JP2003200436A - Method for manufacturing holding plate used for coating external electrode of electronic part - Google Patents

Method for manufacturing holding plate used for coating external electrode of electronic part

Info

Publication number
JP2003200436A
JP2003200436A JP2002003339A JP2002003339A JP2003200436A JP 2003200436 A JP2003200436 A JP 2003200436A JP 2002003339 A JP2002003339 A JP 2002003339A JP 2002003339 A JP2002003339 A JP 2002003339A JP 2003200436 A JP2003200436 A JP 2003200436A
Authority
JP
Japan
Prior art keywords
holding plate
silicone rubber
plate
molding
external electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002003339A
Other languages
Japanese (ja)
Inventor
Atsushi Komori
敦 小森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Polymer Co Ltd
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Polymer Co Ltd, Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Polymer Co Ltd
Priority to JP2002003339A priority Critical patent/JP2003200436A/en
Publication of JP2003200436A publication Critical patent/JP2003200436A/en
Pending legal-status Critical Current

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  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To reduce the tackiness of a plastic molded object to prevent the adhesion of grinding refuse to a holding plate or the clogging of a grinding material with the grinding refuse. <P>SOLUTION: The method for manufacturing the holding plate 1 comprising a process (a) for inserting a core material plate 5 having rigidity comprising a metal or the like into a mold and molding and processing a silicone rubber molded object 7 to obtain the holding plate 1, a process (b) for heat-treating the holding plate 1, a process (c) for grinding the surface of the silicone rubber molded object 7 of the holding plate 1 and a process (d) for irradiating the ground holding plate 1 with radiation. Radiation used in the irradiation of the holding plate 1 is preferably ultraviolet rays. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、チップコンデンサ
や抵抗体等の小型電子部品の端部に外部電極を塗布して
形成する際に用いる保持プレートの製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a holding plate used when an external electrode is applied to and formed on an end of a small electronic component such as a chip capacitor or a resistor.

【0002】[0002]

【従来の技術】チップコンデンサや抵抗体等の小型電子
部品の端部に外部電極を塗布して形成する方法のひとつ
に、電子部品の最大断面寸法よりも小さな直径の多数の
穴を形成したプラスチック材料を含む保持プレートを用
いるものが知られている(特公昭62−20685号公
報)。小さな直径の穴を押し広げて電子部品を収容し、
プラスチック材料の弾性によって弾性的に保持するもの
である。この保持プレートは、金属等の剛性を有し、プ
ラスチック材料に形成され、保持される電子部品の最大
断面寸法よりやや大きな径の弾性孔の径よりもさらにや
や大きな径を有する芯材穴を予め設けた芯材プレートを
金型にインサートし、金型にプラスチック材料、例えば
シリコーンゴムを注入して成形される。
2. Description of the Related Art One of the methods for applying external electrodes to the ends of small electronic components such as chip capacitors and resistors is to form a plastic with a large number of holes having a diameter smaller than the maximum cross-sectional dimension of the electronic component. It is known to use a holding plate containing a material (Japanese Patent Publication No. 62-20685). Push a small diameter hole open to accommodate electronic components,
It is elastically held by the elasticity of the plastic material. This holding plate has rigidity such as metal, is formed of a plastic material, and has a core material hole having a diameter slightly larger than the diameter of the elastic hole having a diameter slightly larger than the maximum sectional size of the electronic component to be held. The core plate provided is inserted into a mold, and a plastic material such as silicone rubber is injected into the mold for molding.

【0003】保持プレートに弾性的な弾性穴を設けるに
は、電子部品に対応した多数の成形ピンを埋設した金型
に芯材プレートをインサートし、該成形ピンと芯材プレ
ートに予め設けた芯材穴との隙間にプラスチック材料を
充填する方法が一般的であり、さらに成形後、外部電極
塗布機能を損なわないように、プラスチック成形体の穴
バリや、プラスチック成形体表面の凹凸を平坦化するた
めに、プラスチック成形体表面を研磨加工する方法が汎
用的に用いられている。チップコンデンサ等の小型電子
部品に電極を塗布形成する際には、平面部分を重ねて保
管・移送される保持プレートが、順次個別に分離されて
小型電子部品が保持プレートの弾性穴内に挿入され、電
極塗布ラインへ送給される。電子部品は、保持プレート
単位で纏めて電極が塗布形成された後、弾性穴数と同数
の押しピンにより押し出すことにより一度に落下させて
回収する。電子部品は、その両端に電極が塗布形成され
る場合もある。
In order to provide elastic holes in the holding plate, the core material plate is inserted into a mold in which a large number of molding pins corresponding to electronic parts are embedded, and the core material preliminarily provided on the molding pins and the core material plate. The method of filling the gap between the holes and the plastic material is generally used, and after molding, in order to flatten the hole burrs of the plastic molded product and the unevenness of the plastic molded product surface so as not to impair the external electrode coating function. In addition, a method of polishing the surface of the plastic molded body is generally used. When coating and forming electrodes on small electronic components such as chip capacitors, holding plates that are stored and transferred by stacking flat portions are sequentially separated and small electronic components are inserted into elastic holes of the holding plate. It is delivered to the electrode coating line. After the electrodes are applied and formed collectively for each holding plate, the electronic components are pushed out by the same number of push pins as the number of elastic holes, and are dropped and collected at one time. Electrodes may have electrodes formed on both ends thereof by coating.

【0004】[0004]

【発明が解決しようとする課題】この保持プレートは、
両表面の大部分がプラスチック材料で被覆され、そのプ
ラスチック材料表面は研磨により平坦化されているた
め、電極を塗布形成する装置に平面方向に重ねてセット
すると、保持プレート同士が粘着により強固に貼りつい
た状態となり、保持プレートを個別に分離し難くなるこ
とがあり、搬送機械がスムースに作動せず、場合によっ
ては停止する等のトラブルに至ることが少なくなかっ
た。また、電極塗布後押しピンによって部品を落下させ
る際には、プラスチック材料の粘着性と電子部品の静電
気により保持プレート裏面に電子部品が張り付き、電子
部品が落下しないという問題も起きていた。本発明は、
上記問題に鑑みなされたもので、保持プレートのセット
状態からの分離性向上と、全ての製品のスムースな回収
とを可能にする、電子部品の外部電極塗布に用いる保持
プレートの製造方法を提供するものである。
This holding plate is
Most of both surfaces are covered with a plastic material, and the surface of the plastic material is flattened by polishing.Therefore, when the electrodes are applied and formed on top of each other in the plane direction, the holding plates are firmly attached by adhesion. In some cases, the holding plate may become stuck and it may be difficult to separate the holding plates individually, the transport machine may not operate smoothly, and in some cases, troubles such as stopping may occur. Further, when the component is dropped by the push pin after the electrode application, there is a problem that the electronic component sticks to the back surface of the holding plate due to the adhesiveness of the plastic material and the static electricity of the electronic component, and the electronic component does not fall. The present invention is
The present invention has been made in view of the above problems, and provides a method of manufacturing a holding plate used for coating external electrodes of electronic components, which enables improvement of separability from a set state of the holding plate and smooth recovery of all products. It is a thing.

【0005】[0005]

【課題を解決する手段】前記課題を達成するための本発
明の保持プレートの製造方法は、金属等の剛性を有し、
予め厚さ方向に芯材穴を設けた芯材プレートに、厚さ方
向に電子部品を弾性的に保持可能な多数の弾性穴を有す
るようにシリコーンゴム成形体を一体成形加工してなる
電子部品の外部電極塗布に用いる保持プレートの製造方
法であって、(ア).前記金属等の剛性を有する芯材プ
レートを金型にインサートし、シリコーンゴム成形体を
成形加工して保持プレートを得る工程、(イ).前記保
持プレートを熱処理する工程、(ウ).前記保持プレー
トのシリコーンゴム成形体表面を研磨加工する工程、
(エ).前記研磨加工された保持プレートに放射線を照
射する工程、からなる。前記照射する放射線種は、紫外
線であることが好ましい。
A method of manufacturing a holding plate according to the present invention for achieving the above object has a rigidity of metal or the like,
An electronic component formed by integrally molding a silicone rubber molded body having a large number of elastic holes capable of elastically holding an electronic component in the thickness direction on a core plate having a core material hole previously formed in the thickness direction. A method of manufacturing a holding plate used for applying an external electrode, comprising: (a). A step of inserting the core plate having rigidity such as metal into a mold and molding a silicone rubber molded body to obtain a holding plate; (a). A step of heat-treating the holding plate, (c). A step of polishing the surface of the silicone rubber molded body of the holding plate,
(D). Irradiating the polished holding plate with radiation. It is preferable that the radiation species to be irradiated is ultraviolet light.

【0006】[0006]

【発明の実施の形態】本発明者は、保持プレート表面の
シリコーンゴム成形体の粘着性を低減させる手段とし
て、シリコーンゴム成形体表面に放射線を照射すること
によって、前記課題を達成し得ることを見出して、本発
明に至った。本発明の電子部品の外部電極塗布に用いる
保持プレートを、図面を用いて説明する。図1は、電子
部品の外部電極塗布に用いる保持プレートの、一部を切
り取った模式的斜視図である。図2は、図1の一部拡大
断面図である。図3は、シリコーンゴム成形体の成形加
工で生じる穴バリの一態様を示す説明図である。
BEST MODE FOR CARRYING OUT THE INVENTION As a means for reducing the adhesiveness of a silicone rubber molding on the surface of a holding plate, the present inventor can achieve the above object by irradiating the surface of the silicone rubber molding with radiation. The inventors have found the present invention and reached the present invention. A holding plate used for coating external electrodes of the electronic component of the present invention will be described with reference to the drawings. FIG. 1 is a schematic perspective view in which a part of a holding plate used for coating external electrodes of electronic components is cut away. FIG. 2 is a partially enlarged sectional view of FIG. FIG. 3 is an explanatory view showing one aspect of hole burrs produced by molding of a silicone rubber molded body.

【0007】本発明の電子部品の外部電極塗布に用いる
保持プレート1は、周囲に鍔状部2を有し、鍔状部2の
中央を連結する平坦部3に複数の芯材穴4が形成されて
いる芯材プレート5と、芯材穴4内で上下に連続して平
坦部3の両面を覆い、芯材穴4のほぼ中央部に弾性穴6
を有するシリコーンゴム成形体7からなる。シリコーン
ゴム成形体7の表面は、芯材プレート5の鍔状部2の上
下の面と基本的に同一平面を成している。金属等の剛性
を有する芯材プレート5の材質としては、格別限定され
るものではないが、炭素鋼、アルミニウム合金、マグネ
シウム合金、ニッケル合金等が好ましいものとして挙げ
られ、加工性、操作性の面から、特にはアルミニウム合
金が好適とされる。
A holding plate 1 used for coating external electrodes of an electronic component of the present invention has a collar-shaped portion 2 on the periphery thereof, and a plurality of core material holes 4 are formed in a flat portion 3 connecting the center of the collar-shaped portion 2. The core plate 5 and the core hole 4 continuously covering the both sides of the flat portion 3 in the vertical direction, and the elastic hole 6 is formed substantially in the center of the core hole 4.
And a silicone rubber molded body 7 having The surface of the silicone rubber molded body 7 is basically flush with the upper and lower surfaces of the collar-shaped portion 2 of the core plate 5. The material of the core plate 5 having rigidity such as metal is not particularly limited, but carbon steel, aluminum alloy, magnesium alloy, nickel alloy and the like are mentioned as preferable materials, and in terms of workability and operability. Therefore, aluminum alloy is particularly preferable.

【0008】芯材プレート5は、前述のとおり、周囲に
鍔状部2を有し、鍔状部2の中央を連結する平坦部3に
複数の芯材穴4が形成されている。鍔状部2の厚さを有
する板状体から、鍔状部2の中央を連結する平坦部3を
削りだし、所望の位置に複数の芯材穴4を形成すること
ができる。また、鍔状部2部分と平坦部3部分と別個に
準備し、溶接等で組み立て接合することもできる。芯材
プレート5の表面には、シリコーンゴムとの接着性を高
めるために、予めプライマー処理を施すことが好まし
い。弾性体としてのシリコーンゴム成形体7の材料とし
ては、ミラブル型シリコーンゴム、付加型液状シリコー
ンゴム等、一般的に使用されている材料を用いることが
できる。
As described above, the core material plate 5 has the collar-shaped portion 2 on the periphery thereof, and the plurality of core material holes 4 are formed in the flat portion 3 connecting the centers of the collar-shaped portion 2. From the plate-shaped body having the thickness of the collar-shaped portion 2, the flat portion 3 that connects the centers of the collar-shaped portion 2 can be cut out, and a plurality of core material holes 4 can be formed at desired positions. Alternatively, the brim portion 2 and the flat portion 3 may be separately prepared and assembled and joined by welding or the like. The surface of the core plate 5 is preferably subjected to a primer treatment in advance in order to enhance the adhesiveness with the silicone rubber. As a material of the silicone rubber molded body 7 as an elastic body, a commonly used material such as a millable type silicone rubber or an addition type liquid silicone rubber can be used.

【0009】芯材プレート5の平坦部3上に弾性体とし
てのシリコーンゴム成形体7を成形して保持プレート1
とする。それには、多数の芯材穴4を有する芯材プレー
ト5を、弾性穴6を形成するためのピンを多数有する金
型内の所望の位置にインサートし、シリコーンゴム組成
物を注入して成形固化する。成形方法としては、コンプ
レッション成形、トランスファー成形、インジェクショ
ン成形等の成形方法を用いることができる。いずれの成
形方法を採用する場合も各々適した金型を用いれば良
い。成形固化された保持プレート1には、シリコーンゴ
ム中に残存する低分子シロキサンを低減させ、物性を安
定化させるために、熱処理を施す。熱処理は、乾燥機で
120℃〜230℃の温度で30分〜8時間保持して行
う。
A holding plate 1 is formed by molding a silicone rubber molded body 7 as an elastic body on the flat portion 3 of the core plate 5.
And To this end, a core plate 5 having a large number of core holes 4 is inserted at a desired position in a mold having a large number of pins for forming elastic holes 6, and a silicone rubber composition is injected to mold and solidify. To do. As a molding method, a molding method such as compression molding, transfer molding or injection molding can be used. Whichever molding method is adopted, a die suitable for each may be used. The molded and solidified holding plate 1 is subjected to a heat treatment in order to reduce the amount of low-molecular siloxane remaining in the silicone rubber and stabilize the physical properties. The heat treatment is performed by maintaining the temperature at 120 ° C to 230 ° C for 30 minutes to 8 hours in a dryer.

【0010】熱処理条件は、120℃、30分以下では
効率よく低分子シロキサンを除去できず、また、230
℃×8時間以上では硬化劣化が起こるという理由で、上
記範囲とすることが望ましい。この熱処理は、シリコー
ンゴムの加工においては一般的なものである。シリコー
ンゴム組成物を注入されて形成された保持プレート1
は、弾性穴6の周囲に、図3に典型例を示すように、穴
バリ8が生じていることが多く、また、シリコーンゴム
成形体7の表面も必ずしも平滑であるとはいえない。し
たがって、熱処理工程を経た保持プレート1は、その表
面を研磨する。研磨方法としては、保持プレートの基本
性能とされる平滑性をもたせるために行うものであるた
め、シリコーンゴム加工時に発生する穴バリや微小の凹
凸が除去可能な平面研削、フライス研削、ラッピング等
の方法が有用である。
If the heat treatment is carried out at 120 ° C. for 30 minutes or less, the low-molecular siloxane cannot be removed efficiently, and 230
The above range is desirable because the curing deterioration occurs at 8 ° C. × 8 hours or more. This heat treatment is common in the processing of silicone rubber. Holding plate 1 formed by injecting a silicone rubber composition
In many cases, hole burrs 8 are formed around the elastic hole 6 as shown in a typical example in FIG. 3, and the surface of the silicone rubber molded body 7 is not necessarily smooth. Therefore, the holding plate 1 that has undergone the heat treatment process has its surface polished. As the polishing method, it is performed to have the smoothness that is the basic performance of the holding plate, so it is possible to use surface grinding, milling grinding, lapping, etc. that can remove hole burrs and minute irregularities that occur when processing silicone rubber. The method is useful.

【0011】熱処理され、研磨されたシリコーンゴム成
形体7の表層面は、いまだ多少なりとも粘着性を有して
いる。シリコーンゴム成形体7表層面の粘着性のため
に、積み重ねておくと保持プレートが相互に貼り付いて
しまうことがある。シリコーンゴム成形体7の表層面の
粘着性を低減するために、研磨された保持プレート1に
放射線を照射する。粘着性低減を原理的に可能にし得る
放射線種としては、紫外線、電子線、ガンマー線が挙げ
られる。そのうちで、装置的規模、操作性に優れた紫外
線を用いることが最も好適である。使用する紫外線照射
装置は、市販されているもので何ら問題は無く、紫外線
ランプ、オゾン洗浄ランプ、ユニットクーラー、排風装
置、触媒装置が基本構成とされ、バッチ式、連続コンベ
ア式等を用いることができる。
The surface layer surface of the heat-treated and abraded silicone rubber molded body 7 is still somewhat sticky. Due to the adhesiveness of the surface layer of the silicone rubber molding 7, the holding plates may stick to each other when stacked. In order to reduce the adhesiveness of the surface layer surface of the silicone rubber molded body 7, the polished holding plate 1 is irradiated with radiation. Radiation species that can make tackiness reduction possible in principle include ultraviolet rays, electron beams, and gamma rays. Among them, it is most preferable to use ultraviolet rays, which have excellent apparatus scale and operability. The UV irradiation device used is commercially available and there is no problem.UV lamp, ozone cleaning lamp, unit cooler, air exhaust device, catalyst device are the basic components, and batch type, continuous conveyor type, etc. should be used. You can

【0012】[0012]

【実施例】以下、実施例によって本発明をさらに詳細に
説明するが、本発明はこれに限られるものではない。 [実施例1] 1.芯材プレートとして、アルミニウム合金を縦180
mm、厚さ10mmに切り出し、外周10mmを残して
厚さ方向に両面から2mmずつ切削し、切削した部位に
2mmφの穴を縦30列、横50列、計1500個設け
た芯材プレートを作製した。
The present invention will be described in more detail with reference to the following examples, but the present invention is not limited thereto. [Example 1] 1. Aluminum core vertically 180 for the core plate
mm, thickness 10 mm, cut 2 mm each from both sides in the thickness direction, leaving 10 mm in the outer circumference, and make a core plate with 1500 mm 2 holes each having 2 mmφ holes in the length of 30 rows. did.

【0013】2.次いで前記芯材プレートの芯材穴位置
と同位置になるように配置した1mmφの成形ピンを1
500本備える金型に前記芯材プレートをインサート
し、液状シリコーンゴムKE−1950−50A/B
(信越化学工業(株)製、商品名)をインジェクション
成形機にて注入し、120℃で10分かけて前記シリコ
ーンゴムを硬化させた。 3.次に、これをオーブンに入れ、200℃で4時間か
けて熱処理を行った。 4.さらに、これを円筒研削盤を用いて保持プレートの
表面を研削し、表面の凹凸、バリ等の除去を行った。 5.これを紫外線照射装置(アイグラフィックス(株)
製)に投入し、紫外線を照射した。照射条件としては、
高圧水銀ランプ350W×3灯、照射距離を10mm、
照射時間は片面3分とし、両面に照射した。
2. Next, 1 mmφ forming pin arranged so as to be in the same position as the core hole position of the core plate
Insert the core plate into a mold equipped with 500 pieces, and liquid silicone rubber KE-1950-50A / B
(Shin-Etsu Chemical Co., Ltd., trade name) was injected by an injection molding machine, and the silicone rubber was cured at 120 ° C. for 10 minutes. 3. Next, this was placed in an oven and heat-treated at 200 ° C. for 4 hours. 4. Further, the surface of the holding plate was ground using a cylindrical grinder to remove surface irregularities, burrs and the like. 5. This is an ultraviolet irradiation device (I Graphics Co., Ltd.)
Manufactured) and irradiated with ultraviolet rays. As irradiation conditions,
High-pressure mercury lamp 350W x 3 lights, irradiation distance 10mm,
The irradiation time was 3 minutes on one side, and both sides were irradiated.

【0014】[比較例1]実施例1の紫外線照射の工程
を行わないこと以外は実施例1と同様の工程によって、
比較例1の保持プレートを作製した。
Comparative Example 1 The same steps as in Example 1 were carried out except that the ultraviolet irradiation step in Example 1 was not performed.
A holding plate of Comparative Example 1 was produced.

【0015】実施例により製造したプレートは、表面の
粘着性がなくなったことにより、電極塗布装置に平面方
向に重ねても保持プレート同士が貼り付くこともなく、
スムースに分離、搬送された。電極塗布後も押しピンで
電子部品を落下させる際、プレート裏面に貼り付くこと
もなく、全てを回収することができた。一方、比較例に
より製造したプレートは、電極塗布装置に平面方向に重
ねた際、分離しないことにより1回ラインストップし
た。また、電極塗布後の電子部品の落下回収率は約95
%であり、5%はプレート裏面に貼り付いた状態で不良
となった。
Since the plates produced by the examples have no surface tackiness, the holding plates do not stick to each other even if they are stacked on the electrode coating device in the plane direction.
It was smoothly separated and transported. Even after applying the electrodes, when the electronic parts were dropped by the push pins, they could all be collected without sticking to the back surface of the plate. On the other hand, the plate manufactured according to the comparative example did not separate when it was stacked on the electrode coating device in the plane direction, and thus the line was stopped once. Also, the drop recovery rate of electronic parts after applying electrodes is about 95.
%, And 5% became defective in the state of being attached to the back surface of the plate.

【0016】[0016]

【発明の効果】本発明による保持プレートの製造方法に
よれば、保持プレート表面のシリコーンゴム成形体の粘
着性を低減させることにより、(1)搬送機器停止のト
ラブル防止、(2)保持プレートのセット状態からの分
離性向上、(3)部品の回収率の向上、の効果が得られ
る。したがって、従来の保持プレートの製造方法が有し
ていた問題点を解消した保持プレートを提供できる。
According to the method for manufacturing a holding plate according to the present invention, by reducing the tackiness of the silicone rubber molding on the surface of the holding plate, (1) prevention of troubles due to stoppage of conveying equipment, and (2) holding plate The effects of improving the separability from the set state and (3) improving the collection rate of parts can be obtained. Therefore, it is possible to provide a holding plate that solves the problems of the conventional holding plate manufacturing method.

【図面の簡単な説明】[Brief description of drawings]

【図1】 電子部品の外部電極塗布に用いる保持プレー
トの、一部を切り取った模式的斜視図である。
FIG. 1 is a schematic perspective view in which a part of a holding plate used for coating an external electrode of an electronic component is cut away.

【図2】 図1の一部拡大断面図である。FIG. 2 is a partially enlarged sectional view of FIG.

【図3】 シリコーンゴム成形体の成形加工で生じる穴
バリの一態様を示す説明図である。
FIG. 3 is an explanatory view showing one aspect of hole burrs generated in a molding process of a silicone rubber molded body.

【符号の説明】[Explanation of symbols]

1:(電子部品の外部電極塗布に用いる)保持プレート 2:鍔状部 3:平坦部 4:芯材穴 5:芯材プレート 6:弾性穴 7:シリコーンゴム成形体 8:穴バリ 1: Holding plate (used for coating external electrodes of electronic parts) 2: Collar 3: Flat part 4: Core hole 5: Core plate 6: Elastic hole 7: Silicone rubber molding 8: Hole burr

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 金属等の剛性を有し、予め厚さ方向に芯
材穴を設けた芯材プレートに、厚さ方向に電子部品を弾
性的に保持可能な多数の弾性穴を有するようにシリコー
ンゴム成形体を一体成形加工してなる電子部品の外部電
極塗布に用いる保持プレートの製造方法であって、
(ア).前記金属等の剛性を有する芯材プレートを金型
にインサートし、シリコーンゴム成形体を成形加工して
保持プレートを得る工程、(イ).前記保持プレートを
熱処理する工程、(ウ).前記保持プレートのシリコー
ンゴム成形体表面を研磨加工する工程、(工).前記研
磨加工された保持プレートに放射線を照射する工程、か
らなることを特徴とする電子部品の外部電極塗布に用い
る保持プレートの製造方法。
1. A core material plate having rigidity such as metal and having core material holes preliminarily provided in the thickness direction, having a large number of elastic holes capable of elastically holding electronic components in the thickness direction. A method for manufacturing a holding plate used for applying an external electrode to an electronic component, which comprises integrally molding a silicone rubber molded body,
(A). A step of inserting the core plate having rigidity such as metal into a mold and molding a silicone rubber molded body to obtain a holding plate; (a). A step of heat-treating the holding plate, (c). A step of polishing the surface of the silicone rubber molded body of the holding plate, (engineering). A method of manufacturing a holding plate used for coating an external electrode of an electronic component, comprising the step of irradiating the polished holding plate with radiation.
【請求項2】 前記照射する放射線種が紫外線である請
求項1に記載の電子部品の外部電極塗布に用いる保持プ
レートの製造方法。
2. The method for manufacturing a holding plate used for coating an external electrode of an electronic component according to claim 1, wherein the radiating species to be irradiated is ultraviolet light.
JP2002003339A 2002-01-10 2002-01-10 Method for manufacturing holding plate used for coating external electrode of electronic part Pending JP2003200436A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002003339A JP2003200436A (en) 2002-01-10 2002-01-10 Method for manufacturing holding plate used for coating external electrode of electronic part

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002003339A JP2003200436A (en) 2002-01-10 2002-01-10 Method for manufacturing holding plate used for coating external electrode of electronic part

Publications (1)

Publication Number Publication Date
JP2003200436A true JP2003200436A (en) 2003-07-15

Family

ID=27642954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002003339A Pending JP2003200436A (en) 2002-01-10 2002-01-10 Method for manufacturing holding plate used for coating external electrode of electronic part

Country Status (1)

Country Link
JP (1) JP2003200436A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7759050B2 (en) 2006-07-14 2010-07-20 3M Innovative Properties Company Method for manufacturing thin substrate using a laminate body
US8349706B2 (en) 2003-11-12 2013-01-08 3M Innovtive Properties Company Semiconductor surface protecting method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8349706B2 (en) 2003-11-12 2013-01-08 3M Innovtive Properties Company Semiconductor surface protecting method
US7759050B2 (en) 2006-07-14 2010-07-20 3M Innovative Properties Company Method for manufacturing thin substrate using a laminate body

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