JP2002358899A - Vacuum vessel and its manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a panel with good discharge characteristics and stability and long life by strengthening getter action and increasing absorption ability of impurity gas exhausted in a discharge space at saving and working time of the panel. SOLUTION: As a getter material, a material having activation temperature higher than the maximum temperature of thermal process for making a panel vessel is used. Or, one having activation temperature lower than the maximum temperature of thermal process for making a panel vessel is used as a getter material, in which case, it is cooled till the activation time. Since the getter material is then activated at time when enough degree of vacuum is obtained, impurity gas absorption effect after a tip-off is not damaged, making penalization possible. As a result, vacuum degree reliability is improved after the tip-off.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum container having a depressurized inside and a method of manufacturing the same, and an image display device such as a CRT, a FED, a PDP, and a method of manufacturing the same.

[0002]

2. Description of the Related Art As a conventional example, a gas discharge type display panel (hereinafter, referred to as a PDP panel) which is one type of an image display device will be described.

[0003] This is disclosed as a prior art in Japanese Patent Application Laid-Open No. Hei 10-241582.

FIG. 10 shows a schematic cross-sectional view thereof.

[0005] In FIG. 10, a PDP panel 100 has a front substrate 101 and a rear substrate 102 coated with a frit 103 a around its periphery, and an exhaust pipe 104 is provided with exhaust / gas introduction holes 105 formed in the rear substrate 102. , And a frit 103b is applied to the joint thereof. Further, the getter valve 106 stores the getter 107 therein and is located at the position of the getter exhaust hole 108 opened in the rear substrate 102. A frit 103c is applied to the joint.

The PDP panel 100 is heated in the air to a frit baking temperature of, for example, about 450 ° C. in a sealing step, so that the frit 103a, 103b, 1
03c are baked together, and the front substrate 101 and the rear substrate 10
2. The back substrate 102 and the exhaust pipe 104, and the back substrate 102 and the getter valve 106 are hermetically bonded, respectively.

At this time, the getter 107 is also activated at the same time.

Thereafter, in the exhaust / gas introduction step, for example, the discharge space 1
After evacuating 09 to a vacuum and then cooling to room temperature to fill the discharge space 109 with the discharge gas, the exhaust pipe 104 is chipped off (not shown) to fill the discharge space 109 with the discharge gas.

The reason why the panel 100 is heated to about 350 ° C. during the evacuation step is to promote outgassing from the inner surface of the front substrate 101 and the rear substrate 102 of the panel 100.

The role of the getter 107 is described in Panel 1
00 and during the display operation,
1 to prevent the deterioration of the discharge characteristics of the panel 100 by absorbing the impurity gas released from the inner surface of the rear substrate 102 into the discharge space 109 and keeping the purity of the discharge gas in the discharge space 109 constantly. is there.

FIG. 11 shows a PDP panel disclosed in Japanese Patent Application Laid-Open No. 10-241582. The PDP panel 200 performs a sealing step in a state where the getter valve is open like a 220 and no getter is put inside. When the sealing step is completed, immediately before the next exhaust / gas introduction step, as shown in FIG. 11A, a pellet-like getter is transferred from the getter mounting thin tube 221 of the getter valve 220 to the getter chamber 222. 207 are stored.

The role of the pellet-shaped getter 207 is as follows when the panel 200 is stored and displayed.
Impurity gas released from the inner surface of the front substrate 201 or the rear substrate 202 into the discharge space 209 is absorbed, and the discharge space 209 is removed.
By always maintaining the purity of the discharge gas inside,
This is for preventing the deterioration of the discharge characteristics of 0.

Subsequently, the panel 200 shown in FIG.
As shown in FIG. 11B, the thin tube 221 for mounting the getter of the getter valve 220 is chipped off.

Thereafter, in the exhaust / gas introduction step, first, during heating at about 350.degree.
Evacuate 9 to vacuum.

The reason why the panel 200 is heated to about 350 ° C. during the evacuation step is to promote outgassing from the inner surface of the front substrate 201 and the rear substrate 202 of the panel 200.

At this time, the getter 207 in the form of a pellet is
Since 100% activation is performed by heating at about 350 ° C. in a vacuum in the exhaust / gas introduction step, the storage space and the display operation of the panel 200 are transferred from the inner surface of the front substrate 201 or the rear substrate 202 to the discharge space 209. The ability to absorb the released impure gas is enhanced.

Then, after cooling to room temperature to fill the discharge space 209 with the discharge gas, the exhaust pipe 204 is chipped off and the discharge gas is sealed in the discharge space 209.

According to this method, the pellet-like getter 20 is used.
7 is not mounted in the sealing step heated to about 500 ° C., so that the getter function of oxidizing and absorbing the impure gas is not impaired, and about 7 in vacuum in the exhaust / gas introduction step. Since it is activated 100% by heating at 350 ° C., the ability to absorb the impure gas released from the inner surface of the front substrate 201 or the rear substrate 202 into the discharge space 209 during storage and display operation of the panel 200 is enhanced. That is.

FIG. 12 shows an example of Japanese Patent Application Laid-Open No. H11-329246.
1 shows a method for manufacturing a plasma display panel disclosed in US Pat.

FIG. 12A is a view showing the structure of a specific example of a method of manufacturing a plasma display panel, and FIG.
Are process drawings sequentially showing each process of the exhaust / gas enclosing work. In these drawings, the plasma display panel 30 is shown.
1 is heated simultaneously with exhausting the inside of the panel 301 by an exhaust pipe 302 connected to the panel 301, and further introducing a discharge gas into the panel 301 using the exhaust pipe 302. The getter 3 is provided in the exhaust pipe 302 near the panel 301 which is heated together with the panel 301 when the panel 301 is heated.
05, activating the getter 305 while heating the panel 301, and adsorbing impurities mixed in the discharge gas introduced into the panel 301 by the activated getter 305. And a method for manufacturing a plasma display panel including:

[0021]

In any of the above-described configurations, activation of the getter is performed by utilizing heating in a thermal process at the time of manufacturing a panel.

However, such a configuration has the following problems.

For example, in the PDP panel 100 having the configuration shown in FIG. 10, since the getter 107 has already been incorporated in the getter valve 106 at the assembly stage before the sealing step, the sealing step performed under atmospheric pressure is performed. , The getter 107 is activated. Since it is under atmospheric pressure, the getter 107 is oxidized at the same time as the activation, and as a result, the getter function of absorbing the impure gas is extremely weakened. When the chip is turned off, the getter 107 has a very weak impurity gas adsorption action for maintaining the panel vacuum degree in a high vacuum state after the chip is turned off. As a result, the long-term reliability of the panel characteristics is reduced. There was a problem that it could not contribute to improvement.

Here, there is a special getter in which oxidation hardly occurs even at about 450 ° C., but in such a case, the activation temperature is generally high, and after the evacuation / baking step, the special getter material is used. Even if only the glass is heated at about 800 to 900 ° C. by, for example, a high-frequency heater, the effect of the heating may affect the glass constituting the panel or the getter valve. There was a problem of cracking due to distortion.

In the configuration of Japanese Patent Application Laid-Open No. Hei 10-241582 shown in FIG.
The panel 200 has no getter at the time of the sealing process, and the getter 207 is inserted before the evacuation process performed under vacuum,
The getter is activated by heating at about 350 ° C. in the exhaust step.

However, also in this configuration, the getter 207
Is activated when the temperature reaches 350 ° C. in the exhaust baking process. At this time, the exhaust baking is an initial stage, and as the exhaust baking progresses, the panel 200 is activated.
Outgassing due to the degassing effect from the inner surface of the front substrate 201 and the rear substrate 202 is observed.

That is, if the getter 207 is activated in the initial stage of the exhaust baking when the temperature reaches 350 ° C., the gas released by the subsequent degassing of the panel is adsorbed. Will weaken. As a result, panel 200 after chip-off
The effect for maintaining the inner vacuum is weakened.

In recent years, for the purpose of simplifying the manufacturing process, after sealing, the panel temperature has not been lowered to room temperature.
A process is being studied to keep the temperature when the temperature is lowered to a temperature suitable for baking, and at the same time perform vacuum evacuation to eliminate the loss between the temperature lowering time during sealing and the temperature raising time during evacuation and baking. However, since there is no timing for inserting a getter in the above steps, it is not possible to respond.

There is a demand for a structure and a manufacturing method capable of coping with such steps and maximizing the performance of the getter.

[0030]

The present invention employs the following technical configuration in order to solve such a problem.

That is, the vacuum container of the present invention (claim 1)
At least a vacuum vessel in which the inside of a vessel consisting of an envelope and a getter tube having a non-evaporable getter mounted therein is evacuated, wherein the getter tube is a junction between the getter tube and the envelope. And a structure in which the non-evaporable getter is present at a predetermined distance.

Here, the structure in which the non-evaporable getter is present at a predetermined distance from the junction between the getter tube and the envelope is the inner diameter near the junction with the envelope. : D1 becomes D2 (> D1) from a location away from the joint by a predetermined distance, and the getter has a structure in which the size passes through the inner diameter: D2 part but does not pass through the inner diameter: D1 part. preferable.

Further, a structure in which the non-evaporable type getter is present at a predetermined distance from a junction between the getter tube and the envelope is provided at a junction between the getter tube and the envelope. It is preferable that the structure bends at least two-dimensionally at a location separated by a predetermined distance from.

It is preferable that the predetermined distance is equal to or longer than a projection length of the getter in a length direction of the getter tube.

Preferably, the vacuum container is configured as an image display device.

It is preferable that the image display device is a plasma display panel.

The method for manufacturing a vacuum container according to the present invention (claim 7) includes a sealing step of forming a container by joining at least an envelope and a getter tube having a non-evaporable getter mounted therein, An evacuation / baking step of heating and evacuation of the inside of the vessel at the same time as heating the vessel, wherein the non-evaporable getter has an activity during the sealing step and the evacuation / baking step. It is characterized in that it is not heated up to the activation temperature, but is heated up to its activation temperature and activated after the evacuation / baking step.

[0038] The method for manufacturing a vacuum container according to the present invention (claim 8) comprises a sealing step of forming a container by joining at least an envelope and a getter tube having a non-evaporable getter mounted therein. An evacuation / baking step of evacuation of the inside while heating the vessel, wherein the non-evaporable getter is not heated to its activation temperature during the sealing step. , The exhaust
It is characterized in that it is heated and activated to its activation temperature during the baking step.

The method for manufacturing a vacuum container according to the present invention (claim 9) includes a sealing step of forming a container by joining at least an envelope and a getter tube having a non-evaporable getter mounted therein. An evacuation / baking step of heating and evacuation of the interior while heating the vessel, wherein the non-evaporable getter includes, in the getter tube, the envelope and the getter tube. It is mounted so as to be present at a predetermined distance from the joint portion of, and during the sealing step and the exhaust / baking step,
It is characterized in that it is not heated to the activation temperature, but is heated to the activation temperature and activated after the evacuation / baking step.

The method for manufacturing a vacuum container according to the present invention (claim 10) includes a sealing step of forming a container by joining at least an envelope and a getter tube having a non-evaporable getter mounted therein. An evacuation / baking step of heating and evacuation of the interior while heating the vessel, wherein the non-evaporable getter includes, in the getter tube, the envelope and the getter tube. It is attached so that it exists at a predetermined distance from the joint of
In addition, it is not heated to the activation temperature during the sealing step, but is heated to the activation temperature and activated during the evacuation / baking step.

Here, it is preferable that the time during the evacuation / baking step is immediately before the end of the heating in the evacuation / baking step.

Also, the method of mounting the getter so as to be present at the predetermined distance is characterized in that the inner diameter: D1 near the junction with the envelope is a predetermined distance from the junction as the getter tube. It is preferable to use a structure in which D2 (> D1) from the location and the size of the getter passes through the inner diameter portion D2 but not through the inner diameter portion D1.

In the method of mounting the getter so as to be present at the predetermined distance, the getter tube is bent at least two-dimensionally at a position separated from the joint with the envelope by a predetermined distance. It is preferable to use a structure.

Further, there is a method in which the getter is not heated to the activation temperature during the sealing step and the exhaust / baking step, but is heated to the activation temperature after the exhaust / baking step to activate. Activating the getter by using a material whose activation temperature is higher than the sealing temperature and the exhaust / baking temperature as the getter, and locally heating the getter after the exhaust / baking step. Is preferred.

Further, there is a method in which the getter is not heated to the activation temperature during the sealing step and the exhaust / baking step, but is heated to the activation temperature after the exhaust / baking step to activate. A material whose activation temperature is lower than the sealing temperature at least as the getter, and the getter is locally cooled during the sealing step and during the evacuation / baking step, thereby lowering the activation temperature to the activation temperature or lower. Preferably, after completion of the evacuation / baking step, the getter is activated by locally heating the getter.

A method of activating the getter by heating it to its activation temperature during the evacuation / baking step without heating it to the activation temperature during the sealing step is described below. Using a material whose activation temperature is higher than the sealing temperature and the exhaust / baking temperature,
Preferably, the getter is activated by locally heating it during the evacuation / baking step.

A method of activating the getter by heating it to the activation temperature during the evacuation / baking step without heating the getter to the activation temperature during the sealing step,
A material whose activation temperature is lower than the sealing temperature and higher than the evacuation / baking temperature is used as the getter, and the activation temperature is made lower than the activation temperature by locally cooling the getter during the sealing step. In addition, it is preferable that the getter is locally heated during the evacuation / baking step so that the temperature is equal to or higher than the activation temperature.

The method of heating the getter to its activation temperature during the evacuation / baking step without heating it to the activation temperature during the sealing step, and activating the getter as the getter, Using a material whose activation temperature is lower than the sealing temperature and the exhaust / baking temperature,
And, by locally cooling the getter during the sealing step and the exhaust / baking step, the getter is kept at an activation temperature or lower, and locally cooling the getter during the exhaust / baking step. Preferably, it is stopped.

[0049] Preferably, the local cooling is provided by providing a cooling head in an exhaust / baking device that locally surrounds the non-evaporable getter mounting portion of the getter tube.

Preferably, the local heating is provided by providing a heating head in an exhaust / baking device which locally surrounds the non-evaporable getter mounting portion of the getter tube.

Preferably, the method for manufacturing a vacuum container is included in a method for manufacturing an image display device.

It is preferable that the image display device is a method for manufacturing a plasma display panel.

[0053]

BEST MODE FOR CARRYING OUT THE INVENTION In the vacuum vessel and the method of manufacturing the same according to the present invention, the activation of the getter can be performed without being limited to the thermal process in the panel manufacturing process. It can be performed at a sufficiently advanced stage, that is, in a state where the panel vacuum degree is sufficiently good, and the getter is present in the panel without adsorbing gas when activated.

As a result, the getter can maximize the impurity gas adsorption capacity in the panel, and realize long-term stabilization of the panel characteristics.

The term “getter” used in the following description refers to a material that chemically adsorbs gas molecules and elements, and a material that physically adsorbs gas molecules and elements (for example, a porous material such as activated carbon). Materials having a porous structure and a very large surface area), regardless of the mechanism.

Further, the term “activation” refers to an operation for developing such a gas adsorption action.

Hereinafter, specific examples of the vacuum vessel and the method for manufacturing the same according to the present invention will be described in detail with reference to the drawings.

(First Embodiment) FIG. 1 shows a schematic structure of a vacuum vessel according to the present invention.

The front plate 1a and the back plate 1b are connected by a frit glass 3a to form the envelope 1. Further, the frit glass is aligned with the back plate 1b with the exhaust pipe 4 aligned with the exhaust hole 6. 3b, and the container 10 is connected by the frit glass 3c while the getter tube 5 is aligned with the getter hole 7.

A getter 8 is mounted inside the getter tube 5 in a state separated from the back plate 1b.

With this configuration, the activation of the getter 8 can be controlled independently of the thermal process at the time of manufacturing the container 10, for example, the sealing process or the evacuation / baking process. , A getter state enabling the reliability of the device to be improved.

Here, in order to independently control the activation of the getter 8 without being affected by a thermal process at the time of manufacturing the container 10, for example, a sealing process or an exhausting / baking process,
Although it is necessary to perform local temperature control of the getter 8, both heating and cooling must be performed through the getter tube 5, and the temperature control does not affect the container 10. It is necessary to do so. This is because when the container 10 is also affected by heat, it may be, for example, that the frit glass 3c is insufficiently heated and melted, or the back plate 1
This is because local thermal imbalance of b causes a problem such as occurrence of cracks in the back plate 1b.

The solution to these problems is to keep the getter 8 at an appropriate distance from the back plate 1b, which facilitates local temperature control only in the vicinity of the getter 8 mounting portion of the getter tube 5.

Here, as a specific example of a structure in which the getter 8 is present at a predetermined distance from the junction between the getter tube 5 and the envelope 1, for example, as shown in FIG. : D1 becomes D2 (> D1) from a location away from the envelope 1 by a predetermined distance, and the getter 8 has a structure in which the size passes through the inner diameter: D2 part but does not pass through the inner diameter: D1 part. No.

As another example, as shown in FIG. 3, a structure in which the getter tube 5 is bent at least two-dimensionally at a position separated from the junction between the getter tube 5 and the envelope 1 by a predetermined distance is known. is there.

The temperature control of the getter 8 for controlling the activation timing of the getter 8 is performed by the structure in which the getter 8 is present at a predetermined distance from the junction between the getter tube 5 and the envelope 1 as described above. At this time, it is possible to locally control only the temperature of the getter 8 without affecting the temperature control of the container 10.

Further, it has been experimentally and empirically obtained that the predetermined distance in the above configuration may be a distance equal to or longer than the projection length of the getter 8 in the length direction of the getter tube 5.

Here, as the getter 8, for example, the activation temperature of the getter 8 is set at the time of sealing and exhausting the container 10.
If you use something higher than the maximum temperature in the baking process,
It is not necessary to control the temperature during the manufacturing process.
It is only necessary to heat to the activation temperature after the completion of the baking step, and a configuration that is simple in the manufacturing step can be realized.

If the activation temperature is lower than the maximum temperature in the evacuation / baking step in manufacturing the container 10, it is necessary to locally cool the getter 8 during the thermal process in the manufacturing process. However, since the activation temperature is low, it is possible to realize a configuration capable of minimizing the influence of heat on the container 10 when separately heating and activating the getter 8 separately.

As described above, it is possible to realize a configuration of a vacuum vessel capable of improving the reliability of the degree of vacuum inside.

(Second Embodiment) FIG. 4 shows a schematic structure of an image display device according to the present invention.

Reference numeral 10 denotes a vacuum vessel, which has the structure of the vacuum vessel shown in the first embodiment.

Further, inside the vacuum vessel 10, for example, a field emission type electron-emitting device 11 is disposed on the back plate 1b side, and a control electrode 12 for controlling emitted electrons is provided on the front plate as viewed from the electron-emitting device. On the 1a side and on the inner surface of the front plate 1a, a phosphor 13 that emits light by collision of electrons is applied, and the above configuration enables image display.

The image display device having the above configuration is generally called a field emission display (FED).

The structure of the container of the present invention is used as the vacuum container 10, and the reliability with respect to the degree of vacuum inside becomes high.
As a result, the reliability of image characteristics as an image display device can be improved.

As another example of the image display device,
There is a plasma display panel (PDP). The schematic structure is shown in FIG.

The inside of the container 10 is partitioned by a rib 21 into a discharge space corresponding to a pixel, and at the same time, a discharge gas such as a mixed gas of neon and xenon is sealed inside.

A phosphor 22 is applied between the ribs 21 so as to correspond to the pixels, and an image is displayed by exciting and emitting the phosphor 22 by discharging a discharge gas.

It is the impurity gas state in the container 10 that greatly affects the characteristics of the PDP also as the image display device.

For this reason, it is very important to control the state of the impure gas in the container before and after filling the discharge gas. However, by using the vacuum container structure of the present invention, the characteristic reliability as an image display device can be improved. Improvement was realized.

(Third Embodiment) A method for manufacturing a vacuum container according to the present invention will be described with reference to the schematic structure of the vacuum container shown in FIG.

A frit 3a was applied to at least one peripheral portion of the front substrate 1a and the rear substrate 1b. Also, frit 3b and 3c were applied to the place where the exhaust pipe 4 and the getter pipe 5 of the back substrate 1b are placed.

Here, the getter tube 5 to which the getter 8 was attached was used.

The getter 8 used had an activation temperature higher than the highest temperature in the sealing process and the evacuation / baking process, which are thermal processes for manufacturing a vacuum vessel.

After assembling the above structure into a container structure, a sealing step of heating the entire container to a sealing temperature determined by the melting temperature of the frit was performed.

The frit 3a, 3f
Both b and 3c were heated and melted to complete a container 10 in which the front substrate 1a and the rear substrate 1b, the rear substrate 1b and the exhaust pipe 4, and the rear substrate 1b and the getter pipe were each hermetically bonded.

At this point, the inside of the container 10 is at atmospheric pressure.

Next, in this state, the container 10 is passed through the exhaust pipe 4.
Evacuation, which heats the entire container 10 while evacuating the inside
Baking was done.

This is to evacuate the inside of the container 10 from the exhaust pipe 4 and simultaneously heat the entire container 10. This aims to promote the degassing of the impurity gas adhering to the inner surface of the front substrate 1a or the rear substrate 1b.

The heating temperature at that time is generally lower than the sealing temperature from the viewpoint that it does not affect the frit glass heated, melted and bonded in the sealing step.

In the above, since the getter material 8 is a material whose activation temperature is higher than the sealing temperature and the evacuation / baking temperature, the getter 8 is activated during the sealing process and the evacuation / baking process. Will not be converted.

After the evacuation / baking step is completed, that is, when the degree of vacuum in the container 10 becomes sufficiently good, the getter 8 can be activated by locally heating it.

Specifically, as shown in FIG. 6, for example, the getter 8 is locally heated by a heating head 21 having a structure using a hot wire heater that locally surrounds the vicinity of the getter 8 mounting portion of the getter tube 5. The method was used.

After the activation, the exhaust pipe 4 was chipped off to form a vacuum vessel.

Further, it has been experimentally confirmed that the degree of vacuum in the container 10 immediately before the end of the heating in the evacuation / baking step is almost the same as the degree of vacuum at the end of the evacuation / baking step. Accordingly, the same effect can be obtained even if the activation of the getter 8 is performed during the evacuation / baking step, particularly immediately before the end of the heating.

In particular, when the activation is performed immediately before the end of the heating, the following advantages are obtained.

Usually, when the getter 8 is activated, a gas is released from the getter 8, and in some cases, this gas becomes a source of contamination inside the container. However, the gas is activated immediately before the end of heating. In this case, since the container itself is sufficiently heated, the gas released from the getter is hardly attached to the inside of the container, and as a result, there is an advantage that the gas is hardly contaminated.

In order to realize the local heating of the getter during the baking step, as shown in FIG. 7, a heating head that locally surrounds the getter mounting portion of the getter tube is connected to an exhaust / baking device. It can be provided by locally heating and activating the getter by the heating head during evacuation and baking.

In the above, it is necessary to locally control the temperature of the getter 8, but it is necessary to perform both heating and cooling through the getter tube 5, and
It is necessary to avoid the influence of the temperature control. This is because when the container 10 is also affected by heat, it causes, for example, insufficient heating and melting of the frit glass 3c, or a local thermal imbalance of the back plate 1b, which causes a problem such as cracking of the back plate 1b. It is because it is.

Therefore, as a method for solving such a problem, the getter 8 is separated from the back plate 1b by an appropriate distance, whereby the getter 8 of the getter tube 5 is removed.
Local temperature control only in the vicinity of the mounting portion is facilitated.

More specifically, as the getter tube, for example, as shown in FIG. 2, the inner diameter D1 becomes D2 (> D1) from a location away from the joint by a predetermined distance, and the getter 8
Means that the size passes through the inner diameter: D2 part but the inner diameter: D1
The use of a structure that does not allow the part to pass through is used.

As another example, as shown in FIG. 3, the getter tube 5 has a structure in which the getter tube 5 is bent in at least a two-dimensional shape at a position separated from the junction between the getter tube 5 and the envelope 1 by a predetermined distance. There is a method of using the same.

With the above structure in which the getter 8 is present at a predetermined distance from the junction between the getter tube 5 and the envelope 1, the temperature of the getter 8 is controlled for controlling the activation timing of the getter 8. At this time, it is possible to locally control only the temperature of the getter 8 without affecting the temperature control of the container 10.

According to the manufacturing method described above, the getter 8 is activated when the degree of vacuum is sufficiently high, so that the getter 8 is contaminated by the impure gas released during the manufacturing process of the container 10. As a result, the ability to adsorb impure gas in the panel after chip-off is not impaired.

As a result, a highly reliable vacuum container inside the container 10 can be manufactured.

It is apparent that the effect of the present invention is not limited to the envelope structure shown in the above embodiment. For example, the shape and structure of the envelope and the rectangular parallelepiped may be different. Is not particularly limited.

(Fourth Embodiment) A method for manufacturing a vacuum vessel according to the present invention will be described with reference to the schematic structure of the vacuum vessel shown in FIG.

The description is partially simplified because there are portions where the contents overlap with those of the third embodiment.

The frit 3a is applied to at least one of the peripheral portions of the front substrate 1a and the rear substrate 1b, and the exhaust pipe 4 and the getter pipe 5 are connected to the exhaust holes 6 and the getter exhaust holes 7 formed in the rear substrate 1b. In place and the joints are coated with frit 3b and 3c.

Here, the getter 8 is mounted in the getter tube 5.

The getter 8 is used whose activation temperature is at least lower than that of the sealing process.
During the sealing step and during the evacuation and baking steps, the temperature was locally cooled below the activation temperature.

More specifically, sealing and sealing are performed in a state where the getter 8 mounting portion of the getter tube 5 is locally surrounded by, for example, a water cooling head 22 having a built-in water cooling type cooling tube 22a as shown in FIG. Evacuation and baking can be performed, for example, by providing such a cooling head in the sealing device and the evacuation and baking device.

After the next exhaust / baking step, the getter 8 is locally heated and activated.

Here, the local heating is performed, for example, by the same method as in the third embodiment.

Further, for the same reason as described in the third embodiment, it is possible to activate the getter during the evacuation / baking step.

Here, there are the following two methods for heating the getter during the evacuation / baking step.

One is to use a cooling / heating combined head 23 as shown in FIG. 9 in place of the cooling head 22 described above, to cool during the sealing step, and to activate the activation temperature at a predetermined time during the exhaust / baking step. It is a method of heating up to.

Although there is a drawback that the structure of the head 23 becomes complicated, the structure is possible regardless of whether the activation temperature of the getter is higher or lower than the exhaust / baking temperature.

The other method is applicable only when the activation temperature of the getter is lower than the evacuation / baking temperature. The cooling is stopped at a predetermined time.

By stopping the cooling, the getter is heated to the atmosphere temperature in the furnace, that is, the exhaust / bake temperature and activated.

As described above, the getter 8 is activated when the degree of vacuum becomes sufficiently good, and the gas adsorbing ability of the getter 8 is not impaired.

In the case of this embodiment, the activation temperature of the getter is lower than the sealing temperature and lower than the melting temperature of the frit glass. This is because the getter is heated even though it is localized. Is advantageous from the viewpoint of thermal damage to the glass and the glass frit constituting the above.

For the same reason as described in the third embodiment, it is effective in this embodiment that the getter tube has a structure as shown in FIGS. 2 and 3, for example.

According to the above manufacturing method, it is possible to manufacture a vacuum container having high reliability of the degree of vacuum inside the container 10 and less heat damage when separately heating and activating the getter.

(Fifth Embodiment) An image display device was manufactured by using the method for manufacturing a vacuum container in the above-described embodiment.

The following relates to what is called a field emission display (FED), which is one type of image display device.

A method of manufacturing an image display device according to the present invention will be described with reference to FIG.

Numeral 10 denotes a vacuum vessel. The method for producing the same is the same as the method for producing the vacuum vessel shown in the third and fourth embodiments, except that the field emission type electron-emitting device 11 is mounted on the back plate 1b. The step of disposing, the step of disposing the control electrode 12 for controlling the emitted electrons on the front plate 1a side as viewed from the electron-emitting device, and the application of the phosphor 13 emitting light by collision of electrons to the inner surface of the front plate 1a Step is added.

Then, assembling into a container structure with the above configuration,
After that, sealing, exhausting and baking to form a container are the same as in the third and fourth embodiments.

Although the present embodiment makes it possible to manufacture an image display, the method for manufacturing a vacuum container according to the present invention is used as the method for manufacturing the vacuum container 10, and the reliability with respect to the degree of vacuum inside is increased. As a result, a method of manufacturing an image display device with improved reliability of image characteristics as the image display device was realized.

As another example of a method for manufacturing an image display device, there is a plasma display panel (PDP). The schematic structure is shown in FIG.

The manufacturing method of the container 10 is the same as the manufacturing method of the vacuum container shown in the third and fourth embodiments, except that a step of forming a rib 21 for partitioning the inside of the back plate 1b is performed. A step of applying the phosphor 22 between the ribs and the like, and a step of enclosing a discharge gas such as a mixed gas of neon and xenon inside the vacuum vessel after evacuation and getter activation are added. different.

Although the present embodiment makes it possible to manufacture an image display, the method for manufacturing a vacuum vessel according to the present invention is used as a method for manufacturing the vacuum vessel 10, and the reliability with respect to the degree of vacuum inside is increased. As a result, a method of manufacturing an image display device with improved reliability of image characteristics as the image display device was realized.

[0134]

According to the present invention, the getter function is enhanced and the ability to absorb the impure gas discharged into the discharge space during storage and operation of the panel is enhanced, so that the discharge characteristics are good and stable, and the life is long. Panel can be realized.

[Brief description of the drawings]

FIG. 1 is a view showing a vacuum vessel according to a first embodiment of the present invention.

FIG. 2 shows an example of a getter tube according to the first embodiment of the present invention.

FIG. 3 shows an example of a getter tube according to the first embodiment of the present invention.

FIG. 4 is a schematic diagram of an image display device according to a second embodiment of the present invention.

FIG. 5 is a schematic diagram of an image display device according to a second embodiment of the present invention.

FIG. 6 is a schematic diagram of a local heating head in a method for manufacturing an image display device according to a third embodiment of the present invention.

FIG. 7 is a schematic view of an exhaust baking apparatus provided with a local heating head in a method of manufacturing an image display device according to a third embodiment of the present invention.

FIG. 8 is a schematic view of a local cooling head in a method for manufacturing an image display device according to a fourth embodiment of the present invention.

FIG. 9 is a schematic view of a head for both local cooling and heating in a method for manufacturing an image display device according to a fourth embodiment of the present invention.

FIG. 10 is an explanatory diagram of a conventional technique.

FIG. 11 is an explanatory diagram of a conventional technique.

FIG. 12 is an explanatory diagram of a conventional technique.

[Explanation of symbols]

 Reference Signs List 1 envelope 1a front plate 1b back plate 3a frit glass 3b frit glass 3c frit glass 4 exhaust pipe 5 getter pipe 6 exhaust hole 7 getter hole 8 getter 10 container

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 5C012 AA05 5C032 JJ08 JJ12 JJ17 5C035 JJ10 JJ13 JJ14 5C040 HA01 HA08 HA10 JA40

Claims (22)

[Claims] 1. A vacuum vessel wherein at least an envelope and a getter tube having a non-evaporable getter mounted therein are evacuated to a vacuum, wherein the getter tube comprises the getter tube and the outer envelope. A vacuum container having a structure in which the non-evaporable getter is present at a predetermined distance from a junction with a vessel. 2. A structure in which the non-evaporable getter is present at a predetermined distance from a junction between the getter tube and the envelope, wherein an inner diameter near a junction with the envelope: D1 becomes D2 (> D1) from a position separated from the joint by a predetermined distance, and
2. The vacuum container according to claim 1, wherein the getter has a structure in which the size passes through an inner diameter portion D2 but does not pass an inner diameter portion D1. 3. A structure in which the non-evaporable getter is present at a predetermined distance from a joint between the getter tube and the envelope, the joint between the getter tube and the envelope. 2. The vacuum vessel according to claim 1, wherein the vacuum vessel has a structure that is bent at least two-dimensionally at a position separated from the object by a predetermined distance. 4. The vacuum vessel according to claim 2, wherein the predetermined distance is equal to or longer than a projection length of the getter in a length direction of the getter tube. 5. The vacuum container according to claim 1, wherein the vacuum container is configured as an image display device. 6. The vacuum vessel according to claim 5, wherein the image display device is a plasma display panel. 7. A sealing step of forming a container by joining at least an envelope and a getter tube having a non-evaporable getter mounted therein, and an evacuation unit for heating the container and simultaneously evacuating the interior.
A method of manufacturing a vacuum vessel comprising: a baking step, wherein the non-evaporable getter is not heated to its activation temperature during the sealing step and the evacuation / baking step, and the evacuation / baking step ends. A method for producing a vacuum vessel, wherein the method is heated to the activation temperature and activated later. 8. A sealing step of forming a container by joining at least an envelope and a getter tube having a non-evaporable getter mounted therein, and an evacuation / evacuating unit that heats the container and simultaneously evacuates the inside of the container.
A method of manufacturing a vacuum vessel comprising: a baking step, wherein the non-evaporable getter is not heated to its activation temperature during the sealing step, and is heated to its activation temperature during the evacuation / baking step. A method for producing a vacuum vessel, characterized in that the method is heated and activated to a maximum temperature. 9. A sealing step for forming a container by joining at least an envelope and a getter tube having a non-evaporable getter mounted therein, and an evacuation unit for heating the container and simultaneously evacuating the inside.
A method of manufacturing a vacuum vessel, comprising: a baking step, wherein the non-evaporable getter is mounted inside the getter tube at a predetermined distance from a junction between the envelope and the getter tube. And during the sealing step and the evacuation / baking step, it is not heated to the activation temperature, but is heated to the activation temperature after the evacuation / baking step and activated. Manufacturing method of vacuum container. 10. A sealing step of forming a container by joining at least an envelope and a getter tube having a non-evaporable getter mounted therein;
A method of manufacturing a vacuum vessel, comprising: a baking step, wherein the non-evaporable getter is mounted inside the getter tube at a predetermined distance from a junction between the envelope and the getter tube. A method of manufacturing the vacuum vessel, wherein the heating is not performed to the activation temperature during the sealing step, and the heating and activation is performed to the activation temperature during the evacuation / baking step. 11. The method for manufacturing a vacuum vessel according to claim 8, wherein the step of performing the evacuation / baking step is immediately before finishing the heating in the evacuation / baking step. 12. The method of mounting the getter so as to be present at the predetermined distance, wherein the inner diameter: D1 near the junction with the envelope is a predetermined distance from the junction. The vacuum according to claim 9 or 10, wherein D2 (> D1) is set from the position, and the getter has a structure in which the size passes through the inner diameter portion D2 but does not pass through the inner diameter portion D1. Container manufacturing method. 13. The method of mounting the getter so that the getter is present at the predetermined distance, wherein the getter tube is bent at least two-dimensionally at a position separated from the junction with the envelope by a predetermined distance. The method for manufacturing a vacuum vessel according to claim 9, wherein a structure is used. 14. A method of activating the getter by heating it to the activation temperature after the evacuation / baking step without heating the getter to its activation temperature during the sealing step and the exhaust / baking step. The getter is made of a material whose activation temperature is higher than the sealing temperature and the exhaust / baking temperature, and is activated by locally heating the getter after the exhaust / baking step. The method for producing a vacuum vessel according to claim 7 or 9, wherein: 15. A method in which the getter is not heated to its activation temperature during the sealing step and the evacuation / baking step, but is heated to the activation temperature after the evacuation / baking step to activate the getter. The getter is made of a material whose activation temperature is lower than at least the sealing temperature, and the getter is locally cooled during the sealing step and the evacuation / baking step, thereby activating the getter. 10. The method according to claim 7, wherein the getter is activated by locally heating the getter after the evacuation / baking step. 16. A method of heating and activating the getter to its activation temperature during the evacuation / baking step without heating it to its activation temperature during the sealing step, The method according to claim 1, wherein a material whose activation temperature is higher than the sealing temperature and the exhaust / baking temperature is used, and the getter is activated by locally heating the getter during the exhaust / baking process. 11. The method for producing a vacuum vessel according to 8 or 10. 17. A method of activating and heating the getter to its activation temperature during the evacuation / baking step without heating the getter to its activation temperature during the sealing step, A material whose activation temperature is lower than the sealing temperature and higher than the exhaustion / baking temperature is used, and the getter is locally cooled during the sealing step to lower the activation temperature to the activation temperature or lower. 11. The method for manufacturing a vacuum vessel according to claim 8, wherein the getter is locally heated during the baking step to attain an activation temperature or higher. 18. A method of heating and activating the getter to its activation temperature during the evacuation / baking step without heating it to its activation temperature during the sealing step, Activating the getter by using a material whose activation temperature is lower than the sealing temperature and the exhaust / baking temperature, and locally cooling the getter during the sealing step and the exhaust / baking step The method for manufacturing a vacuum vessel according to claim 8, wherein the temperature is set to be equal to or lower than a temperature, and local cooling of the getter is stopped during the evacuation / baking step. 19. The cooling device according to claim 19, wherein the local cooling is performed by providing a cooling head in an exhaust / baking device that locally surrounds the non-evaporable getter mounting portion of the getter tube. 15, 17, 1
9. The method for manufacturing a vacuum vessel according to any one of 8 above. 20. The method according to claim 20, wherein the local heating is performed by providing a heating head in an exhaust / baking device that locally surrounds the non-evaporable getter mounting portion of the getter tube. 14, 15, 1
18. The method for producing a vacuum vessel according to any one of items 6 and 17. 21. The method for manufacturing a vacuum container according to claim 7, wherein the method for manufacturing a vacuum container is included in a method for manufacturing an image display device. 22. The method according to claim 21, wherein the image display device is a plasma display panel.