JP2010147307A - Solar cell module, method for manufacturing the same, and manufacturing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a solar cell module which does not need a complicated structure, can prevent an output reduction and a hotspot phenomenon, and has excellent reliability. <P>SOLUTION: In this solar cell module 10, a first electrode layer 13, an electricity generating layer 14, and a second electrode layer 16 are in this order overlapped on a substrate 11 to form a laminate 12, and the laminate 12 is zoned by a scribe line 20 to form a plurality of photovoltaic cells 21. The photovoltaic cells at adjacent positions are in series connected to each other, and the photovoltaic module is composed of the photovoltaic cells of a plurality of layers. The second electrode layer has: a first region 16a having a thick film thickness; and a second region 16b having a thinner film thickness than the first region, and both of the first region and the second region are alternately arranged so as to cross the scribe line. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a solar cell module, a manufacturing method thereof, and a manufacturing apparatus.

  In recent years, solar cells are becoming more and more widely used from the viewpoint of efficient use of energy. In particular, a solar cell using a silicon single crystal is excellent in energy conversion efficiency per unit area. However, on the other hand, since a solar cell using a silicon single crystal uses a silicon wafer obtained by slicing a silicon single crystal ingot, a large amount of energy is consumed for manufacturing the ingot, and the manufacturing cost is high. In particular, if a large-area solar cell installed outdoors or the like is to be realized using a silicon single crystal, the current cost is considerably high. Therefore, solar cells using amorphous (amorphous) silicon thin films that can be manufactured at lower cost are widely used as low-cost solar cells.

  An amorphous silicon solar cell uses an amorphous silicon film (i-type) that generates electrons and holes when receiving light, and a semiconductor film having a layer structure called a pin junction sandwiched between p-type and n-type silicon films. Electrodes are formed on both sides of the film. Electrons and holes generated by sunlight move actively due to the potential difference between the p-type and n-type semiconductors, and this is continuously repeated, causing a potential difference between the electrodes on both sides.

  As a specific configuration of such an amorphous silicon solar cell, for example, a transparent electrode such as TCO is formed as a lower electrode on a glass substrate on the light-receiving surface side, and a semiconductor film made of amorphous silicon, an upper electrode, An Ag thin film is formed. An amorphous silicon solar cell having a photoelectric conversion body composed of such upper and lower electrodes and a semiconductor film has a small potential difference and a problem of resistance value only by forming each layer uniformly on a large area on a substrate. A solar battery cell in which photoelectric conversion bodies are electrically partitioned for each predetermined size is formed, and solar battery cells adjacent to each other are electrically connected to each other. Specifically, a plurality of strip-shaped solar cells are formed by forming grooves called scribe lines (scribe lines) with a laser beam or the like in a photoelectric converter uniformly formed over a large area on the base. The solar battery cells are electrically connected in series.

  By the way, in a thin film silicon solar cell, when some solar cells have particle or electrode non-uniformity, electrode failure, or dust is deposited on the light incident surface or a shadow is formed and the output is reduced, a series structure is used. The output of the entire thin film silicon solar cell module formed is significantly reduced. Further, the solar cell whose output is reduced becomes a resistance on the circuit, and a voltage (bias voltage) is applied in the opposite direction to both ends of the solar cell, causing a phenomenon of local heating (hot spot phenomenon).

Conventionally, in order to avoid a decrease in output and a hot spot phenomenon, a bypass diode is provided for each thin film silicon solar cell module (see, for example, Patent Document 1), or a partial scribe line parallel to the scribe line is provided ( For example, a technique such as Patent Document 2) is known.
However, these techniques have problems such as an increase in the manufacturing process and an increase in the cost of the bypass diode.
JP 2001-068696 A JP 2002-76402 A

The present invention has been devised in view of such a conventional situation, does not require a complicated structure, can prevent a decrease in output and a hot spot phenomenon, and has a highly reliable solar cell module. The primary purpose is to provide it.
In addition, the present invention can be added to an existing apparatus without increasing the number of steps, can reduce costs, can prevent a decrease in output and a hot spot phenomenon, and has excellent reliability. A second object of the present invention is to provide a method for manufacturing a solar cell module capable of manufacturing a solar cell module.
The third object of the present invention is to provide a solar cell module manufacturing apparatus capable of preventing a decrease in output and a hot spot phenomenon and capable of manufacturing a solar cell module excellent in reliability. To do.

In the solar cell module according to claim 1 of the present invention, a stacked body in which a first electrode layer, a power generation layer, and a second electrode layer are sequentially stacked on a substrate is partitioned by a scribe line, and a plurality of solar cells. The solar cells are connected in series to each other at adjacent positions, and are composed of a plurality of stages of the solar cells, wherein the second electrode layer has a thick first portion. And a second portion having a thickness smaller than that of the first portion, and both the first portion and the second portion are alternately arranged so as to intersect the scribe line. It is characterized by.
The solar cell module according to claim 2 of the present invention is the solar cell module according to claim 1, wherein, in the second electrode layer, the film thickness of the first part is 150 nm or more and the film thickness of the second part is 50 nm or less. It is characterized by being.
In the method for manufacturing a solar cell module according to claim 3 of the present invention, a laminated body in which a first electrode layer, a power generation layer, and a second electrode layer are sequentially stacked on a substrate is partitioned by a scribe line to form a plurality of solar cells. The battery cells are connected in series between the adjacent solar battery cells, and are composed of a plurality of stages of the solar battery cells. The solar cell has a second portion having a thickness smaller than that of one portion, and the first portion and the second portion are arranged alternately so as to intersect the scribe line. A method for manufacturing a module, in which sputtering is performed by generating a horizontal magnetic field on the surface of a target while applying a sputtering voltage to the target forming the base material of the second electrode layer in a desired process gas atmosphere. Including a step of forming a second electrode layer In the step, using the substrate on which the first electrode layer and the power generation layer have already been formed and the scribe line is also formed, the substrate and the target are extended in a direction intersecting the scribe line. The second electrode layer is formed by disposing a mask having a desired number of portions and attaching sputtered particles knocked out from the target through the mask onto the substrate.
In the solar cell module manufacturing apparatus according to claim 4 of the present invention, a stacked body in which a first electrode layer, a power generation layer, and a second electrode layer are sequentially stacked on a substrate is partitioned by a scribe line to form a plurality of solar cells. The battery cells are connected in series between the adjacent solar battery cells, and are composed of a plurality of stages of the solar battery cells. The solar cell has a second portion having a thickness smaller than that of one portion, and the first portion and the second portion are arranged alternately so as to intersect the scribe line. An apparatus for manufacturing a module, wherein the first electrode layer and the power generation layer are already formed and the substrate on which a scribe line is also formed is used, and the second electrode layer is formed on the substrate in a film formation space In the above, the scrub between the substrate and the target. A portion extending in the direction intersecting the drive line, characterized in that it comprises a mask having desired number.

  In the solar cell module of the present invention, the second electrode layer has a first part having a large film thickness and a second part having a film thickness smaller than that of the first part. All of the second portions are alternately arranged so as to intersect the scribe line. Thereby, even if a problem occurs in a certain solar battery cell, an electric current can be passed through the second portion having a thin film thickness, so that the influence on other solar battery cells can be suppressed. As a result, the present invention does not require a complicated configuration, can prevent output reduction and hot spot phenomenon, and can provide a highly reliable solar cell module.

Further, in the method for manufacturing a solar cell module of the present invention, in the step of forming the second electrode layer by sputtering, a desired number of portions extending in the direction intersecting the scribe line are provided between the substrate and the target. The second electrode layer is formed by disposing a mask having only this, and depositing sputtered particles knocked out of the target through the mask onto the substrate.
Thereby, in the solar cell module to be obtained, the second electrode layer has a first part having a large film thickness and a second part having a film thickness smaller than that of the first part, All of the second parts are arranged so as to cross the scribe line and alternately. As a result, the present invention provides a method for manufacturing a solar cell module that can prevent a decrease in output and a hot spot phenomenon without increasing the number of steps and can manufacture a highly reliable solar cell module. be able to.

In the solar cell module manufacturing apparatus of the present invention, in the film formation space for forming the second electrode layer on the substrate, the solar cell module extends between the substrate and the target in a direction intersecting the scribe line. And a mask having a desired number of portions.
In the solar cell module obtained by using this manufacturing apparatus, the second electrode layer has a first part having a large film thickness and a second part having a film thickness smaller than that of the first part. Both the one part and the second part are arranged alternately so as to intersect the scribe line. As a result, in the present invention, it is possible to provide a solar cell module manufacturing apparatus that can prevent a decrease in output and a hot spot phenomenon, and that can manufacture a solar cell module excellent in reliability.

  Hereinafter, the best mode of a solar cell module, a manufacturing method thereof, and a manufacturing apparatus according to the present invention will be described with reference to the drawings. The present embodiment is specifically described for better understanding of the gist of the invention, and does not limit the invention unless otherwise specified. In addition, in the drawings used in the following description, in order to make the features of the present invention easier to understand, there is a case where a main part is shown in an enlarged manner for convenience, and the dimensional ratio of each component is the same as the actual one. Not necessarily.

FIG. 1 is an enlarged perspective view of an essential part showing an example of an amorphous silicon type solar cell module of the present invention. 2 is a cross-sectional view showing the layer structure of the solar cell module of FIG. 1, (a) is a cross-sectional view taken along line X1-X2 in FIG. 1, and (b) is Y1-Y2 in FIG. It is sectional drawing in a line.
In the solar cell module 10 of the present invention, a laminate 12 in which a first electrode layer 13, a power generation layer 14, a buffer layer 15, and a second electrode layer 16 are sequentially stacked on one surface 11 a of a substrate 11 is partitioned by a scribe line 20. Are made into a plurality of solar cells (partition elements) 21, 21, etc., and the solar cells 21, 21,. It is the comprised solar cell module.

  In the solar cell module 10 of the present invention, the second electrode layer 16 has a first part 16a having a large film thickness and a second part 16b having a film thickness smaller than that of the first part 16a. The first portion 16a and the second portion 16b are alternately arranged so as to intersect with the scribe line 20.

  The substrate 11 is made of an insulating material that is excellent in sunlight transmittance and durable, such as glass and transparent resin. In the solar cell module 10, sunlight S is incident from the other surface 11 b side of the substrate 11.

The laminate 12 is formed by laminating a first electrode layer (lower electrode) 13, a power generation layer (semiconductor layer) 14, a buffer layer 15, and a second electrode layer (upper electrode) 16 in order from the substrate 11 side.
The first electrode layer (lower electrode) 13 may be formed of a transparent conductive material, for example, a light-transmitting metal oxide such as SnO ₂ , ITO, or ZnO.

  The power generation layer (semiconductor layer) 14 is, for example, a pin having an i-type amorphous silicon film 14i sandwiched between a p-type amorphous silicon film 14p and an n-type amorphous silicon film 14n as shown in the upper part of FIG. A joining structure is formed. When sunlight is incident on the power generation layer 14, electrons and holes are generated, which are actively moved by the potential difference between the p-type amorphous silicon film 14p and the n-type amorphous silicon film 14n, and this is repeated continuously. A potential difference is generated between the one electrode layer (lower electrode) 13 and the second electrode layer (upper electrode) 16 (photoelectric conversion).

It is preferable that the buffer layer 15 is disposed between the power generation layer 14 and the second electrode layer 16 disposed on the power generation layer 14.
By disposing the buffer layer 15 between the power generation layer 14 and the second electrode layer 16, diffusion / reaction from the second electrode layer 16 to silicon in the power generation layer 14 can be suppressed. Such a buffer layer 15 is made of, for example, ZnO.

  The second electrode layer (upper electrode) 16 may be formed of a conductive light reflecting film such as Ag (silver) or Al (aluminum). The second electrode layer 16 can be formed by, for example, a sputtering method.

  Such a laminate 12 is divided by a scribe line (scribe line) 20 into a large number of solar cells 21, 21. These solar cells 21, 21... Are electrically partitioned from each other, and are connected, for example, electrically in series between the adjacent solar cells 21. Thereby, the laminated body 12 becomes the form which connected all the photovoltaic cells 21, 21, ... in series, and can take out the electric current of a high electrical potential difference. The scribe line 20 may be formed, for example, by forming the laminated body 12 uniformly on one surface of the substrate 11 and then forming grooves in the laminated body 12 at a predetermined interval with a laser beam or the like.

  And especially in the solar cell module 10 of this invention, as shown in FIG.1 and FIG.2 (b), the 2nd electrode layer 16 is compared with 1st site | part 16a with thick film thickness, and this 1st site | part 16a. The first part 16a and the second part 16b are alternately arranged so as to intersect the scribe line 20.

  Here, for example, as shown in FIG. 3, defects such as a structural defect A1 in which contamination is mixed in the power generation layer 14 and a structural defect A2 in which fine pinholes are generated in the power generation layer 14 may occur. Such structural defects A1 and A2 locally short-circuit (leak) between the first electrode layer 13 and the second electrode layer 16 to reduce power generation efficiency.

  Further, even during the formation of the scribe line 20, as shown in FIG. 3, the structural defect A 3 or the like in which the metal forming the second electrode layer 16 is melted and flows down into the groove of the scribe line 20 due to the laser irradiation position deviation or the like. A bug may occur. Such a structural defect A3 locally short-circuits (leaks) between the first electrode layer 13 and the second electrode layer 16 and decreases power generation efficiency.

When the output is reduced due to such a structural defect or a short circuit (leakage), the output of the entire solar cell module having a series structure is significantly reduced.
When a short circuit occurs, if the second portion 16b is not formed, all the current flowing through the cells in the longitudinal direction is concentrated on the short circuit, so that the cells in the longitudinal direction do not contribute to power generation. However, when the second portion 16b is formed, since the resistance of the second portion 16b is high, all the cell currents in the longitudinal direction are not concentrated on the partial short-circuited portion, and a decrease in power generation efficiency can be suppressed.
Further, the solar cell whose output is reduced due to a shadow or the like becomes a resistance on the circuit, and a voltage (bias voltage) is applied in the opposite direction to both ends of the solar cell, and the phenomenon of local heating by this bias voltage ( Hot spot phenomenon) occurs. However, when the second portion 16b is formed, the second portion 16b becomes a resistance, and it is possible to suppress the concentration of all the reverse voltages of the cells in the longitudinal direction locally. Thereby, formation of a hot spot can be suppressed.
Note that separation of the second electrode at the position of the second portion 16b can also prevent concentration of current to the short-circuited portion and concentration of reverse voltage to the local area. However, in this case, the solar cell has a structure in which a plurality of series cells are arranged in parallel. In this case, when the output of one cell in one series system drops due to shadows or dust, and a high-resistance cell is generated, all of the series system does not contribute to power generation. However, by providing the second portion 16b, a current flows from the second portion 16b to another series system so as to avoid a high-resistance cell, so that the second portion 16b is completely separated in the lateral direction. A reduction in power generation efficiency can be suppressed more than the case.
Thus, the second portion 16b acts as a resistance to a relatively large current concentrated on a short circuit or a hot spot, and acts as an electrode on a relatively small current that avoids a partially resistive cell. As a result, power generation efficiency can be maintained.

However, in the solar cell module 10 of the present invention, the second electrode layer 16 has a first portion 16a having a large film thickness and a second portion 16b having a film thickness smaller than that of the first portion 16a. Both the first part 16 a and the second part 16 b are alternately arranged so as to intersect the scribe line 20.
Thereby, even if the above-mentioned malfunction occurs in a certain solar battery cell, an electric current can be sent by the 2nd site | part 16b with a thin film thickness. Therefore, the influence on other solar cells can be suppressed. As a result, the solar cell module 10 does not require a complicated configuration, can prevent a decrease in output and a hot spot phenomenon, and has excellent reliability.

Although it does not specifically limit as a width | variety of the 2nd site | part 16b, For example, it is about 1-10 mm.
Instead of removing a part of the second electrode layer 16, it is possible to prevent a reduction (loss) in reflection performance in the second electrode layer 16 by using the second portion 16 b having a thin film thickness.

  In the second electrode layer 16, it is preferable that the film thickness of the first part 16a is 150 nm or more and the film thickness of the second part 16b is 50 nm or less. When the film thickness of the first portion 16a is 150 nm or more, it has low resistance and reflection performance, and is excellent in weather resistance for long-term use. In addition, when the film thickness of the second portion 16b is 50 nm or less, when an output or a hot spot phenomenon occurs while maintaining conductivity, the second portion 16b functions as a bypass electrode and has reflection performance.

  A protective layer 17 is preferably formed on the second electrode layer 16 (upper electrode) 15. Such a protective layer 17 is made of, for example, Ti.

Next, a manufacturing method and manufacturing leaving for manufacturing the solar cell module 10 having the above-described configuration will be described.
The manufacturing method of the solar cell module of the present invention generates a horizontal magnetic field on the surface of the target while applying a sputtering voltage to the target forming the base material of the second electrode layer 16 in a desired process gas atmosphere. A step of forming the second electrode layer 16 by sputtering.
And this invention uses the said board | substrate 11 in which the said 1st electrode layer 13 and the said electric power generation layer 14 were already produced in the said process, and the scribe line 20 was also formed, between this board | substrate 11 and the said target 42, A mask having a desired number of portions extending in a direction intersecting with the scribe line 20 is disposed, and the sputtered particles knocked out from the target through the mask are attached on the substrate 11. The second electrode layer 16 is formed.

Thereby, in the obtained solar cell module 10, the second electrode layer 16 has a first portion 16a having a large film thickness and a second portion 16b having a film thickness smaller than that of the first portion 16a. Both the first part 16 a and the second part 16 b are alternately arranged so as to intersect the scribe line 20. As a result, in the present invention, it is possible to prevent a decrease in output and a hot spot phenomenon without increasing the number of steps, and it is possible to manufacture the solar cell module 10 having excellent reliability.
Hereinafter, the manufacturing method of the solar cell module according to the present invention will be described in the order of steps.

First, an insulating transparent substrate 11 having a transparent conductive film formed thereon is prepared as the first electrode layer 13.
Next, the p-type amorphous silicon film 14p, the i-type amorphous silicon film 14i, and the n-type amorphous silicon film 14n of the power generation layer 14 are formed on the first electrode layer 13 in separate plasma CVD reaction chambers.

The p-type amorphous silicon film 14p is formed by, for example, a p-layer of amorphous silicon (a-Si) using a plasma CVD method in an individual reaction chamber, a substrate temperature of 180-200 ° C., a power supply frequency of 13.56 MHz, and a pressure in the reaction chamber. 70-120 Pa, the reactive gas flow rate is 300 sccm for monosilane (SiH ₄ ), 2300 sccm for hydrogen (H ₂ ), 180 sccm for diborane (B ₂ H ₆ / H ₂ ) using hydrogen as a diluent gas, and methane (CH ₄ ). A film can be formed under conditions of 500 sccm.

Further, the i-type amorphous silicon film 14i is formed by, for example, forming an i-layer of amorphous silicon (a-Si) in a separate reaction chamber using a substrate temperature of 180 to 200 ° C., a power supply frequency of 13.56 MHz, and a reaction chamber. The film can be formed under the conditions of a pressure of 70 to 120 Pa and a reactive gas flow rate of monosilane (SiH ₄ ) of 1200 sccm.

Further, the n-type amorphous silicon film 14n is formed by using, for example, an amorphous silicon (a-Si) n-layer by a plasma CVD method in a separate reaction chamber, a substrate temperature of 180 to 200 ° C., a power supply frequency of 13.56 MHz, The film can be formed under conditions where the pressure is 70 to 120 Pa and the flow rate of the reaction gas is 200 sccm of phosphine (PH ₃ / H ₂ ) using hydrogen as a diluent gas.

  Next, a scribe line 20 is formed by irradiating the first electrode layer 13 and the power generation layer 14 with, for example, a laser beam. Thereby, the laminated body 12 is divided | segmented into strip-shaped many photovoltaic cells 21, 21, .... These solar cells 21, 21... Are electrically partitioned from each other, and are connected, for example, electrically in series between the adjacent solar cells 21.

Next, the buffer layer 15, the second electrode layer 16, and the protective layer 17 are sequentially formed on the power generation layer 14.
The buffer layer 15, the second electrode layer 16, and the protective layer 17 are continuously formed (deposited) in the same apparatus using, for example, an in-line type sputtering apparatus.

Here, the solar cell module manufacturing apparatus of the present invention used for forming the buffer layer 15, the second electrode layer 16, and the protective layer 17 will be described.
FIG. 4 is a schematic configuration diagram (side view) of the solar cell module manufacturing apparatus in the present embodiment. FIG. 5 is a schematic configuration diagram (side view) of the sputtering chamber in the manufacturing apparatus shown in FIG.
As shown in FIG. 4, the manufacturing apparatus 30 is an in-line type sputtering apparatus that horizontally holds and conveys the substrate 11, and includes a preparation chamber 31, a heating chamber 32, a sputtering chamber 33, and an isolation chamber for the substrate 11. 34 and a take-out chamber 35, each configured to be able to communicate.

  In the sputtering apparatus 30, a plurality of transport rollers (transport means) 36 are arranged along the transport direction of the substrate 11 (the direction of arrow F-F ′ in FIG. 5). The rotation axis of the conveyance roller 36 is arranged so as to be orthogonal to the conveyance direction of the substrate 11, and a plurality of roller bodies 37 are arranged along the conveyance direction of the substrate 11 on the rotation axis. And the board | substrate 11 hold | maintained on the roller main body 37 is conveyed by a rotating shaft rotating. In the sputtering apparatus 30 of the present embodiment, the substrate 11 is transported while being held horizontally.

  The preparation chamber 31, the heating chamber 32, the sputtering chamber 33, and the isolation chamber 34 are each provided with a vacuum exhaust means 38 such as a turbo molecular pump. The substrate 11 is transferred into the evacuated preparation chamber 31.

The sputtering chamber 33 has a rectangular opening, and a plurality of sputtering cathode mechanisms 40 a to 40 c (for example, three in FIG. 5) are provided on the ceiling side in the sputtering chamber 33 so as to be substantially parallel to the surface of the substrate 11. Has been placed.
Since the sputter cathode mechanisms 40a to 40c have the same configuration, the sputter cathode mechanisms 40a to 40c may be collectively referred to as the sputter cathode mechanism 40 in the following description. The same applies to the constituent members of the sputtering cathode mechanisms 40a to 40c.

The sputter cathode mechanism 40 includes a target 42 and an adhesion preventing member 44.
The target 42 has a rectangular shape in plan view, and a plurality of targets 42 are arranged such that the short direction thereof coincides with the transport direction of the substrate 11. That is, the substrate 11 is transported along the array direction of the targets 42 by the transport means. Each target 42 is disposed to face the substrate 11 with a predetermined gap between the surface thereof and the surface of the substrate 11.

  When the solar cell buffer layer 15, the second electrode layer 16, and the protective layer 17 are formed in the sputtering chamber 33, the target 42 a of the sputtering chamber 33 includes a ZnO-based film forming material that becomes the buffer layer 15. The target 42 b includes an Ag-based film forming material that becomes the second electrode layer 16. Further, the target 42 c includes a Ti-based film forming material that becomes the protective layer 17.

  The target 42 is bonded to the back plate 46 with a brazing material. The target 42 is connected to an external power source (power source) via the back plate 46 and is held at a negative potential. Outside the sputter chamber 33, a magnetic circuit (not shown) that generates a horizontal magnetic field on the surface of the target 42 is disposed along the back surface of the back plate 46.

  The adhesion preventing member 44 is a member facing a U-shaped member in a side view, and is provided so as to surround both sides along the longitudinal direction of each target 42. Accordingly, the targets are blocked by the adhesion preventing member 44. The adhesion preventing member 44 regulates the scattering range of the particles struck from the target 42 and prevents the particles from adhering to a location other than the surface of the substrate 11 (for example, the wall surface of the sputtering chamber 33). . Further, the incident angle of the particles with respect to the substrate 11 is limited to a predetermined angle range.

A gas supply means 47 is connected to each sputtering cathode mechanism 40 in the vicinity of the target 42 and inside the adhesion preventing member 44. The gas supply means 47 supplies an inert gas (sputtering gas) such as Ar or a reactive gas such as O ₂ to the sputtering chamber 33.

  On the carry-out side of the sputtering chamber 33, an isolation chamber 34 and an extraction chamber 35 are provided in communication with the sputtering chamber 33. The extraction chamber 35 is provided with vacuum evacuation means 39 such as a turbo molecular pump, and the isolation chamber 34 and the sputtering chamber 33 are also evacuated by evacuating the extraction chamber 35.

And in particular, in the solar cell module manufacturing apparatus 30 of the present invention, the scribe line 20 and the scribe line 20 are formed between the substrate 11 and the target 42 in the film formation space for forming the second electrode layer 16 on the substrate 11. A mask 50 having a desired number of portions extending in the intersecting direction is provided.
In the solar cell module 10 obtained by using this manufacturing apparatus 30, the second electrode layer 16 has a first portion 16a having a thick film thickness and a second portion 16b having a smaller film thickness than the first portion 16a. The first part 16a and the second part 16b are both arranged so as to cross the scribe line 20 and alternately. As a result, in the manufacturing apparatus of the present invention, it is possible to prevent a decrease in output and a hot spot phenomenon, and it is possible to manufacture the solar cell module 10 having excellent reliability.

Next, a method of forming the buffer layer 15, the second electrode layer 16, and the protective layer 17 using such a manufacturing apparatus 30 will be described.
First, in the sputtering chamber 33, the target 42 is bonded and fixed to the back plate 46 with an indium material or the like. Here, as the target 42a, a ZnO-based film forming material to be the buffer layer 15 is provided. Further, as the target 42b, an Ag-based film forming material to be the second electrode layer 16 is provided. Further, as the target 42c, a Ti-based film forming material to be the protective layer 17 is provided.

Then, in a state where the substrate 11 is housed in the preparation chamber 31, the preparation 31 and the sputtering chamber 33 are roughly evacuated by the vacuum evacuation means 38, and after the preparation chamber 31 and the sputtering chamber 33 reach a predetermined vacuum level, 11 is carried from the preparation chamber 31 to the sputtering chamber 33.
The board | substrate 11 is conveyed to the position A, and the board | substrate 11 is arranged facing the target 42a.

  Next, the sputtering chamber 33 is evacuated by the vacuum evacuation means 38, and after the sputtering chamber 33 reaches a predetermined high vacuum level, a sputtering gas such as Ar is introduced into the sputtering chamber 33 by the sputtering gas introduction means 15, The inside of the sputtering chamber 33 is set to a predetermined pressure (sputtering pressure).

  Next, a sputtering voltage, for example, a sputtering voltage in which a high-frequency voltage is superimposed on a DC voltage is applied to the target 42a by a power source. When the sputtering voltage is applied, plasma is generated on the substrate 11, and ions of a sputtering gas such as Ar excited by the plasma collide with the target 42 a, causing constituent atoms to jump out of the target 42 a, and the power generation layer 14 of the substrate 11. A buffer layer 15 made of ZnO is formed thereon.

After the buffer layer 15 is formed, the substrate 11 is transported to the position B, and the substrate is disposed facing the target 42b.
Next, a sputtering voltage is applied to the target 42 b by a power source to cause constituent atoms to jump out of the target 42 b, and the second electrode layer 16 made of Ag is formed on the power generation layer 14.

Here, in the present invention, in the step of forming the second electrode layer 16 by sputtering, a mask having a desired number of portions extending in a direction intersecting the scribe line 20 between the substrate 11 and the target 42. 50 is arranged. The mask 50 may be, for example, a wire.
Then, sputtered particles knocked out of the target 42b through the mask 50 are attached and deposited on the substrate 11 (buffer layer 15).

At this time, the sputtered particles are deposited thinly in the portion where the adhesion of the sputtered particles is blocked by the mask 50, and the sputtered particles are deposited thick in the other portions.
Thereby, the formed second electrode layer 16 has a first portion 16a having a large film thickness and a second portion 16b having a smaller film thickness than the first portion 16a. Each of the second portions 16b is alternately arranged so as to intersect the scribe line 20.

After the second electrode layer 16 is formed, the substrate 11 is transported to the position C, and the substrate is disposed facing the target 42c.
Next, a sputtering voltage is applied to the target 42 c by a power source to cause constituent atoms to jump out of the target 42 c, and the protective layer 17 made of Ti is formed on the second electrode layer 15.

After the buffer layer 15, the second electrode layer 16, and the protective layer 17 are formed on the substrate 11 as described above, the substrate 11 is transferred from the sputtering chamber 33 to the isolation chamber 34 / the extraction chamber 35, and this extraction is performed. The vacuum in the chamber 35 is broken, and the substrate 11 on which the buffer layer 15, the second electrode layer 16, and the protective layer 17 are formed is taken out.
Thereby, the solar cell module 10 as shown in FIG.1 and FIG.2 is obtained.

  In the solar cell module 10 manufactured in this way, even if a problem occurs in one solar cell, current can flow through the second portion 16b having a small film thickness. It is possible to suppress the influence. As a result, the solar cell module 10 can prevent a decrease in output and a hot spot phenomenon, and has excellent reliability.

  As mentioned above, although the solar cell module of this invention, its manufacturing method, and a manufacturing apparatus have been demonstrated, this invention is not limited to the example mentioned above, In the range which does not deviate from the meaning of invention, it can change suitably.

  The present invention is widely applicable to a solar cell module, a manufacturing method thereof, and a manufacturing apparatus.

The perspective view which shows an example of the solar cell module which concerns on this invention. Sectional drawing which shows the principal part of the solar cell module shown in FIG. Sectional drawing which shows presence of a structural defect in a laminated body. The figure which shows typically an example of the manufacturing apparatus which concerns on this invention. The side view which shows an example of a sputtering chamber in FIG.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 10 Solar cell module, 11 board | substrate, 12 laminated body, 13 1st electrode layer, 14 Power generation layer, 15 Buffer layer, 16 2nd electrode layer, 16a 1st site | part, 16b 2nd site | part, 20 Scribe line, 21 Solar cell .

Claims (4)

A stacked body in which a first electrode layer, a power generation layer, and a second electrode layer are sequentially stacked on a substrate is partitioned by a scribe line to form a plurality of solar cells, and the solar cells in adjacent positions are connected in series. A solar cell module comprising a plurality of stages of the solar cells,
The second electrode layer has a first portion having a thick film thickness and a second portion having a thin film thickness compared to the first portion,
Both the first part and the second part are arranged alternately so as to intersect the scribe line.   2. The solar cell module according to claim 1, wherein in the second electrode layer, the film thickness of the first part is 150 nm or more and the film thickness of the second part is 50 nm or less. A stacked body in which a first electrode layer, a power generation layer, and a second electrode layer are sequentially stacked on a substrate is partitioned by a scribe line to form a plurality of solar cells, and the solar cells in adjacent positions are connected in series. And the second electrode layer has a first part having a large film thickness and a second part having a film thickness smaller than that of the first part. The first part and the second part are both a method of manufacturing a solar cell module that is alternately arranged so as to intersect the scribe line,
In a desired process gas atmosphere, while applying a sputtering voltage to a target that forms the base material of the second electrode layer, a horizontal magnetic field is generated on the surface of the target to perform sputtering, thereby forming a second electrode layer. Including steps,
In the step, using the substrate on which the first electrode layer and the power generation layer have already been formed and the scribe line is also formed, the substrate and the target are extended in a direction intersecting the scribe line. The second electrode layer is formed by disposing a mask having a desired number of exposed portions and attaching sputtered particles knocked out of the target through the mask onto the substrate. Manufacturing method of battery module. A stacked body in which a first electrode layer, a power generation layer, and a second electrode layer are sequentially stacked on a substrate is partitioned by a scribe line to form a plurality of solar cells, and the solar cells in adjacent positions are connected in series. And the second electrode layer has a first part having a large film thickness and a second part having a film thickness smaller than that of the first part. The first part and the second part are both solar cell module manufacturing apparatuses that are alternately arranged so as to intersect the scribe line,
Using the substrate on which the first electrode layer and the power generation layer have already been formed and the scribe line is formed, in the film formation space for forming the second electrode layer on the substrate, the substrate and the target An apparatus for manufacturing a solar cell module, comprising a mask having a desired number of portions extending in a direction intersecting with the scribe line therebetween.

Images