JP2002241473A - Thermosetting epoxy resin composition and its molding and multilayer printed wiring board - Google Patents

Thermosetting epoxy resin composition and its molding and multilayer printed wiring board

Info

Publication number
JP2002241473A
JP2002241473A JP2001040572A JP2001040572A JP2002241473A JP 2002241473 A JP2002241473 A JP 2002241473A JP 2001040572 A JP2001040572 A JP 2001040572A JP 2001040572 A JP2001040572 A JP 2001040572A JP 2002241473 A JP2002241473 A JP 2002241473A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
thermosetting epoxy
wiring board
composition according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001040572A
Other languages
Japanese (ja)
Inventor
Norio Kimura
紀雄 木村
Yasukazu Watanabe
靖一 渡辺
Koshin Nakai
弘進 中居
Naoki Yoneda
直樹 米田
Naoko Ota
尚子 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Holdings Co Ltd
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Priority to JP2001040572A priority Critical patent/JP2002241473A/en
Priority to KR1020020007082A priority patent/KR100776725B1/en
Priority to CNB021206384A priority patent/CN1289600C/en
Priority to TW091102614A priority patent/TWI237036B/en
Publication of JP2002241473A publication Critical patent/JP2002241473A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1433Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1488Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing phosphorus
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • C08G59/621Phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/49Phosphorus-containing compounds
    • C08K5/51Phosphorus bound to oxygen
    • C08K5/53Phosphorus bound to oxygen bound to oxygen and to carbon only
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/63Additives non-macromolecular organic
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Epoxy Resins (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a thermosetting epoxy resin composition satisfying heat resistance, electrical insulating characteristic, and at the same time adhesion strength of a conductive layer on a built-up multilayer printed wiring board, and also excellent in storage stability, its molding, and a build-up multilayer printed wiring board made therefrom and capable of complying to high density. SOLUTION: This thermosetting epoxy resin composition contains (A) an epoxy resin having at least two epoxy groups in a molecule, (B) a curing agent having a phenolic hydroxyl group, and (C) an imidazole compound having a hydroxyl group as a curing accelerator.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、特にビルドアップ
多層プリント配線板において、耐熱性や電気絶縁特性、
ならびに導体層の接着強度を同時に満足し得る熱硬化性
エポキシ樹脂組成物とその成形体、およびこれらを用い
て作製した高密度化に対応できるビルドアップ多層プリ
ント配線板に関するものである。
BACKGROUND OF THE INVENTION The present invention relates to a heat-resistant or electrical insulating property, particularly for a build-up multilayer printed wiring board.
The present invention also relates to a thermosetting epoxy resin composition and a molded product thereof that can simultaneously satisfy the adhesive strength of a conductor layer, and a build-up multilayer printed wiring board that can be manufactured at a high density by using the same.

【0002】[0002]

【従来の技術】従来から、電子機器用の多層プリント配
線板としては、ガラス布等の基材にエポキシ樹脂とジシ
アンジアミドを含浸して乾燥させてなるプリプレグを、
所定枚数重ね合わせ、さらに必要に応じて銅箔などの金
属箔をその片側または両側に積層し、高温(180℃前
後)で数時間真空プレスを行い作製する、銅張積層板が
用いられている。
2. Description of the Related Art Conventionally, as a multilayer printed wiring board for electronic equipment, a prepreg obtained by impregnating a base material such as a glass cloth with an epoxy resin and dicyandiamide and drying the substrate is used.
A copper-clad laminate is used in which a predetermined number of sheets are laminated, and if necessary, a metal foil such as a copper foil is laminated on one or both sides thereof and vacuum-pressed at a high temperature (about 180 ° C.) for several hours to produce. .

【0003】確かに、このようなエポキシ樹脂とジシア
ンジアミドからなる熱硬化性組成物を含浸してなるプリ
プレグを用いる銅張積層板は、耐熱性や耐湿性、耐クラ
ック性、加工性等のプリント配線板に必要な要求特性を
有している。ところが、近年の多層プリント配線板で
は、高密度実装や高集積化、電気配線の高密度化、軽薄
短小化などが求められており、銅張積層板ではかかる要
求への対応が難しいのが実情である。
[0003] Certainly, a copper-clad laminate using a prepreg impregnated with a thermosetting composition comprising such an epoxy resin and dicyandiamide is required to provide printed wiring having heat resistance, moisture resistance, crack resistance, workability and the like. Has the required characteristics required for the board. However, in recent years, multilayer printed wiring boards require high-density mounting, high integration, high-density electrical wiring, lightness, and shortness, and it is difficult for copper-clad laminates to respond to such demands. It is.

【0004】これに対し最近、導体回路層と層間絶縁層
とを交互に積み上げたビルドアップ方式の多層プリント
配線板が注目を集めている。このビルドアップ多層プリ
ント配線板は、層間絶縁層として、プリプレグの代わり
にエポキシ樹脂に硬化剤やフィラーなどを混合した樹脂
組成物を用いたものであり、かかる層間絶縁層の形成方
法としては、スクリーン印刷法、ロールコーティング
法、樹脂フィルムによるラミネート法などが挙げられ
る。さらに最近では、銅箔上にあらかじめ樹脂を塗布し
半硬化状態にした樹脂付きの銅箔を用いてビルドアップ
する多層プリント配線板も採用されてきている。しかし
ながら、このようなビルドアップ多層プリント配線板
は、製造工程上、高温(180℃前後)での真空プレス
が不可能なため、エポキシ樹脂とジシアンジアミドから
なる熱硬化性組成物では反応が遅く使用できない。
On the other hand, recently, a build-up type multilayer printed wiring board in which conductive circuit layers and interlayer insulating layers are alternately stacked has attracted attention. This build-up multilayer printed wiring board uses, as an interlayer insulating layer, a resin composition in which a curing agent or a filler is mixed with epoxy resin instead of prepreg. A printing method, a roll coating method, a lamination method using a resin film, and the like can be given. More recently, a multilayer printed wiring board has been adopted in which a resin is applied in advance on a copper foil to make a semi-cured state and the resin is used to build up the copper foil. However, such a build-up multilayer printed wiring board cannot be used with a thermosetting composition composed of an epoxy resin and dicyandiamide because it cannot be vacuum-pressed at a high temperature (around 180 ° C.) due to the manufacturing process. .

【0005】これに対し、エポキシ樹脂にジシアンジア
ミドとイミダゾール化合物とからなる低温速硬化性の硬
化剤系を用いる組成物が提案されている。しかしなが
ら、かかる硬化剤系では、イミダゾール化合物がジシア
ンジアミドを分解し急激にエポキシ樹脂と反応する。そ
のため、層間絶縁樹脂の表面粗化性が安定せず導体との
ピール強度確保が不安定になり、耐熱性試験において剥
がれ等が発生するといった問題点があった。また、この
ような低温で硬化速度の速い硬化剤系の組成物は、保存
安定性が悪い。そのため、フィルムや樹脂付き銅箔等の
使用形態で用いる樹脂組成物では、1液での保存安定性
も必要となり、その点で問題となっている。
On the other hand, there has been proposed a composition using a low-temperature and fast-curing curing agent system comprising dicyandiamide and an imidazole compound as an epoxy resin. However, in such a curing agent system, the imidazole compound decomposes dicyandiamide and rapidly reacts with the epoxy resin. For this reason, there is a problem that the surface roughness of the interlayer insulating resin is not stable, the peel strength with the conductor is not secured, and peeling or the like occurs in a heat resistance test. Further, such a curing agent-based composition having a high curing rate at a low temperature has poor storage stability. Therefore, a resin composition used in a use form such as a film or a copper foil with a resin also requires storage stability in one solution, which is a problem in that respect.

【0006】[0006]

【発明が解決しようとする課題】本発明は、上述したよ
うな従来技術が抱える問題を解消するためになされたも
のであり、その主たる目的は、ビルドアップ多層プリン
ト配線板において、耐熱性や電気絶縁特性、ならびに導
体層の接着強度を同時に満足し、しかも保存安定性に優
れる熱硬化性エポキシ樹脂組成物とその成形体、および
こららを用いて作製した高密度化に対応できるビルドア
ップ多層プリント配線板を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems of the prior art, and its main purpose is to provide a heat-resistant and electric-power-resistant multi-layer printed wiring board. A thermosetting epoxy resin composition and its molded product that simultaneously satisfy the insulation properties and adhesive strength of the conductor layer and have excellent storage stability, and a build-up multilayer print that can be used for high-density production using these materials. It is to provide a wiring board.

【0007】[0007]

【課題を解決するための手段】発明者らは、上記目的を
実現するために鋭意研究した結果、下記内容を要旨構成
とする発明を完成するに至った。すなわち、本発明の熱
硬化性エポキシ樹脂組成物は、(A)1分子内に2個以上
のエポキシ基を有するエポキシ樹脂、(B)フェノール
性水酸基を有する硬化剤、および(C)硬化促進剤とし
て水酸基を有するイミダゾール化合物を含むことを特徴
とする。
Means for Solving the Problems The inventors of the present invention have conducted intensive studies to achieve the above object, and as a result, have completed the invention having the following features. That is, the thermosetting epoxy resin composition of the present invention comprises (A) an epoxy resin having two or more epoxy groups in one molecule, (B) a curing agent having a phenolic hydroxyl group, and (C) a curing accelerator. As an imidazole compound having a hydroxyl group.

【0008】また、好適な態様によれば、本発明の樹脂
組成物は、前記エポキシ樹脂(A)が、1分子内に1個
以上のエポキシ基を有するエポキシ樹脂に予め10−
(2,5−ジヒドロキシフェニル)−10H−オキサ−
フォスフェナンスレン=10−オキシドを反応させてな
るリン含有エポキシ樹脂を含むことが好ましく、そのリ
ン含有量は1〜5重量%であることがより好適である。
[0008] According to a preferred embodiment, the resin composition of the present invention is characterized in that the epoxy resin (A) is previously prepared by adding 10- to an epoxy resin having one or more epoxy groups in one molecule.
(2,5-dihydroxyphenyl) -10H-oxa-
It preferably contains a phosphorus-containing epoxy resin obtained by reacting phosphenanthrene = 10-oxide, and more preferably the phosphorus content is 1 to 5% by weight.

【0009】他の好適な態様によれば、本発明に樹脂組
成物は、前記硬化剤(B)が、10−(2,5−ジヒド
ロキシフェニル)−10H−オキサ−フォスフェナンス
レン=10−オキシドを含むことが好ましい。
According to another preferred embodiment, the resin composition according to the present invention is characterized in that the curing agent (B) is 10- (2,5-dihydroxyphenyl) -10H-oxa-phosphenanthrene = 10- Preferably, it contains an oxide.

【0010】さらに他の好適な態様によれば、本発明の
樹脂組成物は、平均粒子径が5μm以下の無機または有
機充填材を含むことが好ましく、その含有量は、組成物
の固形分に対して内枠量で40重量%以下であることが
より好適である。
According to still another preferred embodiment, the resin composition of the present invention preferably contains an inorganic or organic filler having an average particle diameter of 5 μm or less, and its content is determined by the solid content of the composition. On the other hand, the inner frame amount is more preferably 40% by weight or less.

【0011】このような熱硬化性エポキシ樹脂組成物は
1液化が可能であり、この樹脂組成物を用いた本発明の
成形体は、上述した熱硬化性エポキシ樹脂組成物を支持
フィルム上に塗布乾燥し、フィルム化したもの、または
上述した熱硬化性エポキシ樹脂組成物を支持銅箔上に塗
布乾燥し、樹脂付き銅箔としたものである。また、本発
明の多層プリント配線板は、上述したような熱硬化性エ
ポキシ樹脂組成物または成形体を使用して作製したもの
である。
Such a thermosetting epoxy resin composition can be made into one liquid, and the molded article of the present invention using this resin composition is obtained by coating the above-mentioned thermosetting epoxy resin composition on a support film. It is dried and formed into a film, or the above-mentioned thermosetting epoxy resin composition is coated on a supporting copper foil and dried to obtain a resin-coated copper foil. Further, the multilayer printed wiring board of the present invention is produced using the above-mentioned thermosetting epoxy resin composition or molded article.

【0012】[0012]

【発明の実施の形態】本発明の熱硬化性エポキシ樹脂組
成物は、硬化剤としてフェノール性水酸基を有する化合
物を含み、硬化促進剤として水酸基を有するイミダゾー
ル化合物を含む点に特徴がある。これにより、エポキシ
樹脂の硬化反応が急激に進むことが無く応力の発生を防
止できるので、種々の特性のばらつきが少なく安定した
層間絶縁層を形成することができる。しかも、硬化され
た層間絶縁層表面は、均一な粗化が短時間で可能とな
り、導体との安定したピール強度を確保でき、耐熱性試
験においても剥がれ等を招くことはない。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The thermosetting epoxy resin composition of the present invention is characterized in that it contains a compound having a phenolic hydroxyl group as a curing agent and an imidazole compound having a hydroxyl group as a curing accelerator. Thus, the generation of stress can be prevented without the curing reaction of the epoxy resin proceeding rapidly, so that a stable interlayer insulating layer with little variation in various characteristics can be formed. Moreover, the surface of the cured interlayer insulating layer can be uniformly roughened in a short time, a stable peel strength with the conductor can be secured, and peeling does not occur even in a heat resistance test.

【0013】また、配線板の製造においては、通常、内
部ストレス緩和のためにアニール処理が行われる。その
際、ジシアンジアミドとイミダゾール化合物とからなる
低温速硬化性の硬化剤系では、アニールによる過硬化で
密着強度の低下を招く。その点、本発明の硬化剤系によ
れば、アニールによる密着強度の低下はなく、密着性向
上に効果がある。さらに、本発明の硬化剤系によれば、
エポキシ樹脂の硬化反応が急激に進むことが無いので、
熱硬化性エポキシ樹脂組成物は、1液化が可能となり保
存安定性に優れ、フィルムまたは樹脂付銅箔の形態にし
ても、保存中に反応が進むことなく安定した配線板の製
造条件を設定することができる。
In the manufacture of a wiring board, an annealing process is usually performed to alleviate internal stress. At that time, in a low-temperature and fast-curing curing agent system composed of dicyandiamide and an imidazole compound, over-curing due to annealing lowers the adhesion strength. In this regard, according to the curing agent system of the present invention, there is no decrease in adhesion strength due to annealing, which is effective in improving adhesion. Furthermore, according to the curing agent system of the present invention,
Since the curing reaction of the epoxy resin does not proceed rapidly,
The thermosetting epoxy resin composition can be made into one liquid and has excellent storage stability, and even in the form of a film or a copper foil with a resin, sets stable production conditions for a wiring board without any reaction during storage. be able to.

【0014】以下、本発明の熱硬化性エポキシ樹脂組成
物の各構成成分について詳しく説明する。まず、1分子
内に2個以上のエポキシ基を有するエポキシ樹脂(A)
としては、ビスフェノールA型エポキシ樹脂(例えば、
ジャパンエポキシレジン(株)製エピコート828、大
日本インキ化学(株)製エピクロン1050)、ビスフ
ェノールA型ノボラックエポキシ樹脂、ビスフェノール
F型エポキシ樹脂、(例えば、大日本インキ化学(株)
製エピクロン830、東都化成(株)製YDF−200
1)、ビスフェノールS型エポキシ樹脂(例えば、大日
本インキ化学(株)製エピクロンEXA−1514)、
フェノールノボラック型エポキシ樹脂(例えば、ジャパ
ンエポキシレジン(株)製エピコート152、15
4)、クレゾールノボラック型エポキシ樹脂(例えば、
大日本インキ化学(株)製エピクロンN−660、N−
673、N−695)、ビフェニル型エポキシ樹脂(例
えば、ジャパンエポキシレジン(株)製エピコートYX
−4000)ナフタレン型エポキシ樹脂(例えば、大日
本インキ化学(株)製HP−4032)、ジシクロペン
タジエン型エポキシ樹脂(例えば、大日本インキ化学
(株)製HP−7200)、N−グリシジル型エポキシ
樹脂、脂環式エポキシ樹脂等のエポキシ樹脂、トリグリ
シジルイソシアヌレート、ウレタン変性エポキシ樹脂、
ゴム変性エポキシ樹脂(例えば、日本曹達(株) BF
−1000、出光石油化学(株) Poly bdR−
45EPI、東都化成(株) YR−450、ダイセル
化学工業(株)エポリードPB−3600、PB−47
00など)、前記エポキシ樹脂に臭素やリン化合物を付
加した物など公知のエポキシ樹脂が使用できるが、これ
らに限定されるものではなく、また数種類を同時に用い
ても差し支えない。
Hereinafter, each component of the thermosetting epoxy resin composition of the present invention will be described in detail. First, an epoxy resin (A) having two or more epoxy groups in one molecule
As a bisphenol A type epoxy resin (for example,
Epicoat 828 manufactured by Japan Epoxy Resin Co., Ltd., Epicron 1050 manufactured by Dainippon Ink and Chemicals, Inc., bisphenol A type novolak epoxy resin, bisphenol F type epoxy resin (for example, Dainippon Ink and Chemicals, Inc.)
Epicron 830, manufactured by Toto Kasei Co., Ltd. YDF-200
1), bisphenol S type epoxy resin (for example, Epicron EXA-1514 manufactured by Dainippon Ink and Chemicals, Inc.),
Phenol novolak type epoxy resin (for example, Epicoat 152, 15 manufactured by Japan Epoxy Resin Co., Ltd.)
4), cresol novolak type epoxy resin (for example,
Epicron N-660, N- manufactured by Dainippon Ink and Chemicals, Inc.
673, N-695), biphenyl type epoxy resin (for example, Epicoat YX manufactured by Japan Epoxy Resin Co., Ltd.)
-4000) naphthalene type epoxy resin (for example, HP-4032 manufactured by Dainippon Ink and Chemicals, Inc.), dicyclopentadiene type epoxy resin (for example, HP-7200 manufactured by Dainippon Ink and Chemicals, Inc.), N-glycidyl type epoxy Resin, epoxy resin such as alicyclic epoxy resin, triglycidyl isocyanurate, urethane-modified epoxy resin,
Rubber-modified epoxy resin (eg, Nippon Soda Co., Ltd. BF
-1000, Idemitsu Petrochemical Co., Ltd. Poly bdR-
45EPI, Toto Kasei Co., Ltd. YR-450, Daicel Chemical Industries, Ltd. Eporide PB-3600, PB-47
00), known epoxy resins such as those obtained by adding a bromine or phosphorus compound to the epoxy resin can be used, but the present invention is not limited thereto, and several types may be used at the same time.

【0015】フェノール性水酸基を有する硬化剤(B)
としては、フェノールノボラック樹脂(例えば、明和化
成 H−1)、アラルキルフェノール樹脂(例えば、三
井化学 XL225)、テルペンフェノール樹脂(例え
ば、ジャパンエポキシレジン(株) エピュアMP40
2)、ナフトール変性フェノール樹脂(例えば、日本化
薬(株) カヤキュアNHN)、ジシクロペンタジエン
変性フェノール樹脂(例えば、日本石油化学工業(株)
DDP−M)、ビスフェノールA型ノボラックフェノ
ール樹脂(例えば、明和化成(株) BPA−D)、ア
ミノトリアジンノボラック樹脂(例えば、大日本インキ
化学工業(株) ATN樹脂)などの公知のフェノール
樹脂が使用できるが、これらに限定されるものではな
い。フェノール性水酸基含有環状リン含有化合物として
は10−(2,5−ジヒドロキシフェニル)−10H−
オキサ−フォスフェナンスレン=10−オキシド(例え
ば、三光株式会社製 HCA-HQ)が使用できる。これらフ
ェノール性水酸基を有する硬化剤は数種類を同時に用い
ても差し支えない。
A curing agent having a phenolic hydroxyl group (B)
Examples thereof include a phenol novolak resin (for example, Meiwa Kasei H-1), an aralkylphenol resin (for example, Mitsui Chemicals XL225), and a terpene phenol resin (for example, Japan Epoxy Resin Co., Ltd. Epure MP40)
2), naphthol-modified phenolic resin (for example, Nippon Kayaku Co., Ltd. Kayacure NHN), dicyclopentadiene-modified phenolic resin (for example, Nippon Petrochemical Industries, Ltd.)
Known phenolic resins such as DDP-M), bisphenol A type novolak phenolic resin (for example, Meiwa Kasei Co., Ltd. BPA-D), and aminotriazine novolak resin (for example, ATN resin of Dainippon Ink and Chemicals, Inc.) are used. It is possible, but not limited to these. Examples of the phenolic hydroxyl group-containing cyclic phosphorus-containing compound include 10- (2,5-dihydroxyphenyl) -10H-
Oxa-phosphenanthrene = 10-oxide (for example, HCA-HQ manufactured by Sanko Corporation) can be used. Several kinds of these phenolic hydroxyl group-containing curing agents may be used at the same time.

【0016】この硬化剤(B)成分の使用量は、(A)
成分に使用するエポキシ樹脂中のエポキシ基1.0モル
に対してフェノール性樹脂の水酸基が0.2〜1.3モ
ルの範囲であることが望ましい。この理由は、0.2モ
ル未満の添加量では未反応のエポキシ基が多く耐熱性が
低下し、1.3モルを超える添加量では未反応の水酸基
が多く残存し、絶縁性の低下などを招き好ましくない。
The amount of the curing agent (B) used is (A)
It is desirable that the hydroxyl group of the phenolic resin is in the range of 0.2 to 1.3 mol per 1.0 mol of the epoxy group in the epoxy resin used as the component. The reason for this is that if the amount added is less than 0.2 mol, there are many unreacted epoxy groups and the heat resistance is reduced. If the amount added is more than 1.3 mol, many unreacted hydroxyl groups remain and the insulation properties are reduced. Inviting is not preferred.

【0017】硬化促進剤としての水酸基を有するイミダ
ゾール化合物(C)の具体例としては、2−フェニル−
4,5−ジヒドロキシ−メチルイミダゾール(例:四国
化成工業 2PHZ)、2−フェニル−4−メチル5−
ヒドロキシ−メチルイミダゾール(例:四国化成工業
2P4MHZ)、2−メチル−4、5−ジヒドロキシ−
メチルイミダゾール(例:四国化成工業 2MHZ)、
2−エチル−4、5−ジヒドロキシ−メチルイミダゾー
ル(例:四国化成工業 2EHZ)、2−イソプロピル
−4、5−ジヒドロキシ−メチルイミダゾール(例:四
国化成工業 2IHZ)、2−n−ブチル−4、5−ジ
ヒドロキシ−メチルイミダゾール(例:四国化成工業
2BuHZ)、2−ウンデシル−4、5−ジヒドロキシ
−メチルイミダゾール(例:四国化成工業 C11H
Z)などが挙げられる。なかでも、2−フェニル−4,
5−ジヒドロキシ−メチルイミダゾール(例:四国化成
工業2PHZ)、2−フェニル−4−メチル5−ヒドロ
キシ−メチルイミダゾール(例:四国化成工業 2P4
MHZ)が好ましい。これらの硬化促進剤は、単独ある
いは2種以上を組み合わせて使用することができる。
Specific examples of the imidazole compound (C) having a hydroxyl group as a curing accelerator include 2-phenyl-
4,5-dihydroxy-methylimidazole (eg, Shikoku Chemicals 2PHZ), 2-phenyl-4-methyl 5-
Hydroxy-methylimidazole (eg, Shikoku Chemicals
2P4MHZ), 2-methyl-4,5-dihydroxy-
Methyl imidazole (eg, Shikoku Chemicals 2MHZ),
2-ethyl-4,5-dihydroxy-methylimidazole (eg, Shikoku Chemicals 2EHZ), 2-isopropyl-4,5-dihydroxy-methylimidazole (eg, Shikoku Chemicals 2IHZ), 2-n-butyl-4, 5-dihydroxy-methylimidazole (eg, Shikoku Chemicals
2BuHZ), 2-undecyl-4,5-dihydroxy-methylimidazole (Example: Shikoku Chemical Industry C11H
Z) and the like. Among them, 2-phenyl-4,
5-dihydroxy-methylimidazole (eg, Shikoku Chemicals 2PHZ), 2-phenyl-4-methyl 5-hydroxy-methylimidazole (eg, Shikoku Chemicals 2P4)
MHZ) is preferred. These curing accelerators can be used alone or in combination of two or more.

【0018】この硬化促進剤(C)成分の添加量は、
(A)成分を構成するエポキシ樹脂に対して0.5〜1
0重量%の範囲とすることが好ましい。この理由は、
0.5重量%より少ないとエポキシ樹脂の硬化不足とな
り、一方、10重量%を超えると硬化しすぎて脆くなり
好ましくない。
The amount of the curing accelerator (C) added is
(A) 0.5 to 1 with respect to the epoxy resin constituting the component
It is preferred to be in the range of 0% by weight. The reason for this is
If the amount is less than 0.5% by weight, the epoxy resin is insufficiently cured, while if it exceeds 10% by weight, the epoxy resin is excessively cured and becomes brittle.

【0019】このような本発明の熱硬化性エポキシ樹脂
組成物には、必要に応じて、平均粒子径が5μm以下の
無機または有機充填材を配合することができ、その含有
量は40重量%以下、より好ましくは30重量%以下と
することが望ましい。この充填剤の添加により、レーザ
ー穴開け性に優れた熱硬化性エポキシ樹脂組成物やその
成形体を得ることができる。この無機または有機充填材
は、平均粒子径が5μmを超えると粗化形状が安定せ
ず、含有量が樹脂組成物中40重量%を超えると、CO
2レーザーの小径ビア形状が悪くなり、めっきの付き回
り性が悪く接続信頼性に問題が生じるし、またレーザー
加工速度を落とすなど生産性からも好ましくない。
If necessary, the thermosetting epoxy resin composition of the present invention may contain an inorganic or organic filler having an average particle diameter of 5 μm or less, and the content thereof is 40% by weight. Or less, more preferably 30% by weight or less. By adding this filler, a thermosetting epoxy resin composition having excellent laser drilling properties and a molded article thereof can be obtained. If the average particle diameter of the inorganic or organic filler exceeds 5 μm, the roughened shape is not stable, and if the content exceeds 40% by weight in the resin composition, CO
(2) The shape of the small-diameter via of the laser is deteriorated, the throwing power of the plating is poor, and there is a problem in connection reliability. In addition, it is not preferable from the viewpoint of productivity such as lowering the laser processing speed.

【0020】無機充填材としては、例えば、硫酸バリウ
ムや炭酸カルシウム、炭酸マグネシウム、酸化マグネシ
ウム、水酸化アルミニウム、水酸化マグネシウム、チタ
ン酸バリウム、酸化ケイ素粉、球状シリカ、無定形シリ
カ、タルク、クレー、雲母粉などを用いることができ
る。また有機充填材としては、例えば、シリコンパウダ
ーや、ナイロンパウダー、フッ素パウダー、ウレタンパ
ウダー、予め硬化したエポキシ樹脂の粉体、架橋アクリ
ルポリマー微粒子、メラミン樹脂、グアナミン樹脂、尿
素樹脂、これらのアミノ樹脂を熱硬化させた後微粉砕し
たものなどが挙げられる。なお、無機または有機充填材
は、これらに限定されるものではなく、また数種類を同
時に用いても差し支えない。
Examples of the inorganic filler include barium sulfate, calcium carbonate, magnesium carbonate, magnesium oxide, aluminum hydroxide, magnesium hydroxide, barium titanate, silicon oxide powder, spherical silica, amorphous silica, talc, clay, Mica powder or the like can be used. Examples of the organic filler include, for example, silicon powder, nylon powder, fluorine powder, urethane powder, precured epoxy resin powder, crosslinked acrylic polymer fine particles, melamine resin, guanamine resin, urea resin, and these amino resins. Heat-cured and then finely pulverized. The inorganic or organic filler is not limited to these, and several kinds may be used at the same time.

【0021】さらに本発明の樹脂組成物では、必要に応
じて、赤リンや三酸化アンチモン、五酸化アンチモン等
の難燃助剤、オルベンやベントン等の増粘剤、シリコー
ン系やフッ素系、高分子系の消泡剤及び/又はレベリン
グ剤、イミダゾール系やチアゾール系、トリアゾール
系、シランカップリング剤等の密着性付与剤のような添
加剤を使用することができる。さらに必要に応じて、フ
タロシアニン・ブルー、フタロシアニン・グリーン、ア
イオジン・グリーン、ジスアゾイエロー、酸化チタン、
カーボンブラック、染料等の公知公用の色剤を用いるこ
とができる。なお、このような添加剤においても、固形
状のものについては、上述した理由から平均粒子径を5
μm以下とすることが望ましい。
Further, in the resin composition of the present invention, if necessary, a flame retardant aid such as red phosphorus, antimony trioxide and antimony pentoxide, a thickener such as orben or benton, a silicone-based or fluorine-based, Additives such as molecular defoaming agents and / or leveling agents, and adhesion-imparting agents such as imidazole, thiazole, triazole and silane coupling agents can be used. Further, if necessary, phthalocyanine blue, phthalocyanine green, iodine green, disazo yellow, titanium oxide,
Known and commonly used coloring agents such as carbon black and dyes can be used. In addition, even in such an additive, the average particle diameter of the solid-state additive is 5% for the reason described above.
It is desirable that the thickness be not more than μm.

【0022】さらに本発明の樹脂組成物は、各種塗布工
程に合わせ有機溶剤を用いて稀釈することができる。有
機溶剤としては、例えばアセトン、メチルエチルケト
ン、シクロヘキサノン等のケトン類、酢酸エチル、酢酸
ブチル、セロソルブアセテート、プロピレングリコール
モノメチルエーテルアセテート、カルビトールアセテー
ト等の酢酸エステル類、セロソルブ、ブチルセロソルブ
等のセロソルブ類、カルビトール、ブチルカルビトール
等のカルビトール類、トルエン、キシレン等の芳香族炭
化水素の他、ジメチルホルムアミド、ジメチルアセトア
ミド、N−メチルピロリドンなどを単独又は2種以上組
み合わせて使用することができる。
Further, the resin composition of the present invention can be diluted with an organic solvent in accordance with various coating steps. Examples of the organic solvent include ketones such as acetone, methyl ethyl ketone and cyclohexanone, ethyl acetate, butyl acetate, cellosolve acetate, acetic acid esters such as propylene glycol monomethyl ether acetate and carbitol acetate, cellosolves such as cellosolve and butyl cellosolve, and carbitol. And carbitols such as butyl carbitol, aromatic hydrocarbons such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like can be used alone or in combination of two or more.

【0023】次に、本発明の熱硬化性エポキシ樹脂組成
物またはその成形体を用いた多層プリント配線板につい
て説明する。 (1)熱硬化性エポキシ樹脂組成物による層間絶縁層の
形成 まず、本発明の熱硬化性エポキシ樹脂組成物を、内層導
体回路を形成した絶縁基材上にスクリーン印刷、カーテ
ンコート、ロールコート、スプレーコートなど公知の方
法を用いて塗布し、乾燥する。このときの乾燥条件は使
用する溶剤により異なるが60〜150℃で5〜60分
の範囲で選択される。次いで、乾燥後、必要に応じて熱
硬化を行い、層間絶縁層を形成する。このときの熱硬化
条件は130℃〜200℃で15〜90分の範囲で選択
される。
Next, a multilayer printed wiring board using the thermosetting epoxy resin composition of the present invention or a molded article thereof will be described. (1) Formation of Interlayer Insulating Layer from Thermosetting Epoxy Resin Composition First, the thermosetting epoxy resin composition of the present invention is screen-printed, curtain-coated, roll-coated on an insulating substrate on which an inner conductor circuit is formed, It is applied using a known method such as spray coating, and dried. The drying conditions at this time vary depending on the solvent used, but are selected in the range of 60 to 150 ° C. for 5 to 60 minutes. Next, after drying, thermal curing is performed as needed to form an interlayer insulating layer. The thermosetting condition at this time is selected from 130 ° C. to 200 ° C. in the range of 15 to 90 minutes.

【0024】(2)熱硬化性エポキシ樹脂組成物の成形
体による層間絶縁層の形成 成形体の調製 成形体を構成する樹脂組成物には、機械的強度、可とう
性を向上させる成分として本発明の樹脂組成物を構成す
る(A)成分以外に、フェノキシ樹脂、ポリアクリル樹
脂、ポリイミド樹脂、ポリアミドイミド樹脂、ポリシア
ネート樹脂、ポリエステル樹脂、ポリフェニレンエーテ
ル樹脂等を配合することができる。これらの樹脂は2種
以上を組み合わせて使用することもできる。
(2) Formation of Interlayer Insulating Layer from Molded Thermosetting Epoxy Resin Composition Preparation of Molded Body The resin composition constituting the molded body has a composition as a component for improving mechanical strength and flexibility. In addition to the component (A) constituting the resin composition of the present invention, a phenoxy resin, a polyacryl resin, a polyimide resin, a polyamideimide resin, a polycyanate resin, a polyester resin, a polyphenylene ether resin, and the like can be blended. These resins can be used in combination of two or more.

【0025】このような本発明の熱硬化性エポキシ樹脂
組成物は、所定の有機溶剤で稀釈され、フィルムコータ
ー等で支持フィルムまたは支持金属箔上に塗布し乾燥さ
れ、フィルム状の成形体または樹脂付き銅箔が作製され
る。ここで、支持フィルムとしては、ポリエチレン、ポ
リプロピレン、ポリエチレンテレフタレート等のポリエ
ステル、ポリカーボネートなどが挙げられる。支持金属
泊としては、銅箔などが挙げられる。なお、このような
支持体は、各種前処理(マッド、コロナ処理)を行って
も良く、支持体の厚さは5〜100μmが一般的であ
る。また、この成形体は、保護フィルム等にて貼着保護
され、シート状またはロール状で保管されることが望ま
しい。
Such a thermosetting epoxy resin composition of the present invention is diluted with a predetermined organic solvent, applied on a supporting film or a supporting metal foil with a film coater or the like, and dried to obtain a film-shaped molded product or resin. A coated copper foil is produced. Here, examples of the support film include polyethylene, polypropylene, polyester such as polyethylene terephthalate, and polycarbonate. Examples of the supporting metal stay include copper foil. In addition, such a support may be subjected to various pretreatments (mud, corona treatment), and the thickness of the support is generally 5 to 100 μm. Further, it is desirable that the molded article is adhered and protected by a protective film or the like, and stored in a sheet or a roll.

【0026】フィルム状成形体による層間絶縁層の形
成 まず、上述のようにして調製したフィルム状成形体を、
内層導体回路を形成した絶縁基材上に、加熱減圧下でラ
ミネートして張り合わせ、さらに加圧することにより基
板のより優れた平滑性が得られる。ラミネート条件とし
ては、温度70〜150℃、圧着圧力0.1〜1MPa
が一般的である。次いで、ラミネート後、必要に応じ熱
硬化を行い、層間絶縁層を形成する。このときの熱硬化
条件は130℃〜200℃で15〜90分の範囲で選択
される。なお、樹脂付き銅箔を用いる配線板の製法につ
いては後述する。
Formation of Interlayer Insulating Layer from Film Formed Body First, the film formed body prepared as described above is
By laminating and laminating the insulating substrate on which the inner conductor circuit is formed under heating and reduced pressure, and further applying pressure, more excellent smoothness of the substrate can be obtained. The laminating conditions are as follows: temperature 70 to 150 ° C., pressure pressure 0.1 to 1 MPa
Is common. Next, after lamination, heat curing is performed as necessary to form an interlayer insulating layer. The thermosetting condition at this time is selected from 130 ° C. to 200 ° C. in the range of 15 to 90 minutes. A method for manufacturing a wiring board using a copper foil with resin will be described later.

【0027】(3)ビルドアップ配線板の製造 まず、上述のようにして形成した層間絶縁層の所定位置
に、スルーホール及びバイアホール部をドリルまたはレ
ーザーで穴開けし、次いで、かかる絶縁層表面を粗化剤
処理して微細な凹凸を形成する。この際、必要に応じて
粗化剤処理前に接着性を安定させるためバフによる物理
研磨を行っても良い。ここで、絶縁層表面の粗化方法と
しては、絶縁層が形成された基板を酸化剤等の溶液中に
浸漬するか、酸化剤等の溶液をスプレーするなどの手段
によって実施することができる。また各種プラズマ処理
などで実施することもできる。またこれらの処理は併用
して用いてもよい。なお、粗化剤の具体例としては、重
クロム酸塩、過マンガン酸塩、オゾン、過酸化水素/硫
酸、硝酸等の酸化剤、N−メチル−2−ピロリドン、
N,N−ジメチルホルムアミド、メトキシプロパノール
等の有機溶剤、また苛性ソーダ、苛性カリ等のアルカリ
性水溶液、硫酸、塩酸などの酸性水溶液を用いることが
できる。
(3) Manufacture of build-up wiring board First, through holes and via holes are drilled at predetermined positions of the interlayer insulating layer formed as described above by a drill or a laser. Is treated with a roughening agent to form fine irregularities. At this time, if necessary, physical polishing with a buff may be performed before the roughening agent treatment to stabilize the adhesiveness. The surface of the insulating layer can be roughened by immersing the substrate on which the insulating layer is formed in a solution of an oxidizing agent or the like, or by spraying a solution of the oxidizing agent or the like. Further, it can be carried out by various plasma treatments. These processes may be used in combination. Specific examples of the roughening agent include oxidizing agents such as dichromate, permanganate, ozone, hydrogen peroxide / sulfuric acid, and nitric acid, N-methyl-2-pyrrolidone,
Organic solvents such as N, N-dimethylformamide and methoxypropanol, alkaline aqueous solutions such as sodium hydroxide and potassium hydroxide, and acidic aqueous solutions such as sulfuric acid and hydrochloric acid can be used.

【0028】次いで、蒸着、スパッタリング、イオンプ
レーティング等の乾式めっき、もしくは無電解・電解め
っき等の湿式めっきにより導体層を形成し、パターンエ
ッチングにて導体回路を形成する。このようにして導体
回路を形成した基板は、必要に応じてアニール処理する
ことにより、熱硬化性樹脂の硬化が進行させ導体層のピ
ール強度をさらに向上させることができる。そしてさら
に、必要に応じてこれらの工程を数回繰り返すことによ
り、所望の多層プリント配線板を得る。
Next, a conductor layer is formed by dry plating such as vapor deposition, sputtering, or ion plating, or wet plating such as electroless or electrolytic plating, and a conductor circuit is formed by pattern etching. The substrate on which the conductor circuit is formed in this manner is subjected to an annealing treatment as necessary, whereby the curing of the thermosetting resin proceeds, and the peel strength of the conductor layer can be further improved. Then, if necessary, these steps are repeated several times to obtain a desired multilayer printed wiring board.

【0029】(3’)樹脂付き銅箔によるビルドアップ
配線板の製造 まず、上記(2)で調製した樹脂付き銅箔を、内層回路
が形成された基板上に真空プレスで積層し、所定のスル
ーホール及びバイアホール部をドリルまたはレーザーで
穴開けを行い、スルホール及びバイアホール内をデスミ
ア処理し微細な凹凸を形成する。この凹凸の形成方法
は、上述した層間絶縁層の粗化方法と同様である。
(3 ') Production of Build-up Wiring Board Using Copper Foil with Resin First, the copper foil with a resin prepared in the above (2) is laminated on a substrate on which an inner layer circuit is formed by a vacuum press. Drilling or laser drilling is performed on the through hole and the via hole, and the inside of the through hole and the via hole is desmeared to form fine irregularities. The method of forming the irregularities is the same as the method of roughening the interlayer insulating layer described above.

【0030】次いで、蒸着、スパッタリング、イオンプ
レーティング等の乾式めっき、もしくは無電解・電解め
っき等の湿式めっきにより導体層を形成し、パターンエ
ッチングにて導体回路を形成する。このようにして導体
回路を形成した基板は、必要に応じてアニール処理する
ことにより、熱硬化性樹脂の硬化が進行させ導体層のピ
ール強度をさらに向上させることができる。そしてさら
に、必要に応じてこれらの工程を数回繰り返すことによ
り、所望の多層プリント配線板を得る。
Next, a conductor layer is formed by dry plating such as vapor deposition, sputtering, or ion plating, or wet plating such as electroless or electrolytic plating, and a conductor circuit is formed by pattern etching. The substrate on which the conductor circuit is formed in this manner is subjected to an annealing treatment as necessary, whereby the curing of the thermosetting resin proceeds, and the peel strength of the conductor layer can be further improved. Then, if necessary, these steps are repeated several times to obtain a desired multilayer printed wiring board.

【0031】[0031]

【実施例】以下に、実施例及び比較例を示して本発明を
具体的に説明するが、本発明が下記実施例に限定される
ものではないことはもとよりである。 (合成例1)1Lのフラスコ中に、10−(2,5−ジ
ヒドロキシフェニル)−10H−オキサ−フォスフェナ
ンスレン=オキシド−10(三光株式会社製、以下「HC
A-HQ」という。)を324g、カルビトールアセテート
を200g、DEN431(ダウケミカル日本製)を5
25g、エピコート828(ジャパンエポキシレジン
製)を380g、トリフェニルフォスフィン1gを入
れ、150℃で100分間反応させた。生成したりん含
有エポキシ樹脂のエポキシ当量は415g/eqであ
り、リン含有率は2.5質量%であった。この樹脂をリ
ン含有樹脂Aとする。
EXAMPLES The present invention will be specifically described below with reference to examples and comparative examples, but it is needless to say that the present invention is not limited to the following examples. (Synthesis Example 1) In a 1 L flask, 10- (2,5-dihydroxyphenyl) -10H-oxa-phosphenanthrene = oxide-10 (manufactured by Sanko Co., Ltd .;
A-HQ. " ), 200 g of carbitol acetate, and 5 parts of DEN431 (manufactured by Dow Chemical Japan).
25 g, 380 g of Epicoat 828 (manufactured by Japan Epoxy Resin) and 1 g of triphenylphosphine were added, and reacted at 150 ° C. for 100 minutes. The epoxy equivalent of the produced phosphorus-containing epoxy resin was 415 g / eq, and the phosphorus content was 2.5% by mass. This resin is referred to as phosphorus-containing resin A.

【0032】(実施例1〜8、比較例1〜3)まず、各
実施例の熱硬化性エポキシ樹脂組成物を、表1に示す成
分組成(質量部)にて各成分と溶剤等をディゾルバーに
て混合し、三本ロールミルにて均一分散させた後、希釈
溶剤にて粘度調整を行い作製した。次に、こうして作製
した熱硬化性エポキシ樹脂組成物を、内層回路が形成さ
れたFR−4内層(コア厚さ0.5mm、銅箔厚さ18
μm)基板上に、スクリーン印刷にて塗布し、110
℃、20分乾燥後、150℃、30分硬化させ、層間絶
縁層を形成した。そして、層間絶縁層の所定位置にドリ
ルまたはレーザーにより穴開けを行い、アルカリ性水溶
液と溶剤の混合物にて膨潤させたのち、アルカリ性過マ
ンガン酸塩水溶液、続いて還元剤にて処理し、粗化剤処
理を行った。その後、無電解銅めっきおよび電解銅めっ
きにて銅厚35μmの導体層を形成し、さらに150
℃、60分アニール処理を行い、多層プリント配線板を
作製した。こうして作製した多層プリント配線板を評価
し、その結果を表2に示す。
(Examples 1 to 8 and Comparative Examples 1 to 3) First, the thermosetting epoxy resin composition of each example was prepared by dissolving each component and a solvent in a component composition (parts by mass) shown in Table 1. , And uniformly dispersed in a three-roll mill, and then the viscosity was adjusted with a diluting solvent to produce the mixture. Next, the thus prepared thermosetting epoxy resin composition was applied to the FR-4 inner layer (core thickness 0.5 mm, copper foil thickness 18
μm) applied on the substrate by screen printing,
After drying at 20 ° C. for 20 minutes, it was cured at 150 ° C. for 30 minutes to form an interlayer insulating layer. Then, a hole is drilled at a predetermined position of the interlayer insulating layer by a drill or a laser, swelled with a mixture of an alkaline aqueous solution and a solvent, and then treated with an alkaline permanganate aqueous solution, followed by a reducing agent, and a roughening agent. Processing was performed. Thereafter, a conductor layer having a copper thickness of 35 μm was formed by electroless copper plating and electrolytic copper plating.
Annealing was performed at 60 ° C. for 60 minutes to produce a multilayer printed wiring board. The multilayer printed wiring board thus manufactured was evaluated, and the results are shown in Table 2.

【0033】(実施例9、10)まず、各実施例の熱硬
化性エポキシ樹脂組成物を、表1に示す成分組成(質量
部)にて各成分と溶剤等をディゾルバーにて混合し、三
本ロールミルにて均一分散させた後、希釈溶剤にて粘度
調整を行い作製した。次に、こうして作製した熱硬化性
エポキシ樹脂組成物を支持フィルムに塗布乾燥しフィル
ム化した成形体を、内層回路が形成されたFR−4内層
(コア厚さ0.5mm、銅箔厚さ18μm)基板上に真
空ラミネーターにより両面同時にラミネートし、150
℃、30分硬化させ、層間絶縁層を形成した。このとき
のラミネート条件は、温度80℃、圧力1MPa、25
秒間のプレスとした。そして、層間絶縁層の所定位置に
ドリルまたはレーザーにより穴開けを行い、アルカリ性
水溶液と溶剤の混合物にて膨潤させたのち、アルカリ性
過マンガン酸塩水溶液、続いて還元剤にて処理し、粗化
剤処理を行った。その後、無電解銅めっきおよび電解銅
めっきにて銅厚35μmの導体層を形成し、さらに15
0℃、60分アニール処理を行い、多層プリント配線板
を作製した。こうして作製した多層プリント配線板を評
価し、その結果を表2に示す。
(Examples 9 and 10) First, the thermosetting epoxy resin compositions of the respective examples were mixed with a dissolver in a component composition (parts by mass) shown in Table 1 using a dissolver. After uniformly dispersing with this roll mill, the viscosity was adjusted with a diluting solvent to prepare the product. Next, the thermosetting epoxy resin composition thus prepared was applied to a support film, dried and formed into a film. The molded body was formed into an FR-4 inner layer (0.5 mm in core thickness, 18 μm in copper foil thickness) in which an inner layer circuit was formed. ) Laminate both sides simultaneously on the substrate by vacuum laminator, 150
C. for 30 minutes to form an interlayer insulating layer. The lamination conditions at this time were as follows: temperature 80 ° C., pressure 1 MPa, 25
Press for 2 seconds. Then, a hole is drilled at a predetermined position of the interlayer insulating layer by a drill or a laser, swelled with a mixture of an alkaline aqueous solution and a solvent, and then treated with an alkaline permanganate aqueous solution, followed by a reducing agent, and a roughening agent. Processing was performed. Thereafter, a conductor layer having a copper thickness of 35 μm was formed by electroless copper plating and electrolytic copper plating.
Annealing was performed at 0 ° C. for 60 minutes to produce a multilayer printed wiring board. The multilayer printed wiring board thus manufactured was evaluated, and the results are shown in Table 2.

【0034】(実施例11、12)まず、各実施例の熱
硬化性エポキシ樹脂組成物は、表1に示す成分組成(質
量部)にて各成分と溶剤等をディゾルバーにて混合し、
三本ロールミルにて均一分散させた後、希釈溶剤にて粘
度調整を行い作製した。次に、こうして作製した熱硬化
性エポキシ樹脂組成物を支持銅箔上に塗布乾燥して得ら
れた成形体を、内層回路が形成されたFR−4内層(コ
ア厚さ0.5mm、銅箔厚さ18μm)基板上の両面
に、樹脂層が基板側となるように積層し、圧力2.5M
Pa 、温度170℃にて1時間の熱プレスを行い、樹
脂付き銅箔層を形成した。そして、樹脂付き銅箔層の所
定位置にドリルまたはレーザーにより穴開けし、デスミ
ア処理を行い、その後銅めっきを行い銅厚35μmの導
体層を形成し、多層プリント配線板を作製した。こうし
て作製した多層プリント配線板を評価し、その結果を表
2に示す。
(Examples 11 and 12) First, the thermosetting epoxy resin composition of each example was prepared by mixing each component and a solvent with a dissolver according to the component compositions (parts by mass) shown in Table 1.
After uniformly dispersing with a three-roll mill, the viscosity was adjusted with a diluting solvent to prepare a product. Next, the thermosetting epoxy resin composition thus prepared was applied on a supporting copper foil and dried, and the molded article obtained was coated with an FR-4 inner layer (core thickness 0.5 mm, copper foil, The thickness is 18 μm) The resin layer is laminated on both sides of the substrate such that the resin layer is on the substrate side, and the pressure is 2.5M.
Hot pressing was performed for 1 hour at Pa and a temperature of 170 ° C. to form a resin-coated copper foil layer. Then, a hole was drilled at a predetermined position of the resin-coated copper foil layer with a drill or laser, desmearing was performed, and then copper plating was performed to form a conductor layer having a copper thickness of 35 μm, thereby producing a multilayer printed wiring board. The multilayer printed wiring board thus manufactured was evaluated, and the results are shown in Table 2.

【0035】[0035]

【表1】 [Table 1]

【0036】[0036]

【表2】 [Table 2]

【0037】[0037]

【発明の効果】以上説明したように本発明によれば、ビ
ルドアップ多層プリント配線板において、耐熱性や電気
絶縁特性、ならびに導体層の接着強度を同時に満足し、
しかも保存安定性に優れる熱硬化性エポキシ樹脂組成物
とその成形体、およびこららを用いて作製した高密度化
に対応できるビルドアップ多層プリント配線板を提供す
ることができる。
As described above, according to the present invention, in a build-up multilayer printed wiring board, heat resistance, electrical insulation properties, and adhesive strength of a conductor layer are simultaneously satisfied,
In addition, it is possible to provide a thermosetting epoxy resin composition having excellent storage stability, a molded article thereof, and a build-up multilayer printed wiring board which can be manufactured at a high density produced by using the same.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // C08L 63:00 C08L 63:00 (72)発明者 米田 直樹 埼玉県比企郡嵐山町大字大蔵388番地 太 陽インキ製造株式会社嵐山事業所内 (72)発明者 太田 尚子 埼玉県比企郡嵐山町大字大蔵388番地 太 陽インキ製造株式会社嵐山事業所内 Fターム(参考) 4F071 AA42 AC11 AE02 AE17 AH13 BB02 BC01 4J036 AB17 AD07 AD08 AD21 AE07 AF05 AF06 AF08 AF19 CC02 DC41 DD07 FA03 FA04 FA05 FB02 FB03 FB06 FB07 FB08 FB09 FB10 FB13 FB16 JA08 5E346 CC09 CC13 CC32 DD03 DD16 DD17 DD22 DD32 EE18 EE33 EE35 GG15 GG27 HH11 HH18──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification FI FI Theme Court ゛ (Reference) // C08L 63:00 C08L 63:00 (72) Inventor Naoki Yoneda 388 Okura Oaza, Arashiyama-cho, Hiki-gun, Saitama (72) Inventor Naoko Ota, 388 Ookura, Oaza, Arashiyama-cho, Hiki-gun, Saitama F-term (reference) 4F071 AA42 AC11 AE02 AE17 AH13 BB02 BC01 4J036 AB17 AD07 AD08 AD21 AE07 AF05 AF06 AF08 AF19 CC02 DC41 DD07 FA03 FA04 FA05 FB02 FB03 FB06 FB07 FB08 FB09 FB10 FB13 FB16 JA08 5E346 CC09 CC13 CC32 DD03 DD16 DD17 DD22 DD32 EE18 EE33 EE35 GG15 GG27 HH11H18

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 (A)1分子内に2個以上のエポキシ基を
有するエポキシ樹脂、(B)フェノール性水酸基を有す
る硬化剤、および(C)硬化促進剤として水酸基を有す
るイミダゾール化合物を含むことを特徴とする熱硬化性
エポキシ樹脂組成物。
1. A composition comprising (A) an epoxy resin having two or more epoxy groups in one molecule, (B) a curing agent having a phenolic hydroxyl group, and (C) an imidazole compound having a hydroxyl group as a curing accelerator. The thermosetting epoxy resin composition characterized by the above-mentioned.
【請求項2】 前記エポキシ樹脂(A)は、1分子内に
1個以上のエポキシ基を有するエポキシ樹脂に予め10
−(2,5−ジヒドロキシフェニル)−10H−オキサ
−フォスフェナンスレン=10−オキシドを反応させて
なるリン含有エポキシ樹脂を含むことを特徴とする請求
項1に記載の熱硬化性エポキシ樹脂組成物。
2. The epoxy resin (A) is prepared by previously adding an epoxy resin having one or more epoxy groups in one molecule.
The thermosetting epoxy resin composition according to claim 1, comprising a phosphorus-containing epoxy resin obtained by reacting-(2,5-dihydroxyphenyl) -10H-oxa-phosphenanthrene = 10-oxide. object.
【請求項3】 前記リン含有エポキシ樹脂は、リン含有
量が1〜5重量%であることを特徴とする請求項2に記
載の熱硬化性エポキシ樹脂組成物。
3. The thermosetting epoxy resin composition according to claim 2, wherein the phosphorus-containing epoxy resin has a phosphorus content of 1 to 5% by weight.
【請求項4】 前記硬化剤(B)は、フェノール性水酸
基を2個以上有することを特徴とする請求項1〜3のい
ずれか1項に記載の熱硬化性エポキシ樹脂組成物。
4. The thermosetting epoxy resin composition according to claim 1, wherein the curing agent (B) has two or more phenolic hydroxyl groups.
【請求項5】 前記硬化剤(B)は、10−(2,5−
ジヒドロキシフェニル)−10H−オキサ−フォスフェ
ナンスレン=10−オキシドを含むことを特徴とする請
求項1〜4のいずれか1項に記載の熱硬化性エポキシ樹
脂組成物。
5. The method according to claim 1, wherein the curing agent (B) is 10- (2,5-
The thermosetting epoxy resin composition according to any one of claims 1 to 4, further comprising (dihydroxyphenyl) -10H-oxa-phosphenanthrene = 10-oxide.
【請求項6】 平均粒子径が5μm以下の無機または有
機充填材を含むことを特徴とする請求項1〜5のいずれ
か1項に記載の熱硬化性エポキシ樹脂組成物。
6. The thermosetting epoxy resin composition according to claim 1, further comprising an inorganic or organic filler having an average particle size of 5 μm or less.
【請求項7】 前記無機または有機充填剤の含有量が、
組成物の固形分に対して内枠量で40重量%以下である
ことを特徴とする請求項6に記載の熱硬化性エポキシ樹
脂組成物。
7. The content of the inorganic or organic filler is:
7. The thermosetting epoxy resin composition according to claim 6, wherein the content of the composition is 40% by weight or less based on the solid content of the composition.
【請求項8】 熱硬化性エポキシ樹脂組成物が一液化し
たものである請求項1〜7のいずれか1項に記載の熱硬
化性エポキシ樹脂組成物。
8. The thermosetting epoxy resin composition according to claim 1, wherein the thermosetting epoxy resin composition is a one-part liquid.
【請求項9】 請求項1〜8のいずれか1項に記載の熱
硬化性エポキシ樹脂組成物を支持フィルム上に塗布乾燥
し、フィルム化してなる成形体。
9. A molded article formed by applying the thermosetting epoxy resin composition according to any one of claims 1 to 8 on a support film and drying to form a film.
【請求項10】 請求項1〜8のいずれか1項に記載の
熱硬化性エポキシ樹脂組成物を支持銅箔上に塗布乾燥
し、樹脂付き銅箔としてなる成形体。
10. A molded article which becomes a resin-coated copper foil by applying and drying the thermosetting epoxy resin composition according to claim 1 on a supporting copper foil.
【請求項11】 請求項1〜10のいずれか1項に記載
の熱硬化性エポキシ樹脂組成物または成形体を使用して
作製した多層プリント配線板。
11. A multilayer printed wiring board produced by using the thermosetting epoxy resin composition or the molded article according to claim 1. Description:
JP2001040572A 2001-02-16 2001-02-16 Thermosetting epoxy resin composition and its molding and multilayer printed wiring board Withdrawn JP2002241473A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2001040572A JP2002241473A (en) 2001-02-16 2001-02-16 Thermosetting epoxy resin composition and its molding and multilayer printed wiring board
KR1020020007082A KR100776725B1 (en) 2001-02-16 2002-02-07 Thermosetting epoxy resin composition, its formed article and multilayer printed circuit board
CNB021206384A CN1289600C (en) 2001-02-16 2002-02-09 Thermosetting epoxy resin composition and its formed body and multilayered printed circuit board
TW091102614A TWI237036B (en) 2001-02-16 2002-02-15 Thermosetting epoxy resin composition and its formed body and multilayered printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001040572A JP2002241473A (en) 2001-02-16 2001-02-16 Thermosetting epoxy resin composition and its molding and multilayer printed wiring board

Publications (1)

Publication Number Publication Date
JP2002241473A true JP2002241473A (en) 2002-08-28

Family

ID=18903153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001040572A Withdrawn JP2002241473A (en) 2001-02-16 2001-02-16 Thermosetting epoxy resin composition and its molding and multilayer printed wiring board

Country Status (4)

Country Link
JP (1) JP2002241473A (en)
KR (1) KR100776725B1 (en)
CN (1) CN1289600C (en)
TW (1) TWI237036B (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005146142A (en) * 2003-11-17 2005-06-09 Nippon Kayaku Co Ltd Epoxy resin composition
JP2005179598A (en) * 2003-12-22 2005-07-07 Chin Yee Chemical Industries Co Ltd Flame-retardant epoxy resin and flame-retardant epoxy resin composition
JP2007115993A (en) * 2005-10-21 2007-05-10 Sumitomo Bakelite Co Ltd Printed wiring board, its production method and multilayered printed wiring board
WO2008044552A1 (en) * 2006-10-06 2008-04-17 Sumitomo Bakelite Company, Ltd. Resin composition, insulating sheet with base, prepreg, multilayer printed wiring board and semiconductor device
WO2008114858A1 (en) * 2007-03-20 2008-09-25 Mitsui Mining & Smelting Co., Ltd. Resin composition for forming insulating layer of printed wiring board
JP2009176889A (en) * 2008-01-23 2009-08-06 Hitachi Chem Co Ltd Insulating resin composition for multilayer printed wiring board, insulating film with support, multilayer printed wiring board, and manufacturing method therefor
JP2009188163A (en) * 2008-02-06 2009-08-20 Hitachi Chem Co Ltd Insulating film with multilayer printed wiring board supporter, multilayer printed wiring board, and method of manufacturing same
JP2010031176A (en) * 2008-07-30 2010-02-12 Sekisui Chem Co Ltd Resin composition, resin film, laminated film, and printed wiring board
JP2012235135A (en) * 2005-05-27 2012-11-29 Hitachi Chem Co Ltd Metallic foil with adhesion auxiliary agent, printed-wiring board using the same, and manufacturing method for printed-wiring board
KR101228734B1 (en) 2010-11-05 2013-02-01 삼성전기주식회사 A flame retardant composition for multilayer wiring board and a multilayer wiring board comprising the same
CN103625051A (en) * 2008-03-25 2014-03-12 味之素株式会社 Insulating resin sheet and method for manufacturing multilayer printed wiring board using the insulating resin sheet

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5720118B2 (en) * 2009-06-01 2015-05-20 三菱レイヨン株式会社 Epoxy resin composition, prepreg and fiber reinforced composite material
CN104302124A (en) * 2014-08-27 2015-01-21 无锡长辉机电科技有限公司 Manufacturing technology of double-faced flexibility printed board
CN108093561A (en) * 2017-12-22 2018-05-29 珠海市航达科技有限公司 A kind of production method of thermoelectricity separation printed circuit board
KR102051375B1 (en) * 2018-05-11 2019-12-04 삼성전자주식회사 Resin composition for printed circuit board and IC package, and product using the same

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05121465A (en) * 1991-10-28 1993-05-18 Hitachi Chem Co Ltd Conductive resin paste composition and semiconductor device using the composition
JPH05308109A (en) * 1992-04-28 1993-11-19 Ube Ind Ltd Liquid type epoxy resin composition for sealing semiconductor
JPH09194813A (en) * 1996-01-23 1997-07-29 Hitachi Chem Co Ltd Conductive resin paste composition and semiconductor device
JPH11269355A (en) * 1998-01-07 1999-10-05 Taiyo Ink Mfg Ltd Liquid thermosetting composition for filler and permanent filling of printed circuit board with the same
JP2000212391A (en) * 1999-01-21 2000-08-02 Nippon Kayaku Co Ltd Flame-retardant epoxy resin composition
JP2000226432A (en) * 1999-02-08 2000-08-15 Hitachi Chem Co Ltd Resin paste composition and semiconductor device using the same
JP2000264956A (en) * 1999-03-12 2000-09-26 Dainippon Ink & Chem Inc Epoxy resin composition for laminate, and laminate
JP2000309624A (en) * 1999-02-23 2000-11-07 Dainippon Ink & Chem Inc Flame-retardant epoxy resin composition and its production
JP2000355622A (en) * 1999-04-15 2000-12-26 Shin Etsu Chem Co Ltd Epoxy resin composition and laminated film and semiconductor device using same
JP2001040183A (en) * 1999-07-29 2001-02-13 Hitachi Chem Co Ltd Resin paste composition and semiconductor apparatus by use thereof
JP2002069270A (en) * 2000-01-11 2002-03-08 Nippon Kayaku Co Ltd Flame-retardant halogen-free epoxy resin composition and use thereof

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100326009B1 (en) * 1993-07-20 2002-05-10 야마사키 노리쓰카 Ortho spiroesters, curable and cured resin compositions of low curing shrinkage comprising the same

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05121465A (en) * 1991-10-28 1993-05-18 Hitachi Chem Co Ltd Conductive resin paste composition and semiconductor device using the composition
JPH05308109A (en) * 1992-04-28 1993-11-19 Ube Ind Ltd Liquid type epoxy resin composition for sealing semiconductor
JPH09194813A (en) * 1996-01-23 1997-07-29 Hitachi Chem Co Ltd Conductive resin paste composition and semiconductor device
JPH11269355A (en) * 1998-01-07 1999-10-05 Taiyo Ink Mfg Ltd Liquid thermosetting composition for filler and permanent filling of printed circuit board with the same
JP2000212391A (en) * 1999-01-21 2000-08-02 Nippon Kayaku Co Ltd Flame-retardant epoxy resin composition
JP2000226432A (en) * 1999-02-08 2000-08-15 Hitachi Chem Co Ltd Resin paste composition and semiconductor device using the same
JP2000309624A (en) * 1999-02-23 2000-11-07 Dainippon Ink & Chem Inc Flame-retardant epoxy resin composition and its production
JP2000264956A (en) * 1999-03-12 2000-09-26 Dainippon Ink & Chem Inc Epoxy resin composition for laminate, and laminate
JP2000355622A (en) * 1999-04-15 2000-12-26 Shin Etsu Chem Co Ltd Epoxy resin composition and laminated film and semiconductor device using same
JP2001040183A (en) * 1999-07-29 2001-02-13 Hitachi Chem Co Ltd Resin paste composition and semiconductor apparatus by use thereof
JP2002069270A (en) * 2000-01-11 2002-03-08 Nippon Kayaku Co Ltd Flame-retardant halogen-free epoxy resin composition and use thereof

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4509539B2 (en) * 2003-11-17 2010-07-21 日本化薬株式会社 Epoxy resin composition sheet
JP2005146142A (en) * 2003-11-17 2005-06-09 Nippon Kayaku Co Ltd Epoxy resin composition
JP2005179598A (en) * 2003-12-22 2005-07-07 Chin Yee Chemical Industries Co Ltd Flame-retardant epoxy resin and flame-retardant epoxy resin composition
JP2012235135A (en) * 2005-05-27 2012-11-29 Hitachi Chem Co Ltd Metallic foil with adhesion auxiliary agent, printed-wiring board using the same, and manufacturing method for printed-wiring board
JP2007115993A (en) * 2005-10-21 2007-05-10 Sumitomo Bakelite Co Ltd Printed wiring board, its production method and multilayered printed wiring board
US8216668B2 (en) 2006-10-06 2012-07-10 Sumitomo Bakelite Company, Ltd. Resin composition, insulating sheet with base, prepreg, multilayer printed wiring board and semiconductor device
WO2008044552A1 (en) * 2006-10-06 2008-04-17 Sumitomo Bakelite Company, Ltd. Resin composition, insulating sheet with base, prepreg, multilayer printed wiring board and semiconductor device
WO2008114858A1 (en) * 2007-03-20 2008-09-25 Mitsui Mining & Smelting Co., Ltd. Resin composition for forming insulating layer of printed wiring board
US8431224B2 (en) 2007-03-20 2013-04-30 Mitsui Mining & Smelting Co., Ltd. Resin composition for forming insulating layer of printed wiring board
JP2009176889A (en) * 2008-01-23 2009-08-06 Hitachi Chem Co Ltd Insulating resin composition for multilayer printed wiring board, insulating film with support, multilayer printed wiring board, and manufacturing method therefor
JP2009188163A (en) * 2008-02-06 2009-08-20 Hitachi Chem Co Ltd Insulating film with multilayer printed wiring board supporter, multilayer printed wiring board, and method of manufacturing same
CN103625051A (en) * 2008-03-25 2014-03-12 味之素株式会社 Insulating resin sheet and method for manufacturing multilayer printed wiring board using the insulating resin sheet
CN103625051B (en) * 2008-03-25 2016-01-13 味之素株式会社 Insulating resin sheet and use the preparation method of multilayer printed-wiring board of this insulating resin sheet
JP2010031176A (en) * 2008-07-30 2010-02-12 Sekisui Chem Co Ltd Resin composition, resin film, laminated film, and printed wiring board
KR101228734B1 (en) 2010-11-05 2013-02-01 삼성전기주식회사 A flame retardant composition for multilayer wiring board and a multilayer wiring board comprising the same

Also Published As

Publication number Publication date
KR100776725B1 (en) 2007-11-19
CN1289600C (en) 2006-12-13
KR20020067627A (en) 2002-08-23
CN1384144A (en) 2002-12-11
TWI237036B (en) 2005-08-01

Similar Documents

Publication Publication Date Title
JP5605259B2 (en) Resin composition for interlayer insulation of multilayer printed wiring board, adhesive film and prepreg
JP4725704B2 (en) Resin composition for interlayer insulation of multilayer printed wiring board, adhesive film and prepreg
JP4423779B2 (en) Epoxy resin composition, adhesive film and prepreg using the composition, multilayer printed wiring board using the same, and method for producing the same
KR100970105B1 (en) Method of laminating circuit board and method of forming insulation layer, multilayer printed wiring board and production method therefor and adhesion film for multilayer printed wiring board
JP3785749B2 (en) Epoxy resin composition and method for producing multilayer printed wiring board using the composition
JP4992396B2 (en) Resin composition for interlayer insulation layer of multilayer printed wiring board
JP5573869B2 (en) Resin composition for interlayer insulation layer of multilayer printed wiring board
JP6205692B2 (en) Thermosetting epoxy resin composition, insulating film forming adhesive film and multilayer printed wiring board
KR101511495B1 (en) Epoxy resin composition
JP5011641B2 (en) Thermosetting resin composition, adhesive film using the same, and multilayer printed wiring board
JP2002241473A (en) Thermosetting epoxy resin composition and its molding and multilayer printed wiring board
KR101027303B1 (en) Resin composition and adhesive film for multi-layered printed wiring board
US20050129895A1 (en) Adhesive film and prepreg
JP2007169454A (en) Prepreg containing modified polyimide resin
JPWO2003099952A1 (en) Adhesive film and prepreg
JP2000017148A (en) Thermosetting resin composition and interlaminar adhesive film for printed wiring board using the same
US20050186434A1 (en) Thermosetting resin composition, adhesive film and multilayer printed wiring board using same
JP2000198907A (en) Flame-retardant epoxy resin composition and production of interlayer adhesive film for printed wiring board and multilayer printed wiring board by using same
JP2002241590A (en) Flame-retardant epoxy resin composition
JP6269401B2 (en) Surface-treated inorganic filler, method for producing the inorganic filler, and resin composition containing the inorganic filler
JP2003127313A (en) Adhesive film and prepreg
JP2002309200A (en) Adhesive film
KR101203156B1 (en) Epoxy resin composition, an adhesive film and a multi-layered printed circuit board prepared by using the same
WO2013121641A1 (en) Resin composition for plating resist, multilayer printed wiring board, and method for producing multilayer printed wiring board
JP2019090059A (en) Thermosetting epoxy resin composition, adhesive film for forming insulating layer and multilayer printed wiring board

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080131

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20100319

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100716

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100810

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20100820

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20100820

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101012

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101130

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110621

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20110808