JP2013148647A - Verification method, verification program, and verification device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To further securely detect an error in optical proximity effect correction processing.SOLUTION: A verification device 1 includes: a determination part 1a for referring to a rule table T1 in which movement amounts of mask patterns 3a and 3b are set in accordance with the widths of individual sides of signal lines 2a and 2b and the distance between the sides of the signal lines included in design data stored in a storage part 2 to thereby determine coordinates of both end portions p1, p2, p3 and p4 of the sides 3a1 and 3b1 of the mask patterns 3a and 3b; and a determination part 1e for determining matching with the coordinates of both ends p1a, p2a, p3a and p4a of the sides 3a2 and 3b2 of the mask patterns 3a and 3b after moving the sides 3a1 and 3b1 of the mask patterns 3a and 3b by optical proximity effect correction processing on the basis of the coordinates of both end portions p1, p2, p3 and p4 determined by the determination part 1a, and if the comparison result is different, outputting error information.

Description

  The present invention relates to a verification method, a verification program, and a verification apparatus.

  With the miniaturization due to high integration of semiconductor devices, the influence of the proximity effect in the exposure process has come to be noticeable. For this reason, an optical proximity correction (OPC) technique for correcting a circuit pattern of design data is known so that the influence of the proximity effect can be acquired in advance and a dimension as designed can be obtained.

  One of the OPC techniques is an OPC process (hereinafter referred to as a rule-based OPC process) in which correction is performed using a correction table that defines a correction amount according to the width of a circuit pattern and the distance to an adjacent circuit pattern in design data. Are known.

JP 2010-26420 A

  The processing result of the rule-based OPC process may differ from the scheduled processing result due to a bug of a program that executes the rule-based OPC process. For this reason, a method for verifying whether the processing result is correct after the rule-based OPC processing is considered. As an example, it is determined whether or not the absolute value of the maximum correction amount set in the correction table used for the rule-based OPC process has been exceeded. If the absolute value of the maximum correction amount has been exceeded, excessive correction has been performed. It is conceivable to detect this.

However, this method has a problem that an error in the processing result within the absolute value of the maximum correction amount cannot be detected.
In one aspect, an object of the present invention is to more reliably detect an error in optical proximity effect correction processing.

  In order to achieve the above object, a disclosed verification method is provided. This verification method is a method for verifying a mask pattern for substrate exposure that is formed based on design data of a semiconductor device, and the computer calculates the width of each side of the signal line included in the design data and the distance between each side. Accordingly, the side of the mask pattern is moved by the optical proximity effect correction processing based on the planned movement amount of the side of the mask pattern determined by referring to the setting information in which the movement amount of the mask pattern is set accordingly. A match with the actual movement amount of the side of the subsequent mask pattern is determined, and error information is output when the comparison results are different.

  In one aspect, an error in the optical proximity effect correction process can be detected more reliably.

It is a figure which shows the design support apparatus of 1st Embodiment. It is a figure which shows the hardware constitutions of the design assistance apparatus of 2nd Embodiment. It is a block diagram which shows the function of the design assistance apparatus of 2nd Embodiment. It is a figure explaining an example of a rule base OPC process. It is a figure explaining the process of the movement amount determination part. It is a figure which shows the process result of an edge movement process part. It is a figure which shows the other process result of a side movement process part. It is a flowchart which shows the process of a design support apparatus. It is a figure which shows an example of an output screen.

Hereinafter, a design support apparatus according to an embodiment will be described in detail with reference to the drawings.
<First Embodiment>
FIG. 1 is a diagram illustrating a design support apparatus according to the first embodiment.

The verification apparatus (computer) 1 according to the first embodiment includes a determination unit 1a, a storage unit 1b, a side moving unit 1c, a storage unit 1d, and a determination unit 1e.
The determination unit 1a performs a rule-based OPC process on the design data of the semiconductor device to be designed stored in the storage unit 2, thereby determining the planned movement amount of the mask pattern side of the photomask used for manufacturing the semiconductor device. To do. By correcting the mask pattern in advance based on the influence of the proximity effect, a signal line as designed can be obtained.

  Specifically, the determination unit 1a refers to the rule table T1 in which the movement amount of the side of the mask pattern is set according to the width of the signal line of the semiconductor device to be designed and the distance between the signal lines, and the mask pattern Determine the estimated amount of movement of the sides. In the rule table T1, a value (nm) indicating the width (line width) of the signal line is set in the row direction, and a value (nm) indicating the distance between the signal lines (distance between the lines) is set in the column direction. Has been. In the column where the line width and the distance between the lines intersect, the movement amount (correction value) of the side of the mask pattern is set. A movement amount with a positive value is a value that corrects the mask pattern corresponding to the adjacent signal line in a direction of approaching, and a movement amount with a negative value separates the mask pattern corresponding to the adjacent signal line. This is the value to correct in the direction.

  The design data stored in the storage unit 2 shown in FIG. 1 includes signal lines 2a and 2b that form a wiring pattern. The line width h1 of the signal line 2a and the line width h2 of the signal line 2b are both assumed to be 110 nm. It is assumed that the line distance S1 between the side 2a1 of the signal line 2a and the side 2b1 of the signal line 2b is 90 nm.

  The determining unit 1a refers to the rule table T1, and determines the planned movement amount of the sides of the mask patterns 3a and 3b formed based on the signal lines 2a and 2b. Specifically, the determination unit 1a applies the line widths h1 and h2 and the line distance S1 to the rule table T1. Then, since the line-to-line distance S1 is 90 nm, the determination unit 1a checks whether or not the line-to-line distance S1 is in the range of 90 to 110 nm. Since the line-to-line distance S1 is 90 nm, the determination unit 1a determines the sides 3a1 and 3b1 as the sides to be moved. The determining unit 1a moves the coordinates (−1, 100) and (−1, −10) of both ends of the side 3a1 to be moved in a direction to separate the side 3b1 from the side 3b1 by a moving amount 2 nm set in the rule table T1. In this case, the coordinates (−3, 100) and (−3, −10) of both ends p1 and p2 of the side 3a2 are stored in the storage unit 1b. In addition, the determination unit 1a uses the coordinates (90, 100) and (90, −10) of both ends of the side 3b2 of the part facing the side 3a1 of the side 3b1 to be moved as the movement amount set in the rule table T1. The coordinates (92, 100) and (92, −10) of both ends p3 and p4 of the side 3b2 when moved in the direction away from the side 3a1 by 2 nm are stored in the storage unit 1b.

  The side moving unit 1c moves each of the sides 3a1 and 3b2 away from each other by an amount of 2 nm according to the rule-based OPC processing program based on the coordinates stored in the storage unit 1b. Then, the coordinates of both ends p1a and p2a of the side 3a2 and the both ends p3a and p4a of the side 3b2 after the side is actually moved are stored in the storage unit 1d.

  Here, an abnormality may occur in the correction of the rule-based OPC process when the side moving unit 1c moves the side. For example, if one of the two vertices forming the side is moved by the determined movement amount, the moved vertex is different from the target position due to an error in the variable definition of the rule-based OPC processing program. May be located.

  FIG. 1 shows a case where an incorrect calculation is performed in the side moving unit 1c and the side is moved more than the planned movement amount. That is, the coordinates p3 and p4 stored in the storage unit 1b are coordinates when the side 3b2 of the mask pattern 3b is moved to the right by 2 nm, but both ends p3a and p4a of the side 3b2 stored in the storage unit 1d. These coordinates (94, 100) and (94, -10) indicate that the side 3b2 of the mask pattern 3b has moved to the right by 4 nm.

  The determination unit 1e compares the vertex coordinates p1, p2, p3, and p4 stored in the storage unit 1b with the vertex coordinates p1a, p2a, p3a, and p4a stored in the storage unit 1d. It is judged whether or not. If these coordinates do not match, the determination unit 1 e outputs error information to the monitor 4.

  According to the verification device 1, the side movement scheduled amount is stored in the storage unit 1b and compared with the actual movement amount. If these movement amounts do not match, error information is output. Thereby, it is possible to detect an error in the processing result within the absolute value of 5 nm of the maximum correction amount of the rule table T1. The designer can improve the accuracy of the photomask to be created by correcting the error.

The determining unit 1a, the side moving unit 1c, and the determining unit 1e can be realized by functions provided in a CPU (Central Processing Unit) included in the verification device 1.
The storage units 1b and 1d can be realized by a data storage area provided in a RAM (Random Access Memory), a hard disk drive (HDD), or the like included in the verification device 1.

Hereinafter, in the second embodiment, the disclosed design support apparatus will be described more specifically.
<Second Embodiment>
FIG. 2 is a diagram illustrating a hardware configuration of the design support apparatus according to the second embodiment.

The entire verification apparatus 10 is controlled by the CPU 101. The CPU 101 is connected to the RAM 102 and a plurality of peripheral devices via the bus 108.
The RAM 102 is used as a main storage device of the verification device 10. The RAM 102 temporarily stores at least part of an OS (Operating System) program and application programs to be executed by the CPU 101. The RAM 102 stores various data used for processing by the CPU 101.

  A hard disk drive 103, graphic processing device 104, input interface 105, drive device 106, and communication interface 107 are connected to the bus 108.

  The hard disk drive 103 magnetically writes data to and reads data from a built-in disk. The hard disk drive 103 is used as a secondary storage device of the verification device 10. The hard disk drive 103 stores an OS program, application programs, and various data. As the secondary storage device, a semiconductor storage device such as a flash memory can be used.

  A monitor 104 a is connected to the graphic processing device 104. The graphic processing device 104 displays an image on the screen of the monitor 104a in accordance with a command from the CPU 101. Examples of the monitor 104a include a display device using a CRT (Cathode Ray Tube) and a liquid crystal display device.

  A keyboard 105 a and a mouse 105 b are connected to the input interface 105. The input interface 105 transmits signals sent from the keyboard 105a and the mouse 105b to the CPU 101. Note that the mouse 105b is an example of a pointing device, and other pointing devices can also be used. Examples of other pointing devices include a touch panel, a tablet, a touch pad, and a trackball.

  The drive device 106 reads data recorded on a portable recording medium such as an optical disc on which data is recorded so as to be readable by reflection of light or a USB (Universal Serial Bus) memory. For example, when the drive device 106 is an optical drive device, data recorded on the optical disc 200 is read using a laser beam or the like. Examples of the optical disc 200 include Blu-ray (registered trademark), DVD (Digital Versatile Disc), DVD-RAM, CD-ROM (Compact Disc Read Only Memory), CD-R (Recordable) / RW (ReWritable), and the like. .

  The communication interface 107 is connected to the network 50. The communication interface 107 transmits / receives data to / from other computers or communication devices via the network 50.

With the hardware configuration as described above, the processing functions of the present embodiment can be realized.
The following functions are provided in the verification apparatus 10 having a hardware configuration as shown in FIG.

FIG. 3 is a block diagram illustrating functions of the design support apparatus according to the second embodiment.
The verification apparatus 10 includes a design information storage unit 11, a rule table storage unit 12, a movement amount determination unit 13, a setting information storage unit 14, a side movement processing unit 15, a movement information storage unit 16, and a correction result storage. A determination unit 18, a correction determination unit 18, and a determination result storage unit 19.

The design information storage unit 11 stores design information such as wiring patterns (signal lines) of the semiconductor integrated circuit to be designed.
The rule table storage unit 12 stores a rule table used for rule-based OPC processing. By correcting the mask pattern in advance based on the influence of the proximity effect, it is possible to obtain a signal line according to the dimensions of the design information.

  The movement amount determination unit 13 executes a rule-based OPC process using the design information and the rule table, and determines a predetermined movement amount of the side of the mask pattern of the photomask used for manufacturing the semiconductor integrated circuit.

FIG. 4 is a diagram for explaining an example of the rule-based OPC process.
In the rule table 12a, a value (nm) indicating the width of the signal line is set in the row direction, and a value (nm) indicating the distance between the signal lines is set in the column direction. In the column where the width of the signal line and the distance between the lines intersect, the movement amount (correction value) of the mask pattern corresponding to the signal line is set. A movement amount with a positive value is a value that corrects the mask pattern corresponding to two adjacent signal lines in a direction of approaching, and a movement amount with a negative value separates the mask pattern corresponding to the two signal lines. This is the value to correct in the direction.

  FIG. 4 shows mask patterns 21, 22, and 23 of a photomask (before correction) that match the line width and the line-to-line distance of the signal lines. The width in the horizontal direction in FIG. 4 of the mask patterns 21, 22, and 23 is referred to as a pattern width. The pattern width WL1 of the mask pattern 21, the pattern width WL2 of the mask pattern 22, and the pattern width WL3 of the mask pattern 23 are all 90 nm. Further, a gap in the horizontal direction in FIG. 4 between the mask patterns 21 and 22 and between the mask patterns 22 and 23 is referred to as a line-to-line distance. The inter-line distance WS1 between the mask patterns 21 and 22 is 110 nm, and the inter-line distance WS2 between the mask patterns 22 and 23 is 120 nm.

  The movement amount determination unit 13 refers to the rule table 12a and determines a side to be moved among the sides 21a, 21b, 22a, 22b, 23a, and 23b. Specifically, the movement amount determination unit 13 applies the pattern widths WL1 to WL3 and the line-to-line distances WS1 and WS2 to the rule table 12a. Then, since the line distance WS1 is 110 nm, the movement amount determination unit 13 checks whether the pattern widths WL1 and WL2 of the mask patterns 21 and 22 forming the line distance WS1 are in the range of 90 to 110 nm. . Since the pattern widths WL1 and WL2 are both 90 nm, the movement amount determination unit 13 determines the sides 21b and 22a forming the inter-line distance WS1 as the sides to be moved. The movement amount determination unit 13 stores, in the setting information storage unit 14, coordinates when the coordinates of both ends of the determined sides 21b and 22a to be moved are moved by a movement amount of 5 nm set in the rule table 12a.

  Next, the side movement processing unit 15 moves each of the sides 21b and 22a in a direction close to each other by a movement amount of 5 nm according to the rule-based OPC processing program based on the coordinates stored in the setting information storage unit. As a result, the pattern width WL11 of the mask pattern 211 after movement and the pattern width WL21 of the mask pattern 221 are each 95 nm. Further, the line-to-line distance WS3 between the sides 21b and 22a is 100 nm.

The side movement processing unit 15 stores the coordinates of both ends of the sides 21 b and 22 a moved in the approaching direction in the movement information storage unit 16 and the correction result storage unit 17.
Incidentally, the coordinates stored in the setting information storage unit 14 and the coordinates stored in the movement information storage unit 16 may not always match. For example, if there is an error in the variable definition in the rule-based OPC processing program, the coordinates stored in the movement information storage unit 16 have an excessive movement amount compared to the coordinates stored in the setting information storage unit 14, The amount may be insufficient.

Hereinafter, the process of the verification apparatus 10 will be described using design information different from the design information shown in FIG.
FIG. 5 is a diagram for explaining the processing of the movement amount determination unit.

  In FIG. 5, it is assumed that the sides 311 and 312 of the mask pattern 31 and the side 321 of the mask pattern 32 are the sides to be rule-based OPC processed. The movement amount determination unit 13 refers to the rule table 12a and determines a side to be moved among the sides 311, 312, and 321 using a method similar to the method described with reference to FIG. 4. Then, the movement amount determination unit 13 determines the sides 312 and 321 as the movement target sides. The movement amount determination unit 13 moves the both end portions 31c and 31d of the side 312 to be moved by the movement amount −2 nm set in the rule table 12a, and the coordinates c = (− 3) of the both end portions 31c1 and 31d1. , 100) and d = (− 3, −10) are stored in the setting information storage unit 14. In addition, the movement amount determination unit 13 moves both end portions 31f and 31g of the part facing the side 311 of the side 321 to be moved by both end portions 31f1 and 31f1 when the movement amount is set to 2 nm set in the rule table 12a. The coordinates f = (92, −10) and g = (92, 100) of 31g1 are stored in the setting information storage unit 14.

  Next, the side movement processing unit 15 moves the sides 312 and 321 in a direction away from each other by a movement amount of 2 nm according to the rule-based OPC processing program based on the coordinates stored in the setting information storage unit 14.

FIG. 6 is a diagram illustrating a processing result of the side movement processing unit.
FIG. 6 shows a case where an incorrect calculation is performed during the edge movement process, and the edge is moved beyond the correction value. That is, the coordinates stored in the setting information storage unit 14 are set so as to move the side 321 of the mask pattern 32 to the right by 2 nm, but both ends of the side 321 after movement stored in the movement information storage unit 16 Coordinates f = (94, −10) and g = (94, 100) of 31f2 and 31g2 indicate that the side 321 of the mask pattern 32 has moved to the right by 4 nm.

FIG. 7 is a diagram illustrating another processing result of the side movement processing unit.
FIG. 7 shows another processing result in which an erroneous calculation is performed during the edge movement processing. That is, the coordinates stored in the setting information storage unit 14 are set so as to move the side 312 of the mask pattern 31 to the left by 2 nm, but both ends of the side 312 after movement stored in the movement information storage unit 16. The coordinates c = (− 5, −100), h = (− 3, 50), i = (− 5, 50), d = (− 3, −10) of 31c2, 31h, 31i, and 31d1 are masks. It shows that the side 312 of the pattern 31 has moved to the right by 4 nm.

  The correction determination unit 18 compares the coordinates stored in the setting information storage unit 14 with the coordinates stored in the movement information storage unit 16. If there are different coordinates, the coordinates are stored in the determination result storage unit 19.

  The coordinates stored in the setting information storage unit 14 shown in FIG. 5 are c = (− 3, 100), d = (− 3, −10), f = (92, −10), g = (92, 100). On the other hand, for example, the coordinates stored in the movement information storage unit 16 shown in FIG. 6 are c = (− 3, 100), d = (− 3, −10), f = (94, −10), g = (94, 100). Since the coordinates stored in the setting information storage unit 14 do not match the coordinates stored in the movement information storage unit 16, the correction determination unit 18 stores different coordinates in the determination result storage unit 19.

Thereafter, the correction determination unit 18 creates a normal notification screen or an error notification screen based on the information stored in the determination result storage unit 19 and displays it on the monitor 104a.
Next, the process of the verification apparatus 10 is demonstrated using a flowchart.

FIG. 8 is a flowchart showing processing of the design support apparatus.
[Step S1] The movement amount determination unit 13 performs rule-based OPC processing using the design information stored in the design information storage unit 11 and the rule table 12a, and sets the movement amount of the mask pattern side. The movement amount determination unit 13 stores the determined coordinates of both ends of the side to be moved in the setting information storage unit 14. Thereafter, the process proceeds to step S2.

  [Step S <b> 2] The side movement processing unit 15 uses the coordinates stored in the setting information storage unit 14 to move the side in the direction of approaching or separating. The side movement processing unit 15 stores the coordinates of both ends of the side moved in the approaching or separating direction in the movement information storage unit 16. Thereafter, the process proceeds to step S3.

[Step S <b> 3] The correction determination unit 18 compares the coordinates stored in the setting information storage unit 14 with the coordinates stored in the movement information storage unit 16. Thereafter, the process proceeds to step S4.
[Step S <b> 4] The correction determination unit 18 determines whether or not the coordinates stored in the setting information storage unit 14 and the coordinates stored in the movement information storage unit 16 coincide with each other in the comparison in Step S <b> 3. When the coordinates stored in the setting information storage unit 14 match the coordinates stored in the movement information storage unit 16 (Yes in step S4), the process proceeds to step S5. If the coordinates stored in the setting information storage unit 14 do not match the coordinates stored in the movement information storage unit 16 (No in step S4), the process proceeds to step S6. The correction determination unit 18 sends the comparison result to the determination result storage unit 19 regardless of whether the coordinates stored in the setting information storage unit 14 match the coordinates stored in the movement information storage unit 16 or not. Remember.

  [Step S5] The correction determination unit 18 creates a normal notification screen based on the information stored in the determination result storage unit 19, and displays the normal notification screen on the monitor 104a. Thereafter, the process of FIG.

  [Step S6] The correction determination unit 18 creates an error notification screen based on the information stored in the determination result storage unit 19 and displays it on the monitor 104a. Thereafter, the process of FIG.

FIG. 9 is a diagram illustrating an example of an output screen.
FIG. 9A shows a normal notification screen when the coordinates match. On the normal notification screen 19a, verification result = OK indicating that the coordinates stored in the setting information storage unit 14 and the coordinates stored in the movement information storage unit 16 match, and count = 0 indicating the number of different coordinates. Is output.

  FIG. 9B shows a screen example when the coordinates do not match. On the error notification screen 19b, verification result = NG indicating that the coordinates stored in the setting information storage unit 14 and the coordinates stored in the movement information storage unit 16 do not match, and count indicating the number of different coordinates. = 2 and different coordinates f and g are output.

  As described above, according to the verification device 10, the rule-based OPC process is performed by comparing the coordinates stored in the setting information storage unit 14 with the coordinates stored in the movement information storage unit 16 in units of coordinates. It can be easily verified whether or not it has been executed correctly. In addition, the side movement within the maximum correction amount is compared with the case where it is detected that excessive correction has been performed when the absolute value of the maximum correction amount set in the correction table used in the rule-based OPC processing described above is exceeded. It is also possible to detect inconsistencies.

  Note that the processing performed by the verification device 10 may be distributed by a plurality of devices. For example, one device generates setting information and actual movement information, and another device verifies whether or not the rule-based OPC processing is correctly executed using the setting information and actual movement information. May be.

  The verification method, the verification program, and the verification apparatus of the present invention have been described based on the illustrated embodiment. However, the present invention is not limited to this, and the configuration of each unit is an arbitrary function having the same function. It can be replaced with the configuration of Moreover, other arbitrary structures and processes may be added to the present invention.

Further, the present invention may be a combination of any two or more configurations (features) of the above-described embodiments.
The above processing functions can be realized by a computer. In that case, a program describing the processing contents of the functions of the verification devices 1 and 10 is provided. By executing the program on a computer, the above processing functions are realized on the computer. The program describing the processing contents can be recorded on a computer-readable recording medium. Examples of the computer-readable recording medium include a magnetic storage device, an optical disk, a magneto-optical recording medium, and a semiconductor memory. Examples of the magnetic storage device include a hard disk drive, a flexible disk (FD), and a magnetic tape. Examples of the optical disk include a DVD, a DVD-RAM, and a CD-ROM / RW. Examples of the magneto-optical recording medium include an MO (Magneto-Optical disk).

  When distributing the program, for example, a portable recording medium such as a DVD or a CD-ROM in which the program is recorded is sold. It is also possible to store the program in a storage device of a server computer and transfer the program from the server computer to another computer via a network.

  The computer that executes the program stores, for example, the program recorded on the portable recording medium or the program transferred from the server computer in its own storage device. Then, the computer reads the program from its own storage device and executes processing according to the program. The computer can also read the program directly from the portable recording medium and execute processing according to the program. In addition, each time a program is transferred from a server computer connected via a network, the computer can sequentially execute processing according to the received program.

  Further, at least a part of the above processing functions can be realized by an electronic circuit such as a DSP (Digital Signal Processor), an ASIC (Application Specific Integrated Circuit), or a PLD (Programmable Logic Device).

DESCRIPTION OF SYMBOLS 1,10 Verification apparatus 1a Determination part 1b, 1d, 2 Memory | storage part 1c Side movement part 1e Judgment part 2a, 2b Signal line 2a1, 2b1, 3a1, 3a2, 3b1, 3b2, 21a, 21b, 22a, 22b, 23a, 23b 311, 312, 321 Side 3 a, 3 b, 21, 22, 23, 211, 221, 31, 32 Mask pattern 11 Design information storage unit 12 Rule table storage unit 12 a, T1 rule table 13 Movement amount determination unit 14 Setting information storage Unit 15 side movement processing unit 16 movement information storage unit 17 correction result storage unit 18 correction determination unit 19 determination result storage unit

Claims (4)

In a method for verifying a mask pattern for substrate exposure formed based on design data of a semiconductor device,
Computer
The side of the mask pattern determined by referring to setting information in which the amount of movement of the mask pattern is set according to the width of each side of the signal line included in the design data and the distance between the sides. Determining a match between the planned movement amount and the actual movement amount of the side of the mask pattern after moving the side of the mask pattern by the optical proximity effect correction processing based on the planned movement amount;
Output error information when the comparison results are different,
A verification method characterized by that.   The verification method according to claim 1, wherein a match between the coordinates of both ends of the side to be moved and the coordinates of both ends of the side to be moved moved by the optical proximity correction process is determined. In the verification program of the mask pattern for substrate exposure formed based on the design data of the semiconductor device,
On the computer,
The side of the mask pattern determined by referring to setting information in which the amount of movement of the mask pattern is set according to the width of each side of the signal line included in the design data and the distance between the sides. Determining a match between the planned movement amount and the actual movement amount of the side of the mask pattern after moving the side of the mask pattern by the optical proximity effect correction processing based on the planned movement amount;
Output error information when the comparison results are different,
A verification program characterized by causing processing to be executed. In a verification apparatus for a mask pattern for substrate exposure formed based on design data of a semiconductor device,
By referring to the setting information in which the movement amount of the mask pattern is set according to the width of each side of the signal line and the distance between each side included in the design data stored in the first storage unit A determining unit that determines a planned movement amount of a side of the mask pattern;
A second storage unit that stores the planned movement amount determined by the determination unit;
Based on the estimated movement amount stored in the second storage unit, a match with the actual movement amount of the side of the mask pattern after moving the side of the mask pattern by the optical proximity effect correction processing is compared and compared A determination unit that outputs error information when the results are different, and
The verification apparatus characterized by having.

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