JP2005258266A - Method for manufacturing metal coated optical fiber - Google Patents

Method for manufacturing metal coated optical fiber Download PDF

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JP2005258266A
JP2005258266A JP2004072368A JP2004072368A JP2005258266A JP 2005258266 A JP2005258266 A JP 2005258266A JP 2004072368 A JP2004072368 A JP 2004072368A JP 2004072368 A JP2004072368 A JP 2004072368A JP 2005258266 A JP2005258266 A JP 2005258266A
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optical fiber
metal
seed layer
core wire
electroplating
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Shigeharu Tanaka
茂晴 田中
Fumiaki Ishida
史明 石田
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Sumitomo Metal Mining Co Ltd
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Sumitomo Metal Mining Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a metal coated optical fiber in which electric power can be easily and stably supplied for forming a metal coating layer on a seed layer by electroplating and high productivity, high quality and high economic advantage can be achieved. <P>SOLUTION: When a metal coating layer is formed by electroplating on the surface of a conductive seed layer 4 which is applied on a primary coated fiber 3 and is exposed by removing a resin coating 2 in a required length of an optical fiber 1, the top end of the primary coated fiber having the exposed sheet layer 4 is gripped and supported by a pair of gripping pieces 5a, 5b at least one of which is made of a conductor. The conductor gripping piece 5a is used as a cathode to supply electric power. The conductive gripping piece 5a is masked with an insulator except at the part being in contact with the primary coated fiber 3 having the seed layer 4. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、金属被覆光ファイバの製造方法に関するものである。   The present invention relates to a method for manufacturing a metal-coated optical fiber.

金属被覆光ファイバの製造方法としては、ガラス又はプラスチックの芯線上に導電性のシード層を設けておき、このシード層の表面上に電解Niめっき若しくは電解Auめっきにより金属被覆層を形成する方法が知られている。また、シード層の形成方法については、炭素(C)やクロム(Cr)等を蒸着又はスパッタリングする方法、あるいはニッケル(Ni)や銅(Cu)を無電解めっきする方法等が知られている。   As a method for producing a metal-coated optical fiber, there is a method in which a conductive seed layer is provided on a glass or plastic core wire, and a metal coating layer is formed on the surface of the seed layer by electrolytic Ni plating or electrolytic Au plating. Are known. As a method for forming the seed layer, a method of depositing or sputtering carbon (C), chromium (Cr) or the like, a method of electroless plating of nickel (Ni) or copper (Cu), or the like is known.

しかしながら、電解Niめっき若しくは電解Auめっきによりシード層上に金属被覆層を形成するに際して、その給電方法についての提案は少ない。この給電方法の代表的なものとして、例えば、特開平6−27356号公報には、シード層に陰極棒の先端を接触させて給電する方法が提案されている。また、特許第2942374号公報には、シード層の一部に導電性塗料を厚く塗布し、その導電性塗料部分に給電する方法が提案されている。   However, when a metal coating layer is formed on a seed layer by electrolytic Ni plating or electrolytic Au plating, there are few proposals for a power feeding method. As a typical power supply method, for example, Japanese Patent Laid-Open No. 6-27356 proposes a method of supplying power by bringing the tip of a cathode bar into contact with a seed layer. Japanese Patent No. 2942374 proposes a method of applying a thick conductive paint to a part of the seed layer and supplying power to the conductive paint portion.

特開平6−27356号公報JP-A-6-27356 特許第2942374号公報Japanese Patent No. 2942374

金属被覆光ファイバの製造において、電解Niめっき若しくは電解Auめっきによりシード層上に金属被覆層を形成する際の給電方法として、上記した従来の方法で電気めっきを行う場合、導通の不具合によりめっき層を形成できない、電気めっき液あるいは金属被覆光ファイバが汚染される、工程が複雑で非効率的であるため製造コストが高くつく、などの問題点があった。   In the production of a metal-coated optical fiber, as a power feeding method when forming a metal coating layer on a seed layer by electrolytic Ni plating or electrolytic Au plating, when electroplating is performed by the above-described conventional method, the plating layer is caused by a conduction failure. In other words, the electroplating solution or the metal-coated optical fiber is contaminated, the process is complicated and inefficient, and the manufacturing cost is high.

例えば、特開平6−27356号公報に記載の陰極棒を接触させる方法では、光ファイバの芯線が125μmと非常に細いため、陰極棒の先端接触部を細くしなければならず、しかも高い接触位置精度が要求される。そのため、陰極としての電気容量が不足する、接触位置ズレが起りやすい、接触面積が小さい等の理由により、所定の電流が流れ難く、電解めっきが出来ない若しくは所定の膜厚が得られないという問題があった。   For example, in the method of contacting the cathode rod described in JP-A-6-27356, since the core of the optical fiber is very thin as 125 μm, the tip contact portion of the cathode rod must be made thin, and the high contact position Accuracy is required. For this reason, there is a problem in that a predetermined current is difficult to flow and electrolytic plating cannot be performed or a predetermined film thickness cannot be obtained due to a shortage of electric capacity as a cathode, contact position deviation easily occurring, or a small contact area. was there.

また、特許第2942374号公報に開示された導電性塗料部分に給電する方法では、導電性塗料の塗布及び乾燥工程が増えるうえ、導電性塗料部分が不要な場合には電気めっき後に導電性塗料部分を除去する工程も必要となる。また、光機器装置に組み込むため芯線の先端部のめっき除去を行う場合、先端部まで厚いめっき層があるため除去時間が長くなる。更に、導電性塗料部分に接触するめっき液の汚染や、導電性塗料除去時の残渣汚染が起りやすく、歩留まりの低下を招くと共に、製造コストが高くつく等の問題があった。   Further, in the method of supplying power to the conductive paint part disclosed in Japanese Patent No. 2942374, the steps of applying and drying the conductive paint increase, and when the conductive paint part is unnecessary, the conductive paint part is applied after electroplating. A process for removing the film is also required. In addition, when removing the plating at the tip of the core wire for incorporation in an optical device, the removal time is long because there is a thick plating layer up to the tip. Further, there are problems such as contamination of the plating solution in contact with the conductive paint portion and residue contamination at the time of removing the conductive paint, resulting in a decrease in yield and high manufacturing cost.

本発明は、上記した従来技術の問題点を解決するためになされたものであり、電気めっきによりシード層上に金属被覆層を形成する際に簡単で且つ安定した給電を行うことができ、高生産性、高品質性、高経済性を達成することが可能な金属被覆光ファイバの製造方法を提供することを目的とするものである。   The present invention has been made to solve the above-described problems of the prior art, and can easily and stably supply power when a metal coating layer is formed on a seed layer by electroplating. It is an object of the present invention to provide a method for producing a metal-coated optical fiber capable of achieving productivity, high quality, and high economic efficiency.

上記目的を達成するため、本発明における金属被覆光ファイバの製造方法は、光ファイバの樹脂被覆を必要長さだけ除去し、露出した芯線上の導電性のシード層表面に、電気めっきにより金属被覆層を形成する金属被覆光ファイバの製造方法において、露出したシード層を有する芯線の先端部を少なくとも一方が導電体からなる一対の把持治具で挟み込み、この導電体の把持治具を陰極側として給電することを特徴とする。   In order to achieve the above object, the method for producing a metal-coated optical fiber according to the present invention removes the resin coating of the optical fiber by a required length and coats the surface of the conductive seed layer on the exposed core wire by electroplating. In the method of manufacturing a metal-coated optical fiber for forming a layer, a tip end portion of a core wire having an exposed seed layer is sandwiched between a pair of holding jigs made of a conductor, and the holding jig for the conductor is used as a cathode side. It is characterized by supplying power.

この本発明の金属被覆光ファイバの製造方法において、前記導電体の把持治具は、シード層を有する芯線と接触する部分以外が耐薬品性及び耐熱性の絶縁体でマスキングされていることが好ましい。   In this method of manufacturing a metal-coated optical fiber according to the present invention, it is preferable that the gripping jig for the conductor is masked with a chemical-resistant and heat-resistant insulator except for a portion in contact with the core wire having the seed layer. .

本発明によれば、電気めっきによりシード層上に金属被覆層を形成する際に、簡単で且つ安定した給電ができるため、電気めっきにより金属被覆層を安定して形成することができ、電気めっき液や金属被覆光ファイバの汚染も無くすことができる。そのため、金属被覆光ファイバの製造において、高生産性、高品質、高経済性を同時に達成することが可能である。   According to the present invention, when the metal coating layer is formed on the seed layer by electroplating, since simple and stable power feeding can be performed, the metal coating layer can be stably formed by electroplating. Contamination of the liquid and the metal-coated optical fiber can be eliminated. Therefore, it is possible to simultaneously achieve high productivity, high quality, and high economic efficiency in the production of the metal-coated optical fiber.

本発明による金属被覆光ファイバの製造方法を、図面を参照して工程順に説明する。まず、図1(a)に示すように、光ファイバ1の樹脂被覆2を金属被覆層の形成に必要な長さだけ除去し、露出した芯線3の上に導電性のシード層4を形成する。シード層4の材質及び形成方法としては、炭素(C)やクロム(Cr)等については蒸着又はスパッタリングにより、ニッケル(Ni)、銅(Cu)、チタン(Ti)等の場合には無電解めっきで形成するのが好適である。尚、予め芯線3の全体にシード層4が形成され、その上に樹脂被覆2を設けた光ファイバを用いることもでき、その場合には樹脂被覆2を一部除去するだけでよく、更にシード層を形成する必要はない。   A method for producing a metal-coated optical fiber according to the present invention will be described in the order of steps with reference to the drawings. First, as shown in FIG. 1A, the resin coating 2 of the optical fiber 1 is removed by a length necessary for forming a metal coating layer, and a conductive seed layer 4 is formed on the exposed core wire 3. . As the material and formation method of the seed layer 4, carbon (C), chromium (Cr), etc. are deposited or sputtered, and in the case of nickel (Ni), copper (Cu), titanium (Ti), etc., electroless plating It is preferable to form by. It is also possible to use an optical fiber in which a seed layer 4 is previously formed on the entire core wire 3 and a resin coating 2 is provided thereon. In this case, only a part of the resin coating 2 may be removed. There is no need to form a layer.

次に、図1(b)に示すように、光ファイバ1の樹脂被覆2から露出した芯線3(表面にシード層4を有する)の先端部を、一対の把持治具5で挟み込む。一対の把持治具5のうち、少なくとも一方は芯線3上のシード層4に給電するため、導電体の把持治具5aとする必要がある。他方の把持治具は、電気めっきに耐え得るように耐薬品性及び耐熱性を有するものであればよく、例えばゴム製の把持治具5bを用いることができる。   Next, as shown in FIG. 1B, the tip of the core wire 3 (having the seed layer 4 on the surface) exposed from the resin coating 2 of the optical fiber 1 is sandwiched between a pair of gripping jigs 5. Since at least one of the pair of gripping jigs 5 supplies power to the seed layer 4 on the core wire 3, it is necessary to use the conductor gripping jig 5a. The other gripping jig only needs to have chemical resistance and heat resistance so that it can withstand electroplating. For example, a rubber gripping jig 5b can be used.

上記導電体の把持治具5aとしては、Cu又はCu合金、Fe又はFe合金、Ti又はTi合金等の導電性の金属材が好ましく、芯線3との接触面以外は耐薬品及び耐熱性の絶縁体でマスキングすることで不要なめっきを防止することができる。また、導電体の把持治具5aの芯線3と接触する面は、平面であってもよいが、芯線3との接触面積が大きくなるように固定用の溝部を形成しておくことが望ましい。   The conductor gripping jig 5a is preferably a conductive metal material such as Cu or Cu alloy, Fe or Fe alloy, Ti or Ti alloy, and other than the contact surface with the core wire 3, chemical and heat resistant insulation. Unnecessary plating can be prevented by masking with a body. The surface of the conductor holding jig 5a that contacts the core wire 3 may be a flat surface, but it is desirable to form a fixing groove so that the contact area with the core wire 3 is increased.

一対の把持治具5a、5bで芯線3の先端部を挟み込んで把持した光ファイバー1は、樹脂被覆1から露出した芯線3の部分を電気めっき液に浸漬し、導電体の把持治具5aを陰極側として給電することにより電気めっきを行う。この電気めっきにより、図1(c)に示すように、露出した芯線3のシード層4上に、把持治具5a、5bで挟み込まれていた先端部を除いて、所定厚みの金属被覆層6が形成される。このように把持治具5を用いることによって、シード層4に確実に且つ安定して給電することができるため、均一な厚みの金属被覆層6を安定して形成することができる。   The optical fiber 1 sandwiched and gripped by the pair of gripping jigs 5a and 5b sandwiching the tip of the core wire 3 is immersed in the electroplating solution to expose the conductor gripping jig 5a as the cathode. Electroplating is performed by supplying power as the side. By this electroplating, as shown in FIG. 1C, the metal coating layer 6 having a predetermined thickness is formed on the exposed seed layer 4 of the core wire 3 except for the tip portion sandwiched between the holding jigs 5a and 5b. Is formed. By using the gripping jig 5 in this way, it is possible to reliably and stably supply power to the seed layer 4, so that the metal coating layer 6 having a uniform thickness can be stably formed.

しかも、把持治具5は電気めっき終了後に簡単に取り外すことができるため、得られた金属被覆光ファイバに給電部分が残ることがない。また、把持治具5で挟み込まれた芯線3の先端部には金属被覆層6がほとんど形成されないため、図1(d)に示すように、後に光機器装置に組み込む際に、露出した芯線3の先端部から金属被覆層6及びシード層3を除去する時間を短縮することができる。更に、芯線3の先端部が把持治具5から歪を受けた場合でも、その先端部を切断除去することもできるので、芯線3の劣化問題も解消することができる。   Moreover, since the gripping jig 5 can be easily removed after the electroplating is completed, no power feeding portion remains in the obtained metal-coated optical fiber. Further, since the metal coating layer 6 is hardly formed at the tip of the core wire 3 sandwiched by the gripping jig 5, as shown in FIG. 1 (d), the exposed core wire 3 is later incorporated into the optical device apparatus. It is possible to shorten the time for removing the metal coating layer 6 and the seed layer 3 from the front end portion. Furthermore, even when the tip end portion of the core wire 3 is distorted from the gripping jig 5, the tip end portion can be cut and removed, so that the deterioration problem of the core wire 3 can be solved.

本発明の実施例を図面に基づいて説明する。図2は本発明による電気めっき装置の具体例であり、表面にシード層4を有する芯線3の先端部を導電体の把持治具5aとゴム製の把持装置5bで挟み込み、この把持治具5a、5bの両端部を治具保持部材7で保持固定すると共に、光ファイバ1の樹脂被覆2の部分を光ファイバ固定部材8で固定するようになっている。   Embodiments of the present invention will be described with reference to the drawings. FIG. 2 shows a specific example of the electroplating apparatus according to the present invention. The tip of a core wire 3 having a seed layer 4 on the surface is sandwiched between a conductor gripping jig 5a and a rubber gripping apparatus 5b. Both ends of 5b are held and fixed by the jig holding member 7, and the resin coating 2 portion of the optical fiber 1 is fixed by the optical fiber fixing member 8.

そして、治具保持部材7と光ファイバ固定部材8を下降又は上昇させることにより、光ファイバ1の樹脂被覆2から露出したシード層4を有する芯線3を、陽極9をセットした電気めっき槽11の電気めっき液10に浸漬し又は取り出すようになっている。尚、治具保持部材7は電気めっき液10に浸漬されるので、耐薬品性及び耐熱性を備えた材料であることが好ましいが、光ファイバ固定部材8は電気めっき液10に浸漬されないので、光ファイバ1の固定に十分な強度を有する材料であればよい。   Then, by lowering or raising the jig holding member 7 and the optical fiber fixing member 8, the core wire 3 having the seed layer 4 exposed from the resin coating 2 of the optical fiber 1 is attached to the electroplating tank 11 in which the anode 9 is set. It is immersed in or removed from the electroplating solution 10. In addition, since the jig holding member 7 is immersed in the electroplating solution 10, it is preferably a material having chemical resistance and heat resistance, but the optical fiber fixing member 8 is not immersed in the electroplating solution 10. Any material having sufficient strength for fixing the optical fiber 1 may be used.

この電気めっき装置を用いて金属被覆光ファイバを製造した。即ち、図1(a)に示すように、光ファイバ1の樹脂被覆2を所定長さだけ除去して芯線3を露出させた後、Ni蒸着あるいは無電解Niめっきにて厚み約0.5μmのシード層4を形成した。このNiのシード層4が形成された芯線3の先端部を、図1(b)に示すように、導電体の把持治具5aと耐薬品性及び耐熱性を備えたゴム製の把持治具5bとで挟み込んで支持した。尚、使用した導電体の把持治具5aの芯線2が接触する面以外は、耐薬品及び耐熱性の樹脂でマスキングした。   A metal-coated optical fiber was manufactured using this electroplating apparatus. That is, as shown in FIG. 1A, after the resin coating 2 of the optical fiber 1 is removed by a predetermined length to expose the core wire 3, the thickness is about 0.5 μm by Ni vapor deposition or electroless Ni plating. A seed layer 4 was formed. As shown in FIG. 1B, a conductor gripping jig 5a and a rubber gripping jig having chemical resistance and heat resistance are attached to the tip of the core wire 3 on which the Ni seed layer 4 is formed. 5b was sandwiched and supported. In addition, it masked with the chemical-resistant and heat resistant resin except the surface where the core wire 2 of the used holding jig 5a of the conductor contacts.

この把持治具5a、5bの両端部を治具保持部材7で保持固定し、光ファイバ1の樹脂被覆2の部分を光ファイバ固定部材8に固定した。その後、光ファイバ1を保持固定した治具保持部材7と光ファイバ固定部材8を下降させ、樹脂被覆2から露出したシード層4を有する芯線3を、図2に示すように、電気めっき槽11の電気めっき液10中に浸漬した。電気めっき槽11内の陽極9と導電体の把持治具5a(陰極)を整流器に結線し、所定電流を流して、電気めっきを行った。尚、電解Niめっきの場合は5A/dm、電解Auめっきの場合は0.5A/dmの電流を流した。 Both ends of the gripping jigs 5 a and 5 b were held and fixed by the jig holding member 7, and the resin coating 2 portion of the optical fiber 1 was fixed to the optical fiber fixing member 8. Thereafter, the jig holding member 7 holding and fixing the optical fiber 1 and the optical fiber fixing member 8 are lowered, and the core wire 3 having the seed layer 4 exposed from the resin coating 2 is electroplated as shown in FIG. Was immersed in the electroplating solution 10. The anode 9 in the electroplating tank 11 and the conductor holding jig 5a (cathode) were connected to a rectifier, and a predetermined current was passed to perform electroplating. In the case of electrolytic Ni plating, a current of 5 A / dm 2 was passed, and in the case of electrolytic Au plating, a current of 0.5 A / dm 2 was passed.

上記の電気めっきが終了した後、治具保持部材7及び光ファイバ固定部材8をめっき液11から引き上げ、導電体の把持治具5aとゴム製の把持治具5bを取り外すと共に、光ファイバ固定部材8から光ファイバ1を取り出して回収した。回収した光ファイバ1の樹脂被覆2から露出した部分には、図1(c)に示すように、芯線3に設けたシード層4の表面上に、把持治具5a、5bで把持されていた先端部を除いて、電解Niめっき厚み約2μm、その上に電解Auめっき厚み約0.5μmの金属被覆層6が形成されていた。   After the electroplating is finished, the jig holding member 7 and the optical fiber fixing member 8 are pulled up from the plating solution 11, and the conductor holding jig 5a and the rubber holding jig 5b are removed, and the optical fiber fixing member is removed. The optical fiber 1 was taken out from 8 and collected. The portion exposed from the resin coating 2 of the collected optical fiber 1 was gripped by the gripping jigs 5a and 5b on the surface of the seed layer 4 provided on the core wire 3, as shown in FIG. Except for the tip, a metal coating layer 6 having an electrolytic Ni plating thickness of about 2 μm and an electrolytic Au plating thickness of about 0.5 μm was formed thereon.

この金属被覆光ファイバは、その後光機器装置に組み込む場合、芯線3の先端部には厚い金属被覆層6がほとんど無く、薄いシード層3が存在するのみであるから、芯線3の先端部端面の研磨加工が極めて容易である。また、金属被覆層6のない先端部を希硝酸溶液に浸漬する等の方法により、図1(d)に示すように、Niのシード層3を除去して、端面を含めた芯線3の先端部を露出させることもできる。更に、金属被覆層6のない芯線3の先端部をカットすれば、把持治具5a、5bで挟み込んだ時に生じた歪部を除去できるので、高品質な金属被覆光ファイバを提供することができる。   When this metal-coated optical fiber is subsequently incorporated into an optical device, there is almost no thick metal coating layer 6 at the tip of the core wire 3 and only a thin seed layer 3 is present. Polishing is extremely easy. Further, the tip of the core wire 3 including the end face is removed by removing the Ni seed layer 3 as shown in FIG. 1D by immersing the tip without the metal coating layer 6 in a dilute nitric acid solution. The part can also be exposed. Furthermore, if the tip of the core wire 3 without the metal coating layer 6 is cut, the strained portion generated when the metal wires are sandwiched between the holding jigs 5a and 5b can be removed, so that a high-quality metal-coated optical fiber can be provided. .

本発明に係る金属被覆光ファイバの製造工程を順に示す模式図である。It is a schematic diagram which shows the manufacturing process of the metal-coated optical fiber which concerns on this invention in order. 本発明に係る金属被覆光ファイバの製造に用いる電気めっき装置の一具体例を示す模式図である。It is a schematic diagram which shows one specific example of the electroplating apparatus used for manufacture of the metal-coated optical fiber which concerns on this invention.

符号の説明Explanation of symbols

1 光ファイバ
2 樹脂被覆
3 芯線
4 シード層
5 把持治具
5a 導電体の把持治具
5b ゴム製の把持治具
6 金属被覆層
7 治具保持部材
8 光ファイバ固定部材
9 陽極
10 電気めっき液
11 電気めっき槽
DESCRIPTION OF SYMBOLS 1 Optical fiber 2 Resin coating 3 Core wire 4 Seed layer 5 Holding jig 5a Conductor holding jig 5b Rubber holding jig 6 Metal coating layer 7 Jig holding member 8 Optical fiber fixing member 9 Anode 10 Electroplating solution 11 Electroplating bath

Claims (2)

光ファイバの樹脂被覆を必要長さだけ除去し、露出した芯線上の導電性のシード層表面に、電気めっきにより金属被覆層を形成する金属被覆光ファイバの製造方法において、露出したシード層を有する芯線の先端部を少なくとも一方が導電体からなる一対の把持治具で挟み込み、この導電体の把持治具を陰極側として給電することを特徴とする金属被覆光ファイバの製造方法。 In the method of manufacturing a metal-coated optical fiber, the resin coating of the optical fiber is removed by a required length, and a metal coating layer is formed by electroplating on the surface of the conductive seed layer on the exposed core wire. A method for producing a metal-coated optical fiber, wherein at least one end portion of a core wire is sandwiched between a pair of gripping jigs made of a conductor, and power is fed as the gripping jig for the conductor as a cathode side. 前記導電体の把持治具は、シード層を有する芯線と接触する部分以外が耐薬品性及び耐熱性の絶縁体でマスキングされていることを特徴とする、請求項1に記載の金属被覆光ファイバの製造方法。 2. The metal-coated optical fiber according to claim 1, wherein the gripping jig for the conductor is masked with a chemical-resistant and heat-resistant insulator except for a portion in contact with the core wire having the seed layer. Manufacturing method.
JP2004072368A 2004-03-15 2004-03-15 Method for manufacturing metal coated optical fiber Pending JP2005258266A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010267975A (en) * 2005-09-29 2010-11-25 Semiconductor Energy Lab Co Ltd Semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010267975A (en) * 2005-09-29 2010-11-25 Semiconductor Energy Lab Co Ltd Semiconductor device

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