JP2010060770A - Optical article and method for manufacturing optical article - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a high-precision optical article free from dispersion of wavefront aberration, in which an optical member and an optical thin film differed in linear expansion coefficient are bonded. <P>SOLUTION: An optical thin film 13 consisting of a plurality of layers is provided between a first optical member 11 and a second optical member 12. The optical thin film 13 includes a first thin film 131 preliminarily provided on the first optical member 11, a second thin film 132 preliminarily provided on the second optical member 12, and a junction layer 133 which molecular-joins the first thin film 131 and the second thin film 132, the junction layer 133 consisting of a plasma polymerized film. Since no adhesive is used for mutually joining the optical members, the junction part between the first optical member 11 and the second optical member 12 has no dispersion of thickness, and a prism 1 improved in light resistance without wavefront aberration is provided. Further, since the plasma polymerized film is used, high-temperature treatment is dispensed with. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to an optical article in which a plurality of optical thin films are provided between a first optical member and a second optical member, for example, a prism, a polarization separation element, and a method for manufacturing these optical articles.

In optical pickups, liquid crystal projectors, and other devices, an optical article formed by sandwiching an optical thin film between a plurality of optical members is used.
As this optical article, for example, a prism provided with a polarization separation film between two triangular prism members, or a cross prism provided with a polarization separation film between the bottoms of two prisms each provided with a polarization separation film inside Or, further, a polarizing separation film is sandwiched between two optical members each provided with a reflection film inside, and a retardation plate is provided on the light exit surface side of the polarization separation film of these optical members. There is a polarization separation element (PS conversion element) provided.

These optical articles are manufactured by various methods, and one of them is a conventional example in which an optical member and a polarization separation film are bonded and fixed with an adhesive. For example, in an optical pickup prism, a conventional example in which an optical thin film is provided at the bottom of one of two triangular prism-shaped prism blocks, and the optical thin film and the bottom of the other prism block are fixed with an adhesive. (Patent Document 1).
Further, in the cross prism, a polarization separation film is formed in advance on the triangular prism-shaped first optical member, and the prism is formed by bonding and fixing the polarization separation film and the second optical member with an adhesive. There is a conventional example (Patent Document 2) in which two are prepared and an antireflection film is formed on one of the prisms, and the antireflection film and the other prism are bonded and fixed with an adhesive.
In addition, when bonding silicon and glass, etc., the bonded surfaces are subjected to hydrophilic treatment (activation) with oxygen plasma, the hydrophilic processed optical members are directly bonded, and heated at about 400 ° C. (Patent Document). 3).

JP 2007-101866 A JP 2007-78779 A Japanese Patent No. 3751972

  In the conventional examples shown in Patent Document 1 and Patent Document 2, since the polarization separation film provided in one optical component and the other optical component are bonded and fixed with an adhesive, the thickness of the adhesive layer varies. As a result, there is a problem that wavefront aberration varies. Furthermore, there exists a subject that heat resistance and light resistance fall because an adhesive agent deteriorates.

In the conventional example shown in Patent Document 3, since the optical members whose bonded surfaces are activated are directly bonded, if the surface roughness of the bonded surfaces is large or the waviness is large, they cannot be bonded.
Further, when the technique of Patent Document 3 is used for manufacturing the prisms shown in Patent Documents 1 and 2, the directly joined members are heated at a high temperature, so members having different linear expansion coefficients, for example, optical members made of glass and the like The optical thin film cannot be bonded. That is, when the optical members are joined together at a high temperature and then returned to room temperature, problems such as a shift between the optical thin film and the optical member having different linear expansion coefficients occur.

  An object of the present invention is to provide a highly accurate optical article and an optical article manufacturing method that can join an optical member and an optical thin film having different linear expansion coefficients with no variation in wavefront aberration.

[Application Example 1]
An optical article according to this application example is an optical article having a first optical member, a second optical member, and an optical thin film provided between the first optical member and the second optical member, The optical thin film includes a plurality of layers and includes a bonding layer that bonds the first optical member and the second optical member. The bonding layer includes a bonded portion on the first optical member side and the second optical member. It is a plasma polymerized film that molecularly bonds the bonded portion on the side.
In this application example of this configuration, since a plasma polymerization film is used for joining the first optical member and the second optical member, processing at a high temperature is unnecessary, and the optical member and the optical thin film having different linear expansion coefficients are used. And can be directly joined. And, since no adhesive is used for joining the first optical member and the second optical member, there is no variation in thickness at the joining portion between the first optical member and the second optical member, and wavefront aberration (particularly, Astigmatism) is reduced and light resistance is improved.

[Application Example 2]
In the optical article according to this application example, the optical thin film includes a first thin film provided in advance on the first optical member, and a second thin film provided in advance on the second optical member, and the bonding layer includes Then, the first thin film as the bonded portion on the first optical member side and the second thin film as the bonded portion on the second optical member side are molecularly bonded.
In this application example of this configuration, the first thin film provided on the first optical member and the second thin film provided on the second optical member are joined via the plasma polymerization film, so the optical thin film is attached to the first optical member. The number of layers of the thin film formed on one optical member can be reduced as compared with the case where the outermost layer of the optical thin film is formed as a bonding layer and bonded to the second optical member. That is, even if an optical thin film is formed from multiple layers, the optical thin film is divided into two optical members, so that cracks that occur in the optical thin film due to multilayering can be prevented.

[Application Example 3]
In the optical article according to this application example, the optical thin film is an optical functional film in which layers of different materials are alternately stacked, and a layer located in the middle of the optical functional film is replaced with the bonding layer.
In this application example having this configuration, since the members arranged on both sides with the bonding layer as the center can be made symmetrical, this member can be manufactured in the same process, and an optical article can be easily manufactured. . In addition, when the number of layers to be laminated is large, cracks may occur in the optical thin film. However, in this application example, in the optical article in which the optical thin film is composed of many layers, a layer located in the middle is formed. Except for the fact that half of the layers are formed separately for the first optical member and the second optical member, respectively, the risk of cracking in the optical thin film is further reduced. Examples of the optical function film include a polarization separation film and a wavelength selection film.

[Application Example 4]
In the optical article according to this application example, each of the first optical member and the second optical member is a triangular prism member.
In this application example having this configuration, a polarization separation film is provided between the bottom portions of the first optical member and the second optical member, whereby a prism used for an optical pickup can be easily manufactured. In addition, the wavefront aberration of the prism is reduced and high accuracy can be achieved.

[Application Example 5]
In the optical article according to this application example, the first optical member and the second optical member are alternately arranged with the optical functional film interposed therebetween, and are between the adjacent optical functional films, A reflective film is provided on each of the optical member and the second optical member, and a phase difference plate is selectively provided on the light exit surface side of the optical function film of the first optical member and the second optical member. It has been.
In this application example having this configuration, it is possible to provide a highly accurate polarization separation element (PS conversion element) with reduced wavefront aberration. Examples of the optical function film include a polarization separation film and a wavelength selection film.

[Application Example 6]
An optical article manufacturing method according to this application example manufactures an optical article having a first optical member, a second optical member, and an optical thin film provided between the first optical member and the second optical member. The optical thin film is divided into a first thin film, a second thin film, and a bonding layer for bonding the first thin film and the second thin film, and the first thin film is used as the first optical member. Plasma is applied to each of the thin film forming step of providing the second thin film on the second optical member, the first thin film provided on the first optical member, and the second thin film provided on the second optical member. A polymer film forming step for forming a polymer film, a surface activation step for activating the plasma polymer film, the plasma polymer layer formed on the first thin film, and the plasma polymer layer formed on the second thin film And a bonding process for bonding and integrating Characterized by comprising.
In this application example having this configuration, in the thin film forming step, the first thin film is formed on one surface of the first optical member by vapor deposition or the like, and the second thin film is formed on one surface of the second optical member. Further, in the polymerization film forming step, a plasma polymerization film is formed on one surface where the first optical member of the first thin film is not provided, and similarly, plasma polymerization is performed on the one surface where the second optical member of the second thin film is not provided. A film is formed. Here, the plasma polymerized film formed on the first thin film and the plasma polymerized film formed on the second thin film are overlapped to form one bonding layer. For example, the number of optical thin film layers is a thin film structure with an odd number. In some cases, the plasma polymerized film is set to half the thickness of the bonding film located at the center.
In the surface activation step, the surface of the plasma polymerization film is activated efficiently. For the surface activation step, for example, a method of irradiating plasma, a method of contacting with ozone gas, a method of treating with ozone water, a method of treating with alkali, or the like can be used. Furthermore, in the bonding step, the plasma polymerization films are pressed together, and the first optical member and the second optical member are bonded via the plasma polymerization film.
Therefore, in this application example, it is possible to provide a method for manufacturing an optical article that can achieve the above-described effects.

[Application Example 7]
In the method for manufacturing an optical article according to this application example, the first optical member and the second optical member have the same configuration, and the first thin film and the second thin film have the same layer configuration.
Therefore, in this application example, in the thin film forming step, the step of forming the first thin film on the first optical member and the step of forming the second thin film on the second optical member can be made the same. The production efficiency is improved as compared with the conventional example in which all the films are formed on one of the optical member and the second optical member. In addition, since the first thin film and the second thin film are formed under the same conditions, the film thickness can be made the same on the first optical member side and the second optical member side, so that the thin film stress can be balanced. .

[Application Example 8]
In the method for manufacturing an optical article according to this application example, in the thin film forming step, the first thin film and the second thin film are formed on opposite surfaces of a strip-shaped optical block for forming the first optical member. The first thin film and the second thin film are respectively formed on opposite surfaces of the strip-shaped optical block for forming the second optical member, and the polymer film forming step includes the step of forming the polymer film. A plasma polymerized film is formed on each of the first thin film and the second thin film formed in the optical block, and the laminating step includes forming the strip optical block in the first thin film. And the plasma polymerization layer formed on the second thin film are stacked together, and the first optical member is cut by cutting the strip-shaped optical block on which the plurality of sheets are stacked in the bonding step. Shaped to the shape of the second optical member.
Therefore, in this application example, after forming the first thin film and the second thin film on the strip-shaped optical block in the thin film forming process, the plasma polymerized film is formed on the first thin film and the second thin film in the polymer film forming process, respectively. In the pasting step, a plurality of strip-shaped optical blocks are laminated in a state where the plasma polymerization layer and the plasma polymerization layer are overlapped, and then cut so as to become an optical article of a predetermined shape. A large amount of optical components can be manufactured.

[Application Example 9]
In the method of manufacturing an optical article according to this application example, the first optical member and the second optical member are columnar members having end faces of right triangles, respectively, and one hypotenuse of the first optical member and the second optical member. Prepare a prism forming step of forming a prism by forming an optical thin film between one oblique side of the member and two prisms formed by this prism forming step, and provide an optical thin film between these prisms to cross A cross prism forming step for forming a prism, wherein in the prism forming step, the first thin film is provided on one oblique side of the first optical member, and the second thin film is provided on one oblique side of the second optical member. Forming a plasma polymerized film on each of the first thin film provided on the first optical member and the second thin film provided on the second optical member, and performing the thin film formation step. A film forming step is performed, and the plasma polymerization layer is formed on the first thin film and the plasma polymerization layer formed on the second thin film by activating these plasma polymerization films and performing the surface activation step. And the bonding step is performed to form the prism whose end face is a right triangle, and in the cross prism forming step, one of the two prisms formed in the prism forming step. The first thin film is continuously provided on the other hypotenuse of the first optical member and the other hypotenuse of the second optical member, and the two of the prisms formed in the prism molding step In the other prism, the second thin film is provided in succession on the other oblique side of the first optical member and the other oblique side of the second optical member, and a thin film forming step is performed. A plasma polymerized film is formed on each of the first thin film provided on one prism and the second thin film provided on the other prism, and the polymerized film forming step is performed. The surface activation step is activated and the plasma polymerization layer formed on the first thin film and the plasma polymerization layer formed on the second thin film are bonded to perform the bonding step. Then, the cross prism having a square end surface is formed.
In the conventional example in which an optical thin film is formed on four optical members and these are bonded and fixed with an adhesive, the thickness management between the four optical members is complicated and complicated. Since the dimension management between the four optical members can be easily performed by bonding, the cross prism can be easily manufactured.
In addition, since this cross prism does not have an adhesive layer for adhering the optical thin film, the thin film itself can be made thin, and a center step shift caused by the thin film thickness can be suppressed.

[Application Example 10]
In the method of manufacturing an optical article according to this application example, in the thin film forming step, the first optical film is formed on the opposite surfaces of a strip-shaped optical block for forming the first optical member. Each of the thin film and the second thin film is formed, and the first thin film and the second thin film are formed on opposite surfaces of a strip-shaped optical block for providing the second optical member with a reflection film provided in advance. Forming a plasma polymerized film on each of the first thin film formed on the strip-shaped optical block and the second thin film formed on the strip-shaped optical block. In the pasting step, the strip-shaped optical block is bonded to the plasma polymerization layer formed on the first thin film and the plasma polymerization layer formed on the second thin film, and a plurality of layers are laminated. A polarization separation film is formed from the first thin film, the second thin film, and the plasma polymerization film, and the strip-like optical block in which a plurality of sheets are laminated in the pasting step intersects the polarization separation film and the reflection film. And the first optical member and the second optical member are formed, and a retardation plate is selectively provided on the light exit surface side of the polarization separation film of the first optical member and the second optical member. Provide.
Therefore, in this application example, in manufacturing the polarization separation element having the above-described effect, the strip-shaped optical block is subjected to the thin film forming step, the polymerized film forming step, and the bonding step, and then the strip-shaped optical block is cut. Therefore, a large amount of polarization separation elements can be manufactured by a simple method.

Embodiments of the present invention will be described with reference to the drawings. Here, in each embodiment, the same components are assigned the same reference numerals, and the description thereof is omitted or simplified.
A first embodiment will be described with reference to FIGS. The first embodiment exemplifies a prism 1 as an optical article. The prism 1 is used as a polarization separation element for an optical pickup.
FIG. 1 is a view showing an end face of the prism 1 according to the first embodiment, and FIG. 2 is a cross-sectional view showing a main part of FIG.
1 and 2, the prism 1 includes a first optical member 11 on the incident light side, a second optical member 12 on the outgoing light side, and between the first optical member 11 and the second optical member 12. The optical thin film 13 is provided.
The first optical member 11 and the second optical member 12 are triangular prism members whose end faces are right-angled triangles, and the end faces have the same shape and length.
Both the first optical member 11 and the second optical member 12 are formed of glass such as BK7 or other optical glass, white plate glass, borosilicate glass, blue plate glass, and the same material.

The optical thin film 13 is a polarization separation film composed of a derivative multilayer film having a polarization separation action, and is composed of layers of different materials, for example, a layer of titanium oxide (TiO ₂ ) that is a high refractive material layer and an oxidation layer that is a low refractive material layer. Silicon (SiO ₂ ) layers are alternately stacked. These layers are composed of 25 layers. If the bottom side of the first optical member 11 is the first layer 1301, the second layer 1302, the third layer 1303, ... the eleventh layer 1311, the twelfth layer 1312, the thirteenth layer 1313, the fourteenth layer 1314, the fifteenth layer 1315, the twenty-third layer 1323, the twenty-fourth layer 1324, and the twenty-fifth layer 1325. It is directly provided on the bottom side of the two optical member 12. Of these layers, odd-numbered layers such as the first layer 1301, the third layer 1303, the fifteenth layer 1315, the twenty-third layer 1323, and the twenty-fifth layer 1325 are silicon oxide (SiO ₂ ) layers, and even-numbered layers such as The second layer 1302, the fourth layer 1304, the twelfth layer 1312, the fourteenth layer 1314, and the twenty-fourth layer 1324 are titanium oxide (TiO ₂ ) layers. These layers are symmetrical in material and film thickness with the 13th layer 1313 as the center.
In the present embodiment, the first layer 1301 to the twelfth layer 1312 constitute the first thin film 131 provided in advance on the first optical member 11, and the fourteenth layer 1314 to the twenty-fifth layer 1325 previously form the second optical member 12. The 13th layer 1313 which comprises the provided 2nd thin film 132 and is located in the middle is replaced by the bonding layer 133 which molecularly bonds the first thin film 131 and the second thin film 132. The bonding layer 133 is formed of a plasma polymerization film described later, and has the same refractive index and film thickness as the thirteenth layer 1313. The first thin film 131 and the second thin film 132 constitute a joined portion.

Next, a method for manufacturing an optical article according to the first embodiment will be described.
[Thin film formation process]
The first thin film 131 is provided on the first optical member 11, and the second thin film 132 is provided on the second optical member 12.
First, the first optical member 11 and the second optical member 12 are formed in a triangular prism shape by a method similar to the conventional method. Then, the first layer 1301 to the twelfth layer 1312 are formed on the bottom portion of the first optical member 11 by using a method similar to a conventional method such as vacuum deposition, ion-assisted deposition, ion plating method, sputtering method or the like. In the same manner, the 25th layer 1325 to the 14th layer 1314 are formed on the bottom side of the second optical member 12 using the same method as in the prior art. Thereby, the first thin film 131 provided on the first optical member 11 and the second thin film 132 provided on the second optical member 12 have the same optical design.
[Polymerized film forming step]
A plasma polymerization film 133 </ b> H is formed on each of the first thin film 131 provided on the first optical member 11 and the second thin film 132 provided on the second optical member 12. The two layers of the plasma polymerized film 133H constitute a single bonding layer 133, and the bonding layer 133 is replaced with the thirteenth layer 1313.

FIG. 3 is a schematic view of the plasma polymerization apparatus used in the first embodiment.
In FIG. 3, the plasma polymerization apparatus 100 includes a chamber 101, a first electrode 111 and a second electrode 112 provided inside the chamber 101, and a high frequency between the first electrode 111 and the second electrode 112. The power supply circuit 120 applies a voltage, the gas supply unit 140 supplies gas into the chamber 101, and the exhaust pump 150 discharges the gas inside the chamber 101.
The first electrode 111 has a support portion 111A that supports the first optical member 11 and the second optical member 12, and the first electrode 111 and the second optical member 12 are sandwiched between the first optical member 11 and the second optical member 12. The electrode 112 is disposed opposite to the electrode 112. The supporting portion 111A is formed with a triangular groove-shaped portion that supports the oblique sides of the first optical member 11 and the second optical member 12, and the first optical member 11 and the second optical member 12 support the triangular groove-shaped portion. In this state, the first thin film 131 and the second thin film 132 face the second electrode 112.

The power supply circuit 120 includes a matching box 121 and a high frequency power supply 122.
The gas supply unit 140 includes a liquid storage unit 141 that stores a liquid film material (raw material liquid), a vaporizer 142 that vaporizes the liquid film material and changes it into a raw material gas, and a gas cylinder 143 that stores a carrier gas. I have. The carrier gas stored in the gas cylinder 143 is a gas that is discharged by the action of an electric field and is introduced into the chamber 101 in order to maintain this discharge, and corresponds to, for example, argon gas or helium gas.
The liquid storage unit 141, the vaporizer 142, the gas cylinder 143, and the chamber 101 are connected by a pipe 102, and the mixed gas of the gaseous film material and the carrier gas is supplied into the chamber 101. ing.
The film material stored in the liquid storage unit 141 is a raw material for forming the plasma polymerization film 133H on the first optical member 11 and the second optical member 12 by the plasma polymerization apparatus 100, and is vaporized by the vaporization apparatus 142 to be a raw material. It becomes gas.

Examples of the source gas include methylsiloxane, hexamethyldisiloxane, octamethyltrisiloxane, decamethyltetrasiloxane, decamethylcyclopentasiloxane, octamethylcyclotetrasiloxane, and methylphenylsiloxane. Examples include gallium, trimethylaluminum, triethylaluminum, triisobutylaluminum, trimethylindium, triethylindium, trimethylzinc, triethylzinc, organometallic compounds, various hydrocarbon compounds, various fluorine compounds, and the like.
The plasma polymerized film 133H obtained by using such a raw material gas is obtained by polymerizing these raw materials (polymer), that is, polyorganosiloxane, organometallic polymer, hydrocarbon polymer, fluorine polymer, etc. Will be composed.

Polyorganosiloxane usually exhibits water repellency, but can be easily desorbed by applying various activation treatments, and can be changed to hydrophilic. That is, polyorganosiloxane is a material that can easily control water repellency and hydrophilicity.
Even if the plasma polymerized films 133H made of polyorganosiloxane exhibiting water repellency are brought into contact with each other, the adhesion is hindered by the organic group, and it is extremely difficult to adhere. On the other hand, the plasma-polymerized film 133H composed of polyorganosiloxane exhibiting hydrophilicity can be particularly easily adhered when they are brought into contact with each other. That is, the advantage that the water repellency and the hydrophilicity can be easily controlled leads to the advantage that the adhesion can be easily controlled. Therefore, the plasma polymerized film 133H made of polyorganosiloxane is preferably used in this embodiment. Will be used. Since the polyorganosiloxane is relatively flexible, even if the constituent materials of the first optical member 11 and the second optical member 12 are different and the linear expansion coefficients are different, the first optical member 11 and The stress accompanying thermal expansion generated between the second optical member 12 and the second optical member 12 can be relaxed. Furthermore, since polyorganosiloxane is excellent in chemical resistance, it can be effectively used for joining members that are exposed to chemicals for a long period of time.

  Among the polyorganosiloxanes, those mainly composed of a polymer of octamethyltrisiloxane are preferred. The plasma polymerized film 131 mainly composed of a polymer of octamethyltrisiloxane is preferably used in the bonding method of the present embodiment because of its excellent adhesiveness. The polymer of octamethyltrisiloxane is liquid at room temperature and has an appropriate viscosity, so it is easy to handle.

Next, a procedure for forming the plasma polymerized film 133H will be described with reference to FIG.
As shown in FIGS. 4A to 4C, the plasma polymerization film 133 </ b> H is formed on the first thin film 131 provided on the first optical member 11 and the second thin film 132 provided on the second optical member 12.
In this polymerization film forming step, the first optical member 11 or the second optical member 12 is held by the support portion 111 </ b> A of the first electrode 111 of the chamber 101 of the plasma polymerization apparatus 100. Then, a predetermined amount of oxygen is introduced into the chamber 101 and a high frequency voltage is applied from the power supply circuit 120 between the first electrode 111 and the second electrode 112 to activate the optical member itself.
Thereafter, when the gas supply unit 140 is operated, a mixed gas of the source gas and the carrier gas is supplied into the chamber 101. The supplied mixed gas is filled in the chamber 101, and the first thin film 131 provided on the first optical member 11 and the second thin film provided on the second optical member 12 as shown in FIG. The mixed gas is exposed at 132.

The ratio (mixing ratio) of the raw material gas in the mixed gas is slightly different depending on the kind of the raw material gas and the carrier gas, the target film forming speed, and the like. It is preferable to set, and it is more preferable to set to about 30 to 60%.
The frequency applied between the first electrode 111 and the second electrode 112 is not particularly limited, but is preferably about 1 kHz to 100 MHz, and more preferably about 10 to 60 MHz. But not limited high frequency power density, in particular, is preferably about 0.01 to 10 / cm ^2, more preferably about 0.1 to 1 W / cm ^2.

The pressure in the chamber 101 during film formation is preferably about 133.3 × 10 ^{−5 to} 1333 Pa (1 × 10 ^{−5 to} 10 Torr), and is preferably 133.3 × 10 ^{−4 to} 133.3 Pa (1 × 10 ^{-4 to 1} Torr) is more preferable.
The raw material gas flow rate is preferably about 0.5 to 200 sccm, more preferably about 1 to 100 sccm.
The carrier gas flow rate is preferably about 5 to 750 sccm, more preferably about 10 to 500 sccm.
The treatment time is preferably about 1 to 10 minutes, more preferably about 4 to 7 minutes.
The temperature of the first optical member 11 or the second optical member 12 is preferably 25 ° C. or higher, and more preferably 25 to 100 ° C.

By applying a high-frequency voltage between the first electrode 111 and the second electrode 112, gas molecules existing between the electrodes 111 and 112 are ionized, and plasma is generated. The molecules in the source gas are polymerized by the energy of this plasma, and the polymer is the surface of the first thin film 131 of the first optical member 11 or the second thin film 132 of the second optical member 12 as shown in FIG. Adhering to and depositing. As a result, as shown in FIG. 4C, the plasma polymerization film 133 </ b> H is formed on the first thin film 131 of the first optical member 11 or the second thin film 132 of the second optical member 12.
The average thickness of the plasma polymerized film 133H is 10 to 1000 nm, and preferably 50 to 500 nm. When the average thickness of the plasma polymerized film 133H is less than 10 nm, sufficient bonding strength cannot be obtained, and when it exceeds 1000 nm, the dimensional accuracy of the bonded body is remarkably lowered.

[Surface activation process]
Thereafter, as shown in FIG. 4D, the plasma polymerization film 133H is activated to activate the surface.
For the surface activation step, for example, a method of irradiating plasma, a method of contacting with ozone gas, a method of treating with ozone water, a method of treating with alkali, or the like can be used.
Here, the activation means that the surface of the plasma polymerized film 133H and the internal molecular bond are cut and an unterminated bond is generated, or an OH group is bonded to the cut bond. A state or a state in which these states are mixed.
In this surface activation step, a method of irradiating plasma is preferable in order to efficiently activate the surface of the plasma polymerization film 133H. The reason for irradiating the surface of the plasma polymerized film 133 is that the molecular structure of the plasma polymerized film 133H is not cut more than necessary, for example, until it reaches the boundary between the plasma polymerized film 133 and the first thin film 131 or the second thin film 132. This is for avoiding the deterioration of the characteristics of the plasma polymerized film 133H.

As the plasma used in the present embodiment, for example, oxygen, argon, nitrogen, air, water, or the like can be used alone or in combination. Among these, it is preferable to use oxygen.
By using such plasma, it is possible to prevent a significant deterioration in the characteristics of the plasma polymerized film 133H, eliminate a wide range of unevenness, and perform processing in a shorter time. Since plasma can be generated by the same equipment as the apparatus for forming the plasma polymerized film 133H, there is also an advantage that the manufacturing cost can be reduced.
The time for irradiating the plasma is not particularly limited as long as the molecular bond in the vicinity of the surface of the plasma polymerized film 133H can be broken, but is preferably about 5 to 30 minutes, and preferably 10 to 60 seconds. More preferred.
OH groups are introduced into the surface of the plasma polymerization film 133H activated in this way.
In the present embodiment, a step of cleaning the first optical member 11 and the second optical member 12 may be provided between the plasma polymerization film forming step and the surface activation step. This cleaning step is performed using chemicals, water, or other appropriate means.

[Bonding process]
In the bonding step, the plasma polymerization layer 133H formed on the first thin film 131 and the plasma polymerization layer 133H formed on the second thin film 132 are bonded and integrated to form the bonding layer 133.
That is, as shown in FIGS. 5A and 5B, the first optical member 11 and the second optical member 12 are pressed against each other with the plasma polymerization film 133H facing each other.
Since the activated state of the plasma polymerized film 133H whose surface has been activated relaxes over time, the plasma polymerized film 133H moves to the bonding step immediately after the surface activation step. Specifically, after the surface activation step, it is preferable to shift to the pasting step within 60 minutes, and it is more preferable to shift within 5 minutes. Within this time, the surface of the plasma polymerized film 133H maintains a sufficiently active state, so that sufficient bonding strength can be obtained at the time of bonding.

By bonding the plasma polymerized films 133H together, these films are bonded to each other. This coupling | bonding is estimated based on the following (1) or (2) or the mechanism of (1) and (2).
(1) In the present embodiment, when the first optical member 11 and the second optical member 12 are bonded together, the OH groups present on the surfaces of the respective plasma polymerized films 133H are adjacent to each other. Become. The adjacent OH groups attract each other by hydrogen bonding, and an attractive force is generated between the OH groups. In addition, OH groups attracting each other by this hydrogen bond are detached from the surface with dehydration condensation depending on temperature conditions. As a result, at the contact boundary between the two plasma polymerized films 133H, the bonds in which the detached OH groups are bonded are bonded. That is, the respective base materials constituting each plasma polymerized film 131H are directly coupled and integrated to form one bonding layer 133.
(2) When two base materials are bonded together, unterminated bonds generated on the surface and inside of each plasma polymerization film 133H are recombined. Since this recombination occurs in a complicated manner so as to overlap (entangle) with each other, a network-like bond is formed at the bonding interface. Thereby, the respective base materials constituting each plasma polymerized film 131H are directly joined and integrated to form a single joining layer 133.

In this embodiment, as shown in FIG. 5C, after the bonding step, the first optical member 11 and the second optical member 12 are pressurized as necessary (pressurization step). Thereby, the prism 1 is manufactured as shown in FIG.
In this pressing step, it is preferable to pressurize the first optical member 11 and the second optical member 12 with a large force in order to increase the bonding strength. Specifically, the pressure for pressurization is preferably about 1 to 10 MPa, more preferably 1 to 5 MPa, although it varies depending on conditions such as the shape and dimensions of the first optical member 11 and the second optical member 12. preferable. The pressurization time is not particularly limited, but is preferably about 10 sec to 30 min.

After pressurizing the first optical member 11 and the second optical member 12, they are heated (heating step). By heating the prism 1, the bonding strength can be increased.
This heating step is provided as necessary, and the heating temperature is 25 to 100 ° C, and preferably 50 to 100 ° C. If it exceeds 100 ° C., the prism 1 may be altered or deteriorated. The heating time is preferably about 1 to 30 minutes.
In addition, although this heating process may be performed independently after a pressurization process, it is preferable to carry out simultaneously with a pressurization process, when strengthening joining strength.

  In this embodiment, since the polymer film that has not been activated is chemically stable, the first optical member 11 and the second optical member 12 each provided with the plasma polymer film 133H are polymerized. A large number are manufactured in advance and stored. And finally, only the required number passes through the surface activation process, the plasma polymerization film 133H is activated, and the manufacturing process of the prism 1 can be improved by quickly moving to the bonding process.

In the present embodiment having the above-described configuration, the following operational effects can be achieved.
(1) A plurality of optical thin films 13 are provided between the first optical member 11 and the second optical member 12, and the optical thin film 13 includes a first thin film 131 provided in advance on the first optical member 11, The prism 1 is configured by including a second thin film 132 provided in advance on the second optical member 12 and a bonding layer 133 that molecularly bonds the first thin film 131 and the second thin film 132. A plasma polymerized film 133H was obtained. And in order to manufacture this prism 1, the 1st thin film 131 was provided in the 1st optical member 11, the thin film formation process which provided the 2nd thin film 132 in the 2nd optical member 12, and the 1st optical member 11 were provided. A polymerized film forming step of forming a plasma polymerized film 133H on each of the first thin film 131 and the second thin film 132 provided on the second optical member 12, a surface activation process of activating the plasma polymerized film 133H, A bonding step of bonding and integrating the plasma polymerization layer 133H formed on the one thin film 131 and the plasma polymerization layer 133H formed on the second thin film 132; Therefore, since no adhesive is used for joining the optical members, there is no variation in thickness at the joint portion between the first optical member 11 and the second optical member 12, there is no wavefront aberration, and light resistance is improved. A prism 1 can be provided. In addition, since the plasma polymerized film 133H is used, processing at a high temperature becomes unnecessary.

(2) The optical thin film 13 is a polarization separation film in which a low refraction layer and a high refraction layer are alternately laminated. This polarization separation film is composed of a first layer 1301 to a 25th layer 1325, and in between these The thirteenth layer 1313 is replaced with a bonding layer 133. That is, since the layer configuration arranged on both sides with the bonding layer 133 as the center is made symmetric, the thin film forming process can be made common to the first optical member 11 and the second optical member 12, and the production efficiency is improved. To do.

(3) The first optical member 11 and the second optical member 12 have the same configuration, and the first thin film 131 and the second thin film 132 have the same layer configuration. The step of forming the first thin film 131 and the step of forming the second thin film 132 on the second optical member 12 can be made the same, and the production efficiency is improved. In addition, since the first thin film 131 and the second thin film 132 are formed under the same conditions, the thin film stress can be balanced on the first optical member side and the second optical member side.

(4) The main material of the plasma polymerized film 133H is polyorganosiloxane, and since this polyorganosiloxane is relatively flexible, the first optical member 11 and the second optical member 12 are joined. The stress accompanying the thermal expansion of both optical members can be relaxed. Therefore, peeling between the first optical member 11 and the second optical member 12 can be reliably prevented. Moreover, since polyorganosiloxane is excellent in chemical resistance, it can be effectively used for the prism 1 that is exposed to chemicals for a long time.

Next, a second embodiment of the present invention will be described with reference to FIGS. The second embodiment differs from the first embodiment in the method of manufacturing the prism 1, and the structure of the prism 1 itself is the same as that of the first embodiment.
The prism manufacturing method according to the second embodiment includes a thin film forming process, a polymerized film forming process, a surface activation process, and a bonding process, as in the first embodiment. While the above-described steps were performed on the first optical member 11 and the second optical member 12 that were pre-shaped in a columnar shape, in the second embodiment, the strip-shaped optical block subjected to the above-described steps was finally formed in a predetermined shape. It is different from the first embodiment in that it is cut into two.

The manufacturing method of the optical article concerning 2nd Embodiment is demonstrated concretely.
[Thin film formation process]
In the second embodiment, a strip-shaped optical block 11A (see FIG. 7) for forming the first optical member 11 and a strip-shaped optical block 12A (see FIG. 7) for forming the second optical member 12 are prepared in advance. To do. In this embodiment, both the strip-shaped optical block 11A and the strip-shaped optical block 12A are long flat plates having the same predetermined thickness, and the material thereof is the same as that of the first optical member 11 and the second optical member 12.
In the thin film forming step, the first thin film 131 and the second thin film 132 are formed on the opposite surfaces of the strip-shaped optical block 11A, respectively, and the first thin film 131 and the opposite surfaces of the strip-shaped optical block 12A are formed. The second thin film 132 is formed.
The formation method of the first thin film 131 and the second thin film 132 is the same as that of the first embodiment.

[Polymerized film forming step]
A plasma polymerized film 133H is formed on the first thin film 131 provided on the strip-shaped optical block 11A, and then a plasma polymerized film 133H is formed on the second thin film 132 provided on the strip-shaped optical block 11A. Similarly, the plasma polymerization film 133H is formed on the first thin film 131 provided on the strip-shaped optical block 12A, and then the plasma polymerization film 133H is formed on the second thin film 132 provided on the strip-shaped optical block 12A.
FIG. 6 is a schematic view of a plasma polymerization apparatus used in the second embodiment.
The plasma polymerization apparatus 100 shown in FIG. 6 differs from the plasma polymerization apparatus 100 shown in FIG. 3 in the shape of the support portion 111A of the first electrode 111. That is, in the second embodiment, in order to support the strip-shaped optical blocks 11A and 12A on which the first thin film 131 and the second thin film 132 are formed by the first electrode 111, the support portion 111A has a flat plate portion.

Next, a procedure for forming the plasma polymerized film 133H will be described with reference to FIG.
In this polymerized film forming step, the strip-shaped optical block 11A is held by the support portion 111A of the first electrode 111 disposed inside the chamber 101, a predetermined amount of oxygen is introduced into the chamber 101, and the first electrode 111 and A high-frequency voltage is applied from the power supply circuit 120 to the second electrode 112 to activate the optical member itself.
Thereafter, a mixed gas of a source gas and a carrier gas is supplied into the chamber 101. The supplied mixed gas is filled in the chamber 101, and as shown in FIG. 7A, the mixed gas is exposed to the first thin film 131 provided in the strip-shaped optical block 11A.
By applying a high-frequency voltage between the first electrode 111 and the second electrode 112, gas molecules existing between the electrodes 111 and 112 are ionized, and plasma is generated. The molecules of the raw material gas are polymerized by the energy of the plasma, and as shown in FIG. 7B, the polymer adheres to and deposits on the surface of the first thin film 131 of the strip-shaped optical block 11A. Thereby, as shown in FIG. 7C, a first thin film 131 plasma polymerized film 133H is formed. Thereafter, the front and back of the strip-shaped optical block 11A are reversed, and the plasma polymerization film 133H is formed on the second thin film 132 of the strip-shaped optical block 11A by the same method as described above. Further, a plasma polymerization film 133H is formed on the first thin film 131 and the second thin film 132 of the strip-shaped optical block 12A.

[Surface activation process]
Thereafter, as shown in FIG. 7D, the surface of the plasma polymerization film 133H is activated. This activation method is the same as in the first embodiment.
[Bonding process]
In the bonding step, the plasma polymerization layer 133H formed on the first thin film 131 and the plasma polymerization layer 133H formed on the second thin film 132 are bonded and integrated to form the bonding layer 133.
First, as shown in FIG. 8A, a plurality of strip-shaped optical blocks 11A and strip-shaped optical blocks 12A are stacked on a base B. The adjacent strip-shaped optical block 11A and strip-shaped optical block 12A are brought into contact with the plasma polymerization film 133H provided on the first thin film 131 and the second thin film 132, respectively. In the second embodiment, the strip-like optical blocks 11A and 12A are arranged so as to be shifted in the horizontal direction so that the lower ends of the plates abut on the plate P inclined by 45 ° with respect to the plane of the base B.
Then, as shown in FIG. 8B, a plurality of stacked strip-like optical blocks 11A and strip-like optical blocks 12A are pressed in a state where the plasma polymerization films 133H face each other.

[Cutting process]
A process of cutting the strip-shaped optical blocks 11A and 12A in which a plurality of sheets are laminated into a predetermined shape will be described with reference to FIGS.
As shown in FIG. 9A, the stacked strip-like optical blocks 11A and 12A are parallel to the arrangement direction of the plate P with respect to the optical element plane, that is, in a direction L of 45 ° with respect to the plane of the optical element. Along the predetermined interval along the line. One cut block 11C is shown in FIG. As shown in FIG. 9B, the end face of the block 11C is a parallelogram. The block 11C has a structure in which the optical thin film 13 including the first thin film 131, the second thin film 132, and the bonding layer 133 is arranged at predetermined intervals.
After that, as shown in FIG. 10A, the end portions of the block 11C are aligned and stacked vertically, and both left and right side portions are trimmed. That is, the cutting is performed along the direction V1 perpendicular to the plane of the block 11C so as to connect the upper edges of the optical thin film 13 positioned on the leftmost side and connect the lower edges of the optical thin film 13 positioned on the rightmost side. To do. The cut state is shown in FIG. In FIG. 10B, since a plurality (four in the figure) of the prisms 1 are integrally formed side by side, they are cut along a direction V2 perpendicular to the plane of the block 11C. As a result, a plurality of (four in the figure) prisms 1 are formed simultaneously.

Therefore, in the second embodiment, the same effects as the effects (1) to (4) of the first embodiment can be obtained, and the following effects can be obtained.
(5) A strip-shaped optical block 11A for molding the first optical member 11 and a strip-shaped optical block 12A for molding the second optical member 12 are prepared in advance, and the strip-shaped optical block is prepared in the thin film forming step. 11A and 12A, the first thin film 131 and the second thin film 132 are formed, and in the polymerization film formation process, the plasma polymerization film 133H is formed on each of the first thin film 131 and the second thin film 132, and in the bonding process, a plurality of films are formed. The strip-shaped optical blocks 11A and 12A are stacked in a state where the plasma polymerization layer 133H and the plasma polymerization layer 133H are stacked, and then cut into the prism 1, so that a large amount of prisms 1 can be manufactured by a simple method. can do.

Next, a third embodiment of the present invention will be described with reference to FIGS. The third embodiment exemplifies a cross prism 2 as an optical article. The cross prism 2 is used, for example, in a liquid crystal projector device.
FIG. 11 is a view showing an end face of the cross prism 2 according to the third embodiment, and FIG. 12 is a cross-sectional view showing a main part of FIG.
In FIG. 11, the cross prism 2 is provided between the first optical member 21 and the second optical member 22 whose end faces are right triangles, and between the oblique sides of the first optical member 21 and the second optical member 22. In addition, two prisms 20 including the optical thin film 23B are joined with the optical thin film 23R interposed therebetween.
Both the first optical member 21 and the second optical member 22 are formed from optical glass such as BK7, white plate glass, borosilicate glass, blue plate glass, and the like, and the triangular prism shape having the same end face shape and length dimension. It is a member.
The bases of the two prisms 20 are arranged to face each other with the optical thin film 23B interposed therebetween, and the cross prism 2 as a whole has a square prismatic end surface.
In other words, the cross prism 2 has a square end surface, and the optical thin films 23R and 23B are formed in a cross so as to connect the diagonal lines. The optical thin film 23R that connects a pair of diagonal lines facing each other is a wavelength selection film that reflects red and transmits green and blue, and the optical thin film 23B that connects the other pair of diagonal lines reflects blue and reflects green and red. This is a wavelength selective film to be transmitted.

As shown in FIG. 12, the optical thin film 23R is a wavelength selective film having a wavelength selective action, and is composed of layers of different materials, for example, a layer of tantalum oxide (Ta ₂ O ₅ ) which is a high refractive material layer, and a low refractive material. Layers of silicon oxide (SiO ₂ ) layers are alternately stacked. These layers are composed of 29 layers. When the layer directly provided on the bottom side of the first optical member 21 is a first layer 2301, the second layer 2302 is directed toward the second optical member 22 side. 3rd layer 2303, 13th layer 2313, 14th layer 2314, 15th layer 2315, 16th layer 2316, 17th layer 2317, ... 27th layer 2327, 28th layer 2328, 29th layer 2329, The 29th layer 2329 is provided directly on the bottom side of the second optical member 22. Of these layers, odd layers, for example, the first layer 2301, the third layer 2303, the fifteenth layer 2315, the twenty-third layer 2323, and the twenty-fifth layer 2325 are silicon oxide (SiO ₂ ) layers, and even-numbered layers, for example, The second layer 2302, the fourth layer 2304, the fourteenth layer 2314, and the twenty-eighth layer 2328 are tantalum oxide (Ta ₂ O ₅ ) layers.
In the present embodiment, the first layer 2301 to the 14th layer 2314 constitute the first thin film 231 provided in advance on the first optical member 21, and the 16th layer 2316 to the 29th layer 2329 on the second optical member 22 in advance. The 15th layer 2315 which comprises the provided 2nd thin film 232 and is located in the middle is replaced with the joining layer 233 which carries out the molecular junction of the 1st thin film 231 and the 2nd thin film 232. The bonding layer 233 is formed of a plasma polymerization film described later, and has the same refractive index and film thickness as the fifteenth layer 2315.
The optical thin film 23B is a wavelength selective film having a wavelength selective action. For example, layers of different materials, for example, a layer of tantalum oxide (Ta ₂ O ₅ ) that is a high refractive material layer and silicon oxide (SiO ₂ ) that is a low refractive material layer. ₂ ) layers are alternately laminated. These layers are composed of 25 layers (not shown). If the layer directly provided on the bottom side of one prism 20 is the first layer, the layer is provided directly on the bottom side of the other prism 20. Becomes the 25th layer. Among these layers, odd-numbered silicon oxide (SiO ₂ ) layers, and even-numbered layers are tantalum oxide (Ta ₂ O ₅ ) layers. The first layer to the twelfth layer constitute a first thin film 231 provided in advance on one prism 20 side, and the fourteenth layer to the 25th layer constitute a second thin film 232 provided in advance on the other prism side, The 13th layer located in the middle is replaced with a bonding layer 233 that molecularly bonds the first thin film 231 and the second thin film 232.

Next, a method for manufacturing an optical article according to the third embodiment will be described.
[Prism molding process]
First, as shown in FIG. 13A, one prism 20 is manufactured.
Therefore, the manufacturing method of the optical article of 3rd Embodiment is comprised from a thin film formation process, a polymeric film formation process, a surface activation process, and a bonding process similarly to 1st Embodiment.
[Thin film formation process]
The first optical member 21 and the second optical member 22 are formed in a triangular prism shape by a method similar to the conventional method. Then, the first thin film 231 is formed on the oblique side portion of the first optical member 21, and the second thin film 232 is formed on the oblique side portion of the second optical member 22. The thin film is formed by using the same deposition method as the conventional method.
[Polymerized film forming step]
A plasma polymerization film 233H is formed on the first thin film 231 provided on the first optical member 21 and the second thin film 232 provided on the second optical member 22 by the same method as in the first embodiment. A two-layered plasma polymerized film 233H constitutes one bonding layer 233, and this bonding layer 233 is replaced with a fifteenth layer 2315.

[Surface activation process]
Thereafter, as in the first embodiment, the plasma polymerization film 233H is activated to activate the surface.
[Bonding process]
In the bonding step, the plasma polymerization layer 233H formed on the first thin film 231 and the plasma polymerization layer 233H formed on the second thin film 232 are bonded and integrated to form the bonding layer 233. Thereby, one prism 20 is formed.
A plurality of prisms 20 are manufactured together by the above process.

[Cross prism formation process]
Next, as shown in FIG. 13B, the bases of the two prisms 20 are joined together to manufacture one cross prism 2. This process is comprised from a thin film formation process, a polymeric film formation process, a surface activation process, and a bonding process similarly to 1st Embodiment like the above-mentioned.
[Thin film formation process]
A first thin film 231 is formed on the bottom side of one prism 20, and a second thin film 232 is formed on the bottom side of the other prism 20.
[Polymerized film forming step]
A plasma polymerization film 233H is formed on the first thin film 231 provided on one prism 20 and the second thin film 232 provided on the other prism 20 by the same method as in the first embodiment.
[Surface activation process]
Thereafter, the plasma polymerization film 233H is activated to activate the surface.
[Bonding process]
In the bonding step, the plasma polymerization layer 233H formed on the first thin film 231 and the plasma polymerization layer 233H formed on the second thin film 232 are bonded and integrated to form the bonding layer 233. Thereby, one cross prism 2 is formed.

In the third embodiment, in addition to the same effects as the effects (1) to (4) of the first embodiment, the following effects can be achieved.
(6) A prism forming step of forming the prism 20 by providing the optical thin film 23R between one oblique side of the triangular prism-shaped first optical member 21 and one oblique side of the second optical member 22, and in this prism forming step The cross prism 2 is manufactured by preparing two molded prisms 20 and providing a cross prism 2 forming step of forming the cross prism 2 by providing the optical thin film 23B between the bottoms of the prisms 20. In the prism forming step, the first thin film 231 is provided on one oblique side of the first optical member 21, and the second thin film 232 is provided on one oblique side of the second optical member 22, and the thin film forming step is performed. A plasma polymerized film 233H is formed on each of the first thin film 231 provided on one optical member 21 and the second thin film 232 provided on the second optical member 22, and a polymerized film forming step is performed. The surface activation process is performed by activating the film, the plasma polymerization layers 233H are bonded to each other, and the bonding process is performed to form the prism 20 whose end face is a right triangle. In the cross prism forming step, the first thin film 231 is provided on the bottom side of one prism 20 of the two prisms 20, the second thin film 232 is provided on the bottom side of the other prism 20, and the thin film forming step is performed. A plasma polymerized film 233H is formed on each of the first thin film 231 and the second thin film 232 of the two prisms 20 to perform a polymerized film forming process, and the plasma polymerized film 233H is activated to perform a surface activation process. Then, the cross-prism 2 is formed by laminating these plasma polymerization layers 233H and performing a laminating process. Therefore, since the dimension management between the four optical members 21 and 22 can be easily performed by joining the plasma polymerization films 233H, the cross prism 2 can be easily manufactured.

(7) Since the optical thin films 23R and 23B are formed in the cross prism 2 so as to connect the diagonal lines of the squares, it is possible to suppress the center step shift caused by the thin film thickness. On the other hand, a wavelength selection film is formed on a triangular prism-shaped optical member in advance, and two prisms are manufactured by bonding and fixing the wavelength selection film and the optical member with an adhesive. In a conventional cross prism in which a wavelength selection film is formed and this wavelength selection film and the other prism are bonded and fixed with an adhesive, the center step shift is increased by the thickness of the adhesive.

Next, a fourth embodiment of the present invention will be described with reference to FIGS. The fourth embodiment exemplifies a polarization separation element 3 called a PS conversion element as an optical article. This polarization separation element 3 is used in, for example, a liquid crystal projector device.
FIG. 14 is a view showing an end face of the polarization beam splitting element 3 according to the fourth embodiment, and FIG. 15 is a cross-sectional view showing a main part of FIG.
In FIG. 14, the polarization separation element 3 is a flat plate member in which first optical members 31 and second optical members 32 are alternately arranged with an optical thin film 33 interposed therebetween. A reflective film 34 is provided on each of the first optical member 31 and the second optical member 32. A phase difference plate 35 is selectively provided on the light exit surface side of the optical thin film 33 of the first optical member 31 and the second optical member 32. The reflective film 34 is disposed at an intermediate position between the adjacent optical thin films 33.
In the first optical member 31 and the second optical member 32, the plane on the light incident side and the plane on the light emitting side are parallel to each other, and the reflection film 34 and the optical thin film 33 are formed at an angle of 45 ° with respect to these planes. Are arranged parallel to each other. In the present embodiment, the polarization separation element 3 has a left-right symmetric structure, and a phase difference plate 35 is arranged side by side at the center thereof.

The first optical member 31 and the second optical member 32 are formed from glass such as optical glass such as BK7, white plate glass, borosilicate glass, and blue plate glass.
The optical thin film 33 is a polarized light separation film formed of a dielectric multilayer film, and converts an incident light bundle (S-polarized light and P-polarized light) into an S-polarized partial beam (S-polarized light) and a P-polarized partial beam ( P-polarized light), reflects S-polarized light, and transmits P-polarized light (see FIG. 15A).
As shown in FIG. 15B, the optical thin film 33 is formed by laminating layers of different materials, for example, a silicon oxide (SiO ₂ ) layer, a lanthanum aluminate layer, and a magnesium fluoride (MgF ₂ ) layer. Composed. These layers are composed of 45 layers. When the first optical member 31 side is the first layer 3301, the second layer 3302, the third layer 3303,... 21 layer 3321, 22nd layer 3322, 23rd layer 3323, 24th layer 3324, 25th layer 3325,..., 43rd layer 3343, 44th layer 3344, 45th layer 3345, and this 45th layer 3345 is the second optical layer. It is directly provided on the member 32. Of these layers, the first layer 3301, the 23rd layer 3323 and the 45th layer 3345 are layers of silicon oxide (SiO ₂ ), and the odd layers other than the first layer 3301, the 23rd layer 3323 and the 45th layer 3345, For example, the third layer 3303, the fifth layer 3305, and the 43rd layer 3343 are magnesium fluoride (MgF2) layers, and are even layers, for example, the second layer 3302, the fourth layer 3304, the twenty-second layer 3322, and the twenty-fourth layer. The layer 3324 and the 44th layer 3344 are lanthanum aluminate layers. These layers are symmetrical in material and film thickness with the 23rd layer 3323 as the center.
In the present embodiment, the first layer 3301 to the 22nd layer 3322 constitute the first thin film 331 provided in advance on the first optical member 31, and the 24th layer 3324 to the 45th layer 3345 on the second optical member 32 in advance. The 23rd layer 3323 which comprises the provided 2nd thin film 332 and is located in the middle is replaced by the bonding layer 333 which molecularly bonds the first thin film 331 and the second thin film 332. The bonding layer 333 is formed of a plasma polymerization film described later, and has the same refractive index and film thickness as the 23rd layer 2313.

The reflective film 34 is formed of a dielectric multilayer film or a metal film, and has a function of reflecting S-polarized light incident on the reflective film 34 as it is. The multilayer film constituting the reflective film 34 is formed by evaporating a material such as silicon dioxide or titanium oxide, for example.
The phase difference plate 35 is a strip-shaped half-wave plate, and its width dimension corresponds to the dimension between the optical thin film 33 and the reflection film 34. The phase difference plate 35 is formed of a quartz crystal made of a single crystal of SiO ₂ , and this quartz crystal may be an artificial quartz crystal or a natural quartz crystal.

Next, a method for manufacturing an optical article according to the fourth embodiment will be described.
[Reflective film forming step]
A strip-shaped optical block 31A for forming the first optical member 31 and a strip-shaped optical block 32A (see FIG. 16) for forming the second optical member 32 are prepared in advance. The material of these strip-shaped optical blocks 31 </ b> A and 32 </ b> A is the same as that of the first optical member 31 and the second optical member 32.
A reflective film 34 is provided in advance at an intermediate position in the thickness direction of the strip-shaped optical blocks 31A and 32A.
[Thin film formation process]
A first thin film 331 and a second thin film 332 are formed on opposite surfaces of the strip-shaped optical blocks 31A and 32A, respectively. The method for forming the first thin film 331 and the second thin film 332 is the same as in the first embodiment, such as vapor deposition.

[Polymerized film forming step]
A plasma polymerized film 333H is formed on the first thin film 331 provided on the strip-shaped optical block 31A, and then a plasma polymerized film 333H is formed on the second thin film 332 provided on the strip-shaped optical block 31A. Similarly, a plasma polymerization film 333H is formed on the first thin film 331 provided on the strip-shaped optical block 32A, and then the plasma polymerization film 333H is formed on the second thin film 332 provided on the strip-shaped optical block 32A.
A procedure for forming the plasma polymerized film 333H will be described with reference to FIG.
In this polymerization film forming step, a plasma polymerization apparatus 100 shown in FIG. 6 is used. A strip-shaped optical block 31A, 32A is arranged inside the chamber 101 of this apparatus, a predetermined amount of oxygen is introduced into the chamber 101, and a high-frequency voltage is supplied from the power supply circuit 120 between the first electrode 111 and the second electrode 112. Is applied to activate the optical member itself.

Thereafter, a mixed gas of a source gas and a carrier gas is supplied into the chamber 101. The supplied mixed gas is filled into the chamber 101, and the mixed gas is exposed to the first thin film 331 provided in the strip-shaped optical blocks 31A and 32A, as shown in FIG. FIG. 16 illustrates a state in which the first thin film 331 is formed only on one surface of the strip-shaped optical blocks 31A and 32A.
By applying a high frequency voltage between the first electrode 111 and the second electrode 112, plasma is generated. The molecules in the raw material gas are polymerized by the energy of the plasma, and the polymer adheres to and deposits on the surfaces of the first thin films 331 of the strip-shaped optical blocks 31A and 32A as shown in FIG. Thereby, as shown in FIG. 16C, the first thin film 331 plasma polymerization film 333H is formed. Thereafter, the front and back of the strip-shaped optical blocks 31A, 32A are reversed, and the plasma polymerization film 333H is formed on the second thin film 332 of the strip-shaped optical blocks 31A, 32A by the same method as described above.

[Surface activation process]
Thereafter, as shown in FIG. 17A, the surface of the plasma polymerized film 333H is activated. This activation method is the same as in the first embodiment.
[Bonding process]
In the bonding step, the plasma polymerization layer 333H formed on the first thin film 331 of the strip-shaped optical block 31A and the plasma polymerization layer 333H formed on the second thin film 332 of the strip-shaped optical block 32A are bonded and integrated. Thus, the bonding layer 333 is formed.
First, a plurality of strip-shaped optical blocks 31A and strip-shaped optical blocks 32A are stacked. Therefore, as shown in FIG. 17B, the adjacent strip-shaped optical block 31A and strip-shaped optical block 32A are such that the plasma polymerization films 333H provided on the first thin film 331 and the second thin film 332 respectively face each other. Further, as shown in FIG. 18A, a plurality of laminated strip-shaped optical blocks 31A and strip-shaped optical blocks 32A are stacked in a state where the plasma polymerization films 333H face each other, and further, FIG. As shown in (B), the strip-shaped optical block 31A and the strip-shaped optical block 32A are pressed. Thus, the bonding layer 333 is formed from the two plasma polymerized films 333H, and the optical thin film 33 that is a polarization separation film is formed from the bonding layer 333, the first thin film 331, and the second thin film 332.

[Cutting process]
The strip-shaped optical blocks 31A and 32A in which a plurality of sheets are stacked are cut into a predetermined shape.
As shown in FIG. 19A, strip-shaped optical blocks 31A and 32A in which a plurality are stacked are prepared. These strip-shaped optical blocks 31A and 32A are in a state where both ends are aligned.
Thereafter, as shown in FIG. 19B, the laminated strip-shaped optical blocks 31A and 32A are cut at predetermined intervals along a direction L of 45 ° with respect to the plane. One cut block 31C is shown in FIG. As shown in FIG. 20A, the end face of the block 31C is a parallelogram. The block 31C has a structure in which the optical thin film 33 and the reflective film 34 are arranged at predetermined intervals. Thereafter, the predetermined position of the block 31C is cut along a direction V1 perpendicular to the plane.
[Phase difference installation process]
As shown in FIG. 20B, the cut blocks 31C are arranged side by side and joined, and the phase difference plate 35 is selectively bonded and fixed to the light exit surface side of the optical thin film 33 of these blocks 31C. Thereby, the polarization separation element 3 is molded.

Therefore, in the fourth embodiment, the same effects as the effects (1) to (4) of the first embodiment can be obtained, and the following effects can be obtained.
(8) The first optical member 31 and the second optical member 32 are alternately arranged with the optical thin film 33 that is a polarization separation film interposed therebetween, and between the adjacent optical thin films 33 and the first optical member 31. A reflective film 34 is provided on each of the second optical members 32, and a phase difference plate 35 is selectively provided on the light exit surface sides of the first optical member 31 and the second optical member 32 to constitute the polarization separation element 3. The optical thin film 33 is composed of a first thin film 331, a second thin film 332, and a bonding layer 333 that molecularly bonds them with a plasma polymerization film 333H. Therefore, since the first optical member 31 and the second optical member 32 can be joined without an adhesive, the light resistance is improved and the first optical member 31 and the first optical member 31 disposed with the polarization separation film interposed therebetween are provided. There is no variation in the thickness between the two optical members 32, there is no wavefront aberration, and the polarization separation element 3 can be made highly accurate.

(9) In order to manufacture the polarization separation element 3, the strip-shaped optical blocks 31A and 32A are prepared, the strip-shaped optical blocks 31A and 32A are provided with the reflection film 34 in advance, and the surfaces on the opposite sides are provided. The first thin film 331 and the second thin film 332 are respectively formed, and the plasma polymerization film 333H is formed on each of the first thin film 331 and the second thin film 332, and then the plasma polymerization layers 333H are bonded together. A plurality of strip-shaped optical blocks 31A, 32A are stacked, and the stacked strip-shaped optical blocks 31A, 32A are cut at an angle of 45 ° with respect to the arrangement direction of the optical thin film 33 and the reflective film 34 to form the first optical member 31. And the second optical member 32 are formed, and the phase difference plate 35 is selectively provided on the light exit surfaces of the first optical member 31 and the second optical member 32. Therefore, it is possible to efficiently manufacture a large amount of the polarization separation element 3 as compared with the case where the first optical member 31 and the second optical member 32 are formed in a predetermined shape and then the thin film formation and the polymerization film formation are performed.

(11) In this embodiment, the optical thin film 33 has a 45-layer structure, but the first layer 3301 to the 22nd layer 3322 of these layers are formed as the first thin film 331 on the strip-shaped optical block 31A. The 24th layer 3324 to the 45th layer 2345 were formed as the second thin film 332 in the strip-shaped optical block 32A. Conventionally, an optical thin film consisting of 45 layers is formed by vapor deposition or the like on one of the first optical member 31 and the second optical member 32. However, since there is a risk of cracks in the optical thin film, A layer of silicon oxide (SiO ₂ ) was used. However, when many layers of silicon oxide (SiO ₂ ) are used, the polarization separation characteristics are not sufficient. On the other hand, in the present embodiment, approximately half of the 22 layers are formed in each of the strip-shaped optical blocks 31A and 32A, so that the polarization separation characteristic is silicon oxide (SiO ₂₎ without worrying about cracks in the optical thin film. ) By using many layers of magnesium fluoride (MgF ₂ ) of a better material, the polarization separation characteristics can be improved as compared with the conventional example.

Hereinafter, examples will be described in order to confirm the effects of the present embodiment.
[Example 1]
Example 1 is an example corresponding to the first embodiment and the second embodiment.
Example 1 is an example of a synthesis prism that is used as an optical pickup and synthesizes red (660 nm) and infrared (785 nm). Table 1 shows the layer structure of the optical thin film 13. In Table 1, “n” is a refractive index, “d” is a film thickness of each layer, “coefficient” is an “optical film thickness coefficient”, and is a relative comparison value with a design wavelength.
In Example 1, the first optical member side and the second optical member side are symmetrical with respect to the thirteenth layer. In designing, the incident angle is 45 ° and the design wavelength is 700 nm.

[Comparative Example 1]
The comparative example is the same synthetic prism as in Example 1, in which the optical member and the optical thin film are bonded and fixed with a photo-curing adhesive (trade name UT20). The layer structure of the optical thin film is the same as that of Example 1.
Wavefront measurement was performed on Example 1 and Comparative Example created under the above conditions with a measuring instrument (trade name FUJINON interferometer). FIG. 21 shows the results obtained by measuring the transmitted wavefront aberration in Example 1 and Comparative Example 1 with the above-described measuring instrument. FIG. 21A shows Example 1, and FIG. 21B shows a comparative example.
As shown in FIG. 21A, it can be seen that in Example 1, there are few interference fringes and the wavefront aberration is extremely small. On the other hand, as shown in FIG. 21B, it can be seen that in Comparative Example 1, the interference fringes can be clearly recognized, so that the wavefront aberration is extremely large.
Moreover, the relationship between the wavelength and the transmittance in Example 1 is shown in FIG.
As described above, in Example 1, since the adhesive is not used, the wavefront aberration is small. Therefore, as shown in FIG. 22, the region 722 is a combined wavelength region of red (660 nm) and infrared (785 nm). It can be seen that the transmittance increases rapidly from about 5 nm to the high light wave side to 100%.

[Example 2]
Example 2 is an example corresponding to the third embodiment.
The second embodiment is a cross prism provided with a wavelength selection film that reflects blue and transmits green and red, and a wavelength selection film that reflects red and transmits green and blue.
Table 2 shows the layer structure of the wavelength selective film that reflects blue and transmits green and red. In Table 2, the first optical member side and the second optical member side are symmetrical about the thirteenth layer. In designing, the incident angle is 45 ° and the design wavelength is 558 nm.
Table 3 shows the layer structure of the wavelength selective film that reflects red and transmits green and blue. In Table 3, the first optical member side and the second optical member side are symmetrical about the 15th layer. In designing, the incident angle is 45 ° and the design wavelength is 803 nm.

[Comparative Example 2]
Comparative Example 2 is the same cross prism as in Example 2, in which the optical member and the optical thin film are bonded and fixed with a photo-curing adhesive (trade name UT20). The layer structure of the optical thin film is the same as that of Example 2.
In Example 2 created under the above conditions, the thickness of the bonding layer was about 2 μm. On the other hand, in Comparative Example 2, the thickness of the adhesive layer made of the adhesive was about 10 μm. Thus, since the thickness dimension of the bonding layer (adhesive layer) in Example 2 is 1/5 as compared with Comparative Example 2, the center step shift caused by the thin film thickness is greatly suppressed as compared with Comparative Example 2. be able to.
And in Example 2, the relationship between the wavelength and the transmittance | permeability T in the case of the wavelength selection film | membrane (corresponding to Table 2) which reflects blue and permeate | transmits green and red is shown in FIG. FIG. 24 shows the relationship between the wavelength and the transmittance T in the case of a wavelength selection film (corresponding to Table 3) that reflects red and transmits green and blue.
In FIG. 23, it can be seen that P-polarized light has the lowest transmittance around 430 nm in the blue region, and S-polarized light has low transmittance up to 500 nm in the blue region. That is, it can be seen that both the P-polarized light and the S-polarized light have low transmittance in the blue region (high reflectance) and high transmittance in the green and red regions (low reflectance).
In FIG. 24, it can be seen that the P-polarized light is the lowest at around 650 nm where the transmittance is in the red region, and the S-polarized light hurts from 570 nm toward the long wavelength and the transmittance becomes zero. That is, it can be seen that both the P-polarized light and the S-polarized light have low transmittance in the red region (high reflectance) and high transmittance in the green and blue regions (low reflectance).

[Example 3]
Example 3 is an example of a polarization beam splitting element corresponding to the fourth embodiment.
Table 4 shows the layer structure of the polarization separation film corresponding to the fourth embodiment. In Table 4, the first optical member side and the second optical member side are symmetrical about the 23rd layer. In designing, the incident angle is 45 ° and the design wavelength is 760 nm.
[Comparative Example 3]
Comparative Example 3 is the same polarization separation element as Example 3, and is a conventional example in which an optical member and an optical thin film are bonded and fixed with a photocurable adhesive (trade name UT20). The layer structure of Comparative Example 3 is shown in Table 5. In Table 5, the 11th layer, the 21st layer, the 29th layer, and the 37th layer are silicon oxide (SiO ₂ ) layers to prevent cracks. In designing the conventional example, the incident angle is 45 ° and the design wavelength is 760 nm.

The spectral characteristics of Example 3 are shown in FIGS. FIG. 25 shows the relationship between the wavelength and transmittance T for P-polarized light, and FIG. 26 shows the relationship between the wavelength and transmittance T for S-polarized light. On the other hand, the spectral characteristic of the comparative example 3 corresponding to Example 3 is shown in FIG.27 and FIG.28.
FIG. 27 shows the relationship between the wavelength and transmittance T for P-polarized light, and FIG. 28 shows the relationship between the wavelength and transmittance T for S-polarized light. In these drawings, A is data in the case of 0 ° with respect to the optical axis, B is data in the case of −5 ° with respect to the optical axis, and C is in the case of + 5 ° with respect to the optical axis. It is data.
From FIG. 25 and FIG. 26, it can be seen that in Example 3, both P-polarized light and S-polarized light have high transmittance in the short wavelength to long wavelength region. On the other hand, from FIG. 27 and FIG. 28, in Comparative Example 3, there is no significant difference in transmittance in the P-polarized light compared to Example 3, but in the S-polarized light, there is a difference between the short wavelength side region and the long wavelength side region. It can be seen that the transmittance is significantly reduced. That is, in Comparative Example 3, since many layers of silicon oxide (SiO ₂ ) are used to prevent cracks, the polarization separation characteristics are insufficient.

It should be noted that the present invention is not limited to the above-described embodiments, and modifications, improvements, and the like within the scope that can achieve the object of the present invention are included in the present invention.
For example, in each said embodiment, although the 1st optical members 11, 21, and 31 and the 2nd optical members 12, 22, and 32 were shape | molded from glass, in this invention, materials other than glass, for example, a polycarbonate, an acryl, etc. The first optical members 11, 21, 31 and the second optical members 12, 22, 32 may be molded from a transparent plastic material such as a system.

Furthermore, in each said embodiment, although the thin film of the same layer was formed in the 1st optical member 11,21,31 and the 2nd optical member 12,22,32, the ratio of the layer of this thin film is limited to the said embodiment. For example, all of the optical thin films 13, 23B, 23R, 33 are provided by vapor deposition on one of the first optical members 11, 21, 31 and the second optical members 12, 22, 32. , 23B, 23R, 33 may be a bonding layer, and the bonding layer may be bonded to the other of the first optical members 11, 21 and the second optical members 12, 22. In this configuration, even when the linear expansion coefficients of the optical member and the thin film are greatly different, both can be bonded.
In the present invention, the optical article can be used for an optical device other than an optical pickup and a liquid crystal projector, for example, a camera.

  The present invention can be used for optical articles used in optical pickups, liquid crystal projectors, and other devices.

The end view which shows the prism which is an optical article of 1st Embodiment of this invention. The principal part expanded sectional view of FIG. Schematic of the plasma polymerization apparatus used in the first embodiment. Schematic explaining the shaping | molding procedure of the plasma polymerization film | membrane in 1st Embodiment. Schematic explaining the bonding process in 1st Embodiment. Schematic of the plasma polymerization apparatus used in the second embodiment of the present invention. Schematic explaining the shaping | molding procedure of the plasma polymerization film | membrane in 2nd Embodiment. Schematic explaining the bonding process in 2nd Embodiment. Schematic explaining the cutting process in 2nd Embodiment. Schematic explaining the cutting process in 2nd Embodiment. The end elevation which shows the cross prism which is the optical article of 3rd Embodiment of this invention. The principal part expanded sectional view of FIG. Schematic for demonstrating the manufacturing method of 3rd Embodiment. The end view which shows the polarization separation element which is an optical article of 4th Embodiment of this invention. The principal part expanded sectional view of FIG. Schematic explaining the shaping | molding procedure of the plasma polymerization film | membrane in 4th Embodiment. Schematic explaining the bonding process in 4th Embodiment. Schematic explaining the bonding process in 4th Embodiment. Schematic explaining the cutting process in 4th Embodiment. Schematic explaining the cutting process in 4th Embodiment. The figure which shows the result of having measured the transmitted wavefront aberration of Example 1 and Comparative Example 1. FIG. 3 is a graph showing the results of Example 1. The graph which shows the result of Example 2. The graph which shows the result of Example 2. 10 is a graph showing the results of Example 3. 10 is a graph showing the results of Example 3. 10 is a graph showing the results of a conventional example corresponding to Example 3. 10 is a graph showing the results of a conventional example corresponding to Example 3.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Prism (optical article), 2 ... Cross prism (optical article), 3 ... Polarization separation element (optical article) 11, 21, 31 ... First optical member, 12, 22, 32 ... Second optical member, 13 , 23B, 23R, 33 ... optical thin film (polarization separation film), 20 ... prism, 34 ... reflection film, 35 ... phase difference plate, 131, 231, 331 ... first thin film (bonded part), 132, 232, 332 ... 2nd thin film (joined part), 133, 233, 333 ... Joining layer, 133H, 233H, 333H ... Plasma polymerization film

Claims (10)

An optical article having a first optical member, a second optical member, and an optical thin film provided between the first optical member and the second optical member,
The optical thin film includes a plurality of layers and includes a bonding layer that bonds the first optical member and the second optical member. The bonding layer includes a bonded portion on the first optical member side and the second optical member. An optical article characterized in that it is a plasma polymerized film for molecularly bonding a bonded portion on a member side. The optical article according to claim 1,
The optical thin film includes a first thin film provided in advance on the first optical member and a second thin film provided in advance on the second optical member, and the bonding layer is disposed on the first optical member side. An optical article characterized by molecularly bonding the first thin film as a bonded portion and the second thin film as a bonded portion on the second optical member side. The optical article according to claim 2,
The optical thin film is an optical functional film in which layers of different materials are alternately laminated, and an optical article in which a layer located in the middle of the optical functional film is replaced with the bonding layer. The optical article according to claim 3,
The optical article, wherein each of the first optical member and the second optical member is a triangular prism member. The optical article according to claim 3,
The first optical member and the second optical member are alternately arranged with the optical functional film interposed therebetween, and are between the adjacent optical functional films, the first optical member and the second optical member, Each of the optical films is provided with a reflection film, and a retardation plate is selectively provided on the light exit surface side of the optical function film of the first optical member and the second optical member. Goods. A method for producing an optical article having a first optical member, a second optical member, and an optical thin film provided between the first optical member and the second optical member,
The optical thin film is divided into a first thin film, a second thin film, and a bonding layer for bonding the first thin film and the second thin film, the first thin film is provided on the first optical member, and the second thin film Forming a thin film on the second optical member;
Forming a polymerized film on each of the first thin film provided on the first optical member and the second thin film provided on the second optical member; and
A surface activation step for activating the plasma polymerized film;
A bonding step of bonding and integrating the plasma polymerization layer formed on the first thin film and the plasma polymerization layer formed on the second thin film. Method. In the manufacturing method of the optical article according to claim 6,
The method for producing an optical article, wherein the first optical member and the second optical member have the same configuration, and the first thin film and the second thin film have the same layer configuration. In the manufacturing method of the optical article according to claim 7,
The thin film forming step forms the first thin film and the second thin film on opposite surfaces of a strip-shaped optical block for forming the first optical member, and forms the second optical member. Forming the first thin film and the second thin film, respectively, on the opposite surfaces of the strip-shaped optical block for
The polymerized film forming step forms a plasma polymerized film on each of the first thin film and the second thin film formed on the strip-shaped optical block,
The laminating step includes laminating a plurality of sheets so that the strip-like optical block is laminated with the plasma polymerization layer formed on the first thin film and the plasma polymerization layer formed on the second thin film,
A method for producing an optical article, wherein the strip-shaped optical block in which a plurality of sheets are laminated in the bonding step is cut and shaped so as to have a shape of the first optical member and the second optical member. . In the manufacturing method of the optical article according to claim 7,
The first optical member and the second optical member are columnar members whose end faces are right triangles, respectively, and an optical thin film is formed between one oblique side of the first optical member and one oblique side of the second optical member. Providing a prism forming step for forming a prism, and preparing a two prisms formed in this prism forming step, and forming a cross prism by forming an optical thin film between these prisms,
In the prism molding step, the first thin film is provided on one oblique side of the first optical member, the second thin film is provided on one oblique side of the second optical member, and a thin film forming step is performed. A plasma polymerized film is formed on each of the first thin film provided on one optical member and the second thin film provided on the second optical member, and the polymerized film forming step is performed. Activate the surface activation step, bond the plasma polymerization layer formed on the first thin film and the plasma polymerization layer formed on the second thin film, and perform the bonding step Molding the prism whose end face is a right triangle,
In the cross prism molding step, one of the two prisms formed in the prism molding step is continuous with the other hypotenuse of the first optical member and the hypotenuse of the second optical member. The other thin prism of the first optical member and the other oblique side of the second optical member in the other prism of the two prisms formed in the prism forming step. The second thin film is provided in succession to perform a thin film forming step, and the first thin film provided on one of the two prisms and the second thin film provided on the other prism, respectively. The plasma polymerization film formed on the first thin film is formed by forming the plasma polymerization film on the first thin film, performing the polymer film formation process, activating these plasma polymerization films and performing the surface activation process. Process for producing an optical article, which comprises molding the said cross prism in which the bonding step end face by carrying out the second formed in said thin film by bonding the plasma-polymerized layer is square. In the manufacturing method of the optical article according to claim 7,
The thin film forming step includes forming the first thin film and the second thin film on opposite surfaces of a strip-shaped optical block for forming the first optical member, which is provided with a reflection film in advance. , The first thin film and the second thin film are respectively formed on surfaces opposite to each other of the strip-shaped optical block for forming the second optical member with a reflection film provided therein in advance,
The polymerized film forming step forms a plasma polymerized film on each of the first thin film formed on the strip-shaped optical block and the second thin film formed on the strip-shaped optical block,
In the bonding step, the strip-shaped optical block is bonded to the plasma polymerization layer formed on the first thin film and the plasma polymerization layer formed on the second thin film to laminate a plurality of sheets. Forming a polarization separation film from the thin film, the second thin film and the plasma polymerized film;
Cutting the strip-shaped optical block in which a plurality of sheets are laminated in the bonding step so as to intersect the polarization separation film and the reflection film, thereby forming the first optical member and the second optical member; A method of manufacturing an optical article, wherein a retardation plate is selectively provided on a light exit surface side of the polarization separation film of the first optical member and the second optical member.

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