JP2004121654A - Apparatus for irradiating electric charged particle for medical use - Google Patents

Apparatus for irradiating electric charged particle for medical use Download PDF

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JP2004121654A
JP2004121654A JP2002292559A JP2002292559A JP2004121654A JP 2004121654 A JP2004121654 A JP 2004121654A JP 2002292559 A JP2002292559 A JP 2002292559A JP 2002292559 A JP2002292559 A JP 2002292559A JP 2004121654 A JP2004121654 A JP 2004121654A
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scanning electromagnet
charged particle
electromagnet
scanning
deflection
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JP3964769B2 (en
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Koji Matsuda
松田 浩二
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Hitachi Ltd
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Hitachi Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To reduce a cost without enlarging other beam deflection means. <P>SOLUTION: An electric charged particle irradiation apparatus for medical use for irradiating the irradiation object P of a patient with electric charged particles includes: an X-direction scanning electromagnet 101 for deflecting an incident electric charged particle beam to transfer a position by bending the beam in an X-direction; an X-direction scanning electromagnet 102 which is arranged on the downstream side of the X-direction scanning electromagnet 101, and deflects in an X-direction the electric charged particle beam deflected by the electromagnet 101, so as to reduce the positional deviation of the beam; and a Y-direction scanning electromagnet 103 which is arranged on the downstream side of the X-direction scanning electromagnet 102, and deflects to the Y-direction the electric charged particle beam deflected by the electromagnet 102. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、照射対象に荷電粒子線ビームを照射する医療用荷電粒子線ビーム照射装置に係わり、特に、複数の走査電磁石を用いビームを走査することにより照射範囲を拡大する医療用荷電粒子照射装置に関する。
【0002】
【従来の技術】
陽子や炭素イオン等の荷電粒子線ビームを患者の患部に照射してガンや腫瘍等を治療する医療用荷電粒子照射装置は、イオン源で発生し、シンクロトロン等の加速器で加速した荷電粒子を、照射野形成手段で照射範囲を患部形状に合わせて成型した後、患者ベッドに横臥した患者の患部に照射する(例えば、非特許文献1参照)。
【0003】
照射野形成手段は、照射対象(患部)の立体形状に合わせて荷電粒子線ビームの照射野を形成し線量分布を調整するものであり、荷電粒子線ビームの進行方向(照射対象の深さ方向、Z軸)に垂直な平面(X軸とY軸を備えたX−Y平面)内における照射範囲を成形する横方向ビーム形成部と、荷電粒子線ビームの進行方向(Z軸)における照射範囲を形成する飛程調節部とから構成される。
【0004】
飛程調節部は、照射対象の深さに対応して荷電粒子線ビームのエネルギーを調整し、荷電粒子線ビームの進行方向(深さ方向)の照射対象の形状に合わせて荷電粒子線ビームを整形するものである。
【0005】
横方向ビーム形成部は、荷電粒子線ビームの進行方向に垂直な平面(X−Y平面)方向に荷電粒子線ビームを拡大した後、拡大された荷電粒子線ビームをコリメータで切り取ることにより、荷電粒子線ビームの進行方向に垂直な平面上の照射対象の形状に合わせて荷電粒子線ビームを整形するものである。このときのビーム拡大には、ビームを走査する手法やビーム径を拡大させる手法、あるいはそれらを組み合わせる手法等がある。
【0006】
ビームを走査する手法においては、一般に、2つのビーム偏向手段を、それぞれの偏向面が互いに垂直になるように配置することが多く、特に陽子、重粒子といった高エネルギービームの照射においては、そのビーム偏向手段として電磁石(走査電磁石)を用いることが多い。例えばY方向に垂直な磁極面を備えY方向の磁場を発生してビームをX方向に偏向するX方向走査電磁石を上流側に配置し、X方向に垂直な磁極面を備えX方向の磁場を発生してビームをY方向に偏向するY方向走査電磁石を下流側に配置する。この場合、ビームのX方向位置は上流側のX方向走査電磁石内で徐々に偏向され、電磁石通過後直線的に変化するため、X方向走査点は上流側X方向走査電磁石の中心付近となり、同様にしてビームのY方向走査点はほぼ下流側Y方向走査電磁石の中心付近となる。
【0007】
このような構成において、下流側のY方向走査電磁石では、上流側X方向走査電磁石によるビーム走査によって、上流側に比べてX方向におけるビーム通過範囲が大きくなり、結果として磁場発生方向であるX方向における磁極間隔を大きくしなければならない。ここで、走査電磁石においては、通常、磁場発生方向における磁極間隔が大きくなるほどその磁気抵抗が大きくなるため、磁極間隔のべき乗(例えば2乗)に比例して消費電力が大きくなる。このため、上記のようなX方向の磁極間隔の増大によってY方向走査電磁石における消費電力は著しく増大し、運転コスト(ランニングコスト)が増大することとなっていた。また、走査電磁石を励磁するための電源については、通常、その最大電圧と最大電流との積で表される電源容量が磁場発生方向の磁極間隔が大きくなるほど例えばそれにほぼ比例して大きくなるため、上記のような構成では、Y方向走査電磁石の励磁用電源として電源容量の極めて大きいものを用意する必要があり、設備コスト(初期コスト)が増大することとなっていた。
【0008】
そこで、これに対応して、従来、X方向走査電磁石とY方向走査電磁石とを大きく距離を離して配置するとともに、これら2つの走査電磁石の間に設けた偏向電磁石及び四極電磁石のX方向におけるビーム収束機能を利用し、下流側Y方向走査電磁石近傍でのX方向におけるビーム通過範囲を小さくするものが提唱されている(例えば、特許文献1参照)。
【0009】
この従来技術では、X方向走査電磁石でX方向にビームを曲げて位置をずらすように偏向させた後、偏向電磁石や四極電磁石のビーム収束機能を利用しそれらを通過する間にX方向にビームの位置のずれを小さくするように徐々に偏向させ、下流側Y方向走査電磁石近傍で一度焦点を結ばせる。これにより、実質的にビーム走査点をその焦点位置(言い換えればY方向走査電磁石付近)に移動させ、下流側Y方向走査電磁石でのX方向におけるビーム通過範囲を縮小している。そして、焦点以降、Y方向走査電磁石を通過し再度X方向にビーム通過範囲が大きくなった粒子線ビームを、コリメータへと導入するようになっている。
【0010】
【非特許文献1】
「Review of Scientific Instruments Vol.64 No.8(1993年8月)」(p.2055〜2122)
【特許文献1】
特開平10−282300号公報(段落番号
【0011】、
【0012】及び図7)
【発明が解決しようとする課題】
上記従来技術では、X方向走査電磁石とY方向走査電磁石の間に設けた偏向電磁石及び四極電磁石のX方向ビーム収束機能を利用し、下流側Y方向走査電磁石近傍で一度焦点を結ばせることでY方向走査電磁石におけるビーム通過範囲を縮小している。これにより、Y方向走査電磁石におけるX方向の磁極間隔の増大による消費電力の増大及び励磁用電源容量の増大を防止し、コスト低減を図ることができる。
【0013】
しかしながら、上記偏向電磁石や四極電磁石のビーム収束機能は本来それほど大きくないため、一旦X方向走査電磁石でビームを曲げて位置をずらすように偏向させた荷電粒子線ビームを逆にビームの位置のずれを小さくするように偏向させる間、その輸送距離の大きさとともにX方向におけるビーム通過範囲の最大値が比較的大きくなり、これに伴ってそれら偏向電磁石や四極電磁石でのX方向におけるビーム通過範囲が大きくなる。すなわち、走査電磁石の小型化を図れるものの、それ以外のビーム偏向手段(この例では四極電磁石や大型構造の偏向電磁石)のX方向における大型化を招く。このため、それらの自重の増大によって支持構造物のたわみが増大し(特にこの公知例のような回転ガントリーでその傾向が顕著となる)、この結果、ビーム照射精度の向上が困難となる。
【0014】
本発明の目的は、他のビーム偏向手段を大型化することなく、コスト低減を図れる医療用荷電粒子照射装置を提供することにある。
【0015】
【課題を解決するための手段】
(1)上記目的を達成するために、本発明は、荷電粒子を患者の患部に照射する医療用荷電粒子照射装置において、入射した荷電粒子線ビームを、そのビーム進行方向に垂直な平面内における一の方向へビームを曲げて位置をずらすように偏向する第1走査電磁石と、この第1走査電磁石より下流側に設けられ、前記第1走査電磁石で偏向された荷電粒子線ビームを、前記一の方向へ前記ビームの位置のずれを小さくするように偏向する第2走査電磁石と、この第2走査電磁石より下流側に設けられ、前記第2走査電磁石で偏向された荷電粒子線ビームを、前記ビーム進行方向に垂直な平面内における前記一の方向と直交する他の方向へ偏向する第3走査電磁石とを有する。
【0016】
本発明においては、第1走査電磁石で例えばX方向にビームを曲げて位置をずらすように偏向させた後に下流側の第2走査電磁石でX方向にビームの位置のずれを小さくするように偏向させることにより、例えばさらに下流側のY方向第3走査電磁石近傍で一度焦点を結ばせることが可能となる。これによって、実質的にビーム走査点をその焦点位置(言い換えれば第3走査電磁石付近)に移動させ、下流側第3走査電磁石におけるX方向におけるビーム通過範囲を縮小し、焦点以降、第3走査電磁石を通過し再度X方向にビーム通過範囲を拡大し所定の大きさとなった粒子線ビームを、コリメータへと導入する。
【0017】
このとき、従来構造のように本来ビーム収束機能のそれほど大きくない偏向電磁石や四極電磁石を用いず、ビーム偏向機能の高い第2走査電磁石を用いることによってX方向にビーム通過範囲を急激に縮小させることができるので、一旦第1走査電磁石でビームを曲げて位置をずらした後にビームの位置のずれを小さくする間におけるその輸送距離を小さくでき、またそのときのビーム通過範囲の最大値を小さくすることができる。したがって、それらの間に通常設けられる偏向電磁石や四極電磁石等の他のビーム偏向手段の小型化を図ることができる。
【0018】
一方このとき、本発明においては、元来の例えばX方向走査電磁石1個とY方向走査電磁石の合計2個から、第1走査電磁石(X方向)、第2走査電磁石(X方向)、第3走査電磁石(Y方向)の合計3個に1個増えるため、その分の消費電力及び電源容量は別途追加となる。
【0019】
しかしながら、例えば消費電力についてみると、X方向走査電磁石1個とY方向走査電磁石1個とを配置する上記の元来構造では、下流側のY方向走査電磁石においてX方向ビーム通過範囲の増大に応じ磁場発生方向であるX方向の磁極間隔が大きくなっている。前述したように消費電力は磁場発生方向における磁極間隔の例えば2乗に比例することから、Y方向走査電磁石の消費電力はX方向走査電磁石の例えば5倍程度にも達する。このため、X方向走査電磁石及びY方向走査電磁石2つを合計した消費電力は著しく増大する。
【0020】
本発明においては、前述したように最下流側の第3走査電磁石におけるX方向ビーム通過範囲の縮小によって磁極間隔を元来構造の例えば1/2程度に低減できることから、上記元来のY方向走査電磁石の約1/3程度にまで第3走査電磁石の消費電力を低減することができる。これに対して、新たな追加分となる第1走査電磁石は偏向量が小さく極めて小型のもので足りることから、第1及び第2走査電磁石の消費電力を合計しても元来のX方向走査電磁石の消費電力の2倍には至らない。この結果、第1〜第3走査電磁石3個の合計消費電力を、元来のX方向及びY方向走査電磁石2個の合計消費電力よりも例えば1/2程度にまで小さくでき、運転コスト(ランニングコスト)を低減することができる。
【0021】
また、電源容量についてみると、X方向走査電磁石1個とY方向走査電磁石1個とを配置する上記の元来構造では、前述したように電源容量は磁場発生方向における磁極間隔に例えば比例することから、Y方向走査電磁石の励磁電源に必要な電源容量は、X方向走査電磁石の励磁電源の例えば数倍(3〜5倍)程度にも達する。このため、Y方向走査電磁石については特に大型の電源が必要で、場合によっては通常の市場では入手できず別途製作する必要が生じ、設備コスト(初期コスト)が増大する。
【0022】
本発明においては、前述したように最下流側の第3走査電磁石におけるX方向ビーム通過範囲の縮小によって磁極間隔が低減されることから、上記元来のY方向走査電磁石の60%程度まで第3走査電磁石用励磁電源の電源容量を低減することができ、コストを著しく低減できる。これに対して、新たな追加分となる第1走査電磁石は偏向量が小さく極めて小型のもので足りることから、第1走査電磁石用に使用される電源容量は元来のX方向走査電磁石の電源容量の1/3程度で足り、また第2走査電磁石用に使用される電源容量も元来のX方向走査電磁石と大差ない程度のもので足りる。この結果、総合的に見て、第1〜第3走査電磁石3個の励磁用電源に必要な設備コスト(初期コスト)を、元来のX方向及びY方向走査電磁石2個の励磁用電源に必要な設備コストに比べて、少なくともほぼ等しいか若しくは小さくすることができる。
【0023】
以上のようにして、本発明においては、他のビーム偏向手段を大型化することなく、コスト低減を図ることができる。
【0024】
(2)上記目的を達成するために、また本発明は、荷電粒子を患者の患部に照射する医療用荷電粒子照射装置において、入射した荷電粒子線ビームを、そのビーム進行方向に垂直な平面内における一の方向へビームを曲げて位置をずらすように偏向する第1走査電磁石と、この第1走査電磁石より下流側に設けられ、前記第1走査電磁石で偏向された荷電粒子線ビームを、前記一の方向へ前記ビームの位置のずれを小さくするように偏向する第2走査電磁石と、この第2走査電磁石より下流側に設けられ、前記第2走査電磁石で偏向された荷電粒子線ビームを、前記ビーム進行方向に垂直な平面内における前記一の方向と直交する他の方向へ偏向する第3走査電磁石と、前記第1走査電磁石による偏向量と前記第2走査電磁石による偏向量との所定の比例関係を維持するように、それら第1及び第2走査電磁石を制御する第1偏向制御手段とを有する。
【0025】
第1走査電磁石による偏向量と第2走査電磁石による偏向量とが比例関係に維持されることにより、ビーム曲げて位置ずれ増大→位置ずれの低減→第3走査電磁石近傍の焦点という粒子線ビームの挙動を維持しつつ、容易かつ確実に走査を行うことができる。
【0026】
(3)上記(1)又は(2)において、好ましくは、前記第3走査電磁石より下流側に、荷電粒子線ビームを散乱させる散乱体を設ける。
【0027】
散乱体を設ける場合、ビーム走査点から散乱体までの距離が大きくなるほど、より多くの方向のより広い範囲から種々のビームが散乱体に入射する可能性が高くなり、散乱体から出射した後におけるビーム外郭が曖昧になる結果、照射ビームの角度分布広がりが大きくなり、コリメータでビームを切り出した後の照射対象内線量分布の切れ(半影)が大きくなって照射精度の向上が困難となる。
【0028】
本発明においては、上記(1)で説明したように実質的にビーム走査点を焦点位置である第3走査電磁石付近に移動させるので、第3走査電磁石より下流側に散乱体を設けることで、走査点と散乱体との距離を小さくすることができる。これにより、照射対象内線量分布の半影を小さくし照射精度を向上することができる。また、大きな範囲を走査し、広い領域を照射する照射装置を実現することができる。特に、ビーム走査点を散乱体付近に合わせた場合には、照射対象内線量分布の半影をより小さくすることができ、照射精度を一層向上させることができる。
【0029】
(4)上記(1)又は(2)において、また好ましくは、前記第2走査電磁石より下流側でかつ前記第3走査電磁石より上流側に、荷電粒子線ビームを散乱させる散乱体を設ける。
【0030】
散乱体をY方向の第3走査電磁石より上流側へ配置したことにより、散乱体と照射面との距離が長くなり、照射面で同じビーム強度分布を形成するために必要な散乱量を小さくすることができる。これにより、散乱体の厚さを薄くすることができ、散乱体におけるビームのエネルギー損失を小さくできる。この結果、照射面に到達するビームのエネルギーが高くなるため、照射対象内でのビームの到達深度が深くなり、より深い標的に対し照射を行うことができる。
【0031】
(5)上記(2)において、また好ましくは、前記第1偏向制御手段は、前記第1走査電磁石及び第2走査電磁石に共通の単一の励磁電源を備え、前記第1走査電磁石及び第2走査電磁石はそれぞれの励磁コイルが前記単一の励磁電源に対し直列に接続されている。
【0032】
これにより、第1走査電磁石及び第2走査電磁石によるビーム偏向量を、特に調節を行わなくても容易に比例関係にすることができる。したがって、運転が簡単になると共に、ずれによる誤照射の可能性を低減することができる。
【0033】
(6)上記(2)において、また好ましくは、前記第1偏向制御手段は、前記第1走査電磁石及び第2走査電磁石に対しそれぞれ電源を供給する第1励磁電源及び第2励磁電源と、これら第1及び第2励磁電源に共通の電源制御手段とを備えている。
【0034】
本発明においては、第1走査電磁石及び第2走査電磁石用の励磁電源がそれぞれ別個に設けられることにより、各励磁電流を、増幅率を変えることで調整し、これによって走査点位置を所望に調整することができる。したがって、第1走査電磁石及び第2走査電磁石の間の機器の条件変更や、磁石の設計誤差があった場合にも、走査点がずれないように調節することができ、ビームの第3走査電磁石磁極への衝突回避や照射精度の維持を実現することができる。またこのとき、第1及び第2励磁電源は第2電源制御手段という単一の信号源で制御されることになるので、第1及び第2走査電磁石の位相調節を行う必要がなく、運転が簡単になると共に、位相ずれによる誤照射の可能性を低減することができる。
【0035】
(7)上記目的を達成するために、本発明は、荷電粒子を患者の患部に照射する医療用荷電粒子照射装置において、入射した荷電粒子線ビームを、そのビーム進行方向に垂直な平面内における一の方向へ偏向する第1走査電磁石と、この第1走査電磁石より下流側に設けられ、前記第1走査電磁石で偏向された荷電粒子線ビームを、前記一の方向へ偏向する第2走査電磁石と、この第2走査電磁石より下流側に設けられ、前記第2走査電磁石で偏向された荷電粒子線ビームを、前記ビーム進行方向に垂直な平面内における前記一の方向と直交する他の方向へ偏向する第3走査電磁石とを有する。
【0036】
(8)上記目的を達成するために、本発明は、荷電粒子を患者の患部に照射する医療用荷電粒子照射装置において、入射した荷電粒子線ビームをX方向においてその偏向量を可変に偏向する第1可変偏向手段と、この第1可変偏向手段より下流側に設けられ、前記第1可変偏向手段で偏向された荷電粒子線ビームをX方向においてその偏向量を可変に偏向する第2可変偏向手段と、この第2可変偏向手段より下流側に設けられ、前記第2可変偏向手段で偏向された荷電粒子線ビームを、Y方向においてその偏向量を可変に偏向する第3可変偏向手段と、前記第1可変偏向手段による偏向量と前記第2可変偏向手段による偏向量との所定の比例関係を維持するように、かつ、前記第2可変偏向手段を通過した後の荷電粒子線ビームの走査点が前記第3可変偏向手段の中心部か若しくは少なくとも近傍となるように、前記第1及び第2可変偏向手段を制御する第2偏向制御手段とを有する。
【0037】
【発明の実施の形態】
以下、本発明の一実施形態を図面を参照しつつ説明する。
【0038】
本実施形態の医療用荷電粒子照射装置は、この種のものとして公知の放射線治療装置、例えば陽子線治療装置に適用されるものである。詳細な図示は省略するが、この陽子線治療装置においては、例えば特開2001−353228号公報に記載のもののように、入射器にて発生した荷電粒子(例えば陽子)ビームが、低エネルギビーム輸送装置を通過して主加速器であるシンクロトロンに入射され、このシンクロトロンで治療に必要とされるエネルギ(通常100〜200MeV)まで加速される。シンクロトロンから出射した荷電粒子ビームは、本実施形態の荷電粒子照射装置(回転照射装置)に入射される。
【0039】
図2は、本実施形態による荷電粒子照射装置の全体概略構造を表す概念的側面図である。以下、荷電粒子線ビームの進行方向(照射対象の深さ方向)をZ軸方向(Z方向)、これに垂直な平面内における一の方向をX方向(図2の紙面内左右方向)、その平面内におけるX方向と直交する方向をY方向(図2の紙面と垂直方向)としている。
【0040】
この図2において、本実施形態の荷電粒子照射装置1は、ビーム輸送用の偏向電磁石2A,2B,2C、ビーム収束用の四極電磁石3A,3B,3C、真空粒子チャンバ4、出射ノズル5、及びX方向走査電磁石(第1走査電磁石)101を取り付けた回転ガントリー6と、この回転ガントリー6を所定の回転軸kまわりに回転駆動するモータ(図示せず)とを備えており、モータを駆動して回転ガントリー6を回転軸kまわりに回転させることにより、照射方向を変えられるようになっている。
【0041】
出射ノズル5は、X方向走査電磁石(第2走査電磁石)102と、その下流側に配設したY方向走査電磁石(第3走査電磁石)103と、さらにその下流側に配設され、ビーム拡大の条件に応じて散乱物の厚さを変更できる散乱体ユニット(散乱体)104とを備えている。
【0042】
X方向走査電磁石102は、出射ノズル5外に設けたX方向走査電磁石101とともに、Y方向に磁場を発生し、上記した偏向電磁石2A,2B,2Cと同じ面内にビームを(その偏向量を可変に)偏向する。このとき、X方向走査電磁石101はビームを曲げて位置をずらすように偏向し、X方向走査電磁石102は、X方向走査電磁石101による上記のビームの位置のずれを小さくするように偏向する。これらX方向走査電磁石102,103の励磁コイル(図示せず)は共通のX方向走査電磁石電源105に電源線106a,106bを介して直列に接続されており、そのX方向走査電磁石電源105からの電力によって励磁される。
【0043】
Y方向走査電磁石103は、X方向に磁場を発生し、Y方向にビームを(その偏向量を可変に)偏向する。このY方向走査電磁石103の励磁コイル(図示せず)はY方向走査電磁石電源107に電源線108を介して接続されており、そのY方向走査電磁石電源107からの電力によって励磁される。
【0044】
次に、上記構成の本実施形態の荷電粒子照射装置1の動作を説明する。
【0045】
荷電粒子照射装置1に入力されたビームは、偏向電磁石2A〜Cにより軌道が曲げられかつ四極電磁石3A〜Cによってベータトロン振動が調節されて下流側に輸送され、X方向走査電磁石102の上流側で真空チャンバー4から真空窓を通して空気中に出て、更に空気中を出射ノズル5内各機器により成型されながら通過した後、照射対象Pに照射される。
【0046】
このようなビーム輸送過程において、ビームは、X方向走査電磁石101,102それぞれの磁極間を通過することによって偏向電磁石7と同じ面内においてX方向に偏向され、さらにY方向走査電磁石104の磁極間を通過することによってY方向に偏向される。
【0047】
図3は、上述したX方向走査電磁石電源105及びY方向走査電磁石電源107によりX方向走査電磁石101,102及びY方向走査電磁石103に供給する励磁電流の時間変化の一例を表す図であり、図4はそれら3台の走査電磁石101,102,103によるビーム偏向に起因する、照射面でのビーム中心軸移動量の時間変化の一例を表す図である。
【0048】
図3において、この例では、X方向走査電磁石電源105及びY方向走査電磁石電源107は、その時間変化が正弦波状となるような励磁電流をそれぞれX方向走査電磁石101,102及びY方向走査電磁石103に供給しており、X方向励磁電流とY方向励磁電流とは、位相が互いに90°ずれている。
【0049】
照射面におけるビームの中心軸は、X方向走査電磁石101,102の偏向量に比例した量だけX方向に移動し、Y方向走査電磁石に103よる偏向量に比例した量だけY方向に移動する。これにより、図4に示すように、X方向走査電磁石101によるビーム中心軸移動量とX方向走査電磁石102によるビーム中心軸移動量との和(ビーム中心軸のX方向総移動量)は、Y方向走査電磁石103によるビーム中心軸移動量(ビーム中心軸のY方向移動量)と振幅が略等しく、位相が90°ずれる。この結果、ビーム中心軸が照射対象Pの照射面において円形の軌跡を描くように制御されている。
【0050】
なおこのとき、2つのX方向走査電磁石101,102については、前述のように互いにX方向走査電源105に対し直列に接続されていることにより、下流側のX方向走査電磁石102によるビーム中心軸移動量の振幅がY方向走査電磁石103によるビーム中心軸移動量の振幅よりも若干大きくなる(例えば1.2倍)とともに、上流側のX方向走査電磁石101によるビーム中心軸移動量の振幅が常に上記X方向走査電磁石102のビーム中心軸移動量の振幅と逆方向で比例関係(例えば0.2倍)に維持されるようになっている。このようにして、前述したビーム中心軸のX方向総移動量と、ビーム中心軸移動量のY方向移動量とが略等しい関係が成立されている。
【0051】
図1は、上記のような励磁制御により実現される荷電粒子ビームの通過挙動を表す説明図であり、ビームのX方向走査面内ビーム軸通過範囲及びビーム通過範囲を模式的に示したものである。なお、各走査電磁石101,102,103の磁極の領域のみを併せて示している。このとき一点鎖線mはビーム通過範囲の中心であって、全ての走査電磁石による偏向量が0の場合ビームの中心軸がこの一点鎖線mに一致するものである。また点線nはビーム中心軸のX方向走査面内通過範囲を示し、実線pはビームの通過範囲であってビーム中心軸の周りビーム径分だけ大きな範囲となっているものである。
【0052】
図1及び前述の図2において、ビームは、まず最上流側のX方向走査電磁石101によって曲げて位置をずらすように比較的小さい振幅で偏向され、この結果走査振幅(言い換えればある程度の時間単位でみたときのビーム軸通過範囲、ビーム径を加味すればビーム通過範囲、以下同様)が下流に行くにしたがって徐々に大きくなる。その後、下流側に配置されたX方向走査電磁石102によってビームは逆に上記ビームの位置のずれを小さくするように(ビーム通過範囲が小さくなる方向に)比較的大きな振幅で偏向される。これにより、X方向走査電磁石102よりも下流では走査振幅が再び小さくなってゆく。
【0053】
このとき、前述したように2つのX方向走査電磁石101,102による偏向量が比例関係に維持されることにより、ビーム中心軸の振幅が0になる焦点ができ、この焦点位置Qが事実上のX方向の走査点となる。走査振幅は焦点位置Qに向かって小さくなっていって焦点位置Qで0になった後、その下流側で再度大きくなる。なお、上記のように比例関係に維持される2つのX方向走査電磁石101,102の偏向量の比を小さくするほど、X方向走査点(焦点位置)Qはより下流側へと移動するが、この例では、例えば電磁石のビーム進行方向磁極長さ及びコイル巻数を適切に選択することによって偏向量の比を調節し、図1に示すように走査点Qが概ねY方向走査電磁石103の水平方向中心部(あるいは少なくともその近傍)に来るように予め設定されている。そして、Y方向走査電磁石103の磁極間隔は、ビーム通過範囲に干渉しない限りにおいてなるべく狭くなるように設定されている。
【0054】
以上のようにして各走査電磁石101,102,103により偏向され、Y方向走査電磁石103内の走査点Qから再び走査振幅が徐々に大きくなったビームは、Y方向走査電磁石103のさらに下流側の散乱体104に入射され、散乱体104に備えられた散乱物により散乱される。これにより、ビームを構成する粒子のXY面内分布がビーム中心軸の周りにガウス分布状に広がり、下流に進むに従ってビーム強度分布が広がる。即ち、ビーム通過範囲がさらに拡大される(図1参照)。このとき、照射面位置でのビーム強度分布はほぼXY方向の2次元ガウス分布であって、その標準偏差はビーム中心軸の描く円の半径の約3分の2に調整され、ガウス分布を円形に走査する結果、照射対象Pの照射面上でのビーム走査1周にわたる平均積算ビーム強度分布が走査中心のまわり走査円の約70%の円形領域内部で一様になるように図られている。
【0055】
散乱体104から出射されたビームは、リッジフィルタ5aを通過することによってそのエネルギを決められた割合で減衰され、ビームのエネルギに患部の厚さに応じた分布が与えられる。その後、線量モニタ5bによりビームの線量が計測され(積算通過量や強度分布を計測してもよい。これら各値を基に照射対象Pに吸収させる線量が制御される)、さらにボーラス5cに入力されて患部の下部形状に応じたエネルギ分布とされる(言い換えれば照射対象P内での深さ方向線量分布が調整され)る。そして、コリメータ5dにより患部の水平方向形状に成形され(言い換えれば照射対象Pにおける横方向線量分布が調整され)た後、照射対象(患者の患部)Pに照射される。
【0056】
なお、以上において、X方向走査電磁石101は、各請求項記載の、入射した荷電粒子線ビームをX方向においてその偏向量を可変に偏向する第1可変偏向手段を構成し、X方向走査電磁石102は、第1可変偏向手段より下流側に設けられ、第1可変偏向手段で偏向された荷電粒子線ビームをX方向においてその偏向量を可変に偏向する第2可変偏向手段を構成し、Y方向走査電磁石103は、第2可変偏向手段より下流側に設けられ、第2可変偏向手段で偏向された荷電粒子線ビームを、Y方向においてその偏向量を可変に偏向する第3可変偏向手段を構成する。
【0057】
また、X方向走査電源107が、第1走査電磁石及び第2走査電磁石に共通の単一の励磁電源を構成すると共に、第1走査電磁石による偏向量と第2走査電磁石による偏向量との所定の比例関係を維持するように、それら第1及び第2走査電磁石を制御する第1偏向制御手段をも構成し、さらに、第1可変偏向手段による偏向量と第2可変偏向手段による偏向量との所定の比例関係を維持するように、かつ、第2可変偏向手段を通過した後の荷電粒子線ビームの走査点が第3可変偏向手段の中心部か若しくは少なくとも近傍となるように、第1及び第2可変偏向手段を制御する第2偏向制御手段をも構成する。
【0058】
次に、本実施形態の作用効果を説明する。
【0059】
(1)他のビーム偏向手段(偏向電磁石、四極電磁石)の小型化
上述したように、本実施形態の荷電粒子照射装置1においては、最上流側のX方向走査電磁石101でX方向にビームを曲げて位置をずらすように(ビーム通過範囲を大きくするように)偏向させた後に下流側のX方向走査電磁石102でX方向に上記ビームの位置のずれを小さくするように(ビーム通過範囲を縮小させる)偏向することにより、さらに下流側のY方向走査電磁石103内部にビーム走査点Qを位置させる。これにより、Y方向走査電磁石103におけるX方向ビーム通過範囲を縮小し、その走査点Q以降、Y方向走査電磁石103を通過し再度X方向にビーム軸通過範囲が拡大して所定の大きさとなった粒子線ビームを、コリメータ5dへと導入する。
【0060】
このように、本来ビーム収束機能のそれほど大きくない偏向電磁石や四極電磁石を用いる従来構造(特開平10−282300号公報)と異なり、ビーム収束機能の高いX方向走査電磁石102でX方向にビーム通過範囲を急激に縮小させるので、一旦X方向走査電磁石101でビームを曲げて位置をずらした後にビームの位置のずれを小さくする間におけるその輸送距離を小さくでき、またそのときのX方向ビーム通過範囲の最大値を小さくすることができる。これにより、上記従来構造に比べ、輸送経路に設けられる他の偏向手段としての偏向電磁石2Cの小型化(X方向における寸法の低減)を図ることができる。また、この結果自重による支持構造物(この例では回転ガントリー6)のたわみを低減できるので、たわみによるビーム照射精度の低下を防止できる。
【0061】
(2)コスト低減
この作用について、比較例を参照しつつ以下詳細に説明する。
【0062】
図5は、1台のX方向走査電磁石及び1台のY方向走査電磁石を備えた元来の荷電粒子照射装置にほぼ相当する本実施形態の比較例による荷電粒子照射装置の全体概略構造を表す概念的側面図であり、図6は、そのビームのX方向走査面内ビーム軸通過範囲及びビーム通過範囲を模式的に示したものであり、それぞれ前述の図2及び図1にそれぞれ相当する図である。なお、図5及び図6において、上記実施形態による荷電粒子照射装置1と同等の部分には「′」を添字として追加した符号を付して表し、適宜説明を省略する。
【0063】
これら図5及び図6において、この比較例の荷電粒子照射装置1′では、走査電磁石として、X方向走査電磁石102′、Y方向走査電磁石103′の2つのみがこの順序で鉛直方向に近接配置され、さらにY方向走査電磁石103′の下流側に、散乱体104′が配置されている。
【0064】
ビームは、上記実施形態の荷電粒子照射装置1の照射方法と同様にして、X方向走査電磁石102′とY方向走査電磁石103′によって偏向され、ビーム中心軸が照射面で円形の軌跡を描く。すなわち、上流側のX方向走査電磁石102′の水平方向中心部(あるいは少なくともその近傍)にX方向における走査点Q′があり、この走査点Q′より下流側に行くにしたがって走査振幅が大きくなる。これによって、X方向走査電磁石102′の下流側に位置するY方向走査電磁石103’位置でのX方向ビーム通過範囲は比較的大きくならざるを得ず、Y方向走査電磁石103′のX方向における磁極間隔も大きくなる。
【0065】
このとき、一般に、走査電磁石の消費電力は磁場発生方向における磁極間隔の例えば2乗に比例することから、本比較例においては、Y方向走査電磁石103′の消費電力はX方向走査電磁石102′の例えば5倍程度にも達する。このため、X方向走査電磁石102′及びY方向走査電磁石103′2つを合計した消費電力は著しく増大する。
【0066】
また、電源容量についてみると、一般に、走査電磁石の電源容量は磁場発生方向における磁極間隔に例えば比例することから、Y方向走査電磁石103′を励磁するY方向走査電磁石電源107′に必要な電源容量は、X方向走査電磁石102′を励磁するX方向走査電磁石電源105′の例えば数倍(3〜5倍)程度にも達する。このため、Y方向走査電磁石電源107′については特に大型の電源が必要で、場合によっては通常の市場では入手できず別途製作する必要が生じ、設備コスト(初期コスト)が増大する。
【0067】
これに対して、本実施形態の荷電粒子照射装置1においては、上記比較例のX方向走査電磁石102′1個とY方向走査電磁石103′の合計2個から、X方向走査電磁石101、X方向走査電磁石102、Y方向走査電磁石103の合計3個と1個増える。しかしながら、本願発明者等の検討によれば、本実施形態の荷電粒子照射装置1においては、前述したように最下流側のY方向走査電磁石103におけるX方向ビーム通過範囲の縮小によって磁極間隔を上記比較例のY方向走査電磁石103′の例えば1/2程度にまで低減できることがわかった。この結果、比較例のY方向走査電磁石103′の約1/3程度にまでY方向走査電磁石103の消費電力を低減することができる。一方、上記比較例と比べた場合の新たな追加分となるX方向走査電磁石101は前述のように偏向量が小さく極めて小型のもので足りることから、X方向走査電磁石101,102の消費電力を合計しても上記比較例のX方向走査電磁石102′の消費電力の2倍には至らない。この結果、X方向走査電磁石101、X方向走査電磁石102、Y方向走査電磁石103の3個の合計消費電力を、上記比較例におけるX方向走査電磁石102′及びY方向走査電磁石103′の2個の合計消費電力よりも例えば1/2程度にまで小さくでき、運転コスト(ランニングコスト)を低減することができる。
【0068】
また、電源容量についてみると、本願発明者等の検討によれば、本実施形態の荷電粒子照射装置1においては、前述したように最下流側のY方向走査電磁石103におけるX方向ビーム通過範囲の縮小によって磁極間隔が低減されることから、上記比較例のY方向走査電磁石103′の励磁用の電源107′の60%程度までY方向走査電源107の電源容量を低減することができ、コストを著しく低減できる。これに対して、上記比較例と比べて新たな追加分となるX方向走査電磁石101は偏向量が小さく極めて小型のもので足りることから、X方向走査電磁石用に増加すべき電源容量は上記比較例のX方向走査電源107′の電源容量の1/3程度で足りる。またX方向走査電磁石102用に使用される電源容量については、X方向走査電磁石102位置でのビーム通過範囲が、比較例のX方向走査電磁石102′よりもX方向に大きくなっており、X方向走査電磁石磁場の有効磁場範囲を広げる必要がある。しかしながらこの場合、磁極面に平行な方向(X方向)への伸長であることから、その電源容量の増加は磁極間隔が大きくした場合ほど多くなく、上記比較例のX方向走査電源107′と大差ない程度のもので足りる。これらの結果、総合的に見て、3個の走査電磁石101,102,102の励磁用に用いる電源105,107に必要な設備コスト(初期コスト)は、上記比較例の2個の走査電磁石102′,103′の励磁用に用いる電源105,107に必要な設備コストに比べて、少なくともほぼ等しいか若しくは小さくすることができることがわかった。
【0069】
以上のように、本実施形態の荷電粒子照射装置1においては、1台のX方向走査電磁石及び1台のY方向走査電磁石を備えた比較例に比べ、運転コスト(ランニングコスト)を低減することができ、また設備コストを少なくともほぼ等しいか若しくは小さくできる。したがって、トータルで見ると、比較例よりも確実にコスト低減を図ることができる。
【0070】
(3)その他
▲1▼X方向走査電源共通化による効果
上述したように、本発明においてはX方向走査電磁石101による偏向量とX方向走査電磁石102による偏向量との間に所定の比例関係を維持する必要がある。本実施形態では、2つのX方向走査電磁石101,102を互いに共通のX方向走査電源105に対して直列に接続していることにより、それぞれの走査電磁石101,102によるビーム偏向量を特に調節を行わなくても容易に比例関係にすることができる。したがって、運転が簡単になると共に、ずれによる誤照射の可能性を低減することができる。
【0071】
▲2▼散乱体の配置位置による効果
一般に、ビーム走査とビーム径拡大を組み合わせる横方向ビーム拡大方法では、散乱体とビーム走査位置が離れるほど、照射対象へ到達する照射ビームの質が悪化する。例えば2つの走査電磁石を用いる場合、それら走査電磁石の上流又は下流に散乱物を配置すると、一方の走査電磁石が散乱物から遠くなり、照射ビームの角度分布広がりが大きくなり、横方向ビーム整形の為のコリメータでビームを切り出した際の切れ(半影)が大きくなって、照射性能が悪化する。本実施形態においては、図1に示すように、図6の上記比較例に比べてX方向走査点Qと散乱体104との間の距離を小さくできることから、散乱体104上でのビーム通過範囲を小さくできる。これにより、照射対象Pの照射面位置でのビーム角度分布広がりを小さくできるので、コリメータ5dでビームを横方向に切り出した場合の、横方向ビーム強度分布の切れ(=照射対象内線量分布の半影)を小さくでき、照射精度を向上できる効果がある。また、大きな範囲を走査し、広い領域を照射する照射装置を実現することができる。
【0072】
またこのとき、本実施形態では、X方向走査点QをY方向走査磁石103の中心でなく散乱体104の中心部又はその近傍に来るように、X方向走査電磁石101,102の偏向量の比を調節することもできる。この場合、Y方向走査電磁石103の磁極間隔は若干大きくなるものの、上記した照射対象P内線量分布の半影をより小さくできる効果がある。
【0073】
なお、上記実施形態においては、散乱体104を、最下流側であるY方向走査電磁石103よりも下流側に配置したが、これに限られず、X方向走査電磁石102とY方向走査電磁石103との間に設けても良い。以下、この変形例について、図7及び図8により説明する。
【0074】
図7は、本変形例による荷電粒子照射装置のX方向走査面内ビーム軸通過範囲及びビーム通過範囲を模式的に示した図であり、上記実施形態の図1に相当する図である。なお、この図7において、上記実施形態による荷電粒子照射装置1と同等の部分には同一の符号を付し、適宜説明を省略する。
【0075】
図7において、この変形例の荷電粒子装置では、散乱体104が、X方向走査電磁石102の下流側でY方向走査電磁石103の上流側に(言い換えればX方向走査電磁石102とY方向走査電磁石103との間に)配置されている。その他の点は、上記実施形態の荷電粒子装置1とほぼ同様である。
【0076】
ビームは、上記実施形態の荷電粒子照射装置1の照射方法と同様にしてX方向走査電磁石101,102とY方向走査電磁石103によって偏向される。またこのとき、X方向走査電磁石102とY方向走査電磁石103との間で散乱体104によって散乱され、ビームを構成する粒子のXY面内分布がビーム中心軸の周りにガウス分布状に広がり下流に進むに従ってビーム強度分布が広がる。そして、最終的にビーム中心軸は照射対象Pの照射面で円形の軌跡を描く。
【0077】
本変形例においても、上記実施形態と同様、本発明の基本的な効果である(1)他のビーム偏向手段の小型化及び(2)コスト低減の効果を得ることができる。
【0078】
すなわち、最上流側のX方向走査電磁石101でX方向にビームを曲げて位置をずらすように偏向させた後に下流側のX方向走査電磁石102でX方向にビームの位置のずれを小さくするように偏向させ、さらに散乱体4を介して下流側のY方向走査電磁石103内部にビーム走査点Qを位置させることにより、Y方向走査電磁石103におけるX方向ビーム通過範囲を縮小する。これにより、本来ビーム収束機能のそれほど大きくない偏向電磁石や四極電磁石を用いる従来構造に比べ、偏向電磁石2Cの小型化を図ることができる。またこれにより、1台のX方向走査電磁石及び1台のY方向走査電磁石を備えた元来の構造に比べ、運転コストを低減することができ、また設備コストを少なくともほぼ等しいか若しくは小さくでき、トータルで見てコスト低減を図ることができる。
【0079】
なお、散乱体ユニットがY方向走査電磁石3よりも上流にあるので、Y方向走査電磁石3を通過する際のビーム通過範囲が上記実施形態の場合に比べて若干大きくなるが、全体的には、ほぼ上記実施形態と同程度の効果を得ることができる。特に、例えば散乱体がX方向走査電磁石とY方向走査電磁石の間にあることを前提とした従来の荷電粒子線ビーム照射装置(例えば特開平10−211292号公報)と比較した場合には、上記の効果は顕著である。
【0080】
図8は、1台のX方向走査電磁石及び1台のY方向走査電磁石を備えた上記特開平10−211292号公報による荷電粒子照射装置にほぼ相当する本実施形態の比較例による荷電粒子照射装置のビームのX方向走査面内ビーム軸通過範囲及びビーム通過範囲を模式的に示したものである。なお、図8において、上記実施形態による荷電粒子照射装置1と同等の部分には「″」を添字として追加した符号を付して表し、適宜説明を省略する。
【0081】
この図8において、この比較例の荷電粒子照射装置では、走査電磁石として、X方向走査電磁石102″、Y方向走査電磁石103″の2つのみがこの順序で鉛直方向に近接配置され、さらにそれら電磁石102″と電磁石103″との間に、散乱体104″が配置されている。この場合、先に図6を用いて前述した比較例と同様、X方向走査電磁石102″の水平方向中心部に走査点Q″があり、下流側に行くにしたがって走査振幅が大きくなるが、Y方向走査電磁石103″に入射する前に散乱体104″によってさらに走査振幅が拡大される。これによって、Y方向走査電磁石103″位置でのX方向ビーム通過範囲がかなり大きくなり、Y方向走査電磁石103″のX方向における磁極間隔もかなり大きくなる。
【0082】
これに対して、図7に示した本変形例の荷電粒子照射装置においては、図8と比較して分かるように、最下流側のY方向走査電磁石103におけるX方向ビーム通過範囲の縮小によって磁極間隔を上記比較例のY方向走査電磁石103″に比べて大幅に低減できる。したがって、上記(1)(2)で述べた効果を得ることができることがわかる。すなわち、散乱体104をX方向走査電磁石102とY方向走査電磁石103との間に配置することを前提とした場合においても、Y方向走査電磁石103の磁極間隔を小さくすることができ、コストダウンや他の偏向手段小型化という効果を図ることができる。
【0083】
また本変形例においては、上記に加え、以下のような効果もある。
【0084】
すなわち、図7と図1とを比較してわかるように、本変形例では、散乱体104と照射面との距離が図1に示した実施形態に比べて大きい。これにより、照射面で同じビーム強度分布を形成するために必要な散乱量は小さくなるので、散乱体104を上記実施形態に比べて薄くすることができる。この結果、散乱体104におけるビームのエネルギー損失が小さくなり、照射面に到達するビームのエネルギーが高くなる。したがって、照射対象P内でのビームの到達深度が深くなり、上記実施形態よりも深い標的に対して照射を行うことができる。
【0085】
なお、以上は、3台の走査電磁石101,102,103と散乱体104とを備えた構成を用いた照射法を例にとって説明したが、散乱体の有無は本発明の本質的ではなく、散乱体104の有無に関係なく前述の発明本来の(1)(2)の効果が得られるのは言うまでもない。
【0086】
また、以上は、2台のX方向走査電磁石101,102を、単一のX方向走査電源105で励磁した場合を例にとって説明したが、これにも限られず、2台のX方向走査電磁石101,102の電源を別々(第1操作電磁石としてのX方向走査電磁石101を励磁する第1励磁電源と、第2操作電磁石としてのX方向走査電磁石102を励磁する第2励磁電源)にしても良い。この場合、各励磁電流を、増幅率を変えることで調整し、これによって走査点位置を所望に調整することができる。したがって、X方向走査電磁石101及びX方向走査電磁石102の間の機器の条件変更や、磁石の設計誤差があった場合にも、走査点がずれないように調節することができ、ビームのY方向走査電磁石103磁極への衝突回避や照射精度の維持を実現することができる。またこの際、それぞれの電源を共通の電源制御手段(単一の信号源)で制御するようにすれば、2つのX方向走査電磁石101,102の位相調節を行う必要がなく、運転が簡単になると共に、位相ずれによる誤照射の可能性を低減することができる。
【0087】
さらに、以上は、ビーム中心軌道が照射面で円形となるように走査する場合を例にとって説明したが、これに限られず、例えばテレビ同様にスキャンさせるなど、任意の軌跡を描かせても良い。この場合でも、2台のX方向走査電磁石101,102によるビーム偏向量を比例関係にすることにより、X方向走査点位置Qは変化せず、本実施形態と同様の効果を得ることができる。
【0088】
さらに、以上は、本発明を、照射装置を回転させて照射方向を変更する回転ガントリーに適用した場合を例にとって説明したが、これに限られるものではなく、照射方向が固定の照射装置に対しても適用できる。この場合、一般にX方向走査電磁石101と102との間にビームを偏向する機器を設けないが、本実施形態と同様の効果を得ることができる。
【0089】
【発明の効果】
本発明によれば、ビーム収束機能の高い第2走査電磁石を用いてX方向にビームの位置のずれを小さくするように急激に偏向させるので、一旦第1走査電磁石でビームを曲げて位置をずらすように偏向させた後にビームの位置のずれを小さくするように偏向させるときのビーム通過範囲の最大値を小さくすることができる。したがって、それらの間に通常設けられる偏向電磁石や四極電磁石等の他のビーム偏向手段の小型化を図ることができる。また、第1〜第3走査電磁石3個の合計消費電力を、元来のX方向及びY方向走査電磁石2個の合計消費電力よりも例えば1/2程度にまで小さくして運転コスト(ランニングコスト)を低減できるとともに、第1〜第3走査電磁石3個の励磁用電源に必要な設備コスト(初期コスト)を、元来のX方向及びY方向走査電磁石2個の励磁用電源に必要な設備コストに比べて、少なくともほぼ等しいか若しくは小さくすることができるので、コスト低減を図ることができる。
【図面の簡単な説明】
【図1】本発明の一実施形態による荷電粒子照射装置の励磁制御により実現される荷電粒子ビームの通過挙動を表す説明図である。
【図2】本発明の一実施形態による荷電粒子照射装置の全体概略構造を表す概念的側面図である。
【図3】X方向走査電磁石電源及びY方向走査電磁石電源によりX方向走査電磁石及びY方向走査電磁石に供給する励磁電流の時間変化の一例を表す図である。
【図4】3台の走査電磁石によるビーム偏向に起因する、照射面でのビーム中心軸移動量の時間変化の一例を表す図である。
【図5】1台のX方向走査電磁石及び1台のY方向走査電磁石を備えた元来の荷電粒子照射装置にほぼ相当する本実施形態の比較例による荷電粒子照射装置の全体概略構造を表す概念的側面図である。
【図6】ビームのX方向走査面内ビーム軸通過範囲及びビーム通過範囲を模式的に示したものである。
【図7】散乱体を、X方向走査電磁石とY方向走査電磁石との間に設けた変形例による荷電粒子照射装置のX方向走査面内ビーム軸通過範囲及びビーム通過範囲を模式的に示した図である。
【図8】1台のX方向走査電磁石及び1台のY方向走査電磁石を備えた比較例による荷電粒子照射装置のビームのX方向走査面内ビーム軸通過範囲及びビーム通過範囲を模式的に示したものである。
【符号の説明】
101     X方向走査電磁石(第1走査電磁石、第1可変偏向手段)
102     X方向走査電磁石(第2走査電磁石、第2可変偏向手段)
103     Y方向走査電磁石(第3走査電磁石、第3可変偏向手段)
104     散乱体
107     X方向走査電源(単一の励磁電源、第1偏向制御手段、第2偏向制御手段)
P       照射対象(患部)
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a medical charged particle beam irradiation apparatus that irradiates a charged particle beam to an irradiation target, and in particular, to a medical charged particle irradiation apparatus that expands an irradiation range by scanning a beam using a plurality of scanning electromagnets. About.
[0002]
[Prior art]
Medical charged particle irradiation equipment that treats cancer and tumors by irradiating the affected part of a patient with charged particle beam beams such as protons and carbon ions.The charged particles generated by an ion source and accelerated by an accelerator such as a synchrotron After the irradiation range is formed by the irradiation field forming means in accordance with the shape of the affected part, the affected part of the patient lying on the patient bed is irradiated (for example, see Non-Patent Document 1).
[0003]
The irradiation field forming means forms the irradiation field of the charged particle beam in accordance with the three-dimensional shape of the irradiation target (affected part) and adjusts the dose distribution. , A Z-axis), a horizontal beam forming unit for shaping an irradiation range in a plane (XY plane having an X-axis and a Y-axis), and an irradiation range in a traveling direction (Z-axis) of a charged particle beam. And a range adjuster that forms
[0004]
The range adjuster adjusts the energy of the charged particle beam corresponding to the depth of the irradiation target, and adjusts the charged particle beam according to the shape of the irradiation target in the traveling direction (depth direction) of the charged particle beam. It is to shape.
[0005]
The horizontal beam forming unit expands the charged particle beam in a plane (XY plane) perpendicular to the traveling direction of the charged particle beam, and then cuts out the expanded charged particle beam with a collimator. The charged particle beam is shaped according to the shape of the irradiation target on a plane perpendicular to the traveling direction of the particle beam. The beam expansion at this time includes a method of scanning the beam, a method of expanding the beam diameter, and a method of combining them.
[0006]
In the method of scanning a beam, generally, two beam deflecting means are often arranged so that their respective deflecting surfaces are perpendicular to each other. In particular, when irradiating a high energy beam such as a proton or a heavy particle, the beam is deflected. An electromagnet (scanning electromagnet) is often used as the deflecting means. For example, an X-direction scanning electromagnet having a magnetic pole surface perpendicular to the Y direction and generating a magnetic field in the Y direction and deflecting the beam in the X direction is arranged on the upstream side, and a magnetic pole surface perpendicular to the X direction is provided. A Y-direction scanning electromagnet that generates and deflects the beam in the Y-direction is disposed downstream. In this case, the position of the beam in the X direction is gradually deflected in the upstream X-direction scanning electromagnet and changes linearly after passing through the electromagnet, so that the X-direction scanning point is near the center of the upstream X-direction scanning electromagnet. The scanning point of the beam in the Y direction is substantially near the center of the downstream Y-direction scanning electromagnet.
[0007]
In such a configuration, the beam scanning range of the downstream Y-direction scanning electromagnet is larger than that of the upstream side by the beam scanning by the upstream X-direction scanning electromagnet. Must be increased. Here, in the scanning electromagnet, since the magnetic resistance generally increases as the magnetic pole interval in the magnetic field generation direction increases, the power consumption increases in proportion to the power (for example, square) of the magnetic pole interval. For this reason, the power consumption in the Y-direction scanning electromagnet significantly increases due to the increase in the magnetic pole interval in the X direction as described above, and the operating cost (running cost) increases. In addition, as for the power supply for exciting the scanning electromagnet, the power supply capacity represented by the product of the maximum voltage and the maximum current is generally increased in proportion to the magnetic pole interval in the direction in which the magnetic field is generated. In the above-described configuration, it is necessary to prepare a power source having an extremely large power supply capacity as an exciting power source for the Y-direction scanning electromagnet, which increases the equipment cost (initial cost).
[0008]
To cope with this, conventionally, the X-direction scanning electromagnet and the Y-direction scanning electromagnet are arranged at a large distance, and the beam in the X-direction of the deflection electromagnet and the quadrupole electromagnet provided between these two scanning electromagnets. Japanese Patent Application Laid-Open No. H11-163,087 proposes a technique that utilizes a convergence function to reduce the beam passage range in the X direction near the downstream Y-direction scanning electromagnet.
[0009]
In this conventional technique, a beam is bent in the X direction by an X-direction scanning electromagnet and deflected so as to shift the position, and then the beam is converged in the X direction while passing through them by utilizing the beam convergence function of a bending electromagnet or a quadrupole electromagnet. It is gradually deflected so as to reduce the positional deviation, and focuses once near the downstream Y-direction scanning electromagnet. As a result, the beam scanning point is substantially moved to the focal position (in other words, in the vicinity of the Y-direction scanning electromagnet), and the beam passing range in the X direction of the downstream Y-direction scanning electromagnet is reduced. Then, after the focal point, the particle beam that has passed through the Y-direction scanning electromagnet and has a larger beam passing range in the X direction again is introduced into the collimator.
[0010]
[Non-patent document 1]
“Review of Scientific Instruments Vol. 64 No. 8 (August 1993)” (p.2055-2122)
[Patent Document 1]
JP-A-10-282300 (paragraph number
[0011]
And FIG. 7)
[Problems to be solved by the invention]
In the above prior art, the X-direction beam convergence function of the deflection electromagnet and the quadrupole electromagnet provided between the X-direction scanning electromagnet and the Y-direction scanning electromagnet is used to focus once in the vicinity of the downstream Y-direction scanning electromagnet. The beam passage range in the directional scanning electromagnet is reduced. As a result, it is possible to prevent an increase in power consumption and an increase in the excitation power supply capacity due to an increase in the magnetic pole interval in the X direction in the Y-direction scanning electromagnet, thereby achieving cost reduction.
[0013]
However, since the beam convergence function of the above-mentioned bending magnets and quadrupole magnets is not so large in nature, the beam position of the charged particle beam once deflected so as to shift the position by bending the beam with the X-direction scanning electromagnet is reversed. While deflecting to be smaller, the maximum value of the beam passing range in the X direction becomes relatively large along with the size of the transport distance, and accordingly, the beam passing range in the X direction by these bending or quadrupole electromagnets becomes larger. Become. That is, although the size of the scanning electromagnet can be reduced, the size of other beam deflecting means (in this example, a quadrupole electromagnet or a deflection electromagnet having a large structure) increases in the X direction. For this reason, the deflection of the support structure increases due to the increase in their own weight (particularly in a rotating gantry as in this known example), and as a result, it becomes difficult to improve the beam irradiation accuracy.
[0014]
SUMMARY OF THE INVENTION An object of the present invention is to provide a medical charged particle irradiation apparatus capable of reducing costs without increasing the size of other beam deflecting means.
[0015]
[Means for Solving the Problems]
(1) In order to achieve the above object, the present invention provides a medical charged particle irradiation apparatus for irradiating an affected part of a patient with charged particles, wherein the charged particle beam is incident on a plane perpendicular to the beam traveling direction. A first scanning electromagnet that bends the beam in one direction to deflect the beam so as to shift the position, and a charged particle beam provided downstream of the first scanning electromagnet and deflected by the first scanning electromagnet. A second scanning electromagnet that deflects to reduce the deviation of the beam position in the direction of, and a charged particle beam that is provided downstream of the second scanning electromagnet and is deflected by the second scanning electromagnet, A third scanning electromagnet that deflects in another direction orthogonal to the one direction in a plane perpendicular to the beam traveling direction.
[0016]
In the present invention, the beam is deflected by, for example, bending in the X direction by the first scanning electromagnet to shift the position, and then deflected by the second scanning electromagnet on the downstream side so as to reduce the deviation of the beam position in the X direction. This makes it possible to focus once, for example, near the Y-direction third scanning electromagnet further downstream. Thereby, the beam scanning point is substantially moved to the focal position (in other words, in the vicinity of the third scanning electromagnet), the beam passing range in the X direction of the downstream third scanning electromagnet is reduced, and after the focal point, the third scanning electromagnet is moved. , The beam passing range is expanded again in the X direction, and the particle beam having a predetermined size is introduced into the collimator.
[0017]
At this time, the beam passing range is sharply reduced in the X direction by using a second scanning electromagnet having a high beam deflection function without using a deflection electromagnet or a quadrupole electromagnet which originally has a beam focusing function not so large as in the conventional structure. Therefore, it is possible to reduce the transport distance while reducing the displacement of the beam after the beam is once displaced by bending the beam by the first scanning electromagnet, and to reduce the maximum value of the beam passage range at that time. Can be. Therefore, it is possible to reduce the size of other beam deflecting means such as a deflection electromagnet or a quadrupole electromagnet usually provided between them.
[0018]
On the other hand, at this time, in the present invention, the first scanning electromagnet (X direction), the second scanning electromagnet (X direction), the third Since the number of the scanning electromagnets (Y direction) is increased by one, the power consumption and the power supply capacity are separately added.
[0019]
However, in terms of power consumption, for example, in the above-described original structure in which one X-direction scanning electromagnet and one Y-direction scanning electromagnet are arranged, the downstream Y-direction scanning electromagnet responds to an increase in the X-direction beam passage range in the downstream Y-direction scanning electromagnet. The magnetic pole interval in the X direction, which is the direction in which the magnetic field is generated, is large. As described above, since the power consumption is proportional to, for example, the square of the magnetic pole interval in the magnetic field generation direction, the power consumption of the Y-direction scanning electromagnet reaches, for example, about five times that of the X-direction scanning electromagnet. Therefore, the total power consumption of the two X-direction scanning electromagnets and two Y-direction scanning electromagnets is significantly increased.
[0020]
In the present invention, as described above, the distance between the magnetic poles can be reduced to, for example, about 元 of the original structure by reducing the X-direction beam passage range of the third scanning electromagnet on the most downstream side. The power consumption of the third scanning electromagnet can be reduced to about 1/3 of the electromagnet. On the other hand, the first additional scanning electromagnet, which has a small amount of deflection and needs only an extremely small size, is sufficient even if the power consumption of the first and second scanning electromagnets is summed up. It does not reach twice the power consumption of the electromagnet. As a result, the total power consumption of the first to third scanning electromagnets can be reduced to, for example, about 1 / of the total power consumption of the original two X-direction and Y-direction scanning electromagnets. Cost) can be reduced.
[0021]
Regarding the power supply capacity, in the above-described original structure in which one X-direction scanning electromagnet and one Y-direction scanning electromagnet are arranged, as described above, the power supply capacity is, for example, proportional to the magnetic pole interval in the magnetic field generation direction. Therefore, the power supply capacity required for the excitation power supply of the Y-direction scanning electromagnet reaches, for example, about several times (3 to 5 times) the excitation power supply of the X-direction scanning electromagnet. For this reason, the Y-direction scanning electromagnet requires a particularly large power supply, and in some cases, it is not available in a normal market and needs to be separately manufactured, which increases the equipment cost (initial cost).
[0022]
In the present invention, since the gap between the magnetic poles is reduced by reducing the X-direction beam passage range of the third scanning electromagnet on the most downstream side as described above, the third scanning electromagnet is reduced to about 60% of the original Y-direction scanning electromagnet. The power capacity of the excitation power source for the scanning electromagnet can be reduced, and the cost can be significantly reduced. On the other hand, the first scanning electromagnet, which is a newly added component, has a small deflection amount and requires only an extremely small one, so the power supply capacity used for the first scanning electromagnet is the same as the power supply of the original X-direction scanning electromagnet. A capacity of about 1/3 of the capacity is sufficient, and a power supply capacity used for the second scanning electromagnet is not much different from the original X-direction scanning electromagnet. As a result, when viewed comprehensively, the equipment cost (initial cost) required for the excitation power supply of the first to third scanning electromagnets is reduced to the original excitation power supply of the two X- and Y-direction scanning electromagnets. It can be at least approximately equal to or less than the required equipment costs.
[0023]
As described above, in the present invention, the cost can be reduced without increasing the size of other beam deflecting means.
[0024]
(2) In order to achieve the above object, the present invention provides a medical charged particle irradiation apparatus for irradiating an affected part of a patient with charged particles, wherein the incident charged particle beam is focused on a plane perpendicular to the beam traveling direction. A first scanning electromagnet which bends the beam in one direction to deflect so as to shift the position, and a charged particle beam beam provided downstream of the first scanning electromagnet and deflected by the first scanning electromagnet, A second scanning electromagnet that deflects to reduce the deviation of the beam position in one direction, and a charged particle beam that is provided downstream of the second scanning electromagnet and deflected by the second scanning electromagnet, A third scanning electromagnet that deflects in a direction perpendicular to the one direction in a plane perpendicular to the beam traveling direction, a deflection amount by the first scanning electromagnet, and a deflection amount by the second scanning electromagnet; So as to maintain a predetermined proportional relationship, and a first deflecting control means for controlling these first and second scanning magnets.
[0025]
By maintaining the proportional relationship between the amount of deflection by the first scanning electromagnet and the amount of deflection by the second scanning electromagnet, the beam is bent to increase the positional deviation → reduced positional deviation → the focus of the particle beam beam near the third scanning electromagnet. Scanning can be performed easily and reliably while maintaining the behavior.
[0026]
(3) In the above (1) or (2), preferably, a scatterer for scattering a charged particle beam is provided downstream of the third scanning electromagnet.
[0027]
When a scatterer is provided, the greater the distance from the beam scanning point to the scatterer, the higher the possibility that various beams will be incident on the scatterer from a wider range in more directions, and after the light is emitted from the scatterer. As a result of the beam outline becoming ambiguous, the angular distribution spread of the irradiation beam becomes large, and the dose distribution in the irradiation target after cutting out the beam by the collimator (the penumbra) becomes large, making it difficult to improve the irradiation accuracy.
[0028]
In the present invention, since the beam scanning point is substantially moved to the vicinity of the third scanning electromagnet, which is the focal position, as described in the above (1), by providing a scatterer downstream of the third scanning electromagnet, The distance between the scanning point and the scatterer can be reduced. Thereby, the penumbra of the dose distribution in the irradiation target can be reduced and the irradiation accuracy can be improved. In addition, an irradiation device that scans a large area and irradiates a wide area can be realized. In particular, when the beam scanning point is set in the vicinity of the scatterer, the penumbra of the dose distribution in the irradiation target can be made smaller, and the irradiation accuracy can be further improved.
[0029]
(4) In the above (1) or (2), and preferably, a scatterer for scattering a charged particle beam is provided downstream of the second scanning electromagnet and upstream of the third scanning electromagnet.
[0030]
By disposing the scatterer on the upstream side of the third scanning electromagnet in the Y direction, the distance between the scatterer and the irradiation surface is increased, and the amount of scattering required to form the same beam intensity distribution on the irradiation surface is reduced. be able to. Thereby, the thickness of the scatterer can be reduced, and the energy loss of the beam in the scatterer can be reduced. As a result, the energy of the beam reaching the irradiation surface increases, so that the beam reaches a deeper position within the irradiation target, so that a deeper target can be irradiated.
[0031]
(5) In (2) above, preferably, the first deflection control means includes a single excitation power supply common to the first scanning electromagnet and the second scanning electromagnet, and the first scanning electromagnet and the second scanning electromagnet include In the scanning electromagnet, each excitation coil is connected in series to the single excitation power supply.
[0032]
Thus, the beam deflection amounts of the first scanning electromagnet and the second scanning electromagnet can be easily made to have a proportional relationship without any particular adjustment. Therefore, the operation can be simplified, and the possibility of erroneous irradiation due to the deviation can be reduced.
[0033]
(6) In (2) above, preferably, the first deflection control means includes a first excitation power supply and a second excitation power supply for supplying power to the first scanning electromagnet and the second scanning electromagnet, respectively. Power supply control means common to the first and second excitation power supplies is provided.
[0034]
In the present invention, the excitation power supply for the first scanning electromagnet and the excitation power supply for the second scanning electromagnet are separately provided, so that each excitation current is adjusted by changing the amplification factor, thereby adjusting the scanning point position as desired. can do. Therefore, even if the condition of the device between the first scanning electromagnet and the second scanning electromagnet is changed, or if there is a design error in the magnet, the scanning point can be adjusted so as not to shift, and the third scanning electromagnet of the beam can be adjusted. It is possible to avoid collision with the magnetic pole and maintain irradiation accuracy. At this time, since the first and second excitation power supplies are controlled by a single signal source called the second power supply control means, it is not necessary to adjust the phases of the first and second scanning electromagnets, and the operation is not performed. In addition to the simplification, the possibility of erroneous irradiation due to a phase shift can be reduced.
[0035]
(7) In order to achieve the above object, the present invention provides a medical charged particle irradiation apparatus for irradiating an affected part of a patient with charged particles, wherein the charged particle beam is incident on a plane perpendicular to the beam traveling direction. A first scanning electromagnet deflecting in one direction, and a second scanning electromagnet provided downstream of the first scanning electromagnet and deflecting the charged particle beam deflected by the first scanning electromagnet in the one direction And a charged particle beam provided downstream of the second scanning electromagnet and deflected by the second scanning electromagnet in a direction perpendicular to the one direction in a plane perpendicular to the beam traveling direction. A third scanning electromagnet for deflection.
[0036]
(8) In order to achieve the above object, the present invention provides a medical charged particle irradiation apparatus for irradiating an affected part of a patient with charged particles by deflecting an incident charged particle beam in an X direction variably. A first variable deflecting device, and a second variable deflecting device provided downstream of the first variable deflecting device for deflecting the amount of deflection of the charged particle beam deflected by the first variable deflecting device in the X direction. Means, and third variable deflecting means provided downstream of the second variable deflecting means and variably deflecting the amount of deflection of the charged particle beam deflected by the second variable deflecting means in the Y direction. Scanning of the charged particle beam so as to maintain a predetermined proportional relationship between the amount of deflection by the first variable deflection unit and the amount of deflection by the second variable deflection unit, and after passing through the second variable deflection unit Point ahead As the center or or at least near the third variable deflection means, and a second deflecting control means for controlling said first and second variable deflection means.
[0037]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
[0038]
The medical charged particle irradiation apparatus according to the present embodiment is applied to a known radiotherapy apparatus such as a proton beam therapy apparatus. Although not shown in detail, in this proton beam therapy system, a charged particle (eg, proton) beam generated by an injector is transported by a low energy beam, as described in, for example, JP-A-2001-353228. After passing through the apparatus, it is incident on the synchrotron, which is the main accelerator, and accelerated by the synchrotron to the energy required for treatment (typically 100 to 200 MeV). The charged particle beam emitted from the synchrotron is incident on the charged particle irradiation device (rotary irradiation device) of the present embodiment.
[0039]
FIG. 2 is a conceptual side view illustrating the overall schematic structure of the charged particle irradiation device according to the present embodiment. Hereinafter, the traveling direction of the charged particle beam (the depth direction of the irradiation target) is the Z-axis direction (the Z direction), and one direction in a plane perpendicular thereto is the X direction (the left-right direction in the plane of the paper of FIG. 2). A direction orthogonal to the X direction in the plane is defined as a Y direction (a direction perpendicular to the plane of FIG. 2).
[0040]
In FIG. 2, the charged particle irradiation apparatus 1 of this embodiment includes a deflection electromagnet 2A, 2B, 2C for beam transport, quadrupole electromagnets 3A, 3B, 3C for beam convergence, a vacuum particle chamber 4, an emission nozzle 5, and A rotating gantry 6 to which an X-direction scanning electromagnet (first scanning electromagnet) 101 is attached, and a motor (not shown) for rotating the rotating gantry 6 around a predetermined rotation axis k are provided. By rotating the rotating gantry 6 around the rotation axis k, the irradiation direction can be changed.
[0041]
The emission nozzle 5 is provided with an X-direction scanning electromagnet (second scanning electromagnet) 102, a Y-direction scanning electromagnet (third scanning electromagnet) 103 disposed downstream thereof, and further disposed downstream thereof for beam expansion. A scatterer unit (scatterer) 104 that can change the thickness of the scatterer according to conditions is provided.
[0042]
The X-direction scanning electromagnet 102 generates a magnetic field in the Y-direction together with the X-direction scanning electromagnet 101 provided outside the emission nozzle 5, and emits a beam (with the amount of deflection in the same plane as the deflection electromagnets 2A, 2B, and 2C). (Variable) deflection. At this time, the X-direction scanning electromagnet 101 deflects so as to shift the position by bending the beam, and the X-direction scanning electromagnet 102 deflects so as to reduce the above-described displacement of the beam position caused by the X-direction scanning electromagnet 101. The excitation coils (not shown) of these X-direction scanning electromagnets 102 and 103 are connected in series to a common X-direction scanning electromagnet power supply 105 via power lines 106a and 106b. Excited by electric power.
[0043]
The Y-direction scanning electromagnet 103 generates a magnetic field in the X direction, and deflects the beam in the Y direction (variably deflects the beam). An excitation coil (not shown) of the Y-direction scanning electromagnet 103 is connected to a Y-direction scanning electromagnet power supply 107 via a power supply line 108, and is excited by power from the Y-direction scanning electromagnet power supply 107.
[0044]
Next, the operation of the charged particle irradiation apparatus 1 of the present embodiment having the above configuration will be described.
[0045]
The beam input to the charged particle irradiation device 1 is transported downstream with its trajectory bent by the bending electromagnets 2A to 2C and adjusted in betatron oscillation by the quadrupole electromagnets 3A to 3C, and upstream of the X-direction scanning electromagnet 102. After exiting through the vacuum window from the vacuum chamber 4 into the air and passing through the air while being molded by various devices in the emission nozzle 5, the irradiation target P is irradiated.
[0046]
In such a beam transport process, the beam is deflected in the X direction in the same plane as the deflection electromagnet 7 by passing between the magnetic poles of the X-direction scanning electromagnets 101 and 102, and further, between the magnetic poles of the Y-direction scanning electromagnet 104. Is deflected in the Y direction.
[0047]
FIG. 3 is a diagram illustrating an example of a temporal change of an exciting current supplied to the X-direction scanning electromagnets 101 and 102 and the Y-direction scanning electromagnet 103 by the above-described X-direction scanning electromagnet power supply 105 and Y-direction scanning electromagnet power supply 107. FIG. 4 is a diagram showing an example of a temporal change in the movement amount of the beam center axis on the irradiation surface due to beam deflection by the three scanning electromagnets 101, 102, and 103.
[0048]
In FIG. 3, in this example, the X-direction scanning electromagnet power supply 105 and the Y-direction scanning electromagnet power supply 107 supply exciting currents whose time changes become sinusoidal, respectively, to the X-direction scanning electromagnets 101 and 102 and the Y-direction scanning electromagnet 103. And the phases of the X-direction exciting current and the Y-direction exciting current are shifted from each other by 90 °.
[0049]
The central axis of the beam on the irradiation surface moves in the X direction by an amount proportional to the amount of deflection of the X-direction scanning electromagnets 101 and 102, and moves in the Y direction by an amount proportional to the amount of deflection by the Y-direction scanning electromagnet 103. Thereby, as shown in FIG. 4, the sum of the movement amount of the beam center axis by the X-direction scanning electromagnet 101 and the movement amount of the beam center axis by the X-direction scanning electromagnet 102 (the total movement amount of the beam center axis in the X direction) is Y The amplitude is substantially equal to the movement amount of the beam center axis (movement amount of the beam center axis in the Y direction) by the direction scanning electromagnet 103, and the phase is shifted by 90 °. As a result, the beam center axis is controlled so as to draw a circular locus on the irradiation surface of the irradiation target P.
[0050]
At this time, since the two X-direction scanning electromagnets 101 and 102 are connected in series to the X-direction scanning power supply 105 as described above, the beam center axis movement by the downstream X-direction scanning electromagnet 102 is performed. The amplitude of the amount is slightly larger (for example, 1.2 times) than the amplitude of the beam center axis movement amount by the Y-direction scanning electromagnet 103, and the amplitude of the beam center axis movement amount by the upstream X-direction scanning electromagnet 101 is always the above. A proportional relationship (for example, 0.2 times) is maintained in the direction opposite to the amplitude of the beam center axis movement amount of the X-direction scanning electromagnet 102. In this way, a relationship is established in which the total amount of movement of the beam center axis in the X direction and the amount of movement of the beam center axis in the Y direction are substantially equal to each other.
[0051]
FIG. 1 is an explanatory diagram showing a passing behavior of a charged particle beam realized by the above excitation control, and schematically shows a beam axis passing range and a beam passing range in the X-direction scanning plane of the beam. is there. Note that only the magnetic pole regions of the scanning electromagnets 101, 102, and 103 are also shown. At this time, the dashed line m is the center of the beam passage range, and the center axis of the beam coincides with the dashed line m when the deflection amount by all the scanning electromagnets is zero. A dotted line n indicates a passing range of the beam center axis in the X-direction scanning plane, and a solid line p indicates a beam passing range which is larger by the beam diameter around the beam center axis.
[0052]
In FIG. 1 and FIG. 2 described above, the beam is first deflected with a relatively small amplitude so as to be displaced by being bent by the X-direction scanning electromagnet 101 on the most upstream side. As a result, the scanning amplitude (in other words, in a certain unit of time) In consideration of the beam axis passing range and the beam diameter as viewed, the beam passing range, the same applies hereinafter) gradually increases toward the downstream. Thereafter, the beam is deflected by the X-direction scanning electromagnet 102 disposed on the downstream side with a relatively large amplitude so that the deviation of the beam position is reduced (in a direction in which the beam passage range is reduced). As a result, the scanning amplitude becomes smaller again downstream of the X-direction scanning electromagnet 102.
[0053]
At this time, since the amount of deflection by the two X-direction scanning electromagnets 101 and 102 is maintained in a proportional relationship as described above, a focal point where the amplitude of the beam center axis becomes 0 is formed, and this focal position Q is effectively reduced. This is a scanning point in the X direction. The scanning amplitude decreases toward the focal position Q, becomes 0 at the focal position Q, and increases again downstream thereof. As the ratio between the deflection amounts of the two X-direction scanning electromagnets 101 and 102 maintained in a proportional relationship as described above decreases, the X-direction scanning point (focal position) Q moves further downstream. In this example, the ratio of the amount of deflection is adjusted by, for example, appropriately selecting the magnetic pole length and the number of coil turns in the beam traveling direction of the electromagnet, so that the scanning point Q is substantially in the horizontal direction of the Y-direction scanning electromagnet 103 as shown in FIG. It is preset so as to come to the center (or at least in the vicinity thereof). The interval between the magnetic poles of the Y-direction scanning electromagnet 103 is set to be as small as possible as long as it does not interfere with the beam passage range.
[0054]
The beam deflected by each of the scanning electromagnets 101, 102, and 103 as described above and whose scanning amplitude gradually increases from the scanning point Q in the Y-direction scanning electromagnet 103 is further downstream of the Y-direction scanning electromagnet 103. The light enters the scatterer 104 and is scattered by the scatterer provided on the scatterer 104. As a result, the distribution of particles constituting the beam in the XY plane spreads in a Gaussian manner around the beam center axis, and the beam intensity distribution spreads downstream. That is, the beam passage range is further expanded (see FIG. 1). At this time, the beam intensity distribution at the irradiation surface position is substantially a two-dimensional Gaussian distribution in the XY directions, and its standard deviation is adjusted to about two-thirds of the radius of the circle drawn by the beam central axis. As a result, the average integrated beam intensity distribution over one round of beam scanning on the irradiation surface of the irradiation target P is made uniform within a circular area around the scanning center and about 70% of the scanning circle. .
[0055]
The beam emitted from the scatterer 104 passes through the ridge filter 5a, the energy of which is attenuated at a predetermined ratio, and the energy of the beam is given a distribution according to the thickness of the affected part. Thereafter, the dose of the beam is measured by the dose monitor 5b (the integrated passing amount or the intensity distribution may be measured. Based on these values, the dose absorbed by the irradiation target P is controlled) and further input to the bolus 5c. Thus, the energy distribution according to the shape of the lower part of the affected part is obtained (in other words, the dose distribution in the depth direction within the irradiation target P is adjusted). Then, after being formed into a horizontal shape of the affected part by the collimator 5d (in other words, the horizontal dose distribution in the irradiation target P is adjusted), the irradiation target (the affected part of the patient) P is irradiated.
[0056]
In the above, the X-direction scanning electromagnet 101 constitutes the first variable deflection means for deflecting the amount of deflection of the incident charged particle beam in the X direction variably, as described in each claim. Constitutes second variable deflection means provided downstream of the first variable deflection means and variably deflects the amount of deflection of the charged particle beam deflected by the first variable deflection means in the X direction; The scanning electromagnet 103 is provided downstream of the second variable deflecting means, and constitutes a third variable deflecting means for deflecting the charged particle beam deflected by the second variable deflecting means variably in the Y direction. I do.
[0057]
Further, the X-direction scanning power supply 107 constitutes a single excitation power supply common to the first scanning electromagnet and the second scanning electromagnet, and a predetermined amount of deflection between the first scanning electromagnet and the second scanning electromagnet. First deflection control means for controlling the first and second scanning electromagnets is also configured so as to maintain the proportional relationship, and furthermore, the deflection amount by the first variable deflection means and the deflection amount by the second variable deflection means are controlled. In order to maintain a predetermined proportional relationship, and so that the scanning point of the charged particle beam after passing through the second variable deflecting means is located at the center of the third variable deflecting means or at least in the vicinity thereof, It also constitutes a second deflection control means for controlling the second variable deflection means.
[0058]
Next, the operation and effect of the present embodiment will be described.
[0059]
(1) Miniaturization of other beam deflecting means (deflecting electromagnet, quadrupole electromagnet)
As described above, in the charged particle irradiation apparatus 1 of the present embodiment, the beam is bent in the X direction by the X-direction scanning electromagnet 101 on the most upstream side to shift the position (to increase the beam passage range). After that, the beam is deflected by the downstream X-direction scanning electromagnet 102 in the X direction so as to reduce the displacement of the beam in the X direction (to reduce the beam passage range), so that the beam is further deflected inside the Y-direction scanning electromagnet 103. The beam scanning point Q is located. As a result, the X-direction beam passage range of the Y-direction scanning electromagnet 103 is reduced, and after the scanning point Q, the beam axis passes through the Y-direction scanning electromagnet 103 and expands again in the X direction to have a predetermined size. The particle beam is introduced into the collimator 5d.
[0060]
As described above, unlike the conventional structure (Japanese Patent Laid-Open No. 10-282300) using a bending electromagnet or a quadrupole electromagnet which does not have a beam converging function, the X-direction scanning electromagnet 102 having a high beam converging function has a beam passing range in the X direction. Is sharply reduced, so that the beam can be bent once by the X-direction scanning electromagnet 101 to shift its position, and then the transport distance can be reduced while reducing the shift in the position of the beam. The maximum value can be reduced. This makes it possible to reduce the size (reduction in the dimension in the X direction) of the deflecting electromagnet 2C as another deflecting means provided in the transport path as compared with the above-described conventional structure. Further, as a result, the deflection of the support structure (the rotating gantry 6 in this example) due to its own weight can be reduced, so that the beam irradiation accuracy due to the deflection can be prevented from lowering.
[0061]
(2) Cost reduction
This operation will be described in detail below with reference to a comparative example.
[0062]
FIG. 5 shows an overall schematic structure of a charged particle irradiation apparatus according to a comparative example of the present embodiment, which is substantially equivalent to an original charged particle irradiation apparatus provided with one X-direction scanning electromagnet and one Y-direction scanning electromagnet. FIG. 6 is a conceptual side view, and FIG. 6 schematically shows a beam axis passing range and a beam passing range in the X-direction scanning plane of the beam, and respectively correspond to FIGS. 2 and 1 described above. It is. In FIGS. 5 and 6, parts equivalent to those of the charged particle irradiation apparatus 1 according to the above-described embodiment are denoted by reference numerals with “′” added as a suffix, and description thereof is omitted as appropriate.
[0063]
5 and 6, in the charged particle irradiation apparatus 1 'of this comparative example, only two scanning electromagnets, an X-direction scanning electromagnet 102' and a Y-direction scanning electromagnet 103 ', are vertically adjacently arranged in this order. Further, a scatterer 104 'is disposed downstream of the Y-direction scanning electromagnet 103'.
[0064]
The beam is deflected by the X-direction scanning electromagnet 102 'and the Y-direction scanning electromagnet 103' in the same manner as in the irradiation method of the charged particle irradiation apparatus 1 of the above embodiment, and the center axis of the beam draws a circular locus on the irradiation surface. That is, there is a scanning point Q 'in the X direction at the center (or at least in the vicinity) of the X-direction scanning electromagnet 102' on the upstream side in the horizontal direction, and the scanning amplitude increases toward the downstream side from the scanning point Q '. . Accordingly, the X-direction beam passing range at the position of the Y-direction scanning electromagnet 103 'located downstream of the X-direction scanning electromagnet 102' must be relatively large, and the magnetic poles of the Y-direction scanning electromagnet 103 'in the X direction are inevitable. The spacing also increases.
[0065]
At this time, since the power consumption of the scanning electromagnet is generally proportional to, for example, the square of the magnetic pole interval in the magnetic field generation direction, in this comparative example, the power consumption of the Y-direction scanning electromagnet 103 ′ is For example, it reaches about five times. Therefore, the total power consumption of the two X-direction scanning electromagnets 102 'and two Y-direction scanning electromagnets 103' is significantly increased.
[0066]
Further, regarding the power supply capacity, since the power supply capacity of the scanning electromagnet is generally proportional to, for example, the magnetic pole interval in the magnetic field generation direction, the power supply capacity required for the Y-direction scanning electromagnet power supply 107 ′ for exciting the Y-direction scanning electromagnet 103 ′ is provided. Is, for example, about several times (3 to 5 times) the power of the X-direction scanning electromagnet power supply 105 'for exciting the X-direction scanning electromagnet 102'. For this reason, a particularly large power supply is required for the Y-direction scanning electromagnet power supply 107 ′. In some cases, the power supply is not available in a normal market and needs to be manufactured separately, which increases the equipment cost (initial cost).
[0067]
On the other hand, in the charged particle irradiation device 1 of the present embodiment, the X-direction scanning electromagnet 101 and the X-direction scanning electromagnet The number of the scanning electromagnets 102 and the Y-direction scanning electromagnets 103 is increased by one in total of three. However, according to the study by the inventors of the present application, in the charged particle irradiation apparatus 1 of the present embodiment, as described above, the magnetic pole interval is reduced by reducing the X-direction beam passage range of the most downstream Y-direction scanning electromagnet 103. It was found that the size of the Y-directional scanning electromagnet 103 'of the comparative example can be reduced to, for example, about 1/2. As a result, the power consumption of the Y-direction scanning electromagnet 103 can be reduced to about 1/3 of the Y-direction scanning electromagnet 103 'of the comparative example. On the other hand, since the X-direction scanning electromagnet 101, which is a new addition when compared with the comparative example, has only a small deflection amount and is extremely small as described above, the power consumption of the X-direction scanning electromagnets 101 and 102 is reduced. The sum does not reach twice the power consumption of the X-direction scanning electromagnet 102 'of the comparative example. As a result, the total power consumption of the X-direction scanning electromagnet 101, the X-direction scanning electromagnet 102, and the Y-direction scanning electromagnet 103 is reduced by the two of the X-direction scanning electromagnet 102 'and the Y-direction scanning electromagnet 103' in the comparative example. For example, the power consumption can be reduced to about 1/2 of the total power consumption, and the operating cost (running cost) can be reduced.
[0068]
As for the power supply capacity, according to the study by the inventors of the present application, in the charged particle irradiation apparatus 1 of the present embodiment, as described above, the X-direction beam passing range of the Y-direction scanning electromagnet 103 on the most downstream side is described. Since the magnetic pole interval is reduced by the reduction, the power supply capacity of the Y-direction scanning power supply 107 can be reduced to about 60% of the excitation power supply 107 'of the Y-direction scanning electromagnet 103' of the comparative example, and the cost is reduced. It can be significantly reduced. On the other hand, since the X-direction scanning electromagnet 101, which is a new addition compared with the comparative example, has a small deflection amount and is extremely small, the power supply capacity to be increased for the X-direction scanning electromagnet is different from the comparative example. About 3 of the power supply capacity of the X-direction scanning power supply 107 ′ in the example is sufficient. Regarding the power supply capacity used for the X-direction scanning electromagnet 102, the beam passage range at the position of the X-direction scanning electromagnet 102 is larger in the X direction than the X-direction scanning electromagnet 102 'of the comparative example. It is necessary to extend the effective magnetic field range of the scanning magnet magnetic field. However, in this case, since the extension is in the direction (X direction) parallel to the magnetic pole surface, the increase in the power supply capacity is not so large as when the magnetic pole interval is increased, and is largely different from the X direction scanning power supply 107 'of the comparative example. Not enough is enough. As a result, when viewed comprehensively, the equipment cost (initial cost) required for the power supplies 105 and 107 used for exciting the three scanning electromagnets 101, 102 and 102 is reduced by the two scanning electromagnets 102 of the comparative example. It has been found that the equipment costs required for the power sources 105 and 107 used for exciting the '′ and 103' can be at least substantially equal to or smaller than the equipment costs.
[0069]
As described above, in the charged particle irradiation apparatus 1 of the present embodiment, the operation cost (running cost) is reduced as compared with the comparative example including one X-direction scanning electromagnet and one Y-direction scanning electromagnet. And equipment costs can be at least approximately equal or less. Therefore, in total, the cost can be reduced more reliably than in the comparative example.
[0070]
(3) Other
(1) Effect of sharing the X-direction scanning power supply
As described above, in the present invention, it is necessary to maintain a predetermined proportional relationship between the amount of deflection by the X-direction scanning electromagnet 101 and the amount of deflection by the X-direction scanning electromagnet 102. In the present embodiment, since the two X-direction scanning electromagnets 101 and 102 are connected in series to a common X-direction scanning power supply 105, the amount of beam deflection by the respective scanning electromagnets 101 and 102 is particularly adjusted. Even without doing so, a proportional relationship can be easily obtained. Therefore, the operation can be simplified, and the possibility of erroneous irradiation due to the deviation can be reduced.
[0071]
(2) Effect of scatterer position
In general, in the lateral beam expansion method that combines beam scanning and beam diameter expansion, the quality of an irradiation beam reaching an irradiation target deteriorates as the scatterer and the beam scanning position are farther apart. For example, when two scanning electromagnets are used, if a scattered object is arranged upstream or downstream of the scanning electromagnets, one of the scanning electromagnets will be farther from the scattered object, and the angular distribution of the irradiation beam will be increased. When the beam is cut out by the collimator (1), the cut (hemi-shadow) becomes large, and the irradiation performance deteriorates. In the present embodiment, as shown in FIG. 1, the distance between the X-direction scanning point Q and the scatterer 104 can be reduced as compared with the comparative example of FIG. Can be reduced. Thereby, the spread of the beam angle distribution at the irradiation surface position of the irradiation target P can be reduced, so that when the beam is cut out in the horizontal direction by the collimator 5d, the transverse beam intensity distribution is cut off (= half of the dose distribution in the irradiation target). (Shadow) can be reduced, and the irradiation accuracy can be improved. In addition, an irradiation device that scans a large area and irradiates a wide area can be realized.
[0072]
At this time, in this embodiment, the ratio of the deflection amounts of the X-direction scanning electromagnets 101 and 102 is set so that the X-direction scanning point Q is not at the center of the Y-direction scanning magnet 103 but at or near the center of the scatterer 104. Can also be adjusted. In this case, although the gap between the magnetic poles of the Y-direction scanning electromagnet 103 is slightly increased, there is an effect that the penumbra of the dose distribution in the irradiation target P can be further reduced.
[0073]
In the above embodiment, the scatterer 104 is disposed downstream of the Y-direction scanning electromagnet 103, which is the most downstream side. However, the present invention is not limited to this. It may be provided between them. Hereinafter, this modified example will be described with reference to FIGS. 7 and 8.
[0074]
FIG. 7 is a diagram schematically illustrating a beam axis passing range and a beam passing range in the X-direction scanning plane of the charged particle irradiation apparatus according to the present modification, and is a diagram corresponding to FIG. 1 of the above embodiment. In FIG. 7, the same parts as those of the charged particle irradiation apparatus 1 according to the above embodiment are denoted by the same reference numerals, and the description thereof will be omitted as appropriate.
[0075]
7, in the charged particle device of this modified example, the scatterer 104 is arranged downstream of the X-direction scanning electromagnet 102 and upstream of the Y-direction scanning electromagnet 103 (in other words, the X-direction scanning electromagnet 102 and the Y-direction scanning electromagnet 103). And between). Other points are substantially the same as those of the charged particle device 1 of the above embodiment.
[0076]
The beam is deflected by the X-direction scanning electromagnets 101 and 102 and the Y-direction scanning electromagnet 103 in the same manner as in the irradiation method of the charged particle irradiation apparatus 1 of the above embodiment. At this time, the scatterer 104 scatters the particles between the X-direction scanning electromagnet 102 and the Y-direction scanning electromagnet 103, and the distribution of the particles constituting the beam in the XY plane spreads in a Gaussian manner around the beam central axis, and is downstream. The beam intensity distribution expands as it proceeds. Finally, the beam center axis draws a circular locus on the irradiation surface of the irradiation target P.
[0077]
Also in the present modification, similar to the above-described embodiment, the basic effects of the present invention (1) downsizing of other beam deflecting means and (2) effects of cost reduction can be obtained.
[0078]
That is, after the beam is bent in the X direction by the X-direction scanning electromagnet 101 on the most upstream side and deflected to shift the position, the displacement of the beam position in the X direction is reduced by the X-direction scanning electromagnet 102 on the downstream side. The beam is deflected and the beam scanning point Q is positioned inside the Y-direction scanning electromagnet 103 on the downstream side via the scatterer 4, thereby reducing the X-direction beam passing range in the Y-direction scanning electromagnet 103. Accordingly, the size of the bending electromagnet 2C can be reduced as compared with a conventional structure using a bending electromagnet or a quadrupole electromagnet which does not originally have a beam converging function that much. In addition, this makes it possible to reduce the operating cost and the equipment cost to be at least substantially equal to or smaller than the original structure including one X-direction scanning electromagnet and one Y-direction scanning electromagnet, The cost can be reduced as a whole.
[0079]
Since the scatterer unit is located upstream of the Y-direction scanning electromagnet 3, the beam passage range when passing through the Y-direction scanning electromagnet 3 is slightly larger than that in the above-described embodiment. Almost the same effects as in the above embodiment can be obtained. In particular, for example, when compared with a conventional charged particle beam irradiation apparatus (for example, Japanese Patent Application Laid-Open No. 10-212292) on the premise that the scatterer is located between the X-direction scanning electromagnet and the Y-direction scanning electromagnet, The effect is remarkable.
[0080]
FIG. 8 shows a charged particle irradiation apparatus according to a comparative example of this embodiment, which is substantially equivalent to the charged particle irradiation apparatus according to the above-mentioned Japanese Patent Application Laid-Open No. 10-212292 having one X-direction scanning electromagnet and one Y-direction scanning electromagnet. 1 schematically shows a beam axis passing range and a beam passing range of the beam in the X-direction scanning plane. In FIG. 8, portions equivalent to those of the charged particle irradiation apparatus 1 according to the above embodiment are denoted by reference numerals with "" added as a suffix, and description thereof will be omitted as appropriate.
[0081]
8, in the charged particle irradiation apparatus of this comparative example, only two scanning electromagnets, an X-direction scanning electromagnet 102 ″ and a Y-direction scanning electromagnet 103 ″, are arranged vertically close to each other in this order. A scatterer 104 "is disposed between the electromagnet 103" and the electromagnet 103 ". In this case, similarly to the comparative example described above with reference to FIG. There is a scanning point Q ", and the scanning amplitude increases toward the downstream side. However, the scanning amplitude is further increased by the scatterer 104" before entering the Y-direction scanning electromagnet 103 ". Thereby, the Y-direction scanning is performed. The beam passing range in the X direction at the position of the electromagnet 103 ″ becomes considerably large, and the magnetic pole interval in the X direction of the Y direction scanning electromagnet 103 ″ becomes considerably large.
[0082]
On the other hand, in the charged particle irradiation apparatus of the present modification shown in FIG. 7, as can be seen from comparison with FIG. The distance can be greatly reduced as compared with the Y-direction scanning electromagnet 103 ″ of the comparative example. It can be seen that the effects described in the above (1) and (2) can be obtained. Even when it is assumed that the Y-direction scanning electromagnet 103 is disposed between the electromagnet 102 and the Y-direction scanning electromagnet 103, the distance between the magnetic poles of the Y-direction scanning electromagnet 103 can be reduced, and the effect of cost reduction and miniaturization of other deflection means can be obtained. Can be planned.
[0083]
In addition, the present modification has the following effects in addition to the above.
[0084]
That is, as can be seen by comparing FIG. 7 and FIG. 1, in the present modification, the distance between the scatterer 104 and the irradiation surface is larger than in the embodiment shown in FIG. This reduces the amount of scattering required to form the same beam intensity distribution on the irradiation surface, so that the scatterer 104 can be made thinner than in the above embodiment. As a result, the energy loss of the beam in the scatterer 104 decreases, and the energy of the beam reaching the irradiation surface increases. Therefore, the reaching depth of the beam in the irradiation target P becomes deep, and irradiation can be performed on a target deeper than in the above embodiment.
[0085]
In the above description, the irradiation method using the configuration including the three scanning electromagnets 101, 102, 103 and the scatterer 104 has been described as an example. However, the presence or absence of the scatterer is not essential to the present invention, and the scatterer is not essential. It goes without saying that the effects (1) and (2) inherent in the invention described above can be obtained regardless of the presence or absence of the body 104.
[0086]
Further, the case where the two X-direction scanning electromagnets 101 and 102 are excited by the single X-direction scanning power supply 105 has been described above as an example, but the present invention is not limited thereto. , 102 may be separate (a first excitation power supply for exciting the X-direction scanning electromagnet 101 as the first operation electromagnet and a second excitation power supply for exciting the X-direction scanning electromagnet 102 as the second operation electromagnet). . In this case, each excitation current is adjusted by changing the amplification factor, whereby the scanning point position can be adjusted as desired. Therefore, even when there is a change in equipment conditions between the X-direction scanning electromagnet 101 and the X-direction scanning electromagnet 102 and a magnet design error, the scanning point can be adjusted so as not to shift, and the beam can be adjusted in the Y-direction. It is possible to avoid collision with the magnetic pole of the scanning electromagnet 103 and maintain irradiation accuracy. At this time, if the respective power supplies are controlled by a common power supply control means (single signal source), it is not necessary to adjust the phases of the two X-direction scanning electromagnets 101 and 102, so that the operation is simplified. In addition, the possibility of erroneous irradiation due to a phase shift can be reduced.
[0087]
Further, the case where the scanning is performed so that the beam center trajectory is circular on the irradiation surface has been described above as an example. However, the present invention is not limited to this, and an arbitrary trajectory may be drawn, for example, by scanning like a television. Also in this case, by setting the beam deflection amounts of the two X-direction scanning electromagnets 101 and 102 to be in a proportional relationship, the X-direction scanning point position Q does not change, and the same effect as that of the present embodiment can be obtained.
[0088]
Furthermore, the above description has been made by taking as an example the case where the present invention is applied to a rotating gantry that changes the irradiation direction by rotating the irradiation device.However, the present invention is not limited to this. Can be applied. In this case, generally, no device for deflecting the beam is provided between the X-direction scanning electromagnets 101 and 102, but the same effect as in the present embodiment can be obtained.
[0089]
【The invention's effect】
According to the present invention, the second scanning electromagnet having a high beam convergence function is used to sharply deflect the beam in the X direction so as to reduce the displacement of the beam position. Therefore, the beam is temporarily bent by the first scanning electromagnet to shift the position. After the deflection, the maximum value of the beam passage range when the beam is deflected so as to reduce the deviation of the beam position can be reduced. Therefore, it is possible to reduce the size of other beam deflecting means such as a deflection electromagnet or a quadrupole electromagnet usually provided between them. Further, the total power consumption of the three first to third scanning electromagnets is reduced to, for example, about one half of the total power consumption of the original two X-direction and Y-direction scanning electromagnets to reduce the operating cost (running cost). ) Can be reduced, and the equipment cost (initial cost) required for the excitation power supply of the first to third scanning electromagnets can be reduced by the equipment required for the original excitation power supply of the two X-direction and Y-direction scanning electromagnets. Since the cost can be at least substantially equal to or smaller than the cost, the cost can be reduced.
[Brief description of the drawings]
FIG. 1 is an explanatory diagram showing a passing behavior of a charged particle beam realized by excitation control of a charged particle irradiation apparatus according to an embodiment of the present invention.
FIG. 2 is a conceptual side view showing the overall schematic structure of a charged particle irradiation apparatus according to one embodiment of the present invention.
FIG. 3 is a diagram illustrating an example of a temporal change of an excitation current supplied to the X-direction scanning electromagnet and the Y-direction scanning electromagnet by the X-direction scanning electromagnet power supply and the Y-direction scanning electromagnet power supply.
FIG. 4 is a diagram illustrating an example of a temporal change of a movement amount of a beam center axis on an irradiation surface due to beam deflection by three scanning electromagnets.
FIG. 5 shows an overall schematic structure of a charged particle irradiation apparatus according to a comparative example of the present embodiment, which is substantially equivalent to an original charged particle irradiation apparatus having one X-direction scanning electromagnet and one Y-direction scanning electromagnet. It is a conceptual side view.
FIG. 6 schematically shows a beam axis passing range and a beam passing range in the X-direction scanning plane of the beam.
FIG. 7 schematically shows a beam axis passing range and a beam passing range in an X-direction scanning plane of a charged particle irradiation apparatus according to a modification in which a scatterer is provided between an X-direction scanning electromagnet and a Y-direction scanning electromagnet. FIG.
FIG. 8 schematically shows a beam axis passing range and a beam passing range in the X-direction scanning plane of a beam of a charged particle irradiation apparatus according to a comparative example having one X-direction scanning electromagnet and one Y-direction scanning electromagnet. It is a thing.
[Explanation of symbols]
101 X-direction scanning electromagnet (first scanning electromagnet, first variable deflection means)
102 X-direction scanning electromagnet (second scanning electromagnet, second variable deflection means)
103 Y-direction scanning electromagnet (third scanning electromagnet, third variable deflection means)
104 scatterer
107 X-direction scanning power supply (single excitation power supply, first deflection control means, second deflection control means)
P Irradiation target (affected area)

Claims (8)

荷電粒子を患者の患部に照射する医療用荷電粒子照射装置において、
入射した荷電粒子線ビームを、そのビーム進行方向に垂直な平面内における一の方向へビームを曲げて位置をずらすように偏向する第1走査電磁石と、
この第1走査電磁石より下流側に設けられ、前記第1走査電磁石で偏向された荷電粒子線ビームを、前記一の方向へ前記ビームの位置のずれを小さくするように偏向する第2走査電磁石と、
この第2走査電磁石より下流側に設けられ、前記第2走査電磁石で偏向された荷電粒子線ビームを、前記ビーム進行方向に垂直な平面内における前記一の方向と直交する他の方向へ偏向する第3走査電磁石とを有することを特徴とする医療用荷電粒子照射装置。
In a medical charged particle irradiation device that irradiates the affected part of a patient with charged particles,
A first scanning electromagnet that deflects the incident charged particle beam so as to shift the position by bending the beam in one direction in a plane perpendicular to the beam traveling direction;
A second scanning electromagnet provided downstream of the first scanning electromagnet and deflecting the charged particle beam deflected by the first scanning electromagnet in the one direction so as to reduce the displacement of the beam position; ,
The charged particle beam provided on the downstream side of the second scanning electromagnet and deflected by the second scanning electromagnet is deflected to another direction orthogonal to the one direction in a plane perpendicular to the beam traveling direction. A medical charged particle irradiation apparatus, comprising: a third scanning electromagnet.
荷電粒子を患者の患部に照射する医療用荷電粒子照射装置において、
入射した荷電粒子線ビームを、そのビーム進行方向に垂直な平面内における一の方向へビームを曲げて位置をずらすように偏向する第1走査電磁石と、
この第1走査電磁石より下流側に設けられ、前記第1走査電磁石で偏向された荷電粒子線ビームを、前記一の方向へ前記ビームの位置のずれを小さくするように偏向する第2走査電磁石と、
この第2走査電磁石より下流側に設けられ、前記第2走査電磁石で偏向された荷電粒子線ビームを、前記ビーム進行方向に垂直な平面内における前記一の方向と直交する他の方向へ偏向する第3走査電磁石と、
前記第1走査電磁石による偏向量と前記第2走査電磁石による偏向量との所定の比例関係を維持するように、それら第1及び第2走査電磁石を制御する第1偏向制御手段とを有することを特徴とする医療用荷電粒子照射装置。
In a medical charged particle irradiation device that irradiates the affected part of a patient with charged particles,
A first scanning electromagnet that deflects the incident charged particle beam so as to shift the position by bending the beam in one direction in a plane perpendicular to the beam traveling direction;
A second scanning electromagnet provided downstream of the first scanning electromagnet and deflecting the charged particle beam deflected by the first scanning electromagnet in the one direction so as to reduce the displacement of the beam position; ,
The charged particle beam provided on the downstream side of the second scanning electromagnet and deflected by the second scanning electromagnet is deflected to another direction orthogonal to the one direction in a plane perpendicular to the beam traveling direction. A third scanning electromagnet;
First deflection control means for controlling the first and second scanning electromagnets so as to maintain a predetermined proportional relationship between the deflection amount of the first scanning electromagnet and the deflection amount of the second scanning electromagnet. Characterized medical particle irradiation equipment.
請求項1又は2記載の医療用荷電粒子照射装置において、前記第3走査電磁石より下流側に、荷電粒子線ビームを散乱させる散乱体を設けたことを特徴とする医療用荷電粒子照射装置。The medical charged particle irradiation apparatus according to claim 1 or 2, further comprising a scatterer for scattering a charged particle beam downstream of the third scanning electromagnet. 請求項1又は2記載の医療用荷電粒子照射装置において、前記第2走査電磁石より下流側でかつ前記第3走査電磁石より上流側に、荷電粒子線ビームを散乱させる散乱体を設けたことを特徴とする医療用荷電粒子照射装置。The medical charged particle irradiation apparatus according to claim 1, wherein a scatterer for scattering a charged particle beam is provided downstream of the second scanning electromagnet and upstream of the third scanning electromagnet. Medical charged particle irradiation device. 請求項2記載の医療用荷電粒子照射装置において、前記第1偏向制御手段は、前記第1走査電磁石及び第2走査電磁石に共通の単一の励磁電源を備え、前記第1走査電磁石及び第2走査電磁石はそれぞれの励磁コイルが前記単一の励磁電源に対し直列に接続されていることを特徴とする医療用荷電粒子照射装置。3. The medical charged particle irradiation apparatus according to claim 2, wherein the first deflection control means includes a single excitation power supply common to the first scanning electromagnet and the second scanning electromagnet, and the first scanning electromagnet and the second scanning electromagnet. A medical charged particle irradiation apparatus, wherein each of the scanning electromagnets is connected in series to the single excitation power supply. 請求項2記載の医療用荷電粒子照射装置において、前記第1偏向制御手段は、前記第1走査電磁石及び第2走査電磁石に対しそれぞれ電源を供給する第1励磁電源及び第2励磁電源と、これら第1及び第2励磁電源に共通の電源制御手段とを備えていることを特徴とする医療用荷電粒子照射装置。3. The medical charged particle irradiation apparatus according to claim 2, wherein the first deflection control means includes a first excitation power supply and a second excitation power supply for supplying power to the first scanning electromagnet and the second scanning electromagnet, respectively. A medical charged particle irradiation apparatus, comprising: a power supply control unit common to the first and second excitation power supplies. 荷電粒子を患者の患部に照射する医療用荷電粒子照射装置において、
入射した荷電粒子線ビームを、そのビーム進行方向に垂直な平面内における一の方向へ偏向する第1走査電磁石と、
この第1走査電磁石より下流側に設けられ、前記第1走査電磁石で偏向された荷電粒子線ビームを、前記一の方向へ偏向する第2走査電磁石と、
この第2走査電磁石より下流側に設けられ、前記第2走査電磁石で偏向された荷電粒子線ビームを、前記ビーム進行方向に垂直な平面内における前記一の方向と直交する他の方向へ偏向する第3走査電磁石とを有することを特徴とする医療用荷電粒子照射装置。
In a medical charged particle irradiation device that irradiates the affected part of a patient with charged particles,
A first scanning electromagnet for deflecting the incident charged particle beam in one direction in a plane perpendicular to the beam traveling direction;
A second scanning electromagnet provided downstream of the first scanning electromagnet and deflecting the charged particle beam deflected by the first scanning electromagnet in the one direction;
The charged particle beam provided on the downstream side of the second scanning electromagnet and deflected by the second scanning electromagnet is deflected to another direction orthogonal to the one direction in a plane perpendicular to the beam traveling direction. A medical charged particle irradiation apparatus, comprising: a third scanning electromagnet.
荷電粒子を患者の患部に照射する医療用荷電粒子照射装置において、
入射した荷電粒子線ビームをX方向においてその偏向量を可変に偏向する第1可変偏向手段と、
この第1可変偏向手段より下流側に設けられ、前記第1可変偏向手段で偏向された荷電粒子線ビームをX方向においてその偏向量を可変に偏向する第2可変偏向手段と、
この第2可変偏向手段より下流側に設けられ、前記第2可変偏向手段で偏向された荷電粒子線ビームを、Y方向においてその偏向量を可変に偏向する第3可変偏向手段と、
前記第1可変偏向手段による偏向量と前記第2可変偏向手段による偏向量との所定の比例関係を維持するように、かつ、前記第2可変偏向手段を通過した後の荷電粒子線ビームの走査点が前記第3可変偏向手段の中心部か若しくは少なくとも近傍となるように、前記第1及び第2可変偏向手段を制御する第2偏向制御手段とを有することを特徴とする医療用荷電粒子照射装置。
In a medical charged particle irradiation device that irradiates the affected part of a patient with charged particles,
First variable deflection means for deflecting the amount of deflection of the incident charged particle beam in the X direction variably;
A second variable deflecting means provided downstream of the first variable deflecting means and variably deflecting the amount of deflection of the charged particle beam deflected by the first variable deflecting means in the X direction;
A third variable deflecting means provided downstream of the second variable deflecting means and variably deflecting the amount of deflection of the charged particle beam deflected by the second variable deflecting means in the Y direction;
Scanning of the charged particle beam so as to maintain a predetermined proportional relationship between the amount of deflection by the first variable deflection unit and the amount of deflection by the second variable deflection unit, and after passing through the second variable deflection unit A second deflection control means for controlling the first and second variable deflection means so that a point is at or near the center of the third variable deflection means; apparatus.
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JP2009279046A (en) * 2008-05-20 2009-12-03 Hitachi Ltd Particle beam therapy system
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