JP2016197672A - Imprint method and imprint device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enhance the transfer quality of a fine pattern while preventing photocurable resin coated on a substrate from wet-spreading at the outside of the edge portion of the substrate.SOLUTION: A print method comprises a step of mounting a substrate in a mount region 41 on a stage so that a certain gap portion 73 is formed between the substrate 71 coated with photocurable resin 70 and an elastic member 50 provided on a stage 40, a step of sequentially pressing the photocurable resin and the elastic member with a pressing roll 10 via a mold 30 which is configured like a thin plate, has flexibility and light-permeability and is held with predetermined tension, whereby a fine pattern 33 formed on a first surface 31 of the mold is pressed against the photocurable resin, and a step of applying light to the photocurable resin while the fine pattern is pressed against the photocurable resin. The thickness of the elastic member is larger than the thickness of the substrate, and the elastic member is pressed by a press roll to be deformed, so that the difference in thickness between the elastic member and the substrate is reduced.SELECTED DRAWING: Figure 1

Description

  The present invention relates to an imprint method and an imprint apparatus.

  In recent years, in optical components used in products such as displays and lighting, the reflection of light by forming a fine pattern on the surface of the product from nanometer (nm) order to micron (μm) order that exhibits special optical properties, It is desired to realize a device that controls diffraction and exhibits an unprecedented new function. As a method for forming such a fine structure, in recent years, an imprint technique has attracted attention in addition to a photolithography technique and an electron beam drawing technique. The imprint technique is a technique for transferring a fine pattern of a mold by pressing a mold having a fine pattern formed on the surface thereof against a transfer target.

  Specific imprint methods include a thermal imprint method and a UV imprint method. In the thermal imprint method, a thermoplastic resin as a transfer object is applied onto a substrate, and the mold is pressed against the thermoplastic resin softened by heating the thermoplastic resin to a temperature higher than the glass transition temperature, and the thermoplastic resin is applied to the thermoplastic resin. This is a method of cooling and curing the transfer thermoplastic resin. Some thermal imprinting methods use a thermosetting resin instead of a thermoplastic resin. In this case, an uncured thermosetting resin is pressed against the mold, and the thermosetting resin is cured by heating in that state. In the UV imprint method, a UV curable resin as a transfer target was applied onto a substrate, the mold was pressed against an uncured UV curable resin, a fine pattern of the mold was transferred to the UV curable resin, and the mold was pressed. In this state, the UV curable resin is cured by irradiating the UV curable resin with UV light.

  Although the thermal imprint method has a feature that the selectivity of the material is wide, there is a problem that the throughput is low because the mold needs to be heated and lowered when transferring the shape. On the other hand, since the UV imprint method is limited to materials that are cured by ultraviolet rays, the selectivity of the material is narrow compared to thermal imprint, but it can be cured in a few seconds to a few tens of seconds. Has the advantage of being very expensive. Which of the thermal imprinting method and the UV imprinting method is adopted depends on the device to be applied, but when there is no problem caused by the material, the UV imprinting method is considered suitable as a mass production method.

  As a method of forming a fine pattern, as shown in FIG. 9, by applying a vertical pressure to the resin 70 applied to the surface of the substrate 71, the flat plate mold 30 on which the fine pattern 33 is formed, A flat plate type imprint in which the fine pattern 33 of the mold 30 is transferred to the resin 70 is generally used. However, in this method, since the mold 30 and the resin 70 are in contact with each other, there is a high possibility that minute bubbles remain inside the fine pattern 33 of the mold 30 and cause a transfer defect. In the flat plate type imprint, it is necessary to perform the imprint in a vacuum environment in order to suppress such transfer defects due to bubbles. In this case, the device cost for the vacuum device is increased, and a predetermined vacuum degree is required. Since it takes a certain time to reach, there is a problem that the throughput is lowered.

  In Patent Document 1, in order to solve the above problem, a roll-type UV imprint method as shown in FIG. 10 is adopted. In this method, the thin plate-shaped mold 30 on which the fine pattern 33 is formed is sent in the feeding direction X while being pressed in the pressing direction Y by the pressing roll 5 against the UV curable resin 70 applied to the substrate 71. The fine pattern 33 of the mold 30 is sequentially transferred to the UV curable resin 70. The UV curable resin 70 is cured by being irradiated with UV light by a UV irradiator 60 installed behind the pressing roll 10.

  According to this method, since the mold 30 is sequentially pressed by feeding the pressing roll 10 against the substrate 71, air easily escapes in the feeding direction X of the pressing roll 10, and bubbles are formed inside the fine pattern 33 of the mold 30. Can be formed without remaining. Furthermore, since the contact area between the mold 30 and the substrate 71 has a linear shape, the pressure for transfer can be reduced. In addition, since processing under atmospheric pressure is possible, a large vacuum device is not required.

JP 2014-54735 A

  However, in the imprint method described in Patent Document 1, as shown in FIG. 10, the pressure roll 10 is fed in the feeding direction X while pressing the UV curable resin 70 in the pressing direction Y, whereby the UV curable resin 70. May be pushed in the feed direction X and flow out of the edge 72 of the substrate 71 in some cases. The UV curable resin 70 that has flowed out wets and spreads on the stage 40 on which the substrate 71 is placed and hardens, and the substrate 71 and the stage 40 are fixed to make it difficult to take out the substrate 70, or the stage 40 is excessively moved. Need to be cleaned.

  In order to avoid such wet spreading of the UV curable resin 70, a plate is formed on the stage 40 on the outer periphery of the substrate 71 so as to form a constant gap 73 between the substrate 71 and the substrate 71 as shown in FIG. A method is conceivable in which 90 is provided and the flowed UV curable resin 70 is accommodated in the gap 73 between the substrate 71 and the plate 90.

  However, even in such an imprinting method, as shown in FIG. 12, when the substrate 71 is thicker than the plate 90, when the pressing roll 10 comes into contact with the plate 90, the stress due to the pressing roll 10 causes the edge of the substrate 71. By concentrating on the portion, the mold 30 is deformed in the vicinity of the stepped portion between the substrate 71 and the plate 90, and the transfer quality of the UV curable resin 70 is deteriorated. On the other hand, as shown in FIG. 13, when the substrate 71 is thinner than the plate 90, stress concentrates on the corners of the plate 90 when the pressing roll 10 rides on the corners of the plate 90. The mold 30 is deformed near the stepped portion with the plate 90, and the transfer quality of the UV curable resin 70 is deteriorated. Such a problem arises not only in the UV imprint method but also in the thermal imprint method in the case of a roll type imprint method.

  SUMMARY OF THE INVENTION The present invention has been made in view of the above-described conventional problems, and an object of the present invention is to improve the transfer quality of a fine pattern while preventing the photocurable resin applied on the substrate from spreading outside the edge of the substrate. .

  In order to achieve the above object, the imprinting method of the present invention is configured so that a certain gap is formed between a substrate coated with a photocurable resin and an elastic member provided on a stage. A step of placing in a placement area on the stage; and a thin plate-like, flexible and light-transmitting mold that is held at a predetermined tension, and the photo-curing resin and the elastic member Are sequentially pressed by a pressing roll to press the fine pattern formed on the first surface of the mold against the photocurable resin, and light is applied to the photocurable resin in a state where the fine pattern is pressed. Irradiating, wherein the thickness of the elastic member is larger than the thickness of the substrate, the elastic member is deformed by being pressed by the pressing roll, and the thickness of the elastic member and the substrate is The difference in height is reduced And wherein the door.

  The imprinting method of the present invention can improve the transfer quality of a fine pattern while preventing the photo-curing resin applied on the substrate from spreading outside the edge of the substrate.

1 is a schematic view showing an entire imprint apparatus according to an embodiment of the present invention. The top view and sectional drawing of the mold which concern on embodiment of this invention are shown. The top view and sectional drawing of the stage, elastic member, and board | substrate which concern on embodiment of this invention are shown. It is a top view which shows the imprint method which concerns on embodiment of this invention. It is sectional drawing which shows the imprint method which concerns on embodiment of this invention. It is an expanded sectional view showing the imprint method concerning an embodiment of the invention. It is an expanded sectional view showing the imprint method concerning an embodiment of the invention. It is an expanded sectional view which shows the imprint method which concerns on another embodiment of this invention. It is a figure explaining the conventional flat plate type imprint. It is sectional drawing which shows a roll type imprint. It is sectional drawing which shows a roll type imprint at the time of using a plate. It is an expanded sectional view showing a roll type imprint method when a substrate is thicker than a plate. It is an expanded sectional view showing a roll type imprint method when a substrate is thinner than a plate.

  The configuration of the imprint apparatus according to the embodiment of the present invention will be described below with reference to the drawings. As shown in FIG. 1, the imprint apparatus 1 according to the present embodiment includes a pressing roll 10, a holding roll 20, a mold 30, a stage 40, an elastic member 50, a UV irradiator 60, and a control unit. 80. The imprint apparatus 1 according to the embodiment of the present invention employs a roll-type UV imprint method.

  The pressing roll 10 has a cylindrical shape and has a shaft 11 at the center thereof, and is rotatable around the shaft 11. Further, the pressing roll 10 can move on a plane perpendicular to the direction of the shaft 11 (axial direction Z). In other words, the pressing roll 10 is movable in a direction toward the stage 40 (pressing direction Y) and a direction perpendicular to the axial direction Z and the pressing direction Y (feeding direction X). The holding roll 20 is also cylindrical and has a shaft 21 at the center thereof, is rotatable about the shaft 21, and the direction of the shaft 21 is parallel to the axial direction Z of the pressing roll 10. The holding roll 20 is held by a unit common to the pressing roll 10, for example, and the pressing roll 10 moves while maintaining a certain distance between the center of the shaft 21 of the holding roll 20 and the center of the axis 11 of the pressing roll 10. Move in sync with. However, the pressing roll 10 and the holding roll 20 do not need to be held by a common unit, and may be held by different units as long as they move in synchronization with each other. For example, as illustrated in FIG. 1, the pressing roll 10 and the holding roll 20 are connected to a control unit 80, and the control unit 80 controls the pressing roll 10 and the holding roll 20 to move in synchronization.

  As shown in FIGS. 1 and 2, the mold 30 has a thin plate shape and is provided between the pressing roll 10 and the holding roll 20 and the stage 40. The mold 30 has a first surface 31 facing the stage 40 and a second surface 32 opposite to the first surface 31, and a fine pattern 33 is formed on at least a part of the first surface 31. Further, one end of the mold 30 is held by the movable holding portion 34, and the other end is held by the fixed holding portion 35. By moving the movable holding portion 34, the tension applied to the mold 30 and the angle of the mold 30 with respect to the stage 40 can be arbitrarily adjusted. The mold 30 is a material having flexibility and UV transparency, and is, for example, a PET film, but is not limited thereto. Further, a light shielding mask 36 that does not transmit UV light is provided on a part of the second surface 32 of the mold 30. The specific position of the light shielding mask 36 will be described later. The material of the light shielding mask 36 is, for example, chromium, and is formed by a method such as sputtering.

  As shown in FIGS. 1 and 3, the stage 40 has a placement area 41 for placing a substrate 71 coated with a UV curable resin 70. The placement area 41 is the first of the mold 30. Facing face 31. The shape of the placement region 41 is the same as the planar shape of the substrate 71. For example, when the planar shape of the substrate 71 is circular as shown in FIG. 3, the placement region 41 is also circular. Here, in an apparatus that performs imprinting on several types of substrates, where the size of the substrate 71 is not fixed, an area in which the largest substrate among the several types can be placed is referred to as a placement area. To do.

  The elastic member 50 is provided on the stage 40 so as to form a predetermined gap 73 between the elastic member 50 and the substrate 71. The thickness T1 of the elastic member 50 is larger than the thickness T2 of the substrate 71, and can be deformed by being pressed in the pressing direction Y by the pressing roll 10. When the thickness T2 of the substrate 71 is 300 μm, the thickness T1 of the elastic member 50 is, for example, 330 μm, and the difference in thickness is 30 μm. The gap 7 is formed in an annular shape surrounding the substrate 71, and its width D is, for example, 50 μm.

  As shown in FIG. 1, the UV irradiator 60 is disposed on the second surface 32 side of the mold 30 at a position where the irradiated UV light 61 is not blocked by the holding roll 20 and the pressing roll 10. It is possible to irradiate the collimated UV light 61. Further, the UV irradiator 60 irradiates the UV light 61 in the pressing direction Y. In this case, the UV irradiator 60 is provided between the pressing roll 10 and the holding roll 20 when viewed from the pressing direction Y. Since the mold 30 has UV transparency, the UV light 61 passes through the mold 30 and is irradiated to the UV curable resin 70 applied to the substrate 71 placed on the placement region 41 of the stage 40. However, the gap 73 between the placement area 41 of the stage 40 and the elastic member 50 is blocked by the light shielding mask 36 on the second surface 32 of the mold 30, and thus is not irradiated with UV light. The UV irradiator 60 is connected to the control unit 80 and moves in synchronization with the movement of the pressing roll 10 and the holding roll 20. The UV irradiator 60 is, for example, an LED, but is not limited thereto.

  Next, an imprint method using the imprint apparatus 1 according to the present embodiment will be described with reference to FIGS. In FIG. 4, the fine pattern 33 and the UV irradiator 60 are omitted, and in FIG. 5, the fine pattern 33, the light shielding mask 36, and the UV curable resin 70 are omitted.

  First, the substrate 71 to which the uncured UV curable resin is applied is placed on the placement region 41 of the stage 40 so that the UV curable resin 70 and the first surface 31 of the mold 30 face each other. Then, the pressing roll 10 is moved in the pressing direction Y while holding the mold 30 at a predetermined tension and angle. Thereby, the press roll 10 contacts the mold 30 second surface 32, and the flexible mold 30 is deformed along the movement of the press roll 10. As the pressing roll 10 moves in the pressing direction Y, pressure is applied perpendicularly to the substrate 71 placed on the stage 40. At this time, the magnitude of the pressure is measured by a load cell (not shown). When the measured pressure reaches a predetermined magnitude, the pressing roll 10 is moved in the feed direction X. As the pressing roll 10 moves in the feed direction X, the pressing roll 10 rotates under the influence of the frictional force with the second surface 32 of the mold 30. The first surface 31 of the mold 30 is sequentially pressed against the UV curable resin on the substrate 71, and the fine pattern 33 formed on the first surface 31 is sequentially transferred to the UV curable resin.

  The holding roll 20 moves following the pressing roll 10 while maintaining a certain distance from the pressing roll 10, and the part of the mold 30 after the pressing by the pressing roll 10 is released is separated from the UV curable resin 70. Hold to not. Since the elastic member 50 is provided on the stage 40 on the outer periphery of the substrate 71, the elastic member 50 may push up the mold 30 and the mold 30 may be separated from the UV curable resin 70 before the UV curable resin 70 is cured. However, when the holding roll 20 moves following the pressing roll 10, the mold 30 between the pressing roll 10 and the holding roll 20 can be held so as not to be separated from the UV curable resin 70.

  Then, as shown in FIG. 5, the UV irradiator 60 moves in synchronization with the pressing roll 10 and the holding roll 20, and the UV light irradiated from the UV irradiator 60 passes between the pressing roll 10 and the holding roll 20. The light passes through and enters the substrate 71 through the mold 30 having translucency. Thereby, UV light is irradiated to the UV curable resin in a state where the UV curable resin is filled in the fine pattern, and the UV curable resin is cured.

  FIG. 6 is an enlarged cross-sectional view showing a state immediately after the pressing roll 10 comes into contact with the elastic member 50. Since the thickness T1 of the elastic member 50 is larger than the thickness T2 of the substrate 71, when the UV curable resin 70 is pressed, the elastic member 50 formed around the substrate 71 is also pressed. Here, since the elastic member 50 can be deformed by being pressed by the pressing roll 10, the elastic member 50 can reduce the difference in thickness between the substrate 71 and the elastic member 50. Thereby, stress concentration generated at the edge 72 of the substrate 71 and the corners of the elastic member 50 can be alleviated, and deformation of the mold 30 in the vicinity of the stepped portion can be suppressed, thereby improving the imprint transfer quality. Can do. The thickness of the elastic member 50 after deformation is preferably the same as the thickness T <b> 2 of the substrate 71.

  For example, when a position detection mechanism (not shown) for detecting the position of the pressing roll 10 in the pressing direction Y is connected to the control unit 80 shown in FIG. 1 and the pressing roll 10 comes into contact with the elastic member 50, the pressing roll 10. The controller 80 corrects the pressure of the pressure roll 10 based on the data of the position detection mechanism so that the pressure does not move suddenly in the pressing direction Y. If the position detection mechanism detects that the position of the pressing roll 10 in the pressing direction Y has risen when the pressing roll 10 comes into contact with the elastic member 50, the control unit 80 increases the pressure of the pressing roll 10. The deformation amount of the elastic member 50 is increased so that the thickness of the elastic member 50 and the thickness of the substrate 71 are approximately the same. On the other hand, when the position detection mechanism detects that the position of the pressing roll 10 in the pressing direction Y is lowered, the control unit 80 reduces the pressure of the pressing roll 10 to reduce the deformation amount of the elastic member 50, and the elasticity. The thickness of the member 50 and the thickness of the substrate 71 are approximately the same. Furthermore, the thickness T1 of the substrate 71 may be measured in advance with a laser displacement meter or the like and stored in the control unit 80 as data. In this case, based on the thickness data of the substrate 71, an appropriate pressure value is calculated so that the thickness of the substrate 71 and the thickness of the elastic member 50 are approximately the same, and the pressing roll 10 contacts the elastic member 50. When the pressure of the pressing roll 10 is controlled to an appropriate value, the pressure is corrected based on the data of the position detection mechanism described above, thereby enabling more accurate control.

  For simplicity, when the thickness T2 of the substrate 71 is measured, the pressure of the pressing roll 10 is P, the thickness of the elastic member 50 is T1, and the Young's modulus of the elastic member 50 is E, P = E × The pressure P of the pressing roll 10, the thickness T1 of the elastic member 50, and the Young's modulus E are adjusted or designed so as to satisfy (T1-T2). As a result, the elastic member 50 can be deformed to a thickness comparable to the thickness T <b> 2 of the substrate 71 when pressed by the pressure P by the pressing roll 10.

  Here, when the pressing roll 10 is sent in the feeding direction X while pressing the UV curable resin 70 in the pressing direction Y, the UV curable resin 70 applied to the substrate 71 is pushed in the feeding direction X, and the UV that has been pushed out. The cured resin 70 flows out from the edge 72 of the substrate 71 and is accommodated in the gap 73 between the substrate 71 and the elastic member 50. At this time, since the thickness T1 of the elastic member 50 is larger than the thickness T2 of the substrate 71, the extruded UV curable resin 70 can be prevented from spreading over the elastic member 50 beyond the gap 73.

  The light shielding mask 36 on the second surface 32 of the mold 30 is at least a gap 73 between the substrate 71 and the elastic member 50 when the fine pattern 33 of the mold 30 is pressed against the UV curable resin 70. The UV light applied to is shielded. Specifically, when the UV irradiator 60 irradiates the UV light 61 in the pressing direction Y, the light shielding mask 36 is on the second surface 33 of the mold 30 and the fine pattern 33 of the mold 30 is UV curable resin. When in the state of being pressed against 70, it is provided at a location that overlaps at least the gap 73 as viewed from the pressing direction Y. Thereby, the curing of the UV curable resin 70 accommodated in the gap 73 can be prevented, the adhesion between the substrate 71 and the stage 40 can be prevented, and the substrate 71 can be easily removed from the placement area 41 of the stage 40 after imprinting. Can be taken out. The UV curable resin 70 accommodated in the gap 73 is maintained by manually wiping and cleaning the stage 40 after the substrate 71 is taken out or replacing the elastic member 50, and smoothly imprints on the next substrate. be able to.

  FIG. 7 is an enlarged cross-sectional view showing a state where the pressing roll is moved in the direction opposite to the feeding direction X after the transfer of the fine pattern is completed, and the mold 30 is peeled off from the UV curable resin 70. After the mold 30 is peeled off, a part of the UV curable resin 70 that maintains an uncured state in the gap 73 adheres to the first surface 31 of the mold 30. Here, the uncured UV curable resin 70 adhering to the stage 40 and the elastic member 50 is removed by cleaning or replacing the member, but the UV curable resin 70 adhering to the mold 30 is left on the next substrate. It is preferable to perform imprinting.

  FIG. 8 shows the second and subsequent imprints when the uncured UV curable resin 70 is left on the first surface 31 of the mold 30 in the first imprint. When the mold 30 is pressed by the pressing roll 10, the UV curable resin 70 applied onto the substrate 71 is extruded in the feed direction X, but is left on the first surface 31 of the mold 30 by the first imprint. It collides with the uncured UV curable resin 70 to be integrated. Due to this collision, the flow rate of the extruded UV curable resin 70 is remarkably reduced, so that it is possible to reliably prevent the UV curable resin 70 from spreading over the elastic member 50 beyond the gap 73.

  In the imprint method according to the present embodiment, the provision of the light shielding mask 36 on the second surface 32 of the mold 30 has been described. However, it is not always necessary to provide the light shielding mask 36. With the configuration of the elastic member 50, it is possible to prevent the UV curable resin 70 from spreading while maintaining the transfer quality. Here, even if the light shielding mask is not provided and the UV light 61 is irradiated to the gap 73, the UV curable resin accommodated in the gap 73 is laminated in the direction in which the UV light 61 is irradiated, that is, the Y direction. Therefore, only the upper part (mold 30 side) of the UV curable resin 70 is cured, and the lower part (stage 40 side) is hard to be cured. Therefore, even when the UV light 61 is applied to the UV curable resin 70 accommodated in the gap 73, the substrate 71 and the stage 40 are hardly fixed, and the substrate 71 can be easily removed from the placement area 41 of the stage 40. Can be taken out. When the light shielding mask 36 is provided and the UV light 61 irradiated to the gap 73 is shielded, not only the lower part but also the upper part of the UV curable resin 70 accommodated in the gap 73 should be in an uncured state. Compared with the case where the light-shielding mask 36 is not provided, the substrate 71 and the stage 40 can be more securely prevented from sticking to each other.

In the imprint method according to the present embodiment, the planar shape of the substrate 71 has been described as being circular, but is not limited thereto, and may be polygonal.
In the present embodiment, it has been described that the UV irradiator 60 irradiates the UV curable resin 70 with the UV light 61 via the mold 30 having UV transparency, but the present invention is not limited to this. It is good also as an aspect which uses the light irradiation device which 30 has transparency with respect to lights other than UV, uses resin hardened | cured with lights other than UV, and irradiates lights other than UV.

  The thermal imprint method may be adopted without being limited to the optical imprint method. In the case of the thermal imprint method, the mold 30 is not limited to a material having optical transparency. Further, as the material of the transfer object, a thermosetting resin or a thermoplastic resin is used instead of the photo-curing resin. When using a thermosetting resin, it is necessary to provide a mechanism for heating the thermosetting resin instead of the light irradiator. For example, a heater is provided inside the stage 40, and the heater heats the thermosetting resin via the substrate 71. In addition, a heater is good also as a structure which is provided in the 2nd surface 32 side of the mold 30, and heats thermosetting resin using near infrared rays etc. instead of being provided in the stage 40 inside. Moreover, when using a thermoplastic resin, it is necessary to provide further the mechanism which cools a thermoplastic resin in addition to the above heating mechanisms instead of a light irradiation device. For example, the thermoplastic resin can be cooled via the surface of the pressing roll 10 and the mold 30 by providing a cooling flow path in the pressing roll 10 and flowing cooling water or a cooling gas through the cooling flow path. However, when the thermal imprint method is adopted, since the elastic member 50 is provided on the stage 40 on the outer periphery of the substrate 71, the elastic member 50 pushes up the mold 30 to cure the thermosetting resin or the thermoplastic resin. Since the mold 30 may be separated from the thermosetting resin or thermoplastic resin before the molding, it is necessary to hold the mold 30 so as not to separate from the thermosetting resin or thermoplastic resin by providing a plurality of holding rolls 20 or the like. .

  Although the imprint apparatus 1 includes the cylindrical holding roll 20, the imprint apparatus 1 is not limited to this, and the portion of the mold 30 after the pressing by the pressing roll 10 is released does not leave the UV curable resin or the like. If it can hold | maintain like this, instead of the holding roll 20, you may use the holding member which is not cylindrical.

  INDUSTRIAL APPLICABILITY The present invention is useful for an imprint method that can improve the transfer quality of a fine pattern while preventing the photocurable resin applied on the substrate from spreading outside the edge of the substrate.

DESCRIPTION OF SYMBOLS 1 Imprint apparatus 10 Press roll 20 Holding roll 30 Mold 36 Shading mask 40 Stage 41 Placement area 50 Elastic member 60 UV irradiator 70 UV curable resin 71 Board | substrate 72 Edge 73 Gap | interval part 80 Control part

Claims (7)

Placing the substrate on a placement region on the stage so as to form a constant gap between the substrate coated with the photocurable resin and the elastic member provided on the stage;
The mold is formed by pressing the photo-curing resin and the elastic member sequentially with a pressing roll through a mold that is a thin plate and has flexibility and light transmission and is held at a predetermined tension. Pressing the fine pattern formed on the first surface of the photocurable resin,
Irradiating light to the photocurable resin in a state where the fine pattern is pressed,
The thickness of the elastic member is larger than the thickness of the substrate, the elastic member is deformed by being pressed by the pressing roll, and the difference in thickness between the elastic member and the substrate is reduced. And imprint method. The mold has a light shielding mask on a second surface opposite to the first surface,
The imprint method according to claim 1, wherein the light shielding mask shields light applied to the gap portion. A photo-curing resin that maintains an uncured state when the light-shielding mask shields light from the photo-curing resin applied to another substrate in a state in which the photo-curing resin remains in a part of the first surface of the mold. The imprint method according to claim 2, wherein imprinting is performed. The imprint method according to claim 1, wherein the substrate has a circular planar shape. A step of placing the substrate on the placement region on the stage so as to form a certain gap between the substrate coated with thermosetting resin or thermoplastic resin and the elastic member provided on the stage. When,
By pressing the thermosetting resin or thermoplastic resin and the elastic member sequentially with a pressing roll through a mold that is thin and flexible and held at a predetermined tension, Pressing the fine pattern formed on the first surface of the mold against a thermosetting resin or a thermoplastic resin softened by heating;
A step of heating or cooling the thermosetting resin or the thermoplastic resin in a state where the fine pattern is pressed, and curing.
The thickness of the elastic member is larger than the thickness of the substrate, the elastic member is deformed by being pressed by the pressing roll, and the difference in thickness between the elastic member and the substrate is reduced. And imprint method. A stage having a placement area for placing a substrate coated with a photocurable resin;
A mold having a thin plate shape, having flexibility and light transmission, having a fine pattern on the first surface facing the mounting area of the stage, and being held at a predetermined tension;
A pressing roll capable of pressing the second surface opposite to the first surface of the mold;
A holding member for holding a part of the mold after the pressing by the pressing roll is released;
A light irradiator disposed on the second surface side of the mold and capable of irradiating light toward a placement area of the stage;
An elastic member provided on the stage so as to form a constant gap with the placement area;
The imprint apparatus, wherein the elastic member is deformable in a direction in which the pressing roll presses the mold. The mold has a light shielding mask on the second surface,
The imprint apparatus according to claim 6, wherein the light shielding mask shields light applied to the gap portion.