JP2009132780A - Resin composition for circuit board, insulating layer with supporting substrate, laminate, and circuit board - Google Patents

Resin composition for circuit board, insulating layer with supporting substrate, laminate, and circuit board Download PDF

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JP2009132780A
JP2009132780A JP2007308932A JP2007308932A JP2009132780A JP 2009132780 A JP2009132780 A JP 2009132780A JP 2007308932 A JP2007308932 A JP 2007308932A JP 2007308932 A JP2007308932 A JP 2007308932A JP 2009132780 A JP2009132780 A JP 2009132780A
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resin composition
resin
weight
circuit board
circuit boards
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Yasuo Shimobe
安雄 下邊
Toshiro Komiyakoku
壽郎 小宮谷
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Sumitomo Bakelite Co Ltd
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Sumitomo Bakelite Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a resin composition for circuit boards, an insulating layer with a supporting substrate, a laminate, and a circuit board, which are excellent in high flexibility and heat resistance against repeated thermal history. <P>SOLUTION: The resin composition for circuit boards contains a naphthalene type epoxy resin, a biphenyl aralkyl epoxy resin, a novolac phenolic resin, an amine curing agent, and a phosphoric ester amide. The content of the naphthalene type epoxy resin is 20-50 wt.% of the total resin composition. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、回路板用樹脂組成物、支持基材付き絶縁層、積層板及び回路板に関する。   The present invention relates to a resin composition for circuit boards, an insulating layer with a supporting substrate, a laminated board, and a circuit board.

フレキシブルプリント回路板は薄く、軽く、可とう性に優れることから、特に携帯電話、カメラモジュール、デジタルビデオカメラ、デジタルスチルカメラ、ノートパソコン、PDA、液晶ドライバーモジュールを始めとしてモバイル機器を中心に利用されているが、近年、これら電子機器の高性能化、小型化に伴いフレキシブルプリント回路板への配線の微細化、高密度実装化、可とう性などがますます要求されてきている。   Flexible printed circuit boards are thin, light, and flexible, so they are used mainly in mobile devices such as mobile phones, camera modules, digital video cameras, digital still cameras, notebook computers, PDAs, and LCD driver modules. However, in recent years, with the improvement in performance and miniaturization of these electronic devices, miniaturization of wiring on a flexible printed circuit board, high-density mounting, flexibility, and the like have been increasingly demanded.

例えば、携帯電話に使用されるフレキシブルプリント回路板は、クラムシェル型ではR=5mm以下のα巻きヒンジ部の連続開閉、スライドヒンジタイプでは部分がR=1mm以下の屈曲で連続摺動といった高屈曲性が求められる。   For example, the flexible printed circuit board used in mobile phones has a high flexion where the clamshell type is a continuous opening and closing of the α-winding hinge part with R = 5 mm or less, and the sliding hinge type part is a continuous sliding with a bending of R = 1 mm or less. Sex is required.

また、小型デジタル機器は高機能化に伴い、それに使われるフレキシブルプリント回路板は、片面、両面板から多層板になったり、電磁波シールド材や補強板を貼着したり、実装部品点数が多くなるため複数回の実装を行なったり、と繰り返し熱履歴を受けることから、複数回の耐熱履歴性が求められている。   In addition, as the functionality of small digital devices increases, the flexible printed circuit boards used for them will change from single-sided or double-sided boards to multi-layer boards, or adhere to electromagnetic shielding materials or reinforcing boards, increasing the number of mounting parts. For this reason, heat resistance history is required a plurality of times because mounting is performed a plurality of times or repeated heat history is received.

また、環境対応により鉛フリーはんだを用いた実装要求があり、これまでの鉛はんだに比べ15〜20℃実装温度が高くなり、これに伴いフレキシブルプリント回路板に高耐熱、高寸法安定性が求められている。   In addition, there is a demand for mounting using lead-free solder for environmental reasons, and the mounting temperature is 15-20 ° C higher than that of conventional lead solder. Accordingly, flexible printed circuit boards are required to have high heat resistance and high dimensional stability. It has been.

さらに、難燃剤としてもハロゲンを含まないことが要求されている。これまでは難燃剤は臭素化エポキシ樹脂を使用するのが一般的であったが(例えば特許文献1)、燃焼時にダイオキシンの発生が懸念されるため、ハロゲンフリー材料が求められている。   Furthermore, it is required that the flame retardant does not contain halogen. Until now, brominated epoxy resins have generally been used as flame retardants (for example, Patent Document 1). However, since there is concern about the generation of dioxins during combustion, halogen-free materials are required.

このように、高屈曲性と、繰返し熱履歴耐熱性を合わせ持ち、さらには高耐熱、高寸法安定性など多種多様な特性をすべて兼ね備えたフレキシブルプリント回路板の要求があるものの、すべての特性を兼ね備えたフレキシブルプリント回路板はないのが実情であった。   As described above, there is a demand for a flexible printed circuit board that has both high flexibility and repeated heat history heat resistance, as well as various characteristics such as high heat resistance and high dimensional stability. The actual situation is that there is no flexible printed circuit board.

以上、フレキシブルプリント回路板に関して説明してきたが、フレキシブルプリント回路板に限らず、例えば、極薄ガラス織布に樹脂を含浸させた極薄プリプレグを積層成型した積層板などに関しても、折り曲げての収納性、耐熱性、耐熱履歴性、寸法安定性など種々の特性を兼ね備えた積層板を用いた回路板が求められているという同じ課題があった。
特開2001−098243号公報
As described above, the flexible printed circuit board has been described. However, the invention is not limited to the flexible printed circuit board. For example, a laminated board obtained by laminating an ultrathin prepreg obtained by impregnating an ultrathin glass woven fabric with resin is folded and stored. There has been the same problem that a circuit board using a laminated board having various properties such as properties, heat resistance, heat history resistance, and dimensional stability is required.
JP 2001-098243 A

本発明は、上記事情に鑑みてなされたものであり、他の諸特性を維持しつつ、高屈曲性と繰返し熱履歴耐熱性のバランスに優れた、回路板用樹脂組成物、支持基材付き絶縁層、積層板及び回路板を提供することにある。   The present invention has been made in view of the above circumstances, and has a resin composition for circuit boards, with a supporting base material, which has excellent balance between high flexibility and repeated heat history heat resistance while maintaining other characteristics. An object is to provide an insulating layer, a laminate, and a circuit board.

本発明による回路板用樹脂組成物は、回路板に用いる樹脂組成物であって、ナフタレン型エポキシ樹脂と、ビフェニルアラルキル型エポキシ樹脂と、ノボラック型フェノール樹脂と、アミン系硬化剤と、リン酸エステルアミドと、を含有することを特徴とする。   A resin composition for a circuit board according to the present invention is a resin composition used for a circuit board, which is a naphthalene type epoxy resin, a biphenyl aralkyl type epoxy resin, a novolac type phenol resin, an amine curing agent, and a phosphate ester. And an amide.

これにより、高屈曲性、繰返し熱履歴耐熱性、に優れた回路基板用樹脂組成物とすることができる。   Thereby, it can be set as the resin composition for circuit boards excellent in high flexibility and repeated heat history heat resistance.

また、カルボン酸変性ニトリルブタジエンゴムをさらに含んでいてもよい。これによりポリイミド、銅箔両材料に対する密着性に優れた回路基板用樹脂組成物とすることができる。   Further, it may further contain a carboxylic acid-modified nitrile butadiene rubber. Thereby, it can be set as the resin composition for circuit boards excellent in the adhesiveness with respect to both polyimide and copper foil materials.

さらに、金属箔または樹脂フィルムからなる支持基材の少なくとも一方の面側に、回路板用樹脂組成物からなる絶縁層が形成された支持基材付き絶縁層を提供することができる。   Furthermore, the insulating layer with a supporting base material in which the insulating layer which consists of the resin composition for circuit boards was formed in the at least one surface side of the supporting base material which consists of metal foil or a resin film can be provided.

また、前記樹脂フィルムからなる支持基材の少なくとも一方の面側に、回路板用樹脂組成物からなる絶縁層を介して金属箔が積層形成された積層板としてもよいし、さらに、前記積層板の金属箔をエッチングにより導体回路を形成し、前記樹脂フィルムからなる支持基材の一方の面側に形成された回路板用樹脂組成物からなる絶縁層を介して前記導体回路を覆うように積層形成された回路板としてもよい。   Moreover, it is good also as a laminated board by which metal foil was laminated | stacked by the insulating layer which consists of a resin composition for circuit boards on the at least one surface side of the support base material which consists of the said resin film, and also the said laminated board A metal foil is etched to form a conductor circuit, and is laminated so as to cover the conductor circuit through an insulating layer made of a resin composition for circuit boards formed on one surface side of the support substrate made of the resin film. It is good also as a formed circuit board.

他の諸特性を維持しつつ、高屈曲性と繰返し熱履歴耐熱性のバランスに優れた、回路板用樹脂組成物、支持基材付き絶縁層、積層板及び回路板を提供することができる。   It is possible to provide a resin composition for circuit boards, an insulating layer with a supporting substrate, a laminated board, and a circuit board excellent in the balance between high flexibility and repeated heat history heat resistance while maintaining other characteristics.

以下、本発明の回路板用樹脂組成物、支持基材付き絶縁層、積層板及び回路板について詳細に説明する。   Hereinafter, the resin composition for circuit boards, the insulating layer with a supporting substrate, the laminate and the circuit board of the present invention will be described in detail.

本発明の回路板用樹脂組成物は、支持基材としてポリイミドフィルムなどの樹脂フィルムの片面に絶縁層を形成したカバーレイフィルムとして用いることや、樹脂フィルムの片面あるいは両面に回路板用樹脂組成物の絶縁層を形成し、金属箔と積層接着することによりフレキシブルプリント回路板用の積層板として用いることができる。   The resin composition for circuit boards of the present invention can be used as a coverlay film in which an insulating layer is formed on one side of a resin film such as a polyimide film as a supporting substrate, or a resin composition for circuit boards on one or both sides of the resin film. It can be used as a laminated board for flexible printed circuit boards by forming an insulating layer and laminating and bonding to a metal foil.

以下、本発明の回路板用樹脂組成物を構成する各成分について説明する。   Hereinafter, each component which comprises the resin composition for circuit boards of this invention is demonstrated.

本発明の回路板用樹脂組成物は、ナフタレン型エポキシ樹脂と、ビフェニルアラルキル型エポキシ樹脂と、ノボラック型フェノール樹脂と、アミン系硬化剤と、リン酸エステルアミドと、を含有する構成となっている。   The resin composition for circuit boards of the present invention comprises a naphthalene type epoxy resin, a biphenyl aralkyl type epoxy resin, a novolac type phenol resin, an amine curing agent, and a phosphoric ester amide. .

本発明の回路板用樹脂組成物は、ナフタレン型エポキシ樹脂と、ビフェニルアラルキル型エポキシ樹脂とを含む。これらのエポキシ樹脂は、分子内にベンゼン環が多く含む。これによる剛直な骨格は分子構造上、低吸水化の効果と難燃性、耐熱性の効果を得ることができる。   The resin composition for circuit boards of this invention contains a naphthalene type epoxy resin and a biphenyl aralkyl type epoxy resin. These epoxy resins contain many benzene rings in the molecule. The rigid skeleton by this can obtain the effect of low water absorption and the effects of flame retardancy and heat resistance on the molecular structure.

ナフタレン型エポキシ樹脂としては、下記化学式(1)で表されるエポキシ樹脂を用いることができる。   As the naphthalene type epoxy resin, an epoxy resin represented by the following chemical formula (1) can be used.

Figure 2009132780
Figure 2009132780

また、ビフェニルアラルキル型エポキシ樹脂としては、下記化学式(2)で表されるエポキシ樹脂を用いることができる。   Moreover, as a biphenyl aralkyl type epoxy resin, the epoxy resin represented by following Chemical formula (2) can be used.

Figure 2009132780
Figure 2009132780

ナフタレン型エポキシ樹脂の含有量は、樹脂組成物全体の20重量%以上、50重量%以下であることが好ましく、さらに好ましくは25重量%以上、40重量%以下である。ナフタレン型エポキシ樹脂の含有量がこの範囲にあれば回路板用樹脂組成物ワニスをフィルムに塗工・乾燥し、カバーレイフィルムを得た際に、粉落ち発生がない等のハンドリング性を損なうことなく高屈曲性と耐熱性を得ることができる。   The content of the naphthalene type epoxy resin is preferably 20% by weight or more and 50% by weight or less, more preferably 25% by weight or more and 40% by weight or less, based on the entire resin composition. If the content of naphthalene-type epoxy resin is within this range, the resin composition varnish for circuit boards is applied to the film and dried to impair handling properties such as no powder falling off when a coverlay film is obtained. High flexibility and heat resistance can be obtained.

また、ビフェニルアラルキル型エポキシ樹脂の含有量は、樹脂組成物全体の5重量%以上、45重量%以下であることが好ましく、さらに好ましくは10重量%以上、35重量%以下である。ビフェニルアラルキル型エポキシ樹脂の含有量がこの範囲にあれば高屈曲性と耐熱性、繰り返し耐熱履歴性を得ることができる。   Further, the content of the biphenyl aralkyl type epoxy resin is preferably 5% by weight or more and 45% by weight or less, more preferably 10% by weight or more and 35% by weight or less of the entire resin composition. If the content of the biphenyl aralkyl type epoxy resin is within this range, high flexibility, heat resistance, and repeated heat history can be obtained.

ナフタレン型エポキシ樹脂と、ビフェニルアラルキル型エポキシ樹脂との配合比率は、両エポキシ樹脂の合計を100重量%としたときに、ナフタレン型エポキシ樹脂は40重量%以上、90重量%以下が好ましく、さらに好ましくは50重量%以上、80重量%以下である。配合比率がこの範囲内にあれば回路板用樹脂組成物ワニスをフィルムに塗工・乾燥し、カバーレイフィルムを得た際に、粉落ち発生がない等のハンドリング性を損なうことなく高屈曲性と耐熱性、繰り返し耐熱履歴性に優れる。   The blending ratio of the naphthalene type epoxy resin and the biphenyl aralkyl type epoxy resin is preferably 40% by weight or more and 90% by weight or less, more preferably 90% by weight or less when the total of both epoxy resins is 100% by weight. Is 50% by weight or more and 80% by weight or less. If the blending ratio is within this range, the resin composition varnish for circuit boards is applied to the film and dried to obtain a coverlay film. Excellent heat resistance and repeated heat history.

また、上記の二官能エポキシ樹脂以外に、ビフェニル型、アントラセン型、キサンテン型、ジシクロペンタジエン型またはビスフェノールS型の何れかを一種類以上含んでいてもよい。これにより、剛直な骨格は分子構造上低吸水化の効果と難燃性、耐熱性の効果を得ることができる。   In addition to the bifunctional epoxy resin, one or more of biphenyl type, anthracene type, xanthene type, dicyclopentadiene type, or bisphenol S type may be included. Thereby, the rigid skeleton can obtain the effect of reducing water absorption and the effect of flame retardancy and heat resistance on the molecular structure.

本発明の回路板用樹脂組成物は、ノボラック型フェノール樹脂を含む。ノボラックフェノール樹脂としては、特に限定されないがアミノトリアジンノボラック型フェノール樹脂であることが好ましい。アミノ基が存在することで塗工時の熱により一部のエポキシ基の反応が起こりBステージ化する。これにより積層プレス時の染み出しが抑えられる。   The resin composition for circuit boards of the present invention contains a novolac type phenol resin. Although it does not specifically limit as a novolak phenol resin, It is preferable that it is an aminotriazine novolak type phenol resin. Due to the presence of amino groups, some of the epoxy groups react with the heat during coating, resulting in a B-stage. Thereby, seepage at the time of lamination press is suppressed.

さらには、トリアジン部の窒素が難燃性に寄与する。ノボラックフェノール樹脂の含有量は、特に限定されないが、本発明に含まれる総エポキシ基に対して0.6から1.2当量を含むことが好ましい。さらに好ましくは0.7から1.1当量である。当量が0.6以下であると硬化不足となり、1.2以上になると硬化収縮に伴う反りが発生しやすくなる。アミノトリアジンノボラック型フェノール樹脂としては、例えば下記化学式(3)で表されるノボラック型フェノール樹脂を用いることができる。   Furthermore, nitrogen in the triazine part contributes to flame retardancy. Although content of novolak phenol resin is not specifically limited, It is preferable to contain 0.6 to 1.2 equivalent with respect to the total epoxy group contained in this invention. More preferably, it is 0.7 to 1.1 equivalent. When the equivalent is 0.6 or less, curing is insufficient, and when it is 1.2 or more, warpage associated with curing shrinkage tends to occur. As the aminotriazine novolac type phenol resin, for example, a novolac type phenol resin represented by the following chemical formula (3) can be used.

Figure 2009132780
Figure 2009132780

ノボラック型フェノール樹脂の含有量は、樹脂組成物全体の20重量%以上、40重量%以下であることが好ましく、さらに好ましくは25重量%以上、35重量%以下である。   The content of the novolak type phenol resin is preferably 20% by weight or more and 40% by weight or less, more preferably 25% by weight or more and 35% by weight or less based on the entire resin composition.

ノボラック型フェノール樹脂の含有量がこの範囲にあれば積層プレス時の染み出しを抑えることができる。   If the content of the novolak-type phenol resin is within this range, it is possible to suppress the seepage during lamination pressing.

本発明の回路板用樹脂組成物は、アミン系硬化剤を含む。アミン系硬化剤としては、ジアミノジフェニルメタン、ジアミノジエチルジフェニルメタン、メタフェニレンジアミン、ジアミノジフェニルスルホン、イソフォロンジアミン、ノルボルネンジアミンなどが挙げられる。アミノ基が存在することで塗工時の熱によりノボラック型フェノール樹脂と一部のエポキシ基の反応を促進させBステージ化する。これにより積層プレス時の染み出しが抑えられる。さらにはポリイミド等の基材フィルムに対して優れた密着性を得ることができ、繰り返し熱履歴性にも優れる。   The resin composition for circuit boards of the present invention contains an amine curing agent. Examples of the amine curing agent include diaminodiphenylmethane, diaminodiethyldiphenylmethane, metaphenylenediamine, diaminodiphenylsulfone, isophoronediamine, norbornenediamine, and the like. The presence of the amino group promotes the reaction of the novolac type phenolic resin and a part of the epoxy groups by the heat at the time of coating, thereby forming a B stage. Thereby, seepage at the time of lamination press is suppressed. Furthermore, it is possible to obtain excellent adhesion to a substrate film such as polyimide, and it is also excellent in repeated heat history.

アミン系硬化剤の含有量は、特に限定されないが、樹脂組成物全体の0.1重量%以上、5重量%以下が好ましく、0.5重量%以上、3重量%以下がより好ましい。含有量がこの範囲内にあると高屈曲性と耐熱性、耐熱履歴性を得ることができる。アミン系硬化剤としては、下記化学式(4)で表されるアミン系硬化剤を用いることができる。   Although content of an amine hardening | curing agent is not specifically limited, 0.1 to 5 weight% of the whole resin composition is preferable, and 0.5 to 3 weight% is more preferable. When the content is within this range, high flexibility, heat resistance, and heat history can be obtained. As the amine curing agent, an amine curing agent represented by the following chemical formula (4) can be used.

Figure 2009132780
Figure 2009132780

本発明の回路板用樹脂組成物は、リン酸エステルアミドを含む。リン酸エステルアミドは、ハロゲンを含まない難燃剤として有効である。一般的なリン化合物であるリン酸エステルと比べ加水分解性が小さいことから耐吸湿半田耐熱性が向上し、耐マイグレーション性(絶縁信頼性)が低下しない特長がある。   The resin composition for circuit boards of this invention contains phosphoric ester amide. Phosphoric ester amide is effective as a flame retardant containing no halogen. Compared to phosphoric acid esters, which are general phosphorus compounds, the hydrolytic property is small, so that the heat resistance of moisture-absorbing solder is improved and the migration resistance (insulation reliability) is not lowered.

リン酸エステルアミドの含有量は、回路板用樹脂組成物全体の5重量%以上、30重量%以下であることが好ましい。さらに好ましくは7重量%以上、25重量%以下である。含有量がこの範囲内であれば物性を損なうことがなく難燃性を付与できる。リン酸エステルアミドのリン含有量は5mol%以上、15mol%以下の一般的なものが使用できる。リン酸エステルアミドとしては、例えば下記化学式(5)で表されるものが用いられる。   The content of phosphoric ester amide is preferably 5% by weight or more and 30% by weight or less based on the entire resin composition for circuit boards. More preferably, it is 7 to 25 weight%. If the content is within this range, flame retardancy can be imparted without impairing physical properties. A phosphorous ester amide having a phosphorus content of 5 mol% or more and 15 mol% or less can be used. As phosphate ester amide, what is represented, for example by following Chemical formula (5) is used.

Figure 2009132780
Figure 2009132780

本発明の回路板用樹脂組成物は、カルボン酸変性ニトリルブタジエンゴムをさらに含んでいてもよい。カルボン酸変性ニトリルブタジエンゴムは、樹脂フィルム、金属箔の両材料に対して密着力向上に有効である。   The circuit board resin composition of the present invention may further contain a carboxylic acid-modified nitrile butadiene rubber. Carboxylic acid-modified nitrile butadiene rubber is effective in improving adhesion to both materials of resin film and metal foil.

カルボン酸変性ニトリルブタジエンゴムの含有量は、回路板用樹脂組成物全体の3重量%以上、20重量%以下が好ましい。さらに好ましくは5重量%以上、15重量%以下である。含有量が下限以上であれば、密着性向上、ハンドリング性向上にすぐれ、上限以下であれば耐熱性、特に複数回プレスなどの耐熱履歴性に優れる。   The content of the carboxylic acid-modified nitrile butadiene rubber is preferably 3% by weight or more and 20% by weight or less based on the total resin composition for circuit boards. More preferably, it is 5 to 15 weight%. When the content is at least the lower limit, the adhesion and handling properties are improved. When the content is not more than the upper limit, the heat resistance, in particular, the heat history characteristics such as multiple presses is excellent.

本発明の回路板用樹脂組成物は、上記以外の成分を含んでいても良い。たとえば、金属箔や回路板との密着力の向上、耐湿性の向上のためにエポキシシラン等のシランカップリング剤あるいはチタネート系カップリング剤、消泡剤、表面調整剤などの添加剤やイミダゾール化合物やトリフェニルホスフィンなどの硬化促進剤を含んでいてもよい。   The resin composition for circuit boards of the present invention may contain components other than those described above. For example, additives such as silane coupling agents such as epoxy silane or titanate coupling agents, antifoaming agents, surface conditioning agents, and imidazole compounds to improve adhesion to metal foils and circuit boards and moisture resistance And a curing accelerator such as triphenylphosphine may be included.

次に、本発明の支持基材付き絶縁層について説明する。   Next, the insulating layer with a supporting substrate of the present invention will be described.

支持基材付き絶縁層は、金属箔または樹脂フィルムからなる支持基材の少なくとも一方の面側に、回路板用樹脂組成物からなる絶縁層が形成されたものである。   The insulating layer with a supporting substrate is obtained by forming an insulating layer made of a resin composition for circuit boards on at least one surface side of a supporting substrate made of a metal foil or a resin film.

樹脂フィルムを支持基材として用いた支持基材付き絶縁層は、回路板に設けられた導体回路の表面を被覆、保護するために用いられ、特に、フレキシブル回路板ではカバーレイフィルムとして用いられている。また、金属箔を支持基材として使った支持基材付き絶縁層は、RCC(Resin Coated Copper)として用いてもよい。これは、多層回路板のビルドアップ材料として用いることもできる。   An insulating layer with a supporting substrate using a resin film as a supporting substrate is used to cover and protect the surface of a conductor circuit provided on a circuit board, and in particular, as a coverlay film in a flexible circuit board. Yes. Moreover, you may use the insulating layer with a support base material which used metal foil as a support base material as RCC (Resin Coated Copper). This can also be used as a build-up material for multilayer circuit boards.

樹脂フィルムの片面にワニスとして塗布、乾燥して絶縁層が設けられたカバーレイフィルムは、上記の回路板用樹脂組成物を所定の溶剤に、所定の濃度で溶解したワニスを樹脂フィルムに塗工後80℃以上、200℃以下の乾燥を行って作製する。乾燥後の回路板用樹脂組成物の厚みについては、用途によって10μm以上、100μm以下の範囲になるように塗工する。カバーレイフィルムの場合は乾燥後にその樹脂組成物面にポリエチレンテレフタレートやポリエチレン、ポリプロピレンなどのフィルムを異物混入防止などの目的で離型フィルムとして使用してもよい。   The cover lay film, which is coated as a varnish on one side of a resin film and dried to provide an insulating layer, is coated with a varnish dissolved in a prescribed concentration in the above resin composition for circuit boards. After that, drying is performed at 80 ° C. or higher and 200 ° C. or lower. About the thickness of the resin composition for circuit boards after drying, it coats so that it may become the range of 10 micrometers or more and 100 micrometers or less by a use. In the case of a coverlay film, a film such as polyethylene terephthalate, polyethylene, or polypropylene may be used as a release film on the surface of the resin composition after drying for the purpose of preventing foreign matter from entering.

ワニスに用いられる溶剤としては、樹脂組成物に対し良好な溶解性を持つものを選択することが好ましい。例えば、アセトン、メチルエチルケトン、トルエン、キシレン、n−ヘキサン、メタノール、エタノール、メチルセルソルブ、エチルセルソルブ、ブチルセロソルブ、メトキシプロパノール、シクロヘキサノン、N−メチルピロリドン、ジメチルホルムアミド、ジメチルアセトアミドなどのうち一種または二種以上の混合系を使用することが可能である。   As the solvent used for the varnish, it is preferable to select a solvent having good solubility in the resin composition. For example, one or two of acetone, methyl ethyl ketone, toluene, xylene, n-hexane, methanol, ethanol, methyl cellosolve, ethyl cellosolve, butyl cellosolve, methoxypropanol, cyclohexanone, N-methylpyrrolidone, dimethylformamide, dimethylacetamide, etc. It is possible to use the above mixed system.

樹脂フィルムとしては、例えばポリイミド樹脂フィルム、ポリエーテルイミド樹脂フィルム、ポリアミドイミド樹脂フィルム等のポリイミド系樹脂フィルム、ポリアミド樹脂フィルム等のポリアミド系樹脂フィルム、ポリエステル樹脂フィルム等のポリエステル系樹脂フィルムが挙げられる。このうち、弾性率と耐熱性を向上させる観点から、特にポリイミド系樹脂フィルムが好ましく用いられる。   Examples of the resin film include polyimide resin films such as polyimide resin films, polyetherimide resin films and polyamideimide resin films, polyamide resin films such as polyamide resin films, and polyester resin films such as polyester resin films. Among these, a polyimide resin film is particularly preferably used from the viewpoint of improving the elastic modulus and heat resistance.

樹脂フィルムの厚さは、特に限定されないが、5μm以上50μm以下が好ましく、さらに好ましくは5μm以上25μm以下である。厚さがこの範囲内であると、特に屈曲性に優れる。   Although the thickness of a resin film is not specifically limited, 5 micrometers or more and 50 micrometers or less are preferable, More preferably, they are 5 micrometers or more and 25 micrometers or less. When the thickness is within this range, the flexibility is particularly excellent.

金属箔を使った支持基材付き絶縁層(RCF)は、上述のカバーレイフィルムと同様に、回路板用樹脂組成物を所定の溶剤に、所定の濃度で溶解したワニスを金属箔に塗工後80℃以上、200℃以下の乾燥を行って作製する。乾燥後の回路板用樹脂組成物の厚みについては、用途によって8μm以上50μm以下の範囲になるように塗工する。RCFの場合も乾燥後にその回路板用樹脂組成物面にポリエチレンテレフタレートやポリエチレン、ポリプロピレンなどのフィルムを異物混入防止などの理由で離型フィルムとして使用してもよい。   Insulating layer (RCF) with a supporting substrate using metal foil is applied to metal foil with a resin composition for circuit boards dissolved in a predetermined solvent and a predetermined concentration in the same manner as the coverlay film described above. After that, drying is performed at 80 ° C. or higher and 200 ° C. or lower. About the thickness of the resin composition for circuit boards after drying, it coats so that it may become the range of 8 micrometers or more and 50 micrometers or less by a use. Also in the case of RCF, a film such as polyethylene terephthalate, polyethylene, or polypropylene may be used as a release film on the circuit board resin composition after drying for the purpose of preventing foreign matter from entering.

金属箔を構成する金属としては、例えば銅および銅系合金、アルミおよびアルミ系合金、鉄および鉄系合金等が挙げられ、銅がより好ましい。   Examples of the metal constituting the metal foil include copper and a copper-based alloy, aluminum and an aluminum-based alloy, iron and an iron-based alloy, and copper is more preferable.

金属箔の厚さは、特に限定されないが、6μm以上70μm以下が好ましく、特に9μm以上18μm以下が好ましい。厚さがこの範囲内であると、特に屈曲性、耐折性に優れる。 ワニスに用いる溶剤としては、前述したカバーレイフィルムに用いた溶剤と同様のものを適宜選択すればよい。   Although the thickness of metal foil is not specifically limited, 6 micrometers or more and 70 micrometers or less are preferable, and 9 micrometers or more and 18 micrometers or less are especially preferable. When the thickness is within this range, the flexibility and folding resistance are particularly excellent. What is necessary is just to select suitably the solvent similar to the solvent used for the coverlay film mentioned above as a solvent used for a varnish.

次に、本発明の積層板について説明する。   Next, the laminated board of this invention is demonstrated.

積層板は、前記樹脂フィルムからなる支持基材の少なくとも一方の面側に、回路板用樹脂組成物からなる絶縁層を介して金属箔が積層形成されている。   In the laminated plate, a metal foil is laminated and formed on at least one surface side of the supporting substrate made of the resin film via an insulating layer made of a resin composition for circuit boards.

積層板は、基材の片面または両面にワニスを塗工し乾燥後、熱圧着ロールなどによって金属箔を樹脂組成物面に積層して作製される。   The laminate is prepared by applying a varnish on one or both sides of a base material and drying it, and then laminating a metal foil on the resin composition surface by a thermocompression roll or the like.

上記金属箔を構成する金属としては、例えば銅および銅系合金、アルミおよびアルミ系合金、鉄および鉄系合金等が挙げられ、銅がより好ましい。   Examples of the metal constituting the metal foil include copper and a copper-based alloy, aluminum and an aluminum-based alloy, iron and an iron-based alloy, and copper is more preferable.

また、基材としては、絶縁性フィルムなどが挙げられ、樹脂フィルムとしては、例えばポリイミド樹脂フィルム、ポリエーテルイミド樹脂フィルム、ポリアミドイミド樹脂フィルム等のポリイミド系樹脂フィルム、ポリアミド樹脂フィルム等のポリアミド系樹脂フィルム、ポリエステル樹脂フィルム等のポリエステル系樹脂フィルムが挙げられる。このうち、弾性率と耐熱性を向上させる観点から、特にポリイミド系樹脂フィルムが好ましく用いられる。また、基材として、ガラス織布、ガラス不織布、ポリエステル不織布等の基材に回路板用樹脂組成物を含浸させたプリプレグに金属箔を積層接着してもよい。   Examples of the base material include an insulating film. Examples of the resin film include a polyimide resin film such as a polyimide resin film, a polyetherimide resin film, and a polyamideimide resin film, and a polyamide resin such as a polyamide resin film. Examples thereof include polyester resin films such as films and polyester resin films. Among these, a polyimide resin film is particularly preferably used from the viewpoint of improving the elastic modulus and heat resistance. Further, as a base material, a metal foil may be laminated and bonded to a prepreg obtained by impregnating a base material such as a glass woven fabric, a glass nonwoven fabric, or a polyester nonwoven fabric with a resin composition for circuit boards.

ワニスに用いる溶剤としては、前述したカバーレイフィルムに用いた溶剤と同様のものを適宜選択すればよい。   What is necessary is just to select suitably the solvent similar to the solvent used for the coverlay film mentioned above as a solvent used for a varnish.

次に、本発明の回路板について説明する。   Next, the circuit board of the present invention will be described.

本発明の回路板は、積層板の金属箔をエッチングにより導体回路を形成し、樹脂フィルムからなる支持基材の一方の面側に回路板用樹脂組成物からなる絶縁層(カバーレイフィルム)を介して導体回路を覆うように積層形成される。上記のカバーレイフィルムは、必要としない部分をあらかじめ除去しておく。除去する方法としては、例えば、金型等を用いて打ち抜いたり、NCドリルやNCルータ等でドリル加工したりしてもよい。作業性、生産性の面から金型を用いて打ち抜くことが好ましい。そして、導体回路の必要な部分にカバーレイフィルムを積層し、熱圧成形装置により圧着する等の方法を用いることができる。この場合、圧着条件は、例えば、圧着温度80℃以上、220℃以下、圧着圧力0.2MPa以上、10MPa以下とすることができる。   In the circuit board of the present invention, a conductive circuit is formed by etching a metal foil of a laminated board, and an insulating layer (cover lay film) made of a resin composition for circuit boards is formed on one surface side of a support base made of a resin film. And are formed so as to cover the conductor circuit. In the above coverlay film, unnecessary portions are removed in advance. As a removing method, for example, it may be punched out using a mold or the like, or drilled with an NC drill, NC router or the like. From the viewpoint of workability and productivity, it is preferable to punch using a mold. And a method of laminating a coverlay film on a necessary part of a conductor circuit, and carrying out pressure bonding with a hot-pressure forming device can be used. In this case, the pressure bonding conditions can be, for example, a pressure bonding temperature of 80 ° C. or higher and 220 ° C. or lower and a pressure bonding pressure of 0.2 MPa or higher and 10 MPa or lower.

以下、本発明を実施例及び比較例により説明するが、本発明はこれに限定されるものではない。   Hereinafter, although an example and a comparative example explain the present invention, the present invention is not limited to this.

(実施例1)
エポキシ樹脂としてナフタレン型エポキシ樹脂(大日本インキ化学工業(株)社製:EPICLON HP−4032D、エポキシ当量 140)34重量部、ビフェニルアラルキル型エポキシ樹脂(日本化薬(株)社製:NC−3000H、エポキシ当量 290)14重量部、硬化剤として化学式3で示したアミノトリアジンノボラック型フェノール樹脂(大日本インキ化学工業(株)社製:フェノライトLA7054、水酸基当量 125)を29重量部、アミン系硬化剤(日本化薬(株)社製:KAYAHARD A−A)1重量部、化学式5で示したリン酸エステルアミド(四国化成製:SP−703)を含有する難燃剤を10重量部、カルボン酸変性NBR(日本ゼオン(株)社製:レビタル1072J)9重量部、カップリング剤(モンメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社製:SILQUEST A−187 SILANE)を3重量部、これらをMEK及びシクロヘキサノンとの混合溶剤に樹脂固形分が50%となるように溶解した。
Example 1
34 parts by weight of naphthalene type epoxy resin (Dainippon Ink & Chemicals, Inc .: EPICLON HP-4032D, epoxy equivalent 140) as an epoxy resin, biphenyl aralkyl type epoxy resin (Nippon Kayaku Co., Ltd .: NC-3000H) , Epoxy equivalent 290) 14 parts by weight, 29 parts by weight of an aminotriazine novolak type phenol resin (Dainippon Ink & Chemicals, Inc .: Phenolite LA7054, hydroxyl group equivalent 125) represented by Chemical Formula 3 as a curing agent, amine series 1 part by weight of a curing agent (Nippon Kayaku Co., Ltd .: KAYAHARD A-A), 10 parts by weight of a flame retardant containing phosphoric ester amide (Shikoku Kasei: SP-703) represented by Chemical Formula 5, 9 parts by weight of acid-modified NBR (manufactured by Nippon Zeon Co., Ltd .: Levital 1072J), coupling agent ( Nmentibu Performance Materials Japan LLC made: 3 parts by weight of SILQUEST A-187 SILANE), these resin solids in a mixed solvent of MEK and cyclohexanone were dissolved to be 50%.

この配合物ワニスを厚み12.5μmのポリイミドフィルムの片面に回路板用樹脂組成物の厚みが乾燥後、10μmとなるようにコンマロールコーターで塗工、120℃5分+150℃5分で乾燥し、次いで圧延銅箔(福田金属箔工業製 18μm厚)を150℃で熱ロールによってラミネート後、反対面にも同様にワニスを塗工、乾燥、圧延銅箔をラミネートした。このものを180℃1時間硬化してフレキシブルプリント回路板用の銅張積層板を得た。   This compound varnish was coated on a single side of a polyimide film having a thickness of 12.5 μm with a comma roll coater so that the thickness of the resin composition for circuit boards was 10 μm, and dried at 120 ° C. for 5 minutes + 150 ° C. for 5 minutes. Then, a rolled copper foil (18 μm thick, manufactured by Fukuda Metal Foil Industry Co., Ltd.) was laminated by a hot roll at 150 ° C., and then the varnish was coated on the opposite side, dried, and the rolled copper foil was laminated. This was cured at 180 ° C. for 1 hour to obtain a copper clad laminate for a flexible printed circuit board.

これを通常の回路作製工程(穴あけ、メッキ、DFRラミネート、露光・現像、エッチング、DFR剥離)にて所定の回路を作製し評価用基板を得た。   A predetermined circuit was produced from this by a normal circuit production process (drilling, plating, DFR lamination, exposure / development, etching, DFR peeling) to obtain a substrate for evaluation.

さらには同配合物ワニスを厚み12.5μmのポリイミドフィルムの片面に回路板用樹脂組成物の厚みが乾燥後、20μmとなるようにコンマロールコーターで塗工、120℃5分+150℃5分で乾燥しカバーレイフィルムを得た。このカバーレイフィルムの所定位置に開孔部を設け、先に作製した評価用基板の両面の所定位置に160℃1時間の真空プレスにて貼り付けて評価用のフレキシブルプリント回路板を作製した。   Furthermore, the same composition varnish was coated on one side of a polyimide film having a thickness of 12.5 μm with a comma roll coater so that the thickness of the resin composition for circuit boards was 20 μm, and 120 ° C. for 5 minutes + 150 ° C. for 5 minutes. It dried and the coverlay film was obtained. An opening was provided at a predetermined position of the cover lay film, and a flexible printed circuit board for evaluation was manufactured by attaching it to a predetermined position on both sides of the previously prepared evaluation substrate with a vacuum press at 160 ° C. for 1 hour.

次に表1に示した配合にて実施例1と同様にして評価用のフレキシブルプリント回路板を作製した。   Next, a flexible printed circuit board for evaluation was produced in the same manner as in Example 1 with the formulation shown in Table 1.

このようにして得られたフレキシブルプリント回路板の成形性、密着力、繰返し熱履歴耐熱性、電気絶縁性、屈曲性、耐折性、難燃性、ハンドリング性を測定し、その結果を表1に示す。   The flexible printed circuit board thus obtained was measured for formability, adhesion, heat history heat resistance, electrical insulation, bendability, folding resistance, flame resistance, and handling properties, and the results are shown in Table 1. Shown in

Figure 2009132780
Figure 2009132780

Figure 2009132780
Figure 2009132780

*成形性
測定用端子を露出させる為に打ち抜いたカバーレイフィルム端部からの最大染み出し量が0.2mm以下で且つ回路間などの埋め込み不良によるボイドが無いかを観察しボイドの無かったものを○とした。
*密着力
JIS規格C5016−8.1に順ずる。密着力が1.0N/mm以上を◎、0.6N/mm以上1.0N/mm未満を○、0.4N/mm以上0.6N/mm未満を△、0.4N/mm未満を×とした。
*繰返し熱履歴耐熱性
得られたフレキシブルプリント回路板を180℃、2MPa、1時間の条件で真空プレスを3回繰返し行い、試験片のピール強度を測定した。ピール強度が0.5N/mm以上であれば○とし、0.3N/mm以下を△とし0.1N/mm未満を×とした。
*電気絶縁性
回路幅及び回路間幅をそれぞれ50μmとした櫛型パターンを用い、初期状態および85℃85%50V1000時間処理後の絶縁抵抗値を測定した。初期値、処理後共に絶縁抵抗値が10以上あったものを○とした。
*屈曲性
IPC法に準じる。R=2mm、1000rpm、ストローク15mmで屈曲回数が1千万回以上のものを◎、500万回以上1千万回未満のものを○、10万回以上500万回未満のものを△、10万回に満たなかったものを×とした。
*耐折性
幅1cmに回路幅及び回路間幅をそれぞれ100μmとした両面板を回路に対して直交方向に180°折り曲げては開き、再度同じ部位を折り曲げては開く。これを繰返し行い、導通抵抗値の変化率が初期値に比べ1%未満を◎、1%以上5%未満を○、5%以上10%未満を△、10%以上を×とした。
*難燃性
UL法に基づき評価した。V−0もしくはVTM−0を◎、V−1もしくはVTM−1を○、それ以下を×とした。
*ハンドリング性(カバーレイとして)
粉落ちがなく、50℃に加熱した銅張り板に得られたカバーレイを貼り付け、剥離、再貼り付けが可能なものを○とした。
* Formability: The maximum amount of protrusion from the edge of the coverlay film punched out to expose the measurement terminals was 0.2 mm or less, and there were no voids due to embedment defects such as between circuits. Was marked as ○.
* Adhesive strength Conforms to JIS standard C5016-8.1. Adhesive strength is 1.0 N / mm or more ◎, 0.6 N / mm or more and less than 1.0 N / mm ○, 0.4 N / mm or more and less than 0.6 N / mm △, less than 0.4 N / mm × It was.
* Repeated heat history heat resistance The obtained flexible printed circuit board was repeatedly subjected to vacuum press three times under the conditions of 180 ° C., 2 MPa, and 1 hour, and the peel strength of the test piece was measured. When the peel strength was 0.5 N / mm or more, it was evaluated as ◯, 0.3 N / mm or less as Δ, and less than 0.1 N / mm as x.
* Electrical insulation Using a comb-shaped pattern with a circuit width and an inter-circuit width of 50 μm, the initial state and the insulation resistance value after treatment at 85 ° C. and 85% for 50 V for 1000 hours were measured. A sample having an insulation resistance value of 10 8 or more both after the initial value and after the treatment was evaluated as ◯.
* Flexibility Conforms to the IPC method. R = 2 mm, 1000 rpm, stroke 15 mm, the number of flexing times is 10 million times or more, ◎, 5 million times to less than 10 million times ○, 100,000 times to less than 5 million times △, 10 What was less than 10,000 times was set as x.
* Folding resistance A double-sided board with a circuit width of 1 cm and a circuit width of 100 μm is folded by 180 ° in the direction perpendicular to the circuit and opened, and the same part is folded and opened again. By repeating this, the change rate of the conduction resistance value was less than 1% compared to the initial value, ◎, 1% to less than 5%, %, 5% to less than 10%, %, and 10% or more to ×.
* Flame retardance Evaluated based on UL method. V-0 or VTM-0 was marked with ◎, V-1 or VTM-1 was marked with ◯, and the others were marked with x.
* Handling (as coverlay)
A coverlay obtained by attaching a coverlay obtained on a copper-clad plate heated to 50 ° C. without causing powder falling off was marked with “◯”.

上記の結果より、実施例1〜18の回路板用樹脂組成物から得られたフレキシブルプリント回路板はいずれも、成形性、密着力、繰返し熱履歴耐熱性、屈曲性、耐折性などにおいても良好な結果が得られた。   From the above results, the flexible printed circuit boards obtained from the resin compositions for circuit boards of Examples 1 to 18 are all in moldability, adhesion, repeated heat history heat resistance, flexibility, folding resistance and the like. Good results were obtained.

Claims (12)

ナフタレン型エポキシ樹脂と、
ビフェニルアラルキル型エポキシ樹脂と、
ノボラック型フェノール樹脂と、
アミン系硬化剤と、
リン酸エステルアミドと、
を含有することを特徴とする回路板用樹脂組成物。
Naphthalene type epoxy resin,
Biphenyl aralkyl epoxy resin,
Novolac type phenolic resin,
An amine-based curing agent;
Phosphoric ester amide,
A resin composition for circuit boards, comprising:
前記ナフタレン型エポキシ樹脂と、前記ビフェニルアラルキル型エポキシ樹脂との配合比率は、両エポキシ樹脂の合計を100重量%としたとき、前記ナフタレン型エポキシ樹脂が40重量%以上、90重量%以下である請求項1に記載の回路板用樹脂組成物。   The blending ratio of the naphthalene type epoxy resin and the biphenyl aralkyl type epoxy resin is 40% by weight or more and 90% by weight or less of the naphthalene type epoxy resin when the total of both epoxy resins is 100% by weight. Item 2. The resin composition for circuit boards according to Item 1. 前記回路板用樹脂組成物の硬化物は、25℃での貯蔵弾性率が1GPa以上である請求項1または2に記載の回路板用樹脂組成物。   The resin composition for circuit boards according to claim 1 or 2, wherein the cured product of the resin composition for circuit boards has a storage elastic modulus at 25 ° C of 1 GPa or more. 前記ナフタレン型エポキシ樹脂の含有量は、樹脂組成物全体の20重量%以上、50重量%以下である請求項1ないし3のいずれかに記載の回路板用樹脂組成物。   4. The circuit board resin composition according to claim 1, wherein a content of the naphthalene type epoxy resin is 20% by weight or more and 50% by weight or less of the entire resin composition. 5. 前記ビフェニルアラルキル型エポキシ樹脂の含有量は、樹脂組成物全体の5重量%以上、45重量%以下である請求項1ないし4のいずれかに記載の回路板用樹脂組成物。   5. The resin composition for a circuit board according to claim 1, wherein the content of the biphenyl aralkyl type epoxy resin is 5% by weight or more and 45% by weight or less of the entire resin composition. 前記ノボラック型フェノール樹脂がアミノトリアジンノボラック型フェノール樹脂またはアミノトリアジンクレゾールノボラック型フェノール樹脂である請求項1ないし5のいずれかに記載の回路板用樹脂組成物。   6. The circuit board resin composition according to claim 1, wherein the novolac type phenol resin is an aminotriazine novolac type phenol resin or an aminotriazine cresol novolac type phenol resin. 前記リン酸エステルアミドの含有量は、樹脂組成物全体の5重量%以上、30重量%以下である請求項1ないし6のいずれかに記載の回路板用樹脂組成物。   The circuit board resin composition according to any one of claims 1 to 6, wherein a content of the phosphoric ester amide is 5% by weight or more and 30% by weight or less of the entire resin composition. カルボン酸変性ニトリルブタジエンゴムをさらに含む請求項1ないし7のいずれかに記載の回路板用樹脂組成物。   The resin composition for circuit boards according to any one of claims 1 to 7, further comprising a carboxylic acid-modified nitrile butadiene rubber. 前記カルボン酸変性ニトリルブタジエンゴムの含有量は、樹脂組成物全体の3重量%以上、20重量%以下である請求項8に記載の回路板用樹脂組成物。   The resin composition for a circuit board according to claim 8, wherein the content of the carboxylic acid-modified nitrile butadiene rubber is 3% by weight or more and 20% by weight or less of the entire resin composition. 金属箔または樹脂フィルムからなる支持基材の少なくとも一方の面側に、請求項1ないし9のいずれかに記載の回路板用樹脂組成物からなる絶縁層が形成された支持基材付き絶縁層。   The insulating layer with a supporting base material in which the insulating layer which consists of the resin composition for circuit boards in any one of Claim 1 thru | or 9 was formed in the at least one surface side of the supporting base material which consists of metal foil or a resin film. 請求項10に記載の樹脂フィルムからなる支持基材の少なくとも一方の面側に、回路板用樹脂組成物からなる絶縁層を介して金属箔が積層形成された積層板。   The laminated board by which metal foil was laminated | stacked and formed on the at least one surface side of the support base material which consists of a resin film of Claim 10 via the insulating layer which consists of a resin composition for circuit boards. 請求項11に記載の積層板の金属箔をエッチングにより導体回路を形成するとともに、樹脂フィルムからなる支持基材の一方の面側に形成された回路板用樹脂組成物からなる絶縁層を介して前記導体回路を覆うように積層形成された回路板。   A conductive circuit is formed by etching the metal foil of the laminated board according to claim 11, and an insulating layer made of a resin composition for a circuit board formed on one surface side of a support base made of a resin film is provided. A circuit board laminated to cover the conductor circuit.
JP2007308932A 2007-11-29 2007-11-29 Resin composition for circuit board, insulating layer with supporting substrate, laminate, and circuit board Pending JP2009132780A (en)

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