JP2011140661A - Resin composition, and prepreg and printed wiring board using the same - Google Patents
Resin composition, and prepreg and printed wiring board using the same Download PDFInfo
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- JP2011140661A JP2011140661A JP2011060633A JP2011060633A JP2011140661A JP 2011140661 A JP2011140661 A JP 2011140661A JP 2011060633 A JP2011060633 A JP 2011060633A JP 2011060633 A JP2011060633 A JP 2011060633A JP 2011140661 A JP2011140661 A JP 2011140661A
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- wiring board
- printed wiring
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- 239000011342 resin composition Substances 0.000 title claims abstract description 32
- 229920005989 resin Polymers 0.000 claims abstract description 18
- 239000011347 resin Substances 0.000 claims abstract description 18
- 239000011256 inorganic filler Substances 0.000 claims abstract description 16
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 16
- 239000002245 particle Substances 0.000 claims abstract description 15
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 12
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 11
- 150000002367 halogens Chemical class 0.000 claims abstract description 11
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 9
- 239000003063 flame retardant Substances 0.000 claims abstract description 9
- 239000012798 spherical particle Substances 0.000 claims abstract description 4
- 239000000758 substrate Substances 0.000 claims description 7
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims description 6
- 238000003825 pressing Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 2
- 238000010030 laminating Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 15
- DXZMANYCMVCPIM-UHFFFAOYSA-L zinc;diethylphosphinate Chemical compound [Zn+2].CCP([O-])(=O)CC.CCP([O-])(=O)CC DXZMANYCMVCPIM-UHFFFAOYSA-L 0.000 abstract description 2
- 229920000647 polyepoxide Polymers 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 239000003822 epoxy resin Substances 0.000 description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- -1 cyanate compound Chemical class 0.000 description 7
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- 239000002966 varnish Substances 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000004843 novolac epoxy resin Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000001788 irregular Effects 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- IYJMFNNRVITCDG-UHFFFAOYSA-N biphenylene;phenol Chemical group OC1=CC=CC=C1.C1=CC=C2C3=CC=CC=C3C2=C1 IYJMFNNRVITCDG-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002366 halogen compounds Chemical class 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 150000003014 phosphoric acid esters Chemical class 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- BGGGMYCMZTXZBY-UHFFFAOYSA-N (3-hydroxyphenyl) phosphono hydrogen phosphate Chemical compound OC1=CC=CC(OP(O)(=O)OP(O)(O)=O)=C1 BGGGMYCMZTXZBY-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- LIAWCKFOFPPVGF-UHFFFAOYSA-N 2-ethyladamantane Chemical compound C1C(C2)CC3CC1C(CC)C2C3 LIAWCKFOFPPVGF-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 150000002013 dioxins Chemical class 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000005829 trimerization reaction Methods 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- KOWVWXQNQNCRRS-UHFFFAOYSA-N tris(2,4-dimethylphenyl) phosphate Chemical compound CC1=CC(C)=CC=C1OP(=O)(OC=1C(=CC(C)=CC=1)C)OC1=CC=C(C)C=C1C KOWVWXQNQNCRRS-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- IFNXAMCERSVZCV-UHFFFAOYSA-L zinc;2-ethylhexanoate Chemical compound [Zn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O IFNXAMCERSVZCV-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Reinforced Plastic Materials (AREA)
Abstract
Description
本発明は、樹脂組成物およびそれを用いたプリプレグ、印刷配線板に関する。 The present invention relates to a resin composition, a prepreg using the resin composition, and a printed wiring board.
近年、環境に対する意識の高まりから、電子機器等に使用されるプリプレグ、金属張積層板、印刷配線板(以下、配線板材料)は、廃棄等の焼却時におけるダイオキシン等の有害ガス発生のおそれがない、すなわちハロゲン系化合物を含まないハロゲンフリー製品の導入が進んでいる。ハロゲン系化合物を含まずに難燃性を付与するには、通常、ハロゲンを含まない難燃剤と比較的多量の無機充填材を併用して添加する方法が行われている。ここに用いられる無機充填材としては、難燃効果の高い水酸化アルミニウムが選択されることが多い。また同様に、鉛を含まない鉛フリーはんだの導入も進んでおり、従来よりも高温で行われる鉛フリーはんだプロセスに対応するため、配線板材料には高耐熱性や低熱膨張が要求されており、これらの要求を満足するため、配線板材料に用いられる樹脂組成物への無機充填材の添加が一層進んでいる。 In recent years, due to the increasing awareness of the environment, prepregs, metal-clad laminates, and printed wiring boards (hereinafter referred to as wiring board materials) used in electronic devices, etc., may generate harmful gases such as dioxins during incineration such as disposal. The introduction of halogen-free products that do not contain halogen compounds is progressing. In order to impart flame retardancy without containing a halogen compound, a method of adding a flame retardant containing no halogen and a relatively large amount of an inorganic filler in combination is generally performed. As the inorganic filler used here, aluminum hydroxide having a high flame retardant effect is often selected. Similarly, lead-free solder that does not contain lead is also being introduced, and in order to cope with the lead-free solder process performed at a higher temperature than before, wiring board materials are required to have high heat resistance and low thermal expansion. In order to satisfy these requirements, the addition of inorganic fillers to resin compositions used for wiring board materials has been further advanced.
さらに、電子機器の高速化や高密度化に伴い、配線板材料の低誘電率化や印刷配線板の高多層化が求められている。しかし、前者の低誘電化に関してハロゲンフリーの配線板材料は、上述のように比較的誘電率の高い水酸化アルミニウムを多量に含むため、低誘電化することが困難であった。また、後者の印刷配線板の高多層化の手法として、金属張積層板の片面または両面に配線パターンを形成してなる2枚以上の内層板を、その内層板間の中間層にプリプレグを介して積層し加熱・加圧するシーケンシャル積層法が一般的に知られている。この方法では、成形時に内層回路板に形成された貫通孔をプリプレグに含まれる樹脂組成物で充填する場合があり、充填材として水酸化アルミニウムを含むハロゲンフリーのプリプレグを使用する場合、水酸化アルミニウムの形状が不定形であることに起因して成形時の流動が不十分なため内層回路板の貫通孔への充填が十分に行われない場合があった。 Furthermore, with the increase in speed and density of electronic devices, there is a demand for lower dielectric constants for wiring board materials and higher multilayers for printed wiring boards. However, the former halogen-free wiring board material has a large amount of aluminum hydroxide having a relatively high dielectric constant as described above, and thus it has been difficult to reduce the dielectric. Further, as a method for increasing the number of layers of the latter printed wiring board, two or more inner layer boards formed by forming a wiring pattern on one or both sides of a metal-clad laminate are used, and a prepreg is interposed in an intermediate layer between the inner layer boards. A sequential lamination method is generally known in which layers are laminated, heated and pressurized. In this method, the through-hole formed in the inner circuit board at the time of molding may be filled with the resin composition contained in the prepreg. When using a halogen-free prepreg containing aluminum hydroxide as the filler, aluminum hydroxide is used. Due to the irregular shape, the flow at the time of molding is insufficient, so that the through-holes of the inner circuit board may not be sufficiently filled.
ハロゲン系化合物を含まずに難燃性を付与するには、樹脂組成物にリン系難燃剤や無機充填材を添加する等の方法が行われている。リン系難燃剤としては、トリフェニルホスフェート、トリクレジルホスフェート、トリキシレニルホスフェート、クレジルジフェニルホスフェート等のリン酸エステル系や、レゾルシノールジホスフェート等の縮合リン酸エステル等が広く用いられている(特許文献1参照)。また、特許文献2に示されているように、難燃剤としてホスフィン酸塩やジホスフィン酸塩を用いる技術が導入されている。 In order to impart flame retardancy without containing a halogen-based compound, a method such as adding a phosphorus-based flame retardant or an inorganic filler to the resin composition is performed. As phosphorus flame retardants, phosphate esters such as triphenyl phosphate, tricresyl phosphate, trixylenyl phosphate, cresyl diphenyl phosphate, condensed phosphate esters such as resorcinol diphosphate, etc. are widely used ( Patent Document 1). Moreover, as shown in Patent Document 2, a technique using phosphinate or diphosphinate as a flame retardant has been introduced.
さらに近年では、大量のデータを高速で処理するために、コンピュータや情報機器端末などで、信号の高周波化が進んでいる。用いる周波数が高くなるにつれて、電気信号の伝送損失が大きくなる。それに対応するために、高周波化に対応した誘電特性を有する印刷配線板の開発が、強く求められている。 Furthermore, in recent years, in order to process a large amount of data at high speed, the frequency of signals has been increased in computers and information equipment terminals. As the frequency used increases, the transmission loss of electrical signals increases. In order to cope with this, there is a strong demand for the development of a printed wiring board having dielectric characteristics corresponding to higher frequencies.
高周波回路における伝送損失は、配線まわりの絶縁層(誘電体)の誘電特性で決まる誘電体損の影響が大きく、印刷配線板用基板(特に絶縁樹脂)の誘電率および誘電正接(tanδ)を低くすることが必要となる。たとえば移動体通信関連の機器では、信号の高周波化に伴い、準マイクロ波帯(1〜3GHz)における伝送損失を少なくするために、誘電正接の低い基板が強く望まれるようになっている。 Transmission loss in high-frequency circuits is greatly affected by dielectric loss determined by the dielectric properties of the insulating layer (dielectric) around the wiring, and the dielectric constant and dielectric loss tangent (tan δ) of the printed wiring board substrate (especially insulating resin) are low. It is necessary to do. For example, in a device related to mobile communication, a substrate having a low dielectric loss tangent is strongly desired in order to reduce transmission loss in the quasi-microwave band (1 to 3 GHz) as the signal becomes higher in frequency.
さらにコンピュータなどの電子情報機器では、動作周波数が1GHzを超える高速マイクロプロセッサが搭載されるようになり、印刷配線板における高速パルス信号の遅延が問題になってきた。印刷配線板では、信号の遅延時間が、配線まわりの絶縁物の比誘電率εrの平方根に比例して長くなるため、高速コンピュータなどでは、誘電率の低い配線板用材料が求められている。 Furthermore, electronic information devices such as computers have been equipped with high-speed microprocessors with operating frequencies exceeding 1 GHz, and delays in high-speed pulse signals on printed wiring boards have become a problem. In a printed wiring board, the signal delay time becomes longer in proportion to the square root of the relative dielectric constant εr of the insulator around the wiring. Therefore, a high-speed computer or the like requires a low dielectric constant wiring board material.
本発明は、上記の従来技術の問題点を解消し、ハロゲンフリーでありかつ貫通孔の充填に優れた低誘電率の樹脂組成物およびそれを用いたプリプレグ、印刷配線板を提供するものである。 The present invention solves the above-mentioned problems of the prior art, and provides a low-dielectric-constant resin composition that is halogen-free and excellent in filling through holes, and a prepreg and printed wiring board using the same. .
すなわち、本発明は以下の通りである。
(1)(a)粒形が球状でありかつ平均粒径が0.1〜5μmである無機充填材、(b)ハロゲンを含有しない熱硬化性樹脂、(c)ハロゲンを含有しない該熱硬化性樹脂の硬化剤、(d)ハロゲンを含有しない難燃剤を含み、かつ硬化物における周波数1GHzでの比誘電率が2.5〜3.5である樹脂組成物。
(2)項(1)に記載の樹脂組成物を基材に含浸、乾燥させてなるプリプレグ。
(3)片面または両面に配線パターンを形成してなる2枚以上の内層板間に、項(2)に記載のプリプレグを介して、積層し加熱・加圧して得られる印刷配線板。
That is, the present invention is as follows.
(1) (a) an inorganic filler having a spherical particle shape and an average particle diameter of 0.1 to 5 μm, (b) a thermosetting resin containing no halogen, and (c) the thermosetting containing no halogen. A resin composition comprising a curing agent for a functional resin, (d) a flame retardant containing no halogen, and having a relative dielectric constant of 2.5 to 3.5 at a frequency of 1 GHz in the cured product.
(2) A prepreg obtained by impregnating a substrate with the resin composition according to item (1) and drying it.
(3) A printed wiring board obtained by laminating, heating and pressing between two or more inner layer boards formed with a wiring pattern on one side or both sides via the prepreg according to item (2).
ハロゲンフリーでありかつ貫通孔の充填に優れた低誘電率の樹脂組成物およびそれを用いたプリプレグ、印刷配線板を提供することが可能となった。 It has become possible to provide a resin composition having a low dielectric constant that is halogen-free and excellent in filling through holes, and a prepreg and printed wiring board using the resin composition.
以下、本発明を詳細に説明する。
本発明の(a)成分は、粒形が球状でありかつ平均粒径が0.1〜5μmである無機充填材である。平均粒径が0.1μm未満の場合、金属箔引き剥がし強度が劣ることがあり、5μmを超える場合、樹脂組成物に有機溶剤を加えワニスとした場合に沈降しやすくなることがある。また、本発明では、無機充填材の最大粒径が20μm以下であることが好ましい。最大粒径が20μmを超えると、プリプレグの厚みが薄い場合や金属張積層板に形成される配線パターンが微細な場合に電気的特性等において信頼性に劣る場合がある。本発明で用いられる無機充填材としては、粒形が球状でありかつ平均粒径が0.1〜5μmであれば特に限定されないが、誘電率が小さいことからシリカが好ましい。市販品としては、SP−3B(扶桑化学工業株式会社製商品名、平均粒径3.0μm)、SO−25R(株式会社アドマテックス製商品名、平均粒径0.5μm)などが挙げられる。
Hereinafter, the present invention will be described in detail.
The component (a) of the present invention is an inorganic filler having a spherical particle shape and an average particle size of 0.1 to 5 μm. When the average particle size is less than 0.1 μm, the peel strength of the metal foil may be inferior, and when it exceeds 5 μm, the resin composition may be easily precipitated when an organic solvent is added to the resin composition. Moreover, in this invention, it is preferable that the maximum particle size of an inorganic filler is 20 micrometers or less. If the maximum particle size exceeds 20 μm, the electrical characteristics may be inferior in reliability when the thickness of the prepreg is thin or the wiring pattern formed on the metal-clad laminate is fine. The inorganic filler used in the present invention is not particularly limited as long as the particle shape is spherical and the average particle diameter is 0.1 to 5 μm, but silica is preferable because of its low dielectric constant. Examples of commercially available products include SP-3B (trade name, manufactured by Fuso Chemical Industry Co., Ltd., average particle size: 3.0 μm), SO-25R (trade name manufactured by Admatechs Co., Ltd., average particle size: 0.5 μm), and the like.
本発明で用いられる無機充填材の配合量は、樹脂組成物の樹脂固形分100重量部に対して、5〜100重量部配合することが好ましい。5重量部未満では無機充填材の効果が得られず、100重量部を超えると樹脂組成物に有機溶剤を加えワニスとした場合に無機充填材が沈降したり凝集を生じることがある。本発明において無機充填材を添加する際、必要に応じて各種表面処理剤を添加しても良い。 The amount of the inorganic filler used in the present invention is preferably 5 to 100 parts by weight based on 100 parts by weight of the resin solid content of the resin composition. If the amount is less than 5 parts by weight, the effect of the inorganic filler cannot be obtained. If the amount exceeds 100 parts by weight, the inorganic filler may settle or agglomerate when an organic solvent is added to the resin composition to form a varnish. When adding an inorganic filler in this invention, you may add various surface treating agents as needed.
本発明の(b)成分は、ハロゲンを含有しない熱硬化性樹脂であれば特に制限されず、例えば、エポキシ樹脂、ポリイミド樹脂、トリアジン樹脂、メラミン樹脂、フェノール樹脂、シアネート類化合物等が挙げられ、これらを単独で、または、2種以上使用することができる。これらの中でエポキシ樹脂を例に挙げると、ビスフェノールA型エポキシ樹脂、ビスフェノールAD型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、脂環式エポキシ樹脂、脂肪族鎖状エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビフェニル型エポキシ樹脂、フェノールビフェニレンノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビフェノールのジグリシジルエーテル化物、ナフタレンジオールのジグリシジルエーテル化物、フェノール類のジグリシジルエーテル化物、アルコール類のジグリシジルエーテル化物、および、これらのアルキル置換体、水素添加物等が用いられ、これらの中から単独で、または、2種以上を使用することができる。 The component (b) of the present invention is not particularly limited as long as it is a thermosetting resin containing no halogen, and examples thereof include an epoxy resin, a polyimide resin, a triazine resin, a melamine resin, a phenol resin, and a cyanate compound. These can be used alone or in combination of two or more. Among these, epoxy resins are exemplified as follows: bisphenol A type epoxy resin, bisphenol AD type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, alicyclic epoxy resin, aliphatic chain epoxy resin, phenol Novolac epoxy resin, cresol novolac epoxy resin, biphenyl epoxy resin, phenol biphenylene novolac epoxy resin, bisphenol A novolac epoxy resin, diglycidyl etherified product of biphenol, diglycidyl etherified product of naphthalenediol, diglycidyl phenolic compound Etherified products, diglycidyl etherified products of alcohols, alkyl-substituted products thereof, hydrogenated products, and the like can be used. Among these, alone or in combination of two or more. It can be.
本発明の(c)成分は、ハロゲンを含有しない該熱硬化性樹脂の硬化剤であれば特に制限されない。熱硬化性樹脂としてエポキシ樹脂を使用する場合の硬化剤を例に挙げると、アミン化合物、多官能性フェノール化合物、酸無水物化合物等が挙げられ、これらから単独または2種以上選択される。硬化剤の配合量は、特に制限されないが、熱硬化性樹脂の主材の官能基に対して0.01〜5.0当量が好ましい。いずれの熱硬化性樹脂を用いる場合でも、硬化促進剤を使用しても良い。この場合の硬化促進剤としては、特に制限されないが、例えばイミダゾール系化合物、有機リン系化合物、第2級アミン、第3級アミン、第4級アンモニウム塩等が用いられ、これらから単独または2種以上選択される。硬化促進剤の配合量についても、特に制限されないが、樹脂組成物中の有機成分の固形分総量100重量部に対して0.01〜10重量部が好ましい。 The component (c) of the present invention is not particularly limited as long as it is a curing agent for the thermosetting resin containing no halogen. Examples of the curing agent in the case of using an epoxy resin as the thermosetting resin include amine compounds, polyfunctional phenol compounds, acid anhydride compounds, and the like, and these are selected singly or in combination. Although the compounding quantity of a hardening | curing agent is not restrict | limited in particular, 0.01-5.0 equivalent is preferable with respect to the functional group of the main material of a thermosetting resin. Even when any thermosetting resin is used, a curing accelerator may be used. The curing accelerator in this case is not particularly limited. For example, imidazole compounds, organophosphorus compounds, secondary amines, tertiary amines, quaternary ammonium salts, and the like are used. These are selected. The blending amount of the curing accelerator is not particularly limited, but is preferably 0.01 to 10 parts by weight with respect to 100 parts by weight of the total solid content of the organic component in the resin composition.
本発明の(d)成分は、ハロゲンを含有しない難燃剤であれば特に制限されず、例えばホスフィン酸金属塩系、ホスファゼン系、リン酸エステル系、縮合リン酸エステル系、リン酸アンモニウム系、リン酸メラミン系、環状エステル系等が挙げられ、これらの中から単独で、または、2種以上を使用することができる。 The component (d) of the present invention is not particularly limited as long as it is a halogen-free flame retardant. For example, phosphinic acid metal salt-based, phosphazene-based, phosphate ester-based, condensed phosphate ester-based, ammonium phosphate-based, phosphorus An acid melamine type, a cyclic ester type, etc. are mentioned, Among these, it can use individually or 2 types or more.
また、本発明において使用される樹脂組成物は、必要に応じて触媒、可とう剤等を適宜加えても良い。また本発明の樹脂組成物の硬化物は、周波数1GHzでの比誘電率が2.5〜3.5である。比誘電率が3.5を超えると印刷配線板にした場合、高速パルス信号の遅延が問題になってくる。比誘電率が2.5未満の樹脂組成物は作製が困難となる。 In addition, the resin composition used in the present invention may contain a catalyst, a flexible agent, and the like as needed. Further, the cured product of the resin composition of the present invention has a relative dielectric constant of 2.5 to 3.5 at a frequency of 1 GHz. When the relative dielectric constant exceeds 3.5, when a printed wiring board is used, the delay of the high-speed pulse signal becomes a problem. A resin composition having a relative dielectric constant of less than 2.5 is difficult to produce.
本発明の樹脂組成物のワニスは、上記の配合材料に必要に応じて有機溶剤を加え、混合することにより得られる。本発明に用いられる有機溶剤としては、特に制限されないが、メタノール、エタノール、イソプロピルアルコール、n−ブタノール等のアルコール系溶剤、アセトン、メチルエチルケトン、シクロヘキサノン等のケトン系溶剤、トルエン、キシレン等の芳香族炭化水素系溶剤、ジメチルスルホキシド等の硫黄化合物系溶剤、N−メチルピロリドン、N−メチルホルムアルデヒド、N,N−ジメチルホルムアミド等のアミド系溶剤、メチルセロソルブ、エチルセロソルブ、セロソルブアセテート等のセロソルブ系溶剤等が使用可能であり、これらから単独または2種以上選択される。 The varnish of the resin composition of the present invention can be obtained by adding an organic solvent to the above compounded material as necessary and mixing them. The organic solvent used in the present invention is not particularly limited, but alcohol solvents such as methanol, ethanol, isopropyl alcohol and n-butanol, ketone solvents such as acetone, methyl ethyl ketone and cyclohexanone, and aromatic carbonization such as toluene and xylene. Hydrogen solvents, sulfur compound solvents such as dimethyl sulfoxide, amide solvents such as N-methylpyrrolidone, N-methylformaldehyde, N, N-dimethylformamide, cellosolv solvents such as methyl cellosolve, ethyl cellosolve, cellosolve acetate, etc. They can be used and are selected from these alone or in combination.
本発明の樹脂組成物のワニスを基材に含浸させ、さらに乾燥させてプリプレグを製造する。本発明に用いられる基材としては、特に制限されないが、通常織布や不織布等が用いられる。基材の材質としては、特に制限されないが、ガラス、アルミナ、シリカアルミナガラス、シリカガラス、炭化ケイ素、ジルコニア等の無機繊維や、アラミド、ポリエーテルイミド、カーボン、セルロース等の有機繊維等が用いられる。 The base material is impregnated with the varnish of the resin composition of the present invention, and further dried to produce a prepreg. Although it does not restrict | limit especially as a base material used for this invention, Usually, a woven fabric, a nonwoven fabric, etc. are used. The material of the substrate is not particularly limited, but inorganic fibers such as glass, alumina, silica alumina glass, silica glass, silicon carbide, and zirconia, and organic fibers such as aramid, polyetherimide, carbon, and cellulose are used. .
本発明の印刷配線板は、金属張積層板等の片面または両面に配線パターンを形成してなる2枚以上の内層板を、その内層板間に本発明のプリプレグを介して積層し加熱・加圧して得られる。加熱加圧成形する際の条件は、熱硬化性樹脂と硬化剤との反応性に依存するため、用いられる樹脂材料により選択され、通常130〜250℃、好ましくは150〜200℃の範囲の温度、通常0.5〜20MPa、好ましくは1〜8MPaの範囲の圧力、通常10〜200分、好ましくは30〜120分の範囲の加熱加圧時間が選ばれる。 The printed wiring board of the present invention comprises two or more inner layer boards formed by forming a wiring pattern on one side or both sides of a metal-clad laminate or the like, laminated between the inner layer boards via the prepreg of the present invention, and heated and heated. Obtained by pressing. The conditions at the time of heat and pressure molding depend on the reactivity between the thermosetting resin and the curing agent, and therefore are selected according to the resin material used, and are usually in the range of 130 to 250 ° C., preferably 150 to 200 ° C. In general, a pressure in the range of 0.5 to 20 MPa, preferably 1 to 8 MPa, a heating and pressing time in the range of 10 to 200 minutes, preferably 30 to 120 minutes is selected.
以下に、本発明を実施例により具体的に説明するが、本発明はこれに限定されるものではない。 EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples.
(実施例1〜3、比較例1〜2)
下記表1に示した配合量(固形重量部)の樹脂組成物とメチルエチルケトンを配合し、80℃で60分間撹拌し樹脂組成物のワニスを得た。なお、メチルエチルケトンはワニスの固形分が50重量%となるよう配合した。作製したワニスを厚さ0.1mmのガラスクロス(2116:旭シュエーベル株式会社製、商品名)に含浸後、160℃で5分間加熱、乾燥して樹脂分50重量%のプリプレグを得た。250mm×250mmに切断した板厚0.8mmの銅張積層板(MCL−E−67:日立化成工業株式会社製、商品名)に、ドリル加工により直交10mm間隔に直径0.1mmの貫通孔を576個形成し、この銅張積層板2枚の間に上記のプリプレグ1枚挟み、上記銅張積層板の両側に厚さ18μmの銅箔(GTS−18:古河サーキットフォイル株式会社製、商品名)を配置し、180℃、3MPa、60分間、真空下で加熱加圧成形することにより試験用基板を作製した。実施例および比較例で得られた試験用基板について、貫通孔への充填性を1穴毎に確認することで評価した。充填性は、貫通孔内に樹脂組成物が空隙なく充填されている場合をOKとし、次式(1)により算出した。結果を表1に示した。
(Examples 1-3, Comparative Examples 1-2)
The resin composition and methyl ethyl ketone of the compounding quantity (solid weight part) shown in following Table 1 were mix | blended, and it stirred for 60 minutes at 80 degreeC, and obtained the varnish of the resin composition. Methyl ethyl ketone was blended so that the varnish had a solid content of 50% by weight. The prepared varnish was impregnated into a 0.1 mm thick glass cloth (2116, manufactured by Asahi Sebel Co., Ltd., trade name), heated at 160 ° C. for 5 minutes and dried to obtain a prepreg having a resin content of 50% by weight. Through holes with a diameter of 0.1 mm are drilled at intervals of 10 mm perpendicular to a copper-clad laminate (MCL-E-67: manufactured by Hitachi Chemical Co., Ltd., trade name) with a thickness of 0.8 mm cut into 250 mm × 250 mm. 576 pieces were formed, one prepreg was sandwiched between the two copper-clad laminates, and a copper foil (GTS-18: manufactured by Furukawa Circuit Foil Co., Ltd., trade name) on both sides of the copper-clad laminates. ) Was placed, and a test substrate was prepared by heating and pressing under vacuum at 180 ° C., 3 MPa for 60 minutes. About the test board | substrate obtained by the Example and the comparative example, it evaluated by confirming the filling property to a through-hole for every hole. Fillability was calculated by the following equation (1), assuming that the resin composition was filled in the through-holes without voids. The results are shown in Table 1.
また、樹脂組成物の硬化物(30mm×30mm、厚み1mm)を作製し、RF Impedance/Material Analyzer(Hewlett Packard社製、4291B)により室温25℃下で硬化物の1GHzでの比誘電率を測定した。結果を表1に示した。 Also, a cured product (30 mm × 30 mm, 1 mm thickness) of the resin composition was prepared, and the relative permittivity at 1 GHz of the cured product was measured at 25 ° C. at 25 ° C. using RF Impedance / Material Analyzer (manufactured by Hewlett Packard, 4291B). did. The results are shown in Table 1.
また前記表1中の配合材料(樹脂組成物)の詳細を以下に示した。
1*:球状シリカ、平均粒径3.0μm(商品名:SP−3B、扶桑化学工業株式会社製)
2*:球状シリカ、平均粒径0.5μm(商品名:SO−25R、株式会社アドマテックス製)
3*:シリカ(不定形)、平均粒径1.1μm(商品名:FLB−1、株式会社瀧森製)
4*:水酸化アルミニウム(不定形)、平均粒径3.0μm(ナカライテクス株式会社製)
5*:クレゾールノボラック型エポキシ樹脂(商品名:ESCN−195、住友化学工業株式会社製、エポキシ当量:195)
6*:フェノールビフェニレンノボラック型エポキシ樹脂(商品名:NC−3000−H、日本化薬株式会社製、エポキシ当量:288)
7*:リン変性エポキシ樹脂(商品名:FX289、東都化成株式会社製、エポキシ当量:308)
8*:2,2−ビス(4−シアネートフェニル)プロパンのプレポリマ(商品名:AroCy B−30、旭チバ株式会社製、三量化率30%、シアネート当量:200)
9*:メラミン変性フェノールノボラック樹脂(商品名:エピキュアYLH828、ジャパンエポキシレジン株式会社製、水酸基当量:146)
10*:2−エチル−4メチルイミダゾール(商品名:エピキュアEMI24、ジャパンエポキシレジン株式会社製)
11*:2−エチルヘキサン酸亜鉛(和光純薬工業株式会社製)
12*:ジアルキルホスフィン酸アルミニウム塩(商品名:OP930、クラリアント社製)
Moreover, the detail of the compounding material (resin composition) in the said Table 1 was shown below.
1 *: Spherical silica, average particle size 3.0 μm (trade name: SP-3B, manufactured by Fuso Chemical Industry Co., Ltd.)
2 *: Spherical silica, average particle size 0.5 μm (trade name: SO-25R, manufactured by Admatechs Co., Ltd.)
3 *: Silica (irregular shape), average particle size 1.1 μm (trade name: FLB-1, manufactured by Kashimori)
4 *: Aluminum hydroxide (irregular shape), average particle diameter 3.0 μm (manufactured by Nacalai Tex)
5 *: Cresol novolac type epoxy resin (trade name: ESCN-195, manufactured by Sumitomo Chemical Co., Ltd., epoxy equivalent: 195)
6 *: phenol biphenylene novolac type epoxy resin (trade name: NC-3000-H, manufactured by Nippon Kayaku Co., Ltd., epoxy equivalent: 288)
7 *: Phosphorus-modified epoxy resin (trade name: FX289, manufactured by Tohto Kasei Co., Ltd., epoxy equivalent: 308)
8 *: 2,2-bis (4-cyanatephenyl) propane prepolymer (trade name: AroCy B-30, manufactured by Asahi Ciba Co., Ltd., trimerization rate 30%, cyanate equivalent: 200)
9 *: Melamine-modified phenol novolak resin (trade name: Epicure YLH828, manufactured by Japan Epoxy Resin Co., Ltd., hydroxyl equivalent: 146)
10 *: 2-ethyl-4-methylimidazole (trade name: EpiCure EMI24, manufactured by Japan Epoxy Resin Co., Ltd.)
11 *: Zinc 2-ethylhexanoate (Wako Pure Chemical Industries, Ltd.)
12 *: Dialkylphosphinic acid aluminum salt (trade name: OP930, manufactured by Clariant)
表1から明らかなように、本発明の実施例1〜3は、無機充填材として球状シリカの無機充填材を用いることにより、比較例1および2と比較して比誘電率が小さくかつ貫通孔への充填性に優れている。これに対し、比較例1は、不定形のシリカを用いているために貫通孔への充填性に劣り、比較例2は不定形の水酸化アルミニウムを用いているために貫通孔への充填性に劣りさらに比誘電率も大きい。 As is apparent from Table 1, Examples 1 to 3 of the present invention have a small relative dielectric constant and through-holes as compared with Comparative Examples 1 and 2 by using a spherical silica inorganic filler as the inorganic filler. Excellent filling properties. On the other hand, Comparative Example 1 is inferior in filling ability to the through-hole because it uses amorphous silica, and Comparative Example 2 is filling in the through-hole because it uses amorphous aluminum hydroxide. In addition, the relative dielectric constant is also large.
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