JP2002311577A - Original plate of planographic printing plate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an excellent original plate of a planographic printing plate excellent in uniformity of an image forming layer, exhibiting high-contrast image forming property without lowering sensitivity and having good ink receptivity. SOLUTION: In the original plate having an image forming layer containing a high molecular compound on a base, the high molecular compound is a specified fluoroaliphatic group-containing copolymer.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel lithographic printing plate precursor containing a polymer compound having a fluoroaliphatic group in an image forming layer (hereinafter, also referred to as a fluorine-based polymer). The present invention relates to a lithographic printing plate precursor capable of providing a lithographic printing plate having a uniform coating surface state without causing cracks and providing excellent lithographic printing plates with excellent inking property.

[0002]

2. Description of the Related Art A lithographic printing plate precursor has a structure in which an image forming composition is provided on a substrate. A typical production process is to apply an image forming composition dispersed or dissolved in an organic solvent and, if necessary, an upper layer such as a protective layer to the surface of a support having been subjected to appropriate surface treatment, undercoating, back coating, etc. It will dry. Further, a typical plate-making process is a surface exposure of a contact or projection method via an image mask, a scanning of an electromagnetic wave based on image information from a computer, a direct exposure by modulation, and an image forming composition on a support. After causing a change in physical properties of the product in an image-like manner, the non-image area of the image-forming composition is removed (developed) and, if necessary, subjected to a treatment such as hydrophilization, sensitization, formation of a protective film, etc. A planographic printing plate having a non-image portion composed of a support surface layer and an image portion composed of a hydrophobic composition surface layer is formed. In the lithographic printing plate thus obtained, in a typical printing step, a hydrophilic non-image portion receives the dampening solution, and a lipophilic image portion receives the ink to form an ink image on the surface. A printed matter is obtained by directly or indirectly transferring the obtained ink image to a desired print medium.

As the image forming layer used here, as a change in physical properties upon exposure, a negative type which changes from soluble to insoluble, a positive type which changes from insoluble to soluble,
Also, various techniques are already known, such as one using a photoreaction, one using a heat mode process, and one using a thermal recording method as the principle of change in physical properties. Regardless of which image forming layer is used, there is a common technical problem to realize a highly useful lithographic printing plate precursor. That is, 1) the uniformity of the image forming layer is high, and 2) the hydrophobicity of the image portion is high, and the non-image portion has high development removability. The uniformity of the image area is technically mainly related to the above manufacturing process, but the original plate with insufficient uniformity is a printing plate that provides a large number of high quality, uniform printed matter stably. It is not preferable because the basic required performance of the device is significantly reduced. In addition, having a high hydrophobicity in the image area means that in the plate making process, by increasing durability against a developing solution, an excellent resolution is obtained, and sufficient printing durability and ink inking property are obtained in the printing process. It's important in terms of things. However, the high hydrophobicity of the image area may cause a decrease in solubility in an aqueous alkaline solution, which is a commonly used developer, and may result in poor development of non-image areas and generation of sludge components in the developer. And so on. That is, the hydrophobicity of the image area and the removability of the non-image area simply require contradictory properties to the image forming layer, and it is difficult and important to develop a technology that can achieve both. I have.

[0004] In view of such technical problems, it is known that the use of a composition containing a polymer compound having a fluoroaliphatic group as an image forming composition is useful. For example, Japanese Patent Application Laid-Open No. 54-135004 discloses effectiveness as a technique for improving the uniformity of an image forming layer. Also, JP-A-62-170950, JP-A-8-158
No. 58, JP-A-2000-19724 and the like disclose the utility of a copolymer containing a monomer unit having a fluoroaliphatic group and a monomer unit having a specific functional group. These techniques improve the deficiencies in the prior art, which merely discloses the use of a polymer compound having a fluoroaliphatic group, by selecting additional substituents.
This is a technique for reducing the adverse effect of a polymer having a fluoroaliphatic group on a plate making / printing process, or conversely, making effective use of it. Specifically, Japanese Patent Application Laid-Open No. Sho 62-170950
In Japanese Patent Application Laid-Open No. 2000-19724, Japanese Unexamined Patent Application Publication No. 2000-19724 discloses a method for further improving the function of expressing the uniformity of a film due to the improvement of surface activity. Disclosed is the effect of forming a high-contrast image by achieving compatibility between hydrophobicity of an image area and removability of a non-image area by utilizing an orientation force. Among the effects of the polymer having a fluoroaliphatic group, regarding the uniformity of the film, the surface activity of the polymer having a fluoroaliphatic group, that is, the organic solvent of the image forming composition in the production process, It is thought to be due to the ability of the dispersion solution to lower the surface tension. Another effect of the polymer compound having a fluoroaliphatic group is that the high hydrophobicity of the polymer compound containing a fluoroaliphatic group contained in the image forming layer of the lithographic printing plate precursor and the surface of the image forming layer It is considered to be caused by the orientation, uneven distribution, and localization ability of the polymer. That is, since the distribution of the fluoroaliphatic group-containing polymer compound in the image forming composition can be relatively high near the surface, the development removability of the photosensitive layer as a whole is maintained while the surface is particularly highly hydrophobic. It is considered that the property can be imparted. Further, as a measure for improving the polymer compound having a fluoroaliphatic group, a method other than the selection of the copolymer component can be considered. For example, JP-A-2000-187
No. 318 discloses that a polymer compound using a monomer unit having two or more fluoroaliphatic groups can provide an image forming material having excellent solubility discrimination between an image area and a non-image area. Have been.

As described above, an image forming layer containing a fluoroaliphatic compound is effective as a method for achieving the above-mentioned technical problems 1) and 2) common as an image forming layer for a lithographic printing plate precursor. However, on the other hand, the effect is still not enough, and in fact, further improvement is desired. For example, when a positive type image forming layer is used, in order to obtain a good printed matter, an image obtained after exposure and development has as high a discrimination between an image part and a non-image part as possible, that is, a substance having a high gradation (high contrast). Are required in terms of image reproducibility and scratch resistance, and are required to have high sensitivity and satisfy burn-out, white light safety and development tolerance. Not.

Here, the image being soft means that there is a large difference between the number of steps at which the image starts to remain when exposed and developed through the step wedge and the number of steps at which the film completely remains. Further, that the image is in high contrast means that the difference between the number of steps at which the image starts to remain and the number of steps at which the film completely remains is small.

[0007] Burning is caused by the fact that the lith film rises due to the gas generated by the decomposition of the photosensitive material and makes it impossible to perform perfect contact exposure. The easier it is to eliminate burns. The white light safety indicates the stability of image sensitivity when the printing plate is exposed to a white light such as a fluorescent light, and the higher the image, the better the white light safety. The step wedge is a strip-shaped film in which the density changes by 0.15 for each step, and is used when obtaining the relationship between the exposure amount and the remaining amount of the photosensitive layer after development after exposure. The clear sensitivity means the sensitivity at which an image starts to be formed after exposure and development. The development tolerance is
This is to observe how the image sensitivity after exposure and development changes when the concentration of the developer changes, and it is said that the smaller the change in sensitivity, the better the development tolerance.

Further, a photopolymerization printing plate containing a photopolymerization initiator represented by a negative type lithographic printing plate and a monomer having a polymerizable double bond, particularly a laser direct plate having high sensitivity to a laser beam in the visible light region. In the case of an exposure type printing plate, when the image is exposed with an inner drum type laser plate setter that fixes the printing plate, rotates the mirror at high speed, and exposes the image, the fogging due to scattered light and reflected light occurs because the gradation is conventionally soft. It was easy. Exposure with high energy is desired to increase the printing durability of the printing plate. However, fogging due to scattered light and reflected light is getting worse, so that the exposure amount cannot be increased to increase the printing durability. In order to increase the printing durability, it is necessary to prevent fog due to scattered light and reflected light even at a high exposure amount. This can be solved by making the gradation high. This is because image exposure with a laser is performed for about 1 microsecond per dot, but fog due to scattered or reflected light is exposed to extremely weak light for a long time in the order of several minutes, and the photosensitive layer is exposed. Light curing. Therefore, when the gradation of the photosensitive material becomes high, the photosensitive material is hardly photocured with weak light, and is removed by development without fogging. In the case of a heat-sensitive lithographic printing plate that draws using an infrared laser, etc., discrimination between the image part and the non-image part is low, that is, the gradation is low (soft tone), so that image omission may occur in the part touched by bare hands. In addition, there is a problem that stability against trauma is poor.

[0009]

SUMMARY OF THE INVENTION The present invention seeks to establish a technology capable of achieving the above technical problems 1) and 2) at a level higher than the conventional technology. An object of the present invention is to provide a lithographic printing plate precursor which is excellent in uniformity of a formed layer, shows a high contrast image forming property without lowering the sensitivity, and has good ink adhesion.

[0010]

Means for Solving the Problems As a result of intensive studies, the present inventors have found that the above object can be achieved by adding a specific fluorine-based polymer to an image forming layer. The present invention is an invention based on a discovery made by examining a specific fluoroaliphatic group and a copolymer component in detail. That is, in the present invention, a lithographic printing plate precursor having a configuration as described in (1) and (2) described below exerts excellent effects on the technical problems 1) and 2). For example, it has been found that a positive photosensitive resin composition can be obtained which gives a uniform coating surface without causing surface quality abnormality due to foaming during production, and which has good ink depositability without lowering sensitivity. Was.

Further, by adding the fluoropolymer according to the present invention, in the negative type lithographic printing plate precursor, in addition to the improvement of the surface quality and the inking, the gradation is increased, and particularly, the laser-sensitive photopolymerizable printing plate is used. It was found that a printing plate having high sensitivity to laser light, good fogging by scattered light and reflected light, and high printing durability was obtained. Further, in the heat-sensitive lithographic printing plate precursor, in addition to the improvement of the surface quality and the inking property, the discrimination is large and the image strength is strong, so that the image touching of a portion touched with bare hands does not occur, and the stability against trauma is improved. It turned out that a printing plate was obtained.

The lithographic printing plate precursor according to the present invention has the following constitutions (1) and (2). (1) In a lithographic printing plate precursor having an image forming layer containing a fluoroaliphatic group-containing copolymer on a support,
A lithographic printing plate precursor wherein the fluoroaliphatic group-containing copolymer contains a repeating unit corresponding to the following monomer (i) and a repeating unit corresponding to the following monomer (ii). (I) a fluoroaliphatic group-containing monomer represented by the following general formula [1] (ii) poly (oxyalkylene) acrylate and / or poly (oxyalkylene) methacrylate general formula [1]

[0013]

Embedded image (In the general formula [1], R ₁ represents a hydrogen atom or a methyl group, and X represents an oxygen atom, a sulfur atom, or —N (R ₂ )
Represents m, m represents an integer of 1 to 6, and n represents an integer of 2 or 3. R ₂ represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. )

(2) In a lithographic printing plate precursor having an image-forming layer containing a fluoroaliphatic group-containing copolymer on a support, the fluoroaliphatic group-containing copolymer has the following (i) A repeating unit corresponding to a monomer, the following (ii)
A repeating unit corresponding to the monomer of the following (iii):
A lithographic printing plate precursor comprising: a repeating unit corresponding to the monomer of (I) a fluoroaliphatic group-containing monomer represented by the above general formula [1] (ii) poly (oxyalkylene) acrylate and / or poly (oxyalkylene) methacrylate (iii) the above (i) and (ii) Copolymerizable monomer represented by the following general formula [2] General formula [2]

[0015]

Embedded image (In the general formula [2], R ₃ represents a hydrogen atom or a methyl group, Y represents a divalent linking group, R ₄ is 20 or less linear having 4 or more carbon atoms which may have a substituent, Represents a branched or cyclic alkyl group.)

Preferred embodiments will be described below. (3) a repeating unit corresponding to the fluoroaliphatic group-containing monomer represented by the general formula [1], a repeating unit corresponding to polyoxyalkylene (meth) acrylate,
A lithographic printing plate precursor comprising a fluoroaliphatic group-containing copolymer having a repeating unit corresponding to polyoxyethylene (meth) acrylate. (4) In a lithographic printing plate precursor comprising at least an image forming layer containing a photothermal conversion agent, an alkali-soluble resin and the above-mentioned fluoroaliphatic group-containing copolymer on an aluminum support, the image forming layer is exposed to laser light. The lithographic printing plate as described in any one of (1) to (3) above, wherein the solubility in an alkali developing solution can be increased or decreased. (5) A lithographic printing plate precursor comprising an aluminum support and an image forming layer containing at least a photothermal conversion agent, a thermal radical generator, a radical polymerizable compound and the above-mentioned fluoroaliphatic group-containing copolymer. The above (1), wherein the forming layer is capable of increasing or decreasing the solubility in an alkali developing solution by laser exposure.
A lithographic printing plate according to any one of (1) to (4).

[0017]

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a copolymer having a fluoroaliphatic group (sometimes abbreviated as “fluorinated polymer”) according to the present invention will be described in detail. As the fluorine-based polymer used in the present invention, acrylic resins and methacrylic resins satisfying the requirements described in the above (1) or (2), and copolymers thereof with a vinyl monomer copolymerizable therewith are useful.

One of the fluoroaliphatic groups in the fluoropolymer according to the present invention is obtained from a fluoroaliphatic compound produced by a telomerization method (also called a telomer method) or an oligomerization method (also called an oligomer method). It is derived. Regarding the production method of these fluoroaliphatic compounds, for example,
117-11 of "Synthesis and Function of Fluorine Compounds"
Eight pages and “Chemistry of Organic Fluorine Compou
nds II "(Monograph 187, Ed by Milos Hudlicky and A
ttila E. Pavlath, American Chemical Society 1995), pages 747-752. The telomerization method is a method of synthesizing a telomer by radical polymerization of a fluorine-containing vinyl compound such as tetrafluoroethylene using an alkyl halide having a large chain transfer constant such as iodide as a telogen (see, for example, Scheme-1). showed that).

[0019]

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The obtained terminal iodinated telomer is usually
For example, appropriate terminal chemical modification such as [Scheme 2] is performed, and the resulting compound is led to a fluoroaliphatic compound. These compounds are further converted to a desired monomer structure, if necessary, and used for producing a fluoroaliphatic group-containing polymer.

[0021]

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In the general formula [1] of the present invention, R ₁ represents a hydrogen atom or a methyl group, and X represents an oxygen atom, a sulfur atom, or —N (R ₂ ) —. Here, R ₂ represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, specifically, a methyl group, an ethyl group, a propyl group, or a butyl group, and is preferably a hydrogen atom or a methyl group. X is more preferably an oxygen atom. M in the general formula [1] is preferably an integer of 1 to 6, and particularly preferably 2. N in the general formula [1] is 2
Or 3, and a mixture of 2 or 3 may be used. More specific examples of the fluoroaliphatic group-containing monomer represented by the general formula [1] are shown below, but are not limited thereto.

[0023]

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[0024]

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[0025]

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[0026]

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[0027]

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[0028]

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[0029]

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In the general formula [2], R ₃ is a hydrogen atom,
Y represents a methyl group, and Y represents a divalent linking group. Examples of the divalent linking group include an oxygen atom, a sulfur atom, -N (R5)-,
Are preferred. Here, R5 is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, for example, a methyl group, an ethyl group, a propyl group,
Butyl groups and the like are preferred. More preferred forms of R5 are a hydrogen atom and a methyl group. Y is an oxygen atom, -N (H)
—, —N (CH ₃ ) — are more preferred. R ₄ represents a linear, branched or cyclic alkyl group having 4 to 20 carbon atoms which may have a substituent. Examples of the substituent of the alkyl group represented by R ₄ include a hydroxyl group, an alkylcarbonyl group, an arylcarbonyl group, a carboxyl group, an alkyl ether group, an aryl ether group, a halogen atom such as a fluorine atom, a chlorine atom and a bromine atom, a nitro group, a cyano group. And amino groups, but not limited thereto. Examples of the linear, branched or cyclic alkyl group having 4 to 20 carbon atoms include a butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group and undecyl group which may be linear or branched. , Dodecyl group, tridecyl group, tetradecyl group, pentadecyl group, octadecyl group, eicosanyl group and the like, cyclohexyl group, cycloheptyl group and other monocyclic cycloalkyl group and bicycloheptyl group, bicyclodecyl group, tricycloundecyl group, Polycyclic cycloalkyl groups such as a tetracyclododecyl group, an adamantyl group, a norbornyl group, and a tetracyclodecyl group are preferably used.

More specific examples of the monomer represented by the general formula [2] include, but are not limited to, the following monomers.

[0032]

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[0033]

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[0034]

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[0035]

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[0036]

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[0037]

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[0038]

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[0039]

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[0040]

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[0041]

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[0042]

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[0043]

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Next, poly (oxyalkylene) acrylate and / or poly (oxyalkylene) methacrylate, which are essential components of the present invention, will be described. A polyoxyalkylene group can be represented by (OR) x, where R is an alkylene group having 2 to 4 carbon atoms, for example, -C
_{H 2 CH 2 -, - CH} 2 CH 2 CH 2 -, - CH (CH 3) CH
₂ -, or _{-CH (CH 3) CH (CH} 3) - is preferably. The oxyalkylene units in the above-mentioned poly (oxyalkylene) group may be the same as in poly (oxypropylene), or may be those in which two or more different oxyalkylenes are irregularly distributed. It may be a linear or branched oxypropylene or oxyethylene unit, or may be a linear or branched oxypropylene unit block and an oxyethylene unit block.
The poly (oxyalkylene) chain may include one or more chain bonds (eg, -CONH-Ph-NHCO-,-
S— etc .: Ph represents a phenylene group). If the linkage in the chain has three or more valencies, this provides a means for obtaining branched oxyalkylene units. When this copolymer is used in the present invention, the molecular weight of the poly (oxyalkylene) group is suitably from 250 to 3000. Poly (oxyalkylene) acrylates and methacrylates are commercially available hydroxy poly (oxyalkylene) materials,
For example, trade name “Pluronic” [Pluronic (manufactured by Asahi Denka Kogyo Co., Ltd.), Adeka polyether (Asahi Denka Kogyo Co., Ltd.)
Manufactured by "Carbowax (Glyco Products)", "Triton" (Rori and Haas (Rohm and Haas)) and PEG (Daiichi Kogyo Seiyaku Co., Ltd.) Can be produced by a known method with acrylic acid, methacrylic acid, acryl chloride, methacryl chloride, acrylic anhydride, etc. Alternatively, poly (oxyalkylene) diacrylate produced by a known method can be used. .

In the present invention, an essential component represented by the general formula [1]
A copolymer of the monomer represented by the formula (1) and polyoxyalkylene (meth) acrylate is used, but it is more preferable to contain polyoxyethylene (meth) acrylate since solubility in a developer is improved. A particularly preferred embodiment is a polymer obtained by copolymerizing three or more monomers of a monomer represented by the general formula [1], polyoxyethylene (meth) acrylate, and polyoxyalkylene (meth) acrylate. Here, polyoxyalkylene (meth) acrylate is a monomer different from polyoxyethylene (meth) acrylate. More preferably, it is a terpolymer of polyoxyethylene (meth) acrylate, polyoxypropylene (meth) acrylate, and a monomer represented by the general formula [1]. The preferred copolymerization ratio of polyoxyethylene (meth) acrylate is 0.5 mol% or more of all
Mol% or less, more preferably 1 mol% or more and 10 mol% or less.

In the present invention, an essential component represented by the general formula [1]
And poly (oxyalkylene) acrylate and / or poly (oxyalkylene) methacrylate and the monomer represented by the general formula [2],
A monomer copolymerizable therewith can be reacted. The copolymerizable ratio of the copolymerizable monomer is preferably 20 mol% or less, more preferably 10 mol% or less of all monomers. Such monomers include:
Polymer Handbook 2nd ed. ,
J. Brandrup, Wiley lintersci
ence (1975) Chapter 2Page 1
To 483 can be used. For example, compounds having one addition-polymerizable unsaturated bond selected from acrylic acid, methacrylic acid, acrylic esters, methacrylic esters, acrylamides, methacrylamides, allyl compounds, vinyl ethers, vinyl esters, and the like. I can give it.

Specifically, the following monomers can be mentioned. Acrylic esters: methyl acrylate, ethyl acrylate, propyl acrylate, chloroethyl acrylate, 2-hydroxyethyl acrylate, trimethylolpropane monoacrylate, benzyl acrylate,
Methacrylic esters such as methoxybenzyl acrylate, furfuryl acrylate, tetrahydrofurfuryl acrylate, etc .: methyl methacrylate, ethyl methacrylate, propyl methacrylate, chloroethyl methacrylate, 2-hydroxyethyl methacrylate,
Trimethylolpropane monomethacrylate, benzyl methacrylate, methoxybenzyl methacrylate, furfuryl methacrylate, tetrahydrofurfuryl methacrylate, etc.

Acrylamides: acrylamide, N-
Alkyl acrylamide (the alkyl group has 1 carbon atom
To 3, for example, a methyl group, an ethyl group, or a propyl group), N, N-dialkylacrylamide (an alkyl group having 1 to 3 carbon atoms), N-hydroxyethyl-N-methylacrylamide, N-2- Acetamidoethyl-N-acetylacrylamide and the like. Methacrylamides: methacrylamide, N-alkyl methacrylamide (alkyl group having 1 to 3 carbon atoms, for example, methyl group, ethyl group, propyl group), N,
N-dialkyl methacrylamide (alkyl group having 1 to 3 carbon atoms), N-hydroxyethyl-N-methylmethacrylamide, N-2-acetamidoethyl-
N-acetyl methacrylamide and the like. Allyl compounds: allyl esters (eg, allyl acetate,
Allyl caproate, allyl caprylate, allyl laurate, allyl palmitate, allyl stearate, allyl benzoate, allyl acetoacetate, allyl lactate), allyloxyethanol, etc.

Vinyl ethers: alkyl vinyl ethers (eg, hexyl vinyl ether, octyl vinyl ether, decyl vinyl ether, ethylhexyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, chloroethyl vinyl ether,
-Methyl-2,2-dimethylpropyl vinyl ether,
2-ethylbutyl vinyl ether, hydroxyethyl vinyl ether, diethylene glycol vinyl ether,
Dimethylaminoethyl vinyl ether, diethylaminoethyl vinyl ether, butylaminoethyl vinyl ether, benzyl vinyl ether, tetrahydrofurfuryl vinyl ether, etc. Vinyl esters: vinyl bityrate, vinyl isobutyrate, vinyl trimethyl acetate, vinyl diethyl acetate, vinyl valate, vinyl caproate , Vinyl chloroacetate, vinyl dichloroacetate, vinyl methoxy acetate, vinyl butoxy acetate,
Vinyl lactate, vinyl-β-phenylbutyrate,
Vinylcyclohexylcarboxylate and the like.

Dialkyl itaconates: dimethyl itaconate, diethyl itaconate, dibutyl itaconate and the like. Dialkyl or monoalkyl esters of fumaric acid: dibutyl fumarate and the like, crotonic acid, itaconic acid, acrylonitrile, methacrylonitrile, maleilenitrile, styrene and the like.

Some of the fluorinated chemical products produced by the electrolytic fluorination method, which has been favorably used in the past, are substances having low biodegradability and high bioaccumulation, and the degree is slight. However, there is a concern that it has reproductive and developmental toxicity. The fact that the fluorine-based chemical product according to the present invention is a substance having higher environmental safety is also an industrial advantage.

The amount of the fluoroaliphatic group-containing monomer represented by the general formula [1] used in the fluoropolymer used in the present invention is 5 mol% based on each monomer of the fluoropolymer. Or more, preferably 5-7
0 mol%, more preferably in the range of 7 to 60 mol%. Poly (oxyalkylene) acrylate and / or poly (oxyalkylene) which are essential components of the present invention
The amount of the methacrylate is at least 10 mol% based on each monomer of the fluoropolymer, and is preferably 15 to 7%.
0 mol%, more preferably 20 to 60 mol%. The amount of the monomer represented by the general formula [2], which is a preferable embodiment used in the present invention, is 3 mol% or more, preferably 5 to 50 mol%, based on each monomer of the fluoropolymer. And more preferably 10 to 40 mol%.

The preferred weight average molecular weight of the fluoropolymer used in the present invention is preferably from 3,000 to 100,000, more preferably from 6,000 to 80,000.
Further, the preferable addition amount of the fluoropolymer used in the present invention is in the range of 0.005 to 8% by weight, preferably 0.01 to 5% by weight, based on the photosensitive composition (the coating component excluding the solvent). %, More preferably 0.1% by weight.
It is in the range of 0.5 to 3% by weight. If the amount of the fluorine-containing polymer is less than 0.005% by weight, the effect is insufficient. Adversely affect

The fluoropolymer of the present invention can be produced by a known and commonly used method. For example, a monomer such as the (meth) acrylate having a fluoroaliphatic group or the (meth) acrylate having a polyoxyalkylene group described above is polymerized by adding a general-purpose radical polymerization initiator in an organic solvent. Manufacturing. Alternatively, if necessary, another addition-polymerizable unsaturated compound can be added to produce the compound in the same manner as described above. In accordance with the polymerizability of each monomer, a dropping polymerization method in which a monomer and an initiator are polymerized while being dropped into a reaction vessel is also effective for obtaining a polymer having a uniform composition.

Hereinafter, specific examples of the structure of the fluoropolymer according to the present invention will be shown, but the present invention is not limited thereto. The numbers in the formulas indicate the molar ratio of each monomer component. Mw represents a weight average molecular weight.

[0056]

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[0060]

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[0061]

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[0062]

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[0063]

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[0064]

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[0065]

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Next, other components necessary for preparing a photosensitive resin composition as a composition for an image forming layer according to the present invention will be described. As the positive-type photosensitive resin composition, any one can be used as long as its solubility or swelling property in a developer changes before and after exposure, and an o-quinonediazide compound is preferred as a positive photosensitive resin composition. For example, in the case of a positive photosensitive resin composition containing an alkali-soluble resin and an o-quinonediazide compound, the o-quinonediazide compound is a compound having at least one o-quinonediazide group and has a solubility in an aqueous alkali solution by actinic light. Are preferred.

As such a structure, various structures are known. For example, “Light-Sensitive” by J. KOSAR
Systems "(John Wiley & Sons, Inc, 1965) P.33
See pages 6 to 352 for details. As the photosensitive compound of the positive photosensitive resin composition, various hydroxyl compounds and sulfonic acid esters of o-benzoquinonediazide or o-naphthoquinonediazide are particularly suitable.

Examples of the above o-quinonediazide compounds include, for example, 1,2-naphthoquinone-2-diazide-5.
Esters of -sulfonyl chloride with phenol-formaldehyde resin or cresol-formaldehyde resin; 1,2-naphthoquinone-2-diazido-5-sulfonyl chloride and pyrogallol, described in US Pat. No. 3,635,709. Esters with acetone resin; esters of 1,2-naphthoquinone-2-diazido-5-sulfonyl chloride and resorcin-benzaldehyde resin described in JP-B-63-13,528; JP-B-62-44,257 Of 1,2-naphthoquinone-2-diazido-5-sulfonyl chloride and resorcinol-pyrogallol-acetone co-condensation resin described in JP-A No.

A polyester obtained by esterifying 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride to a polyester having a terminal hydroxyl group described in JP-B-56-45,127; 24,6
No. 41,995, a copolymer of N- (4-hydroxyphenyl) methacrylamide with a homopolymer or another copolymerizable monomer may be added to 1,2-naphthoquinone-2.
Esterified ester of 1-diazido-5-sulfonyl chloride; ester of 1,2-naphthoquinone-2-diazido-5-sulfonyl chloride and bisphenol-formaldehyde resin described in JP-B-54-29,922 A copolymer of p-hydroxystyrene described in JP-B-52-36,043 with a homopolymer of p-hydroxystyrene or another copolymerizable monomer with 1,2-naphthoquinone-2-diazido-5-sulfonyl chloride; 1,2-naphthoquinone-2-diazide-
There are esters of 5-sulfonyl chloride with polyhydroxybenzophenone.

Other known o-quinonediazide compounds that can be used in the present invention include JP-A-63-80,2525.
4, JP-A-58-5,737, JP-A-57-111,
No. 530, JP-A-57-111,531, JP-A-57-111
114,138, JP-A-57-142,635, JP-A-51-36,129, JP-B-62-2,411,
Those described in each specification such as JP-B-62-51,459 and JP-B-51-483 can be used. The content of the o-quinonediazide compound,
It is usually 5 to 60% by weight, more preferably 10 to 40% by weight, based on the total solid content of the photosensitive resin composition.

As a photosensitive compound other than o-quinonediazide, a chemically amplified photosensitive material comprising a combination of a compound in which an alkali-soluble group is protected with an acid-decomposable group and a photoacid generator can be used. As the photoacid generator used in the chemical amplification system, known photoacid generators can be used.

For example, SI Schlesinger, Photogr. S
ci. Eng., 18, 387 (1974), TSBal etal, Polymer,
21, 423 (1980) etc., U.S. Pat.
4,069,055, 4,069,056, ammonium salts described in JP-A-3-140140, etc., DCNecker et al, Macromolecul
es, 17, 2468 (1984), CS Wen etal, Teh, Proc. Con
f. Rad.Curing ASIA, p478 Tokyo, Oct (1988), U.S. Pat.Nos.
1307 (1977), Chem. & Eng. News, Nov. 28, p31 (1988),
European Patent No. 104,143, U.S. Patent No. 339,049, No. 410,
No. 201, JP-A-2-150848, iodonium salts described in JP-A-2-29514, etc., JV Crivello et al, Polymer J.
17, 73 (1985), JV Crivello et al. J. Org. Chem.,
43, 3055 (1978), WR Wattetal, J. Polymer Sci., P
olymer Chem. Ed., 22, 1789 (1984), JV Crivelloet
al, Polymer Bull., 14, 279 (1985), JV Crivello
etal, Macromorecules, 14 (5), 1141 (1981), JV Cri
vello etal, J. Polymer Sci., Polymer Chem. Ed., 1
7, 2877 (1979), European Patent No. 370,693, U.S. Patent 3,90
2,114, European Patent Nos. 233,567, 297,443, 297,
No. 442, U.S. Pat.Nos. 4,933,377, 410,201, 339,0
No. 49, No. 4,760,013, No. 4,734,444, No. 2,833,827
No. 2,904,626, 3,604,580, 3,604,
No. 581, etc., sulfonium salt,

JV Crivello etal, Macromorecules, 1
0 (6), 1307 (1977), JV Crivelloetal, J. Polymer S
ci., Polymer Chem. Ed., 17, 1047 (1979) and the like, CS Wen et al., Teh, Proc. Conf. Rad.
Onium salts such as arsonium salts described in Curing ASIA, p478 Tokyo, Oct (1988), U.S. Pat.No. 3,905,815,
JP-B-46-4605, JP-A-48-36281, JP-A-55-32070
No., JP-A-60-239736, JP-A-61-169835, JP-A-61-169835
-169837, JP-A-62-58241, JP-A-62-212401, JP-A-63-70243, and organic halogen compounds described in JP-A-63-298339, K. Meier et al., J. Rad. Curing, 13 (4),
26 (1986), TP Gill et al., Inorg. Chem., 19, 3007.
(1980), D. Astruc, Acc. Chem. Res., 19 (12), 377 (18
96), and organometallic / organic halides described in JP-A-2-14145, S. Hayase et al., J. Polymer Sci., 25, 753
(1987), E. Reichmanis et al., J. Pholymer Sci., Pol
ymerChem. Ed., 23, 1 (1985), QQ Zhu etal, J. Ph.
otochem., 36, 85, 39, 317 (1987), B. Amit et al, Te
trahedron Lett., (24), 2205 (1973), DHR Barto
n etal, J. Chem Soc., 3571 (1965), PM Collins eta
l, J. Chem. SoC., Perkin I, 1695 (1975), M. Rudinst
ein etal, Tetrahedron Lett., (17), 1445 (1975), J.
W. Walker etal J. Am. Chem. Soc., 110, 7170 (198
8), SCBusmanetal, J. Imaging Technol., 11 (4), 191 (198
5), HM Houlihan et al, Macormolecules, 21, 2001 (198
8), PMCollins et al, J. Chem. Soc., Chem. Commun., 532
(1972), S. Hayase et al, Macromolecules, 18, 1799 (198
5), E. Reichmanis et al, J. Electrochem. Soc., Solid Sta.
te Sci.Technol., 130 (6), FMHoulihan et al, Macromolc
ules, 21, 2001 (1988), EP 0290,750, 046,08
No. 3, 156,535, 271,851, 0,388,343, U.S. Pat.Nos. 3,901,710, 4,181,531, JP-A-60-198538
No., a photoacid generator having an o-nitrobenzyl-type protecting group described in JP-A-53-133022, etc.

M. TUNOOK etal, Polymer Preprints Japa
n, 35 (8), G. Berner et al., J. Rad. Curing, 13 (4), W.
J. Mijs etal, Coating Technol., 55 (697), 45 (1983),
Akzo, H. Adachi etal, Polymer Preprints, Japan, 37
(3), European Patent Nos. 0199,672, 84515, 199,672,
No. 044,115, No. 0101,122, U.S. Pat.No. 4,618,564,
No. 4,371,605, No. 4,431,774, JP-A-64-18143, JP-A-2-245756, Photodecomposition represented by iminosulfonate described in Japanese Patent Application No. 3-140109, etc. to generate sulfonic acid. And the disulfone compounds described in JP-A-61-166544 and the like. The amount of the compound that decomposes by irradiation with actinic rays or radiation to generate an acid is the total weight of the photosensitive resin composition (excluding the coating solvent).
The amount is usually in the range of 0.001 to 40% by weight, preferably 0.01 to 20% by weight, more preferably 0.1 to 5% by weight, based on the total weight.

The compound having an alkali-soluble group protected by an acid-decomposable group is a compound having a -CO-C- or -CO-Si- bond, and examples thereof include the following. a) at least one selected from the group consisting of orthocarboxylic acid esters and carboxylic acid amide acetals, wherein the compound can have polymerizability, said group being a crosslinking element in the main chain or a lateral substituent B) an oligomeric or polymeric compound containing in the main chain a compound selected from the group consisting of repeating acetal and ketal; c) a compound containing at least one enol ester or N-acylaminocarbonate group; d. ) Cyclic acetal or ketal of β-ketoester or β-ketoamide,

E) a compound containing a silyl ether group, f) a compound containing a silyl enol ether group, g) an aldehyde or ketone component
Monoacetals or monoketals having a solubility of 0.1-100 g / l, h) ethers of tertiary alcohols, and i) carboxylic esters and carbonates of tertiary allylic or benzylic alcohols.

The compounds of the type (a) which can be cleaved by acids as components of the light-sensitive mixture are described in DE-A-2,610,842 and DE-A-2,928,636. Mixtures containing compounds of type (b) are described in German Patents 2,306,248 and
718,254. Compounds of class (c) are described in EP-A-0,006,626 and EP-A-0,006,627. Compounds of class (d) are described in EP-A-0,202,
The compounds used as class (e) are described in DE 196,196 and 3,601,264. Compounds of class (f) are described in German Offenlegungsschrift 3,730,78.
No. 5,730,783, compounds of type (g) are described in German Offenlegungsschrift 3,731.
No. 0,783. Compounds of type (h) are described, for example, in US Pat. No. 4,603,101, and compounds of type (i) are described, for example, in US Pat.
491,628 and a paper by JM Frechet et al. (J. Im.
agingSci. 30, 59-64 (1986)). The content of the compound protected by the acid-decomposable group is usually 1 to 60% by weight, more preferably 5 to 40% by weight, based on the total solid content of the photosensitive resin composition.

The photosensitive resin composition may contain a synthetic resin which is insoluble in water and soluble in an alkaline aqueous solution (hereinafter referred to as an alkali-soluble resin). Examples of the alkali-soluble resin include phenol / formaldehyde resin, cresol / formaldehyde resin, phenol / cresol / formaldehyde cocondensation resin, phenol-modified xylene resin, polyhydroxystyrene, polyhalogenated hydroxystyrene, N- (4-hydroxyphenyl) methacryl In addition to amide copolymers and hydroquinone monomethacrylate copolymers, sulfonylimide polymers described in JP-A-7-28244, and carboxyl group-containing polymers described in JP-A-7-36184 are exemplified. Other acrylic resins containing a phenolic hydroxyl group, such as those disclosed in JP-A-51-34711, acrylic resins having a sulfonamide group described in JP-A-2-866, and urethane-based resins. Also, various alkali-soluble polymer compounds can be used. These alkali-soluble polymer compounds have a weight average molecular weight of 500 to 20,000 and a number average molecular weight of 200 to 6
000 is preferred. Such alkali-soluble polymer compounds may be used alone or in combination of two or more, and are used in an amount of 80% by weight or less of the whole composition.

Further, as described in US Pat. No. 4,123,279, an alkyl group having 3 to 8 carbon atoms such as a t-butylphenol formaldehyde resin or an octylphenol formaldehyde resin is used as a substituent. It is preferable to use a condensate of phenol and formaldehyde in combination to improve the oil sensitivity of the image. Such an alkali-soluble resin is generally used in an amount of 90% by weight or less based on the total weight of the composition.

The photosensitive resin composition may further contain, if necessary, a cyclic acid anhydride for increasing the sensitivity, a printing-out agent for obtaining a visible image immediately after exposure, a dye as an image coloring agent, and the like. Can be added.

In the photosensitive resin composition of the present invention,
It is preferable to add cyclic acid anhydrides, phenols, and organic acids to increase the sensitivity. As the cyclic acid anhydride, phthalic anhydride, tetrahydrophthalic anhydride, and phthalic anhydride as described in U.S. Pat.
Hexahydrophthalic anhydride, 3,6-endooxy to Δ4
To tetrahydrophthalic anhydride, tetrachlorophthalic anhydride, maleic anhydride, chloromaleic anhydride, α-phenylmaleic anhydride, succinic anhydride, pyromellitic anhydride and the like. Phenols include bisphenol A, p-nitrophenol, p-ethoxyphenol,
2,3,4-trihydroxybenzophenone, 4-hydroxybenzophenone, 2,4,4'-trihydroxybenzophenone, 4,4 ', 4 "-trihydroxy-triphenylmethane, 4,4', 3", 4 "-Tetrahydroxy-3,5,3 ', 5'-tetramethyltriphenylmethane.

As the organic acids, JP-A-60-8894
No. 2, JP-A-2-96755, and the like, there are sulfonic acids, sulfinic acids, alkyl sulfates, phosphonic acids, phosphinic acids, phosphate esters, carboxylic acids, and the like. p-toluenesulfonic acid, dodecylbenzenesulfonic acid, p-toluenesulfinic acid, ethyl sulfate, phenylphosphonic acid,
Phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophthalic acid, adipic acid, p-toluic acid, 3,4-dimethoxybenzoic acid, phthalic acid, terephthalic acid, 1,4-cyclohexene-2,2- Examples thereof include dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid, and ascorbic acid. The proportion of the cyclic acid anhydrides, phenols and organic acids in the photosensitive resin composition is preferably 0.05 to 15% by weight, more preferably 0.1 to 5% by weight.

Examples of the printing-out agent for obtaining a visible image immediately after exposure include a combination of a photosensitive compound which releases an acid upon exposure and an organic dye which forms a salt with an acid and changes color. it can.

Examples of the photosensitive compound which releases an acid upon exposure include o-naphthoquinonediazide-4-sulfonic acid halogenide described in JP-A-50-36,209; and JP-A-53-36223. The trihalomethyl-2-bilone and trihalomethyl-s-
Triazine; various o-naphthoquinonediazide compounds described in JP-A-55-62444; 2-trihalomethyl-5-aryl-1,3,4 described in JP-A-55-77742. -Oxadiazole compounds; and diazonium salts. These compounds can be used alone or in combination,
The added amount is preferably in the range of 0.3 to 15% by weight based on the total weight of the composition.

In the photosensitive resin composition of the present invention, at least one kind of organic dye which changes its color tone by interacting with a photolysis product of a compound which generates an acidic substance by photolysis is used. . Such organic dyes include diphenylmethane, triarylmethane, thiazine, oxazine, phenazine, xanthene, anthraquinone, iminonaphthoquinone,
Azomethine dyes can be used. Specifically, it is as follows.

Brilliant green, eosin, ethyl violet, erythrosin B, methyl green, crystal violet, basic fuchsin, phenolphthalein, 1,3-diphenyltriazine, alizarin red S, thymolphthalein, methyl violet 2B, quinaldine red, Rose bengal, thymol sulfophthalein, xylenol blue, methyl orange, orange IV, diphenylthiocarbazone, 2,7-
Dichlorofluorescein, paramethyl red, congo red, benzopurpurine 4B, α-naphthyl red,
Nile blue 2B, Nile blue A, phenacetaline,
Methyl violet, malachite green, parafuchsin, oil blue # 603 [Orient Chemical Industry Co., Ltd.
Oil Pink # 312 (Orient Chemical Industry Co., Ltd.), Oil Red 5B (Orient Chemical Industry Co., Ltd.), Oil Scarlet # 308 (Orient Chemical Industry Co., Ltd.), Oil Red OG (Orient Chemical Co., Ltd.) Industrial Co., Ltd.), Oil Red RR (Orient Chemical Co., Ltd.), Oil Green # 502 (Orient Chemical Co., Ltd.), Spiron Red BEH Special (Hodogaya Chemical Co., Ltd.), Victoria Pure Blue BOH (made by Hodogaya Chemical Industry Co., Ltd.),

Patent Pure-Blue (manufactured by Sumitomo Sangoku Chemical Co., Ltd.), Sudan Blue II (manufactured by BASF), m
-Cresol purple, cresol red, rhodamine B, rhodamine 6G, first acid violet R, sulforhodamine B, auramine, 4-p-diethylaminophenyliminonaphthoquinone, 2-carboxyanilino-4-p-diethylaminophenyliminonaphthoquinone, -Carbostearylamino-4-p-dihydrooxyethyl-amino-phenyliminonaphthoquinone, p-methoxybenzoyl-p'-diethylamino-o'-methylphenyliminoacetanilide, cyano-p-diethylaminophenyliminoacetanilide, 1-phenyl- 3-methyl-4-p-diethylaminophenylimino-5-pyrazolone, 1-β-naphthyl-4-p-diethylaminophenylimino-5-pyrazolone and the like.

Particularly preferred organic dyes are triarylmethane dyes. Triarylmethane dyes are disclosed in JP-A-62-293471 and Japanese Patent Application No. 4-11284.
Those having a sulfonic acid compound as a counter anion as shown in the specification of JP-A No. 4 are particularly useful. These dyes can be used alone or as a mixture, and the amount added is 0.3 to 15% by weight based on the total weight of the photosensitive resin composition.
Is preferred. If necessary, other dyes and pigments can be used in combination, and the amount used is 70% by weight or less, more preferably 50% by weight or less, based on the total weight of the dyes and pigments.

Next, the photosensitive resin composition of the present invention when used as a photosensitive layer of a photopolymerizable printing plate, which is a negative printing plate, will be described. When the photosensitive resin composition of the present invention is a photopolymerizable photosensitive resin composition, the main components thereof include, in addition to the fluorine-based polymer, a compound containing an addition-polymerizable ethylenic double bond, It is a polymerization initiator and the like, and if necessary, a compound such as a thermal polymerization inhibitor is added.

The compound containing an addition-polymerizable double bond is
The compound can be arbitrarily selected from compounds having at least one, preferably two or more terminal ethylenically unsaturated bonds. For example, those having a chemical form such as a monomer, a prepolymer, that is, a dimer, a trimer and an oligomer, or a mixture thereof and a copolymer thereof. Examples of monomers and copolymers thereof include esters of unsaturated carboxylic acids (eg, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.) with aliphatic polyhydric alcohol compounds, and unsaturated esters. Examples include amides of a carboxylic acid and an aliphatic polyamine compound.

Specific examples of the ester monomer of the aliphatic polyhydric alcohol compound and the unsaturated carboxylic acid include acrylic acid esters such as ethylene glycol diacrylate, triethylene glycol diacrylate, and 1,3.
-Butanediol diacrylate, tetramethylene glycol diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate , 1,4-cyclohexanediol diacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol pentaacrylate
G, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer and the like.

Examples of the methacrylate include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, and 1,3-butanediol. Dimethacrylate, hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, dipentaerythritol-pentamethacrylate
Sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3-methacryloxy
-2-hydroxypropoxy) phenyl] dimethylmethane, bis- [p- (methacryloxyethoxy) phenyl] dimethylmethane and the like.

Examples of itaconic acid esters include ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate,
There are 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, pentaerythritol diitaconate, sorbitol tetritaconate and the like.

The crotonic acid esters include ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate,
Sorbitol tetradicrotonate and the like. Examples of the isocrotonic acid ester include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate. The maleic acid ester includes ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, sorbitol tetramaleate and the like. Furthermore, a mixture of the above-mentioned ester monomers can also be mentioned.

Specific examples of the amide monomer of the aliphatic polyamine compound and the unsaturated carboxylic acid include methylene bis-acrylamide, methylene bis-methacrylamide, 1,6-hexamethylene bis-acrylamide,
Examples include 1,6-hexamethylenebis-methacrylamide, diethylenetriaminetrisacrylamide, xylylenebisacrylamide, and xylylenebismethacrylamide. As another example, a polyisocyanate compound having two or more isocyanate groups in one molecule described in JP-B-48-41708 contains a hydroxyl group represented by the following general formula (A). A vinyl urethane compound containing two or more polymerizable vinyl groups in one molecule to which a vinyl monomer has been added is exemplified. CH ₂ ＣC (R 5) COOCH ₂ CH (R 6) OH (A) (where R 5 and R 6 represent H or CH ₃ )

Further, urethane acrylates described in JP-A-51-37193,
64183, JP-B-49-43191, JP-B-52-
Examples include polyfunctional acrylates and methacrylates such as polyester acrylates and epoxy acrylates obtained by reacting an epoxy resin with (meth) acrylic acid as described in JP-A-30490. Furthermore, The Journal of the Adhesion Society of Japan vol. 20, No. 7, 300-308
Those introduced as photocurable monomers and oligomers on page (1984) can also be used. The amount of the compound containing these double bonds is
It is 5 to 70% by weight (hereinafter abbreviated as%), preferably 10 to 50% by weight based on all components.

The photopolymerization initiator contained in the photopolymerizable photosensitive resin composition used in the present invention may be selected from various photopolymerization initiators known in patents and literatures, depending on the wavelength of the light source used, or A combination system (photopolymerization initiation system) of two or more photopolymerization initiators can be appropriately selected and used. For example, when using light near 400 nm as a light source, benzyl, benzoin ether, Michler's ketone, anthraquinone, thioxanthone, acridine, phenazine,
Benzophenone and the like are widely used.

Also, visible light of 400 nm or more, Ar laser, second harmonic of semiconductor laser, SHG-YAG
Even when a laser is used as a light source, various photopolymerization initiation systems have been proposed, for example, US Pat. No. 2,850,44.
Certain photoreducing dyes described in No. 5, for example, rosbengal, eosin, erythrosine, and the like, or a system using a combination of a dye and a photopolymerization initiator, for example, a complex initiation system of a dye and an amine (Japanese Patent Publication No. Sho 44) -20189), a combination system of hexaarylbiimidazole, a radical generator and a dye (Japanese Patent Publication No. 45-37377), and a system of hexaarylbiimidazole and p-dialkylaminobenzylidene ketone (Japanese Patent Publication No. 47-2528, 54-15
No. 5292), a system of a cyclic cis-α-dicarbonyl compound and a dye (JP-A-48-18383), a system of a cyclic triazine and a merocyanine dye (JP-A-54-151024).
No.) 3-Ketocoumarin and activator system (JP-A-52-11)
No. 2681, JP-A-58-15503), a system of biimidazole, styrene derivative and thiol (JP-A-59-1)
No. 40203), a system of an organic peroxide and a dye (Japanese Unexamined Patent Publication No.
-1504, JP-A-59-140203, JP-A-59-140203
-189340, JP-A-62-174203, JP-B-62-1641, U.S. Pat. No. 4,766,055), and a system of a dye and an active halogen compound (JP-A-63-25890).
No. 3, JP-A-2-63054),

A system of a dye and a borate compound (JP-A-62-1)
JP-A-43044, JP-A-62-150242, JP-A-6-150242
4-13140, JP-A-64-13141, JP-A-6-13
4-1142, JP-A-64-13143, JP-A-6-143
4-1144, JP-A-64-17048, JP-A-1
-229003, JP-A-1-298348, JP-A-1
No.-138204), a system of a dye having a rhodanine ring and a radical generator (Japanese Patent Application Laid-Open Nos. 2-196443 and 2-244050), and a system of titanocene and a 3-ketocoumarin dye (Japanese Patent Application Laid-Open No. 63-221110). , A combination of titanocene and a xanthene dye and an addition-polymerizable ethylenically unsaturated compound containing an amino group or a urethane group (JP-A-4-221958, JP-A-4-2197)
No. 56), a system of titanocene and a specific merocyanine dye (JP-A-6-295061), a system of titanocene and a dye having a benzopyran ring (JP-A-8-334897)
And the like. The amount of the photopolymerization initiator used is based on 100 parts by weight of the ethylenically unsaturated compound.
It can be used in the range of 0.05 to 100 parts by weight, preferably 0.1 to 70 parts by weight, more preferably 0.2 to 50 parts by weight.

In the photopolymerizable photosensitive resin composition of the present invention, an unnecessary ethylenically unsaturated compound which can be polymerized during the production or storage of the photosensitive resin composition is required in addition to the above basic components. It is desirable to add a small amount of a thermal polymerization inhibitor to prevent thermal polymerization. Suitable thermal polymerization inhibitors include haloid quinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-
Butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), N
-Nitrosophenylhydroxylamine cerium salt, N-nitrosophenylhydroxylamine aluminum salt and the like. The addition amount of the thermal polymerization inhibitor is preferably about 0.01% to about 5% based on the weight of the whole composition.
If necessary, a higher fatty acid derivative such as behenic acid or behenic acid amide may be added to prevent polymerization inhibition by oxygen, and may be unevenly distributed on the surface of the photosensitive layer in a drying process after coating. . The addition amount of the higher fatty acid derivative is preferably about 0.5% to about 10% of the whole composition.

A lithographic printing plate having a photosensitive layer using a photosensitive resin composition as the photosensitive resin composition of the present invention is provided on the photopolymerizable photosensitive layer to prevent polymerization inhibition by oxygen. A barrier protective layer can be provided. Examples of the water-soluble vinyl polymer contained in the oxygen-blocking protective layer include polyvinyl alcohol, and its partial esters, ethers, and acetal, or a substantial amount of unsubstituted vinyl alcohol units that have the necessary water solubility. And copolymers thereof. Examples of the polyvinyl alcohol include those which are hydrolyzed by 71 to 100% and have a degree of polymerization of 300 to 2400.

Specifically, PVA-10 manufactured by Kuraray Co., Ltd.
5, PVA-110, PVA-117, PVA-117
H, PVA-120, PVA-124, PVA-124
H, PVA-CS, PVA-CST, PVA-HC, PV
A-203, PVA-204, PVA-205, PVA-2
10, PVA-217, PVA-220, PVA-22
4, PVA-217EE, PVA-217E, PVA-2
20E, PVA-224E, PVA-405, PVA-4
20, PVA-613, L-8 and the like. Examples of the copolymer include polyvinyl acetate chloroacetate or propionate hydrolyzed 88 to 100%, polyvinyl formal and polyvinyl acetal, and copolymers thereof. Other useful polymers include polyvinylpyrrolidone, gelatin and gum arabic, which may be used alone or in combination.

In the present invention, the solvent used for coating the oxygen-barrier protective layer is preferably pure water, but alcohols such as methanol and ethanol, and ketones such as acetone and methyl ethyl ketone may be mixed with pure water. .
The concentration of the solid content in the coating solution is suitably from 1 to 20% by weight. In the present invention, known additives such as a surfactant for improving coating properties and a water-soluble plasticizer for improving physical properties of the film may be added to the oxygen-barrier protective layer. Examples of the water-soluble plasticizer include propionamide, cyclohexanediol, glycerin, and sorbitol. Further, a water-soluble (meth) acrylic polymer or the like may be added. The coating amount of the oxygen-barrier protective layer is suitably in the range of about 0.1 / m ² to about 15 / m ² by weight after drying. More preferably, from 1.0 / m ² to about 5.0 /
m ² .

The present invention relates to a positive-working lithographic printing plate precursor having an image-forming layer having a positive-type photosensitive resin composition using the quinonediazide or a compound having an alkali-soluble group protected by an acid-decomposable group. In addition to negative PS plates using a photopolymerization system, for example, the following types of lithographic printing plate materials can be similarly used. (1) A negative type lithographic printing plate material using a diazo resin. (2) A negative type lithographic printing plate material using a photocrosslinkable resin. (3) alkali-soluble binder, acid generator, acid (heat)
Negative laser direct drawing type lithographic printing plate material containing a crosslinkable compound. (4) a positive-working type containing at least a light-to-heat conversion agent and an alkali-soluble binder, and optionally further containing a substance that is thermally decomposable and substantially reduces the solubility of the alkali-soluble binder when not decomposed. Laser direct drawing type lithographic printing material. (5) A negative laser direct drawing type lithographic printing plate containing at least a photothermal conversion agent, a thermal radical generator and a radical polymerizable compound.

In particular, the heat mode laser direct drawing type lithographic printing plates (4) and (5) eliminate the need for post-heating, which is a problem of the lithographic printing plate precursor marketed under the general name of thermal CTP. It is highly useful, but has the disadvantage of insufficient heat dissipation to the support and lack of thermal reactivity, resulting in insufficient discrimination between the image area and the non-image area and being vulnerable to scratches. are doing. The effect of the fluorine-based polymer of the present invention is extremely useful for solving the problem of the material system having low weak discrimination. That is, a particularly preferred embodiment of the present invention is a lithographic printing plate precursor comprising an image forming layer containing at least a photothermal conversion agent and a binder resin on an aluminum support, wherein the image forming layer is formed by laser exposure. Which can increase or decrease the solubility in an alkaline developer, and which contains the fluoropolymer of the present invention "
It is. More preferred is a lithographic printing plate precursor comprising an aluminum support provided with an image forming layer containing at least a photothermal conversion agent, a thermal radical generator and a radical polymerizable compound, wherein the image forming layer is exposed to laser light. Which can reduce the solubility in an alkaline developer, and which contains the fluoropolymer of the present invention "
It is.

Hereinafter, the materials used in each example will be described in detail. As the diazo resin used in (1), for example, there is a diazo resin represented by a salt of a condensate of a diazodiarylamine and an active carbonyl compound, and a photosensitive, water-insoluble and organic solvent-soluble resin is preferable. Particularly preferred diazo resins include, for example, 4-diazodiphenylamine, 4-diazo-3-methyldiphenylamine, 4-diazo-4'-methyldiphenylamine, 4-diazo-3'-methyldiphenylamine, 4-diazo-4'- Condensation of methoxydiphenylamine, 4-diazo-3-methyl-4'-ethoxydiphenylamine, 4-diazo-3-methoxydiphenylamine, etc. with formaldehyde, paraformaldehyde, acetaldehyde, benzaldehyde, 4,4'-bis-methoxymethyldiphenyl ether, etc. Organic or inorganic acid salts.

In this case, examples of the organic acid include methanesulfonic acid, benzenesulfonic acid, toluenesulfonic acid,
Xylenesulfonic acid, mesitylenesulfonic acid, dodecylbenzenesulfonic acid, naphthalenesulfonic acid, propylnaphthalenesulfonic acid, 1-naphthol-5-sulfonic acid, 2-nitrobenzenesulfonic acid, 3-chlorobenzenesulfonic acid, 2-hydroxy-4-methoxy Benzophenone-5-sulfonic acid and the like can be mentioned, and inorganic acids include hexafluorophosphoric acid, tetrafluoroboric acid, thiocyanic acid and the like. Furthermore, a diazo resin having a main chain of a polyester group described in JP-A-54-30121; a polymer having a carboxylic anhydride residue described in JP-A-61-273538, and a diazo resin having a hydroxyl group. A diazo resin obtained by reacting a compound; a diazo resin obtained by reacting a polyisocyanate compound with a diazo compound having a hydroxyl group can also be used.

The use amount of these diazo resins is preferably in the range of 0 to 40% by weight based on the solid content of the composition. If necessary, two or more diazo resins may be used in combination. In preparing the negative photosensitive resin composition, an organic polymer binder is usually used in combination. Examples of such an organic polymer binder include an acrylic resin, a polyamide resin, a polyester resin, an epoxy resin, a polyacetal resin, a polystyrene resin, and a novolak resin. Further, in order to improve performance, known additives, for example,
Thermal polymerization inhibitors, dyes, pigments, plasticizers, stability improvers and the like can be added.

Suitable dyes include, for example, crystal violet, maracay green, Victoria blue,
Basic oil-soluble dyes such as methylene blue, ethyl violet, and rhodamine B are included. Examples of commercially available products include “Victoria Pure Blue BOH” (manufactured by Hodogaya Chemical Industry Co., Ltd.) and “Oil Blue # 603”.
(Manufactured by Orient Chemical Industry Co., Ltd.). Examples of the pigment include phthalocyanine blue, phthalocyanine green, dioxazine violet, quinacridone red, and the like.

Examples of the plasticizer include diethyl phthalate, dibutyl phthalate, dioctyl phthalate, tributyl phosphate, trioctyl phosphate, tricresyl phosphate, tri (2-chloroethyl) phosphate, tributyl citrate and the like. Further, as known stability improvers, for example, phosphoric acid, phosphorous acid, oxalic acid, tartaric acid, malic acid, citric acid, dipicolinic acid, polyacrylic acid, benzenesulfonic acid, toluenesulfonic acid and the like can also be used in combination. . The amount of these various additives varies depending on the purpose, but is generally preferably in the range of 0 to 30% by weight of the solid content of the photosensitive resin composition.

As the photocrosslinkable resin used in (2), a photocrosslinkable resin having an affinity for an aqueous alkali developing solution is preferable. A copolymer having a carboxyl group; a phenylenediacrylic acid residue described in JP-A-60-165646 and a polyester resin having a carboxyl group; and a phenylenediacrylic acid residue described in JP-A-60-203630. Polyester resin having a phenolic hydroxyl group; polyester resin having a phenylenediacrylic acid residue and a sodium iminodisulfonyl group described in JP-B-57-42858;
Polymers having an azide group and a carboxyl group in the side chain described in JP-A No. 552, and polymers having a maleimide group in the side chain described in JP-A-7-295212 can be used.

The alkali-soluble binder and acid generator used in (3) are the materials used in the positive PS plate using the aforementioned quinonediazide or a compound having an alkali-soluble group protected by an acid-decomposable group. The same can be used. The acid (thermal) crosslinkable compound refers to a compound that crosslinks in the presence of an acid, and includes, for example, aromatic compounds and heterocyclic compounds that are polysubstituted with a hydroxymethyl group, an acetoxymethyl group, or an alkoxymethyl group. Among them, preferred examples include compounds obtained by condensing phenols and aldehydes under basic conditions. Preferred among the above compounds are, for example, compounds obtained by condensing phenol and formaldehyde under basic conditions as described above,
-A compound obtained from cresol and formaldehyde,
Examples include compounds obtained from bisphenol A and formaldehyde, compounds obtained from 4,4'-bisphenol and formaldehyde, and compounds disclosed as resole resins in GB 2,082,339.

These acid crosslinkable compounds have a weight average molecular weight of 500 to 100,000 and a number average molecular weight of 200 to 100.
50,000 are preferred. Other preferred examples include aromatic compounds substituted with an alkoxymethyl or oxiranylmethyl group disclosed in EP-A-0,212,482; EP-A-0,133,216;
EA No. 3,634,671, DE No. 3,711,2
No. 64, monomer and oligomer melamine-formaldehyde condensates and urea-formaldehyde condensates, alkoxy-substituted compounds disclosed in EP-A-0,212,482. Still other preferred examples are, for example, melamine-formaldehyde derivatives having at least two free N-hydroxymethyl, N-alkoxymethyl or N-acyloxymethyl groups. Of these, N-alkoxymethyl derivatives are particularly preferred.

Further, a low molecular weight or oligomeric silanol can be used as a silicon-containing crosslinking agent. Examples of these are dimethyl- and diphenyl-silanediols and oligomers which have already been precondensed and contain these units, for example those disclosed in EP-A 0,377,155. Among aromatic compounds and heterocyclic compounds poly-substituted with an alkoxymethyl group, a compound having an alkoxymethyl group at a position adjacent to a hydroxyl group, and the alkoxy group of the alkoxymethyl group having 18 or less carbon atoms is preferable. Examples thereof are given, and particularly preferred examples are those represented by the following general formulas (B) to (B).
The compound of (E) can be mentioned.

[0115]

Embedded image

In the formula, L _{1 to} L ₈ may be the same or different and represent an alkoxymethyl group substituted with an alkoxy group having 18 or less carbon atoms, such as methoxymethyl, ethoxymethyl and the like. These are preferred because they have high crosslinking efficiency and can improve printing durability. The above compounds which are crosslinked by heat may be used alone or may be used alone.
A combination of more than two types may be used. The acid-crosslinkable compound used in the present invention is used in an amount of 5 to 80% by weight, preferably 10 to 75% by weight, particularly preferably 20 to 70% by weight, based on the total solid content of the lithographic printing plate material. .
When the addition amount of the acid crosslinking compound is less than 5% by weight, the durability of the photosensitive layer of the lithographic printing plate material obtained is deteriorated.
Exceeding 0% by weight is not preferred in terms of stability during storage.

As the alkali-soluble binder used in (4), the same materials as those used in the positive PS plate using quinonediazide described above can be used. As a substance that is thermally decomposable and substantially degrades the solubility of the alkali-soluble binder when not decomposed, various onium salts, quinonediazide compounds, etc. are excellent in lowering the solubility of the alkali-soluble binder. And is preferably used. Examples of onium salts include diazonium salts, ammonium salts, phosphonium salts, iodonium salts, sulfonium salts, selenonium salts, arsonium salts, and the like.

Suitable onium salts used in the present invention include, for example, S. I. Schle
singer, Photogr. Sci. Eng. , 1
8, 387 (1974); S. Bal et a
l. , Polymer, 21, 423 (1980); JP-A-5-158230; diazonium salts described in U.S. Pat.
No. 056, JP-A-3-140140 and the like. C. Necker et al. , Mac
romolecules, 17, 2468 (198
4), C.I. S. Wen et al. , Teh, Pro
c. Conf. Rad. Curing ASIA, p4
78, Tokyo, Oct (1988), U.S. Pat. Nos. 4,069,055 and 4,069,056, and the like. V. Crivello et
al. , Macromolecules, 10 (6),
1307 (1977), Chem. & Eng. New
s, Nov. 28, p31 (1988), European Patent No. 1
04,143, U.S. Pat. Nos. 339,049, 4
10,201, JP-A-2-150848, JP-A-2-29514 and the like iodonium salts,

JVCrivello et al., Polymer J. 17, 73
(1985), JVCrivello et al., J. Org. Chem., 43, 3055.
(1978), WRWatt et al., J. Polymer Sci., Polymer C
hem.Ed., 22, 1789 (1984), JVCrivello et al., Poly
mer Bull., 14,279 (1985), JVCrivello et al., Macro
molecules, 14 (5), 1141 (1981), JVCrivello etal.,
J. Polymer Sci., Polymer Chem. Ed., 17, 2877 (1979),
EP 370,693, U.S. Patent 3,902,114, EP 233,567, 297,443, 297,442, U.S. Pat.
4,760,013, 4,734,444, 2,833,827, German Patent 2,904,626, 3,604,580, 3,604,581, etc., sulfonium salts described in JVCrivello et al., Macr.
omolecules, 10 (6), 1307 (1977), JVCrivelloet al.,
J. Polymer Sci., PolymerChem. Ed., 17,1047 (1979)
Selenonium salts described in CSWen et al., Teh, Pro
c. Conf. Rad. Curing ASIA, p478, Tokyo, Oct (1988) and the like.

In the present invention, among these, diazonium salts are particularly preferred. Particularly preferred diazonium salts include those described in JP-A-5-158230. Suitable quinonediazide compounds include o-quinonediazide compounds.

The o-quinonediazide compound used in the present invention is a compound having at least one o-quinonediazide group, which increases the alkali solubility by thermal decomposition, and may be a compound having various structures. In other words, o-quinonediazide helps the solubility of the light-sensitive material system by both the effect of losing the ability to inhibit the dissolution of the alkali-soluble binder due to thermal decomposition and the effect of converting o-quinonediazide itself into an alkali-soluble substance. Examples of the o-quinonediazide compound used in the present invention include, for example, J.
Coser, "Light-Sensitive Systems" (Jo
hn Wiley & Sons. Inc.) The compounds described on pages 339 to 352 can be used, and especially o-reacted with various aromatic polyhydroxy compounds or aromatic amino compounds.
Sulfonate esters or amides of quinonediazides are preferred. Also, benzoquinone- (1,2)-as described in JP-B-43-28403.
Diazidesulfonic acid chloride or naphthoquinone-
Ester of (1,2) -diazide-5-sulfonic acid chloride with pyrogallol-acetone resin, US Pat. No. 3,043
Esters of benzoquinone- (1,2) -diazidesulfonic acid chloride or naphthoquinone- (1,2) -diazido-5-sulfonic acid chloride and phenol-formaldehyde resin described in 6,120 and 3,188,210, etc. Are also preferably used.

Further, naphthoquinone- (1,2) -diazide
Esters of -4-sulfonic acid chloride and phenol-formaldehyde resin or cresol-formaldehyde resin, and esters of naphthoquinone- (1,2) -diazide-4-sulfonic acid chloride and pyrogallol-acetone resin are also suitably used. You. Other useful o
-Quinonediazide compounds have been reported in many patent-related documents and are known. For example, JP-A-47-530
No. 3, JP-A-48-63802, JP-A-48-63803, JP-A-48
-96575, JP-A-49-38701, JP-A-48-13354, JP-B-41-11222, JP-B-45-9610, JP-B-49-17481,
U.S. Pat.Nos. 2,797,213, 3,454,400, 3,55
No. 4,323, No. 3,573,917, No. 3,674,495, No.
3,785,825; British Patent Nos. 1,277,602 and 1,251,34
No. 5, No. 1,267,005, No. 1,329,888, No. 1,33
No. 0,932, German Patent No. 854,890, etc.
There may be mentioned those described therein.

The amount of the o-quinonediazide compound used in the present invention is preferably from 1 to 50% by weight, more preferably from 5 to 30% by weight, particularly preferably from 10 to 50% by weight, based on the total solids of the lithographic printing plate material. -30% by weight.
These compounds can be used alone or as a mixture of several types. If the amount of the o-quinonediazide compound is less than 1% by weight, the recording properties of the image will be deteriorated.

Examples of the counter ion of the onium salt include tetrafluoroboric acid, hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, 5-nitro-o-toluenesulfonic acid, 5-sulfosalicylic acid, and 2,5-dimethylbenzene. Sulfonic acid, 2,4,6-trimethylbenzenesulfonic acid, 2-nitrobenzenesulfonic acid, 3-chlorobenzenesulfonic acid, 3-bromobenzenesulfonic acid, 2-fluorocaprylnaphthalenesulfonic acid, dodecylbenzenesulfonic acid, 1-naphthol- Examples thereof include 5-sulfonic acid, 2-methoxy-4-hydroxy-5-benzoyl-benzenesulfonic acid, and paratoluenesulfonic acid. Among them, particularly preferred are alkyl aromatic sulfonic acids such as hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid and 2,5-dimethylbenzenesulfonic acid. o
-The addition amount of the above compounds other than the quinonediazide compound is
Preferably 1 to 50 based on the total solids of the lithographic printing plate material
%, More preferably 5 to 30% by weight, particularly preferably 10 to 30% by weight.

As specific examples of the material used in (5), those mentioned above as examples of the photopolymerization system can be given. Many of the photopolymerization initiators are also useful as thermal radical generators. In addition, azobis compounds (azobisisobutyronitrile), diazonium compounds, and the like can also be used as the thermal polymerization initiator. The compound group capable of addition polymerization is also common. Further, the photothermal conversion agent may be any substance as long as it can absorb the light of the exposure light source, and therefore, all the dye groups exemplified in the photopolymerization system can be applied. However,
As a high-power laser light source for heat mode exposure that is practically used, a (near) infrared light source having a wavelength of 750 nm or more is mainly used. It is a compound that can absorb external light. Various IR absorbers are available, but most preferably used are heptamethine cyanine dyes, phthalocyanines, carbon black and the like.

Others In the composition of the present invention, various resins having a hydrophobic group, for example, an octylphenol-formaldehyde resin, a t-butylphenol-formaldehyde resin, a t-butylphenol, a
Butylphenol / benzaldehyde resin, rosin-modified novolak resin, and o-
Naphthoquinonediazide sulfonic acid ester and the like; various plasticizers for improving the flexibility of the coating film, for example, dibutyl phthalate, dioctyl phthalate, butyl glycolate, tricresyl phosphate, dioctyl adipate, etc. Additives can be added. The amount of these additives is preferably in the range of 0.01 to 30% by weight based on the total weight of the composition.

Further, a known resin for further improving the abrasion resistance of the film can be added to these compositions. These resins include, for example, polyvinyl acetal resin, polyurethane resin, epoxy resin, vinyl chloride resin, nylon, polyester resin, acrylic resin and the like, and can be used alone or in combination. The addition amount is preferably in the range of 2 to 40% by weight based on the total weight of the composition.

Further, in the photosensitive resin composition of the present invention, in order to widen the development latitude, Japanese Patent Application Laid-Open No.
Non-ionic surfactants described in JP-A-251740 and JP-A-4-68355,
An amphoteric surfactant as described in JP-A-9-121044 and JP-A-4-13149 can be added. Specific examples of the nonionic surfactant include sorbitan tristearate, sorbitan monopalmitate, sorbitan triolate, stearic acid monoglyceride, polyoxyethylene sorbitan monooleate, polyoxyethylene nonyl phenyl ether, and the like. Specific examples of the activator include alkyl di (aminoethyl) glycine, alkyl polyaminoethyl glycine hydrochloride, Amogen K (trade name, manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd., N-tetradecyl-N, N-betaine type), -
Alkyl-N-carboxyethyl-N-hydroxyethyl imidazolinium betaine, Levon 15 (trade name, manufactured by Sanyo Chemical Co., Ltd., alkyl imidazoline type) and the like. The proportion of the nonionic surfactant and amphoteric surfactant in the photosensitive resin composition is preferably from 0.05 to 15% by weight, and more preferably from 0.1 to 5% by weight.

Improvement of coating surface quality: In the photosensitive resin composition of the present invention, a surfactant for improving the coating surface quality, for example, as described in JP-A-62-170950. A fluorinated surfactant can be added. A preferable addition amount is 0.0% of the entire photosensitive resin composition.
0.01 to 1.0% by weight, and more preferably 0.005 to 1.0% by weight.
~ 0.5% by weight.

The photosensitive resin composition of the present invention contains a yellow dye, preferably having an absorbance at 417 nm of 436.
A yellow dye having an absorbance of 70 nm or more can be added.

When a lithographic printing plate photosensitive material is obtained from the photosensitive resin composition containing the fluoropolymer of the present invention,
First, it is provided as an image forming layer on a suitable support. The photosensitive resin composition containing the fluoropolymer of the present invention is dissolved or dispersed in the following organic solvent alone or in a mixture, applied to a support, and dried. As the organic solvent, any of known organic solvents can be used, and those having a boiling point of from 40 ° C to 200 ° C, particularly from 60 ° C to 160 ° C, are selected from the advantages in drying.
Of course, it is better to select one in which the surfactant of the present invention is dissolved.

Examples of the organic solvent include alcohols such as methyl alcohol, ethyl alcohol, n- or iso-propyl alcohol, n- or iso-butyl alcohol, diacetone alcohol, acetone, methyl ethyl ketone, methyl propyl ketone, methyl butyl ketone Ketones such as methyl amyl ketone, methyl hexyl ketone, diethyl ketone, diisobutyl ketone, cyclohexanone, methyl cyclohexanone, and acetylacetone; hydrocarbons such as benzene, toluene, xylene, cyclohexane, and methoxybenzene; ethyl acetate; n- or iso- Acetates such as propyl acetate, n- or iso-butyl acetate, ethyl butyl acetate, and hexyl acetate; methylene dichloride; ethylene dichloride; Halides, isopropyl ether, etc. chlorobenzene, n- butyl ether, dioxane, dimethyl dioxane, tetrahydrofuran and the like,

Ethylene glycol, methyl cellosolve,
Methyl cellosolve acetate, ethyl cellosolve, diethyl cellosolve, cellosolve acetate, butyl cellosolve, butyl cellosolve acetate, methoxymethoxyethanol, diethylene glycol monomethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether Acetate, propylene glycol monoethyl ether, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether, polyhydric alcohols such as 3-methyl-3-methoxybutanol and derivatives thereof, dimethyl sulfoxide,
A special solvent such as N, N-dimethylformamide or the like is preferably used alone or as a mixture. It is appropriate that the concentration of the solid content in the composition to be applied is 2 to 50% by weight.

As the method for applying the composition of the present invention, for example, methods such as roll coating, dip coating, air knife coating, gravure coating, gravure offset coating, hopper coating, blade coating, wire doctor coating, spray coating and the like are used. The weight after drying is preferably 0.3 to 4.0 g / m ² . As the coating amount decreases, the exposure amount for obtaining an image may be small,
The film strength decreases. As the coating amount increases, the exposure amount is required but the photosensitive film becomes strong. For example, when used as a printing plate, a printing plate having a high printable number (high printing durability) can be obtained.

The drying of the photosensitive resin composition applied on the support is usually performed with heated air. Heating is preferably performed at a temperature in the range of 30C to 200C, particularly 40C to 140C. In addition to a method in which the drying temperature is kept constant during the drying, a method in which the temperature is gradually increased may be performed. Good results may be obtained by dehumidifying the drying air. The heated air is applied at a rate of 0.1 m / sec.
It is preferable to supply at a rate of 0 m / sec, particularly 0.5 m / sec to 20 m / sec.

Matt layer: A mat layer is provided on the surface of the photosensitive layer provided as described above in order to reduce the time required for evacuation during contact exposure using a vacuum printing frame and to prevent blurring. Preferably, it is provided. More specifically,
-125805, JP-B-57-6582, 61-2
A method of providing a mat layer as described in each of JP-A-8986 and a method of thermally fusing a solid powder as described in JP-B-62-62337.

The support used for the photosensitive lithographic printing plate or the like is a dimensionally stable plate-like material. Can be. Examples of such a support include paper, paper laminated with plastics (eg, polyethylene, polypropylene, polystyrene, etc.), a metal plate such as aluminum (including an aluminum alloy), zinc, iron, copper, etc., for example, diacetate. Cellulose, cellulose triacetate,
Films of plastics such as cellulose propionate, cellulose butyrate, cellulose acetate butyrate, cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc., and paper or plastic on which the above metals are laminated or evaporated A film is included, but an aluminum plate is particularly preferable. The aluminum plate includes a pure aluminum plate and an aluminum alloy plate. Various aluminum alloys can be used, and for example, an alloy of aluminum with a metal such as silicon, copper, manganese, magnesium, chromium, zinc, lead, bismuth, and nickel is used. These compositions also contain some negligible amount of impurities in addition to some iron and titanium.

The support is subjected to a surface treatment as required.
For example, in the case of a photosensitive lithographic printing plate, on the surface of the support,
A hydrophilic treatment is performed. In the case of a support having a surface of metal, particularly aluminum, surface treatment such as graining, immersion in an aqueous solution of sodium silicate, potassium fluorozirconate, phosphate, or anodizing is performed. Preferably, it has been done. Also, as described in U.S. Pat. No. 2,714,066,
An aluminum plate which is grained and then immersed in an aqueous solution of sodium silicate, or an aqueous solution of an alkali metal silicate after anodizing the aluminum plate as described in US Pat. No. 3,181,461. What has been immersed in is preferably used. The anodizing treatment is, for example, an inorganic acid such as phosphoric acid, chromic acid, sulfuric acid, or boric acid, or oxalic acid, an organic acid such as sulfamic acid, or an aqueous or non-aqueous solution of a salt thereof alone or in combination of two or more. It is carried out by flowing a current in an electrolytic solution using an aluminum plate as an anode.

Also, silicate electrodeposition as described in US Pat. No. 3,658,662 is effective. These hydrophilic treatments are performed not only to make the surface of the support hydrophilic, but also to prevent harmful reactions with the photosensitive resin composition provided thereon, and to improve the adhesion to the photosensitive layer. It is performed in order to improve. Prior to graining the aluminum plate, if necessary, the surface may be subjected to a pretreatment to remove rolling oil on the surface and to expose a clean aluminum surface. For the former, solvents such as trichlene, surfactants and the like are used. For the latter, a method using an alkali etching agent such as sodium hydroxide or potassium hydroxide is widely used.

As the graining method, any of mechanical, chemical and electrochemical methods is effective. Examples of the mechanical method include a ball polishing method, a blast polishing method, and a brush polishing method in which an aqueous dispersion slurry of an abrasive such as pumice is rubbed with a nylon brush. A method of immersing in a saturated aqueous solution of an aluminum salt of a mineral acid as described in the official gazette is suitable. As an electrochemical method, a method of alternating current electrolysis in an acidic electrolyte such as hydrochloric acid, nitric acid or a combination thereof is used. Is preferred. Among such surface roughening methods, in particular, a surface roughening method combining mechanical surface roughening and electrochemical surface roughening as described in Japanese Patent Application Laid-Open No. 55-137993, Is preferred because of its strong adhesion to the support. The graining by the above-mentioned method has a center line surface roughness (Ra) of the surface of the aluminum plate of 0.3 to 1.0 μm.
It is preferable that the application is performed in such a range as follows. The aluminum plate thus grained is washed with water and chemically etched as required.

As the lithographic printing plate precursor according to the invention, it is particularly preferable to use an aluminum support which has been subjected to electrochemical surface-roughening treatment using an aqueous solution containing hydrochloric acid. When a support treated in this manner is used, it is possible to obtain a printing plate having extremely excellent non-image areas and blanket stains during printing. By using the image forming layer of the present invention, which is excellent in discrimination between the image area and the non-image area, it is possible to achieve both the excellent stain resistance and the printing durability. A preferred embodiment of the present invention, a base plate roughened by electrochemical treatment using an aqueous solution containing hydrochloric acid as an electrolytic solution, will be described in detail. In the case of electrochemical surface roughening treatment using an electrolyte mainly containing hydrochloric acid, the average opening diameter is 0.01 to several μm.
m, a small pit having a ratio of depth to average opening diameter of 0.1 to 0.5 is formed, and at the same time, the average opening diameter is several μm to several tens μm.
Since a double structure having a large undulation of m is easily formed, a roughened shape which is desirable for hardly soiling and printing durability can be obtained. Nitric acid salts, chlorides, amines, aldehydes, phosphoric acid, chromic acid, boric acid, acetic acid, oxalic acid, and the like can be added to the electrolytic solution as needed. Among them, acetic acid is particularly preferred. In the electrochemical graining treatment, the applied voltage is preferably 1 to 50 V, more preferably 5 to 30 V. Current density (peak value) is 5 to 200 A / dm
² is preferable, and 20 to 150 A / dm ² is more preferable. Electricity is 10-2000C in total for all processing steps
/ Dm ² is preferable, and 20 to 1000 C / dm ² is more preferable. The temperature is preferably from 10 to 60 ° C, and from 15 to 45 ° C.
C is more preferred. The frequency is preferably from 10 to 200 Hz, more preferably from 40 to 150 Hz. The hydrochloric acid concentration is preferably 0.1 to 5%, and the current waveform used for electrolysis is
A sine wave, a rectangular wave, a trapezoidal wave, a sawtooth wave, or the like is appropriately selected depending on a desired roughened shape, but a rectangular wave is particularly preferable.

The electrochemical graining treatment using an aqueous solution containing hydrochloric acid as an electrolytic solution can be used in combination with a mechanical graining treatment or an electrochemical graining treatment under different conditions. The mechanical surface-roughening treatment is preferably performed before the electrochemical surface-roughening treatment and before the dissolution treatment using the alkaline aqueous solution. The method of the mechanical surface roughening treatment is not particularly limited, but brush polishing and honink polishing are preferable. In brush polishing, for example, a cylindrical brush in which brush bristles having a bristle diameter of 0.2 to 1 mm are planted is rotated, and a slurry in which an abrasive is dispersed in water is supplied to the contact surface while being pressed against the aluminum plate surface to roughen the surface. Perform the conversion process. In the honing polishing, a slurry in which an abrasive is dispersed in water is injected under pressure from a nozzle, and the slurry is made to impinge obliquely on the aluminum plate surface to perform a surface roughening treatment. Further, the sheet which has been subjected to the surface roughening process may be pasted to the surface of the aluminum plate, and the surface roughening process may be performed by applying pressure to perform the mechanical surface roughening process. When performing the mechanical roughening process,
The solvent degreasing treatment or the emulsion degreasing treatment described above can be omitted.

As the electrochemical graining treatment under different conditions, an electrochemical graining treatment mainly containing nitric acid can be mentioned. The acidic aqueous solution mainly composed of nitric acid may be one used for electrochemical surface roughening treatment using a normal direct current or alternating current. For example, aluminum nitrate,
One or more of nitric acid compounds such as sodium nitrate and ammonium nitrate can be used by adding to a nitric acid aqueous solution having a nitric acid concentration of 5 to 15 g / l at a concentration from 0.01 g / l to reaching saturation. In an acidic aqueous solution mainly composed of nitric acid, metals contained in aluminum alloys such as iron, steel, manganese, nickel, titanium, magnesium, and silicon may be dissolved. As the acidic aqueous solution mainly containing nitric acid, among others, nitric acid, an aluminum salt, and a nitrate are contained, and aluminum ion is 1 to 15 g.
/ L, preferably 1 to 10 g / l, and nitric acid concentration of 5 to 15 so that ammonium ion is 10 to 300 ppm.
It is preferable to use one obtained by adding aluminum nitrate and ammonium nitrate to a g / l aqueous nitric acid solution. The aluminum ions and ammonium ions increase spontaneously during the electrochemical graining treatment. Further, the liquid temperature at this time is preferably from 10 to 95 ° C, more preferably from 40 to 80 ° C.

In the lithographic printing plate precursor of the present invention which has been subjected to the above-mentioned roughening treatment, it is preferable that the average opening diameter of the small pits having a roughened shape is 0.01 to 3 μm. The thickness is more preferably 0.05 to 2 μm, and particularly preferably 0.05 to 1.
0 μm. Within this range, satisfactory printing durability and printing durability can be ensured, and good printing durability can be obtained. The ratio of the average depth of the small pits to the average opening diameter is
It is preferably 0.1 to 0.5. It is more preferably from 0.1 to 0.3, and particularly preferably from 0.15 to 0.2. Within this range, it is preferable that the printing is not easily stained or the printing durability is not deteriorated, and the stain hardly is not deteriorated. The average opening diameter of the large undulation having a roughened surface is preferably 3 to 20 μm. It is more preferably 3 to 17 μm, and particularly preferably 4 to 10 μm. Within this range, it is preferable that the stain resistance in printing and the printing durability do not deteriorate and the stain resistance does not deteriorate.

The etching solution is usually selected from aqueous solutions of bases or acids that dissolve aluminum. In this case, a film different from aluminum derived from the etchant component must not be formed on the etched surface. Preferred examples of the etching agent include sodium hydroxide, potassium hydroxide, trisodium phosphate, disodium phosphate, tripotassium phosphate, and dipotassium phosphate as basic substances; and sulfuric acid and persulfuric acid as acidic substances. , Phosphoric acid, hydrochloric acid, and salts thereof. Metals having a lower ionization tendency than aluminum, such as salts of zinc, chromium, cobalt, nickel, and copper, are not preferable because they form unnecessary films on the etched surface. These etchants have a dissolution rate of 1 hour or less for the aluminum or alloy to be used in setting the concentration and temperature for use.
Most preferably, it is carried out at a rate of 0.3 g to 40 g / m ² per minute, but it may be higher or lower.

The etching is carried out by immersing the aluminum plate in the above-mentioned etching solution or by applying the etching solution to the aluminum plate.
The treatment is preferably performed so as to be in the range of 10 to 10 g / m ² . As the etching agent, it is desirable to use an aqueous solution of a base because of its high etching rate. In this case, since a smut is generated, a normal desmutting process is performed. As the acid used for the desmut treatment, nitric acid, sulfuric acid, phosphoric acid, chromic acid, hydrofluoric acid, borofluoric acid and the like are used. The etched aluminum plate is washed and anodized as necessary. The anodic oxidation can be performed by a method conventionally used in this field. Specifically, when direct current or alternating current is passed through aluminum in an aqueous solution or a non-aqueous solution in which sulfuric acid, phosphoric acid, chromic acid, oxalic acid, sulfamic acid, benzenesulfonic acid, or the like or a combination of two or more thereof, aluminum An anodized film can be formed on the surface of the support.

The anodizing treatment conditions cannot be generally determined because they vary depending on the electrolytic solution to be used.
° C, current density 0.5-60 amps / dm ² , voltage 1-10
0V and an electrolysis time of 30 seconds to 50 minutes are appropriate. Among these anodizing treatments, in particular, British Patent No. 1,4
Anodizing at high current density in sulfuric acid as described in U.S. Pat.
The method of anodizing phosphoric acid as an electrolytic bath described in US Pat. No. 661 is preferable. The aluminum plate which has been roughened and anodized as described above may be subjected to a hydrophilizing treatment, if necessary. Preferred examples thereof include US Pat. , 4
No. 61, for example, an alkali metal silicate, for example, an aqueous solution of sodium silicate or Japanese Patent Publication No.
There is a method of treating with potassium fluoride zirconate disclosed in 22063 and polyvinylphosphonic acid as disclosed in U.S. Pat. No. 4,153,461.

Organic Undercoat Layer: It is preferable to provide an organic undercoat layer before coating the photosensitive layer on the photosensitive lithographic printing plate of the present invention in order to reduce the remaining photosensitive layer in the non-image area. Examples of the organic compound used in the organic undercoat layer include carboxymethyl cellulose, dextrin, gum arabic,
-Phosphonic acids having an amino group such as -aminoethylphosphonic acid, phenylphosphonic acid which may have a substituent,
Organic phosphonic acids such as naphthylphosphonic acid, alkylphosphonic acid, glycerophosphonic acid, methylenediphosphonic acid and ethylenediphosphonic acid; phenylphosphoric acid which may have a substituent; naphthylphosphoric acid; Organic phosphoric acid, optionally substituted phenylphosphinic acid, naphthylphosphinic acid, organic phosphinic acid such as alkylphosphinic acid and glycerophosphinic acid, amino acids such as glycine and β-alanine, and triethanolamine hydrochloride Or a hydrochloride of an amine having a hydroxyl group, or a mixture of two or more.

In addition, at least one compound selected from a group of high molecular compounds having a structural unit represented by poly (p-vinylbenzoic acid) in a molecule can be used. More specifically, a copolymer of p-vinylbenzoic acid and vinylbenzyltriethylammonium salt, a copolymer of p-vinylbenzoic acid and vinylbenzyltrimethylammonium chloride and the like can be mentioned.

The organic undercoat layer can be provided by the following method. That is, a method in which a solution obtained by dissolving the above organic compound in water or an organic solvent such as methanol, ethanol, or methyl ethyl ketone or a mixed solvent thereof is coated on an aluminum plate and dried, and a method in which water or methanol, ethanol, methyl ethyl ketone, etc. An aluminum plate is immersed in a solution obtained by dissolving the above organic compound in an organic solvent or a mixed solvent thereof to adsorb the organic compound, and thereafter, washed with water or the like and dried to form an organic undercoat layer. Is the way. In the former method, a solution of the above organic compound having a concentration of 0.005 to 10% by weight can be applied by various methods. For example, any method such as bar coater coating, spin coating, spray coating, and curtain coating may be used. In the latter method, the concentration of the solution is 0.01 to 20% by weight, preferably 0.05 to 20% by weight.
-5% by weight, the immersion temperature is 20-90 ° C., preferably 25-50 ° C., and the immersion time is 0.1 second-20 minutes,
Preferably it is 2 seconds to 1 minute.

The pH of the solution used is adjusted by adjusting the pH with a basic substance such as ammonia, triethylamine or potassium hydroxide or an acidic substance such as hydrochloric acid or phosphoric acid.
It can also be used in the range of ~ 12. Further, a yellow dye may be added for improving the tone reproducibility of the photosensitive lithographic printing plate. Further, this solution has the following general formula (a)
Can be added. Formula (a) (HO) x-R5- (COOH) y wherein R5 represents an arylene group having 14 or less carbon atoms which may have a substituent, and x and y are independently an integer of 1 to 3. Represents Specific examples of the compound represented by the general formula (a) include 3-hydroxybenzoic acid, 4-hydroxybenzoic acid, salicylic acid, 1-hydroxy-2-naphthoic acid, 2-hydroxy-1-naphthoic acid, -Hydroxy-3-naphthoic acid, 2,4-dihydroxybenzoic acid, 10-hydroxy-
9-anthracenecarboxylic acid and the like. The coating amount of the organic undercoat layer after drying is suitably from 1 to 100 mg / m ² , and preferably from ² to 70 mg / m ² . If the coating amount is less than 2 mg / m ² , sufficient printing durability cannot be obtained. The same is true even if it is larger than 100 mg / m ² .

Back coat: A back coat is provided on the back surface of the support, if necessary. As such a back coat, a coating layer comprising a metal oxide obtained by hydrolysis and polycondensation of an organic polymer compound described in JP-A-5-45885 and an organic or inorganic metal compound described in JP-A-6-35174 Is preferably used.
Among these coating layers, Si (OCH ₃ ) ₄ and Si (OC ₂ H ₅ )
₄ , Si (OC ₃ H ₇ ) ₄ , Si (OC ₄ H ₉ ) ₄ and other silicon alkoxy compounds are inexpensive and readily available, and the resulting metal oxide coating layer is excellent in developer resistance, especially preferable.

The planographic printing plate prepared as described above is usually subjected to image exposure and development processing. As the light source of the actinic ray used for image exposure, for example, a mercury lamp, a metal halide lamp, a xenon lamp, a chemical lamp,
There are carbon arc lamps and the like. As radiation, electron beam,
X-rays, ion beams, far infrared rays, and the like. G line,
i-line, Deep-UV light, and high-density energy beam (laser beam) are also used. Laser beams include helium / neon laser, argon laser, krypton laser, helium / cadmium laser, KrF
Excimer laser and the like can be mentioned. In the laser direct-writing printing plate, a light source having an emission wavelength in the near infrared to infrared region is preferable, and a solid-state laser and a semiconductor laser are particularly preferable.

Examples of the developer used in the present invention include those described in JP-B-57-7427, and include sodium silicate, potassium silicate, sodium hydroxide, potassium hydroxide, and hydroxide. Inorganic alkaline agents such as lithium, tribasic sodium phosphate, dibasic sodium phosphate, tribasic ammonium phosphate, dibasic ammonium phosphate, sodium metasilicate, sodium bicarbonate, aqueous ammonia, etc., and monoethanolamine or diethanolamine An aqueous solution of an organic alkali agent is suitable. The alkaline solution is added so that the concentration of the alkaline solution is 0.1 to 10% by weight, preferably 0.5 to 5% by weight. The lithographic printing plate of the present invention is particularly useful when using a developer substantially free of silicate. Developing solutions containing silicates can increase the discrimination between the image and non-image areas and are widely used. However, there is a problem that the working environment is not preferable. By containing the fluorine-based polymer of the present invention, sufficient discrimination can be obtained without using a silicate developer. That is,
A preferred embodiment of the present invention is directed to a `` plate making method comprising imagewise exposing a lithographic printing plate precursor comprising an image forming layer containing the fluoropolymer of the present invention, followed by treatment with a developer substantially free of silicate ''. It is. Here, the developer containing substantially no silicate means a developer having a SiO ₂ content of 0.5% by weight or less, preferably 0.1% by weight or less, more preferably 0.01% by weight or less. .

Preferred as a developer for a lithographic printing plate using the photosensitive resin composition of the present invention are (a) at least one saccharide selected from non-reducing sugars and (b) at least one base, and Is in the range of 9.0 to 13.5. Hereinafter, the developer will be described in detail. In the present specification, unless otherwise specified, the developing solution means a developing solution (a developing solution in a narrow sense) and a developing replenisher.

It is preferable that the main components of the developer are at least one compound selected from non-reducing sugars and at least one base, and the pH of the solution is in the range of 9.0 to 13.5. . Such non-reducing sugars are saccharides having no free aldehyde group or ketone group and exhibiting no reducibility, trehalose-type oligosaccharides in which reducing groups are bonded to each other, glycosides in which the reducing groups of saccharides are bonded to non-saccharides. It is classified as a sugar alcohol reduced by hydrogenation of a body and a saccharide, and both are suitably used. Trehalose-type oligosaccharides include saccharose and trehalose, and examples of glycosides include alkyl glycosides, phenol glycosides, and mustard oil glycosides. As sugar alcohols, D, L-arabit,
Rebit, xylit, D, L-sorbit, D, L-mannit, D, L-idit, D, L-tallit, zuricit and allozurcit. Further, maltitol obtained by hydrogenation of disaccharide and reductant (reduced starch syrup) obtained by hydrogenation of oligosaccharide are preferably used. Among these, non-reducing sugars which are particularly preferred are sugar alcohols and saccharose. D-sorbitol, saccharose and reduced starch syrup are particularly preferred because they have a buffering action in an appropriate pH range and are inexpensive.

These non-reducing sugars can be used alone or in combination of two or more, and their ratio in the developer is preferably 0.1 to 30% by weight, more preferably 1 to 20% by weight. is there. Below this range, a sufficient buffering effect cannot be obtained, and at concentrations higher than this range, it is difficult to achieve high concentration and the problem of increased cost arises. When a reducing sugar is used in combination with a base, there is a problem that the color changes to brown with the lapse of time, and the pH gradually lowers, thereby deteriorating the developability.

As a base to be combined with the non-reducing sugar, a conventionally known alkali agent can be used. For example, sodium hydroxide, potassium hydroxide, lithium hydroxide, trisodium phosphate, tripotassium phosphate, triammonium phosphate, disodium phosphate, dipotassium phosphate, diammonium phosphate, sodium carbonate, potassium carbonate, Inorganic alkali agents such as ammonium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, ammonium hydrogen carbonate, sodium borate, potassium borate, and ammonium borate are exemplified. Also, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, Organic alkali agents such as ethyleneimine, ethylenediamine and pyridine are also used.

These alkaline agents are used alone or in combination of two or more. Among these, sodium hydroxide and potassium hydroxide are preferred because the pH can be adjusted in a wide pH range by adjusting the amounts of these with respect to the non-reducing sugar. Also, trisodium phosphate, tripotassium phosphate, sodium carbonate, potassium carbonate and the like are preferable since they themselves have a buffering action. These alkaline agents are added so that the pH of the developer is in the range of 9.0 to 13.5, and the amount of addition is determined by the desired pH and the type and amount of non-reducing sugar. The range is 10.0-13.
2.

An alkaline buffer consisting of a weak acid other than saccharides and a strong base can be used in combination with the developer. The weak acid used as such a buffer is preferably one having a dissociation constant (pKa) of 10.0 to 13.2. Such weak acids include IONISATION CONSTAN published by Pergamon Press
Selected from those described in TS OF ORGANIC ACIDS IN AQUEOUS SOLUTION and the like, for example, 2,2,3,3-tetrafluoropropanol-1 (PKa 12.74),
Alcohols such as trifluoroethanol (12.37) and trichloroethanol (12.24), and aldehydes such as pyridine-2-aldehyde (12.68) and pyridine-4-aldehyde (12.05) Salicylic acid (13.0), 3-hydroxy-2-naphthoic acid (12.84), catechol (12.6), gallic acid (12.4), sulfosalicylic acid (11.7),
3,4-dihydroxysulfonic acid (12.2 above), 3,
4-dihydroxybenzoic acid (11.94), 1,2,2
4-trihydroxybenzene (11.82), hydroquinone (11.56), pyrogallol (11.3)
4), o-cresol (10.33), resorcinol (11.27), p-cresol (10.2)
7) compounds having a phenolic hydroxyl group, such as m-cresol (10.09);

2-butanone oxime (12.45);
Acetoxime (12.42), 1,2-cycloheptanedione dioxime (12.3), 2-hydroxybenzaldehyde oxime (12.10), dimethylglyoxime (11.9), ethanediamide dioxime (11.37) and acetophenone oxime (11.37).
Oximes such as 35) and adenosine (12.5
6), inosine (12.5) and guanine (12.
3), cytosine (12.2), hypoxanthine (1)
2.1), nucleic acid-related substances such as xanthine (11.9), and diethylaminomethylphosphonic acid (12.
32) 1-amino-3,3,3-trifluorobenzoic acid (12.29), isopropylidene diphosphonic acid (12.10), 1,1-ethylidene diphosphonic acid (1
1.54), 1-hydroxy 1,1-ethylidene diphosphonate (11.52), benzimidazole (12.
86), thiobenzamide (12.8), picolinethioamide (12.55), barbituric acid (12.8).
And weak acids such as 5).

Of these weak acids, preferred are sulfosalicylic acid and salicylic acid. As the base to be combined with these weak acids, sodium hydroxide, ammonium hydroxide, potassium hydroxide and lithium hydroxide are preferably used.
These alkali agents are used alone or in combination of two or more. The above-mentioned various alkaline agents are used by adjusting the pH within a preferred range depending on the concentration and combination.

Various surfactants and organic solvents can be added to the developer, if necessary, for the purpose of accelerating the developability, dispersing the development residue and improving the ink affinity of the printing plate image area. Preferred surfactants include anionic, cationic, nonionic and amphoteric surfactants.

Preferred examples of the surfactant include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyoxyethylene polystyryl phenyl ethers, polyoxyethylene polyoxypropylene alkyl ethers, and glycerin fatty acid partial esters. , Sorbitan fatty acid partial esters,
Pentaerythritol fatty acid partial ester, propylene glycol monofatty acid ester, sucrose fatty acid partial ester, polyoxyethylene sorbitan fatty acid partial ester, polyoxyethylene sorbitol fatty acid partial ester, polyethylene glycol fatty acid ester, polyglycerin fatty acid partial ester , Polyoxyethylenated castor oils, polyoxyethylene glycerin fatty acid partial esters, fatty acid diethanolamides,
Nonionic surfactants such as N, N-bis-2-hydroxyalkylamines, polyoxyethylene alkylamines, triethanolamine fatty acid esters, and trialkylamine oxides;

Fatty acid salts, abietic acid salts, hydroxyalkanesulfonic acid salts, alkanesulfonic acid salts,
Dialkyl sulfosuccinates, linear alkylbenzene sulfonates, branched alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkylphenoxy polyoxyethylene propyl sulfonates, polyoxyethylene alkyl sulfophenyl ether salts, N-methyl- N-oleyl taurine sodium salt, N-alkyl sulfosuccinic acid monoamide disodium salt, petroleum sulfonates, sulfated tallow oil, fatty acid alkyl ester sulfates, alkyl sulfates, polyoxyethylene alkyl ether sulfates, Fatty acid monoglyceride sulfates, polyoxyethylene alkyl phenyl ether sulfates, polyoxyethylene styryl phenyl ether sulfates, alkyl Phosphoric acid ester salts, polyoxyethylene alkyl ether phosphoric acid ester salts, polyoxyethylene alkyl phenyl ether phosphoric acid ester salts, partially saponified styrene / maleic anhydride copolymers, olefin / maleic anhydride copolymers Saponified substances,

Anionic surfactants such as naphthalene sulfonate formalin condensates; quaternary ammonium salts such as alkylamine salts and tetrabutylammonium bromide; cationic surfactants such as polyoxyethylene alkylamine salts and polyethylene polyamine derivatives. And amphoteric surfactants such as carboxybetaines, aminocarboxylic acids, sulfobetaines, aminosulfates, and imidazolines. Among the surfactants mentioned above, the term "polyoxyethylene" can be read as a polyoxyalkylene such as polyoxymethylene, polyoxypropylene, or polyoxybutylene, and these surfactants are also included.

Further preferred surfactants are fluorine-based surfactants containing a perfluoroalkyl group in the molecule. Such fluorosurfactants include perfluoroalkyl carboxylate, perfluoroalkyl sulfonate, anionic type such as perfluoroalkyl phosphate, amphoteric type such as perfluoroalkyl betaine,
Cationic and perfluoroalkylamine oxides such as perfluoroalkyltrimethylammonium salts, perfluoroalkylethylene oxide adducts, oligomers containing perfluoroalkyl groups and hydrophilic groups,
Non-ionic types such as oligomers containing perfluoroalkyl groups and lipophilic groups, oligomers containing perfluoroalkyl groups, hydrophilic groups and lipophilic groups, and urethanes containing perfluoroalkyl groups and lipophilic groups are included. The above surfactants can be used alone or in combination of two or more, and are added to the developer in an amount of 0.001 to 10% by weight, more preferably 0.01 to 5% by weight.

Various developing stabilizers can be used in the developing solution. Preferred examples thereof are disclosed in
Preferred examples include polyethylene glycol adducts of sugar alcohols described in JP-A-282079, tetraalkylammonium salts such as tetrabutylammonium hydroxide, phosphonium salts such as tetrabutylphosphonium bromide, and iodonium salts such as diphenyliodonium chloride. Further, Japanese Patent Application Laid-Open
Anionic or amphoteric surfactants described in JP-A-51324, water-soluble cationic polymers described in JP-A-55-95946, JP-A-56-1425
And water-soluble amphoteric polymer electrolytes described in JP-A-28.

Further, an organic boron compound to which an alkylene glycol has been added described in JP-A-59-84241, and a water-soluble surfactant of the polyoxyethylene / polyoxypropylene block polymerization type described in JP-A-60-111246. JP-A-60-129750, polyoxyethylene / polyoxypropylene-substituted alkylenediamine compounds, JP-A-61-215554, polyethylene glycol having a weight average molecular weight of 300 or more, JP-A-63-175858. JP-A-2-39157 discloses a fluorine-containing surfactant having a cationic group, a water-soluble ethylene oxide addition compound obtained by adding 4 mol or more of ethylene oxide to an acid or alcohol, and a water-soluble polyalkylene compound. No.

An organic solvent is further added to the developer if necessary. Suitable organic solvents are those having a solubility in water of about 10% by weight or less, and preferably those having a solubility in water of 5% by weight or less. For example, 1-phenylethanol, 2-phenylethanol, 3-phenyl-1-propanol, 4-phenyl-1-butanol, 4-phenyl
2-butanol, 2-phenyl-1-butanol, 2-phenoxyethanol, 2-benzyloxyethanol, o-
Methoxybenzyl alcohol, m-methoxybenzyl alcohol, p-methoxybenzyl alcohol, benzyl alcohol, cyclohexanol, 2-methylcyclohexanol, 3-methylcyclohexanol and 4-methylcyclohexanol, N-phenylethanolamine and N-phenyldiethanolamine And the like. The content of the organic solvent is 0.1 to 5% by weight based on the total weight of the used solution. The amount used is closely related to the amount used of the surfactant, and it is preferable to increase the amount of the surfactant as the amount of the organic solvent increases. This is because if the amount of the surfactant is small and the amount of the organic solvent is large, the organic solvent does not completely dissolve, and therefore, it is impossible to expect good developability.

A reducing agent can be further added to the developer. This is to prevent stains on the printing plate, and is particularly effective when developing a negative photosensitive lithographic printing plate containing a photosensitive diazonium salt compound.Preferred organic reducing agents include thiosalicylic acid, hydroquinone, and methol. Phenol compounds such as methoxyquinone, resorcinol and 2-methylresorcin; and amine compounds such as phenylenediamine and phenylhydrazine. More preferred inorganic reducing agents include sodium salts, potassium salts, and ammonium salts of inorganic acids such as sulfurous acid, bisulfite, phosphorous acid, bisulfite, diphosphite, thiosulfate and dithionite. Salts and the like can be mentioned. Among these reducing agents, sulfites are particularly excellent in the stain prevention effect. These reducing agents are contained preferably in the range of 0.05 to 5% by weight with respect to the developing solution at the time of use.

The developing solution may further contain an organic carboxylic acid. Preferred organic carboxylic acids have 6 to 6 carbon atoms.
20 aliphatic carboxylic acids and aromatic carboxylic acids. Specific examples of the aliphatic carboxylic acid include caproic acid, enantiic acid, caprylic acid, lauric acid, myristic acid, palmitic acid and stearic acid, and particularly preferred are alkanoic acids having 8 to 12 carbon atoms. . Further, unsaturated fatty acids having a double bond in the carbon chain or branched fatty acids may be used. The aromatic carboxylic acid is a compound in which a benzene ring, a naphthalene ring, an anthracene ring, or the like is substituted with a carboxyl group.
-Chlorobenzoic acid, p-chlorobenzoic acid, o-hydroxybenzoic acid, p-hydroxybenzoic acid, o-aminobenzoic acid, p-aminobenzoic acid, 2,4-dihydrobenzoic acid,
2,5-dihydroxybenzoic acid, 2,6-dihydroxybenzoic acid, 2,3-dihydroxybenzoic acid, 3,5-dihydroxybenzoic acid, gallic acid, 1-hydroxy-2-naphthoic acid, 3-hydroxy-2- Naphthoic acid, 2-hydroxy-
There are 1-naphthoic acid, 1-naphthoic acid and 2-naphthoic acid, and hydroxynaphthoic acid is particularly effective.

The above aliphatic and aromatic carboxylic acids are preferably used as a sodium salt, potassium salt or ammonium salt in order to enhance water solubility. The content of the organic carboxylic acid in the developer used in the present invention is not particularly limited, but if the content is less than 0.1% by weight, the effect is not sufficient.
If it is 0% by weight or more, not only the effect cannot be further improved but also dissolution may be hindered when another additive is used in combination. Therefore, the preferred addition amount is 0.1 to 10% by weight, more preferably 0.5 to 4% by weight, based on the developer used.
% By weight.

The developing solution may further contain, if necessary, a preservative,
Coloring agents, thickeners, defoamers, water softeners, and the like can be included. Examples of water softeners include polyphosphoric acid and its sodium, potassium, and ammonium salts, ethylenediaminetetraacetic acid, diethylenetriaminepentaacetic acid, triethylenetetraminehexaacetic acid, hydroxyethylethylenediaminetriacetic acid, nitrilotriacetic acid, 1,2-diaminocyclohexanetetraacetic acid. Aminopolycarboxylic acids such as acetic acid and 1,3-diamino-2-propanoltetraacetic acid and their sodium, potassium and ammonium salts, aminotri (methylenephosphonic acid), ethylenediaminetetra (methylenephosphonic acid), diethylenetriaminepenta (methylene Phosphonic acid), triethylenetetraminehexa (methylenephosphonic acid), hydroxyethylethylenediaminetri (methylenephosphonic acid) and 1- Dorokishitaen 1,1-diphosphonic acid and their sodium salts, potassium salts and ammonium salts.

The optimum value of such a water softener varies depending on the chelation, the hardness of the hard water used and the amount of the hard water. -5% by weight, more preferably 0.01-0.
It is in the range of 5% by weight. If the added amount is less than this range, the intended purpose is not sufficiently achieved, and if the added amount is more than this range, adverse effects on the image area such as color omission appear. The remaining component of the developer is water. It is advantageous from the viewpoint of transportation that the developing solution is a concentrated solution in which the content of water is smaller than that at the time of use and is diluted with water at the time of use. In this case, the degree of concentration is appropriately such that each component does not cause separation or precipitation.

As a developer for a lithographic printing plate using the photosensitive resin composition of the present invention, a developer described in JP-A-6-282079 can also be used. This is SiO ₂ / M ₂
The molar ratio of O (M represents an alkali metal) is 0.5 to 2.
And a water-soluble ethylene oxide adduct obtained by adding 5 mol or more of ethylene oxide to a sugar alcohol having 4 or more hydroxyl groups. Sugar alcohol is a polyhydric alcohol corresponding to one obtained by reducing an aldehyde group and a ketone group of a sugar to form primary and secondary alcohol groups, respectively. Shellfish examples of sugar alcohols include D, L-trait, erythritol, D, L-arabit, ribit, xylit,
D, L-sorbit, D, L-mannit, D, L-idit, D, L-talit, dursit, allozurcit, etc., and also di-, tri-, tetra-, penta- and hexaglycerin condensed with sugar alcohols No. The water-soluble ethylene oxide adduct is obtained by adding 5 mol or more of ethylene oxide to 1 mol of the sugar alcohol. Further, propylene oxide may be block-copolymerized with the ethylene oxide-added compound, if necessary, as long as the solubility is acceptable. These ethylene oxide addition compounds may be used alone or in combination of two or more. The addition amount of these water-soluble ethylene oxide addition compounds is suitably from 0.001 to 5% by weight, more preferably from 0.001 to 2% by weight, based on the developer (working solution).

The above-mentioned various surfactants and organic solvents can be further added to the developer, if necessary, for the purpose of accelerating the developing property, dispersing the developing residue and improving the ink affinity of the printing plate image area. .

PS developed with a developer having such a composition
The plate is subjected to post-treatment with washing water, a rinsing solution containing a surfactant or the like, a finisher containing a gum arabic or a starch derivative, or a protective gum solution. These treatments can be used in various combinations for the post-treatment of the PS plate of the present invention.

In recent years, automatic developing machines for PS plates have been widely used in the template and printing industries in order to rationalize and standardize plate making operations. This automatic developing machine generally comprises a developing section and a post-processing section, and comprises a device for transporting a PS plate, each processing solution tank and a spray device, and pumps the exposed PS plate horizontally while pumping it. Each processing liquid is sprayed from a spray nozzle to perform development and post-processing. Recently, a PS plate is immersed and transported by a submerged guide roll or the like in a processing solution tank filled with a processing solution to carry out development processing, or a fixed amount of small amount of washing water is supplied to the plate surface after development for washing. A method is also known in which the waste water is reused as dilution water of a developer undiluted solution.

In such automatic processing, processing can be performed while replenishing each processing solution with a replenisher in accordance with the processing amount, the operating time, and the like. Further, a so-called disposable processing method in which processing is performed with a substantially unused processing liquid can also be applied. The lithographic printing plate obtained by such a process is set on an offset printing machine and used for printing a large number of sheets.

[0181]

The present invention will be further described below with reference to examples. However, the present invention is not limited by these examples.

[Examples 1 to 12, Comparative Examples 1 to 3] (All percentages in the following Examples are% by weight unless otherwise specified.) JIS having a thickness of 0.24 mm
A 1050 aluminum plate with an average particle size of about 2.1 μm
While supplying a suspension of pumistone and water to the aluminum surface, brush graining was performed with a rotating nylon brush shown below. The first brush has a hair length of 100 mm,
The hair diameter is 0.95 mm, the flocking density is 70 fibers / cm ² ,
The brush had a bristle length of 80 mm, a bristle diameter of 0.295 mm, and a flocking density of 670 pieces / cm ² . The rotation of each of the brush rolls was 250 rpm. After brush graining, rinse well with water, immerse in 10% sodium hydroxide at 60 ° C for 25 seconds, etch, and rinse with running water.
It was neutralized and washed with 0% nitric acid and washed with water. These are represented by VA = 1
Using a sinusoidal alternating current under the condition of 2.7 V, 1
The electrolytic surface roughening treatment was performed in an aqueous solution of nitric acid at a concentration of 160 clones / dm ^{2 at} the anode. When the surface roughness was measured, it was 0.79 μm (Ra display). Subsequently, after immersion in a 1% aqueous sodium hydroxide solution at 40 ° C. for 30 seconds, immersion in a 30% aqueous sulfuric acid solution and desmut treatment at 60 ° C. for 40 seconds, a current density of 2 A / dm ^{2 in} a 20% aqueous sulfuric acid solution Was anodized with a direct current so that the weight of the oxide film was 1.6 g / m ² , to prepare a substrate.

The undercoat liquid (A) having the following composition was applied to the surface of the substrate thus treated, and dried at 80 ° C. for 30 seconds. The coating amount after drying was 10 mg / m ² . Undercoat solution (A) β-alanine 0.10 g methanol 40 g pure water 60 g In this way, substrate (I) was produced. Next, on this substrate (I), a photosensitive solution (composition) shown in the following Table 1 was applied in a thickness of 12 ml / m ² by rod coating, and dried at 100 ° C. for 1 minute to perform positive photosensitive lithographic printing. The original plate was obtained. The coated amount after drying was 1.15 g / m ² . In order to further shorten the vacuum adhesion time, a mat layer was formed as described in JP-B-61-28986.

[0184]

[Table 1]

[0185]

[Table 2]

[0186]

Embedded image

Each photosensitive solution obtained above was vigorously shaken in a bottle, and the foaming property was observed. Foaming is remarkable when the foaming is remarkable and the foam does not disappear even after 30 minutes from standing. X The foaming is remarkable, but when the foam disappears within 20 minutes after the standing. A sample in which bubbles disappeared within 5 minutes was evaluated as ◎.
In addition, the surface of the photosensitive layer coated surface of the thus prepared photosensitive printing plate was visually observed. The surface condition was represented by the number of pinholes generated per square meter. Table 3 shows the results.

[0188]

[Table 3]

As is clear from Table 3, the addition of the fluoropolymer of the present invention provides a lithographic printing plate precursor having low foaming properties of the photosensitive material, excellent defoaming properties, and excellent uniformity of the image forming layer. Can be.

[Examples 13 to 19, Comparative Examples 4 and 5] The fluorinated polymer was changed as shown in Table 4, and the other conditions were exactly the same as those for the production of the light-sensitive material 1 and used as a lithographic printing plate precursor. And photosensitive materials 13 to 19, R4 and R5.

[0191]

[Table 4]

[0192]

Embedded image

The photosensitive lithographic printing plate precursor thus prepared was evaluated by the following method. After exposing for 1 minute with a 3 kW metal halide lamp from a distance of 1.5 m through an original consisting of solid and halftone dots, the following developing solution and a finisher were used on a 900 V PS processor manufactured by Fuji Photo Film Co., Ltd. FP2W (1: 1) manufactured by Photo Film Co., Ltd. was charged and developed at 30 ° C. for 12 seconds to prepare a lithographic printing plate. Then, Dainippon Ink Co., Ltd. was used as an ink for the R201 printing machine manufactured by Roland.
Printing was carried out using GEOS-G (N) manufactured by Nippon Kayaku Co., Ltd., and the number of sheets until a sufficient ink density was obtained in the image portion at the start of printing was examined to determine the number of inlaid sheets. The smaller the number, the better the planographic printing plate. Further, printing was performed until the blurring of the solid portion of the printed matter began to occur. The higher the number of printings, the better the planographic printing plate. Separately, lithographic printing plate precursors each 1m
After the entire surface of ² was exposed, it was processed with 100 ml of a developing solution, and the state of generation of sludge in the developing solution after the processing was observed. Result 5
It is shown in the table. (Developer composition) Pure water 90 wt% D-Sorbit 6 wt% KOH 2.5 wt%

[0194]

[Table 5]

From Table 5, it can be seen that the lithographic printing plate precursor according to the present invention provides an excellent lithographic printing plate having both good inking property, printing durability and prevention of generation of sludge. That is, it is considered that the lithographic printing plate precursor according to the invention exhibits high deposition and high printing durability due to high hydrophobicity, and still retains excellent developer dissolving / dispersing property.

(Examples 20 to 22, Comparative Example 6) The fluorinated polymer was changed as shown in Table 6, and the other conditions were exactly the same as in the preparation of the photosensitive material 1, and the lithographic printing plate precursor was used as a lithographic printing plate precursor. 20 to 22, R6 were prepared.

[0197]

[Table 6]

[0198]

Embedded image

The photosensitive lithographic printing plate precursor thus produced was evaluated by the following method. Sensitivity is a step wedge manufactured by Fuji Photo Film Co., Ltd. (density difference of each step is 0.15)
Through a 3 kW metal halide lamp from a distance of 1 m for 1 minute, and using a PS processor 900V manufactured by Fuji Photo Film Co., Ltd. at 30 ° C.
For 12 seconds, the molar ratio of SiO ₂ / K ₂ O is 1.16,
₂ Developed with an aqueous solution having a concentration of 1.4%, and expressed by the number of clear stages. The higher the number of stages, the higher the sensitivity. The gradation represents the difference between the number of clear steps and the number of solid steps of the sample for which the sensitivity was evaluated. A lower value indicates a higher contrast. The development tolerance is p based on the developer described above.
Exposure and development were carried out in the same manner as in the above sensitivity except that a liquid in which H was increased or decreased by 0.2 was used, and the change in the number of solid plates due to pH was shown. The smaller this value is, the better the development tolerance is. Table 7 shows the results.

[0200]

[Table 7]

As is clear from Table 7, Examples 20 to
Sample No. 22 has a high contrast without lowering the sensitivity, and has good development tolerance.

[Examples 23 and 24] A 1S aluminum plate having a thickness of 0.30 mm was placed on a No. 8 nylon brush and
Using a 0-mesh aqueous suspension of pamistone, the surface was grained, and then thoroughly washed with water. After immersing in 10% sodium hydroxide at 70 ° C for 60 seconds and etching,
After washing with running water, neutralization washing with 20% HNO ₃ and washing with water were performed.
This was converted to 300 coulombs / dm ^{2 in} a 1% aqueous nitric acid solution using a sinusoidal alternating current under the condition of VA = 12.7 V.
The electrolytic surface roughening treatment was performed using the quantity of electricity at the time of anode. When the surface roughness was measured, it was 0.45 μm (Ra display). Subsequently, it is immersed in a 30% H ₂ SO ₄ aqueous solution,
After desmutting at 55 ° C. for 2 minutes, 33 ° C., 20% H ₂
In a SO ₄ aqueous solution, place a cathode on the grained surface,
When anodized at a current density of 5 A / dm ² for 50 seconds, the thickness was 2.7 g / m ² .

Further, sodium silicate No. 3 (SiO ₂ = 28 to
(2.5% by weight of 30%, Na ₂ O = 9 to 10%, Fe = 0.02% or less), pH = 11.2, 70 ° C. for 13 seconds, followed by washing with water. The silicate amount at that time was 10 mg / m ² . For measurement, the amount of Si element was determined by fluorescent X-ray analysis. Next, a liquid composition (sol solution) of the SG method was prepared by the following procedure. The following composition was weighed into a beaker and stirred at 25 ° C. for 20 minutes. Si (OC ₂ H ₅ ) ₄ 38 g 3-methacryloxypropyltrimethoxysilane 13 g 85% phosphoric acid aqueous solution 12 g ion-exchanged water 15 g methanol 100 g

The solution was transferred to a three-necked flask, fitted with a reflux condenser, and immersed in the oil bath at room temperature. The contents of the three-necked flask were heated to 50 ° C. in 30 minutes while stirring with a magnetic stirrer. While maintaining the bath temperature at 50 ° C, the reaction was further performed for 1 hour to obtain a liquid composition (sol liquid). This sol solution was diluted with methanol / ethylene glycol = 20/1 (weight ratio) so as to be 0.5% by weight, applied with a wheeler to a substrate, and dried at 100 ° C. for 1 minute. The coating amount at that time was 4 mg / m ² . The amount of this coating was also determined by fluorescent X-ray analysis to determine the amount of Si element.
It was taken as the coating amount. A high-sensitivity photopolymerizable composition 1 having the following composition was applied to the aluminum plate treated in this manner so that the dry coating weight was 1.5 g / m ² ,
For 1 minute to form a photosensitive layer.

[Photopolymerizable Composition 1] Tetramethylolmethanetetraacrylate 1.5 g Linear organic high molecular polymer (B1) 2.0 g Allyl methacrylate / methacrylic acid copolymer (copolymerization molar ratio 80/20) , Weight average molecular weight 45,000) Sensitizer (C1) 0.15 g

[0206]

Embedded image

(Λmax THF 479 nm, ε = 6.9 × 10 ⁴ ) 0.2 g of photopolymerization initiator (D1)

[0208]

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IRGACURE907 (E1) (manufactured by Ciba-Geigy) 0.4 g Fluoropolymer (described in Table 8) See Table 8 ε-Phthalocyanine / (B1) dispersion 0.2 g Methyl ethyl ketone 9.0 g Propylene Glycol monomethyl ether acetate 7.5 g Toluene 11.0 g

[0210]

[Table 8]

On this photosensitive layer, polyvinyl alcohol (98 mol% saponification, polymerization degree 5
00) of a 3% by weight aqueous solution having a dry coating weight of 2.5 g /
m ² , dried at 120 ° C. for 3 minutes,
A photopolymerizable lithographic printing plate precursor was obtained. The uniformity of the film of the photosensitive layer was good. On the other hand, when the fluoropolymer was removed from the photosensitive layer composition, the film was mottled and non-uniform (Comparative Example 7). A comparative photosensitive solution prepared in the same manner except that the fluoropolymer was changed to R-1 was also prepared. On the other hand, when R-1 was added, the foaming property was high and the defoaming property was inferior (Comparative Example 8). The obtained plate was exposed at 4000 dp using XLP4000 (Ar laser 75 mW, 488 nm) manufactured by Optronics.
i, under conditions of 175 lines / inch, 1 to 99 in 1% increments
% Was exposed in duplicate. Then 2 at 120 ° C
Post-heating treatment was performed by exposing for 0 second.

The development was carried out by immersion in the following developer at 25 ° C. for 30 seconds. (Developer) 1K potassium silicate 30g potassium hydroxide 15g water 1000g

Next, GU-7 (Fuji Photo Film Co., Ltd.)
) Was diluted twice with water to treat the plate surface. 400
When the plate surface energy amount reproduced by 1% under the condition of 0 dpi and 175 lines / inch was determined as the sensitivity of the sample, it was 0.2 mJ, which was practically sufficient. Further, the quality of halftone dots at the exposure amount was good, and unnecessary fog and flare were not recognized. When a printing press was performed using SORKZ manufactured by Heidelberg Co., Ltd., and the ink used was Claf G (N) manufactured by Dainippon Ink Co., Ltd., a printing durability test was performed. did it.

Further, the obtained plate material was stored at 60 ° C. for 3 days, exposed and developed in the same manner, printed, and visually evaluated to evaluate the stability over time. The printing durability, stain resistance, and image quality were good without any change from the photosensitive material immediately after coating.

Next, examples of the heat-crosslinkable planographic printing plate precursor will be described. <Structure of crosslinking agent [KZ-1]>

[0216]

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<Procurement of Binder Polymer [BP-1]> Poly (p-hydroxystyrene) and Marca Linker MS-4P (trade name) manufactured by Maruzen Petrochemical Co., Ltd. were obtained, and [BP-1] and did.

[Examples 25 to 26] An aluminum plate (material 1050) having a thickness of 0.30 mm was washed with trichlorethylene and degreased, and then its surface was grained with a nylon brush and a 400 mesh pumicetone-water suspension. And
Washed well with water. This plate was immersed in a 25% aqueous solution of sodium hydroxide at 45 ° C. for 9 seconds, etched, washed with water, and further immersed in 2% HNO ₃ for 20 seconds and washed with water.
At this time, the etching amount of the grained surface was about 3 g / m ² . Next, the plate was provided with a 3 g / m ² DC anodic oxide film at a current density of 15 A / dm ² using 7% H ₂ SO ₄ as an electrolytic solution, and then washed and dried. Next, the following undercoat liquid was applied to this aluminum plate, and dried at 80 ° C. for 30 seconds. The coating amount after drying was 10 mg / m ² .

Undercoat solution β-alanine 0.1 g Phenylphosphonic acid 0.05 g Methanol 40 g Pure water 60 g

Next, the following solution [G] was prepared, and this solution was applied to the above-mentioned primed aluminum plate.
After drying at 0 ° C. for 1 minute, a negative type lithographic printing original plate was obtained. The coated surface condition was uniform and good. The coating amount after drying is 1.5
g / m ² .

Solution [G] Fluorine-based polymer (described in Table 9) See Table 9 Acid generator [SH-1] 0.3 g Crosslinker "KZ-1" 0.5 g Binder polymer [BP-1] 1.5 g Infrared absorber [IK-1] 0.07 g AIZEN SPIRON BLUE C-RH 0.035 g (manufactured by Hodogaya Chemical Co., Ltd.) Methyl ethyl ketone 12 g Methyl alcohol 10 g 1-methoxy-2-propanol 8 g

[0222]

[Table 9]

The structures of the acid generator [SH-1] and the infrared absorber [IK-1] used are shown below.

[0224]

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The surface of the resulting negative type lithographic printing plate precursor was touched with bare hands, and then scanned and exposed with a semiconductor laser emitting infrared light having a wavelength of about 820 to 850 nm. After exposure, after a heat treatment at 110 ° C. for 30 seconds with a panel heater,
The image was developed with a developing solution manufactured by Fuji Photo Film Co., Ltd., DP-4 (a 1: 8 water diluent). After image formation, it was visually determined whether or not the image of the part touched with bare hands was missing.
No image omission occurred.

[Comparative Example 9] A solution was prepared in the same manner as in Example 25 except that the fluorine-based polymer P-19 was not used in the solution [G] used in Example 25. This solution was applied to the undercoated aluminum plate used in Example 25, and dried at 100 ° C. for 1 minute to obtain a negative type lithographic printing plate. The coated surface was mottled and non-uniform. This lithographic printing plate precursor was image-formed by the same operation as in Example 25. After the image formation, it was visually determined whether or not the image of the portion touched by the bare hand was missing. As a result, clear image omission occurred.

Next, examples of the thermal positive type planographic printing plate precursor will be described. [Preparation of Copolymer 1] In a 20 ml three-necked flask equipped with a stirrer, a condenser and a dropping funnel, 4.61 g (0.0%) of N- (p-aminosulfonylphenyl) methacrylamide was added.
192 mol), 2.94 g of ethyl methacrylate (0.0
258 mol), 0.80 g of acrylonitrile (0.01
5 mol) and 20 g of N, N-dimethylacetamide, and the mixture was stirred while being heated to 65 ° C. in a hot water bath. "V-65" (manufactured by Wako Pure Chemical Industries, Ltd.)
0.15 g was added, and the mixture was stirred for 2 hours under a nitrogen stream while maintaining at 65 ° C. The reaction mixture was further added to N- (p-aminosulfonylphenyl) methacrylamide 4.61
g, 2.94 g of ethyl methacrylate, 0.80 g of acrylonitrile, N, N-dimethylacetamide and "V-6
5 ", and a mixture of 0.15 g was dropped by a dropping funnel over 2 hours. After the addition was completed, the resulting mixture was further stirred at 65 ° C. for 2 hours. After completion of the reaction, methanol (40 g) was added to the mixture, and the mixture was cooled. The obtained mixture was added to 2 liters of water while stirring the water. The mixture was stirred for 30 minutes, and the precipitate was taken out by filtration and dried. 15 g of a white solid was obtained. The weight average molecular weight (polystyrene standard) of this specific copolymer 1 was determined by gel permeation chromatography to be 53,000.
It was 0.

[Preparation of Substrate] An aluminum plate (material 1050) having a thickness of 0.3 mm was washed with trichloroethylene and degreased. Washed well with water. This plate was etched by immersing it in a 25% aqueous solution of sodium hydroxide at 45 ° C. for 9 seconds, washed with water, further immersed in 20% nitric acid for 20 seconds, and washed with water. At this time, the etching amount of the grained surface was about 3 g / m ² .
Next, this plate was subjected to a current density of 15 A /
to provide a DC anodic oxide film of 3 g / m ² in dm ^2, washed with water, dried and further coated with the following undercoat solution, a coating film 9
Dry at 0 ° C. for 1 minute. The amount of coating after drying is 10mg
/ M ² .

Undercoat liquid β-alanine 0.5 g Methanol 95 g Water 5 g

Further, the mixture was treated with a 2.5% by weight aqueous solution of sodium silicate at 30 ° C. for 10 seconds.
The coating film was dried at 80 ° C. for 15 seconds to obtain a substrate. The coating amount of the coating film after drying was 15 mg / m ² .

Undercoat liquid 0.3 g of the following compound 100 g of methanol 1 g of water

[0232]

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Examples 27 to 28 The following photosensitive solutions 1 were prepared. The photosensitive liquid 1 was applied to the obtained substrate in an amount of 1.
Coating was carried out at 8 g / m ² to obtain a lithographic printing plate precursor having an excellent coated surface of the photosensitive layer.

Photosensitive solution 1 Fluorinated polymer (described in Table 10) See Table 10. Copolymer 1 0.75 gm, p-cresol novolak (m, p ratio = 6/4, 0.25 g Weight average molecular weight 3,500 , Unreacted cresol 0.5% by weight) p-toluenesulfonic acid 0.003 g tetrahydrophthalic anhydride 0.03 g cyanine dye (IK-1) 0.017 g Victoria Pure Blue BOH counter ion 0.015 g 1-naphthalene Sulfonate anion dye γ-butyl lactone 10 g Methyl ethyl ketone 10 g 1-methoxy-2-propanol 1 g

[0235]

[Table 10]

The lithographic printing plate precursor obtained was evaluated for development stability against damage by the following method. The photosensitive material surface of the lithographic printing plate precursor was subjected to a continuous load type scratch strength tester "SB6
Using "Type 2" (manufactured by Shinto Kagaku Co., Ltd.), "No. 5C" filter paper manufactured by Advantech Toyo Co., Ltd. is attached to a square flat portion of 1 cm square hitting the plate of the scratching jig, and a load of 100 g is applied. At a speed of 6 cm / sec. Next, an output of 500 mW, a wavelength of 830 nm, and a beam diameter of 17 μm (l
/ E ² ) using a semiconductor laser at a main scanning speed of 5 m / sec and a 5% halftone dot-like image exposure. Developed. The obtained image formed a good halftone dot, the image portion of the scratched portion did not dissolve at all, and it was confirmed that the lithographic printing plate of the present invention had good development stability against external damage. In addition, the foaming property of the photosensitive solution was low, and the coating surface was as good as 5 or less pinholes per square meter in Example 27 and 3 or less per square meter.

[Comparative Example 10] A lithographic printing plate precursor was obtained in the same manner as in Examples 27 to 28 except that the fluoropolymer was not used. The film was mottled and uneven. Next, the lithographic printing plate precursors of Examples 27 to 2 were used.
In the same manner as in Example 8, the development stability against damage was evaluated.
In the scratched portion, the unexposed halftone dot portion on which the image should originally be put was developed and removed. [Comparative Example 11] A lithographic printing plate precursor was obtained in the same manner as in Examples 27 to 28 except that the fluoropolymer was changed to R-2. The foaming property of the photosensitive solution was high, and the time required for defoaming was 30 minutes or more, which was inferior in production suitability. Next, the lithographic printing plate precursor was evaluated for development stability against damage in the same manner as in Examples 27 to 28. In the scratched portion, the unexposed halftone dot portion on which the image should originally be put was developed and removed.

(Examples 27 to 28, Comparative Examples 10 and 1
According to the result of 1), by adding a specific fluorine-based polymer, a photosensitive liquid having excellent foaming properties and defoaming properties and a good surface condition is provided, and the photosensitive layer has a stability against trauma in a state before development. It can be seen that it has improved.

Next, examples of a radical polymerization type thermal negative type planographic printing plate precursor will be described. "Preparation of support" 99.5% or more of aluminum and Fe
0.30%, Si 0.10%, Ti 0.02
% And a melt of JIS A1050 alloy containing 0.013% of Cu were subjected to cleaning treatment and cast. In the cleaning process,
Degassing treatment was performed to remove unnecessary gases such as hydrogen in the molten metal, and ceramic tube filter treatment was performed.
Casting was performed by a DC casting method. The solidified ingot having a thickness of 500 nm was formed into a rolled aluminum plate having a thickness of 10 nm from the surface.
By controlling the roughness of the rolling roll, the center line average surface roughness Ra after the cold rolling was controlled to 0.2 μm. Then, it was put on a tension lever to improve the flatness.

Next, a surface treatment for forming a lithographic printing plate support was performed. First, in order to remove the rolling oil on the aluminum surface, a 10% aqueous sodium aluminate solution was subjected to vertical degreasing at 50 ° C. for 30 seconds, and a 30% aqueous sulfuric acid solution was neutralized at 50 ° C. for 30 seconds, and a smut removal treatment was performed. Next, in order to improve the adhesion between the support and the photosensitive layer and to impart water retention to the non-image area, a so-called graining treatment for roughening the surface of the support was performed. While maintaining an aqueous solution containing 1% nitric acid and 0.5% aluminum nitrate at 45 ° C. and flowing an aluminum web into the aqueous solution, the current density was 20 A / d by an indirect power supply cell.
Electrolytic graining was performed by giving an anode side electric quantity of 240 C / dm ² with an alternating waveform of m ² and a duty ratio of 1: 1. Then, at 50 ° C 3 with a 10% aqueous sodium aluminate solution.
Etching process for 0 second, 50% with 30% sulfuric acid aqueous solution
Neutralization and smut removal treatment were performed at 30 ° C. for 30 seconds.

In order to further improve abrasion resistance, chemical resistance and water retention, an oxide film was formed on the support by anodic oxidation. An anodic oxide film of 2.5 g / m ^{2 is} obtained by performing an electrolytic treatment with a direct current of 14 A / dm ² by an indirect power supply cell while carrying an aluminum web through the electrolyte using a 20% aqueous solution of sulfuric acid at 35 ° C. as an electrolyte. Was prepared.

[Undercoating] Next, the following undercoating solution was applied to this aluminum support using a wire bar so that the dry coating solid content was 5 mg / m ^{2, and the} resulting mixture was heated at 90 ° C. for 30 seconds using a hot air drier. Dried. <Undercoat liquid>-0.1 g of 2-aminoethylphosphonic acid-0.1 g of phenylphosphonic acid-75 g of methanol-25 g of water

(Examples 29 to 30) The following photosensitive layer coating solution was coated on the undercoated support using a wire bar, and dried at 115 ° C. for 45 seconds with a hot air drier. To obtain a negative type lithographic printing plate precursor. The coated surface is excellent in uniformity. The coating amount was 1.3 g / m ² .

<Coating solution for photosensitive layer> Photothermal conversion agent (cyanine dye TN-1) 0.10 g Thermal radical generator (sulfonium salt compound TN-2) 0.30 g Addition polymerizable unsaturated compound (dipentaerythritol) Hexaacrylate) 1.00 g Alkali-soluble binder polymer (copolymer of allyl methacrylate and methacrylic acid, having a copolymerization molar ratio of 83 to 17 and a weight average molecular weight of 125,000) 1.2 g Coloring agent (Naphthalene sulfonate of Victoria Pure Blue) 0.04 g-Fluoropolymer (described in Table 11) See Table 11-Methyl ethyl ketone 10.0 g-1-methoxy-2-propanol 8.0 g

[0245]

[Table 11]

Structure of (Cyanine Dye TN-1)

[0247]

Embedded image

Structure of (Sulfonium Salt Compound TN-2)

[0249]

Embedded image

The obtained negative type lithographic printing plate precursor was water cooled 4
Cre Cre equipped with 0W infrared semiconductor laser
ndsetter 3244VFS, output 9W, outer drum rotation speed 210rpm, energy 100m
50% halftone image exposure was performed under the conditions of J / cm ² and a resolution of 2400 dpi. Next, development processing was performed using an automatic developing machine Stublon 900N manufactured by Fuji Photo Film Co., Ltd. Developer,
The replenisher used had the following composition, the developing bath temperature was 30 ° C., and the finisher used was a 1: 1 water dilution (pH = 10.8) of FN-6 manufactured by Fuji Photo Film. Uniform,
Good dot images were obtained. When the obtained lithographic printing plate was printed with a Heidelberg SEI-SOR-M printing machine, 110,000 or more printed materials for Example 29 and 120,000 or more printed materials for Example 30 were obtained. I got it. In addition, the photosensitive solution of this example had low foaming properties, and the time required for defoaming was within 5 minutes, indicating that it had sufficient production suitability.

<Developer>-Potassium carbonate 10 g-Sodium dibutylnaphthalene sulfonate 10 g-Ethylene glycol mononaphthyl ether 20 g-Sodium sulfite 3 g-Potassium hydroxyethanediphosphonate 2 g-Silicone SA730 (a surfactant manufactured by Toshiba Silicone Co., Ltd. 0.1 g water 954.9 g <replenisher> sodium carbonate monohydrate 13 g ethylene glycol mononaphthyl ether monosulfate sodium salt 10 g ethylene glycol monododecyl ether 20 g sodium sulfite 3 g ethylenediaminetetraacetic acid 4g sodium 1g, water 953g

(Comparative Example 12) Except that the fluorinated polymer was removed from the above photosensitive liquid, the same as in Examples 29 to 30 was carried out.
A lithographic printing plate precursor was prepared. The image forming layer had insufficient uniformity. Further, when the exposure and development treatment was carried out in the same manner as in Examples 29 to 30, scratches occurred in the dot image area. (Comparative Example 13) A fluorine-based polymer was converted to R-
A lithographic printing plate precursor was produced in exactly the same manner as in Examples 29 to 30, except that the composition was changed to 4. The foaming property was high, the time required for defoaming was 30 minutes or more, and the production suitability was poor. The image forming layer had insufficient uniformity. Further, when the exposure and development treatment was carried out in the same manner as in Examples 29 to 30, scratches occurred in the dot image area.

(Examples 29 to 30, Comparative Examples 12 and 1
From 3), it can be seen that the use of the fluoropolymer of the present invention provides a thermal negative type lithographic printing plate having a uniform surface and improved developer resistance in the image area.

Next, examples of the hydrochloric acid support preferred in the present invention will be described. Manufacture of Aluminum Substrate Using a 0.24 mm thick JIS 1050 aluminum plate, the following pre-treatment, surface roughening treatment, hydrophilic film generation treatment, and post-treatment if necessary are performed in this order, An aluminum substrate to be used for was prepared.

<Roughening treatment> The surface of an aluminum plate was roughened using a nylon brush having a bristle diameter of 0.72 mm and a bristle length of 80 mm and an aqueous suspension of pamistone having an average particle size of about 15 to 35 µm. Washed with water. Next, the film was immersed in a 10% aqueous sodium hydroxide solution at 70 ° C. for 30 seconds for etching, washed with running water, then neutralized and washed with a 20% aqueous nitric acid solution, and washed with water. The aluminum plate mechanically roughened in this way was further subjected to the following electrochemical roughening. In a hydrochloric acid aqueous solution prepared by adding aluminum chloride to hydrochloric acid so that the concentration of hydrochloric acid is 7.5 g / l and the concentration of aluminum ions is 5 g / l, the mechanical roughening is performed at a liquid temperature of 35 ° C. Using a radial cell, alternating current was applied to the aluminum plate subjected to alternating current electrolysis. As the alternating current, a sine wave generated by adjusting the current and voltage of a commercial alternating current having a frequency of 60 Hz using an induction voltage regulator and a transformer was used. The total amount of electricity when the aluminum plate is the anode is 50 C / dm ² ,
Qc / Qa in the cycle was 0.95.

With respect to the concentrations of hydrochloric acid and aluminum ions in the aqueous hydrochloric acid solution, the relationship between the temperature, conductivity, and ultrasonic wave propagation speed and the concentrations of hydrochloric acid and aluminum ions was determined. Concentrated hydrochloric acid having a concentration of 35% and water were added from the circulation tank to the inside of the electrolytic cell main body so that the sound wave propagation velocity became a predetermined value, and the excess hydrochloric acid aqueous solution was kept constant by overflowing. Next, an alkali solution containing 5% and 0.5% of sodium hydroxide and aluminum ions, respectively, and having a solution temperature of 45 ° C. was used as a treatment liquid. It was 1 g / m ^2, and the surface so the amount of dissolution of the surface on the opposite side is the 0.05 g / m ^2, was subjected to etching treatment. A liquid temperature of 50 ° C. containing 300 g / l and 5 g / l of sulfuric acid and aluminum ions on both sides of the etched aluminum plate, respectively.
Was subjected to desmut treatment by spraying an aqueous sulfuric acid solution.

<Manufacture of Substrate> The aluminum plate thus subjected to the surface roughening treatment was subjected to a sulfuric acid concentration of 170 g / l (containing 0.5% of aluminum ions), a liquid temperature of 30 ° C., and a current density of 5 A.
Anodizing treatment was performed at 70 / dm ^{2 for} 70 seconds, followed by washing with water. The amount of the anodized film was 3.5 g / m ² . Then, p
H13 was immersed in an aqueous solution of sodium hydroxide at a liquid temperature of 30 ° C. for 30 seconds, and then washed with water. Next, the substrate was immersed in 2.5% No. 3 sodium silicate at 25 ° C. for 14 seconds and washed with water to produce a substrate. The roughened shape of the aluminum substrate obtained in the above production example, the physical properties of the hydrophilic film, and the like are shown together with the measurement methods.

<Method of Measuring Average Opening Diameter of Large Waviness, Average Opening Diameter of Small Pits, and Ratio of Average Depth of Small Pits to Average Opening Diameter of Small Pits> For each value, an SEM photograph of the aluminum substrate surface was taken. Measured. For an average opening diameter d2 (μm) of a large undulation, a SEM of 1000 times
Using the photograph, the major axis and minor axis of each undulation whose contour can be clearly distinguished are measured, and the average is defined as the undulation aperture diameter, and the sum of the large undulation aperture diameters measured in the SEM photograph is measured. Divided by the number of large undulations of 50.
The SEM used was T-20 manufactured by JEOL Ltd. Measurement of the average opening diameter d1 (μm) of the small pit is 3000 times SE
Using an M photograph, the same procedure was used as in the case of a large swell opening diameter. The SEM used in this case was Hitachi S
-900. The ratio h / d1 between the average depth h (μm) of the small pits and the average opening diameter d1 (μm) of the small pits is as follows:
It measured using the SEM photograph of 30,000 times of a cross section, and used the average value of the measured 50 places.

The values of the above production examples are as follows: Average opening diameter of large undulations: 17 μm Average opening diameter of small pits: 0.05 μm Ratio of average depth of small pits to average opening diameter of small pits:
0.20.

(Examples 31 and 32) On the substrate thus obtained, in the same manner as in Examples 27 and 29,
Each of the lithographic printing plate precursors was prepared and subjected to plate making.
1, 32 planographic printing plates were obtained. The obtained plate was attached to a plate cylinder of a printing machine SOR-M manufactured by Heidelberg, and after supplying dampening water, ink was supplied, and paper was further supplied to perform printing. Next, the printing press was stopped, and the printing plate was left at room temperature for 1 hour with the printing plate attached to the printing cylinder, and then printing was resumed. After restarting, the number of print sheets required until a good printed product without stains was obtained was eight in Example 31 and ten in Example 32, which was sufficiently small.

[0261]

According to the lithographic printing plate precursor of the present invention, since a specific fluorine-containing polymer is contained in the image forming layer, it is possible to coat a photosensitive layer having excellent uniformity without causing a production failure due to foaming or the like. Thus, the surface of the image portion is sufficiently hydrophobic, and excellent characteristics such as excellent developer resistance, inking property, and printing durability, and excellent removability of the non-image portion can be provided. The positive working lithographic printing plate precursor according to one embodiment of the present invention shows satisfactory image forming properties without lowering the sensitivity of the non-image area, and has a wide range of satisfactory development tolerance. . In addition, the negative type lithographic printing plate precursor was satisfactory in that the image portion had good developer resistance.

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Akira Nishioka 4,000 Kawajiri, Yoshida-cho, Haibara-gun, Shizuoka Pref. EA04 4J027 AC02 AC03 BA07 CD01 CD10

Claims (2)

[Claims] 1. A lithographic printing plate precursor having an image-forming layer containing a fluoroaliphatic group-containing copolymer on a support, wherein the fluoroaliphatic group-containing copolymer is represented by the following (i):
A lithographic printing plate precursor comprising: a repeating unit corresponding to the monomer of (1) and a repeating unit corresponding to the monomer of (ii) below. (I) a fluoroaliphatic group-containing monomer represented by the following general formula [1] (ii) poly (oxyalkylene) acrylate and / or poly (oxyalkylene) methacrylate general formula [1] (In the general formula [1], R ₁ represents a hydrogen atom or a methyl group, and X represents an oxygen atom, a sulfur atom, or —N (R ₂ )
Represents m, m represents an integer of 1 to 6, and n represents an integer of 2 or 3. R ₂ represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. ) 2. A lithographic printing plate precursor having an image-forming layer containing a fluoroaliphatic group-containing copolymer on a support, wherein the fluoroaliphatic group-containing copolymer comprises the following (i):
A lithographic printing plate precursor comprising: a repeating unit corresponding to the monomer of the following (ii), a repeating unit corresponding to the monomer of the following (ii), and a repeating unit corresponding to the monomer of the following (iii): (I) a fluoroaliphatic group-containing monomer represented by the general formula [1] according to claim 1 (ii) poly (oxyalkylene) acrylate and / or poly (oxyalkylene) methacrylate (iii) the above (i) and A monomer represented by the following general formula [2] copolymerizable with (ii): General formula [2] (In the general formula [2], R ₃ represents a hydrogen atom or a methyl group, Y represents a divalent linking group, R ₄ is 20 or less linear having 4 or more carbon atoms which may have a substituent, Represents a branched or cyclic alkyl group.)