JP2011051278A - Lightweight substrate with excellent gas barrier properties and surface characteristics and member using this substrate - Google Patents
Lightweight substrate with excellent gas barrier properties and surface characteristics and member using this substrate Download PDFInfo
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Landscapes
- Electroluminescent Light Sources (AREA)
- Laminated Bodies (AREA)
- Joining Of Glass To Other Materials (AREA)
Abstract
Description
本発明は、電子部品用途として薄型軽量化を図るガスバリア性に優れ、かつ表面性に優れた軽量基板に関する。具体的には、ディスプレイが有機ＥＬ、電子ペーパーであるディスプレイ部材や照明が有機ＥＬである照明部材や太陽電池部材に好適な薄型軽量化を図った基板で、水、空気のガスバリア性を有する軽量基板に関する。 The present invention relates to a lightweight substrate that is excellent in gas barrier properties and is excellent in surface properties for thinning and weight reduction as an electronic component application. Specifically, it is a lightweight and lightweight substrate with a water and air gas barrier property, which is a thin and lightweight substrate suitable for display members that are organic EL and electronic paper displays, and lighting members and solar cell members that are organic EL. Regarding the substrate.
従来、ガスバリアフィルムは、内容物の品質を変化させる原因となる酸素や水蒸気の影響を防ぐために、食品や医薬品等の包装材料として用いられたり、液晶表示パネルに形成されている素子が水蒸気に触れて性能劣化するのを避けるために、電子デバイス等のパッケージ材料として用いられてきた。しかし、ガスバリアフィルムは、水蒸気透過率が０．１g／（ｍ２ｄａｙ）程度であるため、将来、大きな市場が期待されている太陽電池や有機ＥＬ関連部品に必要とされているガスバリア性、具体的には、水蒸気透過率が１×１０―2g／（ｍ２ｄａｙ）以下を達成することは難しい。 Conventionally, gas barrier films have been used as packaging materials for foods and pharmaceuticals to prevent the effects of oxygen and water vapor, which cause changes in the quality of the contents, and elements formed on liquid crystal display panels touch water vapor. In order to avoid performance degradation, it has been used as a packaging material for electronic devices and the like. However, since the gas barrier film has a water vapor transmission rate of about 0.1 g / (m 2 day), the gas barrier property required for solar cells and organic EL-related parts that are expected to have a large market in the future, Specifically, it is difficult to achieve a water vapor transmission rate of 1 × 10 −2 g / (m 2 day) or less.
ガラスのガスバリア性は完全であるが、持ち運び可能な携帯型液晶テレビなどの用途では、軽量化の要求が強い。これらを同時に解決する方法として一対のガラスとこれらに挟まれた樹脂からなるガスバリア性に優れ、且つ表面性に優れた軽量基板の開発に至った。
一方、ガラス積層体によるガスバリア性の改善も期待できる。これまでのガラス積層体の技術としては、以下のようなものがすでに開示されている。
Although the gas barrier properties of glass are perfect, there is a strong demand for weight reduction in applications such as portable LCD TVs that can be carried. As a method for solving these problems at the same time, the inventors have developed a lightweight substrate having excellent gas barrier properties and excellent surface properties comprising a pair of glasses and a resin sandwiched between them.
On the other hand, improvement of gas barrier properties by the glass laminate can also be expected. The following are already disclosed as conventional glass laminate technologies.
例えば、特許文献１（特開２００６−９６６１２号公報）では、ホウ珪酸ガラス板を使用し、それらの相互間に介在させる中間膜としてテロラフルオロエチレン‐ヘキサフルオロプロピレン‐ビニリデンフロライドの共重合体を使用する合わせガラスが開示されている。ここで使用される薄膜ガラスは防犯ガラス等に使用することを目的としているためその厚みは、２〜１５ｍｍ程度が使用される。このため、本目的、用途とは本質的に異なる。また、大面積を必要とされる。 For example, in Patent Document 1 (Japanese Patent Laid-Open No. 2006-96612), a borosilicate glass plate is used, and a copolymer of terafluoroethylene-hexafluoropropylene-vinylidene fluoride is used as an intermediate film interposed therebetween. The laminated glass used is disclosed. Since the thin film glass used here is intended to be used for crime prevention glass or the like, a thickness of about 2 to 15 mm is used. For this reason, it is essentially different from this purpose and application. Moreover, a large area is required.
例えば、太陽電池のバック基板に適応した場合、ガラスが厚く重量的に難がある。
例えば、特許文献２（特開２００８−３７０９４号公報）には、ガラス／硬化中間層／ガラスの構成を持つ透明な積層体が軽量薄型ディスプレイに好適な積層体であることが開示される。文献２は積層する薄膜ガラスの厚みは１００μｍ〜２００μｍである。１００μｍ〜２００μｍのガラスを使用する場合ですら構造体としては、十分軽量化されているとは言い難く、１００μｍ未満ではディスプレイの基板としての剛性が不足し、基板に適さない。
For example, when applied to a back substrate of a solar cell, the glass is thick and difficult in terms of weight.
For example, Patent Document 2 (Japanese Patent Laid-Open No. 2008-37094) discloses that a transparent laminate having a glass / cured intermediate layer / glass configuration is a laminate suitable for a lightweight thin display. In Document 2, the thickness of the thin film glass to be laminated is 100 μm to 200 μm. Even when glass of 100 μm to 200 μm is used, it is difficult to say that the structure is sufficiently lightened, and if it is less than 100 μm, the rigidity of the display substrate is insufficient and it is not suitable for the substrate.
さらに、例えば、特許文献３（特開平７−４３６９６号公報）には、厚さ１．５μｍ以上２５０μｍ未満の超薄ガラス板間に１層の接着性透明性樹脂が介在される表示装置用基板が開示されている。この超薄ガラスは片面に研磨が施される必要があり、ガラスの持つ平滑性についてはまったく着目されていない。また、プロセスコストの大巾な増加につながる。 Further, for example, Patent Document 3 (Japanese Patent Laid-Open No. 7-43696) discloses a display device substrate in which a single layer of an adhesive transparent resin is interposed between ultrathin glass plates having a thickness of 1.5 μm or more and less than 250 μm. Is disclosed. This ultra-thin glass needs to be polished on one side, and no attention is paid to the smoothness of the glass. In addition, the process cost is greatly increased.
本発明は、ガラス表面の平滑性に優れたガラスを選定し、その特徴を充分発揮させる組み合わせによりガスバリア性に優れ、かつ表面性に優れた軽量基板提供することが出来ることを見出した。 The present invention has found that a lightweight substrate having excellent gas barrier properties and excellent surface properties can be provided by selecting a glass having excellent glass surface smoothness and sufficiently exhibiting the characteristics.
本発明の目的は、前記課題を解消し、表示装置などのより一層の薄型軽量化を実現するとともに、軽量で、水、空気のガスバリア性を有する積層体を提供することである。 An object of the present invention is to solve the above-mentioned problems, to realize a further reduction in thickness and weight of a display device and the like, and to provide a light-weight laminate having water and air gas barrier properties.
本発明は、少なくとも一対の薄膜ガラスと、それらに挟まれた樹脂を主成分とする中間層からなり、水蒸気透過率が１×１０−２g／（ｍ２ｄａｙ）以下であるガスバリア性に優れ、かつ表面性に優れた軽量基板である。
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、薄膜ガラスのうち少なくとも１枚の平均厚みが５μｍ〜１００μｍの範囲であることを特徴とする。
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、薄膜ガラスの平均厚みがそれぞれ５μｍ〜１００μｍの範囲であり、これら平均厚みの差が１μｍ未満であることを特徴とする。
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、薄膜ガラスの平均厚みがそれぞれ５μｍ〜１００μｍの範囲であり、これら平均厚みの差が１μｍ以上、９０μｍ以下であることを特徴とする。
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、薄膜ガラスの平均厚みが５μｍ〜１００μｍの範囲であり、これら平均厚みの合計が中間層の厚みよりも薄いことを特徴とする。
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、薄膜ガラスの平均厚みが５μｍ〜１００μｍの範囲であり、これら平均厚みの合計と中間層の厚みとの総計が３．０ｍｍ以下であることを特徴とする。
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、薄膜ガラスの平均厚みが５μｍ〜１００μｍの範囲であり、これら平均厚みの合計と中間層の厚みとの総計が１．０ｍｍ以下であることを特徴とする。
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、薄膜ガラスの平均厚みが５μｍ〜１００μｍの範囲であり、これら平均厚みの合計と中間層の厚みとの総計が０．５ｍｍ以下であることを特徴とする。
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、中間層が熱可塑性樹脂を主たる構成成分とすることを特徴とする。
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、中間層が熱硬化樹脂を主たる構成成分とすることを特徴とする。
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、中間層が複数の樹脂層からなることを特徴とする。
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、複数の樹脂層の両最外層が、ガラスとの接着性または粘着性を有する樹脂を主たる構成成分とすることを特徴とする。
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、薄膜ガラスが、オーバーフロー法により作られ、表面粗さ（Ｒａ値）が１ｎｍ以下の平滑な表面を有することを特徴とする。好ましくは、０．５ｎｍ以下である。
また、本発明は、前記ガスバリア性に優れ、かつ表面性に優れた軽量基板を用いたディスプレイ部材であっても良い。
また、本発明は、ディスプレイが有機ＥＬであるディスプレイ部材であっても良い。
また、本発明は、ディスプレイが電子ペーパーであるディスプレイ部材であっても良い。
また、本発明は、前記ガスバリア性に優れ、かつ表面性に優れた軽量基板を用いた照明部材であっても良い。
また、本発明は、照明光源に有機ＥＬを用いた照明部材であっても良い。
また、本発明は、前記ガスバリア性に優れ、かつ表面性に優れた軽量基板を用いた太陽電池部材であっても良い。
The present invention comprises at least a pair of thin film glasses and an intermediate layer mainly composed of a resin sandwiched between them, and has an excellent gas barrier property with a water vapor transmission rate of 1 × 10 −2 g / (m 2 day) or less. And a lightweight substrate with excellent surface properties.
Moreover, the lightweight substrate excellent in gas barrier properties and surface properties of the present invention is characterized in that the average thickness of at least one of the thin film glasses is in the range of 5 μm to 100 μm.
Moreover, the lightweight substrate excellent in gas barrier properties and surface properties of the present invention is characterized in that the average thickness of the thin film glass is in the range of 5 μm to 100 μm, respectively, and the difference between these average thicknesses is less than 1 μm. .
Further, the lightweight substrate having excellent gas barrier properties and excellent surface properties of the present invention has an average thickness of thin film glass in the range of 5 μm to 100 μm, respectively, and the difference in average thickness is 1 μm or more and 90 μm or less. Features.
Further, the lightweight substrate having excellent gas barrier properties and excellent surface properties according to the present invention is characterized in that the average thickness of the thin film glass is in the range of 5 μm to 100 μm, and the total of these average thicknesses is thinner than the thickness of the intermediate layer. And
Moreover, the lightweight substrate excellent in gas barrier properties and surface properties of the present invention has an average thickness of thin film glass in the range of 5 μm to 100 μm, and the total of the average thickness and the thickness of the intermediate layer is 3. It is 0 mm or less.
Moreover, the lightweight substrate excellent in gas barrier properties and surface properties of the present invention has an average thickness of thin film glass in the range of 5 μm to 100 μm, and the sum of the average thickness and the thickness of the intermediate layer is 1. It is 0 mm or less.
Moreover, the lightweight substrate excellent in gas barrier properties and surface properties of the present invention has an average thickness of thin film glass in the range of 5 μm to 100 μm, and the total of these average thicknesses and intermediate layer thicknesses is 0.00. It is 5 mm or less.
The lightweight substrate having excellent gas barrier properties and excellent surface properties according to the present invention is characterized in that the intermediate layer is mainly composed of a thermoplastic resin.
Moreover, the lightweight substrate excellent in gas barrier properties and surface properties of the present invention is characterized in that the intermediate layer is mainly composed of a thermosetting resin.
Moreover, the lightweight substrate excellent in gas barrier properties and surface properties of the present invention is characterized in that the intermediate layer is composed of a plurality of resin layers.
In addition, the lightweight substrate having excellent gas barrier properties and excellent surface properties according to the present invention is characterized in that both outermost layers of a plurality of resin layers are mainly composed of a resin having adhesiveness or tackiness with glass. And
Further, the lightweight substrate having excellent gas barrier properties and excellent surface properties according to the present invention is characterized in that the thin film glass is made by an overflow method and has a smooth surface with a surface roughness (Ra value) of 1 nm or less. To do. Preferably, it is 0.5 nm or less.
Further, the present invention may be a display member using a lightweight substrate having excellent gas barrier properties and excellent surface properties.
Moreover, the display member whose display is organic EL may be sufficient as this invention.
Moreover, the display member whose display is electronic paper may be sufficient as this invention.
Further, the present invention may be an illumination member using a lightweight substrate having excellent gas barrier properties and excellent surface properties.
Moreover, the present invention may be an illumination member using organic EL as an illumination light source.
Further, the present invention may be a solar cell member using a lightweight substrate having excellent gas barrier properties and excellent surface properties.
本発明に従えば、少なくとも一対の薄膜ガラスと、それらに挟まれた樹脂を主成分とする中間層からなり、水蒸気透過率が１×１０−2g／（ｍ２ｄａｙ）以下であることを特徴とするガスバリア性に優れ、かつ表面性に優れた軽量基板を使うことにより従来のガラス基板より薄型軽量の電子部品を作成することができる。 According to the present invention, it comprises at least a pair of thin film glasses and an intermediate layer mainly composed of a resin sandwiched between them, and has a water vapor transmission rate of 1 × 10 −2 g / (m 2 day) or less. By using a lightweight substrate with excellent gas barrier properties and excellent surface properties, it is possible to produce electronic components that are thinner and lighter than conventional glass substrates.
また、これは空気や水分のバリア性が良好であるので、例えば、液晶表示パネルやＥＬ表示パネル等に形成されている素子が、水蒸気に触れて性能劣化するのを避けることができる等の効果が期待できる。また、電子ペーパー、太陽電池等のバリア性の要求される部材での軽量化をはかることが出来る。 In addition, since this has good air and moisture barrier properties, for example, it is possible to avoid that elements formed in a liquid crystal display panel, an EL display panel, etc. are exposed to water vapor and deteriorate in performance. Can be expected. In addition, it is possible to reduce the weight of members that require barrier properties such as electronic paper and solar cells.
（ガスバリア性に優れ、かつ表面性に優れた軽量基板）
本発明におけるガスバリア性に優れ、かつ表面性に優れた軽量基板は、少なくとも一対の薄膜ガラスと、それらに挟まれた樹脂中間層からなり、水蒸気透過率が１×１０−２g／（ｍ２ｄａｙ）以下であることを特徴とする。
(Lightweight substrate with excellent gas barrier properties and surface properties)
The lightweight substrate having excellent gas barrier properties and excellent surface properties in the present invention comprises at least a pair of thin film glasses and a resin intermediate layer sandwiched between them, and has a water vapor transmission rate of 1 × 10 −2 g / (m 2. day) or less.
また、本発明におけるガスバリア性に優れ、かつ表面性に優れた軽量基板は、２枚の薄膜ガラスの平均厚みの合計と樹脂中間層の厚みとの総計（以下『板厚寸法』ということがある）については薄いものが好まれ、３．０ｍｍ以下が好ましい。好ましくは、１．０ｍｍ以下。さらに好ましくは０．５ｍｍ以下である。 In addition, the lightweight substrate having excellent gas barrier properties and excellent surface properties in the present invention may be the sum of the average thickness of the two thin film glasses and the thickness of the resin intermediate layer (hereinafter referred to as “plate thickness dimension”). ) Is preferred, and is preferably 3.0 mm or less. Preferably, it is 1.0 mm or less. More preferably, it is 0.5 mm or less.
（薄膜ガラス）
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板を構成する薄膜ガラスは、平均厚みが５〜１００μｍであることが好ましい。厚みが１００〜５００μｍの基板の場合、軽量基板のとしての価値が小さくなってしまう。また、薄膜ガラスの平均厚みが５μｍ未満では、薄肉すぎて取り扱いが困難になる。
(Thin glass)
Moreover, it is preferable that the thin film glass which comprises the lightweight substrate excellent in the gas barrier property of this invention and excellent in surface property is 5-100 micrometers in average thickness. In the case of a substrate having a thickness of 100 to 500 μm, the value as a lightweight substrate is reduced. In addition, when the average thickness of the thin film glass is less than 5 μm, it is too thin to handle.
本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板を構成する薄膜ガラスは、各種成形法によって成形されたものを採用することが可能である。例えばロールアウト法、リドロー法、ダウンドロー法、フロート法等を必要に応じて使用することが可能である。ただし、前記フロート法を使用した場合、溶融金属（溶融錫）の上面に溶融ガラスを流し込んでガラス層を形成するという手法のため、このフロート法により成形されたガラス基板は、溶融錫との接触側に対応する片面を精密研磨する必要が出てくる。この場合、出来たガラス面も例えば表面粗さＲａ２０ｎｍ程度である。しかし、研磨回数などを調整することにより目的物に近い表面を作りだすことは可能ある。 As the thin film glass constituting the lightweight substrate having excellent gas barrier properties and surface properties of the present invention, those formed by various molding methods can be adopted. For example, a rollout method, a redraw method, a downdraw method, a float method or the like can be used as necessary. However, when the float method is used, the glass substrate formed by this float method is in contact with the molten tin because of the method of forming a glass layer by pouring molten glass onto the upper surface of the molten metal (molten tin). It will be necessary to precisely polish one side corresponding to the side. In this case, the finished glass surface has a surface roughness Ra of about 20 nm, for example. However, it is possible to create a surface close to the target by adjusting the number of times of polishing.
従って、本発明における薄膜ガラスは、上記の成形法のうちオーバーフロー法により作成されたものであることが特に好ましい。オーバーフロー法の場合、ガラス固化工程で上記のような溶融金属との接触がないため、オーバーフロー法により作成された薄膜ガラスは、表面が極めて平滑で、均質なものが出来き、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板に好適に用いることができる。また、後工程でガラスの研磨等の作業をする必要がなく、生産コストの面でも優位である。 Therefore, the thin film glass in the present invention is particularly preferably one produced by the overflow method among the above molding methods. In the case of the overflow method, since there is no contact with the molten metal as described above in the glass solidification process, the thin film glass produced by the overflow method can be made with a very smooth and homogeneous surface, and the gas barrier property of the present invention In addition, it can be suitably used for a lightweight substrate having excellent surface properties. Further, it is not necessary to perform operations such as glass polishing in the subsequent process, which is advantageous in terms of production cost.
ここで、オーバーフロー成形方法であるとは、上部が開口した樋形状の溶融ガラス供給溝をオーバーフロー成形装置頂部に有し、このガラス供給溝の両側壁頂部をオーバーフローの堰とし、かつ両側壁の外面部の断面が略楔形となるように両側壁の外面同士を下方に向けて相互に接近させて下端で終結させた成形体を備え、溶融ガラスをガラス供給溝の一端から連続的に供給して両側壁頂部稜線からオーバーフローさせ、両側壁外面に沿って流下させて略楔形下端で合流させて薄膜ガラスとすることのできる薄膜ガラスの成形装置を使用し、薄膜ガラスを成形する方法であることを意味している。 Here, the overflow molding method means that a glass-shaped molten glass supply groove having an open top is formed at the top of the overflow molding apparatus, the tops of both side walls of the glass supply groove serve as overflow weirs, and the outer surfaces of the side walls The outer surface of both side walls are directed downward and close to each other so that the cross section of the part is substantially wedge-shaped, and the molten glass is continuously supplied from one end of the glass supply groove. It is a method of forming a thin film glass by using a thin film glass forming apparatus that can overflow from the top ridge lines of both side walls, flow down along the outer surfaces of both side walls, and merge at a substantially wedge-shaped lower end to form a thin film glass. I mean.
このような製造方法で製造された薄膜ガラスであれば、ガラス溶融時の自由表面を維持してガラス表面が形成されるため、ガラス透光面に強度に影響するような傷等が製造時に形成され難い。そのため、高い形状品位の薄膜ガラスを成形し易く、薄膜ガラスの強度低下となる原因を低減できるため、好ましい。 If it is a thin film glass manufactured by such a manufacturing method, the glass surface is formed while maintaining the free surface when the glass is melted. It is hard to be done. Therefore, it is preferable because it is easy to form a thin glass with high shape and quality, and the cause of a decrease in strength of the thin glass can be reduced.
このような製造方法で作成された薄膜ガラスの表面粗さのＲａ値は１ｎｍ以下を確保でき、本電気電子用途にて特に好ましい。特にこのましくは、０．５ｎｍ以下である。表面粗さのＲａ値が１ｎｍを超える場合、例えば、光半導体用窓ガラスのような場合、透過光がガラス窓の表面で散乱し、受発信する信号にノイズを生じさせるなどの不具合がある。
尚、超薄ガラス板の表面粗さ（Ｒａ値）は、垂直分解能０．０５ｎｍ程度の市販されている走査型プローブ顕微鏡（ＳＰＭ）によって測定できる。
The Ra value of the surface roughness of the thin film glass produced by such a production method can ensure 1 nm or less, which is particularly preferable in the present electric / electronic application. In particular, this is preferably 0.5 nm or less. When the Ra value of the surface roughness exceeds 1 nm, for example, in the case of a window glass for optical semiconductors, there is a problem that transmitted light is scattered on the surface of the glass window and noise is generated in a signal transmitted and received.
The surface roughness (Ra value) of the ultrathin glass plate can be measured by a commercially available scanning probe microscope (SPM) having a vertical resolution of about 0.05 nm.
本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板を構成する薄膜ガラスの材質としては、多成分系酸化物ガラスであればどのようなものであってもよい。例えば、本発明を適用することのできる材質としては、無アルカリガラス、硼珪酸ガラス、アルミノシリケートガラス等が特に好適であり、その中でも無アルカリガラスは最も好ましい。 The material of the thin film glass constituting the lightweight substrate having excellent gas barrier properties and excellent surface properties of the present invention may be any material as long as it is a multicomponent oxide glass. For example, as a material to which the present invention can be applied, alkali-free glass, borosilicate glass, aluminosilicate glass, and the like are particularly preferable, and alkali-free glass is most preferable among them.
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板を構成する薄膜ガラスを所望の寸法となるように加工する方法としては種々の加工方法を採用してもよい。例えば、ダイヤモンドホイールによる切断加工、ウォータージェット切断加工、切削加工、ワイヤーソー切断装置による切断、バンドソー切断装置による加工、レーザー切断装置、折り割加工機、研磨装置、切削装置等を必要に応じて使い分けることが可能である。 In addition, various processing methods may be employed as a method of processing the thin film glass constituting the lightweight substrate having excellent gas barrier properties and excellent surface properties of the present invention so as to have a desired size. For example, diamond wheel cutting, water jet cutting, cutting, wire saw cutting machine, band saw cutting machine, laser cutting machine, folding machine, polishing machine, cutting machine, etc. It is possible.
（中間層）
本発明における中間層は、樹脂を主成分とする。樹脂には、熱可塑性樹脂や熱硬化性樹脂（以下、併せて『樹脂』ということがある）を用いることができる。
(Middle layer)
The intermediate layer in the present invention contains a resin as a main component. As the resin, a thermoplastic resin or a thermosetting resin (hereinafter sometimes referred to as “resin”) can be used.
中間層は、どのような有機樹脂を充填したものであってもよい。例えばＰＶＢ（ポリビニルブチラール）、ウレタン樹脂、ＰＭＭＡ（ポリメチルメタクリレート）、ＰＳ（ポリスチレン）、ＰＭＡ（メタクリル樹脂）、ＰＣ（ポリカーボネート）、ＰＶＦ（ポリビニルホルマール）、ＰＯＭ（ポリアセタール）、ＰＰ（ポリプロピレン）、ＰＥ（ポリエチレン）、ＡＳ（ＡＳ樹脂）、ＥＶＡ（エチレン酢酸ビニル共重合体）、ＰＡ（ポリアミド）、ＰＥＴ（ポリエチレンテレフタレート）、ＰＢＴ（ポリブチレンテレフタレート）、ＤＡＰ（ジアリルフタレート樹脂）、ＡＡＳ（ＡＡＳ樹脂）、ＡＣＳ（ＡＣＳ樹脂）、ＴＰＸ（ポリメチルペンテン）、ＰＰＯ（ポリフェニレンオキシド）、ＰＰＳ（ポリフェニレンスルフィド）、ＢＳ（ブタジエンスチレン樹脂）、ＰＡＢＭ（ポリアミノビスマレイミド）、ＭＢＳ（ＭＢＳ樹脂）、ＰＡＩ（ポリイミド）、ＰＡＲ（ポリアリレート）、ＰＡＳＦ（ポリアリルスルフォン）、ＢＲ（ポリブタジエン）、ＰＥＳＦ（ポリエーテルスルフォン）、ＰＥＥＫ（ポリエーテルエーテルケトン）、ＳＩ（ケイ素樹脂）、ＰＴＦＥ（ポリ４フッ化エチレン）、ＦＥＰ（ポリフッ化エチレンプロピレン）、ＰＦＡ（ペルフロロアルコキシフッ化プラスチック）、耐熱フッ素系樹脂等の材料を必要に応じて使用することができる。これらの中間層は単一層であっても、さらに多層構造（複数樹脂層の多層構造）となっているものであってよい。 The intermediate layer may be filled with any organic resin. For example, PVB (polyvinyl butyral), urethane resin, PMMA (polymethyl methacrylate), PS (polystyrene), PMA (methacrylic resin), PC (polycarbonate), PVF (polyvinyl formal), POM (polyacetal), PP (polypropylene), PE (Polyethylene), AS (AS resin), EVA (ethylene vinyl acetate copolymer), PA (polyamide), PET (polyethylene terephthalate), PBT (polybutylene terephthalate), DAP (diallyl phthalate resin), AAS (AAS resin) , ACS (ACS resin), TPX (polymethylpentene), PPO (polyphenylene oxide), PPS (polyphenylene sulfide), BS (butadiene styrene resin), PABM (polyaminobismaleimide) MBS (MBS resin), PAI (polyimide), PAR (polyarylate), PASF (polyallyl sulfone), BR (polybutadiene), PESF (polyether sulfone), PEEK (polyether ether ketone), SI (silicon resin), Materials such as PTFE (polytetrafluoroethylene), FEP (polyfluoroethylenepropylene), PFA (perfluoroalkoxyfluorinated plastic), and heat-resistant fluorine-based resin can be used as necessary. These intermediate layers may be a single layer or a multilayer structure (multilayer structure of a plurality of resin layers).
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板に係る中間層には、着色剤、赤外線や紫外線などの特定波長についての光線の吸収剤、酸化防止剤、可塑剤、消泡剤、増粘剤、塗料性改良剤、あるいは耐電防止剤等の各種添加剤、薬剤などを適量配合することでさらに付加的な性能を付与することができる。
さらに、軽量化の目的から発砲体であってもよい。
In addition, the intermediate layer according to the lightweight substrate having excellent gas barrier properties and surface properties of the present invention has a colorant, a light absorber for specific wavelengths such as infrared rays and ultraviolet rays, an antioxidant, a plasticizer, a quencher. Additional performance can be imparted by blending appropriate amounts of various additives such as foaming agents, thickeners, paint improvers, or antistatic agents, and drugs.
Furthermore, a fired body may be used for the purpose of weight reduction.
本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板に係る中間層に適用する材料は、予め部分架橋した状態にあるゲル状重合物を準備し、それを中間層となるように成形したものを使用することもできる。この場合には、部分架橋したゲル状重合物についてはどのような形態であってもよく、粉粒状、ペレット状、ボール状、あるいはシート状等の種々の形状とすることができる。この中でも特にシート形状とするならば、さらにシート表面に所望の表面処理剤、機能膜を塗布、被覆させる等の対処を行うことができる。また成形時の微細な気泡の除去も行い易いので好ましい。 The material to be applied to the intermediate layer relating to the lightweight substrate having excellent gas barrier properties and surface properties of the present invention is prepared by preparing a gel-like polymer in a partially crosslinked state in advance and forming it as an intermediate layer. You can also use what you did. In this case, the partially crosslinked gel-like polymer may be in any form, and can be in various forms such as powder, pellets, balls, or sheets. Among these, if the sheet shape is used in particular, it is possible to take measures such as coating and coating a desired surface treatment agent and functional film on the sheet surface. Further, it is preferable because fine bubbles can be easily removed during molding.
本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板を形成する方法については、各種の方法が利用できる。例えば、予め積層状態に保持した薄膜ガラスの間に中間層となる樹脂を注入することで積層体とし、その後で樹脂を硬化させることによって積層構造体とするものでもよく、あるいは、薄膜ガラス間に樹脂製のシート材を挿入した状態で薄膜ガラスを重ねた状態とし、そのまま加熱処理や圧縮処理を施すものでもよい。 Various methods can be used for the method of forming a lightweight substrate having excellent gas barrier properties and surface properties according to the present invention. For example, a laminated body may be formed by injecting a resin serving as an intermediate layer between thin film glasses previously held in a laminated state, and then a laminated structure may be obtained by curing the resin, or between thin film glasses. The thin film glass may be stacked with the resin sheet material inserted, and heat treatment or compression treatment may be performed as it is.
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、上述に加え、中間層が、熱可塑性樹脂を用いたシート材により構成されてなるものであるならば、積層構造を構成する際に効率的な工程で積層構造体を形成することができ、積層構造体の成形品位を管理し易く好ましい。 In addition to the above, the lightweight substrate having excellent gas barrier properties and excellent surface properties according to the present invention has a laminated structure provided that the intermediate layer is composed of a sheet material using a thermoplastic resin. When it comprises, a laminated structure can be formed by an efficient process, and it is easy to manage the molding quality of the laminated structure, which is preferable.
例えば、ＰＶＢ（ポリビニルブチラール）やＥＶＡ（エチレンポリビニルアセテート）などの熱可塑性樹脂材をシート状に予め成形したものを薄膜ガラスと薄膜ガラスとの間に挟接した状態で保持し、その状態で加熱などして薄膜ガラスと接合させて中間層とすることができる。 For example, a sheet of a thermoplastic resin material such as PVB (polyvinyl butyral) or EVA (ethylene polyvinyl acetate) is preliminarily formed into a sheet shape and held between the thin film glass and the thin film glass, and heated in that state. For example, it can be bonded to a thin film glass to form an intermediate layer.
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、上述に加え、中間層に、ガラス、結晶化ガラス、金属及び炭素の群の内、１種以上により構成されてなる繊維状物、網状物、組布あるいは織布を含有してなるものであるならば、用途に応じて最適な構成を採用することによって、充分な剛性と強度を有するガスバリア性に優れ、かつ表面性に優れた軽量基板とすることができ、多様なニーズに対応することが可能となる。 Moreover, the lightweight board | substrate excellent in the gas barrier property of this invention and excellent in surface property is comprised by 1 or more types in the group of glass, crystallized glass, a metal, and carbon in addition to the above. If it contains a fibrous material, a net-like material, a braided fabric or a woven fabric, by adopting the optimum configuration according to the application, it has excellent gas barrier properties with sufficient rigidity and strength, and the surface It is possible to make a lightweight substrate with excellent performance, and to meet various needs.
上記のガラス、結晶化ガラス、金属及び炭素については、その材質については特に限定しない。例えばガラスについては、各種の多成分系ガラス、あるいは石英ガラスなどを使用でき、結晶化ガラスについても種々の結晶化ガラス材質が利用できる。また、金属やカーボンについても同様である。さらに繊維状物、網状物、組布あるいは織布については、その大きさや形状などについても限定されることはない。 About said glass, crystallized glass, a metal, and carbon, it does not specifically limit about the material. For example, various multicomponent glass or quartz glass can be used for glass, and various crystallized glass materials can be used for crystallized glass. The same applies to metals and carbon. Further, the size, shape, etc. of the fibrous material, net-like material, braided fabric or woven fabric are not limited.
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、必要に応じて適所にレーザーやエッチング、サンドブラスト等を使用することによって材質コードや型番等をガラス表面に刻印することが可能である。 In addition, the lightweight substrate having excellent gas barrier properties and excellent surface properties according to the present invention can be engraved with a material code, model number, etc. on the glass surface by using laser, etching, sandblasting, etc. in an appropriate place as necessary. Is possible.
また、本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板は、積層体を形成する際に予め成形した型材中に薄膜ガラスを押圧することによって、全体が湾曲した構造物としてもよい。 In addition, the lightweight substrate having excellent gas barrier properties and excellent surface properties according to the present invention may be a structure in which the whole is curved by pressing a thin film glass into a mold material previously formed when forming a laminate. .
また、使用目的に応じて本発明に従えば、ガスバリア性に優れ、かつ表面性に優れた軽量基板の最外層の片面または両面に各種方法により被膜（機能性被膜）を積層した構造体を得ることができる。 Further, according to the present invention according to the purpose of use, a structure in which a coating (functional coating) is laminated by various methods on one or both surfaces of the outermost layer of a lightweight substrate having excellent gas barrier properties and excellent surface properties is obtained. be able to.
例えば、ガスバリア性に優れ、かつ表面性に優れた軽量基板の一対の薄膜ガラスのうち、少なくとも一方の薄膜ガラスの積層体外方表面となる面には、反射防止処理を施こした軽量基板に有用な構造体とすることができる。したがって前記反射防止処理面が、前記軽量基板が備えられる表示装置の表示面側となるように配置されることによって、反射光による表示面のちらつきを防止することができる。 For example, among a pair of thin glass substrates of a lightweight substrate having excellent gas barrier properties and excellent surface properties, the surface that is the outer surface of the laminate of at least one thin film glass is useful for a lightweight substrate that has undergone antireflection treatment. Structure. Therefore, flickering of the display surface due to reflected light can be prevented by arranging the antireflection treatment surface to be on the display surface side of the display device provided with the lightweight substrate.
前記機能性被膜としては、光学性能を付与する屈折率調整膜、不透過膜、反射防止膜や耐候性を向上させる保護膜、さらに導電膜、帯電膜等の導電性被膜を適宜採用することができる。これら被膜のうち、導電性被膜、半導体被膜、防眩性被膜（反射防止被膜）が特に好ましい。 As the functional film, a refractive index adjusting film that imparts optical performance, an impermeable film, an antireflection film, a protective film that improves weather resistance, and a conductive film such as a conductive film or a charged film may be appropriately employed. it can. Of these coatings, conductive coatings, semiconductor coatings, and antiglare coatings (antireflection coatings) are particularly preferable.
被膜の施工方法としては、化学蒸着法、物理蒸着法、スプレー法、ディッピング法、貼り付け法あるいは刷毛塗り法等を適宜使用することが可能である。
また、機能性被膜に半導体機能を有する被膜を用いた構造体は、太陽電池部材として特に有用である。
As a method for applying the coating, a chemical vapor deposition method, a physical vapor deposition method, a spray method, a dipping method, a pasting method, a brush coating method, or the like can be appropriately used.
In addition, a structure using a functional film having a semiconductor function is particularly useful as a solar cell member.
本発明のガスバリア性に優れ、かつ表面性に優れた軽量基板（以下、単に『ガスバリア性に優れた軽量基板』ということがある）は、例えば、液晶部材、ディスプレイ部材、有機ＥＬ部材、電子ペーパー部材、照明部材、太陽電池部材などの各種部材に好適に用いられる。 The lightweight substrate excellent in gas barrier properties and surface properties of the present invention (hereinafter sometimes simply referred to as “lightweight substrate excellent in gas barrier properties”) is, for example, a liquid crystal member, a display member, an organic EL member, or electronic paper. It is suitably used for various members such as members, lighting members and solar cell members.
以下実施例にて詳述する。ただし、本発明は実施例に限定されない。
尚、実施例中の各物性値は下記測定法による。
This will be described in detail in the following examples. However, the present invention is not limited to the examples.
In addition, each physical property value in an Example is based on the following measuring method.
（表面粗さ（Ｒａ値））
垂直分解能０．０５ｎｍの走査型プローブ顕微鏡（ＳＰＭ）で測定した。
(Surface roughness (Ra value))
Measurement was performed with a scanning probe microscope (SPM) having a vertical resolution of 0.05 nm.
（ガスバリア性評価：水蒸気透過率）
ＭＯＣＯＮ社製のパーマトランＷ１Ａを用いて４０℃、９０ＲＨ％雰囲気下における水蒸気透過率を測定した。
(Gas barrier property evaluation: water vapor transmission rate)
Using Permantran W1A manufactured by MOCON, the water vapor transmission rate in an atmosphere of 40 ° C. and 90 RH% was measured.
（薄膜ガラスの平均厚み）
（株）ミツトヨ社製の厚み計測器にて測定した。
［ガスバリア性に優れた軽量基板１の作成］
図１は、本発明の一実施例であるガスバリア性に優れた軽量基板１の構成を示す断面図である。図１に示すように、ガスバリア性に優れた軽量基板１は、一対の薄膜ガラス２および薄膜ガラス２ａ間に、前記薄膜ガラス２，２ａより厚いポリビニルブチラール系中間層３を介在して形成される。
ガスバリア性に優れた軽量基板１は、以下に示す手順で作成される。厚さ３ｍｍのソーダライムガラス板を支持体としてこの上に、以下に述べるそれぞれ２０ｃｍ×２０ｃｍの大きさの部材が積層される。まず、オーバーフロー法で作成された表面粗さＲａ０．２ｎｍで厚さ１００μｍの薄膜ガラス２が積層される。この上に接着性を有し、水洗、乾燥、裁断、調湿した厚さ４００μｍのポリビニルブチラールフィルム３が積層される。さらに、オーバーフロー法で作成された表面粗さＲａ０．２ｎｍで厚さ１００μｍの薄膜ガラス２ａを上にして設置される。
(Average thickness of thin film glass)
The thickness was measured with a thickness measuring instrument manufactured by Mitutoyo Corporation.
[Production of lightweight substrate 1 with excellent gas barrier properties]
FIG. 1 is a cross-sectional view showing a configuration of a lightweight substrate 1 having excellent gas barrier properties according to an embodiment of the present invention. As shown in FIG. 1, a lightweight substrate 1 having excellent gas barrier properties is formed between a pair of thin film glass 2 and thin film glass 2a with a polyvinyl butyral intermediate layer 3 thicker than the thin film glass 2 or 2a interposed therebetween. .
The lightweight substrate 1 having excellent gas barrier properties is prepared by the following procedure. Members each having a size of 20 cm × 20 cm described below are laminated on a soda lime glass plate having a thickness of 3 mm as a support. First, a thin film glass 2 having a surface roughness Ra of 0.2 nm and a thickness of 100 μm prepared by an overflow method is laminated. On top of this, a polyvinyl butyral film 3 having a thickness of 400 μm which has adhesiveness and is washed, dried, cut and conditioned is laminated. Further, the thin film glass 2a having a surface roughness Ra of 0.2 nm and a thickness of 100 μm prepared by the overflow method is placed on top.
このようにして、支持体上に積層されたガスバリア性に優れた軽量基板１は、ゴム袋の中に収納されて温度８５℃、真空度５５０ｍｍＨｇで２５分間減圧加熱され、予備接着が行われる。次いで、前記ガスバリア性に優れた軽量基板１の端面にＵＶ（紫外線）硬化型アクリル樹脂が塗布され、紫外線照射によって前記アクリル樹脂の硬化が行われる。これによってガスバリア性に優れた軽量基板１の端面が封止される。さらにガスバリア性に優れた軽量基板１は、オートクレーブで１３７℃、１０ｋｇ／ｃｍ２ で２５分間加圧され、同時にガスバリア性に優れた軽量基板１の端面に塗布されたＵＶ硬化型アクリル樹脂の十分な硬化が行われる。
前記オーバーフロー法で作成された表面粗さＲａ０．２ｎｍで厚さ１００μｍの薄膜ガラスは、日本電気硝子（株）製のガラスシートを使用し、前記ポリビニルブチラールフィルム３には、積水化学工業社製フィルムを使用した。
In this way, the lightweight substrate 1 having excellent gas barrier properties laminated on the support is housed in a rubber bag and heated under reduced pressure for 25 minutes at a temperature of 85 ° C. and a vacuum degree of 550 mmHg to perform preliminary adhesion. Next, UV (ultraviolet) curable acrylic resin is applied to the end face of the lightweight substrate 1 having excellent gas barrier properties, and the acrylic resin is cured by irradiation with ultraviolet rays. As a result, the end face of the lightweight substrate 1 having excellent gas barrier properties is sealed. Further, the lightweight substrate 1 having excellent gas barrier properties is pressurized with an autoclave at 137 ° C. and 10 kg / cm 2 for 25 minutes, and at the same time, sufficient UV curable acrylic resin applied to the end face of the lightweight substrate 1 having excellent gas barrier properties. Curing is performed.
As the thin film glass having a surface roughness Ra of 0.2 nm and a thickness of 100 μm prepared by the overflow method, a glass sheet manufactured by Nippon Electric Glass Co., Ltd. is used, and the polyvinyl butyral film 3 is a film manufactured by Sekisui Chemical Co., Ltd. It was used.
［ガスバリア性に優れた軽量基板２の作成］
ガスバリア性に優れた軽量基板２のガラスは、日本電気硝子社製のオーバーフロー法で作成された表面粗さＲａ０．４ｎｍで厚さ５０μｍの薄膜ガラスを２枚使用し、中間層の樹脂は帝人化成社製ポリカーボネートフィルム１００μｍを使用した。これを用いた軽量基板の作成手順は軽量基板1と同様である。ただし、ポリカーボネートとガラス基板との間にアクリル系の粘着剤（日本合成化学社製ポリエスターXI−１００１）を塗布した。
[Creation of lightweight substrate 2 with excellent gas barrier properties]
The glass of the lightweight substrate 2 with excellent gas barrier properties uses two thin film glasses with a surface roughness Ra of 0.4 nm and a thickness of 50 μm made by the overflow method manufactured by Nippon Electric Glass Co., Ltd., and the resin of the intermediate layer is Teijin Chemicals A 100 μm polycarbonate film was used. The procedure for creating a lightweight substrate using this is the same as that for the lightweight substrate 1. However, an acrylic adhesive (Polyester XI-1001 manufactured by Nippon Synthetic Chemical Co., Ltd.) was applied between the polycarbonate and the glass substrate.
［ガスバリア性に優れた軽量基板3の作成］
ガスバリア性に優れた軽量基板３のガラスは、日本電気硝子社製のオーバーフロー法で作成された表面粗さＲａ０．３ｎｍで厚さ１００μｍの薄膜ガラスを２枚使用し、中間層の樹脂は帝人化成社製ポリカーボネートシート３００μｍを使用した。ただしこのシートには、日本電気硝子社製ガラスファイバーＳＰＦ-６０が約５％程含まれている。これを用いた軽量基板の作成手順は軽量基板１と同様である。ただし、ポリカーボネートとガラス基板との間にアクリル系の粘着剤（日本合成化学社製ポリエスターXI−１００１）を塗布した。
[Creation of lightweight substrate 3 with excellent gas barrier properties]
The glass of the lightweight substrate 3 with excellent gas barrier properties uses two thin film glasses with a surface roughness Ra of 0.3 nm and a thickness of 100 μm made by the overflow method manufactured by Nippon Electric Glass Co., Ltd., and the resin of the intermediate layer is Teijin Chemicals A 300 μm polycarbonate sheet was used. However, this sheet contains about 5% of glass fiber SPF-60 manufactured by Nippon Electric Glass Co., Ltd. The procedure for creating a lightweight substrate using this is the same as that for the lightweight substrate 1. However, an acrylic adhesive (Polyester XI-1001 manufactured by Nippon Synthetic Chemical Co., Ltd.) was applied between the polycarbonate and the glass substrate.
［ガスバリア性に優れた軽量基板４の作成］
ガスバリア性に優れた軽量基板４のガラスは、日本電気硝子社製のオーバーフロー法で作成された表面粗さＲａ０．２ｎｍで厚さ５０μｍの薄膜ガラスを２枚使用し、中間層は、エポキシ系フィルム（３Ｍ社製ＴＭフィルムＡＦ-１６２−２）厚み２００μｍを使用した。その他の基板作成手順は「軽量基板１」と同様に行った。ただし、オートクレーブの加圧条件は、１２０℃、１０ｋｇ／ｃｍ２ で６０分間である。
[Production of lightweight substrate 4 with excellent gas barrier properties]
The glass of the lightweight substrate 4 excellent in gas barrier property uses two thin film glasses having a surface roughness Ra of 0.2 nm and a thickness of 50 μm prepared by the overflow method manufactured by Nippon Electric Glass Co., Ltd., and the intermediate layer is an epoxy film. (3M TM film AF-162-2) A thickness of 200 μm was used. Other substrate preparation procedures were performed in the same manner as “Lightweight substrate 1”. However, the autoclave pressure condition is 120 ° C. and 10 kg / cm 2 for 60 minutes.
［基板５の作成］
基板５のガラスは従来のＲａ２０ｎｍで厚み３００μｍのガラス２枚を使用した。その他の基板作成手順は「軽量基板１」と同様に行った。
[Creation of substrate 5]
As the glass of the substrate 5, two conventional glasses having a Ra of 20 nm and a thickness of 300 μm were used. Other substrate preparation procedures were performed in the same manner as “Lightweight substrate 1”.
［実施例１］
軽量基板１のガスバリア性を測定したところ、測定限界の１×１０−２ｇ/（ｍ２・ｄａｙ）以下のガスバリア性を示した。これを有機ＥＬ照明のバック基板として使用したところ５万時間以上の良好な耐久性を示した。ただし、有機EL照明は環境温度など大きく依存するため２３℃の標準環境条件下でテストした。この条件は以下実施例、比較例においても同様である。
[Example 1]
When the gas barrier property of the lightweight substrate 1 was measured, it showed a gas barrier property of 1 × 10 −2 g / (m 2 · day) or less of the measurement limit. When this was used as a back substrate for organic EL lighting, it showed good durability for 50,000 hours or more. However, since organic EL lighting greatly depends on environmental temperature and the like, it was tested under standard environmental conditions of 23 ° C. This condition is the same in the following examples and comparative examples.
［実施例２］
軽量基板２のガスバリア性を測定したところ、測定限界の１×１０−２ｇ/（ｍ２・ｄａｙ）以下のガスバリア性を示した。これを有機ＥＬ照明のバック基板として使用したところ５万時間以上の良好な耐久性を示した。
[Example 2]
When the gas barrier property of the lightweight substrate 2 was measured, it showed a gas barrier property of 1 × 10 −2 g / (m 2 · day) or less of the measurement limit. When this was used as a back substrate for organic EL lighting, it showed good durability for 50,000 hours or more.
［実施例３］
軽量基板３のガスバリア性を測定したところ、測定限界の１×１０−２ｇ/（ｍ２・ｄａｙ）以下のガスバリア性を示した。これを有機ＥＬ照明のバック基板として使用したところ５万時間以上の良好な耐久性を示した。
[Example 3]
When the gas barrier property of the lightweight substrate 3 was measured, it showed a gas barrier property of 1 × 10 −2 g / (m 2 · day) or less of the measurement limit. When this was used as a back substrate for organic EL lighting, it showed good durability for 50,000 hours or more.
［実施例４］
軽量基板４のガスバリア性を測定したところ、測定限界の１×１０−２ｇ/（ｍ２・ｄａｙ）以下のガスバリア性を示した。これを有機ＥＬ照明のバック基板として使用したところ５万時間以上の良好な耐久性を示した。
[Example 4]
When the gas barrier property of the lightweight substrate 4 was measured, it showed a gas barrier property of 1 × 10 −2 g / (m 2 · day) or less of the measurement limit. When this was used as a back substrate for organic EL lighting, it showed good durability for 50,000 hours or more.
［比較例１］
基板５を有機ＥＬ照明のバック基板として使用したところ、実施例１〜４に比べ約１．５倍から２倍程度重く、また、基板層内に非常に微細な気泡が入り、これが剥離の起点になり問題が発生した。
[Comparative Example 1]
When the substrate 5 was used as a back substrate for organic EL lighting, it was about 1.5 to 2 times heavier than Examples 1 to 4, and very fine bubbles entered the substrate layer. The problem occurred.
［比較例２］
実施例１〜４の基板の代わりに厚み３００μの帝人化成（株）製ポリカーボネートシートを用い、有機ＥＬ照明のバック基板とした場合、ダークスポトと呼ばれる非発光部が約１０時間後に発生した。この原因の詳細は不明であるが、水分等の影響が作用しているものと考えられる。ちなみに、厚み３００μのポリカーボネートシート単独のガスバリア性は１２ｇ/（ｍ２・ｄａｙ）である。
[Comparative Example 2]
When a polycarbonate sheet manufactured by Teijin Chemicals Co., Ltd. having a thickness of 300 μm was used instead of the substrates of Examples 1 to 4, and a back substrate for organic EL lighting was used, a non-light emitting portion called a dark spot was generated after about 10 hours. Although the details of the cause are unknown, it is considered that the influence of moisture and the like is acting. Incidentally, the gas barrier property of a polycarbonate sheet having a thickness of 300 μm is 12 g / (m 2 · day).
最後に、ガスバリア性に優れる軽量基板１〜４は、有機ＥＬ照明以外にも高度なガスバリア性が必要な電気電子材用部材、例えば、液晶関連部品や太陽電池関連部品に用いるとこれまでにない良好な特性を付与することが出来る。 Finally, the lightweight substrates 1 to 4 having excellent gas barrier properties are unprecedented when used for members for electric and electronic materials that require high gas barrier properties other than organic EL lighting, such as liquid crystal related components and solar cell related components. Good characteristics can be imparted.
１：ガスバリア性に優れた軽量基板
２：薄膜ガラス
２ａ：薄膜ガラス
３：ポリビニルブチラール系中間層
1: Lightweight substrate excellent in gas barrier property 2: Thin glass 2a: Thin glass 3: Polyvinyl butyral intermediate layer
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| JP2016518262A (en) * | 2013-03-14 | 2016-06-23 | コーニング インコーポレイテッド | Method and apparatus for manufacturing and cutting composite structures of flexible glass and polymer |
| US11766849B2 (en) | 2013-03-14 | 2023-09-26 | Corning Incorporated | Methods and apparatus for fabricating and cutting flexible glass and polymer composite structures |
| CN109824931A (en) * | 2019-01-23 | 2019-05-31 | 中山大学 | Method, composite membrane and its application that glassy layer prepares composite membrane are burnt on polymeric membrane |
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