JP2014115108A - Distance measuring device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a distance measuring device capable of accurately measuring distance while reducing an influence of multiple reflection.SOLUTION: The device comprises: projection means for projecting a pattern light on an object; imaging means for imaging the object on which the pattern light is projected; acquisition means for acquiring distance from the projection means or the imaging means to the object to be measured on the basis of a picture imaged by the imaging means; and determination means for determining the pattern light to be projected by the projection means on the basis of a positional relationship between the projection means and the imaging means.

Description

  The present invention relates to a technique for measuring a three-dimensional shape of a target object.

  As a technique for measuring the three-dimensional shape of a measurement target object in a non-contact manner, a technique using a projection device and an imaging device is common. Specifically, it is common to project a fringe pattern, specify the position of the image fringe pattern captured by the captured image on the projection device, and obtain a three-dimensional shape based on the principle of triangulation.

  In such a three-dimensional measurement method, when the measurement target object has a gloss such as a metal part, the pattern light projected on the other surface may be projected several times between the measurement target objects depending on the shape of the measurement target object. Reflection, that is, multiple reflection occurs. Since multiple reflection occurs mutually between objects to be measured, it is also called mutual reflection. When multiple reflection occurs, a reflection that should not originally exist in the object to be measured occurs. When a three-dimensional measurement process is applied based on such a photographed image, the reflection is recognized as noise, which may reduce the measurement accuracy.

  Here, the problem of estimating an incorrect three-dimensional shape due to multiple reflection will be described in detail with reference to FIG. In FIG. 2, 201 is the principal point of the image pickup apparatus, and 202 is an image sensor. Although the image sensor 202 is not physically placed at the position of the image sensor 202, the image sensor 202 will be described at the position 202 for convenience in order not to invert the image. Reference numeral 204 denotes a principal point of the projection apparatus, and 203 denotes a projection element. The arrangement position of the projection element 203 is also arranged at the position 203 for the same reason as the imaging element 202. Here, a stripe pattern 205 for three-dimensional measurement is displayed on the projection element 203. There are three-dimensional measuring machines that project a plurality of fringe patterns, but this time, for the sake of explanation, only the fringe pattern 205 is displayed. The light generated by the fringe pattern 205 travels in the direction of the straight line 206 and is reflected by the surface 207 on the measurement target object 213. The light diffusely reflected by the surface 207 travels in the direction of the straight line 209 and forms an image at a position 210 on the image sensor 202. The light specularly reflected on the surface 207 travels in the direction of the straight line 214, further reflects on the surface 208, travels in the direction of the straight line 211, and forms an image at a position 212 on the image sensor 202. Originally, the three-dimensional shape should be estimated from the image formed at the position 210. However, since it is not known which of the positions 210 and 212 is the image caused by the multiple reflections, it is 212 on the image sensor. When the three-dimensional shape of the image formed at the position is restored, a shape different from the shape of the measurement target object 213 is estimated.

  In Patent Document 1, two types of different pattern lights with different fringe periods (pitch) are projected, a three-dimensional shape is obtained from each, and multiple reflections occur in a region where there is a difference between two three-dimensional measurement results. It is obtained by finding the surface causing the multiple reflection by ray tracing, extinguishing the pattern light corresponding to that surface, and projecting the newly extinguished pattern onto the measurement target object. The three-dimensional measurement result is corrected based on the captured image.

JP 2008-309551 A

However, in the above configuration, ray tracing is performed in order to find the pattern light portion that causes multiple reflection, and the processing is complicated and takes time.
The present invention has been made in view of the above problems, and it is an object of the present invention to reduce the influence of multiple reflection without increasing the number of shots and accurately measure the distance.

  In order to achieve the above object, a distance measuring device according to the present invention includes, for example, a projection unit that projects pattern light onto a target object, an imaging unit that images the target object onto which the pattern light is projected, Based on the image captured by the image capturing unit, the measuring unit that measures the distance from the projection unit or the image capturing unit to the measurement target object, and the positional relationship between the projecting unit and the image capturing unit, Determining means for determining the pattern light to be projected by the projecting means.

  According to the present invention, the influence of multiple reflection can be reduced and the distance can be accurately measured without increasing the number of shots.

It is a figure which shows the whole structure of a distance measuring device. It is the figure which showed the mode of multiple reflection. It is the figure which showed description of the spatial encoding method. It is a figure showing the pattern light of the distance measuring device which concerns on 1st Embodiment. It is a figure explaining epipolar restraint. It is the figure which showed the mode of the projection and imaging in the conventional pattern light and the pattern light of a present Example. It is the figure which showed the case where a some pattern light is used. It is the figure which showed expansion of a three-dimensional measurement area. It is a flowchart showing operation | movement of the distance measuring device which concerns on 1st Embodiment. It is a figure showing the pattern light of the distance measuring device which concerns on 2nd Embodiment. It is a figure showing the pattern light of the distance measuring device which concerns on 3rd Embodiment. It is a flowchart showing operation | movement of the distance measuring device which concerns on 3rd Embodiment.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[First Embodiment]
First, a spatial encoding method that is a general three-dimensional measurement method using an imaging device and a projection device will be described with reference to FIG. In FIG. 3, the distance measuring device includes an imaging unit 101 and a projection unit 102.

  The imaging unit 101 is an industrial camera, for example, and images the measurement target object 108. The projection unit 102 is an apparatus capable of projecting pattern light, such as a laser projector or a liquid crystal projector, and is an apparatus capable of projecting a plurality of patterns such as the pattern light group 302.

  As a distance measurement procedure, the projection unit 102 projects pattern light in which a bright part and a dark part are arranged so as to divide a space such as the pattern lights 303 and 304 from the pattern light group 302. In the figure, the bright part is represented as 1 and the dark part is represented as 0. The pattern lights 303 and 304 are projected onto the measurement target object 108 in time series. For the sake of explanation here, it is assumed that the material of the measurement target object 108 is a measurement target object with little influence of multiple reflection. Then, the image pickup unit 101 captures each pattern light. As a result, code strings such as code strings 305 and 306 are obtained. When the code strings 305 and 306 are decoded, it can be converted into a value representing the position of the pattern light in the projection unit 102 such as 307. That is, like the point 301 on the measurement target object 108, the projection image on the measurement target object 108 of the projection unit 102 and the imaging unit 101 is associated with the captured image, thereby enabling triangulation.

  With reference to FIG. 1, the structure of the distance measuring device 10 which concerns on this embodiment is demonstrated.

  The distance measurement apparatus 10 according to the present embodiment includes an imaging unit 101, a projection unit 102, a pattern light generation unit 103, a control unit 104, a storage unit 105, a multiple reflection pattern removal unit 106, and a distance calculation unit 107. With.

  The imaging unit 101 includes an optical system and an imaging element, and images the measurement target object 108. In addition, the imaging unit 101 outputs the captured image to the storage unit 105. Further, the imaging unit 101 images the measurement target object 108 from a direction different from the projection direction of the projection unit 102.

  The projection unit 102 projects pattern light onto the measurement target object 108 based on the pattern light information input from the pattern light generation unit 103. The projection unit 102 is a device that can project pattern light, such as a laser projector or a liquid crystal projector, and the configuration of the projection unit 102 is not limited as long as the pattern light can be projected.

  The pattern light generation unit 103 generates pattern light based on the control information of the control unit 104, controls the projection unit 102, and projects the pattern onto the measurement target object.

  Here, the pattern light projected by the pattern light generation unit 103 will be described in detail. The pattern light projected in this embodiment is a pattern like the pattern light 401 in FIG. In general, a fringe pattern 405 is arranged on the entire surface of the pattern light, such as the pattern light 402, in a measurement method using spatial coding. On the other hand, the pattern light 401 of the present embodiment uses patterns having different intensities of the stripe pattern 403 based on the epipolar line 404.

  Here, epipolar lines determined by epipolar constraints determined by the positional relationship between the imaging unit and the projection unit will be described with reference to FIG. In FIG. 5, reference numeral 503 denotes a main point of the imaging unit, and reference numeral 501 denotes an imaging element. Reference numeral 504 denotes a principal point of the projection unit, and 502 denotes a projection element. In addition, 506 is a three-dimensional point arbitrarily selected in a three-dimensional space. Here, a plane 509 defined by the imaging unit principal point 503, the projection unit principal point 504, and the three-dimensional point 506 can be defined. A line defined by the plane 509 intersecting with the image sensor 501 is an epipolar line 507 on the imaging side.

  A line defined by the plane 509 intersecting the projection element 502 is a projection-side epipolar line 508. Here, if the pattern arranged on the epipolar line 508 on the projection side is a three-dimensional point on the plane formed by the imaging unit principal point 503, the projection unit principal point 504, and the three-dimensional point 506, imaging is performed in the imaging device 501. It can be seen that the image is picked up by the epipolar line 507 on the side. The present invention uses this principle to mitigate the effects of multiple reflections.

  Returning to FIG. 4, the epipolar line 404 is illustrated in FIG. 4, but is not displayed in the pattern to be actually projected. In addition, the fringe pattern 403 does not have to be strictly parallel to the epipolar line, and may be substantially parallel. Furthermore, the fringe pattern 403 projected in a state where the light intensity is different based on the epipolar line 404 need not be the projection pattern of the present embodiment as long as the distance can be measured. For example, a grid pattern or a sine wave pattern may be used.

  Next, the reason why the influence of multiple reflection can be reduced by using the pattern light 401 will be described with reference to FIGS.

  First, the problem with the conventional pattern light will be described with reference to FIG. In FIG. 6, reference numeral 602 denotes a pattern light, and reference numeral 603 denotes a measurement stripe pattern. The pattern light 402 in FIG. 6 may be a pattern using a plurality of stripes as in 402 in FIG. 4, but will be described using a stripe pattern 603 configured with a single stripe for the sake of explanation. The pattern light 602 is projected onto the measurement target object, and an image such as 601 is captured as the captured image. The captured image 601 includes a pattern 604 obtained by directly reflecting the fringe pattern 603 on the surface of the object to be measured, and a surface of the object to be measured 108 having a concave surface, and multiple reflections centering on the center 605 of the concave surface. Thus, a pattern 606 in which a mirror image is captured is captured. Here, since the captured patterns 604 and 606 are difficult to separate at the time of imaging, when the three-dimensional measurement is performed using the captured patterns 604 and 606, the captured pattern 606 acts as noise. However, shape information that is not the original shape of the measurement target object is output.

  Next, the fact that the pattern light of this embodiment can reduce the influence of multiple reflection will be described with reference to FIG.

  The pattern light 608 may be a pattern of a plurality of stripes as in the pattern light 401 of the present embodiment, but will be described using the pattern light 608 composed of a single stripe 610 for explanation. Here, reference numeral 607 denotes an image picked up by the image pickup unit 101, and reference numeral 609 denotes an epipolar line.

  Further, in the captured image 607, the pattern light 608 is reflected directly on the surface of the measurement target object, and the pattern 614 is captured. The surface of the measurement target object 108 is concave, and the center 605 of the concave surface is the center. A pattern 611 in which a mirror image is captured is captured.

  The pattern 611 includes patterns 612 and 613 having different patterns. However, the pattern 611 is provided for the purpose of explanation, and the pattern is not provided to the actually captured pattern. Here, the pattern light 608 and the captured image 607 are divided by the epipolar line 609.

  In other words, in the captured image 607, it can be determined in advance that the region where the pattern 614 captured by direct reflection on the surface of the measurement target object 108 is captured is within the region delimited by the epipolar line 609 in advance. . Here, since the imaged stripe pattern 612 is an area where the stripe pattern 610 does not exist in the area delimited by the epipolar line 609, the imaged stripe pattern 612 is imaged by multiple reflection on the surface of the measurement target object. It is possible to specify that the pattern has been changed. Therefore, the fringe pattern can be removed from the object of distance measurement.

  The fringe pattern 613 is a pattern captured by multiple reflection on the surface of the measurement target object 108, but since the region delimited by the epipolar line 609 is the same region as the pattern light 610, it is from the target of distance measurement. It cannot be removed. Therefore, an incorrect distance measurement result is output. As described above, the pattern light of this method is divided into a pattern that can be removed from the captured image, such as the captured stripe patterns 612 and 613, and a stripe pattern that cannot be removed.

  That is, since the striped pattern 612 can be removed from the captured image and the striped pattern 613 that cannot be removed is limited (FIG. 6A), the pattern light of this embodiment has multiple reflections. The impact can be reduced. Here, the present invention is a pattern in which the pattern in the captured image is captured by multiple reflection on the surface of the measurement target object based on the epipolar constraint determined by the positional relationship between the imaging unit and the projection unit. It is determined whether the pattern is reflected directly on the surface of the target object, but it is a pattern captured by multiple reflections on the surface of the measurement target object using another method, or is reflected directly on the surface of the measurement target object. As long as it is possible to determine whether the pattern has been picked up, it may be determined in combination with that method. For example, a plurality of three-dimensional measuring devices are arranged, and from the tendency of the distance between the plurality of three-dimensional measuring devices arranged, the pattern is a pattern captured by multiple reflections on the surface of the measurement target object, or the measurement target object It may be determined whether the pattern is directly reflected on the surface and imaged. Further, if it can be determined whether the pattern is reflected directly on the surface of the measurement target object, the pattern of the corresponding part may be extinguished or dimmed, and the pattern may be projected again.

  The pattern light generation unit 103 according to the present embodiment can also generate pattern light for switching and projecting a plurality of pattern lights in time series. An example of the pattern light of this embodiment will be described with reference to FIG.

  The pattern light generated by the pattern light generation unit 103 may be a pattern like the pattern group 701. A pattern group 701 is pattern light that divides the imaging space as needed using pattern light 702 to 706. In the pattern of the present invention, any of the pattern lights 702 to 706 may be made to have different light intensities based on the epipolar constraint with respect to patterns such as the pattern group 701. In FIG. An example of dividing the light 706 will be described. The pattern light 706 has different light intensities based on the epipolar line 404 as in the pattern light 401. The change in the intensity of the pattern light referred to here is controlled by changing the luminance of the pixels of the projection unit (including dimming, extinction, and brightening).

  Here, it will be described with reference to FIG. 8 that the pattern projected from the pattern light generation unit 103 of the present invention can expand a range in which distance measurement is possible by projecting a plurality of patterns. The pattern projected from the pattern light generation unit 103 may project pattern light such as the pattern light 801 in FIG. In the pattern light 801, the fringe pattern 802 is arranged in an area where the intensity of the fringe pattern 403 is different in the area delimited by the epipolar line 404 with respect to the fringe pattern 403 of the pattern light 401. By arranging in this way, it is possible to interpolate an area where distance measurement is impossible with the pattern light 401 with the pattern light 801 and to expand the range where distance measurement is possible.

  Returning to FIG. 1, the control unit 104 controls the pattern projection timing by the pattern light generation unit 103. The control unit 104 also controls the imaging unit 101 to start imaging based on the timing at which the projection unit 102 starts pattern projection.

  The storage unit 105 is a memory that stores a captured image acquired from the imaging unit 101. Then, the captured image is output to the multiple reflection pattern removal unit 106.

  The multiple reflection pattern removal unit 106 removes a part of the pattern generated by the multiple reflection from the captured image acquired from the storage unit 105 or all of the pattern according to the object shape or pattern light. Here, a method for removing a pattern generated by multiple reflection will be described with reference to FIG.

  In the pattern 611 generated by the multiple reflection in FIG. 6B, the removable pattern is a pattern in a region where the measurement pattern 610 does not exist in the pattern light divided by the epipolar line 609 such as 612. Here, the removal of the pattern caused by the multiple reflection may be calculated by deleting the pattern 612 from the captured image in the captured image 607 or ignoring the region where the pattern 612 exists when calculating the distance. .

  Returning to FIG. 1, the distance calculation unit 107 determines the position of the fringe pattern imaged by the imaging unit 101 and the position of the fringe pattern projected by the projection unit 102 based on the pattern input from the multiple reflection pattern removal unit 106. Is associated. Then, the distance is calculated based on the triangulation principle based on the positions of the associated stripe patterns.

  Next, with reference to the flowchart of FIG. 9, the process procedure of the distance measuring device according to the present embodiment will be described.

(Step S901)
In step S <b> 901, the pattern light generated by the pattern light generation unit 103 is projected from the projection unit 102 toward the measurement target object 108 based on the control signal from the control unit 104.

(Step S902)
In step S902, the measurement target object 108 is imaged using the imaging unit 101 in synchronization with the projection from the projection unit 102 using the control signal from the control unit 104.

(Step S903)
In step S903, the captured image is stored in the storage unit 105.

(Step S904)
In step S904, it is determined whether or not all the pattern light generated by the pattern light generation unit 103 has been projected from the projection unit 102 (pattern end). If there is pattern light that is not projected, the process returns to step S901. If there is no pattern light that is not projected by the pattern light generation unit 103, the process proceeds to step S905.

(Step S905)
In step S905, the captured image is read from the storage unit 105, and the multiple reflection pattern removal unit 106 removes part or all of the pattern generated by the multiple reflection.

(Step S906)
In step S906, the distance calculation unit 107 calculates the distance based on the principle of triangulation using the image information output from the multiple reflection pattern removal unit 106.

(Step S907)
In step S907, the distance result calculated by the distance calculation unit 107 is output.

  Thus, each process of the flowchart of FIG. 9 ends.

  As described above, according to the first embodiment, the pattern light to be projected onto the measurement target object is divided into regions based on the epipolar constraint of the camera and the projector, and the divided pattern light is sequentially projected. The influence of multiple reflections can be reduced.

[Second Embodiment]
The distance measurement device according to the second embodiment is the same as the configuration of the distance measurement device 10 described in the first embodiment except for the pattern light projected from the pattern light generation unit 103. Therefore, the pattern light generation unit 103 of the distance measuring apparatus according to the present embodiment will be described with reference to FIG.

  The pattern light generated by the pattern light generation unit 103 of the distance measuring apparatus according to the present embodiment is a pattern like the pattern light 1001 in FIG. The pattern light 1001 is composed of 1002 and 1003 having different light wavelengths in the region divided by the epipolar line 1004. The pattern light 1001 is projected, projected by the projection unit 102, and the light reflected by the measurement target object 108 is subjected to wavelength separation by the imaging unit 101 and stored in the storage unit. As a method of wavelength separation in the imaging unit 101, a color filter configured on an imaging element incorporated in the imaging unit 101 may be used, or a wavelength separation prism is disposed in the imaging unit 101, and the wavelength May be separated. Alternatively, a plurality of imaging units 101 may be arranged, and a color filter may be arranged inside each imaging unit to perform wavelength separation. In other words, by using the pattern light 1001, the pattern light 401 and 801 in FIG. 8 described in the first embodiment can use two pattern lights, thereby expanding the three-dimensional measurement range while reducing multiple reflections. However, the pattern light of this embodiment can expand the range in which distance measurement can be performed while reducing multiple reflections with one pattern light.

  As described above, according to the second embodiment, the pattern light region projected onto the measurement target object is divided into regions based on the epipolar constraint of the camera and the projector, and the wavelength of the pattern light in the divided region is divided. By changing, it is possible to reduce the influence of multiple reflections even when one pattern light is projected. Note that the wavelengths of all the divided regions do not necessarily have to be different, and the effect of the present embodiment can be achieved by changing the wavelength of the pattern light in at least the adjacent regions.

[Third Embodiment]
The distance measurement device according to the present embodiment is the same as the configuration of the distance measurement device 10 described in the first embodiment except for the pattern projected from the pattern light generation unit 103. Therefore, the pattern light generation unit 103 of the distance measuring apparatus according to the present embodiment will be described with reference to FIGS.

  The pattern light generated by the pattern light generation unit 103 of the distance measuring apparatus according to the present embodiment is pattern light such as the pattern light A1102 and the pattern light B1103 in FIG. Here, the captured image 1101 is an image obtained by capturing the measurement target object 1111. Here, the imaging of the measurement target object 1111 may be an image obtained by projecting uniform light from the projection unit 102, or illumination in an environment where the measurement target object 1111 exists may be used.

  Next, in the measurement target object 1111 picked up by the picked-up image 1101, the measurement target object 1111 is set using light intensity information, light wavelength information, light polarization information, or a combination thereof. Divide into multiple areas. A method of dividing an image using information on light intensity, information on light wavelength, information on polarization of light, or information on a combination thereof is a general method such as a region growth method, an average value shift method, or a graph cut. A known image dividing method can be used. The divided areas are 1104, 1105, and 1106.

  The intention to divide into areas 1104, 1105, and 1106 is a phenomenon in which multiple reflection occurs between the surfaces of the measurement target object, and therefore multiple reflections are performed by dividing and processing the measurement target object for each surface. Is intended to reduce

  When the approximate shape information and approximate position and orientation of the subject 1111 are known, it is not necessary to capture the captured image 1101, and the pattern light generation unit 103 uses the approximate shape information and approximate position and orientation. The surface of 1111 can be estimated. The rough shape information is, for example, a CAD model of the subject 1111 or a set of three-dimensional coordinates on the surface of the subject 1111.

  Next, the intensity of the pattern light is changed using the epipolar line 1110 for the divided regions 1104 to 1106. Here, a pattern is defined according to the epipolar line 1110 for each region.

  A stripe pattern 1107 is defined for the area 1104, 1109 is defined for the area 1105, and 1108 is defined for the area 1106. Of course, since multiple reflection is a phenomenon that occurs on a plurality of surfaces, the stripe patterns 1107, 1108, and 1109 may be projected as independent pattern lights on each surface. The intention to avoid simultaneously projecting pattern light 1107 and 1109 corresponding to 1104 and 1105, such as pattern light A1102, is that the region where multiple reflections are likely to occur is a spatially close surface. This is to improve the area where multiple reflection can be reduced.

  Furthermore, the effect of this embodiment is demonstrated using FIG.11 (b). FIG. 11B illustrates a captured image 1112 obtained by projecting the pattern light B1103 onto the measurement target object 1111 described with reference to FIG. Further, a stripe pattern obtained by imaging the measurement target object 1111 onto which the pattern light B1103 is projected by the imaging unit 101 is 1114, and a pattern generated by multiple reflection is 1113. Here, since the position on the captured image to be irradiated with the stripe pattern 1109 is known by the epipolar line 1110, the pattern 1113 generated by the multiple reflection can be removed.

  Next, with reference to the flowchart of FIG. 12, the procedure of the process of the distance measuring device according to the present embodiment will be described.

(Step S1201)
In step S1201, the image of the imaging unit 101 is output to the control unit 104, and the control unit 104 converts the captured image into light intensity information, light wavelength information, light polarization information, or a combination thereof. Is used to divide into a plurality of regions as shown in 1104 to 1106 in FIG. Based on the information of the divided areas, the pattern light generation unit 103 generates pattern light such as the pattern light A1102 and the pattern light B1103 in FIG.

(Step S1202)
In step S <b> 1202, the pattern light generation unit projects the pattern light generated by the pattern light generation unit 103 from the projection unit 102 toward the measurement target object 108 based on the control signal from the control unit 104 of 103.

(Step S1203)
In step S1203, the measurement target object 108 is imaged using the imaging unit 101 in synchronization with the projection from the projection unit 102 using the control signal from the control unit 104.

(Step S1204)
In step S1204, the captured image is stored in the storage unit 105.

(Step S1205)
In step S1205, it is determined whether all the patterns generated by the pattern light generation unit 103 have been projected from the projection unit 102 (pattern end). If there is pattern light that is not projected, the process returns to step S1202.

  If there is no pattern light that is not projected by the pattern light generation unit 103, the process proceeds to step S1206.

(Step S1206)
In step S1206, the captured image is read from the storage unit 105, and the multiple reflection pattern removal unit 106 removes part or all of the multiple reflection pattern.

(Step S1207)
In step S1207, the distance calculation unit 107 calculates the distance based on the principle of triangulation using the image information output from the multiple reflection pattern removal unit 106. In step S1208, the distance measurement result calculated by the distance calculation unit 107 is output. Thus, the processes in the flowchart of FIG. 11 are completed.

  Further, the distance measuring apparatus of the present invention may change the position and orientation of the measurement target object 1111 and execute the process of the flowchart of FIG. 12 again to perform three-dimensional measurement a plurality of times.

  As described above, according to the third embodiment, the surface of the captured image is identified based on the captured image obtained by capturing the measurement target object, and the measurement target is determined based on the identified surface and the epipolar constraint. The area of the pattern light projected onto the object is divided into areas. This embodiment can reduce the influence of multiple reflection.

  The present invention can also be realized by executing the following processing. That is, software (computer program) that realizes the functions of the above-described embodiments is supplied to a system or apparatus via a network or various storage media, and the computer (or CPU, MPU, etc.) of the system or apparatus reads the program. To be executed.

DESCRIPTION OF SYMBOLS 10 Distance measuring device 101 Imaging part 102 Projection part 103 Pattern light generation part 104 Control part 105 Storage part 106 Multiple reflection pattern removal part 107 Distance calculation part

Claims (10)

Projection means for projecting pattern light onto a target object;
Imaging means for imaging the target object onto which the pattern light is projected;
An acquisition unit that acquires a distance from the projection unit or the imaging unit to the measurement target object based on an image captured by the imaging unit;
A distance measuring apparatus comprising: a determining unit that determines pattern light to be projected by the projecting unit based on a positional relationship between the projecting unit and the imaging unit.   The distance measuring apparatus according to claim 1, wherein the determining unit determines the pattern light based on epipolar constraint determined based on a positional relationship between the projecting unit and the imaging unit. The determination unit generates a plurality of pattern lights by dividing the pattern light pattern into a plurality of regions based on a positional relationship between the projection unit and the imaging unit,
The distance measuring apparatus according to claim 1, wherein the projecting unit sequentially projects the generated plurality of pattern lights.   The determining means includes, based on the positional relationship between the projection means and the imaging means, the wavelength of a pixel included in a partial area of the pattern light pattern included in the other area of the pattern light pattern. The distance measuring device according to claim 1, wherein the distance measuring device is different from a pixel.   The said determination means changes the brightness | luminance of the one part area | region of the said pattern light based on the positional relationship of the said projection means and the said imaging means, The any one of Claim 1 thru | or 3 characterized by the above-mentioned. The described distance measuring device.   The determining unit determines pattern light projected by the projecting unit based on a positional relationship between the projecting unit and the imaging unit and a captured image obtained by capturing the target object. The distance measuring device according to any one of 1 to 5.   The determining unit determines pattern light projected by the projecting unit based on a positional relationship between the projecting unit and the imaging unit, shape information of the target object, and an approximate position and orientation of the target object. The distance measuring device according to claim 1, wherein: A projecting step for projecting pattern light onto a target object;
An imaging step in which an imaging unit images the measurement target object onto which the pattern light is projected;
An acquisition step in which a measurement unit acquires a distance from the projection unit or the imaging unit to the measurement target object based on an image captured by the imaging unit;
A distance measuring method comprising: a determining step of determining pattern light projected by the projecting unit based on a positional relationship between the projecting unit and the imaging unit.   A computer program for causing a computer to execute the distance measuring method according to claim 8.   A computer-readable storage medium storing the computer program according to claim 9.

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