JP2008298845A - Drawing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a drawing device that can reduce the time required for assembling or maintenance of the device as well as load and cost for adjusting each optical component and easily increase or decrease the number of irradiation beams. <P>SOLUTION: A plurality of optical components to irradiate an upper face of a substrate 9 with pulse beams are integrated as irradiation units 40 for each pulse beam. The positions and the optical axes of the plurality of optical components are adjusted in advance for each irradiation unit 40, and the adjusted irradiation units 40 are mounted on a device. This means no adjustment is required for the plurality of optical components on the device, and the time required for assembling and maintenance of a pattern drawing device 1 can be reduced. Since high accuracy adjustment is required as the entire irradiation units 40, load and cost of adjustment on each optical component can be reduced. By increasing or decreasing the number of irradiation units 40, the number of irradiation beams can be easily increased or decreased. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention provides a plurality of light beams for a substrate such as a color filter substrate, a glass substrate for a flat panel display (FPD) such as a liquid crystal display device or a plasma display device, a semiconductor substrate, or a printed board. The present invention relates to a drawing apparatus that draws a plurality of patterns on a photosensitive material formed on a substrate by simultaneously irradiating.

  In the substrate manufacturing process, a drawing apparatus is used that draws a predetermined pattern on the surface of the substrate by simultaneously irradiating the surface of the substrate coated with a photosensitive material with a plurality of lights. A conventional drawing apparatus includes a stage that moves while holding the substrate in a horizontal posture, and a plurality of irradiation units that irradiate a predetermined pattern light on the upper surface of the substrate. From the plurality of irradiation units while moving the substrate Each pattern light is irradiated to draw a regular pattern on the upper surface of the substrate.

  A plurality of irradiating units of the drawing apparatus includes a homogenizer for homogenizing the profile of light supplied from the light source, an aperture for partially blocking the light to form a predetermined pattern light, and an upper surface of the substrate. It is composed of a plurality of optical components such as a projection optical system for irradiating pattern light. These optical components are respectively attached to predetermined positions of a housing and a frame provided in the drawing apparatus.

  A conventional drawing apparatus is disclosed in Patent Document 1, for example. Further, as an example of an apparatus for irradiating light on an object to be processed as in the drawing apparatus, configurations of a laser irradiation apparatus and a laser processing apparatus are disclosed in Patent Documents 2 and 3.

JP 2005-345582 A JP-A-11-283933 Japanese Patent Laid-Open No. 10-277768

  However, in a conventional drawing apparatus, a plurality of optical components such as a homogenizer, an aperture, and a projection optical system constituting the optical head are individually attached to the drawing apparatus, and the positions of these optical components on the drawing apparatus are mutually different. The relationship and the optical axis were adjusted. For this reason, it takes a considerable time to attach and adjust these optical components to the drawing apparatus. Also, when replacing some of these optical components due to problems, etc., it is necessary to adjust the optical axis again after replacing the optical components, so the drawing apparatus must be stopped for a long time. It was.

  Further, in the conventional drawing apparatus, since a plurality of optical components are used in combination on the apparatus, each optical component needs to be individually adjusted with high accuracy. Therefore, it takes time to adjust each optical component, and the cost of each optical component is large. Furthermore, in such a conventional drawing apparatus, if the number of irradiation lights is increased or decreased according to the size of the substrate to be processed, the dimensions of the housing and frame for mounting each optical component must be changed. I had to. For this reason, it was not possible to easily increase or decrease the number of irradiation light.

  The present invention has been made in view of such circumstances, can reduce the time required for assembly and maintenance of the drawing apparatus, can also reduce the adjustment burden and cost for each optical component, and It is an object of the present invention to provide a drawing apparatus that can easily increase or decrease the number of irradiation light.

  In order to solve the above-mentioned problem, an invention according to claim 1 is a drawing apparatus for drawing a plurality of patterns on a photosensitive material formed on a substrate by simultaneously irradiating the substrate with a plurality of lights. A light source that emits the plurality of lights, a plurality of irradiation units that irradiate the substrate while transforming the plurality of lights into a predetermined pattern light, and a relative movement between the plurality of irradiation units and the substrate Each of the plurality of irradiation units includes a light homogenizing unit for homogenizing a profile of light emitted from the light source, and the light homogenized by the light homogenizing unit. A pattern light generation unit that transforms light into a light, and a projection unit that projects the pattern light onto a photosensitive material formed on the substrate, the light homogenization unit, the pattern light generation unit, and the projection The units are arranged and integrated at predetermined positions with respect to a reference part formed in the irradiation unit, and the position and orientation of each irradiation unit in the apparatus are defined by the reference part. It is characterized by that.

  According to a second aspect of the present invention, in the drawing apparatus according to the first aspect, the irradiation unit accommodates the light homogenization unit, the pattern light generation unit, and the projection unit in a predetermined housing. The housing includes a positioning pin as the reference portion.

  The invention according to claim 3 is the drawing apparatus according to claim 1 or 2, wherein the plurality of irradiation units are arranged on the same adjustment frame, the light homogenizer, the pattern light generator, and the The projection unit has been adjusted.

  According to a fourth aspect of the present invention, in the drawing apparatus according to any one of the first to third aspects, a central control unit that provides a control signal to the plurality of irradiation units and a plurality of the irradiation units are provided. And further comprising individual control means for controlling the operations of the pattern light generation unit and the projection unit based on a control signal given from the central control means.

  According to a fifth aspect of the present invention, in the drawing apparatus for drawing a plurality of patterns on the photosensitive material formed on the substrate by simultaneously irradiating the substrate with a plurality of lights, the plurality of lights are emitted. A plurality of irradiation units that irradiate the substrate while deforming the plurality of lights into a predetermined pattern light, and a moving unit that relatively moves the plurality of irradiation units and the substrate. The plurality of optical components constituting the irradiation unit are arranged and integrated at predetermined positions with respect to a reference portion formed in the irradiation unit, and the position and orientation of each irradiation unit in the apparatus Is defined by the reference portion.

  According to invention of Claims 1-4, the light homogenization part, pattern light generation part, and projection part which comprise an irradiation unit are each arrange | positioned in a predetermined position with respect to the reference | standard site | part formed in the irradiation unit. In addition, the positions and postures of the respective irradiation units in the apparatus are defined by the reference portion. For this reason, if the positions of the light homogenizer, pattern light generator, and projection unit are adjusted in advance for each irradiation unit, the light homogenizer and pattern light generator can be generated simply by fixing each irradiation unit on the drawing apparatus. Positioning of the unit and the projection unit is also completed. Therefore, it is possible to reduce the time required for assembly and maintenance of the drawing apparatus, and it is possible to reduce the adjustment burden and cost for each optical component. Moreover, the number of irradiation lights can be easily increased / decreased by increasing / decreasing the number of irradiation units installed in a drawing apparatus.

  In particular, according to the second aspect of the present invention, the positioning pin as the reference portion is formed in the housing that accommodates the light homogenizing section, the pattern light generating section, and the projection section. For this reason, the position of the irradiation unit in the apparatus can be appropriately regulated with a simple configuration.

  In particular, according to the third aspect of the invention, the plurality of irradiation units are obtained by adjusting the light homogenization unit, the pattern light generation unit, and the projection unit on the same adjustment frame. For this reason, all of the plurality of irradiation units can be adjusted equally.

  In particular, according to the invention described in claim 4, the drawing apparatus includes a central control unit that provides a control signal to the plurality of irradiation units, and a control signal that is provided to each of the plurality of irradiation units and is provided from the central control unit. And an individual control means for controlling the operations of the pattern light generation unit and the projection unit based on the above. As a result, since the addresses of the pattern light generation unit and the projection unit are designated through the individual control means, the same address setting can be used for each irradiation unit.

  According to the invention of claim 5, the plurality of optical components constituting the irradiation unit are arranged and integrated respectively at predetermined positions with respect to the reference portion formed in the irradiation unit, The position and orientation of each irradiation unit in the apparatus are defined by the reference part. For this reason, if the positions of the plurality of optical components are adjusted in advance for each irradiation unit, the positioning of the plurality of optical components is completed only by fixing each irradiation unit on the drawing apparatus. Therefore, it is possible to reduce the time required for assembly and maintenance of the drawing apparatus, and it is possible to reduce the adjustment burden and cost for each optical component. Moreover, the number of irradiation lights can be easily increased / decreased by increasing / decreasing the number of irradiation units installed in a drawing apparatus.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. In addition, in each figure referred in the following description, in order to clarify the positional relationship and operation direction of each member, the common XYZ orthogonal coordinate system is attached | subjected.

  FIG. 1 is a perspective view showing a schematic configuration of a pattern drawing apparatus 1 according to an embodiment of the present invention. The pattern drawing device 1 is a device for drawing a predetermined pattern on the upper surface of a glass substrate (hereinafter simply referred to as “substrate”) 9 for a color filter in a process of manufacturing a color filter of a liquid crystal display device. As shown in FIG. 1, the pattern drawing apparatus 1 mainly includes a stage 10 that moves while holding the substrate 9, a laser oscillator 20 that emits pulsed light, and a plurality of pulsed lights emitted from the laser oscillator 20. A beam splitter 30, a plurality of irradiation units 40 that irradiate the upper surface of the substrate 9 with a plurality of divided pulse lights, and a central control unit 50 that controls the operation of each part of the apparatus.

  The stage 10 has a flat outer shape, and the substrate 9 is placed and held on the upper surface thereof in a horizontal posture. A photosensitive material such as a photoresist is applied and formed in advance on the upper surface of the substrate 9 to be processed. A plurality of suction holes (not shown) are formed on the upper surface of the stage 10. When the substrate 9 is placed on the stage 10, the substrate 9 is fixed to the upper surface of the stage 10 by the suction pressure of the suction holes. Retained. The stage 10 is supported on a base 11 of the apparatus via a stage moving mechanism 12. The stage moving mechanism 12 is configured by, for example, a mechanism using a linear motor, and moves the stage 10 on the base 11 in the main scanning direction (Y-axis direction), the sub-scanning direction (X-axis direction), and the rotation direction (Z-axis). In the surrounding rotation direction), respectively, within a predetermined range.

  The laser oscillator 20 is a light source device that emits pulsed light based on a predetermined drive signal. The pulsed light emitted from the laser oscillator 20 is guided to the beam splitter 30 through an optical system (not shown). The beam splitter 30 is fixedly installed on an upper portion of a frame 13 that is installed on the base 11 so as to straddle the stage 10. The pulsed light introduced into the beam splitter 30 is divided into a plurality of (5 in this embodiment) pulsed light having the same light quantity by a plurality of half mirrors provided inside the beam splitter 30. Further, the plurality of divided pulse lights are equally spaced along the sub-scanning direction from the plurality of windows 31 (see FIG. 3) formed on the + Y side surface of the beam splitter 30 toward the irradiation unit 40 side. Are emitted as parallel light beams arranged in a row.

  The plurality of irradiation units 40 are optical units for irradiating the upper surface of the substrate 9 with each of the plurality of pulse lights emitted from the beam splitter 30. Each irradiation unit is installed at equal intervals on the frame 13 along the sub-scanning direction so as to correspond to each of the plurality of pulse lights. A plurality of pulse lights emitted from the beam splitter 30 are irradiated onto the upper surface of the substrate 9 held on the stage 10 through an optical system provided in each irradiation unit 40. Thereby, a predetermined pattern is exposed at equal intervals along the sub-scanning direction on the photosensitive material formed on the upper surface of the substrate 9.

  When pulse light is repeatedly emitted from the laser oscillator 20 while moving the stage 10 in the main scanning direction, the upper surface of the substrate 9 is exposed to a predetermined width (that is, drawn) in the main scanning direction (that is, drawn). For example, a plurality of pattern groups having a width of 50 mm are drawn. When one drawing in the main scanning direction is completed, the pattern drawing apparatus 1 moves the stage 10 by the irradiation width of the irradiation unit 40 in the sub-scanning direction, and moves the stage 10 in the main scanning direction again while moving the laser beam in the main scanning direction. Pulse light is intermittently emitted from the oscillator 20. As described above, the pattern drawing apparatus 1 repeats drawing a pattern in the main scanning direction a predetermined number of times (for example, four times) while shifting the substrate 9 in the sub-scanning direction by the irradiation width of the irradiation unit 40. A regular pattern for a color filter is formed on the entire upper surface.

  FIG. 2 is a perspective view showing the internal configuration of the irradiation unit 40. In FIG. 2, only the internal configuration of one irradiation unit 40 is shown, but the other irradiation units 40 also have the same internal configuration. As shown in FIG. 2, the irradiation unit 40 has a substantially L-shaped casing 41, and an attenuator 42 for adjusting the light intensity of the pulsed light and a profile of the pulsed light (light intensity) A homogenizer 43 for homogenizing the distribution), a reflecting mirror 44, an aperture unit 45 for partially blocking the pulsed light to form a predetermined pattern light, two zoom lenses 46a, 46b, 2 Two focus mirrors 47 a and 47 b, a concave spherical mirror 48, and a convex spherical mirror 49 are provided. Each of these optical components is fixed to a predetermined position inside the housing 41 and integrated with the housing 41.

  When pulsed light is introduced into the irradiation unit 40, the light intensity of the pulsed light is first adjusted to a predetermined value by passing through the attenuator 42, and then the profile of the pulsed light is passed through the homogenizer 43. Homogenized. Thereafter, the pulsed light is reflected by the reflecting mirror 44 so that its optical axis is directed downward, and the aperture unit 45 disposed below the reflecting mirror 44 is irradiated with the pulsed light.

  The aperture unit 45 includes an aperture 45a that is a glass plate on which a plurality of types of projection patterns are formed, and a support portion 45b that supports the aperture 45a. The pulsed light is partially shielded when passing through the aperture 45a supported by the support portion 45b, and is irradiated downward as pattern light formed into a color filter pattern shape. A drive mechanism 45c configured by a linear motor or the like is connected to the support portion 45b of the aperture unit 45. When the drive mechanism 45c is operated, the support 45b and the aperture 45a on the support 45b move in the main scanning direction, the sub-scanning direction, and the rotation direction. Thereby, the aperture unit 45 can select the pattern to be projected, and can adjust the projection position of the pattern. In FIG. 2, for convenience of illustration, the drive mechanism 45 c is conceptually illustrated, but actually, the drive mechanism 45 c is also housed inside the housing 41.

  The pulsed light that has passed through the aperture unit 45 is irradiated onto the focus mirror 47a through the zoom lens 46a, and sequentially on each surface of the focus mirror 47a, the concave spherical mirror 48, the convex spherical mirror 49, the concave spherical mirror 48, and the focus mirror 47b. Is reflected on the upper surface of the substrate 9 through the zoom lens 46b. That is, the zoom lenses 46 a and 46 b, the focus mirrors 47 a and 47 b, the concave spherical mirror 48, and the convex spherical mirror 49 constitute a projection unit that projects pulsed light as pattern light onto the upper surface of the substrate 9.

  Drive mechanisms 46c and 46d for individually displacing the heights of the zoom lenses 46a and 46b are connected to the zoom lenses 46a and 46b. When the drive mechanisms 46c and 46d are operated, the heights of the zoom lenses 46a and 46b change, and thereby the magnification of the pattern projected on the upper surface of the substrate 9 is adjusted. The focus mirrors 47a and 47b are connected to a drive mechanism 47c that integrally displaces them in the main scanning direction. When the drive mechanism 47c is operated, the optical path length is changed by changing the positions of the focus mirrors 47a and 47b in the main scanning direction, and the focal position of the pulsed light is adjusted. In FIG. 2, for convenience of illustration, the drive mechanisms 46c, 46d, and 47c are conceptually shown. However, the drive mechanisms 46c, 46d, and 47c are actually driven by a mechanism that uses a motor and a ball screw. Both are realized and housed inside the casing 41.

  Before the irradiation unit 40 is attached to the frame 13, the optical system (the attenuator 42, the homogenizer 43, the reflection mirror 44, the aperture unit 45, the zoom lenses 46 a and 46 b, and the focus mirror 47 a) in a single state in advance. 47b, the concave spherical mirror 48, and the convex spherical mirror 49) are adjusted. Specifically, by fixing the irradiation unit 40 to the predetermined adjustment frame 60 and supplying the predetermined adjustment light beam into the irradiation unit 40, the position adjustment of each optical component, the optical axis alignment, and the like are performed. The optical system is adjusted.

  When the irradiation unit 40 is fixed to the adjustment frame 60, the positioning pin 41b formed on the lower surface of the horizontal portion (portion in which the attenuator 42 and the homogenizer 43 are accommodated) 41a extending in the horizontal direction of the housing 41 is used. The irradiation unit 40 is positioned with respect to the main scanning direction, the sub-scanning direction, and the height direction by being fitted into positioning holes 61 formed on the upper surface of the projection unit. Further, a drooping portion (a portion in which the aperture unit 45, the zoom lenses 46a and 46b, the focus mirrors 47a and 47b, the concave spherical mirror 48, and the convex spherical mirror 49 are housed) 41c hanging downward from one end of the horizontal portion 41a is provided. By causing the Y-side surface 41d to abut on the + Y-side surface 62 of the adjustment frame 60, the rotation of the irradiation unit 40 in the rotational direction is restricted.

  That is, the irradiation unit 40 is positioned on the adjustment frame 60 with reference to the positioning pins 41b and the contact surface 41d formed on the housing 41, and the internal optical system is adjusted in that state. Therefore, the plurality of irradiation units 40 attached to the pattern drawing apparatus 1 are all adjusted so that the plurality of optical components and the optical axes are in the same positional relationship with respect to the positioning pins 41b and the contact surfaces 41d. It has become.

  FIG. 3 is a perspective view showing a state when the irradiation unit 40 whose optical system has been adjusted is attached to the frame 13 of the pattern drawing apparatus 1. On the upper surface of the frame 13, a plurality of positioning holes 13 a are formed at equal intervals along the sub-scanning direction so as to correspond to the attachment position of the irradiation unit 40. The positional relationship between each positioning hole 13a and the + Y side surface 13b of the frame 13 is designed to be equal to the positional relationship between the positioning hole 61 and the + Y side surface 62 in the adjustment frame 60 described above. . For this reason, the irradiation unit 40 is mounted on the frame 13 in the same state as during the adjustment in the adjustment frame 60. Specifically, the irradiation unit 40 is positioned in the main scanning direction, the sub-scanning direction, and the height direction by fitting the positioning pins 41b of the irradiation unit 40 into the positioning holes 13a of the frame 13. Further, the −Y side surface 41 d of the hanging part 41 c is brought into contact with the + Y side surface 13 b of the frame 13, thereby restricting the rotation of the irradiation unit 40 in the rotational direction.

  Thus, in the pattern drawing apparatus 1 of the present embodiment, a plurality of optical components for irradiating the upper surface of the substrate 9 with the pulsed light are integrated as an irradiation unit 40 for each pulsed light. Then, the positions and optical axes of a plurality of optical components are adjusted in advance for each irradiation unit 40, and the adjusted irradiation unit 40 is mounted on the frame 13 of the pattern drawing apparatus 1. For this reason, it is not necessary to adjust a plurality of optical components on the pattern drawing apparatus 1, and the time required for assembly and maintenance of the pattern drawing apparatus 1 can be reduced. Moreover, since it is only necessary to adjust the irradiation unit 40 as a whole with high accuracy, the adjustment burden for each optical component and the cost for each optical component can be reduced. Furthermore, by increasing or decreasing the number of irradiation units 40, the number of irradiation light can be easily increased or decreased.

  Returning to FIG. 1, the central control unit 50 is a processing unit for controlling the operation of each unit in the pattern drawing apparatus 1. The central control unit 50 is configured by, for example, a computer having a CPU and a memory, and realizes a drawing process in the pattern drawing apparatus 1 by controlling the operation of each unit in accordance with a program installed in the computer and various input instructions. FIG. 4 is a block diagram showing a connection configuration between each unit in the pattern drawing apparatus 1 and the central control unit 50. As shown in FIG. 4, the central control unit 50 is electrically connected to the stage moving mechanism 12, the laser oscillator 20, and the plurality of irradiation units 40, and can control these operations.

  FIG. 5 is a block diagram showing a more detailed connection configuration between the plurality of irradiation units 40 and the central control unit 50. In FIG. 5, the control signal supply system is indicated by a solid line, and the drive power supply system is indicated by a broken line. As shown in FIG. 5, inside the central control unit 50, a main power supply 51 that supplies driving power to each irradiation unit 40, a host CPU 52 that generates a control signal for each irradiation unit 40, and transmission of control signals A channel selector 53 for selecting the irradiation unit 40 to be the first is provided. The central control unit 50 supplies driving power from the main power supply 51 to each irradiation unit 40 and transmits a control signal from the host CPU 52 to the irradiation unit 40 to be controlled via the channel selector 53.

  On the other hand, in the irradiation unit 40, an in-unit power supply unit 71 for supplying driving power to each unit in the irradiation unit 40 and an individual control unit for controlling the operation of the drive mechanisms 45c, 46c, 46d, 47c. 72, 73, 74 are provided. The in-unit power supply unit 71 distributes the drive power supplied from the main power supply 51 to the individual control units 72, 73, 74 and the drive mechanisms 45c, 46c, 46d, 47c. The individual control units 72, 73, and 74 are provided corresponding to the drive mechanism to be controlled, and control the operation of each drive mechanism based on the control signal given from the central control unit 50. Specifically, the individual control unit 72 controls the operation of the drive mechanism 45c, the individual control unit 73 controls the operation of the drive mechanisms 46c and 46d, and the individual control unit 74 controls the operation of the drive mechanism 47c. . Note that the hardware configuring the in-unit power supply unit 71 and the individual control units 72, 73, and 74 are all housed in the housing 41 of the irradiation unit 40.

  In this way, the central control unit 50 first designates the irradiation unit 40 to be controlled by the channel selector 53, and drives the drive mechanisms 45c, 46c, and the like via the individual control unit 72 provided inside the irradiation unit 40. The operation of 46d and 47c is controlled. For this reason, the same address setting can be used in each irradiation unit 40, and even when the irradiation unit 40 is replaced, there is no need to reset the control addresses for the drive mechanisms 45c, 46c, 46d, and 47c. Thereby, the compatibility of the irradiation unit 40 can be improved.

  As mentioned above, although one Embodiment of this invention was described, this invention is not limited to said example. For example, in the above embodiment, the irradiation unit 40 is fixed on the frames 13 and 60 using the positioning pins 41b and the contact surfaces 41d, but other contact surfaces, positioning blocks, and the like are used. Thus, the position and posture of the irradiation unit 40 may be fixed. That is, the position of the internal optical component is adjusted with respect to any reference part formed in the irradiation unit 40, and the position and posture of the irradiation unit 40 on the frame 13 are regulated with reference to the reference part. That's fine.

  In the above embodiment, the attenuator 42, the homogenizer 43, the reflection mirror 44, the aperture unit 45, the zoom lenses 46a and 46b, the focus mirrors 47a and 47b, the concave spherical mirror 48, and the convex spherical mirror 49 are integrated as the irradiation unit 40. However, the optical component integrated in the present invention is not limited to the above example. For example, only a part of the above-described optical components may be integrated, or an optical component other than the above may be included in the irradiation unit 40.

  In the pattern drawing apparatus 1 described above, the upper surface of the substrate 9 is simultaneously irradiated with five pulse lights. However, the number of pulse lights simultaneously irradiated in the drawing apparatus of the present invention is limited to five. Is not to be done. Moreover, although the said pattern drawing apparatus 1 used the laser oscillator 20 as a light source, the drawing apparatus of this invention may use other light sources, such as LED and a mercury lamp. The pattern drawing apparatus 1 moves the stage 10 and the substrate 9 with respect to the stationary irradiation unit 40. However, the drawing apparatus according to the present invention moves the irradiation unit 40 with respect to the stationary substrate 9. It may be moved. That is, what is necessary is just to move the irradiation unit 40 and the board | substrate 9 relatively.

  Further, the pattern drawing apparatus 1 described above is targeted for processing the glass substrate 9 for the color filter. However, the pattern drawing apparatus of the present invention uses other substrates such as a semiconductor substrate, a printed board, and a glass substrate for a plasma display device. It may be a processing target.

It is the perspective view which showed schematic structure of the pattern drawing apparatus. It is the perspective view which showed the internal structure of the irradiation unit. It is the perspective view which showed the mode when attaching an irradiation unit to a pattern drawing apparatus. It is the block diagram which showed the connection structure between each part in an apparatus, and a central control part. It is the block diagram which showed the detailed connection structure between an irradiation unit and a central control part.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Pattern drawing apparatus 9 Board | substrate 10 Stage 11 Base 12 Stage moving mechanism 13 Frame 13a Positioning hole 20 Laser oscillator 30 Beam splitter 40 Irradiation unit 41 Case 41b Positioning pin 42 Attenuator 43 Homogenizer 44 Reflection mirror 45 Aperture unit 45a Aperture 46a, 46b Zoom lens 47a, 47b Focus mirror 45c, 46c, 46d, 47c Drive mechanism 48 Concave spherical mirror 49 Convex spherical mirror 50 Central control unit 60 Adjustment frame 61 Positioning holes 72, 73, 74 Individual control unit

Claims (5)

In a drawing apparatus for drawing a plurality of patterns on a photosensitive material formed on a substrate by simultaneously irradiating the substrate with a plurality of lights,
A light source that emits the plurality of lights;
A plurality of irradiation units that irradiate the substrate while deforming the plurality of lights into a predetermined pattern light; and
Moving means for relatively moving the plurality of irradiation units and the substrate;
With
Each of the plurality of irradiation units is
A light homogenizing unit for homogenizing the profile of light emitted from the light source;
A pattern light generator that transforms the light homogenized by the light homogenizer into the pattern light;
A projection unit that projects the pattern light onto a photosensitive material formed on the substrate;
Have
The light homogenization unit, the pattern light generation unit, and the projection unit are arranged and integrated at predetermined positions with respect to a reference portion formed in the irradiation unit, and each irradiation in the apparatus The drawing apparatus, wherein the position and orientation of the unit are defined by the reference portion. The drawing apparatus according to claim 1,
The irradiation unit houses the light homogenization unit, the pattern light generation unit, and the projection unit in a predetermined housing,
The drawing apparatus, wherein a positioning pin as the reference portion is formed in the housing. The drawing apparatus according to claim 1 or 2,
The drawing apparatus, wherein the plurality of irradiation units are adjusted in the light homogenization unit, the pattern light generation unit, and the projection unit on the same adjustment frame. The drawing apparatus according to any one of claims 1 to 3,
Central control means for providing a control signal to the plurality of irradiation units;
Individual control means that is provided in each of the plurality of irradiation units and controls the operations of the pattern light generation unit and the projection unit based on a control signal given from the central control unit;
The drawing apparatus further comprising: In a drawing apparatus for drawing a plurality of patterns on a photosensitive material formed on a substrate by simultaneously irradiating the substrate with a plurality of lights,
A light source that emits the plurality of lights;
A plurality of irradiation units that irradiate the substrate while deforming the plurality of lights into a predetermined pattern light; and
Moving means for relatively moving the plurality of irradiation units and the substrate;
With
The plurality of optical components constituting the irradiation unit are arranged and integrated at predetermined positions with respect to a reference portion formed in the irradiation unit, and the position and posture of each irradiation unit in the apparatus are A drawing apparatus defined by the reference portion.

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