JP2007287809A - Laminated semiconductor device and method of the same - Google Patents

Laminated semiconductor device and method of the same Download PDF

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Publication number
JP2007287809A
JP2007287809A JP2006111469A JP2006111469A JP2007287809A JP 2007287809 A JP2007287809 A JP 2007287809A JP 2006111469 A JP2006111469 A JP 2006111469A JP 2006111469 A JP2006111469 A JP 2006111469A JP 2007287809 A JP2007287809 A JP 2007287809A
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semiconductor chip
die bonding
bonding member
semiconductor device
die
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Yasuhiro Hachisuga
泰博 蜂須賀
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Sharp Corp
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Sharp Corp
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    • HELECTRICITY
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    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
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    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
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    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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    • H01L2224/9212Sequential connecting processes
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    • H01L2224/92Specific sequence of method steps
    • H01L2224/922Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
    • H01L2224/9222Sequential connecting processes
    • H01L2224/92242Sequential connecting processes the first connecting process involving a layer connector
    • H01L2224/92247Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a laminated semiconductor device which has such a structure that a semiconductor chip having an identical or nearly identical chip area can be easily laminated. <P>SOLUTION: The front face of a first semiconductor chip 1 and the rear face of a die pad 3 are adhered to each other, the rear face of a second semiconductor chip 2 and the front face of the die pad 3 are adhered to each other, the electrode pad 5a of the first semiconductor chip 1 is connected with the front face of an inner lead 6 through a wire 7a, and the electrode pad 5b of the second semiconductor chip 2 is connected with the front face of the inner lead 6 through a wire 7b. The die pad 3 is made smaller in area than the first semiconductor chip 1 and the second semiconductor chip 2, and the electrode pad 5a is provided in an area other than a bonding face between the front face of the first semiconductor chip 1 and the rear face of the die pad 3, and the wire 7a connected with the electrode pad 5a passes through the front face of the first semiconductor chip 1, the rear face of the second semiconductor chip 2 and a concave space 12 surrounded by the outer side face of the die pad 3, and enters the electrode pad 5a of the first semiconductor chip 1 from the diagonally upper side. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、半導体装置及びその組み立て技術に関し、より詳細には、複数の同一チップ面積、若しくは、類似したチップ面積の半導体チップをパッケージ内に積層して搭載した積層型半導体装置、及び、当該積層型半導体装置の製造方法に関する。   The present invention relates to a semiconductor device and an assembly technique thereof, and more specifically, a stacked semiconductor device in which a plurality of semiconductor chips having the same chip area or similar chip areas are stacked and mounted in a package, and the stacked layer The present invention relates to a method for manufacturing a type semiconductor device.

近年、メモリ容量の増加、及び、メモリとロジックの混載等、半導体チップの高集積化が加速する中で、制限された面積でそれらを実現するために、複数の半導体チップを同一パッケージ内において積層する積層型半導体装置が増加してきている。   In recent years, with the increase in memory capacity and the increased integration of semiconductor chips such as mixed memory and logic, multiple semiconductor chips are stacked in the same package in order to realize them in a limited area. There are an increasing number of stacked semiconductor devices.

特に、メモリの容量の増加に関しては、同一チップを積層するのが主流であり、また、メモリとロジックの混載する場合でも、類似したチップ面積を積層することがある。こうした同一チップ面積、若しくは、類似チップ面積の半導体チップを積層した積層型半導体装置として、以下の特許文献1の図8、或いは、特許文献2の図1に開示されている第1の従来構造が用いられている。   In particular, with respect to an increase in memory capacity, it is the mainstream to stack the same chip, and a similar chip area may be stacked even when the memory and logic are mounted together. As a stacked semiconductor device in which semiconductor chips having the same chip area or similar chip area are stacked, the first conventional structure disclosed in FIG. 8 of Patent Document 1 or FIG. It is used.

第1の従来構造は、例えば、図5に代表的に示すように、リードフレームのダイパッド23の表裏両面に、1つの半導体チップ21をダイパッド23の表面へ、また、他の半導体チップ22をダイパッド23の裏面へ背中合わせで、接着剤24a,24bにて夫々接着固定され、各半導体チップ21,22とリードフレームのインナリード26への接続は、ダイパッド23の表面の半導体チップ21の電極パッド25aはインナリード26の表面へ、ダイパッド23の裏面の半導体チップ22の電極パッド25bはインナリード26の裏面へ夫々接続される構造となっている。   In the first conventional structure, for example, as representatively shown in FIG. 5, one semiconductor chip 21 is placed on the surface of the die pad 23 on the front and back surfaces of the die pad 23 of the lead frame, and the other semiconductor chip 22 is placed on the die pad. The back surface of the semiconductor chip 21 is back-to-back and bonded and fixed with adhesives 24a and 24b. The connection between the semiconductor chips 21 and 22 and the lead frame inner lead 26 is performed by the electrode pad 25a of the semiconductor chip 21 on the surface of the die pad 23. The electrode pad 25 b of the semiconductor chip 22 on the back surface of the die pad 23 is connected to the back surface of the inner lead 26 on the surface of the inner lead 26.

上記第1の従来構造の積層型半導体装置は、以下に示すような製造方法で製造される。先ず初めに、リードフレームのダイパッド23の表面に接着剤24aを塗布して第1の半導体チップ21を搭載し固定する。次に、第1の半導体チップ21を搭載したリードフレームを裏返し、ダイパッド23の裏面に接着剤24bを塗布して第2の半導体チップ22を搭載し固定する。 次に、第1の半導体チップ21の電極パッド25aとインナリード26の表面との間でワイヤ27aにて両者を接続する。次に、第1の半導体チップ21とインナリード26をワイヤで接合されたリードフレームを裏返し、第2の半導体チップ22の電極パッド25bとインナリード26の裏面との間でワイヤ27bにて両者を接続する。その後、半導体チップ21,22、ダイパッド23、インナリード26、及び、ワイヤ27a,27bを樹脂で封止し、リードフレームの外枠から分離する。   The stacked semiconductor device having the first conventional structure is manufactured by the following manufacturing method. First, the adhesive 24a is applied to the surface of the die pad 23 of the lead frame, and the first semiconductor chip 21 is mounted and fixed. Next, the lead frame on which the first semiconductor chip 21 is mounted is turned over, the adhesive 24b is applied to the back surface of the die pad 23, and the second semiconductor chip 22 is mounted and fixed. Next, the electrode pad 25 a of the first semiconductor chip 21 and the surface of the inner lead 26 are connected by a wire 27 a. Next, the lead frame in which the first semiconductor chip 21 and the inner lead 26 are joined by the wire is turned over, and both are connected by the wire 27b between the electrode pad 25b of the second semiconductor chip 22 and the back surface of the inner lead 26. Connecting. Thereafter, the semiconductor chips 21 and 22, the die pad 23, the inner lead 26, and the wires 27a and 27b are sealed with resin and separated from the outer frame of the lead frame.

ところで、上記第1の従来構造の積層型半導体装置には、以下に示すような問題があり、種々の改良が試みられている。   Incidentally, the stacked semiconductor device having the first conventional structure has the following problems, and various improvements have been attempted.

即ち、上記第1の従来構造の積層型半導体装置は、図5に示すように、第1の半導体チップ21と第2の半導体チップ22がダイパッド23を挟んで背中合わせとなっているため、夫々の半導体チップをダイパッドに搭載して固定し、更に、インナリードへのワイヤの接続を行うためには、製造工程中にリードフレームを数回に亘って裏返す必要があるため、製造工程が複雑となり製造コスト高騰の要因となっていた。   That is, in the stacked semiconductor device having the first conventional structure, as shown in FIG. 5, the first semiconductor chip 21 and the second semiconductor chip 22 are back-to-back with the die pad 23 interposed therebetween. In order to mount and fix the semiconductor chip on the die pad, and to connect the wires to the inner leads, it is necessary to turn the lead frame several times during the manufacturing process, which makes the manufacturing process complicated. It was a factor of cost increase.

更に、一方の半導体チップを搭載して固定し、インナリードへの接続を行うためには、他方の半導体チップの素子面及びワイヤ部が、リードフレームの下側に位置するため、その下側の半導体チップの素子面へのキズ、ワイヤ部の変形を防ぐ必要が有り、半導体チップの取り扱いを十分に慎重に行う必要があった。   Furthermore, in order to mount and fix one semiconductor chip and connect it to the inner lead, the element surface and the wire part of the other semiconductor chip are located below the lead frame. It is necessary to prevent scratches on the element surface of the semiconductor chip and deformation of the wire portion, and it is necessary to handle the semiconductor chip sufficiently carefully.

そこで、上記第1の従来構造の積層型半導体装置の問題点を解決するために、以下に示す第2の従来構造の積層型半導体装置(特許文献1参照)、及び、第3の従来構造の積層型半導体装置(特許文献2参照)が、夫々に提案されている。   Accordingly, in order to solve the problems of the stacked semiconductor device having the first conventional structure, the second stacked semiconductor device having the conventional structure (see Patent Document 1) and the third conventional structure described below are used. A stacked semiconductor device (see Patent Document 2) has been proposed.

第2及び第3の従来構造の積層型半導体装置は、何れも、ダイパッドの裏面側に搭載する半導体チップを背中合わせで接着固定せずに、当該半導体チップの表面とダイパッドの裏面を対向させて、つまり、ダイパッドの表面側に搭載する半導体チップと同じ側に表面を向けて搭載することで、製造工程中にリードフレームを数回に亘って裏返すことを回避している。   In both of the stacked semiconductor devices of the second and third conventional structures, the semiconductor chip mounted on the back surface side of the die pad is not bonded and fixed back to back, but the front surface of the semiconductor chip and the back surface of the die pad are opposed to each other. In other words, mounting the lead frame on the same side as the semiconductor chip mounted on the surface side of the die pad avoids turning the lead frame over several times during the manufacturing process.

上記第2の従来構造の積層型半導体装置は、図6に示すように、リードフレームのダイパッド33の表裏両面に、ダイパッド33より小さい第1の半導体チップ31をダイパッド33の表面へ、また、ダイパッド33より大きい第2の半導体チップ32をダイパッド33の裏面へ、夫々の素子面を上側に揃えて夫々接着固定され、各半導体チップ31,32とリードフレームのインナリード36への接続は、ダイパッド33の表裏両面の各半導体チップ31,32の各電極パッド35a,35bが、夫々ワイヤ37a,37bを介してインナリード36の表面へ接続される構造となっている。   As shown in FIG. 6, the stacked semiconductor device of the second conventional structure has a first semiconductor chip 31 smaller than the die pad 33 on the front and back surfaces of the die pad 33 of the lead frame and the die pad 33. The second semiconductor chip 32 larger than 33 is bonded and fixed to the back surface of the die pad 33 and the respective element surfaces are aligned on the upper side, and the connection between the semiconductor chips 31 and 32 and the lead leads 36 to the inner leads 36 is performed. The electrode pads 35a and 35b of the semiconductor chips 31 and 32 on both the front and back surfaces are connected to the surface of the inner lead 36 via wires 37a and 37b, respectively.

上記第2の従来構造の積層型半導体装置は、以下に示すような製造方法で製造される。先ず初めに、リードフレームのダイパッド33の裏面(下面)に接着テープ34bを貼付したものを用意し、ダイパッド33の裏面に第2の半導体チップ32を熱圧着して搭載する。次に、ダイパッド33の表面(上面)に接着剤34aを塗布して第1の半導体チップ31を搭載し固定する。次に、第1の半導体チップ31の電極パッド35aとインナリード36の表面(上面)との間をワイヤ37aにて接続し、第2の半導体チップ32の電極パッド35bとインナリード36の表面(上面)との間をワイヤ37bにて接続する。その後、半導体チップ31,32、ダイパッド33、インナリード36、及び、ワイヤ37a,37bを樹脂で封止し、リードフレームの外枠から分離する。   The stacked semiconductor device having the second conventional structure is manufactured by the following manufacturing method. First, an adhesive tape 34b attached to the back surface (lower surface) of the die pad 33 of the lead frame is prepared, and the second semiconductor chip 32 is mounted on the back surface of the die pad 33 by thermocompression bonding. Next, an adhesive 34 a is applied to the surface (upper surface) of the die pad 33 to mount and fix the first semiconductor chip 31. Next, the electrode pad 35a of the first semiconductor chip 31 and the surface (upper surface) of the inner lead 36 are connected by a wire 37a, and the electrode pad 35b of the second semiconductor chip 32 and the surface of the inner lead 36 ( The upper surface is connected by a wire 37b. Thereafter, the semiconductor chips 31, 32, the die pad 33, the inner leads 36, and the wires 37a, 37b are sealed with resin and separated from the outer frame of the lead frame.

上記第3の従来構造の積層型半導体装置は、図7に示すように、リードフレームのダイパッド43の表裏両面に、チップ周縁部に電極パッドを配置した第1の半導体チップ41をダイパッド43の表面へ、また、チップ中央に電極パッドを配置した第2の半導体チップ42をダイパッド43の裏面へ、夫々の素子面を上側に揃えて接着固定され、各半導体チップ41,42とリードフレームのインナリード46への接続は、ダイパッド43の表裏両面の各半導体チップ41,42の各電極パッド45a,45bが、夫々ワイヤ47a,47bを介してインナリード46の表面へ接続される構造となっている。   As shown in FIG. 7, the stacked semiconductor device having the third conventional structure includes a first semiconductor chip 41 in which electrode pads are arranged on the front and back surfaces of the die pad 43 of the lead frame, and the surface of the die pad 43. Further, the second semiconductor chip 42 having an electrode pad disposed at the center of the chip is bonded and fixed to the back surface of the die pad 43 with the respective element surfaces aligned on the upper side, and the inner leads of each of the semiconductor chips 41 and 42 and the lead frame are fixed. The connection to 46 has a structure in which the electrode pads 45a and 45b of the semiconductor chips 41 and 42 on both the front and back surfaces of the die pad 43 are connected to the surface of the inner lead 46 via wires 47a and 47b, respectively.

上記第3の従来構造の積層型半導体装置は、以下に示すような製造方法で製造される。先ず初めに、リードフレームの中央に開口部を有するダイパッド43の裏面(下面)に、同様に中央に開口部を有する接着テープ44bを貼付し、ダイパッド43の裏面に第2の半導体チップ42の素子面(表面)を対向させて接着する。このとき、チップ中央に配置された第2の半導体チップ42の電極パッド45aが、ダイパッド43の開口部内に露出する。次に、第2の半導体チップ42の電極パッド45bとインナリード46の表面(上面)との間を、ダイパッド43の上側を跨ぎダイパッド43の開口部を通過するワイヤ47aにて接続する。次に、ダイパッド43の表面(上面)に非導電性の接着剤44aを塗布するとともに、ダイパッド43の開口部内を充填し、ダイパッド43の表面に第1の半導体チップ41を搭載し固定する。次に、第1の半導体チップ41の電極パッド41aとインナリード46の表面(上面)との間をワイヤ47aにて接続する。その後、半導体チップ41,42、ダイパッド43、インナリード46、及び、ワイヤ47a,47bを樹脂で封止し、リードフレームの外枠から分離する。   The stacked semiconductor device having the third conventional structure is manufactured by the following manufacturing method. First, an adhesive tape 44b having an opening at the center is similarly applied to the back surface (lower surface) of the die pad 43 having an opening at the center of the lead frame, and the element of the second semiconductor chip 42 is attached to the back of the die pad 43. Adhere with the faces facing each other. At this time, the electrode pad 45 a of the second semiconductor chip 42 disposed in the center of the chip is exposed in the opening of the die pad 43. Next, the electrode pad 45 b of the second semiconductor chip 42 and the surface (upper surface) of the inner lead 46 are connected by a wire 47 a that straddles the upper side of the die pad 43 and passes through the opening of the die pad 43. Next, a non-conductive adhesive 44 a is applied to the surface (upper surface) of the die pad 43, the inside of the die pad 43 is filled, and the first semiconductor chip 41 is mounted and fixed on the surface of the die pad 43. Next, the electrode pad 41a of the first semiconductor chip 41 and the surface (upper surface) of the inner lead 46 are connected by a wire 47a. Thereafter, the semiconductor chips 41 and 42, the die pad 43, the inner leads 46, and the wires 47a and 47b are sealed with resin and separated from the outer frame of the lead frame.

特開平11−317488号公報JP 11-317488 A 特開2004−200683号公報Japanese Patent Laid-Open No. 2004-200683

しかしながら、上述した第2及び第3の従来構造による積層型半導体装置では、以下に示すような問題点がある。即ち、第2の従来構造による積層型半導体装置では、ダイパッドの表面側に搭載する半導体チップをダイパッドの裏面側に搭載する半導体チップより小さくして、ダイパッドを両半導体チップの中間的な大きさとすることで、裏面側に搭載する半導体チップの電極パッド上方のワイヤ接続に要する空間的余裕を確保しているため、同じチップ面積の半導体チップをダイパッドの表裏両面に搭載した積層型半導体装置を実現することができない。   However, the stacked semiconductor devices according to the second and third conventional structures described above have the following problems. That is, in the stacked semiconductor device according to the second conventional structure, the semiconductor chip mounted on the front surface side of the die pad is made smaller than the semiconductor chip mounted on the back surface side of the die pad so that the die pad is an intermediate size between the two semiconductor chips. As a result, a space margin required for wire connection above the electrode pad of the semiconductor chip mounted on the back surface side is secured, so a stacked semiconductor device in which semiconductor chips having the same chip area are mounted on both the front and back surfaces of the die pad is realized. I can't.

更に、第3の従来構造による積層型半導体装置では、ダイパッドの裏面側に搭載する半導体チップの電極パッドをチップ中央に配置する必要があり、半導体チップの設計に制約ができ、チップ周縁部に電極パッドを配置した同種の半導体チップを積層することができない。極端に言えば、チップ周縁部に電極パッドを配置した同じ半導体チップを積層することができない。また、ダイパッドの表面とダイパッドの表面側に搭載する半導体チップの裏面間に、ダイパッドの裏面側に搭載する半導体チップとインナリードを接続するワイヤが通過し、ワイヤも長く撓み易くなるため、当該間隔を相当に確保する必要が生じることから、2つの半導体チップを積層した厚みが大きくなる。従って、パッケージの厚みに制約がある場合は、当該間隔が狭くなり、ワイヤがダイパッドの表面或いは上側の半導体チップの裏面と接触する虞がある。   Furthermore, in the stacked semiconductor device having the third conventional structure, the electrode pad of the semiconductor chip to be mounted on the back side of the die pad needs to be arranged in the center of the chip, which can restrict the design of the semiconductor chip, It is impossible to stack the same kind of semiconductor chips on which pads are arranged. Speaking extremely, it is not possible to stack the same semiconductor chip in which electrode pads are arranged on the periphery of the chip. In addition, a wire connecting the semiconductor chip mounted on the back side of the die pad and the inner lead passes between the front surface of the die pad and the back surface of the semiconductor chip mounted on the front side of the die pad, and the wire also becomes long and easily bent. Therefore, the thickness of the two semiconductor chips stacked is increased. Therefore, when there is a restriction on the thickness of the package, the interval is narrowed, and there is a possibility that the wire contacts the surface of the die pad or the back surface of the upper semiconductor chip.

本発明は上記の問題点に鑑みてなされたものであり、その目的は、同一若しくは略同一のチップ面積の半導体チップを簡易に積層可能な構造の積層型半導体装置を提供する点にある。   The present invention has been made in view of the above problems, and an object thereof is to provide a stacked semiconductor device having a structure in which semiconductor chips having the same or substantially the same chip area can be stacked easily.

上記目的を達成するための本発明に係る積層型半導体装置は、半導体チップをダイボンディング部材の表裏両面に夫々搭載する積層型半導体装置であって、前記ダイボンディング部材の裏面側に搭載される第1半導体チップの表面と前記ダイボンディング部材の裏面とを対向させて接着し、前記ダイボンディング部材の表面側に搭載される第2半導体チップの裏面と前記ダイボンディング部材の表面とを対向させて接着し、前記第1半導体チップの表面に形成された1または複数の電極パッドと、対応するインナリードの表面側とをワイヤで接続し、前記第2半導体チップの表面に形成された1または複数の電極パッドと、対応するインナリードの表面側とをワイヤで接続して形成され、前記ダイボンディング部材の表面及び裏面の各面積が、前記第1半導体チップと前記第2半導体チップの各チップ面積より小さく、前記第1半導体チップの前記電極パッドが、前記第1半導体チップの表面の前記ダイボンディング部材の裏面との接着面以外の領域に設けられ、前記第1半導体チップの前記電極パッドと接続する前記ワイヤが、前記第1半導体チップの表面と前記第2半導体チップの裏面と前記ダイボンディング部材の外側面に囲まれた凹入空間を通過して斜め上方から前記第1半導体チップの前記電極パッドに向けて進入していることを第1の特徴とする。   In order to achieve the above object, a stacked semiconductor device according to the present invention is a stacked semiconductor device in which semiconductor chips are mounted on both front and back surfaces of a die bonding member, and is mounted on the back side of the die bonding member. 1 The front surface of the semiconductor chip and the back surface of the die bonding member are bonded to face each other, and the back surface of the second semiconductor chip mounted on the front surface side of the die bonding member and the surface of the die bonding member are bonded to each other. Then, one or more electrode pads formed on the surface of the first semiconductor chip are connected to the surface side of the corresponding inner lead by a wire, and one or more electrode pads formed on the surface of the second semiconductor chip are connected. It is formed by connecting the electrode pad and the corresponding inner lead surface side with a wire, and each area of the front surface and the back surface of the die bonding member is The area of each of the first semiconductor chip and the second semiconductor chip is smaller than each chip area, and the electrode pad of the first semiconductor chip is a region other than the adhesive surface between the surface of the first semiconductor chip and the back surface of the die bonding member. And the wire connected to the electrode pad of the first semiconductor chip is surrounded by a front surface of the first semiconductor chip, a back surface of the second semiconductor chip, and an outer surface of the die bonding member. The first feature is that the light enters the electrode pad of the first semiconductor chip obliquely from above.

更に、本発明に係る積層型半導体装置は、上記第1の特徴に加えて、前記第1半導体チップと前記第2半導体チップの各チップ面積が同じまたは略同じであることを第2の特徴とする。   Furthermore, in addition to the first feature described above, the stacked semiconductor device according to the present invention has the second feature that the chip areas of the first semiconductor chip and the second semiconductor chip are the same or substantially the same. To do.

更に、本発明に係る積層型半導体装置は、上記第1または第2の特徴に加えて、前記第1半導体チップの表面と前記ダイボンディング部材の裏面が、接着剤または接着テープにより接着されていることを第3の特徴とする。   Furthermore, in the stacked semiconductor device according to the present invention, in addition to the first or second feature, the front surface of the first semiconductor chip and the back surface of the die bonding member are bonded with an adhesive or an adhesive tape. This is the third feature.

更に、本発明に係る積層型半導体装置は、上記第1乃至第3の何れかの特徴に加えて、前記第2半導体チップの裏面と前記ダイボンディング部材の表面が、接着剤または接着テープにより接着されていることを第4の特徴とする。   Furthermore, in the stacked semiconductor device according to the present invention, in addition to any one of the first to third features, the back surface of the second semiconductor chip and the surface of the die bonding member are bonded with an adhesive or an adhesive tape. This is a fourth feature.

更に、本発明に係る積層型半導体装置は、上記第1乃至第4の何れかの特徴に加えて、前記ダイボンディング部材が、吊りリードで支持される矩形状のダイパッドであることを第5の特徴とする。   Furthermore, in the stacked semiconductor device according to the present invention, in addition to any one of the first to fourth features, a fifth aspect is that the die bonding member is a rectangular die pad supported by a suspension lead. Features.

更に、本発明に係る積層型半導体装置は、上記第1乃至第4の何れかの特徴に加えて、前記ダイボンディング部材が、矩形状のダイパッドを備えず前記ダイパッドを支持するための吊りリードだけで形成されていることを第6の特徴とする。   Furthermore, in the stacked semiconductor device according to the present invention, in addition to any of the first to fourth features, the die bonding member is not provided with a rectangular die pad, but only a suspension lead for supporting the die pad. The sixth feature is that it is formed as described above.

更に、本発明に係る積層型半導体装置は、上記第5の特徴に加えて、前記第1半導体チップの前記電極パッドが、前記第1半導体チップの表面の周縁部に複数配置され、前記ダイパッドが、前記第1半導体チップの前記複数の電極パッドによって包囲される最大矩形領域より小さいことを第7の特徴とする。   Furthermore, in the stacked semiconductor device according to the present invention, in addition to the fifth feature, a plurality of the electrode pads of the first semiconductor chip are arranged on a peripheral edge portion of the surface of the first semiconductor chip, and the die pad includes The seventh feature is that the area is smaller than a maximum rectangular area surrounded by the plurality of electrode pads of the first semiconductor chip.

更に、本発明に係る積層型半導体装置は、上記第5乃至第7の何れかの特徴に加えて、前記吊りリードが、前記第1半導体チップの前記電極パッドに重ならない位置に設けてあることを第8の特徴とする。   Furthermore, in the stacked semiconductor device according to the present invention, in addition to any of the fifth to seventh features, the suspension lead is provided at a position that does not overlap the electrode pad of the first semiconductor chip. Is the eighth feature.

上記何れかの特徴を備えた積層型半導体装置によれば、ダイボンディング部材の表面及び裏面の各面積が、第1半導体チップと第2半導体チップの各チップ面積より小さいため、ダイボンディング部材の厚みと、ダイボンディング部材と各半導体チップを接着する接着材料の厚みを足した厚みに等しい高さの凹入空間が、ダイボンディング部材の裏面側に搭載される第1半導体チップの周縁部に形成され、第1半導体チップの表面の周縁部に形成された電極パッドが当該凹入空間に露出し、ワイヤが当該凹入空間を通過して斜め上方から第1半導体チップの電極パッドに向けて進入して接続するため、ワイヤがダイボンディング部材の表面側に搭載される第2半導体チップの周縁部に干渉されず電極パッドとインナリード間を接続できる。この結果、同一若しくは略同一のチップ面積の半導体チップを積層する積層型半導体装置を提供することができる。   According to the stacked semiconductor device having any one of the above characteristics, the area of the front surface and the back surface of the die bonding member is smaller than the chip areas of the first semiconductor chip and the second semiconductor chip. And a recessed space having a height equal to the sum of the thickness of the adhesive material for bonding the die bonding member and each semiconductor chip is formed in the peripheral portion of the first semiconductor chip mounted on the back side of the die bonding member. The electrode pad formed on the peripheral edge of the surface of the first semiconductor chip is exposed to the recessed space, and the wire passes through the recessed space and enters the electrode pad of the first semiconductor chip obliquely from above. Therefore, the wire can be connected between the electrode pad and the inner lead without interfering with the peripheral portion of the second semiconductor chip mounted on the surface side of the die bonding member. As a result, it is possible to provide a stacked semiconductor device in which semiconductor chips having the same or substantially the same chip area are stacked.

また、第1半導体チップと第2半導体チップの何れの電極パッドもチップ表面の周縁部に配置することができるため、電極パッドとインナリード間を接続するワイヤ長が短くなり、ワイヤの撓み等に起因する接触不良を低減でき、ワイヤに寄生する誘導成分を軽減でき、寄生誘導成分に起因するノイズを低減でき電気的特性の向上が図れる。   In addition, since any electrode pad of the first semiconductor chip and the second semiconductor chip can be disposed at the peripheral portion of the chip surface, the length of the wire connecting the electrode pad and the inner lead is shortened. The resulting contact failure can be reduced, the inductive component parasitic on the wire can be reduced, the noise caused by the parasitic inductive component can be reduced, and the electrical characteristics can be improved.

尚、本発明の記載において、チップ表面或いは半導体チップの表面とは、半導体チップの基板に対して半導体素子等の回路素子が形成されている側の表面を意味する。従って、半導体チップの裏面は、半導体チップの表面とは反対側の面を意味する。また、チップ表面の周縁部とは、半導体チップの各端辺からチップ中心部に向けて後退した領域を意味する。   In the description of the present invention, the chip surface or the surface of the semiconductor chip means a surface on the side where circuit elements such as semiconductor elements are formed with respect to the substrate of the semiconductor chip. Therefore, the back surface of the semiconductor chip means a surface opposite to the front surface of the semiconductor chip. In addition, the peripheral portion of the chip surface means a region that is recessed from each end of the semiconductor chip toward the center of the chip.

特に、上記第3の特徴の積層型半導体装置によれば、第1半導体チップの表面とダイボンディング部材の裏面を接着する接着材料として、接着剤または接着テープを使用して上記作用効果を奏することができる。また、接着材料は、第1半導体チップの表面に絶縁性の保護膜が被覆されているので、導電性材料と絶縁性材料の両方の使用が可能である。   In particular, according to the stacked semiconductor device of the third feature, the above-described effects can be obtained by using an adhesive or an adhesive tape as an adhesive material for bonding the front surface of the first semiconductor chip and the back surface of the die bonding member. Can do. In addition, since the adhesive material is coated with an insulating protective film on the surface of the first semiconductor chip, both a conductive material and an insulating material can be used.

特に、上記第4の特徴の積層型半導体装置によれば、第2半導体チップの裏面とダイボンディング部材の表面を接着する接着材料として、接着剤または接着テープを使用して上記作用効果を奏することができる。また、接着材料は導電性材料と絶縁性材料の両方の使用が可能である。更に、接着テープのテープ材質が絶縁性の場合は、第2半導体チップの裏面全面に接着テープを貼付することで、第2半導体チップの裏面が導電性である場合における第1半導体チップの電極パッドと接続するワイヤが第2半導体チップの裏面に接触することによる短絡不良を防止できる。   In particular, according to the stacked semiconductor device of the fourth feature, the above-described effects can be obtained by using an adhesive or an adhesive tape as an adhesive material for bonding the back surface of the second semiconductor chip and the surface of the die bonding member. Can do. Further, the adhesive material can use both a conductive material and an insulating material. Further, when the tape material of the adhesive tape is insulative, the electrode tape of the first semiconductor chip in the case where the back surface of the second semiconductor chip is conductive by applying the adhesive tape to the entire back surface of the second semiconductor chip. Can be prevented from being short-circuited due to the wire connected to contact with the back surface of the second semiconductor chip.

特に、上記第8の特徴の積層型半導体装置によれば、ワイヤが吊りリードに干渉されることなく第1半導体チップの電極パッドに接続することができ、上記作用効果を奏することができる。   In particular, according to the stacked semiconductor device having the eighth feature, the wire can be connected to the electrode pad of the first semiconductor chip without being interfered by the suspension lead, and the above-described effects can be obtained.

更に、本発明に係る積層型半導体装置の製造方法は、上記第1の特徴の積層型半導体装置の製造方法であって、前記ダイボンディング部材の裏面側に、前記第1半導体チップの表面と前記ダイボンディング部材の裏面とを対向させて接着する第1ダイボンディング工程と、前記第1ダイボンディング工程の後に、前記第1半導体チップの表面に形成された1または複数の電極パッドと、対応するインナリードの表面側とをワイヤで接続する第1ワイヤリング工程と、前記第1ワイヤリング工程の後に、前記ダイボンディング部材の表面側に、前記第2半導体チップの裏面と前記ダイボンディング部材の表面とを対向させて接着する第2ダイボンディング工程と、前記第2ダイボンディング工程の後に、前記第2半導体チップの表面に形成された1または複数の電極パッドと、対応するインナリードの表面側とをワイヤで接続する第2ワイヤリング工程と、を順次実行することを第1の特徴とする。   Furthermore, the manufacturing method of the stacked semiconductor device according to the present invention is the manufacturing method of the stacked semiconductor device according to the first feature, wherein the surface of the first semiconductor chip and the surface of the first semiconductor chip are disposed on the back surface side of the die bonding member. A first die bonding step in which the back surface of the die bonding member is opposed to each other, and one or more electrode pads formed on the surface of the first semiconductor chip after the first die bonding step; A first wiring step for connecting the front surface side of the lead with a wire, and after the first wiring step, the back surface of the second semiconductor chip and the front surface of the die bonding member are opposed to the front surface side of the die bonding member. Formed on the surface of the second semiconductor chip after the second die bonding step and the second die bonding step. One or a plurality of electrode pads, and a second wiring step for connecting the surface side of the corresponding inner leads by wires, the sequential first feature to run the for.

上記第1の特徴の積層型半導体装置の製造方法によれば、第1ワイヤリング工程時には、ダイボンディング部材の表面側に第2半導体チップが接着されていないので、第1半導体チップの電極パッドの上方が開放されている状態で、容易にワイヤを電極パッドに接続することができ、上述の作用効果を奏する本発明に係る積層型半導体装置を製造することができる。   According to the manufacturing method of the stacked semiconductor device having the first feature, the second semiconductor chip is not bonded to the surface side of the die bonding member during the first wiring process, so the upper side of the electrode pad of the first semiconductor chip. In the open state, the wire can be easily connected to the electrode pad, and the stacked semiconductor device according to the present invention having the above-described effects can be manufactured.

更に、本発明に係る積層型半導体装置の製造方法は、上記第1の特徴に加えて、前記第1ワイヤリング工程において、前記ワイヤを前記電極パッドの表面から外側斜め上方に向けて延伸するように接続することを第2の特徴とする。   Furthermore, in addition to the first feature, the method for manufacturing a stacked semiconductor device according to the present invention extends, in the first wiring step, the wire from the surface of the electrode pad obliquely upward to the outside. The second feature is to connect.

上記第2の特徴の積層型半導体装置の製造方法によれば、第1ワイヤリング工程において第1半導体チップの電極パッドと接続されたワイヤが、凹入空間の高さ内を通過でき、第1ワイヤリング工程に続く第2ダイボンディング工程において、第2半導体チップの裏面とダイボンディング部材の表面とを対向させて接着する際に、第1半導体チップの電極パッドと接続されたワイヤが第2半導体チップの裏面と接触して、第2半導体チップの裏面とダイボンディング部材の表面との接着不良、或いは、ワイヤの接続不良が生じるのを防止できる。   According to the method for manufacturing a stacked semiconductor device of the second feature, the wire connected to the electrode pad of the first semiconductor chip in the first wiring step can pass through the height of the recessed space, and the first wiring In the second die bonding step subsequent to the step, when the back surface of the second semiconductor chip and the front surface of the die bonding member are bonded to face each other, the wire connected to the electrode pad of the first semiconductor chip is connected to the second semiconductor chip. It is possible to prevent occurrence of poor adhesion between the back surface of the second semiconductor chip and the surface of the die bonding member or poor connection of the wires by contacting the back surface.

以下、本発明に係る積層型半導体装置、及び、その製造方法(以下、適宜「本発明装置」及び「本発明方法」と略称する)の実施形態を図面に基づいて説明する。   DESCRIPTION OF EMBODIMENTS Hereinafter, embodiments of a stacked semiconductor device according to the present invention and a manufacturing method thereof (hereinafter, appropriately abbreviated as “device of the present invention” and “method of the present invention”) will be described with reference to the drawings.

〈第1実施形態〉
図1に示すように、本発明装置11は、同一チップ面積の2つの半導体チップ1,2をダイパッド3(ダイボンディング部材に相当)の表裏両面に夫々搭載して1つの樹脂パッケージ内に封止した積層型半導体装置である。図1(A)は、本発明装置11の樹脂封止部分の内部構造をパッケージ上面より透視した平面透視図であって、ダイパッド3の表面側に搭載される第2半導体チップ2の一部(図面上の上半分)を破砕して、第2半導体チップ2の裏面側に位置するダイパッド3とダイパッド3の裏面側に搭載される第1半導体チップ1を露出させた状態を模式的に示す一部破砕平面透視図である。図1(B)は、図1(A)に示すX−X’断面における本発明装置11の断面構造を模式的に示す縦断面図である。
<First Embodiment>
As shown in FIG. 1, the device 11 of the present invention mounts two semiconductor chips 1 and 2 having the same chip area on both front and back surfaces of a die pad 3 (corresponding to a die bonding member) and seals them in one resin package. This is a stacked semiconductor device. FIG. 1A is a plan perspective view of the internal structure of the resin-sealed portion of the device 11 of the present invention seen through the top surface of the package, and a part of the second semiconductor chip 2 mounted on the surface side of the die pad 3 ( The upper half of the drawing) is crushed and schematically shows a state in which the die pad 3 located on the back side of the second semiconductor chip 2 and the first semiconductor chip 1 mounted on the back side of the die pad 3 are exposed. FIG. FIG. 1B is a longitudinal sectional view schematically showing a sectional structure of the device 11 of the present invention in the section XX ′ shown in FIG.

図1に示すように、本発明装置11は、ダイパッド3の裏面側に搭載される第1半導体チップ1の表面とダイパッド3の裏面とを対向させて接着し、ダイパッド3の表面側に搭載される第2半導体チップ2の裏面とダイパッド3の表面とを対向させて接着し、第1半導体チップ1の表面周縁部に形成された1または複数の電極パッド5aと対応するインナリード6の表面側とをワイヤ7aで接続し、第2半導体チップ2の表面周縁部に形成された1または複数の電極パッド5bと対応するインナリード6の表面側とをワイヤ7bで接続して形成されている。   As shown in FIG. 1, the device 11 of the present invention is mounted on the front surface side of the die pad 3 by adhering the front surface of the first semiconductor chip 1 mounted on the back surface side of the die pad 3 to the back surface of the die pad 3. The back surface of the second semiconductor chip 2 and the surface of the die pad 3 are bonded to face each other, and the inner lead 6 corresponding to one or a plurality of electrode pads 5a formed on the front surface peripheral portion of the first semiconductor chip 1 Are connected by a wire 7a, and one or a plurality of electrode pads 5b formed on the peripheral edge of the surface of the second semiconductor chip 2 and the corresponding surface side of the inner lead 6 are connected by a wire 7b.

ダイパッド3は、第1半導体チップ1及び第2半導体チップ2より小さい矩形状で、図1に示す例では、4隅において吊りリード9によって支持されている。インナリード6は樹脂封止部分より外側は、図示しないアウタリードとして、吊りリード9とともに、樹脂封止前にはリードフレームの外枠(図示せず)に接続して支持されている。ダイパッド3、インナリード6、及び、吊りリード9を含むリードフレームは、42アロイ等のFe−Ni合金系材料や、Cu合金系材料等の公知の金属材料を使用して形成されている。   The die pad 3 has a rectangular shape smaller than that of the first semiconductor chip 1 and the second semiconductor chip 2 and is supported by suspension leads 9 at four corners in the example shown in FIG. Outside the resin-encapsulated portion, the inner lead 6 is supported as an outer lead (not shown) together with the suspension lead 9 and connected to an outer frame (not shown) of the lead frame before resin encapsulation. The lead frame including the die pad 3, the inner lead 6, and the suspension lead 9 is formed using a known metal material such as an Fe—Ni alloy material such as 42 alloy or a Cu alloy material.

本発明装置11に搭載する第1半導体チップ1及び第2半導体チップ2は、チップ表面の周縁部に、夫々の電極パッド5a,5bを各別に配置している。ダイパッド3の縦横の各寸法は、第1半導体チップ1の縦横の各寸法に対して、第1半導体チップ1のチップ端辺から電極パッド5aの最もチップ内部寄りの位置までの距離にワイヤボンディング時の位置合わせ精度等を考慮したマージンを追加した長さの2倍以上短くなっている。これにより、第1半導体チップ1の表面とダイパッド3の裏面とを対向させて接着した場合に、第1半導体チップ1の表面周縁部に配置された各電極パッド5aがダイパッド3によって遮蔽されることがなく、ワイヤボンディング可能となる。   The first semiconductor chip 1 and the second semiconductor chip 2 mounted on the device 11 of the present invention are provided with respective electrode pads 5a and 5b on the periphery of the chip surface. The vertical and horizontal dimensions of the die pad 3 are the distances from the chip end side of the first semiconductor chip 1 to the position closest to the inside of the electrode pad 5a with respect to the vertical and horizontal dimensions of the first semiconductor chip 1 during wire bonding. The length is more than twice as long as a margin added in consideration of the positioning accuracy. Thus, when the front surface of the first semiconductor chip 1 and the back surface of the die pad 3 are bonded to face each other, the electrode pads 5 a arranged on the peripheral edge of the front surface of the first semiconductor chip 1 are shielded by the die pad 3. No wire bonding is possible.

また、本実施形態では、ダイパッド3を4隅で支持する4本の吊りリード9の位置、つまり、第1半導体チップ1の表面の4隅には、電極パッド5aを配置しておらず、電極パッド5aが吊りリード9によって遮蔽されることがなく、ワイヤボンディング可能となる。尚、第1半導体チップ1の表面の4隅に電極パッド5aが配置されている場合には、他の電極パッド5aの間隔が大きく空いている個所に、吊りリード9の位置を合わせればよい。   In the present embodiment, the electrode pads 5 a are not disposed at the positions of the four suspension leads 9 that support the die pad 3 at the four corners, that is, at the four corners of the surface of the first semiconductor chip 1. The pad 5a is not shielded by the suspension lead 9, and wire bonding is possible. Note that when the electrode pads 5a are arranged at the four corners of the surface of the first semiconductor chip 1, the position of the suspension leads 9 may be adjusted to a location where the distance between the other electrode pads 5a is large.

図1(B)に示すように、本発明装置11では、同一チップ面積の2つの半導体チップ1,2を、それより面積小さいダイパッド3の表裏両面に接着することで、第1半導体チップ1の表面と第2半導体チップ2の裏面とダイパッド3の外側面に囲まれた凹入空間12がダイパッド3の吊りリード9を除く周囲に形成され、第1半導体チップ1の電極パッド5aと接続するワイヤ7aが、凹入空間12を通過して斜め上方から電極パッド5aに向けて進入しているため、ワイヤ7aがその上方に位置する第2半導体チップ2の裏面に干渉されずに、電極パッド5aとワイヤボンディング可能となる。   As shown in FIG. 1B, in the device 11 of the present invention, the two semiconductor chips 1 and 2 having the same chip area are bonded to both the front and back surfaces of the die pad 3 having a smaller area than the first semiconductor chip 1. A recessed space 12 surrounded by the front surface, the back surface of the second semiconductor chip 2, and the outer surface of the die pad 3 is formed in the periphery except for the suspension leads 9 of the die pad 3, and is a wire connected to the electrode pad 5 a of the first semiconductor chip 1. 7a passes through the recessed space 12 and enters the electrode pad 5a obliquely from above, so that the wire 7a is not interfered with the back surface of the second semiconductor chip 2 positioned above the electrode pad 5a. Wire bonding is possible.

次に、本発明装置11の製造方法について説明する。先ず、図2(A)に示すように、ダイパッド3の裏面側に、第1半導体チップ1の表面とダイパッド3の裏面とを対向させて、接着剤4aを塗布して貼り合せた後に硬化させて接着する(第1ダイボンディング工程)。本実施形態で使用する接着剤4aとしては、例えば、有機樹脂系接着材料を使用できるが、導電性接着材料と絶縁性接着材料の両方の使用が可能である。   Next, a method for manufacturing the device 11 of the present invention will be described. First, as shown in FIG. 2 (A), the front surface of the first semiconductor chip 1 and the back surface of the die pad 3 are opposed to the back surface side of the die pad 3, and the adhesive 4a is applied and bonded, and then cured. And bond (first die bonding step). As the adhesive 4a used in the present embodiment, for example, an organic resin adhesive material can be used, but both a conductive adhesive material and an insulating adhesive material can be used.

引き続き、図2(B)に示すように、第1半導体チップの表面周縁部に形成された電極パッド5aと、対応するインナリード6の表面側とをワイヤ7aで接続する(第1ワイヤリング工程)。このとき、ワイヤ7aを電極パッド5aの表面から外側斜め上方に向けて延伸するように接続する。本実施形態では、ワイヤ7aが、次工程の第2ダイボンディング工程によって形成される凹入空間12を通過する角度で電極パッド5aに進入してワイヤリングする必要があり、例えば、超音波ワイヤボンディング等のウェッジボンディング法を使用することができる。   Subsequently, as shown in FIG. 2B, the electrode pads 5a formed on the surface peripheral edge portion of the first semiconductor chip and the surface side of the corresponding inner lead 6 are connected by the wire 7a (first wiring process). . At this time, the wire 7a is connected so as to extend outward and obliquely upward from the surface of the electrode pad 5a. In the present embodiment, it is necessary to wire the wire 7a by entering the electrode pad 5a at an angle passing through the recessed space 12 formed by the second die bonding step of the next step. For example, ultrasonic wire bonding or the like The wedge bonding method can be used.

引き続き、図2(C)に示すように、ダイパッド3の表面側に、第2半導体チップ2の裏面とダイパッド3の表面とを対向させて、接着剤4bを塗布して貼り合せた後に硬化させて接着する(第2ダイボンディング工程)。本実施形態で使用する接着剤4bとしては、例えば、有機樹脂系接着材料を使用できるが、導電性接着材料と絶縁性接着材料の両方の使用が可能であり、第1ダイボンディング工程で使用する接着剤4aと同じ接着剤を使用できる。   Subsequently, as shown in FIG. 2C, the back surface of the second semiconductor chip 2 and the front surface of the die pad 3 are opposed to the front surface side of the die pad 3, and the adhesive 4b is applied and bonded, and then cured. And bond (second die bonding step). As the adhesive 4b used in the present embodiment, for example, an organic resin-based adhesive material can be used, but both a conductive adhesive material and an insulating adhesive material can be used and used in the first die bonding step. The same adhesive as the adhesive 4a can be used.

引き続き、図2(D)に示すように、第2半導体チップ2の表面周縁部に形成された電極パッド5bと、対応するインナリード6の表面側とをワイヤ7bで接続する(第2ワイヤリング工程)。ここで、インナリード6の表面側とワイヤ7bの接続点を、第1ワイヤリング工程におけるインナリード6の表面側とワイヤ7aの接続点より、外側(アウタリード寄り)にすることで、既存のワイヤ7aに干渉されずに、ワイヤ7bをインナリード6の表面側にワイヤボンディング可能となる。   Subsequently, as shown in FIG. 2D, the electrode pads 5b formed on the surface peripheral edge portion of the second semiconductor chip 2 and the surface side of the corresponding inner leads 6 are connected by wires 7b (second wiring process). ). Here, the connecting point between the surface side of the inner lead 6 and the wire 7b is outside (closer to the outer lead) than the connecting point between the surface side of the inner lead 6 and the wire 7a in the first wiring step, so that the existing wire 7a. The wire 7b can be bonded to the surface side of the inner lead 6 without interference.

引き続き、半導体チップ1,2、ダイパッド3、インナリード6、及び、ワイヤ7a,7bを樹脂8で封止し成型する。その後、樹脂成型された本発明装置11をリードフレームの外枠(図示せず)から切断して分離する。   Subsequently, the semiconductor chips 1 and 2, the die pad 3, the inner leads 6, and the wires 7 a and 7 b are sealed with the resin 8 and molded. Thereafter, the resin-molded device 11 of the present invention is cut and separated from the outer frame (not shown) of the lead frame.

〈第2実施形態〉
次に、本発明装置の第2実施形態について説明する。図3に示すように、第2実施形態の本発明装置11aは、同一チップ面積の2つの半導体チップ1,2を非矩形状のダイボンディング部材13の表裏両面に夫々搭載して1つの樹脂パッケージ内に封止した積層型半導体装置である。図3は、本発明装置11aの樹脂封止部分の内部構造をパッケージ上面より透視した平面透視図であって、ダイボンディング部材13の表面側に搭載される第2半導体チップ2の一部(図面上の上半分)を破砕して、第2半導体チップ2の裏面側に位置するダイボンディング部材13とダイボンディング部材13の裏面側に搭載される第1半導体チップ1を露出させた状態を模式的に示す一部破砕平面透視図である。
Second Embodiment
Next, a second embodiment of the device of the present invention will be described. As shown in FIG. 3, the inventive device 11a of the second embodiment has one resin package in which two semiconductor chips 1 and 2 having the same chip area are mounted on both front and back surfaces of a non-rectangular die bonding member 13, respectively. This is a stacked semiconductor device sealed inside. FIG. 3 is a plan perspective view of the internal structure of the resin-sealed portion of the device 11a of the present invention seen through the top surface of the package, and a part of the second semiconductor chip 2 mounted on the surface side of the die bonding member 13 (drawing). The upper half of the upper part) is crushed so that the die bonding member 13 located on the back side of the second semiconductor chip 2 and the first semiconductor chip 1 mounted on the back side of the die bonding member 13 are exposed. FIG.

図3に示すように、本発明装置11aは、ダイボンディング部材13の裏面側に搭載される第1半導体チップ1の表面とダイボンディング部材13の裏面とを対向させて接着し、ダイボンディング部材13の表面側に搭載される第2半導体チップ2の裏面とダイボンディング部材13の表面とを対向させて接着し、第1半導体チップ1の表面周縁部に形成された1または複数の電極パッド5aと対応するインナリード6の表面側とをワイヤ7aで接続し、第2半導体チップ2の表面周縁部に形成された1または複数の電極パッド5bと対応するインナリード6の表面側とをワイヤ7bで接続して形成されている。   As shown in FIG. 3, the device 11 a of the present invention adheres the front surface of the first semiconductor chip 1 mounted on the back surface side of the die bonding member 13 and the back surface of the die bonding member 13 so as to face each other. The back surface of the second semiconductor chip 2 mounted on the front surface side of the first semiconductor chip 1 and the surface of the die bonding member 13 are bonded to face each other, and one or a plurality of electrode pads 5a formed on the peripheral edge of the front surface of the first semiconductor chip 1; The corresponding inner lead 6 is connected to the surface side of the inner lead 6 by a wire 7a, and one or more electrode pads 5b formed on the peripheral edge of the surface of the second semiconductor chip 2 are connected to the corresponding inner lead 6 by the wire 7b. Connected and formed.

ダイボンディング部材13は、第1実施形態におけるダイパッド3と同じ機能を奏するもので、本実施形態では、4本の吊りリード9が、パッケージの中心部に向かって幅広の状態で延伸し、ダイパッド3が存在した矩形領域内で「X」字形状を呈し、X字状の各端部で、各吊りリード9によって支持されている。吊りリード9及びインナリード6は第1実施形態と同じである。また、ダイボンディング部材13、インナリード6、及び、吊りリード9を含むリードフレームは、42アロイ等のFe−Ni合金系材料や、Cu合金系材料等の公知の金属材料を使用して形成されている。   The die bonding member 13 has the same function as the die pad 3 in the first embodiment. In this embodiment, the four suspension leads 9 extend in a wide state toward the center of the package, and the die pad 3 It has an “X” shape within the rectangular region where the X exists, and is supported by each suspension lead 9 at each end of the X shape. The suspension lead 9 and the inner lead 6 are the same as in the first embodiment. The lead frame including the die bonding member 13, the inner lead 6, and the suspension lead 9 is formed using a known metal material such as a Fe-Ni alloy material such as 42 alloy or a Cu alloy material. ing.

本発明装置11aに搭載する第1半導体チップ1及び第2半導体チップ2は、第1実施形態と同様に、チップ表面の周縁部に、夫々の電極パッド5a,5bを各別に配置している。ここで、X字状のダイボンディング部材13に外接する矩形の縦横の各寸法は、第1半導体チップ1の縦横の各寸法に対して、第1半導体チップ1のチップ端辺から電極パッド5aの最もチップ内部寄りの位置までの距離にワイヤボンディング時の位置合わせ精度等を考慮したマージンを追加した長さの2倍以上短くなっている。しかし、第1実施形態と異なり、X字状のダイボンディング部材13に外接する矩形は、第1半導体チップ1及び第2半導体チップ2より大きくすることができる。つまり、第1半導体チップ1の表面に配置する電極パッド5aの位置を、ダイボンディング部材13と重ならないようにすればよく、ダイボンディング部材13の大きさ及び形状は、電極パッド5aの配置に合わせて適宜変更可能である。   As in the first embodiment, the first semiconductor chip 1 and the second semiconductor chip 2 mounted on the device 11a of the present invention have the electrode pads 5a and 5b arranged on the periphery of the chip surface, respectively. Here, the vertical and horizontal dimensions of the rectangle circumscribing the X-shaped die bonding member 13 are different from the vertical and horizontal dimensions of the first semiconductor chip 1 from the chip edge of the first semiconductor chip 1 to the electrode pad 5a. The distance to the position closest to the inside of the chip is at least twice as long as the added margin considering the alignment accuracy at the time of wire bonding. However, unlike the first embodiment, the rectangle circumscribing the X-shaped die bonding member 13 can be made larger than the first semiconductor chip 1 and the second semiconductor chip 2. That is, the position of the electrode pad 5a disposed on the surface of the first semiconductor chip 1 may be set so as not to overlap with the die bonding member 13. The size and shape of the die bonding member 13 are matched to the arrangement of the electrode pad 5a. Can be changed as appropriate.

本発明装置11aにおいても、第1実施形態と同様に、同一チップ面積の2つの半導体チップ1,2を、ダイボンディング部材13の表裏両面に接着することで、第1半導体チップ1の表面と第2半導体チップ2の裏面とダイボンディング部材13の外側面に囲まれた凹入空間12がダイボンディング部材13の吊りリード9を除く周囲に形成され、第1半導体チップ1の電極パッド5aと接続するワイヤ7aが、凹入空間12を通過して斜め上方から電極パッド5aに向けて進入しているため、ワイヤ7aがその上方に位置する第2半導体チップ2の裏面に干渉されずに、電極パッド5aとワイヤボンディング可能となる。更に、本発明装置11aの製造方法は、第1実施形態と同様であるので、重複する説明は割愛する。   In the inventive device 11a as well, as in the first embodiment, the two semiconductor chips 1 and 2 having the same chip area are bonded to both the front and back surfaces of the die bonding member 13 so that the surface of the first semiconductor chip 1 and the first semiconductor chip 1 (2) A recessed space 12 surrounded by the back surface of the semiconductor chip 2 and the outer surface of the die bonding member 13 is formed around the die bonding member 13 except for the suspension leads 9, and is connected to the electrode pads 5a of the first semiconductor chip 1. Since the wire 7a passes through the recessed space 12 and enters from the upper side toward the electrode pad 5a, the wire 7a is not interfered with the back surface of the second semiconductor chip 2 positioned above the electrode pad 5a. Wire bonding with 5a is possible. Furthermore, since the manufacturing method of this invention apparatus 11a is the same as that of 1st Embodiment, the overlapping description is omitted.

〈別実施形態〉
以下に、本発明装置の別実施形態について説明する。
<Another embodiment>
Hereinafter, another embodiment of the device of the present invention will be described.

〈1〉上記各実施形態では、第1ダイボンディング工程において、第1半導体チップ1の表面とダイパッド3(或いは、ダイボンディング部材13)の裏面とを対向させて、接着剤4aを塗布して貼り合せた後に硬化させて接着する場合を想定したが、図4に示すように、接着剤4aに代えて、接着剤が塗布されたポリイミドテープ等の接着テープ10aを用いるのも好ましい。この場合、ダイパッド3(或いは、ダイボンディング部材13)の裏面に予め、ダイパッド3(或いは、ダイボンディング部材13)と同形状の接着テープ10aを貼付してものを準備しておき、第1半導体チップ1の表面を接着テープ10a面に熱圧着して接着するようにすることで、工程の簡略化は図れる。   <1> In the above embodiments, in the first die bonding step, the front surface of the first semiconductor chip 1 and the back surface of the die pad 3 (or the die bonding member 13) are opposed to each other, and the adhesive 4a is applied and pasted. Although the case where it hardens | cures after bonding and adhere | attaches was assumed, as shown in FIG. 4, it is preferable to replace with the adhesive agent 4a and to use adhesive tapes 10a, such as a polyimide tape with which the adhesive agent was apply | coated. In this case, an adhesive tape 10a having the same shape as that of the die pad 3 (or die bonding member 13) is prepared in advance on the back surface of the die pad 3 (or die bonding member 13), and the first semiconductor chip is prepared. The process can be simplified by thermocompression bonding the surface of 1 to the surface of the adhesive tape 10a.

また同様に、第2ダイボンディング工程において、第2半導体チップ2の裏面とダイパッド3(或いは、ダイボンディング部材13)の表面とを対向させて、接着剤4bを塗布して貼り合せた後に硬化させて接着する場合を想定したが、接着剤4bに代えて、接着剤が塗布されたポリイミドテープ等の接着テープ10bを用いてもよい。   Similarly, in the second die bonding step, the back surface of the second semiconductor chip 2 and the front surface of the die pad 3 (or the die bonding member 13) are made to face each other, and the adhesive 4b is applied and bonded, and then cured. However, instead of the adhesive 4b, an adhesive tape 10b such as a polyimide tape to which an adhesive is applied may be used.

〈2〉上記各実施形態では、2つの半導体チップ1,2が同一チップ面積の場合を想定したが、各チップ面積は完全に一致している必要はなく、同じダイパッド3(或いは、ダイボンディング部材13)より大きく、樹脂封止可能な大きさである限りにおいて、略同一の面積であってもよい。   <2> In each of the above embodiments, it is assumed that the two semiconductor chips 1 and 2 have the same chip area. However, the chip areas do not have to be completely matched, and the same die pad 3 (or die bonding member). 13) It may be substantially the same area as long as it is larger and can be sealed with resin.

また、2つの半導体チップ1,2は全く同じ半導体チップである必要はなく、例えば、一方がロジックデバイスで、他方がメモリデバイスであってもよい。この場合、2つの半導体チップ1,2の夫々の電極パッド5a,1bで入力或いは出力する信号が異なる場合は、夫々に対して専用に設けられたインナリード6とワイヤ7a,7bによって接続するようにすればよい。   The two semiconductor chips 1 and 2 do not have to be exactly the same semiconductor chip. For example, one may be a logic device and the other may be a memory device. In this case, if the signals input or output by the electrode pads 5a and 1b of the two semiconductor chips 1 and 2 are different, the inner leads 6 and the wires 7a and 7b provided exclusively for the respective electrodes are connected. You can do it.

〈3〉上記各実施形態では、吊りリード9が4本の場合を例に説明したが、吊りリード9は、2本または3本、或いは、5本以上であっても構わない。   <3> In the above embodiments, the case where the number of the suspension leads 9 is four has been described as an example. However, the number of the suspension leads 9 may be two, three, or five or more.

〈4〉上記各実施形態では、インナリード6に接続するアウタリードの加工形状については、特に言及していなかったが、本発明装置は、DIP、SIP、ZIP、SOJ、SSOP、TSOP、QFP、TQFP、SON、QFN等の種々のパッケージ形状及びアウタリードの形状に適用可能である。   <4> In the above embodiments, the processing shape of the outer lead connected to the inner lead 6 is not particularly mentioned, but the present invention apparatus is DIP, SIP, ZIP, SOJ, SSOP, TSOP, QFP, TQFP. It is applicable to various package shapes such as SON, QFN, and outer lead shapes.

本発明に係る積層型半導体装置及び積層型半導体装置の製造方法は、複数の同一チップ面積、若しくは、類似したチップ面積の半導体チップをパッケージ内に積層して搭載した積層型半導体装置に利用可能である。   The stacked semiconductor device and the manufacturing method of the stacked semiconductor device according to the present invention can be used for a stacked semiconductor device in which a plurality of semiconductor chips having the same chip area or similar chip areas are stacked and mounted in a package. is there.

本発明に係る積層型半導体装置の第1実施形態における樹脂封止部分の内部構造を模式的に示す一部破砕平面透視図(A)と縦断面図(B)Partially fractured plan perspective view (A) and longitudinal sectional view (B) schematically showing the internal structure of a resin-sealed portion in the first embodiment of the stacked semiconductor device according to the present invention 本発明に係る積層型半導体装置の製造方法の各工程途中における積層型半導体装置の断面構造を模式的に示す工程断面図Process sectional drawing which shows typically the cross-section of the laminated semiconductor device in the middle of each process of the manufacturing method of the laminated semiconductor device which concerns on this invention 本発明に係る積層型半導体装置の第2実施形態における樹脂封止部分の内部構造を模式的に示す一部破砕平面透視図Partially fractured plan perspective view schematically showing the internal structure of a resin-sealed portion in a second embodiment of a stacked semiconductor device according to the present invention 本発明に係る積層型半導体装置の別実施形態における樹脂封止部分の断面構造を模式的に示す縦断面図The longitudinal cross-sectional view which shows typically the cross-section of the resin sealing part in another embodiment of the laminated semiconductor device which concerns on this invention 第1の従来構造の積層型半導体装置の断面構造を模式的に示す縦断面図1 is a longitudinal cross-sectional view schematically showing a cross-sectional structure of a first conventional stacked semiconductor device 第2の従来構造の積層型半導体装置の断面構造を模式的に示す縦断面図A longitudinal sectional view schematically showing a sectional structure of a stacked semiconductor device having a second conventional structure 第3の従来構造の積層型半導体装置の断面構造を模式的に示す縦断面図A longitudinal sectional view schematically showing a sectional structure of a third conventional stacked semiconductor device

符号の説明Explanation of symbols

11,11a: 本発明に係る積層型半導体装置
1: 第1半導体チップ
2: 第2半導体チップ
3: ダイパッド(ダイボンディング部材)
4a,4b: 接着剤
5a: 第1半導体チップの電極パッド
5b: 第2半導体チップの電極パッド
6: インナリード
7a,7b: ワイヤ
8: 樹脂
9: 吊りリード
10a,10b: 接着テープ
12: 凹入空間
13: ダイボンディング部材
21,31,41: ダイパッドの表面側に搭載される半導体チップ
22,32,42: ダイパッドの裏面側に搭載される半導体チップ
23,33,43: ダイパッド
24a,24b,34a,44a: 接着剤
25a,25b,35a,35b,45a,45b: 電極パッド
26,36,46: インナリード
27a,27b,37a,37b,47a,47b: ワイヤ
28,38,48: 樹脂
34b,44b: 接着テープ
11, 11a: Stacked semiconductor device according to the present invention 1: First semiconductor chip 2: Second semiconductor chip 3: Die pad (die bonding member)
4a, 4b: Adhesive 5a: Electrode pad of the first semiconductor chip 5b: Electrode pad of the second semiconductor chip 6: Inner lead 7a, 7b: Wire 8: Resin 9: Suspended lead 10a, 10b: Adhesive tape 12: Recessed Space 13: Die bonding member 21, 31, 41: Semiconductor chip mounted on the front side of the die pad 22, 32, 42: Semiconductor chip mounted on the back side of the die pad 23, 33, 43: Die pad 24a, 24b, 34a 44a: Adhesive 25a, 25b, 35a, 35b, 45a, 45b: Electrode pad 26, 36, 46: Inner lead 27a, 27b, 37a, 37b, 47a, 47b: Wire 28, 38, 48: Resin 34b, 44b : Adhesive tape

Claims (10)

半導体チップをダイボンディング部材の表裏両面に夫々搭載する積層型半導体装置であって、
前記ダイボンディング部材の裏面側に搭載される第1半導体チップの表面と前記ダイボンディング部材の裏面とを対向させて接着し、
前記ダイボンディング部材の表面側に搭載される第2半導体チップの裏面と前記ダイボンディング部材の表面とを対向させて接着し、
前記第1半導体チップの表面に形成された1または複数の電極パッドと、対応するインナリードの表面側とをワイヤで接続し、
前記第2半導体チップの表面に形成された1または複数の電極パッドと、対応するインナリードの表面側とをワイヤで接続して形成され、
前記ダイボンディング部材の表面及び裏面の各面積が、前記第1半導体チップと前記第2半導体チップの各チップ面積より小さく、
前記第1半導体チップの前記電極パッドが、前記第1半導体チップの表面の前記ダイボンディング部材の裏面との接着面以外の領域に設けられ、
前記第1半導体チップの前記電極パッドと接続する前記ワイヤが、前記第1半導体チップの表面と前記第2半導体チップの裏面と前記ダイボンディング部材の外側面に囲まれた凹入空間を通過して斜め上方から前記第1半導体チップの前記電極パッドに向けて進入していることを特徴とする積層型半導体装置。
A stacked semiconductor device in which a semiconductor chip is mounted on each of the front and back surfaces of a die bonding member,
Adhering the front surface of the first semiconductor chip mounted on the back surface side of the die bonding member and the back surface of the die bonding member facing each other,
Adhering the back surface of the second semiconductor chip mounted on the surface side of the die bonding member and the surface of the die bonding member facing each other,
Connecting one or more electrode pads formed on the surface of the first semiconductor chip to the surface side of the corresponding inner lead with a wire;
Formed by connecting one or more electrode pads formed on the surface of the second semiconductor chip to the surface side of the corresponding inner lead with a wire;
Each area of the front surface and the back surface of the die bonding member is smaller than each chip area of the first semiconductor chip and the second semiconductor chip,
The electrode pad of the first semiconductor chip is provided in a region other than the adhesive surface of the surface of the first semiconductor chip with the back surface of the die bonding member;
The wire connected to the electrode pad of the first semiconductor chip passes through a recessed space surrounded by the surface of the first semiconductor chip, the back surface of the second semiconductor chip, and the outer surface of the die bonding member. A stacked semiconductor device, wherein the semiconductor device enters from the upper side toward the electrode pad of the first semiconductor chip.
前記第1半導体チップと前記第2半導体チップの各チップ面積が同じまたは略同じであることを特徴とする請求項1に記載の積層型半導体装置。   2. The stacked semiconductor device according to claim 1, wherein the chip areas of the first semiconductor chip and the second semiconductor chip are the same or substantially the same. 前記第1半導体チップの表面と前記ダイボンディング部材の裏面が、接着剤または接着テープにより接着されていることを特徴とする請求項1または2に記載の積層型半導体装置。   3. The stacked semiconductor device according to claim 1, wherein a front surface of the first semiconductor chip and a back surface of the die bonding member are bonded by an adhesive or an adhesive tape. 前記第2半導体チップの裏面と前記ダイボンディング部材の表面が、接着剤または接着テープにより接着されていることを特徴とする請求項1〜3の何れか1項に記載の積層型半導体装置。   4. The stacked semiconductor device according to claim 1, wherein a back surface of the second semiconductor chip and a surface of the die bonding member are bonded with an adhesive or an adhesive tape. 5. 前記ダイボンディング部材が、吊りリードで支持される矩形状のダイパッドであることを特徴とする請求項1〜4の何れか1項に記載の積層型半導体装置。   5. The stacked semiconductor device according to claim 1, wherein the die bonding member is a rectangular die pad supported by a suspension lead. 前記ダイボンディング部材が、矩形状のダイパッドを備えず前記ダイパッドを支持するための吊りリードだけで形成されていることを特徴とする請求項1〜4の何れか1項に記載の積層型半導体装置。   5. The stacked semiconductor device according to claim 1, wherein the die bonding member is not provided with a rectangular die pad but is formed only with a suspension lead for supporting the die pad. 6. . 前記第1半導体チップの前記電極パッドが、前記第1半導体チップの表面の周縁部に複数配置され、
前記ダイパッドが、前記第1半導体チップの前記複数の電極パッドによって包囲される最大矩形領域より小さいことを特徴とする請求項5に記載の積層型半導体装置。
A plurality of the electrode pads of the first semiconductor chip are disposed on the peripheral edge of the surface of the first semiconductor chip;
6. The stacked semiconductor device according to claim 5, wherein the die pad is smaller than a maximum rectangular region surrounded by the plurality of electrode pads of the first semiconductor chip.
前記吊りリードが、前記第1半導体チップの前記電極パッドに重ならない位置に設けてあることを特徴とする請求項5〜7の何れか1項に記載の積層型半導体装置。   The stacked semiconductor device according to claim 5, wherein the suspension lead is provided at a position that does not overlap the electrode pad of the first semiconductor chip. 請求項1に記載の積層型半導体装置の製造方法であって、
前記ダイボンディング部材の裏面側に、前記第1半導体チップの表面と前記ダイボンディング部材の裏面とを対向させて接着する第1ダイボンディング工程と、
前記第1ダイボンディング工程の後に、前記第1半導体チップの表面に形成された1または複数の電極パッドと、対応するインナリードの表面側とをワイヤで接続する第1ワイヤリング工程と、
前記第1ワイヤリング工程の後に、前記ダイボンディング部材の表面側に、前記第2半導体チップの裏面と前記ダイボンディング部材の表面とを対向させて接着する第2ダイボンディング工程と、
前記第2ダイボンディング工程の後に、前記第2半導体チップの表面に形成された1または複数の電極パッドと、対応するインナリードの表面側とをワイヤで接続する第2ワイヤリング工程と、を順次実行することを特徴とする積層型半導体装置の製造方法。
A method of manufacturing a stacked semiconductor device according to claim 1,
A first die bonding step of bonding the front surface of the first semiconductor chip and the back surface of the die bonding member opposite to each other on the back surface side of the die bonding member;
After the first die bonding step, a first wiring step of connecting one or more electrode pads formed on the surface of the first semiconductor chip and the surface side of the corresponding inner lead with a wire;
A second die bonding step of bonding the back surface of the second semiconductor chip and the surface of the die bonding member opposite to each other on the surface side of the die bonding member after the first wiring step;
After the second die bonding step, a second wiring step of sequentially connecting one or a plurality of electrode pads formed on the surface of the second semiconductor chip and the surface side of the corresponding inner lead with a wire is sequentially executed. A method for manufacturing a stacked semiconductor device, comprising:
前記第1ワイヤリング工程において、前記ワイヤを前記電極パッドの表面から外側斜め上方に向けて延伸するように接続することを特徴とする請求項9に記載の積層型半導体装置の製造方法。
10. The method of manufacturing a stacked semiconductor device according to claim 9, wherein in the first wiring step, the wires are connected so as to extend outward and obliquely upward from the surface of the electrode pad. 11.
JP2006111469A 2006-04-14 2006-04-14 Laminated semiconductor device and method of the same Withdrawn JP2007287809A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017017340A (en) * 2016-09-29 2017-01-19 ラピスセミコンダクタ株式会社 Semiconductor device and measuring device
US9881855B2 (en) 2012-09-14 2018-01-30 Lapis Semiconductor Co., Ltd. Semiconductor device and metering apparatus
JP2019021944A (en) * 2018-11-07 2019-02-07 ラピスセミコンダクタ株式会社 Semiconductor device and measuring device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9881855B2 (en) 2012-09-14 2018-01-30 Lapis Semiconductor Co., Ltd. Semiconductor device and metering apparatus
US10242939B2 (en) 2012-09-14 2019-03-26 Lapis Semiconductor Co., Ltd. Semiconductor device and metering apparatus
JP2017017340A (en) * 2016-09-29 2017-01-19 ラピスセミコンダクタ株式会社 Semiconductor device and measuring device
JP2019021944A (en) * 2018-11-07 2019-02-07 ラピスセミコンダクタ株式会社 Semiconductor device and measuring device

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