JP2002365454A - Photonic crystal and manufacturing apparatus and manufacturing method for the same as well as manufacturing apparatus and manufacturing method for waveguide - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an apparatus and method of manufacturing a photonic crystal without requiring intricate constitution and manufacturing a waveguide in the photonic crystal. SOLUTION: A substrate 10 containing a material which gives rise to a change in refractive index by irradiating the material with light of a specific wavelength is first prepared in the method of manufacturing the two-dimensional photonic crystal. A diffraction grating 24 is arranged to face the substrate 10. The substrate 10 is irradiated with the light (for example, UV rays) 26 of the specific wavelength through the diffraction grating 24 in this state, by which the refractive index changing sections are formed like a grid apart prescribed intervals in the substrate 10 and the photonic crystal 10' is obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a photonic crystal having a band gap for light (photonic band gap), an apparatus and a method for manufacturing the same, and an apparatus and a method for manufacturing a waveguide.

[0002]

2. Description of the Related Art Conventionally, a wafer fusion method has been proposed as a method for producing a photonic crystal. In this wafer fusion method, first, as shown in FIG.
Crystal growth of the lGaAs layer and the GaAs layer (crystal growth step). Next, as shown in FIG. 9B, the GaAs layer is selectively etched to form a diffraction grating (diffraction grating forming step). Subsequently, as shown in FIG. 9C, the two diffraction gratings formed in the previous step are arranged so that the diffraction gratings are opposed to each other and one diffraction grating is orthogonal to the other diffraction grating. To fuse (fusion step). continue,
As shown in FIG. 9D, GaAs in the upper diffraction grating
The s substrate and the AlGaAs layer are selectively etched and removed, leaving only the GaAs layer of one diffraction grating on one diffraction grating (substrate removal step). Thereafter, the three-dimensional photonic crystal 110 is obtained by stacking the diffraction gratings obtained in the crystal growth step and repeating the fusion step and the substrate removal step.

When a waveguide is formed on the three-dimensional photonic crystal 110 formed as described above, the diffraction grating of the photonic crystal is selectively etched as shown in FIG. Form 112. Or
The defect array is filled with a light guide material using a well-known semiconductor manufacturing process.

[0004]

However, the method for producing a photonic crystal by the wafer fusion method has various problems. For example, misalignment between diffraction gratings appears as a variation in product performance.Therefore, each diffraction grating needs to be accurately arranged on a lower-layer diffraction grating. It is difficult to increase the yield. In addition, in the case of a method of obtaining a waveguide by filling a light guide material into a defect row, it is necessary to mix a special material into the light guide material, which causes a problem that a semiconductor manufacturing process becomes complicated.

[0005]

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and it is an object of the present invention to provide a novel photonic crystal manufacturing method different from the above-mentioned wafer fusion method and an apparatus therefor. With the goal.

A photonic crystal of the present invention that achieves this object is made of a material whose refractive index changes when irradiated with light of a specific wavelength, and has a two-dimensional structure in which a refractive index is changed in a slab waveguide. It is characterized by having a refractive index changing portion in the form of a grating.

[0007] A photonic crystal according to another aspect of the present invention includes:
It is made of a material whose refractive index changes when irradiated with light of a specific wavelength, and has a refractive index changing portion in the form of a three-dimensional lattice with a changed refractive index.

[0008] The method for producing a photonic crystal of the present invention comprises:
A step of causing the light of a specific wavelength emitted from the light source to enter the diffraction grating, and applying the light emitted from the diffraction grating to a substrate made of a material whose refractive index changes when irradiated with the light of the specific wavelength. Irradiating to form a refractive index change portion.

[0009] A method of manufacturing a photonic crystal according to another aspect of the present invention is characterized in that the diffraction grating is a two-dimensional lattice-shaped phase diffraction grating.

A method for manufacturing a photonic crystal according to another aspect of the present invention is characterized in that the method includes a step of irradiating a substrate with light having a specific wavelength from different directions.

A method for manufacturing a photonic crystal according to another aspect of the present invention is characterized in that different directions are directions orthogonal to each other.

A method for manufacturing a photonic crystal according to another aspect of the present invention is characterized in that a three-dimensional lattice-like refractive index changing portion is formed.

In the method of manufacturing a waveguide according to the present invention, a step of arranging a mask having a desired pattern and the step of irradiating light having a specific wavelength to a material whose refractive index changes at the irradiated portion through the mask are performed. Irradiating light of a specific wavelength to form a refractive index changing portion having a changed refractive index in the slab waveguide.

According to another embodiment of the present invention, there is provided a method of manufacturing a waveguide.
Arranging a mask having a desired pattern on a photonic crystal having a two-dimensional lattice-shaped refractive index changing portion; and irradiating the photonic crystal with light of a specific wavelength through the mask to form a refractive index changing portion. Forming a refractive index changing portion equivalent to the above.

According to another aspect of the present invention, there is provided a method of manufacturing a waveguide.
Arranging a mask having a desired pattern on a photonic crystal having a two-dimensional lattice-shaped refractive index changing portion, and irradiating the photonic crystal with light having a different specific wavelength through the mask to change the refractive index; Restoring the refractive index of the portion.

According to another aspect of the present invention, there is provided a method of manufacturing a waveguide.
A photonic crystal having a three-dimensional lattice-shaped refractive index changing portion is irradiated with light of a specific wavelength through an optical system having a predetermined beam diameter and a predetermined depth of focus, and the refractive index changing portion. Forming a refractive index change portion equivalent to the above.

According to another embodiment of the present invention, there is provided a method of manufacturing a waveguide.
For a photonic crystal having a three-dimensional lattice-shaped refractive index changing part, light of a specific wavelength different to a desired refractive index changing part of the photonic crystal via a predetermined beam diameter and a predetermined depth of focus optical system. Irradiating light to restore the refractive index to its original value.

An apparatus for producing a photonic crystal according to the present invention comprises:
It has a light source that emits light of a specific wavelength, a diffraction grating that receives light emitted from the light source, and a substrate support that supports a substrate that irradiates the light emitted from the diffraction grating. Photonic crystal manufacturing equipment.

A photonic crystal manufacturing apparatus according to another aspect of the present invention is characterized in that the diffraction grating is a two-dimensional lattice-shaped phase diffraction grating.

A photonic crystal manufacturing apparatus according to another aspect of the present invention is characterized in that there is provided means for relatively changing the direction of irradiating light of a specific wavelength to the substrate.

According to another aspect of the present invention, there is provided an apparatus for manufacturing a waveguide.
A light source that emits light of a specific wavelength to a photonic crystal having a two-dimensional lattice-shaped refractive index changing portion, a mask having a desired pattern for blocking light emitted from the light source, and irradiating light that has passed through the mask And a photonic crystal supporting portion for supporting the photonic crystal.

According to another embodiment of the present invention, there is provided a waveguide manufacturing apparatus comprising:
A photonic crystal having a two-dimensional lattice-shaped refractive index changing portion has a light source that emits light of a specific wavelength that restores the refractive index of the refractive index changing portion to the original, and a desired pattern that blocks light emitted from the light source. An apparatus for manufacturing a waveguide, comprising: a mask; and a photonic crystal support portion that supports the photonic crystal that irradiates light passing through the mask.

According to another aspect of the present invention, there is provided an apparatus for manufacturing a waveguide.
A light source that emits light of a specific wavelength to a photonic crystal having a three-dimensional lattice-shaped refractive index changing portion; and a light emitted from the light source is focused on the photonic crystal with a predetermined beam diameter and a predetermined depth of focus. It is characterized by having an optical system for emitting light and a photonic crystal support portion for supporting the photonic crystal.

According to another aspect of the present invention, there is provided a waveguide manufacturing apparatus comprising:
A light source that emits light of a specific wavelength that restores the refractive index of the refractive index changing portion to a photonic crystal having a three-dimensional lattice-shaped refractive index changing portion; An optical system for condensing light with a predetermined beam diameter and a predetermined depth of focus, and a photonic crystal supporting portion for supporting the photonic crystal.

The terms "first direction" to "third direction" included in the structure of the present invention indicate relative directions with respect to the substrate, and are, for example, fixed in a three-dimensional space. It does not mean the direction in which it was performed.

[0026]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Some embodiments of the present invention will be described below in detail with reference to the accompanying drawings. Note that, in a plurality of drawings, the same reference numerals indicate the same or similar portions, or portions that perform the same or similar functions. In addition, in order to facilitate understanding of the invention, parts (for example, photonic crystals) shown in the accompanying drawings are represented in proportions different from actual dimensional proportions, and shapes and dimensions represented in the accompanying drawings are shown. The scope of the present invention should not be limited by the present invention.

Embodiment 1 FIG. 1 is a diagram showing a method and an apparatus for manufacturing a two-dimensional photonic crystal. The substrate 10 that is to be a photonic crystal is composed of a laminate of three layers. The laminate comprises two base layers 1 arranged in parallel.
A slab waveguide including core layers 2 and 14 and a core layer (substrate) 16 sandwiched between the base layers 12 and 14 is formed. For example, the base layers 12 and 14 are made of quartz. The core layer 16
Is a material in which a material (for example, germanium (Ge)) whose refractive index changes when a specific wavelength of light (for example, ultraviolet light) is irradiated to a base material such as quartz. However,
The base 10 is not limited to such a layered structure,
It may be composed of only the core layer, or may be one in which the core layer is laminated on one base layer. This point can be similarly applied to all the embodiments.

An exposure apparatus 20 for producing a photonic crystal from the substrate 10 includes a light source optical system 22 and a diffraction grating 2.
4 The light source optical system 22 includes a light source that emits light (for example, ultraviolet light) 26 that causes a change in the refractive index of the core layer 16 and an optical lens (both not shown) that converts light emitted from the light source into a parallel light flux. ). Diffraction grating 24
Is a two-dimensional phase-type diffraction grating that efficiently generates ± 1st-order diffracted light. As shown in FIG. 2, one side of a plate-like substrate 26 has a first direction parallel to the surface of the substrate 26 (X-axis direction). ) And a second direction (Y-axis direction) perpendicular thereto, at a predetermined interval, a large number of convex portions 28 are formed in a lattice shape, and thereby extend in the first direction and the second direction. Multiple grids 3
0, 32 are formed in parallel. Also, the diffraction grating 24
Is perpendicular to the optical axis (Z axis) of the light source optical system 22.
It is fixed to the grid support 34.

When a photonic crystal is manufactured using the exposure apparatus 20 having such a configuration, the substrate 10 is
4 is supported by the base support 36 in parallel with or substantially parallel to the support 4. When the light source of the light source optical system 22 is driven in this state, the light 26 of a specific wavelength emitted from the light source is converted into parallel light by an optical lens, and then converted into parallel light.
4 is incident. As shown, the diffraction grating 24 diffracts the incident light 26 in the X-axis direction and the Y-axis direction orthogonal thereto to form ± first-order diffracted lights, and exposes the interference light of these diffracted lights to the substrate 10. I do.

In the core layer 16 of the substrate 10, as shown in FIG. 3, the refractive index of a portion (exposed portion) corresponding to the bright portion of the interference fringe obtained by the interference light changes, and the refractive index of the two-dimensional lattice is changed. A change 38 results. However, the refractive index of the portion (the non-exposed portion 40) corresponding to the dark portion of the interference fringe does not change. In addition,
In order to cause a larger change in the refractive index, the core layer 16
When hydrogen is added to the substrate, the exposed substrate 10 may be subjected to a heat treatment (for example, an annealing treatment) in order to remove the hydrogen at an early stage.

The core layer 16 of the two-dimensional photonic crystal 10 ′ manufactured as described above selectively reflects light having a wavelength corresponding to the lattice spacing of the refractive index changing portion 38, and has other wavelengths. Transmit only light. Therefore, by changing the lattice spacing of the diffraction grating 24 that determines the lattice spacing of the refractive index changing part 38, a two-dimensional photonic crystal 10 'having a photonic band gap at different wavelengths can be obtained.

Embodiment 2 FIG. 4 is a view showing a method and an apparatus for manufacturing a three-dimensional photonic crystal. In this figure, a substrate supporting portion 42 is connected to a rotating mechanism 44, and the rotating mechanism 44 allows the substrate 10 to move around the axis extending in the Y-axis direction so that the front surface 50 and the rear surface 52 of the substrate 10 A direction orthogonal to the optical axis Z (first direction) of the system 22 and a peripheral surface 54 (the peripheral surface includes the peripheral surface of the core layer 16) connecting the front surface 50 and the rear surface 52 at their peripheral edges. It can be directed in a direction perpendicular to the optical axis Z.

In the exposure apparatus 20, the grid support 56
Holds a first diffraction grating 58 and a second diffraction grating 60. The grating support 56 is also connected to a moving mechanism 62, and when the moving mechanism 62 is driven, the grating support 56 is oriented in a second direction (Y-axis direction) orthogonal to the optical axis Z, A first method for positioning the first diffraction grating 58 on the optical path
4 (a position shown in FIG. 4) and a second position (not shown) for positioning the second diffraction grating 60 on the optical path instead of the first diffraction grating 58 so as to be movable. is there.

Like the diffraction grating 24 used in the first embodiment, the first diffraction grating 58 has a second direction (Y-axis direction) and a third direction orthogonal to the second direction (X-axis direction). A two-dimensional diffraction grating (see FIG. 2) having a lattice extending in the second direction (Y-axis direction) is installed in the present embodiment so as to face the support unit moving direction. On the other hand, as shown in FIG. 5, the second diffraction grating 60 has a second direction (Y-axis direction).
Is a one-dimensional diffraction grating in which only the extending grating is formed, and in the present embodiment, the grating is oriented in the second direction (Y-axis direction).

When a three-dimensional photonic crystal is manufactured using the above-described exposure apparatus 20, the main body 10 of the substrate 10 is first oriented with its main surface 50 facing the light source optical system 22 (ie, in a direction perpendicular to the Z axis). ), And is supported by the base support portion 42. On the other hand, in the exposure apparatus 20, the grating support 56 is installed at a first position shown in the drawing, and the first diffraction grating 24 is
It is installed facing. In this state, the light 26 emitted from the light source of the light source optical system 22 is incident on the first diffraction grating 24, and the diffracted light transmitted through the first diffraction grating 24 exposes the main substrate surface 50 from the Z-axis direction. Is done. As a result, as described in the first embodiment, the interference light of the diffracted light obtained from the first diffraction grating 24 is exposed on the base 10 and the core layer 16 thereof, and as shown in FIG. One refractive index changing portion 64 is formed in the core layer 16.

When the exposure of the substrate main surface 50 is completed as described above, the rotation mechanism 44 is driven to rotate the substrate 10 by 90 °, and the substrate peripheral surface 54 is opposed to the light source optical system 22. Further, in the exposure device 20, the moving mechanism 62 is driven to move the support portion 56 to the second position, and to position the second diffraction grating 24 on the optical path. In this state, the light emitted from the light source of the light source optical system 22 enters the second diffraction grating 60,
The diffracted light transmitted through the second diffraction grating 60 is exposed on the peripheral surface of the base (the peripheral surface of the core layer) 54 in the Z-axis direction. As a result, the interference light of the diffracted light obtained from the second diffraction grating 24 is exposed on the base 10, and as shown in FIG. 6, the second refractive index changing section orthogonal to the first refractive index changing section 64. 66 are formed on the core layer 16 in parallel, and the three-dimensional photonic crystal 1
0 '' is obtained.

The three-dimensional photonic crystal 10 ″ having the three-dimensional refractive index changing portion formed in the core layer as described above.
Selectively reflects light having a wavelength corresponding to the lattice spacing between the first and second refractive index changing portions 64 and 66, and transmits only light having other wavelengths. Therefore, the refractive index changing section 64,
By changing the lattice spacing of the diffraction gratings 58 and 60 that determine the lattice spacing of 66, a three-dimensional photonic crystal having a photonic band gap at different wavelengths can be obtained.

In the above description, the first diffraction grating 5
8, a grating extending in a second direction (Y-axis direction) and a third direction (X-axis direction) orthogonal thereto is formed, and the second diffraction grating 60 is formed in a second direction (Y-axis direction). The first diffraction grating is formed with a grating extending only in the third direction (X-axis direction), and the first diffraction grating and the first diffraction grating having only the grating in the first direction are formed on the first diffraction grating. The above-described three-dimensional photonic crystal can be obtained by using the second diffraction grating having only the gratings in the two directions. In this case, first, the main surface 50 of the substrate 10 is exposed through a first diffraction grating having a grating in a third direction, and then the substrate 10 is exposed through a second diffraction grating having a grating in a second direction. Is exposed again, and then the substrate 10 is rotated by 90 degrees to expose the peripheral surface 54 of the substrate 10 from the second diffraction grating. Note that the second exposure and the third exposure may use different diffraction gratings.

In the above description, the substrate 10 and its main surface and peripheral surface are exposed from different directions by rotating the substrate 10 by 90 degrees with respect to the fixed exposure device 20. The main surface and the peripheral surface may be exposed from different directions with respect to 10. In this case, a two-dimensional diffraction grating and a one-dimensional diffraction grating as described above may be used, three one-dimensional diffraction gratings may be used, or two one-dimensional diffraction gratings may be used.
A two-dimensional diffraction grating may be used. In addition, one light source that irradiates light to a plurality of diffraction gratings may be provided, or a light source may be provided for each diffraction grating.

Third Embodiment FIG. 7 shows a configuration of a waveguide manufacturing apparatus 70 for forming a waveguide by forming a defect column (defect portion) in the two-dimensional photonic crystal 10 ′ formed in the first embodiment. Is shown. This waveguide manufacturing apparatus 70 has a mask 74 arranged to face the main surface 72 of the two-dimensional photonic crystal 10 '. The mask 74 has a light-transmitting portion 76 that transmits light and a non-light-transmitting portion 78 that blocks light. The light-transmitting portion 76 has a shape corresponding to a defect row to be formed. The light source optical system 80 has different light sources depending on whether a defect row is formed by forming a high refractive index portion in the photonic crystal 10 ′ or a defect row is formed by forming a low refractive index portion. Use

In the case where a row of defects in a low refractive index portion is formed in the photonic crystal 10 '(core layer 16), the light source optical system 8
For 0, an infrared laser such as a YAG laser is used. In this case, when the light transmitted through the light transmitting portion 76 of the mask 74 is exposed to the photonic crystal 10 ′, the temperature of the exposed crystal portion increases, and the refractive index changing portion 38 in the photonic crystal 10 ′ increases. (See FIG. 3) is erased, and the refractive index of the exposed portion becomes a low refractive index portion (defect row 82 and waveguide).
On the other hand, when forming a defect row of a high refractive index portion in the photonic crystal 10 ′, a light source that emits ultraviolet light is used as the light source 22. In this case, when the light transmitted through the light transmitting portion 76 of the mask 74 is exposed to the photonic crystal 10 ′, the refractive index of the exposed crystal portion increases, and the high refractive index portion (the defect column 82 and the waveguide ). As a result, when light is irradiated on the two-dimensional photonic crystal 10 'in which the defect rows 82 are formed, only light of a predetermined wavelength is guided through the defect rows 82, and light of other wavelengths is reflected.

As described above, according to the present embodiment, a waveguide can be easily and easily formed in a two-dimensional photonic crystal by using a light source and a mask.

Fourth Embodiment: FIG. 8 shows a waveguide manufacturing apparatus 90 for forming a waveguide by forming a defect row (defect portion) in the three-dimensional photonic crystal 10 ″ formed in the second embodiment.
Is shown. Exposure unit 92 of this waveguide manufacturing apparatus 90
Has a lens 96 for imaging light emitted from the light source optical system 94. Now, assuming that the numerical aperture of the lens 96 is NA, the diameter of the light spot focused by the lens 96 is 0.61.
λ / NA (λ: wavelength), depth of focus ± 0.5λ / NA ²
In this embodiment, the focal depth is designed to be several μm. Specifically, if the wavelength of light emitted from the light source 94 is 1 μm and the numerical aperture NA is 0.5,
The spot diameter is 1.22 μm and the depth of focus is 2 μm.
The support section 98 supporting the photonic crystal 10 ″ is connected to a three-axis moving mechanism (control section) 100, and any part of the photonic crystal 10 ″ (particularly, any part in the core layer 16). Can be moved to the focal position.

A waveguide manufacturing apparatus 9 having such a configuration
According to 0, the light emitted from the light source optical system 94 is collected by the lens 96, and the spot 102 is formed at a predetermined depth of focus. The three-axis moving mechanism 100 moves the photonic crystal 10 ″ (only the core layer 16 is shown in the drawing for simplicity) with respect to the spot 102 in the X-axis direction and orthogonal to the X-axis direction. The spot 102 moves in the Y-axis direction, the Z-axis direction orthogonal to the X and Y-axis directions, and
In this case, an arbitrary shape of the defect row is formed in the core layer 16 by scanning in the three-dimensional direction.

As in the case of the third embodiment, when forming a defect row by forming a high refractive index portion in the photonic crystal 10 ″, the light source 94 emits ultraviolet rays. On the other hand, when forming a low refractive index portion, the light source 94 emits an infrared laser such as a YAG laser.

In this embodiment, the photonic crystal 10 ″ is moved with respect to the fixed exposure portion 92 to form a light guide path in the photonic crystal. The light guide path can be similarly formed by moving the exposure section.

As described above, according to the waveguide manufacturing apparatus 90 of the present embodiment, a waveguide of an arbitrary shape can be formed easily and easily in a three-dimensional photonic crystal.

[0048]

As is apparent from the above description, according to the present invention, a photonic crystal can be manufactured and a waveguide can be manufactured in the photonic crystal without requiring a complicated structure.

[Brief description of the drawings]

FIG. 1 is a diagram showing a schematic configuration of an apparatus for manufacturing a two-dimensional photonic crystal according to a first embodiment.

FIG. 2 is a plan view (a) and side views (b) and (c) in which a part of a two-dimensional diffraction grating is enlarged.

FIG. 3 is a partially enlarged plan view showing a refractive index changing portion formed on a core layer.

FIG. 4 is a diagram showing a schematic configuration of an apparatus for manufacturing a three-dimensional photonic crystal according to a second embodiment.

5A and 5B are an enlarged plan view and a side view of a part of a one-dimensional diffraction grating employed in the manufacturing apparatus shown in FIG.

FIG. 6 is a partially enlarged perspective view showing a refractive index changing portion formed in a core layer.

FIG. 7 is a perspective view of a waveguide manufacturing apparatus according to a third embodiment.

FIG. 8 is a perspective view of a waveguide forming apparatus according to a fourth embodiment.

FIG. 9 is a diagram showing a conventional method for manufacturing a photonic crystal.

FIG. 10 is a diagram illustrating a method for manufacturing a waveguide formed on the photonic crystal manufactured by the method in FIG. 9;

[Explanation of symbols]

 10: Base 10 ': Photonic crystal 12, 14: Base layer 16: Core layer (base) 20: Exposure device 24: Diffraction grating 34: Grating support 38: Refractive index changing portion

Claims (19)

[Claims] 1. A slab waveguide having a refractive index changing portion in the form of a two-dimensional lattice having a changed refractive index is made of a material whose refractive index changes by irradiating light of a specific wavelength. A photonic crystal characterized by the following. 2. A photo comprising a material whose refractive index changes when irradiated with light of a specific wavelength, and having a refractive index changing portion in the form of a three-dimensional lattice having a changed refractive index. Nick crystal. 3. A step of causing light of a specific wavelength emitted from a light source to be incident on a diffraction grating, and irradiating the light emitted from the diffraction grating with the light of the specific wavelength to change a refractive index of an irradiated portion. Irradiating a substrate made of a material to form a refractive index changing portion. 4. The method for producing a photonic crystal according to claim 3, wherein the diffraction grating is a two-dimensional lattice-shaped phase diffraction grating. 5. The method for producing a photonic crystal according to claim 3, further comprising a step of irradiating the substrate with light having a specific wavelength from different directions. 6. The method for producing a photonic crystal according to claim 5, wherein the different directions are directions orthogonal to each other. 7. The method for manufacturing a photonic crystal according to claim 3, wherein a refractive index change portion having a three-dimensional lattice shape is formed. 8. A step of arranging a mask having a desired pattern, and irradiating a material whose refractive index changes by irradiating light of a specific wavelength with the light of the specific wavelength through the mask. Forming a refractive index changing portion having a changed refractive index in the slab waveguide. 9. A step of arranging a mask having a desired pattern on the photonic crystal according to claim 1, and irradiating the photonic crystal with light of a specific wavelength through the mask to change the refractive index. Forming a refractive index change portion equivalent to the above. 10. A step of arranging a mask having a desired pattern on the photonic crystal according to claim 1;
Irradiating the photonic crystal with light of a different specific wavelength through the mask to restore the refractive index of the refractive index changing portion to the original value. 11. A refractive index changing unit which irradiates the photonic crystal according to claim 2 with light of a specific wavelength through an optical system having a predetermined beam diameter and a predetermined depth of focus. Forming a refractive index change portion equivalent to the above. 12. A light having a specific wavelength different from that of the photonic crystal according to claim 2 at a desired refractive index change portion of the photonic crystal via an optical system having a predetermined beam diameter and a predetermined depth of focus. Irradiating light to restore the refractive index to its original value. 13. A light source for emitting light of a specific wavelength, a diffraction grating for receiving the light emitted from the light source, and a substrate support for supporting a substrate on which the light emitted from the diffraction grating is irradiated. Characteristic photonic crystal manufacturing equipment. 14. The apparatus for producing a photonic crystal according to claim 13, wherein the diffraction grating is a two-dimensional lattice-shaped phase diffraction grating. 15. The apparatus for producing a photonic crystal according to claim 13, further comprising means for relatively changing a direction in which light having a specific wavelength is applied to the substrate. 16. A light source for emitting light of a specific wavelength to the photonic crystal according to claim 1, a mask having a desired pattern for shielding light emitted from the light source, and irradiating light having passed through the mask. And a photonic crystal supporting portion for supporting the photonic crystal. 17. The photonic crystal according to claim 1, having a light source that emits light of a specific wavelength that restores the refractive index of the refractive index changing portion to a light, and a desired pattern that blocks light emitted from the light source. An apparatus for manufacturing a waveguide, comprising: a mask; and a photonic crystal support portion that supports the photonic crystal that irradiates light passing through the mask. 18. A light source for emitting light of a specific wavelength to the photonic crystal according to claim 2, and a light emitted from the light source is collected on the photonic crystal with a predetermined beam diameter and a predetermined depth of focus. An apparatus for manufacturing a waveguide, comprising: an optical system that emits light; and a photonic crystal support that supports the photonic crystal. 19. A light source for emitting light of a specific wavelength that restores the refractive index of the refractive index changing portion to the photonic crystal according to claim 2, and a light emitted from the light source is supplied to the photonic crystal by a predetermined method. An optical system for condensing light at a predetermined beam diameter and a predetermined depth of focus, and a photonic crystal supporting portion for supporting the photonic crystal.