JP2003007910A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JP2003007910A
JP2003007910A JP2001184167A JP2001184167A JP2003007910A JP 2003007910 A JP2003007910 A JP 2003007910A JP 2001184167 A JP2001184167 A JP 2001184167A JP 2001184167 A JP2001184167 A JP 2001184167A JP 2003007910 A JP2003007910 A JP 2003007910A
Authority
JP
Japan
Prior art keywords
substrate
semiconductor device
resin
electric circuit
electrode member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001184167A
Other languages
Japanese (ja)
Inventor
Kazuhiro Hachiman
和宏 八幡
Shiyunei Nobusada
俊英 信定
Taketo Kunihisa
武人 國久
Kazuto Nishida
一人 西田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2001184167A priority Critical patent/JP2003007910A/en
Publication of JP2003007910A publication Critical patent/JP2003007910A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1532Connection portion the connection portion being formed on the die mounting surface of the substrate
    • H01L2924/15321Connection portion the connection portion being formed on the die mounting surface of the substrate being a ball array, e.g. BGA

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a semiconductor device which is small in size and low in height and is light-weight and has a built-in matching circuit for an active element and has a high yield and is low-cost. SOLUTION: A second substrate 7 is mounted on one face 6a of a first substrate 6, and the second substrate 7 is sealed with a resin 9 with a part of an electrode member 8a formed on one face 6a of the first substrate 6 being exposed. Due to this structure, the semiconductor device can be guaranteed for final characteristics after being incorporated into a device substrate just by a final inspection of a single body before being incorporated into the device substrate. Furthermore, handling during the secondary mounting and a mounting reliability can also be satisfied.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、高周波信号を取り
扱う装置で使用される半導体装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device used in a device that handles high frequency signals.

【0002】[0002]

【従来の技術】近年の携帯電話をはじめとするマイクロ
波、ミリ波帯を取り扱う装置では、開発、商品サイクル
の短縮化のために、特開平8−255965号公報に見
られるように、半導体装置を装置基板に実装して目的の
電気回路を構築している。
2. Description of the Related Art In recent years, in devices for handling microwave and millimeter wave bands such as mobile phones, semiconductor devices such as those disclosed in Japanese Patent Laid-Open No. 8-255965 have been developed in order to shorten the development and product cycles. Is mounted on the device substrate to construct an intended electric circuit.

【0003】これは、図18(a)(b)に示すように
半導体装置Aを装置基板Bに半田ボール1を介して二次
実装して、図18(c)に示すように隙間に封止樹脂2
を充填して組み立てられている。
This is because the semiconductor device A is secondarily mounted on the device substrate B via the solder balls 1 as shown in FIGS. 18 (a) and 18 (b) and sealed in the gap as shown in FIG. 18 (c). Stop resin 2
Is filled and assembled.

【0004】この半導体装置Aは、一般にモジュールと
呼ばれており、基板3の上に、デバイス4,5をフリッ
プチップ実装(もしくはフェイスアップ実装)の後、ワ
イヤーボンディングで接続して電気回路が構成されてい
る。
This semiconductor device A is generally called a module, and after the devices 4 and 5 are flip-chip mounted (or face-up mounted) on the substrate 3, they are connected by wire bonding to form an electric circuit. Has been done.

【0005】[0005]

【発明が解決しようとする課題】この半導体装置Aは、
装置基板Bに実装前の一次実装の段階で、基板3に設け
られているパッドを介してオンウエハ状態で最終の特性
検査が行われており、以降の特性検査は行わない。その
後、図18(b)(c)に示すように二次実装において
組み上げて最終の組立体とされる。
The semiconductor device A is
At the stage of the primary mounting before mounting on the device substrate B, the final characteristic inspection is performed in the on-wafer state through the pads provided on the substrate 3, and the subsequent characteristic inspection is not performed. After that, as shown in FIGS. 18B and 18C, they are assembled in the secondary mounting to form a final assembly.

【0006】ところがこのような組立体では、上記の最
終の特性検査の後、半田ボール1にて装置基板Bに実装
され、加えて封止樹脂2で封止を行うため、特にマイク
ロ波やミリ波などの高周波の信号を取り扱う組立体にお
いては、上記の最終の特性検査の性能が、最終形態の特
性と必ずしも一致せず、最終特性の保証が困難となる。
However, in such an assembly, after the final characteristic inspection, the solder balls 1 are mounted on the device substrate B, and the sealing resin 2 is used for sealing. In an assembly handling a high-frequency signal such as a wave, the performance of the final characteristic inspection described above does not always match the characteristic of the final form, and it is difficult to guarantee the final characteristic.

【0007】また、この半導体装置Aは、デバイス4,
5が実装された基板3を樹脂封止する前に装置基板Bに
二次実装するため、二次実装時には樹脂封止が行われて
おらず、二次実装時のハンドリング及び実装の信頼性に
問題がある。
Further, the semiconductor device A includes the device 4,
Since the substrate 3 on which 5 is mounted is secondarily mounted on the device substrate B before being resin-sealed, resin sealing is not performed at the time of secondary mounting, and the handling and mounting reliability at the time of secondary mounting are improved. There's a problem.

【0008】また、二次実装が完了した使用状態では、
デバイス4,5の周辺が全て樹脂で封止されているた
め、デバイス4,5の能動素子で発生する熱の放熱が悪
く、大きな出力を有する半導体装置への利用には問題が
ある。
Further, in the usage state where the secondary mounting is completed,
Since the periphery of each of the devices 4 and 5 is sealed with resin, the heat generated by the active elements of the devices 4 and 5 is poorly radiated, and there is a problem in using the semiconductor device having a large output.

【0009】本発明は、装置基板に組み込む前に単体で
最終検査するだけでも装置基板に組み込み後の最終特性
の保証ができる構造で、しかも二次実装時のハンドリン
グ及び実装の信頼性を満足することができる構造の半導
体装置を提供することを目的とする。
The present invention has a structure capable of guaranteeing the final characteristics after the device is mounted on the device substrate only by performing a final inspection by itself before the device is mounted on the device substrate, and also satisfies the handling and mounting reliability during the secondary mounting. An object of the present invention is to provide a semiconductor device having a structure capable of achieving the above.

【0010】また、さらに能動素子などで発生する放熱
が良好な構造の半導体装置を提供することを目的とす
る。
It is another object of the present invention to provide a semiconductor device having a structure in which heat dissipation generated by an active element or the like is good.

【0011】[0011]

【課題を解決するための手段】本発明の請求項1記載の
半導体装置は、第1基板の片面上に互いに面を対向させ
て並行に第2基板を実装し第1,第2基板に形成された
回路を結合して電気回路を形成した半導体装置であっ
て、第1基板の前記片面上に第1基板の電気回路に電気
接続された電極部材を設け、この電極部材の一部を露出
させた状態で第1基板の前記片面の一部もしくは全体を
樹脂で封止したことを特徴とする。
According to a first aspect of the present invention, a semiconductor device is formed on a first substrate and a second substrate by mounting a second substrate in parallel on one surface of a first substrate with their surfaces facing each other. A semiconductor device in which an electric circuit is formed by connecting the formed circuits, and an electrode member electrically connected to the electric circuit of the first substrate is provided on the one surface of the first substrate, and a part of the electrode member is exposed. In this state, a part or the whole of the one surface of the first substrate is sealed with resin.

【0012】本発明の請求項2記載の半導体装置は、請
求項1において、前記第1基板の電気回路と前記電極部
材との間を配線パターンで接続したことを特徴とする。
According to a second aspect of the present invention, in the first aspect, the electric circuit of the first substrate and the electrode member are connected by a wiring pattern.

【0013】本発明の請求項3記載の半導体装置は、請
求項1または請求項2において、第1基板に形成された
電気回路が、能動素子と受動素子のうちの受動素子で構
成したことを特徴とする。
According to a third aspect of the present invention, in the semiconductor device according to the first or second aspect, the electric circuit formed on the first substrate is composed of a passive element of an active element and a passive element. Characterize.

【0014】本発明の請求項4記載の半導体装置は、請
求項1または請求項2において、第2基板に形成された
電気回路が、能動素子または能動素子と受動素子で構成
したことを特徴とする。
According to a fourth aspect of the present invention, in the semiconductor device according to the first aspect or the second aspect, the electric circuit formed on the second substrate is composed of an active element or an active element and a passive element. To do.

【0015】本発明の請求項5記載の半導体装置は、第
1基板の片面上に第2基板の片面を対向させて第1基板
に第2基板を並行に実装し第1,第2基板に形成された
回路を結合して電気回路を形成した半導体装置であっ
て、第1基板の前記片面上に導体で形成され第1基板の
回路に電気接続された電極部材が設けられ、第2基板の
前記片面とは反対側の他方面を露出させるとともに前記
電極部材の一部を露出させた状態で第1基板の前記片面
の一部もしくは全体を樹脂で封止したことを特徴とす
る。
According to a fifth aspect of the present invention, in the semiconductor device according to the fifth aspect, one surface of the first substrate is opposed to one surface of the second substrate, and the second substrate is mounted in parallel on the first substrate. A semiconductor device in which formed circuits are combined to form an electric circuit, wherein an electrode member formed of a conductor and electrically connected to the circuit of the first substrate is provided on the one surface of the first substrate, and the second substrate is provided. The one surface of the first substrate is partially or entirely sealed with a resin while exposing the other surface opposite to the one surface and exposing a part of the electrode member.

【0016】本発明の請求項6記載の半導体装置は、請
求項5において、第2基板の露出した前記他方面に熱伝
導率の良好な放熱層を設けたことを特徴とする。本発明
の請求項7記載の半導体装置は、請求項6において、前
記第2基板に、ビアホールを設けたことを特徴とする。
A semiconductor device according to a sixth aspect of the present invention is characterized in that, in the fifth aspect, a heat dissipation layer having a good thermal conductivity is provided on the exposed other surface of the second substrate. A semiconductor device according to a seventh aspect of the present invention is the semiconductor device according to the sixth aspect, wherein a via hole is provided in the second substrate.

【0017】本発明の請求項8記載の半導体装置は、請
求項1または請求項2において、第2基板の前記片面と
は反対側の他方面に熱伝導率の良好な放熱層を設け、前
記放熱層に熱伝導率の良好な熱伝導部材を設け、前記電
極部材の一部と前記熱伝導部材の一部を露出させた状態
で第1基板の前記片面の一部もしくは全体を樹脂で封止
したことを特徴とする。
The semiconductor device according to claim 8 of the present invention is the semiconductor device according to claim 1 or 2, wherein a heat dissipation layer having a good thermal conductivity is provided on the other surface of the second substrate opposite to the one surface thereof. A heat conducting member having a good heat conductivity is provided on the heat dissipation layer, and a part or the whole of the one side of the first substrate is sealed with a resin with a part of the electrode member and a part of the heat conducting member exposed. It is characterized by having stopped.

【0018】本発明の請求項9記載の半導体装置は、請
求項8において、第2基板に前記放熱層に接続されたビ
アホールを設けたことを特徴とする。本発明の請求項1
0記載の半導体装置は、請求項1〜請求項9において、
第1基板の前記片面とは反対側の他方面に熱伝導率の良
好な放熱層を設けたことを特徴とする。
According to a ninth aspect of the present invention, in the semiconductor device according to the eighth aspect, the second substrate is provided with a via hole connected to the heat dissipation layer. Claim 1 of the present invention
0 is a semiconductor device according to any one of claims 1 to 9.
A heat dissipation layer having a good thermal conductivity is provided on the other surface of the first substrate opposite to the one surface.

【0019】本発明の請求項11記載の半導体装置は、
請求項10において、前記第1基板に、前記放熱層に接
続されたビアホールを設けたことを特徴とする。本発明
の請求項12記載の半導体装置は、請求項1〜請求項1
1において、前記第1基板が多層構造を有することを特
徴とする。
A semiconductor device according to claim 11 of the present invention is
In claim 10, a via hole connected to the heat dissipation layer is provided on the first substrate. A semiconductor device according to claim 12 of the present invention is the semiconductor device according to claim 1 to claim 1.
1, the first substrate has a multilayer structure.

【0020】本発明の請求項13記載の半導体装置は、
請求項1〜請求項12において、第1基板の前記片面と
は反対側の他方面に、受動素子を形成または実装したこ
とを特徴とする。
A semiconductor device according to claim 13 of the present invention is
In any one of claims 1 to 12, a passive element is formed or mounted on the other surface of the first substrate opposite to the one surface.

【0021】本発明の請求項14記載の半導体装置は、
請求項1〜請求項13において、第1基板の前記片面と
は反対側の他方面に、チップ能動素子を実装したことを
特徴とする。
A semiconductor device according to claim 14 of the present invention is
In any one of claims 1 to 13, a chip active element is mounted on the other surface of the first substrate opposite to the one surface.

【0022】本発明の請求項15記載の半導体装置は、
請求項10〜請求項14において、前記第1基板に、第
1基板の前記片面とは反対側の他方面に形成された回路
と形成された素子あるいは実装した素子の少なくとも何
れかに接続されたビアホールを設けたことを特徴とす
る。
A semiconductor device according to claim 15 of the present invention is
The device according to claim 10, wherein the first substrate is connected to at least one of a circuit formed on the other surface of the first substrate opposite to the one surface and a formed element or a mounted element. The feature is that a via hole is provided.

【0023】本発明の請求項16記載の半導体装置は、
請求項1〜請求項9において、前記電極部材または熱伝
導部材が、ボール状の金,銀,銅、白金等の金属または
合金あるいは樹脂を核にその表面に導電材料をメッキし
て構成されていることを特徴とする。
A semiconductor device according to claim 16 of the present invention is
The electrode member or the heat conducting member according to any one of claims 1 to 9, wherein the electrode member or the heat conducting member has a ball-shaped metal or alloy such as gold, silver, copper, platinum or the like as a core, and a conductive material plated on the surface thereof It is characterized by being

【0024】本発明の請求項17記載の半導体装置は、
第1基板の片面上に互いに面を対向させて並行に第2基
板を実装し第1,第2基板に形成された回路を結合して
電気回路を形成した半導体装置であって、第1基板の前
記片面とは反対側の他方面に前記第1基板に形成された
ビアホールを介して前記第2基板の側に接続される電極
を設け、前記第2基板を覆うように第1基板の前記片面
の一部もしくは全体を樹脂で封止したことを特徴とす
る。
A semiconductor device according to claim 17 of the present invention is
A semiconductor device in which a second substrate is mounted in parallel on one surface of a first substrate with the surfaces thereof facing each other and the circuits formed on the first and second substrates are combined to form an electric circuit. An electrode connected to the second substrate side through a via hole formed in the first substrate is provided on the other surface opposite to the one surface of the first substrate, and the electrode of the first substrate is covered so as to cover the second substrate. It is characterized in that a part or the whole of one side is sealed with a resin.

【0025】本発明の請求項18記載の半導体装置は、
請求項17において、第1基板の前記他方面の上に第1
基板の回路に電気接続された電極部材を設けたことを特
徴とする。
A semiconductor device according to claim 18 of the present invention is
The first substrate on the other surface of the first substrate according to claim 17,
It is characterized in that an electrode member electrically connected to the circuit of the substrate is provided.

【0026】[0026]

【発明の実施の形態】以下、本発明の各実施の形態を図
1〜図17に基づいて説明する。 (実施の形態1)図1〜図3は本発明の(実施の形態
1)を示す。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to FIGS. (Embodiment 1) FIGS. 1 to 3 show (Embodiment 1) of the present invention.

【0027】本発明の(実施の形態1)の半導体装置A
は、図1に示すように、第1基板6の片面6a上に互い
に面を対向させて並行に第2基板7を実装し第1,第2
基板6,7に形成された電気回路を結合して電気回路を
形成した半導体装置であって、第1基板6の前記片面6
a上に第1基板6の電気回路に電気接続された電極部材
としてのボール8aを設け、このボール8aの一部を露
出させた状態で第1基板6の前記片面6aの全体を封止
樹脂9で封止して構成されている。
A semiconductor device A according to the first embodiment of the present invention
As shown in FIG. 1, the second substrate 7 is mounted in parallel on one surface 6a of the first substrate 6 with the surfaces facing each other.
A semiconductor device in which electric circuits formed on substrates 6 and 7 are combined to form an electric circuit, the one side 6 of a first substrate 6 being provided.
A ball 8a serving as an electrode member electrically connected to the electric circuit of the first substrate 6 is provided on the surface a, and the entire one surface 6a of the first substrate 6 is sealed with a resin with a part of the ball 8a exposed. It is configured by sealing with 9.

【0028】第1基板6は、半導体、ガラス、石英、サ
ファイヤ等のベース基材からなり、前記片面6a上には
パッド10aが半導体プロセスによって形成されてい
る。このパッド10aは、インダクタ,コンデンサ,抵
抗,フィルタ等の受動素子と配線と外部及び第2基板7
とのインターフェイスのために形成される。
The first substrate 6 is made of a base material such as semiconductor, glass, quartz and sapphire, and the pad 10a is formed on the one surface 6a by a semiconductor process. The pad 10a includes passive elements such as an inductor, a capacitor, a resistor and a filter, wiring, the outside and the second substrate 7.
Formed for interfacing with.

【0029】第2基板7は、GaAs,Si等の半導体
からなり、第1基板6の片面6aと対向している面7a
には第1基板6とのインターフェイスのためのパッド1
0bが半導体プロセスにより形成されており、加えてパ
ッド10b上には、突起電極11が形成されている。ま
た、第2基板7の面7aにはFET、BJT等の能動素
子、配線が形成されている。
The second substrate 7 is made of a semiconductor such as GaAs or Si and has a surface 7a facing the one surface 6a of the first substrate 6.
Has a pad 1 for interfacing with the first substrate 6.
0b is formed by a semiconductor process, and in addition, the bump electrode 11 is formed on the pad 10b. Further, active elements such as FETs and BJTs and wirings are formed on the surface 7a of the second substrate 7.

【0030】図2は一般な無線装置のフロントエンド部
として使用できるように構成された前記半導体装置Aを
示し、LNAブロック12,段間フィルタブロック1
3,ミキサーブロック14を含んでいる。
FIG. 2 shows the semiconductor device A configured so as to be used as a front end portion of a general radio device, and includes an LNA block 12 and an interstage filter block 1.
3, including a mixer block 14.

【0031】ここで、第2基板7には回路図上の点線内
のLNA用のFET15とミキサー用のデュアルゲート
FET16が形成されており、その他は、第1基板6に
形成されたインダクタ,コンデンサ,抵抗,フィルタな
どの受動素子及び配線である。
Here, the FET 15 for LNA and the dual gate FET 16 for mixer, which are within the dotted line on the circuit diagram, are formed on the second substrate 7, and the others are the inductor and the capacitor formed on the first substrate 6. , Passive elements such as resistors and filters, and wiring.

【0032】なお、黒四角マーク15a〜15c,16
a〜16dは第1基板6と第2基板7のインターフェイ
ス部であって、構造上は、突起電極を半田接続などで接
続を行っている。また、白丸マークはRF入力端子1
7、Lo入力端子18、IF出力端子19、及び電源接
続端子20であり、接地Gを含め、外部とのインターフ
ェイス部であって、全て第1基板6上に実装された前記
ボール8aによって構成されている。
Incidentally, the black square marks 15a to 15c, 16
Reference numerals a to 16d denote interface portions between the first substrate 6 and the second substrate 7, and structurally connect the protruding electrodes by soldering or the like. The white circle mark indicates the RF input terminal 1
7, the Lo input terminal 18, the IF output terminal 19, and the power supply connection terminal 20, which is an interface portion with the outside including the ground G, and is all configured by the ball 8a mounted on the first substrate 6. ing.

【0033】このような構成の半導体装置Aは、図3
(a)に示すように第1基板6の繰り返しパターンとし
て形成されている第1集合基板60と、図3(b)に示
すように第2基板7の繰り返しパターンとして形成され
ている第2集合基板70とを用意する。
The semiconductor device A having such a configuration is shown in FIG.
As shown in FIG. 3A, a first aggregate substrate 60 is formed as a repeating pattern of the first substrate 6, and as shown in FIG. 3B, a second aggregate substrate is formed as a repeating pattern of the second substrate 7. A substrate 70 is prepared.

【0034】第2集合基板70は、前記面7aとは反対
側の面7bとなる面70bを予め研磨し、前記面7aの
各パッド10b上に突起電極11を形成し、これを個々
の第2基板7に分割を行った上で、図3(c)に示すよ
うに第1集合基板60にフリップチップ実装で配置す
る。フリップチップ接続は、半田接続法や異方性導電膜
を用いた方法などで接続を行う。
In the second collective substrate 70, the surface 70b, which is the surface 7b opposite to the surface 7a, is polished in advance, and the protruding electrodes 11 are formed on each pad 10b of the surface 7a. After the two substrates 7 are divided, they are arranged on the first collective substrate 60 by flip-chip mounting as shown in FIG. Flip-chip connection is performed by a solder connection method, a method using an anisotropic conductive film, or the like.

【0035】さらに、図3(d)に示すように第1集合
基板60にボール8aを半田リフローで第1基板6のパ
ッド10aとの電気的・機械的接続を行って実装する。
第1基板6と第2基板7の接続を半田で行う場合には、
このとき一括して半田接続することも可能である。
Further, as shown in FIG. 3D, the ball 8a is mounted on the first aggregate substrate 60 by solder reflow to electrically and mechanically connect to the pad 10a of the first substrate 6.
When connecting the first substrate 6 and the second substrate 7 with solder,
At this time, it is also possible to perform solder connection at once.

【0036】ボール8aは、第2基板7の厚みと突起電
極11の高さをあわせた高さよりも大きい直径のものを
選択する。次に、第1基板6の機械的な保護として、図
3(e)に示すようにボール8aの一部を露出させて第
1集合基板60の全面(もしくは一部)を封止樹脂9で
封止し、これを、図3(f)に示すようにダイシングラ
インに沿って個々の半導体装置に分割切断して構成され
る。
The ball 8a is selected to have a diameter larger than the total thickness of the second substrate 7 and the bump electrode 11. Next, as mechanical protection of the first substrate 6, as shown in FIG. 3E, a part of the balls 8 a is exposed and the entire surface (or part) of the first collective substrate 60 is sealed with the sealing resin 9. It is formed by sealing and dividing and cutting into individual semiconductor devices along dicing lines as shown in FIG.

【0037】このように樹脂面を調整することにより、
ボール8aを介して、外部とのインターフェイスが可能
となる。最後にダイシングライン21に沿って切断し個
片の半導体装置を得る。
By adjusting the resin surface in this way,
It is possible to interface with the outside through the ball 8a. Finally, the semiconductor device is obtained by cutting along the dicing line 21.

【0038】このように構成したため、図1に示すよう
に完成状態の半導体装置は、第1基板6における第2基
板の実装部分を封止するように封止樹脂9で封止したの
で、第1基板6の両面を覆うようにセラミックパッケー
ジする形態に比べて、小型で部品としての高さが低く、
軽量化できる。
With this structure, the semiconductor device in the completed state is sealed with the sealing resin 9 so as to seal the mounting portion of the second substrate on the first substrate 6 as shown in FIG. Compared with a form in which a ceramic package covers both sides of one substrate 6, the size is small and the height of parts is low,
Can be lightened.

【0039】さらに、第2基板7に能動素子を搭載し、
第2基板7とは別基板の第1基板6にインダクタ,薄膜
抵抗,MIMキャパシタ等の受動素子,フィルタ等の機
能素子を半導体プロセスで構成することによって、能動
素子の整合回路が内蔵され、かつフィルタ等の機能素子
も内蔵可能で、歩留りの低い能動素子と歩留まりの高い
受動素子を別基板に形成し、両者を検査後に組み立てる
ことでトータルとして歩留まりが高く、半導体プロセス
を用いて作成するため高精度で、インターフェイスのた
めのボールが接続され、樹脂封止された形態が最終形態
となり、最終形態での検査が可能となるため、最終のト
ータル特性の保証ができ、二次実装時のハンドリングが
容易で信頼性の高い半導体装置とできる。
Further, an active element is mounted on the second substrate 7,
A matching circuit for an active element is built in by forming a passive element such as an inductor, a thin film resistor and a MIM capacitor, and a functional element such as a filter by a semiconductor process on a first substrate 6 which is a separate substrate from the second substrate 7. Functional elements such as filters can also be built in, and active elements with low yields and passive elements with high yields are formed on different substrates, and both are assembled after inspection, resulting in a high total yield, which is achieved by using a semiconductor process. With the accuracy, the ball for the interface is connected, the resin-sealed form becomes the final form, and inspection in the final form is possible, so the final total characteristics can be guaranteed and handling during secondary mounting is possible. The semiconductor device can be easily and highly reliable.

【0040】ここでボール8aを、第1基板6と第2基
板7とを組み立てる一次実装時のリフロー温度、ならび
に完成した半導体装置を装置基板に実装する際のリフロ
ー温度では溶けない金属等の導体にすることで、2次実
装時にボール8aが溶けないため、安定な実装ができ
る。
Here, the ball 8a is a conductor such as a metal that does not melt at the reflow temperature at the time of primary mounting for assembling the first substrate 6 and the second substrate 7 and at the reflow temperature at the time of mounting the completed semiconductor device on the device substrate. By doing so, the ball 8a does not melt during the secondary mounting, so that stable mounting can be performed.

【0041】ボール8aの具体例としては、ボール状の
金,銀,銅、白金等の金属または合金あるいは樹脂を核
にその表面に導電材料をメッキしたものなどを使用でき
る。 (実施の形態2)図4は本発明の(実施の形態2)を示
す。
As a specific example of the ball 8a, a ball-shaped metal or alloy such as gold, silver, copper, platinum or the like, or a resin having its surface plated with a conductive material can be used. (Embodiment 2) FIG. 4 shows (Embodiment 2) of the present invention.

【0042】図1に示した(実施の形態1)の半導体装
置は、第2基板7は面7bが封止樹脂9で覆われていた
が、この(実施の形態2)の半導体装置では、第2基板
7の面7bが封止樹脂9から露出している点が異なって
いる。
In the semiconductor device of (Embodiment 1) shown in FIG. 1, the surface 7b of the second substrate 7 is covered with the sealing resin 9. However, in the semiconductor device of (Embodiment 2), The difference is that the surface 7b of the second substrate 7 is exposed from the sealing resin 9.

【0043】この図4に示した形状の半導体装置は、例
えば、(実施の形態1)における図3(e)のように封
止が完了して分割前の集合基板70を、第2基板7の面
7bが露出するようボール8aの先端と封止樹脂9を研
磨し、その後に分割することにより製造できる。
In the semiconductor device having the shape shown in FIG. 4, for example, as shown in FIG. 3E in (Embodiment 1), the collective substrate 70 which has not been divided after the sealing is completed is divided into the second substrate 7. It can be manufactured by polishing the tip of the ball 8a and the sealing resin 9 so as to expose the surface 7b, and then dividing.

【0044】このように構成することによって、半導体
装置を装置基板に実装した状態では、第2基板7の面7
bが直接に2次実装される装置基板と接触するため、第
2基板7に形成された能動素子から発熱する熱を装置基
板へ効率よく放熱できる。
With this structure, when the semiconductor device is mounted on the device substrate, the surface 7 of the second substrate 7 is formed.
Since b directly contacts the device substrate to be secondarily mounted, the heat generated from the active element formed on the second substrate 7 can be efficiently radiated to the device substrate.

【0045】(実施の形態3)図5は本発明の(実施の
形態3)を示す。図4に示した(実施の形態2)の半導
体装置は、第2基板7の面7bが封止樹脂9から露出し
ているだけであったが、この図5に示した形状の半導体
装置は、さらに、第2基板7の面7bに蒸着,メッキ等
で熱伝導率の良好な放熱層としての金属層22が形成さ
れている。
(Embodiment 3) FIG. 5 shows (Embodiment 3) of the present invention. In the semiconductor device of (Embodiment 2) shown in FIG. 4, the surface 7b of the second substrate 7 is only exposed from the sealing resin 9, but the semiconductor device having the shape shown in FIG. Further, a metal layer 22 as a heat dissipation layer having a good thermal conductivity is formed on the surface 7b of the second substrate 7 by vapor deposition, plating or the like.

【0046】このように構成すれば、第2基板7の面7
bを装置基板と半田接続等による接続することが可能と
なり、第2基板7に形成された能動素子から発熱する熱
を2次実装された装置基板へより効率よく放熱できる。
With this structure, the surface 7 of the second substrate 7
b can be connected to the device substrate by soldering or the like, and the heat generated from the active element formed on the second substrate 7 can be more efficiently radiated to the device substrate secondarily mounted.

【0047】(実施の形態4)図6は本発明の(実施の
形態4)を示し、図5に示した(実施の形態3)の構成
に加えて、第2基板7にあらかじめビアホール23が作
成されている。
(Embodiment 4) FIG. 6 shows (Embodiment 4) of the present invention. In addition to the structure of (Embodiment 3) shown in FIG. 5, a via hole 23 is previously formed in the second substrate 7. Has been created.

【0048】このように構成すると、第2基板7の面7
aに形成された能動素子の接地がボール8bを介すこと
なく、ビアホール23と金属層22を介して装置基板に
接続できるため、より強固な接地が行え、特性の向上に
つながる。
With this structure, the surface 7 of the second substrate 7
The active element formed in a can be connected to the device substrate through the via hole 23 and the metal layer 22 without passing through the ball 8b, so that stronger grounding can be performed and the characteristics can be improved.

【0049】(実施の形態5)図7は本発明の(実施の
形態5)を示す。図1に示した(実施の形態1)の半導
体装置は、第2基板7は面7bが封止樹脂9で覆われて
いたが、この(実施の形態5)の半導体装置では、第2
基板7の面7bに蒸着,メッキ等で熱伝導率の良好な放
熱層としての金属層22が形成されているとともに、前
記金属層22に熱伝導率の良好な熱伝導部材としてのボ
ール24を設け、ボール24,8aの一部が露出するよ
うに封止樹脂9で第1基板6を封止している。
(Fifth Embodiment) FIG. 7 shows (Fifth Embodiment) of the present invention. In the semiconductor device of (Embodiment 1) shown in FIG. 1, the surface 7b of the second substrate 7 is covered with the sealing resin 9. However, in the semiconductor device of (Embodiment 5),
A metal layer 22 as a heat dissipation layer having good thermal conductivity is formed on the surface 7b of the substrate 7 by vapor deposition, plating or the like, and a ball 24 as a heat conducting member having good thermal conductivity is provided on the metal layer 22. The first substrate 6 is provided with the sealing resin 9 so that the balls 24 and 8a are partially exposed.

【0050】なお、このとき、第1基板6に実装された
ボール8aの頂点と第2基板7に実装されたボール24
の頂点の高さが同じ程度になるようにボール8a,24
の大きさを選択する。また、このとき封止樹脂面は第2
基板7の面7bは埋まるがボール8a,24の一部は露
出するようにする。
At this time, the vertices of the balls 8a mounted on the first substrate 6 and the balls 24 mounted on the second substrate 7
So that the heights of the vertices of the balls are about the same.
Select the size of. At this time, the sealing resin surface is the second
The surface 7b of the substrate 7 is buried, but the balls 8a and 24 are partially exposed.

【0051】このように構成したため、半導体装置を装
置基板に実装した状態では、第2基板7に形成された能
動素子から発熱する熱を、金属層22とボール24を介
して装置基板へ効率よく放熱できる。
With this configuration, when the semiconductor device is mounted on the device substrate, the heat generated from the active element formed on the second substrate 7 is efficiently transferred to the device substrate via the metal layer 22 and the balls 24. Can dissipate heat.

【0052】ボール8a,24の具体例としては、ボー
ル状の金,銀,銅、白金等の金属または合金あるいは樹
脂を核にその表面に導電材料をメッキしたものなどを使
用できる。
As specific examples of the balls 8a, 24, ball-shaped metal or alloy such as gold, silver, copper, platinum or the like, or resin whose core is plated with a conductive material can be used.

【0053】(実施の形態6)図8は本発明の(実施の
形態6)を示す。図7に示した(実施の形態5)の構成
に加えて、第2基板7にあらかじめビアホール25が作
成されている。また、ボール24は導電性である。
(Embodiment 6) FIG. 8 shows (Embodiment 6) of the present invention. In addition to the configuration of (Fifth Embodiment) shown in FIG. 7, a via hole 25 is formed in the second substrate 7 in advance. Also, the balls 24 are electrically conductive.

【0054】このように構成すると、第2基板7の面7
aに形成された能動素子の接地がボール8aを介すこと
なく、ビアホール25と金属層22を介してボール24
から装置基板に接続できるため、より強固な接地が行
え、特性の向上につながる。
With this structure, the surface 7 of the second substrate 7
The grounding of the active element formed in a is not via the ball 8a, but via the via hole 25 and the metal layer 22 to the ball 24.
Since it can be connected to the device substrate, the grounding can be performed more firmly, leading to improvement in characteristics.

【0055】(実施の形態7)図9は本発明の(実施の
形態7)を示す。この図9は、図1に示した(実施の形
態1)の半導体装置の第1基板6の片面6aとは反対側
の他方面6bに、蒸着,メッキ等で熱伝導率の良好な放
熱層としての金属層26が形成され、第1基板6にこの
金属層26に接続されたビアホール27が形成されてい
る。
(Embodiment 7) FIG. 9 shows (Embodiment 7) of the present invention. This FIG. 9 shows a heat dissipation layer having a good thermal conductivity by vapor deposition, plating or the like on the other surface 6b of the first substrate 6 of the semiconductor device shown in FIG. 1 opposite to the one surface 6a. And a via hole 27 connected to the metal layer 26 is formed in the first substrate 6.

【0056】このように構成したため、第2基板7に形
成された能動素子から発熱する熱がビアホール27を介
して金属層26から効率よく放熱ができる。また、金属
層26が導電性の場合には、二次実装した後に金属層2
6を装置基板の接地に接続することによって、第2基板
7に形成された能動素子の接地を、ボール8aを介すこ
となく、装置基板に直接接続する事ができ、良好な接地
状態を得ることができ、高周波特性の向上につながる。
With this configuration, the heat generated from the active element formed on the second substrate 7 can be efficiently radiated from the metal layer 26 via the via hole 27. In addition, when the metal layer 26 is conductive, the metal layer 2 is formed after the secondary mounting.
By connecting 6 to the ground of the device substrate, the ground of the active element formed on the second substrate 7 can be directly connected to the device substrate without passing through the ball 8a, and a good ground state is obtained. It is possible to improve the high frequency characteristics.

【0057】なお、このように第1基板6の面6bに熱
伝導率が良好または導電性の少なくとも一方の特性を満
足する層を形成し、これに接続されたビアホール27を
第1基板6に設けることは、上記の各実施の形態におい
て実施することによって同様の効果を期待できる。
As described above, a layer satisfying at least one of good thermal conductivity and conductivity is formed on the surface 6b of the first substrate 6, and the via hole 27 connected to the layer is formed on the first substrate 6. Providing the same effect can be expected by implementing in each of the above-described embodiments.

【0058】(実施の形態8)上記の各実施の形態の第
1基板6は一層基板であったが、この実施の形態では、
第1基板6は多層基板で形成されている。
(Embodiment 8) The first substrate 6 in each of the above embodiments is a single-layer substrate, but in this embodiment,
The first substrate 6 is a multi-layer substrate.

【0059】具体的には、(実施の形態1)の場合を例
に挙げて説明すると、図10に示すように内層にコンデ
ンサ、インダクタ、フィルタ等の受動素子を形成でき、
第1基板6の面6aにのみ受動素子を形成するより、多
くの受動素子を形成できる。
Specifically, the case of (Embodiment 1) will be described as an example. As shown in FIG. 10, passive elements such as capacitors, inductors and filters can be formed in the inner layer,
More passive elements can be formed than forming passive elements only on the surface 6a of the first substrate 6.

【0060】(実施の形態9)上記の各実施の形態の第
1基板6は面6bに部品が実装されていなかったが、こ
の実施の形態では第1基板6の面6bにも部品が実装さ
れている。
(Embodiment 9) The components are not mounted on the surface 6b of the first substrate 6 of each of the above embodiments, but in this embodiment, the components are also mounted on the surface 6b of the first substrate 6. Has been done.

【0061】具体的には、(実施の形態7)の場合を例
に挙げて説明すると、図11に示すように、第1基板6
の面6bにコンデンサ,インダクタ,抵抗,フィルタ等
の能動部品28を形成または実装することで、小型軽量
低背化を妨げることなく、主に第1基板6の面6aにの
み受動素子を形成するより、多くの受動素子を形成でき
る。
Specifically, the case of (Embodiment 7) will be described by way of example, as shown in FIG.
By forming or mounting active components 28 such as capacitors, inductors, resistors, and filters on the surface 6b, the passive elements are mainly formed only on the surface 6a of the first substrate 6 without hindering reduction in size and weight. Therefore, many passive elements can be formed.

【0062】(実施の形態10)上記の各実施の形態の
第1基板6は面6bに部品が実装されていなかったが、
この実施の形態では第1基板6の面6bにも部品が実装
されている。
(Embodiment 10) In the first substrate 6 of each of the above embodiments, no component is mounted on the surface 6b.
In this embodiment, components are also mounted on the surface 6b of the first substrate 6.

【0063】具体的には、(実施の形態7)の場合を例
に挙げて説明すると、図12に示すように、第1基板6
の面6bに部品実装が可能なランドを設け、チップ部品
29を実装することで、第1,第2基板6,7にパター
ン形成にて形成したスパイラルインダクタ、MIMコン
デンサ等のインダクタンス、キャパシタンスが大きい場
合の第1基板6の大型化、及びそれに伴うコストアップ
を回避できる。
Specifically, the case of (Embodiment 7) will be described by way of example, as shown in FIG.
By providing a land capable of component mounting on the surface 6b and mounting the chip component 29, the inductance and capacitance of the spiral inductor, MIM capacitor, etc. formed by pattern formation on the first and second substrates 6 and 7 are large. In this case, it is possible to avoid an increase in the size of the first substrate 6 and an accompanying increase in cost.

【0064】(実施の形態11)上記の各実施の形態の
第2基板7に能動素子だけを実装したが、受動素子を併
せて実装することもできる。また、LNA用のFET1
5とミキサー用のデュアルゲートFET16はひとつの
第2基板に形成しているが、別々の第2基板に形成し
て、この二つの第2基板7,7を第1基板6にフリップ
チップ実装を行うこともできる。
(Embodiment 11) Although only the active element is mounted on the second substrate 7 in each of the above-described embodiments, a passive element may be mounted together. Also, FET1 for LNA
5 and the dual gate FET 16 for the mixer are formed on one second substrate, but they are formed on different second substrates, and the two second substrates 7 and 7 are flip-chip mounted on the first substrate 6. You can also do it.

【0065】(実施の形態12)図13(a)〜(c)
は本発明の(実施の形態12)を示す。上記の各実施の
形態では、第1基板6はパッド10aがボール8aを介
して直接に装置基板に電気接続される構成であったが、
この実施の形態では図13(c)に示すように再配線パ
ターン30を介してボール8bがパッド10aに接続さ
れている。
(Embodiment 12) FIGS. 13A to 13C.
(Embodiment 12) of the present invention. In each of the above-described embodiments, the first substrate 6 has the configuration in which the pad 10a is directly electrically connected to the device substrate via the ball 8a.
In this embodiment, as shown in FIG. 13C, the ball 8b is connected to the pad 10a via the rewiring pattern 30.

【0066】これは図13(a)(b)を経て作成され
る。まず、図13(a)に示すように、第1基板6のパ
ッド10aを露出させた状態で第2基板7を一次樹脂9
aで封止し、その後に第1基板6のパッド10aから一
次樹脂9aの上にかけて再配線パターン30を形成し、
再配線パターン30の他端にパッド10cを形成する。
This is created through FIGS. 13A and 13B. First, as shown in FIG. 13A, the second substrate 7 is covered with the primary resin 9 with the pads 10a of the first substrate 6 exposed.
Then, the rewiring pattern 30 is formed from the pad 10a of the first substrate 6 to the top of the primary resin 9a.
The pad 10c is formed on the other end of the rewiring pattern 30.

【0067】次に図13(b)では、二次樹脂9bでさ
らに封止した後に、パッド10cの個所にコンタクトホ
ール31を形成してこれを露出させ、図13(c)に示
すようにパッド10cにボール8bを取り付けて構成さ
れている。ボール8bは導電性を有しており、前記の実
施の形態のボール8aと同じ材質のものを使用できる。
Next, in FIG. 13 (b), after further sealing with the secondary resin 9b, a contact hole 31 is formed at the location of the pad 10c to expose it, and as shown in FIG. 13 (c), the pad is formed. A ball 8b is attached to 10c. The ball 8b has conductivity, and the same material as the ball 8a of the above-described embodiment can be used.

【0068】なお、図13(a)〜(c)の加工は、
(実施の形態1)に示した図3のように集合基板に対し
て加工した後に分割することによって個々の半導体装置
に分割して製造する。
The processing shown in FIGS. 13A to 13C is as follows.
As shown in FIG. 3 shown in (Embodiment 1), a collective substrate is processed and then divided into individual semiconductor devices to be manufactured.

【0069】(実施の形態13)図14(a)〜(c)
と図15は本発明の(実施の形態13)を示す。図13
に示す(実施の形態12)では、第2基板7の面7bは
一次樹脂9aで覆われていたが、この(実施の形態1
3)では図14(c)に示すように熱導電部材としての
ボール24aが当接してこのボール24aの一部が二次
樹脂9bから露出している。
(Embodiment 13) FIGS. 14A to 14C.
FIG. 15 shows (Embodiment 13) of the present invention. FIG.
Although the surface 7b of the second substrate 7 is covered with the primary resin 9a in (Embodiment 12) shown in FIG.
In 3), as shown in FIG. 14 (c), the ball 24a as a heat conductive member comes into contact and a part of this ball 24a is exposed from the secondary resin 9b.

【0070】これは図14(a)(b)を経て作成され
る。まず、図14(a)に示すように、第2基板7の面
7bにあらかじめ蒸着、メッキ等で金属層22を形成
し、該当個所にはボール24aを接続できるパッド32
を形成し、第1基板6のパッド10aを露出させた状態
で第2基板7を一次樹脂9aで封止し、その後に第1基
板6のパッド10aから一次樹脂9aの上にかけて再配
線パターン30を形成し、再配線パターン30の他端に
パッド10cを形成する。
This is created through FIGS. 14A and 14B. First, as shown in FIG. 14A, a metal layer 22 is previously formed on the surface 7b of the second substrate 7 by vapor deposition, plating, etc., and a pad 32 to which a ball 24a can be connected is formed at a corresponding portion.
Is formed, the second substrate 7 is sealed with the primary resin 9a in a state where the pad 10a of the first substrate 6 is exposed, and then the rewiring pattern 30 is applied from the pad 10a of the first substrate 6 to the primary resin 9a. And the pad 10c is formed on the other end of the rewiring pattern 30.

【0071】次に図14(b)では、二次樹脂9bでさ
らに封止した後に、パッド10c,32の個所にコンタ
クトホール33を形成してこれを露出させ、図14
(c)に示すようにパッド10aには少なくとも導電性
を有するボール8bを取り付け、パッド32には少なく
とも熱伝導性を有するボール24aを取り付けて構成さ
れている。
Next, in FIG. 14B, after further sealing with the secondary resin 9b, the contact holes 33 are formed at the positions of the pads 10c and 32 to expose the contact holes 33.
As shown in (c), the ball 10b having at least conductivity is attached to the pad 10a, and the ball 24a having at least heat conductivity is attached to the pad 32.

【0072】二次樹脂9bで封止後にパッド10c,3
2の部分を開孔してボール8b,24aを実装したが、
ボール24aを実装後に一次樹脂9aで封止し、ボール
8bを実装後に二次樹脂9bで封止したり、一次樹脂9
aで封止した後に開孔してボール24aを実装し、再配
線パターン30にボール8bを実装後に二次樹脂9bで
封止して作製することもできる。
After sealing with the secondary resin 9b, the pads 10c, 3
The holes 2 were opened to mount the balls 8b and 24a,
The ball 24a is sealed with the primary resin 9a after mounting, the ball 8b is sealed with the secondary resin 9b after mounting, and the primary resin 9 is used.
Alternatively, the ball 24a may be mounted by opening after sealing with a, and the ball 8b may be mounted on the rewiring pattern 30 and then sealed with the secondary resin 9b.

【0073】なお、図14(a)〜(c)などの上記の
加工は、(実施の形態1)に示した図3のように集合基
板に対して加工した後に分割することによって個々の半
導体装置に分割して製造する。
The above-described processing of FIGS. 14A to 14C and the like is performed by processing the collective substrate as shown in FIG. 3 shown in (Embodiment 1) and then dividing it into individual semiconductors. It is divided into devices and manufactured.

【0074】ボール8b,24aの大きさは、実装状態
において各ボールの頂点の高さが同じ程度になるように
選択する。このように構成したため、第2基板7の面7
bは封止樹脂に埋まるがボール24aの一部が露出して
いるため、第2基板7に形成された能動素子から発熱す
る熱が2次実装された装置基板へ効率よく放熱できる。
The sizes of the balls 8b and 24a are selected so that the heights of the vertices of the balls are about the same in the mounted state. Because of this structure, the surface 7 of the second substrate 7
Since b is embedded in the sealing resin, but a part of the ball 24a is exposed, the heat generated from the active element formed on the second substrate 7 can be efficiently radiated to the device substrate secondarily mounted.

【0075】さらに、図15に示したように、第2基板
7にあらかじめビアホール34を作成するとともにボー
ル24aに導電性を有する材料を使用することによっ
て、第2基板7に形成された能動素子から発熱する熱が
2次実装された装置基板へ効率よく放熱ができることに
加え、第2基板7の面7aに形成された能動素子の接地
が第1基板6に実装されたボール8bを介すことなく、
装置基板へ直接に接続でき、より強固な接地が行え、特
性の向上を実現できる。
Further, as shown in FIG. 15, by forming via holes 34 in the second substrate 7 in advance and using a conductive material for the balls 24a, the active elements formed on the second substrate 7 can be removed. The generated heat can be efficiently dissipated to the device board mounted secondarily, and the active element formed on the surface 7a of the second board 7 is grounded via the ball 8b mounted on the first board 6. Without
It can be directly connected to the device board, more robust grounding can be achieved, and characteristics can be improved.

【0076】ここで、ボール8b,24aを1次2次の
実装時にリフロー温度で溶けない金属等の導体にするこ
とで、2次実装時にボールが溶けないため、安定な実装
ができる。
Here, the balls 8b and 24a are made of a conductor such as a metal that does not melt at the reflow temperature during the primary and secondary mounting, and the balls do not melt during the secondary mounting, so that stable mounting can be performed.

【0077】具体例としては、ボール状の金,銀,銅、
白金等の金属または合金あるいは樹脂を核にその表面に
導電材料をメッキしたものなどを使用できることは、上
記の他の実施の形態と同じである。
As a concrete example, ball-shaped gold, silver, copper,
It is the same as the other embodiments described above that a metal or alloy such as platinum or a resin having a core as a core and a conductive material plated on the surface can be used.

【0078】第1,第2基板6,7に実装する部品の種
類についても上記の他の実施の形態の何れでも実施でき
る。 (実施の形態14)図16と図17は本発明の(実施の
形態14)を示す。
The types of components mounted on the first and second boards 6 and 7 can be implemented by any of the other embodiments described above. (Embodiment 14) FIGS. 16 and 17 show (Embodiment 14) of the present invention.

【0079】図16に示す半導体装置は、第1基板6の
面6a上に互いに面を対向させて並行に第2基板7を実
装して第1,第2基板6,7に形成された電気回路を結
合して電気回路を形成した半導体装置であって、第1基
板6の前記片面とは反対側の他方面6bに第1基板6に
形成されたビアホール35を介して第2基板7に接続さ
れる電極36を設け、第2基板7を覆うように第1基板
6の面6aの一部もしくは全体を封止樹脂9で封止した
ものである。
In the semiconductor device shown in FIG. 16, the second substrate 7 is mounted in parallel on the surface 6a of the first substrate 6 with the surfaces facing each other, and the electrical devices formed on the first and second substrates 6 and 7 are formed. A semiconductor device in which circuits are combined to form an electric circuit, which is formed on the second substrate 7 through a via hole 35 formed in the first substrate 6 on the other surface 6b opposite to the one surface of the first substrate 6. An electrode 36 to be connected is provided, and part or all of the surface 6a of the first substrate 6 is sealed with a sealing resin 9 so as to cover the second substrate 7.

【0080】この半導体装置は、装置基板に電極36を
直接に接続して電気接続するか、仮想線で示す前記導電
性のボール37を介して装置基板に電気接続される。ま
た、図17に示すように第2基板7にビアホール38を
形成して構成することもできる。
This semiconductor device is electrically connected to the device substrate by directly connecting the electrodes 36, or is electrically connected to the device substrate through the conductive balls 37 shown by virtual lines. Alternatively, as shown in FIG. 17, a via hole 38 may be formed in the second substrate 7 to form the structure.

【0081】[0081]

【発明の効果】以上のように本発明によると、第1基板
の片面上に互いに面を対向させて並行に第2基板を実装
し第1,第2基板に形成された回路を結合して電気回路
を形成し、第1基板の前記片面上に第1基板の電気回路
に電気接続された電極部材を設け、この電極部材の一部
を露出させた状態で第1基板の前記片面の一部もしくは
全体を樹脂で封止したため、装置基板に組み込む前に単
体で最終検査するだけでも装置基板に組み込み後の最終
特性の保証ができる構造で、しかも二次実装時のハンド
リング及び実装の信頼性を満足することができる。
As described above, according to the present invention, the second substrate is mounted in parallel on one surface of the first substrate with the surfaces thereof facing each other, and the circuits formed on the first and second substrates are combined. An electric circuit is formed, an electrode member electrically connected to the electric circuit of the first substrate is provided on the one surface of the first substrate, and one of the one surface of the first substrate is exposed with a part of the electrode member exposed. Since all parts or the whole is sealed with resin, the final characteristics can be guaranteed after mounting on the device board by just performing a final inspection before mounting it on the device board, and the reliability of handling and mounting during secondary mounting Can be satisfied.

【0082】さらに、第2基板の第1基板との対向面と
反対側の面を前記樹脂から露出させて封止したり、また
はこの面を露出させなくてもこの面に熱伝導率の良好な
熱伝導部材を当接させ、この熱伝導部材の一部を前記樹
脂から露出させて封止することによつて、第2基板に形
成された能動素子などで発生する熱を良好に放熱するこ
とができる。
Further, the surface of the second substrate opposite to the surface facing the first substrate is exposed from the resin for sealing, or even if this surface is not exposed, good thermal conductivity can be obtained on this surface. A heat conducting member is brought into contact with the resin, and a part of the heat conducting member is exposed from the resin for sealing, so that the heat generated by the active element or the like formed on the second substrate is satisfactorily radiated. be able to.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の(実施の形態1)の半導体装置の断面
FIG. 1 is a sectional view of a semiconductor device according to (Embodiment 1) of the present invention.

【図2】同実施の形態の半導体装置の回路図FIG. 2 is a circuit diagram of the semiconductor device of the same embodiment.

【図3】同実施の形態の半導体装置の製造工程図FIG. 3 is a manufacturing process diagram of the semiconductor device of the embodiment.

【図4】本発明の(実施の形態2)の半導体装置の断面
FIG. 4 is a sectional view of a semiconductor device according to (Embodiment 2) of the present invention.

【図5】本発明の(実施の形態3)の半導体装置の断面
FIG. 5 is a sectional view of a semiconductor device of (Embodiment 3) of the present invention.

【図6】本発明の(実施の形態4)の半導体装置の断面
FIG. 6 is a sectional view of a semiconductor device of (Embodiment 4) of the present invention.

【図7】本発明の(実施の形態5)の半導体装置の断面
FIG. 7 is a sectional view of a semiconductor device according to (Embodiment 5) of the present invention.

【図8】本発明の(実施の形態6)の半導体装置の断面
FIG. 8 is a sectional view of a semiconductor device of (Embodiment 6) of the present invention.

【図9】本発明の(実施の形態7)の半導体装置の断面
FIG. 9 is a sectional view of a semiconductor device according to (Embodiment 7) of the present invention.

【図10】本発明の(実施の形態8)の半導体装置の断
面図
FIG. 10 is a sectional view of a semiconductor device according to (Embodiment 8) of the present invention.

【図11】本発明の(実施の形態9)の半導体装置の断
面図
FIG. 11 is a sectional view of a semiconductor device according to (Embodiment 9) of the present invention.

【図12】本発明の(実施の形態10)の半導体装置の
断面図
FIG. 12 is a sectional view of a semiconductor device according to (Embodiment 10) of the present invention.

【図13】本発明の(実施の形態12)の半導体装置の
製造工程の断面図
FIG. 13 is a sectional view of a manufacturing process of a semiconductor device according to (Embodiment 12) of the present invention.

【図14】本発明の(実施の形態13)の半導体装置の
製造工程の断面図
FIG. 14 is a sectional view of a manufacturing process of a semiconductor device according to (Embodiment 13) of the present invention.

【図15】同実施の形態の別の実施例の断面図FIG. 15 is a sectional view of another example of the same embodiment.

【図16】本発明の(実施の形態14)の半導体装置の
断面図
FIG. 16 is a sectional view of a semiconductor device of (Embodiment 14) of the present invention.

【図17】同実施の形態の別の実施例の断面図FIG. 17 is a sectional view of another example of the same embodiment.

【図18】従来の半導体装置を装置基板に実装する工程
FIG. 18 is a process diagram of mounting a conventional semiconductor device on a device substrate.

【符号の説明】[Explanation of symbols]

A 半導体装置 6 第1基板 7 第2基板 8a ボール(電極部材) 9 封止樹脂 22,26 金属層(放熱層) 23,25,27,35 ビアホール 24,24a ボール(熱伝導部材) 28 受動素子 29 チップ能動素子 30 再配線パターン(配線パターン) 36 電極(電極部材) A semiconductor device 6 First substrate 7 Second substrate 8a ball (electrode member) 9 Sealing resin 22,26 Metal layer (heat dissipation layer) 23,25,27,35 via holes 24, 24a ball (heat conduction member) 28 Passive elements 29 chip active devices 30 Rewiring pattern (wiring pattern) 36 electrodes (electrode members)

フロントページの続き (72)発明者 國久 武人 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 西田 一人 大阪府門真市大字門真1006番地 松下電器 産業株式会社内Continued front page    (72) Inventor Takehito Kunihisa             1006 Kadoma, Kadoma-shi, Osaka Matsushita Electric             Sangyo Co., Ltd. (72) Inventor Hitoshi Nishida             1006 Kadoma, Kadoma-shi, Osaka Matsushita Electric             Sangyo Co., Ltd.

Claims (18)

【特許請求の範囲】[Claims] 【請求項1】第1基板の片面上に互いに面を対向させて
並行に第2基板を実装し第1,第2基板に形成された回
路を結合して電気回路を形成した半導体装置であって、 第1基板の前記片面上に第1基板の電気回路に電気接続
された電極部材を設け、この電極部材の一部を露出させ
た状態で第1基板の前記片面の一部もしくは全体を樹脂
で封止した半導体装置。
1. A semiconductor device in which an electric circuit is formed by mounting a second substrate in parallel on one surface of a first substrate with the surfaces thereof facing each other and connecting the circuits formed on the first and second substrates. Then, an electrode member electrically connected to the electric circuit of the first substrate is provided on the one surface of the first substrate, and a part or the whole of the one surface of the first substrate is exposed with a part of the electrode member exposed. A semiconductor device sealed with resin.
【請求項2】前記第1基板の電気回路と前記電極部材と
の間を配線パターンで接続した請求項1記載の半導体装
置。
2. The semiconductor device according to claim 1, wherein a wiring pattern connects between the electric circuit of the first substrate and the electrode member.
【請求項3】第1基板に形成された電気回路が、能動素
子と受動素子のうちの受動素子で構成した請求項1また
は請求項2に記載の半導体装置。
3. The semiconductor device according to claim 1, wherein the electric circuit formed on the first substrate comprises a passive element of an active element and a passive element.
【請求項4】第2基板に形成された電気回路が、能動素
子または能動素子と受動素子で構成した請求項1または
請求項2に記載の半導体装置。
4. The semiconductor device according to claim 1, wherein the electric circuit formed on the second substrate comprises an active element or an active element and a passive element.
【請求項5】第1基板の片面上に第2基板の片面を対向
させて第1基板に第2基板を並行に実装し第1,第2基
板に形成された回路を結合して電気回路を形成した半導
体装置であって、 第1基板の前記片面上に導体で形成され第1基板の回路
に電気接続された電極部材が設けられ、 第2基板の前記片面とは反対側の他方面を露出させると
ともに前記電極部材の一部を露出させた状態で第1基板
の前記片面の一部もしくは全体を樹脂で封止した半導体
装置。
5. An electric circuit in which one surface of a second substrate is opposed to one surface of a first substrate, the second substrate is mounted in parallel on the first substrate, and the circuits formed on the first and second substrates are coupled to each other. A semiconductor device having a first substrate, an electrode member formed of a conductor and electrically connected to a circuit of the first substrate is provided on the one surface of the first substrate, and the other surface of the second substrate opposite to the one surface. A semiconductor device in which a part or the whole of the one surface of the first substrate is sealed with a resin while exposing a part of the electrode member.
【請求項6】第2基板の露出した前記他方面に熱伝導率
の良好な放熱層を設けた請求項5記載の半導体装置。
6. The semiconductor device according to claim 5, wherein a heat dissipation layer having a good thermal conductivity is provided on the exposed other surface of the second substrate.
【請求項7】前記第2基板に、ビアホールを設けた請求
項6記載の半導体装置。
7. The semiconductor device according to claim 6, wherein a via hole is provided in the second substrate.
【請求項8】第2基板の前記片面とは反対側の他方面に
熱伝導率の良好な放熱層を設け、 前記放熱層に熱伝導率の良好な熱伝導部材を設け、 前記電極部材の一部と前記熱伝導部材の一部を露出させ
た状態で第1基板の前記片面の一部もしくは全体を樹脂
で封止した請求項1または請求項2に記載の半導体装
置。
8. A heat dissipation layer having good heat conductivity is provided on the other surface of the second substrate opposite to the one surface, and a heat conduction member having good heat conductivity is provided on the heat dissipation layer. The semiconductor device according to claim 1, wherein a part or the whole of the one surface of the first substrate is sealed with a resin while a part and a part of the heat conducting member are exposed.
【請求項9】第2基板に前記放熱層に接続されたビアホ
ールを設けた請求項8記載の半導体装置。
9. The semiconductor device according to claim 8, wherein a via hole connected to the heat dissipation layer is provided on the second substrate.
【請求項10】第1基板の前記片面とは反対側の他方面
に熱伝導率の良好な放熱層を設けた請求項1〜請求項9
の何れかに記載の半導体装置。
10. A heat dissipation layer having a good thermal conductivity is provided on the other surface of the first substrate opposite to the one surface.
The semiconductor device according to any one of 1.
【請求項11】前記第1基板に、前記放熱層に接続され
たビアホールを設けた請求項10記載の半導体装置。
11. The semiconductor device according to claim 10, wherein a via hole connected to the heat dissipation layer is provided on the first substrate.
【請求項12】前記第1基板が多層構造を有する請求項
1〜請求項11の何れかに記載の半導体装置。
12. The semiconductor device according to claim 1, wherein the first substrate has a multilayer structure.
【請求項13】第1基板の前記片面とは反対側の他方面
に、受動素子を形成または実装した請求項1〜請求項1
2の何れかに記載の半導体装置。
13. A passive element is formed or mounted on the other surface of the first substrate opposite to the one surface.
2. The semiconductor device according to any one of 2.
【請求項14】第1基板の前記片面とは反対側の他方面
に、チップ能動素子を実装した請求項1〜請求項13の
何れかに記載の半導体装置。
14. The semiconductor device according to claim 1, wherein a chip active element is mounted on the other surface of the first substrate opposite to the one surface.
【請求項15】前記第1基板に、第1基板の前記片面と
は反対側の他方面に形成された回路と形成された素子あ
るいは実装した素子の少なくとも何れかに接続されたビ
アホールを設けた請求項10〜請求項14の何れかに記
載の半導体装置。
15. A via hole connected to at least one of an element formed and a circuit formed on the other surface of the first substrate opposite to the one surface of the first substrate is provided in the first substrate. The semiconductor device according to claim 10.
【請求項16】前記電極部材または熱伝導部材が、ボー
ル状の金,銀,銅、白金等の金属または合金あるいは樹
脂を核にその表面に導電材料をメッキして構成されてい
る請求項1〜請求項9の何れかに記載の半導体装置。
16. The electrode member or the heat conducting member is formed by plating a ball with a metal or alloy such as gold, silver, copper, platinum or the like, or a resin as a core, and plating a conductive material on the surface thereof. ~ The semiconductor device according to claim 9.
【請求項17】第1基板の片面上に互いに面を対向させ
て並行に第2基板を実装し第1,第2基板に形成された
回路を結合して電気回路を形成した半導体装置であっ
て、 第1基板の前記片面とは反対側の他方面に前記第1基板
に形成されたビアホールを介して前記第2基板の側に接
続される電極を設け、 前記第2基板を覆うように第1基板の前記片面の一部も
しくは全体を樹脂で封止した半導体装置。
17. A semiconductor device in which a second substrate is mounted in parallel on one surface of a first substrate with the surfaces thereof facing each other and the circuits formed on the first and second substrates are combined to form an electric circuit. Then, an electrode connected to the second substrate side via a via hole formed in the first substrate is provided on the other surface of the first substrate opposite to the one surface, and covers the second substrate. A semiconductor device in which a part or the whole of the one surface of the first substrate is sealed with a resin.
【請求項18】第1基板の前記他方面の上に第1基板の
回路に電気接続された電極部材を設けた請求項17記載
の半導体装置。
18. The semiconductor device according to claim 17, wherein an electrode member electrically connected to a circuit of the first substrate is provided on the other surface of the first substrate.
JP2001184167A 2001-06-19 2001-06-19 Semiconductor device Pending JP2003007910A (en)

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