JP2004191244A - Spectrograph and correction method - Google Patents

Spectrograph and correction method Download PDF

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Publication number
JP2004191244A
JP2004191244A JP2002360996A JP2002360996A JP2004191244A JP 2004191244 A JP2004191244 A JP 2004191244A JP 2002360996 A JP2002360996 A JP 2002360996A JP 2002360996 A JP2002360996 A JP 2002360996A JP 2004191244 A JP2004191244 A JP 2004191244A
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light
correction
wavelength
light receiving
intensity distribution
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JP2004191244A5 (en
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Kenji Imura
健二 井村
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Minolta Co Ltd
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Minolta Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a spectrograph having a correction function for returning a wavelength precision to a substantial initial condition. <P>SOLUTION: This spectrograph is provided with a light source 16 for correction, a diffraction grating 14, a photoreception sensor array 15, the first and second light incident apertures 12a, 12b, a wavelength picture element number correspondence information storage part 211 for wavelength picture element number correspondence information, a reference profile storage part 212 for storing preliminarily a reference profile that is an intensity distribution of light for correction based on an output from the photoreception sensor array 15, a correction level storage part 213 for the correction, and an arithmetic processing part 20. The arithmetic processing part 20 compares the profile in the correction that is the intensity distribution of the light for the correction based on the output from the photoreception sensor array 15 with the reference profile to find a difference between image-focusing positions of the both profiles on the sensor array 15 as the correction level, when finding the correction level, and a spectral intensity distribution by the output from the photoreception sensor array 15 is corrected based on the correction level, when finding the spectral intensity distribution of measured light. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

【０００１】
【発明の属する技術分野】
本発明は、可視光、赤外線又は紫外線の測定光の分光強度分布を測定する分光装置に関し、特に、波長精度を略初期状態に戻す補正機能を備える分光装置に関する。
【０００２】
【従来の技術】
従来、分光装置の分光手段として、測定光を波長毎に分散し、この分散された各波長の光を受光する光電変換素子アレイにより分散光を同時測定するポリクロメータが知られている。このポリクロメータは、可動部が無く、回折格子とレンズや凹面鏡等の結像光学系とを組み合わせたものや、この組み合わせたものと同一機能を果たす凹面回折格子により、測定光を波長毎に分散すると共に、分散された光の像を光電変換素子アレイ上に結像させて、各波長の強度を同時測定するように構成されている。
【０００３】
このような分光手段の波長精度は、結像光学系の光学素子、分光素子及び受光素子等の各光学要素における相対位置変化に敏感であるため、高精度を実現及び維持するためには、使用を始めてからも補正を行う必要がある。分光手段の補正を行うためには、一般に、安定した波長基準が必要である。安定した波長基準は、例えば、レーザ光源や輝線光源フィルタ等が用いられるが、この光源装置は、コストが高く、フィルタは、精度を維持するために周囲温度を一定に保持する必要がある等の理由から、分光装置に組み込むことが難しく、また、ユーザ自身が取り扱うことも困難である。そのため、ユーザは、通常年に１回程度、分光装置をメーカに返送してメーカに補正を依頼することが多い。
【０００４】
一方、上述のように、分光手段の波長精度が各光学要素の相対位置の変化に敏感であることから、これら光学要素を支持する支持部材に経時変化や温度変化に対して安定な金属材料が用いられている。
【０００５】
なお、分光手段の校正に関し、例えば、特許文献１がある。この特許文献１には、被校正ポリクロメータと基準ポリクロメータとを同一構成でそれぞれ用意し、被校正ポリクロメータから得たデータと、基準ポリクロメータから得たデータと、既知として予め記憶されている基準ポリクロメータの分光感度特性とに基づいて校正を行う分光装置が開示されている。
【０００６】
【特許文献１】
特開平１２−２０５９５５号公報
【０００７】
【発明が解決しようとする課題】
ところで、従来の補正方法では、通常年に１回程度の補正であるため、補正後から次の補正までの間における波長精度が保証されないという問題がある。そして、メーカに補正を依頼しなければならないため、補正を依頼する間は分光装置を利用することができない、返送等の依頼に手間がかかる、依頼の費用が掛かる等の問題も生じる。
【０００８】
一方、従来の補正方法では、上述のように支持部材に安定な部材を採用しなければならず、安価なＡＢＳ、ポリカーボネート等の汎用プラスチック材料を用いることが困難であることから、低廉化や軽量化の障害となっていた。
【０００９】
そこで、本発明は、上記事情に鑑みて為された発明であり、各光学要素の相対位置の変化により波長シフトが生じたとしても、測定時に補正することにより、初期の波長精度を維持することができる分光装置及び補正方法を提供することを目的とする。
【００１０】
【課題を解決するための手段】
上述の目的を達成するために、請求項１に係る分光装置は、補正用の光を発光する光源と、入射される光を波長に応じて分散する分散手段と、前記分散手段で分散した光を受光し、受光した各波長成分の光強度に応じた電気信号を出力する光電変換素子が配列されてなる受光手段と、測定光が入射され前記分散手段を介して前記受光手段上に波長分散像を結像する第１入射開口と、前記補正用の光が入射され前記分散手段を介して前記受光手段上に０次反射光による像を結像する第２入射開口と、測定光の波長と該波長に対応する光電変換素子に割り当てられた画素番号との対応関係を示す波長画素番号対応情報を予め記憶する波長画素番号対応情報記憶手段と、前記受光手段の出力に基づく前記補正用の光の強度分布である基準プロファイルを予め記憶する基準プロファイル記憶手段と、補正量を求める場合には前記受光手段の出力に基づく前記補正用の光の強度分布である補正時時プロファイルと前記基準プロファイルとを比較することによって前記補正時プロファイルと前記基準プロファイルとにおける前記受光手段上の結像位置の差を前記補正量として求め前記補正量を補正量記憶手段に記憶すると共に、測定光の分光強度分布を求める場合には前記受光手段の出力と前記波長画素番号対応情報と前記補正量とに基づいて補正し前記測定光の分光強度分布を求める演算処理手段とを備える。
【００１１】
そして、請求項５では、補正用の光を発光する光源と、入射される光を波長に応じて分散する分散手段と、前記分散手段で分散した光を受光し受光した各波長成分の光強度に応じた電気信号を出力する光電変換素子が配列されてなる受光手段と、測定光が入射され前記分散手段を介して前記受光手段上に波長分散像を結像する第１入射開口と、前記補正用の光が入射され前記分散手段を介して前記受光手段上に０次反射光による像を結像する第２入射開口と、情報を記憶する記憶手段と、測定光の分光強度分布を求める演算処理手段とを備える分光装置の波長シフトを補正する補正方法において、前記演算処理手段は、前記受光手段の出力に基づく前記補正用の光の強度分布である基準プロファイルを予め前記記憶手段に記憶するステップと、補正量を求める場合には前記受光手段の出力に基づく前記補正用の光の強度分布である補正時プロファイルと前記基準プロファイルとを比較することによって前記補正時プロファイルと前記基準プロファイルとの前記受光手段上の結像位置の差を前記補正量として求めるステップと、求めた前記補正量を前記記憶手段に記憶するステップと、測定光の分光強度分布を求める場合には前記受光手段の出力を前記補正量で補正することによって前記測定光の分光強度分布を求めるステップとを実行する。
【００１２】
このような分光装置及び分光装置の補正方法では、補正用の光による分光強度分布である基準プロイファイルを基準プロファイル記憶手段や記憶手段に製造時や出荷時等に予め記憶しておくので、補正量を求める場合に、補正時に求めた補正用の光による強度分布である補正時プロイファイルと基準プロファイルとを比較することができ、この比較から補正量を求めることができる。そのため、測定光の強度分布をこの補正量で補正することができるから、製造時や出荷時等の基準プロファイルを記憶した時点における波長精度で測定光の分光強度分布を測定することができる。
【００１３】
このため、安定な基準波長の光を発光するレーザ光源や輝線光源等を組み込む必要が無く、また、フィルタの透過特性を安定にするために周囲温度を一定に保つ必要がないので、分光装置の大型化やコストアップを抑制することができる。さらに、光源、第１入射開口、第２入射開口、分散手段及び受光手段等の光学要素を支持する支持部材に必ずしも経時的に及び熱的に安定な材料を用いる必要がないので、支持部材に安価な又は軽量な材料を用いることができる。
【００１４】
また、第１入射開口と第２入射開口の相対位置は、略一定に保たれるべく構成される。請求項２では、請求項１に記載の分光装置において、前記第１入射開口及び前記第２入射開口は、経時的に前記第１入射開口と前記第２入射開口との相対位置が略一定である材料の板に形成される。このような分光装置では、経時的に精度よく補正することができる。
【００１５】
そして、請求項３では、請求項１又は請求項２に記載の分光装置において、前記第１入射開口及び前記第２入射開口は、温度変化に対して前記第１入射開口と前記第２入射開口との相対位置が略一定である材料の板に形成される。このような分光装置では、温度変化があっても精度よく補正することができる。
【００１６】
さらに、請求項４では、請求項１乃至請求項３の何れか１項に記載の分光装置において、前記補正用の光が点灯されている間に測定光を遮光する遮光手段をさらに備える。
【００１７】
このような分光装置では、遮光手段を備えるので、補正用の光による基準プロファイルや補正時プロファイルを得る場合に測定光を確実に遮光することができ、測定光がこれらプロファイルに与える影響を考慮する必要がなくなる。
【００１８】
【発明の実施の形態】
以下、本発明に係る実施形態を図面に基づいて説明する。なお、各図において同一の構成については、同一の符号を付し、その説明を省略する。まず、本実施形態の構成について説明する。
（実施形態の構成）
図１は、本実施形態における分光輝度計の要部の構成を示す図である。
【００１９】
図１において、分光輝度計２００は、受光光学系１１、入射開口板１２、結像光学系１３、回折格子１４、受光センサアレイ１５、光源１６、駆動部１７、信号処理部１８、アナログ／ディジタル変換部（Ａ／Ｄ変換部）１９、演算処理部２０及び記憶部２１を備えて構成される。
【００２０】
測定光１０は、受光光学系１１によって収束され、第１入射開口１２ａに入射する。第１入射開口１２ａは、第２入射開口１２ｂと共に入射開口板１２に設けられる。入射開口板１２は、波長精度を高精度で維持する観点から、通常の使用年数における経時変化に対し、又は、通常の使用環境における温度変化に対し第１入射開口１２ａと第２入射開口１２ｂとの相対位置が略一定である材料、例えば、経時的に及び熱的に安定性の高い材料、より具体的には、例えば、このような金属材料（例えば、熱膨張係数の小さいＳＵＳ４３０やインバー鋼やチタン等）が好ましい。
【００２１】
第１入射開口１２ａを通過した光束１０ａは、結像光学系１３によって平行光束となって、回折格子１４に入射する。回折格子１４に入射した平行光束は、波長毎に波長に応じて異なる方向に分散反射し、再び結像光学系１３に入射する。そして、結像光学系１３は、受光センサアレイ１５上に第１入射開口１２ａの波長分散像１０ｂを結像する。受光センサアレイ１５は、光電変換素子が等間隔に配列されており、各光電変換素子は、受光した光強度に応じた電流を生成する。
【００２２】
受光センサアレイ１５の出力は、信号処理部１８に入力され、電流／電圧変換等の信号処理を経て、Ａ／Ｄ変換部１９に入力される。Ａ／Ｄ変換部１９は、信号処理部１８でそれぞれ処理された受光センサアレイ１５における各光電変換素子の出力をアナログ信号からディジタル信号に変換し、ディジタル信号に変換された各光電変換素子の出力を演算処理部２０に出力する。演算処理部２０は、入力された各光電変換素子の出力を後述のように処理する。
【００２３】
一方、光源１６は、入射開口板１２における第２入射開口１２ｂの受光光学系１１側に配置される。光源１６は、駆動部１７によって駆動され、補正用の光（補正光）を発光する。発光タイミング及び発光時間は、駆動部１７を介して演算処理部２０によって制御される。第２入射開口１２ｂは、第１入射開口１２ａから一定距離離れた位置で入射開口板１２に設けられる。この第２入射開口１２ｂの位置は、第２入射開口１２ｂを通過した補正光の光束６ａが結像光学系１３によって平行光束となり、回折格子１４による０次反射光が結像光学系１３によって第２入射開口１２ｂの像を受光センサアレイ１５上に結像するような位置である。そして、補正光の波長は、回折格子１４による０次反射光が充分に得られるように選択される。例えば、回折格子１４が可視域用の場合にはブレーズ波長が短波長になるようにブレーズされたものが多いため、光源１６は、赤外或いは赤の発光ダイオード（ＬＥＤ）とすることで十分な０次反射光が得られる。
【００２４】
また、記憶部２１は、後述の波長画素番号対応情報を記憶する波長画素番号対応情報記憶部２１１、基準プロファイルを記憶する基準プロファイル記憶部２１２、補正量を記憶する補正量記憶部２１３を備え、さらに、演算処理部２０が実行するプログラムやプログラム実行中のデータ等を記憶し、例えば、ＲＯＭやＲＡＭで構成される。
【００２５】
そして、測定光を遮光する場合には、受光光学系１１の入射側に着脱可能な遮光キャップ８を装着する。遮光キャップ８は、例えば、光源１６より補正用の光が点灯されている間に測定光を遮光するために使用される。
【００２６】
次に、本実施形態の動作について説明する。
（製造工程における波長校正の動作）
図２は、製造工程における波長校正の動作を示すフローチャートである。図３は、受光センサアレイにおける各光電変換素子の波長に対する受光感度を示す図である。図３の横軸はｎｍ単位で示す波長であり、その縦軸は相対感度である。図４は、画素番号ｎと相対強度Ａｎとの関係を示す図である。図４の横軸は画素番号ｎであり、その縦軸は相対強度である。図５は、シフト基準プロファイルの一例を示す図である。図５の横軸は画素番号変数ｘであり、その縦軸は相対強度である。
【００２７】
図２において、まず、演算処理部２０は、周知の方法で、図３に示すように、画素番号ｎにおける光電変換素子の中心波長λｃnをそれぞれ求める（Ｓ１１）。画素番号ｎは、受光センサアレイ１５における各光電変換素子に対し順に割り振った番号であり、ｎ＝１、２、３、・・・、Ｎである。
【００２８】
次に、演算処理部２０は、処理Ｓ１１の測定結果を用いて任意の波長λを中心波長とする画素番号変数ｘを与える関数ｆx（λ）を求める（Ｓ１２）。図３から分かるように、隣接する各画素の中心波長は、略等間隔であるが、厳密には等間隔ではなく、画素番号と中心波長との関係を表す関数ｆx（λ）は、一次式にならない。本実施形態では、関数ｆｘ（λ）として計算の容易性等の観点から例えば３次や４次、ここでは４次の多項式を用いることができる。
ｆx（λ）＝Ｄ0＋Ｄ1・λ＋Ｄ2・λ2＋Ｄ3・λ3＋Ｄ4・λ4 ・・・（１）
ここで、この式１の各次数に対する係数Ｄ0、Ｄ1、Ｄ2、Ｄ3及びＤ4は、画素番号ｎに対応する中心波長λｃnのデータを用いて最小自乗法によって求める。
【００２９】
次に、演算処理部２０は、式１を用いて、分光強度分布の名目波長Λｍに対応する画素番号ｘｍ＝ｆx（Λｍ）を求めて、名目波長とこの波長を中心波長とする画素番号との対応関係を示す波長画素番号対応情報として記憶部２１の波長画素番号対応情報記憶部２１１に記憶する（Ｓ１３）。ここで、ｍは、１、２、３、・・・、Ｍの正数であり、例えば、受光センサアレイ１５が１０ｎｍピッチで３６０ｎｍから７４０ｎｍまでの波長域を受光可能とすればＭ＝３９となる。
【００３０】
次に、遮光キャップ８を受光光学系１１の入射側に装着することによって受光光学系１１に入射する光を遮断する。なお、第１入射開口１２ａに入射される光が遮断されればよいので、遮光キャップ８に限らず、受光光学系１１の入射側から第１入射開口１２ａまでの間に遮光板等を用いて遮光してもよい。その後、演算処理部２０は、駆動部１７を介して光源１６を点灯することによって補正光を発光させ、回折格子の０次光による第２入射開口１２ｂの像を受光センサアレイ１５上に生成させる。そして、演算処理部２０は、受光センサアレイ１５から信号処理部１８及びＡ／Ｄ変換部１９を介して、例えば図４に示すような画素番号ｎの光電変換素子の出力Ａ（ｎ）を得る（Ｓ１４）。
【００３１】
次に、演算処理部２０は、さらにＡ（ｎ）を補間して画素番号変数ｘの関数としての基準プロファイルＡｓ（ｘ）を求め（Ｓ１５）、さらに、図５に示すように、結像位置を受光センサアレイ１５上で少しずつシフト（移動）させたシフト基準プロファイルＡk（ｘ’）を求める（Ｓ１６）。ここで、シフト基準プロファイルＡk（ｘ’）は、単位変化量をｄｘとし、変化量をｋ・ｄｘとすれば、処理Ｓ１５で求めた基準プロファイルＡｓ（ｘ）の画素番号変数ｘをｘ＋ｋ・ｄｘ（＝ｘ’）に座標変換することによって求めることができる。即ち、式２のようになる。
Ａk（ｘ’）＝Ａｓ（ｘ＋ｋ・ｄｘ） ・・・ （２）
ここで、単位変化量ｄｘは、例えば、波長変化（例えば０．１ｎｍ）に相当する画素番号の変化とし、変化量ｋ・ｄｘは、例えば、ｋ＝−１０、−９、・・・、９、１０として−１ｎｍから＋１ｎｍに相当する画素番号の変化とする。
【００３２】
そして、演算処理部２０は、求めたシフト基準プロファイルＡk（ｘ’）を画素番号の変化量ｋ・ｄｘと対応付けて記憶部２１の基準プロファイル記憶部２１２に記憶する（Ｓ１７）。
【００３３】
以上のように動作することによって、分光輝度計２００は、補正に必要な基礎データとなるシフト基準プロファイルＡk（ｘ’）データと対応する画素番号の変化量ｋ・ｄｘデータを記憶部２１に記憶することができる。
【００３４】
次に、測定時における分光輝度計２００の動作について説明する。
（測定時の動作）
図６は、測定する場合の動作を示すフローチャートである。
【００３５】
図６において、まず、基準プロファイルを求めた場合と同様に、遮光キャップ８を受光光学系１１に装着することによって受光光学系１１に入射する光を遮断する。その後、演算処理部２０は、駆動部１７を介して光源１６を点灯することによって補正光を発光させ、回折格子の０次光による第２入射開口１２ｂの像を受光センサアレイ１５上に生成させる。そして、演算処理部２０は、受光センサアレイ１５から信号処理部１８及びＡ／Ｄ変換部１９を介して、画素番号ｎの光電変換素子の出力Ｂ（ｎ）を得て、基準プロファイルＡｓ（ｘ）と同様に補間を行って補正時プロファイルＢｓ（ｘ）を求める（Ｓ２１）。
【００３６】
次に、演算処理部２０は、補正時プロファイルＢｓ（ｘ）と、記憶部２１に格納されている各シフト基準プロファイルＡk（ｘ’）との相関Ｃｒkを順次にそれぞれ求めることによって、最も相関の高いシフト基準プロファイルＡk（ｘ’）を求める（Ｓ２２）。
【００３７】
ここで、補正時プロファイルＢｓ（ｘ）とシフト基準プロファイルＡk（ｘ’）との相関Ｃｒkは、式３を用いて算出される。
Crk＝｛r(Bs(x)、Ak(x’))｝2／｛r(Bs(x)、Bs(x))・r(Ak(x’)、Ak(x’))｝
r(P(x)、Q(x))＝∫P(x)・Q(x)dx・・・ （３）
そして、演算処理部２０は、最も相関の高いシフト基準プロファイルＡk（ｘ’）に対応する画素番号の変化量ｋ・ｄｘ（補正量）を求め、基準プロファイルＡｓ（ｘ）と補正時プロファイルＢｓ（ｘ）との結像位置変化とする。演算処理部２０は、変化量ｋ・ｄｘ（補正量）を記憶部２１の補正量記憶部２１３に記憶する（Ｓ２３）。
【００３８】
本実施形態では、この画素番号の変化量ｋ・ｄｘで表した基準プロファイルＡｓ（ｘ）と補正時プロファイルＢｓ（ｘ）との結像位置変化が受光センサアレイ１５における全ての光電変換素子上に生じていると見做し、この変化量ｋ・ｄｘによって分光強度分布の波長シフトを補正する。即ち、式４に示すように、記憶部２１に格納されている名目波長Λｍに対応する画素番号ｘｍを、求めた画素番号の変化量ｋ・ｄｘで補正する。
ｘ’ｍ＝ｘｍ＋ｋ・ｄｘ ・・・ （４）
なお、補正時プロファイルＢｓ（ｘ）とシフト基準プロファイルＡk（ｘ’）とを比較することによって結像位置の差を光電変換素子のピッチ（繰り返しの間隔）より小さい分解能で推定するためには、第２入射開口１２ｂの像は、受光センサアレイ１５における複数の光電変換素子上に強度分布、特に単純な曲線の強度分布を持つ必要がある。上述の実施形態では、結像光学系１３の収差を利用したが、図７に示すように、第２入射開口１２ｂの射出側に拡散板１２ｄを設けることによって積極的に単純な曲線の強度分布を得るようにしてもよい。
【００３９】
その後、演算処理部２０は、駆動部１７を介して光源１６を消灯する。また、遮光キャップ８を除いて測定光が受光光学系１１を介して第１入射開口に入射可能となるように設定する。そして、測定光を受光光学系１１に入射させ、演算処理部２０は、受光センサアレイ１５から信号処理部１８及びＡ／Ｄ変換部１９を介して、測定光に対する画素番号ｎの光電変換素子の出力Ｃ（ｎ）を得て（Ｓ２４）、基準プロファイルＡｓ（ｘ）と同様に補間を行って測定光プロファイルＣｓ（ｘ）を求める（Ｓ２５）。
【００４０】
次に、演算処理部２０は、求めた測定光プロファイルＣｓ（ｘ）のｘに式４のｘ’ｍを代入することによって、波長シフト補正された名目波長Λｍで分光強度Ｃ（ｘ’ｍ）を求める（Ｓ２６）。
【００４１】
なお、続けて測定する場合には、改めて処理２１から開始してもよいが、処理Ｓ２４から開始してもよい。測定時の補正は、絶えず初期の波長精度を維持する観点から測定ごとに自動的に行うように構成してもよく、演算処理部２０の負担の軽減や測定時間を短縮する観点から電源を投入した後に自動的に一度だけ行うように構成してもよい。また、補正開始を指示するスイッチを設け、ユーザの所望によりこのスイッチをオンすることによって補正を行うように構成してもよい。
【００４２】
本実施形態に係る分光輝度計２００は、シフト基準プロファイルＡk（ｘ’）を記憶部２１に備え、これを用いて測定時における補正量を求めることができるので、分光手段の光学要素の相対位置が経時的、熱的に変化することによって分光手段に波長シフトが生じたとしても、初期の波長校正時における波長精度で測定することができ、また、ユーザ側で補正することができる。
【００４３】
なお、上述の実施形態では、画素番号の変化量ｋ・ｄｘで表した基準プロファイルＡｓ（ｘ）と補正時プロファイルＢｓ（ｘ）との結像位置変化で受光センサアレイ１５全域での結像位置の変化を補正しているが、さらに精度を上げる観点から、結像位置変化を結像位置の関数としてもよい。例えば、変化量（補正量）ｋ・ｄｘのｄｘを結像位置ｘの関数としてもよい。
【００４４】
そして、入射開口板１２、結像光学系１３、回折格子１４及び受光センサアレイ１５等の各光学要素における経時的、熱的な相対位置変化は、さまざまに起こり得る。ここで、受光センサアレイ１５の波長分散方向（図１におけるＡ方向）における位置変化によって生じる結像位置変化は、結像位置に依らず一定である。一方、入射開口板１２の両入射開口配設方向（図１におけるＢ方向）における位置変化や結像光学系１３の垂直方向（図１におけるＣ方向）における位置変化、回折格子１４の回転（図１におけるＤ方向、図面の紙面に対して垂直な方向を軸とする回転）によって生じる結像位置変化は、回折格子１４からの射出角の変化を経て生じるため、その量は、結像位置に依存する。例えば、第２入射開口１２ｂの０次光による像の結像位置ｘ0での結像位置変化がｄｘ0の場合の、任意の結像位置ｘにおける結像位置変化ｄｘ（ｘ）は、幾何学的な考察から得ることができ、小型化のため、第１入射開口１２ａと第２入射開口１２ｂとの間隔を短くすると、図１から分かるように、第２入射開口１２ｂの０次光による像は、受光センサアレイ１５の短波長領域に結像し、これから離れた長波長域での結像位置変化をより正確に演算することができる。
【００４５】
さらに、受光センサアレイ１５の波長分散方向（図１のＡ方向）における位置変化によって生じる結像位置変化（受光センサアレイ１５上の結像位置に依らず均一に変化する）を取り除く観点から、図８に示すように、入射開口板１２に受光センサアレイ１５も取り付けるようにしてもよい。即ち、第１入射開口１２ａ、第２入射開口１２ｂ及び受光センサアレイ１５を１枚の入射開口板１２’に設ける。この場合では、起こり得る結像位置変化は、明確に回折格子１４からの射出角の変化を経て生じるので、前述の幾何学的な考察による各結像位置での補正量の精度を高めることができる。
【００４６】
図９は、回折格子からの射出各の変化において、０次反射方向の変化と１次回折方向の変化との関係を示す図である。図９に示すように、回折格子Ｇにおいて、０次反射方向がＲ0からＲ0’へｄ0だけ変化したときに、１次回折方向がＲ1からＲ1’へｄ1だけ変化する。ここで、回折格子Ｇの格子定数を６００本／ｍｍ、波長を５５０ｎｍ、ｄ0を０．００３６度（１ｎｍの波長シフトに相当する。）とすると、ｄ1とｄ0との差は６パーセント程度であり、１次回折方向の変化を０次反射方向の変化としても大きな誤差とはならないことが分かる。
【００４７】
そして、上述の実施形態において、警告を提示する警告手段と補正量の許容範囲の限界値である閾値を記憶する閾値記憶手段とを分光輝度計２００にさらに備えさせ、演算処理部２０は、さらに、画素番号の変化量ｋ・ｄｘ（補正量）が所定の閾値以上となった場合には、許容誤差以上の波長シフトが生じたことをユーザに警告するように構成してもよい。このように構成することによって、ユーザは、警告されるまで所定範囲内の精度で測定されるから、安心して測定を続けることができ、警告を受けた場合には、補正の時機が来たことを認識することができる。ここで、警告手段は、ＬＥＤ等のランプやブザー等の警告音を発生させる警告音発生手段やＬＣＤ等に警告メッセージを表示する警告表示手段等である。
【００４８】
以上、本明細書に開示された主な発明を以下にまとめる。
（付記１）補正用の光を発光する光源と、入射される光を波長に応じて分散する分散手段と、前記分散手段で分散した光を受光し、受光した各波長成分の光強度に応じた電気信号を出力する光電変換素子が配列されてなる受光手段と、測定光が入射され前記分散手段を介して前記受光手段上に波長分散像を結像する第１入射開口と、前記補正用の光が入射され前記分散手段を介して前記受光手段上に０次反射光による像を結像する第２入射開口と、測定光の波長と該波長に対応する光電変換素子に割り当てられた画素番号との対応関係を示す波長画素番号対応情報を予め記憶する波長画素番号対応情報記憶手段と、前記受光手段の出力に基づく前記補正用の光の強度分布である基準プロファイルを予め記憶する基準プロファイル記憶手段と、補正量を求める場合には前記受光手段の出力に基づく前記補正用の光の強度分布である補正時プロファイルと前記基準プロファイルとを比較することによって前記補正時プロファイルと前記基準プロファイルとにおける前記受光手段上の結像位置の差を前記補正量として求め前記補正量を補正量記憶手段に記憶すると共に、測定光の分光強度分布を求める場合には前記受光手段の出力と前記波長画素番号対応情報と前記補正量とに基づいて補正し前記測定光の分光強度分布を求める演算処理手段とを備えることを特徴とする分光装置。
（付記２）前記第１入射開口及び前記第２入射開口は、経時的に前記第１入射開口と前記第２入射開口との相対位置が略一定である材料の板に形成されることを特徴とする付記１に記載の分光装置。
（付記３）前記第１入射開口及び前記第２入射開口は、温度変化に対して前記第１入射開口と前記第２入射開口との相対位置が略一定である材料の板に形成されることを特徴とする付記１又は付記２に記載の分光装置。
（付記４）前記補正用の光が点灯中に測定光を遮光する遮光手段をさらに備えることを特徴とする付記１乃至付記３の何れかに記載の分光装置。
（付記５）前記基準プロファイル記憶手段は、前記基準プロファイルを所定の画素番号間隔でシフトしたシフト基準プロファイルを記憶し、
前記演算処理手段は、前記補正時プロファイルとシフト基準プロファイルとの相関を求めることによって前記補正量を求めることを特徴とする付記１乃至付記４に記載の分光装置。
（付記６）前記演算処理手段は、前記補正量を電源投入時に求めて補正量記憶手段に記憶することを特徴とする付記１乃至付記５に記載の分光装置。
（付記７）前記演算処理手段は、前記補正量をユーザの指示があった場合に求めて補正量記憶手段に記憶することを特徴とする付記１乃至付記５に記載の分光装置。
（付記８）補正用の光を発光する光源と、入射される光を波長に応じて分散する分散手段と、前記分散手段で分散した光を受光し、受光した各波長成分の光強度に応じた電気信号を出力する光電変換素子が配列されてなる受光手段と、測定光が入射され前記分散手段を介して前記受光手段上に波長分散像を結像する第１入射開口と、前記補正用の光が入射され前記分散手段を介して前記受光手段上に０次反射光による像を結像する第２入射開口と、前記受光手段の出力に基づく前記補正用の光の強度分布である基準プロファイル（基準プロファイルをもとに求められたシフト基準プロファイルを含む）を予め記憶する基準プロファイル記憶手段と、警告を提示する警告手段と、補正量の許容範囲の限界値である閾値を記憶する閾値記憶手段と、前記受光手段の出力に基づく前記補正用の光の強度分布である補正時プロファイルと前記基準プロファイルとを比較することによって前記補正時プロファイルと前記基準プロファイルとの前記受光手段上の結像位置の差を補正量として求めると共に、求めた前記補正量が前記閾値以上である場合には前記警告手段で警告を提示する演算処理手段とを備えることを特徴とする分光装置。
（付記９）補正用の光を発光する光源と、入射される光を波長に応じて分散する分散手段と、前記分散手段で分散した光を受光し受光した各波長成分の光強度に応じた電気信号を出力する光電変換素子が配列されてなる受光手段と、測定光が入射され前記分散手段を介して前記受光手段上に波長分散像を結像する第１入射開口と、前記補正用の光が入射され前記分散手段を介して前記受光手段上に０次反射光による像を結像する第２入射開口と、情報を記憶する記憶手段と、測定光の分光強度分布を求める演算処理手段とを備える分光装置の波長シフトを補正する補正方法において、前記演算処理手段は、前記受光手段の出力に基づく前記補正用の光の強度分布である基準プロファイル（基準プロファイルをもとに求められるシフト基準プロファイルを含む）を予め前記記憶手段に記憶するステップと、補正量を求める場合には前記受光手段の出力に基づく前記補正用の光の強度分布である補正時プロファイルと前記基準プロファイルとを比較することによって前記補正時プロファイルと前記基準プロファイルとの前記受光手段上の結像位置の差を前記補正量として求めるステップと、求めた前記補正量を前記記憶手段に記憶するステップと、測定光の分光強度分布を求める場合には前記受光手段の出力を前記補正量で補正することによって前記測定光の分光強度分布を求めるステップとを実行することを特徴とする補正方法
【００４９】
【発明の効果】
以上のように、請求項１に係る分光装置及び請求項５に係る分光装置の補正方法は、基準プロイファイルを基準プロファイル記憶手段や記憶手段に製造時や出荷時等に予め記憶しておくので、補正量を求める場合に、補正時に求めた補正時プロイファイルと基準プロファイルとを比較することができ、この比較から補正量を求めることができる。そのため、測定光の分光強度分布をこの補正量で補正することができるから、製造時や出荷時等の基準プロファイルを記憶した時点における波長精度で測定光の分光強度分布を測定することができる。そして、分光装置自体に補正手段が組み込まれているので、日常的に補正することが可能であり、メーカに補正を依頼する必要が無いから、いつでも分光装置を利用することができ、返送等の依頼の手間がかからず、依頼の費用も掛からない。さらに、光源、第１入射開口、第２入射開口、分散手段及び結像手段等の光学要素を支持する支持部材に必ずしも経時的に及び熱的に安定な材料を用いる必要がないので、支持部材に安価な又は軽量な材料を用いることができる。
【００５０】
また、第１入射開口と第２入射開口の相対位置は、略一定に保たれるべく構成される。請求項２に係る分光装置は、請求項１の効果に加えて、第１及び第２入射開口を形成する板に経時的に両入射開口の相対位置が略一定である材料を用いるので、経時的に精度よく補正することができる。
【００５１】
そして、請求項３に係る分光装置は、請求項１及び請求項２の効果に加えて、第１及び第２入射開口を形成する板に温度変化に対して両入射開口の相対位置が略一定である材料を用いるので、温度変化に対して精度よく補正することができる。
【００５２】
さらに、請求項４に係る分光装置は、請求項１乃至請求項３の効果に加えて、遮光手段を備えるので、補正用の光による基準プロファイルや補正時プロファイルを得る場合に測定光を確実に遮光することができ、測定光がこれら分光プロファイルに与える影響を考慮する必要がなくなる。
【図面の簡単な説明】
【図１】本実施形態における分光輝度計の要部の構成を示す図である。
【図２】製造工程における波長校正の動作を示すフローチャートである。
【図３】受光センサアレイにおける各光電変換素子の波長に対する受光感度を示す図である。
【図４】画素番号ｎと相対強度Ａｎとの関係を示す図である。
【図５】シフト基準プロファイルの一例を示す図である。
【図６】測定する場合の動作を示すフローチャートである。
【図７】拡散板を用いる場合における、分光輝度計の拡散板周辺の構成を示す図である。
【図８】本実施形態の変形形態における分光輝度計の要部の構成を示す図である。
【図９】回折格子からの射出各の変化において、０次反射方向の変化と１次回折方向の変化との関係を示す図である。
【符号の説明】
８ 遮光キャップ、１２ 入射開口板、１２ａ 第１入射開口、１２ｂ、第２入射開口、１４ 回折格子、１５ 受光センサアレイ、１６ 光源、２０ 演算処理部、２１ 記憶部、２００ 分光輝度計、２１１ 波長画素番号対応情報記憶部、２１２ 基準プロファイル記憶部、２１３ 補正量記憶部[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a spectrometer for measuring a spectral intensity distribution of measurement light of visible light, infrared light or ultraviolet light, and more particularly to a spectrometer having a correction function for returning wavelength accuracy to a substantially initial state.
[0002]
[Prior art]
2. Description of the Related Art Conventionally, as a spectroscopic unit of a spectroscopic device, a polychromator that disperses measurement light for each wavelength and simultaneously measures the dispersed light by a photoelectric conversion element array that receives the dispersed light of each wavelength is known. This polychromator has no movable parts and combines a diffraction grating with an imaging optical system such as a lens or a concave mirror, or a concave diffraction grating that performs the same function as this combination, and disperses the measurement light for each wavelength. At the same time, the image of the dispersed light is formed on the photoelectric conversion element array, and the intensity of each wavelength is measured simultaneously.
[0003]
The wavelength accuracy of such a spectral unit is sensitive to changes in the relative position of each optical element such as the optical element, the spectral element, and the light receiving element of the imaging optical system. It is necessary to perform the correction even after starting. In general, a stable wavelength reference is required to correct the spectral means. As a stable wavelength reference, for example, a laser light source or an emission line light source filter is used. However, this light source device is expensive, and the filter needs to maintain a constant ambient temperature in order to maintain accuracy. For this reason, it is difficult to incorporate it into the spectroscopic device, and it is also difficult for the user to handle it. For this reason, the user often returns the spectroscopic device to the manufacturer about once a year and requests the manufacturer to perform correction.
[0004]
On the other hand, as described above, since the wavelength accuracy of the spectroscopic means is sensitive to changes in the relative positions of the optical elements, a metal material that is stable against aging and temperature changes is provided on a support member that supports these optical elements. Used.
[0005]
Note that there is, for example, Patent Document 1 regarding calibration of the spectroscopic means. In this patent document 1, a calibration polychromator and a reference polychromator are prepared in the same configuration, and data obtained from the calibration polychromator and data obtained from the reference polychromator are previously stored as known. A spectroscopic device that performs calibration based on the spectral sensitivity characteristics of a reference polychromator is disclosed.
[0006]
[Patent Document 1]
JP-A-12-205955
[0007]
[Problems to be solved by the invention]
By the way, in the conventional correction method, since the correction is usually performed about once a year, there is a problem that the wavelength accuracy between the correction and the next correction is not guaranteed. Then, since the correction must be requested from the maker, the spectroscopic device cannot be used while the correction is requested, there is a problem that the request for the return and the like is troublesome, and the request is costly.
[0008]
On the other hand, in the conventional correction method, a stable member must be employed as the support member as described above, and it is difficult to use inexpensive general-purpose plastic materials such as ABS and polycarbonate. It was an obstacle to the conversion.
[0009]
Therefore, the present invention has been made in view of the above circumstances, and even when a wavelength shift occurs due to a change in the relative position of each optical element, the initial wavelength accuracy is maintained by correcting at the time of measurement. It is an object of the present invention to provide a spectroscopic device and a correction method that can perform the correction.
[0010]
[Means for Solving the Problems]
In order to achieve the above object, a spectroscopic device according to claim 1 includes a light source that emits light for correction, a dispersing unit that disperses incident light according to a wavelength, and a light that is dispersed by the dispersing unit. And a light receiving means in which photoelectric conversion elements for outputting electric signals corresponding to the light intensities of the received wavelength components are arranged, and a wavelength dispersion is applied to the light receiving means via the dispersion means upon which measurement light is incident. A first entrance aperture for forming an image, a second entrance aperture for receiving the light for correction and forming an image by the zero-order reflected light on the light receiving means via the dispersion means, and a wavelength of the measurement light. And wavelength pixel number correspondence information storage means for storing in advance wavelength pixel number correspondence information indicating the correspondence between the pixel numbers assigned to the photoelectric conversion elements corresponding to the wavelength, and the correction for the correction based on the output of the light receiving means. Reference profile, which is the light intensity distribution And a correction profile by comparing the reference profile with the profile at the time of correction, which is the intensity distribution of the light for correction based on the output of the light receiving unit when the correction amount is obtained. The difference between the imaging position on the light receiving unit between the time profile and the reference profile is obtained as the correction amount, the correction amount is stored in the correction amount storage unit, and the spectral intensity distribution of the measurement light is obtained. Calculating means for correcting based on the output of the means, the wavelength pixel number correspondence information and the correction amount to obtain the spectral intensity distribution of the measurement light.
[0011]
According to claim 5, a light source for emitting light for correction, a dispersing means for dispersing incident light according to a wavelength, and a light intensity of each wavelength component which receives and receives the light dispersed by the dispersing means. A light receiving unit in which photoelectric conversion elements that output an electric signal corresponding to the light receiving unit are arranged; a first incident aperture through which measurement light is incident and forms a chromatic dispersion image on the light receiving unit via the dispersion unit; A second incident aperture for receiving a light for correction and forming an image by the zero-order reflected light on the light receiving means via the dispersing means, a storage means for storing information, and a spectral intensity distribution of the measuring light are obtained. In a correction method for correcting a wavelength shift of a spectroscopic device including an arithmetic processing unit, the arithmetic processing unit stores a reference profile, which is an intensity distribution of the correction light based on an output of the light receiving unit, in the storage unit in advance. Steps to do When obtaining the correction amount, the light receiving unit of the correction profile and the reference profile is compared by comparing the correction profile, which is the intensity distribution of the light for correction based on the output of the light receiving unit, with the reference profile. Obtaining the difference between the above imaging positions as the correction amount, storing the obtained correction amount in the storage means, and correcting the output of the light receiving means when obtaining the spectral intensity distribution of the measurement light. Obtaining the spectral intensity distribution of the measurement light by correcting the amount with the amount.
[0012]
In such a spectroscopic device and a method of correcting the spectroscopic device, the reference profile, which is the spectral intensity distribution by the light for correction, is stored in advance in the reference profile storage unit or the storage unit at the time of manufacture or shipment, so that the correction is performed. When the amount is obtained, the correction profile, which is the intensity distribution of the light for correction obtained at the time of correction, can be compared with the reference profile, and the correction amount can be obtained from this comparison. Therefore, since the intensity distribution of the measurement light can be corrected by the correction amount, the spectral intensity distribution of the measurement light can be measured with the wavelength accuracy at the time of storing the reference profile at the time of manufacturing or shipping.
[0013]
Therefore, there is no need to incorporate a laser light source or a bright line light source that emits light having a stable reference wavelength, and it is not necessary to maintain a constant ambient temperature in order to stabilize the transmission characteristics of the filter. Increase in size and cost can be suppressed. Further, since it is not always necessary to use a material that is stable over time and thermally, the supporting member that supports the optical elements such as the light source, the first entrance opening, the second entrance opening, the dispersion unit, and the light receiving unit is not necessary. Inexpensive or lightweight materials can be used.
[0014]
Further, the relative positions of the first entrance aperture and the second entrance aperture are configured to be kept substantially constant. According to a second aspect, in the spectroscopic device according to the first aspect, the relative positions of the first entrance aperture and the second entrance aperture are substantially constant over time in the first entrance aperture and the second entrance aperture. Formed on a plate of some material. In such a spectroscopic device, it is possible to accurately correct over time.
[0015]
According to a third aspect, in the spectroscopic device according to the first or second aspect, the first entrance aperture and the second entrance aperture are arranged such that the first entrance aperture and the second entrance aperture respond to a temperature change. Are formed on a plate of a material whose relative position is substantially constant. Such a spectroscopic device can accurately correct even if there is a temperature change.
[0016]
According to a fourth aspect of the present invention, in the spectroscopic device according to any one of the first to third aspects, the spectrometer further includes a light blocking unit that blocks the measurement light while the correction light is turned on.
[0017]
In such a spectroscopic device, since the light shielding unit is provided, it is possible to reliably shield the measurement light when obtaining the reference profile or the correction profile by the light for correction, and consider the influence of the measurement light on these profiles. Eliminates the need.
[0018]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments according to the present invention will be described with reference to the drawings. In each drawing, the same components are denoted by the same reference numerals, and description thereof will be omitted. First, the configuration of the present embodiment will be described.
(Configuration of the embodiment)
FIG. 1 is a diagram illustrating a configuration of a main part of the spectral luminance meter according to the present embodiment.
[0019]
In FIG. 1, a spectral luminance meter 200 includes a light receiving optical system 11, an entrance aperture plate 12, an imaging optical system 13, a diffraction grating 14, a light receiving sensor array 15, a light source 16, a driving unit 17, a signal processing unit 18, an analog / digital It includes a conversion unit (A / D conversion unit) 19, an arithmetic processing unit 20, and a storage unit 21.
[0020]
The measurement light 10 is converged by the light receiving optical system 11 and enters the first entrance aperture 12a. The first entrance aperture 12a is provided in the entrance aperture plate 12 together with the second entrance aperture 12b. From the viewpoint of maintaining the wavelength accuracy with high accuracy, the entrance aperture plate 12 is provided with the first entrance aperture 12a and the second entrance aperture 12b with respect to a temporal change in a normal use life or a temperature variation in a normal use environment. Are relatively constant relative to each other, for example, a material having high thermal stability over time, and more specifically, for example, such a metal material (for example, SUS430 or Invar steel having a small coefficient of thermal expansion). And titanium are preferred.
[0021]
The light beam 10a that has passed through the first entrance aperture 12a is converted into a parallel light beam by the imaging optical system 13, and is incident on the diffraction grating 14. The parallel luminous flux incident on the diffraction grating 14 is dispersed and reflected in different directions according to the wavelength for each wavelength, and then enters the imaging optical system 13 again. Then, the imaging optical system 13 forms the wavelength dispersion image 10b of the first incident aperture 12a on the light receiving sensor array 15. The light receiving sensor array 15 has photoelectric conversion elements arranged at equal intervals, and each photoelectric conversion element generates a current according to the intensity of the received light.
[0022]
The output of the light receiving sensor array 15 is input to a signal processing unit 18 and is input to an A / D conversion unit 19 through signal processing such as current / voltage conversion. The A / D conversion unit 19 converts the output of each photoelectric conversion element in the light receiving sensor array 15 processed by the signal processing unit 18 from an analog signal to a digital signal, and converts the output of each photoelectric conversion element into a digital signal. Is output to the arithmetic processing unit 20. The arithmetic processing section 20 processes the input output of each photoelectric conversion element as described later.
[0023]
On the other hand, the light source 16 is arranged on the light receiving optical system 11 side of the second entrance opening 12b of the entrance aperture plate 12. The light source 16 is driven by the drive unit 17 and emits light for correction (correction light). The light emission timing and the light emission time are controlled by the arithmetic processing unit 20 via the drive unit 17. The second entrance aperture 12b is provided in the entrance aperture plate 12 at a position separated by a certain distance from the first entrance aperture 12a. The position of the second entrance aperture 12b is such that the luminous flux 6a of the correction light passing through the second entrance aperture 12b is converted into a parallel luminous flux by the imaging optical system 13, and the zero-order reflected light by the diffraction grating 14 is transmitted by the imaging optical system 13. This position is such that an image of the two entrance apertures 12b is formed on the light receiving sensor array 15. The wavelength of the correction light is selected so that the zero-order reflected light from the diffraction grating 14 can be sufficiently obtained. For example, when the diffraction grating 14 is in the visible region, it is often blazed so that the blaze wavelength becomes short. Therefore, it is sufficient that the light source 16 be an infrared or red light emitting diode (LED). Zero-order reflected light is obtained.
[0024]
The storage unit 21 includes a wavelength pixel number correspondence information storage unit 211 that stores wavelength pixel number correspondence information described below, a reference profile storage unit 212 that stores a reference profile, and a correction amount storage unit 213 that stores a correction amount. Further, it stores a program executed by the arithmetic processing unit 20, data during execution of the program, and the like, and is configured by, for example, a ROM or a RAM.
[0025]
When the measurement light is shielded, a detachable light shielding cap 8 is attached to the incident side of the light receiving optical system 11. The light-shielding cap 8 is used, for example, to shield the measurement light while the light for correction from the light source 16 is turned on.
[0026]
Next, the operation of the present embodiment will be described.
(Operation of wavelength calibration in the manufacturing process)
FIG. 2 is a flowchart showing the operation of wavelength calibration in the manufacturing process. FIG. 3 is a diagram illustrating the light receiving sensitivity with respect to the wavelength of each photoelectric conversion element in the light receiving sensor array. The horizontal axis in FIG. 3 is the wavelength in nm, and the vertical axis is the relative sensitivity. FIG. 4 is a diagram illustrating the relationship between the pixel number n and the relative intensity An. The horizontal axis in FIG. 4 is the pixel number n, and the vertical axis is the relative intensity. FIG. 5 is a diagram illustrating an example of the shift reference profile. The horizontal axis in FIG. 5 is the pixel number variable x, and the vertical axis is the relative intensity.
[0027]
In FIG. 2, first, the arithmetic processing unit 20 uses a known method, as shown in FIG. n Are respectively obtained (S11). The pixel number n is a number sequentially assigned to each photoelectric conversion element in the light receiving sensor array 15, and n = 1, 2, 3,..., N.
[0028]
Next, the arithmetic processing unit 20 obtains a function fx (λ) that gives a pixel number variable x having an arbitrary wavelength λ as a center wavelength using the measurement result of the processing S11 (S12). As can be seen from FIG. 3, the center wavelengths of adjacent pixels are substantially at equal intervals, but not exactly at equal intervals, and a function fx (λ) representing the relationship between the pixel number and the center wavelength is a linear expression. do not become. In the present embodiment, for example, a third-order or fourth-order, here, a fourth-order polynomial can be used as the function fx (λ) from the viewpoint of ease of calculation and the like.
fx (λ) = D 0 + D 1 ・ Λ + D Two ・ Λ Two + D Three ・ Λ Three + D Four ・ Λ Four ... (1)
Here, the coefficient D for each order of Equation 1 0 , D 1 , D Two , D Three And D Four Is the central wavelength λc corresponding to the pixel number n. n Is determined by the method of least squares using the data of
[0029]
Next, the arithmetic processing unit 20 obtains the pixel number xm = fx (Λm) corresponding to the nominal wavelength Λm of the spectral intensity distribution using Expression 1, and calculates the nominal wavelength and the pixel number having this wavelength as the center wavelength. Are stored in the wavelength pixel number correspondence information storage unit 211 of the storage unit 21 as wavelength pixel number correspondence information indicating the correspondence relationship (S13). Here, m is a positive number of 1, 2, 3,..., M. For example, if the light receiving sensor array 15 can receive a wavelength range from 360 nm to 740 nm at a pitch of 10 nm, M = 39. Become.
[0030]
Next, the light incident on the light receiving optical system 11 is blocked by mounting the light shielding cap 8 on the incident side of the light receiving optical system 11. Since the light incident on the first entrance opening 12a only needs to be blocked, not only the light shielding cap 8 but also a light shielding plate or the like is used between the entrance side of the light receiving optical system 11 and the first entrance opening 12a. The light may be shielded. Thereafter, the arithmetic processing unit 20 emits correction light by turning on the light source 16 via the driving unit 17, and generates an image of the second incident aperture 12 b by the zero-order light of the diffraction grating on the light receiving sensor array 15. . Then, the arithmetic processing unit 20 obtains, for example, the output A (n) of the photoelectric conversion element of the pixel number n as shown in FIG. 4 from the light receiving sensor array 15 via the signal processing unit 18 and the A / D conversion unit 19. (S14).
[0031]
Next, the arithmetic processing unit 20 further interpolates A (n) to obtain a reference profile As (x) as a function of the pixel number variable x (S15). Further, as shown in FIG. Reference profile A in which is shifted (moved) little by little on the light receiving sensor array 15 k (X ') is obtained (S16). Here, shift reference profile A k (X ′) is, if the unit change amount is dx and the change amount is k · dx, the pixel number variable x of the reference profile As (x) obtained in step S15 is coordinated to x + k · dx (= x ′). It can be obtained by conversion. That is, Equation 2 is obtained.
A k (X ′) = As (x + k · dx) (2)
Here, the unit change amount dx is, for example, a change in the pixel number corresponding to a wavelength change (for example, 0.1 nm), and the change amount k · dx is, for example, k = −10, −9,. , 10 is a change in the pixel number corresponding to -1 nm to +1 nm.
[0032]
Then, the arithmetic processing unit 20 calculates the shift reference profile A k (X ′) is stored in the reference profile storage unit 212 of the storage unit 21 in association with the pixel number change amount k · dx (S17).
[0033]
By operating as described above, the spectral luminance meter 200 shifts the shift reference profile A as basic data necessary for correction. k The change amount k · dx data of the pixel number corresponding to the (x ′) data can be stored in the storage unit 21.
[0034]
Next, the operation of the spectral luminance meter 200 during measurement will be described.
(Operation during measurement)
FIG. 6 is a flowchart showing the operation when measuring.
[0035]
In FIG. 6, first, similarly to the case where the reference profile is obtained, the light incident on the light receiving optical system 11 is blocked by attaching the light shielding cap 8 to the light receiving optical system 11. Thereafter, the arithmetic processing unit 20 emits correction light by turning on the light source 16 via the driving unit 17, and generates an image of the second incident aperture 12 b by the zero-order light of the diffraction grating on the light receiving sensor array 15. . Then, the arithmetic processing unit 20 obtains the output B (n) of the photoelectric conversion element of the pixel number n from the light receiving sensor array 15 via the signal processing unit 18 and the A / D conversion unit 19, and obtains the reference profile As (x The interpolation is performed in the same manner as in (1) to obtain the correction profile Bs (x) (S21).
[0036]
Next, the arithmetic processing unit 20 calculates the correction profile Bs (x) and each shift reference profile A stored in the storage unit 21. k Correlation Cr with (x ') k Are sequentially obtained to obtain the shift reference profile A having the highest correlation. k (X ') is obtained (S22).
[0037]
Here, the correction profile Bs (x) and the shift reference profile A k Correlation Cr with (x ') k Is calculated using Equation 3.
Cr k = ｛R (Bs (x), A k (x '))｝ Two / ｛R (Bs (x), Bs (x)) ・ r (A k (x '), A k (x '))｝
r (P (x), Q (x)) = ∫P (x) · Q (x) dx (3)
Then, the arithmetic processing unit 20 calculates the shift reference profile A having the highest correlation. k The amount of change k · dx (correction amount) of the pixel number corresponding to (x ′) is obtained, and is defined as the change in the imaging position between the reference profile As (x) and the correction profile Bs (x). The arithmetic processing unit 20 stores the change amount k · dx (correction amount) in the correction amount storage unit 213 of the storage unit 21 (S23).
[0038]
In the present embodiment, the change in the imaging position between the reference profile As (x) and the correction profile Bs (x) expressed by the change amount k · dx of the pixel number is applied to all the photoelectric conversion elements in the light receiving sensor array 15. It is considered that a shift has occurred, and the wavelength shift of the spectral intensity distribution is corrected by the change amount k · dx. That is, as shown in Expression 4, the pixel number xm corresponding to the nominal wavelength Λm stored in the storage unit 21 is corrected by the obtained pixel number change amount k · dx.
x′m = xm + k · dx (4)
The correction profile Bs (x) and the shift reference profile A k In order to estimate the difference between the imaging positions with a resolution smaller than the pitch (repetition interval) of the photoelectric conversion elements by comparing (x ′) with (x ′), the image of the second entrance aperture 12 b It is necessary to have an intensity distribution, particularly a simple curve intensity distribution, on a plurality of photoelectric conversion elements. In the above-described embodiment, the aberration of the imaging optical system 13 is used. However, as shown in FIG. 7, by providing a diffusing plate 12d on the exit side of the second entrance opening 12b, the intensity distribution of a simple curve is positively increased. May be obtained.
[0039]
After that, the arithmetic processing unit 20 turns off the light source 16 via the driving unit 17. In addition, the measurement light is set so that it can enter the first entrance aperture via the light receiving optical system 11 except for the light shielding cap 8. Then, the measurement light is made incident on the light receiving optical system 11, and the arithmetic processing unit 20 transmits the measurement light from the light receiving sensor array 15 via the signal processing unit 18 and the A / D conversion unit 19 to the photoelectric conversion element of the pixel number n with respect to the measurement light. The output C (n) is obtained (S24), and interpolation is performed in the same manner as the reference profile As (x) to obtain the measurement light profile Cs (x) (S25).
[0040]
Next, the arithmetic processing unit 20 substitutes x′m of Expression 4 for x of the obtained measurement light profile Cs (x), thereby obtaining the spectral intensity C (x′m) at the nominal wavelength Δm corrected for the wavelength shift. Is obtained (S26).
[0041]
When the measurement is continued, the process may be started again from the process 21 or may be started from the process S24. The correction at the time of measurement may be automatically performed for each measurement from the viewpoint of constantly maintaining the initial wavelength accuracy, and the power is turned on from the viewpoint of reducing the load on the arithmetic processing unit 20 and reducing the measurement time. It may be configured to perform the operation only once after the operation. Further, a switch for instructing the start of correction may be provided, and correction may be performed by turning on this switch as desired by the user.
[0042]
The spectral luminance meter 200 according to the present embodiment has a shift reference profile A k Since (x ′) is provided in the storage unit 21 and the correction amount at the time of measurement can be obtained using this, the relative position of the optical element of the spectroscopic unit changes with time and thermally, so that the Even if a shift occurs, it can be measured with the wavelength accuracy at the time of initial wavelength calibration, and can be corrected on the user side.
[0043]
In the above-described embodiment, the image forming position of the reference profile As (x) and the correction-time profile Bs (x) represented by the pixel number change amount k · dx is used as the image forming position in the entire light receiving sensor array 15. However, from the viewpoint of further improving the accuracy, the change in the imaging position may be made a function of the imaging position. For example, dx of the change amount (correction amount) k · dx may be used as a function of the imaging position x.
[0044]
Then, various temporal and thermal relative position changes in each optical element such as the entrance aperture plate 12, the imaging optical system 13, the diffraction grating 14, and the light receiving sensor array 15 can occur. Here, the change in the imaging position caused by the change in the position of the light receiving sensor array 15 in the wavelength dispersion direction (the direction A in FIG. 1) is constant regardless of the imaging position. On the other hand, a change in the position of the entrance aperture plate 12 in the direction in which the two entrance apertures are disposed (direction B in FIG. 1), a change in the position of the imaging optical system 13 in the vertical direction (direction C in FIG. 1), and rotation of the diffraction grating 14 (see FIG. (1), the change of the imaging position caused by the rotation about the axis perpendicular to the plane of the drawing) occurs through the change of the exit angle from the diffraction grating 14, and the amount of the change depends on the imaging position. Dependent. For example, an image forming position x of the image by the 0th-order light of the second entrance aperture 12b. 0 Change in imaging position at dx 0 In the case of (1), the imaging position change dx (x) at an arbitrary imaging position x can be obtained from geometrical considerations. For miniaturization, the difference between the first entrance opening 12a and the second entrance opening 12b is obtained. When the interval is shortened, as can be seen from FIG. 1, the image of the second incident aperture 12 b by the zero-order light forms an image in the short wavelength region of the light receiving sensor array 15, and changes in the imaging position in the long wavelength region away from this Can be calculated more accurately.
[0045]
Further, from the viewpoint of removing an imaging position change (a uniform change irrespective of the imaging position on the light receiving sensor array 15) caused by a change in the position of the light receiving sensor array 15 in the wavelength dispersion direction (direction A in FIG. 1). As shown in FIG. 8, the light receiving sensor array 15 may be attached to the entrance aperture plate 12. That is, the first entrance aperture 12a, the second entrance aperture 12b, and the light receiving sensor array 15 are provided on one entrance aperture plate 12 '. In this case, a possible change in the imaging position occurs clearly through a change in the exit angle from the diffraction grating 14, and therefore, it is possible to increase the accuracy of the correction amount at each imaging position based on the above-described geometrical consideration. it can.
[0046]
FIG. 9 is a diagram showing a relationship between a change in the 0th-order reflection direction and a change in the 1st-order diffraction direction in each change in the emission from the diffraction grating. As shown in FIG. 9, in the diffraction grating G, the zero-order reflection direction is R 0 To R 0 'D 0 When the first-order diffraction direction is R 1 To R 1 'D 1 Only change. Here, the grating constant of the diffraction grating G is 600 lines / mm, the wavelength is 550 nm, and d is 0 Is 0.0036 degrees (corresponding to a wavelength shift of 1 nm), d 1 And d 0 Is about 6%, and it can be seen that even if a change in the first-order diffraction direction is a change in the zero-order reflection direction, no significant error occurs.
[0047]
In the above-described embodiment, the spectral luminance meter 200 further includes a warning unit that presents a warning and a threshold storage unit that stores a threshold that is a limit value of an allowable range of the correction amount, and the arithmetic processing unit 20 further includes: When the amount of change k · dx (correction amount) of the pixel number is equal to or larger than a predetermined threshold value, a warning may be given to the user that a wavelength shift exceeding an allowable error has occurred. With this configuration, the user can measure with accuracy within a predetermined range until a warning is given, so that the user can continue measuring with confidence, and when a warning is given, it is time to correct. Can be recognized. Here, the warning unit is a warning sound generating unit that generates a warning sound such as a lamp such as an LED or a buzzer, or a warning display unit that displays a warning message on an LCD or the like.
[0048]
The main inventions disclosed in the present specification are summarized below.
(Supplementary Note 1) A light source that emits light for correction, a dispersing unit that disperses incident light according to wavelength, and receives light dispersed by the dispersing unit, according to the light intensity of each received wavelength component. Light-receiving means in which photoelectric conversion elements for outputting electric signals are arranged, a first entrance aperture for receiving measurement light and forming a chromatic dispersion image on the light-receiving means through the dispersion means, and And a second incident aperture for forming an image by the 0th-order reflected light on the light receiving means via the dispersion means, and a wavelength of the measurement light and a pixel assigned to the photoelectric conversion element corresponding to the wavelength. A wavelength pixel number correspondence information storage unit for storing wavelength pixel number correspondence information indicating a correspondence relationship with a number in advance, and a reference profile for previously storing a reference profile which is an intensity distribution of the correction light based on an output of the light receiving unit. Storage means; When obtaining the positive amount, the light receiving means in the corrected profile and the reference profile is compared by comparing the corrected profile, which is the intensity distribution of the light for correction based on the output of the light receiving means, with the reference profile. The difference between the above imaging positions is obtained as the correction amount, and the correction amount is stored in the correction amount storage means.When the spectral intensity distribution of the measurement light is obtained, the output of the light receiving means and the wavelength pixel number correspondence information and A spectroscopic apparatus, comprising: an arithmetic processing unit for performing correction based on the correction amount and obtaining a spectral intensity distribution of the measurement light.
(Supplementary Note 2) The first entrance aperture and the second entrance aperture are formed on a plate of a material in which the relative position between the first entrance aperture and the second entrance aperture is substantially constant over time. 2. The spectroscopic device according to claim 1, wherein
(Supplementary Note 3) The first entrance aperture and the second entrance aperture are formed on a plate of a material in which the relative position between the first entrance aperture and the second entrance aperture is substantially constant with respect to a temperature change. The spectroscopic device according to Supplementary Note 1 or 2, characterized in that:
(Supplementary note 4) The spectroscopic device according to any one of Supplementary notes 1 to 3, further comprising a light blocking unit that blocks the measurement light while the correction light is on.
(Supplementary Note 5) The reference profile storage means stores a shift reference profile obtained by shifting the reference profile at a predetermined pixel number interval,
5. The spectroscopic apparatus according to claim 1, wherein the arithmetic processing unit obtains the correction amount by obtaining a correlation between the correction profile and a shift reference profile.
(Supplementary note 6) The spectroscope according to Supplementary notes 1 to 5, wherein the arithmetic processing unit obtains the correction amount at power-on and stores the correction amount in the correction amount storage unit.
(Supplementary note 7) The spectroscopic apparatus according to supplementary notes 1 to 5, wherein the arithmetic processing unit obtains the correction amount when a user's instruction is given, and stores the correction amount in the correction amount storage unit.
(Supplementary Note 8) A light source that emits light for correction, a dispersing unit that disperses incident light according to a wavelength, and receives light dispersed by the dispersing unit, and according to the light intensity of each received wavelength component. Light-receiving means in which photoelectric conversion elements for outputting electric signals are arranged, a first entrance aperture for receiving measurement light and forming a chromatic dispersion image on the light-receiving means through the dispersion means, and A second incident aperture for forming an image of the zero-order reflected light on the light receiving means through the dispersing means, and a reference which is an intensity distribution of the correction light based on the output of the light receiving means. A reference profile storage unit for storing in advance a profile (including a shift reference profile obtained based on the reference profile), a warning unit for presenting a warning, and a threshold for storing a threshold value which is a limit value of an allowable range of the correction amount Storage means and By comparing the corrected profile, which is the intensity distribution of the light for correction based on the output of the light receiving means, with the reference profile, the difference between the image forming position on the light receiving means between the corrected profile and the reference profile. And an arithmetic processing unit for presenting a warning by the warning unit when the obtained correction amount is equal to or larger than the threshold value.
(Supplementary Note 9) A light source that emits light for correction, a dispersing unit that disperses incident light in accordance with a wavelength, and receives light dispersed by the dispersing unit according to the light intensity of each wavelength component received. A light receiving unit in which photoelectric conversion elements for outputting an electric signal are arranged, a first incident aperture through which measurement light is incident, and a chromatic dispersion image is formed on the light receiving unit via the dispersing unit; A second incident aperture for receiving light and forming an image of the zero-order reflected light on the light receiving means via the dispersing means, a storage means for storing information, and an arithmetic processing means for obtaining a spectral intensity distribution of the measuring light In the correction method for correcting a wavelength shift of a spectroscopic device, the arithmetic processing unit includes a reference profile (a shift obtained based on a reference profile) which is an intensity distribution of the correction light based on an output of the light receiving unit. Standard Pro And the correction profile is compared with the reference profile, which is the intensity distribution of the correction light based on the output of the light receiving unit, when the correction amount is obtained. Calculating the difference between the image forming position on the light receiving unit of the correction profile and the reference profile as the correction amount, storing the obtained correction amount in the storage unit, Determining the spectral intensity distribution of the measurement light by correcting the output of the light receiving unit with the correction amount when obtaining the intensity distribution.
[0049]
【The invention's effect】
As described above, in the spectroscopic device according to claim 1 and the correction method of the spectroscopic device according to claim 5, the reference profile file is stored in the reference profile storage unit or the storage unit in advance at the time of manufacture or shipment. When the correction amount is obtained, the correction profile obtained at the time of correction can be compared with the reference profile, and the correction amount can be obtained from this comparison. Therefore, the spectral intensity distribution of the measurement light can be corrected with this correction amount, so that the spectral intensity distribution of the measurement light can be measured with the wavelength accuracy at the time of storing the reference profile at the time of manufacturing, shipping, or the like. Then, since the correcting means is incorporated in the spectroscopic device itself, it is possible to make corrections on a daily basis, and there is no need to request correction from a manufacturer. No hassle of request and no cost of request. Further, since it is not always necessary to use a material that is stable over time and thermally, the support member that supports the optical elements such as the light source, the first entrance aperture, the second entrance aperture, the dispersion unit, and the image formation unit is not necessary. Inexpensive or lightweight materials can be used.
[0050]
Further, the relative positions of the first entrance aperture and the second entrance aperture are configured to be kept substantially constant. In addition to the effect of the first aspect, the spectroscopic device according to claim 2 uses a material in which the relative positions of the two entrance openings are substantially constant over time for the plate forming the first and second entrance openings. It is possible to correct with high accuracy.
[0051]
According to the third aspect of the present invention, in addition to the effects of the first and second aspects, in addition to the effects of the first and second aspects, the relative positions of the two entrance apertures are substantially constant with respect to a temperature change in the plate forming the first and second entrance apertures. Since the material is used, it is possible to accurately correct for a temperature change.
[0052]
Furthermore, the spectroscopic device according to claim 4 further includes a light shielding means in addition to the effects of claims 1 to 3, so that the measurement light can be reliably used when a reference profile or a correction profile by light for correction is obtained. Since the light can be shielded, it is not necessary to consider the influence of the measurement light on these spectral profiles.
[Brief description of the drawings]
FIG. 1 is a diagram illustrating a configuration of a main part of a spectral luminance meter according to an embodiment.
FIG. 2 is a flowchart showing an operation of wavelength calibration in a manufacturing process.
FIG. 3 is a diagram illustrating light receiving sensitivity with respect to wavelength of each photoelectric conversion element in the light receiving sensor array.
FIG. 4 is a diagram showing a relationship between a pixel number n and a relative intensity An.
FIG. 5 is a diagram illustrating an example of a shift reference profile.
FIG. 6 is a flowchart showing an operation when measuring.
FIG. 7 is a diagram illustrating a configuration around a diffusion plate of a spectral luminance meter when a diffusion plate is used.
FIG. 8 is a diagram illustrating a configuration of a main part of a spectral luminance meter according to a modification of the present embodiment.
FIG. 9 is a diagram illustrating a relationship between a change in a 0th-order reflection direction and a change in a first-order diffraction direction in each change in emission from a diffraction grating.
[Explanation of symbols]
Reference Signs List 8 light shielding cap, 12 entrance aperture plate, 12a first entrance aperture, 12b, second entrance aperture, 14 diffraction grating, 15 light receiving sensor array, 16 light sources, 20 arithmetic processing section, 21 storage section, 200 spectral luminance meter, 211 wavelength Pixel number correspondence information storage unit, 212 reference profile storage unit, 213 correction amount storage unit

Claims (5)

補正用の光を発光する光源と、
入射される光を波長に応じて分散する分散手段と、
前記分散手段で分散した光を受光し、受光した各波長成分の光強度に応じた電気信号を出力する光電変換素子が配列されてなる受光手段と、
測定光が入射され前記分散手段を介して前記受光手段上に波長分散像を結像する第１入射開口と、
前記補正用の光が入射され前記分散手段を介して前記受光手段上に０次反射光による像を結像する第２入射開口と、
測定光の波長と該波長に対応する光電変換素子に割り当てられた画素番号との対応関係を示す波長画素番号対応情報を予め記憶する波長画素番号対応情報記憶手段と、
前記受光手段の出力に基づく前記補正用の光の強度分布である基準プロファイルを予め記憶する基準プロファイル記憶手段と、
補正量を求める場合には前記受光手段の出力に基づく前記補正用の光の強度分布である補正時プロファイルと前記基準プロファイルとを比較することによって前記補正時プロファイルと前記基準プロファイルとにおける前記受光手段上の結像位置の差を前記補正量として求め前記補正量を補正量記憶手段に記憶すると共に、測定光の分光強度分布を求める場合には前記受光手段の出力と前記波長画素番号対応情報と前記補正量とに基づいて補正し前記測定光の分光強度分布を求める演算処理手段とを備えること
を特徴とする分光装置。A light source that emits light for correction,
Dispersion means for dispersing incident light according to wavelength,
A light receiving unit configured to receive light dispersed by the dispersing unit, and an array of photoelectric conversion elements that output an electric signal corresponding to the light intensity of each received wavelength component,
A first entrance aperture on which measurement light is incident and forms a chromatic dispersion image on the light receiving unit via the dispersing unit;
A second entrance aperture on which the light for correction is incident and forms an image by the 0-order reflected light on the light receiving means via the dispersion means;
Wavelength pixel number correspondence information storage means for storing in advance wavelength pixel number correspondence information indicating the correspondence between the wavelength of the measurement light and the pixel number assigned to the photoelectric conversion element corresponding to the wavelength,
Reference profile storage means for storing in advance a reference profile which is an intensity distribution of the light for correction based on the output of the light receiving means,
When the correction amount is obtained, the light receiving means in the correction time profile and the reference profile is compared by comparing the correction time profile, which is the intensity distribution of the light for correction based on the output of the light receiving means, with the reference profile. The difference between the above imaging positions is obtained as the correction amount, and the correction amount is stored in the correction amount storage means.When the spectral intensity distribution of the measurement light is obtained, the output of the light receiving means and the wavelength pixel number correspondence information and A spectroscopic apparatus, comprising: an arithmetic processing unit for performing correction based on the correction amount and obtaining a spectral intensity distribution of the measurement light. 前記第１入射開口及び前記第２入射開口は、経時的に前記第１入射開口と前記第２入射開口との相対位置が略一定である材料の板に形成されることを特徴とする請求項１に記載の分光装置。The said 1st entrance opening and the said 2nd entrance opening are formed in the board | substrate of the material with which the relative position of the said 1st entrance opening and the said 2nd entrance opening is substantially constant with time. 2. The spectroscopic device according to 1. 前記第１入射開口及び前記第２入射開口は、温度変化に対して前記第１入射開口と前記第２入射開口との相対位置が略一定である材料の板に形成されることを特徴とする請求項１又は請求項２に記載の分光装置。The first entrance aperture and the second entrance aperture are formed on a plate of a material in which the relative position between the first entrance aperture and the second entrance aperture is substantially constant with respect to a temperature change. The spectroscopic device according to claim 1. 前記補正用の光が点灯されている間に測定光を遮光する遮光手段をさらに備えることを特徴とする請求項１乃至請求項３の何れか１項に記載の分光装置。The spectroscopic device according to any one of claims 1 to 3, further comprising a light blocking unit that blocks measurement light while the correction light is turned on. 補正用の光を発光する光源と、入射される光を波長に応じて分散する分散手段と、前記分散手段で分散した光を受光し受光した各波長成分の光強度に応じた電気信号を出力する光電変換素子が配列されてなる受光手段と、測定光が入射され前記分散手段を介して前記受光手段上に波長分散像を結像する第１入射開口と、前記補正用の光が入射され前記分散手段を介して前記受光手段上に０次反射光による像を結像する第２入射開口と、情報を記憶する記憶手段と、測定光の分光強度分布を求める演算処理手段とを備える分光装置の波長シフトを補正する補正方法において、
前記演算処理手段は、
前記受光手段の出力に基づく前記補正用の光の強度分布である基準プロファイルを予め前記記憶手段に記憶するステップと、
補正量を求める場合には前記受光手段の出力に基づく前記補正用の光の強度分布である補正時プロファイルと前記基準プロファイルとを比較することによって前記補正時プロファイルと前記基準プロファイルとの前記受光手段上の結像位置の差を前記補正量として求めるステップと、
求めた前記補正量を前記記憶手段に記憶するステップと、
測定光の分光強度分布を求める場合には前記受光手段の出力を前記補正量で補正することによって前記測定光の分光強度分布を求めるステップとを実行すること
を特徴とする補正方法。A light source that emits light for correction, a dispersing unit that disperses incident light according to the wavelength, and receives the light dispersed by the dispersing unit and outputs an electric signal corresponding to the light intensity of each wavelength component received. A light receiving means in which photoelectric conversion elements are arranged, a first incident aperture through which measurement light is incident and forms a chromatic dispersion image on the light receiving means via the dispersing means, and the correction light is incident. A spectroscope comprising: a second entrance aperture for forming an image of the 0th-order reflected light on the light receiving means via the dispersion means; a storage means for storing information; and an arithmetic processing means for obtaining a spectral intensity distribution of the measurement light. In a correction method for correcting a wavelength shift of an apparatus,
The arithmetic processing means comprises:
Storing a reference profile, which is an intensity distribution of the correction light based on the output of the light receiving unit, in the storage unit in advance;
When obtaining the correction amount, the light receiving unit of the correction profile and the reference profile is compared by comparing the correction profile, which is the intensity distribution of the light for correction based on the output of the light receiving unit, with the reference profile. Obtaining the difference between the above imaging positions as the correction amount;
Storing the obtained correction amount in the storage means;
Determining the spectral intensity distribution of the measurement light by correcting the output of the light receiving means with the correction amount, thereby obtaining the spectral intensity distribution of the measurement light.
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