JP2002174810A - Glass substrate for display, manufacturing method for the same and display using the same - Google Patents
Glass substrate for display, manufacturing method for the same and display using the sameInfo
- Publication number
- JP2002174810A JP2002174810A JP2000375135A JP2000375135A JP2002174810A JP 2002174810 A JP2002174810 A JP 2002174810A JP 2000375135 A JP2000375135 A JP 2000375135A JP 2000375135 A JP2000375135 A JP 2000375135A JP 2002174810 A JP2002174810 A JP 2002174810A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- display
- weight
- glass
- stress layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
- C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Liquid Crystal (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はディスプレイ用のガ
ラス基板及びその製造方法並びにこれを用いたディスプ
レイに関する。The present invention relates to a glass substrate for a display, a method for manufacturing the same, and a display using the same.
【0002】[0002]
【従来の技術】パーソナルコンピュータや携帯電話とい
った情報端末の表示装置としては液晶ディスプレイが用
いられている。一般に、液晶ディスプレイは透明電極が
形成された1対の基板間に液晶が封入された構造を有し
ている。この基板としてはソーダライムガラスや無アル
カリガラス等で形成されたガラス基板が用いられてい
る。2. Description of the Related Art Liquid crystal displays are used as display devices for information terminals such as personal computers and mobile phones. Generally, a liquid crystal display has a structure in which liquid crystal is sealed between a pair of substrates on which transparent electrodes are formed. As this substrate, a glass substrate formed of soda lime glass, non-alkali glass, or the like is used.
【0003】ところで、携帯電話、モバイル型パーソナ
ルコンピューター、携帯型AV機器等の携帯型情報端末
といった情報端末の小型化に伴い、情報端末で使用され
るディスプレイ用のガラス基板の軽量化と省電力化が要
望されている。例えば、バックライトを用いずに、画像
を背面に配置された反射板で反射して表示する反射型液
晶ディスプレイでは、ガラス基板が厚くなると視差が生
じ、画像が2重にみえ、これによって2つの画像が色を
うち消しあうため、画像の輝度が低下してしまう。従っ
て、このような液晶ディスプレイに用いられるガラス基
板は特に厚さを薄くすることが重要である。By the way, with the miniaturization of information terminals such as portable information terminals such as mobile phones, mobile personal computers, and portable AV devices, the weight of glass substrates for displays used in information terminals has been reduced and power consumption has been reduced. Is required. For example, in a reflective liquid crystal display in which an image is reflected by a reflector disposed on the back surface and displayed without using a backlight, when the glass substrate is thicker, parallax is generated, and the image appears to be doubled. Since the images erase each other in color, the brightness of the image decreases. Therefore, it is important to reduce the thickness of the glass substrate used for such a liquid crystal display.
【0004】一方、ガラス基板は厚さが薄くなると、デ
ィスプレイの製造工程中あるいは使用中に割れやすくな
るといった問題がある。この問題に対処するため、ディ
スプレイ用基板として、強化処理により強度が増大され
た強化ガラス基板を用いることが提案されている。例え
ば、特開昭57−205343号や特開平9−2367
92号は強化処理により強度が強化された液晶ディスプ
レイ用のガラス基板が開示されている。On the other hand, when the thickness of the glass substrate is reduced, there is a problem that the glass substrate is liable to be broken during the manufacturing process or during use of the display. In order to address this problem, it has been proposed to use a tempered glass substrate whose strength has been increased by a tempering treatment as a display substrate. For example, JP-A-57-205343 and JP-A-9-2367
No. 92 discloses a glass substrate for a liquid crystal display whose strength is enhanced by a strengthening treatment.
【0005】[0005]
【発明が解決しようとする課題】しかし、上述したガラ
ス基板では携帯型情報端末で用いられる厚さに形成した
場合、強度が十分でない場合がある。例えば、上述した
反射型液晶ディスプレイでは、ディスプレイの輝度を維
持するため、ガラス基板としては厚さが0.7mm以
下、通常0.4mm程度のものを用いる必要がある。こ
の場合、従来の強化ガラス基板では強化対象のガラス基
板の厚さが薄いため、必要な強度を得ることが困難な場
合がある。However, when the above-mentioned glass substrate is formed to a thickness used in a portable information terminal, the strength may not be sufficient. For example, in the above-mentioned reflective liquid crystal display, in order to maintain the brightness of the display, it is necessary to use a glass substrate having a thickness of 0.7 mm or less, usually about 0.4 mm. In this case, in a conventional tempered glass substrate, it is sometimes difficult to obtain necessary strength because the thickness of the glass substrate to be tempered is thin.
【0006】また、従来の強化方法で必要な強度を持た
せようとすると強化処理に長時間を要する場合がある。
例えば、ソーダライムガラスで形成されたガラス基板
に、厚さ50μm以上の圧縮応力層を形成するためには
ガラス基板を溶融塩中に16時間以上浸漬する必要があ
り、たとえ必要な強度を得られたとしても製造の手間及
びコストが増大してしまう。[0006] In addition, in order to provide a necessary strength by the conventional strengthening method, it may take a long time for the strengthening process.
For example, in order to form a compressive stress layer having a thickness of 50 μm or more on a glass substrate formed of soda lime glass, it is necessary to immerse the glass substrate in a molten salt for 16 hours or more. Even if it is, the labor and cost of manufacturing increase.
【0007】また、強化処理に使用する処理塩によって
は、ガラス基板が着色してしまったり、処理塩コストが
高くなりすぎるといった問題もある。本発明は上述した
問題点を解決するためになされたものであり、薄型化、
軽量化が可能で、機械的強度や透明性が高く、しかも短
時間で製造可能なディスプレイ用ガラス基板及びその製
造方法並びにこれを用いたディスプレイを提供すること
を目的とする。Further, depending on the treatment salt used for the strengthening treatment, there are problems that the glass substrate is colored and the treatment salt cost becomes too high. The present invention has been made to solve the above-described problems, and has been made thinner,
An object of the present invention is to provide a glass substrate for a display which can be reduced in weight, has high mechanical strength and transparency, and can be manufactured in a short time, a method for manufacturing the same, and a display using the same.
【0008】[0008]
【課題を解決するための手段】本発明は、厚さが0.7
mm以下で、表面に深さ50μm以上の圧縮応力層を有
するディスプレイ用ガラス基板である。本発明のディス
プレイ用ガラス基板は厚さが0.7mm以下と薄いた
め、ディスプレイの薄型化及び軽量化を図ることができ
ると共に、ディスプレイの輝度の低下を防止することが
できる。また、表面に深さ50μm以上の圧縮応力層を
有しているため、基板の厚さが0.7mm以下であって
も充分な強度を有する。例えば、本発明のガラス基板の
厚さが0.4mmである場合、厚さが0.8mmであっ
て圧縮応力層が形成されていないガラス基板と同等の強
度を有する。本発明のディスプレイ用ガラス基板の厚さ
は0.2〜0.5mmが好ましく、0.2〜0.45m
mがより好ましく、0.2〜0.4mmが最も好まし
い。また、圧縮応力層の深さは70μm以上が好まし
く、100μm以上がより好ましい。本発明に係るガラ
ス基板の圧縮応力層の深さの上限は基板の厚さ等の条件
により異なるが、通常、基板の厚さの1/4倍程度とす
ることが好ましい。The present invention has a thickness of 0.7 mm.
This is a display glass substrate having a compressive stress layer having a thickness of 50 mm or less and a depth of 50 μm or more on the surface. Since the glass substrate for a display of the present invention is as thin as 0.7 mm or less, it is possible to reduce the thickness and weight of the display and to prevent a decrease in luminance of the display. In addition, since the surface has a compressive stress layer having a depth of 50 μm or more, even if the thickness of the substrate is 0.7 mm or less, it has sufficient strength. For example, when the thickness of the glass substrate of the present invention is 0.4 mm, the glass substrate has a thickness of 0.8 mm and has the same strength as a glass substrate on which a compressive stress layer is not formed. The thickness of the glass substrate for a display of the present invention is preferably 0.2 to 0.5 mm, and 0.2 to 0.45 m.
m is more preferable, and 0.2 to 0.4 mm is most preferable. Further, the depth of the compressive stress layer is preferably at least 70 μm, more preferably at least 100 μm. Although the upper limit of the depth of the compressive stress layer of the glass substrate according to the present invention varies depending on conditions such as the thickness of the substrate, it is usually preferably about 1 / times the thickness of the substrate.
【0009】このような圧縮応力層はガラス基板に焼入
れといった物理強化処理又はイオン交換といった化学強
化処理を施すことにより形成することができる。本発明
では、化学強化処理により機械的強度の高い圧縮応力層
が得られること、厚さが0.7mm以下のガラス基板に
は物理強化処理は適さないことから化学強化処理を用い
ることが好ましい。Such a compressive stress layer can be formed by subjecting a glass substrate to physical strengthening such as quenching or chemical strengthening such as ion exchange. In the present invention, it is preferable to use the chemical strengthening treatment because a compressive stress layer having high mechanical strength can be obtained by the chemical strengthening treatment and the physical strengthening treatment is not suitable for a glass substrate having a thickness of 0.7 mm or less.
【0010】この化学強化処理は、ガラス基板の表面の
イオン半径が小さいアルカリイオン(例えば、ナトリウ
ムイオン)をイオン半径の大きなアルカリイオン(例え
ば、カリウムイオン)に置換すること、例えば、ナトリ
ウムイオンを含有するガラス基板をカリウムイオンを含
む溶融処理塩で処理することにより行うことができる。
このようなイオン交換処理が行われることにより、ガラ
ス基板表面の圧縮応力層の組成はイオン交換処理前の組
成と若干異なるが、基板深層部の組成はイオン交換処理
前の組成とほぼ同じである。In this chemical strengthening treatment, alkali ions having a small ionic radius (eg, sodium ions) on the surface of the glass substrate are replaced with alkali ions having a large ionic radius (eg, potassium ions). By treating the glass substrate with a molten salt containing potassium ions.
By performing such an ion exchange treatment, the composition of the compressive stress layer on the surface of the glass substrate is slightly different from the composition before the ion exchange treatment, but the composition of the deep portion of the substrate is almost the same as the composition before the ion exchange treatment. .
【0011】化学強化処理により圧縮応力層が形成され
たかは、ガラス基板の表面付近に含まれる金属イオンの
分布を調べることにより判定することができる。具体的
には、イオン半径の大きなアルカリ金属イオンと、イオ
ン半径の小さなアルカリ金属イオンの深さ分布を調べ、
(イオン半径の大きな金属イオンの密度)/(イオン半
径の小さな金属イオンの密度)が、ガラスの深層部(ガ
ラスの厚みの半分の深さの部分)よりも表面に近い部分
のほうが大きければ、イオン交換による化学強化が行な
われたものであることが判る。Whether or not the compressive stress layer has been formed by the chemical strengthening treatment can be determined by examining the distribution of metal ions contained near the surface of the glass substrate. Specifically, the depth distribution of the alkali metal ion having a large ionic radius and the alkali metal ion having a small ionic radius is examined,
If (density of metal ions having a large ionic radius) / (density of metal ions having a small ionic radius) is larger in a portion closer to the surface than in a deep portion of glass (a portion having a depth of half the thickness of glass), It turns out that the chemical strengthening by ion exchange was performed.
【0012】また、圧縮応力層の深さは、精密歪み計を
用いたバビネ補正法又は偏光顕微鏡を用いる方法などで
求めることができる。精密歪み計を用いたバビネ補正法
は市販の測定装置により行うことができる。偏光顕微鏡
を用いる方法は、ガラス基板のイオン交換処理面を垂直
に切断し、その断面を厚さ0.5mm以下となるよう薄
く研磨した後、偏光顕微鏡にて研磨面に垂直に偏光を入
射し直行ニコルにて観察することにより行うことができ
る。化学強化ガラスは、表面付近に圧縮応力層が形成さ
れるため、表面から明るさや色の変化している部分の距
離を測定することによって圧縮応力層の厚さが測定され
る。The depth of the compressive stress layer can be determined by a Babinet correction method using a precision strain gauge or a method using a polarizing microscope. The Babinet correction method using a precision strain meter can be performed by a commercially available measuring device. In the method using a polarizing microscope, the ion-exchange-treated surface of the glass substrate is cut vertically, and its cross section is polished thinly to a thickness of 0.5 mm or less. This can be done by observing with direct Nicol. Since the chemically stressed glass has a compressive stress layer formed near the surface, the thickness of the compressive stress layer is measured by measuring the distance from the surface to the portion where the brightness or color changes.
【0013】このような化学強化処理が行われるガラス
基板としては、イオン半径の小さなアルカリイオン(例
えば、カリウム以下のアルカリ金属イオン)を含有する
ガラス基板が用いられる。また、圧縮応力層を形成する
ためには、ガラス基板が歪み点以下のときに溶融処理塩
で処理する必要があるため、歪み点が一定温度以上のガ
ラス基板が用いられる。As a glass substrate on which such a chemical strengthening treatment is performed, a glass substrate containing an alkali ion having a small ionic radius (for example, an alkali metal ion of potassium or less) is used. In addition, in order to form a compressive stress layer, it is necessary to treat the glass substrate with a molten salt when the temperature is below the strain point. Therefore, a glass substrate having a strain point of a certain temperature or higher is used.
【0014】このようなガラス基板の組成は、耐久性、
安定性、イオン交換効率、歪み点、透明性、溶解性、機
械強度等を考慮して定めることができるが、SiO2、
Al 2O3、Li2O、Na2O及びZrO2を含むこ
とが好ましい。上記成分の含有量については以下の点を
考慮して決められる。The composition of such a glass substrate has durability,
Stability, ion exchange efficiency, strain point, transparency, solubility, machine
It can be determined in consideration of mechanical strength, etc.2,
Al 2O3, Li2O, Na2O and ZrO2Including
Is preferred. Regarding the content of the above components, the following points
It is decided in consideration of.
【0015】SiO2はガラス骨格を形成する必須成分
であり、その含有量が40重量%未満であると化学的耐
久性が悪化し、逆に70重量%を超えると溶融温度が高
くなりすぎる。従って、SiO2の含有量は40〜70
重量%とすることが好ましい。[0015] SiO 2 is an essential component for forming a glass skeleton, its a content of less than 40% by weight chemical durability deteriorates, and the melting temperature exceeds 70 wt% is too high. Therefore, the content of SiO 2 is 40-70.
It is preferable to set the weight%.
【0016】Al2O3はガラス表面のイオン交換性能
を向上させる成分であり、その含有量が0.1重量%未
満であるとその効果がなく、逆に20重量%を超えると
耐失透性が低下する。従って、Al2O3含有量は0.
1〜20重量%とすることが好ましい。Al 2 O 3 is a component for improving the ion exchange performance of the glass surface. If its content is less than 0.1% by weight, it has no effect. Conversely, if its content exceeds 20% by weight, devitrification resistance is obtained. Is reduced. Therefore, the content of Al 2 O 3 is 0.1.
The content is preferably set to 1 to 20% by weight.
【0017】Na2Oはイオン交換処理において主とし
てカリウムイオンと置換されることによってガラスを化
学強化する成分であり、その含有量が20重量%を越え
る化学的耐久性が低下する。従って、Na2Oの含有量
は0〜20重量%とすることが好ましい。Na 2 O is a component that chemically strengthens the glass by being mainly replaced by potassium ions in the ion exchange treatment, and the chemical durability of which content exceeds 20% by weight decreases. Therefore, the content of Na 2 O is preferably set to 0 to 20% by weight.
【0018】Li2Oはイオン交換処理において主とし
てナトリウムイオンと置換されることによってガラスを
化学強化する成分であり、Na2Oよりもイオン交換速
度が大きいため、短時間で深い圧縮応力層を形成するた
めに用いられる。Li2Oの含量が15重量%を超える
と耐失透性と化学耐久性が低下すると共に、圧縮応力層
の最表面のナトリウムイオンの濃度が高くなり、Na溶
出量が増加する。従って、Li2Oの含有量は0〜15
重量%とすることが好ましい。Li 2 O is a component that chemically strengthens the glass by being mainly replaced by sodium ions in the ion exchange treatment. Since the ion exchange rate is higher than that of Na 2 O, a deep compressive stress layer is formed in a short time. Used to If the content of Li 2 O exceeds 15% by weight, the devitrification resistance and the chemical durability decrease, and the concentration of sodium ions on the outermost surface of the compressive stress layer increases, so that the Na elution amount increases. Therefore, the content of Li 2 O is 0 to 15
It is preferable to set the weight%.
【0019】Li2OとNa2Oの合計含有量が3重量
%未満であると、イオン交換時の効率が低下し、充分な
深さの圧縮応力層を形成することが難しくなる。一方、
20重量%を超えるとガラスの化学的耐久性、耐失透性
がともに低下してしまう。従って、Li2OとNa2O
の合計含有量は3〜20重量%とすることが好ましい。When the total content of Li 2 O and Na 2 O is less than 3% by weight, the efficiency at the time of ion exchange decreases, and it becomes difficult to form a compressive stress layer having a sufficient depth. on the other hand,
If it exceeds 20% by weight, both the chemical durability and the devitrification resistance of the glass will be reduced. Therefore, Li 2 O and Na 2 O
Is preferably 3 to 20% by weight.
【0020】ZrO2はイオン交換速度を向上させ、ガ
ラスの化学的耐久性や硬さを向上させる成分であり、そ
の含有量が9重量%を超えるとZrO2の溶解度が過飽
和になり、原料が溶けずに沈殿状態となりやすい。従っ
て、ZrO2の含有量は0.1〜9重量%であることが
好ましい。ZrO 2 is a component that improves the ion exchange rate and improves the chemical durability and hardness of glass. If its content exceeds 9% by weight, the solubility of ZrO 2 becomes supersaturated, and It tends to precipitate without melting. Therefore, the content of ZrO 2 is preferably 0.1 to 9% by weight.
【0021】また、このガラス基板は、溶融性の向上、
耐失透性の向上、ガラス粘度の調整、歪み点の調整、熱
膨張特性の調整、ヤング率の向上、清澄等の目的のた
め、K 2O、MgO、CaO、SrO、BaO、Zn
O、TiO2、B2O3、La2O3、Y2O3、P2
O5、SnO2、Sb2O3、SO3等を含有すること
ができる。上記成分のうち、MgO、CaO、TiO
2、Y2O3はヤング率を向上させる成分であり、適量
含有させることによって曲げ変形に強いガラスが得られ
る。Further, the glass substrate has an improved melting property,
Improvement of devitrification resistance, adjustment of glass viscosity, adjustment of strain point, heat
For the purpose of adjusting expansion characteristics, improving Young's modulus, fining, etc.
K 2O, MgO, CaO, SrO, BaO, Zn
O, TiO2, B2O3, La2O3, Y2O3, P2
O5, SnO2, Sb2O3, SO3Etc.
Can be. Of the above components, MgO, CaO, TiO
2,Y2O3Is a component that improves the Young's modulus,
By containing it, a glass resistant to bending deformation can be obtained.
You.
【0022】従って、本発明で用いられるガラス基板と
しては、SiO2を40〜70重量%、Al2O3を
0.1〜20重量%、Li2Oを0〜15重量%、Na
2Oを0〜20重量%、Li2OとNa2Oの合計含有
量が3〜20重量%、ZrO2を0.1〜9重量%を含
むガラスで形成されていることが望ましい。[0022] Therefore, the glass substrate used in the present invention, S i O 2 of 40 to 70 wt%, the Al 2 O 3 0.1 to 20 wt%, Li 2 O 0 to 15 wt%, Na
The 2 O 0 to 20 wt%, Li 2 O and Na 2 O total content 3 to 20 wt% of it is preferably formed of a glass containing a ZrO 2 0.1 to 9 wt%.
【0023】また、SiO2を45〜65重量%、Al
2O3を1〜20重量%、Li2Oを3〜10重量%、
Na2Oを3〜15重量%、ZrO2を3〜8重量%、
Sb 2O3を0〜1重量%含むガラスで形成されている
ことがより好ましい。上記の望ましい組成及びより好ま
しい組成において、上記成分の合計含有量が80重量%
以上であることが好ましく、90重量%以上であること
がより好ましく、95重量%以上であることがさらに好
ましい。Further, SiO2From 45 to 65% by weight of Al
2O3From 1 to 20% by weight of Li2O to 3 to 10% by weight,
Na2O to 3 to 15% by weight, ZrO2From 3 to 8% by weight,
Sb 2O3Is formed of glass containing 0 to 1% by weight of
Is more preferable. Above desired composition and more preferred
In a new composition, the total content of the above components is 80% by weight.
Preferably at least 90% by weight
Is more preferred, and even more preferably 95% by weight or more.
Good.
【0024】化学処理が施されるガラス基板として、上
記組成のものが用いられる場合、化学強化処理を行うた
めの処理塩としては、ナトリウムイオン及びカリウムイ
オンの少なくともいずれか一方を含む処理塩、例えば、
NaNO3、KNO3又はこれらの混合物等を用いるこ
とができる。この場合、上記処理塩を350〜550℃
程度に加熱して溶融塩とし、ガラス基板をこの溶融塩中
に30分〜6時間程度浸漬することによりイオン交換を
行うことができる。これによって、ガラス基板に透明な
圧縮応力層を形成することができる。When the glass substrate having the above composition is used as the glass substrate to be subjected to the chemical treatment, the treatment salt for performing the chemical strengthening treatment is a treatment salt containing at least one of sodium ion and potassium ion, for example, ,
NaNO 3 , KNO 3 or a mixture thereof can be used. In this case, the above treated salt is heated at 350 to 550 ° C.
Ion exchange can be performed by immersing the glass substrate in the molten salt for about 30 minutes to 6 hours for about 30 minutes to 6 hours. Thereby, a transparent compressive stress layer can be formed on the glass substrate.
【0025】ガラス基板に上記の化学強化処理を施すこ
とにより、ガラス基板中のアルカリ金属イオンの移動が
抑制され、ガラス基板からのアルカリ金属の溶出量が低
減される。従って、化学強化処理により液晶素子のアル
カリ金属汚染を防止することも可能になる。ガラス基板
からのアルカリ金属の溶出量を更に低減するためには、
化学強化処理後に、ガラス基板を水又は酸水溶液で洗浄
したり、ガラス基板を120℃以上好ましくは150℃
以上に加熱してガラス基板表面のヒドロニウムイオンを
除去したり、或いは、ガラス基板の表面にSiO2をコ
ーティングするようにしてもよい。By subjecting the glass substrate to the above chemical strengthening treatment, the movement of alkali metal ions in the glass substrate is suppressed, and the amount of alkali metal eluted from the glass substrate is reduced. Therefore, it is possible to prevent the alkali metal contamination of the liquid crystal element by the chemical strengthening treatment. In order to further reduce the amount of alkali metal eluted from the glass substrate,
After the chemical strengthening treatment, the glass substrate is washed with water or an acid aqueous solution, or the glass substrate is heated to 120 ° C. or more, preferably 150 ° C.
The heating may be performed to remove the hydronium ions on the surface of the glass substrate, or the surface of the glass substrate may be coated with SiO 2 .
【0026】また、ガラス基板に化学強化処理を施すこ
とによって、ガラス基板の加熱、冷却に伴う寸法変化を
抑制することもできる。これによって、液晶ディスプレ
イの製造工程における温度変化によってガラス基板の寸
法が変化しにくくなる。従って、ガラス基板に薄膜や配
線を重ねていく液晶ディスプレイの製造工程において構
成部品の位置ずれが少なくなり、高精度の液晶ディスプ
レイを製造することが可能になる。Further, by subjecting the glass substrate to a chemical strengthening treatment, a dimensional change accompanying heating and cooling of the glass substrate can be suppressed. This makes it difficult for the dimensions of the glass substrate to change due to a temperature change in the manufacturing process of the liquid crystal display. Accordingly, in the manufacturing process of the liquid crystal display in which the thin film and the wiring are superposed on the glass substrate, the displacement of the component parts is reduced, and it is possible to manufacture the liquid crystal display with high precision.
【0027】化学強化処理が施されたガラス基板に微小
な傷(マイクロクラック)といったクラックソースがあ
ると、このクラックソースが成長してガラスの破壊を発
生させる原因となる。クラックソースは、化学強化され
た主表面に存在する場合よりも端面に存在する場合のほ
うが基板強度に与える影響が大きい。従って、強化処理
が施される前のガラス基板又は強化処理が施されたガラ
ス基板のクラックソースを除去することによって強度を
向上させることができる。特に、ガラス基板端面のクラ
ックソースを除去することが望ましい。If the glass substrate subjected to the chemical strengthening treatment has a crack source such as a minute scratch (micro crack), the crack source grows and causes the glass to break. The crack source has a greater effect on the substrate strength when present on the end face than when present on the chemically strengthened main surface. Therefore, the strength can be improved by removing the crack source of the glass substrate before the tempering treatment or the glass substrate subjected to the tempering treatment. In particular, it is desirable to remove the crack source on the end face of the glass substrate.
【0028】クラックソースの除去方法には、エッチン
グによる方法、加熱軟化による方法等がある。エッチン
グによる方法では、ガラス基板を酸を含むエッチング液
に浸漬し、マイクロクラックを除去し、クラックの先端
を鈍化させることにより、基板強度を向上させる。この
エッチング液としては、フッ酸を含有するもの、例え
ば、フッ酸と硫酸、塩酸、硝酸などとの混酸を用いるこ
とが好ましい。このような混酸、特にフッ酸を含む混酸
を用いることによりガラス基板表面にエッチングによる
副生成物が堆積せず、滑らかな面を形成することが可能
になる。As a method of removing the crack source, there are a method by etching, a method by softening by heating, and the like. In the etching method, the strength of the substrate is improved by immersing the glass substrate in an etching solution containing an acid, removing microcracks, and dulling the tips of the cracks. As the etching solution, a solution containing hydrofluoric acid, for example, a mixed acid of hydrofluoric acid and sulfuric acid, hydrochloric acid, nitric acid or the like is preferably used. By using such a mixed acid, particularly a mixed acid containing hydrofluoric acid, it is possible to form a smooth surface without depositing by-products by etching on the glass substrate surface.
【0029】このようなエッチング処理は、化学強化前
のガラス基板に施すこともできるが、化学強化後に行う
ことにより圧縮応力層を緩和させることなくガラス基板
表面のアルカリ金属を除去することができるので、化学
強化後に施すことが望ましい。Such an etching treatment can be performed on the glass substrate before chemical strengthening, but by performing it after chemical strengthening, the alkali metal on the glass substrate surface can be removed without relaxing the compressive stress layer. It is desirable to apply after chemical strengthening.
【0030】加熱軟化による方法は、ガラスの端部をバ
ーナーなどで加熱し、軟化させる。これによってマイク
ロクラックが塞がれ、端面が非接触の新たな非機械加工
面になる。軟化によってガラス面の形状が変化した場合
は、ガラス面のみを研磨することによってガラスの平坦
性を確保することができる。加熱軟化による方法はガラ
スを軟化点以上に加熱しなければならないため、化学強
化前に行なう必要がある。In the method using heat softening, the edge of the glass is heated with a burner or the like to soften the glass. This closes the microcracks and makes the end face a new non-machined surface with no contact. When the shape of the glass surface changes due to softening, the flatness of the glass can be ensured by polishing only the glass surface. Since the method by heat softening requires heating the glass above the softening point, it must be performed before chemical strengthening.
【0031】上述した化学強化処理が施されたガラス基
板を切断すると、切断した端面は圧縮応力層のない未強
化ガラスとなり、強度が極端に低下してしまう。本発明
者は、化学強化処理により、曲げ強度が400MPaと
なったガラス基板を切断すると、曲げ強度が約100M
Paに低下することを確認した。従って、本発明のガラ
ス基板は、予め使用時の寸法に加工されたガラス基板に
強化処理を施して形成されることが好ましい。When the glass substrate subjected to the above-mentioned chemical strengthening treatment is cut, the cut end face becomes unstrengthened glass having no compressive stress layer, and the strength is extremely reduced. The inventor found that when a glass substrate having a bending strength of 400 MPa was cut by a chemical strengthening treatment, the bending strength was about 100M.
It was confirmed that it decreased to Pa. Therefore, it is preferable that the glass substrate of the present invention is formed by performing a strengthening treatment on a glass substrate that has been processed in advance to dimensions at the time of use.
【0032】本発明のディスプレイ用ガラス基板は、圧
縮応力層の厚さを越えない範囲で研磨を行なうことがで
きる。本発明のガラス基板は、例えば、STN液晶ディ
スプレイ、TFT液晶ディスプレイ、DSTN液晶ディ
スプレイ等の液晶ディスプレイや有機ELディスプレ
イ、電界放出型ディスプレイ等に用いることができる。The glass substrate for display of the present invention can be polished within a range not exceeding the thickness of the compressive stress layer. The glass substrate of the present invention can be used for a liquid crystal display such as an STN liquid crystal display, a TFT liquid crystal display, a DSTN liquid crystal display, an organic EL display, a field emission display, and the like.
【0033】特に、厚さを0.7mm以下としても、十
分な強度を有しているので、モバイル型パーソナルコン
ピュータ、携帯電話、小型液晶テレビの表示装置といっ
た携帯型ディスプレイに用いることができる。本発明の
ガラス基板は、厚さを薄く形成することにより、反射型
液晶ディスプレイ、透過型液晶ディスプレイ、半透過型
液晶ディスプレイなどの液晶ディスプレイ等に用いるこ
とができる。In particular, even if the thickness is 0.7 mm or less, it has a sufficient strength and can be used for a portable display such as a display device of a mobile personal computer, a mobile phone, or a small liquid crystal television. The glass substrate of the present invention can be used for a liquid crystal display such as a reflection type liquid crystal display, a transmission type liquid crystal display, and a semi-transmission type liquid crystal display by forming the thickness to be thin.
【0034】[0034]
【実施例】以下、実施例により本発明をさらに説明す
る。 (実施例1〜7)表1の組成のガラス原料を白金坩堝で
1400〜1500℃に加熱、溶融して、清澄を行なっ
た後、鋳型に流し込んでガラスを調製した。ガラスが固
化した後、ガラスをガラスの徐冷点付近に加熱された電
気炉に移し、室温まで除冷してガラスブロックを得た。
このガラスブロックから、厚さ0.4mm、35×35
mmの両面が研磨されたガラス基板を製造した。The present invention will be further described below with reference to examples. (Examples 1 to 7) Glass materials having the compositions shown in Table 1 were heated and melted in a platinum crucible at 1400 to 1500 ° C., clarified, and then poured into a mold to prepare glass. After the glass was solidified, the glass was transferred to an electric furnace heated near the annealing point of the glass, and cooled to room temperature to obtain a glass block.
From this glass block, a thickness of 0.4 mm, 35 × 35
A glass substrate having both sides polished in mm was manufactured.
【0035】このガラス基板を所定温度に保持した溶融
塩中に所定時間浸漬して化学強化処理を行い、両面に深
さ50μm以上の圧縮応力層を有する強化ガラス基板を
得た。そして、得られた強化ガラス基板の未加傷曲げ強
度及び加傷曲げ強度を測定した。未加傷曲げ強度はJI
S−R1601の3点曲げ試験に準じて測定した。The glass substrate was immersed in a molten salt maintained at a predetermined temperature for a predetermined time to perform a chemical strengthening treatment, thereby obtaining a reinforced glass substrate having a compressive stress layer with a depth of 50 μm or more on both sides. Then, the uninjured bending strength and the injured bending strength of the obtained tempered glass substrate were measured. Uninjured bending strength is JI
It was measured according to the three-point bending test of S-R1601.
【0036】加傷曲げ強度は♯150のサンドペーパー
で強化ガラス基板の片面に均一に傷を付け、その面に引
っ張り応力が働くようにして測定した。以上の結果、未
加傷強度400MPa以上、加傷曲げ強度250MPa
以上の透明強化ガラス基板が得られた。The bending bending strength was measured using a # 150 sandpaper to uniformly scratch one surface of the tempered glass substrate and apply a tensile stress to the surface. As a result, the uninjured strength is 400 MPa or more, and the injured bending strength is 250 MPa.
The above transparent tempered glass substrate was obtained.
【0037】(実施例8)実施例1で得られた強化ガラ
ス基板を5%希フッ酸と30%硫酸の混合水溶液に室温
で5分間浸漬してエッチング処理を行った。このような
エッチング処理が施された強化ガラス基板の未加傷曲げ
強度は550MPaであり、エッチングが施されていな
い実施例1の値と比較し、10%程度向上させることが
できた。Example 8 The tempered glass substrate obtained in Example 1 was immersed in a mixed aqueous solution of 5% diluted hydrofluoric acid and 30% sulfuric acid at room temperature for 5 minutes to perform an etching treatment. The undamaged bending strength of the tempered glass substrate subjected to such etching treatment was 550 MPa, which was able to be improved by about 10% as compared with the value of Example 1 in which no etching was performed.
【0038】[0038]
【表1】 [Table 1]
【0039】(実施例9)実施例8で得られた強化ガラ
ス基板(厚さ0.4mm、35×35mm)を用いて
1.8インチの半透過型STN液晶ディスプレイを作製
した。このディスプレイでは厚さ1mmの強化ガラス基
板を用いた液晶ディスプレイに比べた場合輝度を20%
程度向上させることができた。また、基板の厚みを0.
7mmとした場合には、従来品より輝度を10%程度向
上させることができた。Example 9 Using the tempered glass substrate (0.4 mm thick, 35 × 35 mm) obtained in Example 8, a transflective 1.8-inch STN liquid crystal display was manufactured. The brightness of this display is 20% compared to a liquid crystal display using a tempered glass substrate with a thickness of 1 mm.
The degree could be improved. Further, the thickness of the substrate is set to 0.
In the case of 7 mm, the brightness could be improved by about 10% compared with the conventional product.
【0040】この強化ガラス基板は十分な加傷曲げ強度
を有しているので、ディスプレイ製造過程で基板が損傷
する可能性を低減し、しかも使用の際に予想される加傷
に対して充分な耐久性を有するディスプレイを提供する
ことができた。The tempered glass substrate has a sufficient bending strength to reduce the possibility of the substrate being damaged during the manufacturing process of the display, and has a sufficient resistance to the damage expected during use. A durable display could be provided.
【0041】(比較例1〜3)表2の組成のガラス原料
を用い実施例1〜7と同一の方法でガラス基板を製造し
た。このガラス基板を所定温度に保持した処理塩中に所
定時間浸漬して化学強化処理を行い、両主表面に圧縮応
力層を有する強化ガラス基板を得た。そして、実施例1
〜7と同様の方法で強化ガラス基板の未加傷曲げ強度及
び加傷曲げ強度を測定した。Comparative Examples 1 to 3 Glass substrates were manufactured in the same manner as in Examples 1 to 7 using the glass raw materials having the compositions shown in Table 2. The glass substrate was immersed in a treatment salt maintained at a predetermined temperature for a predetermined time to perform a chemical strengthening treatment, thereby obtaining a reinforced glass substrate having a compressive stress layer on both main surfaces. And Example 1
The uninjured bending strength and the injured bending strength of the reinforced glass substrate were measured in the same manner as in Examples 7 to 7.
【0042】その結果、未加傷曲げ強度は100〜45
0MPaと充分なものもあったが、加傷曲げ強度は70
MPa以下であり、これでは基板の厚さを薄くして軽量
化した場合、使用時に傷が付くと割れやすく、実用に耐
え得るものではなかった。As a result, the undamaged bending strength was 100 to 45.
Although there was a satisfactory one at 0 MPa, the wound bending strength was 70 MPa.
When the substrate is reduced in thickness and weight is reduced, the substrate is liable to be broken if damaged during use, and is not practically usable.
【0043】[0043]
【表2】 [Table 2]
【0044】[0044]
【発明の効果】以上の説明から明らかなように、本発明
によれば、厚さを薄くしても十分な強度を有するディス
プレイ用ガラス基板が提供される。従って、このような
基板を用いることにより、ディスプレイの薄型化及び軽
量化を図ることができると共に、消費電力を増大させる
ことなくディスプレイの輝度の低下を防止することが可
能になる。As is apparent from the above description, according to the present invention, a glass substrate for a display having a sufficient strength even if the thickness is reduced is provided. Therefore, by using such a substrate, it is possible to reduce the thickness and weight of the display and to prevent a decrease in the luminance of the display without increasing power consumption.
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Claims (8)
μm以上の圧縮応力層を有するディスプレイ用ガラス基
板。1. A surface having a thickness of 0.7 mm or less and a depth of 50 mm
A glass substrate for a display having a compressive stress layer of μm or more.
3を0.1〜20重量%、Na2Oを0〜20重量%、
Li2Oを0〜15重量%、ZrO2を0.1〜9重量
%含有し、Li2OとNa2Oの合計含有量が3〜20
重量%であるガラス材料で形成されたガラス基板の表面
に深さ50μm以上の圧縮応力層を有するディスプレイ
用ガラス基板。2. A composition comprising 40 to 70% by weight of SiO 2 and Al 2 O
3 0.1 to 20 wt%, 0-20 wt% of Na 2 O,
Li 2 O is contained in an amount of 0 to 15% by weight, ZrO 2 is contained in an amount of 0.1 to 9% by weight, and the total content of Li 2 O and Na 2 O is 3 to 20%.
A glass substrate for a display having a compressive stress layer having a depth of 50 μm or more on the surface of a glass substrate formed of a glass material of weight%.
前記圧縮応力層が形成される前に切断された面である請
求項1又は2に記載のディスプレイ用ガラス基板。3. The display glass substrate according to claim 1, wherein an end surface of the display glass substrate is a surface cut before the compression stress layer is formed.
有する携帯型液晶ディスプレイ用基板。4. A portable liquid crystal display substrate having a compressive stress layer having a depth of 50 μm or more on its surface.
有する反射型液晶ディスプレイ用ガラス基板。5. A glass substrate for a reflective liquid crystal display having a compressive stress layer having a depth of 50 μm or more on the surface.
強化処理して、表面に深さ50μm以上の圧縮応力層を
形成する工程を備えたディスプレイ用ガラス基板の製造
方法。6. A method for producing a glass substrate for a display, comprising a step of chemically strengthening a glass substrate having a thickness of 0.7 mm or less to form a compressive stress layer having a depth of 50 μm or more on the surface.
3を0.1〜20重量%、Na2Oを0〜20重量%、
Li2Oを0〜15重量%、ZrO2を0.1〜9重量
%含有し、Li2OとNa2Oの合計含有量が3〜20
重量%であるガラス材料で形成されたガラス基板を化学
強化処理して、表面に深さ50μm以上の圧縮応力層を
形成する工程を備えたディスプレイ用ガラス基板の製造
方法。7. A composition comprising 40 to 70% by weight of SiO 2 and Al 2 O
3 0.1 to 20 wt%, 0-20 wt% of Na 2 O,
Li 2 O is contained in an amount of 0 to 15% by weight, ZrO 2 is contained in an amount of 0.1 to 9% by weight, and the total content of Li 2 O and Na 2 O is 3 to 20%.
A method for manufacturing a glass substrate for a display, comprising a step of chemically strengthening a glass substrate formed of a glass material of weight% to form a compressive stress layer having a depth of 50 μm or more on the surface.
たディスプレイ用ガラス基板又は請求項6又は7項記載
の方法により製造されたディスプレイ用基板を備えたデ
ィスプレイ。8. A display comprising the glass substrate for display according to claim 1 or a display substrate manufactured by the method according to claim 6 or 7.
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