JP2004134682A - Gas cylinder, stage apparatus, and aligner - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a stage apparatus or the like in which vibration is reduced by canceling the reaction caused by stage driving while avoiding a problem of magnetic field fluctuation. <P>SOLUTION: A moving element 21 is fitted on an outer surface of a fixed guide shaft 11 of a gas cylinder 1. A counter mass 15 is housed for sliding in a pressure chamber 22 within the moving element 21. Tongue-like pressure receiving plates 16 and 17 are mounted onto the counter mass 15. Both pressure receiving plates 16 and 17 play a role of a piston for the gas cylinder 1 by dividing the inside of the pressure chamber 22 into two chambers P1 and P2. In the gas cylinder 1, gas pressures in the pressure chambers P1 and P2 divided by the pressure receiving plates 16 and 17 are controlled to move the moving element 21 along with the guide shaft 11, and to cancel the driving reaction by moving the counter mass 15 oppositely to the moving element 21. <P>COPYRIGHT: (C)2004,JPO

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a gas cylinder, a stage device including a driving mechanism including the gas cylinder, and an exposure apparatus including the stage device. In particular, the present invention relates to a stage device and the like capable of canceling a reaction force due to stage driving and reducing vibration while avoiding the problem of magnetic field fluctuation.
[0002]
[Prior art]
A conventional technique will be described by taking a stage apparatus in the field of a so-called lithography technique for forming a fine pattern of a semiconductor device or the like as an example.
In an optical exposure apparatus which is currently the mainstream in lithography technology, an electromagnetic actuator such as a linear motor with high thrust capable of high-resolution positioning linear control is widely used as a stage driving source. A high-resolution laser interferometer is widely used for measuring the position of the stage. Further, as the XY guide system for the stage, a non-contact air bearing having high rigidity is used so that the stage can be easily positioned. Thus, the positioning of the stage on the order of several nm is becoming possible.
[0003]
However, in an exposure apparatus that uses an electron beam, which is a charged particle beam, an unexpected deflection and aberration of the electron beam may occur due to a magnetic field fluctuation when the electromagnetic actuator operates, and exposure accuracy may be reduced. There is a problem in using an electromagnetic actuator similar to light exposure for driving. In the electron beam exposure apparatus, high-speed deflection of an electron beam in an electron optical system is possible. Therefore, since the position error of the stage can be corrected on the optical system side, the accuracy of the position of the stage is not required to be as high as that of light exposure, and the order of several μm is sufficient.
[0004]
By the way, when the stage is moved, the stage movement reaction force is transmitted to the structure of the exposure apparatus, and the structure vibrates. This vibration is transmitted to the optical system, and may cause a positional shift of the transfer pattern image and a decrease in contrast. On the other hand, in the current light exposure apparatus, the vibration of the exposure apparatus is released to the floor via a shock absorber acting as a low-pass filter. Alternatively, a vibration isolation mechanism based on the law of conservation of momentum has been put to practical use.
[0005]
[Problems to be solved by the invention]
An object of the present invention is to provide a stage device or the like that can cancel a reaction force due to stage driving and reduce vibration while avoiding the problem of magnetic field fluctuation.
[0006]
[Means for Solving the Problems]
In order to solve the above-mentioned problem, a gas cylinder of the present invention includes a hollow fixed guide shaft, a movable member having a pressure chamber formed therein, which is fitted and guided on an outer surface of the guide shaft, A pressure receiving plate that separates the pressure chamber and that can move while being fitted into a child; and a counter mass that is connected to the pressure receiving plate and that is fitted and guided on the inner surface of the guide shaft. By controlling the gas pressure in the pressure chamber divided by the pressure receiving plate, the movable element is driven along the guide shaft, and the driving reaction force thereof is changed by the counter mass moving in the opposite direction to the movable element. It is characterized by canceling by.
[0007]
In the gas cylinder of the present invention, the mover corresponds to a cylinder tube of a normal air cylinder, the guide shaft corresponds to a piston rod, and the pressure receiving plate corresponds to a piston. However, contrary to a normal air cylinder, the guide shaft, which is a piston rod, is fixed, and the mover, which is a cylinder tube, moves. A counter mass is connected to the pressure receiving plate, which is a piston, and the counter mass cancels a driving reaction force when the moving element is driven along the guide shaft. Therefore, the driving reaction force of the moving element is not transmitted to the outside, and vibration can be prevented. Since the guide shaft itself for guiding the movable element is fixed, it is possible to secure the straightness and the stability of the attitude of the movable element.
[0008]
The stage device of the present invention is a stage device that includes a driving mechanism including a driving gas cylinder and moves and positions the stage. The driving gas cylinder has a hollow fixed guide shaft supported by a base of the stage device. A stage in which a pressure chamber is formed, which is fitted and guided on the outer surface of the guide shaft, and a pressure receiving plate which is movable within the stage and divides the pressure chamber; A pressure receiving plate connected thereto, and a counter mass fitted and guided on the inner surface of the guide shaft; and controlling the gas pressure in the pressure chamber divided by the pressure receiving plate to thereby move the stage. Driving along the guide axis and canceling the driving reaction force by the counter mass moving in the direction opposite to the stage.
[0009]
Since this stage device uses a gas cylinder as a driving source, there is no problem of magnetic field fluctuation. Further, since the above-mentioned reaction force canceling mechanism is provided, vibration is small, and the straightness of the stage and the stability of the posture are good.
[0010]
In the present invention, a static pressure guide bearing and a vacuum exhaust mechanism can be provided between the movable element or the stage and the fixed guide shaft, and between the counter mass and the fixed guide shaft.
Since the static pressure guide bearing has low contact resistance, the movement of the mover / counter mass with respect to the fixed guide shaft can be made smooth, and the controllability of the stage is improved. Furthermore, since the gas leak can be reduced by the vacuum exhaust mechanism, the stage device of the present invention can be used even in a vacuum atmosphere or a special atmosphere.
[0011]
In the present invention, a trim cylinder for introducing a trim pressure for returning the counter mass to the stroke origin may be formed in the fixed guide shaft.
If the movement (stroke) of the counter mass at the time of canceling the reaction force accumulates and increases, the cylinder may not be able to operate. Therefore, the counter mass is returned to the origin by the trim cylinder. As a timing for operating the trim cylinder, for example, when the present stage apparatus is applied to an exposure apparatus, non-exposure or the like in which vibration disturbance to the exposure apparatus is relatively allowed may be considered.
[0012]
In the present invention, the fixed guide shaft may include an electromagnetic motor that returns the counter mass to the stroke origin.
In this case, an electromagnetic motor such as a linear motor is used instead of the trim cylinder. When an electromagnetic motor is used, a disturbing magnetic field is generated. However, the operation may be performed at a timing that causes no problem even if the disturbing magnetic field is generated.
[0013]
An exposure apparatus according to the present invention is an exposure apparatus that selectively irradiates an energy beam onto a sensitive substrate to form a pattern, and includes a stage on which the sensitive substrate is mounted and / or a stage on which a pattern original is mounted. And a stage device according to any one of claims 2 to 4.
Since the exposure apparatus includes the above-described stage device, vibration of the exposure device due to driving of the stage can be reduced, and exposure performance can be improved.
[0014]
In the exposure apparatus of the present invention, the energy beam for transferring the pattern is not particularly limited, and may be light, ultraviolet light, X-ray (soft X-ray, EUV, etc.), charged particle beam (electron beam, ion beam) or the like. . Also, the exposure method is not limited, and can be widely applied to reduced projection exposure, close-to-uniform transfer, direct drawing method, and the like.
[0015]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, description will be made with reference to the drawings.
First, an exposure apparatus according to an embodiment of the present invention will be described with reference to FIG.
FIG. 5 is a diagram showing an overall configuration of an exposure apparatus according to one embodiment of the present invention.
A support structure 109 is provided on a base 105 of the exposure apparatus 100 shown in FIG. The anti-vibration table 107 is a damper having an anti-vibration function. A reticle chamber 111 is fixed on a support structure 109 of the exposure apparatus 100, and a wafer chamber 103 is connected below the structure 109. The lower part of the wafer chamber 103 is supported on a base 105 via a support member 108. A vacuum chamber 111A is formed inside the reticle chamber 111, and a vacuum chamber 103A is formed inside the wafer chamber 103.
[0016]
In the reticle chamber 111, a reticle surface plate (stage base) 115 is mounted on the upper surface of the support structure 109. A reticle stage device 130 is mounted on the reticle surface plate 115. Reticle R is placed on reticle stage 130. On the other hand, a wafer stage device 140 is movably mounted on a bottom surface inside the wafer chamber 103 via a wafer surface plate 138. The wafer W is placed on the wafer stage device 140.
[0017]
An illumination optical system lens barrel (electron beam illumination lens barrel) 113 is disposed above the reticle chamber 111. The illumination optical system barrel 113 is disposed so as to penetrate the upper surface of the reticle chamber 111. An electron gun, a condenser lens, a deflector and the like (not shown) are arranged in the lens barrel 113.
[0018]
A vacuum system 114 (including a turbo molecular pump P) for drawing a vacuum in the internal vacuum chamber 111A is connected to a side portion (left side in the figure) of the reticle chamber 111. Further, a loader chamber 116 (including a gate valve and a manipulator) for transferring the reticle R into and out of the vacuum chamber 111A is connected to a side portion (the right side in the figure) of the reticle chamber 111.
[0019]
A projection optical system lens barrel (electronic projection lens barrel) 123 is provided at the center of the support structure 109 between the reticle surface plate 115 in the reticle chamber 111 and the wafer chamber 103. The projection optical system barrel 123 is disposed so as to vertically penetrate the support structure 109. In the lens barrel 123, a plurality of stages of projection lenses (condenser lenses), deflectors, aberration correcting lenses and coils (not shown) are arranged.
[0020]
A vacuum system 104 (including a turbo molecular pump) for drawing a vacuum in the internal vacuum chamber 103A is connected to the bottom (lower side in the figure) of the wafer chamber 103. Further, a loader chamber 106 (including a gate valve and a manipulator) for transferring the wafer W into and out of the vacuum chamber 103A is connected to a side portion (the right side in the figure) of the wafer chamber 103.
[0021]
Next, an overall configuration of a stage device according to an embodiment of the present invention will be described with reference to FIG.
FIG. 6 is a plan view showing a stage device according to one embodiment of the present invention.
FIG. 6 shows an example of a wafer stage 140 (with a built-in driving device) mounted on a wafer surface plate at the bottom of the wafer chamber. In the present embodiment, the stage apparatus is described as being applied to the wafer stage 140 of the line exposure apparatus in FIG. 5, but the present invention is not limited to this and can be used in various applications and forms.
[0022]
As shown in FIG. 6, a stage 210 is provided at the center of the wafer stage (stage device) 140. The stage section 210 includes a lower stage 211 and an upper stage 217. The lower stage 211 and the upper stage 217 are connected by, for example, a leaf spring or the like. Although not shown, a wafer holding device such as a fine movement table and an electrostatic chuck is provided on the upper stage 217, and fixes the wafer W.
[0023]
An X-axis mover 205 extending in the X-axis direction is fitted to the lower stage 211 via a gas bearing (not shown). At both ends of the X-axis mover 205, Y-axis sliders (movers) 207 slidable in the Y direction are provided. Each Y-axis slider 207 is fitted with a Y-axis fixed guide (stator) 208 extending in the Y-axis direction via a gas bearing (not shown). Although described later in detail with reference to FIG. 1, the Y-axis slider 207 and the fixed guide 208 constitute a gas cylinder as a slider driving mechanism.
[0024]
Guide fixing portions 209 and 212 are provided near both ends of each fixing guide 208. Each fixed guide 208 is fixed to the base 202 (corresponding to the above-described wafer surface plate on the bottom of the wafer chamber).
[0025]
A Y-axis mover 205 'extending in the Y-axis direction is fitted to the upper stage 217 via a gas bearing (not shown). At both ends of the Y-axis mover 205 ', X-axis sliders (movers) 207' slidable in the X direction are provided. An X-axis fixed guide (stator) 208 'extending in the X-axis direction is fitted to each X-axis slider 207' via a gas bearing (not shown). As will be described in detail later with reference to FIG. 1, the X-axis slider 207 'and the fixed guide 208' constitute a gas cylinder as a slider driving mechanism.
[0026]
Guide fixing portions 209 'and 212' are provided near both ends of each fixing guide 208 '. Each fixed guide 208 'is fixed to the base 202 (corresponding to the above-described wafer surface plate on the bottom of the wafer chamber).
[0027]
Next, the configuration of a gas cylinder (corresponding to the slider 207 and the guide 208 in FIG. 6) according to one embodiment of the present invention will be described with reference to FIGS.
FIG. 1 is a diagram showing a gas cylinder (stage device) according to one embodiment of the present invention. (A) is a side cross-sectional view, and (B) is a cross-sectional view along line AA of (A).
The stage driving gas cylinder 1 shown in FIG. 1 includes a fixed rectangular guide shaft 11 having a long rectangular shape having a hollow portion 12. The guide shaft 11 is a member corresponding to the above-described fixed guide 208 (see FIG. 6). Both ends of the guide shaft 11 are fixed on support legs 10 (corresponding to the guide fixing portions 209 and 212 in FIG. 6) which are raised on a base 202 (see FIG. 6) of the stage device.
[0028]
The mover 21 is fitted on the outer surface of the guide shaft 11. The mover 21 is a member corresponding to the above-described Y-axis slider 207 (see FIG. 6). The mover 21 is guided by the guide shaft 11 and slides in the left-right direction in FIG. A pressure chamber 22 is formed so as to be dug inside the movable member 21.
[0029]
The hollow portion 12 of the guide shaft 11 houses a square bar-shaped counter mass 15. The counter mass 15 is fitted and guided on the inner surface of the guide shaft 11, and slides in the left-right direction in FIG. The length of the counter mass 15 in the longitudinal direction is shorter than the length of the guide shaft 11 in the axial direction. Therefore, in a state in which the counter mass 15 is accommodated in the guide shaft 11, right and left chambers PP1 and PP2 are formed on both end sides of the guide shaft 11 (outside of both end surfaces of the counter mass 15). These chambers PP1 and PP2 constitute a cylinder chamber for a trim pressure described later.
[0030]
Tongue-shaped pressure receiving plates 16 (upper side) and 17 (lower side) are attached to the central upper and lower surfaces of the counter mass 15 so as to rise, respectively. As shown in FIG. 1B, the pressure receiving plates 16 and 17 respectively pass through slits 11a and 11b (length L in FIG. 1A) formed on the upper and lower surfaces of the guide shaft 11, respectively. , And extend to the inner surface of the movable member 21. The two pressure receiving plates 16 and 17 extend on a plane orthogonal to the sliding direction of the counter mass 15 and the moving member 21 (the left-right direction in FIG. 1A) and serve as a piston of the gas cylinder 1. These pressure receiving plates 16 and 17 move integrally with the counter mass 15 and fit into the movable member 21 to slide. The pressure chambers 22 in the movable element 21 are divided into a right pressure chamber P1 and a left pressure chamber P2 by the pressure receiving plates 16 and 17. The two chambers P1 and P2 are respectively connected to individual supply / exhaust systems (not shown).
[0031]
A plurality of static pressure guide bearings (air pads) 26 are provided on the sliding surface of the mover 21 with the outer surface of the guide shaft 11 and the sliding surface of the counter mass 15 with the inner surface of the guide shaft 11. Each air pad 26 is formed from a porous orifice material. As shown in FIG. 1A, a low vacuum groove 28 for performing low vacuum evacuation and a high vacuum groove 29 for performing high vacuum evacuation are sequentially formed outside the air pad 26 in the mover 21. Inside the mover 21, passages (not shown) for supplying, collecting, and exhausting air are formed in the air pads 26 and the exhaust grooves 28, 29.
[0032]
The moving element 21 and the counter mass 15 are supported in a non-contact manner with respect to the guide shaft 11 by the air jetted from each air pad 26. The air jetted from the air pad 26 on the movable element 21 side is released to the atmosphere through an atmosphere opening groove (not shown). The air leaking from the open-to-atmosphere groove is exhausted through the low-vacuum groove 28 and the high-vacuum groove 29. In this way, the air blown out of the air pad does not leak much into the wafer chamber 103 (see FIG. 5) maintained at a high vacuum.
[0033]
As shown in FIG. 1A, a laser interferometer 19a is provided on the inner end surface of the right chamber PP1 of the guide shaft 11. On the other hand, a laser interferometer 19b is provided on the right end face of the counter mass 15 at a position facing the laser interferometer 19a. These interferometers 19a and 19b are connected to a monitor or the like (not shown). The position of the counter mass 15 with respect to the guide shaft 11, that is, the amount of movement of the counter mass 15 is detected by the interferometers 19a and 19b. Both interferometers 19a and 19b may of course be provided on the left chamber PP2 side.
[0034]
In this embodiment, the laser interferometers 19a and 19b are used as the moving amount detecting means of the counter mass 15, but other than this, for example, a linear scale or the like may be used. In this case, a linear scale is arranged on the lower surface of the chamber inside the guide shaft 11, and a detector is attached to the end face of the counter mass. Then, the scale of the linear scale is read by this detector, and the amount of movement of the counter mass is detected.
[0035]
In this example, an electromagnetic motor can be used for the trim mechanism of the counter mass. FIG. 2 is a diagram showing a trim electromagnetic motor attached to a gas cylinder according to another embodiment.
As shown in FIG. 2, an electromagnetic motor 33 is connected to an end face of the counter mass 15 via a shaft 31. The shaft 31 extends through the inside of the hole 11x of the end surface 11X of the guide shaft 11 and extends to the outside, and an electromagnetic motor (linear motor) 33 is attached to the end thereof. An air pad 36 similar to that described above is provided on the inner peripheral surface of the hole 11x. The electromagnetic motor 33 is housed in a magnetic shield case 38. With the driving of the electromagnetic motor 33, the counter mass 15 is pushed and pulled via the shaft 31 and slides inside the guide shaft 11.
[0036]
Next, a state of driving the gas cylinder having the above-described configuration will be described with reference to FIGS.
FIG. 3 is a diagram illustrating a state when the gas cylinder in FIG. 1 is driven (at the time when the moving element moves rightward).
FIG. 4 is a diagram showing a state when the gas cylinder of FIG. 1 is driven (at the time of moving the moving element to the left).
[0037]
As shown in FIG. 3, when the moving element 21 (stage slider) is moved rightward (X direction) in the figure along the guide shaft 11, the right pressure chamber P <b> 1 in the moving element 21 is supplied with air. Air is exhausted from the left pressure chamber P2. Then, the internal pressure of the right pressure chamber P1 becomes higher than the internal pressure of the left pressure chamber P2, the right side wall 22R of the moving member 21 is pushed rightward, and the moving member 21 slides in the X direction along the guide shaft 11. . At this time, since the guide shaft 11 that guides the movable member 21 is fixed to the support leg 10, the straightness and the stability of the posture of the movable member 21 can be secured.
[0038]
At this time, gas pressure is applied to the pressure receiving plates 16 and 17 inside the movable element 21 in the direction (X ′ direction) opposite to the sliding movement direction (X direction) of the movable element 21. This gas pressure can also be considered as a movement reaction force (stage movement reaction force) of the moving element 21. Then, under the pressure, the pressure receiving plates 16 and 17 are fitted inside the movable member 21 and slide leftward (X 'direction). Then, together with the pressure receiving plates 16 and 17, the counter mass 15 in the guide shaft 11 is fitted on the inner surface of the guide shaft 11 in the same direction (X ′ direction) as the direction of action of the stage reaction force and guided. Slides while being played. The slide of the counter mass 15 can cancel the stage reaction force. Therefore, the vibration is small, and the straightness and posture stability of the moving member 21 are good.
[0039]
On the other hand, as shown in FIG. 4, when the moving member 21 (stage slider) is moved to the left (X ′ direction) in the figure along the guide shaft 11, the right side of the moving member 21 is reversed, as described above. The air is exhausted from the pressure chamber P1 and is supplied to the left pressure chamber P2. Then, the internal pressure of the right pressure chamber P1 becomes lower than the internal pressure of the left pressure chamber P2, and the left side wall 22L of the movable member 21 is pushed to the left, and the movable member 21 slides in the X ′ direction along the guide shaft 11. . In this case, contrary to the above, the gas pressure in the X direction is applied to the pressure receiving plates 16 and 17 inside the mover 21, and the counter mass 15 in the guide shaft 11 slides in the X direction. As described above, since the stage reaction force is canceled, the vibration is small, and the straightness and posture stability of the moving member 21 are good.
[0040]
Here, if the movement (stroke) of the counter mass 15 at the time of canceling the reaction force accumulates and increases, there is a possibility that the operation of the movable element 21 may become impossible. Therefore, the counter mass 15 is returned to the origin by the trim cylinders PP1 and PP2 in FIG. 1 or the electromagnetic motor 33 in FIG.
[0041]
The exposure apparatus repeats step movement → scan (exposure) → step movement during pattern formation, and moves between chips. Here, at the time of the step (at the time of non-exposure), since the vibration disturbance to the exposure apparatus is relatively allowed, the counter mass 15 is trimmed and returned to the stroke origin. At this time, based on the detection values of the laser interferometers 19a and 19b, the position of the counter mass 15 is confirmed and returned to the stroke origin. In this manner, a normal stage operation at the time of canceling the reaction force during exposure can be ensured.
[0042]
As described above, in the exposure apparatus that drives the stage using the gas cylinder, the problem of the magnetic field fluctuation does not occur as in the case of using the electromagnetic actuator, so that the exposure performance can be further improved in the case of the charged particle beam exposure apparatus. . In the present embodiment, since the electromagnetic motor 33 for adjusting the trim pressure is housed in the magnetic shield case 38, the problem of magnetic field fluctuation due to the driving of the electromagnetic motor 33 can be avoided.
[0043]
【The invention's effect】
As is apparent from the above description, according to the present invention, it is possible to provide a stage device or the like capable of canceling a reaction force due to stage driving and reducing vibration.
[Brief description of the drawings]
FIG. 1 is a view showing a gas cylinder (stage device) according to an embodiment of the present invention. (A) is a side cross-sectional view, and (B) is a cross-sectional view along line AA of (A).
FIG. 2 is a view showing an electromagnetic motor for trim attached to a gas cylinder according to another embodiment.
FIG. 3 is a diagram showing a state when the gas cylinder of FIG. 1 is driven (at the time when the moving element moves rightward).
FIG. 4 is a diagram showing a state when the gas cylinder of FIG. 1 is driven (at the time of moving the moving element to the left).
FIG. 5 is a diagram showing an overall configuration of an exposure apparatus according to one embodiment of the present invention.
FIG. 6 is a plan view showing a stage device according to one embodiment of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Gas cylinder 10 Support leg 11 Fixed guide shaft 12 Hollow part 15 Counter mass 16, 17 Pressure receiving plate 19a, 19b Laser interferometer 21 Moving element 22 Pressure chamber 26, 36 Static pressure guide bearing (air pad) 28 Low vacuum groove 29 High vacuum Groove 31 Shaft 33 Electromagnetic motor (linear motor) 38 Magnetic shield case 100 Exposure device 140 Wafer stage

Claims (6)

A hollow fixed guide shaft,
A movable member having a pressure chamber formed therein, which is guided by being fitted to an outer surface of the guide shaft;
A pressure-receiving plate that partitions the pressure chamber, which is movable by being fitted into the movable member;
The pressure receiving plate is connected, and comprises a counter mass fitted and guided on the inner surface of the guide shaft,
By controlling the gas pressure in the pressure chamber divided by the pressure receiving plate, the moving element is driven along the guide shaft, and the driving reaction force is changed by the counter mass moving in the opposite direction to the moving element. A gas cylinder characterized by being canceled. A stage device that includes a driving mechanism including a driving gas cylinder, and moves and positions the stage.
The driving gas cylinder,
A hollow fixed guide shaft supported on the base of the stage device,
A stage in which a pressure chamber is formed, which is fitted and guided on the outer surface of the guide shaft;
A pressure receiving plate that is movable within the stage and that divides the pressure chamber;
The pressure receiving plate is connected, and comprises a counter mass fitted and guided on the inner surface of the guide shaft,
The stage is driven along the guide shaft by controlling the gas pressure in the pressure chamber divided by the pressure receiving plate, and the reaction force is canceled by the counter mass moving in the direction opposite to the stage. A stage device characterized by the above-mentioned. The gas cylinder according to claim 1, wherein a static pressure guide bearing and a vacuum exhaust mechanism are provided between the mover or the stage and the fixed guide shaft, and between the counter mass and the fixed guide shaft. Or the stage device according to claim 2. The gas cylinder or the stage device according to claim 1, wherein a trim cylinder for introducing a trim pressure for returning the counter mass to a stroke origin is formed in the fixed guide shaft. The gas cylinder or the stage device according to any one of claims 1 to 3, further comprising an electromagnetic motor that returns the counter mass to a stroke origin in the fixed guide shaft. An exposure apparatus that selectively irradiates an energy beam onto a sensitive substrate to form a pattern,
An exposure apparatus comprising the stage device according to any one of claims 2 to 5 as a stage on which the sensitive substrate is mounted and / or a stage on which a pattern original is mounted.

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