JP2016012178A - Device and method for managing temperature inside server rack - Google Patents

Abstract

PROBLEM TO BE SOLVED: To simply decide an appropriate measure against heat accumulation inside a server rack.SOLUTION: A device for managing temperature inside a server rack 100 comprises: a temperature distribution acquisition section 30 which acquires temperature distribution data on a front surface of a server rack 70; an extraction section 32 which extracts temperature distribution data in a width direction of the server rack 70 on the basis of the temperature distribution data acquired by the temperature distribution acquisition section 30; a determination section 34 which determines an equipment constitution pattern on the basis of the temperature distribution data in the width direction extracted by the extraction section 32; and a decision section 36 which decides a measure against heat accumulation inside the server rack 70 on the basis of the equipment constitution pattern determined by the determination section 34.

Description

  The present invention relates to a server rack temperature management device and a server rack temperature management method.

  In recent years, in the data center, for the purpose of energy saving in the server room, countermeasures for heat accumulation such as separation of warm air and cold air in the server room and change of arrangement of the server rack are taken. Patent Document 1 discloses a method for modeling a temperature distribution in a data center.

  However, recently, it has been found that heat accumulation has occurred in the server rack installed in the server room. Countermeasures for heat accumulation in the server rack include installation of a blank panel in the server rack and adjustment of the opening degree of the opening / closing part of the server rack wall surface.

Special table 2013-502006 gazette

  When implementing measures against heat accumulation in the server rack, an operator needs to grasp the device configuration pattern in the server rack and take measures against heat accumulation suitable for the device configuration pattern.

  However, in order to grasp the device configuration pattern, specialized knowledge about the data center and the server rack is necessary, and it is very inefficient if an operator investigates the state of countless server racks.

  In one aspect, an object of the present invention is to provide a server rack temperature management device and a server rack temperature management method capable of easily determining an appropriate heat accumulation countermeasure in a server rack.

  In one aspect, the temperature management device in the server rack includes a temperature distribution acquisition unit that acquires temperature distribution data of a front or back surface of the server rack, and the server based on the temperature distribution data acquired by the temperature distribution acquisition unit. An extraction unit for extracting temperature distribution data in the width direction of the rack; a determination unit for determining a device configuration pattern in the server rack based on the temperature distribution data in the width direction extracted by the extraction unit; and the determination unit And a determining unit that determines a countermeasure for heat accumulation in the server rack based on the device configuration pattern determined by the above.

  In one aspect, the temperature management method in the server rack acquires temperature distribution data of the front or back of the server rack, and extracts temperature distribution data related to the width direction of the server rack based on the acquired temperature distribution data. Determining a device configuration pattern in the server rack based on the extracted temperature distribution data in the width direction, and determining a countermeasure for heat accumulation in the server rack based on the determined device configuration pattern. This is a server rack temperature management method executed by a computer.

  It is possible to easily determine an appropriate heat accumulation countermeasure in the server rack.

It is a perspective view which shows the server rack in which the temperature management apparatus in a server rack which concerns on 1st Embodiment is utilized. It is a figure which shows the hardware constitutions of the temperature management apparatus in a server rack which concerns on 1st Embodiment. It is a figure which shows the hardware constitutions of the control apparatus of FIG. It is a functional block diagram of the control apparatus of FIG. FIG. 5A is a diagram illustrating an example of an area table, FIG. 5B is a diagram illustrating an example of a device configuration pattern table, and FIG. 5C is a diagram illustrating an example of a countermeasure table. It is. It is a flowchart which shows the process of the control apparatus which concerns on 1st Embodiment. It is a figure which shows the temperature distribution data of the whole server rack front surface. FIG. 8A is a graph showing temperature distribution data in the width direction of the fourth-stage unit, and FIG. 8B is a graph showing temperature distribution data in the width direction of the 22-th unit. It is a graph which shows the temperature distribution data of the width direction of the 32nd-stage unit. FIG. 10A is a graph showing the position of the highest temperature and the areas A to C in the temperature distribution data in the width direction of the fourth stage unit, and FIG. 10B shows the width of the 32nd unit. It is the graph which showed the position and AC area | region of the highest temperature to the temperature distribution data of a direction. It is a figure which shows an example of the apparatus structure pattern obtained as a result of the process of FIG. It is a flowchart which shows the process of the control apparatus which concerns on 2nd Embodiment. FIGS. 13A and 13B are graphs for explaining steps S18 'and S20' in FIG. 13 is a table showing an example of a processing result in step S18 ′ of FIG. 12. FIG. 15A is a graph of temperature distribution data showing an example in which the device configuration pattern is a central high-temperature device in the third embodiment, and FIG. 15B is a diagram of the device in the third embodiment. It is a graph of the temperature distribution data which shows the example from which a structure pattern becomes a front part high temperature apparatus. It is a flowchart which shows the process of the control apparatus which concerns on 3rd Embodiment. It is a flowchart which shows the specific process of step S22 'of FIG. It is a figure which shows an example of the countermeasure table used in 3rd Embodiment. It is FIG. (1) for demonstrating a modification. It is FIG. (2) for demonstrating a modification.

<< First Embodiment >>
Hereinafter, a first embodiment of a server rack temperature management apparatus will be described in detail with reference to FIGS.

  FIG. 1 is a perspective view showing a server rack 70 in which the server rack temperature management apparatus of this embodiment is used. As an example, the server rack 70 has 42-stage units therein, and each unit can store equipment constituting the server. As shown in FIG. 1, an opening / closing window 72 is provided on the upper wall and side wall of the server rack 70. The opening degree of the opening / closing window 72 is adjusted by the server rack temperature management device 100 (see FIG. 2).

  FIG. 2 is a block diagram showing the configuration of the server rack temperature management apparatus 100. As shown in FIG. 2, the server rack temperature management device 100 includes an infrared camera 10, a display device 12, an opening adjustment mechanism 16 as an adjustment device, and a control device 50.

  As shown in FIG. 1, the infrared camera 10 is installed so as to face the front surface of the server rack 70. The infrared camera 10 acquires temperature distribution data (see FIG. 7) for the entire front surface of the server rack (for example, width 700 [mm], height 2000 [mm]) under the instruction of the control device 50. In place of the infrared camera 10, resistance temperature detector thermometer, thermocouple thermometer, radiation thermometer, bimetal thermometer, thermal expansion thermometer, thermistor thermometer, optical fiber type The temperature distribution data of the entire front surface of the server rack 70 may be acquired using a thermometer or the like.

  The display device 12 includes a liquid crystal display and the like, and displays information related to measures against heat accumulation in the server rack 70 under the instruction of the control device 50.

  The opening adjustment mechanism 16 includes a motor and the like, and drives the motor and the like under the instruction of the control device 50, thereby opening and closing the opening and closing window 72 provided in the server rack 70 and adjusting the opening of the opening and closing window 72. To do. When a plurality of opening / closing windows 72 are provided in the server rack 70, a plurality of opening adjustment mechanisms 16 are prepared corresponding to the opening / closing windows 72.

  The control device 50 comprehensively controls the server rack temperature management device 100. Specifically, the control device 50 determines the device configuration pattern of each unit of the server rack 70 from the temperature distribution data of the server rack 70, and determines a countermeasure for heat accumulation in the server rack 70 based on the device configuration pattern. In addition, the control device 50 notifies the operator of the determined heat accumulation countermeasure information to the operator via the display device 12, and controls the driving of the opening adjustment mechanism 16 in order to execute the determined heat accumulation countermeasure.

  FIG. 3 shows a hardware configuration of the control device 50. As shown in FIG. 3, the control device 50 includes a CPU (Central Processing Unit) 90, a ROM (Read Only Memory) 92, a RAM (Random Access Memory) 94, a storage unit (here, an HDD (Hard Disk Drive)) 96, An input / output interface 97, a portable storage medium drive 99, and the like are provided. To the input / output interface 97, the infrared camera 10, the display device 12, and the opening adjustment mechanism 16 shown in FIG. Each component of the control device 50 is connected to a bus 98. In the control device 50, the CPU 90 executes a program stored in the ROM 92 or the HDD 96 or a program read from the portable storage medium 91 by the portable storage medium drive 99, whereby a temperature distribution acquisition unit shown in FIG. 30, functions as the extraction unit 32, the determination unit 34, the determination unit 36, the display control unit 38, and the drive control unit 40 are realized. 4 also shows an area table 20 stored in the HDD 96 of the control device 50, a device configuration pattern table 22 as a storage unit, and a countermeasure table 24.

  The temperature distribution acquisition unit 30 acquires temperature distribution data of the entire front surface of the server rack 70 from the infrared camera 10. The temperature distribution acquisition unit 30 transmits the acquired temperature distribution data to the extraction unit 32.

  Based on the temperature distribution data acquired by the temperature distribution acquisition unit 30, the extraction unit 32 extracts temperature distribution data regarding the width direction of the server rack 70 for each position (height) corresponding to each unit of the server rack 70. Here, the width direction means a direction perpendicular to the direction in which the units are arranged on the front surface of the server rack 70. That is, in the present embodiment, the width direction means a direction (horizontal direction) perpendicular to the vertical direction within the front surface of the server rack 70.

  The determination unit 34 determines the device configuration pattern of each unit in the server rack 70 based on the temperature distribution data in the width direction extracted by the extraction unit 32. In the present embodiment, the device configuration pattern includes a left end high temperature device, a center high temperature device, and a right end high temperature device. The determination unit 34 uses the area table 20 and the device configuration pattern table 22 when determining the device configuration pattern. Here, as shown in FIG. 5A, the area table 20 includes each area (A area, A), when the server rack 70 is divided into a plurality of areas (three in FIG. 5A) in the width direction. A range of (B region, C region) is defined. In the case of FIG. 5A, the area A is a range from the left end (0 mm) of the front surface of the server rack 70 to a position of 233 mm, and the area B is from a position of 233 mm from the left end of the front surface of the server rack 70 to a position of 466 mm. Range. Further, the area C is a range from a position of 466 mm from the left end of the front surface of the server rack 70 to the right end (700 mm). The device configuration pattern table 22 has a data structure as shown in FIG. Details of the device configuration pattern table 22 in FIG. 5B will be described later.

  The determination unit 36 determines a heat accumulation countermeasure to be taken based on the device configuration pattern (any one of the left end high temperature device, the center high temperature device, and the right end high temperature device) determined by the determination unit 34. In this case, the determination unit 36 uses the countermeasure table 24 shown in FIG. The countermeasure table 24 is a table that stores the device configuration pattern in association with the countermeasure to be taken. Specifically, the countermeasure table 24 indicates that when the device configuration pattern is the left-end high-temperature device or the right-end high-temperature device, a measure “change the opening of the wall surface of the server rack 70” should be taken. It is defined that when the device configuration pattern is a central high-temperature device, a measure of “mounting a blank panel” should be taken.

  When the countermeasure for the heat accumulation determined by the determining section 36 is a countermeasure requiring manual work by the operator, the display control section 38 displays information on the countermeasure for the heat accumulation on the display device 12 to notify the operator. To do. For example, when the measure is “blank panel mounting”, the display control unit 38 displays on the display device 12 at which position on the front surface of the server rack 70 the blank panel should be mounted.

  The drive control unit 40 executes the heat accumulation countermeasure when the heat accumulation countermeasure determined by the determination unit 36 is an automatic countermeasure. Specifically, when the countermeasure is “change in the opening degree of the server rack wall surface”, the drive control unit 40 controls the opening degree adjusting mechanism 16 to change the opening degree of the opening / closing window 72.

  Next, processing of the server rack temperature management apparatus 100 according to the present embodiment will be described in detail along the flowchart of FIG. 6 with reference to other drawings as appropriate. As a premise of this processing, it is assumed that Y, which is a parameter indicating the unit (number of stages) of the server rack 70, is set to an initial value 1.

  In the process of FIG. 6, first, in step S <b> 10, the temperature distribution acquisition unit 30 acquires temperature distribution data of the entire front surface of the server rack 70. In the present embodiment, as an example, it is assumed that temperature distribution data of the entire front surface of the server rack 70 as illustrated in FIG. 7 is acquired. In FIG. 7, it is assumed that the temperature increases in the order of a black portion, a hatched portion, and a white portion. Moreover, since the black-colored part is high temperature, it means the heat accumulation part in the server rack 70.

  In the process of FIG. 6, after step S10, the processes of steps S12 to S28 are repeated until the parameter Y reaches the total number of units YE (YE = 42 in this embodiment) (until S26 is affirmed). It is supposed to be.

  In step S12, the extraction unit 32 extracts temperature distribution data in the width direction of the height corresponding to the Y-th stage. In the case of the Y stage = 1 stage, the extraction unit 32 extracts temperature distribution data at a predetermined height of the first stage unit (the uppermost unit). In this case, for example, when the dimension in the height direction of the unit is 44.45 [mm], the extraction unit 32 extracts the temperature distribution in the width direction at a height of 22.225 [mm] from the lower surface of the unit. It shall be.

  FIG. 8A shows an example of the temperature distribution in the width direction when the Y stage = the fourth stage, and FIG. 8B shows the width when the Y stage = the 22nd stage. An example of the temperature distribution in the direction is shown. FIG. 9 shows an example of the temperature distribution in the width direction when the Y-th level = 32-th level.

  Next, in step S14, the determination unit 34 extracts the maximum temperature in the temperature distribution data in the width direction of the height corresponding to the Y-th stage. In this case, the determination unit 34 extracts the maximum temperature from the temperature distribution data in the width direction of the Y-th stage extracted in step S14. For example, in the case of the temperature distribution data in FIG. 8A, 35 ° C. is extracted as the maximum temperature. In the case of the temperature distribution data in FIG. 8B, 22 ° C. is extracted as the maximum temperature. In the case of the temperature distribution data of FIG. 9, 33 ° C. is extracted as the maximum temperature.

  Next, in step S16, the determination unit 34 determines whether or not the maximum temperature is equal to or higher than a predetermined threshold value. As the threshold value in this case, for example, 25 ° C. can be adopted. In the process of step S16, it can be said that it is determined whether there is a heat accumulation in the Y-stage unit. If the determination in step S16 is negative, that is, if there is no heat accumulation in the Y-stage unit, the process proceeds to step S26. On the other hand, if the determination in step S16 is affirmative, that is, if there is a heat accumulation in the Y-th unit, the process proceeds to step S18. For example, in the case of the temperature distribution data of FIG. 8A and FIG. 9, the maximum temperature is equal to or higher than the threshold value (25 ° C.), so the determination in step S16 is affirmed. On the other hand, in the case of the temperature distribution data of FIG. 8B, since the maximum temperature is less than the threshold value, the determination in step S16 is negative.

  When it is determined that there is a heat accumulation in the Y-stage unit and the process proceeds to step S18, the determination unit 34 specifies the position in the width direction of the maximum temperature. The position of the maximum temperature is the distance from the left end portion of the front surface of the server rack 70 of the maximum temperature extracted in step S14. When Y = 4 shown in FIG. 8A, the position of the maximum temperature is 650 mm as shown in FIG. Further, in the case of Y = 32 shown in FIG. 9, the position of the maximum temperature is 350 mm as shown in FIG.

  Next, in step S20, the determination unit 34 specifies a region including the position of the highest temperature. In this case, the determination unit 34 sets the A area, the B area, and the C area as shown in FIGS. 10A and 10B based on the area table 20 (FIG. 5A) (division). To do). Then, the determination unit 34 determines in which of the A to C regions the position of the highest temperature is included. In the case of Y = 4 shown in FIG. 10A, it is determined that the position of the highest temperature (650 mm) is included in the C region. Further, in the case of Y = 32 shown in FIG. 10B, it is determined that the position of the highest temperature (350 mm) is included in the B region.

  Next, in step S22, the determination unit 34 determines the device configuration pattern of the Y-th unit. In this case, the determination unit 34 determines the device configuration pattern of the Y-th unit based on the identification result of step S20 and the device configuration pattern table 22 of FIG. Here, the device configuration pattern table 22 of FIG. 5B stores device configuration patterns corresponding to the respective areas A to C. In the example of FIG. 5B, when the highest temperature position is in the A area, it is stored that the left side of the unit is a “left end high temperature apparatus” on which a high temperature apparatus is mounted, and the highest temperature is stored in the B area. When there is a position, it is stored that it is a “central high temperature device” in which a device having a high temperature in the center of the unit is mounted. Further, in the example of FIG. 5B, when the position of the maximum temperature is in the C region, it is stored that the “right end high-temperature device” is mounted with a device on the right side of the unit that has a high temperature. Therefore, if Y = 4, the determination unit 34 determines “right-end high-temperature device” based on the highest temperature position (C region). In addition, when Y = 32, the determination unit 34 determines “center high-temperature device” based on the position of the highest temperature (B region).

  Next, in step S24, the determination unit 36 determines a countermeasure for heat accumulation in the Y-th unit. In this case, the determination unit 36 determines the optimum heat accumulation countermeasure based on the device configuration pattern determined in step S22 and the countermeasure table 24 of FIG. For example, in the case of a unit with Y = 4, since it is “right end high temperature device”, the determination unit 36 determines “change the opening of the server rack wall surface” as a countermeasure. In the case of a unit with Y = 32, since it is a “central high temperature device”, the determination unit 36 determines “blank panel mounting” as a countermeasure.

  Next, in step S <b> 26, the extraction unit 32 determines whether Y is the final stage (YE stage) of the server rack 70. In the present embodiment, the extraction unit 32 determines whether Y = 42. If the determination is negative, the process proceeds to step S28, and the extraction unit 32 increments Y by 1 (Y ← Y + 1), and returns to step S12. Thereafter, Y becomes 42, and the processes and determinations in steps S10 to S28 are repeated until the determination in step S26 is affirmed. In the present embodiment, when the determination in step S26 is affirmed, as shown in FIG. 11, the device configuration pattern of the units in the first to fourth stages is determined as “right-end high-temperature device”. It is assumed that “change the opening of the server rack wall surface” is determined. Further, it is assumed that the equipment configuration pattern of the 31st to 33rd stage units is determined as “central high temperature equipment” and “blank panel mounting” is determined as a countermeasure. It is assumed that the other units are determined to have no heat accumulation.

  When the determination in step S26 is affirmed and the process proceeds to step S30, the display control unit 38 displays, on the display device 12, information on the countermeasure to be notified to the worker among the countermeasures determined in step S24. In the present embodiment, the display control unit 38 displays on the display device 12 such that a blank panel is mounted on the front surface of the 31st to 33rd stage units of the server rack 70. In addition, since the worker can know the measures to be taken for the server rack 70 by referring to the information displayed on the display device 12, it is possible to take an appropriate measure against heat accumulation.

  In step S32, the drive control unit 40 executes a countermeasure that can be automatically performed among the countermeasures. Specifically, the drive control unit 40 adjusts the opening degree of the opening / closing window 72 from, for example, 0% to 50% via the opening degree adjusting mechanism 16. As a result, the drive control unit 40 can automatically take an appropriate countermeasure against heat accumulation. If the opening / closing window 72 of the server rack 70 cannot be opened / closed automatically, display may be performed so that the display control unit 38 adjusts the opening degree of the opening / closing window 72 on the display device 12 in step S30.

  After the process of step S32 is performed, the whole process of FIG. 6 is complete | finished.

  As described above in detail, according to the present embodiment, the temperature distribution acquisition unit 30 that acquires the temperature distribution data of the front surface of the server rack 70, and the server based on the temperature distribution data acquired by the temperature distribution acquisition unit 30. Based on the temperature distribution data regarding the width direction extracted by the extraction unit 32 and the extraction unit 32 that extracts the temperature distribution data regarding the width direction of the rack 70 (FIGS. 8A, 8B, and 9). A determination unit 34 for determining a device configuration pattern in the rack 70 and a determination unit 36 for determining a heat accumulation countermeasure in the server rack 70 based on the device configuration pattern determined by the determination unit 34 are provided. Thereby, it is possible to easily determine an appropriate heat accumulation countermeasure based on the device configuration pattern in the server rack 70 determined based on the temperature distribution data. In addition, since the display control unit 38 uses the display device 12 to notify an appropriate countermeasure for heat accumulation, or the drive control unit 40 drives the opening adjustment mechanism 16 based on the appropriate countermeasure for heat accumulation, the server rack The heat accumulation in 70 can be effectively eliminated.

  Further, in the present embodiment, the determination unit 34 refers to the device configuration pattern table 22 that stores the trend of the temperature distribution data related to the width direction of the server rack 70 and the device configuration pattern in association with each other. Since the device configuration pattern is determined, the determination unit 34 can determine the device configuration pattern by a simple method.

  In the present embodiment, the temperature in the server rack 70 is displayed based on the display control unit 38 that displays information related to the heat accumulation countermeasure determined by the determination unit 36 on the display device 12 and the heat accumulation countermeasure determined by the determination unit 36. And a drive control unit 40 that controls the drive of the opening adjustment mechanism 16 that performs the adjustment. The display control unit 38 is used to prompt the operator to take measures against heat accumulation, and the drive control unit 40 can automatically It becomes possible to take measures against heat accumulation in Note that one of the display control unit 38 and the drive control unit 40 may be omitted in accordance with the configuration of the server rack 70, the operator's work needs in measures against heat accumulation, and the like.

  In the present embodiment, the server rack 70 has a plurality of units, the extraction unit 32 extracts temperature distribution data related to the width direction corresponding to each of the units of the plurality of units, and the determination unit 34 has a plurality of units. The device configuration pattern of each unit is determined. Thereby, it becomes possible to take measures against heat accumulation in consideration of the device configuration pattern of each unit.

  In the present embodiment, among the temperature distribution data related to the width direction, which of the plurality of regions divided in the width direction of the server rack 70 includes a position where the temperature is equal to or greater than a predetermined threshold value. Since the device configuration pattern is determined based on the above, the device configuration pattern can be determined by a simple method.

<< Second Embodiment >>
Next, a server rack temperature management apparatus according to the second embodiment will be described with reference to FIGS. In the second embodiment, the configuration of the temperature management device in the server rack is the same as that of the first embodiment, but a part of the processing by the control device 50 is different from the first embodiment. Yes.

  FIG. 12 is a flowchart showing processing executed by the control device 50 of the server rack temperature management apparatus according to the second embodiment. As can be seen by comparing FIG. 12 and FIG. 6, in the second embodiment, step S18 ′ is executed instead of step S18 of FIG. 6, and step S20 ′ is executed instead of step S20. It is like that. Hereinafter, step S18 'and step S20' will be described in detail.

  In FIG. 12, the case where the process proceeds to step S18 ′ means that the temperature distribution data in the width direction of the server rack 70 is data as shown in FIG. 8A and FIG. 9 (data in which heat accumulation is determined to have occurred). ).

  In step S18 ', the determination unit 34 calculates an integrated value of the temperature distribution data in each of the A to C regions. Specifically, in the case of Y = 4, as shown in FIG. 13A, the integral value of the hatched part in the A region (range from 0 [mm] to 233 [mm]), B Integral value of the hatched part in the region (range from 233 [mm] to 466 [mm]), Integral value of the hatched part in the C region (range of 466 [mm] to 700 [mm]) Is calculated. That is, when the temperature is T and the position in the width direction is x, the determination unit 34 calculates the integral value of each region by the following equations (1) to (3).

  In this case, as shown in FIG. 14, the A region integration value is 4600 ° C. · mm, the B region integration value is 5600 ° C. · mm, and the C region integration value is 7500 ° C. · mm. .

  Similarly, in the case of Y = 32, as shown in FIG. 13B, the integral value of the hatched portion in the A region, the integral value of the hatched portion in the B region, and the C region The integral value of the hatched part is calculated from the above formulas (1) to (3).

  In this case, as shown in FIG. 14, the A region integration value is 4800 ° C. · mm, the B region integration value is 7200 ° C. · mm, and the C region integration value is 4800 ° C./mm. .

  Next, in step S20 ', the determination unit 34 specifies the region of the maximum integration value. If Y = 4, the determination unit 34 specifies the C region as the region of the maximum integration value. If Y = 32, the determination unit 34 specifies the region B as the region of the maximum integration value.

  Thereafter, using the region determined in step S20 ', the determination unit 34 determines the device configuration pattern (S22), and the determination unit 36 determines a countermeasure for heat accumulation (S24). Then, at the stage where the heat accumulation countermeasures of the units where all the heat accumulation has occurred are determined (S26: Yes), the display control unit 38 displays information on the heat accumulation countermeasures on the display device 12 (S30). The drive control unit 40 drives the opening adjustment mechanism 16 (S32).

  As described above, as in the second embodiment, the integrated values of the A to C regions are obtained, and the device configuration pattern and the heat accumulation countermeasure are determined based on the region where the integrated value is the maximum. The same effects as those of the first embodiment can be obtained.

<< Third Embodiment >>
Next, a third embodiment will be described with reference to FIGS. In the first and second embodiments described above, for example, the temperature distribution data in the width direction as shown in FIG. 15A and the temperature distribution data in the width direction as shown in FIG. 15B are the same. The case of the device configuration pattern (central high temperature device) has been described. However, actually, the device configuration pattern may be different in the temperature distribution data of FIGS. 15 (a) and 15 (b). For example, the device configuration pattern when the temperature distribution data has a steep shape as shown in FIG. 15A is “central high temperature device”, and the temperature distribution data has a gentle shape as shown in FIG. This is a case where the device configuration pattern is “front surface high temperature device”. In the third embodiment, an example will be described in which device configuration patterns are different in the temperature distribution data of FIGS. 15A and 15B. The configuration of the server rack temperature management apparatus in the third embodiment is the same as that in the first and second embodiments.

  FIG. 16 shows processing by the control device 50 of the third embodiment. In the third embodiment, a subroutine for determining a device configuration pattern in step S22 'is executed instead of step S22 in the first embodiment. In the subroutine of step S22 ', processing according to the flowchart of FIG. 17 is executed. As a premise that the process of FIG. 17 is executed, temperature distribution data in the width direction as shown in FIGS. 15A, 15B, and 10A is obtained, and the position of the maximum temperature is included. It is assumed that a region (FIGS. 15A and 15B is a B region, and FIG. 10A is a C region) is specified.

  In the process of FIG. 17, first, in step S <b> 40, the determination unit 34 determines whether or not the specified area is the B area. For example, when the area specified as shown in FIG. 10A is the C area, the determination in step S40 is negative and the process proceeds to step S42.

  In step S42, the determination unit 34 determines whether the specified area is the A area. When the region specified as shown in FIG. 10A is the C region, the determination in step S42 is denied, and in step S46, the determination unit 34 determines “right end high-temperature equipment”. The process proceeds to step S24 in FIG. On the other hand, if the determination in step S42 is affirmative, the process proceeds to step S44, where the determination unit 34 determines “the left end high temperature device”, and the process proceeds to step S24 in FIG.

  On the other hand, when the determination in step S40 is affirmative (in the case of FIG. 15A and FIG. 15B), the process proceeds to step S48, and the determination unit 34 determines the average temperature of the region excluding the B region. Is calculated. Specifically, the determination unit 34 calculates the average temperature of the A region and the C region. In the case of the temperature distribution data in FIG. 15A, it is assumed that the average temperature in the A region and the C region is 24 ° C. Further, in the case of the temperature distribution data of FIG. 15B, it is assumed that the average temperature of the A region and the C region is 29 ° C.

  Next, in step S50, the determination unit 34 calculates a difference Tm between the maximum temperature and the average temperature calculated in step S48. In the case of FIG. 15A, the maximum temperature is 33 ° C., and the average temperature is 24 ° C., so the difference is 9 ° C. On the other hand, in the case of FIG. 15B, since the maximum temperature is 33 ° C. and the average temperature is 29 ° C., the difference is 4 ° C.

  Next, in step S52, the determination unit 34 determines whether Tm is greater than or equal to a threshold value (for example, 5 ° C.). If the determination in step S52 is affirmative, it means that the temperature distribution data has been determined to have a steep shape. Therefore, in step S54, the determination unit 34 is “central high-temperature device”. judge. Thereafter, the process proceeds to step S24 in FIG. On the other hand, if the determination in step S52 is negative, it means that the temperature distribution data has been determined to have a gradual shape. Therefore, in step S56, the determination unit 34 is a “front surface high temperature device”. Is determined. Thereafter, the process proceeds to step S24 in FIG.

  If transfering it to step S24, the determination part 36 will determine a heat accumulation countermeasure. Here, the determination unit 36 uses a table as shown in FIG. 18 as the countermeasure table 24. That is, in the case of the temperature distribution data as shown in FIG. 15A, since it is a “central high temperature device”, “blank panel mounting” is determined as a countermeasure. Further, in the case of the temperature distribution data as shown in FIG. 15B, since it is “front surface high temperature equipment”, “change in opening of server rack wall surface and mounting of fan” is determined as a countermeasure. Further, in the case of the temperature distribution data as shown in FIG. 10A, since it is “right-end high-temperature equipment”, “change in opening of server rack wall surface” is determined as a countermeasure. For example, when “change in server rack wall opening and fan installation” is determined as a countermeasure, the display control unit 38 displays on the display device 12 that the fan needs to be installed at a predetermined position (S30). . Moreover, the drive control part 40 controls the drive of the opening degree adjustment mechanism 16 so that the opening degree of the opening-and-closing window of the server rack 70 may be 0% to 50% (S32). Other countermeasures for heat accumulation are the same as those in the first embodiment.

  As described above, according to the third embodiment, the region including the position of the highest temperature is the same, but the device configuration pattern is different when the shape of the temperature distribution data is different (FIG. 15 ( Even in the case of (a) and FIG. 15 (b)), it is possible to determine an appropriate device configuration pattern and determine an appropriate heat accumulation countermeasure. Thereby, the countermeasure against the heat accumulation in the server rack 70 can be effectively executed.

  Further, in the third embodiment, even when it is not possible to take an appropriate heat accumulation countermeasure only by specifying a portion having a high temperature, the device configuration data is determined from the temperature distribution data, and the heat accumulation countermeasure is determined. By taking the steps described above, it is possible to take appropriate measures against heat accumulation.

  In the third embodiment, as shown in FIG. 16, the case where the processes of steps S18 and S20 are executed after step S16 has been described (illustrated), but the present invention is not limited to this. That is, after step S16, the processes of steps S18 'and S20' may be executed as in FIG. 12 (second embodiment).

  In the third embodiment, the case where the feature of the shape of the temperature distribution data is specified from the difference between the average value of the temperatures in the A and C regions and the maximum temperature has been described. It is good also as specifying the characteristic of the shape of temperature distribution data using a method. For example, if there are multiple peaks in the temperature distribution, or if the device configuration pattern differs due to deviations in the region of the maximum temperature position, etc., specify the shape characteristics of the temperature distribution data taking them into account However, the device configuration pattern may be determined.

  In each of the above-described embodiments, the case where the temperature distribution data of the entire front surface of the server rack 70 is collectively acquired using the infrared camera 10 or the like as illustrated in FIGS. 1 and 2 is limited. It is not a thing. For example, when a line scan type radiation thermometer is used in place of the infrared camera 10, the temperature distribution data of each unit may be obtained one step at step S10 in FIGS. In this case, after step S28, the process may return to step S10, and the processes and determinations of steps S10 to S28 may be repeatedly executed.

  In each of the above-described embodiments, the case where the temperature distribution data is acquired at the height corresponding to all the units has been described. However, the present invention is not limited to this, and for example, the server rack 70 using a line scan type radiation thermometer. The temperature distribution data may be acquired at one or more arbitrary heights. As the arbitrary height, it is possible to adopt a height or the like in which characteristics (rough device configuration pattern) in the server rack 70 can be determined from the temperature distribution data in the past. Even in this case, an appropriate countermeasure against heat accumulation can be realized in the server rack 70.

  In the above embodiments, a plurality of fans 65 as shown in FIG. 19 may be provided on the front surface of the server rack 70. In the example of FIG. 19, three fans 65, left, center, and right, are provided for three units. The drive control unit 40 controls the driving of these fans 65. In this case, for example, as illustrated in FIG. 11, it is assumed that the first to fourth stage units are “right end high temperature equipment” and the 31st to 33rd stage units are “center high temperature equipment”. In such a case, the drive control unit 40 drives the fan 65 indicated by a thick line in FIG. 19 and stops the other fans. Even in this case, the heat accumulation in the server rack 70 can be effectively eliminated. In this case, since the number of fans 65 to be driven can be minimized, power consumption can be reduced. The installation position of the fan 65 is not limited to the front surface of the server rack 70, and may be installed on the back surface, the side surface, the upper surface, or the like.

  In each of the above embodiments, as shown in FIG. 20, a floor blowing grill 67 may be provided on the floor on the front side of the server rack 70. The floor blow grill 67 has an air flow adjusting plate and an angle adjusting mechanism for the air flow adjusting plate, and the drive control unit 40 can adjust the angle of the air flow adjusting plate to change the blowing direction of the cold air. It has become. In the case where such a floor blowing grill 67 is provided, the drive control unit 40 causes the air flow adjusting plate to pass through the angle adjusting mechanism so that the cold air from the floor blowing grill 67 hits the heat accumulation portion of the server rack 70. The angle may be adjusted. Thereby, the heat accumulation of the server rack 70 can be effectively eliminated.

  In each of the above embodiments, the case where the area is divided into three in the width direction of the server rack 70 has been described, but the present invention is not limited to this. You may make it divide | segment an area | region into 2 or 4 or more.

  In each of the above-described embodiments, the case where the server rack temperature management device 100 holds the tables 20, 22, and 24 has been described. However, the present invention is not limited to this, and an external device (data server) or the like may hold the table. Good. In this case, the server rack temperature management apparatus 100 may communicate with an external apparatus as necessary to acquire information on the tables 20, 22, and 24.

  In each of the above embodiments, the case where the temperature distribution data on the front surface of the server rack is acquired using the infrared camera 10 or the like has been described, but the present invention is not limited to this. For example, the temperature distribution data on the back surface of the server rack 70 may be acquired using the infrared camera 10 or the like, the device configuration pattern may be determined based on the temperature distribution data, and the heat accumulation countermeasure may be determined.

  The above processing functions can be realized by a computer. In that case, a program describing the processing contents of the functions that the processing apparatus should have is provided. By executing the program on a computer, the above processing functions are realized on the computer. The program describing the processing contents can be recorded on a computer-readable recording medium (except for a carrier wave).

  When the program is distributed, for example, it is sold in the form of a portable recording medium such as a DVD (Digital Versatile Disc) or a CD-ROM (Compact Disc Read Only Memory) on which the program is recorded. It is also possible to store the program in a storage device of a server computer and transfer the program from the server computer to another computer via a network.

  The computer that executes the program stores, for example, the program recorded on the portable recording medium or the program transferred from the server computer in its own storage device. Then, the computer reads the program from its own storage device and executes processing according to the program. The computer can also read the program directly from the portable recording medium and execute processing according to the program. Further, each time the program is transferred from the server computer, the computer can sequentially execute processing according to the received program.

  The above-described embodiment is an example of a preferred embodiment of the present invention. However, the present invention is not limited to this, and various modifications can be made without departing from the scope of the present invention.

In addition, the following additional remarks are disclosed regarding description of the above 1st-3rd embodiment and a modification.
(Supplementary Note 1) A temperature distribution acquisition unit that acquires temperature distribution data of the front or back of the server rack;
Based on the temperature distribution data acquired by the temperature distribution acquisition unit, an extraction unit that extracts temperature distribution data related to the width direction of the server rack;
A discriminating unit for discriminating a device configuration pattern in the server rack based on the temperature distribution data related to the width direction extracted by the extracting unit;
A server rack temperature management device comprising: a determination unit that determines a countermeasure for heat accumulation in the server rack based on the device configuration pattern determined by the determination unit.
(Additional remark 2) The said discrimination | determination part discriminate | determines the apparatus configuration pattern in the said server rack with reference to the storage part which links | relates and stores the tendency of the temperature distribution data regarding the width direction of the said server rack, and an apparatus configuration pattern The temperature management device in a server rack according to supplementary note 1, wherein:
(Additional remark 3) The display control part which displays the information regarding the said heat accumulation countermeasure which the said determination part determined on a display apparatus,
The server rack according to appendix 1 or 2, further comprising at least one of a drive control unit that controls driving of an adjustment device that performs temperature adjustment in the server rack based on the heat accumulation countermeasure determined by the determination unit. Temperature management device.
(Supplementary Note 4) The server rack includes a plurality of units.
The extraction unit extracts temperature distribution data related to the width direction corresponding to each of the plurality of units,
The temperature management apparatus in a server rack according to any one of appendices 1 to 3, wherein the determination unit determines a device configuration pattern of each of the plurality of units.
(Additional remark 5) The said discrimination | determination part is based on whether the location which shows a predetermined characteristic in the temperature distribution data regarding the said width direction is located in the some area | region divided | segmented regarding the width direction of the said server rack. 5. The server rack internal temperature management device according to any one of appendices 1 to 4, wherein the device configuration pattern is discriminated.
(Additional remark 6) The temperature in the server rack of Additional remark 5 characterized by the location which shows the said predetermined characteristic being more than a predetermined threshold value, and is a location which shows the maximum value of the temperature distribution data regarding the said width direction. Management device.
(Additional remark 7) The said discrimination | determination part calculates the integral value of the temperature distribution data regarding the said width direction in each of the said several area | region, Based on which of the said several area | region the area | region where the said integral value becomes the maximum is the said area | region The temperature management apparatus in a server rack according to appendix 5, wherein a device configuration pattern in the server rack is determined.
(Additional remark 8) The said discrimination | determination part further discriminate | determines the apparatus structure pattern in the said server rack based on the distribution shape of the temperature distribution data regarding the said width direction, The additional description 5-7 characterized by the above-mentioned. Server rack temperature management device.
(Supplementary note 9) Obtain the temperature distribution data of the front or back of the server rack,
Based on the acquired temperature distribution data, extract the temperature distribution data related to the width direction of the server rack,
Based on the extracted temperature distribution data related to the width direction, determine the device configuration pattern in the server rack,
Based on the determined device configuration pattern, determine a heat accumulation countermeasure in the server rack,
A temperature management method in a server rack, wherein the computer executes processing.
(Supplementary Note 10) In the determination process, the device configuration pattern in the server rack is determined with reference to a storage unit that stores the trend of the temperature distribution data in the width direction of the server rack in association with the device configuration pattern. The server rack temperature management method according to appendix 9, wherein:
(Additional remark 11) The process which displays the information regarding the said heat accumulation countermeasure determined in the process to determine on a display apparatus,
The computer executes at least one of processing for controlling driving of an adjusting device that performs temperature adjustment in the server rack based on the heat accumulation countermeasure determined in the determining processing. The server rack temperature management method according to 9 or 10.
(Supplementary Note 12) The server rack includes a plurality of units.
In the extracting process, temperature distribution data relating to the width direction corresponding to each of the plurality of units is extracted,
12. The server rack temperature management method according to any one of appendices 9 to 11, wherein in the determining process, the device configuration pattern of each of the plurality of units is determined.
(Additional remark 13) In the said discrimination | determination process, based on whether the location which shows a predetermined characteristic in the temperature distribution data regarding the said width direction is located in the some area | region divided | segmented regarding the width direction of the said server rack. 13. The server rack temperature management method according to any one of appendices 9 to 12, wherein a device configuration pattern in the rack is determined.
(Supplementary note 14) The temperature in the server rack according to supplementary note 13, wherein the location indicating the predetermined characteristic is a location that is equal to or greater than a predetermined threshold and indicates a maximum value of the temperature distribution data in the width direction. Management method.
(Supplementary Note 15) In the determination process, an integral value of the temperature distribution data in the width direction in each of the plurality of regions is calculated, and based on which of the plurality of regions is a region where the integral value is maximum. 14. The server rack temperature management method according to appendix 13, wherein a device configuration pattern in the server rack is determined.
(Supplementary note 16) In any one of Supplementary notes 13 to 15, wherein in the determination process, a device configuration pattern in the server rack is further determined based on a distribution shape of temperature distribution data in the width direction. The temperature management method in a server rack as described.

16 Opening adjustment mechanism (adjustment device)
22 Device configuration pattern table (storage unit)
DESCRIPTION OF SYMBOLS 30 Temperature distribution acquisition part 32 Extraction part 34 Discrimination part 36 Determination part 38 Display control part 40 Drive control part 70 Server rack 100 Temperature management apparatus in server rack

Claims (7)

A temperature distribution acquisition unit that acquires temperature distribution data of the front or back of the server rack;
Based on the temperature distribution data acquired by the temperature distribution acquisition unit, an extraction unit that extracts temperature distribution data related to the width direction of the server rack;
A discriminating unit for discriminating a device configuration pattern in the server rack based on the temperature distribution data related to the width direction extracted by the extracting unit;
A server rack temperature management device comprising: a determination unit that determines a countermeasure for heat accumulation in the server rack based on the device configuration pattern determined by the determination unit.   The determining unit determines a device configuration pattern in the server rack with reference to a storage unit that stores a trend of temperature distribution data related to the width direction of the server rack and a device configuration pattern in association with each other. The temperature management apparatus in a server rack according to claim 1. A display control unit for displaying information on the heat accumulation countermeasure determined by the determination unit on a display device;
3. The server rack according to claim 1, further comprising at least one of a drive control unit that controls driving of an adjustment device that performs temperature adjustment in the server rack based on the heat accumulation countermeasure determined by the determination unit. Internal temperature management device. The server rack has a plurality of units,
The extraction unit extracts temperature distribution data related to the width direction corresponding to each of the plurality of units,
4. The server rack temperature management apparatus according to claim 1, wherein the determination unit determines a device configuration pattern of each of the plurality of units. 5.   The determination unit is configured to configure a device configuration in the server rack based on which of the plurality of regions divided in the width direction of the server rack has a portion showing a predetermined characteristic in the temperature distribution data in the width direction. The temperature management apparatus in a server rack according to any one of claims 1 to 4, wherein a pattern is discriminated.   6. The server rack temperature management apparatus according to claim 5, wherein the determination unit further determines a device configuration pattern in the server rack based on a distribution shape of temperature distribution data in the width direction. Obtain the temperature distribution data on the front or back of the server rack,
Based on the acquired temperature distribution data, extract the temperature distribution data related to the width direction of the server rack,
Based on the extracted temperature distribution data related to the width direction, determine the device configuration pattern in the server rack,
Based on the determined device configuration pattern, determine a heat accumulation countermeasure in the server rack,
A temperature management method in a server rack, wherein the computer executes processing.

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