JP2007201134A - Exposure apparatus, light source device therefor, and adjusting method of the exposure apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a light source device for an exposure apparatus capable of easily correcting unevenness in illumination intensity without using a special optical system, to provide the exposure apparatus, and to provide a method for adjusting the exposure apparatus. <P>SOLUTION: A reflecting surface of a concave mirror 102 of the light source device 100 is constituted of a plurality of movable mirrors 110, and further is provided with a piezoelectric element 115 for changing an outgoing direction of light from the reflecting surface of the movable mirror 110. Thus, the outgoing direction of at least part of the illumination light emitted from the light source device 100 is changed, thereby changing an illumination distribution of the illumination light in an exposed region of the exposure apparatus 1 and correcting the unevenness in the illumination intensity. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a light source device for an exposure apparatus, an exposure apparatus, and an adjustment method for the exposure apparatus, and relates to an exposure apparatus light source device having a concave mirror that collects and emits light emitted from the light source, and an exposure apparatus adjustment method. About.

  In general, in an exposure apparatus used in a lithography process in a manufacturing process of a semiconductor integrated circuit or a liquid crystal device, the illuminance distribution of illumination light to be exposed is made uniform in order to cope with the miniaturization of the circuit, and the line width is uniform. It is required to improve.

Conventionally, in order to make the illuminance distribution of the exposure light on the surface of the semiconductor wafer uniform, a method of adding an optical system such as a correction filter corresponding to the illuminance distribution on the optical path is used. For example, Japanese Patent Application Laid-Open No. 09-27450 discloses a semiconductor manufacturing method and a semiconductor manufacturing apparatus that can make the illuminance distribution uniform by using an illumination optical system whose optical characteristics can be changed.
Japanese Patent Laid-Open No. 09-27450

  However, the method of adding a correction optical system according to the illuminance distribution of illumination light can cope with the illuminance unevenness that can know the tendency in advance, but it takes a long time to change over time of the light source and the optical system. With respect to illuminance unevenness due to changing factors, it is necessary to prepare a correction optical system with different characteristics each time, and there is a problem that it is difficult to cope with it.

  The present invention has been made in view of the above problems, and it is possible to easily correct illuminance unevenness without using a special optical system, an exposure apparatus light source apparatus, an exposure apparatus, and an exposure apparatus adjustment method. The purpose is to provide.

  The light source device for an exposure apparatus according to the present invention is a light source device for an exposure apparatus having a concave mirror that collects and emits light emitted from a light source, and includes a curved surface or a flat surface that constitutes at least a part of the concave mirror. It is characterized by comprising a plurality of mirror members having reflecting surfaces, and mirror member moving means for changing the light emitting direction of the reflecting surfaces of the plurality of mirror members.

  An exposure apparatus according to the present invention includes the above-described light source device for an exposure apparatus, and projects a pattern having a predetermined shape formed on a mask onto an exposure area using illumination light emitted from the light source apparatus for the exposure apparatus. An exposure apparatus, an illuminance distribution acquisition means for acquiring an illuminance distribution of the illumination light in the exposed area, and the support portion of the mirror member moving means based on the illuminance distribution acquired by the illuminance distribution acquisition means And a control means for controlling the amount of movement.

  The exposure apparatus adjustment method according to the present invention includes a plurality of movable mirrors that collect light emitted from a light source and emit illumination light, and each of the movable mirrors is supported independently of the rotation. An exposure apparatus adjustment method including a light source device having a plurality of support portions that move in a direction parallel to a symmetry axis, the illuminance distribution acquisition step of acquiring the illuminance distribution of the illumination light, and the acquisition of the illuminance distribution It has a mirror movement amount calculation step for calculating the movement amount of the movable mirror based on the result, and a mirror movement step for moving the support portion based on the movement amount of the movable mirror.

  According to such a configuration of the present invention, the illumination light having no illuminance unevenness in the exposed region is obtained by changing the emission direction of the illumination light by the reflecting surface of the mirror member based on the acquired illuminance distribution. Can do. For this reason, in the process of using the exposure apparatus, even if the illuminance unevenness of the illumination light due to the temporal change of the light source or the optical system occurs, it is not necessary to prepare a member for correction separately. It is possible to adjust the distribution.

  Further, according to the present invention, the reflecting surface of the mirror member has a rotationally symmetric shape having a rotationally symmetric axis, and has an annular shape when viewed from the rotationally symmetric axis direction. It is preferable that the mirror member is configured by coaxially arranging the rotational symmetry axis of the reflection surface of the mirror member.

  According to such a configuration, the direction in which each of the plurality of mirror members emits light can be changed with a simple structure in which the plurality of annular mirror members are arranged concentrically. Therefore, the emission direction of at least a part of the light emitted from the light source device for exposure apparatus can be changed, and the distribution of the emitted light can be changed.

  In the present invention, it is preferable that the cross-sectional shape of the reflecting surface of the mirror member by a plane including the rotational symmetry axis is a straight line or a curved line.

  In the present invention, it is preferable that the reflecting surface of the mirror member is a reflecting surface of a polyhedral reflecting mirror constituted by a plurality of plane mirrors.

  According to such a structure, the concave mirror which consists of a some mirror member can be produced easily.

  Further, according to the present invention, the mirror member moving means has a support portion capable of moving back and forth in a direction parallel to the rotational symmetry axis, and each of the plurality of mirror members is independently parallel to the rotational symmetry axis. It is preferable that the support portion is supported so as to be movable in the direction.

  According to such a configuration, the mirror member moving means can be configured by a simple mechanism with few components, and a highly reliable light source device can be easily realized.

  In addition, the present invention includes storage means for storing the illuminance distribution acquired by the illuminance distribution acquisition means, and the control means acquires the illuminance distribution stored in the storage means and the illuminance distribution acquisition means. It is preferable to control the amount of movement of the support portion of the mirror member moving means based on the illuminance distribution.

  Further, the present invention includes a change amount storage step for storing a change amount of the illuminance distribution when each of the plurality of support portions is moved by a predetermined movement amount before the illuminance distribution acquisition step, In the mirror movement amount calculation step, it is preferable to calculate the movement amounts of the plurality of movable mirrors based on the change amount and the result of obtaining the illuminance distribution.

  According to such a configuration, it is not necessary to repeat trials each time adjustment is performed during correction adjustment of illuminance unevenness, and adjustment of the illuminance distribution can be completed in a short time.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a schematic view showing the arrangement of an exposure apparatus according to an embodiment of the present invention. The exposure apparatus 1 is an apparatus that projects a pattern having a predetermined shape drawn on a reticle 4 that is a mask onto a surface that is a projection surface of a wafer 20 that is a substrate.

  First, the configuration of the exposure apparatus 1 of the present embodiment will be described below. The exposure apparatus 1 includes a light source device 100, an illumination optical system 2, a reticle 4, and a projection optical system 5. The light source device 100 includes a mercury lamp 101 that is a light source and a concave mirror 102, condenses light emitted from the mercury lamp 101 by the concave mirror, and emits illumination light to the illumination optical system 2. The illumination optical system 2 includes a plurality of illumination optical element groups 12 such as a plurality of condenser lenses and integrators. The illumination optical system 2 shapes the illumination light emitted from the light source device 100 into a substantially uniform light beam and emits the light to the reticle 4. In the present embodiment, the illumination optical system 2 has a plurality of mirrors 3 on the optical axis of the illumination light, and the optical axis of the illumination light is bent by the mirror 3. The projection optical system 5 includes a lens group disposed so that the reticle 4 and the projection surface are in a conjugate relationship, and illumination light transmitted through the reticle 4 is projected onto the projection surface via the projection optical system 5. By reaching the top, the pattern image of the reticle 4 is formed on the exposure area of the projection surface.

  The exposure apparatus 1 also has a chuck 8 for fixing the wafer 20 and an XY stage 7 for moving the surface of the wafer 20 on the projection surface. The XY stage 7 has a biaxial linear motion mechanism 6 driven by a servo motor or the like, and moves the chuck 8 to which the wafer 20 is fixed to the exposed area, thereby the pattern of the reticle 4 on the surface of the wafer 20. Project an image.

  An illuminance sensor 9 that is an illuminance distribution acquisition means is disposed on the XY stage 7. The illuminance sensor 9 has a photoelectric conversion element such as a photodiode having a light receiving surface on the same plane as the surface of the wafer 20, and measures the intensity of light on the projection surface. The light source device 100, the XY stage 7, and the illuminance sensor 9 are electrically connected to a control device 10 having an arithmetic device that is a control means. The control device 10 can acquire the illuminance distribution of the illumination light emitted from the projection optical system 5 by moving the XY stage 7 and moving the illuminance sensor 9 within the exposure area to scan. The measurement result of the illuminance distribution acquired by the illuminance sensor 9 is stored in the storage device 11 that is a storage means connected to the control device 10. The illuminance sensor 9 is composed of photoelectric conversion elements arranged in a matrix in an area having the same size as the exposed area, for example, a sensor such as a CCD, and the illuminance distribution of illumination light without scanning. It is also possible to obtain a configuration.

  Next, the configuration of the light source device 100 of the present embodiment will be described. FIG. 2 is a configuration diagram illustrating an outline of the light source device 100. The light source device 100 includes a mercury lamp 101 that is a light source and a concave mirror 102. The concave mirror 102 is a reflecting mirror constituted by a concave reflecting surface having a plurality of annular glass or metal rotationally symmetric shapes. In this embodiment, the rotating mirror is formed by rotating an ellipse around a major axis. This is an elliptical mirror having a reflecting surface made of a spheroid ellipsoid ES. The concave mirror 102 condenses the light emitted from the mercury lamp 101 provided at the position of the first focal point F1 of the elliptical mirror at the second focal point F2 of the elliptical mirror. The concave mirror 102 may be a spherical mirror, a parabolic mirror, or the like instead of an elliptical mirror. For example, the concave mirror 102 is configured by a polyhedral mirror that approximately forms an elliptical surface, a spherical surface, or a parabolic surface by combining a minute planar mirror. Also good. Moreover, the concave mirror 102 may be a resin main body on which a metal film is deposited. In the present embodiment, the axis that is the center of the light emitted from the concave mirror 102 is referred to as the optical axis of the illumination light. That is, the straight line passing through the first focal point F1 and the second focal point F2 of the elliptical mirror, which is the rotational axis (rotational symmetry axis) of the elliptical mirror that is a rotating body, is referred to as an optical axis. In addition, the direction from the first focal point F1 of the elliptical mirror in which the mercury lamp 101 is disposed to the second focal point F2 where the illumination light is collected is referred to as an emission direction of the illumination light.

  The concave mirror 102 is a mirror member formed by dividing the spheroid ellipsoid ES by a plurality of planes substantially orthogonal to the rotation axis of the spheroid ellipsoid ES, that is, the optical axis of the illumination light, as shown in FIG. It is composed of a plurality of movable mirrors 110. The reflecting surface of the movable mirror 110 has a rotationally symmetric shape with the optical axis as a rotationally symmetric axis, and has an annular shape when viewed from the rotationally symmetric axis direction.

  Note that the movable mirror 110 of the present embodiment has a tapered reflecting surface in which a cross-sectional shape of the reflecting surface is formed by a straight line in contact with the spheroid ellipsoid ES in a section including a plane including the rotational symmetry axis. In the present embodiment, the concave mirror 102 is configured by forming a plurality of annular movable mirrors 110 having such a tapered reflecting surface on the same axis so as to approximately form a spheroidal surface. Has been. In addition, the movable mirror 110 may be a multi-surface reflecting mirror constituted by a plurality of plane mirrors.

  The concave mirror 102 is composed of a plurality of movable mirrors 110 having an annular reflecting surface arranged concentrically when viewed from the direction of the second focal point F2. The plurality of movable mirrors 110 are configured such that the angle of each reflecting surface with respect to the optical axis changes, and the direction in which the illumination light is emitted by the reflecting surface can be changed.

  Here, the configuration of the movable mirror 110 will be described below. FIG. 3 is an explanatory diagram showing the configuration of one of the plurality of movable mirrors 110 constituting the concave mirror 102. The movable mirror 110 has a reflection surface having a shape that is a region sandwiched between two planes of the spheroid ellipsoid ES that are substantially orthogonal to the rotation axis on the front side of the illumination light emission direction. The movable mirror 110 has an annular shape when viewed in parallel with the optical axis of the illumination light from the second focal point F2 side. In this embodiment, the case where the movable mirror 110 is viewed in parallel with the optical axis of the illumination light from the second focal point F2 side is referred to as a plan view.

  The movable mirror 110 which is a mirror member is supported on a base 112 which is a base by a support 111, a push-pull rod 113, a support ring 114 and a piezo element 115 which are mirror member moving means. An annular movable mirror 110 is supported at three points on a base 112 disposed on the side opposite to the reflecting surface of the movable mirror 110 by pillars 111 disposed at equal intervals in the circumferential direction in plan view. It is fixed. The support column 111 extends from the base 112 substantially perpendicular to the surface of the base 112. That is. The support column 111 is disposed substantially parallel to the optical axis of the illumination light, is a surface opposite to the reflecting surface of the movable mirror 110, and is connected radially inward in a plan view of the movable mirror 110. Yes. The connection method of the support 111 and the movable mirror 110 may be fixed support such as welding, may be elastic support via rubber, or may be supported with a certain degree of freedom like a ball joint. You may do.

  Further, in a plan view, the push-pull rod 113 which is a rod-like support portion substantially parallel to the column 111 is provided at three positions on the surface opposite to the reflecting surface of the movable mirror 110, that is, the outer surface in the radial direction of the column 111. Are connected. The push-pull rod 113 is fixed to the same annular support ring 114, and a piezoelectric element 115, which is a piezoelectric element, is disposed on the opposite side of the support ring 114 where the push-pull rod 113 is fixed. Yes. The support ring 114 is supported and fixed at three points on the base 112 via three piezoelectric elements 115. The piezo element 115 is disposed so that the expansion / contraction direction when applied with a voltage is substantially parallel to the extending direction of the push-pull rod 113, that is, the optical axis of the illumination light. Each of the plurality of piezo elements 115 is electrically connected to the control device 10, and expands and contracts according to the voltage applied by the control device 10. In the present embodiment, the piezo element 115 has a configuration that extends as the applied voltage increases.

  In the mirror member moving means having the above-described configuration, the push-pull rod 113 serving as a support portion has an optical axis of illumination light (rotation of the movable mirror 110) due to expansion and contraction of the piezo element 115 disposed on the opposite side across the support ring 114. It can move back and forth in a direction parallel to the symmetry axis. For example, when the piezo element 115 extends, the movable mirror 110 supported by the push-pull rod 113 is supported by the support 111 by the back surface being pressed in the emission direction by the support ring 114 and the push-pull rod 113. The point is elastically deformed from the point, and the angle of the reflecting surface with respect to the optical axis becomes shallow. Further, for example, when the piezo element 115 is contracted, the movable mirror 110 is elastically deformed by pulling the back surface opposite to the emission direction by the support ring 114 and the push-pull rod 113, and the angle of the reflection surface with respect to the optical axis is increased. Deepen. According to the above-described configuration, the angle of the reflecting surface of the movable mirror 110 can be changed to a predetermined angle by individually controlling expansion and contraction of the three piezoelectric elements 115, and illumination by the reflecting surface of the movable mirror The light emission direction can be changed. The method for driving the movable mirror 110 is not limited to a piezoelectric element such as the piezo element 115, and an actuator such as a linear motor or a hydraulic piston may be used. Further, the movable mirror 110 may be supported only by the push-pull rod 113 without providing the support 111. In this case, the movable mirror 110 is not elastically deformed by the expansion and contraction of the piezo element 115, and the movable mirror 110 moves in a direction parallel to the optical axis of the illumination light (the rotational symmetry axis of the movable mirror 110).

  FIG. 3 illustrates one movable mirror 110 and its driving method. In this embodiment, each of the plurality of movable mirrors 110 constituting the concave mirror 102 is independently arranged concentrically. It is supported by the same mechanism as in FIG. Thus, the concave mirror 102 configured by the plurality of movable mirrors 110 can change the emission direction of at least part of the illumination light emitted from the light source device 100. In the exposure apparatus 1 of the present embodiment, the illuminance distribution of the illumination light in the exposure area can be changed by changing the emission direction of at least a part of the illumination light emitted from the light source device 100 in this way. it can.

  A method for adjusting the illuminance distribution of the illumination light in the exposure area in the exposure apparatus 1 of the present embodiment having the above-described configuration will be described below with reference to FIG. FIG. 4 is a flowchart of an illuminance distribution adjustment method. The illuminance distribution adjustment process described below is executed by the control device 10 in response to an instruction from the user, for example, during maintenance of the exposure apparatus. In the illuminance distribution adjusting process described below, a reticle 4 that is a mask is not used, or a uniform and transparent reticle 4 on which a pattern is not formed is used.

  First, when the piezoelectric element 115 that drives each of the plurality of movable mirrors 110 is expanded or contracted by a certain unit amount, that is, the control unit 10 moves each of the push-pull rods 113 that are support portions by a predetermined amount of movement. It is determined whether or not the “applied voltage-illuminance change amount table”, which is the change amount of the illuminance distribution when the movable mirror 110 is moved by a predetermined value, has already been acquired and stored in the storage device 11 (step S1). ). If the “applied voltage-illuminance change amount table” is already stored, the process proceeds to step S3. If the “applied voltage-illuminance change amount table” is not stored, the process proceeds to step S 2, and the process proceeds to a change amount storing step, which is a process of acquiring the “applied voltage-illuminance change amount table”.

  In the change amount storing step, the control device 10 expands and contracts each of the piezo elements 115 by a certain unit amount, moves each of the push-pull rods 113 as the support portions by a predetermined movement amount, and moves the movable mirror 110 by a predetermined value. The “applied voltage-illuminance change amount table”, which is the change amount of the illuminance distribution when moved, is acquired (step S2).

  Here, the “applied voltage-illuminance change amount table” is an initial state in which no voltage is applied to all the piezo elements 115, and each of a plurality of piezo elements 115 is provided for the illuminance distribution in this initial state. This is a record of how the illuminance distribution changes when the voltage applied to is changed.

  Specifically, the control device 10 first acquires the illuminance distribution of the illumination light in the exposure area by the illuminance sensor 9 as an initial state in which no voltage is applied to all the piezo elements 115 and stores it in the storage device 11. .

  Next, for example, when the range of the applied voltage for driving the piezo element 115 of the present embodiment is 0V to 100V, five levels of applied voltages 20V, 40V, 60V, 80V and 100V are applied to one piezo element 115aa. In the case of applying to, the illuminance distribution at each applied voltage is measured by the illuminance sensor 9 and stored in the storage device 11. The applied voltage to the piezo element 115 corresponds to the expansion and contraction of the piezo element 115, that is, corresponds to the change in the direction in which the illumination light is emitted by the reflecting surface of the movable mirror 110, so the illuminance distribution changes. . At this time, the other piezoelectric elements 115 are in a state of an applied voltage of 0 V at the initial position. By taking the difference between the illuminance distribution at the five levels of applied voltages and the illuminance distribution in the initial state, the control device 10 changes the applied voltage to the piezo element 115aa and the illuminance distribution of illumination light in the exposed area. Get relationship with quantity.

  As described above, the control device 10 sequentially obtains the relationship between the applied voltage and the amount of change in the illuminance distribution of the illumination light in the exposed region for all the piezo elements 115, thereby obtaining the “applied voltage-illuminance change amount table”. Is acquired and stored in the storage device 11. In other words, in this change amount storage step, the control device 10 learns and stores how the illuminance distribution of the illumination light in the exposed area changes when the movable mirror 110 is moved. . This is because it is not easy to predict how a certain movement of the movable mirror 110 affects the illuminance distribution in the exposure apparatus 1 having a complicated optical system, and the tendency is stored in advance. To simplify the trials necessary for the subsequent adjustment steps. Control goes to step S3.

  Next, in the illuminance distribution acquisition process, the control device 10 changes the voltage applied to the piezo element 115 immediately before the adjustment process of the main illuminance distribution, that is, immediately before step S1, and the illumination sensor 9 performs illumination in the exposed area. Get the illuminance distribution of light. (Step S3). Thereby, the illuminance distribution of the illumination light in the state before adjusting the illuminance distribution is obtained.

  Next, the control device 10 determines whether or not the unevenness of the illuminance distribution of the illumination light obtained in step S3 is within an allowable range (step S4). If the unevenness of the illuminance distribution is within the determined allowable range, the adjustment process of the illuminance distribution is terminated. If the unevenness of the illuminance distribution is outside the determined allowable range, the process proceeds to step S5.

  Next, in the mirror movement amount calculating step, the control device 10 is based on the illuminance distribution of the illumination light obtained in step S3 and the “applied voltage-illuminance change amount table” stored in the storage device 11. It is calculated how much the voltage applied to which piezo element 115 should be changed in order to eliminate the illuminance unevenness. That is, the moving amount of the movable mirror 110 is calculated (step S5).

Next, in the mirror moving process, the control device 10 controls the voltage applied to the piezo element 115 based on the result of the moving amount of the movable mirror 110 calculated in step S5, and moves the push-pull rod 113. The movable mirror 110 is moved by (Step S6). After moving the movable mirror 110, the process returns to the illuminance distribution acquisition step (step S3) in which the illuminance distribution is measured again. If the result of re-measurement of the illuminance distribution is within the allowable range, the adjustment process of the illuminance distribution is terminated. If the result of the re-measurement of the illuminance distribution is outside the allowable range, the amount of movement of the movable mirror 110 is calculated again based on the result, and the movable mirror 110 is moved. As described above, the control device 10 repeats steps S3 to S6 until the illuminance unevenness of the illuminance distribution in the exposed area falls within the allowable range. If the illuminance unevenness of the illuminance distribution does not fall within the allowable range even after repeating steps S3 to S6 a predetermined number of times, a warning is sent to the user and the adjustment process of the illuminance distribution is terminated. Also good.
By the method described above, the illuminance unevenness of the illuminance distribution in the exposure area of the exposure apparatus 1 of the present embodiment is corrected and eliminated.

  According to the exposure apparatus light source apparatus, exposure apparatus, and exposure apparatus adjustment method of the present embodiment described above, the following effects can be obtained.

  The exposure apparatus 1 of the present embodiment includes a plurality of movable mirrors 110 that constitute the reflecting surface of the concave mirror 102, and a piezo element 115 that changes the direction in which the illumination light is emitted by the reflecting surface of the movable mirror 110. By changing the emitting direction of the illumination light by the reflecting surface 110, the illuminance distribution of the illumination light in the exposed area can be changed.

  In addition, the movable mirror 110 can be easily created because it can be created by cutting the spheroid ES by a plurality of planes substantially orthogonal to the rotation axis. Further, the drive mechanism of the movable mirror 110 is mainly composed of the piezo element 115 and the push-pull rod 113, is a simple mechanism with few components, and the light source device 100 with high reliability can be easily realized.

  Further, the exposure apparatus 1 of the present embodiment has no uneven illuminance in the exposed area by changing the emission direction of the illumination light by the reflecting surface of the movable mirror 110 based on the illuminance distribution obtained by the illuminance sensor 9. Illumination light can be obtained. That is, even when the illumination light unevenness due to the temporal change of the light source or the optical system occurs in the process of using the exposure apparatus 1, it is not necessary to prepare a member for correction separately, so it is quick, easy and inexpensive. It is possible to adjust the illuminance distribution.

  In addition, the exposure apparatus 1 of the present embodiment stores an “applied voltage-illuminance change amount table” in the storage device 11 and calculates the amount of movement of the movable mirror 110 based on this. Once the “applied voltage-illuminance change amount table” is acquired, it is not necessary to acquire it every time adjustment is performed. Therefore, the “applied voltage-illuminance change amount table” is not stored for adjustment of the illuminance distribution after the next time. It can be completed in a shorter time than the case.

  In this embodiment, the concave mirror 102 is constituted by a plurality of movable mirrors 110 divided in the optical axis direction, but the concave mirror 102 is further divided into some parts in the circumferential direction. May be.

  The present invention is not limited to the above-described embodiments, and can be appropriately changed without departing from the gist or concept of the invention that can be read from the claims and the entire specification. The apparatus, the exposure apparatus, and the adjustment method of the exposure apparatus are also included in the technical scope of the present invention.

It is the schematic which shows the structure of exposure apparatus. It is the schematic which shows the structure of a light source device. It is explanatory drawing which showed the structure about one of several movable mirrors which comprise a concave mirror. It is a flowchart of the adjustment method of illuminance distribution.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 100 Light source device, 101 Mercury lamp, 102 Concave mirror, 110 Movable mirror, 111 support | pillar, 112 base, 113 Push pull rod, 114 Support ring, 115 Piezo element, ES spheroid, F1 1st focus, F2 2nd focus

Claims (9)

A light source device for an exposure apparatus having a concave mirror that condenses and emits light emitted from a light source,
A plurality of mirror members having a reflecting surface composed of a curved surface or a flat surface constituting at least a part of the concave mirror;
A light source device for an exposure apparatus, comprising: a mirror member moving unit that changes an emission direction of light by the reflecting surfaces of the plurality of mirror members. The reflecting surface of the mirror member has a rotationally symmetric shape having a rotationally symmetric axis, and has an annular shape when viewed from the rotationally symmetric axis direction,
2. The light source device for an exposure apparatus according to claim 1, wherein the concave mirror is configured by arranging the plurality of mirror members coaxially with a rotational symmetry axis of a reflection surface of the mirror member.   3. The light source device for an exposure apparatus according to claim 2, wherein a cross-sectional shape of the reflecting surface of the mirror member by a plane including the rotationally symmetric axis is a straight line or a curved line.   3. The light source device for an exposure apparatus according to claim 2, wherein the reflecting surface of the mirror member is a reflecting surface of a multi-surface reflecting mirror composed of a plurality of plane mirrors. The mirror member moving means has a support part capable of moving back and forth in a direction parallel to the rotational symmetry axis,
5. The exposure according to claim 2, wherein each of the plurality of mirror members is supported by the support portion so as to be independently movable in a direction parallel to the rotational symmetry axis. 6. Light source device for apparatus. A light source device for an exposure apparatus according to any one of claims 1 to 5, wherein a pattern having a predetermined shape formed on a mask using illumination light emitted from the light source device for exposure apparatus is used as an exposure area. An exposure apparatus for projecting,
Illuminance distribution acquisition means for acquiring an illuminance distribution of the illumination light in the exposed area;
An exposure apparatus comprising: a control unit that controls a moving amount of the support portion of the mirror member moving unit based on the illuminance distribution acquired by the illuminance distribution acquiring unit. Storage means for storing the illuminance distribution acquired by the illuminance distribution acquisition means;
The control means controls the amount of movement of the support part of the mirror member moving means based on the illuminance distribution stored in the storage means and the illuminance distribution acquired by the illuminance distribution acquisition means. The exposure apparatus according to claim 6, characterized in that: A plurality of movable mirrors that collect light emitted from the light source and emit illumination light, and a plurality of support portions that support each of the movable mirrors and that each move independently in a direction parallel to the rotational symmetry axis An adjustment method for an exposure apparatus provided with a light source device comprising:
An illuminance distribution acquisition step of acquiring an illuminance distribution of the illumination light;
A mirror movement amount calculation step of calculating a movement amount of the movable mirror based on the acquisition result of the illuminance distribution;
A method of adjusting an exposure apparatus, comprising: a mirror moving step of moving the support portion based on a moving amount of the movable mirror. Before the illuminance distribution acquisition step, a change amount storage step for storing a change amount of the illuminance distribution when each of the plurality of support portions is moved by a predetermined movement amount,
9. The exposure apparatus adjustment method according to claim 8, wherein, in the mirror movement amount calculation step, movement amounts of the plurality of movable mirrors are calculated based on the change amount and an acquisition result of the illuminance distribution.

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