, but also the entire surface is colored. This embodiment is also included.

In addition, as an image that can further improve anti-counterfeiting and design properties by combining with the optical image, for example, as illustrated in FIGS. 22 (a) and (b), an arrow indicating the formation location of the hologram forming region, A frame surrounding the formation location, an image used for recognizing a hologram formation region such as a character indicating the formation location, and the optical image and diffraction grating pattern as illustrated in FIGS. 22 (c) and 22 (d) Is an image representing another part of the figure, and an image in which the optical image represents a part of the character string or number string as illustrated in FIGS. 22 (e) and (f). The above-mentioned hologram such as an image representing another part of a character string or a number of strings, or an image representing a background such as a cloud or a sky arranged around the sun when the light image is an image representing the sun Formation Images with a single unity in combination with the light image to be reproduced within can be given image or the like to form a.
FIGS. 22A, 22C, and 22E show the state before the optical image reproduction, and FIGS. 22B, 22D, and 22F show the state during the optical image reproduction. Is shown.
In FIGS. 22A and 22B, the image 15 is an arrow indicating the location where the reflective hologram forming region 11 is formed, and “real” is used as the first optical image 21 in the reflective hologram forming region 11. A character string representing can be reproduced. In FIGS. 22C and 22D, the image 15 is a part of an ellipse, and one ellipse can be displayed in combination with the other part of the ellipse indicated by the first light image 21 and the diffraction grating pattern 14. It is a thing. In FIGS. 22E and 22F, the image 15 is a part of the character string “real” and has one meaning in combination with the other part of the character string “real” shown by the first light image 21. It is possible to display a character string “real” with
FIG. 22 shows an example in which the hologram forming area in which the optical image combined with the image displayed by the image display layer is recorded is the reflective hologram forming area 11.

The image display layer is not particularly limited as long as it can display a desired image. For example, a printed layer having a colorant and a resin material, and a diffraction grating pattern drawn by a diffraction grating cell arranged in a pattern in plan view. Examples thereof include a second hologram layer.
The printed layer can easily draw images of various colors and patterns. The second hologram layer can display an image only when irradiated with reference light. For this reason, it is because the said printed layer etc. can form easily the hologram structure excellent in forgery prevention property and design property.
The image display layer may be only one type or may be a combination of two or more types. For example, the image display layer may include a plurality of print layers, a print layer, and a second hologram layer.
Hereinafter, the print layer and the second hologram layer will be described.

(A) Print layer The print layer has a colorant and a resin material.
Examples of the resin material include polycarbonates, polyesters, cellulose derivatives, norbornene resins, polyvinyl chlorides, polyvinyl acetates, acrylic resins, urethane resins, polypropylenes, polyethylenes, styrenes, and the like. These resins can be used.
As the coloring material, those generally used as a printing layer can be used, pigments such as inorganic pigments and organic pigments, acidic dyes, direct dyes, disperse dyes, oil-soluble dyes, metal-containing oil-soluble dyes, and sublimation properties. And dyes such as pigments.
In addition, as the coloring material, a fluorescent light emitting material such as an ultraviolet light emitting material and an infrared light emitting material that emits fluorescence by absorbing ultraviolet light or infrared light, particles that become a reflecting mirror such as a polarized cholesteric polymer liquid crystal pigment, glass beads, and the like are also used. Can do.
As the printing layer forming method, that is, the printing method, a method similar to a general printing layer forming method can be used. Specific examples of the printing method include various printing methods such as inkjet printing, screen printing, offset printing, gravure printing, and flexographic printing.
Moreover, as an ink used for the said printing layer, what is used for formation of a general printing layer can be used, and what dispersed or melt | dissolved the said resin material and the coloring material in the solvent can be used.

The printed layer is not particularly limited as long as it is a position that does not hinder the reproduction and visual recognition of the optical image and the diffraction grating pattern in the hologram forming region. On the surface, on the same plane as the hologram layer, on the surface of the vapor deposition layer opposite to the hologram layer, or the like.
The printed layer may overlap the hologram forming region in plan view, but usually does not overlap.
FIG. 23 shows an example in which the printed layer 4 is formed on the surface of the transparent substrate 3 opposite to the hologram layer 1.

(B) Second hologram layer The second hologram layer has a diffraction grating pattern drawn by a diffraction grating cell arranged in a pattern in plan view, and the diffraction grating cell is arranged by irradiating reference light. The pattern having the pattern shape is reproduced.
Such a diffraction grating pattern, diffraction grating cell, and reference light can be the same as the contents described in the above-mentioned “1. Hologram layer”, and thus description thereof is omitted here.

The formation position of the second hologram layer may be on the same plane as the hologram layer, or may be on the surface of the hologram layer on the vapor deposition layer side or on the surface opposite to the vapor deposition layer. Good. As an example in which the second hologram layer is formed on the same plane as the hologram layer, the hologram layer and the second hologram layer are integrally formed, and a diffraction grating pattern is formed in a non-hologram area of the hologram layer. Can do.
In FIG. 24, the second vapor deposition layer 7 formed so as to be in contact with the irregular surface of the diffraction grating pattern of the second hologram layer 6 and the second hologram layer is disposed on the surface of the hologram layer 1 on the vapor deposition layer 2 side. In this example, the film is formed through the vapor deposition layer 2 and the interlayer adhesive layer 5.
The second hologram layer is usually arranged so that the diffraction grating pattern does not overlap the hologram forming region in plan view.

The material constituting the second hologram layer is not particularly limited as long as it can form an uneven shape functioning as a diffraction grating included in the diffraction grating cell.
Such a material can be the same as the constituent material of the hologram layer described in the section “1. Hologram layer”.

  The film thickness of the second hologram layer is not particularly limited as long as it can stably form the concavo-convex shape of the diffraction grating, and can be the same as the hologram layer described in the section “1. Hologram layer”. .

  The formation location of the second hologram layer may be the same as the printing layer described in the section “(a) Printing layer”.

The hologram structure of the present invention may have a second vapor deposition layer formed so as to be in contact with the uneven surface of the diffraction grating pattern of the second hologram layer.
The second vapor deposition layer is not particularly limited as long as the second hologram layer can function as a reflection type, and is generally used for a reflection hologram. Can do. Specifically, the second vapor deposition layer can be the same as the content described in the section “2. Vapor deposition layer”.

(3) Interlayer Adhesive Layer The hologram structure of the present invention may have an interlayer adhesive layer that adheres the components.
In addition, about an interlayer contact bonding layer, what is generally used for a hologram structure can be used, and it is suitably selected according to the material which comprises the said transparent base material, a hologram layer, etc.
As the interlayer adhesive layer, for example, a known adhesive layer such as a two-component curable adhesive layer, an ultraviolet curable adhesive layer, a thermosetting adhesive layer, or a hot melt adhesive layer can be used.
About the thickness of the said interlayer contact bonding layer, it sets suitably by the magnitude | size etc. of the structure to adhere | attach.

When the interlayer adhesive layer is formed so as to overlap the transmission hologram forming region in plan view, a layer having transparency is used.
The light transmittance of the interlayer adhesive layer can be, for example, the same as the light transmittance described in the section “(1) Transparent substrate”.

(4) Adhesive layer The hologram structure of the present invention may have an adhesive layer formed on the surface of the vapor deposition layer opposite to the hologram layer. This is because the hologram structure can be easily attached to an adherend by having an adhesive layer.

When the adhesive layer is formed so as to overlap the transmission hologram forming region in plan view, a layer having transparency is used.
The light transmittance of the adhesive layer can be the same as the light transmittance described in the section “(1) Transparent base material”, for example.

The adhesive layer may be a pressure-sensitive adhesive layer, or a re-peeling adhesive layer having both adhesion and re-peeling properties.
The adhesive layer is an adhesive layer such as a two-component curable adhesive layer, an ultraviolet curable adhesive layer, a thermosetting adhesive layer, or a hot-melt adhesive layer similar to the interlayer adhesive layer. Also good.
When the adhesive layer is a pressure-sensitive adhesive layer, the hologram structure of the present invention can be firmly attached to a desired member, and the hologram structure can be hardly peeled off from the adherend.
Further, when the adhesive layer is a re-peeling adhesive layer, the hologram structure of the present invention is bonded to a desired member by adhering so that air does not enter between the re-peeling adhesive layer and the adherend. Can do. Such a re-peeling adhesion layer can easily perform adhesion and peeling repeatedly without leaving a mark due to an adhesive or the like on the adherend, and can suppress damage to the adherend.

  When the adhesive layer is a pressure-sensitive adhesive layer, examples of the resin used for the pressure-sensitive adhesive layer include acrylic resins, ester resins, urethane resins, ethylene vinyl acetate resins, latex resins, epoxy resins, and polyurethanes. Examples thereof include ester resins, fluorine resins such as vinylidene fluoride resin (PVDF) and vinyl fluoride resin (PVF), and polyimide resins such as polyimide, polyamideimide, and polyetherimide. The resin is preferably an acrylic resin, a urethane resin, an ethylene vinyl acetate resin, or a latex resin.

  When the adhesive layer is a re-peeling adhesive layer, examples of the resin used for the re-peeling adhesive layer include acrylic resins, acrylic ester resins, copolymers thereof, styrene-butadiene copolymers, Examples include natural rubber, casein, gelatin, rosin ester, terpene resin, phenolic resin, styrene resin, coumarone indene resin, polyvinyl ether, and silicone resin. The resin is preferably an acrylic resin or a silicone resin. This is because the acrylic resin can be bonded even when the surface of the adherend has some unevenness. In addition, the silicone resin is less likely to decrease in adhesive strength even when adhesion and peeling are repeated.

  The thickness of the adhesive layer is appropriately selected according to the type and use of the hologram structure of the present invention, but is usually preferably in the range of 1 μm to 500 μm, and more preferably in the range of 2 μm to 50 μm. It is preferable. This is because the adhesive layer is excellent in adhesiveness when the thickness is within the above-described range.

(5) Release sheet Moreover, as for the hologram structure of this invention, the release sheet may be arrange | positioned on the contact bonding layer mentioned above. Immediately before the hologram structure of the present invention is bonded to a desired adherend via the adhesive layer, the release sheet and the adhesive layer can be peeled off and used. Thereby, it can prevent that a foreign material adheres between a contact bonding layer and a to-be-adhered body.

The release sheet is not particularly limited as long as it can protect the adhesive layer and can be easily released from the adhesive layer. As such a release sheet, for example, a layer made of polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS) or the like can be used.
The thickness of the release sheet is appropriately selected according to the type and application of the hologram structure of the present invention.

  Moreover, it is preferable that the surface of the release sheet on the side in contact with the adhesive layer is subjected to a release treatment in order to facilitate the release operation with the adhesive layer. Examples of such treatment methods include silicone treatment and alkyd treatment, but are not particularly limited.

(6) Arbitrary member Furthermore, the hologram structure of the present invention may have an ultraviolet absorbing layer, an infrared absorbing layer, an antireflection layer or the like on the transparent substrate or on the non-hologram forming region of the hologram layer. Good. By having such a layer, the hologram structure can be given an ultraviolet absorption function, an infrared absorption function, an antireflection function, etc., and the hologram structure of the present invention can be used as various filters. Become.
Since these layers can be the same as those generally used, description thereof is omitted here.

4). Hologram Structure The hologram structure of the present invention may be used by adhering the hologram structure to the adherend, or may be used without adhering to the adherend.

The embodiment to be used by adhering to the adherend is not particularly limited as long as it has an adhesive layer used for adhesion to the adherend, and the hologram structure is the above-mentioned of the vapor deposition layer. An aspect (first usage aspect) having an adhesive layer formed on the surface opposite to the hologram layer and used as a hologram seal, the surface of the vapor deposition layer opposite to the hologram layer A heat seal layer formed on the surface of the hologram layer, a peelable layer formed on the surface of the hologram layer opposite to the vapor-deposited layer, and a peelable layer formed on the surface of the peelable layer opposite to the hologram layer. And a base material used as a hologram transfer foil (second use mode).
Moreover, as an aspect used without adhere | attaching on the said to-be-adhered body, the aspect (3rd usage aspect) etc. which the said hologram structure is used as an information recording medium can be mentioned.

(1) First Use Mode A first use mode of the hologram structure of the present invention is such that the hologram structure has an adhesive layer formed on a surface of the vapor deposition layer opposite to the hologram layer, It is an aspect used as a seal.

Such a hologram structure of this embodiment will be described with reference to the drawings. FIG. 25 is a schematic cross-sectional view showing an example of the hologram structure according to this aspect. As illustrated in FIG. 25, the hologram structure 10 of this embodiment has an adhesive layer 41 formed on the surface of the vapor deposition layer 2 opposite to the hologram layer 1 and is used as a hologram seal. is there.
In addition, about the code | symbol in FIG. 25, since it shows the member same as the thing of FIG. 1 and FIG. 2, description here is abbreviate | omitted.
In this example, the hologram structure 10 has a release sheet 42 on the surface of the adhesive layer 41 opposite to the vapor deposition layer 2.

According to this aspect, by providing the adhesive layer, anti-counterfeiting properties and design properties can be easily imparted to the adherend.
As a specific application of the hologram structure of this embodiment, a point light source is disposed on the hologram forming area by attaching it to a ticket, a branded product, a product quality control number label, etc. Uses for authenticity determination using an optical image reproduced on the surface, uses for imparting design properties, and the like.
As the adherend, one having transparency at least in a region overlapping with the transmission hologram forming region in plan view is used.

The hologram structure of this aspect has an adhesive layer.
The adhesive layer can be the same as that described in the section “3. Other Configurations”.
Moreover, you may have the other structure of the above-mentioned "3. Other structure" etc. as needed.

(2) Second Usage Aspect The second usage aspect of the hologram structure of the present invention is that the hologram structure is a heat seal layer formed on a surface of the vapor deposition layer opposite to the hologram layer, and the hologram. A detachable layer formed on the surface of the layer opposite to the vapor deposition layer, and a detachable substrate formed on the surface of the easy layer on the opposite side of the hologram layer. It is an aspect used as a foil.

Such a hologram structure of this embodiment will be described with reference to the drawings. FIG. 26 is a schematic cross-sectional view showing an example of the hologram structure according to this aspect. As illustrated in FIG. 26, the hologram structure 10 of this aspect includes a heat seal layer 43 formed on the surface of the vapor deposition layer 2 opposite to the hologram layer 1, and the vapor deposition layer of the hologram layer 1. 2 having a peeling easy layer 44 formed on the surface opposite to the surface 2 and a peeling substrate 45 formed on the surface of the peeling easy layer 44 opposite to the hologram layer 1. It is used as a foil.
In addition, about the code | symbol in FIG. 26, since it shows the same member as the thing of FIG. 1 and FIG. 2, description here is abbreviate | omitted.
In this example, the hologram structure 10 has a release sheet 42 on the surface of the heat seal layer 43 opposite to the vapor deposition layer 2.

According to this aspect, the anti-counterfeiting property and the design property can be easily imparted to the adherend by having the heat seal layer.
Further, since the peeling base material is formed on the opposite side of the hologram layer from the vapor deposition layer via the peeling layer, it is possible to prevent the hologram structure from being damaged before being attached to the adherend.
As a specific application of the hologram structure of this embodiment, a point light source is placed on a hologram forming region by transferring it in a desired pattern shape onto a ticket, a branded product, a product quality control number label, or the like. Can be used for performing authenticity determination using an optical image reproduced in the hologram forming region, for providing design properties, and the like.
As the adherend, one having transparency at least in a region overlapping with the transmission hologram forming region in plan view is used.

The hologram structure of this embodiment has a heat seal layer, a peelable layer and a peeling substrate.
Hereafter, each structure of the hologram structure of this aspect is demonstrated in detail.

  The heat seal layer has a function of bonding the hologram layer and the vapor deposition layer to the adherend.

When the heat seal layer is formed so as to overlap the transmission hologram forming region in plan view, a layer having transparency is used.
The light transmittance of the heat seal layer can be the same as the light transmittance described in “(1) Transparent substrate” of “3.

The heat seal layer is not particularly limited as long as it can adhere the hologram layer and the adherend according to the type of adherend to which the hologram layer and the vapor deposition layer are transferred from the hologram structure of the present embodiment. It is not a thing.
As the heat seal layer, for example, a heat seal layer containing a thermoplastic resin described in JP 2014-16422 A can be used.

The peeling substrate supports the hologram layer, the vapor deposition layer, and the like.
The peeling substrate is peeled from the hologram structure after the hologram structure of this aspect is bonded to the adherend.
Such a peeling substrate may be transparent or may have light shielding properties.
As a material and film thickness which comprise the said base material for peeling, since it can be the same as that of the transparent base material as described in the term of said "3. other structure", description here is abbreviate | omitted.

The easy peeling layer is provided to easily separate the peeling base material and the hologram layer after the hologram layer is bonded to the adherend via the adhesive layer.
As such an easy-peeling layer, the re-peeling adhesion layer described in the section “3. Other configuration” can be used.

  The formation position of the easy-peeling layer in plan view is not particularly limited as long as the base material for peeling can be easily peeled from the hologram layer.

  The hologram structure according to this aspect may have other configurations described in the above section “3. Other configurations” as necessary.

(3) Third Usage Mode A third usage mode of the hologram structure of the present invention is an mode in which the hologram structure is used as an information recording medium.

Such a hologram structure of this embodiment will be described with reference to the drawings. FIG. 27 is a schematic cross-sectional view showing an example of the hologram structure according to this aspect. As illustrated in FIG. 27, the hologram structure 10 of this aspect includes a back-side protective layer 46 formed on the surface of the vapor deposition layer 2 opposite to the hologram layer 1, and the vapor deposition layer 2 of the hologram layer 1. It has a surface-side protective layer 47 formed on the opposite surface and an intermediate substrate 48 formed between the hologram layer 1 and the surface-side protective layer 47, and is used as an information recording medium.
In addition, about the code | symbol in FIG. 27, since it shows the member same as the thing of FIG. 1 and FIG. 2, description here is abbreviate | omitted.

According to this aspect, it can be set as the information recording medium excellent in forgery prevention property and design property by using as an information recording medium.
Specific examples of the use of the hologram structure of the present aspect include cards such as credit cards, cash cards and point cards, employee ID cards, ID cards such as driver's licenses, passbooks, passports and the like.

  The hologram structure of this aspect has a hologram layer and a vapor deposition layer, but may have other configurations depending on the type for the information recording medium.

Such other configurations include, for example, a back side protective layer formed on the surface of the vapor deposition layer opposite to the hologram layer, and a surface side protection formed on the surface of the hologram layer opposite to the vapor deposition layer. And an intermediate substrate formed between the hologram layer and the surface-side protective layer.
The surface-side protective layer is formed on the surface of the hologram layer opposite to the vapor deposition layer and protects the hologram layer, and at least a region overlapping the hologram forming region in plan view is transparent Used.
The said back surface side protective layer is formed in the surface on the opposite side to the hologram layer of a vapor deposition layer, and protects a hologram layer and a vapor deposition layer. As such a back side protective layer, a layer having transparency at least in a region overlapping the transmission hologram forming region in plan view is used.
The intermediate substrate is formed between the hologram layer and the front surface side protective layer, and supports the hologram layer, the front surface side protective layer, and the back surface side protective layer, and at least overlaps the hologram forming region in plan view. Those having transparency are used. The intermediate base material may be used also as a transparent base material.
About the constituent material and film thickness of such a surface side protective layer, a back surface side protective layer, and an intermediate | middle base material, it can be made to be the same as that of the transparent base material as described in the said "3. . More specifically, polycarbonate can be used as the constituent material of the front surface side protective layer and the back surface side protective layer, and polyethylene terephthalate can be used as the constituent material of the intermediate substrate.
Moreover, as a formation location of a surface side protective layer, a back surface side protective layer, and an intermediate | middle base material, what is necessary is just to be able to protect a hologram layer etc., but the whole surface of a hologram layer and a vapor deposition layer can be covered.

Examples of the other configuration include an information recording layer for recording information.
Examples of the information recording layer include a printed layer on which information is recorded by printing, a magnetic layer on which information is recorded by magnetism, an IC chip layer including an integrated circuit (IC) chip, and the like.
As said other structure, functional layers, such as an antenna layer containing an antenna, can be included.
The formation location of these information recording layer and functional layer is not particularly limited as long as it does not hinder the reproduction and visual recognition of the optical image in the hologram formation region. May be on the opposite surface, on the same plane as the hologram layer, on the opposite surface of the vapor deposition layer from the hologram layer, or the like.

5. Manufacturing Method The manufacturing method of the hologram structure of the present invention is not particularly limited as long as it can accurately manufacture a hologram structure including the above-described configurations, and is the same as a general hologram structure forming method. The method can be used.
Specific examples of the production method include a method of preparing a transparent substrate and forming a hologram layer and a vapor deposition layer in this order.

6). Applications Applications of the hologram structure of the present invention can be used for anti-counterfeit applications, and include information recording media including cards such as credit cards and cash cards.
Further, the hologram structure may have an adhesive layer that can be bonded to another adherend, and may be used as a hologram structure seal that can be attached to the adherend.
Furthermore, the hologram structure may have a heat seal layer and may be used as a hologram structure transfer foil that can be transferred to an adherend.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  The following examples illustrate the present invention in more detail.

[Example 1]
<Formation of reflective cell master and reflective cell>
A dry etching resist was spin-coated with a spinner on a chromium thin film of a photomask blank plate in which a surface low-reflection chromium thin film was laminated on a synthetic quartz substrate. As a resist for dry etching, ZEP7000 manufactured by Nippon Zeon Co., Ltd. was used and formed to have a thickness of 400 nm. The resist layer was exposed to a pattern previously created by a computer using an electron beam drawing apparatus (MEBES4500: manufactured by ETEC), and the exposed portion of the resist resin was easily dissolved. Thereafter, the developer was sprayed (spray development) to remove the easily soluble portion, and a resist pattern was formed.
The pattern lattice pitch was 3179 nm at the shortest.
The pattern depth was 140 nm.
Subsequently, by using the formed resist pattern, a portion of the chromium thin film not covered with the resist was etched away by dry etching to expose the quartz substrate. Next, the exposed quartz substrate was etched to form a recess in the quartz substrate. Thereafter, the resist thin film was dissolved and removed to obtain a reflective cell original plate having a concave portion formed by etching the quartz substrate and a convex portion in which the quartz substrate and the chromium thin film remained without being etched. The size of the reflective cell was 0.25 mm.

  A composition for forming a hologram layer (UV curable acrylate resin: refractive index 1.52, measurement wavelength: 633 nm) was dropped onto a polycarbonate sheet (transparent substrate) having a thickness of 0.5 mm to form a coating film of the above composition. Next, an original plate having irregularities was placed on the coating film and pressed. Next, after irradiating actinic radiation and hardening the said coating film, it peeled, and the reflection type cell which has the uneven surface which reversed the uneven | corrugated type | mold of the original was formed. Thereafter, the original plate is repeatedly placed, pressed, cured, and peeled, and the reflective cells are arranged in a grid pattern so that the area ratio of the reflective cells is 50% and the distribution is approximately 15 mm. A hologram layer having a thickness of 2 μm and having a corner reflection hologram forming region was formed.

<Formation of transmission cell master and transmission cell>
An original plate was obtained in the same manner as the reflective cell original plate.
The size of the transmissive cell was 0.25 mm.
The pattern lattice pitch was 3179 nm at the shortest, and the pattern depth was 825 nm.
Next, stacking, pressing, curing, and peeling of the transmission cell original plate is repeated on the coating film after the formation of the reflection type cell, and the reflection cell is transmitted to the area where the reflection type cell is not disposed in the reflection hologram forming area. By spreading the type cells, the reflection type cells and the transmission type cells are arranged in a grid pattern, the area percentage of the transmission type cells is 50%, and the 15 mm square transmission hologram forming region is almost evenly distributed. A hologram layer having a thickness of 2 μm was formed.
As a result, a hologram layer having a hologram forming area formed so that all of the reflection hologram forming area and the transmission hologram forming area overlap each other and the reflection type and transmission type cells are arranged in a grid pattern is formed.

  Subsequently, an aluminum oxide layer having a film thickness of 100 nm was formed as a transparent vapor deposition layer on the entire surface of the reflection hologram forming region and the transmissive hologram forming region of the hologram layer by a sputtering method to obtain a hologram structure.

<Evaluation>
When a point light source is arranged at a position 50 mm from the hologram layer surface on the observation surface side of the hologram structure and observed from a location 300 mm away from the hologram layer surface, a predetermined image Fourier transformed into a 15 mm square hologram formation region Could be observed with good visibility.
In addition, when a point light source is arranged at a position 50 mm away from the hologram layer surface on the opposite side of the hologram structure observation surface and observed from a location 300 mm away from the hologram layer surface, Fourier transform is performed within a 15 mm square hologram formation region. The predetermined image thus obtained could be observed with good visibility.

DESCRIPTION OF SYMBOLS 1 ... Hologram layer 1a ... Uneven surface 2 ... Deposition layer 3 ... Transparent base material 4 ... Print layer 5 ... Interlayer adhesion layer 6 ... 2nd hologram layer 7 ... 2nd vapor deposition layer 10 ... Hologram structure 11 ... Reflective hologram formation area DESCRIPTION OF SYMBOLS 11a ... Reflection type cell 12 ... Transmission type hologram formation area 12a ... Transmission type cell 13 ... Overlapping area 14 ... Diffraction grating pattern 14a ... Diffraction grating cell 15 ... Image 21 ... First light image 22 ... Second light image 41 ... Adhesive layer 42 ... Release sheet 43 ... Heat seal layer 44 ... Easy peel layer 45 ... Peeling substrate 46 ... Back side protective layer 47 ... Front side protective layer 48 ... Intermediate substrate

Claims (8)

A hologram layer having a reflective hologram forming region and a transmission hologram forming region;
A vapor deposition layer formed so as to be in contact with the concavo-convex surface of the reflective hologram forming region of the hologram layer;
Have
A hologram structure, wherein a phase type Fourier transform hologram for converting light incident from a point light source into a desired optical image is recorded in the reflection hologram formation region and the transmission hologram formation region.   2. The hologram structure according to claim 1, wherein the reflection hologram formation region and the transmission hologram formation region overlap in plan view.   At least one of the reflection hologram formation region and the transmission hologram formation region of the hologram layer, a hologram cell in which a phase Fourier transform hologram is recorded that converts light incident from a point light source into the optical image; 3. A diffraction grating cell, which is formed on the same plane as the hologram cell and draws a diffraction grating pattern by being arranged in a pattern in plan view, is arranged. The hologram structure according to 1.   4. The hologram structure according to claim 3, wherein the diffraction grating design is a planar diffraction grating design capable of reproducing the design in a planar manner.   The hologram structure according to claim 3, wherein the diffraction grating pattern is a three-dimensional diffraction grating pattern that can be reproduced three-dimensionally. The hologram structure has an adhesive layer formed on the surface of the vapor deposition layer opposite to the hologram layer,
6. The hologram structure according to claim 1, wherein the hologram structure is used as a hologram seal. The hologram structure has a heat seal layer formed on a surface of the vapor deposition layer opposite to the hologram layer;
An easy peeling layer formed on the surface of the hologram layer opposite to the vapor deposition layer;
A peeling base material formed on the surface of the peelable layer opposite to the hologram layer;
Have
6. The hologram structure according to claim 1, wherein the hologram structure is used as a hologram transfer foil.   The hologram structure according to any one of claims 1 to 5, wherein the hologram structure is used as an information recording medium.