JP2006257212A - Film-forming composition, insulation film using it and electronic device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a film-forming composition capable of forming an insulation film, especially the one that has a low permittivity and a relative permittivity least prone to changes over time, an insulation film and an electronic device provided with the film. <P>SOLUTION: The film-forming composition contains a cage compound and has a dissolved oxidative gas content of not more than 1% of the saturation concentration of the oxidative gas. The insulation film and the electronic device use the composition. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a film-forming composition, and more particularly, to an insulating film-forming composition having good film properties such as dielectric constant and mechanical strength used for electronic devices, and further, an insulation obtained using the composition. The present invention relates to an electronic device having a film.

  In recent years, in the field of electronic materials, with the progress of higher integration, more functions, and higher performance, circuit resistance and capacitor capacity between wirings have increased, leading to an increase in power consumption and delay time. In particular, the increase in delay time is a major factor in reducing the signal speed of the device and the occurrence of crosstalk. Therefore, in order to reduce the delay time and speed up the device, it is necessary to reduce parasitic resistance and parasitic capacitance. It has been. As a specific measure for reducing this parasitic capacitance, an attempt has been made to cover the periphery of the wiring with a low dielectric interlayer insulating film. In addition, the interlayer insulating film is required to have excellent heat resistance that can withstand subsequent processes such as a thin film formation process, chip connection, and pinning at the time of manufacturing a mounting substrate, and chemical resistance that can withstand a wet process. Furthermore, in recent years, low resistance Cu wiring is being introduced from Al wiring, and along with this, planarization by CMP (Chemical Mechanical Polishing) has become common, and high mechanical strength that can withstand this process is high. It has been demanded.

Polybenzoxazole and polyimide are widely known as highly heat-resistant insulating films, but because they contain highly polar N atoms, they are satisfactory in terms of low dielectric properties, low water absorption, durability, and hydrolysis resistance. Nothing has been obtained.
In addition, many organic polymers are generally poorly soluble in organic solvents, and it is an important issue to suppress precipitation in coating solutions and the generation of bumps in insulating films. Therefore, if the polymer main chain is bent to have a bent structure, the glass transition point and the heat resistance are adversely affected, and it is not easy to achieve both.
Further, a highly heat-resistant resin having a polyarylene ether as a basic main chain is known (Patent Document 1), and the dielectric constant is in the range of 2.6 to 2.7. However, in order to realize a high-speed device, further reduction of the dielectric constant is desired, and the dielectric constant in the bulk is preferably made 2.6 or less, more preferably 2.5 or less without making it porous. It is desired.

US Pat. No. 6,509,415

  The present invention relates to a film-forming composition for solving the above-mentioned problems, more specifically to a composition for forming an insulating film having good film properties such as dielectric constant and mechanical strength used for electronic devices, etc. The present invention relates to an insulating film obtained using the composition and an electronic device having the insulating film.

式（Ｉ）中、
Ｒは複数ある場合は各々独立に水素原子、炭素数１〜１０のアルキル基、炭素数２〜１０のアルケニル基、炭素数２〜１０のアルキニル基、炭素数６〜２０のアリール基、または炭素数０〜２０のシリル基を表す。
ｍは１〜１４の整数を表す。
Ｘは複数ある場合は各々独立にハロゲン原子、炭素数１〜１０のアルキル基、炭素数２〜１０のアルケニル基、炭素数６〜２０のアリール基、または炭素数０〜２０のシリル基を表す。
ｎは０〜１３の整数を表す。
＜６＞ カゴ型構造を有する化合物が窒素原子を有さないことを特徴とする＜１＞〜＜５＞のいずれかに記載の膜形成用組成物。
＜７＞ 有機溶剤を含む＜６＞に記載の膜形成用塗布液。
＜８＞ ＜７＞に記載の膜形成用塗布液を用いて形成した絶縁膜。
＜９＞ ＜８＞に記載の絶縁膜を有する電子デバイス。 It has been found that the above problems are solved by the following <1> to <10> configurations.
<1> A film-forming composition comprising a compound having a cage structure, wherein the content of dissolved oxidizing gas is 1% or less of the saturation concentration of the oxidizing gas.
<2> The film-forming composition as described in <1>, wherein the cage structure is a saturated hydrocarbon structure.
<3> Any of <1> and <2>, wherein the ratio of the total number of carbon atoms in the cage structure to the total number of carbon atoms in the total solid content contained in the film-forming composition is 30% or more The film forming composition according to claim 1.
<4> The film-forming composition as described in any one of <1> to <3>, wherein the cage structure is a diamantane structure.
<5> The film forming composition according to <4>, wherein the compound having a cage structure is a polymer of at least one compound represented by the following formula (I).

In formula (I),
When there are a plurality of R, each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or carbon The silyl group of several 0-20 is represented.
m represents an integer of 1 to 14.
When X is plural, each independently represents a halogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or a silyl group having 0 to 20 carbon atoms. .
n represents an integer of 0 to 13.
<6> The film-forming composition as described in any one of <1> to <5>, wherein the compound having a cage structure does not have a nitrogen atom.
<7> The coating solution for forming a film according to <6> containing an organic solvent.
<8> An insulating film formed using the film forming coating solution according to <7>.
<9> An electronic device having the insulating film according to <8>.

  The insulating film formed from the film-forming composition of the present invention has film characteristics such as dielectric constant and mechanical strength, and since the dielectric constant is good after aging, it can be used as an interlayer insulating film in electronic devices and the like.

  Hereinafter, the present invention will be described in detail.

<Compound having a cage structure>
The “cage structure” described in the present invention is such that the volume is determined by a plurality of rings formed of covalently bonded atoms, and a point located within the volume cannot be separated from the volume without passing through the ring. Refers to a molecule. For example, an adamantane structure is considered a cage structure. In contrast, a cyclic structure having a single bridge such as norbornane (bicyclo [2,2,1] heptane) is not considered a cage structure because the ring of a single bridged cyclic compound does not define volume. .

The amount of dissolved oxidizing gas contained in the film forming composition in the present invention is 1% or less of the saturation concentration of the oxidizing gas. Preferably, it is 0.1% or less, more preferably 0.01%. Although the saturation concentration is largely determined by the solvent, it is specifically assumed here that the solvent is at room temperature (23 ° C.).
The amount of dissolved oxidizing gas can be measured using various known methods. Specifically, the amount of oxygen can be measured using a commercially available dedicated dissolved oxygen meter. The amount of bromine, chlorine dioxide, etc. can be measured by the so-called DPD method using diethyl-p-phenylenediamine. The DPD method performs an operation (liquid separation operation) of extracting water from a solution in which diethyl-p-phenylenediamine is added at a predetermined concentration from a solution for which a gas concentration is to be obtained to oxidize diethyl-p-phenylenediamine in an aqueous layer and perform an absorbance analysis. This is a method to be performed, and the concentration is obtained by comparison with a standard sample whose oxidizing gas concentration is known. The amount of nitrogen dioxide can be measured by the Salzmann method. The Salzmann method is measured by performing an absorbance analysis in the same manner as the DPD method using a Salzman reagent (N-1 naphthylethylenediamine dihydrochloride, sulfanilic acid and acetic acid). Ozone can be measured by extracting ozone from the solution to be measured into water and using a commercially available dissolved ozone concentration meter.

  Making the content of the dissolved oxidizing gas component 1% or less of the saturation concentration of the oxidizing gas is, for example, a treatment for reducing the components of the dissolved oxidizing gas of each constituent component to be described later in the film forming composition It can be achieved by performing a treatment for reducing the component content of the dissolved oxidizing gas of the medium component or a treatment for reducing the content directly from the composition, selection of components, and the like. As a specific method for the treatment to be reduced, there are a method of expelling dissolved oxidizing gas by bubbling of an inert gas, adsorption to a deoxidizing gas agent, and a reaction with a deoxidizing gas agent. For example, a method of bubbling nitrogen, a method of extracting an oxidizing gas component with ultrapure water, a method of passing through an activated carbon filter, or the like is preferable.

  Examples of such oxidizing gas include bromine, iodine, ozone, nitrogen dioxide, chlorine dioxide, oxygen, and the like, but it is preferable to reduce oxygen and ozone, and it is particularly preferable to reduce oxygen.

The total number of carbon atoms in the cage structure of the present invention is preferably 10 to 30, more preferably 11 to 18, and particularly preferably 14 carbon atoms.
The carbon atom here does not include a linking group substituted with a cage structure or a carbon atom of the substituent. For example, 1-methyladamantane is composed of 10 carbon atoms, and the cage structure of 1-ethyldiamantane is composed of 14 carbon atoms.

  The compound having a cage structure of the present invention is preferably a saturated hydrocarbon, and preferable examples thereof include diamond-like structures such as adamantane, diamantane, triamantane, tetramantane, dodecahedran, etc. because of high heat resistance. More preferred examples include diamantane and triamantane, and particularly preferred examples include diamantane in that a lower dielectric constant is obtained and synthesis is easy.

  The cage structure in the present invention may have one or more substituents. Examples of the substituent include a halogen atom (a fluorine atom, a chloro atom, a bromine atom, or an iodine atom), a carbon number of 1 to 10. Linear, branched and cyclic alkyl groups (methyl, t-butyl, cyclopentyl, cyclohexyl, etc.), alkenyl groups having 2 to 10 carbon atoms (vinyl, propenyl, etc.), alkynyl groups having 2 to 10 carbon atoms (ethynyl, phenyl) Ethynyl etc.), C6-C20 aryl groups (phenyl, 1-naphthyl, 2-naphthyl etc.), C2-C10 acyl groups (benzoyl etc.), C6-C20 aryloxy groups (phenoxy etc.) ), Arylsulfonyl groups having 6 to 20 carbon atoms (such as phenylsulfonyl), nitro groups, cyano groups, silyl groups (triethoxysilyl, methyldiethoxysilyl, Vinylsilyl etc.) and the like. Among these, preferred substituents are a fluorine atom, a bromine atom, a linear, branched or cyclic alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, an alkynyl group having 2 to 5 carbon atoms, and a silyl group. is there. These substituents may be further substituted with another substituent.

  The cage structure in the present invention preferably has 1 to 4 substituents, more preferably 2 to 3 substituents, and particularly preferably 2 substituents. In this case, the substituent bonded to the cage structure may be a monovalent or higher valent group or a divalent or higher valent linking group.

  The “compound having a cage structure” of the present invention may be a low molecular compound or a high molecular compound (for example, a polymer), and is preferably a polymer. When the compound having a cage structure is a polymer, the mass average molecular weight is preferably 1,000 to 500,000, more preferably 5,000 to 300,000, and particularly preferably 10,000 to 200,000. The polymer having a cage structure may be contained in the film forming composition as a resin composition having a molecular weight distribution. When the compound having a cage structure is a low molecular compound, the molecular weight is preferably 3000 or less, more preferably 2000 or less, and particularly preferably 1000 or less.

  In the present invention, the cage structure may be incorporated into the polymer main chain as a monovalent or higher pendant group. Preferred polymer main chains to which the cage compound is bonded include, for example, conjugated unsaturated bond chains such as poly (arylene), poly (arylene ether), poly (ether), polyacetylene, polyethylene, etc. Among them, heat resistance is good. From these points, poly (arylene ether) and polyacetylene are more preferable.

In the present invention, the cage structure is also preferably a part of the polymer main chain. That is, when it is a part of the polymer main chain, it means that the polymer chain is cleaved when the compound having a cage structure is removed from the polymer. In this form, the cage structures are directly single-bonded between the cage structures or linked by a suitable divalent or higher linking group. Examples of the linking group include, for example, —C (R ₁₁ ) (R ₁₂ ) —, —C (R ₁₃ ) ═C (R ₁₄ ) —, —C≡C—, arylene group, —CO—, —O—. , —SO ₂ —, —N (R ₁₅ ) —, —Si (R ₁₆ ) (R ₁₇ ) —, or a combination thereof. Here, R _{11 to} R ₁₇ each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or an alkoxy group. These linking groups may be substituted with a substituent, and for example, the above-described substituents are preferable examples.
Among these, more preferred linking groups are —C (R ₁₁ ) (R ₁₂ ) —, —CH═CH—, —C≡C—, arylene group, —O—, —Si (R ₁₆ ) (R ₁₇ ). -Or a combination thereof, and particularly preferred are -CH = CH-, -C≡C-, -O-, -Si (R ₁₆ ) (R ₁₇ )-or a combination thereof.

  The “compound having a cage structure” of the present invention may contain one or more cage structures in the molecule.

  Specific examples of the “compound having a cage structure” of the present invention are shown below, but the present invention is of course not limited thereto.

  The compound having a cage structure of the present invention is particularly preferably a polymer of a compound represented by the following formula (I).

In formula (I):
When there are a plurality of R, each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or the number of carbon atoms When 0 to 20 silyl groups are represented and R is other than a hydrogen atom, R may be further substituted with another substituent. Further substituents include, for example, halogen atoms (fluorine atoms, chloro atoms, bromine atoms, or iodine atoms), alkyl groups, alkenyl groups, alkynyl groups, aryl groups, acyl groups, aryloxy groups, arylsulfonyl groups, nitro groups, A cyano group, a silyl group, etc. are mentioned. R is preferably a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms or a silyl group having 0 to 20 carbon atoms, more preferably a hydrogen atom or a silyl group having 0 to 10 carbon atoms. It is.
m represents an integer of 1 to 14, preferably an integer of 1 to 4, more preferably an integer of 1 to 3, and particularly preferably 2 or 3.
Each X independently represents a halogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or a silyl group having 0 to 20 carbon atoms, X may be further substituted with another substituent, and examples of the further substituent include the same substituents as those in the previous group R. X is preferably a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a silyl group having 0 to 20 carbon atoms, more preferably a bromine atom or carbon. They are an alkenyl group having 2 to 4 carbon atoms and a silyl group having 0 to 10 carbon atoms.
n represents an integer of 0 to 13, preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 or 1.

Optimum polymerization reaction conditions for the compound represented by the formula (I) are in an organic solvent, preferably an internal temperature of 0 ° C to 220 ° C, more preferably 50 ° C to 210 ° C, and particularly preferably 100 ° C to 200 ° C. It is preferably performed for 1 to 50 hours, more preferably 2 to 20 hours and 3 to 10 hours. If desired, a metal catalyst such as palladium, nickel, tungsten, or molybdenum may be used.
The preferable range of the weight average molecular weight of the polymerized polymer is 1000 to 500000, more preferably 5000 to 300000, and particularly preferably 10000 to 200000.

  Specific examples of the compound represented by the formula (I) are shown below.

  The compound having a cage structure preferably has a reactive group that forms a covalent bond with another molecule by heat. Such a reactive group is not particularly limited, and for example, a substituent that causes a cycloaddition reaction or a radical polymerization reaction can be preferably used. For example, a group having a double bond (vinyl group, allyl group, etc.), a group having a triple bond (ethynyl group, phenylethynyl group, etc.), a combination of a diene group or a dienophile group for causing a Diels-Alder reaction is effective. In particular, an ethynyl group and a phenylethynyl group are effective.

  Further, the compound having a cage structure of the present invention preferably does not contain a nitrogen atom from the viewpoint of molar polarizability and dielectric constant due to hygroscopicity of the insulating film. The compound having a cage structure of the present application is preferably a compound other than polyimide, that is, a compound having no polyimide bond or amide bond.

  From the viewpoint of imparting good characteristics (dielectric constant, mechanical strength) to the insulating film formed from the composition of the present invention, the total of the cage structure occupying the total number of carbons in the total solid content contained in the film-forming composition. The carbon number ratio is preferably 30% or more, more preferably 50 to 95%, and still more preferably 60% to 90%. Here, the total solid content contained in the film-forming composition corresponds to the total solid content constituting the insulating film obtained by this coating solution. In addition, what does not remain in an insulating film after insulating film formation like a foaming agent is not included in solid content.

  As the compound having a cage structure, a commercially available product or a compound synthesized by a known method can be used.

The film-forming composition of the present invention can contain an organic solvent and can be used as a coating solution.
Examples of suitable solvents that can be used in the present invention include, but are not limited to, alcohol solvents such as 1-methoxy-2-propanol, 1-butanol, 2-ethoxymethanol, and 3-methoxypropanol; acetylacetone Ketone solvents such as methyl ethyl ketone, methyl isobutyl ketone, 2-pentanone, 3-pentanone, 2-heptanone, 3-heptanone, cyclohexanone; propyl acetate, butyl acetate, isobutyl acetate, pentyl acetate, ethyl propionate, propyl propionate, Ester solvents such as butyl propionate, isobutyl propionate, propylene glycol monomethyl ether acetate, methyl lactate, ethyl lactate, γ-butyrolactone; diisopropyl ether, dibutyl ether, ethyl propyl ether Ether solvents such as tellurium, anisole, phenetol, veratrol; aromatic hydrocarbon solvents such as mesitylene, ethylbenzene, diethylbenzene, propylbenzene, 1,2-dichlorobenzene, and the like. You may mix and use.

  More preferred solvents are 1-methoxy-2-propanol, cyclohexanone, propylene glycol monomethyl ether acetate, ethyl lactate, γ-butyrolactone, anisole and mesitylene.

  The solid content concentration of the coating liquid of the present invention is preferably 3 to 50% by mass, more preferably 5 to 35% by mass, and particularly preferably 7 to 20% by mass.

Furthermore, the composition for forming a film of the present invention includes a radical generator, a nonionic surfactant, and the like within a range that does not impair various properties of the insulating film (heat resistance, dielectric constant, mechanical strength, coatability, adhesion, etc.). You may add additives, such as a fluorine-type nonionic surfactant and a silane coupling agent.
Examples of the radical generator include t-butyl peroxide, pentyl peroxide, hexyl peroxide, lauroyl peroxide, benzoyl peroxide, azobisisobutyronitrile, and the like. Examples of the nonionic surfactant include octyl polyethylene oxide, decyl polyethylene oxide, dodecyl polyethylene oxide, octyl polypropylene oxide, decyl polypropylene oxide, dodecyl polypropylene oxide, and the like. Examples of the fluorine-based nonionic surfactant include perfluorooctyl polyethylene oxide, perfluorodecyl polyethylene oxide, perfluordecyl polyethylene oxide, and the like. Examples of the silane coupling agent include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriacetoxysilane, allyltrimethoxysilane, allyltriethoxysilane, divinyldiethoxysilane, trivinylethoxysilane, hydrolysates thereof, or The dehydration condensate of this thing etc. are mentioned.
The addition amount of these additives has an appropriate range depending on the use of the additive or the solid content concentration of the coating liquid, but generally 0.001% to 10% by mass% in the coating liquid, More preferably, it is 0.01% to 5%, and particularly preferably 0.05% to 2%.

  The insulating film can be formed by applying the coating solution of the present invention to the substrate by any method such as spin coating, roller coating, dip coating, or scanning, and then removing the solvent by heat treatment. . The method of the heat treatment is not particularly limited, but the commonly used hot plate heating, method using a furnace, light irradiation heating using a xenon lamp by RTP (Rapid Thermal Processor), etc. are applied. Can do.

  The film obtained by using the coating liquid of the present invention is suitable as an insulating film in electronic components such as semiconductor devices and multichip module multilayer wiring boards, and other than semiconductor interlayer insulating films, surface protective films, and buffer coat films. It can be used as a passivation film in an LSI, an α-ray blocking film, a flexographic printing plate cover lay film, an overcoat film, a flexible copper clad plate cover coat, a solder resist film, a liquid crystal alignment film, and the like.

  Although there is no restriction | limiting in particular in the film thickness of this coating film, it is preferable that it is 0.001-100 micrometers, It is more preferable that it is 0.01-10 micrometers, It is especially preferable that it is 0.1-1 micrometers.

A porous film can also be formed by adding a foaming agent in advance to the coating liquid for forming an insulating film of the present invention. The foaming agent added to form the porous film is not particularly limited, and examples thereof include organic compounds having a boiling point higher than the solvent of the coating solution, thermally decomposable low molecular compounds, and thermally decomposable polymers. It is done.
The addition amount of the foaming agent has an appropriate range depending on the solid content concentration of the coating solution, but generally it is preferably 0.01% to 20%, more preferably 0.1% by mass% in the coating solution. -10%, particularly preferably 0.5% to 5%.

  The compounds of the present invention are preferably cross-linked by heating after coating to form an insulating film having excellent mechanical strength and heat resistance. The optimum conditions for this heat treatment are preferably a heating temperature of 200 to 450 ° C, more preferably 300 to 420 ° C, particularly preferably 350 to 400 ° C, and a heating time of preferably 1 minute to 2 hours, more The time is preferably 10 minutes to 1.5 hours, particularly preferably 30 minutes to 1 hour. The heat treatment may be performed in several stages.

  The following examples illustrate the invention and are not intended to limit its scope.

  The structures of the compounds used in the examples are shown below.

<Synthesis Example 1>
4,9-dibromodiamantane was synthesized by the method described in Macromolecules 1991, 24, 5266. A 500 ml flask was charged with 1.30 g of commercially available p-divinylbenzene, 3.46 g of 4,9-dibromodiamantane, 200 ml of dichloroethane, and 2.66 g of aluminum chloride, and stirred at an internal temperature of 70 ° C. for 24 hours. Thereafter, 200 ml of water was added to separate the organic layer. After adding anhydrous sodium sulfate, the solid content was removed by filtration, and dichloroethane was concentrated under reduced pressure until the volume was reduced to half, 300 ml of methanol was added to this solution, and the deposited precipitate was filtered. 2.8 g of polymer (A-4) having a weight average molecular weight of about 10,000 was obtained.
Similarly, a polymer (A-12) having a weight average molecular weight of about 10,000 was synthesized by Friedel-Crafts reaction.

<Example 1>
5.0 ml of cyclohexanone in which 1.0 g of the above polymer (A-4) was blown with nitrogen having a purity of 99.99999999% for 10 minutes so that the dissolved oxygen content was 0.01% or less of the saturated concentration and nitrogen having a purity of 99.999999% Was dissolved in 5.0 ml of a mixed solvent of anisole having a dissolved oxygen content of 0.01% or less of the saturated concentration by heating for 10 minutes to prepare a coating solution. When the dissolved oxygen content of the obtained solution was measured with a dissolved oxygen concentration meter, it was 0.01% or less of the saturated concentration at 23 ° C. Further, as a result of measuring other oxidizing gas concentrations using a DPD method, a Salzmann method, and an ozone densitometer, the total concentrations detected were 23 ° C. and 0.001% or less of the saturated concentration. This solution was filtered through a 0.1 micron tetrafluoroethylene filter, spin-coated on a silicon wafer, this coating was heated on a hot plate at 150 ° C. for 60 seconds under a nitrogen stream, and further heated at 400 ° C. Heated on plate for 30 minutes. The dielectric constant of the obtained insulating film having a thickness of 0.5 microns was calculated from the capacitance value at 1 MHz using a mercury probe manufactured by Four Dimensions and an HP4285ALCR meter manufactured by Yokogawa Hewlett-Packard. Moreover, when the Young's modulus was measured using MTS nanoindenter SA2, it was 7.3 GPa.
This wafer was allowed to stand in an atmosphere of 23 ° C. and 40% RH, and after 1 week, the relative dielectric constant was measured by the above method to be 2.49.

<Example 2>
1.0 g of the above polymer (A-12) was blown with 99.999999% purity nitrogen for 10 minutes to reduce the dissolved oxygen content to 0.01% or less of the saturation concentration, and 99.999999% purity gamma-butyrolactone. Nitrogen was blown in for 10 minutes to dissolve in a mixed solvent of 5.0 ml of anisole having a dissolved oxygen content of 0.01% or less of the saturated concentration to prepare a coating solution. When the dissolved oxygen content of the obtained solution was measured with a dissolved oxygen concentration meter, it was 0.01% or less of the saturated concentration at 23 ° C. Further, as a result of measuring other oxidizing gas concentrations using a DPD method, a Salzmann method, and an ozone densitometer, the total concentrations detected were 23 ° C. and 0.001% or less of the saturated concentration. This solution was filtered through a 0.1 micron tetrafluoroethylene filter, spin-coated on a silicon wafer, this coating was heated on a hot plate at 180 ° C. for 60 seconds under a nitrogen stream, and further heated at 300 ° C. Heated on plate for 10 minutes. The relative dielectric constant of the obtained insulating film having a thickness of 0.5 microns was 2.54. The Young's modulus was 6.1 GPa.
This wafer was left in an atmosphere of 23 ° C. and 40% RH, and after 1 week, the relative dielectric constant was measured by the above method and found to be 2.54.

<Synthesis Example 2>
4,9-diethynyldiamantane was synthesized according to the synthesis method described in Macromolecules., 5262, 5266 (1991) using diamantane as a raw material. Next, 10 g of 4,9-diethynyldiamantane, 50 ml of 1,3,5-triisopropylbenzene and 120 mg of Pd (PPh ₃ ) ₄ were stirred at an internal temperature of 190 ° C. for 12 hours under a nitrogen stream. After the reaction solution was brought to room temperature, 300 ml of isopropyl alcohol was added. The precipitated solid was filtered and washed with methanol. 3.0 g of polymer (A) having a weight average molecular weight of 20000 was obtained.

<Example 3>
1.0 g of the polymer (A) synthesized in Synthesis Example 2 was dissolved in 10.0 ml of cyclohexanone having a dissolved oxygen content of 0.01% or less by blowing nitrogen having a purity of 99.99999999% for 10 minutes. Was prepared. When the dissolved oxygen content of the obtained solution was measured with a dissolved oxygen concentration meter, it was 0.01% or less of the saturated concentration at 23 ° C. Further, as a result of measuring other oxidizing gas concentrations using a DPD method, a Salzmann method, and an ozone densitometer, the total concentrations detected were 23 ° C. and 0.001% or less of the saturated concentration. This solution was filtered through a 0.2 micron tetrafluoroethylene filter, spin-coated on a silicon wafer, and this coating film was heated on a hot plate at 110 ° C. for 90 seconds under a nitrogen stream, and then at 250 ° C. for 60 seconds. It was heated and further heated in a 400 ° C. oven purged with nitrogen for 60 minutes. The dielectric constant of the obtained insulating film having a thickness of 0.50 microns was 2.40. The Young's modulus was 7.1 GPa.
This wafer was left in an atmosphere of 23 ° C. and 40% RH, and after one week, the relative dielectric constant was measured by the above method to be 2.40.

<Comparative Example 1>
A solution was prepared by performing the same operation as in Example 1 except that the treatment with nitrogen of 99.99999999% for the solvent was not carried out for 10 minutes. When the dissolved oxygen content of the obtained solution was measured with a dissolved oxygen concentration meter, it was 1.5% of the saturated concentration at 23 ° C. This solution was filtered through a 0.1 micron tetrafluoroethylene filter, spin-coated on a silicon wafer, this coating was heated on a hot plate at 150 ° C. for 60 seconds under a nitrogen stream, and further heated at 400 ° C. Heated on plate for 30 minutes. The relative dielectric constant of the obtained insulating film having a thickness of 0.5 μm was calculated from the capacitance value at 1 MHz by using a mercury probe manufactured by Four Dimensions and an HP4285ALCR meter manufactured by Yokogawa Hewlett-Packard. Moreover, when the Young's modulus was measured using Nano Indenter SA2 manufactured by MTS, it was 7.2 GPa.
This wafer was left in an atmosphere of 23 ° C. and 40% RH, and after 1 week, the relative dielectric constant was measured by the above method to be 2.75.

<Example 4>
A solution was prepared by the same operation as in Comparative Example 1, and then a process of blowing nitrogen having a purity of 99.99999999% for 10 minutes was performed. When the dissolved oxygen content of the obtained solution was measured with a dissolved oxygen concentration meter, it was 0.1% of the saturated concentration at 23 ° C. Further, as a result of measuring other oxidizing gas concentrations using a DPD method, a Salzmann method, and an ozone densitometer, the total concentrations detected were 23 ° C. and 0.01% or less of the saturated concentration. This solution was filtered through a 0.1 micron tetrafluoroethylene filter, spin-coated on a silicon wafer, this coating was heated on a hot plate at 150 ° C. for 60 seconds under a nitrogen stream, and further heated at 400 ° C. Heated on plate for 30 minutes. The relative dielectric constant of the obtained insulating film having a thickness of 0.5 μm was calculated from the capacitance value at 1 MHz by using a mercury probe manufactured by Four Dimensions and an HP4285ALCR meter manufactured by Yokogawa Hewlett-Packard. Moreover, when the Young's modulus was measured using Nano Indenter SA2 manufactured by MTS, it was 7.2 GPa.
This wafer was allowed to stand in an atmosphere of 23 ° C. and 40% RH, and after 1 week, the relative dielectric constant was measured by the above method and found to be 2.52.

<Comparative example 2>
1.0 g of the polymer (B) (obtained from Sigma-Aldrich) was dissolved in 10.0 ml of cyclohexanone subjected to a treatment with nitrogen of purity 99.999999% for 10 minutes to prepare a coating solution. When the dissolved oxygen content of the obtained solution was measured with a dissolved oxygen concentration meter, it was 0.01% or less of the saturated concentration at 23 ° C. This solution was filtered through a 0.2 micron tetrafluoroethylene filter, spin-coated on a silicon wafer, and this coating film was heated on a hot plate at 110 ° C. for 90 seconds under a nitrogen stream, and then at 250 ° C. for 60 seconds. It was heated and further heated in a 400 ° C. oven purged with nitrogen for 60 minutes. The relative dielectric constant of the obtained insulating film having a thickness of 0.50 microns was 2.70. The Young's modulus was 3.5 GPa.
This wafer was left in an atmosphere of 23 ° C. and 40% RH, and after one week, the relative dielectric constant was measured by the above method to be 2.79.

Claims (9)

  A film-forming composition comprising a compound having a cage structure, wherein the content of dissolved oxidizing gas in the composition is 1% or less of the saturation concentration of the oxidizing gas Composition.   2. The film-forming composition according to claim 1, wherein the cage structure is a saturated hydrocarbon structure.   3. The film according to claim 1, wherein the ratio of the total number of carbon atoms of the cage structure to the total number of carbon atoms in the total solid content contained in the film-forming composition is 30% or more. Forming composition.   The film-forming composition according to any one of claims 1 to 3, wherein the cage structure is a diamantane structure. The film-forming composition according to claim 4, wherein the compound having a cage structure is a polymer of at least one compound represented by the following formula (I).

In formula (I),
When there are a plurality of R, each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or carbon The silyl group of several 0-20 is represented.
m represents an integer of 1 to 14.
When X is plural, each independently represents a halogen atom, an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or a silyl group having 0 to 20 carbon atoms. .
n represents an integer of 0 to 13.   The film-forming composition according to claim 1, wherein the compound having a cage structure is a compound comprising a constituent element excluding a nitrogen atom.   The coating liquid for film formation according to any one of claims 1 to 6, comprising an organic solvent.   An insulating film formed using the film-forming coating solution according to claim 7.   An electronic device having the insulating film according to claim 8.