JP2009276665A - Method for manufacturing patterned retardation film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a patterned retardation film having a large sidewall angle. <P>SOLUTION: In the method for manufacturing the patterned retardation film, including a first step of carrying a polymerizable liquid crystal composition on a substrate to form a polymerizable liquid crystal composition layer, a second step of curing an exposure part by irradiating the polymerizable liquid crystal composition layer with an active energy ray via a mask and a third step of removing an uncured part, a value calculated from a distance d (μm) between the mask and the polymerizable liquid crystal composition layer and a parallel degree θ (°) of the active energy ray by using formula (1): d×tan(θ) is 5.3 or below, and a value obtained by dividing a concentration (ppm) of a polymerization inhibitor contained in the polymerizable liquid crystal composition layer by a concentration (mass%) of a polymerization initiator contained in the polymerizable liquid crystal composition layer is in the range of 333 to 3,750. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a method for producing a patterned retardation film using a polymerizable liquid crystal composition used for optical compensation of a liquid crystal display or the like.

  As a technique useful for improving the performance of a transflective liquid crystal display, use of a patterned retardation film has been proposed (Non-Patent Documents 1 to 3, Patent Documents 1 and 2). This is because one pixel is divided into a transmission area and a reflection area, and a retardation film is provided only in one area. A retardation film with a width of about 20 to 100 μm and patterned with or without a retardation film is used. To do.

Such a patterned retardation film can be produced, for example, according to the procedure shown in FIGS.
However, the cross-sectional shape of the patterned retardation film produced by the conventional manufacturing method is not a rectangular shape, but has an outer shape as shown in FIG.
If the side wall angle shown in FIG. 4 is small, there is a problem that the region where the phase difference continuously changes is large at the boundary between the transmission region and the reflection region. This area corresponds to the “width” shown in FIG. Since this portion lowers the display quality, it is necessary to make it as small as possible. However, in the conventional technique, the side wall angle is usually only about 17 degrees, which is an obstacle to the application of the patterned retardation film.

C.Doornkamp, B.M.I.van der Zande, S.J.Roosendaal, L.W.G.Sofmeel, J.J.van Glabbeek, J.T.M.Osenga, J.A.M.Steenbakkers, "Next generation mobile LCDs with in-cell retarders", IDW’03, 685 (2003). SJRoosendaal, BMI van der Zande, ACNieuwkerk, CA Renders, JTM Osenga, C. Doornkamp, E.Peeters, J. Bruinink, JAMM van Haaren and S. Takahashi, "Novel High Performance Transflective LCD with a Patterned Retarder", SID '03, 78 (2003). C. Doornkamp, S. J. Roosendaal, B.M.I.van der Zande, L.W.G.Stofmeel, J.J.van Glabbeek, J.T.M.Osenga, "Novel Transflective LCD with Ultra-wide Viewing Angle", SID’04, 670 (2004). JP 2005-338256 A JP 2006-98623 A

  The objective of this invention is providing the manufacturing method which enlarges the side wall angle defined above of a patterned retardation film.

  As a result of intensive studies to achieve the above object, it has been found that setting specific manufacturing conditions is effective, and the present invention has been completed.

The present invention is a first step in which a polymerizable liquid crystal composition is carried on a substrate to form a polymerizable liquid crystal composition layer, and the exposed portion is irradiated with active energy rays through the mask to the polymerizable liquid crystal composition layer. In the method for producing a patterned retardation film comprising the second step of curing the film and the third step of removing the uncured portion, the distance d (μm) between the mask and the polymerizable liquid crystal composition layer and the active energy ray The parallelism θ (degree) is expressed by the following formula (1)
d × tan (θ) Equation (1)
The value calculated in (5) is 5.3 or less, and the concentration (ppm) of the polymerization inhibitor contained in the polymerizable liquid crystal composition layer is the concentration (%) of the polymerization initiator contained in the polymerizable liquid crystal composition layer. Provided is a method for producing a patterned retardation film, wherein the divided value is in the range of 333 to 3750.

  When the production method of the present invention is applied to produce a patterned retardation film, the side wall angle can be increased. When the obtained patterned retardation film is used, the display quality of the display can be improved.

  The best mode of the polymerizable liquid crystal composition according to the present invention will be described below. The invention of the present application is characterized in that the value calculated by the equation (1) (hereinafter referred to as parameter A) is 5.3 or less, preferably 3.0 or less, and more preferably 1.5 or less.

  The distance d between the mask and the polymerizable liquid crystal composition layer is preferably 150 μm or less, more preferably 100 μm or less, and particularly preferably 80 μm or less. Although better results are obtained when the thickness is 50 μm or less, the mask and the polymerizable liquid crystal composition layer come into contact if the distance d is too small. The parallelism θ is preferably 5 degrees or less, more preferably 4 degrees or less, and particularly preferably 3 degrees or less.

  The polymerizable liquid crystal composition preferably contains 3 to 5% by mass of a polymerization initiator and 1000 to 15000 ppm of a polymerization inhibitor. Examples of the polymerization initiator include benzoin ethers, benzophenones, acetophenones, benzyl ketals, and acylphosphine oxides. Specifically, “Irugarue-819”, “Irugarue-651”, “Irugarue-184D”, “Irugarue-1800”, “Irugarue-907”, “Irugarue-369” (above, manufactured by Ciba Specialty Chemicals) “Lucirin TPO” (manufactured by BASF) may be mentioned. Among these, “Irugarue-907” and “Irugarue-369”, which can ensure curability without replacing the atmosphere during curing with nitrogen, are preferable, and “Irgacure-907” having excellent curability is most preferable.

  Examples of the polymerization inhibitor include hydroquinone, hydroquinone monoalkyl ethers, tert-butylcatechols, pyrogallols, thiophenols, nitro compounds, β-naphthylamines, β-naphthols, nitroso compounds and the like. More specific examples include methoxyphenol and 2,6-di-tert-butylphenol. An example of a preferable combination of a polymerization initiator and a polymerization inhibitor is a combination of “Irgacure-907” as a polymerization initiator and “methoxyphenol” as a polymerization inhibitor. When the addition concentration of the polymerization inhibitor is B (ppm) and the concentration of the polymerization initiator is C (%), B / C (hereinafter, this value is referred to as parameter D) is set to 333 to 3750. Preferably, 600 to 2500 is more preferable, and 800 to 2000 is particularly preferable. When the parameter D is small, the resolution and the side wall angle tend to deteriorate, and when the parameter D is large, the curability tends to deteriorate. When the parameter A is 3.0 or more and 5.3 or less, the parameter D is preferably set to 800 to 3750, and when the parameter A is 1.5 or more and less than 3.0, the parameter D is preferably set to 600 to 2500, When the parameter A is less than 1.5, the parameter D is preferably set to 300 to 2000.

The value obtained by dividing parameter D by parameter A is preferably set to 190 or more, more preferably set to 380 or more, and particularly preferably set to 830 or more.
As the first step of forming the polymerizable liquid crystal composition layer by supporting the polymerizable liquid crystal composition on the substrate, for example, the polymerizable liquid crystal composition is dissolved in a solvent, applied onto the substrate, The method of volatilizing can be mentioned. It is also possible to apply the polymerizable liquid crystal directly onto the substrate without dissolving it in the solvent. Suitable organic solvents include, for example, alkyl-substituted benzenes such as toluene, xylene, cumene, propylene glycol monomethyl ether acetate, butyl acetate, cyclohexanone, cyclopentanone and the like. Further, dimethylformamide, γ-butyrolactone, N-methylpyrrolidinone, methyl ethyl ketone, ethyl acetate and the like may be added to these solvents. Examples of the method for volatilizing the solvent include a method in which heating at 60 to 150 ° C., more preferably 80 to 120 ° C. is performed for 15 to 120 seconds, more preferably 30 to 90 seconds. In addition to this heating, vacuum drying can be combined. Examples of the application method include spin coating, die coating, extrusion coating, roll coating, wire bar coating, gravure coating, spray coating, dipping, and printing.

  It is preferable to use ultraviolet rays as the active energy rays.

Irradiation dose is preferably 50~900mJ / cm ^2, more preferably ^{60~500mJ / cm 2, 80~300mJ / cm} 2 is particularly preferred. If the irradiation amount is small, the mechanical properties and heat resistance of the resulting retardation film tend to deteriorate. On the other hand, when the irradiation amount is large, the mechanical properties and heat resistance are improved, but the resolution is deteriorated, and it tends to be difficult to form a fine pattern, and the side wall angle tends to be small. The setting of the intensity of ultraviolet rays is also important. The ultraviolet intensity is preferably ² to 100 mW / cm ^2, more preferably 10 to 50 mW / cm ² . If the intensity of ultraviolet rays is weak, the time required for mask exposure tends to be long and productivity tends to deteriorate. When the ultraviolet intensity is strong, the resolution and the side wall angle tend to be small.

  Examples of the step of removing the uncured part include a method of dissolving and cleaning using a solvent. As the solvent, it is preferable to select an organic solvent that dissolves the polymerizable liquid crystal material composition and does not damage the cured polymerizable liquid crystal composition. Examples of the organic solvent include alkyl-substituted benzene such as toluene, xylene, cumene, propylene glycol monomethyl ether acetate, butyl acetate, cyclohexanone, cyclopentanone and the like. The time for contacting with the solvent is preferably 10 seconds or longer, and more preferably 20 seconds or longer. It may be immersed in a solvent, or the solvent may be sprayed in a shower shape. When the time of contact with the solvent is short, an uncured portion tends to remain, and when the contact with the solvent for 5 minutes or more, the obtained retardation film tends to swell with the solvent.

As described above, the mechanical properties and heat resistance of the obtained retardation film tend to deteriorate when the UV irradiation amount during mask exposure is small. In order to improve this, it is effective to irradiate the active energy ray again after the third step. Irradiation dose is preferably ^{100mJ / cm 2 ~2000mJ / cm 2} , more preferably ^{150~1500mJ / cm 2, 200~1000mJ / cm} 2 is particularly preferred.
As the polymerizable liquid crystal composition, the general formula (I)

(Wherein P represents a reactive functional group, Sp represents a spacer group having 1 to 20 carbon atoms, m represents 0 or 1, MG represents a mesogenic group or a mesogenic support group, and R ¹ represents Represents a halogen atom, a cyano group or an alkyl group having 1 to 25 carbon atoms, and the alkyl group may be substituted by one or more halogen atoms or CN, and one CH ₂ present in the group. Group or two or more non-adjacent CH ₂ groups are each independently of each other such that —O—, —S—, —NH—, —N (CH ₃ ) -, -CO-, -COO-, -OCO-, -OCOO-, -SCO-, -COS- or -C≡C- may be substituted, or R ¹ may be represented by the general formula (Ia)

（式中、Pは反応性官能基を表し、Spは炭素原子数１〜２０のスペーサー基を表し、mは０又は１を表す。）で表される構造を表す。）で表される化合物を含有する請求項１記載のパターン化位相差フィルムの製造方法。
一般式（I）において、Spがアルキレン基を表し（該アルキレン基は１つ以上のハロゲン原子又はCNにより置換されていても良く、この基中に存在する１つのCH₂基又は隣接していない２つ以上のCH₂基はそれぞれ相互に独立して、酸素原子が相互に直接結合しない形で、-O-、-S-、-NH-、-N(CH₃)-、-CO-、-COO-、-OCO-、-OCOO-、-SCO-、-COS-又は-C≡C-により置き換えられていても良い。）、MGが一般式（I-b）

(Wherein P represents a reactive functional group, Sp represents a spacer group having 1 to 20 carbon atoms, and m represents 0 or 1). The manufacturing method of the patterned phase difference film of Claim 1 containing the compound represented by this.
In the general formula (I), Sp represents an alkylene group (the alkylene group may be substituted by one or more halogen atoms or CN, and is not adjacent to one CH ₂ group present in the group) Two or more CH ₂ groups are independently of each other, in a form in which oxygen atoms are not directly bonded to each other, —O—, —S—, —NH—, —N (CH ₃ ) —, —CO—, -COO-, -OCO-, -OCOO-, -SCO-, -COS- or -C≡C- may be substituted.), MG is represented by the general formula (Ib)

（式中、A1、A2及びA3はそれぞれ独立的に、1,4-フェニレン基、1,4-シクロヘキシレン基、1,4-シクロヘキセニル基、テトラヒドロピラン-2,5-ジイル基、1,3-ジオキサン-2,5-ジイル基、テトラヒドロチオピラン-2,5-ジイル基、1,4-ビシクロ(2,2,2)オクチレン基、デカヒドロナフタレン-2,6-ジイル基、ピリジン-2,5-ジイル基、ピリミジン-2,5-ジイル基、ピラジン-2,5-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基、2,6-ナフチレン基、フェナントレン-2,7-ジイル基、9,10-ジヒドロフェナントレン-2,7-ジイル基、1,2,3,4,4a,9,10a-オクタヒドロフェナントレン2,7-ジイル基又はフルオレン2,7-ジイル基を表し、該1,4-フェニレン基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基、2,6-ナフチレン基、フェナントレン-2,7-ジイル基、9,10-ジヒドロフェナントレン-2,7-ジイル基、1,2,3,4,4a,9,10a-オクタヒドロフェナントレン2,7-ジイル基及びフルオレン2,7-ジイル基は置換基として１個以上のF、Cl、CF₃、OCF₃、シアノ基、炭素原子数１〜８のアルキル基、アルコキシ基、アルカノイル基、アルカノイルオキシ基、炭素原子数２〜８のアルケニル基、アルケニルオキシ基、アルケノイル基又はアルケノイルオキシ基を有していても良く、Z0、Z1、Z2及びZ3はそれぞれ独立して、-COO-、-OCO-、-CH₂ CH₂-、-OCH₂-、-CH₂O-、-CH=CH-、-C≡C-、-CH=CHCOO-、-OCOCH=CH-、-CH₂CH₂COO-、-CH₂CH₂OCO-、-COO CH₂CH₂-、-OCOCH₂CH₂-、-CONH-、-NHCO-又は単結合を表し、nは０、１又は２を表す。）で表される構造を表し、Pが一般式（I-c）、一般式（I-d）及び一般式（I-e）

(In the formula, A1, A2 and A3 are each independently 1,4-phenylene group, 1,4-cyclohexylene group, 1,4-cyclohexenyl group, tetrahydropyran-2,5-diyl group, 1, 3-dioxane-2,5-diyl group, tetrahydrothiopyran-2,5-diyl group, 1,4-bicyclo (2,2,2) octylene group, decahydronaphthalene-2,6-diyl group, pyridine- 2,5-diyl group, pyrimidine-2,5-diyl group, pyrazine-2,5-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, 2,6-naphthylene group, Phenanthrene-2,7-diyl group, 9,10-dihydrophenanthrene-2,7-diyl group, 1,2,3,4,4a, 9,10a-octahydrophenanthrene 2,7-diyl group or fluorene 2, Represents a 7-diyl group, the 1,4-phenylene group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, 2,6-naphthylene group, phenanthrene-2,7-diyl group, 9 , 10-Dihydrophenanthrene-2,7-diyl group 1,2,3,4,4a, 9,10a- octahydrophenanthrene 2,7-diyl group and fluorene 2,7-diyl group is 1 or more F as _{substituents, Cl, CF 3, OCF 3} , cyano Group, an alkyl group having 1 to 8 carbon atoms, an alkoxy group, an alkanoyl group, an alkanoyloxy group, an alkenyl group having 2 to 8 carbon atoms, an alkenyloxy group, an alkenoyl group or an alkenoyloxy group. , Z0, Z1, Z2 and Z3 are each independently -COO-, -OCO-, -CH ₂ CH _2- , -OCH _2- , -CH ₂ O-, -CH = CH-, -C≡C -, -CH = CHCOO-, -OCOCH = CH-, -CH ₂ CH ₂ COO-, -CH ₂ CH ₂ OCO-, -COO CH ₂ CH _2- , -OCOCH ₂ CH _2- , -CONH-,- NHCO- or a single bond, n represents 0, 1 or 2), and P represents a general formula (Ic), general formula (Id) and general formula (Ie)

(In the formula, R ²¹ , R ²² , R ²³ , R ³¹ , R ³² , R ³³ , R ⁴¹ , R ⁴² and R ⁴³ are each independently a hydrogen atom, a halogen atom or an alkyl group having 1 to 5 carbon atoms. And n represents 0 or 1) and preferably contains a compound represented by the formula: wherein the substituent is selected from the group consisting of substituents represented by:
Here, the compound contained in the polymerizable liquid crystal composition is more specifically represented by the general formula (II)

又、一般式（III）

In addition, the general formula (III)

（式中、Z¹は水素原子、ハロゲン原子、シアノ基又は炭素原子数１〜２０の炭化水素基を表し、Z²は水素原子又はメチル基を表し、tは０又は1を表し、A、B及びCはそれぞれ独立的に、1,4−フェニレン基、隣接しないCH基が窒素で置換された1,4−フェニレン基、1,4−シクロヘキシレン基、１つ又は隣接しない２つのCH₂基が酸素又は硫黄原子で置換された1,4−シクロヘキシレン基、1,4−シクロヘキセニレン基を表すが、式中に存在する1,4−フェニレン基は炭素原子数１〜７のアルキル基、アルコキシ基、アルカノイル基、シアノ基又はハロゲン原子で一つ以上置換されていても良く、Y³及びY⁴はそれぞれ独立的に単結合、-CH₂CH₂-、-CH₂O-、-OCH₂-、-COO-、-OCO-、-C≡C-、-CH=CH-、-CF=CF-、-（CH₂）₄-、-CH₂CH₂CH₂O-、-OCH₂CH₂CH₂-、-CH=CHCH₂CH₂-、-CH₂CH₂CH=CH-、-CH=CHCOO-、-OCOCH=CH-、-CH₂CH₂COO-、-CH₂CH₂OCO-、-COO CH₂CH₂-又は-OCOCH₂CH₂-を表し、Y⁵は単結合、-O-、-COO-、-OCO-又は-CH=CHCOO-を表す。）で表されるで表される化合物を用いると、重合性液晶組成物の粘度低減が可能で、また液晶温度範囲を室温もしくは室温付近まで低減できるので好ましい。
又、一般式（IV）

(In the formula, Z ¹ represents a hydrogen atom, a halogen atom, a cyano group or a hydrocarbon group having 1 to 20 carbon atoms, Z ² represents a hydrogen atom or a methyl group, t represents 0 or 1, A, B and C are each independently a 1,4-phenylene group, a 1,4-phenylene group in which a non-adjacent CH group is substituted with nitrogen, a 1,4-cyclohexylene group, one or two non-adjacent CH ₂ Represents a 1,4-cyclohexylene group or 1,4-cyclohexenylene group in which the group is substituted with an oxygen or sulfur atom, and the 1,4-phenylene group present in the formula is an alkyl having 1 to 7 carbon atoms Group, an alkoxy group, an alkanoyl group, a cyano group or a halogen atom, and Y ³ and Y ⁴ are each independently a single bond, —CH ₂ CH ₂ —, —CH ₂ O—, _{-OCH 2 -, - COO -,} - OCO -, - C≡C -, - CH = CH -, - CF = CF -, - (CH 2) 4 -, - CH 2 CH 2 CH 2 O -, - OCH ₂ CH ₂ CH _2- , -CH = CHCH ₂ CH _2- , -CH _{2 CH 2 CH = CH -, -} CH = CHCOO -, - OCOCH = CH -, - CH 2 CH 2 COO -, - CH 2 CH 2 OCO -, - COO CH 2 CH 2 - or -OCOCH ₂ CH ₂ - and Y ⁵ represents a single bond, —O—, —COO—, —OCO— or —CH═CHCOO—), and the viscosity of the polymerizable liquid crystal composition is reduced. In addition, the liquid crystal temperature range can be reduced to or near room temperature, which is preferable.
In addition, general formula (IV)

(Wherein Z ³ represents a hydrogen atom, a halogen atom, a cyano group or a hydrocarbon group having 1 to 20 carbon atoms, Z ⁴ represents a hydrogen atom or a methyl group, W ³ represents a single bond, —O—, -COO- or -OCO-, v represents an integer of 2 to 18, u represents 0 or 1, D, E and F are each independently a 1,4-phenylene group or a non-adjacent CH group. 1,4-phenylene group substituted with nitrogen, 1,4-cyclohexylene group, 1,4-cyclohexylene group in which one or two non-adjacent CH ₂ groups are substituted with oxygen or sulfur atoms, 1, Represents a 4-cyclohexenylene group, but the 1,4-phenylene group present in the formula is substituted by one or more alkyl groups, alkoxy groups, alkanoyl groups, cyano groups or halogen atoms having 1 to 7 carbon atoms. Y ⁶ and Y ⁷ are each independently a single bond, —CH ₂ CH ₂ —, —CH ₂ O—, —OCH ₂ —, —COO—, —OCO—, —C≡C—, — CH = CH-, -CF = CF _{-, - (CH 2) 4} -, - CH 2 CH 2 CH 2 O -, - OCH 2 CH 2 CH 2 -, - CH = CHCH 2 CH 2 -, - CH 2 CH 2 CH = CH -, - CH = CHCOO -, - OCOCH = CH -, - CH 2 CH 2 COO -, - CH 2 CH 2 OCO -, - COO CH 2 CH 2 - or -OCOCH ₂ CH ₂ - represents, Y ⁸ represents a single bond, - O-, -COO-, -OCO-, or -CH = CHCOO-) is preferred because the liquid crystal properties can be adjusted without significantly increasing the viscosity of the polymerizable liquid crystal composition. .

  Specific examples of the compound represented by the general formula (I) can be given below.

(Wherein j, k, l and m each independently represent an integer of 2 to 18)
Specific examples of the compound represented by the general formula (II) can be given below.

(Wherein j and k each independently represents an integer of 2 to 18)
Specific examples of the compound represented by the general formula (III) include the structure of the compound and the phase transition temperature.

(In the formula, a cyclohexane ring represents a transcyclohexane ring, a number represents a phase transition temperature, C represents a crystalline phase, N represents a nematic phase, S represents a smectic phase, and I represents an isotropic liquid phase.)
Specific examples of the compound represented by the general formula (IV) can be given below.

(In the formula, X ¹ represents a hydrogen atom or a methyl group, and R represents an alkyl group having 1 to 20 carbon atoms.)
In addition, the discotic compound has a benzene derivative, triphenylene derivative, truxene derivative, phthalocyanine derivative or cyclohexane derivative as the core of the center of the molecule, and a linear alkyl group, a linear alkoxy group or a substituted benzoyloxy group is a side chain. It is preferable that the structure is a radially substituted structure represented by the general formula (V).

（式中、R⁵はそれぞれ独立して一般式（V-a）で表される置換基を表す。）

(In the formula, each R ⁵ independently represents a substituent represented by the general formula (Va).)

(In the formula, R ⁶ and R ⁷ each independently represent a hydrogen atom, a halogen atom or a methyl group, and R ⁸ represents an alkoxy group having 1 to 20 carbon atoms, and the hydrogen atom in the alkoxy group represents a general formula. (It may be substituted by a substituent represented by (Vb), general formula (Vc) or general formula (Vd).)

Wherein R ⁸¹ , R ⁸² , R ⁸³ , R ⁸⁴ , R ⁸⁵ , R ⁸⁶ , R ⁸⁷ , R ⁸⁸ and R ⁸⁹ are each independently a hydrogen atom, a halogen atom or an alkyl group having 1 to 5 carbon atoms. And n represents 0 or 1.) In general formula (V), at least one of R ⁸ is represented by general formula (Vb), general formula (Vc) or It preferably represents an alkoxy group substituted by a substituent represented by the general formula (Vd), and all of R ⁸ are substituted represented by the general formula (Vb), the general formula (Vc) or the general formula (Vd). It is particularly preferred to represent an alkoxy group substituted by a group.
Further, the general formula (Va) specifically represents the general formula (Ve).

（式中ｎは２〜９の整数を表す）で表される構造を有することが特に好ましい。
重合性液晶組成物層を形成した時に、液晶分子の配向をホモジニアス配向させることを目的として、重合性液晶組成物に一般式（VI）

It is particularly preferable to have a structure represented by the formula (wherein n represents an integer of 2 to 9).
When the polymerizable liquid crystal composition layer is formed, the polymerizable liquid crystal composition has the general formula (VI) for the purpose of homogeneously aligning the liquid crystal molecules.

(Wherein R ¹ , R ² , R ³ and R ⁴ each independently represents a hydrogen atom, a halogen atom or a hydrocarbon group having 1 to 20 carbon atoms, and one hydrocarbon atom in the hydrocarbon group) It may be substituted with the above halogen atom.) It is preferable to contain a compound having a repeating unit represented by the following formula and having a weight average molecular weight of 100 or more.

  Examples of the compound represented by the general formula (VI) include polyethylene, polypropylene, polyisobutylene, paraffin, liquid paraffin, chlorinated polypropylene, chlorinated paraffin, and chlorinated liquid paraffin. In addition to this, a compound in which a fluorine atom is introduced is also effective from the viewpoint of suppressing unevenness. Among the compounds having a repeating unit represented by the general formula (VI), as a preferred structure, the formula (VI-a) to the formula (VI-f)

The compound which has a repeating unit represented by these is mentioned. Among these, structures represented by formulas (VI-a) to (VI-e) are more preferable, and structures represented by formulas (VI-a) and (VI-c) are particularly preferable. A copolymer obtained by copolymerizing two or more compounds having a repeating unit represented by formula (VI-a) to formula (VI-f) is also preferable. In this case, a copolymer having the formula (VI-a) and the formula (VI-b), a copolymer having the formula (VI-a) and the formula (VI-c), the formula (VI-a) and the formula ( More preferred are copolymers having VI-f) and copolymers having formulas (VI-a), (VI-b) and formula (VI-f), wherein formula (VI-a) and formula (VI Particularly preferred are copolymers having -b) and copolymers having the formulas (VI-a), (VI-b) and (VI-f).

  If the weight average molecular weight of the compound is too small, the effect of reducing the tilt angle is poor. If the weight average molecular weight is too large, the orientation is not stable for a long time, so there is an optimum range. Specifically, it is preferably 200 to 1000000, more preferably 300 to 100000, and particularly preferably 400 to 80000.

Moreover, it is preferable to contain 0.01-5 mass% of this compound in a polymeric liquid crystal composition, It is more preferable to contain 0.05-2 mass%, Containing 0.1-1 mass% Is particularly preferred.
In order to ensure smoothness of the surface when the polymerizable liquid crystal composition layer is formed, it is preferable to add a surfactant. As the surfactant, there is no distinction between an ionic surfactant and a nonionic surfactant. Surfactants that can be included include alkyl carboxylates, alkyl phosphates, alkyl sulfonates, fluoroalkyl carboxylates, fluoroalkyl phosphates, fluoroalkyl sulfonates, polyoxyethylene derivatives, fluoro Examples thereof include alkylethylene oxide derivatives, polyethylene glycol derivatives, alkylammonium salts, fluoroalkylammonium salts, silicone derivatives and the like, and fluorine-containing surfactants and silicone derivatives are particularly preferable.

More specifically, “MEGAFAC F-110”, “MEGAFACCF-113”, “MEGAFAC F-120”, “MEGAFAC F-812”, “MEGAFAC F-142D”, “MEGAFAC F-144D”, “MEGAFAC F-” 150 "," MEGAFAC F-171 "," MEGAFACCF-173 "," MEGAFAC F-177 "," MEGAFAC F-183 "," MEGAFAC F-195 "," MEGAFAC F-824 "," MEGAFAC F-833 " , “MEGAFAC F-114”, “MEGAFAC F-410”, “MEGAFAC F-493”, “MEGAFAC F-494”, “MEGAFAC F-443”, “MEGAFAC F-444”, “MEGAFAC F-445”, "ME GAFAC F-446, MEGAFAC F-470, MEGAFAC F-471, MEGAFAC F-474, MEGAFAC F-475, MEGAFAC F-477, MEGAFAC F-478, MEGAFAC F-479, MEGAFAC F-480SF, MEGAFAC F-482, MEGAFAC F-483, MEGAFAC F-484, MEGAFAC F-486, MEGAFAC F-487, MEGAFAC F -489 "," MEGAFAC F-172D "," MEGAFAC F-178K "," MEGAFAC F-178RM "," MEGAFAC R-08 "," MEGAFAC R-30 "," MEGAFAC F-472SF "," MEGAFAC " “BL-20”, “MEGAFAC R-61”, “MEGAFAC R-90”, “MEGAFAC ESM-1”, “MEGAFAC MCF-350SF” (manufactured by DIC Corporation), “Factent 100”, “Factent” 100C "," Factent 110 "," Factent 150 "," Factent 150CH "," Factent A "," Factent 100A-K "," Factent 501, "" Factent 300 "," Factent " 310 "," Factent 320 "," Factent 400SW "," FTX-400P "," Factent 251 "," Factent 215M "," Factent 212MH "," Factent 250 "," Factent 222F " , “Fargent 212 ”,“ FTX-218 ”,“ FTX-209F ”,“ FTX-213F ”,“ FTX-233F ”,“ Factent 245F ”,“ FTX-208G ”,“ FTX-240G ”,“ FTX-206D ”, "FTX-220D", "FTX-230D", "FTX-240D", "FTX-207S", "FTX-211S", "FTX-220S", "FTX-230S", "FTX-750FM", "FTX -730FM, FTX-730FL, FTX-710FS, FTX-710FM, FTX-710FL, FTX-750LL, FTX-730LS, FTX-730LM, FTX-730LL ”,“ FTX-710LL ”(from Neos),“ BYK-300 ”,“ BYK-302 ”,“ BYK-306 ”,“ BYK-307 ” , “BYK-310”, “BYK-315”, “BYK-320”, “BYK-322”, “BYK-323”, “BYK-325”, “BYK-330”, “BYK-331”, “ "BYK-333", "BYK-337", "BYK-340", "BYK-344", "BYK-370", "BYK-375", "BYK-377", "BYK-350", "BYK-" 352 "," BYK-354 "," BYK-355 "," BYK-356 "," BYK-358N "," BYK-361N "," BYK-357 "," BYK-390 "," BYK-392 " , “BYK-UV3500”, “BYK-UV3510”, “BYK-UV3570”, “BYK-Silklean 3700” (above, manufactured by Big Chemie Japan), “TE O Rad2100 "," TEGO Rad2200N "," TEGO Rad2250 "," TEGO Rad2300 "," TEGO Rad2500 "," TEGO Rad2600 "," TEGO Rad2700 "(or more, Tego Co., Ltd.) can be mentioned an example of such.

The preferred addition amount of the surfactant varies depending on components other than the surfactant contained in the polymerizable liquid crystal composition, the use temperature, etc., but is contained in the polymerizable liquid crystal composition in an amount of 0.01 to 1% by mass. The content is preferably 0.02 to 0.5 mass%, more preferably 0.03 to 0.1 mass%. When the content is lower than 0.01% by mass, it is difficult to obtain the effect of reducing film thickness unevenness. The total content of the surfactant and the content of the compound having a weight average molecular weight of 100 or more having the repeating unit represented by the general formula (VI) is preferably 0.02 to 0.5% by mass, It is more preferable to contain 0.05-0.4 mass%, and it is especially preferable to contain 0.1-0.2 mass%.

EXAMPLES Hereinafter, although an Example is given and this invention is further explained in full detail, this invention is not limited to these Examples. The resolution, width, and sidewall angle of the patterned retardation film described in the examples were measured with a laser microscope (VK-9510 manufactured by Keyence Corporation). The weight average molecular weight is detected by solvent tetrahydrofuran and differential refractometer detection using a GPC analyzer (HLC-8220GPC manufactured by Tosoh Corporation) using two TSKgel GMHXL and TSKgel G2000HXL and TSKgel G1000HXL columns (both manufactured by Tosoh Corporation). And calculated in terms of polystyrene.
(Reference Example 1)
40% by mass of the compound of the formula (a)

式(b)の化合物20質量%

20% by mass of the compound of the formula (b)

式（c）の化合物25質量%

25% by mass of the compound of the formula (c)

式（d）の化合物5質量％

5% by mass of the compound of the formula (d)

式（e）の化合物10質量%

10% by mass of the compound of formula (e)

からなる重合性液晶組成物（A）を調整した。重合性液晶組成物（A）質量93.35%に、光重合開始剤Irgacure-907（チバスペシャリティケミカルズ社製）5.0質量%、重量平均分子量600の流動パラフィン（関東化学社製）を0.1質量%、ＦＴＸ−７３０ＬＳ（ネオス社製）0.05質量%、重合禁止剤4-メトキシフェノールを15000ppm添加した重合性液晶組成物（A1）を調製した。

A polymerizable liquid crystal composition (A) comprising: Polymerizable liquid crystal composition (A) mass 93.35%, photopolymerization initiator Irgacure-907 (manufactured by Ciba Specialty Chemicals) 5.0 mass%, liquid paraffin (weight average molecular weight 600) 0.1 mass%, FTX A polymerizable liquid crystal composition (A1) was prepared by adding 0.05% by mass of -730LS (manufactured by Neos) and 15000 ppm of a polymerization inhibitor 4-methoxyphenol.

(Reference Example 2)
Polymerizable liquid crystal composition (A) mass 94.35%, photopolymerization initiator Irgacure-907 (manufactured by Ciba Specialty Chemicals) 5.0 mass%, liquid paraffin (weight-average molecular weight 600) 0.1 mass%, FTX A polymerizable liquid crystal composition (A2) prepared by adding 0.05% by mass of -730LS (manufactured by Neos) and 5000 ppm of a polymerization inhibitor 4-methoxyphenol was prepared.

(Reference Example 3)
Polymerizable liquid crystal composition (A) mass 94.75%, photopolymerization initiator Irgacure-907 (manufactured by Ciba Specialty Chemicals) 5.0 mass%, liquid paraffin (weight average molecular weight 600) 0.1 mass%, FTX A polymerizable liquid crystal composition (A3) to which 0.05 mass% of -730LS (manufactured by Neos) and 1000 ppm of a polymerization inhibitor 4-methoxyphenol was added was prepared.

Example 1
A propylene glycol monomethyl ether acetate solution containing 25% by mass of the polymerizable liquid crystal composition (A2) was prepared. This was spin-coated (570 rpm / 15 seconds) on a glass substrate with a polyimide alignment film that had been rubbed. The spin-coated substrate was dried at 70 ° C. for 2 minutes. A mask (1951 USAF test target manufactured by Edmond Co., Ltd.) was placed on the polymerizable liquid crystal composition layer thus formed at an interval of 100 μm, and a mask was exposed by irradiating a UV light source with a parallelism of 3 degrees from above. The intensity of the UV light source was set to 20 mW / cm ^2, and an energy amount of 60 mJ / cm ² was irradiated by irradiating for 3 seconds. Next, the uncured portion was removed by immersing the substrate in propylene glycol monomethyl ether acetate for 30 seconds. The solvent adhering to the substrate subjected to this treatment was volatilized by air blow to obtain a patterned retardation film. The resolution of the patterned retardation film thus obtained was 15.6 μm, the width was 5.7 μm, the side wall angle was 18.3 degrees, and the thickness was 1.9 μm.
The retardation of the retardation film was 342 nm. Further, when the obtained retardation film was heated at 240 ° C. for 1 hour, the retardation became 83.0% of the pre-heating retardation.

(Example 2)
A patterned retardation film was obtained in the same manner as in Example 1 except that the distance was changed to 50 μm. The resolution of the obtained patterned retardation film was 6.2 μm, the width was 1.9 μm, and the side wall angle was 44.9 degrees.
(Example 3)
A patterned retardation film was obtained in the same manner as in Example 1 except that the distance was changed to 23 μm. The resolution of the obtained patterned retardation film was 11.0 μm, the width was 2.8 μm, and the side wall angle was 34.6 degrees.

(Example 4)
A patterned retardation film was obtained in the same manner as in Example 1 except that the distance was changed to 12 μm. The resolution of the obtained patterned retardation film was 8.8 μm, the width was 2.9 μm, and the side wall angle was 33.5 degrees.
(Example 5)
A patterned retardation film was obtained in the same manner as in Example 1 except that the irradiation time was 5 seconds and the UV irradiation amount was 100 mJ / cm ² . The resolution of the obtained patterned retardation film was 31.3 μm, the width was 5.5 μm, and the side wall angle was 19.2 degrees.

(Example 6)
A patterned retardation film was obtained in the same manner as in Example 1 except that the irradiation time was 5 seconds, the UV irradiation amount was 100 mJ / cm ² , and the distance was changed to 50 μm. The resolution of the obtained patterned retardation film was 15.6 μm, the width was 2.9 μm, and the side wall angle was 33.7 degrees.
(Example 7)
A patterned retardation film was obtained in the same manner as in Example 1 except that the irradiation time was 5 seconds, the UV irradiation amount was 100 mJ / cm ² , and the distance was changed to 23 μm. The resolution of the obtained patterned retardation film was 13.9 μm, the width was 1.9 μm, and the side wall angle was 44.7 degrees.

(Example 8)
A patterned retardation film was obtained in the same manner as in Example 1 except that the irradiation time was 5 seconds, the UV irradiation amount was 100 mJ / cm ² , and the distance was changed to 23 μm. The resolution of the obtained patterned retardation film was 13.9 μm, the width was 1.9 μm, and the side wall angle was 44.7 degrees.
(Example 9)
A patterned retardation film was obtained in the same manner as in Example 1 except that the irradiation time was 5 seconds and the UV irradiation amount was 140 mJ / cm ² . The resolution of the obtained patterned retardation film was 78.7 μm, the width was 4.9 μm, and the side wall angle was 21.2 degrees.

(Example 10)
A patterned retardation film was obtained in the same manner as in Example 1 except that the irradiation time was 7 seconds, the UV irradiation amount was 140 mJ / cm ² , and the distance was changed to 50 μm. The resolution of the obtained patterned retardation film was 22.1 μm, the width was 2.0 μm, and the side wall angle was 43.0 degrees.
(Example 11)
A patterned retardation film was obtained in the same manner as in Example 1 except that the irradiation time was 5 seconds, the UV irradiation amount was 140 mJ / cm ² , and the distance was changed to 23 μm. The resolution of the obtained patterned retardation film was 19.7 μm, the width was 2.0 μm, and the side wall angle was 43.7 degrees.

(Example 12)
A patterned retardation film was obtained in the same manner as in Example 1 except that the irradiation time was 5 seconds, the UV irradiation amount was 140 mJ / cm ² , and the distance was changed to 12 μm. The resolution of the obtained patterned retardation film was 19.7 μm, the width was 1.9 μm, and the side wall angle was 45.0 degrees.
(Example 13)
The intensity of the UV light source was set to 8 mW / cm ² , and a patterned retardation film was obtained in the same manner as in Example 1 except that the energy amount of 100 mJ / cm 2 was irradiated by irradiation for 12.5 seconds. The resolution of the obtained patterned retardation film was 55.7 μm, the width was 5.6 μm, and the side wall angle was 18.7 degrees.

(Example 14)
Patterning position is the same as in Example 1 except that the intensity of the UV light source is set to 8 mW / cm ² , and the amount of energy of 100 mJ / cm ² is irradiated by irradiation for 12.5 seconds and the distance is changed to 50 μm. A phase difference film was obtained. The resolution of the obtained patterned retardation film was 17.5 μm, the width was 1.9 μm, and the side wall angle was 45.0 degrees.
(Example 15)
Patterning position is the same as in Example 1 except that the intensity of the UV light source is set to 8 mW / cm ² , and the amount of energy of 100 mJ / cm ² is irradiated by irradiation for 12.5 seconds and the distance is changed to 23 μm. A phase difference film was obtained. The resolution of the obtained patterned retardation film was 12.4 μm, the width was 1.9 μm, and the side wall angle was 44.7 degrees.

(Example 16)
Patterning position is the same as in Example 1 except that the intensity of the UV light source is set to 8 mW / cm ² , and the energy amount of 100 mJ / cm ² is irradiated by irradiation for 12.5 seconds and the distance is changed to 12 μm. A phase difference film was obtained. The resulting patterned retardation film had a resolution of 9.8 μm, a width of 1.8 μm, and a side wall angle of 46.5 degrees.
(Example 17)
A patterned retardation film was obtained in the same manner as in Example 1 except that the polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A1). The resolution of the obtained patterned retardation film was 8.8 μm, the width was 5.5 μm, and the side wall angle was 19.1 degrees.

(Example 18)
A patterned retardation film was obtained in the same manner as in Example 1 except that the polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A1) and the distance was changed to 50 μm. The resolution of the obtained patterned retardation film was 8.8 μm, the width was 2.7 μm, and the side wall angle was 34.8 degrees.
(Example 19)
The pattern was the same as in Example 1, except that the polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A1), the irradiation time was 5 seconds, and the UV irradiation amount was 100 mJ / cm ^2. A retardation film was obtained. The resolution of the obtained patterned retardation film was 12.4 μm, the width was 4.1 μm, and the side wall angle was 24.9 degrees.

(Example 20)
The pattern was the same as in Example 1 except that the polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A1), the irradiation time was 7 seconds, and the UV irradiation amount was 140 mJ / cm ^2. A retardation film was obtained. The resolution of the obtained patterned retardation film was 17.5 μm, the width was 3.6 μm, and the sidewall angle was 28.2 degrees.

(Comparative Example 1)
A patterned retardation film was obtained in the same manner as in Example 1 except that the polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A3). The resolution of the obtained patterned retardation film was 125.0 μm, the width was 13.4 μm, and the side wall angle was 8.1 degrees.
(Comparative Example 2)
A patterned retardation film was obtained in the same manner as in Example 1 except that the polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A3) and the distance was changed to 50 μm. The resolution of the obtained patterned retardation film was 99.2 μm, the width was 8.2 μm, and the side wall angle was 13.1 degrees.

(Comparative Example 3)
A patterned retardation film was obtained in the same manner as in Example 1 except that the polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A3) and the distance was changed to 23 μm. The resolution of the obtained patterned retardation film was 62.5 μm, the width was 6.8 μm, and the side wall angle was 15.6 degrees. (Comparative Example 4)
A patterned retardation film was obtained in the same manner as in Example 1 except that the polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A3) and the distance was changed to 12 μm. The resolution of the obtained patterned retardation film was 31.3 μm, the width was 6.3 μm, and the side wall angle was 16.8 degrees.

(Comparative Example 5)
The pattern was the same as in Example 1 except that the polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A3), the irradiation time was 5 seconds, and the UV irradiation amount was 100 mJ / cm ^2. A retardation film was obtained. The resolution of the resulting patterned retardation film was worse than 140.4 μm, the width was 19.7 μm, and the sidewall angle was 5.5 degrees.
(Comparative Example 6)
The pattern was the same as in Example 1 except that the polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A3), the irradiation time was 5 seconds, and the UV irradiation amount was 100 mJ / cm ^2. A retardation film was obtained. The resolution of the obtained patterned retardation film was 111.4 μm, the width was 7.4 μm, and the side wall angle was 14.5 degrees.

(Comparative Example 7)
Except for changing the polymerizable liquid crystal composition (A2) to the polymerizable liquid crystal composition (A3), changing the irradiation time to 5 seconds, changing the UV irradiation amount to 100 mJ / cm ^2, and changing the distance to 23 μm. In the same manner as in Example 1, a patterned retardation film was obtained. The resolution of the obtained patterned retardation film was 88.3 μm, the width was 7.1 μm, and the side wall angle was 15.0 degrees.
(Comparative Example 8)
Except for changing the polymerizable liquid crystal composition (A2) to the polymerizable liquid crystal composition (A3), changing the irradiation time to 5 seconds, changing the UV irradiation amount to 100 mJ / cm ^2, and changing the distance to 12 μm. In the same manner as in Example 1, a patterned retardation film was obtained. The resolution of the obtained patterned retardation film was 62.5 μm, the width was 6.1 μm, and the side wall angle was 17.3 degrees.

(Comparative Example 9)
The pattern was the same as in Example 1 except that the polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A3), the irradiation time was 7 seconds, and the UV irradiation amount was 140 mJ / cm ^2. A retardation film was obtained. The resolution of the resulting patterned retardation film was worse than 140.4 μm, the width was 20.7 μm, and the sidewall angle was 5.2 degrees.
(Comparative Example 10)
The pattern was the same as in Example 1 except that the polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A3), the irradiation time was 7 seconds, and the UV irradiation amount was 140 mJ / cm ^2. A retardation film was obtained. The resolution of the resulting patterned retardation film was worse than 140.4 μm, the width was 11.7 μm, and the sidewall angle was 9.2 degrees.

(Comparative Example 11)
The polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A3), the irradiation time was changed to 7 seconds, the UV irradiation amount was changed to 140 mJ / cm ² , and the distance was changed to 23 μm. In the same manner as in Example 1, a patterned retardation film was obtained. The resolution of the obtained patterned retardation film was 125.0 μm, the width was 9.6 μm, and the side wall angle was 11.3 degrees.

(Comparative Example 12)
The polymerizable liquid crystal composition (A2) was changed to the polymerizable liquid crystal composition (A3), the irradiation time was changed to 7 seconds, the UV irradiation amount was changed to 140 mJ / cm ² , and the distance was changed to 12 μm. In the same manner as in Example 1, a patterned retardation film was obtained. The resolution of the obtained patterned retardation film was 99.2 μm, the width was 7.6 μm, and the side wall angle was 14.0 degrees.
Table 1 summarizes the results.

(Example 21)
A patterned retardation film was obtained in the same manner as in Example 1 except that the time of immersion in propylene glycol monomethyl ether acetate was changed to 60 seconds. The resolution of the obtained patterned retardation film was 13.9 μm, the width was 5.5 μm, and the side wall angle was 19.1 degrees.
Further, when the obtained retardation film was heated at 240 ° C. for 1 hour, the retardation became 84.0% of the pre-heating retardation.

(Example 22)
A patterned retardation film was obtained in the same manner as in Example 1 except that the time of immersion in propylene glycol monomethyl ether acetate was changed to 90 seconds. The resolution of the obtained patterned retardation film was 13.9 μm, the width was 5.5 μm, and the side wall angle was 19.1 degrees.
Further, when the obtained retardation film was heated at 240 ° C. for 1 hour, the retardation became 84.2% of the retardation before heating.

(Comparative Example 13)
A patterned retardation film was obtained in the same manner as in Example 1 except that the immersion time in propylene glycol monomethyl ether acetate was changed to 15 seconds. The resolution of the obtained patterned retardation film was 17.5 μm, the width was 6.1 μm, and the side wall angle was 17.3 degrees.
Further, when the obtained retardation film was heated at 240 ° C. for 1 hour, the retardation became 81.5% of the retardation before heating.

(Example 23)
After producing a patterned retardation film in exactly the same way as in Example 1, the intensity of the UV light source is set to 20 mW / cm ² on the obtained retardation film, and the whole surface is irradiated for 10 seconds without using a mask. Was irradiated with an energy amount of 200 mJ / cm ² . When the retardation film subjected to additional UV exposure was heated at 240 ° C. for 1 hour, the retardation became 86.5% of the retardation before heating.

It is sectional drawing which formed the layer of the polymeric liquid crystal composition. It is sectional drawing of mask exposure. It is sectional drawing which removed the uncured part. It is a cross-sectional shape figure of a patterned retardation film.

Explanation of symbols

1 Polymerizable liquid crystal molecule 2 Polymerizable liquid crystal composition layer 3 Alignment film 4 Substrate 5 UV (ultraviolet)
6 Mask

Claims (11)

A first step of forming a polymerizable liquid crystal composition layer by supporting the polymerizable liquid crystal composition on a substrate, and a step of curing an exposed portion by irradiating the polymerizable liquid crystal composition layer with an active energy ray through a mask. In the method for producing a patterned retardation film comprising a second step and a third step of removing the uncured portion, the distance d (μm) between the mask and the polymerizable liquid crystal composition layer and the parallelism θ ( Degree) is expressed by the following formula (1)
d × tan (θ) Equation (1)
The value calculated by the above is 5.3 or less, and the concentration (ppm) of the polymerization inhibitor contained in the polymerizable liquid crystal composition layer is the concentration (mass%) of the polymerization initiator contained in the polymerizable liquid crystal composition layer. A method for producing a patterned retardation film, wherein the value divided by is in the range of 333 to 3750. The method for producing a patterned retardation film according to claim 1, wherein the active energy ray is ultraviolet light and the irradiation amount is 80 to 300 mJ / cm ² . 2. The method for producing a patterned retardation film according to claim 1, wherein the step of removing the uncured portion comprises a means for dissolving and washing the uncured portion using an organic solvent, and the washing treatment time is 20 seconds or longer. . The manufacturing method of the patterned retardation film of Claim 1 which has the process of irradiating an active energy ray again after a 3rd process. The polymerizable liquid crystal composition has the general formula (I)

(Wherein P represents a reactive functional group, Sp represents a spacer group having 1 to 20 carbon atoms, m represents 0 or 1, MG represents a mesogenic group or a mesogenic support group, and R ¹ represents Represents a halogen atom, a cyano group or an alkyl group having 1 to 25 carbon atoms, and the alkyl group may be substituted by one or more halogen atoms or CN, and one CH ₂ present in the group. Group or two or more non-adjacent CH ₂ groups are each independently of each other such that —O—, —S—, —NH—, —N (CH ₃ ) -, -CO-, -COO-, -OCO-, -OCOO-, -SCO-, -COS- or -C≡C- may be substituted, or R ¹ may be represented by the general formula (Ia)

(Wherein P represents a reactive functional group, Sp represents a spacer group having 1 to 20 carbon atoms, and m represents 0 or 1). The manufacturing method of the patterned phase difference film of Claim 1 containing the compound represented by this. In the general formula (I), Sp represents an alkylene group (the alkylene group may be substituted by one or more halogen atoms or CN, and is not adjacent to one CH ₂ group present in the group) Two or more CH ₂ groups are independently of each other, in a form in which oxygen atoms are not directly bonded to each other, —O—, —S—, —NH—, —N (CH ₃ ) —, —CO—, -COO-, -OCO-, -OCOO-, -SCO-, -COS- or -C≡C- may be substituted.), MG is represented by the general formula (Ib)

(In the formula, A1, A2 and A3 are each independently 1,4-phenylene group, 1,4-cyclohexylene group, 1,4-cyclohexenyl group, tetrahydropyran-2,5-diyl group, 1, 3-dioxane-2,5-diyl group, tetrahydrothiopyran-2,5-diyl group, 1,4-bicyclo (2,2,2) octylene group, decahydronaphthalene-2,6-diyl group, pyridine- 2,5-diyl group, pyrimidine-2,5-diyl group, pyrazine-2,5-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, 2,6-naphthylene group, Phenanthrene-2,7-diyl group, 9,10-dihydrophenanthrene-2,7-diyl group, 1,2,3,4,4a, 9,10a-octahydrophenanthrene 2,7-diyl group or fluorene 2, Represents a 7-diyl group, the 1,4-phenylene group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, 2,6-naphthylene group, phenanthrene-2,7-diyl group, 9 , 10-Dihydrophenanthrene-2,7-diyl group 1,2,3,4,4a, 9,10a- octahydrophenanthrene 2,7-diyl group and fluorene 2,7-diyl group is 1 or more F as _{substituents, Cl, CF 3, OCF 3} , cyano Group, an alkyl group having 1 to 8 carbon atoms, an alkoxy group, an alkanoyl group, an alkanoyloxy group, an alkenyl group having 2 to 8 carbon atoms, an alkenyloxy group, an alkenoyl group or an alkenoyloxy group. , Z0, Z1, Z2 and Z3 are each independently -COO-, -OCO-, -CH ₂ CH _2- , -OCH _2- , -CH ₂ O-, -CH = CH-, -C≡C -, -CH = CHCOO-, -OCOCH = CH-, -CH ₂ CH ₂ COO-, -CH ₂ CH ₂ OCO-, -COO CH ₂ CH _2- , -OCOCH ₂ CH _2- , -CONH-,- NHCO- or a single bond, n represents 0, 1 or 2), and P represents a general formula (Ic), general formula (Id) and general formula (Ie)

(In the formula, R ²¹ , R ²² , R ²³ , R ³¹ , R ³² , R ³³ , R ⁴¹ , R ⁴² and R ⁴³ are each independently a hydrogen atom, a halogen atom or an alkyl group having 1 to 5 carbon atoms. And n represents 0 or 1). The method for producing a patterned retardation film according to claim 5, comprising a compound represented by: a substituent selected from the group consisting of substituents represented by: . The polymerizable liquid crystal composition has the general formula (II)

Wherein m represents 0 or 1, W ¹ and W ² each independently represent a single bond, —O—, —COO— or —OCO—, and Y ¹ and Y ² each independently represent — COO- or -OCO- is represented, and r and s each independently represent an integer of 2 to 18, the 1,4-phenylene group present in the formula is an alkyl group or alkoxy group having 1 to 7 carbon atoms , An alkanoyl group, a cyano group, or a halogen atom, which may be substituted one or more.) The method for producing a patterned retardation film according to claim 6. The polymerizable liquid crystal composition has the general formula (III)

(In the formula, Z ¹ represents a hydrogen atom, a halogen atom, a cyano group or a hydrocarbon group having 1 to 20 carbon atoms, Z ² represents a hydrogen atom or a methyl group, t represents 0 or 1, A, B and C are each independently a 1,4-phenylene group, a 1,4-phenylene group in which a non-adjacent CH group is substituted with nitrogen, a 1,4-cyclohexylene group, one or two non-adjacent CH ₂ Represents a 1,4-cyclohexylene group or 1,4-cyclohexenylene group in which the group is substituted with an oxygen or sulfur atom, and the 1,4-phenylene group present in the formula is an alkyl having 1 to 7 carbon atoms Group, an alkoxy group, an alkanoyl group, a cyano group or a halogen atom, and Y ³ and Y ⁴ are each independently a single bond, —CH ₂ CH ₂ —, —CH ₂ O—, _{-OCH 2 -, - COO -,} - OCO -, - C≡C -, - CH = CH -, - CF = CF -, - (CH 2) 4 -, - CH 2 CH 2 CH 2 O -, - OCH ₂ CH ₂ CH _2- , -CH = CHCH ₂ CH _2- , -CH _{2 CH 2 CH = CH -, -} CH = CHCOO -, - OCOCH = CH -, - CH 2 CH 2 COO -, - CH 2 CH 2 OCO -, - COO CH 2 CH 2 - or -OCOCH ₂ CH ₂ - and And Y ⁵ represents a single bond, —O—, —COO—, —OCO—, or —CH═CHCOO—.) The method for producing a patterned retardation film according to claim 6 . The polymerizable liquid crystal composition has the general formula (IV)

(Wherein Z ³ represents a hydrogen atom, a halogen atom, a cyano group or a hydrocarbon group having 1 to 20 carbon atoms, Z ⁴ represents a hydrogen atom or a methyl group, W ³ represents a single bond, —O—, -COO- or -OCO-, v represents an integer of 2 to 18, u represents 0 or 1, D, E and F are each independently a 1,4-phenylene group or a non-adjacent CH group. 1,4-phenylene group substituted with nitrogen, 1,4-cyclohexylene group, 1,4-cyclohexylene group in which one or two non-adjacent CH ₂ groups are substituted with oxygen or sulfur atoms, 1, Represents a 4-cyclohexenylene group, but the 1,4-phenylene group present in the formula is substituted by one or more alkyl groups, alkoxy groups, alkanoyl groups, cyano groups or halogen atoms having 1 to 7 carbon atoms. Y ⁶ and Y ⁷ are each independently a single bond, —CH ₂ CH ₂ —, —CH ₂ O—, —OCH ₂ —, —COO—, —OCO—, —C≡C—, — CH = CH-, -CF = CF _{-, - (CH 2) 4} -, - CH 2 CH 2 CH 2 O -, - OCH 2 CH 2 CH 2 -, - CH = CHCH 2 CH 2 -, - CH 2 CH 2 CH = CH -, - CH = CHCOO -, - OCOCH = CH -, - CH 2 CH 2 COO -, - CH 2 CH 2 OCO -, - COO CH 2 CH 2 - or -OCOCH ₂ CH ₂ - represents, Y ⁸ represents a single bond, - The method for producing a patterned retardation film according to claim 6, comprising a compound represented by the formula: O—, —COO—, —OCO— or —CH═CHCOO—. The polymerizable liquid crystal composition has a benzene derivative, a triphenylene derivative, a truxene derivative, a phthalocyanine derivative or a cyclohexane derivative as a mother nucleus at the center of the molecule, and a linear alkyl group, a linear alkoxy group, or a substituted benzoyloxy group as its side chain. The manufacturing method of the patterned phase difference film of Claim 1 containing the disk shaped liquid crystal compound which is the structure substituted radially. The manufacturing method of the patterned phase difference film of Claim 10 in which a disk shaped liquid crystal compound contains the polymeric liquid crystal composition represented by general formula (V).

(In the formula, each R ⁵ independently represents a substituent represented by the general formula (Va).)

(In the formula, R ⁶ and R ⁷ each independently represent a hydrogen atom, a halogen atom or a methyl group, and R ⁸ represents an alkoxy group having 1 to 20 carbon atoms, and the hydrogen atom in the alkoxy group represents a general formula. (It may be substituted by a substituent represented by (Vb), general formula (Vc) or general formula (Vd).)

Wherein R ⁸¹ , R ⁸² , R ⁸³ , R ⁸⁴ , R ⁸⁵ , R ⁸⁶ , R ⁸⁷ , R ⁸⁸ and R ⁸⁹ are each independently a hydrogen atom, a halogen atom or an alkyl group having 1 to 5 carbon atoms. And n represents 0 or 1.)

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