JP2005293968A - Manufacturing method of organic electroluminescent element - Google Patents

Manufacturing method of organic electroluminescent element Download PDF

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JP2005293968A
JP2005293968A JP2004105814A JP2004105814A JP2005293968A JP 2005293968 A JP2005293968 A JP 2005293968A JP 2004105814 A JP2004105814 A JP 2004105814A JP 2004105814 A JP2004105814 A JP 2004105814A JP 2005293968 A JP2005293968 A JP 2005293968A
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crucibles
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organic material
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Koki Ishida
弘毅 石田
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Sanyo Electric Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of an organic electroluminescent element capable of improving production efficiency and mass productivity while preventing deterioration of a characteristic of an organic material. <P>SOLUTION: A plurality of crucibles 10, 11 and 12 are so arranged as to face to a surface of a substrate 50 intended to form an organic layer thereon. The plurality of crucibles 10, 11 and 12 are arranged in parallel with one another under the substrate 50. The plurality of crucibles 10, 11 and 12 each have an elongated box-like shape extending in the Y-direction. A projecting part extending in the Y-direction is formed on each upper surface of the plurality of crucibles 10, and a plurality of organic material spouting holes 20, 21 and 22 are formed on the upper surfaces of the projecting parts. The plurality of organic material spouting holes 20, 21 and 22 are slantingly formed so as to be able to spout the organic material to spouting target points. The crucibles 11 and 12 are filled with the same organic material. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、有機エレクトロルミネッセンス素子の製造方法に関する。   The present invention relates to a method for manufacturing an organic electroluminescence element.

近年、情報機器の多様化に伴い、一般に使用されているCRT(陰極線管)に比べて消費電力が少ない平面表示素子に対するニーズが高まってきている。このような平面表示素子の1つとして、高効率、薄型、軽量、低視野角依存性等の特徴を有する有機エレクトロルミネッセンス(以下、有機ELと略記する)素子が注目され、この有機EL素子を用いたディスプレイの研究開発が活発に行われている。   In recent years, with the diversification of information equipment, there has been an increasing need for flat display elements that consume less power than commonly used CRTs (cathode ray tubes). As one of such flat display elements, an organic electroluminescence (hereinafter abbreviated as organic EL) element having features such as high efficiency, thinness, light weight, and low viewing angle dependency has been attracting attention. Research and development of the display used is being actively conducted.

有機EL素子は、電子注入電極とホール注入電極とからそれぞれ電子とホールとを発光部内へ注入し、注入された電子およびホールを発光中心で再結合させて有機分子を励起状態にし、この有機分子が励起状態から基底状態へと戻るときに蛍光を発生する自発光型の素子である。この有機EL素子は、発光材料である蛍光物質を選択することにより発光色を変化させることができ、マルチカラー、フルカラー等の表示装置への応用に対する期待が高まっている。   The organic EL element injects electrons and holes from the electron injection electrode and the hole injection electrode into the light emitting part, recombines the injected electrons and holes at the emission center to bring the organic molecules into an excited state, and the organic molecules Is a self-luminous element that emits fluorescence when it returns from the excited state to the ground state. This organic EL element can change a luminescent color by selecting the fluorescent material which is a luminescent material, and the expectation for the application to display apparatuses, such as multi-color and a full color, is increasing.

一般に有機EL素子の各層は、蒸着法を用いて形成される。この蒸着法は、まず、坩堝に有機材料を充填し、そして、坩堝の外部に設けられたヒータにより坩堝内の有機材料を加熱することによって有機材料を蒸発させ基板に有機層を形成するものである。
特開2001−247959号公報 特開2003−293122号公報
In general, each layer of the organic EL element is formed using a vapor deposition method. In this vapor deposition method, first, the crucible is filled with an organic material, and the organic material is evaporated by heating the organic material in the crucible with a heater provided outside the crucible, thereby forming an organic layer on the substrate. is there.
JP 2001-247959 A JP 2003-293122 A

しかしながら、坩堝内に充填された有機材料は、ヒータにより加熱されることにより有機材料の特性が劣化する場合がある。この劣化を防止するためにヒータによる加熱温度を低下させることも可能であるが、加熱温度を低下させると蒸着速度が低下する。それにより、有機EL素子の製造における生産効率が低下する。   However, the organic material filled in the crucible may be deteriorated in characteristics of the organic material when heated by a heater. In order to prevent this deterioration, the heating temperature by the heater can be lowered. However, when the heating temperature is lowered, the deposition rate is lowered. Thereby, the production efficiency in the manufacture of the organic EL element is lowered.

本発明の目的は、有機材料の特性の劣化を防止しつつ、生産効率および量産性を向上させることができる有機エレクトロルミネッセンス素子の製造方法を提供することである。   The objective of this invention is providing the manufacturing method of the organic electroluminescent element which can improve production efficiency and mass productivity, preventing the deterioration of the characteristic of an organic material.

本発明に係る有機エレクトロルミネッセンス素子の製造方法は、基板上に有機材料からなる有機層を備えた有機エレクトロルミネッセンス素子の製造方法であって、第1の方向に延びかつ略平行に配置された複数の坩堝のうち少なくとも2つの坩堝に同一の有機材料を充填する工程と、2つの坩堝を加熱する工程と、複数の坩堝と基板とを互いに相対的に第1の方向に交差する第2の方向に移動させる工程とを備えたものである。   The manufacturing method of the organic electroluminescent element which concerns on this invention is a manufacturing method of the organic electroluminescent element provided with the organic layer which consists of organic materials on a board | substrate, Comprising: The plurality extended in the 1st direction and arrange | positioned substantially in parallel A step of filling at least two of the crucibles with the same organic material, a step of heating the two crucibles, and a second direction crossing the plurality of crucibles and the substrate relative to each other in the first direction And a step of moving to the position.

本発明に係る有機エレクトロルミネッセンス素子の製造方法においては、第1の方向に延びかつ略平行に配置された複数の坩堝のうち少なくとも2つの坩堝に同一の有機材料が充填される。その2つの坩堝が加熱されつつ、複数の坩堝と基板とが互いに相対的に第1の方向に交差する第2の方向に移動される。それにより、基板の全面に均一に有機層を形成することができる。   In the method for manufacturing an organic electroluminescent element according to the present invention, at least two crucibles extending in the first direction and arranged substantially in parallel are filled with the same organic material. While the two crucibles are heated, the plurality of crucibles and the substrate are moved relative to each other in a second direction that intersects the first direction. Thereby, an organic layer can be uniformly formed on the entire surface of the substrate.

この場合、少なくとも2つの坩堝に同一の有機材料が充填されているので、坩堝の加熱温度を低下させた場合でも1つの坩堝を用いて加熱温度を高く設定した場合と比べて、有機材料の蒸発量を同等に維持することができる。その結果、有機材料の特性の劣化を防止しつつ、有機エレクトロルミネッセンス素子の生産効率および量産性を向上させることができる。   In this case, since the same organic material is filled in at least two crucibles, even when the heating temperature of the crucible is lowered, the evaporation of the organic material is compared with the case where the heating temperature is set high using one crucible. The amount can be kept equal. As a result, it is possible to improve the production efficiency and mass productivity of the organic electroluminescence element while preventing the deterioration of the characteristics of the organic material.

複数の坩堝は、それぞれ設定された噴射方向を中心として所定の広がりをもって有機材料の蒸気を噴出し、基板の共通の領域に有機材料が堆積するように少なくとも2つの坩堝の噴射方向が設定されてもよい。   The plurality of crucibles are configured such that the spray direction of at least two crucibles is set so that the vapor of the organic material is sprayed with a predetermined spread around the set spray direction, and the organic material is deposited on a common region of the substrate. Also good.

この場合、少なくとも2つの坩堝から基板の共通の領域に有機材料を噴出することができるので、基板に形成される有機層の厚みを均一に制御することができる。   In this case, since the organic material can be ejected from at least two crucibles to the common region of the substrate, the thickness of the organic layer formed on the substrate can be controlled uniformly.

有機材料は、ルブレン系材料を含んでもよい。ここで、ルブレン系有機材料は、熱により劣化しやすい。この場合、有機材料への加熱温度を低下させることができるので、ルブレン系材料の特性の劣化を防止することができる。   The organic material may include a rubrene-based material. Here, the rubrene-based organic material is easily deteriorated by heat. In this case, since the heating temperature to the organic material can be lowered, deterioration of the characteristics of the rubrene-based material can be prevented.

本発明によれば、有機材料の特性の劣化を防止しつつ、有機エレクトロルミネッセンス素子の生産効率および量産性を向上させることができる。   ADVANTAGE OF THE INVENTION According to this invention, the production efficiency and mass productivity of an organic electroluminescent element can be improved, preventing the deterioration of the characteristic of an organic material.

以下、本実施の形態に係る有機エレクトロルミネッセンス素子の製造方法について説明する。   Hereinafter, the manufacturing method of the organic electroluminescence element according to the present embodiment will be described.

図1は本発明の一実施の形態に係る有機エレクトロルミネッセンス素子の製造方法を説明するための斜視図である。以下、有機エレクトロルミネッセンス素子を有機EL素子と略記する。   FIG. 1 is a perspective view for explaining a method of manufacturing an organic electroluminescence element according to an embodiment of the present invention. Hereinafter, the organic electroluminescence element is abbreviated as an organic EL element.

図1においては、互いに直交する3方向をX方向、Y方向およびZ方向とする。X方向およびY方向は有機層を形成する基板50の表面に平行な方向であり、Z方向は基板50の表面に垂直な方向である。   In FIG. 1, three directions orthogonal to each other are defined as an X direction, a Y direction, and a Z direction. The X direction and the Y direction are directions parallel to the surface of the substrate 50 forming the organic layer, and the Z direction is a direction perpendicular to the surface of the substrate 50.

図1に示すように、本実施の形態に係る有機EL素子の製造方法においては、複数の坩堝10,11,12を用いる。複数の坩堝10,11,12は、有機層を形成しようとする基板50の表面に対向するように配置される。図1では、基板50の下方に複数の坩堝10,11,12が並列に配置される。   As shown in FIG. 1, a plurality of crucibles 10, 11, and 12 are used in the method for manufacturing an organic EL element according to the present embodiment. The plurality of crucibles 10, 11, and 12 are arranged to face the surface of the substrate 50 on which the organic layer is to be formed. In FIG. 1, a plurality of crucibles 10, 11, 12 are arranged in parallel below the substrate 50.

図1に示すように、複数の坩堝10,11,12はY方向に延びた細長い箱型形状を有する。複数の坩堝10の上面にY方向に延びた凸部が形成されており、その凸部の上面に複数の有機材料噴出孔20が形成されている。同様に、坩堝11,12においても、上面にY方向に延びた凸部が形成されており、その凸部の上面に複数の有機材料噴出孔21,22が形成されている。   As shown in FIG. 1, the plurality of crucibles 10, 11, and 12 have an elongated box shape extending in the Y direction. Convex portions extending in the Y direction are formed on the top surfaces of the plurality of crucibles 10, and a plurality of organic material ejection holes 20 are formed on the top surfaces of the convex portions. Similarly, in the crucibles 11 and 12, a convex portion extending in the Y direction is formed on the upper surface, and a plurality of organic material ejection holes 21 and 22 are formed on the upper surface of the convex portion.

次に、図2は図1の坩堝10の凸部に形成された有機材料噴出孔20を説明するための模式的断面図であり、図3は図1の坩堝11の凸部に形成された有機材料噴出孔21を説明するための模式的断面図であり、図4は坩堝12の凸部に形成された有機材料噴出孔22を説明するための模式的断面図である。   Next, FIG. 2 is a schematic cross-sectional view for explaining the organic material ejection hole 20 formed in the convex portion of the crucible 10 in FIG. 1, and FIG. 3 is formed in the convex portion of the crucible 11 in FIG. FIG. 4 is a schematic cross-sectional view for explaining the organic material ejection hole 21, and FIG. 4 is a schematic cross-sectional view for explaining the organic material ejection hole 22 formed in the convex portion of the crucible 12.

図2に示すように、坩堝10はコ字形状の容器1からなり、その容器1の開口部に有機材料噴出孔20を有する蓋部2が形成される。容器1および蓋部2は一体的に形成されてもよく、別体として形成されてもよい。この蓋部2に形成された有機材料噴出孔20は、噴出目標点Pに向かう噴射方向30を中心として広がり角度θ1の範囲で有機材料を噴出する。ここで、噴出目標点Pとは、有機材料が、坩堝10から蒸発または昇華して基板50に堆積する領域の中心点を示すものである。また、蓋部2に形成された有機材料噴出孔20は、噴射方向30がZ軸に対して角度θ10だけ傾斜するように設けられている。   As shown in FIG. 2, the crucible 10 is composed of a U-shaped container 1, and a lid 2 having an organic material ejection hole 20 is formed in the opening of the container 1. The container 1 and the lid part 2 may be formed integrally or may be formed as separate bodies. The organic material ejection hole 20 formed in the lid 2 ejects the organic material in the range of the spread angle θ1 with the ejection direction 30 toward the ejection target point P as the center. Here, the ejection target point P indicates the center point of the region where the organic material is evaporated or sublimated from the crucible 10 and deposited on the substrate 50. The organic material ejection hole 20 formed in the lid 2 is provided such that the ejection direction 30 is inclined by an angle θ10 with respect to the Z axis.

同様に、図3に示す坩堝11はコ字形状の容器1からなり、その容器1の開口部に有機材料噴出孔21を有する蓋部2aが形成される。この蓋部2aに形成された有機材料噴出孔21は、噴出目標点Pに向かう噴射方向30を中心として広がり角度θ1の範囲で有機材料を噴出する。また、蓋部2aに形成された有機材料噴出孔21は、噴射方向30がZ軸と平行に、すなわち基板50に対して垂直方向に設けられている。   Similarly, the crucible 11 shown in FIG. 3 includes a U-shaped container 1, and a lid 2 a having an organic material ejection hole 21 is formed in the opening of the container 1. The organic material ejection hole 21 formed in the lid portion 2a ejects the organic material in the range of the spread angle θ1 with the ejection direction 30 toward the ejection target point P as the center. Further, the organic material ejection holes 21 formed in the lid portion 2 a are provided with the ejection direction 30 parallel to the Z axis, that is, perpendicular to the substrate 50.

さらに、図4に示す坩堝12はコ字形状の容器1からなり、その容器1の開口部に有機材料噴出孔22を有する蓋部2bが形成される。この蓋部2bに形成された有機材料噴出孔22は、噴出目標点Pに向かう噴射方向30を中心として広がり角度θ1の範囲で有機材料を噴出する。また、蓋部2bに形成された有機材料噴出孔22は、噴射方向30がZ軸に対して角度−θ12だけ傾斜するように設けられている。   Further, the crucible 12 shown in FIG. 4 is composed of a U-shaped container 1, and a lid 2 b having an organic material ejection hole 22 is formed in the opening of the container 1. The organic material ejection hole 22 formed in the lid portion 2b ejects the organic material in the range of the spread angle θ1 with the ejection direction 30 toward the ejection target point P as the center. Further, the organic material ejection holes 22 formed in the lid 2b are provided such that the ejection direction 30 is inclined by an angle −θ12 with respect to the Z axis.

次に、図5は図1の基板50と複数の坩堝10,11,12との位置関係を示す模式図である。   Next, FIG. 5 is a schematic diagram showing the positional relationship between the substrate 50 of FIG. 1 and the plurality of crucibles 10, 11, 12.

図5に示すように、目標噴出点Pは、坩堝10,11,12により堆積される有機材料の領域の長さL1の中心点を示す。上述した角度θ10,θ12は、目標噴出点Pの位置、基板50と坩堝10,11,12との距離H、坩堝10と坩堝11との間隔L3および坩堝11と坩堝12との間隔L4により決定される。   As shown in FIG. 5, the target ejection point P indicates the center point of the length L1 of the region of the organic material deposited by the crucibles 10, 11, and 12. The angles θ10 and θ12 described above are determined by the position of the target ejection point P, the distance H between the substrate 50 and the crucibles 10, 11, and 12, the distance L3 between the crucible 10 and the crucible 11, and the distance L4 between the crucible 11 and the crucible 12. Is done.

したがって、この角度θ10,θ12を最適な数値に設定することにより、坩堝10,11,12から噴出される有機材料が、基板50の共通の領域に均一に堆積される。   Therefore, by setting the angles θ10 and θ12 to optimum values, the organic material ejected from the crucibles 10, 11, and 12 is uniformly deposited in the common region of the substrate 50.

次に、基板50の表面に有機層を形成する方法について説明する。   Next, a method for forming an organic layer on the surface of the substrate 50 will be described.

まず、図2、図3および図4に示す坩堝10,11,12の内部に有機材料が充填される(図示せず)。ここで、例えば坩堝11,坩堝12に同一の有機材料が充填される。充填される有機材料の詳細については後述する。   First, an organic material is filled in the crucibles 10, 11, and 12 shown in FIGS. 2, 3, and 4 (not shown). Here, for example, the crucible 11 and the crucible 12 are filled with the same organic material. Details of the organic material to be filled will be described later.

次いで、坩堝10,11,12に設けられたヒータ(図示せず)により坩堝10,11,12が加熱される。その熱により坩堝10,11,12に充填された有機材料が蒸発または昇華する。   Next, the crucibles 10, 11 and 12 are heated by heaters (not shown) provided in the crucibles 10, 11 and 12. The organic material filled in the crucibles 10, 11 and 12 is evaporated or sublimated by the heat.

この際、坩堝10,11,12は、基板50に対して一定速度でX方向に往復移動する。移動速度は5mm/sec以上10mm/sec以下とすることが好ましい。それにより、蒸発または昇華した有機材料が基板50に均一に堆積し、基板50の表面に有機層が形成される。   At this time, the crucibles 10, 11, and 12 reciprocate in the X direction at a constant speed with respect to the substrate 50. The moving speed is preferably 5 mm / sec or more and 10 mm / sec or less. Thereby, the evaporated or sublimated organic material is uniformly deposited on the substrate 50, and an organic layer is formed on the surface of the substrate 50.

この場合、坩堝11,12に同一の有機材料が充填されているので、ヒータの加熱温度を低下させた場合でも1つの坩堝を用いて加熱温度を高く設定した場合と比べて、有機材料の蒸発量を同等に維持することができる。その結果、有機材料の特性の劣化を防止しつつ、有機エレクトロルミネッセンス素子の生産効率および量産性を向上させることができる。   In this case, since the crucibles 11 and 12 are filled with the same organic material, the evaporation of the organic material can be achieved even when the heating temperature of the heater is lowered as compared with the case where the heating temperature is set higher using one crucible. The amount can be kept equal. As a result, it is possible to improve the production efficiency and mass productivity of the organic electroluminescence element while preventing the deterioration of the characteristics of the organic material.

なお、本実施の形態においては、坩堝10,11,12を基板50に対して一定速度で移動させることとしたが、これに限定されず、坩堝10,11,12を一方向にのみ一定速度で移動させてもよく、また、坩堝10,11,12の移動および停止を間欠的に繰り返してもよい。   In the present embodiment, the crucibles 10, 11, and 12 are moved at a constant speed with respect to the substrate 50. However, the present invention is not limited to this, and the crucibles 10, 11, and 12 are moved at a constant speed only in one direction. The crucibles 10, 11, and 12 may be moved and stopped intermittently.

さらに、本実施の形態においては、坩堝10,11,12を移動させることとしたが、これに限定されず、坩堝10,11,12を固定させた状態で基板50を移動させることとしてもよい。   Furthermore, in this embodiment, the crucibles 10, 11, and 12 are moved. However, the present invention is not limited to this, and the substrate 50 may be moved while the crucibles 10, 11, and 12 are fixed. .

次に、図6は、本実施の形態に係る製造方法により形成される有機EL素子の模式的構造図である。   Next, FIG. 6 is a schematic structural diagram of an organic EL element formed by the manufacturing method according to the present embodiment.

図6に示すように、有機EL素子600は、基板50、陽極(ホール注入電極)51、ホール注入層52、ホール輸送層53、発光層54、電子輸送層55および陰極(電子注入電極)56を順に含む積層構造を有する。   As shown in FIG. 6, the organic EL element 600 includes a substrate 50, an anode (hole injection electrode) 51, a hole injection layer 52, a hole transport layer 53, a light emitting layer 54, an electron transport layer 55, and a cathode (electron injection electrode) 56. In order.

基板50上に透明な陽極51が形成される。陽極51の材料としてインジウム酸化スズ(Indium Tin Oxcide : 以下、ITOと略記する)が用いられる。また、ITOの他に酸化スズ(SnO2 )または酸化インジウム(In2 3 )等が用いられる。陽極51を覆うように有機材料からなるホール注入層52および有機材料からなるホール輸送層53が形成される。 A transparent anode 51 is formed on the substrate 50. As the material of the anode 51, indium tin oxide (hereinafter abbreviated as ITO) is used. In addition to ITO, tin oxide (SnO 2 ), indium oxide (In 2 O 3 ), or the like is used. A hole injection layer 52 made of an organic material and a hole transport layer 53 made of an organic material are formed so as to cover the anode 51.

ホール注入層52の材料として、下記式(1)で示される分子構造を有する4,4'4"-トリス(N-(2-ナフチル)-N-フェニル-アミノ)-トリフェニルアミン(4,4'4"-Tris(N-(2-naphthyl)-N-phenyl-amino)-triphenylamine:以下、2TNATAと略記する)等が用いられる。   As a material for the hole injection layer 52, 4,4'4 "-tris (N- (2-naphthyl) -N-phenyl-amino) -triphenylamine (4,4) having a molecular structure represented by the following formula (1): 4'4 "-Tris (N- (2-naphthyl) -N-phenyl-amino) -triphenylamine (hereinafter abbreviated as 2TNATA) or the like is used.

Figure 2005293968
Figure 2005293968

また、ホール輸送層53の材料として、下記式(2)で示される分子構造を有するN,N'-ジ(ナフタレン-1-イル)-N,N'-ジフェニル-ベンジジン(N,N'-Di(naphthalene-1-yl)-N,N'-diphenyl-benzidine:以下、NPBと略記する)等が用いられる。   Further, as a material of the hole transport layer 53, N, N′-di (naphthalen-1-yl) -N, N′-diphenyl-benzidine (N, N′-) having a molecular structure represented by the following formula (2) Di (naphthalene-1-yl) -N, N′-diphenyl-benzidine (hereinafter abbreviated as NPB) and the like are used.

Figure 2005293968
Figure 2005293968

ホール輸送層53上には、有機材料からなる発光層54が形成される。発光層54の材料として、ホスト材料であり上記式(2)で示される分子構造を有するNPB、および発光ドーパントとして下記式(3)で示される分子構造を有する5,12-ビス(4-(6-メチルベンゾチアゾール-2-イル)フェニル)-6,11-ジフェニルナフタセン(5,12-Bis(4-(6-methylbenzothiazol-2-yl)phenyl)-6,11-diphenylnaphthacene:以下、DBzRと略記する)等が用いられる。ここで、DBzRは、ルブレン誘導体(ルブレン系材料)である。   A light emitting layer 54 made of an organic material is formed on the hole transport layer 53. As a material of the light emitting layer 54, NPB which is a host material and has a molecular structure represented by the above formula (2), and 5,12-bis (4- (4- () having a molecular structure represented by the following formula (3) as a light emitting dopant. 6-methylbenzothiazol-2-yl) phenyl) -6,11-diphenylnaphthacene (5,12-Bis (4- (6-methylbenzothiazol-2-yl) phenyl) -6,11-diphenylnaphthacene: DBzR) For example). Here, DBzR is a rubrene derivative (rubrene-based material).

Figure 2005293968
Figure 2005293968

さらに、発光層54上には、電子輸送層55が形成される。電子輸送層55の材料として、式(4)に示される分子構造を有するトリス(8-ヒドロキシキノリナト)アルミニウム(Tris(8-hydroxyquinolinato)aluminum:以下、Alqと略記する)等が用いられる。   Further, an electron transport layer 55 is formed on the light emitting layer 54. As a material of the electron transport layer 55, tris (8-hydroxyquinolinato) aluminum (hereinafter abbreviated as Alq) having a molecular structure represented by the formula (4) is used.

Figure 2005293968
Figure 2005293968

さらに、陰極56の材料として、MgIn合金(比率10:1)等が用いられる。   Further, as the material of the cathode 56, an MgIn alloy (ratio 10: 1) or the like is used.

上述した有機EL素子600の、発光層54の形成には、上記の坩堝10,11,12を用いる。この場合、坩堝10にNPBを充填し、坩堝11,12にDBzRを充填する。ここで、ルブレン系有機材料は、熱により劣化しやすい。   The crucibles 10, 11, and 12 are used for forming the light emitting layer 54 of the organic EL element 600 described above. In this case, the crucible 10 is filled with NPB, and the crucibles 11 and 12 are filled with DBzR. Here, the rubrene-based organic material is easily deteriorated by heat.

この場合、坩堝11,12に同一のルブレン系の有機材料(DBzR)が充填されているので、ヒータの加熱温度を低下させた場合でも1つの坩堝を用いて加熱温度を高く設定した場合と比べて、ルブレン系の有機材料の蒸発量を同等に維持することができる。その結果、ルブレン系材料の特性の劣化を防止しつつ、有機エレクトロルミネッセンス素子の生産効率および量産性を向上させることができる。   In this case, since the crucibles 11 and 12 are filled with the same rubrene-based organic material (DBzR), even when the heating temperature of the heater is lowered, the heating temperature is set higher using one crucible. Thus, the evaporation amount of the rubrene-based organic material can be maintained at the same level. As a result, the production efficiency and mass productivity of the organic electroluminescence element can be improved while preventing the deterioration of the characteristics of the rubrene-based material.

なお、本実施の形態では、陽極51から光を取り出すバックエミッション構造の有機EL素子600について説明したが、これに限定されず、本発明は、陰極56側から光を取り出すトップエミッション構造の有機EL素子に適用することもできる。   In the present embodiment, the back-emission structure organic EL element 600 that extracts light from the anode 51 has been described. However, the present invention is not limited to this, and the present invention is applicable to a top-emission structure organic EL element that extracts light from the cathode 56 side. It can also be applied to an element.

さらに本実施の形態においては、坩堝10,11,12を用いた場合について説明したが、これに限定されず、任意の複数の坩堝を用いてもよい。   Furthermore, although the case where crucibles 10, 11, and 12 are used has been described in the present embodiment, the present invention is not limited to this, and any plurality of crucibles may be used.

また、本実施の形態においては、坩堝10の有機材料噴出孔20および坩堝12の有機材料噴出孔22を角度θ10,θ12傾斜させることとしたが、これに限定されず、坩堝10および坩堝12自体を角度θ10,θ12傾けてもよい。   In the present embodiment, the organic material ejection hole 20 of the crucible 10 and the organic material ejection hole 22 of the crucible 12 are inclined by the angles θ10 and θ12. However, the present invention is not limited to this, and the crucible 10 and the crucible 12 itself. May be inclined at angles θ10 and θ12.

(基板と複数の坩堝との位置関係の他の例)
次に、基板50と複数の坩堝10,11,12との位置関係の他の構成例として、坩堝10の代わりに坩堝13を用いた例について説明する。
図7は坩堝13の模式的断面図であり、図8は基板50と複数の坩堝11、12および13との位置関係を示す模式図である。
(Other examples of positional relationship between substrate and multiple crucibles)
Next, an example in which the crucible 13 is used instead of the crucible 10 will be described as another configuration example of the positional relationship between the substrate 50 and the plurality of crucibles 10, 11, and 12.
FIG. 7 is a schematic cross-sectional view of the crucible 13, and FIG. 8 is a schematic view showing the positional relationship between the substrate 50 and the plurality of crucibles 11, 12 and 13.

図7および図8においては、互いに直交する3方向をX方向、Y方向およびZ方向とする。X方向およびY方向は有機層を形成する基板50の表面に平行な方向であり、Z方向は基板50の表面に垂直な方向である。   7 and 8, three directions orthogonal to each other are defined as an X direction, a Y direction, and a Z direction. The X direction and the Y direction are directions parallel to the surface of the substrate 50 forming the organic layer, and the Z direction is a direction perpendicular to the surface of the substrate 50.

図7に示すように、坩堝13はコ字形状の容器1からなり、その容器1の開口部に有機材料噴出孔23を有する蓋部2cが形成される。この蓋部2cに形成された有機材料噴出孔23は、噴出目標点Pに対して広がり角度θ1の範囲で有機材料を噴出する。また、蓋部2cに形成された有機材料噴出孔23は、Z軸に対して角度−θ13だけ傾斜して設けられている。   As shown in FIG. 7, the crucible 13 includes a U-shaped container 1, and a lid 2 c having an organic material ejection hole 23 is formed in the opening of the container 1. The organic material ejection hole 23 formed in the lid portion 2c ejects the organic material with respect to the ejection target point P within the range of the spread angle θ1. In addition, the organic material ejection hole 23 formed in the lid 2c is provided to be inclined by an angle −θ13 with respect to the Z axis.

次いで、図8に示すように、目標噴出点Pは、坩堝11、12および13により堆積される有機材料の領域の長さL1の中心点を示す。上述した角度θ12、θ13は、目標噴出点Pの位置、基板50と坩堝11、12および13との距離H、坩堝11と坩堝12との間隔L4および坩堝12と坩堝13との間隔L5により決定される。   Next, as shown in FIG. 8, the target ejection point P indicates the center point of the length L1 of the region of the organic material deposited by the crucibles 11, 12 and 13. The angles θ12 and θ13 described above are determined by the position of the target ejection point P, the distance H between the substrate 50 and the crucibles 11, 12, and 13, the distance L4 between the crucible 11 and the crucible 12, and the distance L5 between the crucible 12 and the crucible 13. Is done.

したがって、このθ12およびθ13を最適な数値に設定することにより、坩堝11、12および13から噴出される有機材料が、基板50の共通の領域に均一に堆積される。   Therefore, by setting θ12 and θ13 to optimum values, the organic material ejected from the crucibles 11, 12, and 13 is uniformly deposited in the common region of the substrate 50.

以下、実施例においては、本実施の形態に係る有機EL素子の製造方法を用いて上記図6の有機EL素子を作製した。また、比較例においては、従来の有機EL素子の製造方法を用いて有機EL素子を作製した。以下、実施例および比較例の詳細について説明する。   Hereinafter, in the examples, the organic EL element shown in FIG. 6 was manufactured using the method for manufacturing the organic EL element according to the present embodiment. Moreover, in the comparative example, the organic EL element was produced using the manufacturing method of the conventional organic EL element. Details of the examples and comparative examples will be described below.

(実施例)
実施例においては、基板50として500mm×350mmの大きさのものを用いた。複数の坩堝10,11,12は基板50から200mm下方の位置に設けた。
(Example)
In the example, the substrate 50 having a size of 500 mm × 350 mm was used. The plurality of crucibles 10, 11 and 12 were provided at positions 200 mm below the substrate 50.

実施例における坩堝10および坩堝11の距離L3は100mmとし、坩堝11,坩堝12の距離L4は100mmとし、基板50のX方向の長さL2は500mmとし、坩堝10の角度θ10は45度とし、坩堝12の角度θ12は−45度とした。また、領域の長さL1は400mmである。   In the embodiment, the distance L3 between the crucible 10 and the crucible 11 is 100 mm, the distance L4 between the crucible 11 and the crucible 12 is 100 mm, the length L2 in the X direction of the substrate 50 is 500 mm, the angle θ10 of the crucible 10 is 45 degrees, The angle θ12 of the crucible 12 was −45 degrees. The region length L1 is 400 mm.

まず、ガラス基板50上に陽極51をスパッタ法により形成した。陽極51を形成した基板50を中性洗剤および純水で洗浄した後、所定温度下で所定時間ベークした。その後、UV/03洗浄を行い、減圧した真空蒸着装置内にセットした。   First, the anode 51 was formed on the glass substrate 50 by sputtering. The substrate 50 on which the anode 51 was formed was washed with a neutral detergent and pure water, and then baked at a predetermined temperature for a predetermined time. Thereafter, UV / 03 cleaning was performed, and the vacuum deposition apparatus was set in a vacuum.

次に、坩堝(図示せず)の内部に2TNATAを充填した。そして、坩堝を加熱することにより陽極51上にホール注入層52を形成した。次いで、坩堝(図示せず)の内部にNPBを充填した。そして、坩堝を加熱することによりホール注入層52上にホール輸送層53を形成した。   Next, 2TNATA was filled in a crucible (not shown). Then, the hole injection layer 52 was formed on the anode 51 by heating the crucible. Next, NPB was filled inside the crucible (not shown). Then, the hole transport layer 53 was formed on the hole injection layer 52 by heating the crucible.

続いて、図1の坩堝10の内部に、ホスト材料であるNPBを充填し、坩堝11,12の内部に、赤色発光ドーパントであるDBzRを充填した。   Subsequently, NPB as a host material was filled into the crucible 10 of FIG. 1, and DBzR as a red light emitting dopant was filled into the crucibles 11 and 12.

そして、坩堝10,11,12を一定速度(10mm/sec)で一方向(X方向)に移動させつつヒータによる加熱を行った。実施例においてヒータによる加熱温度は、約320℃に設定した。そして、ホール輸送層53上に発光層54を形成した。   Then, the crucibles 10, 11 and 12 were heated by a heater while moving in one direction (X direction) at a constant speed (10 mm / sec). In the example, the heating temperature by the heater was set to about 320 ° C. Then, a light emitting layer 54 was formed on the hole transport layer 53.

次いで、坩堝(図示せず)の内部にAlqを充填した。そして、坩堝を加熱することにより発光層54上に電子輸送層55を形成した。さらに、陰極としてAlを形成し、有機EL素子を作製した。   Next, Alq was filled in the crucible (not shown). And the electron carrying layer 55 was formed on the light emitting layer 54 by heating a crucible. Furthermore, Al was formed as a cathode to produce an organic EL element.

(比較例)
比較例においては、発光層の形成時において、坩堝10の内部にホスト材料であるNPBを充填し、坩堝11の内部に、赤色発光ドーパントであるDBzRを充填した。この場合、坩堝12は用いていない。
(Comparative example)
In the comparative example, at the time of forming the light emitting layer, the crucible 10 was filled with NPB as a host material, and the crucible 11 was filled with DBzR as a red light emitting dopant. In this case, the crucible 12 is not used.

また、ヒータによる加熱温度を340℃に設定した。その他の条件については、実施例と同様にして有機EL素子を作製した。   Moreover, the heating temperature by a heater was set to 340 degreeC. About other conditions, it carried out similarly to the Example, and produced the organic EL element.

(評価)
実施例および比較例により作製した有機EL素子の発光効率、CIE(Comission International d'Eclairage )色度座標CIE、駆動電圧および輝度半減期を測定した。その測定結果を表1に示す。
(Evaluation)
Luminous efficiency, CIE (Comission International d'Eclairage) chromaticity coordinates CIE, driving voltage, and luminance half-life of the organic EL devices produced in Examples and Comparative Examples were measured. The measurement results are shown in Table 1.

なお、表1においては実施例および比較例の有機EL素子の各特性の測定結果を比較例の各測定結果を1として規格化し、規格化した各測定結果を示した。   In Table 1, the measurement results of the characteristics of the organic EL elements of Examples and Comparative Examples were normalized with each measurement result of the Comparative Example as 1, and each measurement result normalized was shown.

Figure 2005293968
Figure 2005293968

なお、xは、xはCIE色度座標の横軸であり、yはCIE色度座標の縦軸である。   X is the horizontal axis of the CIE chromaticity coordinates, and y is the vertical axis of the CIE chromaticity coordinates.

表1に示すように、実施例で作製した有機EL素子の発光効率は、比較例で作製した有機EL素子の発光効率の2.14倍となった。   As shown in Table 1, the luminous efficiency of the organic EL element produced in the example was 2.14 times that of the organic EL element produced in the comparative example.

また、比較例で作製した有機EL素子においては、有機EL素子を構成する有機材料の劣化により目標とする色度の光が発生されなかった。一方、実施例で作製した有機EL素子においては、目標とする色度の光が発生された。   Moreover, in the organic EL element produced by the comparative example, the light of the target chromaticity was not generated by deterioration of the organic material which comprises an organic EL element. On the other hand, in the organic EL device produced in the example, light having a target chromaticity was generated.

実施例で作製した有機EL素子の駆動電圧は、比較例で作製した有機EL素子の駆動電圧の1.05倍となった。   The drive voltage of the organic EL element produced in the example was 1.05 times the drive voltage of the organic EL element produced in the comparative example.

また、実施例で作製した有機EL素子の輝度半減期は、比較例で作製した有機EL素子の輝度半減期の10倍となった。   Moreover, the luminance half-life of the organic EL device produced in the example was 10 times the luminance half-life of the organic EL device produced in the comparative example.

以上のことにより、坩堝11,12に同一の有機材料を充填して坩堝11,12の加熱温度を低く設定した場合、1つの坩堝に有機材料を充填して坩堝の加熱温度を高く設定した場合と比べて、有機EL素子の発光特性が向上した。   When the crucibles 11 and 12 are filled with the same organic material and the heating temperature of the crucibles 11 and 12 is set low, the crucibles 11 and 12 are filled with the organic material and the crucible heating temperature is set high. Compared with, the light emission characteristics of the organic EL element were improved.

本発明は、各種表示装置、各種光源等に利用することができる。   The present invention can be used for various display devices, various light sources, and the like.

本実施の形態に係る有機エレクトロルミネッセンス素子の製造方法を説明するための斜視図である。It is a perspective view for demonstrating the manufacturing method of the organic electroluminescent element which concerns on this Embodiment. 図1の坩堝の凸部に形成された有機材料噴出孔を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the organic material ejection hole formed in the convex part of the crucible of FIG. 図1の坩堝の凸部に形成された有機材料噴出孔を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the organic material ejection hole formed in the convex part of the crucible of FIG. 坩堝の凸部に形成された有機材料噴出孔を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the organic material ejection hole formed in the convex part of a crucible. 図1の基板と複数の坩堝との位置関係を示す模式図である。It is a schematic diagram which shows the positional relationship of the board | substrate of FIG. 1, and several crucibles. 本実施の形態に係る製造方法により形成される有機EL素子の模式的構造図である。It is a typical structure figure of the organic EL element formed by the manufacturing method concerning this embodiment. 坩堝の模式的断面図である。It is a typical sectional view of a crucible. 基板と複数の坩堝との位置関係を示す模式図である。It is a schematic diagram which shows the positional relationship of a board | substrate and several crucibles.

符号の説明Explanation of symbols

10、11、12 坩堝
20、21、22 有機材料噴出孔
50 基板
51 陽極(ホール注入電極)
52 ホール注入層
53 ホール輸送層
54 発光層
55 電子輸送層
56 陰極(電子注入電極)
600 有機EL素子
10, 11, 12 Crucible 20, 21, 22 Organic material ejection hole 50 Substrate 51 Anode (hole injection electrode)
52 hole injection layer 53 hole transport layer 54 light emitting layer 55 electron transport layer 56 cathode (electron injection electrode)
600 Organic EL device

Claims (3)

基板上に有機材料からなる有機層を備えた有機エレクトロルミネッセンス素子の製造方法であって、
第1の方向に延びかつ略平行に配置された複数の坩堝のうち少なくとも2つの坩堝に同一の有機材料を充填する工程と、
前記2つの坩堝を加熱する工程と、
前記複数の坩堝と前記基板とを互いに相対的に前記第1の方向に交差する第2の方向に移動させる工程とを備えたことを特徴とする有機エレクトロルミネッセンス素子の製造方法。
A method for producing an organic electroluminescence device comprising an organic layer made of an organic material on a substrate,
Filling at least two crucibles of a plurality of crucibles extending in a first direction and arranged substantially in parallel with the same organic material;
Heating the two crucibles;
And a step of moving the plurality of crucibles and the substrate relative to each other in a second direction intersecting the first direction.
前記複数の坩堝は、それぞれ設定された噴射方向を中心として所定の広がりをもって前記有機材料の蒸気を噴出し、前記基板の共通の領域に前記有機材料が堆積するように前記少なくとも2つの坩堝の噴射方向が設定されたことを特徴とする請求項1記載の有機エレクトロルミネッセンス素子の製造方法。 The plurality of crucibles eject the vapor of the organic material with a predetermined spread centering around a set ejection direction, and the at least two crucibles are ejected so that the organic material is deposited on a common region of the substrate. 2. The method of manufacturing an organic electroluminescence element according to claim 1, wherein the direction is set. 前記有機材料は、ルブレン系材料を含むことを特徴とする請求項1または2記載の有機エレクトロルミネッセンス素子の製造方法。 The method of manufacturing an organic electroluminescence element according to claim 1, wherein the organic material includes a rubrene-based material.
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JP7025970B2 (en) 2018-03-26 2022-02-25 長州産業株式会社 Thin-film deposition equipment and thin-film deposition method

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