JP2008068258A - Method for producing porous combined structure and porous fine particle to be used for the production - Google Patents

Method for producing porous combined structure and porous fine particle to be used for the production Download PDF

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JP2008068258A
JP2008068258A JP2007296462A JP2007296462A JP2008068258A JP 2008068258 A JP2008068258 A JP 2008068258A JP 2007296462 A JP2007296462 A JP 2007296462A JP 2007296462 A JP2007296462 A JP 2007296462A JP 2008068258 A JP2008068258 A JP 2008068258A
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fine particles
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JP4626829B2 (en
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Hironori Hatono
広典 鳩野
Masami Ando
正美 安藤
Hirotaka Ishibashi
弘孝 石橋
Hiromasa Tokutome
弘優 徳留
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Toto Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for forming a structure or a film having minute continuous pores on a substrate. <P>SOLUTION: A porous fine particle is formed by firing brittle material superfine particles having <0.1 μm average particle diameter so that brittle material superfine particles are combined partially with one another. A porous combined structure is formed by dispersing the porous fine particles in a gas to obtain aerosol and blowing the obtained aerosol against the substrate to make the porous fine particles collide with the substrate and combine the porous fine particles with one another so that the combined porous fine particles are accumulated on the substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、基材表面にセラミックスや半導体などの脆性材料からなる多孔質の構造物を形成した複合構造物の作製方法およびこの作製方法に使用する多孔質微粒子に関する。
本発明に係る複合構造物は、例えば太陽電池の電子伝導膜部、タンパク質やウィルスの吸着膜、触媒膜などとして利用し得る。
The present invention relates to a method for producing a composite structure in which a porous structure made of a brittle material such as ceramics or semiconductor is formed on a substrate surface, and a porous fine particle used in the production method.
The composite structure according to the present invention can be used, for example, as an electron conductive film part of a solar cell, a protein or virus adsorption film, or a catalyst film.

セラミックスやガラスなど基材の上に多孔質の被膜を形成させる方法としては、微粒子およびバインダーを溶媒に分散させたスラリーやペーストを基材に塗布し、これを乾燥させて、まず百数十℃で脱バインダー処理を行い、次いで融点以下の数百℃の温度で加熱焼成することにより、微粒子同士の接点において物質移動によるネックを形成させて結合させ、微粒子のネットワークによりある程度強度を保有した膜として得る手法がある。焼成温度や焼成時間を制御することによりネックの強度や多孔度、細孔径を制御できる。焼成温度を高く維持すれば、連続気孔から独立気孔へ、緻密化へと形態を変化させることもできる。 As a method for forming a porous film on a substrate such as ceramics or glass, a slurry or paste in which fine particles and a binder are dispersed in a solvent is applied to the substrate, and this is dried. The film is debonded and then heated and fired at a temperature of several hundreds of degrees centigrade below the melting point to form a neck due to mass transfer at the contact points between the fine particles, and as a film possessing some strength by the fine particle network There is a technique to get. The neck strength, porosity, and pore diameter can be controlled by controlling the firing temperature and firing time. If the firing temperature is kept high, the form can be changed from continuous pores to independent pores to densification.

また基材表面に金属やセラミックスなどの被膜を形成する方法として、PVDやCVDなどの蒸着法、ゾルゲル法、あるいは溶射法が知られている。PVD、CVD法などは緻密な組織を作製することが得意であり、多孔質構造物を形成させることは困難である。溶液から作製するゾルゲル法も基本的には緻密質を作製する方法であり、またこれらの方法は数μm以上の厚膜を形成させることが困難であることが知られている。溶射法は粒径が数μm〜100μmの粒子を使用する場合が多く、形成される被膜はその手法の特徴として内部に独立気泡が残存することが知られているが、減圧プラズマ溶射などでは、比較的緻密質の被膜を形成させることができる。 Further, as a method of forming a film of metal or ceramic on the surface of the substrate, a vapor deposition method such as PVD or CVD, a sol-gel method, or a thermal spraying method is known. PVD, CVD, etc. are good at producing dense structures, and it is difficult to form a porous structure. The sol-gel method prepared from a solution is basically a method for producing a dense material, and it is known that these methods are difficult to form a thick film of several μm or more. The thermal spraying method often uses particles having a particle size of several μm to 100 μm, and it is known that closed air bubbles remain inside the formed film as a feature of the technique, A relatively dense film can be formed.

また、最近では新たな被膜形成方法として、エアロゾルデポジション法があり、
特許第3265481号、国際出願特許WO01/27348A1に開示されるものが知られている。この方法は、脆性材料の微粒子をガス中に分散させたエアロゾルを基板に向けて吹き付け、その衝突エネルギーにより微粒子を破砕・変形させることにより、粒子あるいは破砕断片同士を接合させて、基板上に構造物を形成させる方法で、焼成させることなく焼成体と同等程度の強度を持つ構造物を形成できる手法である。
Recently, as a new film formation method, there is an aerosol deposition method.
Those disclosed in Japanese Patent No. 3265481 and International Application Patent WO01 / 27348A1 are known. In this method, an aerosol in which fine particles of a brittle material are dispersed in a gas is sprayed toward the substrate, and the particles or fragments are joined together by pulverizing and deforming the particles by the collision energy. In this method, a structure having the same strength as that of the fired body can be formed without firing.

多孔質の膜を作製する方法として、スラリーやペーストの塗布後の焼成法では焼成温度が数百℃であるためにプラスチック材料や低融点金属などの熱に弱い基材に膜を形成させることが困難である。また数μm以上の厚膜を形成させる場合には、乾燥時や脱バインダー処理時、焼成時に収縮や基材との熱膨張率の差によって膜に大きな亀裂が生じるなどの問題があった。 As a method for producing a porous film, the baking method after applying slurry or paste has a baking temperature of several hundred degrees Celsius, so that the film is formed on a heat-sensitive substrate such as a plastic material or a low melting point metal. Have difficulty. Further, when a thick film of several μm or more is formed, there is a problem that a large crack is generated in the film due to shrinkage or a difference in thermal expansion coefficient from the base material at the time of drying, debinding, or firing.

エアロゾルデポジション法は、脆性材料の厚膜を室温付近で形成させるに都合の良い方法であるが、連続気孔を持つような緻密度が低い多孔質の膜を形成させることは困難であった。特許第3265481号においては、使用する超微粒子脆性材料の調製方法として、原料超微粒子脆性材料の仮焼き温度を変えて、数十nm程度の粒径に調整された微細な超微粒子脆性材料を加熱し、粒径で50nm〜1μm程度の2次粒子に凝集させる方法が示唆されているが、これは理論密度が95%以上の緻密質の成形体を作製する方法であり、微細な粒子を接合させることにより、衝撃によりこれらの界面から割れることで粉砕が行われやすい凝集微粒子を作製することに着目されていた。すなわちエアロゾルデポジション法は緻密な膜を形成させる方法としてはこのような工夫が提案されているものの、ナノレベルの細孔径の連続気孔を有する膜を形成させる好適な手法は考案されていなかった。 The aerosol deposition method is a convenient method for forming a thick film of a brittle material near room temperature, but it has been difficult to form a porous film having continuous pores and a low density. In Japanese Patent No. 3265481, as a method for preparing the ultrafine particle brittle material to be used, the fine ultrafine particle brittle material adjusted to a particle size of about several tens of nanometers is heated by changing the calcining temperature of the raw ultrafine particle brittle material. However, a method of agglomerating secondary particles having a particle size of about 50 nm to 1 μm has been suggested, but this is a method for producing a compact molded body having a theoretical density of 95% or more, and joining fine particles. Thus, attention has been focused on producing aggregated fine particles that are easily pulverized by cracking from these interfaces by impact. That is, the aerosol deposition method has proposed such a device as a method for forming a dense film, but a suitable method for forming a film having continuous pores having a nano-level pore diameter has not been devised.

エアロゾルデポジション法は微粒子の運動エネルギーすなわち基板への衝突の際のエネルギーを構造物形成に利用しているため、微粒子が著しく小さい場合、例えば0.1μm未満の場合においては、質量が小さいために構造物形成が難しいという事実があった。また0.1μm以上の粒子を用いると構造物形成には都合が良いが、この場合にも比較的緻密質の構造物は作製しやすいものの、連続気孔を持ち、十分な強度を持つ(すなわち圧粉体でない)多孔質構造物の形成は困難であったし、たとえ多孔質構造物が形成されても細孔径は使用する微粒子の粒径に依存するため、ナノレベルの微細な孔や大きな比表面積が必要な場合にはこれらの多孔質構造物は最適とは言い難いものである。 The aerosol deposition method uses the kinetic energy of fine particles, that is, the energy at the time of collision with the substrate, to form a structure. Therefore, if the fine particles are extremely small, for example, less than 0.1 μm, the mass is small. There was the fact that structure formation was difficult. In addition, when particles of 0.1 μm or more are used, it is convenient for forming a structure. In this case as well, a relatively dense structure is easy to produce, but it has continuous pores and has sufficient strength (ie, pressure It is difficult to form a porous structure (not powder), and even if a porous structure is formed, the pore size depends on the particle size of the fine particles used. These porous structures are less than optimal when surface area is required.

本件では、特にエアロゾルデポジション法の新しい手法として、従来では困難であった微細な連続気孔を持つ構造物あるいは膜を基板上に形成すること、また望ましくは常温環境下でこれを行うことで、プラスチック材料や低融点金属材料などに適用することを提案するものである。 In this case, as a new method of the aerosol deposition method in particular, by forming a structure or film having fine continuous pores, which has been difficult in the past, on a substrate, and preferably in a room temperature environment, It is proposed to be applied to plastic materials and low melting point metal materials.

微細な気孔を持つ膜は、例えば前記した色素増感型太陽電池の酸化チタンなどの電子伝導膜部、ハイドロキシアパタイト多孔体を用いたタンパク質やウィルスの吸着膜、あるいは比表面積の大きい多孔体を担体としてその表面に各種触媒を形成させた触媒膜などの利用が考えられ、これを透明なプラスチックフィルム、ガラス、金属などに形成させて使用することが考えられる。ハイドロキシアパタイトなどは加熱により変性を来すことも懸念されるため、常温で膜が形成されることは好適である。 The membrane having fine pores is, for example, an electron conductive film portion such as titanium oxide of the dye-sensitized solar cell described above, a protein or virus adsorption film using a hydroxyapatite porous material, or a porous material having a large specific surface area. It is conceivable to use a catalyst film having various catalysts formed on the surface thereof, and to use it by forming it on a transparent plastic film, glass, metal or the like. Since hydroxyapatite and the like may be denatured by heating, it is preferable that a film is formed at room temperature.

本発明においては、連続気孔が存在する平均粒径が0.1〜50μmの多孔質微粒子を、ガス中に分散させてエアロゾルとし、このエアロゾルを基材に向けて吹き付けて多孔質微粒子を衝突させて、基材上に、多孔質微粒子同士が結合して堆積した多孔質構造物を形成させることを特徴とする、基材と多孔質の構造物からなる多孔質複合構造物の作製方法を提供する。 In the present invention, porous fine particles having an average particle diameter of 0.1 to 50 μm having continuous pores are dispersed in a gas to form an aerosol, and the aerosol is sprayed toward a substrate to cause the porous fine particles to collide. Providing a method for producing a porous composite structure comprising a substrate and a porous structure, wherein the porous structure is formed by bonding and depositing porous fine particles on the substrate. To do.

前記多孔質微粒子は、平均微粒子径が0.1μm未満の脆性材料超微粒子を焼成し、これら脆性材料超微粒子同士を一部結合せしめて形成する。 The porous fine particles are formed by firing brittle material ultrafine particles having an average fine particle diameter of less than 0.1 μm and partially bonding these brittle material ultrafine particles.

平均微粒子径については、超微粒子のSEM観察を行い、像内から任意に最低50ヶ、望ましくは200ヶ以上の微粒子を選び、像面積から円に変換したときの直径を算出し、これらを平均することによって求める。
平均粒径は、レーザー回折式粒度分布測定により測定された値を用いる。本発明においては、島津製作所製レーザー回折式粒度分布測定装置SALD−2000を用いた。
Regarding the average particle size, SEM observation of ultrafine particles is performed, and at least 50 particles, preferably 200 particles or more, are selected from the image, and the diameter when the image area is converted into a circle is calculated. By seeking.
The average particle size is a value measured by laser diffraction particle size distribution measurement. In the present invention, a laser diffraction particle size distribution analyzer SALD-2000 manufactured by Shimadzu Corporation was used.

脆性材料超微粒子が一部結合しかつ連続気孔が存在する状態の多孔質微粒子については、その気孔(細孔)の分布がシャープで密にパッキングされているほど微粒子同士の結合部分の数が多く、多孔質微粒子の強度も大きいと考えられる。本発明においては、あまりに多孔質微粒子の強度が低い場合には、衝突により容易に破砕してしまい、多孔質の構造物が得られ難くなるため、ある程度密にパッキングされている状態の多孔質微粒子が好適である。この指標として例えば、多孔質微粒子の細孔径、細孔体積を細孔分布測定装置で測定し、平均微粒子径の3倍以上の細孔径を持つ細孔の体積の、全細孔体積に占める割合が、6%以下である状態を用いる。 For porous fine particles in which ultrafine particles of brittle material are partially bonded and continuous pores exist, the number of bonded portions between the fine particles increases as the distribution of the pores (pores) is sharper and densely packed. It is considered that the strength of the porous fine particles is also large. In the present invention, if the strength of the porous fine particles is too low, the porous fine particles are easily crushed by collision and it is difficult to obtain a porous structure. Is preferred. As this index, for example, the pore diameter and pore volume of porous fine particles are measured with a pore distribution measuring device, and the proportion of the volume of pores having a pore diameter three times or more the average fine particle diameter to the total pore volume Is 6% or less.

また本発明における多孔質複合構造物作製方法は常温環境で行われることを特徴とする。
ここで常温とは、脆性材料の融点や前述の熱処理の温度より十分低い温度のことを指し、実質的には200℃以下である。
In addition, the porous composite structure manufacturing method in the present invention is performed in a room temperature environment.
Here, normal temperature refers to a temperature sufficiently lower than the melting point of the brittle material and the temperature of the heat treatment described above, and is substantially 200 ° C. or lower.

また本発明における多孔質複合構造物の作製方法において、基板におけるエアロゾルが衝突する面に、エアロゾルを斜めに吹き付けることを特徴とする。基板に対してエアロゾルの衝突方向が直角の場合には、圧粉体の堆積が起こりやすいため多孔質構造物の形成は困難である。斜めに吹き付けることで、エアロゾル流が衝突後基板表面に沿って逃げやすくなり、たとえ多孔質構造物形成に弊害となる圧粉体が形成されても、エアロゾルの噴射圧力でこれが吹き飛ばされるため、好適に構造物が形成が行われる。 In the method for producing a porous composite structure according to the present invention, the aerosol is obliquely sprayed on the surface of the substrate on which the aerosol collides. When the aerosol impingement direction is perpendicular to the substrate, it is difficult to form a porous structure because the green compact is likely to be deposited. By spraying at an angle, the aerosol flow can easily escape along the substrate surface after collision, and even if a green compact that is harmful to the formation of a porous structure is formed, it is blown away by the spray pressure of the aerosol. Formation of the structure is performed.

本発明においては多孔質微粒子を作製する方法が、脆性材料超微粒子を溶媒に、あるいは溶媒とバインダーとに、混合させて分散させ、乾燥させて脆性材料超微粒子が密に充填された状態とし、これを焼成して後、粒径を調製して多孔質微粒子を得ることを特徴とする。あるいは、脆性材料超微粒子単独で、もしくは脆性材料超微粒子にバインダーを混合させたものを、プレスして圧密させ、これを焼成して後、粒径を調製して多孔質微粒子を得ることを特徴とする。 In the present invention, the method for producing the porous fine particles is a state in which the brittle material ultrafine particles are mixed and dispersed in a solvent or in a solvent and a binder, and dried to form a state in which the brittle material ultrafine particles are densely packed, After firing this, the particle size is adjusted to obtain porous fine particles. Alternatively, brittle material ultrafine particles alone, or brittle material ultrafine particles mixed with a binder, pressed and consolidated, fired, and then adjusted to obtain particle size to obtain porous fine particles And

多孔微粒子が基板に衝突後、容易に破砕してもとの脆性材料超微粒子にもどってしまっては、たとえ構造物が形成されたとしても緻密化が進んでしまい、目的とする多孔質の構造物が得られない。脆性材料超微粒子同士がある程度強固な結合をした多孔質微粒子とするには上述のような工程を採ることが好適である。このようにして多孔質微粒子を作製することは、予めその気孔率、細孔径を所望の値に管理してこれを多孔質の構造物の気孔率、細孔径に反映させることができるため、重要な工程である。 If the porous microparticles collide with the substrate and then easily return to the brittle material ultrafine particles, even if a structure is formed, the densification proceeds and the desired porous structure I can't get anything. In order to obtain porous fine particles in which the ultrafine particles of brittle material are bonded to each other to some extent, it is preferable to take the steps as described above. It is important to prepare the porous fine particles in this way because the porosity and pore diameter can be controlled in advance to the desired values and reflected in the porosity and pore diameter of the porous structure. It is a difficult process.

ここで施す焼成は、脆性材料超微粒子の材質の融点よりも低い温度で加熱することで、脆性材料超微粒子同士の接点にネックと呼ばれる結合部分を形成してお互いが結合して集合した、ある体積を持つ多孔質材料を形成させる熱処理であり、焼成によって形成された多孔質材料の大きさが50μm以上などある場合には、ミルや乳鉢による解砕を行うことや篩分け、分級を行うことで、大きさを調節し、所望の粒径の多孔質微粒子とする。 The firing to be performed here is performed by heating at a temperature lower than the melting point of the material of the brittle material ultrafine particles, forming a joint portion called a neck at the contact point between the brittle material ultrafine particles, and gathering together. Heat treatment to form a porous material with a volume. When the porous material formed by firing has a size of 50 μm or more, etc., crushing with a mill or mortar, sieving, classification Then, the size is adjusted to obtain porous fine particles having a desired particle diameter.

以上に説明したように本発明によれば、エアロゾルデポジション法の材料として、連続気孔が存在し且つ平均粒径が0.1〜50μmの脆性材料多孔質微粒子を用いたので、今までのエアロゾルデポジション法では困難であった微細な連続気孔を持つ構造物あるいは膜を基板上に形成することができる。
また、本発明方法は常温環境下で実施することができるので、プラスチック材料や低融点金属材料などの表面に前記構造物を作製することができる。特に熱により変性しやすい材料を用いる場合には、それを考慮しなくてよいので利用範囲が大幅に拡大する。
As described above, according to the present invention, as the material for the aerosol deposition method, brittle material porous fine particles having continuous pores and an average particle size of 0.1 to 50 μm are used. A structure or film having fine continuous pores, which has been difficult with the deposition method, can be formed on the substrate.
Further, since the method of the present invention can be carried out in a room temperature environment, the structure can be produced on the surface of a plastic material, a low melting point metal material or the like. In particular, when a material that is easily denatured by heat is used, it is not necessary to consider it, so that the range of use is greatly expanded.

図1に多孔質微粒子をガス中に分散させたエアロゾルを、基材に向けて吹き付けて多孔質微粒子を衝突させて、基材上に多孔質の構造物を形成する工程で使用する、エアロゾルデポジション法を利用した構造物形成装置10の模式図を本発明における実施の一態様として示す。 FIG. 1 shows an aerosol which is used in a process of forming a porous structure on a substrate by spraying an aerosol in which porous particles are dispersed in a gas toward the substrate to collide with the porous particles. The schematic diagram of the structure forming apparatus 10 using the position method is shown as one embodiment of the present invention.

形成装置10は、窒素などのガスボンベ101がガス搬送管102を介して、多孔質微粒子を内蔵するエアロゾル発生器103に接続し、エアロゾル搬送管104を介して形成室105内に設置された、縦0.4mm横10mmの開口を持つノズル106に接続されている。ノズル106の先にはXYステージ107に設置された基板108が配置される。
形成室105は真空ポンプ109に接続されている。
In the forming apparatus 10, a gas cylinder 101 such as nitrogen is connected to an aerosol generator 103 containing porous fine particles via a gas transport pipe 102, and is installed in a forming chamber 105 via an aerosol transport pipe 104. It is connected to a nozzle 106 having an opening of 0.4 mm and a width of 10 mm. A substrate 108 placed on the XY stage 107 is disposed at the tip of the nozzle 106.
The formation chamber 105 is connected to a vacuum pump 109.

以上の構成の作製装置10による多孔質の構造物の作製手順を次に述べる。ガスボンベ101を開栓し、ガスを搬送管102を通じてエアロゾル発生器103に導入させ、多孔質微粒子を含むエアロゾルを発生させる。エアロゾルは搬送管104を通じてノズル106へと送られ、ノズル106の開口より高速で噴出される。このとき真空ポンプ109の作動により、形成室105内は数kPaの減圧環境下に置かれている。ノズル106の開口の先に配置された基板108に多孔質微粒子が衝突し、微粒子がお互いに接合し、基板上に微粒子の材料からなる多孔質の構造物が形成される。基板108はXYステージ107により揺動されており、所望の形状・面積に誘電体の構造物が形成される。以上の操作は常温環境下で行われる。 A procedure for manufacturing a porous structure by the manufacturing apparatus 10 having the above configuration will be described below. The gas cylinder 101 is opened, and the gas is introduced into the aerosol generator 103 through the transport pipe 102 to generate an aerosol containing porous fine particles. The aerosol is sent to the nozzle 106 through the transport pipe 104 and ejected at a high speed from the opening of the nozzle 106. At this time, the inside of the forming chamber 105 is placed in a reduced pressure environment of several kPa by the operation of the vacuum pump 109. Porous fine particles collide with the substrate 108 disposed at the tip of the opening of the nozzle 106, the fine particles are bonded to each other, and a porous structure made of the fine particle material is formed on the substrate. The substrate 108 is swung by an XY stage 107, and a dielectric structure is formed in a desired shape and area. The above operation is performed in a room temperature environment.

以下多孔質構造物の作製方法として、酸化チタン多孔体を作製する工程につき、実施例として説明する。 Hereinafter, as a method for producing a porous structure, a process for producing a titanium oxide porous body will be described as an example.

(実施例1)
・多孔質微粒子を準備する工程
酸化チタン粉末(平均微粒子径:25nm)を水、バインダー(PEG:分子量20000)と分散剤(アセチルアセトン)を重量比でTiO:水:バインダー:分散剤=40:40:8:1で混合し、室温で乾燥固化後、650℃で30分焼成した。その後、乳鉢にて粉砕し、25μmのメッシュを通した。粉砕後の粒子をSEMで観察したところ、平均微粒子径が約25nmの一次粒子からなる多孔質微粒子であることがわかった。また、得られた多孔質微粒子の細孔径をマイクロメリティックス高速比表面積/細孔分布測定装置アサップ2000で調べたところ、細孔径の中心値は約40nmで粉砕後の多孔質微粒子の平均粒径をレーザー回折式粒度分布測定装置にて測定したところ約20μmであった。
(Example 1)
Step for preparing porous fine particles Titanium oxide powder (average fine particle diameter: 25 nm) is water, and binder (PEG: molecular weight 20000) and dispersant (acetylacetone) are in a weight ratio of TiO 2 : water: binder: dispersant = 40: The mixture was mixed at 40: 8: 1, dried and solidified at room temperature, and calcined at 650 ° C. for 30 minutes. Thereafter, the mixture was pulverized in a mortar and passed through a 25 μm mesh. When the pulverized particles were observed with an SEM, it was found to be porous fine particles composed of primary particles having an average fine particle diameter of about 25 nm. Further, when the pore diameter of the obtained porous fine particles was examined with a micromeritics high speed specific surface area / pore distribution measuring apparatus Asap 2000, the average value of the pore diameter was about 40 nm and the average particle size of the porous fine particles after pulverization The diameter was measured by a laser diffraction particle size distribution measuring device to be about 20 μm.

2.多孔質の構造物を作製する工程
上記多孔質微粒子を150℃で一晩乾燥した後、上述した構造物形成装置10に準ずる構造物形成装置を用い、ガスとしてHeを使用して多孔質微粒子をエアロゾルとし、流量を5L/minにて酸化インジウム−酸化スズ薄膜の透明導電膜付きガラス基板に向けてノズルより噴射させて衝突させ、透明導電膜上に室温で酸化チタンの多孔質の構造物を形成した。このとき基板とノズルから噴射するエアロゾルの角度を60°とした。構造物の厚みは12μmであった。形成された構造物を基板と一緒にエタノール溶液につけ、超音波洗浄機(高周波出力80W)で5分間超音波を照射したところ、特に構造物の崩壊などの変化は見られず、明らかに圧粉体ではないことがわかった。また、この膜はSEM観察から、表面にクラックが無い事、粒子径が約25nmである一次粒子からなる多孔質体であることがわかった。図2にこの多孔質構造物のSEMによる表面観察像を示す。
2. Step of producing porous structure After drying the above-mentioned porous fine particles at 150 ° C. overnight, using a structure forming apparatus similar to the above-described structure forming apparatus 10 and using He as a gas, A porous structure of titanium oxide is sprayed on a transparent conductive film at room temperature by spraying it from a nozzle toward a glass substrate with a transparent conductive film of an indium oxide-tin oxide thin film at a flow rate of 5 L / min. Formed. At this time, the angle of the aerosol sprayed from the substrate and the nozzle was set to 60 °. The thickness of the structure was 12 μm. When the formed structure was put on an ethanol solution together with the substrate and irradiated with ultrasonic waves for 5 minutes with an ultrasonic cleaner (high frequency output 80W), there was no change such as the collapse of the structure in particular. I found out that it was not my body. Further, this film was found by SEM observation to have no cracks on the surface and to be a porous body composed of primary particles having a particle diameter of about 25 nm. FIG. 2 shows a surface observation image by SEM of this porous structure.

(実施例2)
・多孔質微粒子を準備する工程
酸化チタン粉末(平均1次粒子径:25nm)を水、バインダー(PEG:分子量20000)と分散剤(アセチルアセトン)を重量比でTiO:水:バインダー:分散剤=40:40:8:1で混合し、室温で乾燥固化後、650℃で30分焼成した。その後、乳鉢にて粉砕し、25μmのメッシュを通した。粉砕後の粒子をSEMで観察したところ、平均微粒子径が約25nmの一次粒子からなる多孔質微粒子であることがわかった。また、得られた多孔質微粒子の細孔径をマイクロメリティックス高速比表面積/細孔分布測定装置アサップ2000で調べたところ、細孔径の中心値は約40nmで粉砕後の多孔質微粒子の平均粒径をレーザー回折式粒度分布測定装置にて測定したところ約20μmであった。
(Example 2)
Step for preparing porous fine particles Titanium oxide powder (average primary particle size: 25 nm) is water, and binder (PEG: molecular weight 20000) and dispersant (acetylacetone) are in a weight ratio of TiO 2 : water: binder: dispersant = The mixture was mixed at 40: 40: 8: 1, dried and solidified at room temperature, and calcined at 650 ° C. for 30 minutes. Thereafter, the mixture was pulverized in a mortar and passed through a 25 μm mesh. When the pulverized particles were observed with an SEM, it was found to be porous fine particles composed of primary particles having an average fine particle diameter of about 25 nm. Further, when the pore diameter of the obtained porous fine particles was examined with a micromeritics high speed specific surface area / pore distribution measuring apparatus Asap 2000, the average value of the pore diameter was about 40 nm and the average particle size of the porous fine particles after pulverization The diameter was measured by a laser diffraction particle size distribution measuring device to be about 20 μm.

2.多孔質の構造物を作製する工程
上記多孔質微粒子を150℃で1晩乾燥した後、上述した構造物形成装置10に準ずる構造物形成装置を用い、ガスとしてHeを使用して多孔質微粒子をエアロゾルとし、流量を5L/minにてフッ素をドープした酸化スズ薄膜の透明導電膜付きPETフィルムに向けてノズルより噴射させて衝突させ、透明導電膜上に室温で酸化チタンの多孔質の構造物を形成した。このとき基板とエアロゾルの衝突角度を60°とした。形成された構造物を基板と一緒にエタノール溶液につけ、超音波洗浄機(高周波出力80W)で5分間超音波を照射したところ、特に構造物の崩壊などの変化は見られず、明らかに圧粉体ではないことがわかった。また、この膜はSEM観察から、表面にクラックが無いこと、粒子径が約25nmである一次粒子からなる多孔質体であることがわかった。
2. Step of producing porous structure After the porous fine particles are dried at 150 ° C. overnight, the porous fine particles are formed using He as a gas using a structure forming apparatus similar to the structure forming apparatus 10 described above. A porous structure of titanium oxide at room temperature on a transparent conductive film by spraying from a nozzle toward a PET film with a transparent conductive film of a tin oxide thin film doped with fluorine at a flow rate of 5 L / min. Formed. At this time, the collision angle between the substrate and the aerosol was set to 60 °. When the formed structure was put on an ethanol solution together with the substrate and irradiated with ultrasonic waves for 5 minutes with an ultrasonic cleaner (high frequency output 80W), there was no change such as the collapse of the structure in particular. I found out that it was not my body. Further, this film was found by SEM observation to have no cracks on the surface and to be a porous body composed of primary particles having a particle diameter of about 25 nm.

(実施例3)
・多孔質微粒子を準備する工程
酸化チタン粉末(平均1次粒子径:25nm)を水、バインダー(PEG:分子量20000)と分散剤(アセチルアセトン)を重量比でTiO:水:バインダー:分散剤=40:40:8:1で混合し、室温で乾燥固化後、650℃で30分焼成した。その後、乳鉢にて粉砕し、25μmのメッシュを通した。粉砕後の粒子をSEMで観察したところ、平均微粒子径が約25nmの一次粒子からなる多孔質微粒子である事がわかった。また、得られた多孔質微粒子の細孔径をマイクロメリティックス高速比表面積/細孔分布測定装置アサップ2000で調べたところ、細孔径の中心値は約40nmで粉砕後の多孔質微粒子の平均粒径をレーザー回折式粒度分布測定装置にて測定したところ約20μmであった。
(Example 3)
Step for preparing porous fine particles Titanium oxide powder (average primary particle size: 25 nm) is water, and binder (PEG: molecular weight 20000) and dispersant (acetylacetone) are in a weight ratio of TiO 2 : water: binder: dispersant = The mixture was mixed at 40: 40: 8: 1, dried and solidified at room temperature, and calcined at 650 ° C. for 30 minutes. Thereafter, the mixture was pulverized in a mortar and passed through a 25 μm mesh. Observation of the pulverized particles with an SEM revealed that the particles were porous fine particles composed of primary particles having an average fine particle diameter of about 25 nm. Further, when the pore diameter of the obtained porous fine particles was examined with a micromeritics high speed specific surface area / pore distribution measuring apparatus Asap 2000, the average value of the pore diameter was about 40 nm and the average particle size of the porous fine particles after pulverization The diameter was measured by a laser diffraction particle size distribution measuring device to be about 20 μm.

2.多孔質の構造物を作製する工程
上記多孔質微粒子を150℃で一晩乾燥した後、上述した構造物形成装置10に準ずる構造物形成装置を用い、ガスとしてHeを使用して多孔質微粒子をエアロゾルとし、流量を5L/minにて酸化インジウム−酸化スズ薄膜の透明導電膜付きPETフィルムに向けてノズルより噴射させて衝突させ、透明導電膜上に室温で酸化チタンの多孔質の構造物を形成した。このとき基板とエアロゾルの衝突角度を60°とした。形成された構造物を基板と一緒にエタノール溶液につけ、超音波洗浄機(高周波出力80W)で5分間超音波を照射したところ、特に構造物の崩壊などの変化は見られず、明らかに圧粉体ではないことがわかった。また、この膜はSEM観察から、表面にクラックが無い事、粒子径が約25nmである一次粒子からなる多孔質体であることがわかった。
2. Step of producing porous structure After drying the above-mentioned porous fine particles at 150 ° C. overnight, using a structure forming apparatus similar to the above-described structure forming apparatus 10 and using He as a gas, A porous structure of titanium oxide is sprayed on a transparent conductive film at room temperature by spraying from a nozzle toward a PET film with a transparent conductive film of an indium oxide-tin oxide thin film at a flow rate of 5 L / min. Formed. At this time, the collision angle between the substrate and the aerosol was set to 60 °. When the formed structure was put on an ethanol solution together with the substrate and irradiated with ultrasonic waves for 5 minutes with an ultrasonic cleaner (high frequency output 80W), there was no change such as the collapse of the structure in particular. I found out that it was not my body. Further, this film was found by SEM observation to have no cracks on the surface and to be a porous body composed of primary particles having a particle diameter of about 25 nm.

(比較例1)
酸化チタン微粒子(平均1次粒子径:25nm)を150℃で一晩乾燥した後、上述した構造物形成装置10に準ずる構造物形成装置を用い、ガスとしてHeを使用してこの微粒子をエアロゾルとし、流量を6L/minにてフッ素をドープした酸化スズ薄膜の透明導電膜付きガラス基板に向けて噴射角度を直角、60°としてノズルより噴射させて衝突させたところ、基板上に微粒子からなる圧粉体が厚く堆積するのみであった。得られた堆積物を基板と一緒にエタノール溶液につけ、超音波洗浄機(高周波出力80W)で5分間超音波を照射したところ、基板より剥がれ落ちたため、十分な強度を持つ多孔質構造物が形成されていないことがわかった。
(Comparative Example 1)
After drying titanium oxide fine particles (average primary particle size: 25 nm) at 150 ° C. overnight, using a structure forming apparatus similar to the structure forming apparatus 10 described above, using He as a gas, the fine particles are made into an aerosol. When the jetting angle is set at a right angle of 60 ° toward the glass substrate with a transparent conductive film of a tin oxide thin film doped with fluorine at a flow rate of 6 L / min, the pressure is made of fine particles on the substrate. The powder only deposited thick. The obtained deposit was put on an ethanol solution together with the substrate, and irradiated with ultrasonic waves for 5 minutes with an ultrasonic cleaner (high frequency output 80 W). As a result, it peeled off from the substrate, and a porous structure with sufficient strength was formed. I found out that it was not.

(実施例4)
所望の細孔径を持つ多孔質構造物を得る場合には、多孔質微粒子の作製工程が重要である。これは超微粒子同士がある程度強固な結合を持った多孔質微粒子を準備することにより構造物そのものができるか否かに影響を与えること、また多孔質微粒子の細孔径をデザインすることが多孔質構造物の細孔径へ反映されることが考えられるからである。ここでは多孔質微粒子の作製工程による多孔質微粒子の細孔径の変化について説明する。
Example 4
In the case of obtaining a porous structure having a desired pore diameter, a production process of porous fine particles is important. This has an influence on whether or not the structure itself can be made by preparing porous fine particles in which ultrafine particles have a certain degree of strong bond, and designing the pore size of the porous fine particles is a porous structure This is because it may be reflected in the pore diameter of the object. Here, the change in the pore diameter of the porous fine particles due to the production process of the porous fine particles will be described.

微粒子には前述の酸化チタン微粒子(平均一次粒子径(平均微粒子径):25nm)を用い、以下のA、B、Cの3種類の工程にて多孔質微粒子の作製を試みた。
A:酸化チタン微粒子をそのまま550℃にて加熱する工程。
B:酸化チタン微粒子にイオン交換水および分散剤(アセチルアセトン:和光純薬製)を40:40:1の重量比にて混合して分散させた後、室温で乾燥を行い、550℃にて加熱する工程。
C:酸化チタン微粒子にイオン交換水と分散剤(アセチルアセトン:和光純薬製)およびバインダー(ポリエチレングリコール分子量20000:和光純薬製)を40:40:1:4の重量比にて混合して分散させた後、室温にて乾燥を行い、その後550℃で加熱する工程。
As the fine particles, the above-described titanium oxide fine particles (average primary particle size (average fine particle size): 25 nm) were used, and production of porous fine particles was attempted in the following three types of processes A, B, and C.
A: A step of heating the titanium oxide fine particles as they are at 550 ° C.
B: Ion exchange water and a dispersant (acetylacetone: Wako Pure Chemical Industries, Ltd.) were mixed and dispersed in titanium oxide fine particles at a weight ratio of 40: 40: 1, dried at room temperature, and heated at 550 ° C. Process.
C: Ion exchange water, a dispersing agent (acetylacetone: manufactured by Wako Pure Chemical Industries) and a binder (polyethylene glycol molecular weight 20000: manufactured by Wako Pure Chemical Industries) are mixed at a weight ratio of 40: 40: 1: 4 and dispersed in titanium oxide fine particles. And then drying at room temperature and then heating at 550 ° C.

何れも加熱後はある程度強度を持った凝集体あるいは多孔質の構造物となっており、これをある程度解砕してある粒度の多孔質微粒子に調製して、マイクロメリティックス高速比表面積/細孔分布測定装置アサップ2000にて細孔径とその細孔体積について測定を行った。この結果を図3に示す。図中のA、B、Cについては前述の通りであり、Dは酸化チタン微粒子を加熱する前の多孔質ではない超微粒子の粉体を示している。横軸は多孔質微粒子細孔径あるいは粉体の粒子同士の隙間の大きさを示しており、縦軸はその細孔径における細孔体積量を示している。 All of them become aggregates or porous structures having a certain degree of strength after heating, and this is prepared into porous fine particles having a particle size that has been crushed to some extent, and then has a micromeritics high-speed specific surface area / thinness. The pore diameter and the pore volume were measured with a pore distribution measuring apparatus Asap 2000. The result is shown in FIG. A, B, and C in the figure are as described above, and D indicates an ultrafine powder that is not porous before the titanium oxide fine particles are heated. The horizontal axis indicates the pore size of the porous fine particles or the size of the gap between the powder particles, and the vertical axis indicates the volume of pores at the pore diameter.

この結果から、単に超微粒子を加熱したのみでは細孔分布はもともとの粉体のそれと同程度であり、超微粒子に分散処理などを施して粒子同士が密に充填した状態にしたのち加熱することにより、細孔径分布をシャープに揃えることが可能になるということがわかる。
ここで酸化チタン微粒子の平均微粒子径25nmの値の3倍として多孔質微粒子の細孔径75nmという値に注目し、この多孔質微粒子の全細孔体積に占める、細孔径75nm以上の細孔体積の割合を測定したところ、Aにおいて、7.3%、Dにおいて6.7%であり、B、Cでは観測されず、無いに等しい結果となった。細孔径分布が小さくシャープであるほど多孔質微粒子そのものの強度も大きいと考えられる。B、Cの多孔質粒子が多孔質構造物の作製には好適である。
From this result, the pore distribution is almost the same as that of the original powder simply by heating the ultrafine particles, and after the ultrafine particles are subjected to a dispersion treatment, etc., the particles are packed closely and heated. Thus, it can be seen that the pore diameter distribution can be made sharp.
Here, paying attention to the value of 75 nm of the pore diameter of the porous fine particle as three times the value of the average particle diameter of the titanium oxide fine particle of 25 nm, the pore volume having a pore diameter of 75 nm or more occupying the total pore volume of the porous fine particle. When the ratio was measured, it was 7.3% in A and 6.7% in D, and it was not observed in B and C. It is considered that the finer the pore size distribution is, the sharper the fine particles themselves are. B and C porous particles are suitable for producing a porous structure.

エアロゾルデポジション法を利用した構造物形成装置の模式図Schematic diagram of a structure forming device using the aerosol deposition method 多孔質構造物のSEM写真SEM photo of porous structure 多孔質微粒子細孔径と細孔体積量との関係を示すグラフGraph showing the relationship between the pore size of porous fine particles and the volume of pores

符号の説明Explanation of symbols

10…構造物形成装置、101…窒素ガスボンベ、102…ガス搬送管、103…エアロゾル発生器、104…エアロゾル搬送管、105…形成室、106…ノズル、107…XYステージ、108…基板、109…真空ポンプ。 DESCRIPTION OF SYMBOLS 10 ... Structure formation apparatus, 101 ... Nitrogen gas cylinder, 102 ... Gas conveyance pipe, 103 ... Aerosol generator, 104 ... Aerosol conveyance pipe, 105 ... Formation chamber, 106 ... Nozzle, 107 ... XY stage, 108 ... Substrate, 109 ... Vacuum pump.

Claims (5)

脆性材料超微粒子同士が一部結合しかつ連続気孔が存在する平均粒径が0.1〜50μmの多孔質微粒子を、ガス中に分散させてエアロゾルとし、このエアロゾルを基材に向けて吹き付けて前記多孔質微粒子を衝突させて、前記基材上に前記多孔質微粒子同士が結合して堆積した多孔質構造物を形成させることを特徴とする基材と多孔質構造物からなる多孔質複合構造物の作製方法。 Porous fine particles having an average particle diameter of 0.1 to 50 μm, in which brittle material ultrafine particles are partially bonded and have continuous pores, are dispersed in a gas to form an aerosol, and this aerosol is sprayed toward a substrate. A porous composite structure comprising a base material and a porous structure, wherein the porous fine particles are collided to form a porous structure in which the porous fine particles are bonded and deposited on the base material. Manufacturing method. 請求項1に記載の多孔質複合構造物の作製方法において、前記脆性材料多孔質微粒子は、平均微粒子径が0.1μm未満の脆性材料超微粒子を焼成して形成したことを特徴とする多孔質複合構造物の作製方法。 2. The method for producing a porous composite structure according to claim 1, wherein the brittle material porous fine particles are formed by firing brittle material ultrafine particles having an average fine particle diameter of less than 0.1 μm. A method for manufacturing a composite structure. 請求項1または2に記載の多孔質複合構造物の作製方法において、前記多孔質構造物の形成が常温環境で行われることを特徴とする多孔質複合構造物の作製方法。 3. The method for producing a porous composite structure according to claim 1 or 2, wherein the porous structure is formed in a room temperature environment. 請求項1乃至3に記載の多孔質複合構造物の作製方法において、前記基板における前記エアロゾルが衝突する面に、前記エアロゾルを斜めに吹き付けることを特徴とする多孔質複合構造物の作製方法。 4. The method for producing a porous composite structure according to claim 1, wherein the aerosol is obliquely sprayed on a surface of the substrate on which the aerosol collides. 微粒子を基材に向けて吹き付けて衝突させ基材と多孔質の構造物からなる多孔質複合構造物を形成する方法において使用される原材料微粒子であって、その平均微粒子径が0.1μm未満の脆性材料超微粒子が集合してその接点で結合した、平均粒径が0.1〜50μmで、内部に連続気孔を有する多孔質微粒子。 Raw material fine particles used in a method for forming a porous composite structure composed of a base material and a porous structure by spraying fine particles toward the base material and having an average fine particle diameter of less than 0.1 μm Porous fine particles having an average particle diameter of 0.1 to 50 μm and continuous pores inside, in which brittle material ultrafine particles are assembled and bonded at the contact points.
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